WO2021072623A1 - 一种钛合金和高温合金加工用的涂层刀具及其制备方法 - Google Patents

一种钛合金和高温合金加工用的涂层刀具及其制备方法 Download PDF

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WO2021072623A1
WO2021072623A1 PCT/CN2019/111204 CN2019111204W WO2021072623A1 WO 2021072623 A1 WO2021072623 A1 WO 2021072623A1 CN 2019111204 W CN2019111204 W CN 2019111204W WO 2021072623 A1 WO2021072623 A1 WO 2021072623A1
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chamber
coating
temperature
substrate
purity
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PCT/CN2019/111204
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English (en)
French (fr)
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王成勇
林海生
郑李娟
匡同春
邓阳
王启民
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广东工业大学
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Priority to JP2022522774A priority Critical patent/JP2022552402A/ja
Priority to PCT/CN2019/111204 priority patent/WO2021072623A1/zh
Priority to CN201980057356.XA priority patent/CN112689688B/zh
Priority to DE112019007736.8T priority patent/DE112019007736T5/de
Publication of WO2021072623A1 publication Critical patent/WO2021072623A1/zh
Priority to US17/721,386 priority patent/US20220234114A1/en

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23B—TURNING; BORING
    • B23B27/00—Tools for turning or boring machines; Tools of a similar kind in general; Accessories therefor
    • B23B27/14—Cutting tools of which the bits or tips or cutting inserts are of special material
    • B23B27/148—Composition of the cutting inserts
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/021—Cleaning or etching treatments
    • C23C14/022—Cleaning or etching treatments by means of bombardment with energetic particles or radiation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/021—Cleaning or etching treatments
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0641—Nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0641—Nitrides
    • C23C14/0647—Boron nitride
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23B—TURNING; BORING
    • B23B2228/00—Properties of materials of tools or workpieces, materials of tools or workpieces applied in a specific manner
    • B23B2228/10—Coatings
    • B23B2228/105—Coatings with specified thickness

Definitions

  • the invention relates to the technical field of tool protective coatings for cutting difficult-to-machine materials, in particular to a coated tool for processing titanium alloys and high-temperature alloys and a preparation method thereof.
  • Titanium alloys and high-temperature alloys are typical difficult-to-machine materials. Titanium alloy cutting processing characteristics: 1) Titanium alloy processing is easy to produce sticking phenomenon with the tool, resulting in severe adhesion and wear of the tool, reducing the service life of the tool; 2) Titanium alloy has poor thermal conductivity, and the local high temperature generated during processing makes Titanium alloys easily absorb oxygen and nitrogen, which can cause work hardening and cause tool chipping; 3) Titanium alloys have a small elastic modulus and large springbacks during cutting deformation, which can easily cause tool chatter.
  • the characteristics of high-temperature alloy cutting processing 1) The high-temperature alloy has low thermal conductivity, high local cutting temperature, and the workpiece material often has a greater affinity with the tool material, which can easily cause severe bonding and wear of the tool; 2) cutting deformation of the high-temperature alloy The coefficient is large, the tendency of work hardening is obvious; 3) The cutting force is large, and its fluctuation is large, which is easy to cause tool vibration. 4) The formation of strong and continuous chips and burrs makes the tool wear serious. In summary, the cutting of titanium alloys and high-temperature alloys puts forward the requirements of strong adhesion resistance, good wear resistance, and toughness to coated tools.
  • Cemented carbide tools have become the first choice for processing titanium alloys and high temperature alloys due to their low cost and good processing performance.
  • the commonly used coating materials in hard alloy coated tools are mainly nitrogen/carbide coatings of transition metals, such as TiAlN, TiSiCN, AlCrSiN, etc.
  • transition metals such as TiAlN, TiSiCN, AlCrSiN, etc.
  • oxide coatings such as Al 2 O 3 and Cr 2 O 3 have also tried to be used in the cutting of titanium alloys and high-temperature alloys.
  • the PVD method is used to deposit high-quality oxides. There are still many problems in the coating of materials.
  • TM-B series and TM-BN series coatings such as TiB 2 , VB 2 , TiBN and so on.
  • the TM-B coating has the characteristics of high hardness and low friction coefficient, but the prepared TM-B coating has problems such as high stress and poor bonding force, which severely restrict its application in cutting; and TM-B The coating does not show good anti-bonding wear performance in cutting titanium alloys and high-temperature alloys.
  • TM-BN coatings mainly focuses on TiBN coatings; there are relatively few researches on HfBN, VBN, NbBN, TaBN, MoBN and other coatings, and according to existing reports, related TMBN prepared by PVD method
  • the coating presents an amorphous BN phase wrapped nanocrystalline boride structure; there are no reports about the application of HfBN, VBN, NbBN, TaBN, MoBN and other coatings on cutting tools.
  • One of the objectives of the present invention is to avoid the deficiencies in the prior art and provide a coated tool for processing titanium alloys and high-temperature alloys.
  • the tool coating has strong anti-adhesion performance, low internal stress, and low friction coefficient.
  • the characteristics of high bonding strength with the tool matrix can effectively inhibit the bonding wear and tool damage of the coated tool in the process of cutting titanium alloy and high-temperature alloy, and significantly improve the service life of the tool and the quality of workpiece processing.
  • a coated tool for processing titanium alloy and high-temperature alloy is provided, and the coating of the coated tool is a Me-B-N coating.
  • the Me-BN coating is Me1-BN, where Me1 is one or more of the transition metal elements Hf, V, Nb, Ta, and Mo, and the atomic percentage of each element is: Me1 8-40 %, B 15-60%, N 10-65%, the Me-BN coating includes a Me1Nx phase and a BN phase.
  • the Me-BN coating is Me1-Me2-BN, where Me1 is one or more of the transition metal elements Hf, V, Nb, Ta, and Mo, and Me2 is the transition metal element Ti, One or more elements of Zr, Cr and W, the atomic percentage of each element is: Me14 ⁇ 36%, Me24 ⁇ 36%, B15 ⁇ 60%, N10 ⁇ 65%, the Me-BN coating includes There are Me1Nx phase, Me2Nx phase and BN phase.
  • the thickness of the Me-B-N coating is 0.3-5 ⁇ m.
  • the tool coating is a Me-BN coating
  • the tool coating has the characteristics of high hardness, low internal stress, low friction coefficient and high bonding strength with the tool matrix, which not only makes the coated tool effective in cutting titanium Alloys and superalloys show obvious anti-adhesive performance, and can effectively inhibit tool bonding wear and tool breakage in the process of cutting titanium alloys and superalloys.
  • the second purpose of the present invention is to avoid the shortcomings in the prior art and provide a method for preparing Me-BN coated tools for processing titanium alloys and high-temperature alloys.
  • the preparation method is simple in process and can be prepared conveniently and quickly. Me-BN coating.
  • a method for preparing Me-B-N coated tools for processing titanium alloys and high-temperature alloys which is characterized in that it comprises the following steps:
  • Steps of depositing Me-BN coating continuously inject high-purity N 2 and high-purity Ar into the chamber while keeping the temperature of the heater in the chamber constant, applying a negative bias to the substrate, using magnetron sputtering technology, and depositing a certain thickness Me-BN series coating;
  • the flow ratio of the high-purity N 2 and the high-purity Ar is 0.06-0.25, the chamber pressure is controlled at 0.4-4 Pa, and the temperature of the heater in the chamber is maintained at 300-600°C;
  • the target material adopts a Me-B target, the planet carrier on which the substrate is placed is connected to the negative electrode of the power supply, the planet carrier rotation speed is 3r/min, the negative bias voltage is -50 ⁇ -300V, and the coating time is 60 ⁇ 300min.
  • Substrate pretreatment steps ultrasonically clean the tool in absolute ethanol, dry it with hot air, and then clamp it on a three-dimensionally rotatable planet carrier, and send it into the chamber;
  • the vacuuming step of the chamber first vacuuming by mechanical pump and molecular pump, and then heating by infrared heating tube to fully remove volatile impurities on the surface of the chamber and the substrate;
  • Ion etching step continuously inject high-purity Ar into the chamber while keeping the temperature of the heater in the chamber constant, apply a negative bias to the substrate, perform ion etching on the substrate, and remove the oxide scale and loose layer on the surface of the tool;
  • the ultrasonic cleaning is to ultrasonically clean the tool substrate with absolute ethanol for 10-20 minutes.
  • the chamber evacuation step evacuated to 4 ⁇ 10 -5 mbar or less by the mechanical pump and molecular pump, and then set the temperature of the infrared heating tube heating 30min 600 °C, the degree of vacuum chamber to be 4 ⁇ 10 - After 5 mbar, set the temperature of the infrared heating tube to 550°C and heat for 30 minutes, and finally vacuum the chamber to below 4 ⁇ 10 -5 mbar to fully remove the volatile impurities on the surface of the chamber and the substrate.
  • the heating temperature of the infrared heating tube is 300-600°C, and the chamber pressure is 1.0 Pa; the cathode arc adopts a circular Cr target with a purity of more than 99% and a target current of 70-100A.
  • the planet carrier on which the substrate is placed is connected to a dual-stage pulse power supply, the planet carrier speed is 3r/min, the negative bias voltage is -300V, the positive bias voltage is +20V, the frequency is 20kHz, and the duty cycle is 80%. , The ion etching time is 20-40 min.
  • Cooling sampling step After the coating is finished, turn on the furnace circulation cooling system. After the chamber is cooled in a vacuum state, the chamber can be opened and the workpiece can be taken out.
  • the temperature of the cooling water in the cooling system is set at 15-20°C, and the workpiece can be taken out after the chamber is slowly cooled to below 70°C in a vacuum state.
  • the Me-BN coating deposited by the planar Me-B target magnetron sputtering is used, and the flow ratio of pure N 2 and high-purity Ar is accurately controlled.
  • the average power density of the target is 5.5 ⁇ 16.5W/cm 2 , and the duty cycle is 2% ⁇ 5%. Therefore, the prepared Me-BN coating has strong anti-adhesion performance, good uniformity, low internal stress and low friction coefficient.
  • it can effectively improve the service life of the tool and the surface quality of the workpiece.
  • Figure 1 is the SEM morphology of the surface of the V-B-N coating of Example 1 of the present invention.
  • Fig. 2 is a diagram of the flank wear of the Hf-B-N-coated cemented carbide insert in the embodiment 2 of the present invention in the processing of titanium alloy and high-temperature alloy.
  • a V-B-N coating tool for processing titanium alloys and high-temperature alloys The atomic percentages of the elements in the V-B-N coating are: V15%, B20%, and N65%.
  • the V-B-N coating includes a VN phase and a BN phase.
  • the thickness of the V-B-N coating is 0.3 ⁇ m.
  • a method for preparing a V-B-N coated tool for processing titanium alloys and high-temperature alloys including the following steps:
  • Substrate pretreatment the tool is ultrasonically cleaned in absolute ethanol for 10 minutes, dried by hot air, and then clamped on a three-dimensionally rotatable planet carrier, and sent into the chamber;
  • the cemented carbide substrate is ion etched by arc-enhanced glow discharge technology.
  • the specific process is: (1) The cathode motor arc uses a circular Cr target with a purity of more than 99%, and the target current is 70A; (2) The planet carrier where the substrate is placed is connected to a two-stage pulse power supply, and the planet carrier speed is 3r/min, negative The bias voltage gradually increases from -50V to -300V, the positive voltage is +20V, the frequency is 20kHz, and the duty cycle is 80%; (3) High-purity Ar is continuously injected into the vacuum chamber, and the pressure is 1.0Pa. The flow rate is controlled by air pressure; (4) The temperature of the infrared heating tube is set to 300°C; (5) The ion etching time is 20 minutes; this step can effectively remove the oxide scale and loose layer on the surface of the substrate;
  • VBN coating Continuously inject high-purity N 2 and high-purity Ar into the chamber, while keeping the temperature of the heater in the chamber constant, applying a negative bias to the substrate, using high-power pulsed magnetron sputtering technology, the deposition has A certain thickness of VBN series coating.
  • the flow rate of the high-purity N 2 is 10 sccm
  • the flow rate ratio of the high-purity N 2 and the high-purity Ar is controlled to be 0.06
  • the chamber pressure is controlled at 0.8 Pa
  • the temperature of the infrared heating tube in the chamber is maintained at 600° C.
  • the substrate is negatively biased.
  • Pressure using magnetron sputtering technology to coat the substrate.
  • Plane VB target is used as the sputtering target;
  • the planet carrier where the substrate is placed is connected to the negative electrode of the power supply, the planet carrier speed is 3r/min, and the negative bias voltage is -300V;
  • the coating treatment time is 60min;
  • Cooling sampling After the coating is finished, turn on the furnace circulation cooling system, set the cooling water temperature to 15°C, and wait until the chamber is slowly cooled to below 70°C under vacuum, then the workpiece can be taken out.
  • Figure 1 shows the surface SEM morphology of the obtained V-B-N coating. It can be seen that the surface of the deposited V-B-N coating is relatively smooth and flat on the whole, without defects such as droplets and voids.
  • a Hf-BN coating tool for processing titanium alloys and high-temperature alloys wherein the atomic percentage of each element in the Hf-BN coating is: Hf55%, B15%, and N30%, and the Hf-BN coating includes HfN Phase and BN phase.
  • the thickness of the Hf-B-N coating is 5 ⁇ m.
  • a method for preparing Hf-B-N coated tools for processing titanium alloys and high-temperature alloys including the following steps:
  • Substrate pretreatment ultrasonically clean the tool in absolute ethanol for 20 minutes, dry it with hot air, and then clamp it on a three-dimensional rotating planetary carrier, and send it into the chamber;
  • the cemented carbide substrate is ion etched by arc-enhanced glow discharge technology.
  • the specific process is: (1) The cathodic arc adopts a circular Cr target with a purity of more than 99% and a target current of 90A; (2) The planet carrier where the substrate is placed is connected to a two-stage pulse power supply, and the planet carrier speed is 3r/min, negative bias The pressure gradually increases from -50V to -300V, the positive voltage is +20V, the frequency is 20kHz, and the duty cycle is 80%; (3) High-purity Ar is continuously introduced into the vacuum chamber, the pressure is 1.0Pa, and the flow of Ar is introduced Controlled by air pressure; (4) The temperature of the infrared heating tube is set to 600°C; (5) The ion etching time is 40 minutes; this step can effectively remove the oxide scale and loose layer on the surface of the substrate;
  • Hf-BN coating continuous injection of high-purity N 2 and high-purity Ar into the chamber, while keeping the temperature of the heater in the chamber constant, applying a negative bias to the substrate, using high-power pulsed magnetron sputtering technology, Deposit a certain thickness of Hf-BN coating.
  • the flow rate of the high-purity N 2 is 10 sccm
  • the flow ratio of the high-purity N 2 and the high-purity Ar is controlled to be 0.25
  • the chamber air pressure is controlled to 0.4 Pa
  • the temperature of the infrared heating tube in the chamber is maintained at 300° C.
  • the substrate is negatively biased.
  • Pressure using magnetron sputtering technology to coat the substrate.
  • Planar Hf-B target is used as the sputtering target, and the power density is 16.5W/cm2;
  • the planet carrier where the substrate is placed is connected to the negative electrode of the power supply, the planet carrier speed is 3r/min, and the negative bias voltage is -50V;
  • the coating treatment time is 300min;
  • Cooling sampling After the coating is finished, turn on the furnace circulation cooling system, set the cooling water temperature to 20°C, and wait until the chamber is slowly cooled to below 70°C under vacuum, then the workpiece can be taken out.
  • a Hf-Ti-BN coated tool for processing titanium alloys and high-temperature alloys wherein the atomic percentage of each element in the Hf-Ti-BN coating is: Hf20%, Ti15%, B30%, N35%, and the Hf -Ti-BN coating includes HfN phase, TiN phase and BN phase.
  • the thickness of the Hf-Ti-B-N coating is 2.75 ⁇ m.
  • a method for preparing Hf-Ti-B-N coated tools for processing titanium alloys and high-temperature alloys including the following steps:
  • Substrate pretreatment ultrasonically clean the tool in absolute ethanol for 15 minutes, dry it with hot air, and then mount it on a three-dimensionally rotatable planet carrier and send it into the chamber;
  • the cemented carbide substrate is ion etched by arc-enhanced glow discharge technology.
  • the specific process is: (1) The cathodic arc uses a circular Cr target with a purity of more than 99% and a target current of 80A; (2) The planet carrier where the substrate is placed is connected to a dual-stage pulse power supply, and the planet carrier speed is 3r/min, negative bias The pressure gradually increases from -50V to -300V, the positive voltage is +20V, the frequency is 20kHz, and the duty cycle is 80%; (3) High-purity Ar is continuously introduced into the vacuum chamber, the pressure is 1.0Pa, and the flow of Ar is introduced Controlled by air pressure; (4) The temperature of the infrared heating tube is set to 450°C; (5) The ion etching time is 30 minutes; this step can effectively remove the oxide scale and loose layer on the surface of the substrate;
  • Hf-Ti-BN coating Continuously pass high-purity N 2 and high-purity Ar into the chamber, while keeping the temperature of the heater in the chamber constant, applying a negative bias to the substrate, using radio frequency magnetron sputtering technology, Deposit Hf-Ti-BN coating with a certain thickness.
  • the flow rate of the high-purity N 2 is 20 sccm
  • the flow ratio of the high-purity N 2 and the high-purity Ar is controlled to be 0.14
  • the chamber air pressure is controlled at 0.6 Pa
  • the temperature of the infrared heating tube in the chamber is maintained at 450° C.
  • the substrate is negatively biased.
  • Pressure using magnetron sputtering technology to coat the substrate.
  • the specific process is: (1) Sputtering target material adopts plane Hf-B target and Ti-B target; (2) The planet carrier on which the substrate is placed is connected to the negative electrode of the power supply, the planet carrier speed is 3r/min, and the negative bias voltage is -175V; (3) The coating treatment time is 180min;
  • Cooling sampling After the coating is finished, turn on the furnace circulation cooling system, set the cooling water temperature to 18°C, and wait until the chamber is slowly cooled to below 70°C under vacuum, then the workpiece can be taken out.
  • the milling test parameters are as follows: cutting speed 100m/min, cutting depth 3mm, cutting width 0.5mm, feed speed 0.2mm/z). Cooling conditions: conventional coolant. The milling test results show that: Compared with other commercial coated tools, the bonding wear of Hf-Ti-B-N coated carbide tools is not obvious, and the cutting life of the tools is increased by at least 2 times.
  • the tool coating is a Me-BN coating
  • the tool coating has the characteristics of high hardness, low internal stress, low friction coefficient and high bonding strength with the tool matrix, which not only makes the coated tool effective In the process of cutting titanium alloys and superalloys, it exhibits obvious anti-adhesion performance, and it can also effectively inhibit tool bonding wear and tool breakage in the process of cutting titanium alloys and superalloys;
  • the Me-BN coating deposited by the planar Me-B target magnetron sputtering is used, and the flow ratio of pure N 2 and high-purity Ar is accurately controlled, and the average power of the sputtering target The density is 5.5 ⁇ 16.5W/cm 2 and the duty cycle is 2% ⁇ 5%. Therefore, the prepared Me-BN coating has strong anti-adhesion performance, good uniformity, low internal stress and low friction coefficient. In the cutting of alloys and superalloys, it can effectively improve the service life of the tool and the surface quality of the workpiece.

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  • Engineering & Computer Science (AREA)
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Abstract

一种钛合金和高温合金加工用的涂层刀具及其制备方法，所述涂层刀具的涂层为Me-B-N涂层，该钛合金和高温合金加工用的涂层刀具的制备方法，包括以下步骤：基体预处理步骤：将刀具进行清洗干燥后，送入腔室；腔室抽真空步骤：通过机械泵和分子泵抽真空；离子刻蚀步骤：向腔室内通入高纯Ar，保持腔室内加热器温度，加负偏压，对基体进行离子刻蚀，去除刀具表面的氧化皮和疏松层；沉积Me-B-N系涂层步骤：向腔室内连续通入高纯N2和高纯Ar，同时保持腔室内加热器温度恒定，基体加负偏压，采用磁控溅射技术或电弧等离子体技术，沉积具有一定厚度的Me-B-N系涂层；冷却取样步骤：开启炉体循环冷却系统，待腔室在真空状态下冷却后即可打开腔室，取出工件。

Description

一种钛合金和高温合金加工用的涂层刀具及其制备方法 技术领域
本发明涉及难加工材料切削用刀具防护涂层技术领域，特别是涉及一种钛合金和高温合金加工用的涂层刀具及其制备方法。
背景技术
在切削加工领域，钛合金和高温合金都是典型的难加工材料。钛合金切削加工特点：1)钛合金加工过程中易与刀具产生黏刀现象，导致刀具严重的粘结磨损，降低了刀具的使用寿命；2)钛合金导热性差，加工中产生的局部高温使得钛合金很容易吸收氧和氮，造成加工硬化现象，引起刀具崩刃；3)钛合金的弹性模数小，切削加工变形时回弹大，容易引起刀具震颤。高温合金切削加工特点：1)高温合金热导系数低，局部切削温度高，且工件材料常与刀具材料具有较大的亲和力，极易造成刀具严重的粘结磨损；2)高温合金的切削变形系数大，加工硬化倾向明显；3)切削力大，且其浮动较大，易引起刀具震动4)形成强韧而连续的切屑和毛刺，使得刀具磨损严重。综合以上，钛合金和高温合金的切削加工对涂层刀具提出了抗粘性强、耐磨性好、强韧性等要求。
硬质合金刀具因成本低、加工性能好等优势，成为了加工钛合金和高温合金的首选。硬质合金涂层刀具中常用的涂层材料主要是过渡族金属的氮/碳化物涂层，如TiAlN、TiSiCN、AlCrSiN等。相关研究表明，相对于无涂层硬质合金刀具，涂层刀具在切削加工钛合金和高温合金中能够有效抑制刀具磨损；但也有不少学者指出涂层刀具的切削效果明显不如无涂层刀具。另外，Al 2O 3、Cr 2O 3等氧化物涂层也尝试用于钛合金和高温合金的切削加工，但由于该类涂层的导电性普遍较差，采用PVD方法沉积高质量的氧化物涂层仍存在很多问题。
目前，TM-B系、TM-B-N系涂层也有少量报道，如TiB 2,VB 2,TiBN等。TM-B系涂层具有硬度高、摩擦系数低等特点，但所制备的TM-B涂层存在应力大、结合力差等问题，严重制约了其在切削加工中的应用；且TM-B涂层在切削钛合金和高温合金中，并未表现出来较好的抗粘结磨损性能。对于TM-B-N系涂层的相关研究，主要集中于TiBN涂层；HfBN、VBN、NbBN、TaBN、MoBN等涂层的研究则相对较少，且根据现有报道，使用PVD方法制备的相关TMBN涂层呈现非晶态BN相包裹纳米晶硼化物的结构；尚未见到HfBN、VBN、NbBN、TaBN、MoBN等涂层在切削刀具上的应用的相关报道。
发明内容
本发明的目的之一在于避免现有技术中的不足之处而提供一种钛合金和高温合金加工用 的涂层刀具，该刀具涂层具有抗粘结性能强、内应力低、摩擦系数低、与刀具基体结合强度高等特点，能够有效抑制在涂层刀具在切削钛合金和高温合金过程中的粘结磨损和刀具破损，明显提高刀具的使用寿命和工件加工质量。
本发明的目的之一通过以下技术方案实现：
本发明的目的之一通过以下技术方案实现：
提供一种钛合金和高温合金加工用的涂层刀具，所述涂层刀具的涂层为Me-B-N涂层。
进一步的，所述Me-B-N涂层为Me1-B-N,其中Me1为过渡族金属元素Hf、V、Nb、Ta、Mo中的一种或者多种元素,各元素原子百分比为：Me1 8～40％，B 15～60％，N 10～65％，所述Me-B-N涂层包括有Me1Nx相和BN相。
进一步的，所述Me-B-N涂层为Me1-Me2-B-N,其中Me1为过渡族金属元素Hf、V、Nb、Ta、Mo中的一种或者多种元素,Me2为过渡族金属元素Ti、Zr、Cr、W中的一种或者多种元素,各元素原子百分比为：Me14～36％，Me24～36％，B 15～60％，N 10～65％，所述Me-B-N涂层包括有Me1Nx相、Me2Nx相和BN相。
进一步的，所述Me-B-N涂层的厚度为0.3～5μm。
有益效果：由于该刀具涂层为Me-B-N系涂层，使得该刀具涂层具有硬度高、内应力低、摩擦系数低和与刀具基体结合强度高等特点，不仅使得涂层刀具在切削加工钛合金和高温合金过程中表现出明显的抗粘结性能，而且还能够有效抑制在切削钛合金和高温合金过程中的刀具粘结磨损和刀具破损。
本发明的目的之二在于避免现有技术中的不足之处而提供一种钛合金和高温合金加工用的Me-B-N涂层刀具的制备方法，该制备方法工艺简单，能够方便快捷的制备出Me-B-N涂层。
本发明的目的之二通过以下技术方案实现：
一种钛合金和高温合金加工用的Me-B-N涂层刀具的制备方法，其特征在于：包括以下步骤：
沉积Me-B-N系涂层步骤：向腔室内连续通入高纯N 2和高纯Ar，同时保持腔室内加热器温度恒定，基体加负偏压，采用磁控溅射技术，沉积具有一定厚度的Me-B-N系涂层；
所述高纯N 2和高纯Ar的流量比值为0.06～0.25，腔室气压控制在0.4～4Pa，同时保持腔室内加热器温度为300～600℃；
所述靶材采用Me-B靶，放置基体的行星架接电源负极，行星架转速为3r/min，负偏压为-50～-300V，所述镀膜的时间为60～300min。
进一步的，所述沉积Me-B-N系涂层步骤前，需进行以下步骤：
基体预处理步骤：将刀具在无水乙醇中超声清洗，热风吹干后装夹在可三维旋转的行星架上，送入腔室；
腔室抽真空步骤：先通过机械泵和分子泵抽真空，接着利用红外加热管加热，充分去除腔室和基体表面易挥发杂质；
离子刻蚀步骤：向腔室内连续通入高纯Ar，同时保持腔室内加热器温度恒定，基体加负偏压，对基体进行离子刻蚀，去除刀具表面的氧化皮和疏松层；
进一步的，基体预处理步骤中，所述超声清洗是将刀具基体用无水乙醇超声清洗10～20min。
进一步的，腔室抽真空步骤中，先通过机械泵和分子泵抽真空至4×10 -5mbar以下，接着红外加热管设置温度为600℃加热30min，待腔室真空度至4×10 -5mbar以下后，红外加热管设置温度为550℃加热30min，最终抽腔室真空至4×10 -5mbar以下，充分去除腔室和基体表面易挥发杂质。
进一步的，离子刻蚀步骤中，所述红外加热管加热温度为300～600℃，腔室气压为1.0Pa；阴极电弧采用圆形Cr靶，纯度99％以上，靶电流70～100A。
进一步的，离子刻蚀步骤中，放置基体的行星架接双级脉冲电源，行星架转速为3r/min，负偏压为-300V，正偏压为+20V，频率20kHz，占空比80％，所述离子刻蚀时间为20～40min。
进一步的，所述沉积Me-B-N系涂层步骤后，需进行以下步骤：
冷却取样步骤：镀膜结束后，开启炉体循环冷却系统，待腔室在真空状态下冷却后即可打开腔室，取出工件。
进一步的，冷却取样步骤中，所述冷却系统中冷却水温度设定15～20℃，待腔室在真空状态下缓慢冷却至70℃以下，即可取出工件。
有益效果：由于在制备涂层的工艺过程当中，采用平面Me-B靶磁控溅射所沉积的Me-B-N涂层，并且精确的控制了纯N 2和高纯Ar的流量比值,溅射靶平均功率密度为5.5～16.5W/cm 2，占空比为2％～5％，因此使得制备出来的Me-B-N涂层抗粘结性能强、均匀性好、内应力低、摩擦系数低，在钛合金和高温合金的切削加工中，能有效提高刀具的使用寿命和工件加工表面质量。
附图说明
下面结合附图和具体实施方式对本实用新型作进一步详细的说明。
图1是本发明实施例1的V-B-N涂层的表面SEM形貌。
图2是本发明实施例2的Hf-B-N涂层的硬质合金刀片加工钛合金和高温合金的后刀面磨损情况图。
具体实施方式
结合以下实施例对本发明作进一步描述。
实施例1
一种钛合金和高温合金加工用的V-B-N涂层刀具，所述V-B-N涂层中各元素原子百分比为：V15％，B20％，N65％，所述V-B-N涂层包括有VN相和BN相。
在优选实施例中，所述V-B-N涂层的厚度为0.3μm。
一种钛合金和高温合金加工用的V-B-N涂层刀具的制备方法，包括以下步骤：
1)基体预处理：将刀具在无水乙醇中超声清洗10min，热风吹干后装夹在可三维旋转的行星架上，送入腔室；
2)腔室抽真空：先通过机械泵和分子泵抽真空至4×10 -5mbar以下，接着红外加热管设置温度为600℃加热30min，待腔室真空度至4×10 -5mbar以下后，红外加热管设置温度为550℃加热30min，最终抽腔室真空至4×10 -5mbar以下，充分去除腔室和基体表面易挥发杂质；
3)离子刻蚀：在沉积薄膜之前，采用电弧增强型辉光放电技术对硬质合金基体进行离子刻蚀。具体工艺是：(1)阴极电机电弧采用圆形Cr靶，纯度达99％以上，靶电流为70A；(2)放置基体的行星架接双级脉冲电源，行星架转速为3r/min，负偏压从-50V到-300V逐渐增加，正电压为+20V，频率20kHz，占空比80％；(3)向真空腔室中连续通入高纯Ar，气压为1.0Pa，通入的Ar流量通过气压控制；(4)红外加热管温度设定为300℃；(5)离子刻蚀时间为20min；该步骤能够有效去除基体表面的氧化皮和疏松层；
4)沉积V-B-N系涂层：向腔室内连续通入高纯N 2和高纯Ar，同时保持腔室内加热器温度恒定，基体加负偏压，采用高功率脉冲磁控溅射技术，沉积具有一定厚度的V-B-N系涂层。所述高纯N 2的流量为10sccm，控制高纯N 2和高纯Ar的流量比值为0.06，腔室气压控制在0.8Pa，同时保持腔室内红外加热管温度为600℃，基体加负偏压，采用磁控溅射技术对基底进行镀膜处理。具体工艺是：(1)溅射靶材采用平面V-B靶；(2)放置基体的行星架接电源负极，行星架转速为3r/min，负偏压为-300V；(3)镀膜处理时间为60min；
5)冷却取样：镀膜结束后，开启炉体循环冷却系统，冷却水温度设定15℃，待腔室在真空状态下缓慢冷却至70℃以下，即可取出工件。
图1为所得V-B-N涂层的表面SEM形貌，可见沉积的V-B-N涂层表面整体上较光滑平整，无液滴、空洞等缺陷。
实施例2
一种钛合金和高温合金加工用的Hf-B-N涂层刀具，所述Hf-B-N涂层中各元素原子百分比为：Hf55％，B15％，N30％，所述Hf-B-N涂层包括有HfN相和BN相。
在优选实施例中，所述Hf-B-N涂层的厚度为5μm。
一种钛合金和高温合金加工用的Hf-B-N涂层刀具的制备方法，包括以下步骤：
1)基体预处理：将刀具在无水乙醇中超声清洗20min，热风吹干后装夹在可三维旋转的行星架上，送入腔室；
2)腔室抽真空：先通过机械泵和分子泵抽真空至4×10 -5mbar以下，接着红外加热管设置温度为600℃加热30min，待腔室真空度至4×10 -5mbar以下后，红外加热管设置温度为550℃加热30min，最终抽腔室真空至4×10 -5mbar以下，充分去除腔室和基体表面易挥发杂质；
3)离子刻蚀：在沉积薄膜之前，采用电弧增强型辉光放电技术对硬质合金基体进行离子刻蚀。具体工艺是：(1)阴极电弧采用圆形Cr靶，纯度达99％以上，靶电流为90A；(2)放置基体的行星架接双级脉冲电源，行星架转速为3r/min，负偏压从-50V到-300V逐渐增加，正电压为+20V，频率20kHz，占空比80％；(3)向真空腔室中连续通入高纯Ar，气压为1.0Pa，通入的Ar流量通过气压控制；(4)红外加热管温度设定为600℃；(5)离子刻蚀时间为40min；该步骤能够有效去除基体表面的氧化皮和疏松层；
4)沉积Hf-B-N系涂层：向腔室内连续通入高纯N 2和高纯Ar，同时保持腔室内加热器温度恒定，基体加负偏压，采用高功率脉冲磁控溅射技术，沉积具有一定厚度的Hf-B-N系涂层。所述高纯N 2的流量为10sccm，控制高纯N 2和高纯Ar的流量比值为0.25，腔室气压控制在0.4Pa，同时保持腔室内红外加热管温度为300℃，基体加负偏压，采用磁控溅射技术对基底进行镀膜处理。具体工艺是：(1)溅射靶材采用平面Hf-B靶，功率密度为16.5W/cm2；(2)放置基体的行星架接电源负极，行星架转速为3r/min，负偏压为-50V；(3)镀膜处理时间为300min；
5)冷却取样：镀膜结束后，开启炉体循环冷却系统，冷却水温度设定20℃，待腔室在真空状态下缓慢冷却至70℃以下，即可取出工件。
车削试验参数：切削速度90m/min,切削深度1.0mm，进给速度0.25mm/r。冷却方式为油水复合喷雾冷却。车削试验结果表明：与无涂层硬质合金刀片相比，Hf-B-N涂层的硬质 合金刀片能够更好的抑制后刀面磨损(如图2所示)，且具有较强的抗钛合金粘结性能。
实施例3
一种钛合金和高温合金加工用的Hf-Ti-B-N涂层刀具，所述Hf-Ti-B-N涂层中各元素原子百分比为：Hf20％，Ti15％,B30％，N35％，所述Hf-Ti-B-N涂层包括有HfN相、TiN相和BN相。
在优选实施例中，所述Hf-Ti-B-N涂层的厚度为2.75μm。
一种钛合金和高温合金加工用的Hf-Ti-B-N涂层刀具的制备方法，包括以下步骤：
1)基体预处理：将刀具在无水乙醇中超声清洗15min，热风吹干后装夹在可三维旋转的行星架上，送入腔室；
2)腔室抽真空：先通过机械泵和分子泵抽真空至4×10 -5mbar以下，接着红外加热管设置温度为600℃加热30min，待腔室真空度至4×10 -5mbar以下后，红外加热管设置温度为550℃加热30min，最终抽腔室真空至4×10 -5mbar以下，充分去除腔室和基体表面易挥发杂质；
3)离子刻蚀：在沉积薄膜之前，采用电弧增强型辉光放电技术对硬质合金基体进行离子刻蚀。具体工艺是：(1)阴极电弧采用圆形Cr靶，纯度达99％以上，靶电流为80A；(2)放置基体的行星架接双级脉冲电源，行星架转速为3r/min，负偏压从-50V到-300V逐渐增加，正电压为+20V，频率20kHz，占空比80％；(3)向真空腔室中连续通入高纯Ar，气压为1.0Pa，通入的Ar流量通过气压控制；(4)红外加热管温度设定为450℃；(5)离子刻蚀时间为30min；该步骤能够有效去除基体表面的氧化皮和疏松层；
4)沉积Hf-Ti-B-N系涂层：向腔室内连续通入高纯N 2和高纯Ar，同时保持腔室内加热器温度恒定，基体加负偏压，采用射频磁控溅射技术，沉积具有一定厚度的Hf-Ti-B-N系涂层。所述高纯N 2的流量为20sccm，控制高纯N 2和高纯Ar的流量比值为0.14，腔室气压控制在0.6Pa，同时保持腔室内红外加热管温度为450℃，基体加负偏压，采用磁控溅射技术对基底进行镀膜处理。具体工艺是：(1)溅射靶材采用平面Hf-B靶和Ti-B靶；(2)放置基体的行星架接电源负极，行星架转速为3r/min，负偏压为-175V；(3)镀膜处理时间为180min；
5)冷却取样：镀膜结束后，开启炉体循环冷却系统，冷却水温度设定18℃，待腔室在真空状态下缓慢冷却至70℃以下，即可取出工件。
铣削试验参数如下：切削速度100m/min，切削深度3mm，切削宽度0.5mm，进给速度0.2mm/z)。冷却条件：常规冷却液。铣削试结果表明：相比其他商用涂层刀具，Hf-Ti-B-N涂层硬质合金刀具粘结磨损不明显，刀具切削寿命提高至少2倍。
本发明的有益效果：由于该刀具涂层为Me-B-N系涂层，使得该刀具涂层具有硬度高、内应力低、摩擦系数低和与刀具基体结合强度高等特点，不仅使得涂层刀具在切削加工钛合金和高温合金过程中表现出明显的抗粘结性能，而且还能够有效抑制在切削钛合金和高温合金过程中的刀具粘结磨损和刀具破损；
由于在制备涂层的工艺过程当中，采用平面Me-B靶磁控溅射所沉积的Me-B-N涂层，并且精确的控制了纯N 2和高纯Ar的流量比值,溅射靶平均功率密度为5.5～16.5W/cm 2，占空比为2％～5％，因此使得制备出来的Me-B-N涂层抗粘结性能强、均匀性好、内应力低、摩擦系数低，在钛合金和高温合金的切削加工中，能有效提高刀具的使用寿命和工件加工表面质量。
最后应当说明的是，以上实施例仅用以说明本发明的技术方案，而非对本发明保护范围的限制，尽管参照较佳实施例对本发明作了详细地说明，本领域的普通技术人员应当理解，可以对本发明的技术方案进行修改或者等同替换，而不脱离本发明技术方案的实质和范围。

Claims (12)

  1. 一种钛合金和高温合金加工用的涂层刀具，其特征在于：所述涂层刀具的涂层为Me-B-N涂层。
  2. 如权利要求1所述的一种钛合金和高温合金加工用的涂层刀具，其特征在于：所述Me-B-N涂层为Me1-B-N,其中Me1为过渡族金属元素Hf、V、Nb、Ta、Mo中的一种或者多种元素,各元素原子百分比为：Me1 8～40％，B 15～60％，N 10～65％，所述Me-B-N涂层包括有Me1Nx相和BN相。
  3. 如权利要求1所述的一种钛合金和高温合金加工用的涂层刀具，其特征在于：所述Me-B-N涂层为Me1-Me2-B-N,其中Me1为过渡族金属元素Hf、V、Nb、Ta、Mo中的一种或者多种元素,Me2为过渡族金属元素Ti、Zr、Cr、W中的一种或者多种元素,各元素原子百分比为：Me1 4～36％，Me2 4～36％，B 15～60％，N 10～65％，所述Me-B-N涂层包括有Me1Nx相、Me2Nx相和BN相。
  4. 如权利要求1-3中任意一项所述的一种钛合金和高温合金加工用的涂层刀具，其特征在于：所述Me-B-N涂层的厚度为0.3～5μm。
  5. 如权利要求4所述的一种钛合金和高温合金加工用的涂层刀具的制备方法，其特征在于：包括以下步骤：
    沉积Me-B-N系涂层步骤：向腔室内连续通入高纯N 2和高纯Ar，同时保持腔室内加热器温度恒定，基体加负偏压，采用磁控溅射技术或电弧等离子体技术，沉积具有一定厚度的Me-B-N系涂层；
    所述高纯N 2和高纯Ar的流量比值为0.06～0.25，腔室气压控制在0.4～4Pa，同时保持腔室内加热器温度为300～600℃；
    所述靶材采用Me-B靶，放置基体的行星架接电源负极，行星架转速为3r/min，负偏压为-50～-300V，所述镀膜的时间为60～300min。
  6. 如权利要求5所述的一种钛合金和高温合金加工用的Me-B-N涂层刀具的制备方法，其特征在于：所述沉积Me-B-N系涂层步骤前，需进行以下步骤：
    基体预处理步骤：将刀具在无水乙醇中超声清洗，热风吹干后装夹在可三维旋转的行星架上，送入腔室；
    腔室抽真空步骤：先通过机械泵和分子泵抽真空，接着利用红外加热管加热，充分去除腔室和基体表面易挥发杂质；
    离子刻蚀步骤：向腔室内连续通入高纯Ar，同时保持腔室内加热器温度恒定，基体加负偏压，对基体进行离子刻蚀，去除刀具表面的氧化皮和疏松层。
  7. 如权利要求6所述的一种钛合金和高温合金加工用的Me-B-N涂层刀具的制备方法，其特征在于：基体预处理步骤中，所述超声清洗是将刀具基体用无水乙醇超声清洗10～20min。
  8. 如权利要求6所述的一种钛合金和高温合金加工用的Me-B-N涂层刀具的制备方法，其特征在于：腔室抽真空步骤中，先通过机械泵和分子泵抽真空至4×10 -5mbar以下，接着红外加热管设置温度为600℃加热30min，待腔室真空度至4×10 -5mbar以下后，红外加热管设置温度为550℃加热30min，最终抽腔室真空至4×10 -5mbar以下，充分去除腔室和基体表面易挥发杂质。
  9. 如权利要求6所述的一种钛合金和高温合金加工用的Me-B-N涂层刀具的制备方法，其特征在于：离子刻蚀步骤中，所述红外加热管加热温度为300～600℃，腔室气压为1.0Pa；阴极电弧采用圆形Cr靶，纯度99％以上，靶电流70～100A。
  10. 如权利要求5所述的一种钛合金和高温合金加工用的Me-B-N涂层刀具的制备方法，其特征在于：离子刻蚀步骤中，放置基体的行星架接双级脉冲电源，行星架转速为3r/min，负偏压为-300V，正偏压为+20V，频率20kHz，占空比80％，所述离子刻蚀时间为20～40min。
  11. 如权利要求6中任意所述的一种钛合金和高温合金加工用的Me-B-N涂层刀具的制备方法，其特征在于：所述沉积Me-B-N系涂层步骤后，需进行以下步骤：
    冷却取样步骤：镀膜结束后，开启炉体循环冷却系统，待腔室在真空状态下冷却后即可打开腔室，取出工件。
  12. 如权利要求11所述的一种钛合金和高温合金加工用的Me-B-N涂层刀具的制备方法，其特征在于：冷却取样步骤中，所述冷却系统中冷却水温度设定15～20℃，待腔室在真空状态下缓慢冷却至70℃以下，即可取出工件。
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