WO2021059469A1 - Dispositif de génération de plasma et procédé de traitement par plasma - Google Patents

Dispositif de génération de plasma et procédé de traitement par plasma Download PDF

Info

Publication number
WO2021059469A1
WO2021059469A1 PCT/JP2019/038099 JP2019038099W WO2021059469A1 WO 2021059469 A1 WO2021059469 A1 WO 2021059469A1 JP 2019038099 W JP2019038099 W JP 2019038099W WO 2021059469 A1 WO2021059469 A1 WO 2021059469A1
Authority
WO
WIPO (PCT)
Prior art keywords
plasma
nozzle
gas
cover
ejection port
Prior art date
Application number
PCT/JP2019/038099
Other languages
English (en)
Japanese (ja)
Inventor
俊之 池戸
卓也 岩田
聡一 白木
Original Assignee
株式会社Ｆｕｊｉ
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 株式会社Ｆｕｊｉ filed Critical 株式会社Ｆｕｊｉ
Priority to JP2021548108A priority Critical patent/JP7461961B2/ja
Priority to PCT/JP2019/038099 priority patent/WO2021059469A1/fr
Priority to CN201980100638.3A priority patent/CN114430935A/zh
Priority to EP19947409.9A priority patent/EP4037440A4/fr
Publication of WO2021059469A1 publication Critical patent/WO2021059469A1/fr

Links

Images

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H05H1/4645—Radiofrequency discharges
    • H05H1/466—Radiofrequency discharges using capacitive coupling means, e.g. electrodes
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/26—Plasma torches
    • H05H1/32—Plasma torches using an arc
    • H05H1/34—Details, e.g. electrodes, nozzles
    • H05H1/341—Arrangements for providing coaxial protecting fluids

Definitions

  • the present disclosure relates to a plasma generator or the like that ejects plasma gas.
  • Some plasma generators have a structure in which the processing gas is turned into plasma in the reaction chamber, and the turned plasma gas is ejected from a spout formed in a nozzle or the like.
  • the following patent documents describe an example of such a plasma generator.
  • An object of the present specification is to improve the practicality of a plasma generator having a structure in which plasma gas is ejected from an ejection port.
  • the present specification describes an apparatus main body in which a reaction chamber for converting a processing gas into plasma is formed, and a first ejection port for ejecting the plasma gas converted into plasma in the reaction chamber.
  • a ceramic nozzle formed with the plasma gas, and a metal nozzle cover formed so that a second ejection port for ejecting the gas so as to cover the plasma gas covers the first ejection port.
  • the plasma generator is disclosed.
  • the main body of the apparatus in which the reaction chamber for converting the processing gas into plasma is formed, and the first ejection port for ejecting the plasma gas converted into plasma in the reaction chamber are formed, and the apparatus is described.
  • a plasma generator in which the nozzle cover is composed of a ceramic cover body provided on the device body and a metal cover portion on which the second ejection port is formed and provided on the cover body.
  • the present specification is formed in a metal member in a plasma gas ejection step of ejecting plasma gas from the first ejection port toward the object to be processed and toward the plasma gas ejected from the first ejection port.
  • a plasma treatment method including a shield gas ejection step of shielding the plasma gas by ejecting the shield gas from the second ejection port is disclosed.
  • FIG. 1 It is a figure which shows the plasma apparatus. It is a perspective view which shows the plasma head. It is sectional drawing which cut the plasma head in the X direction and Z direction at the position of the electrode and the plasma passage on the main body side. It is sectional drawing in the AA line of FIG. It is a perspective view of a nozzle cover. It is a perspective view of a nozzle cover.
  • the plasma device 10 includes a plasma head 11, a robot 13, and a control box 15.
  • the plasma head 11 is attached to the robot 13.
  • the robot 13 is, for example, a serial link type robot (also called an articulated robot).
  • the plasma head 11 can irradiate plasma gas while being held at the tip of the robot 13.
  • the plasma head 11 can move three-dimensionally according to the drive of the robot 13.
  • the control box 15 is mainly composed of a computer and controls the plasma device 10 in an integrated manner.
  • the control box 15 has a power supply unit 15A for supplying electric power to the plasma head 11 and a gas supply unit 15B for supplying gas to the plasma head 11.
  • the power supply unit 15A is connected to the plasma head 11 via a power cable (not shown).
  • the power supply unit 15A changes the voltage applied to the electrodes 33 (see FIGS. 3 and 4) of the plasma head 11 based on the control of the control box 15.
  • the gas supply unit 15B is connected to the plasma head 11 via a plurality of (four in this embodiment) gas tubes 19.
  • the gas supply unit 15B supplies the reaction gas, the carrier gas, and the heat gas, which will be described later, to the plasma head 11 based on the control of the control box 15.
  • the control box 15 controls the gas supply unit 15B, and controls the amount of gas supplied from the gas supply unit 15B to the plasma head 11.
  • the robot 13 operates under the control of the control box 15 and irradiates the object W placed on the table 17 with plasma gas from the plasma head 11.
  • control box 15 includes an operation unit 15C having a touch panel and various switches.
  • the control box 15 displays various setting screens, operating states (for example, gas supply state, etc.) and the like on the touch panel of the operation unit 15C. Further, the control box 15 receives various information by inputting an operation to the operation unit 15C.
  • the plasma head 11 includes a plasma generation unit 21, a heat gas supply unit 23, and the like.
  • the plasma generation unit 21 generates plasma gas by converting the processing gas supplied from the gas supply unit 15B (see FIG. 1) of the control box 15 into plasma.
  • the heat gas supply unit 23 heats the gas supplied from the gas supply unit 15B to generate heat gas.
  • the plasma head 11 of the present embodiment ejects the plasma gas generated by the plasma generation unit 21 together with the heat gas generated by the heat gas supply unit 23 to the object W to be processed shown in FIG.
  • the processing gas is supplied to the plasma head 11 from the upstream side to the downstream side in the direction of the arrow shown in FIG.
  • the plasma head 11 may not be provided with the heat gas supply unit 23. That is, the plasma apparatus of the present disclosure may have a configuration that does not use heat gas.
  • the plasma generation unit 21 includes a head body unit 31, a pair of electrodes 33, a plasma irradiation unit 35, and the like.
  • 3 is a cross-sectional view taken along the positions of the pair of electrodes 33 and a plurality of plasma passages 71 on the main body side, which will be described later
  • FIG. 4 is a cross-sectional view taken along the line AA of FIG.
  • the head main body 31 is formed of a ceramic having high heat resistance, and a reaction chamber 37 for generating plasma gas is formed inside the head main body 31.
  • Each of the pair of electrodes 33 has, for example, a cylindrical shape, and is fixed in a state where its tip is projected into the reaction chamber 37.
  • the pair of electrodes 33 may be simply referred to as electrodes 33.
  • the direction in which the pair of electrodes 33 are arranged is referred to as the X direction
  • the direction in which the plasma generation unit 21 and the heat gas supply unit 23 are arranged is referred to as the Y direction
  • the axial direction of the cylindrical electrodes 33 is referred to as the Z direction.
  • the X direction, the Y direction, and the Z direction are directions orthogonal to each other.
  • the heat gas supply unit 23 includes a gas pipe 41, a heater 43, a connecting unit 45, and the like.
  • the gas pipe 41 and the heater 43 are attached to the outer peripheral surface of the head main body 31 and are covered with the cover 47 shown in FIG.
  • the gas pipe 41 is connected to the gas supply unit 15B of the control box 15 via the gas tube 19 (see FIG. 1). Gas (for example, air) is supplied to the gas pipe 41 from the gas supply unit 15B.
  • the heater 43 is attached in the middle of the gas pipe 41. The heater 43 heats the gas flowing through the gas pipe 41 to generate heat gas.
  • the connecting portion 45 connects the gas pipe 41 to the plasma irradiation portion 35.
  • the connecting portion 45 is connected to the gas pipe 41 at one end and to the heat gas passage 51 formed in the plasma irradiation portion 35 at the other end. .. Heat gas is supplied to the heat gas passage 51 via the gas pipe 41.
  • an electrode cover 53 made of an insulator such as ceramics.
  • the electrode cover 53 has a substantially hollow tubular shape, and openings are formed at both ends in the longitudinal direction.
  • the gap between the inner peripheral surface of the electrode cover 53 and the outer peripheral surface of the electrode 33 functions as a gas passage 55.
  • the opening on the downstream side of the electrode cover 53 is connected to the reaction chamber 37.
  • the lower end of the electrode 33 projects from the opening on the downstream side of the electrode cover 53.
  • a reaction gas flow path 61 and a pair of carrier gas flow paths 63 are formed inside the head main body 31.
  • the reaction gas flow path 61 is provided in a substantially central portion of the head main body portion 31, is connected to the gas supply unit 15B via a gas tube 19 (see FIG. 1), and reacts with the reaction gas supplied from the gas supply unit 15B. It flows into the chamber 37.
  • the pair of carrier gas flow paths 63 are arranged at positions sandwiching the reaction gas flow path 61 in the X direction. Each of the pair of carrier gas flow paths 63 is connected to the gas supply unit 15B via the gas tube 19 (see FIG. 1), and the carrier gas is supplied from the gas supply unit 15B.
  • the carrier gas flow path 63 allows the carrier gas to flow into the reaction chamber 37 through the gas passage 55.
  • Oxygen (O2) can be used as the reaction gas (seed gas).
  • the gas supply unit 15B allows, for example, a mixed gas of oxygen and nitrogen (N2) (for example, dry air (Air)) to flow between the electrodes 33 of the reaction chamber 37 via the reaction gas flow path 61.
  • this mixed gas may be referred to as a reaction gas for convenience, and oxygen may be referred to as a seed gas.
  • Nitrogen can be used as the carrier gas.
  • the gas supply unit 15B allows carrier gas to flow in from each of the gas passages 55 so as to surround each of the pair of electrodes 33.
  • AC voltage is applied to the pair of electrodes 33 from the power supply unit 15A of the control box 15.
  • a voltage for example, as shown in FIG. 4
  • a pseudo arc A is generated between the lower ends of the pair of electrodes 33 in the reaction chamber 37.
  • the reaction gas passes through the pseudo arc A, the reaction gas is turned into plasma. Therefore, the pair of electrodes 33 generate the discharge of the pseudo arc A, turn the reaction gas into plasma, and generate the plasma gas.
  • a plurality of plasmas on the main body side (six in this embodiment) formed by arranging them at intervals in the X direction and extending in the Z direction.
  • a passage 71 is formed. The upstream ends of the plurality of main body-side plasma passages 71 are connected to the reaction chamber 37.
  • the plasma irradiation unit 35 includes a nozzle 73, a nozzle cover 75, and the like.
  • the nozzle 73 is generally T-shaped when viewed from the side in the X direction, and is composed of a nozzle body 77 and a nozzle tip 79.
  • the nozzle 73 is an integral body of the nozzle body 77 and the nozzle tip 79, and is made of highly heat-resistant ceramic.
  • the nozzle body 77 generally has a flange shape, and is fixed to the lower surface of the head body 31 by bolts 80. Further, the nozzle tip 79 has a shape extending downward from the lower surface of the nozzle body 77.
  • the nozzle 73 is formed with a plurality of nozzle-side plasma passages 81 (six in this embodiment) that penetrate the nozzle body 77 and the nozzle tip 79 in the vertical direction, that is, in the Z direction.
  • the plurality of nozzle-side plasma passages 81 are arranged at intervals in the X direction.
  • the plurality of nozzle-side plasma passages 81 are formed at the same positions as the plurality of main body-side plasma passages 71 in the Z direction. Therefore, the plasma passage 71 on the main body side and the plasma passage 81 on the nozzle side communicate with each other.
  • the nozzle cover 75 generally has a T-shape when viewed from the side in the X direction, and includes a cover main body 85 and a cover tip 87.
  • the cover body 85 and the cover tip 87 are separate members, the cover body 85 is molded of ceramic, and the cover tip 87 is molded of metal, specifically stainless steel.
  • the cover main body 85 has a generally plate-shaped plate thickness, and the cover main body 85 is formed with a concave portion 89 having an opening on the upper surface and a concave shape in the Z direction.
  • the cover body 85 is fixed to the lower surface of the head body 31 by bolts 90 so that the nozzle body 77 of the nozzle 73 is housed in the recess 89.
  • the cover body 85 is formed with a heat gas passage 51 so as to extend in the Y direction, one end of the heat gas passage 51 opens into the recess 89, and the other end of the heat gas passage 51 is the cover body. It is open to the side of 85.
  • the end of the heat gas passage 51 that opens on the side surface of the cover body 85 is connected to the connecting portion 45 of the heat gas supply portion 23 described above.
  • the cover tip 87 has a plate shape similar to the thickness of the cover body 85, and is fixed to the lower surface of the cover body 85 by bolts 91 so as to extend downward from the lower surface of the cover body 85. ing.
  • One through hole 93 penetrating in the Z direction is formed in the cover tip 87, and the upper end portion of the through hole 93 communicates with the recess 89 of the cover main body 85.
  • the nozzle tip 79 of the nozzle 73 is inserted into the through hole 93.
  • the nozzle 73 is entirely covered by the nozzle cover 75.
  • the lower end of the nozzle tip 79 of the nozzle 73 and the lower end of the cover tip 87 of the nozzle cover 75 are located at the same height.
  • the nozzle body 77 of the nozzle 73 is located inside the recess 89 of the nozzle cover 75, and the nozzle tip 79 of the nozzle 73 is inside the through hole 93 of the nozzle cover 75. Is located.
  • the plasma gas generated in the reaction chamber 37 flows through the main body side plasma passage 71 and the nozzle side plasma passage 81 together with the carrier gas, and is ejected from the opening 81A at the lower end of the nozzle side plasma passage 81.
  • the heat gas supplied from the gas pipe 41 to the heat gas passage 51 flows through the heat gas output passage 95.
  • This heat gas functions as a shield gas that protects the plasma gas.
  • the heat gas flows through the heat gas output passage 95 and is ejected from the opening 95A at the lower end of the heat gas output passage 95 along the plasma gas ejection direction. At this time, the heat gas is ejected so as to surround the plasma gas ejected from the opening 81A of the nozzle-side plasma passage 81.
  • the plasma device 10 is an example of a plasma generator.
  • the heat gas supply unit 23 is an example of an ejection device.
  • the head main body 31 is an example of the device main body.
  • the reaction chamber 37 is an example of the reaction chamber.
  • the nozzle 73 is an example of a nozzle.
  • the nozzle cover 75 is an example of a nozzle cover.
  • the nozzle body 77 is an example of a nozzle body.
  • the nozzle tip 79 is an example of the nozzle tip.
  • the opening 81A of the nozzle-side plasma passage 81 is an example of the first ejection port.
  • the cover body 85 is an example of the cover body.
  • the cover tip 87 is an example of the cover portion.
  • the opening 95A of the heat gas output passage 95 is an example of the second ejection port.
  • the heat gas is an example of a seal gas.
  • the ceramic nozzle 73 is covered with a nozzle cover 75 having a metal cover tip 87.
  • the cover tip 87 which is the tip of the nozzle cover 75, is molded of metal and is not easily damaged. Therefore, even if the tip of the plasma head 11 comes into contact with the object W or the like during plasma irradiation by the plasma head 11, the nozzle 73 is protected by the metal nozzle cover 75, so that the nozzle 73 Damage is prevented.
  • ceramics are relatively expensive, while metals are inexpensive. Therefore, even if the cover tip 87 is damaged or deformed, the cover tip 87 can be replaced at a low cost.
  • the nozzle cover 75 is composed of a cover main body 85 and a cover tip 87, the cover main body 85 is molded of ceramic, and the cover tip 87 is molded of stainless steel.
  • the cover main body 85 is molded of ceramic
  • the cover tip 87 is molded of stainless steel.
  • the metal cover tip 87 has a shape that extends away from the cover body 85. That is, the metal cover tip 87 has a shape extending in a direction away from the reaction chamber 37. As a result, it becomes possible to more preferably prevent the discharge outside the reaction chamber 37, and it is possible to further ensure appropriate plasma formation.
  • the nozzle tip 79 of the nozzle 73 also has a shape that extends away from the nozzle body 77, that is, downward, like the cover tip 87 of the nozzle cover 75.
  • the nozzle tip 79 extending downward is inserted inside the cover tip 87 extending downward.
  • the plasma gas ejected from the opening 81A of the nozzle tip 79 can be appropriately ejected to the outside of the nozzle cover 75.
  • heated heat gas is flowed between the nozzle 73 and the nozzle cover 75, and the heated heat gas is ejected around the plasma gas.
  • the efficacy (wetting property, etc.) of the plasma gas can be enhanced.
  • the present disclosure is not limited to the above embodiment, and can be implemented in various modes with various changes and improvements based on the knowledge of those skilled in the art.
  • heat gas is flowed between the nozzle 73 and the nozzle cover 75, but the heat gas does not have to flow. That is, the nozzle cover 75 may be arranged only as a cover for protecting the nozzle 73.
  • the plasma gas and the heat gas are ejected from one plasma head 11, but the plasma gas and the heat gas may be ejected from the two heads. That is, plasma gas may be ejected from one head, and heat gas may be ejected from a head different from that head. Further, the nozzle-side plasma passage 81 and the heat gas output passage 95 may be formed at different positions in one head, and the plasma gas and the heat gas may be ejected from the respective passages.
  • the nozzle 73 and the nozzle cover 75 are fixed to the head main body 31, but they may be simply provided. That is, the nozzle body 77 may be provided on the head body 31. Further, the nozzle tip 79 may also be provided on the nozzle body 77.
  • Plasma device plasma generator
  • 23 Heat gas supply unit (spouting device)
  • 31 Head body (device body)
  • 37 Reaction chamber
  • 73 Nozzle
  • 75 Nozzle cover
  • 77 Nozzle body
  • 79 Nozzle tip
  • 81A Opening (first spout)
  • 85 Cover body
  • 87 Cover tip (cover part)
  • 95A Opening (second spout)

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)

Abstract

La présente invention concerne un dispositif de génération de plasma comprenant : un corps de dispositif dans lequel une chambre de réaction pour générer du plasma à partir d'un gaz de traitement est formée ; une buse en céramique ayant un premier orifice d'éjection pour éjecter le gaz plasma généré dans la chambre de réaction ; et un couvercle de buse métallique formé de telle sorte qu'un second orifice d'éjection pour éjecter un gaz de façon à recouvrir le gaz plasma recouvre le premier orifice d'éjection.
PCT/JP2019/038099 2019-09-27 2019-09-27 Dispositif de génération de plasma et procédé de traitement par plasma WO2021059469A1 (fr)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2021548108A JP7461961B2 (ja) 2019-09-27 2019-09-27 プラズマ発生装置、およびプラズマ処理方法
PCT/JP2019/038099 WO2021059469A1 (fr) 2019-09-27 2019-09-27 Dispositif de génération de plasma et procédé de traitement par plasma
CN201980100638.3A CN114430935A (zh) 2019-09-27 2019-09-27 等离子体发生装置及等离子体处理方法
EP19947409.9A EP4037440A4 (fr) 2019-09-27 2019-09-27 Dispositif de génération de plasma et procédé de traitement par plasma

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2019/038099 WO2021059469A1 (fr) 2019-09-27 2019-09-27 Dispositif de génération de plasma et procédé de traitement par plasma

Publications (1)

Publication Number Publication Date
WO2021059469A1 true WO2021059469A1 (fr) 2021-04-01

Family

ID=75165628

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2019/038099 WO2021059469A1 (fr) 2019-09-27 2019-09-27 Dispositif de génération de plasma et procédé de traitement par plasma

Country Status (4)

Country Link
EP (1) EP4037440A4 (fr)
JP (1) JP7461961B2 (fr)
CN (1) CN114430935A (fr)
WO (1) WO2021059469A1 (fr)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56126981U (fr) * 1980-02-22 1981-09-26
JPS57165370U (fr) * 1981-04-09 1982-10-18
JPH05174994A (ja) * 1991-12-24 1993-07-13 Origin Electric Co Ltd プラズマア−ク装置およびパイロットア−ク発生方法
WO2015141768A1 (fr) 2014-03-19 2015-09-24 大陽日酸株式会社 Système à arc de plasma non transféré, ensemble d'adaptateur de conversion et chalumeau à plasma non transféré
WO2019180839A1 (fr) * 2018-03-20 2019-09-26 株式会社Ｆｕｊｉ Dispositif à plasma et procédé de génération de plasma

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE795891A (fr) * 1972-02-23 1973-06-18 Electricity Council Perfectionnements aux chalumeaux a plasma
US5220150A (en) * 1991-05-03 1993-06-15 Regents Of The University Of Minnesota Plasma spray torch with hot anode and gas shroud
JPH08294779A (ja) * 1995-04-21 1996-11-12 Koike Sanso Kogyo Co Ltd プラズマトーチのノズル
US7737383B2 (en) * 2006-08-25 2010-06-15 Thermal Dynamics Corporation Contoured shield orifice for a plasma arc torch
JP2008153147A (ja) * 2006-12-20 2008-07-03 Seiko Epson Corp プラズマ処理装置
JP5275092B2 (ja) * 2009-03-12 2013-08-28 長野日本無線株式会社 プラズマ処理装置
WO2018029845A1 (fr) * 2016-08-11 2018-02-15 富士機械製造株式会社 Dispositif de génération de plasma et procédé d'irradiation de plasma

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56126981U (fr) * 1980-02-22 1981-09-26
JPS57165370U (fr) * 1981-04-09 1982-10-18
JPH05174994A (ja) * 1991-12-24 1993-07-13 Origin Electric Co Ltd プラズマア−ク装置およびパイロットア−ク発生方法
WO2015141768A1 (fr) 2014-03-19 2015-09-24 大陽日酸株式会社 Système à arc de plasma non transféré, ensemble d'adaptateur de conversion et chalumeau à plasma non transféré
WO2019180839A1 (fr) * 2018-03-20 2019-09-26 株式会社Ｆｕｊｉ Dispositif à plasma et procédé de génération de plasma

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of EP4037440A4

Also Published As

Publication number Publication date
JP7461961B2 (ja) 2024-04-04
EP4037440A1 (fr) 2022-08-03
JPWO2021059469A1 (fr) 2021-04-01
EP4037440A4 (fr) 2022-11-16
CN114430935A (zh) 2022-05-03

Similar Documents

Publication Publication Date Title
US10716200B2 (en) Plasma arc cutting system, including retaining caps, and other consumables, and related operational methods
US20090107958A1 (en) Torch and Contact Tip for Gas Metal Arc Welding
CA2240219A1 (fr) Methode et appareil de soudage tig
US5109150A (en) Open-arc plasma wire spray method and apparatus
JP6890689B2 (ja) プラズマ処理機
JP2010539644A (ja) 表面処理又は表面コーティング方法及び装置
US11731216B2 (en) Device for working a surface of a workpiece by means of a laser beam and method for operating the device
JP6605598B2 (ja) プラズマ発生装置
US20140263250A1 (en) Welding diffuser with debris removal
WO2021059469A1 (fr) Dispositif de génération de plasma et procédé de traitement par plasma
US20060289391A1 (en) Arc spraying torch head
JPH031110B2 (fr)
WO2021079420A1 (fr) Dispositif de génération de plasma et procédé de traitement par plasma
WO2022149258A1 (fr) Couvercle de protection et dispositif de génération de plasma
JPH10330919A (ja) プラズマバーナ装置
JP2019050216A (ja) プラズマガス照射装置
JP6944066B2 (ja) プラズマ発生装置
JP2007190609A (ja) ナロウグルーブのシールドガス供給方法及びシールドガス供給ウェッジ
JP3564814B2 (ja) Ｔｉｇ溶接装置
WO2022123674A1 (fr) Structure fixée et dispositif de génération de plasma
WO2023127626A1 (fr) Chalumeau de soudage
WO2017037885A1 (fr) Dispositif de génération de plasma à pression atmosphérique
KR20080098234A (ko) 플라즈마 발생장치
JP7066827B2 (ja) プラズマ装置、プラズマヘッド用ダミーノズル
KR101468393B1 (ko) 플럭스가 자동 공급되는 티그 용접용 토치 및 이것을 이용한 용접방법

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 19947409

Country of ref document: EP

Kind code of ref document: A1

ENP Entry into the national phase

Ref document number: 2021548108

Country of ref document: JP

Kind code of ref document: A

NENP Non-entry into the national phase

Ref country code: DE

WWE Wipo information: entry into national phase

Ref document number: 2019947409

Country of ref document: EP

ENP Entry into the national phase

Ref document number: 2019947409

Country of ref document: EP

Effective date: 20220428