WO2020258869A1 - 显示面板及其制备方法、显示装置 - Google Patents

显示面板及其制备方法、显示装置 Download PDF

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Publication number
WO2020258869A1
WO2020258869A1 PCT/CN2020/072530 CN2020072530W WO2020258869A1 WO 2020258869 A1 WO2020258869 A1 WO 2020258869A1 CN 2020072530 W CN2020072530 W CN 2020072530W WO 2020258869 A1 WO2020258869 A1 WO 2020258869A1
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Prior art keywords
layer
dam
display panel
sub
opening
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PCT/CN2020/072530
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English (en)
French (fr)
Inventor
杜凌霄
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昆山工研院新型平板显示技术中心有限公司
昆山国显光电有限公司
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Publication of WO2020258869A1 publication Critical patent/WO2020258869A1/zh

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    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/40—OLEDs integrated with touch screens
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices

Definitions

  • This application relates to the field of display technology, in particular to a display panel, a display device, and a manufacturing method of the display panel.
  • the polarizer will affect the transmittance of the optical device (such as a camera) provided on one side of the display panel. Therefore, it is usually necessary to groove the polarizer corresponding to the position of the optical device to form a depolarized area.
  • the inventor of the present application found that the method of forming the depolarized region by the above-mentioned groove processing is relatively complicated.
  • the present application provides a display panel, a display device, and a manufacturing method of the display panel, which can form a depolarization area more simply.
  • a technical solution adopted in this application is to provide a display panel, the display panel comprising: an array substrate; a first functional layer, arranged on one side of the array substrate, provided with an opening, and the first functional layer is away from The edge of the opening on one side of the array substrate is provided with a dam surrounding the opening; a polarizing layer is located on the side of the first functional layer away from the array substrate, and ends at the dam, and does not cover the opening .
  • Another technical solution adopted in this application is to provide a display device, the display device comprising: the display panel and the optical device according to any one of the above embodiments, wherein the optical device is located on the array substrate away from the One side of the polarizing layer, and the photosensitive area of the optical device is arranged corresponding to the opening.
  • the manufacturing method includes: forming a first functional layer on one side of an array substrate, wherein the first functional layer is provided with an opening, and The edge of the opening on the side of the first functional layer facing away from the array substrate is provided with a dam surrounding the opening; a polarizing layer is formed on the side of the first functional layer facing away from the array substrate, and the polarizing layer is cut off at The dam does not cover the opening.
  • the beneficial effects of this application are: in the display panel provided by this application, the first functional layer is provided with an opening, and the edge of the opening on the side of the first functional layer facing away from the array substrate is provided with a dam surrounding the opening; The layer is away from the side of the array substrate and ends at the dam, and does not cover the opening; this application defines the position of the subsequent polarizing layer by setting the dam, so that the subsequently formed polarizing layer will not overflow to the other side of the dam. It overflows into the opening to form a depolarized area on the other side of the dam; compared with the method of trenching to form the depolarized area in the prior art, the method adopted in this application is simpler and the process can be realized.
  • the polarizer formed after grooving is generally bonded to the screen (for example, the first functional layer), and there is generally a deviation in alignment during bonding, resulting in the range of the depolarized area formed It cannot be accurately defined.
  • the method adopted in this application can achieve high-precision alignment of the polarizing layer and the first functional layer, thereby improving the display quality of the display panel.
  • FIG. 1 is a top view of an embodiment of a display panel of this application
  • FIG. 2 is a cross-sectional view of an embodiment of the display panel in FIG. 1 along the line A-A;
  • FIG. 3 is a schematic structural diagram of an embodiment of the touch electrode in FIG. 2;
  • FIG. 4 is a schematic structural diagram of another embodiment of the display panel of the present application.
  • FIG. 5 is a schematic structural diagram of another embodiment of a display panel of this application.
  • FIG. 6 is a schematic structural diagram of an embodiment of a display device of this application.
  • FIG. 7 is a schematic flowchart of an embodiment of a method for manufacturing a display panel of the present application.
  • FIG. 1 is a schematic top view of an embodiment of the display panel of this application
  • FIG. 2 is a schematic cross-sectional view of an embodiment of the display panel in FIG. 1 along the line AA.
  • the display panel may be an organic light emitting diode ( OLED) display panel, etc.
  • the display panel includes: an array substrate 10, a first functional layer 12, and a polarizing layer 14.
  • the array substrate 10 may include a substrate, a thin film transistor layer, etc.
  • the substrate may be a flexible substrate, and its material may be polyimide, polyethylene terephthalate, or polynaphthalene. Ethylene glycol diformate, etc.; of course, in other embodiments, the substrate may also be a rigid substrate, and the material may be silicon or the like.
  • the first functional layer 12 is disposed on the side of the array substrate 10 with an opening 120, and the edge of the opening 120 on the side of the first functional layer 12 facing away from the array substrate 10 is provided with a dam 122 surrounding the opening 120.
  • the shape of the opening 120 may be an irregular figure, which is beneficial to realize a special-shaped display panel.
  • the opening 120 may be a regular pattern, such as an ellipse, a circle, a square, etc.
  • the polarizing layer 14 is located on the side of the first functional layer 12 away from the array substrate 10 and ends at the dam 122 and does not cover the opening 120. At this time, the opening 120 forms a depolarizing area. In addition, when the dam 122 is made of a transparent material and the polarizing layer 14 does not cover the top surface of the dam 122, the dam 122 and the opening 120 jointly form a depolarization area, which can increase the area of the depolarization area formed.
  • the polarizing layer 14 may be formed on the first functional layer 12 by coating or inkjet printing.
  • the polarizing layer 14 may include a linear polarizing film and a retardation film that are stacked, and the retardation film is close to the first functional layer 12 relative to the linear polarizing film; and in order to avoid extremes between the linear polarizing film and the retardation film For resistance interference, a low-temperature organic insulating layer material OC can be used as an anti-interference layer between the linear polarizing film and the retardation film.
  • the present application defines the position of the subsequently formed polarizing layer 14 by setting the dam 122, so that the subsequently formed polarizing layer 14 will not overflow to the other side of the dam 122, that is, it will not overflow into the opening 120, so that the polarizing layer 14 will not overflow to the other side of the dam 122.
  • the depolarization area is formed on the side; the method used in this application is relatively simple and the process can be realized; and generally, the polarizer formed after trenching is bonded to the screen body (for example, the first functional layer 12).
  • the first functional layer 12 includes a touch layer 124 and a bank 122.
  • the touch layer 124 may be a resistive touch type or a capacitive touch type. The structure of the layer 124 will be described later.
  • the touch layer 124 is located on the periphery of the dam 122 with a gap d1 between them to form an annular groove (not labeled).
  • the polarizing layer 14 covers the touch layer 124 and extends to the bottom of the annular groove. The design of the annular groove can better utilize the embankment 122 to define the position of the polarizing layer 14 without restricting the relative height of the embankment 122 and the touch layer 124.
  • the display panel provided by the present application may also include other structures.
  • a light-emitting layer and an encapsulation layer may be further included between the array substrate 10 and the first functional layer 12, and the luminescence layer may be opposite to the encapsulation layer. Close to the array substrate 10.
  • the aforementioned touch layer 124 includes a plurality of touch electrodes 1240 and an insulating layer 1242.
  • the insulating layer 1242 covers the plurality of touch electrodes 1240 and is filled between the touch electrodes 1240.
  • the design method of the touch control layer 124 is relatively simple, and the process is mature.
  • FIG. 3 is a schematic structural diagram of an embodiment of the touch electrode in FIG. 2.
  • the multiple touch electrodes 1240 in the touch layer 124 include multiple transmitting electrodes TX, multiple receiving electrodes RX, and multiple bridging electrodes 12400.
  • the transmitting electrodes TX and the receiving electrodes RX are located on the first metal layer M1, and are arranged crosswise to bridge the electrodes.
  • the electrode 12400 is located on the second metal layer M2; in this embodiment, a plurality of transmitting electrodes TX may be arranged at intervals and extending in the first direction, and a plurality of receiving electrodes RX may be arranged at intervals and extending in the second direction.
  • the transmitting electrode TX and the receiving electrode RX can be perpendicular to the second direction or at an acute angle.
  • one of the transmitting electrode TX and the receiving electrode RX is disconnected at the intersection of the two, and the transmitting electrode TX is crossed by the bridging electrode 12400.
  • Connect with the other one of the receiving electrodes RX; that is, both ends of the bridging electrode 12400 can be connected to the disconnected transmitting electrode TX or the disconnected receiving electrode RX, and the second metal layer M2 where the bridging electrode 12400 is located is connected to the transmitting electrode TX It is arranged in a different layer from the first metal layer M1 where the receiving electrode RX is located.
  • the first metal layer M1 in the touch layer 124 may be disposed away from the array substrate 10 relative to the second metal layer M2; in other embodiments, the touch layer 124
  • the second metal layer M2 can also be disposed away from the array substrate 10 relative to the first metal layer M1.
  • the insulating layer 1242 in the touch layer 124 includes a first sub-insulating layer 12420 and a second sub-insulating layer 12422, the first sub-insulating layer 12420 covers the first metal layer M1, and the second sub-insulating layer 12422 covers The second metal layer M2 and the area between the second metal layer M2 and the first metal layer M1.
  • the design structure of the touch electrode 1240 and the insulating layer 1242 in the touch layer 124 is relatively simple, and the process is mature and easy to implement.
  • the dam 122 can be formed by any one of the first sub-insulating layer 12420 or the second sub-insulating layer 12422 in the touch layer 124; the above design method can make the first sub-insulating layer 12420 formed Or the second sub-insulating layer 12422 forms the dam 122 at the same time, so that the process of forming the dam 122 is simpler and the process efficiency of the display panel is improved.
  • a mask may be used to form the dam 122 while forming the first sub-insulating layer 12420 of the touch layer 124, and the height of the formed dam 122 may be the same as the height of the first sub-insulating layer 12420.
  • a mask may be used to form the dam 122 while forming the second sub-insulating layer 12422 of the touch layer 124, and the height of the formed dam 122 may be the same as the height of the second sub-insulating layer 12422.
  • FIG. 4 is a schematic structural diagram of another embodiment of the display panel of this application.
  • the dam 122a can be formed by the first sub-insulating layer 12420a, the second sub-insulating layer 12422a, and the first sub-insulating layer 12420a in the touch layer 124a.
  • At least two (for example, two, three, or four) of the metal layer M1a and the second metal layer M2a are stacked, and the stacking order of the at least two in the bank 122a and the stacking order in the touch layer 124a the same.
  • the above design method can make the first sub-insulating layer 12420a or the second sub-insulating layer 12422a or the first metal layer M1a or the second metal layer M2a of the touch layer 124a form one layer of the dam 122a, the dam 122a
  • the design method is simpler and can improve the process efficiency of the display panel; and the design method of the dam 122a can adjust and increase the height of the dam 122a, so that the dam 122a has a better effect of defining the polarizing layer 14a.
  • the dam 122/122a can also be made of a different material from the touch layer 124/124a, and in this case, the dam 122/122a and the touch layer 124/124a can be formed sequentially.
  • FIG. 5 is a schematic structural diagram of another embodiment of the display panel of this application.
  • the display panel further includes: a protective layer 16b located at the bottom of the annular groove (not labeled) and polarized
  • the layer 14b covers the protective layer 16b.
  • the total height of the protective layer 16b and the polarizing layer 14b in the annular groove is less than or equal to the height of the dam 122b.
  • the design of the protective layer 16b can strengthen the protection of the exposed area at the bottom of the annular groove, so as to reduce the probability of external water vapor passing through the bottom of the annular groove to corrode various components in the display panel.
  • the protective layer 16b may be formed by the first sub-insulating layer 12420b in the touch layer (not labeled); or, when the height of the dam 122b When the height exceeds the sum of the heights of the second sub-insulating layer 12422b and the polarizing layer 14b, the protective layer 16b may be formed by the second sub-insulating layer 12422b in the touch layer (not shown).
  • This design method can form the protective layer 16b while forming the first sub-insulating layer 12420b or the second sub-insulating layer 12422b of the touch layer, thereby simplifying the process flow and improving the process efficiency of the display panel.
  • FIG. 6 is a schematic structural diagram of an embodiment of a display device of the present application.
  • the display device includes: the display panel 20 and the optical device 22 in any of the above embodiments, wherein the optical device 22 is located on the side of the array substrate 200 away from the polarizing layer 202, and the photosensitive area of the optical device 22 is arranged corresponding to the opening 204.
  • the optical device 22 may be a camera, a distance sensor, or the like.
  • the dam 206 is made of a transparent material, and the polarizing layer 202 does not cover the top surface of the dam 206 and the side wall of the dam 206 adjacent to the opening 204, as shown in FIG. 6, the photosensitive area of the optical device 22 can be connected to the opening 204 and the dam 206 The area formed together corresponds to the setting.
  • the display device may also include others, for example, a cover plate located on the side of the polarizing layer 202 away from the array substrate 200; another example is a housing, which is sleeved on the display panel 20 and the optical device 22. Peripheral.
  • FIG. 7 is a schematic flowchart of an embodiment of a method for manufacturing a display panel of the present application.
  • the preparation method includes:
  • a first functional layer 12 is formed on the side of the array substrate 10, wherein the first functional layer 12 is provided with an opening 120, and the edge of the opening 120 on the side of the first functional layer 12 away from the array substrate 10 is provided with a dam surrounding the opening 120 122.
  • the first functional layer 12 includes the touch layer 124 and the dam 122; the preparation method provided in this application before the above step S101 may further include: forming a light-emitting layer on the side of the array substrate 10; An encapsulation layer is formed on the side of the layer away from the array substrate; the above step S101 specifically includes forming the first functional layer 12 on the side of the encapsulation layer away from the light-emitting layer.
  • the above-mentioned specific process of forming the first functional layer 12 may be:
  • a patterned second metal layer M2 is formed on one side of the array substrate 10.
  • the second metal layer M2 includes a plurality of bridge electrodes 12400 located on the touch layer 124; at this time, if the dam 122 includes the second metal layer M2
  • the second metal layer M2 can be formed at the position corresponding to the dam 122 while forming the bridge electrode 12400 of the touch layer 124 by using a mask.
  • a second sub-insulation layer 12422 is formed on the side of the second metal layer M2 away from the array substrate 10; at this time, if the dam 122 includes the part formed by the second sub-insulation layer 12422, a mask can be used to form the touch layer At the same time as the second sub-insulating layer 12422 of 124, a second sub-insulating layer 12422 is also formed at a position corresponding to the dam 122.
  • a patterned first metal layer M1 is formed on the side of the second sub-insulating layer 12422 far away from the array substrate 10, the first metal layer M1 includes a plurality of transmitting electrodes TX and a plurality of receiving electrodes RX arranged crosswise, and the transmitting electrode TX And one of the receiving electrodes RX is disconnected at the intersection of the two; the bridging electrode 12400 is correspondingly arranged at the intersection of the transmitting electrode TX and the receiving electrode RX.
  • a via hole can be opened at the corresponding position of the second sub-insulating layer 12422, so that The disconnected transmitting electrode TX or receiving electrode RX is connected to the bridge electrode 12400 at the corresponding position through the second sub-insulating layer 12422.
  • the dam 122 includes a portion formed by the first metal layer M1
  • the first metal layer M1 can be formed at a position corresponding to the dam 122 while forming the transmitting electrode TX and the receiving electrode RX of the touch layer 124.
  • a first sub-insulating layer 12420 is formed on the side of the first metal layer M1 away from the array substrate 10, and the first sub-insulating layer 12420 covers the first metal layer M1; at this time, if the dam 122 includes the first sub-insulating layer 12420
  • a mask can be used to form the first sub-insulating layer 12420 of the touch layer 124 while also forming the first sub-insulating layer 12420 at the position corresponding to the dam 122.
  • the second metal layer M2 can also be far away from the array substrate 10 relative to the first metal layer M1, and the formation process is similar to the above, and will not be described in detail here.
  • a polarizing layer 14 is formed on the side of the first functional layer 12 away from the array substrate 10, and the polarizing layer 14 is cut off by the dam 122 and does not cover the opening 120.
  • the polarizing layer 14 can be formed on the side of the array substrate 10 by coating or inkjet printing; in this case, the dam 122 can effectively limit the position of the polarizing layer 14 so that the polarizing layer 14 will not cover Into the opening 120.

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Abstract

一种显示面板、显示装置及显示面板的制备方法，所述显示面板包括：阵列基板（10）；第一功能层（12），设置于所述阵列基板（10）一侧，设有开口（120），且所述第一功能层（12）背离所述阵列基板（10）一侧的所述开口（120）边缘设有围绕所述开口（120）的堤坝（122）；偏光层（14），位于所述第一功能层（12）背离所述阵列基板（10）一侧，且截止于所述堤坝（122），不覆盖所述开口（120）。通过上述方式，能够更为简便地形成去偏光区域。

Description

显示面板及其制备方法、显示装置 技术领域
本申请涉及显示技术领域，特别是涉及一种显示面板、显示装置及显示面板的制备方法。
背景技术
目前，为了降低显示面板中的金属层对外界环境光的反射，一般需要在显示面板的出光面一侧设置偏光片，以降低金属层对外界环境光的反射，提高显示面板在强光下的对比度。
而偏光片会影响显示面板一侧设置的光学器件(例如，摄像头等)的透过率，因此通常需要将对应于光学器件位置处的偏光片做挖槽处理，以形成去偏光区域。
本申请的发明人在长期研究过程中发现，上述挖槽处理形成去偏光区域的做法较为繁琐。
发明内容
本申请提供一种显示面板、显示装置及显示面板的制备方法，能够更为简便地形成去偏光区域。
本申请采用的一个技术方案是：提供一种显示面板，所述显示面板包括：阵列基板；第一功能层，设置于所述阵列基板一侧，设有开口，且所述第一功能层背离所述阵列基板一侧的所述开口边缘设有围绕所述开口的堤坝；偏光层，位于所述第一功能层背离所述阵列基板一侧，且截止于所述堤坝，不覆盖所述开口。
本申请采用的另一个技术方案是：提供一种显示装置，所述显示装置包括：上述任一实施例所述的显示面板及光学器件，其中，所述光学器件位于所述阵列基板远离所述偏光层一侧，且所述光学器件的感光区与所述开口对应设置。
本申请采用的另一个技术方案是：提供一种显示面板的制备方法，所述制备方法包括：在阵列基板一侧形成第一功能层，其中，所述第一功能层设有开口，且所述第一功能层背离所述阵列基板一侧的所述开口边缘设有围绕所述开口的堤坝；在所述第一功能层背离所述阵列基板一侧形成偏光层，所述偏光层截止于所述堤坝且不覆盖所述开口。
本申请的有益效果是：本申请所提供的显示面板中第一功能层设有开口，且在第一功能层背离阵列基板一侧的开口边缘设有围绕开口的堤坝；偏光层位于第一功能层背离阵列基板一侧，且截止于堤坝，不覆盖开口；本申请通过设置堤坝来限定后续形成的偏光层的位置，以使得后续形成的偏光层不会溢出至堤坝另一侧，即不会溢出至开口中，从而在堤坝另一侧形成去偏光区域；与现有技术中挖槽形成去偏光区域的方式相比，且本申请所采用的方式较为简单，且工艺可实现。；另外，现有技术中一般是将挖槽后形成的偏光片与屏体(例如，第一功能层)进行贴合，贴合时一般会存在对位偏差，导致形成的去偏光区域的范围无法准确限定，本申请所采用的方式可以实现偏光层与第一功能层的高精度对位，从而提升显示面板的显示质量。
【附图说明】
为了更清楚地说明本申请实施例中的技术方案，下面将对实施例描述中所需要使用的附图作简单地介绍，下面描述中的附图仅仅是本申请的一些实施例，对于本领域普通技术人员来讲，在不付出创造性劳动的前提下，还可以根据这些附图获得其他的附图，其中：
图1为本申请显示面板一实施方式的俯视图；
图2为图1中显示面板沿A-A线一实施方式的剖视图；
图3为图2中触控电极一实施方式的结构示意图；
图4为本申请显示面板另一实施方式的结构示意图；
图5为本申请显示面板另一实施方式的结构示意图；
图6为本申请显示装置一实施方式的结构示意图；
图7为本申请显示面板的制备方法一实施方式的流程示意图。
【具体实施方式】
下面将结合本申请实施例中的附图，对本申请实施例中的技术方案进行清楚、完整地描述，显然，所描述的实施例仅仅是本申请一部分实施例，而不是全部的实施例。基于本申请中的实施例，本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施例，均属于本申请保护的范围。
请参阅图1-图2，图1为本申请显示面板一实施方式的俯视示意图，图2为图1中显示面板沿A-A线一实施方式的剖视示意图，该显示面板可以是有机 发光二极管(OLED)显示面板等，该显示面板包括：阵列基板10、第一功能层12、偏光层14。
具体地，在本实施例中，阵列基板10可以包括衬底、薄膜晶体管层等，衬底可以是柔性衬底，其材质可以为聚酰亚胺、聚对苯二甲酸乙二酯、聚萘二甲酸乙二醇酯等；当然，在其他实施例中，衬底也可以是硬性衬底，其材质可以是硅等。
第一功能层12设置于阵列基板10一侧，设有开口120，且第一功能层12背离阵列基板10一侧的开口120边缘设有围绕开口120的堤坝122。在本实施例中，开口120的形状可以为不规则图形，进而有利于实现异形显示面板。当然，在其他实施例中，开口120可以为规则图形，例如，椭圆形、圆形、方形等。
偏光层14位于第一功能层12背离阵列基板10一侧，且截止于堤坝122，不覆盖开口120，此时开口120形成去偏光区域。另外，当堤坝122为透明材质，且偏光层14不覆盖堤坝122的顶面时，堤坝122和开口120共同形成去偏光区域，该设计方式可以增加形成的去偏光区域的面积。偏光层14可以采用涂布或喷墨打印的方式在第一功能层12上形成。在本实施例中，偏光层14可以包括层叠设置的线偏光膜和相位差膜，且相位差膜相对线偏光膜靠近第一功能层12；而为了避免线偏光膜和相位差膜之间极性干扰，还可在线偏光膜和相位差膜之间设置一层低温有机绝缘层材料OC作为抗干扰层。
本申请通过设置堤坝122来限定后续形成的偏光层14的位置，以使得后续形成的偏光层14不会溢出至堤坝122另一侧，即不会溢出至开口120中，从而在堤坝122另一侧形成去偏光区域；本申请所采用的方式较为简单，且工艺可实现；且一般是将挖槽后形成的偏光片与屏体(例如，第一功能层12)进行贴合，贴合时一般会存在对位偏差，导致形成的去偏光区域的范围无法准确限定，而本申请所采用的方式可以实现偏光层14与第一功能层12的高精度对位，从而提升显示面板的显示质量。
在一个实施方式中，如图2所示，第一功能层12包括触控层124以及堤坝122，触控层124可以为电阻式触控形式，也可以为电容式触控形式，具体触控层124的结构将在后续说明。触控层124位于堤坝122外围，两者之间具有间隔d1，以形成环形凹槽(未标示)，偏光层14覆盖触控层124，且延伸至环形凹槽底部。该环形凹槽的设计可以更好的利用堤坝122限定偏光层14的位置， 且无需限制堤坝122与触控层124的相对高度。当然，在其他实施例中，堤坝122与触控层124之间也可没有间隔d1，此时堤坝122的高度需超过触控层124的高度。另外，在其他实施例中，本申请所提供的显示面板还可包括其他结构，例如，在阵列基板10和第一功能层12之间还可包括发光层和封装层，发光层可相对封装层靠近阵列基板10。
在另一个实施方式中，上述触控层124包括：多个触控电极1240和绝缘层1242，绝缘层1242覆盖多个触控电极1240，且填充于触控电极1240之间。该触控层124的设计方式较为简单，且工艺成熟。
具体地，请一并参阅图2和图3，图3为图2中触控电极一实施方式的结构示意图。触控层124中的多个触控电极1240包括多个发射电极TX、多个接收电极RX以及多个桥接电极12400，发射电极TX和接收电极RX位于第一金属层M1，且交叉设置，桥接电极12400位于第二金属层M2；在本实施例中，多个发射电极TX可以间隔排布且沿第一方向延伸，多个接收电极RX可以间隔排布且沿第二方向延伸，第一方向可以和第二方向垂直或者成锐角。而为使得同层设置的发射电极TX与接收电极RX之间相互绝缘不受影响，发射电极TX和接收电极RX中的一个在两者交叉处断开，且通过桥接电极12400跨过发射电极TX和接收电极RX中的另一个进行连接；即桥接电极12400的两端可以与断开的发射电极TX或断开的接收电极RX连接，且桥接电极12400所在的第二金属层M2与发射电极TX和接收电极RX所在的第一金属层M1非同层设置。此外，在本实施例中，如图2中所示，触控层124中的第一金属层M1可相对第二金属层M2远离阵列基板10设置；在其他实施例中，触控层124中的第二金属层M2也可相对第一金属层M1远离阵列基板10设置。
请继续参阅图2，触控层124中的绝缘层1242包括第一子绝缘层12420和第二子绝缘层12422，第一子绝缘层12420覆盖第一金属层M1，第二子绝缘层12422覆盖第二金属层M2以及第二金属层M2与第一金属层M1之间的区域。
在本实施例中，上述触控层124中的触控电极1240和绝缘层1242的设计结构较为简单，且工艺成熟，易于实现。
进一步，如图2所示，堤坝122可以由触控层124中的第一子绝缘层12420或第二子绝缘层12422中任意一种形成；上述设计方式可以使得在形成第一子绝缘层12420或第二子绝缘层12422的同时形成堤坝122，从而使得形成堤坝122的工艺较为简单，且提高显示面板的制程效率。例如，可以利用掩膜版在形 成触控层124的第一子绝缘层12420的同时形成堤坝122，所形成的堤坝122的高度可以与第一子绝缘层12420的高度相同。又例如，可以利用掩膜版在形成触控层124的第二子绝缘层12422的同时形成堤坝122，所形成的堤坝122的高度可以与第二子绝缘层12422的高度相同。
进一步，如图4所示，图4为本申请显示面板另一实施方式的结构示意图，该堤坝122a可以由触控层124a中的第一子绝缘层12420a、第二子绝缘层12422a、第一金属层M1a和第二金属层M2a中的至少两种(例如，两种、三种、四种)堆叠形成，且至少两种在堤坝122a中的堆叠顺序与其在触控层124a中的堆叠顺序相同。上述设计方式可以使得在形成触控层124a的第一子绝缘层12420a或第二子绝缘层12422a或第一金属层M1a或第二金属层M2a的同时形成堤坝122a中的一层，该堤坝122a的设计方式工艺实现较为简单，能够提高显示面板的制程效率；且该堤坝122a的设计方式可以调节并增加堤坝122a的高度，以使得堤坝122a限定偏光层14a的效果更好。
当然，在其他实施例中，堤坝122/122a也可为不同于触控层124/124a的材质，此时堤坝122/122a和触控层124/124a可以先后形成。
在另一个实施方式中，如图5所示，图5为本申请显示面板另一实施方式的结构示意图，该显示面板还包括：保护层16b，位于环形凹槽(未标示)底部，且偏光层14b覆盖保护层16b，此时环形凹槽内保护层16b和偏光层14b的高度之和小于等于堤坝122b的高度。该保护层16b的设计可以加强对该环形凹槽底部裸露区域的保护，以降低外部水汽通过该环形凹槽底部侵蚀显示面板中各个元器件的概率。
当堤坝122b的高度超过第一子绝缘层12420b和偏光层14b的高度之和时，保护层16b可以由触控层(未标示)中的第一子绝缘层12420b形成；或，当堤坝122b的高度超过第二子绝缘层12422b和偏光层14b的高度之和时，保护层16b可以由触控层(未标示)中的第二子绝缘层12422b形成。该设计方式可以使得在形成触控层的第一子绝缘层12420b或第二子绝缘层12422b的同时形成保护层16b，从而简化工艺流程，提高显示面板的制程效率。
请参阅图6，图6为本申请显示装置一实施方式的结构示意图。该显示装置包括：上述任一实施例中的显示面板20和光学器件22，其中，光学器件22位于阵列基板200远离偏光层202一侧，且光学器件22的感光区与开口204对应设置。该光学器件22可以是摄像头、距离感测器等。当堤坝206为透明材质， 且偏光层202不覆盖堤坝206的顶面以及堤坝206邻近开口204一侧的侧壁时，如图6所示，光学器件22的感光区可与开口204和堤坝206共同形成的区域对应设置。
当然，在其他实施例中，该显示装置还可包括其他，例如，盖板，位于偏光层202远离阵列基板200一侧；又例如，壳体，套设在上述显示面板20和光学器件22的外围。
下面从制备方法的角度对本申请所提供的显示面板作进一步说明。请一并参阅图2和图7，图7为本申请显示面板的制备方法一实施方式的流程示意图。该制备方法包括：
S101：在阵列基板10一侧形成第一功能层12，其中，第一功能层12设有开口120，且第一功能层12背离阵列基板10一侧的开口120边缘设有围绕开口120的堤坝122。
具体地，在本实施例中，第一功能层12包括触控层124以及堤坝122；上述步骤S101之前本申请所提供的制备方法还可以包括：在阵列基板10一侧形成发光层；在发光层远离阵列基板一侧形成封装层；上述步骤S101具体包括在封装层远离发光层一侧形成第一功能层12。
在一个实施方式中，上述形成第一功能层12的具体过程可以为：
A、在阵列基板10一侧形成图案化的第二金属层M2，第二金属层M2包括位于触控层124的多个桥接电极12400；此时，若堤坝122中包括第二金属层M2构成的部分，则可利用掩膜版在形成触控层124的桥接电极12400的同时在对应堤坝122的位置形成第二金属层M2。
B、在第二金属层M2远离阵列基板10一侧形成第二子绝缘层12422；此时，若堤坝122包括第二子绝缘层12422构成的部分，则可利用掩膜版在形成触控层124的第二子绝缘层12422的同时在对应堤坝122的位置也形成第二子绝缘层12422。
C、在第二子绝缘层12422远离阵列基板10一侧形成图案化的第一金属层M1，第一金属层M1包括交叉设置的多个发射电极TX和多个接收电极RX，且发射电极TX和接收电极RX中的一个在两者交叉处断开；桥接电极12400对应设置于发射电极TX和接收电极RX的交叉处，此时第二子绝缘层12422对应位置处可以开设过孔，以使得断开的发射电极TX或接收电极RX透过第二子绝缘层12422与对应位置处的桥接电极12400连接。此时，若堤坝122中包括第一 金属层M1构成的部分，则可在形成触控层124的发射电极TX和接收电极RX的同时在对应堤坝122的位置形成第一金属层M1。
D、在第一金属层M1远离阵列基板10一侧形成第一子绝缘层12420，第一子绝缘层12420覆盖第一金属层M1；此时，若堤坝122包括第一子绝缘层12420构成的部分，则可利用掩膜版在形成触控层124的第一子绝缘层12420的同时在对应堤坝122的位置也形成第一子绝缘层12420。
在另一个实施方式中，第二金属层M2也可相对第一金属层M1远离阵列基板10，其形成过程与上述类似，在此不再详述。
S102：在第一功能层12背离阵列基板10一侧形成偏光层14，偏光层14截止于堤坝122且不覆盖开口120。
在一个实施方式中，可以利用涂布或喷墨打印等方式在阵列基板10一侧形成偏光层14；此时，堤坝122可以有效地限定偏光层14的位置，以使偏光层14不会覆盖到开口120中。
以上所述仅为本申请的实施方式，并非因此限制本申请的专利范围，凡是利用本申请说明书及附图内容所作的等效结构或等效流程变换，或直接或间接运用在其他相关的技术领域，均同理包括在本申请的专利保护范围内。

Claims (15)

  1. 一种显示面板，包括：
    阵列基板；
    第一功能层，设置于所述阵列基板一侧，设有开口，且所述第一功能层背离所述阵列基板一侧的所述开口边缘设有围绕所述开口的堤坝；
    偏光层，位于所述第一功能层背离所述阵列基板一侧，且截止于所述堤坝，不覆盖所述开口。
  2. 根据权利要求1所述的显示面板，其中，
    所述第一功能层包括触控层以及所述堤坝，所述触控层位于所述堤坝外围，两者之间具有间隔，以形成环形凹槽，所述偏光层覆盖所述触控层，且延伸至所述环形凹槽底部。
  3. 根据权利要求2所述的显示面板，其中，所述触控层包括多个触控电极和绝缘层；其中，多个所述触控电极包括多个发射电极、多个接收电极以及多个桥接电极，所述发射电极和所述接收电极位于第一金属层，且交叉设置，所述桥接电极位于第二金属层，所述发射电极和所述接收电极中的一个在两者交叉处断开，且通过所述桥接电极跨过所述发射电极和所述接收电极中的另一个进行连接；
    所述绝缘层包括第一子绝缘层和第二子绝缘层，所述第一子绝缘层覆盖所述第一金属层，所述第二子绝缘层覆盖所述第二金属层以及所述第二金属层与第一金属层之间的区域。
  4. 根据权利要求3所述的显示面板，其中，
    所述堤坝由所述第一子绝缘层或所述第二子绝缘层中任意一种形成。
  5. 根据权利要求3所述的显示面板，其中，
    所述堤坝由所述第一子绝缘层、所述第二子绝缘层、所述第一金属层和所述第二金属层中的至少两种堆叠形成，且所述至少两种在所述堤坝中的堆叠顺序与其在所述触控层中的堆叠顺序相同。
  6. 根据权利要求4或5所述的显示面板，其中，所述显示面板还包括：
    保护层，位于所述环形凹槽底部，所述偏光层覆盖所述保护层。
  7. 根据权利要求6所述的显示面板，其中，
    所述环形凹槽内的所述保护层和所述偏光层的高度之和小于等于所述堤坝的高度。
  8. 根据权利要求6所述的显示面板，其中，
    所述堤坝的高度超过所述第一子绝缘层和所述偏光层的高度之和，所述保护层由所述第一子绝缘层形成。
  9. 根据权利要求6所述的显示面板，其中，
    所述堤坝的高度超过所述第二子绝缘层和所述偏光层的高度之和，所述保护层由所述第二子绝缘层形成。
  10. 根据权利要求1所述的显示面板，其中，
    所述第一功能层包括触控层以及所述堤坝，所述触控层位于所述堤坝的外围，且两者之间无间隔，所述堤坝的高度超过所述触控层的高度。
  11. 根据权利要求1所述的显示面板，其中，
    所述堤坝为透明材质，所述偏光层不覆盖所述堤坝的顶面。
  12. 一种显示装置，包括：
    权利要求1-11任一项所述的显示面板及光学器件，其中，所述光学器件位于所述阵列基板远离所述偏光层一侧，且所述光学器件的感光区与所述开口对应设置。
  13. 根据权利要求12所述的显示装置，其中，
    所述堤坝为透明材质，且所述偏光层不覆盖所述堤坝的顶面以及所述堤坝邻近所述开口一侧的侧壁；所述光学器件的感光区与所述开口和所述堤坝共同形成的区域对应设置。
  14. 一种显示面板的制备方法，包括：
    在阵列基板一侧形成第一功能层，其中，所述第一功能层设有开口，且所述第一功能层背离所述阵列基板一侧的所述开口边缘设有围绕所述开口的堤坝；
    在所述第一功能层背离所述阵列基板一侧形成偏光层，所述偏光层截止于所述堤坝且不覆盖所述开口。
  15. 根据权利要求14所述的制备方法，其中，所述在所述第一功能层背离所述阵列基板一侧形成偏光层，包括：
    利用涂布或喷墨打印方式在所述阵列基板一侧形成所述偏光层。
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CN110286797B (zh) * 2019-06-27 2020-09-11 昆山工研院新型平板显示技术中心有限公司 一种显示面板、显示装置及显示面板的制备方法
CN111048575A (zh) * 2020-01-03 2020-04-21 武汉华星光电半导体显示技术有限公司 有机发光显示面板及其制备方法
EP4123429A4 (en) * 2020-03-19 2023-04-12 BOE Technology Group Co., Ltd. TOUCH SENSOR AND INDICATOR
WO2021184294A1 (zh) 2020-03-19 2021-09-23 京东方科技集团股份有限公司 触控传感器和显示装置
US11874987B2 (en) 2020-03-19 2024-01-16 Chengdu Boe Optoelectronics Technology Co., Ltd. Touch sensor and display apparatus
WO2021184292A1 (zh) 2020-03-19 2021-09-23 京东方科技集团股份有限公司 触控传感器和显示装置
CN113874821B (zh) 2020-03-19 2023-08-15 京东方科技集团股份有限公司 触控传感器和显示装置
CN112416180B (zh) * 2020-12-08 2024-03-12 合肥维信诺科技有限公司 触控显示面板和显示装置
CN113299700A (zh) 2021-05-08 2021-08-24 武汉华星光电半导体显示技术有限公司 一种显示面板及其制备方法

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102799028A (zh) * 2012-08-16 2012-11-28 深圳市华星光电技术有限公司 液晶面板及其制作方法
US20170287992A1 (en) * 2016-03-29 2017-10-05 Samsung Electronics Co., Ltd. Electronic device including display and camera
CN206650080U (zh) * 2017-04-25 2017-11-17 上海天马微电子有限公司 一种显示面板和显示装置
CN109120753A (zh) * 2018-08-21 2019-01-01 武汉天马微电子有限公司 一种显示面板及显示装置
CN109283736A (zh) * 2018-12-06 2019-01-29 华勤通讯技术有限公司 一种显示屏及电子设备
CN109637373A (zh) * 2019-01-29 2019-04-16 厦门天马微电子有限公司 显示模组和显示装置
CN110286797A (zh) * 2019-06-27 2019-09-27 昆山工研院新型平板显示技术中心有限公司 一种显示面板、显示装置及显示面板的制备方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9075199B2 (en) * 2012-10-30 2015-07-07 Apple Inc. Displays with polarizer layers for electronic devices
KR20150086159A (ko) * 2014-01-17 2015-07-27 주식회사 엘지화학 국지적으로 편광 해소 영역을 갖는 편광자 제조 방법, 이를 이용하여 제조된 편광자 및 편광판
ES2942305T3 (es) * 2017-04-25 2023-05-31 Huawei Tech Co Ltd Dispositivo electrónico con pantalla LCD

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102799028A (zh) * 2012-08-16 2012-11-28 深圳市华星光电技术有限公司 液晶面板及其制作方法
US20170287992A1 (en) * 2016-03-29 2017-10-05 Samsung Electronics Co., Ltd. Electronic device including display and camera
CN206650080U (zh) * 2017-04-25 2017-11-17 上海天马微电子有限公司 一种显示面板和显示装置
CN109120753A (zh) * 2018-08-21 2019-01-01 武汉天马微电子有限公司 一种显示面板及显示装置
CN109283736A (zh) * 2018-12-06 2019-01-29 华勤通讯技术有限公司 一种显示屏及电子设备
CN109637373A (zh) * 2019-01-29 2019-04-16 厦门天马微电子有限公司 显示模组和显示装置
CN110286797A (zh) * 2019-06-27 2019-09-27 昆山工研院新型平板显示技术中心有限公司 一种显示面板、显示装置及显示面板的制备方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2613691A (en) * 2021-12-13 2023-06-14 Lg Display Co Ltd Display device
GB2613691B (en) * 2021-12-13 2024-01-03 Lg Display Co Ltd Display device

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