WO2020232834A1 - 彩色滤光基板以及显示装置 - Google Patents

彩色滤光基板以及显示装置 Download PDF

Info

Publication number
WO2020232834A1
WO2020232834A1 PCT/CN2019/099218 CN2019099218W WO2020232834A1 WO 2020232834 A1 WO2020232834 A1 WO 2020232834A1 CN 2019099218 W CN2019099218 W CN 2019099218W WO 2020232834 A1 WO2020232834 A1 WO 2020232834A1
Authority
WO
WIPO (PCT)
Prior art keywords
color filter
filter substrate
groove
black matrix
matrix layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/CN2019/099218
Other languages
English (en)
French (fr)
Inventor
赵朝军
艾飞
龙时宇
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Wuhan China Star Optoelectronics Technology Co Ltd
Original Assignee
Wuhan China Star Optoelectronics Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Wuhan China Star Optoelectronics Technology Co Ltd filed Critical Wuhan China Star Optoelectronics Technology Co Ltd
Priority to US16/613,910 priority Critical patent/US11314121B2/en
Publication of WO2020232834A1 publication Critical patent/WO2020232834A1/zh
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133388—Constructional arrangements; Manufacturing methods with constructional differences between the display region and the peripheral region

Definitions

  • the present disclosure relates to the field of display technology, in particular to a color filter substrate and a display device.
  • the black matrix layer on the side of the existing color filter substrate is directly connected to the outside.
  • the risk of water vapor invading the inside of the display device along the black matrix layer is high, and when laser cutting, the laser contacts the black matrix layer, resulting in edge black matrix
  • the layer is separated from the color filter substrate, reducing the yield.
  • the black matrix layer on the side of the existing color filter substrate is directly connected to the outside.
  • the risk of water vapor invading the inside of the display device along the black matrix layer is high, and when laser cutting, the laser contacts the black matrix layer, resulting in edge black matrix
  • the layer is separated from the color filter substrate, reducing the yield.
  • an object of the present disclosure is to provide a color filter substrate and a display device, which can isolate the direct contact of external water vapor with the black matrix layer and reduce the risk of water vapor intrusion.
  • the present disclosure provides a color filter substrate.
  • the color filter substrate includes a color filter base and a black matrix layer.
  • the color filter substrate includes an effective area and a frame area arranged beside the effective area.
  • the black matrix layer is disposed on the color filter substrate and located in the effective area and part of the frame area.
  • a groove is arranged in the edge of the frame area of the color filter substrate, and the black matrix layer and the edge of the frame area of the color filter substrate are spaced apart from each other by the groove.
  • the black matrix layer is located beside the groove. The thickness of the black matrix layer is equal to the thickness of the groove.
  • the length of the groove is less than 0.7 mm.
  • the length of the frame area of the color filter substrate is equal to 0.7 mm.
  • the edge of the frame area of the color filter substrate is aligned with the laser cutting line.
  • the black matrix layer and the laser cutting line are spaced apart from each other by the groove.
  • the present disclosure also provides a color filter substrate.
  • the color filter substrate includes a color filter base and a black matrix layer.
  • the color filter substrate includes an effective area and a frame area arranged beside the effective area.
  • the black matrix layer is disposed on the color filter substrate and located in the effective area and part of the frame area.
  • a groove is arranged in the edge of the frame area of the color filter substrate, and the black matrix layer and the edge of the frame area of the color filter substrate are spaced apart from each other by the groove.
  • the black matrix layer is located beside the groove.
  • the length of the groove is less than 0.7 mm.
  • the thickness of the black matrix layer is equal to the thickness of the groove.
  • the length of the frame area of the color filter substrate is equal to 0.7 mm.
  • the edge of the frame area of the color filter substrate is aligned with the laser cutting line.
  • the black matrix layer and the laser cutting line are spaced apart from each other by the groove.
  • the disclosure also provides a display device.
  • the display device includes a color filter substrate, a thin film transistor substrate, and a liquid crystal layer.
  • the thin film transistor substrate is opposite to the color filter substrate.
  • the liquid crystal layer is disposed between the color filter substrate and the thin film transistor substrate.
  • the color filter substrate includes a color filter base and a black matrix layer.
  • the color filter substrate includes an effective area and a frame area arranged beside the effective area.
  • the black matrix layer is disposed on the color filter substrate and located in the effective area and part of the frame area.
  • a groove is arranged in the edge of the frame area of the color filter substrate, and the black matrix layer and the edge of the frame area of the color filter substrate are spaced apart from each other by the groove.
  • the display device further includes a protective layer, a first polyimide layer, and a spacer layer arranged on the color filter substrate in sequence.
  • the display device further includes a GOA circuit, a planarization layer, and a second polyimide layer arranged on the thin film transistor substrate in sequence.
  • the black matrix layer is located beside the groove.
  • the length of the groove is less than 0.7 mm.
  • the thickness of the black matrix layer is equal to the thickness of the groove.
  • the length of the frame area of the color filter substrate is equal to 0.7 mm.
  • the edge of the frame area of the color filter substrate is aligned with a laser cutting line, and the black matrix layer and the laser cutting line pass through the groove. Spaced apart from each other.
  • the black matrix layer is disposed on the color filter substrate and is located in the effective area and In part of the frame area, a groove is provided in the edge of the frame area of the color filter substrate, and the black matrix layer and the edge of the frame area of the color filter substrate pass through the groove. The distance from each other can isolate the direct contact between external water vapor and the black matrix layer, and reduce the risk of water vapor intrusion.
  • FIG. 1 shows a schematic diagram of the structure of a color filter substrate according to an embodiment of the present disclosure
  • FIG. 2 shows a schematic structural diagram of a display device according to an embodiment of the present disclosure.
  • an embodiment of the present disclosure provides a color filter substrate 100.
  • the color filter substrate 100 includes a color filter base 110 and a black matrix layer 120.
  • the color filter substrate 110 includes an effective area 112 and a frame area 114 disposed beside the effective area 112.
  • the black matrix layer 120 is disposed on the color filter substrate 110 and located in the effective area 112 and part of the frame area 114.
  • the edge 116 of the frame region 114 of the color filter substrate 110 is provided with a groove 118, and the black matrix layer 120 and the edge 116 of the frame region 114 of the color filter substrate 110 pass through the recess.
  • the grooves 118 are spaced apart from each other to isolate the direct contact between external water vapor and the black matrix layer 120 and reduce the risk of water vapor intrusion.
  • the black matrix layer 120 is located beside the groove 118.
  • the length of the groove 118 is less than 0.7 mm.
  • the thickness of the black matrix layer 120 is equal to the thickness of the groove 118.
  • the length of the frame area 114 of the color filter substrate 110 is equal to 0.7 mm.
  • the edge 116 of the frame area 114 of the color filter substrate 110 is aligned with the laser cutting line 130.
  • the black matrix layer 120 and the laser cutting line 130 are spaced apart from each other by the groove 118.
  • an embodiment of the present disclosure further provides a display device 10.
  • the display device 10 includes the color filter substrate 100, the thin film transistor substrate 200, and the liquid crystal layer 300 as described above.
  • the thin film transistor substrate 200 is arranged opposite to the color filter substrate 100.
  • the liquid crystal layer 300 is disposed between the color filter substrate 100 and the thin film transistor substrate 200.
  • the display device 10 further includes a protective layer 400, a first polyimide layer 500, and a spacer layer 600 arranged on the color filter substrate 100 in sequence.
  • the display device 10 further includes a GOA circuit 700, a planarization layer 800, and a second polyimide layer 900 arranged on the thin film transistor substrate 200 in sequence.
  • the color filter substrate 100 can be divided into 6 film layers, for example, including the black matrix layer 120, red color resist, green color resist, blue color resist, After the protective layer 400 and the spacer layer 600 are coated, the black matrix layer 120 is exposed and developed to remove the black matrix layer 120 at the edge 116 of the frame region 114 of the color filter substrate 110 , The groove 118 is formed.
  • the color filter substrate 100 side forms the groove 118 on the edge 116 of the frame region 114 of the color filter substrate 110 to isolate the black matrix layer 120 contact with outside water vapor to enhance the moisture resistance of narrow border products.
  • the groove 118 on the edge 116 of the frame area 114 of the color filter substrate 110 defects caused by laser cutting can be reduced, and yield can be improved.
  • the black matrix layer is disposed on the color filter substrate and located in the effective area and part of the frame area, the color filter A groove is provided in the edge of the frame area of the substrate, and the black matrix layer and the edge of the frame area of the color filter substrate are spaced apart from each other by the groove, which can isolate external water vapor from the The direct contact of the black matrix layer reduces the risk of water vapor intrusion.

Landscapes

  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Optical Filters (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Liquid Crystal (AREA)

Abstract

本揭示提供了彩色滤光基板以及显示装置。所述彩色滤光基板包括彩色滤光基底以及黑色矩阵层。所述彩色滤光基底包括有效区和设置在所述有效区旁的边框区。所述黑色矩阵层设置于所述彩色滤光基底上并位于所述有效区和部分所述边框区内。所述彩色滤光基底的边框区的边缘内设置有凹槽。

Description

彩色滤光基板以及显示装置 技术领域
本揭示涉及显示技术领域，特别涉及一种彩色滤光基板以及显示装置。
 背景技术
现有的彩色滤光基板侧的黑色矩阵层直接与外界相连，水汽沿所述黑色矩阵层侵入显示装置内部的风险性高，且镭射切割时，激光接触所述黑色矩阵层，导致边缘黑色矩阵层与彩色滤光基板脱离，降低良率。
故，有需要提供一种彩色滤光基板以及显示装置，以解决现有技术存在的问题。
 技术问题
现有的彩色滤光基板侧的黑色矩阵层直接与外界相连，水汽沿所述黑色矩阵层侵入显示装置内部的风险性高，且镭射切割时，激光接触所述黑色矩阵层，导致边缘黑色矩阵层与彩色滤光基板脱离，降低良率。
 技术解决方案
为解决上述技术问题，本揭示的一目的在于提供一彩色滤光基板以及显示装置，其能够隔绝外界水汽与所述黑色矩阵层的直接接触，降低水汽侵入风险。
达成上述目的，本揭示提供一彩色滤光基板。所述彩色滤光基板包括彩色滤光基底以及黑色矩阵层。所述彩色滤光基底包括有效区和设置在所述有效区旁的边框区。所述黑色矩阵层设置于所述彩色滤光基底上并位于所述有效区和部分所述边框区内。所述彩色滤光基底的边框区的边缘内设置有凹槽，所述黑色矩阵层与所述彩色滤光基底的所述边框区的所述边缘通过所述凹槽而彼此间隔开。所述黑色矩阵层位于所述凹槽旁。所述黑色矩阵层的厚度等于所述凹槽的厚度。
于本揭示其中的一实施例中，所述凹槽的长度小于0.7mm。
于本揭示其中的一实施例中，所述彩色滤光基底的所述边框区的长度等于0.7mm。
于本揭示其中的一实施例中，所述彩色滤光基底的所述边框区的所述边缘与雷射切割线对齐。
于本揭示其中的一实施例中，所述黑色矩阵层与所述雷射切割线通过所述凹槽而彼此间隔开。
本揭示还提供一彩色滤光基板。所述彩色滤光基板包括彩色滤光基底以及黑色矩阵层。所述彩色滤光基底包括有效区和设置在所述有效区旁的边框区。所述黑色矩阵层设置于所述彩色滤光基底上并位于所述有效区和部分所述边框区内。所述彩色滤光基底的边框区的边缘内设置有凹槽，所述黑色矩阵层与所述彩色滤光基底的所述边框区的所述边缘通过所述凹槽而彼此间隔开。
于本揭示其中的一实施例中，所述黑色矩阵层位于所述凹槽旁。
于本揭示其中的一实施例中，所述凹槽的长度小于0.7mm。
于本揭示其中的一实施例中，所述黑色矩阵层的厚度等于所述凹槽的厚度。
于本揭示其中的一实施例中，所述彩色滤光基底的所述边框区的长度等于0.7mm。
于本揭示其中的一实施例中，所述彩色滤光基底的所述边框区的所述边缘与雷射切割线对齐。
于本揭示其中的一实施例中，所述黑色矩阵层与所述雷射切割线通过所述凹槽而彼此间隔开。
本揭示还提供一显示装置。所述显示装置包括彩色滤光基板、薄膜晶体管基板以及液晶层。所述薄膜晶体管基板与所述彩色滤光基板相对设置。所述液晶层设置于所述彩色滤光基板和所述薄膜晶体管基板之间。所述彩色滤光基板包括彩色滤光基底以及黑色矩阵层。所述彩色滤光基底包括有效区和设置在所述有效区旁的边框区。所述黑色矩阵层设置于所述彩色滤光基底上并位于所述有效区和部分所述边框区内。所述彩色滤光基底的边框区的边缘内设置有凹槽，所述黑色矩阵层与所述彩色滤光基底的所述边框区的所述边缘通过所述凹槽而彼此间隔开。
于本揭示其中的一实施例中，所述显示装置还包括保护层、第一聚酰亚胺层和间隔层依次述设置在所述彩色滤光基板上。
于本揭示其中的一实施例中，所述显示装置还包括GOA电路、平坦层和第二聚酰亚胺层依次述设置在所述薄膜晶体管基板上。
于本揭示其中的一实施例中，所述黑色矩阵层位于所述凹槽旁。
于本揭示其中的一实施例中，所述凹槽的长度小于0.7mm。
于本揭示其中的一实施例中，所述黑色矩阵层的厚度等于所述凹槽的厚度。
于本揭示其中的一实施例中，所述彩色滤光基底的所述边框区的长度等于0.7mm。
于本揭示其中的一实施例中，所述彩色滤光基底的所述边框区的所述边缘与雷射切割线对齐，所述黑色矩阵层与所述雷射切割线通过所述凹槽而彼此间隔开。
 有益效果
相较于现有技术，为解决上述技术问题，本揭示的实施例中的彩色滤光基板以及显示装置中，所述黑色矩阵层设置于所述彩色滤光基底上并位于所述有效区和部分所述边框区内，所述彩色滤光基底的边框区的边缘内设置有凹槽，所述黑色矩阵层与所述彩色滤光基底的所述边框区的所述边缘通过所述凹槽而彼此间隔开，能够隔绝外界水汽与所述黑色矩阵层的直接接触，降低水汽侵入风险。
 附图说明
图1显示根据本揭示的一实施例的彩色滤光基板的结构示意图；以及
图2显示根据本揭示的一实施例的显示装置的结构示意图。
 本发明的最佳实施方式
以下各实施例的说明是参考附加的图式，用以例示本揭示可用以实施的特定实施例。
为了让本揭示的上述及其他目的、特征、优点能更明显易懂，下文将特举本揭示优选实施例，并配合所附图式，作详细说明如下。再者，本揭示所提到的方向用语，例如上、下、顶、底、前、后、左、右、内、外、侧层、周围、中央、水平、横向、垂直、纵向、轴向、径向、最上层或最下层等，仅是参考附加图式的方向。因此，使用的方向用语是用以说明及理解本揭示，而非用以限制本揭示。
在图中，结构相似的单元是以相同标号表示。
参照图1，本揭示的一实施例提供彩色滤光基板100。所述彩色滤光基板100包括彩色滤光基底110以及黑色矩阵层120。所述彩色滤光基底110包括有效区112和设置在所述有效区112旁的边框区114。所述黑色矩阵层120设置于所述彩色滤光基底110上并位于所述有效区112和部分所述边框区114内。所述彩色滤光基底110的边框区114的边缘116内设置有凹槽118，所述黑色矩阵层120与所述彩色滤光基底110的所述边框区114的所述边缘116通过所述凹槽118而彼此间隔开，能够隔绝外界水汽与所述黑色矩阵层120的直接接触，降低水汽侵入风险。
于本揭示其中的一实施例中，所述黑色矩阵层120位于所述凹槽118旁。所述凹槽118的长度小于0.7mm。所述黑色矩阵层120的厚度等于所述凹槽118的厚度。
于本揭示其中的一实施例中，所述彩色滤光基底110的所述边框区114的长度等于0.7mm。所述彩色滤光基底110的所述边框区114的所述边缘116与雷射切割线130对齐。
于本揭示其中的一实施例中，所述黑色矩阵层120与所述雷射切割线130通过所述凹槽118而彼此间隔开。
参照图2，本揭示的一实施例还提供一显示装置10。所述显示装置10包括如上所述的彩色滤光基板100、薄膜晶体管基板200以及液晶层300。所述薄膜晶体管基板200与所述彩色滤光基板100相对设置。所述液晶层300设置于所述彩色滤光基板100和所述薄膜晶体管基板200之间。
于本揭示其中的一实施例中，所述显示装置10还包括保护层400、第一聚酰亚胺层500和间隔层600依次述设置在所述彩色滤光基板100上。
于本揭示其中的一实施例中，所述显示装置10还包括GOA电路700、平坦层800和第二聚酰亚胺层900依次述设置在所述薄膜晶体管基板200上。
于本揭示其中的一实施例中，所述彩色滤光基板100生产过程中，可分为6道膜层，例如包括所述黑色矩阵层120、红色色阻、绿色色阻、蓝色色阻、所述保护层400和所述间隔层600, 所述黑色矩阵层120涂布后进行曝光显影除去所述彩色滤光基底110的所述边框区114的所述边缘116的所述黑色矩阵层120，形成所述凹槽118。
于本揭示其中的一实施例中，所述彩色滤光基板100侧在所述彩色滤光基底110的所述边框区114的所述边缘116形成所述凹槽118，隔绝所述黑色矩阵层120与外界水汽的接触来增强窄边框产品的抗湿性。通过在所述彩色滤光基底110的所述边框区114的所述边缘116形成所述凹槽118可降低因镭射切割导致的不良，提升良率。
由于本揭示的实施例中的彩色滤光基板以及显示装置中，所述黑色矩阵层设置于所述彩色滤光基底上并位于所述有效区和部分所述边框区内，所述彩色滤光基底的边框区的边缘内设置有凹槽，所述黑色矩阵层与所述彩色滤光基底的所述边框区的所述边缘通过所述凹槽而彼此间隔开，能够隔绝外界水汽与所述黑色矩阵层的直接接触，降低水汽侵入风险。
尽管已经相对于一个或多个实现方式示出并描述了本揭示，但是本领域技术人员基于对本说明书和附图的阅读和理解将会想到等价变型和修改。本揭示包括所有这样的修改和变型，并且仅由所附权利要求的范围限制。特别地关于由上述组件执行的各种功能，用于描述这样的组件的术语旨在对应于执行所述组件的指定功能（例如其在功能上是等价的）的任意组件（除非另外指示），即使在结构上与执行本文所示的本说明书的示范性实现方式中的功能的公开结构不等同。此外，尽管本说明书的特定特征已经相对于若干实现方式中的仅一个被公开，但是这种特征可以与如可以对给定或特定应用而言是期望和有利的其他实现方式的一个或多个其他特征组合。而且，就术语“包括”、“具有”、“含有”或其变形被用在具体实施方式或权利要求中而言，这样的术语旨在以与术语“包含”相似的方式包括。
以上仅是本揭示的优选实施方式，应当指出，对于本领域普通技术人员，在不脱离本揭示原理的前提下，还可以做出若干改进和润饰，这些改进和润饰也应视为本揭示的保护范围。

Claims (20)

  1. 一种彩色滤光基板，包括:
    彩色滤光基底，包括有效区和设置在所述有效区旁的边框区；以及
    黑色矩阵层，设置于所述彩色滤光基底上并位于所述有效区和部分所述边框区内；
    其中所述彩色滤光基底的边框区的边缘内设置有凹槽，所述黑色矩阵层与所述彩色滤光基底的所述边框区的所述边缘通过所述凹槽而彼此间隔开；
    其中所述黑色矩阵层位于所述凹槽旁；以及
    其中所述黑色矩阵层的厚度等于所述凹槽的厚度。
  2. 如权利要求1所述的彩色滤光基板，其中所述凹槽的长度小于0.7mm。
  3. 如权利要求1所述的彩色滤光基板，其中所述彩色滤光基底的所述边框区的长度等于0.7mm。
  4. 如权利要求1所述的彩色滤光基板，其中所述彩色滤光基底的所述边框区的所述边缘与雷射切割线对齐。
  5. 如权利要求4所述的彩色滤光基板，其中所述黑色矩阵层与所述雷射切割线通过所述凹槽而彼此间隔开。
  6. 一种彩色滤光基板，包括:
    彩色滤光基底，包括有效区和设置在所述有效区旁的边框区；以及
    黑色矩阵层，设置于所述彩色滤光基底上并位于所述有效区和部分所述边框区内；
    其中所述彩色滤光基底的边框区的边缘内设置有凹槽，所述黑色矩阵层与所述彩色滤光基底的所述边框区的所述边缘通过所述凹槽而彼此间隔开。
  7. 如权利要求6所述的彩色滤光基板，其中所述黑色矩阵层位于所述凹槽旁。
  8. 如权利要求6所述的彩色滤光基板，其中所述凹槽的长度小于0.7mm。
  9. 如权利要求6所述的彩色滤光基板，其中所述黑色矩阵层的厚度等于所述凹槽的厚度。
  10.     如权利要求6所述的彩色滤光基板，其中所述彩色滤光基底的所述边框区的长度等于0.7mm。
  11.      如权利要求6所述的彩色滤光基板，其中所述彩色滤光基底的所述边框区的所述边缘与雷射切割线对齐。
  12.     如权利要求11所述的彩色滤光基板，其中所述黑色矩阵层与所述雷射切割线通过所述凹槽而彼此间隔开。
  13.     一种显示装置，包括:
    彩色滤光基板；
    薄膜晶体管基板，与所述彩色滤光基板相对设置；以及
    液晶层，设置于所述彩色滤光基板和所述薄膜晶体管基板之间；
    其中所述彩色滤光基板包括:
    彩色滤光基底，包括有效区和设置在所述有效区旁的边框区；以及
    黑色矩阵层，设置于所述彩色滤光基底上并位于所述有效区和部分所述边框区内；
    其中所述彩色滤光基底的边框区的边缘内设置有凹槽，所述黑色矩阵层与所述彩色滤光基底的所述边框区的所述边缘通过所述凹槽而彼此间隔开。
  14.     如权利要求13所述的显示装置，还包括保护层、第一聚酰亚胺层和间隔层依次述设置在所述彩色滤光基板上。
  15.     如权利要求14所述的显示装置，还包括GOA电路、平坦层和第二聚酰亚胺层依次述设置在所述薄膜晶体管基板上。
  16.     如权利要求13所述的显示装置，其中所述黑色矩阵层位于所述凹槽旁。
  17.     如权利要求13所述的显示装置，其中所述凹槽的长度小于0.7mm。
  18.     如权利要求13所述的显示装置，其中所述黑色矩阵层的厚度等于所述凹槽的厚度。
  19.     如权利要求13所述的显示装置，其中所述彩色滤光基底的所述边框区的长度等于0.7mm。
  20.     如权利要求13所述的显示装置，其中所述彩色滤光基底的所述边框区的所述边缘与雷射切割线对齐，所述黑色矩阵层与所述雷射切割线通过所述凹槽而彼此间隔开。
PCT/CN2019/099218 2019-05-20 2019-08-05 彩色滤光基板以及显示装置 Ceased WO2020232834A1 (zh)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US16/613,910 US11314121B2 (en) 2019-05-20 2019-08-05 Color filter substrate and display device

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN201910419188.6 2019-05-20
CN201910419188.6A CN110161744A (zh) 2019-05-20 2019-05-20 彩色滤光基板以及显示装置

Publications (1)

Publication Number Publication Date
WO2020232834A1 true WO2020232834A1 (zh) 2020-11-26

Family

ID=67631595

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/CN2019/099218 Ceased WO2020232834A1 (zh) 2019-05-20 2019-08-05 彩色滤光基板以及显示装置

Country Status (3)

Country Link
US (1) US11314121B2 (zh)
CN (1) CN110161744A (zh)
WO (1) WO2020232834A1 (zh)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115331542B (zh) * 2021-05-11 2025-04-11 群创光电股份有限公司 光学基板及其制作方法

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6492700B1 (en) * 2001-09-12 2002-12-10 Hannstar Display Corp. Thin film transistor liquid crystal display device
CN101295090A (zh) * 2007-04-27 2008-10-29 群康科技(深圳)有限公司 液晶显示装置
CN102314027A (zh) * 2010-06-30 2012-01-11 上海天马微电子有限公司 液晶显示面板
CN105607339A (zh) * 2016-03-30 2016-05-25 京东方科技集团股份有限公司 显示基板及其制作方法、显示装置
CN106249466A (zh) * 2016-10-11 2016-12-21 京东方科技集团股份有限公司 显示母板及其切割方法
CN106597734A (zh) * 2017-02-22 2017-04-26 北京京东方光电科技有限公司 显示基板及显示装置

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102455551B (zh) * 2010-10-18 2015-05-20 京东方科技集团股份有限公司 彩膜基板及其制造方法、液晶面板和液晶显示器
JP2013225033A (ja) * 2012-04-23 2013-10-31 Japan Display Inc 表示装置及びその製造方法
CN203337945U (zh) * 2013-06-25 2013-12-11 合肥京东方光电科技有限公司 显示面板和液晶显示装置
JP6502715B2 (ja) * 2015-03-25 2019-04-17 株式会社ジャパンディスプレイ 表示装置
CN105425457A (zh) * 2016-01-04 2016-03-23 京东方科技集团股份有限公司 一种液晶面板及显示装置
CN105954922A (zh) * 2016-07-13 2016-09-21 武汉华星光电技术有限公司 一种彩膜基板及液晶面板

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6492700B1 (en) * 2001-09-12 2002-12-10 Hannstar Display Corp. Thin film transistor liquid crystal display device
CN101295090A (zh) * 2007-04-27 2008-10-29 群康科技(深圳)有限公司 液晶显示装置
CN102314027A (zh) * 2010-06-30 2012-01-11 上海天马微电子有限公司 液晶显示面板
CN105607339A (zh) * 2016-03-30 2016-05-25 京东方科技集团股份有限公司 显示基板及其制作方法、显示装置
CN106249466A (zh) * 2016-10-11 2016-12-21 京东方科技集团股份有限公司 显示母板及其切割方法
CN106597734A (zh) * 2017-02-22 2017-04-26 北京京东方光电科技有限公司 显示基板及显示装置

Also Published As

Publication number Publication date
US11314121B2 (en) 2022-04-26
CN110161744A (zh) 2019-08-23
US20210364850A1 (en) 2021-11-25

Similar Documents

Publication Publication Date Title
US20200227681A1 (en) Array substrates, manufacturing methods thereof and display panels
US20150380442A1 (en) Array substrate and display device
WO2013152602A1 (zh) 彩膜基板及其制造方法、以及液晶显示器
WO2019085057A1 (zh) 液晶显示面板以及液晶显示装置
WO2018000808A1 (zh) 显示基板及其制作方法、显示装置
US11637133B2 (en) Array substrate and method of manufacturing same
WO2018228109A1 (zh) 一种coa基板及其制作方法、显示面板、显示装置
CN103926752B (zh) 一种液晶显示器、平面转换模式的阵列基板及其制造方法
WO2018166133A1 (zh) 显示基板和显示面板
WO2014131238A1 (zh) 阵列基板及其制作方法、显示面板及其制作方法
US9753342B2 (en) Color filter array substrate, display device and manufacturing method of color filter array substrate
US20150002793A1 (en) Liquid crystal cell and method for manufacturing the same
WO2021248550A1 (zh) 显示面板及其制作方法
CN205920296U (zh) 阵列基板及包含其的显示面板
WO2021012343A1 (zh) 有机发光器件和有机发光显示装置
US9196631B1 (en) Array substrate and method for manufacturing the same, and display device
TW202041927A (zh) 顯示面板
CN205787504U (zh) 一种阵列基板及显示装置
WO2020232834A1 (zh) 彩色滤光基板以及显示装置
CN104678666A (zh) 显示面板及其制备方法
US20190004351A1 (en) Display panel, manufacturing method thereof and display device
WO2021208146A1 (zh) 一种显示面板及显示装置
CN102955289A (zh) 一种彩膜基板及其制作方法、显示面板、显示装置
CN110673386A (zh) 一种阵列基板及液晶显示面板
US20180246370A1 (en) Method for manufacturing liquid crystal display panel

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 19929339

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 19929339

Country of ref document: EP

Kind code of ref document: A1