WO2022114133A1 - Curable composition, cured product, and electronic component - Google Patents
Curable composition, cured product, and electronic component Download PDFInfo
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- WO2022114133A1 WO2022114133A1 PCT/JP2021/043408 JP2021043408W WO2022114133A1 WO 2022114133 A1 WO2022114133 A1 WO 2022114133A1 JP 2021043408 W JP2021043408 W JP 2021043408W WO 2022114133 A1 WO2022114133 A1 WO 2022114133A1
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- curable composition
- meth
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- mass
- compound
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- 239000000203 mixture Substances 0.000 title claims abstract description 115
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 claims abstract description 86
- 150000001875 compounds Chemical class 0.000 claims abstract description 76
- -1 urethane compound Chemical class 0.000 claims abstract description 72
- 229920001187 thermosetting polymer Polymers 0.000 claims abstract description 34
- 239000000178 monomer Substances 0.000 claims abstract description 19
- 239000003999 initiator Substances 0.000 claims abstract description 15
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims abstract description 6
- 125000001424 substituent group Chemical group 0.000 claims abstract description 5
- 125000004122 cyclic group Chemical group 0.000 claims abstract description 4
- 125000001183 hydrocarbyl group Chemical group 0.000 claims abstract 5
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 claims description 40
- 239000003063 flame retardant Substances 0.000 claims description 35
- 238000002156 mixing Methods 0.000 claims description 19
- 229910052698 phosphorus Inorganic materials 0.000 claims description 16
- 125000004432 carbon atom Chemical group C* 0.000 claims description 15
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical group [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 13
- 239000011574 phosphorus Substances 0.000 claims description 13
- 239000012948 isocyanate Substances 0.000 claims description 10
- 239000010408 film Substances 0.000 abstract description 48
- 239000000758 substrate Substances 0.000 abstract description 34
- 239000010409 thin film Substances 0.000 abstract description 11
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 41
- 239000000047 product Substances 0.000 description 33
- 239000000126 substance Substances 0.000 description 22
- 125000003118 aryl group Chemical group 0.000 description 21
- 229910000679 solder Inorganic materials 0.000 description 17
- 239000002981 blocking agent Substances 0.000 description 16
- 239000011248 coating agent Substances 0.000 description 16
- 238000000576 coating method Methods 0.000 description 16
- 238000007641 inkjet printing Methods 0.000 description 15
- 238000012360 testing method Methods 0.000 description 15
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 14
- 230000000052 comparative effect Effects 0.000 description 13
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- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 12
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 description 11
- 229920000877 Melamine resin Polymers 0.000 description 10
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 10
- 238000010438 heat treatment Methods 0.000 description 10
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 9
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- 238000011156 evaluation Methods 0.000 description 8
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- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 8
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 8
- ACVYVLVWPXVTIT-UHFFFAOYSA-N phosphinic acid Chemical compound O[PH2]=O ACVYVLVWPXVTIT-UHFFFAOYSA-N 0.000 description 8
- 238000000016 photochemical curing Methods 0.000 description 8
- 229920001721 polyimide Polymers 0.000 description 8
- 238000001723 curing Methods 0.000 description 7
- 238000007747 plating Methods 0.000 description 7
- 239000005056 polyisocyanate Substances 0.000 description 7
- 229920001228 polyisocyanate Polymers 0.000 description 7
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 7
- 239000003054 catalyst Substances 0.000 description 6
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- 125000000524 functional group Chemical group 0.000 description 6
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 6
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 6
- 229940105570 ornex Drugs 0.000 description 6
- 238000007639 printing Methods 0.000 description 6
- 238000005476 soldering Methods 0.000 description 6
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 5
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 5
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 5
- 238000006243 chemical reaction Methods 0.000 description 5
- 229910052802 copper Inorganic materials 0.000 description 5
- 239000010949 copper Substances 0.000 description 5
- UHESRSKEBRADOO-UHFFFAOYSA-N ethyl carbamate;prop-2-enoic acid Chemical compound OC(=O)C=C.CCOC(N)=O UHESRSKEBRADOO-UHFFFAOYSA-N 0.000 description 5
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 239000011342 resin composition Substances 0.000 description 5
- 239000002904 solvent Substances 0.000 description 5
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical group [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- 238000005452 bending Methods 0.000 description 4
- 230000001588 bifunctional effect Effects 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 150000002148 esters Chemical class 0.000 description 4
- 125000005448 ethoxyethyl group Chemical group [H]C([H])([H])C([H])([H])OC([H])([H])C([H])([H])* 0.000 description 4
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 4
- 229910052737 gold Inorganic materials 0.000 description 4
- 239000010931 gold Substances 0.000 description 4
- 239000000976 ink Substances 0.000 description 4
- FPHBLZMNRWNJEJ-UHFFFAOYSA-N methyl 2-(prop-2-enoxymethyl)prop-2-enoate Chemical compound COC(=O)C(=C)COCC=C FPHBLZMNRWNJEJ-UHFFFAOYSA-N 0.000 description 4
- 229920003223 poly(pyromellitimide-1,4-diphenyl ether) Polymers 0.000 description 4
- 150000003254 radicals Chemical class 0.000 description 4
- 150000003839 salts Chemical class 0.000 description 4
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 4
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 3
- SDXAWLJRERMRKF-UHFFFAOYSA-N 3,5-dimethyl-1h-pyrazole Chemical compound CC=1C=C(C)NN=1 SDXAWLJRERMRKF-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 244000028419 Styrax benzoin Species 0.000 description 3
- 235000000126 Styrax benzoin Nutrition 0.000 description 3
- 235000008411 Sumatra benzointree Nutrition 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical group C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 3
- 125000002947 alkylene group Chemical group 0.000 description 3
- 229960002130 benzoin Drugs 0.000 description 3
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 3
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 3
- 235000019382 gum benzoic Nutrition 0.000 description 3
- 150000002513 isocyanates Chemical class 0.000 description 3
- 239000000463 material Substances 0.000 description 3
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- 125000004437 phosphorous atom Chemical group 0.000 description 3
- 238000006116 polymerization reaction Methods 0.000 description 3
- 238000003860 storage Methods 0.000 description 3
- RMVRSNDYEFQCLF-UHFFFAOYSA-N thiophenol Chemical compound SC1=CC=CC=C1 RMVRSNDYEFQCLF-UHFFFAOYSA-N 0.000 description 3
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 3
- PUPZLCDOIYMWBV-UHFFFAOYSA-N (+/-)-1,3-Butanediol Chemical compound CC(O)CCO PUPZLCDOIYMWBV-UHFFFAOYSA-N 0.000 description 2
- YXIWHUQXZSMYRE-UHFFFAOYSA-N 1,3-benzothiazole-2-thiol Chemical compound C1=CC=C2SC(S)=NC2=C1 YXIWHUQXZSMYRE-UHFFFAOYSA-N 0.000 description 2
- PMBXCGGQNSVESQ-UHFFFAOYSA-N 1-Hexanethiol Chemical compound CCCCCCS PMBXCGGQNSVESQ-UHFFFAOYSA-N 0.000 description 2
- LCZVSXRMYJUNFX-UHFFFAOYSA-N 2-[2-(2-hydroxypropoxy)propoxy]propan-1-ol Chemical compound CC(O)COC(C)COC(C)CO LCZVSXRMYJUNFX-UHFFFAOYSA-N 0.000 description 2
- NJWGQARXZDRHCD-UHFFFAOYSA-N 2-methylanthraquinone Chemical compound C1=CC=C2C(=O)C3=CC(C)=CC=C3C(=O)C2=C1 NJWGQARXZDRHCD-UHFFFAOYSA-N 0.000 description 2
- NDWUBGAGUCISDV-UHFFFAOYSA-N 4-hydroxybutyl prop-2-enoate Chemical compound OCCCCOC(=O)C=C NDWUBGAGUCISDV-UHFFFAOYSA-N 0.000 description 2
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 2
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 2
- KXDAEFPNCMNJSK-UHFFFAOYSA-N Benzamide Chemical compound NC(=O)C1=CC=CC=C1 KXDAEFPNCMNJSK-UHFFFAOYSA-N 0.000 description 2
- 229930185605 Bisphenol Natural products 0.000 description 2
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical group [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 2
- 229920000298 Cellophane Polymers 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical group [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- URLYGBGJPQYXBN-UHFFFAOYSA-N [4-(hydroxymethyl)cyclohexyl]methyl prop-2-enoate Chemical compound OCC1CCC(COC(=O)C=C)CC1 URLYGBGJPQYXBN-UHFFFAOYSA-N 0.000 description 2
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- 125000002723 alicyclic group Chemical group 0.000 description 2
- 125000001931 aliphatic group Chemical group 0.000 description 2
- 125000004414 alkyl thio group Chemical group 0.000 description 2
- UMLWXYJZDNNBTD-UHFFFAOYSA-N alpha-dimethylaminoacetophenone Natural products CN(C)CC(=O)C1=CC=CC=C1 UMLWXYJZDNNBTD-UHFFFAOYSA-N 0.000 description 2
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- 239000011324 bead Substances 0.000 description 2
- 239000012965 benzophenone Substances 0.000 description 2
- HQABUPZFAYXKJW-UHFFFAOYSA-N butan-1-amine Chemical compound CCCCN HQABUPZFAYXKJW-UHFFFAOYSA-N 0.000 description 2
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- 230000008859 change Effects 0.000 description 2
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- 239000004020 conductor Substances 0.000 description 2
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Chemical compound CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 2
- JQVDAXLFBXTEQA-UHFFFAOYSA-N dibutylamine Chemical compound CCCCNCCCC JQVDAXLFBXTEQA-UHFFFAOYSA-N 0.000 description 2
- 239000003085 diluting agent Substances 0.000 description 2
- 239000000539 dimer Substances 0.000 description 2
- GOJNABIZVJCYFL-UHFFFAOYSA-N dimethylphosphinic acid Chemical compound CP(C)(O)=O GOJNABIZVJCYFL-UHFFFAOYSA-N 0.000 description 2
- 238000007598 dipping method Methods 0.000 description 2
- SZXQTJUDPRGNJN-UHFFFAOYSA-N dipropylene glycol Chemical compound OCCCOCCCO SZXQTJUDPRGNJN-UHFFFAOYSA-N 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- JBKVHLHDHHXQEQ-UHFFFAOYSA-N epsilon-caprolactam Chemical compound O=C1CCCCCN1 JBKVHLHDHHXQEQ-UHFFFAOYSA-N 0.000 description 2
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 2
- 230000004907 flux Effects 0.000 description 2
- RRAMGCGOFNQTLD-UHFFFAOYSA-N hexamethylene diisocyanate Chemical compound O=C=NCCCCCCN=C=O RRAMGCGOFNQTLD-UHFFFAOYSA-N 0.000 description 2
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 125000004184 methoxymethyl group Chemical group [H]C([H])([H])OC([H])([H])* 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- IXQGCWUGDFDQMF-UHFFFAOYSA-N o-Hydroxyethylbenzene Natural products CCC1=CC=CC=C1O IXQGCWUGDFDQMF-UHFFFAOYSA-N 0.000 description 2
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- MFTPIWFEXJRWQY-UHFFFAOYSA-N phosphoric acid prop-2-enoic acid Chemical class OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OP(O)(O)=O MFTPIWFEXJRWQY-UHFFFAOYSA-N 0.000 description 2
- HNJBEVLQSNELDL-UHFFFAOYSA-N pyrrolidin-2-one Chemical compound O=C1CCCN1 HNJBEVLQSNELDL-UHFFFAOYSA-N 0.000 description 2
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- 229910052725 zinc Chemical group 0.000 description 2
- 239000011701 zinc Chemical group 0.000 description 2
- YYJIYUNJTKCRHL-UHFFFAOYSA-N (2-hydroxy-3-prop-2-enoyloxypropyl) prop-2-enoate Chemical compound C=CC(=O)OCC(O)COC(=O)C=C YYJIYUNJTKCRHL-UHFFFAOYSA-N 0.000 description 1
- HCNHNBLSNVSJTJ-UHFFFAOYSA-N 1,1-Bis(4-hydroxyphenyl)ethane Chemical compound C=1C=C(O)C=CC=1C(C)C1=CC=C(O)C=C1 HCNHNBLSNVSJTJ-UHFFFAOYSA-N 0.000 description 1
- NNNLYDWXTKOQQX-UHFFFAOYSA-N 1,1-di(prop-2-enoyloxy)propyl prop-2-enoate Chemical compound C=CC(=O)OC(CC)(OC(=O)C=C)OC(=O)C=C NNNLYDWXTKOQQX-UHFFFAOYSA-N 0.000 description 1
- XKSUVRWJZCEYQQ-UHFFFAOYSA-N 1,1-dimethoxyethylbenzene Chemical compound COC(C)(OC)C1=CC=CC=C1 XKSUVRWJZCEYQQ-UHFFFAOYSA-N 0.000 description 1
- ACRQLFSHISNWRY-UHFFFAOYSA-N 1,2,3,4,5-pentabromo-6-phenoxybenzene Chemical compound BrC1=C(Br)C(Br)=C(Br)C(Br)=C1OC1=CC=CC=C1 ACRQLFSHISNWRY-UHFFFAOYSA-N 0.000 description 1
- ORYGKUIDIMIRNN-UHFFFAOYSA-N 1,2,3,4-tetrabromo-5-(2,3,4,5-tetrabromophenoxy)benzene Chemical compound BrC1=C(Br)C(Br)=CC(OC=2C(=C(Br)C(Br)=C(Br)C=2)Br)=C1Br ORYGKUIDIMIRNN-UHFFFAOYSA-N 0.000 description 1
- MYWOJODOMFBVCB-UHFFFAOYSA-N 1,2,6-trimethylphenanthrene Chemical compound CC1=CC=C2C3=CC(C)=CC=C3C=CC2=C1C MYWOJODOMFBVCB-UHFFFAOYSA-N 0.000 description 1
- FKTHNVSLHLHISI-UHFFFAOYSA-N 1,2-bis(isocyanatomethyl)benzene Chemical compound O=C=NCC1=CC=CC=C1CN=C=O FKTHNVSLHLHISI-UHFFFAOYSA-N 0.000 description 1
- MSAHTMIQULFMRG-UHFFFAOYSA-N 1,2-diphenyl-2-propan-2-yloxyethanone Chemical compound C=1C=CC=CC=1C(OC(C)C)C(=O)C1=CC=CC=C1 MSAHTMIQULFMRG-UHFFFAOYSA-N 0.000 description 1
- VZXTWGWHSMCWGA-UHFFFAOYSA-N 1,3,5-triazine-2,4-diamine Chemical compound NC1=NC=NC(N)=N1 VZXTWGWHSMCWGA-UHFFFAOYSA-N 0.000 description 1
- RTTZISZSHSCFRH-UHFFFAOYSA-N 1,3-bis(isocyanatomethyl)benzene Chemical class O=C=NCC1=CC=CC(CN=C=O)=C1 RTTZISZSHSCFRH-UHFFFAOYSA-N 0.000 description 1
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- YHMYGUUIMTVXNW-UHFFFAOYSA-N 1,3-dihydrobenzimidazole-2-thione Chemical compound C1=CC=C2NC(S)=NC2=C1 YHMYGUUIMTVXNW-UHFFFAOYSA-N 0.000 description 1
- OVBFMUAFNIIQAL-UHFFFAOYSA-N 1,4-diisocyanatobutane Chemical compound O=C=NCCCCN=C=O OVBFMUAFNIIQAL-UHFFFAOYSA-N 0.000 description 1
- SBJCUZQNHOLYMD-UHFFFAOYSA-N 1,5-Naphthalene diisocyanate Chemical compound C1=CC=C2C(N=C=O)=CC=CC2=C1N=C=O SBJCUZQNHOLYMD-UHFFFAOYSA-N 0.000 description 1
- VZXPHDGHQXLXJC-UHFFFAOYSA-N 1,6-diisocyanato-5,6-dimethylheptane Chemical compound O=C=NC(C)(C)C(C)CCCCN=C=O VZXPHDGHQXLXJC-UHFFFAOYSA-N 0.000 description 1
- BOCJQSFSGAZAPQ-UHFFFAOYSA-N 1-chloroanthracene-9,10-dione Chemical compound O=C1C2=CC=CC=C2C(=O)C2=C1C=CC=C2Cl BOCJQSFSGAZAPQ-UHFFFAOYSA-N 0.000 description 1
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 1
- RHNJVKIVSXGYBD-UHFFFAOYSA-N 10-prop-2-enoyloxydecyl prop-2-enoate Chemical compound C=CC(=O)OCCCCCCCCCCOC(=O)C=C RHNJVKIVSXGYBD-UHFFFAOYSA-N 0.000 description 1
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- GDVKFRBCXAPAQJ-UHFFFAOYSA-A dialuminum;hexamagnesium;carbonate;hexadecahydroxide Chemical compound [OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Al+3].[Al+3].[O-]C([O-])=O GDVKFRBCXAPAQJ-UHFFFAOYSA-A 0.000 description 1
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- 238000007865 diluting Methods 0.000 description 1
- 150000002009 diols Chemical class 0.000 description 1
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- VFHVQBAGLAREND-UHFFFAOYSA-N diphenylphosphoryl-(2,4,6-trimethylphenyl)methanone Chemical compound CC1=CC(C)=CC(C)=C1C(=O)P(=O)(C=1C=CC=CC=1)C1=CC=CC=C1 VFHVQBAGLAREND-UHFFFAOYSA-N 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- ODQWQRRAPPTVAG-GZTJUZNOSA-N doxepin Chemical compound C1OC2=CC=CC=C2C(=C/CCN(C)C)/C2=CC=CC=C21 ODQWQRRAPPTVAG-GZTJUZNOSA-N 0.000 description 1
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- 125000001033 ether group Chemical group 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- 125000003754 ethoxycarbonyl group Chemical group C(=O)(OCC)* 0.000 description 1
- 125000005745 ethoxymethyl group Chemical group [H]C([H])([H])C([H])([H])OC([H])([H])* 0.000 description 1
- ORBFAMHUKZLWSD-UHFFFAOYSA-N ethyl 2-(dimethylamino)benzoate Chemical compound CCOC(=O)C1=CC=CC=C1N(C)C ORBFAMHUKZLWSD-UHFFFAOYSA-N 0.000 description 1
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- 125000004705 ethylthio group Chemical group C(C)S* 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 1
- 150000002366 halogen compounds Chemical class 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- XXMIOPMDWAUFGU-UHFFFAOYSA-N hexane-1,6-diol Chemical compound OCCCCCCO XXMIOPMDWAUFGU-UHFFFAOYSA-N 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 229960001545 hydrotalcite Drugs 0.000 description 1
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- 150000003949 imides Chemical class 0.000 description 1
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- 230000006872 improvement Effects 0.000 description 1
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- 239000004615 ingredient Substances 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- NIMLQBUJDJZYEJ-UHFFFAOYSA-N isophorone diisocyanate Chemical compound CC1(C)CC(N=C=O)CC(C)(CN=C=O)C1 NIMLQBUJDJZYEJ-UHFFFAOYSA-N 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 150000003951 lactams Chemical class 0.000 description 1
- VTHJTEIRLNZDEV-UHFFFAOYSA-L magnesium dihydroxide Chemical compound [OH-].[OH-].[Mg+2] VTHJTEIRLNZDEV-UHFFFAOYSA-L 0.000 description 1
- 239000000347 magnesium hydroxide Substances 0.000 description 1
- 229910001862 magnesium hydroxide Inorganic materials 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
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- WDWDWGRYHDPSDS-UHFFFAOYSA-N methanimine Chemical compound N=C WDWDWGRYHDPSDS-UHFFFAOYSA-N 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
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- 229940057867 methyl lactate Drugs 0.000 description 1
- RMJCJLHZCBFPDN-UHFFFAOYSA-N methyl(phenyl)phosphinic acid Chemical compound CP(O)(=O)C1=CC=CC=C1 RMJCJLHZCBFPDN-UHFFFAOYSA-N 0.000 description 1
- SZTJCIYEOQYVED-UHFFFAOYSA-N methyl(propyl)phosphinic acid Chemical compound CCCP(C)(O)=O SZTJCIYEOQYVED-UHFFFAOYSA-N 0.000 description 1
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- 125000002816 methylsulfanyl group Chemical group [H]C([H])([H])S[*] 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
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- PULCKIYKBGOTTG-UHFFFAOYSA-N n-(2,4-dimethylpentan-3-ylidene)hydroxylamine Chemical compound CC(C)C(=NO)C(C)C PULCKIYKBGOTTG-UHFFFAOYSA-N 0.000 description 1
- GKTNLYAAZKKMTQ-UHFFFAOYSA-N n-[bis(dimethylamino)phosphinimyl]-n-methylmethanamine Chemical group CN(C)P(=N)(N(C)C)N(C)C GKTNLYAAZKKMTQ-UHFFFAOYSA-N 0.000 description 1
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- LXTZRIBXKVRLOA-UHFFFAOYSA-N padimate a Chemical compound CCCCCOC(=O)C1=CC=C(N(C)C)C=C1 LXTZRIBXKVRLOA-UHFFFAOYSA-N 0.000 description 1
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- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 1
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- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- BOQSSGDQNWEFSX-UHFFFAOYSA-N propan-2-yl 2-methylprop-2-enoate Chemical compound CC(C)OC(=O)C(C)=C BOQSSGDQNWEFSX-UHFFFAOYSA-N 0.000 description 1
- RLUCXJBHKHIDSP-UHFFFAOYSA-N propane-1,2-diol;propanoic acid Chemical compound CCC(O)=O.CC(O)CO RLUCXJBHKHIDSP-UHFFFAOYSA-N 0.000 description 1
- 125000001501 propionyl group Chemical group O=C([*])C([H])([H])C([H])([H])[H] 0.000 description 1
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- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 125000006239 protecting group Chemical group 0.000 description 1
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- 230000008961 swelling Effects 0.000 description 1
- WMXCDAVJEZZYLT-UHFFFAOYSA-N tert-butylthiol Chemical compound CC(C)(C)S WMXCDAVJEZZYLT-UHFFFAOYSA-N 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- 239000002562 thickening agent Substances 0.000 description 1
- DVKJHBMWWAPEIU-UHFFFAOYSA-N toluene 2,4-diisocyanate Chemical compound CC1=CC=C(N=C=O)C=C1N=C=O DVKJHBMWWAPEIU-UHFFFAOYSA-N 0.000 description 1
- RUELTTOHQODFPA-UHFFFAOYSA-N toluene 2,6-diisocyanate Chemical compound CC1=C(N=C=O)C=CC=C1N=C=O RUELTTOHQODFPA-UHFFFAOYSA-N 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- KHPCPRHQVVSZAH-UHFFFAOYSA-N trans-cinnamyl beta-D-glucopyranoside Natural products OC1C(O)C(O)C(CO)OC1OCC=CC1=CC=CC=C1 KHPCPRHQVVSZAH-UHFFFAOYSA-N 0.000 description 1
- 150000003918 triazines Chemical class 0.000 description 1
- YFDSDPIBEUFTMI-UHFFFAOYSA-N tribromoethanol Chemical compound OCC(Br)(Br)Br YFDSDPIBEUFTMI-UHFFFAOYSA-N 0.000 description 1
- 239000013638 trimer Substances 0.000 description 1
- 125000000026 trimethylsilyl group Chemical group [H]C([H])([H])[Si]([*])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 230000002087 whitening effect Effects 0.000 description 1
- 150000007964 xanthones Chemical class 0.000 description 1
- 125000002256 xylenyl group Chemical class C1(C(C=CC=C1)C)(C)* 0.000 description 1
- 239000001060 yellow colorant Substances 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
- C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
- C08F290/06—Polymers provided for in subclass C08G
Definitions
- the present invention relates to a curable composition, a cured product and an electronic component, and more particularly to a curable composition suitable for inkjet printing, the cured product thereof and an electronic component having the cured product thereof.
- a photocurable composition that can be applied onto a circuit board by inkjet printing is also required from the viewpoint of shortening the manufacturing process of electronic components.
- the substrate After applying such a photocurable composition to a polyimide substrate having a circuit and exposing it to light, the substrate tends to warp. If the substrate is warped in this way, there is a possibility that the photocurable composition cannot be applied to an appropriate position when the second layer is applied (overcoating). Further, if the substrate is warped, it may come into contact with the inkjet head. After that, when the coating film is thermally cured, the substrate is further warped. Therefore, it is necessary to suppress the warp of the photocurable composition for inkjet printing after exposure.
- Patent Document 1 discloses a transparent resin composition for forming an insulating film used for inkjet printing, which has excellent bending resistance and coating film strength.
- the present invention has been made in view of the above problems, and provides a curable composition having flexibility suitable for a thin film substrate such as a flexible wiring board, low warpage after exposure, and heat resistance.
- a curable composition having flexibility suitable for a thin film substrate such as a flexible wiring board, low warpage after exposure, and heat resistance. The purpose.
- the present inventors have made diligent studies to achieve the above object.
- the composition containing the photocurable compound, the photopolymerization initiator, and the thermosetting component the light having two (meth) acryloyl groups and the compound represented by the following general formula (1) as the photocurable compound. It has been found that by containing a curable urethane compound, a curable composition having low warpage, flexibility and heat resistance of the coated substrate after exposure can be obtained, and the present invention has been completed.
- R 1 may be linear, branched or cyclic, and represents a hydrocarbon group having 1 or more and 4 or less carbon atoms which may contain an ether bond (provided that the hydrocarbon group has 1 or more and 4 or less carbon atoms).
- the hydrocarbon group may have a substituent))))))))))))))))))))))))))))))))))))))))))))))))))))))))))))))))))))))))))))))))))))))))))))))))))))))))))) The radically polymerizable monomer represented by (B) A photocurable urethane compound having two (meth) acryloyl groups and (C) Compounds having (meth) acryloyl groups other than (A) and (B), and (D) Photopolymerization initiator and (E) Thermosetting component and It was found to be achieved by a curable composition characterized by containing.
- the compounding amount of the photocurable urethane compound having two (B) (meth) acryloyl groups with respect to (F) the flame retardant is 1% by mass or more and 70% by mass or less. It is preferable to have
- the mixing ratio of the radically polymerizable monomer represented by the formula (1) to the photocurable urethane compound having two (B) (meth) acryloyl groups is 250% by mass or more and 10,000% by mass or less. It is preferable to have.
- the mixing ratio of the radically polymerizable monomer represented by the formula (A) to the flame retardant (F) is 50% by mass or more and 350% by mass or less.
- the (E) thermosetting component contains a latent thermosetting component, and it is further preferable that the latent thermosetting component is a blocked isocyanate compound.
- the (F) flame retardant is a phosphorus-based flame retardant, and it is further preferable that the phosphorus-based flame retardant is phenoxyphosphazene.
- the curable composition has a viscosity of 50 mPa ⁇ s or less at 50 ° C.
- the above object of the present invention can also be achieved by a cured product obtained from the curable composition of the present invention and an electronic component having the cured product.
- the curable composition of the present invention has a low viscosity and can suppress the warp of the thin film substrate after being applied to and exposed to the thin film substrate to a low level. Further, the cured coating film has excellent heat resistance, and has both low warpage and flexibility.
- the curable composition of the present invention is (A) Equation (1) (In the formula (1), R 1 may be linear, branched or cyclic, and represents a hydrocarbon group having 1 or more and 4 or less carbon atoms which may contain an ether bond (provided that the hydrocarbon group has 1 or more and 4 or less carbon atoms).
- the hydrocarbon group may have a substituent))))
- the radically polymerizable monomer of formula (A) (1) contained in the curable composition of the present invention is, for example, the following formula a):.
- R 1 is the same as R 1 in formula (1)
- X ⁇ indicates an initiator radical or a growth radical), so that the polymerization reaction proceeds while cyclizing. It is possible to form a main clavicle with a 5-membered ring ether structure having methylene radicals arranged on both sides as a repeating unit.
- Examples of the hydrocarbon group having 1 or more and 4 or less carbon atoms include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, a sec-butyl group, a tert-butyl group and a vinyl group.
- Examples thereof include an allyl group, a metalyl group, a crotyl group, a cyclopropyl group, a cyclobutyl group, a methoxymethyl group, a methoxyethyl group, an ethoxymethyl group, an ethoxyethyl group and a vinyloxyethyl group.
- substituents examples include a chain unsaturated hydrocarbon group such as a vinyl group, an allyl group, a metallicyl group and a crotyl group; an alkoxy group such as a methoxy group, an ethoxy group and a methoxyethoxy group; a methylthio group and an ethylthio group.
- Alkylthio group acyl group such as acetyl group and propionyl group; acyloxy group such as acetyloxy group and propionyloxy group; alkoxycarbonyl group such as methoxycarbonyl group and ethoxycarbonyl group; alkylthio such as methylthiocarbonyl group and ethylthiocarbonyl group Examples thereof include a carbonyl group; a halogen atom such as a fluorine atom, a chlorine atom, a bromine atom and an iodine atom; a ureido group; an amide group; a cyano group; a hydroxyl group; and a trimethylsilyl group.
- acyl group such as acetyl group and propionyl group
- acyloxy group such as acetyloxy group and propionyloxy group
- alkoxycarbonyl group such as methoxycarbonyl group and ethoxycarbon
- R 1 reduces the viscosity of the radically polymerizable monomer of the formula (A) (1) and the viscosity of the radically polymerizable monomer of the formula (A) (1), thereby lowering the viscosity of the curable composition.
- a chain saturated hydrocarbon group having 1 to 4 carbon atoms a chain unsaturated hydrocarbon group having 1 to 4 carbon atoms and a hydrocarbon having an ether bond having 1 to 4 carbon atoms.
- a hydrogen group is preferable, and a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, a sec-butyl group, a tert-butyl group, an allyl group, a metalyl group, a crotyl group, a methoxyethyl group and an ethoxyethyl group.
- And vinyloxyethyl groups are more preferable, and chains having 1 or more and 4 or less carbon atoms such as methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, sec-butyl group, and tert-butyl group.
- Saturated hydrocarbon groups are even more preferred, methyl, ethyl, n-propyl, isopropyl and tert-butyl groups are even more preferred, and methyl and ethyl groups are particularly preferred.
- Examples of the radically polymerizable monomer of the formula (A) (1) include methyl ⁇ -allyloxymethylacrylate, ethyl ⁇ -allyloxymethylacrylate, n-propyl ⁇ -allyloxymethylacrylate, and ⁇ -allyloxy.
- ⁇ -allyl oxymethyl acrylate sec-butyl ⁇ -allyl oxymethyl acrylate tert-butyl
- ⁇ -allyl oxymethyl acrylate allyl ⁇ -allyl oxymethyl acrylate methallyl, ⁇ -allyl oxymethyl acrylate crotyl, methoxyethyl ⁇ -allyl oxymethyl acrylate, ethoxyethyl ⁇ -allyl oxymethyl acrylate, glycidyl ⁇ -allyl oxymethyl acrylate, vinyl oxyethyl ⁇ -allyl oxymethyl acrylate are preferable, and more preferably ⁇ -allyl oxymethyl.
- Methyl acrylate, ethyl ⁇ -allyl oxymethyl acrylate, n-propyl ⁇ -allyl oxymethyl acrylate, isopropyl ⁇ -allyl oxymethyl acrylate, n-butyl ⁇ -allyl oxymethyl acrylate, ⁇ -allyl oxymethyl acrylic Sect-butyl acid and tert-butyl ⁇ -allyloxymethylacrylate are preferred, with methyl ⁇ -allyloxymethylacrylate, ethyl ⁇ -allyloxymethylacrylate, n-propyl ⁇ -allyloxymethylacrylate, and ⁇ -allyl.
- Isopropyl oxymethyl acrylate and tert-butyl ⁇ -allyl oxymethyl acrylate are more preferred, and methyl ⁇ -allyl oxymethyl acrylate and ethyl ⁇ -allyl oxymethyl acrylate are even more preferred.
- the radically polymerizable monomer of the formula (A) (1) can be adjusted according to, for example, the methods described in JP-A-2014-040585, JP-A-2011-137123, and the like.
- the mixing ratio of the radically polymerizable monomer of the formula (A) (1) is preferably 250% by mass or more and 10,000% by mass with respect to the photocurable urethane compound having two (meth) acryloyl groups described later (B). % Or less, and particularly preferably 300% by mass or more and 5000% by mass or less. Within the above range, the curable resin composition is excellent in low warpage after exposure while maintaining a low viscosity.
- the mixing ratio of the radically polymerizable monomer of the formula (A) (1) is preferably 50 with respect to the flame retardant (F) when the curable composition contains the flame retardant (F) described later. It is by mass% or more and 350% by mass or less, and particularly preferably 65% by mass or more and 250% by mass or less. Within the above range, the curable resin composition is excellent in low warpage and flame retardancy after exposure while maintaining a low viscosity.
- the curable composition of the present invention contains (B) a photocurable urethane compound having two (meth) acryloyl groups.
- the photocurable urethane compound having two (meth) acryloyl groups gives flexibility to the cured product of the curable composition of the present invention, and is applied to a thin film substrate and exposed to the substrate. Suppress warpage.
- (B) As the photocurable urethane compound having two (meth) acryloyl groups a photocurable urethane compound having two (meth) acryloyl groups and having one or less (meth) acryloyl groups was used. It has excellent properties such as heat resistance and flexibility compared to the case, and has lower warpage and flexibility after exposure compared to the case of using a photocurable urethane compound having 3 or more (meth) acryloyl groups. Excellent.
- the photocurable urethane compound having two (B) (meth) acryloyl groups has a viscosity of 20,000 mPa ⁇ s or less at 25 ° C. It is preferable, and it is particularly preferable that it is 15,000 mPa ⁇ s or less.
- the viscosity is 100 rpm, 30 seconds value according to the viscosity measurement method using a 10 cone-plate type rotational viscometer of JIS Z8803: 2011, and a cone plate type viscosity using 1 ° 34'x R24 as a cone rotor. It is a value measured by a meter (TVE-33H, manufactured by Toki Sangyo Co., Ltd.).
- the photocurable urethane compound having two (B) (meth) acryloyl groups has a weight average molecular weight (Mw) of 6,000 or less. It is preferably 2,000 or less, and particularly preferably 2,000 or less.
- Examples of the photocurable urethane compound having two (meth) acryloyl groups include UA-112P, UA-4200, UA-4400, UA-160TM, UA-122P, UA-W2, (above, new).
- the blending ratio of the photocurable urethane compound having two (meth) acryloyl groups is, for example, 0.1 to 30% by mass, preferably 0.5 to 20% by mass, based on the entire curable resin composition. Is.
- the compounding ratio of the photocurable urethane compound having two (meth) acryloyl groups is 1% by mass or more and 70% by mass or less with respect to (F) the flame retardant when (F) the flame retardant is contained. It is preferably 10% by mass or more and 50% by mass or less, and particularly preferably 10% by mass or more and 40% by mass or less.
- the curable composition of the present invention contains a compound having a (meth) acryloyl group other than (C), (A) and (B).
- C A compound having a (meth) acryloyl group other than (A) and (B) is a component that is cured after exposure and incorporated into a cured product.
- a compound having a (meth) acryloyl group other than (C) (A) and (B) may be abbreviated as "a compound having a (C) (meth) acryloyl group”.
- the compound having a (meth) acryloyl group has a (meth) acryloyl group as a photopolymerizable group.
- the (meth) acryloyl group is a general term for an acryloyl group and a meta-acryloyl group.
- a compound having a (meth) acryloyl group has one or more (meth) acryloyl groups, and optionally has a functional group such as a hydroxyl group, an ether bond, a ketone, an aromatic ring, or a heterocycle, or a structural portion. May have.
- a functional group such as a hydroxyl group, an ether bond, a ketone, an aromatic ring, or a heterocycle, or a structural portion. May have.
- compounds having a (C) (meth) acryloyl group that can be contained in the curable composition of the present invention will be exemplified, but the compound having a (C) (meth) acryloyl group is limited to this exemplified compound. It's not a thing.
- a compound having one (meth) acryloyl group includes, for example, a compound having one (C1) (meth) acryloyl group.
- the compound having one (meth) acryloyl group preferably has, for example, a specific functional group (preferably a hydroxyl group) other than the (meth) acryloyl group.
- the compound having one (C1) (meth) acryloyl group has the specific functional group
- the compound having one (C1) (meth) acryloyl group is a cured product after exposure to the curable composition of the present invention.
- the specific functional group can be introduced into the cured product.
- various physical properties of the cured product can be further improved.
- the compound having one (C1) (meth) acryloyl group is more preferably a compound having a (meth) acryloyl group and a hydroxyl group, and the compound having a (meth) acryloyl group and a hydroxyl group is the curability of the present invention.
- the adhesion between the obtained cured film and the conductor and the substrate is improved.
- Examples of the compound having a (meth) acryloyl group and a hydroxyl group include 2-hydroxy-3-acryloyloxypropyl (meth) acrylate, 2-hydroxy-3-phenoxyethyl (meth) acrylate, and 1,4-cyclohexanedimethanol mono (meth).
- Aronix M-5700 (trade name manufactured by Toagosei Co., Ltd.), 4HBA, 2HEA, CHDMMA (above, trade name manufactured by Kyoeisha Chemical Co., Ltd.), BHEA, HPA, HEMA, HPMA (above, manufactured by Nippon Catalyst Co., Ltd.).
- Product name light ester HO, light ester HOP, light ester HOA (above, product name manufactured by Kyoeisha Chemical Co., Ltd.) and the like.
- the compound having a (meth) acryloyl group and a hydroxyl group can be used alone or in combination of two or more.
- 2-hydroxy-3-acryloyloxypropyl acrylate 2-hydroxy-3-phenoxyethyl acrylate, 2-hydroxyethyl acrylate, 2-hydroxypropyl acrylate, 4-hydroxybutyl acrylate, 1,4-cyclohexanedimethanol Monoacrylate is preferably used.
- a compound having no aromatic ring is preferably used.
- the blending amount thereof is preferably 1 part by mass or more per 100 parts by mass of the curable composition of the present invention. It is 15 parts by mass or less, more preferably 1 part by mass or more and 10 parts by mass or less, and particularly preferably 2 parts by mass or more and 5 parts by mass or less. It was
- the compound having (C) (meth) acryloyl group includes, for example, a compound having two (C2) (meth) acryloyl groups.
- a compound having two (meth) acryloyl groups is preferably a photocurable diluent, that is, a curing composition that is diluted to contribute to a decrease in viscosity, and is cured after exposure to become a cured product. It is an ingredient to be incorporated.
- the viscosity at 50 ° C. is less than 50 mPa ⁇ s from the viewpoint of diluting the curable composition of the present invention to reduce the viscosity.
- the viscosity at 50 ° C. is preferably less than 30 mPa ⁇ s, and particularly preferably the viscosity at 50 ° C. is 15 mPa ⁇ s or less.
- Examples of the compound having two (C2) (meth) acryloyl groups having a viscosity at 50 ° C. of less than 50 mPa ⁇ s include a bifunctional (meth) acryloyl group-containing monomer which is an ester of alkylene glycol and (meth) acrylic acid. Can be mentioned.
- the alkylene glycol may be a monoalkylene glycol or one having a repeating structure of two or more alkylene glycols.
- Examples of the monoalkylene glycol include linear or branched alkylene diols having 3 to 16 carbon atoms, preferably 6 to 9 carbon atoms.
- Examples of those having a repeating structure of two or more alkylene glycols include diethylene glycol, dipropylene glycol, dibutylene glycol, triethylene glycol, tripropylene glycol, and tributylene glycol.
- examples of the compound having two (C2) (meth) acryloyl groups having a viscosity at 50 ° C. of less than 50 mPa ⁇ s include diethylene glycol di (meth) acrylate, dipropylene glycol di (meth) acrylate, and dibutylene glycol.
- Di (meth) acrylate triethylene glycol di (meth) acrylate, tripropylene glycol di (meth) acrylate, tributylene glycol di (meth) acrylate, 1,3-butylene glycol di (meth) acrylate, 1,4-butane
- Examples thereof include diol di (meth) acrylate, 1,6-hexanediol di (meth) acrylate, 1,9-nonane diol acrylate, 1,10-decane diol diacrylate, and 1,16-hexadecane diol diacrylate.
- the blending amount thereof is the curable composition 100 of the present invention.
- the mass part for example, it is 2 parts by mass or more and 50 parts by mass or less, preferably 6 parts by mass or more and 40 parts by mass or less, and more preferably 10 parts by mass or more and 30 parts by mass or less.
- the blending amount of the compound having two (C2) (meth) acryloyl groups having a viscosity of less than 50 mPa ⁇ s at 50 ° C. is 2 parts by mass or more and 50 parts by mass or less with respect to 100 parts by mass of the curable composition of the present invention. By doing so, the viscosity of the curable composition can be maintained at a low viscosity, and the compound having two (C2) (meth) acryloyl groups having a viscosity of less than 50 mPa ⁇ s at 50 ° C. after photocuring, that is, exposure can be used. It will be incorporated into the cured product.
- a compound having no aromatic ring and having three or more (meth) acryloyl groups (C) A compound having a (meth) acryloyl group is, for example, a compound having no (C3) aromatic ring and having (meth) acryloyl. Contains compounds having 3 or more groups.
- the curable composition of the present invention contains a compound having (C3) no aromatic ring and having three or more (meth) acryloyl groups, the curable composition of the present invention is exposed while suppressing an increase in viscosity. The curability of time is further improved.
- Examples of the compound having no aromatic ring and having three or more (meth) acryloyl groups include trimethylolpropane triacrylate, trimethylolmethane triacrylate, ethylene oxide-modified trimethylolpropane triacrylate, and propylene oxide-modified trimethylol.
- the compound having three or more (meth) acryloyl groups may be a multi-branched oligomer or polymer. It was
- the blending amount thereof is 100 parts by mass of the curable composition of the present invention. It is preferably 1 part by mass or more and 40 parts by mass or less, and more preferably 5 parts by mass or more and 20 parts by mass or less.
- a compound having an aromatic ring and having two or more (meth) acryloyl groups (C) A compound having a (meth) acryloyl group is, for example, having a (C4) aromatic ring and having a (meth) acryloyl group. Contains compounds having two or more.
- the curable composition of the present invention contains a compound having a (C4) aromatic ring and two or more (meth) acryloyl groups
- the curability at the time of exposure is further improved, and the compound forms an aromatic ring.
- the compound having (C4) an aromatic ring and having two or more (meth) acryloyl groups has a relatively high viscosity because it contains an aromatic ring (that is, the viscosity at 50 ° C. is 50 mPa ⁇ s or more). Will be).
- the number of (meth) acryloyl groups in one molecule of this compound is two.
- Examples of the compound having a (C4) aromatic ring and two or more (meth) acryloyl groups include (meth) acrylate of a polyhydric phenol and an alkylene oxide adduct thereof.
- polyvalent phenol examples include bisphenol A, bisphenol AP, bisphenol B, bisphenol BP, bisphenol E, bisphenol F, bisphenol M, bisphenol P, bisphenol PH, bisphenol Z and other bisphenols, and biphenol.
- alkylene oxide examples include ethylene oxide, propylene oxide, and butylene oxide.
- the number of alkylene oxides added is preferably 6 or less.
- (C4) Commercially available products of compounds having an aromatic ring and having two or more (meth) acryloyl groups include ABE-300 (manufactured by Shin Nakamura Chemical Industry Co., Ltd.), BPE-80N (manufactured by Shin Nakamura Chemical Industry Co., Ltd.), and the like.
- BPE-100 (manufactured by Shin Nakamura Chemical Industry Co., Ltd.), A-BPE-4 (manufactured by Shin Nakamura Chemical Industry Co., Ltd.), BPE-4 (manufactured by Daiichi Kogyo Seiyaku Co., Ltd.), BPE-10 (manufactured by Daiichi Kogyo Seiyaku Co., Ltd.) ), A-BPE-10 (manufactured by Daiichi Kogyo Seiyaku Co., Ltd.), BPE-200 (manufactured by Shin Nakamura Chemical Industry Co., Ltd.), EBECRYL 150 (manufactured by Daicel Ornex Co., Ltd.) and the like.
- the blending amount thereof is 100 parts by mass of the curable composition of the present invention. On the other hand, it is preferably 1 part by mass or more and 40 parts by mass or less, and more preferably 5 parts by mass or more and 20 parts by mass or less.
- the curable composition of the present invention preferably contains a compound having two (C2) (meth) acryloyl groups as a compound having (meth) acryloyl groups other than (C), (A) and (B).
- a compound having two (C2) (meth) acryloyl groups having a viscosity at 50 ° C. of less than 50 mPa ⁇ s.
- any compound that generates radicals by light, a laser, an electron beam, or the like and initiates a radical polymerization reaction can be used.
- the (D) photopolymerization initiator include benzoin and benzoin alkyl ethers such as benzoin, benzoin methyl ether, benzoin ethyl ether, and benzoin isopropyl ether; acetophenone, 2,2-dimethoxy-2-phenylacetophenone, 2, Acetophenones such as 2-diethoxy-2-phenylacetophenone and 1,1-dichloroacetophenone; 2-methyl-1- [4- (methylthio) phenyl] -2-morpholinopropane-1-one, 2-benzyl-2- Aminoacetophenones such as dimethylamino-1- (4-morpholinophenyl) -butane-1-one, N, N-dimethyl
- the above (D) photopolymerization initiator can be used alone or in combination of two or more.
- light such as tertiary amines such as N, N-dimethylaminobenzoic acid ethyl ester, N, N-dimethylaminobenzoic acid isoamyl ester, pentyl-4-dimethylaminobenzoate, triethylamine, and triethanolamine.
- Initiating aids can be used.
- a titanosen compound of Omnirad 784 or the like (manufactured by IGM Resins B.V.), which has an absorption wavelength in the visible light region, can also be added as the (D) photopolymerization initiator in order to promote the photocuring reaction.
- the components to be added as the photopolymerization initiator are not limited to these, but those that absorb light in the ultraviolet light or visible light region to initiate radical polymerization of ethylenically unsaturated groups such as (meth) acryloyl groups.
- the blending amount of the photopolymerization initiator (D) is preferably 0.2 parts by mass or more and 15 parts by mass or less, and more preferably 1 part by mass or more and 8 parts by mass with respect to 100 parts by mass of the curable composition of the present invention. It is less than a part.
- the curable composition of the present invention contains (E) a thermosetting component.
- a thermosetting component in addition to coating of a curable composition, low warpage of the substrate after exposure and flame retardancy of the cured film, functionality such as heat resistance and plating resistance of the cured film can be obtained. It can be further improved.
- thermosetting component for example, a known compound such as a blocked isocyanate compound, an epoxy compound, or an oxetane compound can be used.
- the (E) thermosetting component contains a latent thermosetting component in which the functional group in the structure is protected by a protecting group.
- a latent thermosetting component By including such a latent thermosetting component, it is possible to suppress an unintended reaction in the curable composition due to unforeseen conditions and enhance the storage stability of the curable composition.
- the curable composition is also excellent in inkjet printability at 50 ° C., and when a reaction is desired, it can be easily deprotected by heating or the like to activate the thermosetting component.
- the potential means a property that does not show activity at room temperature or a little heating condition, but is activated by heating at a high temperature of 80 ° C. or higher and shows thermosetting property.
- the latent thermosetting component is a blocked isocyanate compound.
- the blocked isocyanate compound is preferably a compound having a plurality of blocked isocyanate groups in one molecule.
- the blocked isocyanate group is a group in which the isocyanate group is protected by the reaction with the blocking agent and is temporarily inactivated, and when heated to a predetermined temperature, the blocking agent is dissociated to generate an isocyanate group. do.
- polyisocyanate compound having a plurality of isocyanate groups for example, aromatic polyisocyanate, aliphatic polyisocyanate or alicyclic polyisocyanate is used.
- aromatic polyisocyanate examples include 4,4'-diphenylmethane diisocyanate, 2,4-tolylene diisocyanate, 2,6-tolylene diisocyanate, naphthalene-1,5-diisocyanate, o-xylylene diisocyanate, and the like.
- aromatic polyisocyanate examples include 4,4'-diphenylmethane diisocyanate, 2,4-tolylene diisocyanate, 2,6-tolylene diisocyanate, naphthalene-1,5-diisocyanate, o-xylylene diisocyanate, and the like.
- examples thereof include m-xylylene diisocyanate and 2,4-tolylene dimer.
- aliphatic polyisocyanate examples include tetramethylene diisocyanate, hexamethylene diisocyanate, methylene diisocyanate, trimethylhexamethylene diisocyanate, 4,4-methylene bis (cyclohexyl isocyanate) and isophorone diisocyanate.
- alicyclic polyisocyanate examples include bicycloheptane triisocyanate.
- the adduct form, the burette form, the isocyanurate form and the like of the isocyanate compounds mentioned above can be mentioned.
- isocyanate blocking agent examples include phenolic blocking agents such as phenol, cresol, xylenol, chlorophenol and ethylphenol; lactam blocking agents such as ⁇ -caprolactam, ⁇ -palerolactam, ⁇ -butyrolactam and ⁇ -propiolactam; Active oxime-based blocking agents such as ethyl acetoacetate and acetylacetone; methanol, ethanol, propanol, butanol, amyl alcohol, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monobutyl ether, diethylene glycol monomethyl ether, propylene glycol monomethyl ether, benzyl.
- phenolic blocking agents such as phenol, cresol, xylenol, chlorophenol and ethylphenol
- lactam blocking agents such as ⁇ -caprolactam, ⁇ -palerolactam, ⁇ -butyrolact
- Alcohol-based blocking agents such as ether, methyl glycolate, butyl glycolate, diacetone alcohol, methyl lactate and ethyl lactate; oxime-based blocking agents such as formaldehyde xim, acetoaldoxime, acetoxime, methylethylketoxim, diacetylmonooxime and cyclohexaneoxime.
- Mercaptan-based blocking agents such as butyl mercaptan, hexyl mercaptan, t-butyl mercaptan, thiophenol, methylthiophenol, ethylthiophenol; acid amide-based blocking agents such as acetate amide and benzamide; imides such as succinic acid imide and maleate imide.
- Oxime-based blocking agents Amin-based blocking agents such as xylidine, aniline, butylamine, dibutylamine; Imidazole-based blocking agents such as imidazole and 2-ethylimidazole; Imine-based blocking agents such as methyleneimine and propyleneimine; Pyrazole-based such as dimethylpyrazole Examples include blocking agents.
- the blocked isocyanate compound may be commercially available, for example, Duranate TPA-B80E, 17B-60PX, E402-B80T (all manufactured by Asahi Kasei Corporation), TrixeneBI7982: blocked isocyanate (hexamethylene isocyanate (HDM) trimer, Blocking agents: dimethylpyrazole (DMP), Baxenden Chemicals) and the like.
- Duranate TPA-B80E, 17B-60PX, E402-B80T all manufactured by Asahi Kasei Corporation
- TrixeneBI7982 blocked isocyanate (hexamethylene isocyanate (HDM) trimer
- Blocking agents dimethylpyrazole (DMP), Baxenden Chemicals) and the like.
- the latent thermosetting component may be a reaction product obtained by reacting an amine compound such as imidazole or dicyandiamide with a hydroxyl group-containing compound, a cyclic ether group-containing compound, a carboxyl group-containing compound, or the like.
- the blending amount of the (E) thermosetting component is preferably 1 part by mass or more and 30 parts by mass or less, and more preferably 3 parts by mass or more and 15 parts by mass or less per 100 parts by mass of the curable composition of the present invention.
- the blending amount of the thermosetting component is 1 part by mass or more and 30 parts by mass or less per 100 parts by mass of the curable composition of the present invention.
- the curable composition of the present invention may contain a known and commonly used (F) flame retardant for the purpose of improving the flame retardancy of the obtained cured product. Further, by containing a flame retardant, the low warpage after exposure can be further improved.
- flame retardant include phosphoric flame retardants such as phosphoric acid esters and condensed phosphoric acid esters, phosphorus-containing compounds having phenolic hydroxyl groups, phosphazenic compounds, and phosphinic acid metal salts, antimony trioxide, and antimony pentoxide.
- Examples thereof include antimony compounds such as, pentabromodiphenyl ether, halogen compounds such as octabromodiphenyl ether, metal hydroxides such as aluminum hydroxide and magnesium hydroxide, and layered compound hydroxides such as hydrotalcite. Phosphorus-based flame retardants are preferable because of their environmental impact and flame retardant effect.
- the flame retardancy can be improved without impairing the flexibility of the cured film.
- phosphinic acid constituting the phosphinic acid metal salt examples include phosphinic acid, dimethylphosphinic acid, ethylmethylphosphinic acid, diethylphosphinic acid, methyl-n-propylphosphinic acid, methanedi (methylphosphinic acid), benzene-1, Examples thereof include 4- (dimethylphosphinic acid), methylphenylphosphinic acid, phenylphosphinic acid, diphenylphosphinic acid and mixtures thereof.
- Exolit OP 1240, 1240, 1312, 1400, 930, 945TP, and OP-935 examples of commercially available products.
- a phosphazene compound as a phosphorus-based flame retardant.
- the phosphazene compound is preferably a phenoxyphosphazene having a phosphazene structure and a phenoxy group substituted with any one of a cyano group (-CN), a hydroxyl group (-OH) and a methyl group.
- a cyano group -CN
- a hydroxyl group a methyl group
- it has a hexaphenoxycyclotriphosphazene structure as a basic skeleton, and at least two of the six phenoxy groups in the structure are substituted with a cyano group (-CN) or a hydroxyl group (-OH).
- only one of the two phenoxy groups attached to the phosphorus atom in the hexaphenoxycyclotriphosphazene structure is substituted with one cyanide group (-CN) and thus substituted. It is a structure having two phenoxy groups as a whole hexaphenoxycyclotriphosphazene structure.
- the two phenoxy groups attached to the phosphorus atom in the hexaphenoxycyclotriphosphazene structure are both substituted with one cyano group (-CN), and the phenoxy group thus substituted.
- -CN cyano group
- only one of the two phenoxy groups attached to the phosphorus atom in the hexaphenoxycyclotriphosphazene structure is substituted with one hydroxyl group (-OH) and thus thus. It is a structure having three substituted phenoxy groups as a whole hexaphenoxycyclotriphosphazene structure.
- the cyclic phosphazene compound has the following structure: or or It has one of the structures.
- Examples of the preferable commercially available phosphazene compound include FP-300B, FP-300, and SPH-100 (all manufactured by Fushimi Pharmaceutical Co., Ltd.).
- flame retardant One type of flame retardant may be used alone, or two or more types may be used in combination.
- the amount of the flame retardant (F) blended in the curable composition of the present invention is, for example, 5% by mass or more and 60% by mass or less, preferably 10% by mass or more and 50% by mass or less.
- the flame retardant is a phosphorus-based flame retardant
- the blending amount of the phosphorus-based flame retardant is 0.1% by mass or more and 10% by mass or less as the phosphorus content in the curable composition of the present invention. It is possible to effectively impart flame retardancy while maintaining heat resistance and low warpage.
- Thermosetting catalyst selected from the group consisting of melamine and its derivatives The curable composition of the present invention preferably contains a thermosetting catalyst selected from the group consisting of melamine and its derivatives. Melamine and its derivatives act as a curing accelerator for thermosetting reactions, and are used to further improve properties such as heat resistance in addition to adhesion of the cured product to the conductor circuit.
- thermosetting catalyst selected from the group consisting of melamine and its derivatives include guanamines such as acetoguanamine and benzoguanamine; melamine; ethyldiamino-S-triazine, 2,4-diamino-S-triazine, 2,4. Examples thereof include triazine derivatives such as -diamino-6-xylyl-S-triazine, and melamine is preferable.
- thermosetting catalyst selected from the group consisting of melamine and its derivatives can be used alone or in combination of two or more.
- the blending amount thereof is (E) when the total amount of the thermosetting components is 100% by mass. It is preferably 0.1% by mass or more and 20% by mass or less, more preferably 0.5% by mass or more and 20% by mass or less, and particularly preferably 1% by mass or more and 15% by mass or less.
- thermosetting catalyst selected from the group consisting of melamine and its derivatives By setting the blending amount of the thermosetting catalyst selected from the group consisting of melamine and its derivatives to 0.1% by mass or more and 20% by mass or less when the total amount of (E) thermosetting components is 100% by mass. , Good thermosetting can be realized while improving the storage stability of the curable composition.
- Additives such as antioxidants, antifoaming / leveling agents, thixotropy-imparting agents / thickeners, coupling agents, dispersants, polymerization retarders, and colorants are added to the curable composition of the present invention, if necessary. Can be contained.
- a solvent may be used for adjusting the viscosity, but it is preferable that the amount added is small in order to prevent the film thickness from being lowered after curing. Further, it is more preferable that the solvent for adjusting the viscosity is not contained.
- the curable composition of the present invention is preferably applied to printing by an inkjet method.
- the viscosity is such that it can be ejected by an inkjet printer.
- the viscosity of the curable composition of the present invention is preferably 50 mPa ⁇ s or less at 50 ° C, more preferably 20 mPa ⁇ s or less at 50 ° C, and 15 mPa ⁇ s or less at 50 ° C. Is particularly preferable.
- the curable composition of the present invention can directly print a pattern on a substrate for a printed wiring board or the like by an inkjet printing method.
- the curable composition of the present invention does not undergo a polymerization reaction at room temperature, it can be stably stored as a one-component curable composition.
- the curable composition of the present invention can be supplied as ink to an inkjet printer due to its low viscosity, and can be used for printing on a substrate. Further, since the warpage of the thin film substrate can be suppressed to a low level after printing on a thin film substrate such as a polyimide substrate and exposing it, it is suitable as a composition for solder resist for a flexible wiring board.
- the composition layer immediately after printing is photo-cured by irradiating the composition layer with an active energy ray of 50 mJ / cm 2 to 1000 mJ / cm 2 . Obtained at.
- the activation energy ray irradiation is performed by irradiation with active energy rays such as ultraviolet rays, electron beams, and chemical rays, preferably by ultraviolet irradiation.
- Ultraviolet irradiation in an inkjet printer can be performed by, for example, attaching a light source such as a high-pressure mercury lamp, a metal halide lamp, or an ultraviolet LED to the side surface of the print head, and scanning by moving the print head or the substrate. In this case, printing and ultraviolet irradiation can be performed almost at the same time.
- a light source such as a high-pressure mercury lamp, a metal halide lamp, or an ultraviolet LED
- the cured product after photocuring is thermally cured by using a known heating means, for example, a heating furnace such as a hot air furnace, an electric furnace, or an infrared induction heating furnace.
- a heating furnace such as a hot air furnace, an electric furnace, or an infrared induction heating furnace.
- the heating conditions it is preferable to heat at 130 ° C to 170 ° C for 5 to 90 minutes.
- the cured product obtained by the curable composition of the present invention is also excellent in flexibility, and is therefore particularly suitable as a solder resist for flexible wiring boards.
- Examples of the substrate of the flexible wiring board include a film made of glass polyimide, polyimide, polyethylene terephthalate, liquid crystal polymer, polycarbonate, and the like.
- soldering may be performed by hand soldering, flow soldering, reflow soldering, or the like. For example, in the case of reflow soldering, preheating at 100 ° C. to 140 ° C. for 1 to 4 hours is required. After that, it is subjected to a reflow process of heating and melting the solder by repeating heating at 240 to 280 ° C. for about 5 to 20 seconds multiple times (for example, 2 to 4 times). The parts are completed.
- the electronic component means a component used in an electronic circuit, and includes active components such as printed wiring boards, transistors, light emitting diodes, and laser diodes, as well as passive components such as resistors, capacitors, inductors, and connectors.
- active components such as printed wiring boards, transistors, light emitting diodes, and laser diodes
- passive components such as resistors, capacitors, inductors, and connectors.
- the curable composition of the present invention has a low viscosity, excellent coatability, and little warpage after photocuring. Further, it is flexible even after curing, and is excellent in adhesion to a substrate, flame retardancy, solder heat resistance, plating resistance, and solvent resistance, so that it can be applied to various applications, and there is no particular limitation on the application target. For example, it can be used for manufacturing etching resists, solder resists, marking inks, etc. of printed wiring boards by inkjet printing, and among them, solder on flexible wiring boards by inkjet printing, which requires low warpage and flame retardancy after exposure. It can be suitably used as a composition for forming a resist.
- It can also be used as a material for UV molded products, a material for stereolithography, and a material for 3D inkjet.
- Viscosity With respect to the curable compositions of Examples 1 to 18 and Comparative Examples 1 to 4, the viscosities at an ink temperature of 50 ° C. and 100 rpm were measured with a cone plate type viscometer (TVH-33H manufactured by Toki Sangyo Co., Ltd.). , Evaluated according to the following criteria.
- each sample was allowed to stand on a horizontal workbench for 30 minutes with the coating surface as the upper surface, and the heights of the four edges of the sample raised from the workbench were measured with a ruler, and the average value of the heights of the four edges was measured. Asked. The same test was performed three times for each sample, and the average value of the three tests was calculated and evaluated according to the following criteria.
- the average value of the total height of the four ends is 5 mm or less ⁇ : The average value of the total height of the four ends exceeds 5 mm and less than 10 mm ⁇ : The average value of the total height of the four ends is 10 mm or more
- the test piece 1 is mounted on the apparatus, the test piece 1 is vertically attached to the clamp 2 with the load F (0.5 kgf) applied, and the bending angle ⁇ is set. Bending was performed at 135 degrees and a speed of 175 cpm, and the number of reciprocating bends (times) until breaking was measured.
- the evaluation criteria are as follows.
- ⁇ 200 times or more ⁇ : 150 to 199 times ⁇ : 101 to 149 times ⁇ : 100 times or less
- ⁇ No peeling was observed in the cured film even after soaking for 5 seconds x 2 times and performing a peel test with cellophane tape (registered trademark).
- ⁇ No peeling was observed in the cured film even after dipping for 5 seconds x 1 time and performing a peel test with cellophane tape (registered trademark), but when immersed for 5 seconds x 2 times, the cured film swelled and peeled.
- X After dipping for 5 seconds ⁇ 1 time, the cured film swells and peels off.
- Electrolytic gold plating resistance A circuit in which the curable compositions of Examples 1 to 18 and Comparative Examples 1 to 4 are treated with sulfuric acid using an inkjet printing device CPS6151 (manufactured by Microcraft) to have a copper thickness of 12 ⁇ m and a polyimide of 50 ⁇ m. It was applied on a pattern substrate. Then, according to the above "(2) Conditions for forming a cured film", a cured film having a thickness of 20 ⁇ m was formed. The obtained evaluation substrate was gold-plated using a commercially available electroless nickel plating bath and an electroless gold plating bath under the conditions of nickel 5 ⁇ m and gold 0.03 ⁇ m, and the surface condition of the cured film was observed.
- the evaluation criteria are as follows.
- VTM-0 passed and the burning time of each sample was less than 7 seconds
- VTM-0 passed and each sample burned within 10 seconds Not: VTM-0 failed
- Examples 1 to 3 and 15 and Examples 16 to 18 in addition to being able to impart flame retardancy to the cured coating film by further containing (F) a flame retardant, after exposure.
- the low warpage is further improved.
- the heat resistance of the coating film after curing was further improved because the flame retardant (F) was a phosphorus-based flame retardant.
- Examples 16 to 18 have failed the flame retardancy test (Not evaluation), this is due to the fact that they do not contain a flame retardant, and the effect of the present invention is not denied. ..
- Example 2 when the ratio of (A) / (B) is larger than 175% by mass, the viscosity of the curable composition, the warpage after exposure, and the flexibility of the cured film are determined. It was found that the characteristics were further improved.
- Example 2 when the ratio of (A) / (F) is larger than 49% by mass, the viscosity of the curable composition, the warpage after exposure, and the solder heat resistance of the cured film are obtained. It was found that the sexual characteristics were further improved.
- Example 2 when a compound having a (C4) aromatic ring and two or more (meth) acryloyl groups is contained, the flame retardancy and solder heat resistance of the cured film are further contained. From the comparison between Example 2 and Example 12, the cured film further contains (C3) a photocurable compound having no aromatic ring and having three or more (meth) acryloyl groups. It was found that the solder heat resistance characteristics of the solder were improved.
Abstract
Description
(A)式(1)
で表されるラジカル重合性モノマーと、
(B)(メタ)アクリロイル基を2個有する光硬化性ウレタン化合物と、
(C)(A)、(B)以外の(メタ)アクリロイル基を有する化合物と、
(D)光重合開始剤と、
(E)熱硬化成分と、
を含有することを特徴とする硬化性組成物により達成されることが見いだされた。 That is, the object of the present invention is
(A) Equation (1)
The radically polymerizable monomer represented by
(B) A photocurable urethane compound having two (meth) acryloyl groups and
(C) Compounds having (meth) acryloyl groups other than (A) and (B), and
(D) Photopolymerization initiator and
(E) Thermosetting component and
It was found to be achieved by a curable composition characterized by containing.
本発明の硬化性組成物は、
(A)式(1)
で表されるラジカル重合性モノマー(以下、(A)式(1)のラジカル重合性モノマーともいう)と、
(B)(メタ)アクリロイル基を2個有する光硬化性ウレタン化合物と、
(C)(A)、(B)以外の(メタ)アクリロイル基を有する化合物と、
(D)光重合開始剤と、
(E)熱硬化成分と、
を含有する硬化性組成物である。 <Curable composition>
The curable composition of the present invention is
(A) Equation (1)
The radically polymerizable monomer represented by (hereinafter, also referred to as the radically polymerizable monomer of the formula (A) (1)) and
(B) A photocurable urethane compound having two (meth) acryloyl groups and
(C) Compounds having (meth) acryloyl groups other than (A) and (B), and
(D) Photopolymerization initiator and
(E) Thermosetting component and
It is a curable composition containing.
本発明の硬化性組成物に含まれる(A)式(1)のラジカル重合性モノマーは、例えば、以下の式a):
The radically polymerizable monomer of the formula (A) (1) contained in the curable composition of the present invention is, for example, the following formula a):.
本発明の硬化性組成物は、(B)(メタ)アクリロイル基を2個有する光硬化性ウレタン化合物を含む。(B)(メタ)アクリロイル基を2個有する光硬化性ウレタン化合物は、本発明の硬化性組成物の硬化物に柔軟性を与え、また、薄膜基板に塗布し、露光した後のこの基板の反りを抑制する。 [(B) (Meta) Photocurable urethane compound having two acryloyl groups]
The curable composition of the present invention contains (B) a photocurable urethane compound having two (meth) acryloyl groups. (B) The photocurable urethane compound having two (meth) acryloyl groups gives flexibility to the cured product of the curable composition of the present invention, and is applied to a thin film substrate and exposed to the substrate. Suppress warpage.
本発明の硬化性組成物は、(C)(A)、(B)以外の(メタ)アクリロイル基を有する化合物を含む。(C)(A)、(B)以外の(メタ)アクリロイル基を有する化合物は、露光後には硬化して硬化物に組み込まれる成分である。なお、本明細書において(C)(A)、(B)以外の(メタ)アクリロイル基を有する化合物を「(C)(メタ)アクリロイル基を有する化合物」に略記する場合がある。 [Compounds having (meth) acryloyl groups other than (C) (A) and (B)]
The curable composition of the present invention contains a compound having a (meth) acryloyl group other than (C), (A) and (B). (C) A compound having a (meth) acryloyl group other than (A) and (B) is a component that is cured after exposure and incorporated into a cured product. In addition, in this specification, a compound having a (meth) acryloyl group other than (C) (A) and (B) may be abbreviated as "a compound having a (C) (meth) acryloyl group".
(C)(メタ)アクリロイル基を有する化合物は、例えば、(C1)(メタ)アクリロイル基を1個有する化合物を含む。(C1)(メタ)アクリロイル基を1個有する化合物は、例えば、(メタ)アクリロイル基以外の特定の官能基(好ましくは水酸基)を有することが好ましい。当該(C1)(メタ)アクリロイル基を1個有する化合物が前記特定の官能基を有する場合、本発明の硬化性組成物の露光後に(C1)(メタ)アクリロイル基を1個有する化合物が硬化物に組み込まれることによって、前記特定の官能基を硬化物中に導入することができる。このようにして前記特定の官能基を硬化物中に導入した場合、硬化物の各種物性をより向上することができる。 (C1) A compound having one (meth) acryloyl group (C) A compound having a (meth) acryloyl group includes, for example, a compound having one (C1) (meth) acryloyl group. (C1) The compound having one (meth) acryloyl group preferably has, for example, a specific functional group (preferably a hydroxyl group) other than the (meth) acryloyl group. When the compound having one (C1) (meth) acryloyl group has the specific functional group, the compound having one (C1) (meth) acryloyl group is a cured product after exposure to the curable composition of the present invention. By incorporating into the cured product, the specific functional group can be introduced into the cured product. When the specific functional group is introduced into the cured product in this way, various physical properties of the cured product can be further improved.
(C)(メタ)アクリロイル基を有する化合物は、例えば、(C2)(メタ)アクリロイル基を2個有する化合物を含む。 (C2) Compound having two (meth) acryloyl groups The compound having (C) (meth) acryloyl group includes, for example, a compound having two (C2) (meth) acryloyl groups.
(C)(メタ)アクリロイル基を有する化合物は、例えば、(C3)芳香環を有さず、(メタ)アクリロイル基を3個以上有する化合物を含む。 (C3) A compound having no aromatic ring and having three or more (meth) acryloyl groups (C) A compound having a (meth) acryloyl group is, for example, a compound having no (C3) aromatic ring and having (meth) acryloyl. Contains compounds having 3 or more groups.
(C)(メタ)アクリロイル基を有する化合物は、例えば、(C4)芳香環を有し、(メタ)アクリロイル基を2個以上有する化合物を含む。 (C4) A compound having an aromatic ring and having two or more (meth) acryloyl groups (C) A compound having a (meth) acryloyl group is, for example, having a (C4) aromatic ring and having a (meth) acryloyl group. Contains compounds having two or more.
(D)光重合開始剤としては、光、レーザー、電子線等によりラジカルを発生し、ラジカル重合反応を開始する化合物であれば全て用いることができる。当該(D)光重合開始剤としては、例えば、ベンゾイン、ベンゾインメチルエーテル、ベンゾインエチルエーテル、ベンゾインイソプロピルエーテル等のベンゾインとベンゾインアルキルエーテル類;アセトフェノン、2,2-ジメトキシ-2-フェニルアセトフェノン、2,2-ジエトキシ-2-フェニルアセトフェノン、1,1-ジクロロアセトフェノン等のアセトフェノン類;2-メチル-1-[4-(メチルチオ)フェニル]-2-モルホリノプロパン-1-オン、2-ベンジル-2-ジメチルアミノ-1-(4-モルホリノフェニル)-ブタン-1-オン、N,N-ジメチルアミノアセトフェノン等のアミノアセトフェノン類;2-メチルアントラキノン、2-エチルアントラキノン、2-t-ブチルアントラキノン、1-クロロアントラキノン等のアントラキノン類;2,4-ジメチルチオキサントン、2,4-ジエチルチオキサントン、2-クロロチオキサントン、2,4-ジイソプロピルチオキサントン等のチオキサントン類;アセトフェノンジメチルケタール、ベンジルジメチルケタール等のケタール類;2,4,5-トリアリールイミダゾール二量体;リボフラビンテトラブチレート;2-メルカプトベンゾイミダゾール、2-メルカプトベンゾオキサゾール、2-メルカプトベンゾチアゾール等のチオール化合物;2,2,2-トリブロモエタノール、トリブロモメチルフェニルスルホン等の有機ハロゲン化合物;ベンゾフェノン、4,4’-ビスジエチルアミノベンゾフェノン等のベンゾフェノン類またはキサントン類;2,4,6-トリメチルベンゾイルジフェニルホスフィンオキサイド;1,2-オクタンジオン,1-[4-(フェニルチオ)-,2-(O-ベンゾイルオキシム)]、エタノン,1-[9-エチル-6-(2-メチルベンゾイル)-9H-カルバゾール-3-イル]-,1-(O-アセチルオキシム)等のオキシムエステル類などが挙げられる。 [(D) Photopolymerization Initiator]
As the photopolymerization initiator, any compound that generates radicals by light, a laser, an electron beam, or the like and initiates a radical polymerization reaction can be used. Examples of the (D) photopolymerization initiator include benzoin and benzoin alkyl ethers such as benzoin, benzoin methyl ether, benzoin ethyl ether, and benzoin isopropyl ether; acetophenone, 2,2-dimethoxy-2-phenylacetophenone, 2, Acetophenones such as 2-diethoxy-2-phenylacetophenone and 1,1-dichloroacetophenone; 2-methyl-1- [4- (methylthio) phenyl] -2-morpholinopropane-1-one, 2-benzyl-2- Aminoacetophenones such as dimethylamino-1- (4-morpholinophenyl) -butane-1-one, N, N-dimethylaminoacetophenone; 2-methylanthraquinone, 2-ethylanthraquinone, 2-t-butylanthraquinone, 1- Anthraquinones such as chloroanthraquinone; thioxanthones such as 2,4-dimethylthioxanthone, 2,4-diethylthioxanthone, 2-chlorothioxanthone, 2,4-diisopropylthioxanthone; acetophenone dimethylketal, ketals such as benzyldimethylketal; 2 , 4,5-Triarylimidazole dimer; riboflavin tetrabutyrate; thiol compounds such as 2-mercaptobenzoimidazole, 2-mercaptobenzoxazole, 2-mercaptobenzothiazole; 2,2,2-tribromoethanol, tri Organic halogen compounds such as bromomethylphenyl sulfone; benzophenone, benzophenones or xanthones such as 4,4'-bisdiethylaminobenzophenone; 2,4,6-trimethylbenzoyldiphenylphosphine oxide; 1,2-octanedione, 1-[ 4- (Phenylthio)-, 2- (O-benzoyloxime)], etanone, 1- [9-ethyl-6- (2-methylbenzoyl) -9H-carbazole-3-yl]-, 1- (O-) Examples thereof include oxime esters such as acetyl oxime).
また、本発明の硬化性組成物は、(E)熱硬化成分を含む。(E)熱硬化成分を含むことで、硬化性組成物の塗布、露光後の基板の低反り性および硬化膜の難燃性に加えて、硬化膜の耐熱性、めっき耐性などの機能性をさらに向上させることができる。 [(E) Thermosetting component]
Further, the curable composition of the present invention contains (E) a thermosetting component. (E) By containing a thermosetting component, in addition to coating of a curable composition, low warpage of the substrate after exposure and flame retardancy of the cured film, functionality such as heat resistance and plating resistance of the cured film can be obtained. It can be further improved.
本発明の硬化性組成物は、得られる硬化物の難燃性向上を目的として、公知慣用の(F)難燃剤を含むことができる。また、難燃剤を含むことで露光後の低反り性をさらに向上させることができる。
(F)難燃剤としては、例えば、リン酸エステルおよび縮合リン酸エステル、フェノール性水酸基を有するリン含有化合物、ホスファゼン化合物、およびホスフィン酸金属塩等のリン系難燃剤、三酸化アンチモン、五酸化アンチモン等のアンチモン化合物、ペンタブロモジフェニルエーテル、オクタブロモジフェニルエーテル等のハロゲン化合物、水酸化アルミニウム、水酸化マグネシウムなどの金属水酸化物、ハイドロタルサイト等の層状複水酸化物が挙げられる。環境面への影響や難燃効果からリン系難燃剤が好ましい。
ホスフィン酸金属塩としては、例えば、下記構造式(2)
で表される構造を有するものが好ましい。 [(F) Flame Retardant]
The curable composition of the present invention may contain a known and commonly used (F) flame retardant for the purpose of improving the flame retardancy of the obtained cured product. Further, by containing a flame retardant, the low warpage after exposure can be further improved.
(F) Examples of the flame retardant include phosphoric flame retardants such as phosphoric acid esters and condensed phosphoric acid esters, phosphorus-containing compounds having phenolic hydroxyl groups, phosphazenic compounds, and phosphinic acid metal salts, antimony trioxide, and antimony pentoxide. Examples thereof include antimony compounds such as, pentabromodiphenyl ether, halogen compounds such as octabromodiphenyl ether, metal hydroxides such as aluminum hydroxide and magnesium hydroxide, and layered compound hydroxides such as hydrotalcite. Phosphorus-based flame retardants are preferable because of their environmental impact and flame retardant effect.
Examples of the phosphinic acid metal salt include the following structural formula (2).
Those having a structure represented by are preferable.
本発明の硬化性組成物は、メラミンおよびその誘導体からなる群から選択される熱硬化触媒を含むことが好ましい。メラミンおよびその誘導体は、熱硬化反応の硬化促進剤として作用し、硬化物の導体回路との密着性に加えて、耐熱性等の特性をより一層向上させるために使用される。 [Thermosetting catalyst selected from the group consisting of melamine and its derivatives]
The curable composition of the present invention preferably contains a thermosetting catalyst selected from the group consisting of melamine and its derivatives. Melamine and its derivatives act as a curing accelerator for thermosetting reactions, and are used to further improve properties such as heat resistance in addition to adhesion of the cured product to the conductor circuit.
本発明の硬化性組成物により得られる硬化物は、例えば、上記印刷直後の組成物層に50mJ/cm2~1000mJ/cm2の活性エネルギー線を照射することにより組成物層を光硬化させることで得られる。活性エネルギー線照射は、紫外線、電子線、化学線等の活性エネルギー線の照射により、好ましくは紫外線照射により行われる。 <Curing product obtained from the curable composition>
In the cured product obtained by the curable composition of the present invention, for example, the composition layer immediately after printing is photo-cured by irradiating the composition layer with an active energy ray of 50 mJ / cm 2 to 1000 mJ / cm 2 . Obtained at. The activation energy ray irradiation is performed by irradiation with active energy rays such as ultraviolet rays, electron beams, and chemical rays, preferably by ultraviolet irradiation.
このように基板上にパターン印刷した硬化性組成物からなる硬化膜がソルダーレジストとして用いられる場合、部品の実装のためのはんだ付け工程で加熱される。はんだ付けは、手はんだ付け、フローはんだ付け、リフローはんだ付け等のいずれで行われてもよいが、例えば、リフローはんだ付けの場合には、100℃~140℃で1~4時間の予熱と、その後、240~280℃で5~20秒程度の加熱を複数回(例えば、2~4回)繰り返してはんだを加熱・溶融させるリフロー工程に供され、冷却後、必要により部品が実装された電子部品が完成する。 <Electronic components with a cured product of a curable composition>
When a cured film made of a curable composition having a pattern printed on a substrate in this way is used as a solder resist, it is heated in a soldering step for mounting components. Soldering may be performed by hand soldering, flow soldering, reflow soldering, or the like. For example, in the case of reflow soldering, preheating at 100 ° C. to 140 ° C. for 1 to 4 hours is required. After that, it is subjected to a reflow process of heating and melting the solder by repeating heating at 240 to 280 ° C. for about 5 to 20 seconds multiple times (for example, 2 to 4 times). The parts are completed.
下記表1に示す割合(単位:質量部)で各成分を配合し、これをディゾルバーで攪拌した。その後、ビーズミルを用いて1mmのジルコニアビーズにて分散を2時間行い、本発明の硬化性組成物(実施例1~18)および比較例の硬化性組成物(比較例1~4)を得た。 <1. Preparation of Curable Compositions of Examples 1 to 18 and Comparative Examples 1 to 4>
Each component was mixed in the ratio (unit: parts by mass) shown in Table 1 below, and this was stirred with a dissolver. Then, dispersion was carried out with 1 mm zirconia beads using a bead mill for 2 hours to obtain a curable composition of the present invention (Examples 1 to 18) and a curable composition of Comparative Examples (Comparative Examples 1 to 4). ..
*2:2官能ウレタンアクリレート、25℃における粘度:2,000mPa・s、Mw=1,000(UA-2000、新中村化学工業社製)
*3:2官能ウレタンアクリレート、25℃における粘度:12,500mPa・s、Mw=1,000(エベクリル8402、ダイセル・オルネクス社製)
*4:2官能ウレタンアクリレート、25℃における粘度:25,000mPa・s、Mw=6,500(UN-6200、根上工業社製)
*5:3官能ウレタンアクリレート、25℃における粘度:15,000mPa・s(UA-7100、新中村化学工業社製)
*6:6官能ウレタンアクリレートオリゴマー、25℃における粘度1,000~3,000mPa・s(DM576、DOUBLE BOND CHEMICAL社製)
*7:トリメチロールプロパントリアクリレート(A-TMPT、新中村化学工業社製)
*8:1,9-ノナンジオールジアクリレート(1,9-NDA、第一工業製薬社製)
*9:ジプロピレングリコールジアクリレート(DPGDA、ダイセル・オルネクス株式会社製)
*10:エトキシ化ビスフェノールAジアクリレート(A-BPE-10、新中村化学工業社製)
*11:4-ヒドロキシブチルアクリレート(4HBA、日本化成社製)
*12:3官能ブロックイソシアネート(BI7982、Baxenden chemmical社製)
*13:メラミン(日産化学社製)
*14:2-(ジメチルアミノ)-2-[(4-メチルフェニル)メチル]-1-[4-(4-モルホリニル)フェニル]-1-ブタノン(Omnirad 379、IGM社製)
*15:ホスファゼン化合物(リン含有率12.5%)(FP-300B、株式会社伏見製薬所製)
*16:ホスフィン酸金属塩(リン含有率23.0%)(OP935、クラリアントケミカルズ株式会社製)
*17:水酸化アルミニウム(H42M、昭和電工社製)
*18:フタロシアニン系青色着色剤(Pigment Blue15:3)
*19:アントラキノン系黄色着色剤(Pigment Yellow147) * 1: Α- (allyloxymethyl) methyl acrylate (AOMA: manufactured by Nippon Shokubai Co., Ltd.)
* 2: Bifunctional urethane acrylate, viscosity at 25 ° C: 2,000 mPa · s, Mw = 1,000 (UA-2000, manufactured by Shin Nakamura Chemical Industry Co., Ltd.)
* 3: Bifunctional urethane acrylate, viscosity at 25 ° C.: 12,500 mPa · s, Mw = 1,000 (Evecryl 8402, manufactured by Dycel Ornex)
* 4: Bifunctional urethane acrylate, viscosity at 25 ° C: 25,000 mPa · s, Mw = 6,500 (UN-6200, manufactured by Negami Kogyo Co., Ltd.)
* 5: Trifunctional urethane acrylate, viscosity at 25 ° C: 15,000 mPa · s (UA-7100, manufactured by Shin Nakamura Chemical Industry Co., Ltd.)
* 6: Hexfunctional urethane acrylate oligomer, viscosity at 25 ° C. 1,000-3,000 mPa · s (DM576, manufactured by DOUBLE BOND CHEMICAL)
* 7: Trimethylolpropane triacrylate (A-TMPT, manufactured by Shin Nakamura Chemical Industry Co., Ltd.)
* 8: 1,9-Nonanediol diacrylate (1,9-NDA, manufactured by Dai-ichi Kogyo Seiyaku Co., Ltd.)
* 9: Dipropylene glycol diacrylate (DPGDA, manufactured by Dycel Ornex Co., Ltd.)
* 10: Ethoxylated bisphenol A diacrylate (A-BPE-10, manufactured by Shin Nakamura Chemical Industry Co., Ltd.)
* 11: 4-Hydroxybutyl acrylate (4HBA, manufactured by Nihon Kasei)
* 12: Trifunctional blocked isocyanate (BI7982, manufactured by Baxenden chemical)
* 13: Melamine (manufactured by Nissan Chemical Industries, Ltd.)
* 14: 2- (dimethylamino) -2-[(4-methylphenyl) methyl] -1- [4- (4-morpholinyl) phenyl] -1-butanone (Omnirad 379, manufactured by IGM)
* 15: Phosphazene compound (phosphorus content 12.5%) (FP-300B, manufactured by Fushimi Pharmaceutical Co., Ltd.)
* 16: Metallic phosphinic acid salt (phosphorus content 23.0%) (OP935, manufactured by Clariant Chemicals, Inc.)
* 17: Aluminum hydroxide (H42M, manufactured by Showa Denko)
* 18: Phthalocyanine-based blue colorant (Pigment Blue15: 3)
* 19: Anthraquinone-based yellow colorant (Pigment Yellow147)
実施例1~18および比較例1~4の硬化性組成物について以下のように粘度を評価した。また、以下に示すように試験用試料を作成し、塗布性、露光後反り性、柔軟性(MIT試験)、はんだ耐熱性、耐溶剤性、無電解金めっき耐性および難燃性の評価を行った。その結果を表2に示す。 <2. Evaluation>
The viscosities of the curable compositions of Examples 1 to 18 and Comparative Examples 1 to 4 were evaluated as follows. In addition, as shown below, test samples were prepared and evaluated for coatability, post-exposure warpage, flexibility (MIT test), solder heat resistance, solvent resistance, electroless gold plating resistance and flame retardancy. rice field. The results are shown in Table 2.
実施例1~18および比較例1~4の硬化性組成物について、インキ温度50℃、100rpmにおける粘度をコーンプレート型粘度計(東機産業社製TVH-33H)にて測定し、以下の基準で評価した。 (1) Viscosity With respect to the curable compositions of Examples 1 to 18 and Comparative Examples 1 to 4, the viscosities at an ink temperature of 50 ° C. and 100 rpm were measured with a cone plate type viscometer (TVH-33H manufactured by Toki Sangyo Co., Ltd.). , Evaluated according to the following criteria.
○:10mPa・s超20mPa・s以下
×:20mPa・s超 ⊚: 10 mPa · s or less ○: 10 mPa · s more than 20 mPa · s or less ×: 20 mPa · s more than
実施例1~18および比較例1~4の硬化性組成物をインクジェット印刷装置CPS6151(マイクロクラフト社製)にて塗布した。アレイはKM1024iSHE(マイクロクラフト社製、塗布液滴量6pL、ノズル数2×1024個、ヘッド温度50℃)を使用した。光硬化はSGHUV-UN-L042-B(マイクロクラフト社製、LED光源、波長365nm)を光源として使用し、300mJ/cm2で行った。その後、加熱装置は熱風循環式乾燥炉DF610(ヤマト科学株式会社製)を使用し、150℃60分で本硬化を行った。 (2) Conditions for Forming a Cured Film The curable compositions of Examples 1 to 18 and Comparative Examples 1 to 4 were applied by an inkjet printing apparatus CPS6151 (manufactured by Microcraft). As the array, KM1024iSHE (manufactured by Microcraft Co., Ltd., coating droplet amount 6 pL, number of
実施例1~18および比較例1~4の硬化性組成物をインクジェット印刷装置CPS6151(マイクロクラフト社製)にて、硫酸処理済のエスパネックス(登録商標)M(日鉄ケミカル&マテリアル社製)の銅表面上に塗布厚20μmで塗布した。塗膜表面を目視で観察し、以下の基準で評価を行った。 (3) Coatability The curable compositions of Examples 1 to 18 and Comparative Examples 1 to 4 were sulfuric acid-treated with an inkjet printing device CPS6151 (manufactured by Microcraft Co., Ltd.) and Espanex (registered trademark) M (Nittetsu Chemical Co., Ltd.). & Material Co., Ltd.) was applied on the copper surface with a coating thickness of 20 μm. The surface of the coating film was visually observed and evaluated according to the following criteria.
△:全面塗布はできているが、ヘッド操作方向に対してスジが発生しているもの
×:塗膜の一部に抜けが発生しているもの ◯: Uniform coating and smooth surface Δ: Full coating, but streaks in the head operation direction ×: Part of the coating film is missing What is
実施例1~18および比較例1~4の硬化性組成物を、インクジェット印刷装置CPS6151(マイクロクラフト社製)を用い、光硬化条件800mJ/cm2にて、硫酸処理済のカプトン(登録商標)200Hまたは100H(東レ・デュポン社製)の片面に塗布した。得られた露光後塗膜の積層体を、5cmx5cm(縦×横)に切り出してサンプル(膜厚:15μm)とした。各サンプルを、露光後塗膜面を上面として30分間水平な作業台上に静置し、作業台から上昇したサンプルの四端の高さを定規で測定し、四端の高さの平均値を求めた。同様の試験をサンプルごとに3回行い、3回の試験の平均値を求め、以下の基準で評価した。 (4) Post-exposure warpage The curable compositions of Examples 1 to 18 and Comparative Examples 1 to 4 were treated with sulfuric acid under a photocuring condition of 800 mJ / cm 2 using an inkjet printing device CPS6151 (manufactured by Microcraft). It was applied to one side of Kapton (registered trademark) 200H or 100H (manufactured by Toray DuPont). The obtained laminated body of the coated film after exposure was cut out into a sample (film thickness: 15 μm) in a size of 5 cm × 5 cm (length × width). After exposure, each sample was allowed to stand on a horizontal workbench for 30 minutes with the coating surface as the upper surface, and the heights of the four edges of the sample raised from the workbench were measured with a ruler, and the average value of the heights of the four edges was measured. Asked. The same test was performed three times for each sample, and the average value of the three tests was calculated and evaluated according to the following criteria.
○:四端の合計高さの平均値が5mm超過10mm未満
×:四端の合計高さの平均値が10mm以上 ⊚: The average value of the total height of the four ends is 5 mm or less ○: The average value of the total height of the four ends exceeds 5 mm and less than 10 mm ×: The average value of the total height of the four ends is 10 mm or more
実施例1~18および比較例1~4の硬化性組成物をマイクロクラフト社製CP56151にて、硫酸処理済の銅厚12μmで回路パターンが形成されているポリイミド25μmの基板上に塗布した。その後、上記「(2)硬化膜の形成条件」に従い、厚さ20μmの硬化膜を形成した。得られた硬化膜に対し、JIS P8115に基づくMIT試験(R=0.38mm)を実施し、屈曲性を評価した。 (5) Flexibility (MIT test)
The curable compositions of Examples 1 to 18 and Comparative Examples 1 to 4 were applied to a polyimide 25 μm substrate having a circuit pattern formed of a sulfuric acid-treated copper thickness of 12 μm with CP56151 manufactured by Microcraft. Then, according to the above "(2) Conditions for forming a cured film", a cured film having a thickness of 20 μm was formed. A MIT test (R = 0.38 mm) based on JIS P8115 was carried out on the obtained cured film, and the flexibility was evaluated.
○:150~199回
△:101~149回
×:100回以下 ⊚: 200 times or more ○: 150 to 199 times △: 101 to 149 times ×: 100 times or less
実施例1~18および比較例1~4の硬化性組成物をインクジェット印刷装置CPS6151(マイクロクラフト社製)にて、光硬化条件800mJ/cm2にて、硫酸処理済の銅厚12μm、ポリイミド50μmの回路パターン基板上に塗布した。その後、上記「(2)硬化膜の形成条件」に従い、厚さ20μmの硬化膜を形成した。得られた評価基板に対してロジン系フラックスを塗布し、予め260℃に設定したはんだ槽に5秒間浸漬を1回もしくは2回行い、変性アルコールでフラックスを洗浄した後、クロスカットテープピール試験を行い、硬化膜の膨れ・剥がれについて評価した。判定基準は以下のとおりである。 (6) Solder heat resistance The curable compositions of Examples 1 to 18 and Comparative Examples 1 to 4 have been treated with sulfuric acid by an inkjet printing apparatus CPS6151 (manufactured by Microcraft Co., Ltd.) under a photocuring condition of 800 mJ / cm 2 . It was applied onto a circuit pattern substrate having a copper thickness of 12 μm and a polyimide of 50 μm. Then, according to the above "(2) Conditions for forming a cured film", a cured film having a thickness of 20 μm was formed. A rosin-based flux is applied to the obtained evaluation substrate, immersed in a solder bath set at 260 ° C. in advance for 5 seconds once or twice, the flux is washed with a modified alcohol, and then a cross-cut tape peel test is performed. This was performed and the swelling and peeling of the cured film were evaluated. The judgment criteria are as follows.
○:5秒×1回浸漬を行い、セロテープ(登録商標)でピール試験を行っても硬化膜に剥がれが認められないが、5秒×2回浸漬を行うと硬化膜に膨れ、剥がれがある
×:5秒×1回浸漬を行うと硬化膜に膨れ、剥がれがある。 ⊚: No peeling was observed in the cured film even after soaking for 5 seconds x 2 times and performing a peel test with cellophane tape (registered trademark).
◯: No peeling was observed in the cured film even after dipping for 5 seconds x 1 time and performing a peel test with cellophane tape (registered trademark), but when immersed for 5 seconds x 2 times, the cured film swelled and peeled. X: After dipping for 5 seconds × 1 time, the cured film swells and peels off.
実施例1~18および比較例1~4の硬化性組成物をインクジェット印刷装置CPS6151(マイクロクラフト社製)にて、光硬化条件800mJ/cm2にて、硫酸処理済のエスパネックス(登録商標)M(日鉄ケミカル&マテリアル社製)の銅表面上に塗布し、熱風循環式乾燥炉にて150℃、60分加熱して厚さ20μmの硬化膜を得た。硬化膜を、プロピレングリコールモノメチルアセテートに30分間浸漬した後の塗膜状態を評価した。評価基準は以下の通りである。 (7) Solvent resistance The curable compositions of Examples 1 to 18 and Comparative Examples 1 to 4 have been treated with sulfuric acid by an inkjet printing apparatus CPS6151 (manufactured by Microcraft Co., Ltd.) under a photocuring condition of 800 mJ / cm 2 . It was applied onto the copper surface of Espanex (registered trademark) M (manufactured by Nittetsu Chemical & Materials Co., Ltd.) and heated at 150 ° C. for 60 minutes in a hot air circulation type drying oven to obtain a cured film having a thickness of 20 μm. The state of the coating film after immersing the cured film in propylene glycol monomethyl acetate for 30 minutes was evaluated. The evaluation criteria are as follows.
△:ほんの僅か変化しているもの
×:顕著に変化しているもの ○: No change is observed △: Slightly changed ×: Significantly changed
実施例1~18および比較例1~4の硬化性組成物をインクジェット印刷装置CPS6151(マイクロクラフト社製)にて、硫酸処理済の銅厚12μm、ポリイミド50μmの回路パターン基板上に塗布した。その後、上記「(2)硬化膜の形成条件」に従い、厚さ20μmの硬化膜を形成した。得られた評価基板に対し市販の無電解ニッケルめっき浴及び無電解金めっき浴を用いて、ニッケル5μm、金0.03μmの条件で金めっきを行い、硬化膜表面状態の観察を行った。評価基準は以下の通りである。 (8) Electrolytic gold plating resistance A circuit in which the curable compositions of Examples 1 to 18 and Comparative Examples 1 to 4 are treated with sulfuric acid using an inkjet printing device CPS6151 (manufactured by Microcraft) to have a copper thickness of 12 μm and a polyimide of 50 μm. It was applied on a pattern substrate. Then, according to the above "(2) Conditions for forming a cured film", a cured film having a thickness of 20 μm was formed. The obtained evaluation substrate was gold-plated using a commercially available electroless nickel plating bath and an electroless gold plating bath under the conditions of nickel 5 μm and gold 0.03 μm, and the surface condition of the cured film was observed. The evaluation criteria are as follows.
×:顕著に白化若しくは曇りが生じたもの ○: No change is observed ×: Significant whitening or cloudiness occurs
実施例1~18および比較例1~4の硬化性組成物をインクジェット印刷装置CPS6151(マイクロクラフト社製)にて、カプトン100H(東レ・デュポン社製)上に両面塗布した。その後、上記「(2)硬化膜の形成条件」に従い、硬化膜を形成した(各面の塗膜厚さは20μmである)。得られた硬化膜についてUL94規格に準拠した薄材垂直燃焼試験を行った。評価基準は以下の通りである。 (9) Flame Retardant The curable compositions of Examples 1 to 18 and Comparative Examples 1 to 4 were coated on both sides of Kapton 100H (manufactured by Toray DuPont) using an inkjet printing device CPS6151 (manufactured by Microcraft). .. Then, a cured film was formed according to the above "(2) Conditions for forming a cured film" (the thickness of the coating film on each surface is 20 μm). The obtained cured film was subjected to a thin vertical combustion test conforming to the UL94 standard. The evaluation criteria are as follows.
○:VTM-0合格し、各サンプルの燃焼時間が7秒超10秒以内のもの
Not:VTM-0不合格 ⊚: VTM-0 passed and the burning time of each sample was less than 7 seconds ○: VTM-0 passed and each sample burned within 10 seconds Not: VTM-0 failed
なお、実施例16~18は難燃性の試験で不合格(Not評価)となっているが、難燃剤を含んでいないことに起因するものであり、本発明の効果を否定するものではない。 Further, from the comparison between Examples 1 to 3 and 15 and Examples 16 to 18, in addition to being able to impart flame retardancy to the cured coating film by further containing (F) a flame retardant, after exposure. The low warpage is further improved. From the comparison between Examples 14 and 15, the heat resistance of the coating film after curing was further improved because the flame retardant (F) was a phosphorus-based flame retardant.
Although Examples 16 to 18 have failed the flame retardancy test (Not evaluation), this is due to the fact that they do not contain a flame retardant, and the effect of the present invention is not denied. ..
Claims (12)
- (A)式(1)
で表されるラジカル重合性モノマーと、
(B)(メタ)アクリロイル基を2個有する光硬化性ウレタン化合物と、
(C)(A)、(B)以外の(メタ)アクリロイル基を有する化合物と、
(D)光重合開始剤と、
(E)熱硬化成分と、
を含有することを特徴とする硬化性組成物。 (A) Equation (1)
The radically polymerizable monomer represented by
(B) A photocurable urethane compound having two (meth) acryloyl groups and
(C) Compounds having (meth) acryloyl groups other than (A) and (B), and
(D) Photopolymerization initiator and
(E) Thermosetting component and
A curable composition comprising. - (F)難燃剤を含むことを特徴とする請求項1に記載の硬化性組成物。 (F) The curable composition according to claim 1, which contains a flame retardant.
- (F)難燃剤に対する(B)(メタ)アクリロイル基を2個有する光硬化性ウレタン化合物の配合量が1質量%以上70質量%であることを特徴とする請求項2に記載の硬化性組成物。 (F) The curable composition according to claim 2, wherein the blending amount of the photocurable urethane compound having two (B) (meth) acryloyl groups with respect to the flame retardant is 1% by mass or more and 70% by mass. thing.
- (B)(メタ)アクリロイル基を2個有する光硬化性ウレタン化合物に対する(A)式(1)で表されるラジカル重合性モノマーの配合割合が250質量%以上10,000質量%以下であることを特徴とする請求項1~3の何れか1項に記載の硬化性組成物。 (B) The mixing ratio of the radically polymerizable monomer represented by the formula (1) to the photocurable urethane compound having two (meth) acryloyl groups is 250% by mass or more and 10,000% by mass or less. The curable composition according to any one of claims 1 to 3, wherein the curable composition is characterized by.
- (F)難燃剤に対する(A)式(1)で表されるラジカル重合性モノマーの配合割合が50質量%以上350質量%以下であることを特徴とする請求項2~4の何れか1項に記載の硬化性組成物。 (F) Any one of claims 2 to 4, wherein the mixing ratio of the radically polymerizable monomer represented by the formula (A) to the flame retardant is 50% by mass or more and 350% by mass or less. The curable composition according to.
- (E)熱硬化成分が潜在性熱硬化成分を含むことを特徴とする請求項1~5の何れか1項に記載の硬化性組成物。 (E) The curable composition according to any one of claims 1 to 5, wherein the thermosetting component contains a latent thermosetting component.
- 前記潜在性熱硬化成分がブロックイソシアネート化合物であることを特徴とする請求項6に記載の硬化性組成物。 The curable composition according to claim 6, wherein the latent thermosetting component is a blocked isocyanate compound.
- (F)難燃剤がリン系難燃剤であることを特徴とする請求項2~7の何れか1項に記載の硬化性組成物。 (F) The curable composition according to any one of claims 2 to 7, wherein the flame retardant is a phosphorus-based flame retardant.
- 前記リン系難燃剤がフェノキシホスファゼンであることを特徴とする請求項8に記載の硬化性組成物 The curable composition according to claim 8, wherein the phosphorus-based flame retardant is phenoxyphosphazene.
- 50℃における粘度が50mPa・s以下であることを特徴とする請求項1~9の何れか1項に記載の硬化性組成物 The curable composition according to any one of claims 1 to 9, wherein the viscosity at 50 ° C. is 50 mPa · s or less.
- 請求項1~10の何れか一項に記載の硬化性組成物より得られる硬化物。 A cured product obtained from the curable composition according to any one of claims 1 to 10.
- 請求項11に記載の硬化物を有する電子部品。 An electronic component having the cured product according to claim 11.
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JP2014040585A (en) * | 2012-07-25 | 2014-03-06 | Nippon Shokubai Co Ltd | Photocurable composition |
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