WO2021192327A1 - 表面被覆切削工具 - Google Patents
表面被覆切削工具 Download PDFInfo
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- WO2021192327A1 WO2021192327A1 PCT/JP2020/022400 JP2020022400W WO2021192327A1 WO 2021192327 A1 WO2021192327 A1 WO 2021192327A1 JP 2020022400 W JP2020022400 W JP 2020022400W WO 2021192327 A1 WO2021192327 A1 WO 2021192327A1
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- Prior art keywords
- layer
- carbonitride
- thickness
- tool
- average
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- 238000005520 cutting process Methods 0.000 title claims abstract description 35
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims abstract description 27
- 150000004767 nitrides Chemical class 0.000 claims abstract description 19
- 239000010410 layer Substances 0.000 claims description 250
- 239000011247 coating layer Substances 0.000 claims description 18
- 239000000758 substrate Substances 0.000 claims description 16
- 239000011248 coating agent Substances 0.000 claims description 10
- 238000000576 coating method Methods 0.000 claims description 10
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical group O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 claims description 7
- 229910002092 carbon dioxide Inorganic materials 0.000 claims description 3
- 239000001569 carbon dioxide Substances 0.000 claims description 3
- 239000000843 powder Substances 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 7
- 230000000694 effects Effects 0.000 description 7
- 239000002245 particle Substances 0.000 description 7
- 239000000203 mixture Substances 0.000 description 6
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 5
- 239000007789 gas Substances 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000002994 raw material Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- 229910000851 Alloy steel Inorganic materials 0.000 description 2
- 229910001141 Ductile iron Inorganic materials 0.000 description 2
- 238000002441 X-ray diffraction Methods 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 230000001747 exhibiting effect Effects 0.000 description 2
- 238000010884 ion-beam technique Methods 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 238000012935 Averaging Methods 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 229910010060 TiBN Inorganic materials 0.000 description 1
- 229910001315 Tool steel Inorganic materials 0.000 description 1
- 230000002159 abnormal effect Effects 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910002090 carbon oxide Inorganic materials 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000011195 cermet Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 239000013256 coordination polymer Substances 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000008520 organization Effects 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- -1 sialon Chemical compound 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 238000005728 strengthening Methods 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- UONOETXJSWQNOL-UHFFFAOYSA-N tungsten carbide Chemical compound [W+]#[C-] UONOETXJSWQNOL-UHFFFAOYSA-N 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Images
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B27/00—Tools for turning or boring machines; Tools of a similar kind in general; Accessories therefor
- B23B27/14—Cutting tools of which the bits or tips or cutting inserts are of special material
- B23B27/148—Composition of the cutting inserts
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/36—Carbonitrides
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B27/00—Tools for turning or boring machines; Tools of a similar kind in general; Accessories therefor
- B23B27/14—Cutting tools of which the bits or tips or cutting inserts are of special material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
- C23C16/0272—Deposition of sub-layers, e.g. to promote the adhesion of the main coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/308—Oxynitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/34—Nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/403—Oxides of aluminium, magnesium or beryllium
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/405—Oxides of refractory metals or yttrium
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/56—After-treatment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
- C23C28/042—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material including a refractory ceramic layer, e.g. refractory metal oxides, ZrO2, rare earth oxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
- C23C28/044—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material coatings specially adapted for cutting tools or wear applications
Definitions
- the present invention relates to a surface-coated cutting tool (hereinafter, may be referred to as a coated tool).
- a coating tool in which a hard coating layer is coated on the surface of a tool substrate such as tungsten carbide (hereinafter referred to as WC) -based cemented carbide by a vapor deposition method. Is known to exhibit excellent wear resistance.
- the coating tool formed by coating the conventional hard coating layer has excellent wear resistance, but various proposals have been made for further improvement of the hard coating layer.
- Patent Document 1 has a TiCN layer, a bonding layer, and an ⁇ -type Al 2 O 3 layer from the tool substrate toward the surface, and the TiCN layer has an average layer thickness of 4 to 20 ⁇ m and is oriented.
- the sex index TC (220) (hereinafter, may be indicated only by TC) is 0.5 or less, TC (422) is 3 or more, the sum of TC (311) and TC (422) is 4 or more, and the bonding
- the layer is at least one layer of TiN, TiCN, TiCO, and TiCNO, and the average layer thickness is 0.5 to 2 ⁇ m, and the ⁇ -type Al 2 O 3 layer has an average layer thickness of 2 to 20 ⁇ m.
- a coating tool having a hard coating layer having a TC (0 0 12) of 7.2 or more and an I (0 0 12) / I (0 0 14) of 1 or more is described.
- Patent Document 2 toward the surface from the tool substrate, TiCN layer, a bonding layer, alpha type the Al 2 O 3 layer has, the TiCN layer has an average layer thickness of 2 ⁇ 20 [mu] m, the The bonding layer is TiCNO or TiBN having a needle-like structure, and the ⁇ -type Al 2 O 3 layer has a hard coating layer having an average layer thickness of 1 to 15 ⁇ m and a TC (006) of more than 5. Covering tools are listed.
- an object of the present invention is to provide a covering tool having sufficient durability in a cutting process in which the cutting edge is exposed to a large load.
- the surface coating cutting tool is It has a tool base and a hard coating layer on the tool base.
- the hard coating layer has an inner layer, a lower intermediate layer, an upper intermediate layer, a bonding auxiliary layer, and an outer layer in this order from the tool substrate toward the surface.
- the inner layer is a Ti carbonitride layer having an average layer thickness of 4.0 to 20.0 ⁇ m.
- the lower intermediate layer is a Tiriden layer having an average layer thickness of 0.1 to 2.0 ⁇ m.
- the upper intermediate layer is a carbonitride layer of Ti, and has an average layer thickness of 0.1 to 2.5 ⁇ m.
- the grain boundaries of the carbonitride are continuous from the grain boundaries of the Ti carbonitride in the inner layer.
- the bond auxiliary layer is a carbon dioxide oxide layer of Ti, and has an average layer thickness of 3 to 80 nm.
- the outer layer is an ⁇ -type aluminum oxide layer having an average layer thickness of 2.0 to 20.0 ⁇ m.
- the orientation index TC (422) of Ti carbonitrides in the inner layer and the upper intermediate layer is 3.0 or more, and the orientation index TC (0 0 12) of ⁇ -type aluminum oxide in the outer layer is 5.0 or more.
- the present inventor has made extensive studies focusing on the ⁇ -type aluminum oxide layer and the bonding auxiliary layer (bonding layer) in order to improve the durability of the coating tool containing the ⁇ -type aluminum oxide layer as a hard coating layer. As a result, it was discovered that the needle-like structure of the bonding layer adversely affects the durability.
- the bonding layer described in Patent Document 1 is not specified in the document, the bonding layer of Patent Document 2 is obtained in order to obtain an anchor effect in order to strengthen the bonding with the ⁇ -type aluminum oxide layer. Similar to, it has a needle-like structure.
- this acicular structure is the cause of voids in the interface region of the ⁇ -type aluminum oxide layer with the bonding layer. That is, the raw material gas for forming the ⁇ -type aluminum oxide layer is not sufficiently supplied to the gap formed by the needle-shaped structure, which causes voids, and it is difficult to obtain the anchor effect brought about by the needle-shaped structure. I found out. Further, the chipping resistance is improved by forming the Ti carbonitride layer described in Patent Documents 1 and 2 into three layers of Ti carbonitride layer-Ti nitride layer-Ti carbonitride layer. It was also found that it should be done.
- the range includes the upper limit value (B) and the lower limit value (A).
- the unit of the upper limit value (B) and the lower limit value (A) is the same.
- the numerical values include tolerances.
- compositions of Ti nitride, Ti carbonitride, Ti carbonitride oxide, Ti carbonitride, Ti oxide layer and ⁇ -type aluminum oxide layer are limited to the chemical quantitative composition. However, it contains the composition of all conventionally known atomic ratios.
- the covering tool has an inner layer (2), a lower intermediate layer (3), and an upper middle layer on a hard coating layer (1) on a tool substrate (8). It has a layer (4), a binding auxiliary layer (5) and an outer layer (6).
- the inner layer (2), the lower intermediate layer (3), the upper intermediate layer (4), and the bonding auxiliary layer (5) (hereinafter, these layers are collectively referred to as the main layer) are formed of the film-forming gas. Epitaxial growth is carried out by adjusting the gas composition and reaction atmosphere pressure.
- the binding auxiliary layer (5) is not a needle-like structure. That is, the binding auxiliary layer (5) is a non-needle-like structure, and is composed of, for example, equiaxed particles.
- continuous grain boundaries means that when an arbitrary vertical cross section of a hard coating layer, which will be described later, is observed with a scanning electron microscope (SEM), the grain boundaries can be visually recognized as continuous. ..
- SEM scanning electron microscope
- the reason why the grain boundaries can be visually recognized as continuous is that the lattice constants of the epitaxially grown Ti nitride and the Ti carbonitride can be regarded as substantially the same.
- the nitride is the inner Ti carbonitride
- the upper intermediate Ti carbonitride is the lower intermediate Ti nitride, respectively, in a direction parallel to the surface of the tool substrate.
- the lattice spacing is maintained even after cooling after film formation, and the surface spacing of the Ti nitride in the inner layer remains the same, while the Ti nitride in the lower intermediate layer and the Ti nitride in the upper intermediate layer It is thought that this is because it is inherited by Ti carbonitride.
- each layer will be described.
- the inner layer is a Ti carbonitride layer having columnar particles adjacent to the tool substrate or the innermost layer described later, and the average layer thickness thereof is preferably 4.0 to 20.0 ⁇ m.
- the reason for setting the average layer thickness in this range is that if it is less than 4.0 ⁇ m, the wear resistance is lowered, while if it exceeds 20.0 ⁇ m, the fracture resistance is lowered.
- the average layer thickness is more preferably 5.0 to 15.0 ⁇ m, and even more preferably 8.0 to 12.0 ⁇ m.
- the lower intermediate layer is provided between the inner layer and the upper intermediate layer, and is a Tiriden layer, preferably having an average layer thickness of 0.1 to 2.0 ⁇ m. Since the Ti nitride layer is softer and has a lower Young's modulus than the other main layers, it enhances the toughness of the hard coating layer and improves the chipping resistance. That is, as will be described later, when the adhesion between the carbonitride oxide layer of Ti, which is the bonding auxiliary layer, and the ⁇ -type aluminum oxide layer of the outer layer becomes strong, it is caused by the difference in physical properties such as the coefficient of thermal expansion of those substances.
- the average layer thickness of the lower intermediate layer is preferably 0.1 to 2.0 ⁇ m, preferably 0.3 to 2.0 ⁇ m. 1.5 ⁇ m is more preferable, and 0.5 to 1.0 ⁇ m is even more preferable.
- the lower intermediate layer also plays a role of firmly connecting the upper intermediate layer and the inner layer.
- the upper intermediate layer is a Ti carbonitride layer provided between the lower intermediate layer and the bonding auxiliary layer.
- the reason for using the Ti carbonitride layer is that the bond auxiliary layer described later is a Ti carbonitride oxide layer and has oxygen, so that it has a high chemical affinity with the ⁇ -type aluminum oxide layer of the outer layer.
- the bond auxiliary layer described later is a Ti carbonitride oxide layer and has oxygen, so that it has a high chemical affinity with the ⁇ -type aluminum oxide layer of the outer layer.
- the affinity is high in terms of crystallization.
- the average layer thickness is more preferably 0.3 to 2.0 ⁇ m, and even more preferably 0.5 to 1.5 ⁇ m.
- Orientation index TC (422) of Ti carbonitrides in the inner and upper intermediate layers As described above, among the main layers, the inner layer, the lower middle layer, and the upper middle layer, which can be regarded as one large columnar particle, the TC of Ti carbonitride, which is the main constituent phase of these layers ( 422) is preferably 3.0 or more. The reason is that if it is 3.0 or more, the TC (0 0 12) of the ⁇ -type aluminum oxide in the outer layer, which will be described later, becomes 5.0 or more due to the above-mentioned epitaxial growth, and the wear resistance is improved.
- TC (orientation index TC) is measured by X-ray diffraction of a 2 ⁇ / ⁇ concentrated optical system using CuK ⁇ , and is defined by Harris's equation described below.
- I (hkl) is the diffraction intensity of the (hkl) plane
- I 0 (hkl) is the standard intensity described in ICDD file number 00-042-1489 on the same surface
- n is the total number of reflective surfaces.
- the planes to be considered as reflective planes are (111) plane, (200) plane, (220) plane, (311) plane, (331) plane, (420) plane, (422) plane and (511) plane. ..
- the bonding auxiliary layer is a layer in contact with the ⁇ -type aluminum oxide layer of the outer layer, which corresponds to the bonding layers of Patent Documents 1 and 2, and has an average layer thickness of 3 to 80 nm for carbon dioxide oxidation of Ti. It is a material layer. Since this layer has oxygen, it has the property of strengthening the adhesion of the outer layer to the ⁇ -type aluminum oxide layer, and this property is exhibited when the average layer thickness is 3 to 80 nm. .. Further, from the viewpoint of exhibiting this characteristic, the average layer thickness is more preferably 3 to 50 nm, and even more preferably 3 to 30 nm.
- This bond auxiliary layer is a thin layer having an average layer thickness of 3 to 80 nm by adjusting the composition of the film-forming gas and the reaction time, and its structure is not a needle-like structure. Therefore, when the ⁇ -type aluminum oxide layer of the outer layer is formed, voids are not generated in the region near the bond auxiliary layer of the ⁇ -type aluminum oxide layer, and the ⁇ -type aluminum oxide layer of the outer layer is formed through the bond auxiliary layer. It can be firmly bonded to the inner layer, lower intermediate layer, and upper intermediate layer.
- the outer layer is preferably an ⁇ -type aluminum oxide layer having an average layer thickness of 2.0 to 20.0 ⁇ m and a TC (0 0 12) of 5.0 or more. If the average layer thickness is less than 2.0 ⁇ m, the durability cannot be sufficiently ensured for long-term use because it is thin, while if it exceeds 20.0 ⁇ m, the crystal grains of the ⁇ -type aluminum oxide layer become large. Chipping is likely to occur. When TC (0 0 12) is 5.0 or more, high wear resistance is exhibited.
- the (104) plane, (110) plane, (113) plane, (024) plane, and (116) plane described in the ICDD file number 00-010-0173 are used.
- (214) plane, (300) plane, (0 0 12) plane standard strength is used.
- the innermost layer composed of one or more Ti compound layers of the carbide layer and the nitride layer of Ti and having a total average layer thickness of 0.1 to 2.0 ⁇ m is adjacent to the tool substrate. It may be provided between the inner layer and the inner layer. When this innermost layer is provided, the durability of the covering tool is further exhibited.
- the total average layer thickness of the innermost layer is less than 0.1 ⁇ m, the effect of providing the innermost layer is not sufficiently exhibited, while if it exceeds 2.0 ⁇ m, the crystal grains tend to be coarsened and chipping occurs. It will be easier.
- the Ti nitride layer, the carbide layer, and the carbonitride layer are composed of one layer or two or more Ti compound layers, and have a total average layer thickness of 0.1 to 4.0 ⁇ m.
- the outermost layer may be provided above the outer layer. When this outermost layer is provided, corner identification (identification of used parts) after cutting is facilitated when the covering tool is an insert due to an effect such as exhibiting a clear color.
- the total average layer thickness is less than 0.1 ⁇ m, the effect of providing the outermost layer is not sufficiently exhibited, while if it exceeds 4.0 ⁇ m, chipping is likely to occur.
- the tool substrate is a cemented carbide (WC-based cemented carbide: WC and other cemented carbide containing Co and further added with a carbonitride such as Ti, Ta, Nb, etc.), cermet, etc. (Those containing TiC, TiN, TiCN, etc. as the main component, etc.), ceramics (silicon nitride, sialon, aluminum oxide, etc.), or cBN sintered bodies can be used, but the present invention is not limited thereto.
- a cemented carbide WC-based cemented carbide: WC and other cemented carbide containing Co and further added with a carbonitride such as Ti, Ta, Nb, etc.), cermet, etc.
- Those containing TiC, TiN, TiCN, etc. as the main component, etc.), ceramics (silicon nitride, sialon, aluminum oxide, etc.), or cBN sintered bodies can be used, but the present invention is not limited thereto.
- the average layer thickness of each layer constituting the hard coating layer is determined by using, for example, a focused ion beam device (FIB: Focused Ion Beam system), a cross section polisher device (CP: Cross section microscope), or the like.
- FIB Focused Ion Beam system
- CP Cross section microscope
- WC powder, TiC powder, TiN powder, NbC powder, Cr 3 C 2 powder and Co powder having an average particle size of 1 to 3 ⁇ m are prepared, and these raw material powders are blended as shown in Table 1. It was blended into the composition, further added with wax, mixed in a ball mill in acetone for 24 hours, dried under reduced pressure, press-molded into a green compact having a predetermined shape at a pressure of 98 MPa, and the green powder was press-molded into a green compact of a predetermined shape in a vacuum of 5 Pa, 1370. Vacuum sintered at a predetermined temperature within the range of ⁇ 1470 ° C. under the condition of holding for 1 hour, and after sintering, tool bases A to B made of WC-based superhard alloy having an insert shape of ISO standard CNMG120412 are respectively. Manufactured.
- a main layer was formed on the surfaces of these tool substrates A to B.
- the inner layer and the outer layer are formed under the film forming conditions shown in Table 2, and the lower intermediate layer, the upper intermediate layer and the bonding auxiliary layer are formed under the film forming conditions shown in Table 3.
- the oxidation treatment shown in the same table was subsequently carried out to prepare the covering tools 1 to 6 of the present invention shown in Table 6.
- the innermost layer and / or the outermost layer was formed according to the film forming conditions shown in Table 4.
- a hard coating layer is formed on the surfaces of the tool substrates A to B under the film forming conditions according to the film forming conditions described in Patent Document 1 shown in Table 2, Table 3 or Table 5.
- Comparative Example Tools 1 to 6 shown in Table 6 were prepared.
- the lower intermediate layer does not exist, or the film formation conditions of the coating tool of the present invention are diverted to form a film, but the average thickness of the lower intermediate layer is the embodiment of the present invention.
- the average layer thickness of the binding auxiliary layer is one of the present invention. It did not satisfy the range specified in the embodiment.
- Cutting test 1 Target Example tools 1 to 3 and comparative example tools 1 to 3 Work Material: FCD700 Cutting speed: 400 m / min Feed: 0.3 mm / rev Notch: 1.5 mm Cutting time: 1 pass, 1 minute Evaluation: Every 1 minute of cutting time, the cutting edge was observed with a magnifying glass having a magnification of 2 times, and the time until the peeling of the ⁇ -type aluminum oxide layer was confirmed was measured. The results are shown in Table 7.
- Cutting test 2 Target: Example tools 4 to 6 and comparative example tools 4 to 6 Work Material: SNCM439 Cutting speed: 200 m / min Feed: 0.55 mm / rev Notch: 4 mm Cutting time: 2 minutes Evaluation: Observation of chipping occurrence after 2 minutes of cutting time For each tool, 5 corners were evaluated and evaluated by the number of corners where chipping occurred. The results are shown in Table 8.
- the tools of the embodiment show good cutting performance even when subjected to a cutting process in which the cutting edge of ductile cast iron or alloy steel is exposed to a heavy load.
- the ⁇ -type aluminum oxide (Al 2 O 3 ) layer is peeled off in a short time, or a lot of chipping occurs, and the life of the tool is reached in a short time.
- Hard coating layer 2 Inner layer (Ti carbonitride layer) 3 Lower intermediate layer (Ti nitride layer) 4 Upper middle layer (Ti carbonitride layer) 5 Bonding auxiliary layer (Ti carbon oxide layer) 6 Outer layer ( ⁇ -type aluminum oxide layer) 7 Columnar particles 8 Tool base
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Abstract
Description
前記従来の硬質被覆層を被覆形成した被覆工具は、耐摩耗性に優れものであるが、さらなる硬質被覆層の改善についての種々の提案がなされている。
本発明は、この状況を鑑みて、刃先が大きな負担にさらされる切削加工において、十分な耐久性を有する被覆工具を提供することを目的とする。
工具基体と、該工具基体上に硬質被覆層を有し、
前記硬質被覆層は、前記工具基体から表面に向かって、順に、内層、下部中間層、上部中間層、結合補助層および外層を有し、
前記内層は、Tiの炭窒化物層であって、平均層厚が4.0~20.0μmであり、
前記下部中間層は、Tiの窒化物層であって、平均層厚が0.1~2.0μmであり、
前記上部中間層は、Tiの炭窒化物層であって、平均層厚が0.1~2.5μmであり、前記下部中間層のTiの窒化物の粒界と前記上部中間層のTiの炭窒化物の粒界は、前記内層のTiの炭窒化物の粒界から連続しており、
前記結合補助層は、Tiの炭窒酸化物層であって、平均層厚が3~80nmであり、
前記外層は、α型酸化アルミニウム層であって、平均層厚が2.0~20.0μmであり、
前記内層と前記上部中間層のTiの炭窒化物の配向性指数TC(422)が3.0以上、前記外層のα型酸化アルミニウムの配向性指数TC(0 0 12)が5.0以上である、
ことを特徴とする表面被覆切削工具。」
このように粒界が連続しているように視認できる理由は、エピタキシャル成長したTiの窒化物とTiの炭窒化物の格子定数は実質的に同一とみることができるため、下部中間層のTiの窒化物は内層のTiの炭窒化物と、また、上部中間層のTiの炭窒化物は下部中間層のTiの窒化物と、それぞれ、工具基体の表面に平行な方向において、格子間隔(面間隔)を一致させて成長し、成膜後の冷却を経てもこの格子間隔が保持され、内層のTiの炭窒化物の面間隔はそのまま、下部中間層のTiの窒化物、上部中間層のTiの炭窒化物に受け継がれていくためと考えられる。
以下、各層について説明する。
内層は、工具基体または後述する最内層に隣接する柱状粒子を有するTiの炭窒化物層であって、その平均層厚は、4.0~20.0μmが好ましい。平均層厚をこの範囲とする理由は、4.0μm未満であると、耐摩耗性が低下し、一方、20.0μmを超えると耐欠損性が低下するためである。平均層厚は、5.0~15.0μmがより好ましく、8.0~12.0μmがより一層好ましい。
下部中間層は、内層と上部中間層との間に設けられ、Tiの窒化物層であって、平均層厚が0.1~2.0μmであることが好ましい。Tiの窒化物層は、他の主要層に比して軟らかくヤング率が低いため、硬質被覆層の靭性を高め、耐チッピング性を向上させる。すなわち、後述するように、結合補助層であるTiの炭窒酸化物層と外層のα型酸化アルミニウム層との付着が強固となると、それらの物質の熱膨張係数等の物性差に起因して結合補助層に隣接する中間層内に大きな歪みが発生するが、その歪みをヤング率が低いTiの窒化物層によって緩和しているものと考えられる。なお、下部中間層の平均層厚が2.0μmを超えると前述した粒界の連続が損なわれるため、下部中間層の平均層厚は、0.1~2.0μmが好ましく、0.3~1.5μmがより好ましく、0.5~1.0μmがより一層好ましい。
また、下部中間層は、上部中間層と内層を強固に結合させる役割も担っている。
上部中間層は、下部中間層と結合補助層との間に設けられるTiの炭窒化物層である。Tiの炭窒化層とする理由は、後述する結合補助層がTiの炭窒化酸化物層であって酸素を有しているために外層のα型酸化アルミニウム層との化学的な親和性が高い上、Tiの炭窒化物の(422)面の傾きとα型酸化アルミニウムの(0 0 12)面の傾きを考えると結晶学的な親和性が高いためである。上部中間層の平均層厚が0.1μm未満であるとこの親和性の効果が不十分であり、一方、2.5μmを超えると前述した下部中間層による硬質被覆層の靭性向上効果が発揮されない。平均層厚は、0.3~2.0μmがより好ましく、0.5~1.5μmがより一層好ましい。
前述したように、主要層のうち、ひとつの大きな柱状粒子と見なすことができる内層、下部中間層、上部中間層のうち、これらの層の主要な構成相であるTiの炭窒化物のTC(422)は3.0以上であることが好ましい。その理由は、3.0以上であれば、前述のエピタキシャル成長によって後述する外層のα型酸化アルミニウムのTC(0 0 12)が5.0以上となって、耐摩耗性が向上するためである。ここで、TC(配向性指数TC)とは、CuKαを用いた2θ/θ集中法光学系のX線回折により測定され、次に述べるハリスの式で規定されるものである。
結合補助層は、外層のα型酸化アルミニウム層に接する層であって、前記特許文献1および2のボンディング層に対応するものであって、その平均層厚が3~80nmのTiの炭窒酸化物層である。この層は、酸素を有しているため、外層のα型酸化アルミニウム層との付着が強固となる特性を有しており、平均層厚が3~80nmであるとき、この特性が発揮される。また、この特性の発揮の点から、平均層厚は3~50nmがより好ましく、3~30nmがより一層好ましい。
外層は、平均層厚が2.0~20.0μmであって、TC(0 0 12)が5.0以上であるα型酸化アルミニウム層が好ましい。平均層厚は2.0μm未満であると、薄いため長期の使用にわたって耐久性を十分に確保することができず、一方、20.0μmを超えると、α型酸化アルミニウム層の結晶粒が大きくなってしまいチッピングが発生しやすくなる。TC(0 0 12)は、5.0以上であると、高い耐摩耗性を発揮する。
本実施形態では、Tiの炭化物層、窒化物層のうちの1層または2層以上のTi化合物層からなり、0.1~2.0μmの合計平均層厚を有する最内層を工具基体に隣接して内層との間に設けてもよい。この最内層を設ける場合は、被覆工具の耐久性がより一層発揮される。ここで、最内層の合計平均層厚が0.1μm未満では、最内層を設けた効果が十分に奏されず、一方、2.0μmを超えると結晶粒が粗大化しやすくなり、チッピングを発生しやすくなる。
本実施形態において、工具基体は、超硬合金(WC基超硬合金:WCの他、Coを含み、さらに、Ti、Ta、Nb等の炭窒化物を添加したものも含むもの等)、サーメット(TiC、TiN、TiCN等を主成分とするもの等)、セラミックス(窒化珪素、サイアロン、酸化アルミニウムなど)、または、cBN焼結体を用いることができるが、これらに限定されない。
ここで、硬質被覆層を構成する各層の平均層厚は、例えば、集束イオンビーム装置(FIB:Focused Ion Beam system)、クロスセクションポリッシャー装置(CP:Cross section Polisher)等を用いて、硬質被覆層を任意の位置の縦断面(工具基体の表面に垂直な面で切断したもの)の観察用の試料を作製し、その縦断面を走査型電子顕微鏡(SEM)または透過型電子顕微鏡(TEM:Transmission Electron Microscope)、走査型透過電子顕微鏡(STEM:Scanning Transmission Electron Microscope)、あるいはSEMまたはTEM付帯のエネルギー分散型X線分析(EDX:Energy Dispersive X-ray spectrometry)装置を用いて複数箇所(例えば、5箇所)で観察して、平均することにより得ることができる。
ここでは、実施例として、工具基体としてWC基超硬合金を用いたインサート切削工具に適用したものについて述べるが、工具基体として、前記したものを用いた場合であっても同様であるし、ドリル、エンドミルに適用した場合も同様である。
対象:実施例工具1~3および比較例工具1~3
被削材: FCD700
切削速度: 400 m/min
送り: 0.3 mm/rev
切込み: 1.5 mm
切削時間: 1パス1分
評価:切削時間1分毎に切れ刃を拡大率2倍の拡大鏡により観察し、α型酸化アルミニウム層の剥離が確認できるまでの時間を測定した。
結果を表7に示す。
対象:実施例工具4~6および比較例工具4~6
被削材: SNCM439
切削速度: 200 m/min
送り: 0.55 mm/rev
切込み: 4 mm
切削時間: 2分
評価:切削時間2分後のチッピング発生状況を観察
各工具について、5コーナーを評価し、チッピングが発生したコーナー数で評価した。
結果を表8に示す。
2 内層(Tiの炭窒化物層)
3 下部中間層(Tiの窒化物層)
4 上部中間層(Tiの炭窒化物層)
5 結合補助層(Tiの炭酸化物層)
6 外層(α型酸化アルミニウム層)
7 柱状粒子
8 工具基体
Claims (1)
- 工具基体と、該工具基体上に硬質被覆層を有する表面被覆切削工具であって、
前記硬質被覆層は、前記工具基体から表面に向かって、順に、内層、下部中間層、上部中間層、結合補助層および外層を有し、
前記内層は、Tiの炭窒化物層であって、平均層厚が4.0~20.0μmであり、
前記下部中間層は、Tiの窒化物層であって、平均層厚が0.1~2.0μmであり、
前記上部中間層は、Tiの炭窒化物層であって、平均層厚が0.1~2.5μmであり、
前記下部中間層のTiの窒化物の粒界と前記上部中間層のTiの炭窒化物の粒界は、前記内層のTiの炭窒化物の粒界から連続しており、
前記結合補助層は、Tiの炭窒酸化物層であって、平均層厚が3~80nmであり、
前記外層は、α型酸化アルミニウム層であって、平均層厚が2.0~20.0μmであり、
前記内層および前記上部中間層のTiの炭窒化物の配向性指数TC(422)が3.0以上、前記外層のα型酸化アルミニウムの配向性指数TC(0 0 12)が5.0以上である、
ことを特徴とする表面被覆切削工具。
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US20230105932A1 (en) | 2023-04-06 |
CN115297980A (zh) | 2022-11-04 |
JPWO2021192327A1 (ja) | 2021-09-30 |
EP4129539A4 (en) | 2024-04-24 |
KR20220156851A (ko) | 2022-11-28 |
JP7473883B2 (ja) | 2024-04-24 |
EP4129539A1 (en) | 2023-02-08 |
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