WO2021134833A1 - Procédé de préparation de substrat de réseau, substrat de réseau et écran d'affichage à cristaux liquides - Google Patents

Procédé de préparation de substrat de réseau, substrat de réseau et écran d'affichage à cristaux liquides Download PDF

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Publication number
WO2021134833A1
WO2021134833A1 PCT/CN2020/071914 CN2020071914W WO2021134833A1 WO 2021134833 A1 WO2021134833 A1 WO 2021134833A1 CN 2020071914 W CN2020071914 W CN 2020071914W WO 2021134833 A1 WO2021134833 A1 WO 2021134833A1
Authority
WO
WIPO (PCT)
Prior art keywords
layer
array substrate
insulating layer
alignment mark
hydrophobic film
Prior art date
Application number
PCT/CN2020/071914
Other languages
English (en)
Chinese (zh)
Inventor
张霞
Original Assignee
Tcl华星光电技术有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tcl华星光电技术有限公司 filed Critical Tcl华星光电技术有限公司
Priority to US16/645,238 priority Critical patent/US11194199B2/en
Publication of WO2021134833A1 publication Critical patent/WO2021134833A1/fr

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/7084—Position of mark on substrate, i.e. position in (x, y, z) of mark, e.g. buried or resist covered mark, mark on rearside, at the substrate edge, in the circuit area, latent image mark, marks in plural levels
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136277—Active matrix addressed cells formed on a semiconductor substrate, e.g. of silicon
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/708—Mark formation

Abstract

La présente invention concerne un procédé de préparation de substrat de réseau, un substrat de réseau et un écran d'affichage à cristaux liquides. Une zone de non-affichage du substrat de réseau comprend un substrat de base, un repère d'alignement, une couche isolante, une couche de film hydrophobe et un profil d'espaceur noir. La couche de film hydrophobe est disposée sur la couche isolante correspondant au repère d'alignement ; lors du revêtement du matériau d'espaceur noir, l'épaisseur de la couche de film d'espaceur noir dans la zone où la couche de film hydrophobe est disposée est réduite ; ainsi, le problème de difficulté de lecture du repère d'alignement est efficacement amélioré.
PCT/CN2020/071914 2020-01-03 2020-01-14 Procédé de préparation de substrat de réseau, substrat de réseau et écran d'affichage à cristaux liquides WO2021134833A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US16/645,238 US11194199B2 (en) 2020-01-03 2020-01-14 Method of manufacturing array substrate, array substrate, and LCD panel

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN202010003667.2 2020-01-03
CN202010003667.2A CN111077744A (zh) 2020-01-03 2020-01-03 一种阵列基板制备方法、阵列基板及液晶显示面板

Publications (1)

Publication Number Publication Date
WO2021134833A1 true WO2021134833A1 (fr) 2021-07-08

Family

ID=70321752

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/CN2020/071914 WO2021134833A1 (fr) 2020-01-03 2020-01-14 Procédé de préparation de substrat de réseau, substrat de réseau et écran d'affichage à cristaux liquides

Country Status (2)

Country Link
CN (1) CN111077744A (fr)
WO (1) WO2021134833A1 (fr)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI756806B (zh) * 2020-08-31 2022-03-01 友達光電股份有限公司 顯示裝置
CN113871402A (zh) * 2021-09-26 2021-12-31 惠科股份有限公司 阵列基板及显示面板

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20090059141A1 (en) * 2007-08-30 2009-03-05 Seiko Epson Corporation Electro-optic device, and electronic apparatus including the same
CN104765190A (zh) * 2015-04-28 2015-07-08 深圳市华星光电技术有限公司 黑色矩阵的制作方法
CN105974636A (zh) * 2016-07-18 2016-09-28 深圳市华星光电技术有限公司 液晶显示面板的制作方法
CN107966865A (zh) * 2017-12-18 2018-04-27 深圳市华星光电半导体显示技术有限公司 阵列基板的制作方法、阵列基板及显示面板
CN107991803A (zh) * 2017-12-27 2018-05-04 武汉华星光电技术有限公司 一种黑色矩阵的制作方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006221015A (ja) * 2005-02-14 2006-08-24 Toppan Printing Co Ltd 液晶表示装置用カラーフィルタの製造方法及び液晶表示装置用カラーフィルタ
JP2006337696A (ja) * 2005-06-01 2006-12-14 Fujifilm Holdings Corp 液晶パネルの製造方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20090059141A1 (en) * 2007-08-30 2009-03-05 Seiko Epson Corporation Electro-optic device, and electronic apparatus including the same
CN104765190A (zh) * 2015-04-28 2015-07-08 深圳市华星光电技术有限公司 黑色矩阵的制作方法
CN105974636A (zh) * 2016-07-18 2016-09-28 深圳市华星光电技术有限公司 液晶显示面板的制作方法
CN107966865A (zh) * 2017-12-18 2018-04-27 深圳市华星光电半导体显示技术有限公司 阵列基板的制作方法、阵列基板及显示面板
CN107991803A (zh) * 2017-12-27 2018-05-04 武汉华星光电技术有限公司 一种黑色矩阵的制作方法

Also Published As

Publication number Publication date
CN111077744A (zh) 2020-04-28

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