WO2022114133A1 - Curable composition, cured product, and electronic component - Google Patents

Curable composition, cured product, and electronic component Download PDF

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Publication number
WO2022114133A1
WO2022114133A1 PCT/JP2021/043408 JP2021043408W WO2022114133A1 WO 2022114133 A1 WO2022114133 A1 WO 2022114133A1 JP 2021043408 W JP2021043408 W JP 2021043408W WO 2022114133 A1 WO2022114133 A1 WO 2022114133A1
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curable composition
meth
group
mass
compound
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PCT/JP2021/043408
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French (fr)
Japanese (ja)
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悠斗 小田桐
秀之 伊藤
一善 米田
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太陽インキ製造株式会社
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Priority to JP2022565452A priority Critical patent/JPWO2022114133A1/ja
Priority to CN202180078538.2A priority patent/CN116547326A/en
Publication of WO2022114133A1 publication Critical patent/WO2022114133A1/en

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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/06Polymers provided for in subclass C08G

Definitions

  • the present invention relates to a curable composition, a cured product and an electronic component, and more particularly to a curable composition suitable for inkjet printing, the cured product thereof and an electronic component having the cured product thereof.
  • a photocurable composition that can be applied onto a circuit board by inkjet printing is also required from the viewpoint of shortening the manufacturing process of electronic components.
  • the substrate After applying such a photocurable composition to a polyimide substrate having a circuit and exposing it to light, the substrate tends to warp. If the substrate is warped in this way, there is a possibility that the photocurable composition cannot be applied to an appropriate position when the second layer is applied (overcoating). Further, if the substrate is warped, it may come into contact with the inkjet head. After that, when the coating film is thermally cured, the substrate is further warped. Therefore, it is necessary to suppress the warp of the photocurable composition for inkjet printing after exposure.
  • Patent Document 1 discloses a transparent resin composition for forming an insulating film used for inkjet printing, which has excellent bending resistance and coating film strength.
  • the present invention has been made in view of the above problems, and provides a curable composition having flexibility suitable for a thin film substrate such as a flexible wiring board, low warpage after exposure, and heat resistance.
  • a curable composition having flexibility suitable for a thin film substrate such as a flexible wiring board, low warpage after exposure, and heat resistance. The purpose.
  • the present inventors have made diligent studies to achieve the above object.
  • the composition containing the photocurable compound, the photopolymerization initiator, and the thermosetting component the light having two (meth) acryloyl groups and the compound represented by the following general formula (1) as the photocurable compound. It has been found that by containing a curable urethane compound, a curable composition having low warpage, flexibility and heat resistance of the coated substrate after exposure can be obtained, and the present invention has been completed.
  • R 1 may be linear, branched or cyclic, and represents a hydrocarbon group having 1 or more and 4 or less carbon atoms which may contain an ether bond (provided that the hydrocarbon group has 1 or more and 4 or less carbon atoms).
  • the hydrocarbon group may have a substituent))))))))))))))))))))))))))))))))))))))))))))))))))))))))))))))))))))))))))))))))))))))))))))))))))))))))))) The radically polymerizable monomer represented by (B) A photocurable urethane compound having two (meth) acryloyl groups and (C) Compounds having (meth) acryloyl groups other than (A) and (B), and (D) Photopolymerization initiator and (E) Thermosetting component and It was found to be achieved by a curable composition characterized by containing.
  • the compounding amount of the photocurable urethane compound having two (B) (meth) acryloyl groups with respect to (F) the flame retardant is 1% by mass or more and 70% by mass or less. It is preferable to have
  • the mixing ratio of the radically polymerizable monomer represented by the formula (1) to the photocurable urethane compound having two (B) (meth) acryloyl groups is 250% by mass or more and 10,000% by mass or less. It is preferable to have.
  • the mixing ratio of the radically polymerizable monomer represented by the formula (A) to the flame retardant (F) is 50% by mass or more and 350% by mass or less.
  • the (E) thermosetting component contains a latent thermosetting component, and it is further preferable that the latent thermosetting component is a blocked isocyanate compound.
  • the (F) flame retardant is a phosphorus-based flame retardant, and it is further preferable that the phosphorus-based flame retardant is phenoxyphosphazene.
  • the curable composition has a viscosity of 50 mPa ⁇ s or less at 50 ° C.
  • the above object of the present invention can also be achieved by a cured product obtained from the curable composition of the present invention and an electronic component having the cured product.
  • the curable composition of the present invention has a low viscosity and can suppress the warp of the thin film substrate after being applied to and exposed to the thin film substrate to a low level. Further, the cured coating film has excellent heat resistance, and has both low warpage and flexibility.
  • the curable composition of the present invention is (A) Equation (1) (In the formula (1), R 1 may be linear, branched or cyclic, and represents a hydrocarbon group having 1 or more and 4 or less carbon atoms which may contain an ether bond (provided that the hydrocarbon group has 1 or more and 4 or less carbon atoms).
  • the hydrocarbon group may have a substituent))))
  • the radically polymerizable monomer of formula (A) (1) contained in the curable composition of the present invention is, for example, the following formula a):.
  • R 1 is the same as R 1 in formula (1)
  • X ⁇ indicates an initiator radical or a growth radical), so that the polymerization reaction proceeds while cyclizing. It is possible to form a main clavicle with a 5-membered ring ether structure having methylene radicals arranged on both sides as a repeating unit.
  • Examples of the hydrocarbon group having 1 or more and 4 or less carbon atoms include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, a sec-butyl group, a tert-butyl group and a vinyl group.
  • Examples thereof include an allyl group, a metalyl group, a crotyl group, a cyclopropyl group, a cyclobutyl group, a methoxymethyl group, a methoxyethyl group, an ethoxymethyl group, an ethoxyethyl group and a vinyloxyethyl group.
  • substituents examples include a chain unsaturated hydrocarbon group such as a vinyl group, an allyl group, a metallicyl group and a crotyl group; an alkoxy group such as a methoxy group, an ethoxy group and a methoxyethoxy group; a methylthio group and an ethylthio group.
  • Alkylthio group acyl group such as acetyl group and propionyl group; acyloxy group such as acetyloxy group and propionyloxy group; alkoxycarbonyl group such as methoxycarbonyl group and ethoxycarbonyl group; alkylthio such as methylthiocarbonyl group and ethylthiocarbonyl group Examples thereof include a carbonyl group; a halogen atom such as a fluorine atom, a chlorine atom, a bromine atom and an iodine atom; a ureido group; an amide group; a cyano group; a hydroxyl group; and a trimethylsilyl group.
  • acyl group such as acetyl group and propionyl group
  • acyloxy group such as acetyloxy group and propionyloxy group
  • alkoxycarbonyl group such as methoxycarbonyl group and ethoxycarbon
  • R 1 reduces the viscosity of the radically polymerizable monomer of the formula (A) (1) and the viscosity of the radically polymerizable monomer of the formula (A) (1), thereby lowering the viscosity of the curable composition.
  • a chain saturated hydrocarbon group having 1 to 4 carbon atoms a chain unsaturated hydrocarbon group having 1 to 4 carbon atoms and a hydrocarbon having an ether bond having 1 to 4 carbon atoms.
  • a hydrogen group is preferable, and a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, a sec-butyl group, a tert-butyl group, an allyl group, a metalyl group, a crotyl group, a methoxyethyl group and an ethoxyethyl group.
  • And vinyloxyethyl groups are more preferable, and chains having 1 or more and 4 or less carbon atoms such as methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, sec-butyl group, and tert-butyl group.
  • Saturated hydrocarbon groups are even more preferred, methyl, ethyl, n-propyl, isopropyl and tert-butyl groups are even more preferred, and methyl and ethyl groups are particularly preferred.
  • Examples of the radically polymerizable monomer of the formula (A) (1) include methyl ⁇ -allyloxymethylacrylate, ethyl ⁇ -allyloxymethylacrylate, n-propyl ⁇ -allyloxymethylacrylate, and ⁇ -allyloxy.
  • ⁇ -allyl oxymethyl acrylate sec-butyl ⁇ -allyl oxymethyl acrylate tert-butyl
  • ⁇ -allyl oxymethyl acrylate allyl ⁇ -allyl oxymethyl acrylate methallyl, ⁇ -allyl oxymethyl acrylate crotyl, methoxyethyl ⁇ -allyl oxymethyl acrylate, ethoxyethyl ⁇ -allyl oxymethyl acrylate, glycidyl ⁇ -allyl oxymethyl acrylate, vinyl oxyethyl ⁇ -allyl oxymethyl acrylate are preferable, and more preferably ⁇ -allyl oxymethyl.
  • Methyl acrylate, ethyl ⁇ -allyl oxymethyl acrylate, n-propyl ⁇ -allyl oxymethyl acrylate, isopropyl ⁇ -allyl oxymethyl acrylate, n-butyl ⁇ -allyl oxymethyl acrylate, ⁇ -allyl oxymethyl acrylic Sect-butyl acid and tert-butyl ⁇ -allyloxymethylacrylate are preferred, with methyl ⁇ -allyloxymethylacrylate, ethyl ⁇ -allyloxymethylacrylate, n-propyl ⁇ -allyloxymethylacrylate, and ⁇ -allyl.
  • Isopropyl oxymethyl acrylate and tert-butyl ⁇ -allyl oxymethyl acrylate are more preferred, and methyl ⁇ -allyl oxymethyl acrylate and ethyl ⁇ -allyl oxymethyl acrylate are even more preferred.
  • the radically polymerizable monomer of the formula (A) (1) can be adjusted according to, for example, the methods described in JP-A-2014-040585, JP-A-2011-137123, and the like.
  • the mixing ratio of the radically polymerizable monomer of the formula (A) (1) is preferably 250% by mass or more and 10,000% by mass with respect to the photocurable urethane compound having two (meth) acryloyl groups described later (B). % Or less, and particularly preferably 300% by mass or more and 5000% by mass or less. Within the above range, the curable resin composition is excellent in low warpage after exposure while maintaining a low viscosity.
  • the mixing ratio of the radically polymerizable monomer of the formula (A) (1) is preferably 50 with respect to the flame retardant (F) when the curable composition contains the flame retardant (F) described later. It is by mass% or more and 350% by mass or less, and particularly preferably 65% by mass or more and 250% by mass or less. Within the above range, the curable resin composition is excellent in low warpage and flame retardancy after exposure while maintaining a low viscosity.
  • the curable composition of the present invention contains (B) a photocurable urethane compound having two (meth) acryloyl groups.
  • the photocurable urethane compound having two (meth) acryloyl groups gives flexibility to the cured product of the curable composition of the present invention, and is applied to a thin film substrate and exposed to the substrate. Suppress warpage.
  • (B) As the photocurable urethane compound having two (meth) acryloyl groups a photocurable urethane compound having two (meth) acryloyl groups and having one or less (meth) acryloyl groups was used. It has excellent properties such as heat resistance and flexibility compared to the case, and has lower warpage and flexibility after exposure compared to the case of using a photocurable urethane compound having 3 or more (meth) acryloyl groups. Excellent.
  • the photocurable urethane compound having two (B) (meth) acryloyl groups has a viscosity of 20,000 mPa ⁇ s or less at 25 ° C. It is preferable, and it is particularly preferable that it is 15,000 mPa ⁇ s or less.
  • the viscosity is 100 rpm, 30 seconds value according to the viscosity measurement method using a 10 cone-plate type rotational viscometer of JIS Z8803: 2011, and a cone plate type viscosity using 1 ° 34'x R24 as a cone rotor. It is a value measured by a meter (TVE-33H, manufactured by Toki Sangyo Co., Ltd.).
  • the photocurable urethane compound having two (B) (meth) acryloyl groups has a weight average molecular weight (Mw) of 6,000 or less. It is preferably 2,000 or less, and particularly preferably 2,000 or less.
  • Examples of the photocurable urethane compound having two (meth) acryloyl groups include UA-112P, UA-4200, UA-4400, UA-160TM, UA-122P, UA-W2, (above, new).
  • the blending ratio of the photocurable urethane compound having two (meth) acryloyl groups is, for example, 0.1 to 30% by mass, preferably 0.5 to 20% by mass, based on the entire curable resin composition. Is.
  • the compounding ratio of the photocurable urethane compound having two (meth) acryloyl groups is 1% by mass or more and 70% by mass or less with respect to (F) the flame retardant when (F) the flame retardant is contained. It is preferably 10% by mass or more and 50% by mass or less, and particularly preferably 10% by mass or more and 40% by mass or less.
  • the curable composition of the present invention contains a compound having a (meth) acryloyl group other than (C), (A) and (B).
  • C A compound having a (meth) acryloyl group other than (A) and (B) is a component that is cured after exposure and incorporated into a cured product.
  • a compound having a (meth) acryloyl group other than (C) (A) and (B) may be abbreviated as "a compound having a (C) (meth) acryloyl group”.
  • the compound having a (meth) acryloyl group has a (meth) acryloyl group as a photopolymerizable group.
  • the (meth) acryloyl group is a general term for an acryloyl group and a meta-acryloyl group.
  • a compound having a (meth) acryloyl group has one or more (meth) acryloyl groups, and optionally has a functional group such as a hydroxyl group, an ether bond, a ketone, an aromatic ring, or a heterocycle, or a structural portion. May have.
  • a functional group such as a hydroxyl group, an ether bond, a ketone, an aromatic ring, or a heterocycle, or a structural portion. May have.
  • compounds having a (C) (meth) acryloyl group that can be contained in the curable composition of the present invention will be exemplified, but the compound having a (C) (meth) acryloyl group is limited to this exemplified compound. It's not a thing.
  • a compound having one (meth) acryloyl group includes, for example, a compound having one (C1) (meth) acryloyl group.
  • the compound having one (meth) acryloyl group preferably has, for example, a specific functional group (preferably a hydroxyl group) other than the (meth) acryloyl group.
  • the compound having one (C1) (meth) acryloyl group has the specific functional group
  • the compound having one (C1) (meth) acryloyl group is a cured product after exposure to the curable composition of the present invention.
  • the specific functional group can be introduced into the cured product.
  • various physical properties of the cured product can be further improved.
  • the compound having one (C1) (meth) acryloyl group is more preferably a compound having a (meth) acryloyl group and a hydroxyl group, and the compound having a (meth) acryloyl group and a hydroxyl group is the curability of the present invention.
  • the adhesion between the obtained cured film and the conductor and the substrate is improved.
  • Examples of the compound having a (meth) acryloyl group and a hydroxyl group include 2-hydroxy-3-acryloyloxypropyl (meth) acrylate, 2-hydroxy-3-phenoxyethyl (meth) acrylate, and 1,4-cyclohexanedimethanol mono (meth).
  • Aronix M-5700 (trade name manufactured by Toagosei Co., Ltd.), 4HBA, 2HEA, CHDMMA (above, trade name manufactured by Kyoeisha Chemical Co., Ltd.), BHEA, HPA, HEMA, HPMA (above, manufactured by Nippon Catalyst Co., Ltd.).
  • Product name light ester HO, light ester HOP, light ester HOA (above, product name manufactured by Kyoeisha Chemical Co., Ltd.) and the like.
  • the compound having a (meth) acryloyl group and a hydroxyl group can be used alone or in combination of two or more.
  • 2-hydroxy-3-acryloyloxypropyl acrylate 2-hydroxy-3-phenoxyethyl acrylate, 2-hydroxyethyl acrylate, 2-hydroxypropyl acrylate, 4-hydroxybutyl acrylate, 1,4-cyclohexanedimethanol Monoacrylate is preferably used.
  • a compound having no aromatic ring is preferably used.
  • the blending amount thereof is preferably 1 part by mass or more per 100 parts by mass of the curable composition of the present invention. It is 15 parts by mass or less, more preferably 1 part by mass or more and 10 parts by mass or less, and particularly preferably 2 parts by mass or more and 5 parts by mass or less. It was
  • the compound having (C) (meth) acryloyl group includes, for example, a compound having two (C2) (meth) acryloyl groups.
  • a compound having two (meth) acryloyl groups is preferably a photocurable diluent, that is, a curing composition that is diluted to contribute to a decrease in viscosity, and is cured after exposure to become a cured product. It is an ingredient to be incorporated.
  • the viscosity at 50 ° C. is less than 50 mPa ⁇ s from the viewpoint of diluting the curable composition of the present invention to reduce the viscosity.
  • the viscosity at 50 ° C. is preferably less than 30 mPa ⁇ s, and particularly preferably the viscosity at 50 ° C. is 15 mPa ⁇ s or less.
  • Examples of the compound having two (C2) (meth) acryloyl groups having a viscosity at 50 ° C. of less than 50 mPa ⁇ s include a bifunctional (meth) acryloyl group-containing monomer which is an ester of alkylene glycol and (meth) acrylic acid. Can be mentioned.
  • the alkylene glycol may be a monoalkylene glycol or one having a repeating structure of two or more alkylene glycols.
  • Examples of the monoalkylene glycol include linear or branched alkylene diols having 3 to 16 carbon atoms, preferably 6 to 9 carbon atoms.
  • Examples of those having a repeating structure of two or more alkylene glycols include diethylene glycol, dipropylene glycol, dibutylene glycol, triethylene glycol, tripropylene glycol, and tributylene glycol.
  • examples of the compound having two (C2) (meth) acryloyl groups having a viscosity at 50 ° C. of less than 50 mPa ⁇ s include diethylene glycol di (meth) acrylate, dipropylene glycol di (meth) acrylate, and dibutylene glycol.
  • Di (meth) acrylate triethylene glycol di (meth) acrylate, tripropylene glycol di (meth) acrylate, tributylene glycol di (meth) acrylate, 1,3-butylene glycol di (meth) acrylate, 1,4-butane
  • Examples thereof include diol di (meth) acrylate, 1,6-hexanediol di (meth) acrylate, 1,9-nonane diol acrylate, 1,10-decane diol diacrylate, and 1,16-hexadecane diol diacrylate.
  • the blending amount thereof is the curable composition 100 of the present invention.
  • the mass part for example, it is 2 parts by mass or more and 50 parts by mass or less, preferably 6 parts by mass or more and 40 parts by mass or less, and more preferably 10 parts by mass or more and 30 parts by mass or less.
  • the blending amount of the compound having two (C2) (meth) acryloyl groups having a viscosity of less than 50 mPa ⁇ s at 50 ° C. is 2 parts by mass or more and 50 parts by mass or less with respect to 100 parts by mass of the curable composition of the present invention. By doing so, the viscosity of the curable composition can be maintained at a low viscosity, and the compound having two (C2) (meth) acryloyl groups having a viscosity of less than 50 mPa ⁇ s at 50 ° C. after photocuring, that is, exposure can be used. It will be incorporated into the cured product.
  • a compound having no aromatic ring and having three or more (meth) acryloyl groups (C) A compound having a (meth) acryloyl group is, for example, a compound having no (C3) aromatic ring and having (meth) acryloyl. Contains compounds having 3 or more groups.
  • the curable composition of the present invention contains a compound having (C3) no aromatic ring and having three or more (meth) acryloyl groups, the curable composition of the present invention is exposed while suppressing an increase in viscosity. The curability of time is further improved.
  • Examples of the compound having no aromatic ring and having three or more (meth) acryloyl groups include trimethylolpropane triacrylate, trimethylolmethane triacrylate, ethylene oxide-modified trimethylolpropane triacrylate, and propylene oxide-modified trimethylol.
  • the compound having three or more (meth) acryloyl groups may be a multi-branched oligomer or polymer. It was
  • the blending amount thereof is 100 parts by mass of the curable composition of the present invention. It is preferably 1 part by mass or more and 40 parts by mass or less, and more preferably 5 parts by mass or more and 20 parts by mass or less.
  • a compound having an aromatic ring and having two or more (meth) acryloyl groups (C) A compound having a (meth) acryloyl group is, for example, having a (C4) aromatic ring and having a (meth) acryloyl group. Contains compounds having two or more.
  • the curable composition of the present invention contains a compound having a (C4) aromatic ring and two or more (meth) acryloyl groups
  • the curability at the time of exposure is further improved, and the compound forms an aromatic ring.
  • the compound having (C4) an aromatic ring and having two or more (meth) acryloyl groups has a relatively high viscosity because it contains an aromatic ring (that is, the viscosity at 50 ° C. is 50 mPa ⁇ s or more). Will be).
  • the number of (meth) acryloyl groups in one molecule of this compound is two.
  • Examples of the compound having a (C4) aromatic ring and two or more (meth) acryloyl groups include (meth) acrylate of a polyhydric phenol and an alkylene oxide adduct thereof.
  • polyvalent phenol examples include bisphenol A, bisphenol AP, bisphenol B, bisphenol BP, bisphenol E, bisphenol F, bisphenol M, bisphenol P, bisphenol PH, bisphenol Z and other bisphenols, and biphenol.
  • alkylene oxide examples include ethylene oxide, propylene oxide, and butylene oxide.
  • the number of alkylene oxides added is preferably 6 or less.
  • (C4) Commercially available products of compounds having an aromatic ring and having two or more (meth) acryloyl groups include ABE-300 (manufactured by Shin Nakamura Chemical Industry Co., Ltd.), BPE-80N (manufactured by Shin Nakamura Chemical Industry Co., Ltd.), and the like.
  • BPE-100 (manufactured by Shin Nakamura Chemical Industry Co., Ltd.), A-BPE-4 (manufactured by Shin Nakamura Chemical Industry Co., Ltd.), BPE-4 (manufactured by Daiichi Kogyo Seiyaku Co., Ltd.), BPE-10 (manufactured by Daiichi Kogyo Seiyaku Co., Ltd.) ), A-BPE-10 (manufactured by Daiichi Kogyo Seiyaku Co., Ltd.), BPE-200 (manufactured by Shin Nakamura Chemical Industry Co., Ltd.), EBECRYL 150 (manufactured by Daicel Ornex Co., Ltd.) and the like.
  • the blending amount thereof is 100 parts by mass of the curable composition of the present invention. On the other hand, it is preferably 1 part by mass or more and 40 parts by mass or less, and more preferably 5 parts by mass or more and 20 parts by mass or less.
  • the curable composition of the present invention preferably contains a compound having two (C2) (meth) acryloyl groups as a compound having (meth) acryloyl groups other than (C), (A) and (B).
  • a compound having two (C2) (meth) acryloyl groups having a viscosity at 50 ° C. of less than 50 mPa ⁇ s.
  • any compound that generates radicals by light, a laser, an electron beam, or the like and initiates a radical polymerization reaction can be used.
  • the (D) photopolymerization initiator include benzoin and benzoin alkyl ethers such as benzoin, benzoin methyl ether, benzoin ethyl ether, and benzoin isopropyl ether; acetophenone, 2,2-dimethoxy-2-phenylacetophenone, 2, Acetophenones such as 2-diethoxy-2-phenylacetophenone and 1,1-dichloroacetophenone; 2-methyl-1- [4- (methylthio) phenyl] -2-morpholinopropane-1-one, 2-benzyl-2- Aminoacetophenones such as dimethylamino-1- (4-morpholinophenyl) -butane-1-one, N, N-dimethyl
  • the above (D) photopolymerization initiator can be used alone or in combination of two or more.
  • light such as tertiary amines such as N, N-dimethylaminobenzoic acid ethyl ester, N, N-dimethylaminobenzoic acid isoamyl ester, pentyl-4-dimethylaminobenzoate, triethylamine, and triethanolamine.
  • Initiating aids can be used.
  • a titanosen compound of Omnirad 784 or the like (manufactured by IGM Resins B.V.), which has an absorption wavelength in the visible light region, can also be added as the (D) photopolymerization initiator in order to promote the photocuring reaction.
  • the components to be added as the photopolymerization initiator are not limited to these, but those that absorb light in the ultraviolet light or visible light region to initiate radical polymerization of ethylenically unsaturated groups such as (meth) acryloyl groups.
  • the blending amount of the photopolymerization initiator (D) is preferably 0.2 parts by mass or more and 15 parts by mass or less, and more preferably 1 part by mass or more and 8 parts by mass with respect to 100 parts by mass of the curable composition of the present invention. It is less than a part.
  • the curable composition of the present invention contains (E) a thermosetting component.
  • a thermosetting component in addition to coating of a curable composition, low warpage of the substrate after exposure and flame retardancy of the cured film, functionality such as heat resistance and plating resistance of the cured film can be obtained. It can be further improved.
  • thermosetting component for example, a known compound such as a blocked isocyanate compound, an epoxy compound, or an oxetane compound can be used.
  • the (E) thermosetting component contains a latent thermosetting component in which the functional group in the structure is protected by a protecting group.
  • a latent thermosetting component By including such a latent thermosetting component, it is possible to suppress an unintended reaction in the curable composition due to unforeseen conditions and enhance the storage stability of the curable composition.
  • the curable composition is also excellent in inkjet printability at 50 ° C., and when a reaction is desired, it can be easily deprotected by heating or the like to activate the thermosetting component.
  • the potential means a property that does not show activity at room temperature or a little heating condition, but is activated by heating at a high temperature of 80 ° C. or higher and shows thermosetting property.
  • the latent thermosetting component is a blocked isocyanate compound.
  • the blocked isocyanate compound is preferably a compound having a plurality of blocked isocyanate groups in one molecule.
  • the blocked isocyanate group is a group in which the isocyanate group is protected by the reaction with the blocking agent and is temporarily inactivated, and when heated to a predetermined temperature, the blocking agent is dissociated to generate an isocyanate group. do.
  • polyisocyanate compound having a plurality of isocyanate groups for example, aromatic polyisocyanate, aliphatic polyisocyanate or alicyclic polyisocyanate is used.
  • aromatic polyisocyanate examples include 4,4'-diphenylmethane diisocyanate, 2,4-tolylene diisocyanate, 2,6-tolylene diisocyanate, naphthalene-1,5-diisocyanate, o-xylylene diisocyanate, and the like.
  • aromatic polyisocyanate examples include 4,4'-diphenylmethane diisocyanate, 2,4-tolylene diisocyanate, 2,6-tolylene diisocyanate, naphthalene-1,5-diisocyanate, o-xylylene diisocyanate, and the like.
  • examples thereof include m-xylylene diisocyanate and 2,4-tolylene dimer.
  • aliphatic polyisocyanate examples include tetramethylene diisocyanate, hexamethylene diisocyanate, methylene diisocyanate, trimethylhexamethylene diisocyanate, 4,4-methylene bis (cyclohexyl isocyanate) and isophorone diisocyanate.
  • alicyclic polyisocyanate examples include bicycloheptane triisocyanate.
  • the adduct form, the burette form, the isocyanurate form and the like of the isocyanate compounds mentioned above can be mentioned.
  • isocyanate blocking agent examples include phenolic blocking agents such as phenol, cresol, xylenol, chlorophenol and ethylphenol; lactam blocking agents such as ⁇ -caprolactam, ⁇ -palerolactam, ⁇ -butyrolactam and ⁇ -propiolactam; Active oxime-based blocking agents such as ethyl acetoacetate and acetylacetone; methanol, ethanol, propanol, butanol, amyl alcohol, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monobutyl ether, diethylene glycol monomethyl ether, propylene glycol monomethyl ether, benzyl.
  • phenolic blocking agents such as phenol, cresol, xylenol, chlorophenol and ethylphenol
  • lactam blocking agents such as ⁇ -caprolactam, ⁇ -palerolactam, ⁇ -butyrolact
  • Alcohol-based blocking agents such as ether, methyl glycolate, butyl glycolate, diacetone alcohol, methyl lactate and ethyl lactate; oxime-based blocking agents such as formaldehyde xim, acetoaldoxime, acetoxime, methylethylketoxim, diacetylmonooxime and cyclohexaneoxime.
  • Mercaptan-based blocking agents such as butyl mercaptan, hexyl mercaptan, t-butyl mercaptan, thiophenol, methylthiophenol, ethylthiophenol; acid amide-based blocking agents such as acetate amide and benzamide; imides such as succinic acid imide and maleate imide.
  • Oxime-based blocking agents Amin-based blocking agents such as xylidine, aniline, butylamine, dibutylamine; Imidazole-based blocking agents such as imidazole and 2-ethylimidazole; Imine-based blocking agents such as methyleneimine and propyleneimine; Pyrazole-based such as dimethylpyrazole Examples include blocking agents.
  • the blocked isocyanate compound may be commercially available, for example, Duranate TPA-B80E, 17B-60PX, E402-B80T (all manufactured by Asahi Kasei Corporation), TrixeneBI7982: blocked isocyanate (hexamethylene isocyanate (HDM) trimer, Blocking agents: dimethylpyrazole (DMP), Baxenden Chemicals) and the like.
  • Duranate TPA-B80E, 17B-60PX, E402-B80T all manufactured by Asahi Kasei Corporation
  • TrixeneBI7982 blocked isocyanate (hexamethylene isocyanate (HDM) trimer
  • Blocking agents dimethylpyrazole (DMP), Baxenden Chemicals) and the like.
  • the latent thermosetting component may be a reaction product obtained by reacting an amine compound such as imidazole or dicyandiamide with a hydroxyl group-containing compound, a cyclic ether group-containing compound, a carboxyl group-containing compound, or the like.
  • the blending amount of the (E) thermosetting component is preferably 1 part by mass or more and 30 parts by mass or less, and more preferably 3 parts by mass or more and 15 parts by mass or less per 100 parts by mass of the curable composition of the present invention.
  • the blending amount of the thermosetting component is 1 part by mass or more and 30 parts by mass or less per 100 parts by mass of the curable composition of the present invention.
  • the curable composition of the present invention may contain a known and commonly used (F) flame retardant for the purpose of improving the flame retardancy of the obtained cured product. Further, by containing a flame retardant, the low warpage after exposure can be further improved.
  • flame retardant include phosphoric flame retardants such as phosphoric acid esters and condensed phosphoric acid esters, phosphorus-containing compounds having phenolic hydroxyl groups, phosphazenic compounds, and phosphinic acid metal salts, antimony trioxide, and antimony pentoxide.
  • Examples thereof include antimony compounds such as, pentabromodiphenyl ether, halogen compounds such as octabromodiphenyl ether, metal hydroxides such as aluminum hydroxide and magnesium hydroxide, and layered compound hydroxides such as hydrotalcite. Phosphorus-based flame retardants are preferable because of their environmental impact and flame retardant effect.
  • the flame retardancy can be improved without impairing the flexibility of the cured film.
  • phosphinic acid constituting the phosphinic acid metal salt examples include phosphinic acid, dimethylphosphinic acid, ethylmethylphosphinic acid, diethylphosphinic acid, methyl-n-propylphosphinic acid, methanedi (methylphosphinic acid), benzene-1, Examples thereof include 4- (dimethylphosphinic acid), methylphenylphosphinic acid, phenylphosphinic acid, diphenylphosphinic acid and mixtures thereof.
  • Exolit OP 1240, 1240, 1312, 1400, 930, 945TP, and OP-935 examples of commercially available products.
  • a phosphazene compound as a phosphorus-based flame retardant.
  • the phosphazene compound is preferably a phenoxyphosphazene having a phosphazene structure and a phenoxy group substituted with any one of a cyano group (-CN), a hydroxyl group (-OH) and a methyl group.
  • a cyano group -CN
  • a hydroxyl group a methyl group
  • it has a hexaphenoxycyclotriphosphazene structure as a basic skeleton, and at least two of the six phenoxy groups in the structure are substituted with a cyano group (-CN) or a hydroxyl group (-OH).
  • only one of the two phenoxy groups attached to the phosphorus atom in the hexaphenoxycyclotriphosphazene structure is substituted with one cyanide group (-CN) and thus substituted. It is a structure having two phenoxy groups as a whole hexaphenoxycyclotriphosphazene structure.
  • the two phenoxy groups attached to the phosphorus atom in the hexaphenoxycyclotriphosphazene structure are both substituted with one cyano group (-CN), and the phenoxy group thus substituted.
  • -CN cyano group
  • only one of the two phenoxy groups attached to the phosphorus atom in the hexaphenoxycyclotriphosphazene structure is substituted with one hydroxyl group (-OH) and thus thus. It is a structure having three substituted phenoxy groups as a whole hexaphenoxycyclotriphosphazene structure.
  • the cyclic phosphazene compound has the following structure: or or It has one of the structures.
  • Examples of the preferable commercially available phosphazene compound include FP-300B, FP-300, and SPH-100 (all manufactured by Fushimi Pharmaceutical Co., Ltd.).
  • flame retardant One type of flame retardant may be used alone, or two or more types may be used in combination.
  • the amount of the flame retardant (F) blended in the curable composition of the present invention is, for example, 5% by mass or more and 60% by mass or less, preferably 10% by mass or more and 50% by mass or less.
  • the flame retardant is a phosphorus-based flame retardant
  • the blending amount of the phosphorus-based flame retardant is 0.1% by mass or more and 10% by mass or less as the phosphorus content in the curable composition of the present invention. It is possible to effectively impart flame retardancy while maintaining heat resistance and low warpage.
  • Thermosetting catalyst selected from the group consisting of melamine and its derivatives The curable composition of the present invention preferably contains a thermosetting catalyst selected from the group consisting of melamine and its derivatives. Melamine and its derivatives act as a curing accelerator for thermosetting reactions, and are used to further improve properties such as heat resistance in addition to adhesion of the cured product to the conductor circuit.
  • thermosetting catalyst selected from the group consisting of melamine and its derivatives include guanamines such as acetoguanamine and benzoguanamine; melamine; ethyldiamino-S-triazine, 2,4-diamino-S-triazine, 2,4. Examples thereof include triazine derivatives such as -diamino-6-xylyl-S-triazine, and melamine is preferable.
  • thermosetting catalyst selected from the group consisting of melamine and its derivatives can be used alone or in combination of two or more.
  • the blending amount thereof is (E) when the total amount of the thermosetting components is 100% by mass. It is preferably 0.1% by mass or more and 20% by mass or less, more preferably 0.5% by mass or more and 20% by mass or less, and particularly preferably 1% by mass or more and 15% by mass or less.
  • thermosetting catalyst selected from the group consisting of melamine and its derivatives By setting the blending amount of the thermosetting catalyst selected from the group consisting of melamine and its derivatives to 0.1% by mass or more and 20% by mass or less when the total amount of (E) thermosetting components is 100% by mass. , Good thermosetting can be realized while improving the storage stability of the curable composition.
  • Additives such as antioxidants, antifoaming / leveling agents, thixotropy-imparting agents / thickeners, coupling agents, dispersants, polymerization retarders, and colorants are added to the curable composition of the present invention, if necessary. Can be contained.
  • a solvent may be used for adjusting the viscosity, but it is preferable that the amount added is small in order to prevent the film thickness from being lowered after curing. Further, it is more preferable that the solvent for adjusting the viscosity is not contained.
  • the curable composition of the present invention is preferably applied to printing by an inkjet method.
  • the viscosity is such that it can be ejected by an inkjet printer.
  • the viscosity of the curable composition of the present invention is preferably 50 mPa ⁇ s or less at 50 ° C, more preferably 20 mPa ⁇ s or less at 50 ° C, and 15 mPa ⁇ s or less at 50 ° C. Is particularly preferable.
  • the curable composition of the present invention can directly print a pattern on a substrate for a printed wiring board or the like by an inkjet printing method.
  • the curable composition of the present invention does not undergo a polymerization reaction at room temperature, it can be stably stored as a one-component curable composition.
  • the curable composition of the present invention can be supplied as ink to an inkjet printer due to its low viscosity, and can be used for printing on a substrate. Further, since the warpage of the thin film substrate can be suppressed to a low level after printing on a thin film substrate such as a polyimide substrate and exposing it, it is suitable as a composition for solder resist for a flexible wiring board.
  • the composition layer immediately after printing is photo-cured by irradiating the composition layer with an active energy ray of 50 mJ / cm 2 to 1000 mJ / cm 2 . Obtained at.
  • the activation energy ray irradiation is performed by irradiation with active energy rays such as ultraviolet rays, electron beams, and chemical rays, preferably by ultraviolet irradiation.
  • Ultraviolet irradiation in an inkjet printer can be performed by, for example, attaching a light source such as a high-pressure mercury lamp, a metal halide lamp, or an ultraviolet LED to the side surface of the print head, and scanning by moving the print head or the substrate. In this case, printing and ultraviolet irradiation can be performed almost at the same time.
  • a light source such as a high-pressure mercury lamp, a metal halide lamp, or an ultraviolet LED
  • the cured product after photocuring is thermally cured by using a known heating means, for example, a heating furnace such as a hot air furnace, an electric furnace, or an infrared induction heating furnace.
  • a heating furnace such as a hot air furnace, an electric furnace, or an infrared induction heating furnace.
  • the heating conditions it is preferable to heat at 130 ° C to 170 ° C for 5 to 90 minutes.
  • the cured product obtained by the curable composition of the present invention is also excellent in flexibility, and is therefore particularly suitable as a solder resist for flexible wiring boards.
  • Examples of the substrate of the flexible wiring board include a film made of glass polyimide, polyimide, polyethylene terephthalate, liquid crystal polymer, polycarbonate, and the like.
  • soldering may be performed by hand soldering, flow soldering, reflow soldering, or the like. For example, in the case of reflow soldering, preheating at 100 ° C. to 140 ° C. for 1 to 4 hours is required. After that, it is subjected to a reflow process of heating and melting the solder by repeating heating at 240 to 280 ° C. for about 5 to 20 seconds multiple times (for example, 2 to 4 times). The parts are completed.
  • the electronic component means a component used in an electronic circuit, and includes active components such as printed wiring boards, transistors, light emitting diodes, and laser diodes, as well as passive components such as resistors, capacitors, inductors, and connectors.
  • active components such as printed wiring boards, transistors, light emitting diodes, and laser diodes
  • passive components such as resistors, capacitors, inductors, and connectors.
  • the curable composition of the present invention has a low viscosity, excellent coatability, and little warpage after photocuring. Further, it is flexible even after curing, and is excellent in adhesion to a substrate, flame retardancy, solder heat resistance, plating resistance, and solvent resistance, so that it can be applied to various applications, and there is no particular limitation on the application target. For example, it can be used for manufacturing etching resists, solder resists, marking inks, etc. of printed wiring boards by inkjet printing, and among them, solder on flexible wiring boards by inkjet printing, which requires low warpage and flame retardancy after exposure. It can be suitably used as a composition for forming a resist.
  • It can also be used as a material for UV molded products, a material for stereolithography, and a material for 3D inkjet.
  • Viscosity With respect to the curable compositions of Examples 1 to 18 and Comparative Examples 1 to 4, the viscosities at an ink temperature of 50 ° C. and 100 rpm were measured with a cone plate type viscometer (TVH-33H manufactured by Toki Sangyo Co., Ltd.). , Evaluated according to the following criteria.
  • each sample was allowed to stand on a horizontal workbench for 30 minutes with the coating surface as the upper surface, and the heights of the four edges of the sample raised from the workbench were measured with a ruler, and the average value of the heights of the four edges was measured. Asked. The same test was performed three times for each sample, and the average value of the three tests was calculated and evaluated according to the following criteria.
  • the average value of the total height of the four ends is 5 mm or less ⁇ : The average value of the total height of the four ends exceeds 5 mm and less than 10 mm ⁇ : The average value of the total height of the four ends is 10 mm or more
  • the test piece 1 is mounted on the apparatus, the test piece 1 is vertically attached to the clamp 2 with the load F (0.5 kgf) applied, and the bending angle ⁇ is set. Bending was performed at 135 degrees and a speed of 175 cpm, and the number of reciprocating bends (times) until breaking was measured.
  • the evaluation criteria are as follows.
  • 200 times or more ⁇ : 150 to 199 times ⁇ : 101 to 149 times ⁇ : 100 times or less
  • No peeling was observed in the cured film even after soaking for 5 seconds x 2 times and performing a peel test with cellophane tape (registered trademark).
  • No peeling was observed in the cured film even after dipping for 5 seconds x 1 time and performing a peel test with cellophane tape (registered trademark), but when immersed for 5 seconds x 2 times, the cured film swelled and peeled.
  • X After dipping for 5 seconds ⁇ 1 time, the cured film swells and peels off.
  • Electrolytic gold plating resistance A circuit in which the curable compositions of Examples 1 to 18 and Comparative Examples 1 to 4 are treated with sulfuric acid using an inkjet printing device CPS6151 (manufactured by Microcraft) to have a copper thickness of 12 ⁇ m and a polyimide of 50 ⁇ m. It was applied on a pattern substrate. Then, according to the above "(2) Conditions for forming a cured film", a cured film having a thickness of 20 ⁇ m was formed. The obtained evaluation substrate was gold-plated using a commercially available electroless nickel plating bath and an electroless gold plating bath under the conditions of nickel 5 ⁇ m and gold 0.03 ⁇ m, and the surface condition of the cured film was observed.
  • the evaluation criteria are as follows.
  • VTM-0 passed and the burning time of each sample was less than 7 seconds
  • VTM-0 passed and each sample burned within 10 seconds Not: VTM-0 failed
  • Examples 1 to 3 and 15 and Examples 16 to 18 in addition to being able to impart flame retardancy to the cured coating film by further containing (F) a flame retardant, after exposure.
  • the low warpage is further improved.
  • the heat resistance of the coating film after curing was further improved because the flame retardant (F) was a phosphorus-based flame retardant.
  • Examples 16 to 18 have failed the flame retardancy test (Not evaluation), this is due to the fact that they do not contain a flame retardant, and the effect of the present invention is not denied. ..
  • Example 2 when the ratio of (A) / (B) is larger than 175% by mass, the viscosity of the curable composition, the warpage after exposure, and the flexibility of the cured film are determined. It was found that the characteristics were further improved.
  • Example 2 when the ratio of (A) / (F) is larger than 49% by mass, the viscosity of the curable composition, the warpage after exposure, and the solder heat resistance of the cured film are obtained. It was found that the sexual characteristics were further improved.
  • Example 2 when a compound having a (C4) aromatic ring and two or more (meth) acryloyl groups is contained, the flame retardancy and solder heat resistance of the cured film are further contained. From the comparison between Example 2 and Example 12, the cured film further contains (C3) a photocurable compound having no aromatic ring and having three or more (meth) acryloyl groups. It was found that the solder heat resistance characteristics of the solder were improved.

Abstract

[Problem] To provide a curable composition having suitable flexibility, suitably low warpage after light exposure, as well as suitable heat resistance for a thin film substrate such as a flexible wiring board. [Solution] A curable composition containing: (A) a radical polymerizable monomer represented by formula 1 (R1 in formula (1) represents a C1-4 hydrocarbon group which may be linear, branched, or cyclic and may include an ether bond (the hydrocarbon group may have a substituent)); (B) a photocurable urethane compound having two (meth)acryloyl groups; (C) a compound other than (A) and (B) having a (meth)acryloyl group; (D) a photopolymerization initiator; and (E) a thermosetting component. The curable composition has low viscosity, and after being coated on a thin film substrate and exposed to light, is capable of keeping warpage of the thin film substrate low. Furthermore, the cured coated film has excellent heat resistance and has both flexibility and low warpage.

Description

硬化性組成物、硬化物および電子部品Curable compositions, cured products and electronic components
 本発明は、硬化性組成物、硬化物および電子部品に関し、特に、インクジェット印刷に適した硬化性組成物、その硬化物およびその硬化物を有する電子部品に関する。 The present invention relates to a curable composition, a cured product and an electronic component, and more particularly to a curable composition suitable for inkjet printing, the cured product thereof and an electronic component having the cured product thereof.
 フレキシブル配線板(FPC)は電子機器に搭載されるため柔軟性や耐熱性の要求があり、したがって、このFPC用途のソルダーレジストにも柔軟性や耐熱性が要求されている。 Since a flexible wiring board (FPC) is mounted on an electronic device, there is a demand for flexibility and heat resistance, and therefore, a solder resist for this FPC application is also required to have flexibility and heat resistance.
 一方で、現像型ソルダーレジスト組成物と異なり、電子部品の製造工程の短縮の観点からインクジェット印刷により回路基板上に塗布可能な光硬化性組成物も求められている。このような光硬化性組成物を、回路を有するポリイミド基板などに塗布し、露光した後では、基板が反りやすい。このように基板が反ってしまうと、2層目塗布(重ね塗り)する際に、適切な位置に光硬化性組成物を塗布できない虞がある。また、基板が反るとインクジェットヘッドと接触する虞がある。その後、塗膜を熱硬化させるとさらに基板が反ってしまう。そのため、インクジェット印刷用の光硬化性組成物には露光後の反りを抑制する必要がある。 On the other hand, unlike a developing solder resist composition, a photocurable composition that can be applied onto a circuit board by inkjet printing is also required from the viewpoint of shortening the manufacturing process of electronic components. After applying such a photocurable composition to a polyimide substrate having a circuit and exposing it to light, the substrate tends to warp. If the substrate is warped in this way, there is a possibility that the photocurable composition cannot be applied to an appropriate position when the second layer is applied (overcoating). Further, if the substrate is warped, it may come into contact with the inkjet head. After that, when the coating film is thermally cured, the substrate is further warped. Therefore, it is necessary to suppress the warp of the photocurable composition for inkjet printing after exposure.
 このようなインクジェット印刷用の組成物として、例えば特許文献1には、耐折り曲げ性や塗膜強度に優れた、インクジェット印刷に用いられる絶縁膜形成用透明樹脂組成物が開示されている。 As such a composition for inkjet printing, for example, Patent Document 1 discloses a transparent resin composition for forming an insulating film used for inkjet printing, which has excellent bending resistance and coating film strength.
特開2013-189532号公報Japanese Unexamined Patent Publication No. 2013-189532
 しかしながら、特許文献1の樹脂組成物の硬化物は、耐折り曲げ性は優れていると開示されているものの、このインクジェット用インクを、特に薄いポリイミド(カプトン100H)などの薄膜基板上に塗布し、露光した後の反りが改善しているか否か、十分な耐熱性を有しているか否かについては検討がされておらず、これらの特性を両立するための方策は何ら提示されていない。 However, although the cured product of the resin composition of Patent Document 1 is disclosed to have excellent bending resistance, this inkjet ink is applied onto a thin film substrate such as a particularly thin polyimide (Kapton 100H). It has not been examined whether or not the warp after exposure is improved and whether or not it has sufficient heat resistance, and no measures for achieving both of these characteristics have been presented.
 本発明は、上記課題に鑑みてなされたものであり、フレキシブル配線板等の薄膜基板に好適な柔軟性と露光後の低反り性と耐熱性とを兼ね備えた硬化性組成物を提供することを目的とする。 The present invention has been made in view of the above problems, and provides a curable composition having flexibility suitable for a thin film substrate such as a flexible wiring board, low warpage after exposure, and heat resistance. The purpose.
 本発明者らは、上記目的達成に向け鋭意検討を行った。その結果、光硬化性化合物、光重合開始剤、熱硬化成分を含有する組成物において、光硬化性化合物として下記一般式(1)で表される化合物および(メタ)アクリロイル基を2個有する光硬化性ウレタン化合物を含有することで、露光後の塗布基板の低反り性と柔軟性と耐熱性とを兼ね備えた硬化性組成物が得られることを見出し、本発明を完成するに至った。 The present inventors have made diligent studies to achieve the above object. As a result, in the composition containing the photocurable compound, the photopolymerization initiator, and the thermosetting component, the light having two (meth) acryloyl groups and the compound represented by the following general formula (1) as the photocurable compound. It has been found that by containing a curable urethane compound, a curable composition having low warpage, flexibility and heat resistance of the coated substrate after exposure can be obtained, and the present invention has been completed.
 すなわち、本発明の前記目的は、
 (A)式(1)
Figure JPOXMLDOC01-appb-C000002
(式(1)中、Rは、直鎖状、分岐鎖状および環状のいずれでもよく、エーテル結合を含んでいてもよい炭素数1個以上4個以下の炭化水素基を示す(但し、前記炭化水素基中に置換基を有していてもよい))
で表されるラジカル重合性モノマーと、
 (B)(メタ)アクリロイル基を2個有する光硬化性ウレタン化合物と、
 (C)(A)、(B)以外の(メタ)アクリロイル基を有する化合物と、
 (D)光重合開始剤と、
 (E)熱硬化成分と、
 を含有することを特徴とする硬化性組成物により達成されることが見いだされた。
That is, the object of the present invention is
(A) Equation (1)
Figure JPOXMLDOC01-appb-C000002
(In the formula (1), R 1 may be linear, branched or cyclic, and represents a hydrocarbon group having 1 or more and 4 or less carbon atoms which may contain an ether bond (provided that the hydrocarbon group has 1 or more and 4 or less carbon atoms). The hydrocarbon group may have a substituent)))
The radically polymerizable monomer represented by
(B) A photocurable urethane compound having two (meth) acryloyl groups and
(C) Compounds having (meth) acryloyl groups other than (A) and (B), and
(D) Photopolymerization initiator and
(E) Thermosetting component and
It was found to be achieved by a curable composition characterized by containing.
 また、さらに(F)難燃剤を含むことが好ましく、(F)難燃剤に対する(B)(メタ)アクリロイル基を2個有する光硬化性ウレタン化合物の配合量が1質量%以上70質量%以下であることが好ましい Further, it is preferable to further contain (F) a flame retardant, and the compounding amount of the photocurable urethane compound having two (B) (meth) acryloyl groups with respect to (F) the flame retardant is 1% by mass or more and 70% by mass or less. It is preferable to have
 また、(B)(メタ)アクリロイル基を2個有する光硬化性ウレタン化合物に対する(A)式(1)で表されるラジカル重合性モノマーの配合割合が250質量%以上10,000質量%以下であることが好ましい。 Further, when the mixing ratio of the radically polymerizable monomer represented by the formula (1) to the photocurable urethane compound having two (B) (meth) acryloyl groups is 250% by mass or more and 10,000% by mass or less. It is preferable to have.
 さらに、(F)難燃剤に対する(A)式(1)で表されるラジカル重合性モノマーの配合割合が50質量%以上350質量%以下であることが好ましい。 Further, it is preferable that the mixing ratio of the radically polymerizable monomer represented by the formula (A) to the flame retardant (F) is 50% by mass or more and 350% by mass or less.
 そのうえ、(E)熱硬化成分が潜在性熱硬化成分を含むことが好ましく、前記潜在性熱硬化成分がブロックイソシアネート化合物であることがさらに好ましい。 Moreover, it is preferable that the (E) thermosetting component contains a latent thermosetting component, and it is further preferable that the latent thermosetting component is a blocked isocyanate compound.
 また、(F)難燃剤がリン系難燃剤であることが好ましく、前記リン系難燃剤がフェノキシホスファゼンであることがさらに好ましい。 Further, it is preferable that the (F) flame retardant is a phosphorus-based flame retardant, and it is further preferable that the phosphorus-based flame retardant is phenoxyphosphazene.
 さらに、前記硬化性組成物が50℃において50mPa・s以下の粘度を有することが好ましい。 Further, it is preferable that the curable composition has a viscosity of 50 mPa · s or less at 50 ° C.
 さらに、本発明の前記目的は、本発明の硬化性組成物より得られる硬化物、およびこの硬化物を有する電子部品によっても達成することができる。 Further, the above object of the present invention can also be achieved by a cured product obtained from the curable composition of the present invention and an electronic component having the cured product.
 本発明の硬化性組成物は、低粘度であって、薄膜基板に塗布して露光した後のその薄膜基板の反りを低く抑えることができる。さらに、硬化後の塗膜は耐熱性に優れたものとなり、低反り性及び柔軟性を兼ね備えたものとなる。 The curable composition of the present invention has a low viscosity and can suppress the warp of the thin film substrate after being applied to and exposed to the thin film substrate to a low level. Further, the cured coating film has excellent heat resistance, and has both low warpage and flexibility.
硬化性組成物より得られる硬化膜に対して行ったMIT試験の説明図である。It is explanatory drawing of the MIT test performed on the cured film obtained from the curable composition.
<硬化性組成物>
 本発明の硬化性組成物は、
 (A)式(1)
Figure JPOXMLDOC01-appb-C000003
(式(1)中、Rは、直鎖状、分岐鎖状および環状のいずれでもよく、エーテル結合を含んでいてもよい炭素数1個以上4個以下の炭化水素基を示す(但し、前記炭化水素基中に置換基を有していてもよい))
で表されるラジカル重合性モノマー(以下、(A)式(1)のラジカル重合性モノマーともいう)と、
 (B)(メタ)アクリロイル基を2個有する光硬化性ウレタン化合物と、
 (C)(A)、(B)以外の(メタ)アクリロイル基を有する化合物と、
 (D)光重合開始剤と、
 (E)熱硬化成分と、
を含有する硬化性組成物である。
<Curable composition>
The curable composition of the present invention is
(A) Equation (1)
Figure JPOXMLDOC01-appb-C000003
(In the formula (1), R 1 may be linear, branched or cyclic, and represents a hydrocarbon group having 1 or more and 4 or less carbon atoms which may contain an ether bond (provided that the hydrocarbon group has 1 or more and 4 or less carbon atoms). The hydrocarbon group may have a substituent)))
The radically polymerizable monomer represented by (hereinafter, also referred to as the radically polymerizable monomer of the formula (A) (1)) and
(B) A photocurable urethane compound having two (meth) acryloyl groups and
(C) Compounds having (meth) acryloyl groups other than (A) and (B), and
(D) Photopolymerization initiator and
(E) Thermosetting component and
It is a curable composition containing.
[(A)式(1)のラジカル重合性モノマー]
 本発明の硬化性組成物に含まれる(A)式(1)のラジカル重合性モノマーは、例えば、以下の式a):
Figure JPOXMLDOC01-appb-C000004
(式a)中、Rは式(1)中のRと同じであり、X・は開始ラジカルまたは生長ラジカルを示す)で表されるように、環化しながら重合反応が進行するので、両隣にメチレン基を配した5員環エーテル構造を繰り返し単位とする主鎖骨格を形成することが可能である。
[Radical polymerizable monomer of formula (1) (A)]
The radically polymerizable monomer of the formula (A) (1) contained in the curable composition of the present invention is, for example, the following formula a):.
Figure JPOXMLDOC01-appb-C000004
In (formula a), R 1 is the same as R 1 in formula (1), and X · indicates an initiator radical or a growth radical), so that the polymerization reaction proceeds while cyclizing. It is possible to form a main clavicle with a 5-membered ring ether structure having methylene radicals arranged on both sides as a repeating unit.
 前記炭素数1個以上4個以下の炭化水素基としては、例えば、メチル基、エチル基、n-プロピル基、イソプロピル基、n-ブチル基、sec-ブチル基、tert-ブチル基、ビニル基、アリル基、メタリル基、クロチル基、シクロプロピル基、シクロブチル基、メトキシメチル基、メトキシエチル基、エトキシメチル基、エトキシエチル基、ビニルオキシエチル基などが挙げられる。 Examples of the hydrocarbon group having 1 or more and 4 or less carbon atoms include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, a sec-butyl group, a tert-butyl group and a vinyl group. Examples thereof include an allyl group, a metalyl group, a crotyl group, a cyclopropyl group, a cyclobutyl group, a methoxymethyl group, a methoxyethyl group, an ethoxymethyl group, an ethoxyethyl group and a vinyloxyethyl group.
 前記置換基としては、例えば、ビニル基、アリル基、メタリル基、クロチル基、などの鎖状不飽和炭化水素基;メトキシ基、エトキシ基、メトキシエトキシ基などのアルコキシ基;メチルチオ基、エチルチオ基などのアルキルチオ基;アセチル基、プロピオニル基などのアシル基;アセチルオキシ基、プロピオニルオキシ基などのアシルオキシ基;メトキシカルボニル基、エトキシカルボニル基などのアルコキシカルボニル基;メチルチオカルボニル基、エチルチオカルボニル基などのアルキルチオカルボニル基;フッ素原子、塩素原子、臭素原子、ヨウ素原子などのハロゲン原子;ウレイド基;アミド基;シアノ基;水酸基;トリメチルシリル基などが挙げられる。 Examples of the substituent include a chain unsaturated hydrocarbon group such as a vinyl group, an allyl group, a metallicyl group and a crotyl group; an alkoxy group such as a methoxy group, an ethoxy group and a methoxyethoxy group; a methylthio group and an ethylthio group. Alkylthio group; acyl group such as acetyl group and propionyl group; acyloxy group such as acetyloxy group and propionyloxy group; alkoxycarbonyl group such as methoxycarbonyl group and ethoxycarbonyl group; alkylthio such as methylthiocarbonyl group and ethylthiocarbonyl group Examples thereof include a carbonyl group; a halogen atom such as a fluorine atom, a chlorine atom, a bromine atom and an iodine atom; a ureido group; an amide group; a cyano group; a hydroxyl group; and a trimethylsilyl group.
 Rは、(A)式(1)のラジカル重合性モノマーの工業的な作りやすさと、(A)式(1)のラジカル重合性モノマーを低粘度化し、硬化性組成物の粘度を低下させる観点から、炭素数1個以上4個以下の鎖状飽和炭化水素基、炭素数1個以上4個以下の鎖状不飽和炭化水素基および炭素数1個以上4個以下のエーテル結合を有する炭化水素基が好ましく、メチル基、エチル基、n-プロピル基、イソプロピル基、n-ブチル基、sec-ブチル基、tert-ブチル基、アリル基、メタリル基、クロチル基、メトキシエチル基、エトキシエチル基、およびビニルオキシエチル基がより好ましく、メチル基、エチル基、n-プロピル基、イソプロピル基、n-ブチル基、sec-ブチル基、tert-ブチル基などの炭素数1個以上4個以下の鎖状飽和炭化水素基がさらに好ましく、メチル基、エチル基、n-プロピル基、イソプロピル基およびtert-ブチル基がさらに一層好ましく、メチル基およびエチル基が特に好ましい。 R 1 reduces the viscosity of the radically polymerizable monomer of the formula (A) (1) and the viscosity of the radically polymerizable monomer of the formula (A) (1), thereby lowering the viscosity of the curable composition. From the viewpoint, a chain saturated hydrocarbon group having 1 to 4 carbon atoms, a chain unsaturated hydrocarbon group having 1 to 4 carbon atoms and a hydrocarbon having an ether bond having 1 to 4 carbon atoms. A hydrogen group is preferable, and a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, a sec-butyl group, a tert-butyl group, an allyl group, a metalyl group, a crotyl group, a methoxyethyl group and an ethoxyethyl group. , And vinyloxyethyl groups are more preferable, and chains having 1 or more and 4 or less carbon atoms such as methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, sec-butyl group, and tert-butyl group. Saturated hydrocarbon groups are even more preferred, methyl, ethyl, n-propyl, isopropyl and tert-butyl groups are even more preferred, and methyl and ethyl groups are particularly preferred.
 (A)式(1)のラジカル重合性モノマーとしては、例えば、α-アリルオキシメチルアクリル酸メチル、α-アリルオキシメチルアクリル酸エチル、α-アリルオキシメチルアクリル酸n-プロピル、α-アリルオキシメチルアクリル酸イソプロピル、α-アリルオキシメチルアクリル酸n-ブチル、α-アリルオキシメチルアクリル酸sec-ブチル、α-アリルオキシメチルアクリル酸tert-ブチル、α-アリルオキシメチルアクリル酸ビニル、α-アリルオキシメチルアクリル酸アリル、α-アリルオキシメチルアクリル酸メタリル、α-アリルオキシメチルアクリル酸クロチル、α-アリルオキシメチルアクリル酸メトキシメチル、α-アリルオキシメチルアクリル酸メトキシエチル、α-アリルオキシメチルアクリル酸メトキシプロピル、α-アリルオキシメチルアクリル酸メトキシブチル、α-アリルオキシメチルアクリル酸エトキシメチル、α-アリルオキシメチルアクリル酸エトキシエチル、α-アリルオキシメチルアクリル酸ビニルオキシエチルなどが挙げられる。これらは、それぞれ単独で用いてもよく、2種類以上を併用してもよい。 Examples of the radically polymerizable monomer of the formula (A) (1) include methyl α-allyloxymethylacrylate, ethyl α-allyloxymethylacrylate, n-propyl α-allyloxymethylacrylate, and α-allyloxy. Isopropyl methylacrylate, n-butyl α-allyloxymethylacrylate, sec-butyl α-allyloxymethylacrylate, tert-butyl α-allyloxymethylacrylate, vinyl α-allyloxymethylacrylate, α-allyl Allyl oxymethyl acrylate, metharyl α-allyl oxymethyl acrylate, crotyl α-allyl oxymethyl acrylate, methoxymethyl α-allyl oxymethyl acrylate, methoxy ethyl α-allyl oxymethyl acrylate, α-allyl oxymethyl acrylic Examples thereof include methoxypropyl acid, methoxybutyl α-allyloxymethylacrylate, ethoxymethylα-allyloxymethylacrylate, ethoxyethyl α-allyloxymethylacrylate, and vinyloxyethyl α-allyloxymethylacrylate. These may be used alone or in combination of two or more.
 中でも、α-アリルオキシメチルアクリル酸メチル、α-アリルオキシメチルアクリル酸エチル、α-アリルオキシメチルアクリル酸n-プロピル、α-アリルオキシメチルアクリル酸イソプロピル、α-アリルオキシメチルアクリル酸n-ブチル、α-アリルオキシメチルアクリル酸sec-ブチル、α-アリルオキシメチルアクリル酸tert-ブチル、α-アリルオキシメチルアクリル酸アリル、α-アリルオキシメチルアクリル酸メタリル、α-アリルオキシメチルアクリル酸クロチル、α-アリルオキシメチルアクリル酸メトキシエチル、α-アリルオキシメチルアクリル酸エトキシエチル、α-アリルオキシメチルアクリル酸グリシジル、α-アリルオキシメチルアクリル酸ビニルオキシエチルが好ましく、より好ましくはα-アリルオキシメチルアクリル酸メチル、α-アリルオキシメチルアクリル酸エチル、α-アリルオキシメチルアクリル酸n-プロピル、α-アリルオキシメチルアクリル酸イソプロピル、α-アリルオキシメチルアクリル酸n-ブチル、α-アリルオキシメチルアクリル酸sec-ブチルおよびα-アリルオキシメチルアクリル酸tert-ブチルが好ましく、α-アリルオキシメチルアクリル酸メチル、α-アリルオキシメチルアクリル酸エチル、α-アリルオキシメチルアクリル酸n-プロピル、α-アリルオキシメチルアクリル酸イソプロピルおよびα-アリルオキシメチルアクリル酸tert-ブチルがより好ましく、α-アリルオキシメチルアクリル酸メチルおよびα-アリルオキシメチルアクリル酸エチルがさらに好ましい。 Among them, methyl α-allyl oxymethyl acrylate, ethyl α-allyl oxymethyl acrylate, n-propyl α-allyl oxymethyl acrylate, isopropyl α-allyl oxymethyl acrylate, n-butyl α-allyl oxymethyl acrylate. , Α-allyl oxymethyl acrylate sec-butyl, α-allyl oxymethyl acrylate tert-butyl, α-allyl oxymethyl acrylate allyl, α-allyl oxymethyl acrylate methallyl, α-allyl oxymethyl acrylate crotyl, methoxyethyl α-allyl oxymethyl acrylate, ethoxyethyl α-allyl oxymethyl acrylate, glycidyl α-allyl oxymethyl acrylate, vinyl oxyethyl α-allyl oxymethyl acrylate are preferable, and more preferably α-allyl oxymethyl. Methyl acrylate, ethyl α-allyl oxymethyl acrylate, n-propyl α-allyl oxymethyl acrylate, isopropyl α-allyl oxymethyl acrylate, n-butyl α-allyl oxymethyl acrylate, α-allyl oxymethyl acrylic Sect-butyl acid and tert-butyl α-allyloxymethylacrylate are preferred, with methyl α-allyloxymethylacrylate, ethyl α-allyloxymethylacrylate, n-propyl α-allyloxymethylacrylate, and α-allyl. Isopropyl oxymethyl acrylate and tert-butyl α-allyl oxymethyl acrylate are more preferred, and methyl α-allyl oxymethyl acrylate and ethyl α-allyl oxymethyl acrylate are even more preferred.
 (A)式(1)のラジカル重合性モノマーは、例えば、特開2014-040585号公報、特開2011-137123号公報等に記載された方法に準じて調整することができる。 The radically polymerizable monomer of the formula (A) (1) can be adjusted according to, for example, the methods described in JP-A-2014-040585, JP-A-2011-137123, and the like.
 (A)式(1)のラジカル重合性モノマーの配合割合は、後述する(B)(メタ)アクリロイル基を2個有する光硬化性ウレタン化合物に対して、好ましくは250質量%以上10,000質量%以下であり、特に好ましくは300質量%以上5000質量%以下である。上記範囲であると、硬化性樹脂組成物の粘度を低粘度に維持しつつ露光後の低反り性に優れる。 The mixing ratio of the radically polymerizable monomer of the formula (A) (1) is preferably 250% by mass or more and 10,000% by mass with respect to the photocurable urethane compound having two (meth) acryloyl groups described later (B). % Or less, and particularly preferably 300% by mass or more and 5000% by mass or less. Within the above range, the curable resin composition is excellent in low warpage after exposure while maintaining a low viscosity.
 また、(A)式(1)のラジカル重合性モノマーの配合割合は、硬化性組成物が後述する(F)難燃剤を含有する場合には、(F)難燃剤に対して、好ましくは50質量%以上350質量%以下であり、特に好ましくは65質量%以上250質量%以下である。上記範囲であると、硬化性樹脂組成物の粘度を低粘度に維持しつつ露光後の低反り性、難燃性に優れる。 Further, the mixing ratio of the radically polymerizable monomer of the formula (A) (1) is preferably 50 with respect to the flame retardant (F) when the curable composition contains the flame retardant (F) described later. It is by mass% or more and 350% by mass or less, and particularly preferably 65% by mass or more and 250% by mass or less. Within the above range, the curable resin composition is excellent in low warpage and flame retardancy after exposure while maintaining a low viscosity.
[(B)(メタ)アクリロイル基を2個有する光硬化性ウレタン化合物]
 本発明の硬化性組成物は、(B)(メタ)アクリロイル基を2個有する光硬化性ウレタン化合物を含む。(B)(メタ)アクリロイル基を2個有する光硬化性ウレタン化合物は、本発明の硬化性組成物の硬化物に柔軟性を与え、また、薄膜基板に塗布し、露光した後のこの基板の反りを抑制する。
[(B) (Meta) Photocurable urethane compound having two acryloyl groups]
The curable composition of the present invention contains (B) a photocurable urethane compound having two (meth) acryloyl groups. (B) The photocurable urethane compound having two (meth) acryloyl groups gives flexibility to the cured product of the curable composition of the present invention, and is applied to a thin film substrate and exposed to the substrate. Suppress warpage.
 (B)(メタ)アクリロイル基を2個有する光硬化性ウレタン化合物は、(メタ)アクリロイル基を2個有することで、(メタ)アクリロイル基が1個以下である光硬化性ウレタン化合物を用いた場合と比較して耐熱性や柔軟性といった特性に優れ、(メタ)アクリロイル基が3個以上である光硬化性ウレタン化合物を用いた場合と比較して、露光後の低反り性や柔軟性に優れる。 (B) As the photocurable urethane compound having two (meth) acryloyl groups, a photocurable urethane compound having two (meth) acryloyl groups and having one or less (meth) acryloyl groups was used. It has excellent properties such as heat resistance and flexibility compared to the case, and has lower warpage and flexibility after exposure compared to the case of using a photocurable urethane compound having 3 or more (meth) acryloyl groups. Excellent.
 また、本発明の硬化性組成物の粘度を低く抑える観点から、(B)(メタ)アクリロイル基を2個有する光硬化性ウレタン化合物は、その25℃における粘度が20,000mPa・s以下であることが好ましく、15,000mPa・s以下であることが特に好ましい。 Further, from the viewpoint of suppressing the viscosity of the curable composition of the present invention to be low, the photocurable urethane compound having two (B) (meth) acryloyl groups has a viscosity of 20,000 mPa · s or less at 25 ° C. It is preferable, and it is particularly preferable that it is 15,000 mPa · s or less.
 本発明において粘度は、JIS Z8803:2011の10 円すい-平板形回転粘度計による粘度測定方法に準じ、100rpm、30秒値とし、コーン・ロータとして1°34’×R24を用いたコーンプレート型粘度計(TVE-33H、東機産業社製)にて測定した値である。 In the present invention, the viscosity is 100 rpm, 30 seconds value according to the viscosity measurement method using a 10 cone-plate type rotational viscometer of JIS Z8803: 2011, and a cone plate type viscosity using 1 ° 34'x R24 as a cone rotor. It is a value measured by a meter (TVE-33H, manufactured by Toki Sangyo Co., Ltd.).
 同じく、本発明の硬化性組成物の粘度を低く抑える観点から、(B)(メタ)アクリロイル基を2個有する光硬化性ウレタン化合物は、その重量平均分子量(Mw)が6,000以下であることが好ましく、2,000以下であることが特に好ましい。 Similarly, from the viewpoint of keeping the viscosity of the curable composition of the present invention low, the photocurable urethane compound having two (B) (meth) acryloyl groups has a weight average molecular weight (Mw) of 6,000 or less. It is preferably 2,000 or less, and particularly preferably 2,000 or less.
 (B)(メタ)アクリロイル基を2個有する光硬化性ウレタン化合物としては、例えば、UA-112P、UA-4200、UA-4400、UA-160TM、UA-122P、UA-W2、(以上、新中村化学工業社製)、CN962、CN963、CN964、CN965、CN980、CN981、CN982、CN983、CN996、CN9001、CN9002、CN9788、CN9893、CN978、CN9782、CN9783(以上、サートマー社製)、M-1100、M-1200、M-1210、M-1310、M-1600(東亞合成化学工業社製)、UN-9000PEP、UN-9200A、UN-7600、UN-333、UN-1255、UN-6060PTM、UN-6060P、UN-6200(根上工業社製)、AH-600、AT-600(以上、共栄社化学社製)、エベクリル280、エベクリル284、エベクリル8402、エベクリル8411、エベクリル8807、エベクリル9270(ダイセル・オルネクス社製)等を挙げることができる。 (B) Examples of the photocurable urethane compound having two (meth) acryloyl groups include UA-112P, UA-4200, UA-4400, UA-160TM, UA-122P, UA-W2, (above, new). Nakamura Chemical Industry Co., Ltd.), CN962, CN963, CN964, CN965, CN980, CN981, CN982, CN983, CN996, CN9001, CN9002, CN9788, CN9893, CN978, CN9782, CN9783 (all manufactured by Sartmer), M-1100, M-1200, M-1210, M-1310, M-1600 (manufactured by Toagosei Chemical Industry Co., Ltd.), UN-9000PEP, UN-9200A, UN-7600, UN-333, UN-1255, UN-6060PTM, UN- 6060P, UN-6200 (manufactured by Negami Kogyo Co., Ltd.), AH-600, AT-600 (manufactured by Kyoeisha Chemical Co., Ltd.), Ebekryl 280, Evekrill 284, Evekrill 8402, Evekrill 8411, Evekrill 8807, Evekril 9270 (Dysel Ornex) Made) and the like.
(B)(メタ)アクリロイル基を2個有する光硬化性ウレタン化合物の配合割合は、硬化性樹脂組成物全体に対して、例えば0.1~30質量%、好ましくは0.5~20質量%である。 (B) The blending ratio of the photocurable urethane compound having two (meth) acryloyl groups is, for example, 0.1 to 30% by mass, preferably 0.5 to 20% by mass, based on the entire curable resin composition. Is.
 (B)(メタ)アクリロイル基を2個有する光硬化性ウレタン化合物の配合割合は、(F)難燃剤を含有する場合には、(F)難燃剤に対して1質量%以上70質量%以下、好ましくは10質量%以上50質量%以下、特に好ましくは10質量%以上40質量%以下である。 (B) The compounding ratio of the photocurable urethane compound having two (meth) acryloyl groups is 1% by mass or more and 70% by mass or less with respect to (F) the flame retardant when (F) the flame retardant is contained. It is preferably 10% by mass or more and 50% by mass or less, and particularly preferably 10% by mass or more and 40% by mass or less.
[(C)(A)、(B)以外の(メタ)アクリロイル基を有する化合物]
 本発明の硬化性組成物は、(C)(A)、(B)以外の(メタ)アクリロイル基を有する化合物を含む。(C)(A)、(B)以外の(メタ)アクリロイル基を有する化合物は、露光後には硬化して硬化物に組み込まれる成分である。なお、本明細書において(C)(A)、(B)以外の(メタ)アクリロイル基を有する化合物を「(C)(メタ)アクリロイル基を有する化合物」に略記する場合がある。
[Compounds having (meth) acryloyl groups other than (C) (A) and (B)]
The curable composition of the present invention contains a compound having a (meth) acryloyl group other than (C), (A) and (B). (C) A compound having a (meth) acryloyl group other than (A) and (B) is a component that is cured after exposure and incorporated into a cured product. In addition, in this specification, a compound having a (meth) acryloyl group other than (C) (A) and (B) may be abbreviated as "a compound having a (C) (meth) acryloyl group".
 (C)(メタ)アクリロイル基を有する化合物は、光重合性基として(メタ)アクリロイル基を有する。ここで、(メタ)アクリロイル基とは、アクリロイル基及びメタアクリロイル基を総称する用語である。 (C) The compound having a (meth) acryloyl group has a (meth) acryloyl group as a photopolymerizable group. Here, the (meth) acryloyl group is a general term for an acryloyl group and a meta-acryloyl group.
 (C)(メタ)アクリロイル基を有する化合物は、1個以上の(メタ)アクリロイル基を有しており、さらに任意に水酸基、エーテル結合、ケトン、芳香環、複素環などの官能基や構造部を有していてもよい。以下、本発明の硬化性組成物に含まれ得る(C)(メタ)アクリロイル基を有する化合物を例示するが、(C)(メタ)アクリロイル基を有する化合物はこの例示された化合物に限定されるものではない。 (C) A compound having a (meth) acryloyl group has one or more (meth) acryloyl groups, and optionally has a functional group such as a hydroxyl group, an ether bond, a ketone, an aromatic ring, or a heterocycle, or a structural portion. May have. Hereinafter, compounds having a (C) (meth) acryloyl group that can be contained in the curable composition of the present invention will be exemplified, but the compound having a (C) (meth) acryloyl group is limited to this exemplified compound. It's not a thing.
 (C1)(メタ)アクリロイル基を1個有する化合物
 (C)(メタ)アクリロイル基を有する化合物は、例えば、(C1)(メタ)アクリロイル基を1個有する化合物を含む。(C1)(メタ)アクリロイル基を1個有する化合物は、例えば、(メタ)アクリロイル基以外の特定の官能基(好ましくは水酸基)を有することが好ましい。当該(C1)(メタ)アクリロイル基を1個有する化合物が前記特定の官能基を有する場合、本発明の硬化性組成物の露光後に(C1)(メタ)アクリロイル基を1個有する化合物が硬化物に組み込まれることによって、前記特定の官能基を硬化物中に導入することができる。このようにして前記特定の官能基を硬化物中に導入した場合、硬化物の各種物性をより向上することができる。
(C1) A compound having one (meth) acryloyl group (C) A compound having a (meth) acryloyl group includes, for example, a compound having one (C1) (meth) acryloyl group. (C1) The compound having one (meth) acryloyl group preferably has, for example, a specific functional group (preferably a hydroxyl group) other than the (meth) acryloyl group. When the compound having one (C1) (meth) acryloyl group has the specific functional group, the compound having one (C1) (meth) acryloyl group is a cured product after exposure to the curable composition of the present invention. By incorporating into the cured product, the specific functional group can be introduced into the cured product. When the specific functional group is introduced into the cured product in this way, various physical properties of the cured product can be further improved.
 (C1)(メタ)アクリロイル基を1個有する化合物は、(メタ)アクリロイル基と水酸基とを有する化合物であることがより好ましく、(メタ)アクリロイル基と水酸基とを有する化合物が本発明の硬化性組成物に配合される場合、得られた硬化膜と導体および基板との密着性が向上する。 The compound having one (C1) (meth) acryloyl group is more preferably a compound having a (meth) acryloyl group and a hydroxyl group, and the compound having a (meth) acryloyl group and a hydroxyl group is the curability of the present invention. When blended in the composition, the adhesion between the obtained cured film and the conductor and the substrate is improved.
 (メタ)アクリロイル基と水酸基とを有する化合物としては、2-ヒドロキシ-3-アクリロイルオキシプロピル(メタ)アクリレート、2-ヒドロキシ-3-フェノキシエチル(メタ)アクリレート、1,4-シクロヘキサンジメタノールモノ(メタ)アクリレート、2-ヒドロキシエチル(メタ)アクリレート、2-ヒドロキシプロピル(メタ)アクリレート、4-ヒドロキシブチル(メタ)アクリレート、ペンタエリスリトールトリ(メタ)アクリレート、ジペンタエリスリトールモノヒドロキシペンタ(メタ)アクリレート、2-ヒドロキシプロピル(メタ)アクリレート等が挙げられる。市販品としてはアロニックスM-5700(東亞合成社製の商品名)、4HBA、2HEA、CHDMMA(以上、共栄社化学社製の商品名)、BHEA、HPA、HEMA、HPMA(以上、日本触媒社製の商品名)、ライトエステルHO、ライトエステルHOP、ライトエステルHOA(以上、共栄社化学社製の商品名)等がある。(メタ)アクリロイル基と水酸基とを有する化合物は1種類または複数種類を組み合わせて用いることができる。 Examples of the compound having a (meth) acryloyl group and a hydroxyl group include 2-hydroxy-3-acryloyloxypropyl (meth) acrylate, 2-hydroxy-3-phenoxyethyl (meth) acrylate, and 1,4-cyclohexanedimethanol mono (meth). Meta) acrylate, 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 4-hydroxybutyl (meth) acrylate, pentaerythritol tri (meth) acrylate, dipentaerythritol monohydroxypenta (meth) acrylate, Examples thereof include 2-hydroxypropyl (meth) acrylate. Commercially available products include Aronix M-5700 (trade name manufactured by Toagosei Co., Ltd.), 4HBA, 2HEA, CHDMMA (above, trade name manufactured by Kyoeisha Chemical Co., Ltd.), BHEA, HPA, HEMA, HPMA (above, manufactured by Nippon Catalyst Co., Ltd.). Product name), light ester HO, light ester HOP, light ester HOA (above, product name manufactured by Kyoeisha Chemical Co., Ltd.) and the like. The compound having a (meth) acryloyl group and a hydroxyl group can be used alone or in combination of two or more.
 このうち、特に2-ヒドロキシ-3-アクリロイルオキシプロピルアクリレート、2-ヒドロキシ-3-フェノキシエチルアクリレート、2-ヒドロキシエチルアクリレート、2-ヒドロキシプロピルアクリレート、4-ヒドロキシブチルアクリレート、1,4-シクロヘキサンジメタノールモノアクリレートが好ましく用いられる。また、粘度調整の容易さの観点から、芳香環を有さない化合物が好ましく用いられる。 Of these, especially 2-hydroxy-3-acryloyloxypropyl acrylate, 2-hydroxy-3-phenoxyethyl acrylate, 2-hydroxyethyl acrylate, 2-hydroxypropyl acrylate, 4-hydroxybutyl acrylate, 1,4-cyclohexanedimethanol Monoacrylate is preferably used. Further, from the viewpoint of easiness of adjusting the viscosity, a compound having no aromatic ring is preferably used.
 (C1)(メタ)アクリロイル基を1個有する化合物が本発明の硬化性組成物に配合される場合、その配合量は、本発明の硬化性組成物100質量部あたり、好ましくは1質量部以上15質量部以下、より好ましくは1質量部以上10質量部以下であり、特に好ましくは2質量部以上5質量部以下である。  (C1) When a compound having one (meth) acryloyl group is blended in the curable composition of the present invention, the blending amount thereof is preferably 1 part by mass or more per 100 parts by mass of the curable composition of the present invention. It is 15 parts by mass or less, more preferably 1 part by mass or more and 10 parts by mass or less, and particularly preferably 2 parts by mass or more and 5 parts by mass or less. It was
 (C2)(メタ)アクリロイル基を2個有する化合物
 (C)(メタ)アクリロイル基を有する化合物は、例えば、(C2)(メタ)アクリロイル基を2個有する化合物を含む。
(C2) Compound having two (meth) acryloyl groups The compound having (C) (meth) acryloyl group includes, for example, a compound having two (C2) (meth) acryloyl groups.
 (C2)(メタ)アクリロイル基を2個有する化合物は、好ましくは光硬化性希釈剤、すなわち、硬化性組成物を希釈してその粘度低下に寄与するとともに、露光後には硬化して硬化物に組み込まれる成分である。 (C2) A compound having two (meth) acryloyl groups is preferably a photocurable diluent, that is, a curing composition that is diluted to contribute to a decrease in viscosity, and is cured after exposure to become a cured product. It is an ingredient to be incorporated.
 (C2)(メタ)アクリロイル基を2個有する化合物が光硬化性希釈剤である場合、本発明の硬化性組成物を希釈して粘度を低下させる観点から、50℃における粘度が50mPa・s未満であり、好ましくは50℃における粘度が30mPa・s未満、特に好ましくは50℃における粘度が15mPa・s以下である。 (C2) When the compound having two (meth) acryloyl groups is a photocurable diluent, the viscosity at 50 ° C. is less than 50 mPa · s from the viewpoint of diluting the curable composition of the present invention to reduce the viscosity. The viscosity at 50 ° C. is preferably less than 30 mPa · s, and particularly preferably the viscosity at 50 ° C. is 15 mPa · s or less.
 50℃における粘度が50mPa・s未満の(C2)(メタ)アクリロイル基を2個有する化合物としては、例えば、アルキレングリコールと(メタ)アクリル酸とのエステルである二官能(メタ)アクリロイル基含有モノマーが挙げられる。 Examples of the compound having two (C2) (meth) acryloyl groups having a viscosity at 50 ° C. of less than 50 mPa · s include a bifunctional (meth) acryloyl group-containing monomer which is an ester of alkylene glycol and (meth) acrylic acid. Can be mentioned.
 アルキレングリコールは、モノアルキレングリコールでも、2以上のアルキレングリコールの繰り返し構造を有するものであってもよい。モノアルキレングリコールとしては、炭素数3~16個、好ましくは炭素数6~9個の直鎖又は分岐鎖のアルキレンジオールが挙げられる。 The alkylene glycol may be a monoalkylene glycol or one having a repeating structure of two or more alkylene glycols. Examples of the monoalkylene glycol include linear or branched alkylene diols having 3 to 16 carbon atoms, preferably 6 to 9 carbon atoms.
 2以上のアルキレングリコールの繰り返し構造を有するものとしては、ジエチレングリコール、ジプロピレングリコール、ジブチレングリコール、トリエチレングリコール、トリプロピレングリコール、トリブチレングリコールなどが挙げられる。 Examples of those having a repeating structure of two or more alkylene glycols include diethylene glycol, dipropylene glycol, dibutylene glycol, triethylene glycol, tripropylene glycol, and tributylene glycol.
 具体的には、50℃における粘度が50mPa・s未満の(C2)(メタ)アクリロイル基を2個有する化合物としては、ジエチレングリコールジ(メタ)アクリレート、ジプロピレングリコールジ(メタ)アクリレート、ジブチレングリコールジ(メタ)アクリレート、トリエチレングリコールジ(メタ)アクリレート、トリプロピレングリコールジ(メタ)アクリレート、トリブチレングリコールジ(メタ)アクリレート、1,3-ブチレングリコールジ(メタ)アクリレート、1,4-ブタンジオールジ(メタ)アクリレート、1,6-ヘキサンジオールジ(メタ)アクリレート、1,9-ノナンジオールアクリレート、1,10-デカンジオールジアクリレート、1,16-ヘキサデカンジオールジアクリレートなどが挙げられる。 Specifically, examples of the compound having two (C2) (meth) acryloyl groups having a viscosity at 50 ° C. of less than 50 mPa · s include diethylene glycol di (meth) acrylate, dipropylene glycol di (meth) acrylate, and dibutylene glycol. Di (meth) acrylate, triethylene glycol di (meth) acrylate, tripropylene glycol di (meth) acrylate, tributylene glycol di (meth) acrylate, 1,3-butylene glycol di (meth) acrylate, 1,4-butane Examples thereof include diol di (meth) acrylate, 1,6-hexanediol di (meth) acrylate, 1,9-nonane diol acrylate, 1,10-decane diol diacrylate, and 1,16-hexadecane diol diacrylate.
 50℃における粘度が50mPa・s未満の(C2)(メタ)アクリロイル基を2個有する化合物の市販品としては、2G(新中村化学工業社製)、3G(新中村化学工業社製)、DPGDA(ダイセル・オルネクス社製)、T0948(東京化成工業株式会社製)、T2389(東京化成工業株式会社製)、ビスコート#310HP(大阪有機化学工業株式会社製)、PE-200(第一工業製薬株式会社製)、PE-300(第一工業製薬株式会社製)、HDDA(ダイセル・オルネクス社製)、L-C9A(第一工業製薬株式会社製)、A-NOD-N(新中村化学工業社製)、B1065(東京化成工業株式会社製)、1,9-NDA(第一工業製薬社製)などが挙げられる。 Commercially available products of compounds having two (C2) (meth) acryloyl groups having a viscosity at 50 ° C. of less than 50 mPa · s include 2G (manufactured by Shin-Nakamura Chemical Industry Co., Ltd.), 3G (manufactured by Shin-Nakamura Chemical Industry Co., Ltd.), and DPGDA. (Manufactured by Daisel Ornex), T0948 (manufactured by Tokyo Kasei Kogyo Co., Ltd.), T2389 (manufactured by Tokyo Kasei Kogyo Co., Ltd.), Viscort # 310HP (manufactured by Osaka Organic Chemical Industry Co., Ltd.), PE-200 (Daiichi Kogyo Seiyaku Co., Ltd.) Company), PE-300 (Daiichi Kogyo Seiyaku Co., Ltd.), HDDA (Daisel Ornex Co., Ltd.), LC9A (Daiichi Kogyo Seiyaku Co., Ltd.), A-NOD-N (Shin-Nakamura Chemical Industry Co., Ltd.) , B1065 (manufactured by Tokyo Kasei Kogyo Co., Ltd.), 1,9-NDA (manufactured by Dai-ichi Kogyo Seiyaku Co., Ltd.) and the like.
 50℃における粘度が50mPa・s未満の(C2)(メタ)アクリロイル基を2個有する化合物が本発明の硬化性組成物に配合される場合、その配合量は、本発明の硬化性組成物100質量部に対して、例えば2質量部以上50質量部以下、好ましくは6質量部以上40質量部以下、より好ましくは10質量部以上30質量部以下である。 When a compound having two (C2) (meth) acryloyl groups having a viscosity at 50 ° C. of less than 50 mPa · s is blended in the curable composition of the present invention, the blending amount thereof is the curable composition 100 of the present invention. With respect to the mass part, for example, it is 2 parts by mass or more and 50 parts by mass or less, preferably 6 parts by mass or more and 40 parts by mass or less, and more preferably 10 parts by mass or more and 30 parts by mass or less.
 50℃における粘度が50mPa・s未満の(C2)(メタ)アクリロイル基を2個有する化合物の配合量を本発明の硬化性組成物100質量部に対して、2質量部以上50質量部以下とすることで、硬化性組成物の粘度を低粘度に維持することができ、光硬化すなわち露光後には50℃における粘度が50mPa・s未満の(C2)(メタ)アクリロイル基を2個有する化合物は硬化物に組み込まれることとなる。 The blending amount of the compound having two (C2) (meth) acryloyl groups having a viscosity of less than 50 mPa · s at 50 ° C. is 2 parts by mass or more and 50 parts by mass or less with respect to 100 parts by mass of the curable composition of the present invention. By doing so, the viscosity of the curable composition can be maintained at a low viscosity, and the compound having two (C2) (meth) acryloyl groups having a viscosity of less than 50 mPa · s at 50 ° C. after photocuring, that is, exposure can be used. It will be incorporated into the cured product.
 (C3)芳香環を有さず、(メタ)アクリロイル基を3個以上有する化合物
 (C)(メタ)アクリロイル基を有する化合物は、例えば、(C3)芳香環を有さず、(メタ)アクリロイル基を3個以上有する化合物を含む。
(C3) A compound having no aromatic ring and having three or more (meth) acryloyl groups (C) A compound having a (meth) acryloyl group is, for example, a compound having no (C3) aromatic ring and having (meth) acryloyl. Contains compounds having 3 or more groups.
 本発明の硬化性組成物が、(C3)芳香環を有さず、(メタ)アクリロイル基を3個以上有する化合物を含む場合には、本発明の硬化性組成物の粘度上昇を抑えつつ露光時の硬化性がさらに向上する。 When the curable composition of the present invention contains a compound having (C3) no aromatic ring and having three or more (meth) acryloyl groups, the curable composition of the present invention is exposed while suppressing an increase in viscosity. The curability of time is further improved.
 (C3)芳香環を有さず、(メタ)アクリロイル基を3個以上有する化合物としては、トリメチロールプロパントリアクリレート、トリメチロールメタントリアクリレート、エチレンオキサイド変性トリメチロールプロパントリアクリレート、プロピレンオキサイド変性トリメチロールプロパントリアクリレート、エピクロルヒドリン変性トリメチロールプロパントリアクリレート、ペンタエリスリトールテトラアクリレート、テトラメチロールメタンテトラアクリレート、エチレンオキサイド変性リン酸トリアクリレート、プロピレンオキサイド変性リン酸トリアクリレート、エピクロルヒドリン変性グリセロールトリアクリレート、ジペンタエリスリトールヘキサアクリレート、ジトリメチロールプロパンテトラアクリレート、あるいはこれらのシルセスキオキサン変性物等に代表される多官能アクリレート、あるいはこれらに対応するメタアクリレートモノマー、εカプロラクトン変性トリスアクリロキシエチルイソシアヌレートが挙げられる。 (C3) Examples of the compound having no aromatic ring and having three or more (meth) acryloyl groups include trimethylolpropane triacrylate, trimethylolmethane triacrylate, ethylene oxide-modified trimethylolpropane triacrylate, and propylene oxide-modified trimethylol. Propanetriacrylate, epichlorohydrin-modified trimethylolpropanetriacrylate, pentaerythritol tetraacrylate, tetramethylolmethanetetraacrylate, ethyleneoxide-modified phosphoric acid triacrylate, propyleneoxide-modified phosphate triacrylate, epichlorhydrin-modified glyceroltriacrylate, dipentaerythritol hexaacrylate , Ditrimethylolpropane tetraacrylate, polyfunctional acrylate typified by these silsesquioxane modified products, or the corresponding metal acrylate monomer, ε-caprolactone-modified trisacryloxyethyl isocyanurate.
 なお、(メタ)アクリロイル基を3個以上有する化合物は、多分岐状のオリゴマー又はポリマーであってもよい。  The compound having three or more (meth) acryloyl groups may be a multi-branched oligomer or polymer. It was
 (C3)芳香環を有さず、(メタ)アクリロイル基を3個以上有する化合物が本発明の硬化性組成物に配合される場合、その配合量は、本発明の硬化性組成物100質量部に対して好ましくは1質量部以上40質量部以下、より好ましくは5質量部以上20質量部以下である。 (C3) When a compound having no aromatic ring and having three or more (meth) acryloyl groups is blended in the curable composition of the present invention, the blending amount thereof is 100 parts by mass of the curable composition of the present invention. It is preferably 1 part by mass or more and 40 parts by mass or less, and more preferably 5 parts by mass or more and 20 parts by mass or less.
 (C4)芳香環を有し、(メタ)アクリロイル基を2個以上有する化合物
 (C)(メタ)アクリロイル基を有する化合物は、例えば、(C4)芳香環を有し、(メタ)アクリロイル基を2個以上有する化合物を含む。
(C4) A compound having an aromatic ring and having two or more (meth) acryloyl groups (C) A compound having a (meth) acryloyl group is, for example, having a (C4) aromatic ring and having a (meth) acryloyl group. Contains compounds having two or more.
 本発明の硬化性組成物が(C4)芳香環を有し、(メタ)アクリロイル基を2個以上有する化合物を含む場合には、露光時の硬化性がさらに向上し、当該化合物が芳香環を有することで、硬化膜(硬化物)の耐熱性、難燃性等の特性のさらなる向上に寄与する。なお、(C4)芳香環を有し、(メタ)アクリロイル基を2個以上有する化合物は、芳香環を含むために粘度は比較的高粘度となる(すなわち、50℃における粘度が50mPa・s以上となる)。また、良好な光硬化性を維持しつつ硬化性組成物の粘度上昇を抑制する観点から、この化合物一分子中の(メタ)アクリロイル基の数が2個であることが好ましい。 When the curable composition of the present invention contains a compound having a (C4) aromatic ring and two or more (meth) acryloyl groups, the curability at the time of exposure is further improved, and the compound forms an aromatic ring. By having it, it contributes to further improvement of properties such as heat resistance and flame retardancy of the cured film (cured product). The compound having (C4) an aromatic ring and having two or more (meth) acryloyl groups has a relatively high viscosity because it contains an aromatic ring (that is, the viscosity at 50 ° C. is 50 mPa · s or more). Will be). Further, from the viewpoint of suppressing an increase in the viscosity of the curable composition while maintaining good photocurability, it is preferable that the number of (meth) acryloyl groups in one molecule of this compound is two.
 (C4)芳香環を有し、(メタ)アクリロイル基を2個以上有する化合物は、例えば、多価フェノールの(メタ)アクリレートや、そのアルキレンオキサイド付加物が挙げられる。 Examples of the compound having a (C4) aromatic ring and two or more (meth) acryloyl groups include (meth) acrylate of a polyhydric phenol and an alkylene oxide adduct thereof.
 多価フェノールとしては、ビスフェノールA、ビスフェノールAP、ビスフェノールB、ビスフェノールBP、ビスフェノールE、ビスフェノールF、ビスフェノールM、ビスフェノールP、ビスフェノールPH、ビスフェノールZなどのビスフェノール類、ビフェノールなどが挙げられる。 Examples of the polyvalent phenol include bisphenol A, bisphenol AP, bisphenol B, bisphenol BP, bisphenol E, bisphenol F, bisphenol M, bisphenol P, bisphenol PH, bisphenol Z and other bisphenols, and biphenol.
 アルキレンオキサイドとしては、例えば、エチレンオキサイド、プロピレンオキサイド、ブチレンオキサイドが挙げられる。アルキレンオキサイドの付加数は6以下であることが好ましい。 Examples of the alkylene oxide include ethylene oxide, propylene oxide, and butylene oxide. The number of alkylene oxides added is preferably 6 or less.
 (C4)芳香環を有し、(メタ)アクリロイル基を2個以上有する化合物の市販品としては、ABE-300(新中村化学工業社製)、BPE―80N(新中村化学工業社製)、BPE―100(新中村化学工業社製)、A-BPE-4(新中村化学工業社製)、BPE-4(第一工業製薬株式会社製)、BPE-10(第一工業製薬株式会社製)、A-BPE-10(第一工業製薬株式会社製)、BPE―200(新中村化学工業社製)、EBECRYL 150(ダイセル・オルネクス株式会社製)などが挙げられる。 (C4) Commercially available products of compounds having an aromatic ring and having two or more (meth) acryloyl groups include ABE-300 (manufactured by Shin Nakamura Chemical Industry Co., Ltd.), BPE-80N (manufactured by Shin Nakamura Chemical Industry Co., Ltd.), and the like. BPE-100 (manufactured by Shin Nakamura Chemical Industry Co., Ltd.), A-BPE-4 (manufactured by Shin Nakamura Chemical Industry Co., Ltd.), BPE-4 (manufactured by Daiichi Kogyo Seiyaku Co., Ltd.), BPE-10 (manufactured by Daiichi Kogyo Seiyaku Co., Ltd.) ), A-BPE-10 (manufactured by Daiichi Kogyo Seiyaku Co., Ltd.), BPE-200 (manufactured by Shin Nakamura Chemical Industry Co., Ltd.), EBECRYL 150 (manufactured by Daicel Ornex Co., Ltd.) and the like.
 (C4)芳香環を有し、(メタ)アクリロイル基を2個以上有する化合物が本発明の硬化性組成物に配合される場合、その配合量は、本発明の硬化性組成物100質量部に対して好ましくは1質量部以上40質量部以下、より好ましくは5質量部以上20質量部以下である。 (C4) When a compound having an aromatic ring and having two or more (meth) acryloyl groups is blended in the curable composition of the present invention, the blending amount thereof is 100 parts by mass of the curable composition of the present invention. On the other hand, it is preferably 1 part by mass or more and 40 parts by mass or less, and more preferably 5 parts by mass or more and 20 parts by mass or less.
 本発明の硬化性組成物は、(C)(A)、(B)以外の(メタ)アクリロイル基を有する化合物として、(C2)(メタ)アクリロイル基を2個有する化合物を含むことが好ましく、特に、50℃における粘度が50mPa・s未満の(C2)(メタ)アクリロイル基を2個有する化合物を含むことが好ましい。 The curable composition of the present invention preferably contains a compound having two (C2) (meth) acryloyl groups as a compound having (meth) acryloyl groups other than (C), (A) and (B). In particular, it is preferable to contain a compound having two (C2) (meth) acryloyl groups having a viscosity at 50 ° C. of less than 50 mPa · s.
[(D)光重合開始剤]
 (D)光重合開始剤としては、光、レーザー、電子線等によりラジカルを発生し、ラジカル重合反応を開始する化合物であれば全て用いることができる。当該(D)光重合開始剤としては、例えば、ベンゾイン、ベンゾインメチルエーテル、ベンゾインエチルエーテル、ベンゾインイソプロピルエーテル等のベンゾインとベンゾインアルキルエーテル類;アセトフェノン、2,2-ジメトキシ-2-フェニルアセトフェノン、2,2-ジエトキシ-2-フェニルアセトフェノン、1,1-ジクロロアセトフェノン等のアセトフェノン類;2-メチル-1-[4-(メチルチオ)フェニル]-2-モルホリノプロパン-1-オン、2-ベンジル-2-ジメチルアミノ-1-(4-モルホリノフェニル)-ブタン-1-オン、N,N-ジメチルアミノアセトフェノン等のアミノアセトフェノン類;2-メチルアントラキノン、2-エチルアントラキノン、2-t-ブチルアントラキノン、1-クロロアントラキノン等のアントラキノン類;2,4-ジメチルチオキサントン、2,4-ジエチルチオキサントン、2-クロロチオキサントン、2,4-ジイソプロピルチオキサントン等のチオキサントン類;アセトフェノンジメチルケタール、ベンジルジメチルケタール等のケタール類;2,4,5-トリアリールイミダゾール二量体;リボフラビンテトラブチレート;2-メルカプトベンゾイミダゾール、2-メルカプトベンゾオキサゾール、2-メルカプトベンゾチアゾール等のチオール化合物;2,2,2-トリブロモエタノール、トリブロモメチルフェニルスルホン等の有機ハロゲン化合物;ベンゾフェノン、4,4’-ビスジエチルアミノベンゾフェノン等のベンゾフェノン類またはキサントン類;2,4,6-トリメチルベンゾイルジフェニルホスフィンオキサイド;1,2-オクタンジオン,1-[4-(フェニルチオ)-,2-(O-ベンゾイルオキシム)]、エタノン,1-[9-エチル-6-(2-メチルベンゾイル)-9H-カルバゾール-3-イル]-,1-(O-アセチルオキシム)等のオキシムエステル類などが挙げられる。
[(D) Photopolymerization Initiator]
As the photopolymerization initiator, any compound that generates radicals by light, a laser, an electron beam, or the like and initiates a radical polymerization reaction can be used. Examples of the (D) photopolymerization initiator include benzoin and benzoin alkyl ethers such as benzoin, benzoin methyl ether, benzoin ethyl ether, and benzoin isopropyl ether; acetophenone, 2,2-dimethoxy-2-phenylacetophenone, 2, Acetophenones such as 2-diethoxy-2-phenylacetophenone and 1,1-dichloroacetophenone; 2-methyl-1- [4- (methylthio) phenyl] -2-morpholinopropane-1-one, 2-benzyl-2- Aminoacetophenones such as dimethylamino-1- (4-morpholinophenyl) -butane-1-one, N, N-dimethylaminoacetophenone; 2-methylanthraquinone, 2-ethylanthraquinone, 2-t-butylanthraquinone, 1- Anthraquinones such as chloroanthraquinone; thioxanthones such as 2,4-dimethylthioxanthone, 2,4-diethylthioxanthone, 2-chlorothioxanthone, 2,4-diisopropylthioxanthone; acetophenone dimethylketal, ketals such as benzyldimethylketal; 2 , 4,5-Triarylimidazole dimer; riboflavin tetrabutyrate; thiol compounds such as 2-mercaptobenzoimidazole, 2-mercaptobenzoxazole, 2-mercaptobenzothiazole; 2,2,2-tribromoethanol, tri Organic halogen compounds such as bromomethylphenyl sulfone; benzophenone, benzophenones or xanthones such as 4,4'-bisdiethylaminobenzophenone; 2,4,6-trimethylbenzoyldiphenylphosphine oxide; 1,2-octanedione, 1-[ 4- (Phenylthio)-, 2- (O-benzoyloxime)], etanone, 1- [9-ethyl-6- (2-methylbenzoyl) -9H-carbazole-3-yl]-, 1- (O-) Examples thereof include oxime esters such as acetyl oxime).
 上記(D)光重合開始剤は、1種単独で、または2種以上を混合して使用することができる。また、これらに加え、N,N-ジメチルアミノ安息香酸エチルエステル、N,N-ジメチルアミノ安息香酸イソアミルエステル、ペンチル-4-ジメチルアミノベンゾエート、トリエチルアミン、トリエタノールアミン等の三級アミン類などの光開始助剤を使用することができる。また、可視光領域に吸収波長を有するOmnirad 784等(IGM Resins B.V.社製)のチタノセン化合物等も光硬化反応を促進するために(D)光重合開始剤として添加することができる。尚、光重合開始剤として添加する成分はこれらに限られるものではなく、紫外光もしくは可視光領域において光を吸収し、(メタ)アクリロイル基等のエチレン性不飽和基のラジカル重合を開始させるものであればよく、公知の光重合開始剤、光開始助剤に限らず、単独であるいは複数併用して使用することができる。 The above (D) photopolymerization initiator can be used alone or in combination of two or more. In addition to these, light such as tertiary amines such as N, N-dimethylaminobenzoic acid ethyl ester, N, N-dimethylaminobenzoic acid isoamyl ester, pentyl-4-dimethylaminobenzoate, triethylamine, and triethanolamine. Initiating aids can be used. Further, a titanosen compound of Omnirad 784 or the like (manufactured by IGM Resins B.V.), which has an absorption wavelength in the visible light region, can also be added as the (D) photopolymerization initiator in order to promote the photocuring reaction. The components to be added as the photopolymerization initiator are not limited to these, but those that absorb light in the ultraviolet light or visible light region to initiate radical polymerization of ethylenically unsaturated groups such as (meth) acryloyl groups. However, it is not limited to the known photopolymerization initiators and photoinitiator aids, and can be used alone or in combination of two or more.
 (D)光重合開始剤の配合量は、本発明の硬化性組成物100質量部に対して0.2質量部以上15質量部以下であることが好ましく、より好ましくは1質量部以上8質量部以下である。 The blending amount of the photopolymerization initiator (D) is preferably 0.2 parts by mass or more and 15 parts by mass or less, and more preferably 1 part by mass or more and 8 parts by mass with respect to 100 parts by mass of the curable composition of the present invention. It is less than a part.
 (D)光重合開始剤で市販されているものの製品名としては、例えば、Omnirad 907、Omnirad 127、Omnirad 379EG、Omnirad 379EG(何れもIGM Resins B.V.社製)等が挙げられる。 (D) Product names of commercially available photopolymerization initiators include, for example, Omnirad 907, Omnirad 127, Omnirad 379EG, Omnirad 379EG (all manufactured by IGM Resins BV) and the like.
 [(E)熱硬化成分]
 また、本発明の硬化性組成物は、(E)熱硬化成分を含む。(E)熱硬化成分を含むことで、硬化性組成物の塗布、露光後の基板の低反り性および硬化膜の難燃性に加えて、硬化膜の耐熱性、めっき耐性などの機能性をさらに向上させることができる。
[(E) Thermosetting component]
Further, the curable composition of the present invention contains (E) a thermosetting component. (E) By containing a thermosetting component, in addition to coating of a curable composition, low warpage of the substrate after exposure and flame retardancy of the cured film, functionality such as heat resistance and plating resistance of the cured film can be obtained. It can be further improved.
 (E)熱硬化成分としては、例えば、ブロックイソシアネート化合物、エポキシ化合物、オキセタン化合物等の公知の化合物を用いることができる。 As the (E) thermosetting component, for example, a known compound such as a blocked isocyanate compound, an epoxy compound, or an oxetane compound can be used.
 その中でも本発明においては特に、(E)熱硬化成分が、構造中の官能基が保護基により保護された潜在性熱硬化成分を含むことが好ましい。そのような潜在性熱硬化性成分を含むことによって、不慮の条件による硬化性組成物中の意図しない反応を抑制して硬化性組成物の保存安定性を高めることができる。また、かかる硬化性組成物は50℃でのインクジェット印刷性にも優れ、反応を望む際には加熱等によって容易に脱保護し、熱硬化成分を活性化することが可能である。本発明において、潜在性とは、常温や少々の加温条件では活性を示さないが、80℃以上の高温での加熱により活性化して熱硬化性を示す性質を意味するものとする。 Among them, in the present invention, it is particularly preferable that the (E) thermosetting component contains a latent thermosetting component in which the functional group in the structure is protected by a protecting group. By including such a latent thermosetting component, it is possible to suppress an unintended reaction in the curable composition due to unforeseen conditions and enhance the storage stability of the curable composition. In addition, the curable composition is also excellent in inkjet printability at 50 ° C., and when a reaction is desired, it can be easily deprotected by heating or the like to activate the thermosetting component. In the present invention, the potential means a property that does not show activity at room temperature or a little heating condition, but is activated by heating at a high temperature of 80 ° C. or higher and shows thermosetting property.
 中でも、潜在性熱硬化成分が、ブロックイソシアネート化合物であることが好ましい。ブロックイソシアネート化合物は、1分子内に好ましくは複数のブロック化イソシアネート基を有する化合物である。ブロック化イソシアネート基とは、イソシアネート基がブロック剤との反応により保護されて一時的に不活性化された基であり、所定温度に加熱されたときにそのブロック剤が解離してイソシアネート基が生成する。 Above all, it is preferable that the latent thermosetting component is a blocked isocyanate compound. The blocked isocyanate compound is preferably a compound having a plurality of blocked isocyanate groups in one molecule. The blocked isocyanate group is a group in which the isocyanate group is protected by the reaction with the blocking agent and is temporarily inactivated, and when heated to a predetermined temperature, the blocking agent is dissociated to generate an isocyanate group. do.
 複数のイソシアネート基を有するポリイソシアネート化合物としては、例えば、芳香族ポリイソシアネート、脂肪族ポリイソシアネートまたは脂環式ポリイソシアネートが用いられる。 As the polyisocyanate compound having a plurality of isocyanate groups, for example, aromatic polyisocyanate, aliphatic polyisocyanate or alicyclic polyisocyanate is used.
 芳香族ポリイソシアネートの具体例としては、例えば、4,4’-ジフェニルメタンジイソシアネート、2,4-トリレンジイソシアネート、2,6-トリレンジイソシアネート、ナフタレン-1,5-ジイソシアネート、o-キシリレンジイソシアネート、m-キシリレンジイソシアネートおよび2,4-トリレンダイマー等が挙げられる。 Specific examples of the aromatic polyisocyanate include 4,4'-diphenylmethane diisocyanate, 2,4-tolylene diisocyanate, 2,6-tolylene diisocyanate, naphthalene-1,5-diisocyanate, o-xylylene diisocyanate, and the like. Examples thereof include m-xylylene diisocyanate and 2,4-tolylene dimer.
 脂肪族ポリイソシアネートの具体例としては、テトラメチレンジイソシアネート、ヘキサメチレンジイソシアネート、メチレンジイソシアネート、トリメチルヘキサメチレンジイソシアネート、4,4-メチレンビス(シクロヘキシルイソシアネート)およびイソホロンジイソシアネート等が挙げられる。 Specific examples of the aliphatic polyisocyanate include tetramethylene diisocyanate, hexamethylene diisocyanate, methylene diisocyanate, trimethylhexamethylene diisocyanate, 4,4-methylene bis (cyclohexyl isocyanate) and isophorone diisocyanate.
 脂環式ポリイソシアネートの具体例としてはビシクロヘプタントリイソシアネートが挙げられる。並びに先に挙げられたイソシアネート化合物のアダクト体、ビューレット体およびイソシアヌレート体等が挙げられる。 Specific examples of the alicyclic polyisocyanate include bicycloheptane triisocyanate. In addition, the adduct form, the burette form, the isocyanurate form and the like of the isocyanate compounds mentioned above can be mentioned.
 イソシアネートブロック剤としては、例えば、フェノール、クレゾール、キシレノール、クロロフェノールおよびエチルフェノール等のフェノール系ブロック剤;ε-カプロラクタム、δ-パレロラクタム、γ-ブチロラクタムおよびβ-プロピオラクタム等のラクタム系ブロック剤;アセト酢酸エチルおよびアセチルアセトン等の活性メチレン系ブロック剤;メタノール、エタノール、プロパノール、ブタノール、アミルアルコール、エチレングリコールモノメチルエーテル、エチレングリコールモノエチルエーテル、エチレングリコールモノブチルエーテル、ジエチレングリコールモノメチルエーテル、プロピレングリコールモノメチルエーテル、ベンジルエーテル、グリコール酸メチル、グリコール酸ブチル、ジアセトンアルコール、乳酸メチルおよび乳酸エチル等のアルコール系ブロック剤;ホルムアルデヒドキシム、アセトアルドキシム、アセトキシム、メチルエチルケトキシム、ジアセチルモノオキシム、シクロヘキサンオキシム等のオキシム系ブロック剤;ブチルメルカプタン、ヘキシルメルカプタン、t-ブチルメルカプタン、チオフェノール、メチルチオフェノール、エチルチオフェノール等のメルカプタン系ブロック剤;酢酸アミド、ベンズアミド等の酸アミド系ブロック剤;コハク酸イミドおよびマレイン酸イミド等のイミド系ブロック剤;キシリジン、アニリン、ブチルアミン、ジブチルアミン等のアミン系ブロック剤;イミダゾール、2-エチルイミダゾール等のイミダゾール系ブロック剤;メチレンイミンおよびプロピレンイミン等のイミン系ブロック剤;ジメチルピラゾール等のピラゾール系ブロック剤等が挙げられる。 Examples of the isocyanate blocking agent include phenolic blocking agents such as phenol, cresol, xylenol, chlorophenol and ethylphenol; lactam blocking agents such as ε-caprolactam, δ-palerolactam, γ-butyrolactam and β-propiolactam; Active oxime-based blocking agents such as ethyl acetoacetate and acetylacetone; methanol, ethanol, propanol, butanol, amyl alcohol, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monobutyl ether, diethylene glycol monomethyl ether, propylene glycol monomethyl ether, benzyl. Alcohol-based blocking agents such as ether, methyl glycolate, butyl glycolate, diacetone alcohol, methyl lactate and ethyl lactate; oxime-based blocking agents such as formaldehyde xim, acetoaldoxime, acetoxime, methylethylketoxim, diacetylmonooxime and cyclohexaneoxime. Mercaptan-based blocking agents such as butyl mercaptan, hexyl mercaptan, t-butyl mercaptan, thiophenol, methylthiophenol, ethylthiophenol; acid amide-based blocking agents such as acetate amide and benzamide; imides such as succinic acid imide and maleate imide. Oxime-based blocking agents; Amin-based blocking agents such as xylidine, aniline, butylamine, dibutylamine; Imidazole-based blocking agents such as imidazole and 2-ethylimidazole; Imine-based blocking agents such as methyleneimine and propyleneimine; Pyrazole-based such as dimethylpyrazole Examples include blocking agents.
 ブロックイソシアネート化合物は市販のものであってもよく、例えば、デュラネートTPA-B80E、17B-60PX、E402-B80T(いずれも旭化成社製)、TrixeneBI7982:ブロックイソシアネート(ヘキサメチレンイソシアネート(HDM)三量体、ブロック剤:ジメチルピラゾール(DMP)、Baxenden Chemicals社製)等が挙げられる。 The blocked isocyanate compound may be commercially available, for example, Duranate TPA-B80E, 17B-60PX, E402-B80T (all manufactured by Asahi Kasei Corporation), TrixeneBI7982: blocked isocyanate (hexamethylene isocyanate (HDM) trimer, Blocking agents: dimethylpyrazole (DMP), Baxenden Chemicals) and the like.
 なお、潜在性熱硬化成分としては、イミダゾールやジシアンジアミドなどのアミン化合物と、水酸基含有化合物、環状エーテル基含有化合物やカルボキシル基含有化合物等とを反応させた反応物でもよい。 The latent thermosetting component may be a reaction product obtained by reacting an amine compound such as imidazole or dicyandiamide with a hydroxyl group-containing compound, a cyclic ether group-containing compound, a carboxyl group-containing compound, or the like.
 (E)熱硬化成分の配合量は、本発明の硬化性組成物100質量部あたり好ましくは1質量部以上30質量部以下であり、より好ましくは3質量部以上15質量部以下である。(E)熱硬化成分の配合量が、本発明の硬化性組成物100質量部あたり1質量部以上30質量部以下であることで、本発明の硬化性組成物の保存安定性を保持しつつ、硬化膜の耐熱性、めっき耐性などの機能性をさらに向上させることができる。 The blending amount of the (E) thermosetting component is preferably 1 part by mass or more and 30 parts by mass or less, and more preferably 3 parts by mass or more and 15 parts by mass or less per 100 parts by mass of the curable composition of the present invention. (E) When the blending amount of the thermosetting component is 1 part by mass or more and 30 parts by mass or less per 100 parts by mass of the curable composition of the present invention, the storage stability of the curable composition of the present invention is maintained. , Functionality such as heat resistance and plating resistance of the cured film can be further improved.
 [(F)難燃剤]
 本発明の硬化性組成物は、得られる硬化物の難燃性向上を目的として、公知慣用の(F)難燃剤を含むことができる。また、難燃剤を含むことで露光後の低反り性をさらに向上させることができる。
(F)難燃剤としては、例えば、リン酸エステルおよび縮合リン酸エステル、フェノール性水酸基を有するリン含有化合物、ホスファゼン化合物、およびホスフィン酸金属塩等のリン系難燃剤、三酸化アンチモン、五酸化アンチモン等のアンチモン化合物、ペンタブロモジフェニルエーテル、オクタブロモジフェニルエーテル等のハロゲン化合物、水酸化アルミニウム、水酸化マグネシウムなどの金属水酸化物、ハイドロタルサイト等の層状複水酸化物が挙げられる。環境面への影響や難燃効果からリン系難燃剤が好ましい。
ホスフィン酸金属塩としては、例えば、下記構造式(2)
Figure JPOXMLDOC01-appb-C000005
(式(2)中、R、Rは、それぞれ、炭素原子数1~6のアルキル基又は炭素原子数12以下のアリール基を表し、Mは、カルシウム、アルミニウム又は亜鉛を表し、Mがアルミニウムを表す場合にはm=3であり、それ以外の金属を表す場合にはm=2である)
で表される構造を有するものが好ましい。
[(F) Flame Retardant]
The curable composition of the present invention may contain a known and commonly used (F) flame retardant for the purpose of improving the flame retardancy of the obtained cured product. Further, by containing a flame retardant, the low warpage after exposure can be further improved.
(F) Examples of the flame retardant include phosphoric flame retardants such as phosphoric acid esters and condensed phosphoric acid esters, phosphorus-containing compounds having phenolic hydroxyl groups, phosphazenic compounds, and phosphinic acid metal salts, antimony trioxide, and antimony pentoxide. Examples thereof include antimony compounds such as, pentabromodiphenyl ether, halogen compounds such as octabromodiphenyl ether, metal hydroxides such as aluminum hydroxide and magnesium hydroxide, and layered compound hydroxides such as hydrotalcite. Phosphorus-based flame retardants are preferable because of their environmental impact and flame retardant effect.
Examples of the phosphinic acid metal salt include the following structural formula (2).
Figure JPOXMLDOC01-appb-C000005
(In the formula (2), R 1 and R 2 represent an alkyl group having 1 to 6 carbon atoms or an aryl group having 12 or less carbon atoms, respectively, M represents calcium, aluminum or zinc, and M represents calcium, aluminum or zinc. When representing aluminum, m = 3, and when representing other metals, m = 2).
Those having a structure represented by are preferable.
 より好ましくは、式(2)中、Mがアルミニウムを表す構造を有する化合物である。 More preferably, it is a compound having a structure in which M represents aluminum in the formula (2).
 ホスフィン酸金属塩を用いることにより、硬化膜の柔軟性を損なわず難燃性を向上させることができる。 By using the phosphinic acid metal salt, the flame retardancy can be improved without impairing the flexibility of the cured film.
 ホスフィン酸金属塩を構成するホスフィン酸の具体例としては、ホスフィン酸、ジメチルホスフィン酸、エチルメチルホスフィン酸、ジエチルホスフィン酸、メチル-n-プロピルホスフィン酸、メタンジ(メチルホスフィン酸)、ベンゼン-1,4-(ジメチルホスフィン酸)、メチルフェニルホスフィン酸、フェニルホスフィン酸、ジフェニルホスフィン酸およびこれらの混合物が挙げられる。 Specific examples of the phosphinic acid constituting the phosphinic acid metal salt include phosphinic acid, dimethylphosphinic acid, ethylmethylphosphinic acid, diethylphosphinic acid, methyl-n-propylphosphinic acid, methanedi (methylphosphinic acid), benzene-1, Examples thereof include 4- (dimethylphosphinic acid), methylphenylphosphinic acid, phenylphosphinic acid, diphenylphosphinic acid and mixtures thereof.
 市販品としては、例えば、Exolit OP 1240、1240、1312、1400、930、945TP、OP-935を挙げることができる。 Examples of commercially available products include Exolit OP 1240, 1240, 1312, 1400, 930, 945TP, and OP-935.
 露光後の低反り性や柔軟性という観点から、リン系難燃剤としてホスファゼン化合物を用いることが好ましい。ホスファゼン化合物は、シアノ基(-CN)、水酸基(-OH)およびメチル基のいずれか1種により置換されているフェノキシ基とホスファゼン構造を有するフェノキシホスファゼンであることが好ましい。特に、基本骨格としてヘキサフェノキシシクロトリホスファゼン構造を有し、当該構造中の6個のフェノキシ基のうち、少なくとも2個がシアノ基(-CN)または水酸基(-OH)により置換されていることが好ましい。 From the viewpoint of low warpage and flexibility after exposure, it is preferable to use a phosphazene compound as a phosphorus-based flame retardant. The phosphazene compound is preferably a phenoxyphosphazene having a phosphazene structure and a phenoxy group substituted with any one of a cyano group (-CN), a hydroxyl group (-OH) and a methyl group. In particular, it has a hexaphenoxycyclotriphosphazene structure as a basic skeleton, and at least two of the six phenoxy groups in the structure are substituted with a cyano group (-CN) or a hydroxyl group (-OH). preferable.
 好ましい態様としては、ヘキサフェノキシシクロトリホスファゼン構造中のリン原子に結合する2個のフェノキシ基のうちのいずれか一方のみが1個のシアノ基(-CN)により置換され、且つこのように置換されたフェノキシ基を、ヘキサフェノキシシクロトリホスファゼン構造全体として2個有する構造である。 In a preferred embodiment, only one of the two phenoxy groups attached to the phosphorus atom in the hexaphenoxycyclotriphosphazene structure is substituted with one cyanide group (-CN) and thus substituted. It is a structure having two phenoxy groups as a whole hexaphenoxycyclotriphosphazene structure.
 また別の好ましい態様としては、ヘキサフェノキシシクロトリホスファゼン構造中のリン原子に結合する2個のフェノキシ基がいずれも1個シアノ基(-CN)により置換され、且つこのように置換されたフェノキシ基を、ヘキサフェノキシシクロトリホスファゼン構造全体として6個全て有する構造である。 In yet another preferred embodiment, the two phenoxy groups attached to the phosphorus atom in the hexaphenoxycyclotriphosphazene structure are both substituted with one cyano group (-CN), and the phenoxy group thus substituted. Is a structure having all six hexaphenoxycyclotriphosphazene structures as a whole.
 また別の好ましい態様としては、ヘキサフェノキシシクロトリホスファゼン構造中のリン原子に結合する2個のフェノキシ基のうちのいずれか一方のみが1個の水酸基(-OH)により置換され、且つこのように置換されたフェノキシ基を、ヘキサフェノキシシクロトリホスファゼン構造全体として3個有する構造である。 In yet another preferred embodiment, only one of the two phenoxy groups attached to the phosphorus atom in the hexaphenoxycyclotriphosphazene structure is substituted with one hydroxyl group (-OH) and thus thus. It is a structure having three substituted phenoxy groups as a whole hexaphenoxycyclotriphosphazene structure.
 より好ましくは、環状ホスファゼン化合物は、下記構造:
Figure JPOXMLDOC01-appb-C000006
または
Figure JPOXMLDOC01-appb-C000007
または
Figure JPOXMLDOC01-appb-C000008
のうちいずれかの構造を有するものである。
More preferably, the cyclic phosphazene compound has the following structure:
Figure JPOXMLDOC01-appb-C000006
or
Figure JPOXMLDOC01-appb-C000007
or
Figure JPOXMLDOC01-appb-C000008
It has one of the structures.
 好ましいホスファゼン化合物の市販品としては、例えば、FP-300B、FP-300、SPH-100(いずれも伏見製薬社製)を挙げることができる。 Examples of the preferable commercially available phosphazene compound include FP-300B, FP-300, and SPH-100 (all manufactured by Fushimi Pharmaceutical Co., Ltd.).
 (F)難燃剤は、1種を単独で用いてもよく、2種以上を併用してもよい。 (F) One type of flame retardant may be used alone, or two or more types may be used in combination.
また、(F)難燃剤の配合量は、本発明の硬化性組成物中に例えば5質量%以上60質量%以下であり、好ましくは10質量%以上50質量%以下である。(F)難燃剤がリン系難燃剤である場合、リン系難燃剤の配合量が、本発明の硬化性組成物中のリン含有率として0.1質量%以上10%質量%以下であると、耐熱性、低反り性を保ったまま難燃性を効果的に付与することができる。 The amount of the flame retardant (F) blended in the curable composition of the present invention is, for example, 5% by mass or more and 60% by mass or less, preferably 10% by mass or more and 50% by mass or less. (F) When the flame retardant is a phosphorus-based flame retardant, the blending amount of the phosphorus-based flame retardant is 0.1% by mass or more and 10% by mass or less as the phosphorus content in the curable composition of the present invention. It is possible to effectively impart flame retardancy while maintaining heat resistance and low warpage.
 [メラミンおよびその誘導体からなる群から選択される熱硬化触媒]
 本発明の硬化性組成物は、メラミンおよびその誘導体からなる群から選択される熱硬化触媒を含むことが好ましい。メラミンおよびその誘導体は、熱硬化反応の硬化促進剤として作用し、硬化物の導体回路との密着性に加えて、耐熱性等の特性をより一層向上させるために使用される。
[Thermosetting catalyst selected from the group consisting of melamine and its derivatives]
The curable composition of the present invention preferably contains a thermosetting catalyst selected from the group consisting of melamine and its derivatives. Melamine and its derivatives act as a curing accelerator for thermosetting reactions, and are used to further improve properties such as heat resistance in addition to adhesion of the cured product to the conductor circuit.
 メラミンおよびその誘導体からなる群から選択される熱硬化触媒としては、例えば、アセトグアナミン、ベンゾグアナミン等のグアナミン類;メラミン;エチルジアミノ-S-トリアジン、2,4-ジアミノ-S-トリアジン、2,4-ジアミノ-6-キシリル-S-トリアジン等のトリアジン誘導体類が挙げることができ、中でもメラミンであることが好ましい。 Examples of the thermosetting catalyst selected from the group consisting of melamine and its derivatives include guanamines such as acetoguanamine and benzoguanamine; melamine; ethyldiamino-S-triazine, 2,4-diamino-S-triazine, 2,4. Examples thereof include triazine derivatives such as -diamino-6-xylyl-S-triazine, and melamine is preferable.
 メラミンおよびその誘導体からなる群から選択される熱硬化触媒は、1種を単独または2種以上混合して用いることができる。メラミンおよびその誘導体からなる群から選択される熱硬化触媒が本発明の硬化性組成物に配合される場合、その配合量は、(E)熱硬化成分の合計量を100質量%とした場合、好ましくは0.1質量%以上20質量%以下であり、より好ましくは0.5質量%以上20質量%以下、特に好ましくは1質量%以上15質量%以下である。 The thermosetting catalyst selected from the group consisting of melamine and its derivatives can be used alone or in combination of two or more. When the thermosetting catalyst selected from the group consisting of melamine and its derivatives is blended in the curable composition of the present invention, the blending amount thereof is (E) when the total amount of the thermosetting components is 100% by mass. It is preferably 0.1% by mass or more and 20% by mass or less, more preferably 0.5% by mass or more and 20% by mass or less, and particularly preferably 1% by mass or more and 15% by mass or less.
 メラミンおよびその誘導体からなる群から選択される熱硬化触媒の配合量を、(E)熱硬化成分の合計量を100質量%とした場合に0.1質量%以上20質量%以下とすることで、硬化性組成物の保存安定性を高めつつ良好な熱硬化を実現することができる。 By setting the blending amount of the thermosetting catalyst selected from the group consisting of melamine and its derivatives to 0.1% by mass or more and 20% by mass or less when the total amount of (E) thermosetting components is 100% by mass. , Good thermosetting can be realized while improving the storage stability of the curable composition.
 本発明の硬化性組成物には、必要に応じて酸化防止剤、消泡・レベリング剤、チクソトロピー付与剤・増粘剤、カップリング剤、分散剤、重合遅延剤、着色剤等の添加剤を含有させることができる。 Additives such as antioxidants, antifoaming / leveling agents, thixotropy-imparting agents / thickeners, coupling agents, dispersants, polymerization retarders, and colorants are added to the curable composition of the present invention, if necessary. Can be contained.
 更に、本発明の硬化性組成物には、粘度調整のため溶剤を用いてもよいが、硬化後の膜厚低下を防ぐために、添加量は少ないことが好ましい。また、粘度調整のための溶剤は含まないことがより好ましい。 Further, in the curable composition of the present invention, a solvent may be used for adjusting the viscosity, but it is preferable that the amount added is small in order to prevent the film thickness from being lowered after curing. Further, it is more preferable that the solvent for adjusting the viscosity is not contained.
 本発明の硬化性組成物は、好ましくはインクジェット法による印刷に適用される。インクジェット法による印刷に適用可能とするためには、インクジェットプリンターにより噴射可能な粘度であることが好ましい。 The curable composition of the present invention is preferably applied to printing by an inkjet method. In order to make it applicable to printing by the inkjet method, it is preferable that the viscosity is such that it can be ejected by an inkjet printer.
 また、本発明の硬化性組成物の粘度は、50℃で50mPa・s以下であることが好ましく、50℃で20mPa・s以下であることがより好ましく、50℃で15mPa・s以下であることが特に好ましい。 The viscosity of the curable composition of the present invention is preferably 50 mPa · s or less at 50 ° C, more preferably 20 mPa · s or less at 50 ° C, and 15 mPa · s or less at 50 ° C. Is particularly preferable.
 従って、本発明の硬化性組成物によりプリント配線板用の基板等に、インクジェット印刷法により直接パターンを印刷することができる。 Therefore, the curable composition of the present invention can directly print a pattern on a substrate for a printed wiring board or the like by an inkjet printing method.
 さらに、本発明の硬化性組成物は、常温では重合反応が生じないため、一液型の硬化性組成物として安定に保存可能である。 Furthermore, since the curable composition of the present invention does not undergo a polymerization reaction at room temperature, it can be stably stored as a one-component curable composition.
 本発明の硬化性組成物はその粘度の低さからインクジェットプリンターにインクとして供給することができ、基板上への印刷に使用することができる。また、ポリイミド基板等の薄膜基板に印刷し、露光した後に薄膜基板の反りを低く抑えることができるため、フレキシブル配線板に対するソルダーレジスト用途の組成物として好適である。 The curable composition of the present invention can be supplied as ink to an inkjet printer due to its low viscosity, and can be used for printing on a substrate. Further, since the warpage of the thin film substrate can be suppressed to a low level after printing on a thin film substrate such as a polyimide substrate and exposing it, it is suitable as a composition for solder resist for a flexible wiring board.
 <硬化性組成物により得られる硬化物>
本発明の硬化性組成物により得られる硬化物は、例えば、上記印刷直後の組成物層に50mJ/cm~1000mJ/cmの活性エネルギー線を照射することにより組成物層を光硬化させることで得られる。活性エネルギー線照射は、紫外線、電子線、化学線等の活性エネルギー線の照射により、好ましくは紫外線照射により行われる。
<Curing product obtained from the curable composition>
In the cured product obtained by the curable composition of the present invention, for example, the composition layer immediately after printing is photo-cured by irradiating the composition layer with an active energy ray of 50 mJ / cm 2 to 1000 mJ / cm 2 . Obtained at. The activation energy ray irradiation is performed by irradiation with active energy rays such as ultraviolet rays, electron beams, and chemical rays, preferably by ultraviolet irradiation.
 インクジェットプリンターにおける紫外線照射は、例えばプリントヘッドの側面に高圧水銀灯、メタルハライドランプ、紫外線LEDなどの光源を取り付け、プリントヘッドもしくは基板を動かすことによる走査を行うことにより行うことができる。この場合は、印刷と、紫外線照射とをほぼ同時に行なえる。 Ultraviolet irradiation in an inkjet printer can be performed by, for example, attaching a light source such as a high-pressure mercury lamp, a metal halide lamp, or an ultraviolet LED to the side surface of the print head, and scanning by moving the print head or the substrate. In this case, printing and ultraviolet irradiation can be performed almost at the same time.
 光硬化後の硬化物は、公知の加熱手段、例えば、熱風炉、電気炉、赤外線誘導加熱炉等の加熱炉を用いることにより熱硬化する。加熱条件としては、130℃~170℃にて5分~90分加熱することが好ましい。 The cured product after photocuring is thermally cured by using a known heating means, for example, a heating furnace such as a hot air furnace, an electric furnace, or an infrared induction heating furnace. As the heating conditions, it is preferable to heat at 130 ° C to 170 ° C for 5 to 90 minutes.
 本発明の硬化性組成物により得られた硬化物は、柔軟性にも優れるため、特にフレキシブル配線板に対するソルダーレジストとしても好適である。 The cured product obtained by the curable composition of the present invention is also excellent in flexibility, and is therefore particularly suitable as a solder resist for flexible wiring boards.
 フレキシブル配線板の基板としては、例えば、ガラスポリイミド、ポリイミド、ポリエチレンテレフタレート、液晶ポリマー、ポリカーボネートなどからなるフィルム等が挙げられる。 Examples of the substrate of the flexible wiring board include a film made of glass polyimide, polyimide, polyethylene terephthalate, liquid crystal polymer, polycarbonate, and the like.
 <硬化性組成物の硬化物を有する電子部品>
 このように基板上にパターン印刷した硬化性組成物からなる硬化膜がソルダーレジストとして用いられる場合、部品の実装のためのはんだ付け工程で加熱される。はんだ付けは、手はんだ付け、フローはんだ付け、リフローはんだ付け等のいずれで行われてもよいが、例えば、リフローはんだ付けの場合には、100℃~140℃で1~4時間の予熱と、その後、240~280℃で5~20秒程度の加熱を複数回(例えば、2~4回)繰り返してはんだを加熱・溶融させるリフロー工程に供され、冷却後、必要により部品が実装された電子部品が完成する。
<Electronic components with a cured product of a curable composition>
When a cured film made of a curable composition having a pattern printed on a substrate in this way is used as a solder resist, it is heated in a soldering step for mounting components. Soldering may be performed by hand soldering, flow soldering, reflow soldering, or the like. For example, in the case of reflow soldering, preheating at 100 ° C. to 140 ° C. for 1 to 4 hours is required. After that, it is subjected to a reflow process of heating and melting the solder by repeating heating at 240 to 280 ° C. for about 5 to 20 seconds multiple times (for example, 2 to 4 times). The parts are completed.
 なお、本発明において電子部品とは、電子回路に使用する部品を意味し、プリント配線板、トランジスタ、発光ダイオード、レーザーダイオード等の能動部品の他抵抗、コンデンサ、インダクタ、コネクタ等の受動部品も含まれ、本発明の硬化性組成物の硬化物がこれらの絶縁性硬化膜として、本発明の効果を奏するものである。 In the present invention, the electronic component means a component used in an electronic circuit, and includes active components such as printed wiring boards, transistors, light emitting diodes, and laser diodes, as well as passive components such as resistors, capacitors, inductors, and connectors. The cured product of the curable composition of the present invention exerts the effect of the present invention as these insulating cured films.
 本発明の硬化性組成物は、低粘度で塗布性に優れ、光硬化後の反りも少ない。さらに、硬化後にも柔軟であり、基板への密着性、難燃性、はんだ耐熱性、めっき耐性、耐溶剤性に優れることから種々の用途に適用可能であり、適用対象に特に制限はない。例えば、インクジェット印刷によるプリント配線板のエッチングレジスト、ソルダーレジスト、マーキングインキの作製等に用いることができ、中でも露光後の低反り性と難燃性が要求されるインクジェット印刷によるフレキシブル配線板上にソルダーレジストを形成するための組成物として好適に用いることができる。 The curable composition of the present invention has a low viscosity, excellent coatability, and little warpage after photocuring. Further, it is flexible even after curing, and is excellent in adhesion to a substrate, flame retardancy, solder heat resistance, plating resistance, and solvent resistance, so that it can be applied to various applications, and there is no particular limitation on the application target. For example, it can be used for manufacturing etching resists, solder resists, marking inks, etc. of printed wiring boards by inkjet printing, and among them, solder on flexible wiring boards by inkjet printing, which requires low warpage and flame retardancy after exposure. It can be suitably used as a composition for forming a resist.
 また、UV成形品材料、光造形用材料、3Dインクジェット用材料などの用途にも利用可能である。 It can also be used as a material for UV molded products, a material for stereolithography, and a material for 3D inkjet.
 なお、本発明は上記の実施の形態の構成および実施例に限定されるものではなく、発明の要旨の範囲内で種々変形が可能である。 The present invention is not limited to the configuration and examples of the above-described embodiment, and various modifications can be made within the scope of the gist of the invention.
 以下、実施例を示して本発明について具体的に説明するが、本発明はこれらの実施例のみに限定されるものではない。なお、以下において特に断りのない限り、「部」は質量部を意味するものとする。 Hereinafter, the present invention will be specifically described with reference to Examples, but the present invention is not limited to these Examples. In the following, unless otherwise specified, "parts" shall mean parts by mass.
 <1.実施例1~18および比較例1~4の硬化性組成物の調製>
 下記表1に示す割合(単位:質量部)で各成分を配合し、これをディゾルバーで攪拌した。その後、ビーズミルを用いて1mmのジルコニアビーズにて分散を2時間行い、本発明の硬化性組成物(実施例1~18)および比較例の硬化性組成物(比較例1~4)を得た。
<1. Preparation of Curable Compositions of Examples 1 to 18 and Comparative Examples 1 to 4>
Each component was mixed in the ratio (unit: parts by mass) shown in Table 1 below, and this was stirred with a dissolver. Then, dispersion was carried out with 1 mm zirconia beads using a bead mill for 2 hours to obtain a curable composition of the present invention (Examples 1 to 18) and a curable composition of Comparative Examples (Comparative Examples 1 to 4). ..
Figure JPOXMLDOC01-appb-T000009
Figure JPOXMLDOC01-appb-T000009
*1:α-(アリルオキシメチル)アクリル酸メチル(AOMA:日本触媒社製)
*2:2官能ウレタンアクリレート、25℃における粘度:2,000mPa・s、Mw=1,000(UA-2000、新中村化学工業社製)
*3:2官能ウレタンアクリレート、25℃における粘度:12,500mPa・s、Mw=1,000(エベクリル8402、ダイセル・オルネクス社製)
*4:2官能ウレタンアクリレート、25℃における粘度:25,000mPa・s、Mw=6,500(UN-6200、根上工業社製)
*5:3官能ウレタンアクリレート、25℃における粘度:15,000mPa・s(UA-7100、新中村化学工業社製)
*6:6官能ウレタンアクリレートオリゴマー、25℃における粘度1,000~3,000mPa・s(DM576、DOUBLE BOND CHEMICAL社製)
*7:トリメチロールプロパントリアクリレート(A-TMPT、新中村化学工業社製)
*8:1,9-ノナンジオールジアクリレート(1,9-NDA、第一工業製薬社製)
*9:ジプロピレングリコールジアクリレート(DPGDA、ダイセル・オルネクス株式会社製)
*10:エトキシ化ビスフェノールAジアクリレート(A-BPE-10、新中村化学工業社製)
*11:4-ヒドロキシブチルアクリレート(4HBA、日本化成社製)
*12:3官能ブロックイソシアネート(BI7982、Baxenden chemmical社製)
*13:メラミン(日産化学社製)
*14:2-(ジメチルアミノ)-2-[(4-メチルフェニル)メチル]-1-[4-(4-モルホリニル)フェニル]-1-ブタノン(Omnirad 379、IGM社製)
*15:ホスファゼン化合物(リン含有率12.5%)(FP-300B、株式会社伏見製薬所製)
*16:ホスフィン酸金属塩(リン含有率23.0%)(OP935、クラリアントケミカルズ株式会社製)
*17:水酸化アルミニウム(H42M、昭和電工社製)
*18:フタロシアニン系青色着色剤(Pigment Blue15:3)
*19:アントラキノン系黄色着色剤(Pigment Yellow147)
* 1: Α- (allyloxymethyl) methyl acrylate (AOMA: manufactured by Nippon Shokubai Co., Ltd.)
* 2: Bifunctional urethane acrylate, viscosity at 25 ° C: 2,000 mPa · s, Mw = 1,000 (UA-2000, manufactured by Shin Nakamura Chemical Industry Co., Ltd.)
* 3: Bifunctional urethane acrylate, viscosity at 25 ° C.: 12,500 mPa · s, Mw = 1,000 (Evecryl 8402, manufactured by Dycel Ornex)
* 4: Bifunctional urethane acrylate, viscosity at 25 ° C: 25,000 mPa · s, Mw = 6,500 (UN-6200, manufactured by Negami Kogyo Co., Ltd.)
* 5: Trifunctional urethane acrylate, viscosity at 25 ° C: 15,000 mPa · s (UA-7100, manufactured by Shin Nakamura Chemical Industry Co., Ltd.)
* 6: Hexfunctional urethane acrylate oligomer, viscosity at 25 ° C. 1,000-3,000 mPa · s (DM576, manufactured by DOUBLE BOND CHEMICAL)
* 7: Trimethylolpropane triacrylate (A-TMPT, manufactured by Shin Nakamura Chemical Industry Co., Ltd.)
* 8: 1,9-Nonanediol diacrylate (1,9-NDA, manufactured by Dai-ichi Kogyo Seiyaku Co., Ltd.)
* 9: Dipropylene glycol diacrylate (DPGDA, manufactured by Dycel Ornex Co., Ltd.)
* 10: Ethoxylated bisphenol A diacrylate (A-BPE-10, manufactured by Shin Nakamura Chemical Industry Co., Ltd.)
* 11: 4-Hydroxybutyl acrylate (4HBA, manufactured by Nihon Kasei)
* 12: Trifunctional blocked isocyanate (BI7982, manufactured by Baxenden chemical)
* 13: Melamine (manufactured by Nissan Chemical Industries, Ltd.)
* 14: 2- (dimethylamino) -2-[(4-methylphenyl) methyl] -1- [4- (4-morpholinyl) phenyl] -1-butanone (Omnirad 379, manufactured by IGM)
* 15: Phosphazene compound (phosphorus content 12.5%) (FP-300B, manufactured by Fushimi Pharmaceutical Co., Ltd.)
* 16: Metallic phosphinic acid salt (phosphorus content 23.0%) (OP935, manufactured by Clariant Chemicals, Inc.)
* 17: Aluminum hydroxide (H42M, manufactured by Showa Denko)
* 18: Phthalocyanine-based blue colorant (Pigment Blue15: 3)
* 19: Anthraquinone-based yellow colorant (Pigment Yellow147)
<2.評価>
 実施例1~18および比較例1~4の硬化性組成物について以下のように粘度を評価した。また、以下に示すように試験用試料を作成し、塗布性、露光後反り性、柔軟性(MIT試験)、はんだ耐熱性、耐溶剤性、無電解金めっき耐性および難燃性の評価を行った。その結果を表2に示す。
<2. Evaluation>
The viscosities of the curable compositions of Examples 1 to 18 and Comparative Examples 1 to 4 were evaluated as follows. In addition, as shown below, test samples were prepared and evaluated for coatability, post-exposure warpage, flexibility (MIT test), solder heat resistance, solvent resistance, electroless gold plating resistance and flame retardancy. rice field. The results are shown in Table 2.
(1)粘度
 実施例1~18および比較例1~4の硬化性組成物について、インキ温度50℃、100rpmにおける粘度をコーンプレート型粘度計(東機産業社製TVH-33H)にて測定し、以下の基準で評価した。
(1) Viscosity With respect to the curable compositions of Examples 1 to 18 and Comparative Examples 1 to 4, the viscosities at an ink temperature of 50 ° C. and 100 rpm were measured with a cone plate type viscometer (TVH-33H manufactured by Toki Sangyo Co., Ltd.). , Evaluated according to the following criteria.
 ◎:10mPa・s以下
 ○:10mPa・s超20mPa・s以下
 ×:20mPa・s超
⊚: 10 mPa · s or less ○: 10 mPa · s more than 20 mPa · s or less ×: 20 mPa · s more than
(2)硬化膜の形成条件
 実施例1~18および比較例1~4の硬化性組成物をインクジェット印刷装置CPS6151(マイクロクラフト社製)にて塗布した。アレイはKM1024iSHE(マイクロクラフト社製、塗布液滴量6pL、ノズル数2×1024個、ヘッド温度50℃)を使用した。光硬化はSGHUV-UN-L042-B(マイクロクラフト社製、LED光源、波長365nm)を光源として使用し、300mJ/cmで行った。その後、加熱装置は熱風循環式乾燥炉DF610(ヤマト科学株式会社製)を使用し、150℃60分で本硬化を行った。
(2) Conditions for Forming a Cured Film The curable compositions of Examples 1 to 18 and Comparative Examples 1 to 4 were applied by an inkjet printing apparatus CPS6151 (manufactured by Microcraft). As the array, KM1024iSHE (manufactured by Microcraft Co., Ltd., coating droplet amount 6 pL, number of nozzles 2 × 1024, head temperature 50 ° C.) was used. Photocuring was performed at 300 mJ / cm 2 using SGHUV-UN-L042-B (manufactured by Microcraft, LED light source, wavelength 365 nm) as a light source. After that, a hot air circulation type drying oven DF610 (manufactured by Yamato Kagaku Co., Ltd.) was used as a heating device, and the main curing was performed at 150 ° C. for 60 minutes.
(3)塗布性
 実施例1~18および比較例1~4の硬化性組成物をインクジェット印刷装置CPS6151(マイクロクラフト社製)にて、硫酸処理済のエスパネックス(登録商標)M(日鉄ケミカル&マテリアル社製)の銅表面上に塗布厚20μmで塗布した。塗膜表面を目視で観察し、以下の基準で評価を行った。
(3) Coatability The curable compositions of Examples 1 to 18 and Comparative Examples 1 to 4 were sulfuric acid-treated with an inkjet printing device CPS6151 (manufactured by Microcraft Co., Ltd.) and Espanex (registered trademark) M (Nittetsu Chemical Co., Ltd.). & Material Co., Ltd.) was applied on the copper surface with a coating thickness of 20 μm. The surface of the coating film was visually observed and evaluated according to the following criteria.
 ○:均一に塗布ができており、表面が滑らかなもの
 △:全面塗布はできているが、ヘッド操作方向に対してスジが発生しているもの
 ×:塗膜の一部に抜けが発生しているもの
◯: Uniform coating and smooth surface Δ: Full coating, but streaks in the head operation direction ×: Part of the coating film is missing What is
(4)露光後反り性
 実施例1~18および比較例1~4の硬化性組成物を、インクジェット印刷装置CPS6151(マイクロクラフト社製)を用い、光硬化条件800mJ/cmにて、硫酸処理済のカプトン(登録商標)200Hまたは100H(東レ・デュポン社製)の片面に塗布した。得られた露光後塗膜の積層体を、5cmx5cm(縦×横)に切り出してサンプル(膜厚:15μm)とした。各サンプルを、露光後塗膜面を上面として30分間水平な作業台上に静置し、作業台から上昇したサンプルの四端の高さを定規で測定し、四端の高さの平均値を求めた。同様の試験をサンプルごとに3回行い、3回の試験の平均値を求め、以下の基準で評価した。
(4) Post-exposure warpage The curable compositions of Examples 1 to 18 and Comparative Examples 1 to 4 were treated with sulfuric acid under a photocuring condition of 800 mJ / cm 2 using an inkjet printing device CPS6151 (manufactured by Microcraft). It was applied to one side of Kapton (registered trademark) 200H or 100H (manufactured by Toray DuPont). The obtained laminated body of the coated film after exposure was cut out into a sample (film thickness: 15 μm) in a size of 5 cm × 5 cm (length × width). After exposure, each sample was allowed to stand on a horizontal workbench for 30 minutes with the coating surface as the upper surface, and the heights of the four edges of the sample raised from the workbench were measured with a ruler, and the average value of the heights of the four edges was measured. Asked. The same test was performed three times for each sample, and the average value of the three tests was calculated and evaluated according to the following criteria.
 ◎:四端の合計高さの平均値が5mm以下
 ○:四端の合計高さの平均値が5mm超過10mm未満
 ×:四端の合計高さの平均値が10mm以上
⊚: The average value of the total height of the four ends is 5 mm or less ○: The average value of the total height of the four ends exceeds 5 mm and less than 10 mm ×: The average value of the total height of the four ends is 10 mm or more
(5)柔軟性(MIT試験)
 実施例1~18および比較例1~4の硬化性組成物をマイクロクラフト社製CP56151にて、硫酸処理済の銅厚12μmで回路パターンが形成されているポリイミド25μmの基板上に塗布した。その後、上記「(2)硬化膜の形成条件」に従い、厚さ20μmの硬化膜を形成した。得られた硬化膜に対し、JIS P8115に基づくMIT試験(R=0.38mm)を実施し、屈曲性を評価した。
(5) Flexibility (MIT test)
The curable compositions of Examples 1 to 18 and Comparative Examples 1 to 4 were applied to a polyimide 25 μm substrate having a circuit pattern formed of a sulfuric acid-treated copper thickness of 12 μm with CP56151 manufactured by Microcraft. Then, according to the above "(2) Conditions for forming a cured film", a cured film having a thickness of 20 μm was formed. A MIT test (R = 0.38 mm) based on JIS P8115 was carried out on the obtained cured film, and the flexibility was evaluated.
 具体的には、図1に示すように、試験片1を装置に装着し、荷重F(0.5kgf)を負荷した状態で、クランプ2に試験片1を垂直に取り付けて、折り曲げ角度αが135度、速度が175cpmにて折り曲げを行い、破断するまでの往復折り曲げ回数(回)を測定した。なお、試験環境は25℃で、曲率半径はR=0.38mmとした。評価基準は以下の通りである。 Specifically, as shown in FIG. 1, the test piece 1 is mounted on the apparatus, the test piece 1 is vertically attached to the clamp 2 with the load F (0.5 kgf) applied, and the bending angle α is set. Bending was performed at 135 degrees and a speed of 175 cpm, and the number of reciprocating bends (times) until breaking was measured. The test environment was 25 ° C., and the radius of curvature was R = 0.38 mm. The evaluation criteria are as follows.
 ◎:200回以上
 ○:150~199回
 △:101~149回
 ×:100回以下
⊚: 200 times or more ○: 150 to 199 times △: 101 to 149 times ×: 100 times or less
(6)はんだ耐熱性
 実施例1~18および比較例1~4の硬化性組成物をインクジェット印刷装置CPS6151(マイクロクラフト社製)にて、光硬化条件800mJ/cmにて、硫酸処理済の銅厚12μm、ポリイミド50μmの回路パターン基板上に塗布した。その後、上記「(2)硬化膜の形成条件」に従い、厚さ20μmの硬化膜を形成した。得られた評価基板に対してロジン系フラックスを塗布し、予め260℃に設定したはんだ槽に5秒間浸漬を1回もしくは2回行い、変性アルコールでフラックスを洗浄した後、クロスカットテープピール試験を行い、硬化膜の膨れ・剥がれについて評価した。判定基準は以下のとおりである。
(6) Solder heat resistance The curable compositions of Examples 1 to 18 and Comparative Examples 1 to 4 have been treated with sulfuric acid by an inkjet printing apparatus CPS6151 (manufactured by Microcraft Co., Ltd.) under a photocuring condition of 800 mJ / cm 2 . It was applied onto a circuit pattern substrate having a copper thickness of 12 μm and a polyimide of 50 μm. Then, according to the above "(2) Conditions for forming a cured film", a cured film having a thickness of 20 μm was formed. A rosin-based flux is applied to the obtained evaluation substrate, immersed in a solder bath set at 260 ° C. in advance for 5 seconds once or twice, the flux is washed with a modified alcohol, and then a cross-cut tape peel test is performed. This was performed and the swelling and peeling of the cured film were evaluated. The judgment criteria are as follows.
 ◎:5秒×2回浸漬を行い、セロテープ(登録商標)でピール試験を行っても硬化膜に剥がれが認められない。
 ○:5秒×1回浸漬を行い、セロテープ(登録商標)でピール試験を行っても硬化膜に剥がれが認められないが、5秒×2回浸漬を行うと硬化膜に膨れ、剥がれがある
 ×:5秒×1回浸漬を行うと硬化膜に膨れ、剥がれがある。
⊚: No peeling was observed in the cured film even after soaking for 5 seconds x 2 times and performing a peel test with cellophane tape (registered trademark).
◯: No peeling was observed in the cured film even after dipping for 5 seconds x 1 time and performing a peel test with cellophane tape (registered trademark), but when immersed for 5 seconds x 2 times, the cured film swelled and peeled. X: After dipping for 5 seconds × 1 time, the cured film swells and peels off.
(7)耐溶剤性
 実施例1~18および比較例1~4の硬化性組成物をインクジェット印刷装置CPS6151(マイクロクラフト社製)にて、光硬化条件800mJ/cmにて、硫酸処理済のエスパネックス(登録商標)M(日鉄ケミカル&マテリアル社製)の銅表面上に塗布し、熱風循環式乾燥炉にて150℃、60分加熱して厚さ20μmの硬化膜を得た。硬化膜を、プロピレングリコールモノメチルアセテートに30分間浸漬した後の塗膜状態を評価した。評価基準は以下の通りである。
(7) Solvent resistance The curable compositions of Examples 1 to 18 and Comparative Examples 1 to 4 have been treated with sulfuric acid by an inkjet printing apparatus CPS6151 (manufactured by Microcraft Co., Ltd.) under a photocuring condition of 800 mJ / cm 2 . It was applied onto the copper surface of Espanex (registered trademark) M (manufactured by Nittetsu Chemical & Materials Co., Ltd.) and heated at 150 ° C. for 60 minutes in a hot air circulation type drying oven to obtain a cured film having a thickness of 20 μm. The state of the coating film after immersing the cured film in propylene glycol monomethyl acetate for 30 minutes was evaluated. The evaluation criteria are as follows.
 ○:全く変化が認められないもの
 △:ほんの僅か変化しているもの
 ×:顕著に変化しているもの
○: No change is observed △: Slightly changed ×: Significantly changed
(8)無電解金めっき耐性
 実施例1~18および比較例1~4の硬化性組成物をインクジェット印刷装置CPS6151(マイクロクラフト社製)にて、硫酸処理済の銅厚12μm、ポリイミド50μmの回路パターン基板上に塗布した。その後、上記「(2)硬化膜の形成条件」に従い、厚さ20μmの硬化膜を形成した。得られた評価基板に対し市販の無電解ニッケルめっき浴及び無電解金めっき浴を用いて、ニッケル5μm、金0.03μmの条件で金めっきを行い、硬化膜表面状態の観察を行った。評価基準は以下の通りである。
(8) Electrolytic gold plating resistance A circuit in which the curable compositions of Examples 1 to 18 and Comparative Examples 1 to 4 are treated with sulfuric acid using an inkjet printing device CPS6151 (manufactured by Microcraft) to have a copper thickness of 12 μm and a polyimide of 50 μm. It was applied on a pattern substrate. Then, according to the above "(2) Conditions for forming a cured film", a cured film having a thickness of 20 μm was formed. The obtained evaluation substrate was gold-plated using a commercially available electroless nickel plating bath and an electroless gold plating bath under the conditions of nickel 5 μm and gold 0.03 μm, and the surface condition of the cured film was observed. The evaluation criteria are as follows.
 ○:全く変化が認められないもの
 ×:顕著に白化若しくは曇りが生じたもの
○: No change is observed ×: Significant whitening or cloudiness occurs
(9)難燃性
実施例1~18および比較例1~4の硬化性組成物をインクジェット印刷装置CPS6151(マイクロクラフト社製)にて、カプトン100H(東レ・デュポン社製)上に両面塗布した。その後、上記「(2)硬化膜の形成条件」に従い、硬化膜を形成した(各面の塗膜厚さは20μmである)。得られた硬化膜についてUL94規格に準拠した薄材垂直燃焼試験を行った。評価基準は以下の通りである。
(9) Flame Retardant The curable compositions of Examples 1 to 18 and Comparative Examples 1 to 4 were coated on both sides of Kapton 100H (manufactured by Toray DuPont) using an inkjet printing device CPS6151 (manufactured by Microcraft). .. Then, a cured film was formed according to the above "(2) Conditions for forming a cured film" (the thickness of the coating film on each surface is 20 μm). The obtained cured film was subjected to a thin vertical combustion test conforming to the UL94 standard. The evaluation criteria are as follows.
 ◎:VTM-0合格し、各サンプルの燃焼時間が7秒未満のもの
 ○:VTM-0合格し、各サンプルの燃焼時間が7秒超10秒以内のもの
 Not:VTM-0不合格
⊚: VTM-0 passed and the burning time of each sample was less than 7 seconds ○: VTM-0 passed and each sample burned within 10 seconds Not: VTM-0 failed
Figure JPOXMLDOC01-appb-T000010
Figure JPOXMLDOC01-appb-T000010
 表2に示すように、本発明に係る実施例1~18は、硬化性組成物が低粘度であって、薄膜基板、特に、カプトン100Hのような特に薄い基板に塗布して露光した後でもその基盤の反りを低く抑えることができ、同時に、硬化後の塗膜は柔軟性およびはんだ耐熱性に優れていた。 As shown in Table 2, in Examples 1 to 18 according to the present invention, even after the curable composition has a low viscosity and is applied to a thin film substrate, particularly a particularly thin substrate such as Kapton 100H, and exposed to light. The warpage of the substrate could be suppressed to a low level, and at the same time, the cured coating film was excellent in flexibility and solder heat resistance.
 また、実施例1~3、15と実施例16~18との比較から、さらに(F)難燃剤を含むことで、硬化後の塗膜に難燃性を付与できることに加えて、露光後の低反り性がさらに向上した。実施例14と実施例15との比較から、(F)難燃剤がリン系難燃剤であることで、硬化後の塗膜の耐熱性がさらに向上した。
 なお、実施例16~18は難燃性の試験で不合格(Not評価)となっているが、難燃剤を含んでいないことに起因するものであり、本発明の効果を否定するものではない。
Further, from the comparison between Examples 1 to 3 and 15 and Examples 16 to 18, in addition to being able to impart flame retardancy to the cured coating film by further containing (F) a flame retardant, after exposure. The low warpage is further improved. From the comparison between Examples 14 and 15, the heat resistance of the coating film after curing was further improved because the flame retardant (F) was a phosphorus-based flame retardant.
Although Examples 16 to 18 have failed the flame retardancy test (Not evaluation), this is due to the fact that they do not contain a flame retardant, and the effect of the present invention is not denied. ..
 さらに、実施例2と実施例8との比較から、(F)難燃剤がフェノキシホスファゼンである場合に、難燃性だけでなく硬化性組成物の粘度および露光後反り性の特性を向上させることができた。 Further, from the comparison between Example 2 and Example 8, (F) when the flame retardant is phenoxyphosphazene, not only the flame retardancy but also the viscosity and the post-exposure warp property of the curable composition are improved. Was done.
 そのうえ、実施例2と実施例9との比較から、(A)/(B)の比率が175質量%より大きい場合に、硬化性組成物の粘度、露光後反り性、硬化膜の柔軟性の特性がさらに向上していることが分かった。 Moreover, from the comparison between Example 2 and Example 9, when the ratio of (A) / (B) is larger than 175% by mass, the viscosity of the curable composition, the warpage after exposure, and the flexibility of the cured film are determined. It was found that the characteristics were further improved.
 また、実施例2と実施例10との比較から、(A)/(F)の比率が49質量%よりも大きい場合に、硬化性組成物の粘度、露光後反り性、硬化膜のはんだ耐熱性の特性がさらに向上することがわかった。 Further, from the comparison between Example 2 and Example 10, when the ratio of (A) / (F) is larger than 49% by mass, the viscosity of the curable composition, the warpage after exposure, and the solder heat resistance of the cured film are obtained. It was found that the sexual characteristics were further improved.
 さらに、実施例2と実施例11との比較から、さらに(C4)芳香環を有し、(メタ)アクリロイル基を2個以上有する化合物を含む場合に、硬化膜の難燃性およびはんだ耐熱性の特性が向上し、実施例2と実施例12との比較から、さらに(C3)芳香環を有さず、(メタ)アクリロイル基を3個以上有する光硬化性化合物を含む場合に、硬化膜のはんだ耐熱性の特性が向上することがわかった。 Further, from the comparison between Example 2 and Example 11, when a compound having a (C4) aromatic ring and two or more (meth) acryloyl groups is contained, the flame retardancy and solder heat resistance of the cured film are further contained. From the comparison between Example 2 and Example 12, the cured film further contains (C3) a photocurable compound having no aromatic ring and having three or more (meth) acryloyl groups. It was found that the solder heat resistance characteristics of the solder were improved.

Claims (12)

  1.  (A)式(1)
    Figure JPOXMLDOC01-appb-C000001
    (式(1)中、Rは、直鎖状、分岐鎖状および環状のいずれでもよく、エーテル結合を含んでいてもよい炭素数1個以上4個以下の炭化水素基を示す(但し、前記炭化水素基中に置換基を有していてもよい))
    で表されるラジカル重合性モノマーと、
     (B)(メタ)アクリロイル基を2個有する光硬化性ウレタン化合物と、
     (C)(A)、(B)以外の(メタ)アクリロイル基を有する化合物と、
     (D)光重合開始剤と、
     (E)熱硬化成分と、
     を含有することを特徴とする硬化性組成物。
    (A) Equation (1)
    Figure JPOXMLDOC01-appb-C000001
    (In the formula (1), R 1 may be linear, branched or cyclic, and represents a hydrocarbon group having 1 or more and 4 or less carbon atoms which may contain an ether bond (provided that the hydrocarbon group has 1 or more and 4 or less carbon atoms). The hydrocarbon group may have a substituent)))
    The radically polymerizable monomer represented by
    (B) A photocurable urethane compound having two (meth) acryloyl groups and
    (C) Compounds having (meth) acryloyl groups other than (A) and (B), and
    (D) Photopolymerization initiator and
    (E) Thermosetting component and
    A curable composition comprising.
  2.  (F)難燃剤を含むことを特徴とする請求項1に記載の硬化性組成物。 (F) The curable composition according to claim 1, which contains a flame retardant.
  3.  (F)難燃剤に対する(B)(メタ)アクリロイル基を2個有する光硬化性ウレタン化合物の配合量が1質量%以上70質量%であることを特徴とする請求項2に記載の硬化性組成物。 (F) The curable composition according to claim 2, wherein the blending amount of the photocurable urethane compound having two (B) (meth) acryloyl groups with respect to the flame retardant is 1% by mass or more and 70% by mass. thing.
  4.  (B)(メタ)アクリロイル基を2個有する光硬化性ウレタン化合物に対する(A)式(1)で表されるラジカル重合性モノマーの配合割合が250質量%以上10,000質量%以下であることを特徴とする請求項1~3の何れか1項に記載の硬化性組成物。 (B) The mixing ratio of the radically polymerizable monomer represented by the formula (1) to the photocurable urethane compound having two (meth) acryloyl groups is 250% by mass or more and 10,000% by mass or less. The curable composition according to any one of claims 1 to 3, wherein the curable composition is characterized by.
  5.  (F)難燃剤に対する(A)式(1)で表されるラジカル重合性モノマーの配合割合が50質量%以上350質量%以下であることを特徴とする請求項2~4の何れか1項に記載の硬化性組成物。 (F) Any one of claims 2 to 4, wherein the mixing ratio of the radically polymerizable monomer represented by the formula (A) to the flame retardant is 50% by mass or more and 350% by mass or less. The curable composition according to.
  6.  (E)熱硬化成分が潜在性熱硬化成分を含むことを特徴とする請求項1~5の何れか1項に記載の硬化性組成物。 (E) The curable composition according to any one of claims 1 to 5, wherein the thermosetting component contains a latent thermosetting component.
  7.  前記潜在性熱硬化成分がブロックイソシアネート化合物であることを特徴とする請求項6に記載の硬化性組成物。 The curable composition according to claim 6, wherein the latent thermosetting component is a blocked isocyanate compound.
  8.  (F)難燃剤がリン系難燃剤であることを特徴とする請求項2~7の何れか1項に記載の硬化性組成物。 (F) The curable composition according to any one of claims 2 to 7, wherein the flame retardant is a phosphorus-based flame retardant.
  9.  前記リン系難燃剤がフェノキシホスファゼンであることを特徴とする請求項8に記載の硬化性組成物 The curable composition according to claim 8, wherein the phosphorus-based flame retardant is phenoxyphosphazene.
  10.  50℃における粘度が50mPa・s以下であることを特徴とする請求項1~9の何れか1項に記載の硬化性組成物 The curable composition according to any one of claims 1 to 9, wherein the viscosity at 50 ° C. is 50 mPa · s or less.
  11.  請求項1~10の何れか一項に記載の硬化性組成物より得られる硬化物。 A cured product obtained from the curable composition according to any one of claims 1 to 10.
  12.  請求項11に記載の硬化物を有する電子部品。 An electronic component having the cured product according to claim 11.
PCT/JP2021/043408 2020-11-30 2021-11-26 Curable composition, cured product, and electronic component WO2022114133A1 (en)

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Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013014718A (en) * 2011-07-06 2013-01-24 Nippon Shokubai Co Ltd Optical ultraviolet curing resin composition, cured material, and display device
JP2014040585A (en) * 2012-07-25 2014-03-06 Nippon Shokubai Co Ltd Photocurable composition
WO2020085166A1 (en) * 2018-10-22 2020-04-30 キヤノン株式会社 Curable resin composition and cured object obtained therefrom

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013014718A (en) * 2011-07-06 2013-01-24 Nippon Shokubai Co Ltd Optical ultraviolet curing resin composition, cured material, and display device
JP2014040585A (en) * 2012-07-25 2014-03-06 Nippon Shokubai Co Ltd Photocurable composition
WO2020085166A1 (en) * 2018-10-22 2020-04-30 キヤノン株式会社 Curable resin composition and cured object obtained therefrom

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