Classifications

• • G—PHYSICS
  • G01—MEASURING; TESTING
  • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
  • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
  • G01J3/28—Investigating the spectrum
  • G01J3/44—Raman spectrometry; Scattering spectrometry ; Fluorescence spectrometry
  • G01J3/4412—Scattering spectrometry
• • G—PHYSICS
  • G01—MEASURING; TESTING
  • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
  • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
  • G01J3/02—Details
  • G01J3/0205—Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows
• • G—PHYSICS
  • G01—MEASURING; TESTING
  • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
  • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
  • G01J3/02—Details
  • G01J3/027—Control of working procedures of a spectrometer; Failure detection; Bandwidth calculation
• • G—PHYSICS
  • G01—MEASURING; TESTING
  • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
  • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
  • G01J3/02—Details
  • G01J3/0286—Constructional arrangements for compensating for fluctuations caused by temperature, humidity or pressure, or using cooling or temperature stabilization of parts of the device; Controlling the atmosphere inside a spectrometer, e.g. vacuum
• • G—PHYSICS
  • G01—MEASURING; TESTING
  • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
  • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
  • G01J3/28—Investigating the spectrum
  • G01J3/44—Raman spectrometry; Scattering spectrometry ; Fluorescence spectrometry
• • G—PHYSICS
  • G01—MEASURING; TESTING
  • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
  • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
  • G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
  • G01N21/63—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
  • G01N21/65—Raman scattering
• • G—PHYSICS
  • G01—MEASURING; TESTING
  • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
  • G01N2201/00—Features of devices classified in G01N21/00
  • G01N2201/06—Illumination; Optics
  • G01N2201/061—Sources
  • G01N2201/06113—Coherent sources; lasers
• • G—PHYSICS
  • G01—MEASURING; TESTING
  • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
  • G01N2201/00—Features of devices classified in G01N21/00
  • G01N2201/06—Illumination; Optics
  • G01N2201/063—Illuminating optical parts
  • G01N2201/0636—Reflectors

Definitions

• Raman Spectroscopy is an established technology, with extensive literature describing its usage for the characterization of various material properties.
• the Raman spectrum carries information on various properties of a sample. Most notably, different peaks in the spectrum correspond to different materials. When the measured target is comprised of material compounds (e.g. SiGe), specific peaks in the Raman spectrum would correspond to different atom pairs (e.g. Si-Si, Si-Ge and Ge-Ge).
• material compounds e.g. SiGe
• specific peaks in the Raman spectrum would correspond to different atom pairs (e.g. Si-Si, Si-Ge and Ge-Ge).
• the level of doping can hence be incorporated into the fitting procedure, and concurrent assessment of doping level along with stress and composition is possible through monitoring peak locations (see for example - A. Perez-Rodriguez et al., Effect of stress and composition on the Raman spectra of etch-stop SiGeB layers, J. Appl. Phys. 80, 15 (1996).
• FIG. 1 illustrates an example of an illumination spot, an intensity distribution of an aligned impinging beam, an intensity distribution of a misaligned impinging beam, and a region of interest;
• FIG. 2 illustrates a sensor, a spatial fdter, a region of interest, and an impinging spot
• FIG. 3 illustrates nine spatial relationships between a region of interest
• FIG. 4 is an example of an optical measurement system
• FIG. 5 is an example of an optical measurement system
• FIG. 6 is an example of an optical measurement system
• FIG. 7 is an example of an optical measurement system
• FIG. 8 illustrates examples of one or more rotating wedge prisms, and a wedge prism rotator
• FIG. 9 illustrates an example of some elements of the illumination optics
• FIG. 10 illustrates an example of a method
• FIG. 11 illustrates an example of a method
• FIG. 12 illustrates an example of a method
• FIG. 13 illustrates an example of an illumination of a pad
• FIG. 14 illustrates an example of an illumination of regular and irregular areas.
• any reference in the specification to either one of a system, a method and a non- transitory computer readable medium should be applied mutatis mutandis to any other of the system, a method and a non-transitory computer readable medium.
• any reference to a system should be applied mutatis mutandis to a method that can be executed by the system and to a non-transitory computer readable medium that may stores instructions executable by the system.
• the illumination of some of the structural elements may cause the structural element to diffract the radiation, and the diffracted radiation in turn may generate “parasitic” Raman scattering radiation that “distorts” the Raman spectrum (once sensed by a detector of a Raman spectrometer).
• the “parasitic” Raman scattering radiation may, for example, change the location and shape of one or more Raman spectrum peaks, and the like.
• the Raman spectroscopy may be used in semiconductor wafer manufacturing APC, measuring on patterned structures of the wafer, in-die measurement, and the like. [0034] There may be provided a system, a method, and a non-transitory computer readable medium that stores instructions for accurate Raman spectroscopy.
• the impinging beam is emitted from an illuminated area of a sample and impinges on the spatial filter.
• the illuminated area is illuminated by an illuminating beam of radiation (hereinafter “illuminating beam”).
• the accuracy of the Raman spectroscopy is increased by preventing undesired scattered radiation from the sample from reaching a detector This may be done by providing a spatial filter for blocking one or more parts of an impinging beam of radiation (hereinafter “impinging beam”) that falls outside a region of interest (the region of interest is defined by the spatial filter) - thereby preventing these one or more parts of the impinging beam from reaching the detector.
• impinging beam an impinging beam of radiation
• the spatial filtering may be required when the illumination spot “covers” an irregular area.
• An irregular area may distort the illumination spot and/or may generate new scattering sources of a Raman spectrum, and/or may include a non-periodic arrangement of elements, and/or may include a non-homogeneous arrangement of elements.
• Non-limiting examples of irregular areas may include (a) a spot that covers an edge region of a conductor and a vicinity of the edge region - where the edge region is of the same order (for example between 0.1 and 0.9) of the area of the spot, (b) a spot that covers an edge region of a single conductor and also covers the edge region - where the vicinity includes a silt.
• the spatial filter may be applied during measurement on the structures including elements such as through silicon vias (TSVs), shallow trench isolation (STI) (e.g. fill, or/and gate oxide), three dimensional NAND memory (3D-NAND) (e.g. strain profiling, crystallinity and dimension profiling), and the like.
• TSVs through silicon vias
• STI shallow trench isolation
• 3D-NAND three dimensional NAND memory
• the spatial filter may include an adjustable spatial filter that may define different regions of interest. Additionally or alternatively, the spatial filter may exhibit a controllable transparency and/or may define a transparent region of interest that is surrounded by opaque regions. The adjustable filter may be replaced by a set of spatial filters that differ from each other by their spatial filtering properties.
• the spatial filter may include fixed elements that define a fixed region of interest.
• the spatial filter may be utilized in some modes of operation of the system, and may be removed or unutilized in other modes of operation of the system.
• the region of interest may be smaller (and even much smaller) than a relevant cross section of the impinging beam.
• the relevant cross section of the impinging beam is the cross section formed at the plane of the spatial filter.
• the region of interest may be a fraction of the relevant cross section of the impinging beam.
• the region of interest may be less than 1%, 2%, 5%, 10%, 15%, 20% or 30% of the relevant cross section of the impinging beam.
• the illuminated area and the relevant cross section of the impinging beam may be of a same size, may be of a same shape, may differ from each other by size, and/or may differ from each other by shapes.
• Non-limiting examples of these shapes are a rectangular spot, an elliptic spot, a circular spot, a line of illumination, and the like.
• the region of interest may be defined to prevent scattered radiation from reaching the detector.
• the definition of the region of interest may be performed using simulations, actual measurements, and the like.
• the small region of interest provides an accurate and highly sensitive optical measurement system that may be used to evaluate different samples, and/or to evaluate different areas of such samples including but not limited to dense arrays of structural elements, regions that exhibit potentially strained elements, regions that exhibit steep slopes and/or substantial height changes, peripheral areas, measuring through silicon vias, gate oxide of dynamic memory, three dimensional NAND memory units, post CMP areas of dynamic memories, and the like.
• the impinging beam may be regarded as being aligned with the region of interest when a center of the impinging beam is within the region of interest - especially when the center of the impinging beam is located at the middle of the region of interest.
• the misalignment may result from system inaccuracies, temperature changes, vibrations, and the like.
• the method and the non-transitory computer readable medium are configured to compensate for such misalignment.
• the compensation may involve optically aligning (or substantially optically aligning) the region of interest and the impinging beam. This may be done by controlling the location of an impingement of the impinging beam on the spatial fdter.
• the controlling may involve introducing a change in an optical collection path such as changing a direction of propagation of the impinging beam.
• the compensation may be based on feedback related to the radiation detected by the detector.
• the feedback may be provided during a calibration process or during any other point in time.
• the calibration process may be executed continuously, in a non-continuous manner, on the fly, in an iterative manner, and the like.
• the calibration process may be based on an intensity of radiation detected by the detector (after passing through the spatial fdter).
• the calibration process may be based on information other than (or in addition to) the intensity of the radiation detected by the sensor.
• the calibration process may be based on a Raman Spectrum sensed by the detector.
• some of the following examples refer to an iterative process in which a calibration process is followed by a measurement process.
• the sample is measured during the measurement process.
• a target is illuminated using different illumination path configurations that direct the collected radiation to different locations on the spatial filter to provide different test results.
• One of the test results is selected (for example the test result having the highest overall intensity) and the illumination path configuration that provided the selected test result may be used during one or more measurement processes that follow the calibration process.
• the illumination path configuration that is a function (for example- a weighted average) of the multiple test results may be selected
• Timing gaps between consecutive calibration processes may be fixed or may vary over time.
• a calibration process may be triggered based on an event such as measurement failures, a detection of errors in one or more Raman spectra, a detection of certain temperature changes, a detection of certain temperatures, a detection of certain vibrations, occurrence of deviations of one or more measured Raman spectra from expected Raman spectra, and the like.
• the calibration process may be executed per each radiation source or per some of the radiation sources. Such a calibration process may compensate for mechanical and/or optical misalignments related to the different radiation sources and may enable to use less accurate illumination and/or collection paths which may simplify the system and even may reduce the cost of the system.
• Figure 1 illustrates an example of an illumination spot 20, an intensity distribution 21 of an aligned impinging beam, an intensity distribution 22 of a misaligned impinging beam and a region of interest 225.
• Figure 1 illustrates the difference in intensity (29) resulting from misalignment between the region of interest 225 and the impinging beam.
• Figure 1 also illustrates a portion of sample 300, and an image 225’ of the region of interest on the sample.
• Figure 2 illustrates a sensor 224, a spatial filter 223, a region of interest 225, and an impinging spot 26 formed by the impinging beam on the spatial filter.
• the region of interest 225 is variable in size and can be much smaller than the impinging spot.
• Figure 3 illustrates nine spatial relationships 291-299 between the region of interest 227 and the impinging spot 26 at nine different configurations of the optical measurement system.
• the sixth configuration provides the best overlap - and thus it may be selected as the desired configuration of the optical measurement system to be applied during the next measurement processes.
• the spatial filter may allow radiation to pass through a test region of interest that may be larger than the region of interest used during the measurement process.
• Figure 4 is an example of an optical measurement system 200.
• Optical measurement unit 200 includes an illumination path, a collection path, a control unit and a mechanical movement unit 303 for supporting sample 300 and for moving the sample 300 in relation to the collection and illumination paths. It should be noted that the sample 300 may be static while the illumination and/or collection paths may move. It should be noted that both the sample 300 and at least one path of the collection and/or illumination may move in relation to each other.
• the collection path and the illumination path share an objective lens 213, and a half wavelength plate (HWP) 109. It should be noted that the illumination path and the collection path may share more components, may share other components, or may not share any component.
• HWP half wavelength plate
• the illumination angle and the collection angle are perpendicular to the sample. It should be noted that any other illumination angles and/or collection angles may be provided.
• the illumination path is configured to control various parameters of an illumination beam such as but not limited to polarization, frequency spectrum, shape, size, coherency, path, intensity, and the like.
• Various elements illustrated in the figure assist in the control of said parameters. Elements that control polarizations are referred as polarization control elements. Elements that control other parameters of the beam are referred to as additional control elements. It should be noted that a single element may control one or more parameters of the beam.
• Non limiting examples of elements include polarizers, half waveplates, quarter waveplates, analyzers, lenses, grids, apertures, and the like.
• the collection path is configured to control various parameters of the impinging beam such as but not limited to polarization, frequency spectrum, shape, size, coherency, path, intensity, and the like.
• Various elements illustrated in the figure assist in the control of said parameters.
• the illumination path is illustrated as including (a) laser 102, (b) illumination optics 103 that include illumination polarization control element 103(1) and additional illumination control element 103(2), (c) a beam splitter such as dichroic beam splitter 210, (d) HWP 209, and (e) objective lens 213.
• the additional illumination control element may control one or more parameters that differ from polarization - for example shape, size, angle of propagation, and the like.
• the collection path is illustrated as including (a) a beam splitter such as dichroic beam splitter 210, (b) HWP 209, (c) objective lens 213, (d) collection optics 105 that include adjustable optics 105(1) for changing the collection path thereby compensating for misalignments, additional collection control element 105(2), and collection polarization control element 105(3), (e) spatial filter 223, and (f) optical unit 235 that includes a grid 231, first lens 232 for directing radiation that passed through the region of interest onto the grid 231, second lens for directing light from grid 231 towards detector 224.
• a beam splitter such as dichroic beam splitter 210
• HWP 209 objective lens 213
• collection optics 105 that include adjustable optics 105(1) for changing the collection path thereby compensating for misalignments, additional collection control element 105(2), and collection polarization control element 105(3),
• spatial filter 223 and
• optical unit 235 that includes a grid 231, first lens 232 for directing radiation
• the optical unit 235 is configurable in the sense that the spatial relationship between the grid 231 and at least the second lens 233 may be altered to direct different radiation lobes from the grid 231 towards the second lens 233.
• Figure 4 illustrates a rotating unit 238 that may rotate the grid 231 in relation to the first and second lenses. Movements other than rotations may be used to change the spatial relationship between the elements of optical unit 235.
• Detector 224 is configured to generate Raman spectra.
• the detector 224 is coupled to control unit 225 that is configured to control various components/ units/ elements of the optical measurement system and may be configured to control the calibration process.
• Figure 5 is an example of an optical measurement system 200’.
• Measurement system 200’ differs from measurement unit 200 by (a) not including FtWP 209, (b) including multiple lasers 102’, and (c) including a processing unit 234 for processing detection signals.
• the illumination optics 103 may be configured to combine or select radiation from the multiple lasers. In some cases only one laser may be activated at a time.
• Figure 6 is an example of an optical measurement system 200”.
• Measurement system 200 differs from measurement unit 200 by (a) not including HWP 209, and (b) including multiple lasers 102’.
• the illumination optics 103 may be configured to combine or select radiation from the multiple lasers. In some cases only one laser may be activated at a time.
• Figure 7 illustrates an example of an optical measurement system 201.
• System 201 includes an illumination path that includes laser 201, entrance aperture stop 203, mirror 204, first illumination lens 206, illumination field stop 207, second illumination lens 208, illumination polarizer 209, beam splitter 210, HWP such as a rotating HWP 211, objective aperture stop / back focal plane 212, and objective lens 213.
• illumination path that includes laser 201, entrance aperture stop 203, mirror 204, first illumination lens 206, illumination field stop 207, second illumination lens 208, illumination polarizer 209, beam splitter 210, HWP such as a rotating HWP 211, objective aperture stop / back focal plane 212, and objective lens 213.
• the collection path includes objective lens 213, objective aperture stop / back focal plane 212, sample 300, rotating collection polarizer 215, HWP such as a rotating HWP 211, first collection lens 216, collection aperture stop 217, second collection lens 218, Notch Filter 219, collection field stop 220, rotating wedge prism 221, wedge prism rotator 225, slit lens 222, spatial filter 223 (may be a slit that can be opened or closed, the size and/or shape of the open slit may be fixed or adjustable), optical unit 235, and detector 234.
• HWP such as a rotating HWP 211
• first collection lens 216 collection aperture stop 217
• second collection lens 218, Notch Filter 219 collection field stop 220
• rotating wedge prism 221, wedge prism rotator 225 slit lens 222
• spatial filter 223 may be a slit that can be opened or closed, the size and/or shape of the open slit may be fixed or adjustable
• optical unit 235 and detector
• Detector 234 may be a spectrograph.
• Figure 8 illustrates rotating wedge prism 221, wedge prism rotator 225 that surrounds the rotating wedge prism 221, an input beam 281 that enters the rotating wedge prism 221 and an output beam 282 outputted from the rotating wedge prism 221.
• Figure 8 also illustrates multiple paths of an output beam given different rotational locations of the rotating wedge prism 221.
• Figure 8 also illustrates that the system may include a pair of rotating wedge prisms 221 and 221 ’ that provide more options to direct the output beam.
• the output beam passes through both rotating prisms.
• Figure 9 illustrates an example of some elements of the illumination optics. There are three lasers followed by three sections of the illumination path that end by an optical adder for adding radiation from the three lasers.
• the three lasers (for example red, blue and green lasers) 102(1)1-102(3) are followed by the three sections of the illumination path.
• the three sections of the illumination path include three collimators 109(1,1)- 109(1,3), three isolators 109(2,1)- 109(2,3), three clean up filters 109(3,1)- 109(3,3), and three shutters 109(4,1)- 109(4,3).
• the three sections are followed by a combiner that includes three beam splitters such as dichroic beam splitters 109(5,1) - 109(5,3), the combiner is followed by initial mirror 109(5), cylindrical lens 109(6) and secondary mirror 204.
• a combiner that includes three beam splitters such as dichroic beam splitters 109(5,1) - 109(5,3), the combiner is followed by initial mirror 109(5), cylindrical lens 109(6) and secondary mirror 204.
• Figure 10 illustrates an example of a method 400.
• Method 400 may start by step 402 of performing, by an optical measurement system, a calibration process that may include (a) finding a misalignment between a region of interest defined by a spatial filter, and an impinging beam of radiation that is emitted from an illuminated area of a sample, the impinging beam impinges on the spatial filter; and (b) determining a compensating path of propagation of the impinging beam that compensates the misalignment.
• the region of interest is shaped and sized to block scattered radiation from the illuminated area from reaching the detector.
• Step 402 may include analyzing at least one Raman spectrum. Additionally or alternatively - step 402 may include analyzing radiation at frequencies that differ from frequencies of a Raman spectrum. The difference between the two examples of step 402 may involve rotating a grid located in the collection path. [00102] Step 402 may be followed by step 404 of performing a measurement process, while the optical measurement system is configured to provide the compensating path of propagation of the impinging beam, to provide one or more Raman spectrums.
• Step 404 may be followed by step 406 of determining whether to initiate a next iteration of steps 402 and 404 - and if so - jumping to step 402.
• Figure 11 illustrates an example of a method 401.
• Method 401 may start by step 403 of performing a calibration process by illuminating a target using different optical measurement system configurations that direct the impinging beam to different locations on the spatial filter, sensing radiation that passed through the region of interest to provide different test results; and determining a compensating path of propagation of the impinging beam based on the test results.
• the region of interest may be shaped and sized to block scattered radiation from the illuminated area from reaching the detector.
• Step 403 may include selecting one of the test results to provide a selected test result, and determining the compensating path of propagation of the impinging beam based on the selected test result.
• Step 403 may include selecting a test result of a highest intensity of the test results to provide the selected test result.
• the determining may include determining the compensation path by selecting multiple selected test results and defining the path based on the multiple selected test results- for example, using interpolation, extrapolation or any other method.
• Step 403 may include rotating a wedge prism of the optical measurement system to find an orientation of the wedge prism that once applied will direct the impinging beam through the compensating path of propagation of the impinging beam.
• Step 403 may include rotating multiple wedge prisms of the optical measurement system to find a combination of orientations of the multiple wedge prisms that once applied will direct the impinging beam through the compensating path of propagation of the impinging beam.
• Step 403 may include analyzing at least one Raman spectrum. Additionally or alternatively - step 403 may include analyzing radiation at frequencies that differ from frequencies of a Raman spectrum. The difference between the two examples of step 404 may involve rotating a grid located in the collection path. [00113] Step 403 may be followed by step 404 of performing a measurement process, while the optical measurement system is configured to provide the compensating path of propagation of the impinging beam, to provide one or more Raman spectrums.
• Step 404 may be followed by step 406 of determining whether to initiate a next iteration of steps 402 and 404 - and if so - jumping to step 402.
• Figure 12 illustrates method 500 for selective Raman spectroscopy.
• Method 500 may include step 510 of receiving or generating irregular area information about locations of irregular areas of a sample.
• Step 510 may be followed by step 520 of determining, based on the irregular area information, at least one filtering parameter of a spatial filtering process that is applied before a Raman detector.
• Step 520 may include determining a spatial configuration of a filter that precedes the Raman detector.
• Step 520 may include selecting a filter (or adjusting slit opening/width) that precedes the Raman detector out of multiple filters that differ from each other by at least one of the at least one filtering parameter .
• the at least one filtering parameter may include an amount of light that reaches to the Raman detector, wherein the amount of light that reaches the Raman detector when illuminating an irregular area is lower than the amount of light that reaches the Raman detector when illuminating a regular area.
• the at least one filtering parameter may include an area of an opening formed in a filter that precedes the Raman detector, wherein the area of the opening formed in the filter when illuminating an irregular area is smaller than the area of the opening formed in the filter when illuminating a regular area.
• the at least one filtering parameter may include a shape of an opening formed in a filter that precedes the Raman detector, wherein the opening formed in the filter when illuminating an irregular area is narrower than the opening formed in the filter when illuminating a regular area.
• Step 520 may include setting the width of the opening to exceed the width of the image of the irregular element.
• Step 520 may be followed by step 530 of acquiring Raman spectrums of multiple sites of the sample while applying the filtering parameters.
• Step 530 may include applying at least one filtering parameter that fits an irregular area when illuminating an irregular area and applying at least one filtering parameter that fits a regular area when illuminating a regular area.
• a method that includes receiving or determining filtering parameters and applying at least one filtering parameter that fits an irregular area when illuminating an irregular area and applying at least one filtering parameter that fits a regular area when illuminating a regular area.
• Figure 13 illustrates an example of an illumination of a pad 602 and of a vicinity 604 of a pad.
• Pad 602 and its vicinity 604 are illuminated by a scanning beam of radiation that form elliptical spots.
• Spots 614 illuminate only the vicinity and spots 610 illuminate only the pad.
• Spots 610 and 614 illuminate regular areas and at least one filtering parameter related to a regular area is applied during the collection.
• Spots 612 illuminate the edge of the pad - and fall on both the pad and its vicinity. Spots illuminate irregular areas and at least one filtering parameter related to an irregular area is applied during the collection.
• Figure 13 also illustrates an image 622 of spots 610 on a filter that has a large opening 632 (at least one filtering parameter related to a regular area).
• Figure 13 further illustrates image 620 of spots 612 on a filter that has a narrow opening 630 (at least one filtering parameter related to an irregular area).
• the narrow opening 630 may be narrower than image 620 but may be wider (or about equal) image 622.
• Figure 14 illustrates an example of an illumination of regular and irregular areas.
• Spot 730 is not warped when illuminating regular area 730.
• Step 731 is warped when illuminating irregular areas such as an edge region of via
• the analysis of radiation and/or a generating of a Raman spectrum from detection signals of a detector and/or an analysis of a Raman spectrum to determine features of the objects may be executed, at least in part, by a controller and/or a processing circuit that does not belong to the optical measurement system and/or may be remotely positioned from the illumination and/or collection paths.
• any arrangement of components to achieve the same functionality is effectively “associated” such that the desired functionality is achieved.
• any two components herein combined to achieve a particular functionality may be seen as “associated with” each other such that the desired functionality is achieved, irrespective of architectures or intermedial components.
• any two components so associated can also be viewed as being “operably connected,” or “operably coupled,” to each other to achieve the desired functionality.
• the illustrated examples may be implemented as circuitry located on a single integrated circuit or within a same device.
• the examples may be implemented as any number of separate integrated circuits or separate devices interconnected with each other in a suitable manner.
• the examples, or portions thereof may implemented as soft or code representations of physical circuitry or of logical representations convertible into physical circuitry, such as in a hardware description language of any appropriate type.
• any reference signs placed between parentheses shall not be construed as limiting the claim.
• the word ‘comprising’ does not exclude the presence of other elements or steps then those listed in a claim.
• the terms “a” or “an,” as used herein, are defined as one or more than one.
• any method may include at least the steps included in the figures and/or in the specification, only the steps included in the figures and/or the specification.

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