WO2021022708A1 - 彩色滤光片的制作方法及彩色滤光片 - Google Patents

彩色滤光片的制作方法及彩色滤光片 Download PDF

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Publication number
WO2021022708A1
WO2021022708A1 PCT/CN2019/117579 CN2019117579W WO2021022708A1 WO 2021022708 A1 WO2021022708 A1 WO 2021022708A1 CN 2019117579 W CN2019117579 W CN 2019117579W WO 2021022708 A1 WO2021022708 A1 WO 2021022708A1
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Prior art keywords
color
resist
barrier layer
resistance
inorganic barrier
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PCT/CN2019/117579
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English (en)
French (fr)
Inventor
马远洋
周淼
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Tcl华星光电技术有限公司
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Priority to US16/623,783 priority Critical patent/US11346986B2/en
Publication of WO2021022708A1 publication Critical patent/WO2021022708A1/zh

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/201—Filters in the form of arrays
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B1/00—Cleaning by methods involving the use of tools
    • B08B1/10—Cleaning by methods involving the use of tools characterised by the type of cleaning tool
    • B08B1/12—Brushes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B1/00—Cleaning by methods involving the use of tools
    • B08B1/30—Cleaning by methods involving the use of tools by movement of cleaning members over a surface
    • B08B1/32—Cleaning by methods involving the use of tools by movement of cleaning members over a surface using rotary cleaning members
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B13/00—Accessories or details of general applicability for machines or apparatus for cleaning
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/207—Filters comprising semiconducting materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0035—Multiple processes, e.g. applying a further resist layer on an already in a previously step, processed pattern or textured surface

Definitions

  • the present invention relates to the field of display technology, in particular to a manufacturing method of a color filter and a color filter.
  • liquid crystal displays Liquid Crystal Display, LCD
  • organic light-emitting diode displays Organic Light Emitting Display, OLED
  • other flat display devices are widely used in mobile phones, TVs, personal digital assistants, digital cameras, notebook computers, desktop computers because of their high image quality, power saving, thin body and wide application range.
  • Various consumer electronic products have become the mainstream of display devices. .
  • Color Filter is an important component for providing color in liquid crystal displays and white light OLED display devices.
  • the color layer of a common color filter mainly includes red, green, and blue parts, and the target color of the display is achieved through the combination of red, green, and blue pixel light-emitting areas of different brightness.
  • Such patterned red, green and blue pixels are usually manufactured using color resists.
  • the common manufacturing process is to coat the color resist on a transparent base substrate, and after pre-baking, use an ultraviolet lamp and a patterned mask for exposure to cure the color resist to form a color film layer. After a developing process, a pattern is formed, and finally the color resist film layer is further cured by post-baking.
  • the above-mentioned color resist materials mainly include pigments, monomers, alkali-soluble resins (Polymer), initiators, additives, solvents, etc., to form a patterned film
  • the main reaction principle of the layer is that the photoinitiator is activated when the part exposed to ultraviolet light is received, and the monomer is cross-linked and polymerized to cure the color resist; in the development stage, the alkaline developer can dissolve the uncured color resist to form Pattern; Finally, the resin is further thermally cured in the post-baking stage, making the entire film layer more resistant.
  • the main component that provides color in color resist is pigments.
  • Pigments are mainly pigment molecular aggregates with unique chemical structures. They are insoluble in themselves and are generally dispersed in specific organic solvents in the form of small particles.
  • the transmittance of pigment-based color filters is generally low, which means that the backlight needs strong brightness, which inevitably increases the energy consumption of the display device.
  • small pigment particles will inevitably cause a small amount of light scattering, leading to an increase in the dark state transmittance of the display device, and a decrease in contrast.
  • a solution in the industry is to mix a part of the dye (Dye) into the pigment to produce a hybrid (Hybrid) color resist. Dyes are soluble pigment molecules.
  • the purpose of the present invention is to provide a method for manufacturing a color filter, which can avoid diffusion pollution between color resists of different colors and ensure the display effect.
  • the object of the present invention is also to provide a color filter, which can avoid diffusion pollution between color resists of different colors and ensure the display effect.
  • the present invention provides a manufacturing method of a color filter, which includes the steps of manufacturing a color resist layer on a substrate and manufacturing an inorganic barrier layer;
  • the step of making the color resist layer includes the steps of sequentially forming a first color resist, a second color resist, and a third color resist.
  • the first, second, and third color resists are along the surface of the substrate. The direction is repeated in sequence;
  • the step of manufacturing the inorganic barrier layer includes the step of forming a first inorganic barrier layer covering the first color barrier after the first color barrier is formed and before the second color barrier is formed.
  • the manufacturing method of the color filter includes the following steps:
  • a third color resist is formed on the first inorganic barrier layer through a third patterning process.
  • the step of manufacturing the inorganic barrier layer further includes the step of forming a second inorganic barrier layer covering the second color barrier after the second color barrier is formed and before the third color barrier is formed.
  • the manufacturing method of the color filter includes the following steps:
  • a third color resist is formed on the second inorganic barrier layer through a third patterning process.
  • the material of the color resist layer is a mixed color resist material including pigments and dyes, and the material of the inorganic resist layer is silicon nitride;
  • the first color resistance is one of red color resistance, green color resistance and blue color resistance
  • the second color resistance is another one of red color resistance, green color resistance, and blue color resistance that is different from the first color resistance;
  • the third color resistance is one of the red color resistance, the green color resistance and the blue color resistance which is different from the first color resistance and the second color resistance.
  • the invention also provides a color filter, which includes a substrate, a color resist layer and an inorganic resist layer;
  • the color resist layer includes a first color resist, a second color resist, and a third color resist that are sequentially and repeatedly arranged along the direction of the substrate surface;
  • the inorganic barrier layer includes a first inorganic barrier layer covering a first color barrier, and the first inorganic barrier layer separates the first color barrier from the second color barrier and the third color barrier.
  • the color filter includes a substrate, a first color resist provided on the substrate, a first inorganic barrier layer covering the first color resist and the substrate, and a first inorganic barrier layer provided on the first inorganic barrier layer The second color resistance and the third color resistance provided on the first inorganic barrier layer.
  • the inorganic barrier layer further includes a second inorganic barrier layer covering the second color barrier, and the second inorganic barrier layer separates the second color barrier from the third color barrier.
  • the color filter includes a substrate, a first color resist provided on the substrate, a first inorganic barrier layer covering the first color resist and the substrate, and a first inorganic barrier layer provided on the first inorganic barrier layer A second color resist, a second inorganic resist layer covering the first inorganic resist layer and the second color resist, and a third color resist arranged on the second inorganic resist layer.
  • the material of the color resist layer is a mixed color resist material including pigments and dyes, and the material of the inorganic resist layer is silicon nitride;
  • the first color resistance is one of red color resistance, green color resistance and blue color resistance
  • the second color resistance is another one of red color resistance, green color resistance, and blue color resistance that is different from the first color resistance;
  • the third color resistance is one of the red color resistance, the green color resistance and the blue color resistance which is different from the first color resistance and the second color resistance.
  • the present invention provides a method for manufacturing a color filter, which includes the steps of fabricating a color resist layer on a substrate and fabricating an inorganic barrier layer; wherein, the step of fabricating the color resist layer includes: The steps of color resistance, second color resistance, and third color resistance, the first color resistance, second color resistance, and third color resistance are sequentially and repeatedly arranged along the direction of the substrate surface; the step of making an inorganic barrier layer includes: The step of forming a first inorganic barrier layer covering the first color resist after the formation of the first color resist and before forming the second color resist.
  • the invention also provides a color filter, which can avoid diffusion pollution between color resists of different colors and ensure the display effect.
  • FIG. 1 is a flowchart of the first embodiment of the manufacturing method of the color filter of the present invention
  • FIGS. 2 to 5 are schematic diagrams of specific steps of the first embodiment of the manufacturing method of the color filter of the present invention.
  • FIG. 6 is a flowchart of the second embodiment of the manufacturing method of the color filter of the present invention.
  • the first embodiment of the present invention provides a method for manufacturing a color filter, including the steps of fabricating a color resist layer 2 and fabricating an inorganic barrier layer 3 on a substrate 1;
  • the step of making the color resist layer 2 includes the steps of sequentially forming a first color resist 20, a second color resist 30, and a third color resist 40.
  • the first color resist 20, the second color resist 30 and the third color resist The resistors 40 are sequentially and repeatedly arranged along the direction of the surface of the substrate 1;
  • the step of manufacturing the inorganic barrier layer 3 includes the step of forming a first inorganic barrier layer 50 covering the first color resistor 20 after the first color resistor 20 is formed and before the second color resistor 30 is formed.
  • the material of the color resist layer 2 is a mixed color resist material including dyes and pigments, and the colors of the first color resist 20, the second color resist 30, and the third color resist 40 are different. Due to the small molecule characteristics of the dye, the first color resist 20, the second color resist 30, and the third color resist 40 may have a migration problem during the production process, that is, the color resists of different colors will have mutual diffusion pollution.
  • the material of the inorganic barrier layer 3 is preferably silicon nitride (SiNx), so that the inorganic barrier layer has high density, good insulation and excellent light transmittance, and is effective in separating phases. Adjacent color blocking prevents color migration while effectively reducing the impact on light transmittance.
  • the color resist that has color migration problems is the first color resist 20.
  • the red color resist has color migration problems
  • the first color resist 20 is the red color resist
  • the second color resist 30 and The third color resist 40 is the green color resist and the blue color resist or the blue color resist and the green color resist respectively.
  • the green color resist has a problem of color migration
  • the first color resist 20 is the green color resist
  • the second color resist The color resistance 30 and the third color resistance 40 are red color resistance and blue color resistance respectively or blue color resistance and red color resistance respectively.
  • the blue color resistance has a problem of dye migration
  • the first color resistance 20 is the blue color resistance.
  • the second color resist 30 and the third color resist 40 are respectively a green color resist and a blue color resist or are respectively a blue color resist and a green color resist.
  • the manufacturing method of the color filter specifically includes the following steps:
  • a substrate 1 is provided, and a first color resist 20 is formed on the substrate 1 through a first patterning process;
  • a first inorganic barrier layer 50 covering the first color resist 20 and the substrate 1 is formed;
  • a second color resist 30 is formed on the first inorganic barrier layer 50 through a second patterning process
  • a third color resist 40 is formed on the first inorganic barrier layer 50 through a third patterning process.
  • the first inorganic barrier layer 50 is formed by chemical vapor deposition (CVD) deposition.
  • CVD chemical vapor deposition
  • each patterning process includes coating color resist materials of corresponding colors, exposing the color resist materials with a photomask, developing the exposed color resist materials to form patterns, and finally applying the color resist materials Baking is performed to obtain the first color resist 20, the second color resist 30 or the third color resist 40.
  • a second embodiment of the present invention provides a method for manufacturing a color filter, including the steps of fabricating a color resist layer 2 and an inorganic barrier layer 3 on a substrate 1;
  • the step of making the color resist layer 2 includes the steps of sequentially forming a first color resist 20, a second color resist 30, and a third color resist 40.
  • the first color resist 20, the second color resist 30 and the third color resist The resistors 40 are sequentially and repeatedly arranged along the direction of the surface of the substrate 1;
  • the step of fabricating the inorganic barrier layer 3 includes: forming the first inorganic barrier layer 50 covering the first color resistor 20 after the first color resistor 20 is formed and before the second color resistor 30 is formed; The step of forming a second inorganic barrier layer 60 covering the second color resistor 30 before forming the three color resistors 40.
  • the material of the color resist layer 2 is a mixed color resist material including dyes and pigments, and the colors of the first color resist 20, the second color resist 30, and the third color resist 40 are different. Due to the small molecule characteristics of the dye, the first color resist 20, the second color resist 30, and the third color resist 40 may have a migration problem during the production process, that is, the color resists of different colors will have mutual diffusion pollution.
  • the material of the inorganic barrier layer 3 is preferably silicon nitride, so that the inorganic barrier layer has high compactness, good insulation and excellent light transmittance, which can effectively separate adjacent color barriers. While preventing color migration, it effectively reduces the impact on light transmittance.
  • the manufacturing method of the color filter of the present invention preferentially manufactures color resists that may have color migration problems, which corresponds to the first embodiment of the present invention.
  • the color resists that have dye migration problems are the first color resist 20 and the second color resist 30.
  • the first color resist 20 and the second color resist The color resistance 30 is red color resistance and green color resistance or green color resistance and red color resistance respectively, and the third color resistance 40 is blue color resistance; when the red color resistance and blue color resistance have color migration problems, the first Color resistance 20 and second color resistance 30 are red color resistance and blue color resistance respectively or blue color resistance and red color resistance respectively, and third color resistance 40 is green color resistance; when green color resistance and blue color resistance appear shifted In the case of sexual problems, the first color resist 20 and the second color resist 30 are respectively green color resist and blue color resist or blue color resist and green color resist respectively, and the third color resist 40 is red color resist.
  • the manufacturing method of the color filter specifically includes the following steps:
  • a substrate 1 is provided, and a first color resist 20 is formed on the substrate 1 through a first patterning process;
  • FIG. 8 Please refer to FIG. 8 to form a first inorganic barrier layer 50 covering the first color resist 20 and the substrate 1;
  • a second color resist 30 is formed on the first inorganic barrier layer 50 through a second patterning process
  • a third color resist 40 is formed on the second inorganic barrier layer 60 through a third patterning process.
  • the first inorganic barrier layer 50 and the second inorganic barrier layer 60 are formed by chemical vapor deposition (CVD) deposition.
  • CVD chemical vapor deposition
  • each patterning process includes coating color resist materials of corresponding colors, exposing the color resist materials with a photomask, developing the exposed color resist materials to form patterns, and finally applying the color resist materials Baking is performed to obtain the first color resist 20, the second color resist 30 or the third color resist 40.
  • the present invention also has a color filter, including a substrate 1, a color resist layer 2 and an inorganic barrier layer 3;
  • the color resist layer 2 includes a first color resist 20, a second color resist 30, and a third color resist 40 that are sequentially and repeatedly arranged along the surface of the substrate 1;
  • the inorganic barrier layer 3 includes a first inorganic barrier layer 50 covering the first color barrier 20, and the first inorganic barrier layer 50 separates the first color barrier 20 from the second color barrier 30 and the third color barrier. 40 separated.
  • the material of the color resist layer 2 is a mixed color resist material including dyes and pigments, and the colors of the first color resist 20, the second color resist 30, and the third color resist 40 are different. Due to the small molecule characteristics of the dye, the first color resist 20, the second color resist 30, and the third color resist 40 may have a migration problem during the production process, that is, the color resists of different colors will have mutual diffusion pollution.
  • the material of the inorganic barrier layer 3 is preferably silicon nitride (SiNx), so that the inorganic barrier layer has high density, good insulation and excellent light transmittance, and is effective in separating phases. Adjacent color blocking prevents color migration while effectively reducing the impact on light transmittance.
  • the color resist that has the problem of dye migration is the first color resist 20.
  • the first color resist 20 is the red color resist
  • the color resistance 30 and the third color resistance 40 are green color resistance and blue color resistance respectively or blue color resistance and green color resistance respectively.
  • the first color resistance 20 is the green color resistance.
  • the second color resist 30 and the third color resist 40 are red color resist and blue color resist respectively or blue color resist and red color resist respectively.
  • the blue color resist has dye migration problem
  • the first color resist 20 is The blue color resistance, the second color resistance 30 and the third color resistance 40 are respectively green color resistance and blue color resistance or respectively blue color resistance and green color resistance.
  • the color filter described in this first embodiment includes a substrate 1, a first color resist provided on the substrate 1 20.
  • the first inorganic barrier layer 50 covering the first color resist 20 and the substrate 1, the second color resist 30 provided on the first inorganic barrier layer 50, and the second color resist 30 provided on the first inorganic barrier layer 50
  • the third color resistance 40 is a color resistance 40.
  • a color filter of the present invention including a substrate 1, a color resist layer 2 and an inorganic barrier layer 3;
  • the color resist layer 2 includes a first color resist 20, a second color resist 30, and a third color resist 40 that are sequentially and repeatedly arranged along the surface of the substrate 1;
  • the inorganic barrier layer 3 includes a first inorganic barrier layer 50 covering the first color resist 20 and a second inorganic barrier layer 60 covering the second color resist 30.
  • the first inorganic barrier layer 50 connects the first The color resist 20 is separated from the second color resist 30 and the third color resist 40, and the second inorganic barrier layer 60 separates the second color resist 30 and the third color resist 40
  • the material of the color resist layer 2 is a mixed color resist material including dyes and pigments, and the colors of the first color resist 20, the second color resist 30, and the third color resist 40 are different. Due to the small molecule characteristics of the dye, the first color resist 20, the second color resist 30, and the third color resist 40 may have a migration problem during the production process, that is, the color resists of different colors will have mutual diffusion pollution.
  • the material of the inorganic barrier layer 3 is preferably silicon nitride, so that the inorganic barrier layer has high compactness, good insulation and excellent light transmittance, which can effectively separate adjacent color barriers. While preventing color migration, it effectively reduces the impact on light transmittance.
  • the color resists that have color migration problems are the first color resist 20 and the second color resist 30.
  • the first color resist Resist 20 and second color resistance 30 are red color resistance and green color resistance or green color resistance and red color resistance respectively, and third color resistance 40 is blue color resistance; when red color resistance and blue color resistance appear color shift
  • the first color resistance 20 and the second color resistance 30 are red color resistance and blue color resistance or blue color resistance and red color resistance respectively, and the third color resistance 40 is green color resistance;
  • the first color resistance 20 and the second color resistance 30 are respectively green color resistance and blue color resistance or blue color resistance and green color resistance respectively
  • the third color resistance 40 is red color resistance.
  • the color filter described in the second embodiment of the present invention includes a substrate 1, a first color resist 20 provided on the substrate 1, and covering the first color
  • the present invention provides a color filter manufacturing method, which includes the steps of manufacturing a color resist layer and manufacturing an inorganic barrier layer; wherein, the step of manufacturing the color resist layer includes: sequentially forming a first color resist and a second color resist. The step of color resist and the third color resist, the first color resist, the second color resist and the third color resist are repeatedly arranged in sequence; the step of making the inorganic barrier layer includes: forming the second color resist after the first color resist is formed In the previous step of forming the first inorganic barrier layer covering the first color resistor, by arranging the inorganic barrier layer to separate different color resistors, diffusion pollution between different color resistors can be avoided, and the display effect can be ensured.
  • the invention also provides a color filter, which can avoid diffusion pollution between different color resists and ensure the display effect.
  • the invention also provides a color filter, which can avoid diffusion pollution between different color resists and ensure the display effect.

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  • Optics & Photonics (AREA)
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Abstract

一种彩色滤光片的制作方法，包括在衬底（1）上制作色阻层（2）及制作无机阻挡层（3）的步骤，其中，制作色阻层（2）的步骤包括：依次形成第一色阻（20）、第二色阻（30）及第三色阻（40）的步骤，第一色阻（20）、第二色阻（30）及第三色阻（40）沿衬底（1）表面的方向依次重复排列；制作无机阻挡层（3）的步骤包括：在第一色阻（20）形成之后第二色阻（30）形成之前形成覆盖第一色阻（20）的第一无机阻挡层（50）的步骤。还公开了一种彩色滤光片。通过设置无机阻挡层分隔不同色阻，能够避免不同色阻之间的扩散污染，保证显示效果。

Description

彩色滤光片的制作方法及彩色滤光片 技术领域
本发明涉及显示技术领域，尤其涉及一种彩色滤光片的制作方法及彩色滤光片。
 背景技术
随着显示技术的发展，液晶显示器（Liquid Crystal Display，LCD）和有机发光二极管显示器（Organic Light Emitting Display，OLED）等平面显示装置因具有高画质、省电、机身薄及应用范围广等优点，而被广泛的应用于手机、电视、个人数字助理、数字相机、笔记本电脑、台式计算机等各种消费性电子产品，成为显示装置中的主流。。
彩色滤光片（Color Filter，CF）是液晶显示器与白光OLED显示器件中提供色彩的重要部件。常见彩色滤光片的色彩层主要包括红色、绿色、蓝色部分，通过不同亮度红绿蓝像素发光区域组合达到显示的目标色彩。这种图案化的红绿蓝像素通常使用彩色色阻进行制造。其制造的常见流程是将彩色色阻涂覆在透明的衬底基板上，经过预烘烤后以紫外线灯配合图案化光罩进行曝光，使彩色色阻固化形成彩色膜层。再经过显影制程后形成图案，最后通过后烘烤使得彩色色阻膜层进一步固化。
一般来说，上述的彩色色阻的材料主要包含有颜料(Pigment)、单体(Monomer)、碱可溶性树脂(Polymer)、光起始剂(Initiator)、添加剂和溶剂等，形成图案化的膜层主要反应原理为，接受紫外光曝光部分，光起始剂被激活，引发单体发生交联聚合反应使彩色色阻固化；显影阶段，碱性显影液可以溶解未固化的色阻，从而形成图案；最后，后烘烤阶段树脂进一步发生热固化，使得整个膜层有更好的耐性。
彩色色阻中提供色彩的主要成分为颜料，颜料主要为拥有特有化学构造的色素分子集合体，其本身不可溶，一般以小颗粒形式分散在特定的有机溶剂中。基于颜料的彩色滤光片，其透过率普遍较低，这就意味着背光需要较强的亮度，不可避免地提升显示器件能耗。同时，颜料小颗粒会不可避免地造成一小部分光散射，导致显示器件暗态透过率上升，使得对比度下降。目前，业界的一种解决办法是，在颜料中掺入一部分染料（Dye）制作成混合（Hybrid）彩色色阻。染料为可溶的色素分子，通过掺入一部分染料可以减少光散射从而提升彩色滤光片的透过率和对比度。但也因为染料为小分子，在彩色滤光片制造过程中容易出现一些问题，最常见的就是染料析出导致“浮色”，即因彩色滤光片制造工艺中的热制程而通过分子热运动扩散污染接邻膜层或像素。
 技术问题
本发明的目的在于提供一种彩色滤光片的制作方法，能够避免不同颜色的色阻之间的扩散污染，保证显示效果。
本发明的目的还在于提供一种彩色滤光片，能够避免不同颜色的色阻之间的扩散污染，保证显示效果。
 技术解决方案
为实现上述目的，本发明提供一种彩色滤光片的制作方法，包括在衬底上制作色阻层及制作无机阻挡层的步骤；
其中，制作色阻层的步骤包括：依次形成第一色阻、第二色阻及第三色阻的步骤，所述第一色阻、第二色阻及第三色阻沿衬底表面的方向依次重复排列；
制作无机阻挡层的步骤包括：在第一色阻形成之后第二色阻形成之前形成覆盖第一色阻的第一无机阻挡层的步骤。
所述彩色滤光片的制作方法，包括如下步骤：
提供衬底，在所述衬底上通过第一道图案化制程形成第一色阻；
形成覆盖所述第一色阻及衬底的第一无机阻挡层；
在所述第一无机阻挡层上通过第二道图案化制程形成第二色阻；
在所述第一无机阻挡层上通过第三道图案化制程形成第三色阻。
制作无机阻挡层的步骤还包括：在第二色阻形成之后第三色阻形成之前形成覆盖所述第二色阻的第二无机阻挡层的步骤。
所述彩色滤光片的制作方法，包括如下步骤：
提供衬底，在所述衬底上通过第一道图案化制程形成第一色阻；
形成覆盖所述第一色阻及衬底的第一无机阻挡层；
在所述第一无机阻挡层上通过第二道图案化制程形成第二色阻；
形成覆盖所述第二色阻及第一无机阻挡层的第二无机阻挡层；
在所述第二无机阻挡层上通过第三道图案化制程形成第三色阻。
所述色阻层的材料为包括颜料和染料的混合色阻材料，所述无机阻挡层的材料为氮化硅；
所述第一色阻为红色色阻、绿色色阻及蓝色色阻中的一种；
所述第二色阻为红色色阻、绿色色阻及蓝色色阻中不同于第一色阻的另一种；
所述第三色阻为红色色阻、绿色色阻及蓝色色阻中不同于第一色阻和第二色阻的一种。
本发明还提供一种彩色滤光片，包括衬底、色阻层及无机阻挡层；
所述色阻层包括沿衬底表面的方向依次重复排列的第一色阻、第二色阻及第三色阻；
所述无机阻挡层包括覆盖第一色阻的第一无机阻挡层，所述第一无机阻挡层将所述第一色阻与所述第二色阻和第三色阻分隔开。
所述彩色滤光片包括衬底、设于所述衬底上的第一色阻、覆盖所述第一色阻及衬底的第一无机阻挡层、设于所述第一无机阻挡层上的第二色阻以及设于第一无机阻挡层上的第三色阻。
所述无机阻挡层还包括覆盖所述第二色阻的第二无机阻挡层，所述第二无机阻挡层将所述第二色阻与第三色阻分隔开。
所述彩色滤光片包括衬底、设于所述衬底上的第一色阻、覆盖所述第一色阻及衬底的第一无机阻挡层、设于所述第一无机阻挡层上的第二色阻、覆盖第一无机阻挡层及第二色阻的第二无机阻挡层以及设于第二无机阻挡层上的第三色阻。
所述色阻层的材料为包括颜料和染料的混合色阻材料，所述无机阻挡层的材料为氮化硅；
所述第一色阻为红色色阻、绿色色阻及蓝色色阻中的一种；
所述第二色阻为红色色阻、绿色色阻及蓝色色阻中不同于第一色阻的另一种；
所述第三色阻为红色色阻、绿色色阻及蓝色色阻中不同于第一色阻和第二色阻的一种。
 有益效果
本发明的有益效果：本发明提供一种彩色滤光片的制作方法，包括在衬底上制作色阻层及制作无机阻挡层的步骤；其中，制作色阻层的步骤包括：依次形成第一色阻、第二色阻及第三色阻的步骤，所述第一色阻、第二色阻及第三色阻沿衬底表面的方向依次重复排列；制作无机阻挡层的步骤包括：在第一色阻形成之后第二色阻形成之前形成覆盖第一色阻的第一无机阻挡层的步骤，通过在相邻的色阻之间设置无机阻挡层，能够避免不同色阻之间的扩散污染，保证显示效果。本发明还提供一种彩色滤光片，能够避免不同颜色的色阻之间的扩散污染，保证显示效果。
 附图说明
为了能更进一步了解本发明的特征以及技术内容，请参阅以下有关本发明的详细说明与附图，然而附图仅提供参考与说明用，并非用来对本发明加以限制。
附图中，
图1为本发明的彩色滤光片的制作方法的第一实施例的流程图；
图2至图5为本发明的彩色滤光片的制作方法的第一实施例具体步骤示意图；
图6为本发明的彩色滤光片的制作方法的第二实施例的流程图；
图7至图11为本发明的彩色滤光片的制作方法的第二实施例具体步骤示意图。
 本发明的实施方式
为更进一步阐述本发明所采取的技术手段及其效果，以下结合本发明的优选实施例及其附图进行详细描述。
请参阅图1至图5，本发明的第一实施例提供一种彩色滤光片的制作方法，包括在衬底1上制作色阻层2及制作无机阻挡层3的步骤；
其中，制作色阻层2的步骤包括：依次形成第一色阻20、第二色阻30及第三色阻40的步骤，所述第一色阻20、第二色阻30及第三色阻40沿衬底1表面的方向依次重复排列；
制作无机阻挡层3的步骤包括：在第一色阻20形成之后第二色阻30形成之前形成覆盖第一色阻20的第一无机阻挡层50的步骤。
其中，所述色阻层2的材料为包括染料和颜料的混合色阻材料，且第一色阻20、第二色阻30及第三色阻40的颜色不同，由于混合色阻材料中的染料的小分子特性，所述第一色阻20、第二色阻30及第三色阻40在制作过程中可能会出现移染问题，即不同颜色的色阻之间出现相互扩散污染。
需要说明的是，所述无机阻挡层3的材料优选为氮化硅（SiNx），以使得无机阻挡层具有较高的致密性、良好的隔绝性及优秀的光穿透率，在有效分隔相邻色阻防止移染的同时，有效减少对光线穿透率的影响。
具体地，本发明的第一实施例中出现移染性色阻为一种，且在本发明的彩色滤光片的制作方法将出现移染性问题的色阻优先制作，对应到本发明的第一实施例中，即出现移染性问题的色阻为第一色阻20，当红色色阻出现移染性问题时，第一色阻20即为红色色阻，第二色阻30和第三色阻40分别为绿色色阻和蓝色色阻或分别为蓝色色阻和绿色色阻，当绿色色阻出现移染性问题时，第一色阻20即为绿色色阻，第二色阻30和第三色阻40分别为红色色阻和蓝色色阻或分别为蓝色色阻和红色色阻，当蓝色色阻出现移染性问题时，第一色阻20即为蓝色色阻，第二色阻30和第三色阻40分别为绿色色阻和蓝色色阻或分别为蓝色色阻和绿色色阻。
进一步地，在本发明的第一实施例中，所述彩色滤光片的制作方法具体包括如下步骤：
请参阅图2，提供衬底1，在所述衬底1上通过第一道图案化制程形成第一色阻20；
请参阅图3，形成覆盖所述第一色阻20及衬底1的第一无机阻挡层50；
请参阅图4，在所述第一无机阻挡层50上通过第二道图案化制程形成第二色阻30；
请参阅图5，在所述第一无机阻挡层50上通过第三道图案化制程形成第三色阻40。
具体地，通过化学气相沉积机台（CVD）沉积形成第一无机阻挡层50。
具体地，每一道图案化制程均包括涂布相应颜色的色阻材料，采用一道光罩对所述色阻材料进行曝光，对曝光后的色阻材料进行显影，形成图案，最后对色阻材料进行烘烤，得到所述第一色阻20、第二色阻30或第三色阻40。
具体地，请参阅图6至图11，本发明的第二实施例提供一种彩色滤光片的制作方法，包括在衬底1上制作色阻层2及制作无机阻挡层3的步骤；
其中，制作色阻层2的步骤包括：依次形成第一色阻20、第二色阻30及第三色阻40的步骤，所述第一色阻20、第二色阻30及第三色阻40沿衬底1表面的方向依次重复排列；
制作无机阻挡层3的步骤包括：在第一色阻20形成之后第二色阻30形成之前形成覆盖第一色阻20的第一无机阻挡层50的步骤以及在第二色阻30形成之后第三色阻40形成之前形成覆盖所述第二色阻30的第二无机阻挡层60的步骤。
其中，所述色阻层2的材料为包括染料和颜料的混合色阻材料，且第一色阻20、第二色阻30及第三色阻40的颜色不同，由于混合色阻材料中的染料的小分子特性，所述第一色阻20、第二色阻30及第三色阻40在制作过程中可能会出现移染问题，即不同颜色的色阻之间出现相互扩散污染。
需要说明的是，所述无机阻挡层3的材料优选为氮化硅，以使得无机阻挡层具有较高的致密性、良好的隔绝性及优秀的光穿透率，在有效分隔相邻色阻防止移染的同时，有效减少对光线穿透率的影响。
具体地，本发明的第二实施例中有两种色阻出现移染性，本发明的彩色滤光片的制作方法将可能出现移染性问题的色阻优先制作，对应到本发明的第二实施例中，即出现移染性问题的色阻为第一色阻20和第二色阻30，当红色色阻和绿色色阻出现移染性问题时，第一色阻20和第二色阻30分别为红色色阻和绿色色阻或分别为绿色色阻和红色色阻，第三色阻40为蓝色色阻；当红色色阻和蓝色色阻出现移染性问题时，第一色阻20和第二色阻30分别为红色色阻和蓝色色阻或分别为蓝色色阻和红色色阻，第三色阻40为绿色色阻；当绿色色阻和蓝色色阻出现移染性问题时，第一色阻20和第二色阻30分别为绿色色阻和蓝色色阻或分别为蓝色色阻和绿色色阻，第三色阻40为红色色阻。
进一步地，在本发明的第二实施例中，所述彩色滤光片的制作方法具体包括如下步骤：
请参阅图7，提供衬底1，在所述衬底1上通过第一道图案化制程形成第一色阻20；
请参阅图8，形成覆盖所述第一色阻20及衬底1的第一无机阻挡层50；
请参阅图9，在所述第一无机阻挡层50上通过第二道图案化制程形成第二色阻30；
请参阅图10，形成覆盖所述第二色阻30及第一无机阻挡层50的第二无机阻挡层60；
请参阅图11，在所述第二无机阻挡层60上通过第三道图案化制程形成第三色阻40。
具体地，通过化学气相沉积机台（CVD）沉积形成第一无机阻挡层50和第二无机阻挡层60。
具体地，每一道图案化制程均包括涂布相应颜色的色阻材料，采用一道光罩对所述色阻材料进行曝光，对曝光后的色阻材料进行显影，形成图案，最后对色阻材料进行烘烤，得到所述第一色阻20、第二色阻30或第三色阻40。
请参阅图5，对应本发明的第一实施例，本发明还一种彩色滤光片，包括衬底1、色阻层2及无机阻挡层3；
所述色阻层2包括沿衬底1表面的方向依次重复排列的第一色阻20、第二色阻30及第三色阻40；
所述无机阻挡层3包括覆盖第一色阻20的第一无机阻挡层50，所述第一无机阻挡层50将所述第一色阻20与所述第二色阻30和第三色阻40分隔开。
其中，所述色阻层2的材料为包括染料和颜料的混合色阻材料，且第一色阻20、第二色阻30及第三色阻40的颜色不同，由于混合色阻材料中的染料的小分子特性，所述第一色阻20、第二色阻30及第三色阻40在制作过程中可能会出现移染问题，即不同颜色的色阻之间出现相互扩散污染。
需要说明的是，所述无机阻挡层3的材料优选为氮化硅（SiNx），以使得无机阻挡层具有较高的致密性、良好的隔绝性及优秀的光穿透率，在有效分隔相邻色阻防止移染的同时，有效减少对光线穿透率的影响。
具体地，图5所示的实施例中出现移染性问题的色阻为第一色阻20，当红色色阻出现移染性问题时，第一色阻20即为红色色阻，第二色阻30和第三色阻40分别为绿色色阻和蓝色色阻或分别为蓝色色阻和绿色色阻，当绿色色阻出现移染性问题时，第一色阻20即为绿色色阻，第二色阻30和第三色阻40分别为红色色阻和蓝色色阻或分别为蓝色色阻和红色色阻，当蓝色色阻出现移染性问题时，第一色阻20即为蓝色色阻，第二色阻30和第三色阻40分别为绿色色阻和蓝色色阻或分别为蓝色色阻和绿色色阻。
具体地，请参阅图5，在本发明的第一实施例中，在此第一实施例中所述的彩色滤光片包括衬底1、设于所述衬底1上的第一色阻20、覆盖所述第一色阻20及衬底1的第一无机阻挡层50、设于所述第一无机阻挡层50上的第二色阻30以及设于第一无机阻挡层50上的第三色阻40。
请参阅图11，对应本发明的第二实施例，本发明还一种彩色滤光片，包括衬底1、色阻层2及无机阻挡层3；
所述色阻层2包括沿衬底1表面的方向依次重复排列的第一色阻20、第二色阻30及第三色阻40；
所述无机阻挡层3包括覆盖第一色阻20的第一无机阻挡层50及覆盖所述第二色阻30的第二无机阻挡层60，所述第一无机阻挡层50将所述第一色阻20与所述第二色阻30和第三色阻40分隔开，，所述第二无机阻挡层60将所述第二色阻30与第三色阻40分隔开
其中，所述色阻层2的材料为包括染料和颜料的混合色阻材料，且第一色阻20、第二色阻30及第三色阻40的颜色不同，由于混合色阻材料中的染料的小分子特性，所述第一色阻20、第二色阻30及第三色阻40在制作过程中可能会出现移染问题，即不同颜色的色阻之间出现相互扩散污染。
需要说明的是，所述无机阻挡层3的材料优选为氮化硅，以使得无机阻挡层具有较高的致密性、良好的隔绝性及优秀的光穿透率，在有效分隔相邻色阻防止移染的同时，有效减少对光线穿透率的影响。
具体地，图11所示的实施例中出现移染性问题的色阻为第一色阻20和第二色阻30，当红色色阻和绿色色阻出现移染性问题时，第一色阻20和第二色阻30分别为红色色阻和绿色色阻或分别为绿色色阻和红色色阻，第三色阻40为蓝色色阻；当红色色阻和蓝色色阻出现移染性问题时，第一色阻20和第二色阻30分别为红色色阻和蓝色色阻或分别为蓝色色阻和红色色阻，第三色阻40为绿色色阻；当绿色色阻和蓝色色阻出现移染性问题时，第一色阻20和第二色阻30分别为绿色色阻和蓝色色阻或分别为蓝色色阻和绿色色阻，第三色阻40为红色色阻。
具体地，请参阅图11，在本发明的第二实施例中所述的彩色滤光片包括衬底1、设于所述衬底1上的第一色阻20、覆盖所述第一色阻20及衬底1的第一无机阻挡层50、设于所述第一无机阻挡层50上的第二色阻30、覆盖第一无机阻挡层50及第二色阻30的第二无机阻挡层60以及设于第二无机阻挡层60上的第三色阻40。
综上所述，本发明提供一种彩色滤光片的制作方法，包括制作色阻层及制作无机阻挡层的步骤；其中，制作色阻层的步骤包括：依次形成第一色阻、第二色阻及第三色阻的步骤，所述第一色阻、第二色阻及第三色阻依次重复排列；制作无机阻挡层的步骤包括：在第一色阻形成之后第二色阻形成之前形成覆盖第一色阻的第一无机阻挡层的步骤，通过设置无机阻挡层分隔不同色阻，能够避免不同色阻之间的扩散污染，保证显示效果。本发明还提供一种彩色滤光片，能够避免不同色阻之间的扩散污染，保证显示效果。本发明还提供一种彩色滤光片，能够避免不同色阻之间的扩散污染，保证显示效果。
以上所述，对于本领域的普通技术人员来说，可以根据本发明的技术方案和技术构思作出其他各种相应的改变和变形，而所有这些改变和变形都应属于本发明权利要求的保护范围。

Claims (13)

  1. 一种彩色滤光片的制作方法，包括在衬底上制作色阻层及制作无机阻挡层的步骤；
    其中，制作色阻层的步骤包括：依次形成第一色阻、第二色阻及第三色阻的步骤，所述第一色阻、第二色阻及第三色阻沿衬底表面的方向依次重复排列；
    制作无机阻挡层的步骤包括：在第一色阻形成之后第二色阻形成之前形成覆盖第一色阻的第一无机阻挡层的步骤。
  2. 如权利要求1所述的彩色滤光片的制作方法，包括如下步骤：
    提供衬底，在所述衬底上通过第一道图案化制程形成第一色阻；
    形成覆盖所述第一色阻及衬底的第一无机阻挡层；
    在所述第一无机阻挡层上通过第二道图案化制程形成第二色阻；
    在所述第一无机阻挡层上通过第三道图案化制程形成第三色阻。
  3. 如权利要求1所述的彩色滤光片的制作方法，其中，制作无机阻挡层的步骤还包括：在第二色阻形成之后第三色阻形成之前形成覆盖所述第二色阻的第二无机阻挡层的步骤。
  4. 如权利要求3所述的彩色滤光片的制作方法，包括如下步骤：
    提供衬底，在所述衬底上通过第一道图案化制程形成第一色阻；
    形成覆盖所述第一色阻及衬底的第一无机阻挡层；
    在所述第一无机阻挡层上通过第二道图案化制程形成第二色阻；
    形成覆盖所述第二色阻及第一无机阻挡层的第二无机阻挡层；
    在所述第二无机阻挡层上通过第三道图案化制程形成第三色阻。
  5. 如权利要求1所述的彩色滤光片的制作方法，其中，所述色阻层的材料为包括颜料和染料的混合色阻材料，所述无机阻挡层的材料为氮化硅；
    所述第一色阻为红色色阻、绿色色阻及蓝色色阻中的一种；
    所述第二色阻为红色色阻、绿色色阻及蓝色色阻中不同于第一色阻的另一种；
    所述第三色阻为红色色阻、绿色色阻及蓝色色阻中不同于第一色阻和第二色阻的一种。
  6. 一种彩色滤光片，包括衬底、色阻层及无机阻挡层；
    所述色阻层包括沿衬底表面的方向依次重复排列的第一色阻、第二色阻及第三色阻；
    所述无机阻挡层包括覆盖第一色阻的第一无机阻挡层，所述第一无机阻挡层将所述第一色阻与所述第二色阻和第三色阻分隔开。
  7. 如权利要求6所述的彩色滤光片，包括衬底、设于所述衬底上的第一色阻、覆盖所述第一色阻及衬底的第一无机阻挡层、设于所述第一无机阻挡层上的第二色阻以及设于第一无机阻挡层上的第三色阻。
  8. 如权利要求6所述的彩色滤光片，其中，所述无机阻挡层还包括覆盖所述第二色阻的第二无机阻挡层，所述第二无机阻挡层将所述第二色阻与第三色阻分隔开。
  9. 如权利要求8所述的彩色滤光片，包括衬底、设于所述衬底上的第一色阻、覆盖所述第一色阻及衬底的第一无机阻挡层、设于所述第一无机阻挡层上的第二色阻、覆盖第一无机阻挡层及第二色阻的第二无机阻挡层以及设于第二无机阻挡层上的第三色阻。
  10. 如权利要求6所述的彩色滤光片，其中，所述色阻层的材料为包括颜料和染料的混合色阻材料，所述无机阻挡层的材料为氮化硅；
    所述第一色阻为红色色阻、绿色色阻及蓝色色阻中的一种；
    所述第二色阻为红色色阻、绿色色阻及蓝色色阻中不同于第一色阻的另一种；
    所述第三色阻为红色色阻、绿色色阻及蓝色色阻中不同于第一色阻和第二色阻的一种。
  11. 一种彩色滤光片，包括衬底、色阻层及无机阻挡层；
    所述色阻层包括沿衬底表面的方向依次重复排列的第一色阻、第二色阻及第三色阻；
    所述无机阻挡层包括覆盖第一色阻的第一无机阻挡层，所述第一无机阻挡层将所述第一色阻与所述第二色阻和第三色阻分隔开；
    所述彩色滤光片包括衬底、设于所述衬底上的第一色阻、覆盖所述第一色阻及衬底的第一无机阻挡层、设于所述第一无机阻挡层上的第二色阻以及设于第一无机阻挡层上的第三色阻；
    所述色阻层的材料为包括颜料和染料的混合色阻材料，所述无机阻挡层的材料为氮化硅；
    所述第一色阻为红色色阻、绿色色阻及蓝色色阻中的一种；
    所述第二色阻为红色色阻、绿色色阻及蓝色色阻中不同于第一色阻的另一种；
    所述第三色阻为红色色阻、绿色色阻及蓝色色阻中不同于第一色阻和第二色阻的一种。
  12. 如权利要求11所述的彩色滤光片，其中，所述无机阻挡层还包括覆盖所述第二色阻的第二无机阻挡层，所述第二无机阻挡层将所述第二色阻与第三色阻分隔开。
  13. 如权利要求12所述的彩色滤光片，包括衬底、设于所述衬底上的第一色阻、覆盖所述第一色阻及衬底的第一无机阻挡层、设于所述第一无机阻挡层上的第二色阻、覆盖第一无机阻挡层及第二色阻的第二无机阻挡层以及设于第二无机阻挡层上的第三色阻。
PCT/CN2019/117579 2019-08-06 2019-11-12 彩色滤光片的制作方法及彩色滤光片 WO2021022708A1 (zh)

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