WO2021193573A1 - 熱分解ガス精製冷却装置及び熱分解ガス精製冷却方法、並びに、有機物質製造装置及び有機物質の製造方法 - Google Patents
熱分解ガス精製冷却装置及び熱分解ガス精製冷却方法、並びに、有機物質製造装置及び有機物質の製造方法 Download PDFInfo
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- C10J—PRODUCTION OF PRODUCER GAS, WATER-GAS, SYNTHESIS GAS FROM SOLID CARBONACEOUS MATERIAL, OR MIXTURES CONTAINING THESE GASES; CARBURETTING AIR OR OTHER GASES
- C10J3/00—Production of combustible gases containing carbon monoxide from solid carbonaceous fuels
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- C10J3/82—Gas withdrawal means
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- C10K—PURIFYING OR MODIFYING THE CHEMICAL COMPOSITION OF COMBUSTIBLE GASES CONTAINING CARBON MONOXIDE
- C10K1/00—Purifying combustible gases containing carbon monoxide
- C10K1/02—Dust removal
- C10K1/026—Dust removal by centrifugal forces
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D45/00—Separating dispersed particles from gases or vapours by gravity, inertia, or centrifugal forces
- B01D45/12—Separating dispersed particles from gases or vapours by gravity, inertia, or centrifugal forces by centrifugal forces
- B01D45/16—Separating dispersed particles from gases or vapours by gravity, inertia, or centrifugal forces by centrifugal forces generated by the winding course of the gas stream, the centrifugal forces being generated solely or partly by mechanical means, e.g. fixed swirl vanes
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J6/00—Heat treatments such as Calcining; Fusing ; Pyrolysis
- B01J6/008—Pyrolysis reactions
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- B04—CENTRIFUGAL APPARATUS OR MACHINES FOR CARRYING-OUT PHYSICAL OR CHEMICAL PROCESSES
- B04C—APPARATUS USING FREE VORTEX FLOW, e.g. CYCLONES
- B04C5/00—Apparatus in which the axial direction of the vortex is reversed
- B04C5/20—Apparatus in which the axial direction of the vortex is reversed with heating or cooling, e.g. quenching, means
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- C01B3/00—Hydrogen; Gaseous mixtures containing hydrogen; Separation of hydrogen from mixtures containing it; Purification of hydrogen; Reversible storage of hydrogen
- C01B3/02—Production of hydrogen; Production of gaseous mixtures containing hydrogen
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- C10K1/00—Purifying combustible gases containing carbon monoxide
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- C10K1/00—Purifying combustible gases containing carbon monoxide
- C10K1/04—Purifying combustible gases containing carbon monoxide by cooling to condense non-gaseous materials
- C10K1/06—Purifying combustible gases containing carbon monoxide by cooling to condense non-gaseous materials combined with spraying with water
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- C10K1/00—Purifying combustible gases containing carbon monoxide
- C10K1/08—Purifying combustible gases containing carbon monoxide by washing with liquids; Reviving the used wash liquors
- C10K1/10—Purifying combustible gases containing carbon monoxide by washing with liquids; Reviving the used wash liquors with aqueous liquids
- C10K1/101—Purifying combustible gases containing carbon monoxide by washing with liquids; Reviving the used wash liquors with aqueous liquids with water only
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- C10K3/00—Modifying the chemical composition of combustible gases containing carbon monoxide to produce an improved fuel, e.g. one of different calorific value, which may be free from carbon monoxide
- C10K3/001—Modifying the chemical composition of combustible gases containing carbon monoxide to produce an improved fuel, e.g. one of different calorific value, which may be free from carbon monoxide by thermal treatment
- C10K3/003—Reducing the tar content
- C10K3/006—Reducing the tar content by steam reforming
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- C12P—FERMENTATION OR ENZYME-USING PROCESSES TO SYNTHESISE A DESIRED CHEMICAL COMPOUND OR COMPOSITION OR TO SEPARATE OPTICAL ISOMERS FROM A RACEMIC MIXTURE
- C12P7/00—Preparation of oxygen-containing organic compounds
- C12P7/02—Preparation of oxygen-containing organic compounds containing a hydroxy group
- C12P7/04—Preparation of oxygen-containing organic compounds containing a hydroxy group acyclic
- C12P7/06—Ethanol, i.e. non-beverage
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- C12P7/00—Preparation of oxygen-containing organic compounds
- C12P7/02—Preparation of oxygen-containing organic compounds containing a hydroxy group
- C12P7/04—Preparation of oxygen-containing organic compounds containing a hydroxy group acyclic
- C12P7/06—Ethanol, i.e. non-beverage
- C12P7/08—Ethanol, i.e. non-beverage produced as by-product or from waste or cellulosic material substrate
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- C10J2300/092—Wood, cellulose
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- C10J2300/00—Details of gasification processes
- C10J2300/09—Details of the feed, e.g. feeding of spent catalyst, inert gas or halogens
- C10J2300/0913—Carbonaceous raw material
- C10J2300/0946—Waste, e.g. MSW, tires, glass, tar sand, peat, paper, lignite, oil shale
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- C10J2300/00—Details of gasification processes
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- C10J2300/0956—Air or oxygen enriched air
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- C10J2300/00—Details of gasification processes
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- C10J2300/00—Details of gasification processes
- C10J2300/16—Integration of gasification processes with another plant or parts within the plant
- C10J2300/164—Integration of gasification processes with another plant or parts within the plant with conversion of synthesis gas
- C10J2300/1656—Conversion of synthesis gas to chemicals
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- C10J2300/00—Details of gasification processes
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- C10J2300/1656—Conversion of synthesis gas to chemicals
- C10J2300/1665—Conversion of synthesis gas to chemicals to alcohols, e.g. methanol or ethanol
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- C10J2300/1681—Integration of gasification processes with another plant or parts within the plant with biological plants, e.g. involving bacteria, algae, fungi
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- C10J2300/00—Details of gasification processes
- C10J2300/18—Details of the gasification process, e.g. loops, autothermal operation
- C10J2300/1846—Partial oxidation, i.e. injection of air or oxygen only
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- C10J2300/00—Details of gasification processes
- C10J2300/18—Details of the gasification process, e.g. loops, autothermal operation
- C10J2300/1861—Heat exchange between at least two process streams
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- C10J2300/00—Details of gasification processes
- C10J2300/18—Details of the gasification process, e.g. loops, autothermal operation
- C10J2300/1861—Heat exchange between at least two process streams
- C10J2300/1892—Heat exchange between at least two process streams with one stream being water/steam
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E50/00—Technologies for the production of fuel of non-fossil origin
- Y02E50/10—Biofuels, e.g. bio-diesel
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
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- Y02P20/50—Improvements relating to the production of bulk chemicals
- Y02P20/52—Improvements relating to the production of bulk chemicals using catalysts, e.g. selective catalysts
Definitions
- the present invention includes a pyrolysis gas purification / cooling device for a pyrolysis gas derived from waste, a method for purifying and cooling the pyrolysis gas, and an organic substance production device and an organic substance for producing an organic substance using a synthetic gas derived from waste as a raw material. Regarding the method of manufacturing a substance.
- Pyrolysis gas derived from waste contains a lot of impurities such as tar and char, and it is difficult to use it as it is for power generation and chemical synthesis.
- the thermal decomposition gas derived from waste gas ifies substances containing a large amount of components other than carbon, so that the gas phase and solid phase include sublimable substances such as naphthalene, 1-naphthol and 2-naphthol. It contains phase-transferable impurities that can be phase-transferred between them. Therefore, the pyrolysis gas derived from waste is generally used after gas purification for removing these impurities.
- the pyrolysis gas derived from waste has a high temperature at the time of generation, but when using the pyrolysis gas, it may be required to cool it to a low temperature.
- the pyrolysis gas when the pyrolysis gas is converted into an organic substance such as ethanol by a microbial catalyst, it is required to cool it to 40 ° C. or lower. Therefore, the pyrolysis gas derived from waste needs to be cooled while purifying the gas.
- phase transition impurities in the gas are precipitated by a cooler, a filter, etc., and dust components such as tar and char are adsorbed on the surface and enlarged. ,
- the cooling efficiency may be lowered or the gas flow path may be blocked. In order to avoid these events, it is necessary to frequently perform cleaning work for phase transition impurities and dust, which causes a problem that maintenance is complicated and operating cost is increased.
- the present inventor has found that the above problems can be solved by arranging a cyclone in the subsequent stage of the gasification furnace and allowing the pyrolysis gas discharged from the gasification furnace to pass through the cyclone.
- the first form of was completed. That is, the first embodiment of the present invention provides the following [1] to [28].
- [1] A gasifier that gasifies waste to generate a pyrolysis gas, and a cyclone that recovers dust in the pyrolysis gas by passing the pyrolysis gas discharged from the pyrolysis furnace.
- a pyrolysis gas purification cooling device including a heat exchanger that passes and cools the pyrolysis gas that has passed through the cyclone.
- the pyrolysis gas purification cooling device comprising a differential pressure measuring device for measuring the differential pressure between the front stage and the rear stage of the filtration type dust collector.
- the concentration measuring device for measuring the concentration of at least one selected from the phase transition impurities and the solid impurities in the pyrolysis gas discharged from the gasifier is provided.
- the pyrolysis gas purification cooling device according to any one of [10] to [12], comprising a flow path switching unit for selectively switching the filtration type dust collector or the scrubber through which the pyrolysis gas is passed. ..
- An organic substance manufacturing apparatus further provided with a substance generating unit.
- a pyrolysis gas purification cooling method including a step of recovering and a step of cooling the pyrolysis gas that has passed through the cyclone by passing it through a heat exchanger.
- a method for producing an organic substance further containing.
- the present invention also provides the following second embodiment.
- the second embodiment it is possible to obtain a synthetic gas having a high content of at least one of hydrogen and carbon monoxide and appropriately cooled by a heat exchanger. That is, the second aspect of the present invention provides the following [29] to [48].
- a gasifier that gasifies waste to generate pyrolysis gas
- a reformer that reforms the pyrolysis gas discharged from the gasifier
- the heat that has passed through the reformer a pyrolysis gas purification cooling device including a heat exchanger that allows decomposition gas to pass through and cools.
- the pyrolysis gas purification cooling device according to [29] wherein the pyrolysis gas is cooled to a temperature of 30 ° C.
- Purification cooling device Any of [29] to [33], which comprises a filtration type dust collector and a scrubber, and the filtration type dust collector and the scrubber are arranged in parallel after the heat exchanger.
- the pyrolysis gas purification cooling device according to [34] comprising a differential pressure measuring device for measuring the differential pressure between the front stage and the rear stage of the filtration type dust collector.
- the concentration measuring device for measuring the concentration of at least one selected from the phase transition impurities and the solid impurities in the pyrolysis gas discharged from the gasifier is provided.
- An organic substance manufacturing apparatus further provided with a substance generating unit.
- a method for purifying and cooling a pyrolysis gas which comprises a step of cooling the pyrolysis gas that has passed through the reforming furnace by passing it through a heat exchanger.
- [41] [39] or [40] further includes a step of passing the thermal decomposition gas cooled by the heat exchanger through the gas cooling tower and cooling it with water sprayed inside the gas cooling tower.
- the thermal decomposition gas purification cooling method according to the above method.
- the method for purifying and cooling a pyrolysis gas according to any one of [39] to [42] further comprising a step of passing the pyrolysis gas cooled by the heat exchanger through a scrubber.
- the supply of the synthetic gas to the filtration type dust collector or the scrubber is selectively switched by the flow path switching unit according to the measurement result of at least one of the differential pressure measuring device and the concentration measuring device.
- a method for producing an organic substance further containing.
- the present invention it is possible to prevent a decrease in cooling efficiency or blockage of a gas flow path, efficiently remove impurities from a pyrolysis gas derived from waste, and preferably cool and purify the pyrolysis gas. It becomes possible to provide a pyrolysis gas refining cooling device and a pyrolysis gas refining cooling method, and an organic substance manufacturing device and an organic substance manufacturing method for producing an organic substance from a synthetic gas derived from waste as a raw material. ..
- the organic substance manufacturing apparatus 1 As shown in FIG. 1, the organic substance manufacturing apparatus 1 according to the first embodiment of the present invention includes a pyrolysis gas purification cooling apparatus 2.
- the organic substance manufacturing apparatus 1 according to the first embodiment of the present invention and the method for manufacturing an organic substance will be described in detail with reference to the embodiments.
- the organic substance manufacturing apparatus 1 is a pyrolysis gas purification cooling apparatus 2 that gasifies waste to generate a pyrolysis gas G1 and performs a treatment including at least a purification treatment and a cooling treatment on the pyrolysis gas G1 and a pyrolysis.
- the gas purification cooling device 2 includes an organic substance generation unit 3 that produces an organic substance by contacting the synthetic gas G2 obtained by treating the pyrolysis gas G1 with a microbial catalyst.
- the pyrolysis gas purification cooling device 2 in the first embodiment is arranged after the gasification furnace 10, the cyclone 11 arranged after the gasification furnace 10, and the subsequent stage of the cyclone 11. It includes at least a heat exchanger 20.
- the pyrolysis gas refining / cooling device 2 further includes a reforming furnace 12 in the subsequent stage of the cyclone 11 and in front of the heat exchanger 20.
- the pyrolysis gas purification cooling device 2 is further provided with one or more processing devices (hereinafter, these may be collectively referred to as “post-stage processing device 13”) after the heat exchanger 20.
- the latter stage means the latter stage along the gas supply flow of the pyrolysis gas G1.
- the pre-stage means a pre-stage along the supply flow of the pyrolysis gas G1.
- the supply flow of the pyrolysis gas G1 means a flow from the pyrolysis gas G1 being discharged from the gasification furnace 10 to the synthetic gas G2 reformed in the reforming furnace 12 being introduced into the organic substance generation unit 3. ..
- the gasification furnace 10 is a device that generates a pyrolysis gas G1 derived from waste by burning the waste, thermally decomposing it, or the like.
- the waste gasified in the gasifier 10 may be industrial waste such as industrial solid waste, general waste such as urban solid waste (MSW), plastic waste, garbage, and waste. Examples include flammable substances such as tires, biomass waste, food waste, building materials, wood, wood chips, fibers and papers. Of these, municipal solid waste (MSW) is preferred.
- the gasification furnace 10 is not particularly limited, and examples thereof include a kiln gasification furnace, a fixed bed gasification furnace, a fluidized bed gasification furnace, a shaft furnace, a thermoselect furnace, a plasma type gasification furnace, and the like.
- oxygen or air and, if necessary, steam are introduced into the gasification furnace 10.
- the gasification furnace 10 thermally decomposes the waste by heating it at, for example, 500 to 1,100 ° C., preferably 500 to 700 ° C., and appropriately partially oxidizes it to gasify it.
- the pyrolysis gas G1 contains not only carbon monoxide and hydrogen but also tar and char.
- the pyrolysis gas G1 is supplied to the pyrolysis gas purification cooling device 2. Solids and the like generated as incombustibles in the gasification furnace 10 are appropriately recovered.
- the cyclone 11 introduces the pyrolysis gas G1 obtained in the gasification furnace 10 and swirls the pyrolysis gas G1 passing through the cyclone 11 to generate a centrifugal force, and the pyrolysis gas G1 is generated by the centrifugal force. It is a device that separates and removes and recovers solid dust contained in.
- the “dust content” refers to solid components such as tar and char contained in the pyrolysis gas G1.
- the pyrolysis gas G1 whose dust is separated and removed by the cyclone 11 is supplied to the reforming furnace 12.
- "removal” means removing at least a part of the target substance from the gas to reduce the concentration of the target substance in the gas, and completely removes the target substance to be removed. Not limited to removal.
- the temperature of the pyrolysis gas G1 supplied to the cyclone 11 is not particularly limited as long as it is within the heat resistant temperature of the cyclone 11, but is, for example, 500 ° C. or higher and 1,100 ° C. or lower, preferably 500 ° C. or higher and 900 ° C. More preferably, it is 500 ° C. or higher and 700 ° C. or lower.
- the dust separated and removed by the cyclone 11 is preferably reused, and more preferably, it is supplied to the gasifier 10 via the dust supply path 11a provided in the cyclone 11. Since the main component of the dust content separated and removed by the cyclone 11 is a carbon component, the carbon monoxide content in the synthetic gas G2, which will be described later, can be adjusted by resupplying the dust to the gasification furnace 10. ..
- the pyrolysis gas G1 obtained in the gasification furnace 10 is reformed, the content of at least one of hydrogen and carbon monoxide in the pyrolysis gas G1 increases, and the gas is discharged as a synthetic gas G2.
- tar and char contained in the pyrolysis gas G1 are reformed into hydrogen, carbon monoxide, and the like.
- the temperature of the synthetic gas G2 in the reforming furnace 12 is not particularly limited, but is, for example, 900 ° C. or higher, preferably 900 ° C. or higher and 1,300 ° C. or lower, and more preferably 1,000 ° C. or higher and 1,200 ° C. or lower. By setting the temperature in the reforming furnace 12 within the above range, it becomes easy to obtain a synthetic gas G2 having a high content of carbon monoxide and hydrogen.
- the temperature of the synthetic gas G2 discharged from the reformer 12 is the same as the temperature of the synthetic gas G2, for example, 900 ° C. or higher, preferably 900 ° C. or higher and 1,300 ° C. or lower, more preferably 1,000 ° C. or higher. It is 1,200 ° C. or lower.
- the synthetic gas G2 discharged from the reformer 12 contains carbon monoxide and hydrogen. Further, the synthetic gas G2 contains, for example, carbon monoxide in an amount of 0.1% by volume or more and 80% by volume or less, and hydrogen in an amount of 0.1% by volume or more and 80% by volume or less.
- the carbon monoxide concentration in the synthetic gas G2 is preferably 10% by volume or more and 70% by volume or less, and more preferably 20% by volume or more and 55% by volume or less.
- the hydrogen concentration in the synthetic gas G2 is preferably 10% by volume or more and 70% by volume or less, and more preferably 20% by volume or more and 55% by volume or less.
- the synthetic gas G2 may contain carbon dioxide, nitrogen, oxygen and the like in addition to hydrogen and carbon monoxide.
- the carbon dioxide concentration in the synthetic gas G2 is not particularly limited, but is preferably 0.1% by volume or more and 40% by volume or less, and more preferably 0.3% by volume or more and 30% by volume or less.
- the carbon dioxide concentration is particularly preferably lowered when ethanol is produced by using a microbial catalyst, and from such a viewpoint, it is more preferably 0.5% by volume or more and 25% by volume or less.
- the nitrogen concentration in the synthetic gas G2 is usually 40% by volume or less, preferably 1% by volume or more and 20% by volume or less.
- the oxygen concentration in the synthetic gas G2 is usually 5% by volume or less, preferably 1% by volume or less. Further, the oxygen concentration should be as low as possible, and may be 0% by volume or more. However, in general, oxygen is inevitably contained in many cases, and the oxygen concentration is practically 0.01% by volume or more.
- the concentrations of carbon monoxide, carbon dioxide, hydrogen, nitrogen and oxygen in the synthetic gas G2 are the type of waste, the temperature of the gasifier 10 and the reformer 12, and the oxygen concentration of the supply gas supplied to the gasifier 10.
- the predetermined range By appropriately changing the combustion conditions such as, the predetermined range can be obtained. For example, if you want to change the concentration of carbon monoxide or hydrogen, change to waste with a high ratio of hydrocarbons (carbon and hydrogen) such as waste plastic, and if you want to reduce the nitrogen concentration, change the oxygen concentration in the gasifier 10.
- the concentration of each component of carbon monoxide, carbon dioxide, hydrogen and nitrogen may be appropriately adjusted in the synthetic gas G2.
- the concentration may be adjusted by adding at least one of these components to the synthetic gas G2.
- the volume% of each substance in the above-mentioned synthetic gas G2 means the volume% of each substance in the synthetic gas G2 discharged from the reforming furnace 12.
- the heat exchanger 20 is a device that cools the synthetic gas G2 using a heat medium.
- the heat exchanger 20 cools the syngas G2 by transferring the heat energy of the syngas G2 to a heat medium.
- a boiler is preferably used as the heat exchanger 20.
- the boiler is a device in which water as a heat medium is circulated inside, and the circulated water is heated by the heat energy of the synthetic gas G2 to be steamed. When the boiler is used as the heat exchanger 20, the steam generated in the boiler makes it possible to easily heat other devices, and the heat energy of the synthetic gas G2 can be easily reused.
- the heat exchanger 20 can be used for other than the boiler.
- the heat exchanger 20 other than the boiler may have any configuration as long as heat energy is transferred from the synthetic gas G2 to the heat medium, but a partition wall system in which the synthetic gas G2 and the heat medium do not come into direct contact with each other is preferable.
- the heat medium may be either a gas or a liquid, or may have a phase change between the gas and the liquid. Further, the heat medium may be transferred with heat energy from the synthetic gas G2 in a state of being passed through a flow path having any shape such as a tubular shape or a plate shape. If a boiler is used as the heat exchanger 20, it is difficult to cool to a low temperature of 100 ° C.
- heat exchanger 20 other than the boiler, it is possible to cool to a low temperature of 100 ° C. or lower. become.
- the heat exchanger 20 two or more heat exchangers may be combined, and for example, a boiler and a heat exchanger other than the boiler may be combined.
- the heat exchanger 20 cools the synthetic gas G2 supplied at a high temperature of, for example, 900 ° C. or higher, and cools the synthetic gas G2 to, for example, 30 ° C. or higher and 300 ° C. or lower, preferably 40 ° C. or higher and 240 ° C. or lower.
- phase transition impurities such as naphthalene solidify and precipitate, and dust is deposited on the surface of the precipitated phase transition impurities. Adsorbs and enlarges, causing blockage of the gas flow path.
- the synthetic gas G2 supplied to the heat exchanger 20 passes through the cyclone 11, the dust component is separated and removed in the cyclone 11. Therefore, even if the temperature is cooled to 240 ° C. or lower, the dust content in the synthetic gas G2 is removed, so that the enlargement due to the dust content can be suppressed. Therefore, the synthetic gas G2 can be sufficiently cooled by the heat exchanger 20, and the load due to cooling in the post-stage processing device can be reduced. Then, for example, by cooling to 100 ° C. or lower, it is possible to omit the installation of a part of the cooling device in the subsequent stage (for example, a cooling tower described later). Further, for example, by cooling the synthetic gas G2 to about 40 ° C. with the heat exchanger 20, the synthetic gas G2 having a temperature appropriate for the microbial catalyst can be supplied to the organic substance generation unit 3 without providing a separate cooling device. Can be supplied.
- the thermal decomposition gas purification cooling device 2 is a post-processing device 13 arranged after the heat exchanger 20 and includes a water separation device including a gas cooling tower, a filtration type dust collector, a scrubber, an oil scrubber, and a gas chiller, and low temperature separation.
- Method (deep cooling method) separation device fine particle separation device composed of various filters, desulfurization device (sulfide separation device), film separation method separation device, deoxidizer, pressure swing adsorption type separation device (PSA) , Temperature swing adsorption type separation device (TSA), Pressure temperature swing adsorption type separation device (PTSA), Separation device using activated carbon, Deoxidizing catalyst, specifically, Separation device using copper catalyst or palladium catalyst. , Shift reactor and the like. These may be used alone or in combination of two or more.
- the post-stage treatment device 13 shown in FIG. 2 includes a gas cooling tower 21 arranged after the heat exchanger 20, a filtration type dust collector 22 arranged after the gas cooling tower 21, and a filtration dust collector 22. It is provided with a scrubber 23 arranged in the subsequent stage. Further, the post-stage processing device 13 further includes another processing device (not shown) in the subsequent stage of the scrubber 23, and the synthetic gas G2 discharged from the scrubber 23 is subjected to processing such as purification and cooling by the post-stage processing device. It may be done as appropriate.
- the heat exchanger 20 is, for example, 100 ° C. or higher and 300 ° C. or lower, preferably 120 ° C. or higher and 240 ° C. or lower, more preferably 140 ° C. Cool to a temperature of 200 ° C or lower.
- the gas cooling tower 21 is arranged after the heat exchanger 20. Therefore, if the temperature to be cooled by the heat exchanger 20 is within the above range, the gas cooling tower 21 is provided. Since the synthetic gas G2 having a relatively low temperature is supplied to the gas cooling tower 21, it is not necessary to excessively cool the gas in the gas cooling tower 21.
- the amount of water sprayed on the synthetic gas G2 in the gas cooling tower 21 can be reduced, and it is not necessary to supply the synthetic gas G2 having a higher water content to the filtration type dust collector 22 and the scrubber 23. .. Therefore, it is possible to suppress the amount of water moving from the gas cooling tower 21 to the scrubber 23, and it is also possible to prevent the water from agglomerating too much in the filtration type dust collector 22.
- the gas cooling tower 21 is a facility for cooling the gas (synthetic gas G2) passing through the inside of the gas cooling tower 21 by spraying water.
- the gas cooling tower 21 is provided with one or more water spray ports 24 for spraying water on the synthetic gas G2 on its inner peripheral surface. Two or more water spray ports 24 are preferably provided, and two or more water spray ports 24 are more preferably provided at different height positions in the cooling tower 21. Since a plurality of water spray ports 24 are provided and their height positions are different, the synthetic gas G2 can be sufficiently and efficiently cooled by water spraying.
- the synthetic gas G2 is preferably introduced into the gas cooling tower 21 from the upper side thereof, and the synthetic gas G2 is passed through the inside of the gas cooling tower 21 so as to be a downdraft, and passes through the inside of the gas cooling tower 21. During this period, the gas is cooled by the water sprayed from the water spray port 24. In this case, the synthetic gas G2 may be discharged from the lower side of the gas cooling tower 21.
- the synthetic gas G2 introduced into the gas cooling tower 21 has a temperature of 100 ° C. or higher, while the water sprayed from the water spray port 24 is lower than 100 ° C. Therefore, the synthetic gas G2 is cooled by the temperature difference thereof, and is also cooled by the heat of vaporization when the water sprayed from the water spray port 24 is vaporized. It is preferable that a part of vaporized water is mixed as water vapor in the synthetic gas G2.
- the water sprayed from the water spray port 24 may be partially or wholly vaporized at the time of spraying.
- the synthetic gas G2 is preferably cooled to a temperature of 100 ° C. or higher and 200 ° C. or lower, and is discharged to the outside of the gas cooling tower 21 in the above temperature range.
- the synthetic gas G2 is purified by the filtration type dust collector 22 without damaging the filtration type dust collector 22 described later or deteriorating the dust collection performance. can.
- the temperature is 100 ° C. or higher, most of the sprayed water is vaporized and mixed in the synthetic gas G2. Therefore, in the gas cooling tower 21, a large amount of sprayed water is not drained, so that it is not necessary to install a large-scale drainage facility in the gas cooling tower 21.
- a part of the water sprayed on the gas cooling tower 21 may fall as a liquid below the gas cooling tower 21 and be recovered. Further, solid impurities such as tar and char remaining in the synthetic gas G2 may also fall downward and be recovered by colliding with the sprayed water.
- the synthetic gas G2 is more preferably cooled to a temperature of 120 ° C. or higher and 180 ° C. or lower, more preferably 130 ° C. or higher and 170 ° C. or lower, cooled to these temperatures, and discharged to the outside. ..
- the synthetic gas G2 By cooling the synthetic gas G2 to 120 ° C. or higher, it is possible to prevent a large amount of water mixed in the synthetic gas G2 from being liquefied in the gas cooling tower 21 and the filtration type dust collector 22 described later. Further, by setting the temperature to 180 ° C. or lower, it becomes easier to avoid damage and functional deterioration of the filtration type dust collector 22.
- the synthetic gas G2 cooled by the gas cooling tower 21 passes through the filtration type dust collector 22.
- the filtration type dust collector 22 can use what is called a bag filter, and includes a casing and a filter medium housed inside the casing.
- the filter medium is not particularly limited, but for example, a woven fabric such as glass fiber or PTFE fiber or felt or the like is used.
- the synthetic gas G2 may have solid impurities such as tar and char that could not be completely removed by the cyclone 11, but the solid impurities are removed by passing through the filtration type dust collector 22. By removing the solid impurities, it is possible to prevent the solid impurities from being clogged in each device in the subsequent stage of the filtration type dust collector 22.
- gas is generally blown into the reactor through a spurger, but clogging of solid impurities in the spurger can be prevented. Further, by removing the solid impurities, the activity of the microbial catalyst can be easily increased in the organic substance generating unit 3, the microbial catalyst can be prevented from being killed by the influence of the impurities, and the organic substance can be synthesized with high conversion efficiency.
- the temperature of the synthetic gas G2 when passing through the filtration type dust collector 22 is also preferably 100 ° C. or higher and 200 ° C. or lower, more preferably 120 ° C.
- the temperature is ° C. or higher and 180 ° C. or lower, more preferably 130 ° C. or higher and 170 ° C. or lower. Therefore, the filtration type dust collector 22 can be prevented from being damaged by the high-temperature synthetic gas G2 and the filtration performance is deteriorated. Further, it is possible to prevent the synthetic gas G2 contained in the synthetic gas G2 from being liquefied in a large amount in the filtration type dust collector 22.
- Syngas G2 contains various impurities other than the above-mentioned solid impurities, and includes, for example, water-soluble impurities.
- the water-soluble impurities include acid gases such as hydrogen sulfide, hydrogen chloride and blue acid, basic gases such as ammonia, and oxides such as NOx and SOx. These water-soluble impurities are removed by passing through the scrubber 23.
- the synthetic gas G2 also contains oily impurities such as BTEX (benzene, toluene, ethylbenzene, xylene), naphthalene, 1-naphthol, and 2-naphthol, which may also be appropriately removed by the scrubber 23. , Solid impurities and the like that could not be recovered by the filtration type dust collector 22 may be appropriately removed.
- BTEX benzene, toluene, ethylbenzene, xylene
- naphthalene 1-naphthol
- 2-naphthol 2-naphthol
- the scrubber 23 is not particularly limited as long as it has a configuration in which the synthetic gas G2 and water are brought into contact with each other, but as shown in FIG. ) Is preferably in contact with the synthetic gas G2.
- the scrubber 23 may be provided with an introduction path 27, a supply path 28, an discharge path 29, and the like.
- a storage unit 26 for storing wash water is provided in the lower part of the scrubber 23 in the lower part of the scrubber 23, a storage unit 26 for storing wash water is provided.
- the washing water stored in the storage unit 26 may be appropriately stirred by a stirring device (not shown).
- the introduction path 27 is a path for introducing the synthetic gas G2 into the scrubber 23, and the introduction port 27A of the introduction path 27 is, for example, above the liquid level of the washing water stored in the storage portion 26 inside the scrubber 12. It is provided in.
- the supply path 28 circulates water in the scrubber 23 and supplies wash water so as to come into contact with the synthetic gas G2. Specifically, the supply path 28 sprays the washing water stored in the storage unit 26 downward from the nozzle 25 inside the scrubber 23 and brings it into contact with the syngas G2.
- a pump (not shown) is provided in the supply path 28, and the washing water is pumped to the nozzle 25 by the pump. Then, the washing water is sprayed downward from the nozzle 25 inside the scrubber 12.
- the discharge path 29 is provided in the upper part of the scrubber 12, and discharges the synthetic gas G2 after contacting the washing water sprayed from the nozzle 25 to the outside.
- the washing water used in the scrubber 23 may be water alone, or a chemical may be added as appropriate.
- the scrubber 23 may be provided with a removal device 19.
- the removing device 19 is, for example, a device for removing impurities (oil-based impurities, solid impurities, water-soluble impurities, etc.) contained in the washing water.
- the removal device 19 may be provided, for example, with a circulation path for circulating water in the storage unit 26, and may be provided in the middle of the path.
- the removing device 19 may, for example, remove oily impurities contained in the washing water, solid impurities not dissolved in the washing water, water-soluble impurities dissolved in the washing water, and the like.
- the removing device 19 may be an oil-water separating device or the like, a filter for removing solid impurities, or a combination of two or more of these, and is included in the washing water. It may have any structure as long as impurities can be removed.
- the scrubber 23 is provided with the removing device 19 to prevent impurities from accumulating in the washing water.
- the synthetic gas G2 may be cooled by coming into contact with water in the scrubber 23.
- the synthetic gas G2 is cooled by the gas cooling tower 21 and has a predetermined temperature (preferably 100 ° C. or higher and 200 ° C. or lower, more preferably 120 ° C. or higher and 180 ° C. or lower, still more preferably 130 ° C. or higher and 170 ° C. or lower. It is introduced into the scrubber 23 in a state of being cooled to the temperature).
- the temperature of the water in contact with the synthetic gas G2 in the scrubber 23 is less than 100 ° C., preferably 0 ° C. or higher and 40 ° C. or lower, and more preferably 5 ° C. or higher and 30 ° C.
- the "temperature of water in contact with the synthetic gas G2" means, when the wash water is circulated and brought into contact with the synthetic gas G2 as described above, immediately before the water comes into contact with the synthetic gas G2. That is, the temperature of the water (washing water) sprayed from the nozzle 15 may be measured. Further, when the synthetic gas G2 is introduced into the stored water (washing water) as described later, the temperature of the washing water stored in the storage unit 26 may be measured.
- the synthetic gas G2 is cooled in the scrubber 23 to, for example, less than 100 ° C., preferably 40 ° C. or lower, and more preferably 38 ° C. or lower by contacting with water at the above temperature in the scrubber 23.
- the synthetic gas G2 is cooled to a predetermined temperature below the boiling point of water in the scrubber 23
- at least a part of the water (water vapor) mixed in the synthetic gas G2 is condensed and removed in the gas cooling tower 22.
- NS Therefore, it is possible to appropriately remove the water without separately providing a large-scale device for removing the water mixed by the gas cooling tower 22. Further, by cooling to 40 ° C.
- the synthetic gas G2 having an appropriate temperature can be supplied to the organic substance generation unit 3 without providing a separate cooling device. Further, when the processing device provided after the scrubber 23 includes a cooling device, the load on the cooling device can be reduced.
- the synthetic gas G2 is preferably cooled to a temperature of, for example, 0 ° C. or higher, preferably to a temperature of 5 ° C. or higher by coming into contact with water.
- the scrubber 23 is provided with a temperature control device (not shown), and the temperature of the washing water is controlled by the temperature control device.
- the temperature control device may be attached to, for example, the supply path 28 to adjust the temperature of the washing water passing through the inside of the supply path 28, or may be provided on the outer periphery of the scrubber 23 and stored in the storage section 26 of the scrubber 23. The temperature of the may be adjusted.
- the temperature control device may cool the washing water passing through the supply path 28, the washing water stored in the storage unit 26, or the like to bring the temperature within the above range. Further, the water stored in the storage unit 26 may be appropriately replaced to maintain the temperature of the water in contact with the synthetic gas G2 within a constant temperature range.
- the synthetic gas G2 in the scrubber 23, the mode in which the synthetic gas G2 comes into contact with the cleaning water sprayed from the nozzle 25 has been described, but the synthetic gas G2 is introduced into the cleaning water stored in the storage unit 26. You may. In this case, the supply path 28 and the nozzle 25 are omitted, and the washing water is not sprayed from the nozzle. Further, the introduction port 27A of the introduction path 27 is arranged below the liquid level of the washing water stored in the storage unit 26. The syngas G2 will come into contact with the wash water stored in the reservoir 26, whereby the syngas G2 may be washed and cooled.
- the temperature of the water in contact with the synthetic gas G2 and the temperature of the synthetic gas G2 (that is, the synthetic gas G2 introduced into the scrubber 23)
- the temperature of the synthetic gas G2 after cooling) is as described above.
- the post-stage processing device 13 shown in FIG. 3 includes a filtration type dust collector 22 arranged after the heat exchanger 20 and a scrubber 23 after the filtration dust collector 22. That is, in the above embodiment, the configuration in which the gas cooling tower 21 is provided is shown, but the gas cooling tower 21 may be omitted. When the gas cooling tower 21 is omitted, the synthetic gas G2 that has passed at least the filtration type dust collector 22 and the scrubber 23 is brought into contact with the microbial catalyst in the organic substance generation unit 3 and converted into an organic substance.
- the synthetic gas G2 supplied to the filtration type dust collector 22 and the scrubber 23 passes through the cyclone 11, the dust content is separated and removed in the cyclone 11, so that each of the filtration type dust collector 22 and the scrubber 23 The load of purification processing is kept low. Further, the synthetic gas G2 discharged from the scrubber 23 may be further refined by another device of the post-stage processing device 13.
- the cooling temperature in the heat exchanger 20 is, for example, 100 ° C. or higher and 200 ° C. or lower, preferably 120 ° C. or higher and 180 ° C. or lower. It is preferably 130 ° C. or higher and 170 ° C. or lower.
- the heat exchanger 20 cools the filter type dust collector 22 to the heat resistant temperature or lower. Therefore, if the cooling temperature of the heat exchanger 20 is within the above range, it is possible to prevent the filtration type dust collector 22 from being damaged by the high temperature synthetic gas G2 and the filtration performance from being deteriorated.
- the post-stage processing device 13 shown in FIG. 4 includes a gas cooling tower 21 arranged after the heat exchanger 20 and a filtration type dust collector 22 arranged after the gas cooling tower 21. That is, in the above embodiment, the configuration in which the scrubber 23 is provided is shown, but the scrubber 23 may be omitted. When the scrubber 23 is omitted, the synthetic gas G2 that has passed at least the gas cooling tower 21 and the filtration type dust collector 22 is brought into contact with the microbial catalyst in the organic substance generation unit 3 and converted into an organic substance.
- the synthetic gas G2 discharged from the filtration type dust collector 22 is typically a relatively high temperature (for example, 100 ° C. or higher), but when the scrubber 23 is omitted, the filtration type collection is performed.
- a cooling device other than the scrubber 23 is provided in the subsequent stage of the dust collector 22, and the synthetic gas G2 discharged from the filtration type dust collector 22 may be cooled by a cooling device other than the scrubber 23.
- one or more processing devices selected from the above-mentioned post-stage processing devices are provided in the subsequent stage of the filtration type dust collector 22 in addition to the cooling device, and the filtration type collecting device is provided.
- the synthetic gas G2 discharged from the dust collector 22 may be appropriately treated by a post-stage treatment device. Further, the separation device 31 may be omitted when it is not necessary to purify the organic substance produced by the organic substance generation unit 3 or when it is not necessary to separate water from the organic substance-containing liquid. Further, the synthetic gas G2 discharged from the filtration type dust collector 22 may be further refined by a processing device arranged after the filtration type dust collector 22.
- the cooling temperature in the heat exchanger 20 is, for example, 150 ° C. or higher and 300 ° C. or lower, preferably 170 ° C. or higher and 280 ° C. or lower.
- the temperature is preferably 190 ° C. or higher and 260 ° C. or lower.
- the gas cooling tower 21 is arranged after the heat exchanger 20, so that the gas cooling tower 21 is provided with a synthetic gas having a relatively low temperature within the above range. Since G2 is supplied, it is not necessary to excessively cool the gas cooling tower 21.
- the amount of water sprayed on the synthetic gas G2 in the gas cooling tower 21 can be reduced, and it is not necessary to supply the synthetic gas G2 having a higher water content to the filtration type dust collector 22. Therefore, it is possible to prevent the water from agglomerating too much in the filtration type dust collector 22.
- the post-stage processing device 13 shown in FIG. 5 includes a gas cooling tower 21 arranged after the heat exchanger 20 and a scrubber 23 after the gas cooling tower 21. That is, in the above embodiment, the configuration in which the filtration type dust collector 22 is provided is shown, but the filtration type dust collector 22 may be omitted. If the filtration type dust collector 22 is omitted, the synthetic gas G2 cooled in the gas cooling tower 21 will be supplied to the scrubber 23 without going through the filtration type dust collector 22, but via the cyclone 11. As a result, there is no problem because the dust component is separated and removed in the cyclone 11. The synthetic gas G2 discharged from the scrubber 23 may be further refined by another device of the post-processing device 13.
- the cooling temperature in the heat exchanger 20 is, for example, 200 ° C. or higher and 300 ° C. or lower, preferably 210 ° C. or higher and 290 ° C. or lower.
- the temperature is preferably 220 ° C. or higher and 280 ° C. or lower.
- the gas cooling tower 21 is arranged in the rear stage of the heat exchanger 20, and therefore, if it is within the above range, the gas cooling tower 21 is provided with a synthetic gas having a relatively low temperature. Since G2 is supplied, it is not necessary to excessively cool the gas cooling tower 21.
- the amount of water sprayed on the synthetic gas G2 in the gas cooling tower 21 can be reduced, and it is not necessary to supply the synthetic gas G2 having a higher water content to the scrubber 23. Therefore, the amount of water moving from the gas cooling tower 21 to the scrubber 23 can be suppressed.
- the post-stage processing device 13 shown in FIG. 6 includes a filtration-type dust collector 22 arranged after the heat exchanger 20. That is, in the above embodiment, the configuration in which the gas cooling tower 21 and the scrubber 23 are provided is shown, but the gas cooling tower 21 and the scrubber 23 may be omitted.
- the synthetic gas G2 discharged from the filtration type dust collector 22 may be further refined by another device of the post-stage treatment device 13.
- the heat exchanger 20 is, for example, 30 ° C. or higher and 60 ° C. or lower, preferably 35 ° C. or higher and 55 ° C. or lower, more preferably 40 ° C. Cool to a temperature of 50 ° C or lower.
- the temperature to be cooled by the heat exchanger 20 is in the above range. If it is inside, it is possible to prevent the filtration type dust collector 22 from being damaged by the high temperature synthetic gas G2 and the filtration performance from being deteriorated. Further, it is easy to increase the activity of the microbial catalyst in the organic substance generating section 3 in the subsequent stage of the post-stage treatment device 13, and it is possible to prevent the microbial catalyst from being killed by the influence of impurities.
- the present invention is not limited to these, and the synthetic gas G2 suitable for the organic substance generating unit 3 arranged in the post-stage is supplied. Anything that can be done is sufficient.
- the synthetic gas G2 is sufficiently purified by the cyclone 11, the gas cooling tower 21, the filtration type dust collector 22, and the scrubber 23 may be configured to include only the gas cooling tower 21. Further, of the gas cooling tower 21, the filtration type dust collector 22, and the scrubber 23, only the scrubber 23 may be provided.
- the gas cooling tower 21, the filtration type dust collector 22, and the scrubber 23 are all omitted as the post-stage treatment device 13. It may be configured.
- the synthetic gas G2 that has passed at least the cyclone 11 and the heat exchanger 20 in the pyrolysis gas purification cooling device 2 is supplied to the organic substance generation unit 3 as shown in FIG.
- the synthetic gas G2 supplied to the organic substance generation unit 3 is preferably a synthetic gas G2 that has passed through the heat exchanger 20, the gas cooling tower 21, the filtering dust collector 22 and the scrubber 23 in this order.
- the organic substance generation unit 3 produces an organic substance by bringing the synthetic gas G2 into contact with a microbial catalyst.
- the microbial catalyst gas-utilizing microorganisms are preferably used.
- the organic substance generation unit 3 includes a fermenter (reactor) filled with a culture solution containing water and a microbial catalyst. Syngas G2 is supplied to the inside of the fermenter, and the syngas G2 is converted into an organic substance inside the fermenter.
- the organic substance preferably contains either ethanol or isopropanol, and more preferably ethanol.
- the fermenter is preferably a continuous fermentation apparatus, and may be any of a stirring type, an air lift type, a bubble tower type, a loop type, an open bond type, and a photobio type.
- the synthetic gas G2 and the culture solution may be continuously supplied to the fermenter, but it is not necessary to supply the synthetic gas G2 and the culture solution at the same time, and the synthetic gas G2 is supplied to the fermenter to which the culture solution has been supplied in advance. May be supplied. Syngas G2 is generally blown into a fermenter via a sparger or the like.
- the medium used for culturing the microbial catalyst is not particularly limited as long as it has an appropriate composition according to the bacterium, but is limited to water as the main component and nutrients dissolved or dispersed in the water (for example, vitamins, phosphoric acid, etc.). It is a liquid containing and.
- the organic substance generation unit 3 an organic substance is produced by microbial fermentation of a microbial catalyst, and an organic substance-containing liquid is obtained.
- the temperature of the fermenter is preferably controlled to 40 ° C. or lower. By controlling the temperature to 40 ° C. or lower, the microbial catalyst in the fermenter does not die, and the synthetic gas G2 comes into contact with the microbial catalyst to efficiently generate an organic substance such as ethanol.
- the temperature of the fermenter is more preferably 38 ° C. or lower, and in order to enhance the catalytic activity, it is preferably 10 ° C. or higher, more preferably 20 ° C. or higher, still more preferably 30 ° C. or higher.
- the organic substance manufacturing apparatus 1 includes a separating apparatus 31 that separates at least water from the organic substance-containing liquid.
- the separation device 31 preferably includes a distillation device 33, and more preferably a solid-liquid separation device 32 in front of the distillation device 33. It is more preferable that the separation device 31 is used in combination with the solid-liquid separation device 32 and the distillation device 33.
- the separation step performed by combining the solid-liquid separation device 32 and the distillation device 33 will be specifically described.
- the organic substance-containing liquid obtained in the organic substance generation unit 3 may be separated into a solid component mainly composed of microorganisms and a liquid component containing an organic substance in the solid-liquid separation device 32.
- the organic substance-containing liquid obtained in the organic substance generation unit 3 contains the target organic substance, as well as microorganisms and their dead bodies contained in the fermenter as solid components, so that these are removed.
- solid-liquid separation is performed.
- the solid-liquid separation device 32 include a filter, a centrifuge, and a device using a solution precipitation method.
- the solid-liquid separation device 32 may be a device (for example, a heating / drying device) that evaporates a liquid component containing an organic substance from an organic substance-containing liquid and separates the liquid component from the solid component. At this time, all of the liquid components including the target organic substance may be evaporated, or the liquid components may be partially evaporated so that the target organic substance evaporates preferentially.
- the distillation apparatus 33 performs distillation for separating an organic substance which is an object.
- the distillation apparatus 33 can purify a large amount of organic substances with high purity by a simple operation by separation by distillation.
- the distillation apparatus 33 performs distillation to further separate the target organic substance from the liquid components separated by the solid-liquid separation apparatus 32. This makes it possible to purify organic substances in large quantities with higher purity.
- a known distillation column or the like can be used as the distillation apparatus 33.
- the distillate contains the target organic substance (for example, ethanol) with high purity, while the canned liquid (that is, the distillation residue) contains water as the main component (for example, 70 mass by mass). % Or more, preferably 90% by mass or more).
- the organic substance, which is the target substance, and water can be roughly separated.
- the temperature inside the distillation apparatus 33 during distillation of an organic substance is not particularly limited, but is preferably 100 ° C. or lower, and more preferably 70 to 95 ° C.
- an organic substance for example, ethanol or isopropanol
- the pressure in the distillation apparatus 33 at the time of distilling the organic substance may be normal pressure, but is preferably less than atmospheric pressure, more preferably about 60 to 150 kPa (gauge pressure). By setting the pressure in the distillation apparatus 33 within the above range, the separation efficiency of the organic substance can be improved and the yield of the organic substance can be improved.
- the distillation apparatus 33 preferably utilizes the heat energy obtained from the synthetic gas G2 by the heat exchanger 20 described above for distillation.
- the distillation apparatus 33 can raise the temperature inside the distillation apparatus 33 during distillation of an organic substance by reusing the heat energy obtained from the synthetic gas G2 in the heat exchanger 20. In this way, the distillation apparatus 33 reuses the heat energy obtained from the synthetic gas G2 in the heat exchanger 20, so that the energy consumption of the entire organic substance manufacturing process can be reduced.
- the heat energy obtained from the synthetic gas G2 in the heat exchanger 20 can be transferred via the heat energy path 33a connected to the heat exchanger 20 and the distillation apparatus 33.
- the heat energy path 33a is not particularly limited, and may have any configuration in which the heat energy of the synthetic gas G2 is transferred from the heat exchanger 20 to the distillation apparatus 33 by a heat medium.
- the heat medium may be either a gas or a liquid, or may have a phase change between the gas and the liquid.
- the heat exchanger 20 is preferably a boiler, and therefore steam is preferable as the heat medium.
- the water separated in the separation device 31 is preferably reused, more preferably supplied to the gas cooling tower 21, and used for water spraying in the gas cooling tower 21. In this way, when water is reused, the water that is no longer needed by the organic substance generating unit 3 does not become wastewater, which is preferable from the viewpoint of environmental protection and economic efficiency.
- the organic substance manufacturing apparatus 1 may have a water supply path 31a which is connected to the separation apparatus 31 and the gas cooling tower 21 and supplies the water obtained by the separation apparatus 31 to the gas cooling tower 21.
- the water supply path 31a is not particularly limited, but may be composed of pipes or the like. Further, the water separated by the separation device 31 may be further refined and purified, and may be supplied to the gas cooling tower 21.
- the dust content in the pyrolysis gas G1 can be reduced by separating and removing the dust content from the pyrolysis gas G1 by the cyclone 11, and the latter stage. It is possible to prevent a decrease in cooling efficiency or blockage of the gas flow path due to the dust content.
- the heat energy obtained from the synthetic gas G2 by the heat exchanger 20 can be used to raise the temperature in the distillation apparatus 33 at the time of distilling the organic substance. Therefore, the amount of energy procured from the outside in the distillation of the distillation apparatus 33 can be reduced, and the amount of energy used in the entire production process of the organic substance can be reduced.
- the synthetic gas G2 supplied to the heat exchanger 20 by providing the cyclone 11 in the subsequent stage of the gasifier 10 passes through the cyclone 11, so that the dust component is separated and removed in the cyclone 11. Even if the synthetic gas G2 is cooled to 240 ° C. or lower by the heat exchanger 20, it is possible to suppress the enlargement due to the dust content. Further, by cooling the synthetic gas G2 to 100 ° C. or lower with the heat exchanger 20, it is possible to omit the installation of a part of the cooling device in the subsequent stage. Further, by cooling the synthetic gas G2 to about 40 ° C. with the heat exchanger 20, the synthetic gas G2 having an appropriate temperature for the microbial catalyst is supplied to the organic substance generation unit 3 without providing a separate cooling device. be able to.
- the mode in which the pyrolysis gas G1 is obtained from the waste in the gasification furnace 10 has been described, but in the gasification furnace 10, the pyrolysis gas G1 may be generated from other than the waste.
- pyrolysis gas G1 may be generated from fossil resources such as natural gas, coal, heavy oil, petroleum exhaust gas, oil shale, and biomass other than waste.
- the pyrolysis gas G1 may be a by-product gas in various manufacturing processes such as a steel manufacturing process, and for example, the gasification furnace 10 may constitute a steel manufacturing facility or the like.
- the organic substance manufacturing apparatus 1 in the second embodiment is different in that the reformer 12 is arranged in front of the cyclone 11.
- the cyclone 11 in the second embodiment introduces the synthetic gas G2 obtained in the reforming furnace 12 and swirls the synthetic gas G2 in which a solid and a gas are mixed to generate a centrifugal force, and the centrifugal force is generated. It is a device that separates and removes solid dust such as tar and char from the synthetic gas G2 by force. By separating and removing the dust content from the synthetic gas G2 with the cyclone 11, the dust content in the synthetic gas G2 can be reduced, and the cooling efficiency is lowered or the gas flow path is caused by the dust content in the subsequent stage. Can prevent blockage.
- the synthetic gas G2, which has been separated and removed by the cyclone 11, is supplied to the heat exchanger 20.
- gasification furnace 10 and the reforming furnace 12 have been described as being different from each other, but the gasification furnace 10 and the reforming furnace 12 may be integrated into an integrated device, or a synthetic gas. Any type of gasifier may be used as long as it can generate G2.
- the same effects as described in the organic substance manufacturing apparatus and the organic substance manufacturing method according to the first embodiment can be obtained. ..
- the organic substance manufacturing apparatus 1 in the third embodiment includes a filtration type dust collector 22 and a scrubber 23 as a post-stage processing apparatus 13, and the filtration type dust collector 22 and the scrubber 23 are provided.
- the difference is that they are arranged in parallel after the heat exchanger 20. That is, in the organic substance manufacturing apparatus 1 according to the third embodiment, the synthetic gas G2 discharged from the heat exchanger 20 is supplied to either the filtration type dust collector 22 or the scrubber 23 for purification processing.
- the cooling temperature in the heat exchanger 20 is, for example, 100 ° C. or higher and 200 ° C. or lower, preferably 120 ° C. or higher and 180 ° C. or lower, and more preferably 130 ° C. or higher and 170 ° C. or lower. be.
- the heat exchanger 20 since the filtration type dust collector 22 is arranged after the heat exchanger 20, the heat exchanger 20 cools the filter type dust collector 22 to the heat resistant temperature or lower. Therefore, if the cooling temperature of the heat exchanger 20 is within the above range, it is possible to prevent the filtration type dust collector 22 from being damaged by the high temperature synthetic gas G2 and the filtration performance from being deteriorated.
- the organic substance manufacturing apparatus 1 in the third embodiment further includes a differential pressure measuring device 40 and a flow path switching unit 41.
- the differential pressure measuring device 40 measures the differential pressure between the front stage and the rear stage of the filtration type dust collector 22.
- the differential pressure measuring device 40 measures the differential pressure between the synthetic gas G2 supplied to the filtration type dust collector 22 and the synthetic gas G2 discharged from the filtration type dust collector 22, and the differential pressure is a predetermined pressure ( If it exceeds the reference value), it is determined that the filtration type dust collector 22 is blocked. If the differential pressure does not exceed the reference value according to the measurement result of the differential pressure measuring device 40, the synthetic gas G2 is supplied to the filtering type dust collector 22 as the normal operation of the organic substance manufacturing apparatus 1, and the filtering type dust collector is used. The synthetic gas G2 is purified by 22.
- the synthetic gas G2 to the filtering type dust collector 22 is subjected to maintenance to clear the blockage of the filtering type dust collector 22. Is stopped, and the synthetic gas G2 is supplied to the scrubber 23.
- the reference value in the differential pressure measuring device 40 means a value indicated by the differential pressure measuring device 40 when the filtration type dust collector 22 appropriately purifies the synthetic gas G2.
- the differential pressure measuring device 40 a known measuring device capable of measuring the differential pressure between the front stage and the rear stage of the filtration type dust collector 22 can be used.
- the organic substance manufacturing apparatus 1 includes a flow path switching unit 41 for selectively switching the filtration type dust collector 22 or the scrubber 23 through which the synthetic gas G2 is passed.
- the flow path switching unit 41 can be composed of, for example, a two-way switching valve, a three-way switching valve, or the like.
- the flow path switching unit 41 selectively switches either the filtration type dust collector 22 or the scrubber 23 as the supply destination of the synthetic gas G2 discharged from the heat exchanger 20.
- the flow path switching unit 41 selects the filtration type dust collector 22 as the supply destination of the synthetic gas G2.
- the operation of the scrubber 23 can be stopped by selecting the filtration type dust collector 22 as the supply destination of the synthetic gas G2, and the drainage from the scrubber 23 can be stopped. Will not occur, and the problems of wastewater treatment cost and environmental load can be solved.
- the flow path switching unit 41 selects the scrubber 23 as the supply destination of the synthetic gas G2, for example, when the filtration type dust collector 22 is blocked, except during the normal operation of the organic substance manufacturing apparatus 1.
- continuous operation can be performed without stopping the production of the synthetic gas G2, so that it is possible to prevent a decrease in production efficiency. can.
- the organic substance generating unit 5 uses the microbial catalyst, the continuous operation enables the purified synthetic gas G2 to be continuously supplied to the organic substance generating unit 5, and the microbial catalyst is killed. You can prevent it from happening.
- the flow path switching unit 41 may select the supply destination of the synthetic gas G2 discharged from the gasification device 2 according to the measurement result by the differential pressure measuring device 40 described above. Specifically, the differential pressure measuring device 40 measures the differential pressure between the front stage and the rear stage of the filtration type dust collector 22, and when the differential pressure does not exceed the reference value, the flow path switching unit 41 is a filtration type. The synthetic gas G2 is supplied to the dust collector 22. On the other hand, the differential pressure measuring device 40 measures the differential pressure between the front stage and the rear stage of the filtration type dust collector 22, and when the differential pressure exceeds the reference value, the filtration type dust collector 22 is blocked. The flow path switching unit 41 supplies the synthetic gas G2 to the scrubber 23.
- the post-stage processing device 13 shown in FIG. 9 includes a concentration measuring device 42.
- the concentration measuring device 42 is a device for measuring the concentration of impurities in the synthetic gas G2 discharged from the heat exchanger 20, and is, for example, at least one selected from phase transition impurities and solid impurities in the synthetic gas G2. Measure the concentration of.
- the concentration measuring device 42 measures the concentration of a specific impurity (for example, at least one selected from a phase transition impurity and a solid impurity), and when the concentration of the impurity exceeds a predetermined value (reference value), It is determined that the purification processing capacity of the filtration type dust collector 22 is exceeded, and the synthetic gas G2 is supplied to the scrubber 23 in order to avoid clogging of the filtration type dust collector 22.
- the concentration of the specific impurity examples include the concentration of the phase transition impurity.
- the phase transitional impurity refers to an impurity that can undergo a phase transition between the gas phase and the solid phase, including sublimable substances such as naphthalene, 1-naphthol, and 2-naphthol.
- the concentration of the phase transition impurities may be the concentration of a specific component of the phase transition impurities or the concentration of the total amount of the phase transition impurities. Examples of the concentration of a specific component of the phase transition impurity include the concentration of naphthalene.
- Naphthalene is abundantly contained in synthetic gas derived from waste, and by measuring the concentration of naphthalene as a representative, the concentration of phase transition impurities contained in the entire synthetic gas can be roughly grasped.
- concentration of phase transition impurities for example, the concentration of naphthalene is 500 ppm or more.
- the concentration of the specific component may be the concentration of the total amount of two or more components such as naphthalene, 1-naphthol and 2-naphthol.
- the concentration of the entire solid impurities may be measured, or the concentration of a specific component of the solid impurities may be measured.
- the concentration of the total solid impurities may be measured, for example, by adjusting the synthetic gas G2 to a predetermined temperature and measuring the concentration of the total solid impurities contained in the synthetic gas G2 adjusted to the constant temperature.
- the concentration of a specific component of the solid impurity the concentration of tar alone, char alone, the total amount of tar and char, and the like may be measured.
- the concentration of solid impurities for example, the tar concentration is 5 g / Nm 3 or more, and the dust concentration is 50 g / Nm 3 or more.
- these solid impurities and concentration ranges are examples, and other solid impurities and concentration ranges are also applicable.
- the concentrations of both phase transition impurities and solid impurities may be measured. Specifically, the concentrations of both phase transition impurities and solid impurities may be measured, or the total concentration may be measured. In addition, the concentrations of both the specific component of the phase transition impurity and the specific component of the solid impurity may be measured.
- the case of measuring the concentration of two or more components is not particularly limited, but for example, when the concentration of one of the measured components exceeds the reference value, it is preferable to supply the synthetic gas G2 to the scrubber 23. ..
- the flow path switching unit 41 may select a supply destination of the synthetic gas G2 discharged from the heat exchanger 20 according to the measurement result by the concentration measuring device 42 described above. Specifically, the concentration measuring device 42 measures the concentration of a specific impurity (for example, at least one selected from phase transition impurities and solid impurities), and if the concentration does not exceed the reference value, a filtration type is used. Determining that it is within the range of the purification processing capacity of the dust collector 22, the flow path switching unit 41 supplies the synthetic gas G2 to the filtration type dust collector 22 as a normal operation.
- a specific impurity for example, at least one selected from phase transition impurities and solid impurities
- the concentration measuring device 42 measures the concentration of at least one of the phase transition impurities and the solid impurities, and when the concentration of at least one of the phase transition impurities and the solid impurities exceeds the reference value, the filtration type collection is performed.
- the flow path switching unit 41 supplies the synthetic gas G2 to the scrubber 23 except for the normal operation in order to avoid clogging of the filtration type dust collector 22 because it is determined that the purification processing capacity of the dust device 22 is exceeded.
- the concentration measuring device 42 by using the measurement result of the concentration measuring device 42, it is possible to prevent the filtration type dust collector 22 from being blocked and reduce the drainage from the scrubber 23.
- the post-stage processing device 13 shown in FIG. 10 is provided with a concentration measuring device 42 and a differential pressure measuring device 40.
- the post-stage processing device 13 shown in FIG. 10 is provided with a concentration measuring device 42 and a differential pressure measuring device 40, and filters through which the synthetic gas G2 is passed according to the measurement results of the concentration measuring device 42 and the differential pressure measuring device 40.
- the type dust collector 22 or the scrubber 23 can be selectively switched.
- the concentration measuring device 42 measures the concentration of impurities in the synthetic gas G2 discharged from the gasifier 2, and if the concentration of the impurities does not exceed the reference value, the filtration type dust collector.
- the synthetic gas G2 is supplied to 22, and when the concentration of impurities exceeds the reference value, the synthetic gas G2 is supplied to the scrubber 23.
- the differential pressure between the front stage and the rear stage of the filtration type dust collector 22 is measured by the differential pressure measuring device 40 in addition to the concentration measurement of the concentration measuring device 42, thereby causing aged deterioration and the like. Even if the filtration type dust collector 22 is blocked due to a concentration other than the concentration of impurities in the synthetic gas G2, it can be dealt with by supplying the synthetic gas G2 to the scrubber 23, and the organic substance manufacturing apparatus 1 can be continuously operated. It will be possible.
- the post-stage processing device 13 shown in FIG. 11 includes a plurality of filtration-type dust collectors 22, and a plurality of filtration-type dust collectors 22 and a scrubber 23 are arranged in parallel in the rear-stage of the gasification device 2.
- two filtration-type dust collectors 22 are arranged in parallel in the rear-stage of the gasification device 2, and the filtration-type dust collector 22 is used during normal operation of the organic substance production device 1.
- the synthetic gas G2 is supplied to at least one of them, and the synthetic gas G2 is purified.
- Each of the filtration type dust collectors 22 is provided with a differential pressure measuring device 40, and it is preferable to measure the differential pressure between the front stage and the rear stage of the filtration type dust collector 22. If the differential pressure exceeds the reference value according to the measurement result of the differential pressure measuring device 40, the synthetic gas G2 is supplied in order to perform maintenance to eliminate the blockage of the filtration type dust collector 22 for which the differential pressure is measured.
- the post-stage processing device 13 shown in FIG. 11 shows a configuration in which the differential pressure measuring device 40 and the concentration measuring device 42 are provided side by side, but the concentration measuring device 42 may be omitted, and the differential pressure measuring device 40 is labor-saving. You may.
- the embodiment is described as having one or two filtration type dust collectors 22, but the present invention is not limited to these, and three or more filtration type dust collectors 22 and three or more filtration type dust collectors 22 and scrubber 23 are provided. It may be arranged in parallel in the subsequent stage of the gasifier 2. Further, in the above embodiment, a configuration in which the differential pressure measuring device 20 is provided alone, a configuration in which the concentration measuring device 21 is provided alone, and a configuration in which the differential pressure measuring device 20 and the concentration measuring machine 21 are provided side by side. As shown, both the differential pressure measuring device 20 and the concentration measuring device 21 may be omitted.
- the differential pressure measurement is performed by changing the supply destination of the synthetic gas G1 to the differential pressure measuring device 20 or the concentration measuring machine 21 at regular intervals. While suppressing the blockage of the vessel 20, the drainage from the scrubber 23 can be reduced, and impurities can be efficiently removed from the waste-derived synthetic gas G2.
- the post-stage processing device 13 is not limited to the above-described configuration, and the post-stage processing is performed in the front stage of the flow path switching unit 41 or in the rear stage of the filtration type dust collector 22 and the scrubber 23 in the first embodiment.
- the post-stage processing is performed in the front stage of the flow path switching unit 41 or in the rear stage of the filtration type dust collector 22 and the scrubber 23 in the first embodiment.
- the gas cooling tower 21 may be provided in the front stage of the flow path switching unit 41 and in the rear stage of the heat exchanger 20. The behavior of the heat exchanger 20 and the gas cooling tower 21 at this time is as described in the first embodiment.
- the same effects as described in the organic substance manufacturing apparatus and the organic substance manufacturing method according to the first embodiment can be obtained. ..
- the cyclone 11 is arranged in the front stage of the reformer 12, but in the third embodiment, as described in the second embodiment, as described in the second embodiment, The reformer 12 may be arranged in front of the cyclone 11.
- the organic substance production apparatus 1 in the fourth embodiment has a gasification furnace 10 that gasifies waste to generate a pyrolysis gas, and a pyrolysis gas G1 discharged from the gasification furnace 10.
- the reforming furnace 12 for reforming the above and the heat exchanger 20 for passing the pyrolysis gas G1 that has passed through the reforming furnace 12 to cool the surface are provided.
- the organic substance production apparatus 1 (pyrolysis gas purification cooling apparatus 2) includes a gasifier 10, a reformer 12, and a heat exchanger 20, so that the content of at least one of hydrogen and carbon monoxide is high.
- the synthetic gas G2 appropriately cooled by the heat exchanger 20 can be obtained.
- the configuration in which the cyclone 11 is provided is shown, but in the present embodiment, the cyclone 11 is omitted. If the cyclone 11 is omitted, the synthetic gas G2 cooled in the heat exchanger 20 will be supplied to the aftertreatment device 13 without going through the cyclone 11.
- the cyclone 11 may be omitted when the waste contains a small amount of solid impurities or when the synthetic gas G2 is generated using a material other than the waste as a raw material.
- the organic substance manufacturing apparatus 1 in the fourth embodiment is the same as that in the first or third embodiment except that the cyclone 11 is omitted. Therefore, the organic substance manufacturing apparatus 1 in the fourth embodiment includes the gasification furnace 10, the reforming furnace 12, and the heat exchanger 20, but the organic substance manufacturing apparatus 1 in the fourth embodiment is other than these. May also have a post-stage processing device 13 and the like as appropriate.
- the post-stage treatment apparatus 13 is as described in the first and third embodiments, and the organic substance production apparatus 1 is at least the gas cooling tower 21, the filtration type dust collector 22, and the scrubber 23 in the post-stage treatment apparatus 13. It is preferable to provide either one.
- the post-stage processing device 13 can have the configuration shown in the first embodiment and each modification. That is, as shown in FIG.
- the gas cooling tower 21 arranged after the heat exchanger 20, the filtration type dust collector 22 arranged after the gas cooling tower 21, and the filtration dust collector 22 can be configured to include a scrubber 23 arranged in the subsequent stage.
- a filtration type dust collector 22 arranged after the heat exchanger 20 and a scrubber 23 after the filtration dust collector 22 can be provided.
- the gas cooling tower 21 arranged after the heat exchanger 20 and the filtration type dust collector 22 arranged after the gas cooling tower 21 may be provided.
- the gas cooling tower 21 arranged at the rear stage of the heat exchanger 20 and the scrubber 23 at the rear stage of the gas cooling tower 21 can be provided.
- FIG. 5 the gas cooling tower 21 arranged at the rear stage of the heat exchanger 20 and the scrubber 23 at the rear stage of the gas cooling tower 21 can be provided.
- the configuration may include a filtration type dust collector 22 arranged after the heat exchanger 20.
- the post-stage processing device 13 may have the configuration shown in the third embodiment and each modification. That is, as shown in FIG. 8, the filtration type dust collector 22 and the scrubber 23 may be arranged in parallel in the subsequent stage of the heat exchanger 20, and the flow path switching portion 41 may be provided.
- the differential pressure measuring device 40 and the concentration measuring device 42 may be provided, or may be provided in the front stage of the flow path switching unit 41 and in the rear stage of the heat exchanger 20.
- the gas cooling tower 21 may be provided in the air (see FIGS. 9 to 11). Since these details are as described above, the description thereof will be omitted.
- the cyclone 11 is described as a form in which one cyclone 11 is provided in the pyrolysis gas refining cooling device 2, but the cyclone 11 is not limited to one, and two or more cyclones 11 may be provided.
- the cyclone 11 may be provided in the rear stage of the gasification furnace 10 and the rear stage of the reforming furnace 12, respectively. Further, two or more cyclones 11 may be provided in succession.
- the synthetic gas G2 may be generated from other than the waste.
- synthetic gas G2 may be generated from fossil resources such as natural gas, coal, heavy oil, petroleum exhaust gas, oil shale, and biomass other than waste.
- the synthetic gas G2 may be a by-product gas in various manufacturing processes such as a steel manufacturing process, and for example, the gasification furnace 10 may constitute a steel manufacturing facility or the like.
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| JP2022510509A JPWO2021193573A1 (https=) | 2020-03-24 | 2021-03-22 | |
| CN202180024103.XA CN115335493A (zh) | 2020-03-24 | 2021-03-22 | 热分解气体精制冷却装置和方法、有机物质制造装置及有机物质制造方法 |
| US17/913,238 US20230114144A1 (en) | 2020-03-24 | 2021-03-22 | Pyrolysis gas purification/cooling device, pyrolysis gas purification/cooling method, organic substance production device, and method for producing organic substance |
| EP21776243.4A EP4130204A4 (en) | 2020-03-24 | 2021-03-22 | Pyrolysis gas purification/cooling device, pyrolysis gas purification/cooling method, organic substance production device, and method for producing organic substance |
| JP2025177942A JP2026015334A (ja) | 2020-03-24 | 2025-10-22 | 熱分解ガス精製冷却装置及び熱分解ガス精製冷却方法、並びに、有機物質製造装置及び有機物質の製造方法 |
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| US11795090B1 (en) | 2020-09-01 | 2023-10-24 | Wm Intellectual Property Holdings, L.L.C. | Method for processing of sewage sludge using pyrolysis to eliminate PFAS and other undesirable materials |
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- 2021-03-22 JP JP2022510509A patent/JPWO2021193573A1/ja active Pending
- 2021-03-22 EP EP21776243.4A patent/EP4130204A4/en active Pending
- 2021-03-22 US US17/913,238 patent/US20230114144A1/en active Pending
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|---|---|
| EP4130204A1 (en) | 2023-02-08 |
| US20230114144A1 (en) | 2023-04-13 |
| EP4130204A4 (en) | 2024-08-28 |
| JP2026015334A (ja) | 2026-01-29 |
| JPWO2021193573A1 (https=) | 2021-09-30 |
| CN115335493A (zh) | 2022-11-11 |
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