WO2020211183A1 - 一种可光固化氧化石墨烯及其制备方法 - Google Patents

一种可光固化氧化石墨烯及其制备方法 Download PDF

Info

Publication number
WO2020211183A1
WO2020211183A1 PCT/CN2019/091166 CN2019091166W WO2020211183A1 WO 2020211183 A1 WO2020211183 A1 WO 2020211183A1 CN 2019091166 W CN2019091166 W CN 2019091166W WO 2020211183 A1 WO2020211183 A1 WO 2020211183A1
Authority
WO
WIPO (PCT)
Prior art keywords
graphene oxide
reaction
photocurable
anhydrous
add
Prior art date
Application number
PCT/CN2019/091166
Other languages
English (en)
French (fr)
Other versions
WO2020211183A9 (zh
Inventor
王莉
张书源
罗钰
李莹涛
张皓
裴跃琛
冯学明
周正友
卢秉恒
Original Assignee
西安交通大学
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 西安交通大学 filed Critical 西安交通大学
Publication of WO2020211183A1 publication Critical patent/WO2020211183A1/zh
Publication of WO2020211183A9 publication Critical patent/WO2020211183A9/zh

Links

Images

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Definitions

  • the invention belongs to the technical field of light curing, and specifically relates to a light curable graphene oxide and a preparation method thereof.
  • Stereo lithography As a classic rapid prototyping technology, has attracted widespread attention due to its high efficiency, good precision resolution, excellent density, and the ability to print complex shapes. But oligomers (printing raw materials) have become the biggest bottleneck that affects the overall performance of photocured products.
  • Graphene oxide has received extensive attention from scientists because of its excellent water solubility, active and easily modified chemical functional groups, excellent biocompatibility and flexibility.
  • Graphene is usually dispersed in a light-curable resin as a nanofiller to enhance the performance of composite materials, but as the proportion of graphene in the composite material increases, it will lead to a decrease in photosensitivity, a decrease in curing speed, and easy separation of photosensitive resin and graphene And a series of problems such as reduced reaction efficiency.
  • graphene oxide uses simple and efficient chemical synthesis reactions to modify appropriate functional groups to make light-curable materials to directly possess light-curable properties.
  • the purpose of the present invention is to overcome the above-mentioned shortcomings of the prior art and provide a photocurable graphene oxide and a preparation method thereof.
  • the method obtains hydroxyl-rich graphene oxide by oxidizing graphene oxide with characteristic functional groups, and by reacting the hydroxyl groups on the graphene oxide with isocyanohydrin to graft photosensitive groups to obtain water-soluble photocurable biocompatibility Excellent graphene oxide resin.
  • a photocurable graphene oxide the chemical structural formula of the photocurable graphene oxide is:
  • R is a graphene oxide carbocyclic ring.
  • a preparation method of photocurable graphene oxide said photocurable graphene oxide is made by reacting anhydrous hydroxylated graphene oxide and isocyanoethyl methacrylate. Before the reaction, anhydrous hydroxylated Graphene oxide and isocyanoethyl methacrylate are mixed in equal stoichiometry.
  • lithium bromide or lithium chloride is used as a catalyst
  • anhydrous dimethyl sulfoxide is used as a solvent
  • the mixing ratio of the catalyst and anhydrous dimethyl sulfoxide is 1 g: (100-150) mL.
  • the catalyst and the reaction vessel are baked and dried.
  • the reaction temperature is 50-80°C.
  • the reaction system after the reaction is mixed with the cleaning solution, and the reaction product is obtained by centrifugal separation.
  • the reaction product is processed by the freeze-drying method or the vacuum drying method, a photocurable graphite oxide with biocompatibility and water solubility is obtained.
  • the anhydrous hydroxylated graphene oxide is made by mixing graphene oxide and hydrogen peroxide in a ratio of 1g: (1-5) mL and reacting. The entire reaction process is catalyzed by light irradiation. After the reaction is completed, the reaction product is obtained. ; The reaction product is washed and dried to obtain anhydrous rich hydroxylated graphene oxide.
  • the reaction process of graphene oxide and hydrogen peroxide uses FeCl 3 aqueous solution as a catalyst, anhydrous ethanol as a solvent, the volume ratio of FeCl 3 aqueous solution to anhydrous ethanol is 1: (3-10), the mass of FeCl 3 aqueous solution The concentration is 3% to 7%.
  • the starting and process temperature of the reaction between graphene oxide and hydrogen peroxide is 65-85°C.
  • the temperature of the entire reaction system is reduced to below 30°C to obtain the reaction product; the entire reaction process is filtered through cut-off Xenon lamp irradiation of the device.
  • the wavelength of the cut-off filter is> 400 nm.
  • the present invention has the following beneficial effects:
  • the invention discloses a photocurable graphene oxide.
  • the graphene is grafted with water-soluble graphene oxide on the basis of a photocurable group—methacrylic acid group, so that the graphene oxide and methyl Isocyanoethyl acrylate undergoes a prepolymerization reaction to form photocurable graphene oxide with biocompatibility and water solubility.
  • the photocurable graphene oxide retains methacrylic acid groups, making the material still photosensitive Compatibility and biocompatibility, and because it is not the existing blending reaction (the reaction raw materials are simply blended together), but the grafting reaction of the hydroxyl group and the isocyanohydrin radical, the internal structure of the substance is changed, making When the prepared material is applied to photolithography and photocuring, the problems of reduced curing speed and reduced photosensitivity will not occur, and the photocuring can be prepared normally.
  • the invention also discloses a preparation method of photocurable graphene oxide.
  • the preparation method obtains hydroxyl-rich graphene oxide by oxidizing graphene, and reacts with the hydroxyl groups on the graphene oxide and isocyano alcohol radicals.
  • the hydrophilic group is grafted to obtain a graphene oxide resin that is water-soluble, photocurable and has excellent biocompatibility.
  • the reaction temperature is controlled at 50-80°C to satisfy the reaction conditions.
  • the preparation method of the graphene oxide uses hydrogen peroxide and light irradiation to catalyze the photochemical reaction of the graphene oxide, and finally passes through the vacuum drying oven. Dry, remove the water in the hydroxy-rich graphene oxide to prepare anhydrous hydroxy-rich graphene oxide; this preparation method uses photocatalysis to make the graphene oxide in the hydrogen peroxide attach more hydroxyl groups, which is used for preparing the final product Ready to work.
  • the FeCl 3 aqueous solution is used as a catalyst while light is irradiated.
  • the entire reaction proceeds smoothly, and the reaction product is hydroxyl-rich graphene oxide.
  • the start and end of the reaction are controlled.
  • the photocatalyst used is a specific catalyst, which can promote the occurrence of the reaction.
  • Figure 1 is an XRD pattern of the hydroxyl-rich graphene oxide prepared in the present invention
  • Figure 2 is a Fourier infrared spectrogram of the photocurable graphene oxide prepared in the present invention
  • Figure 3 is a macroscopic view of the photocurable graphene oxide prepared in the present invention after photocuring
  • the present invention discloses a photocurable graphene oxide and a preparation method thereof; see the following formula (1), the method utilizes oxidation containing more hydroxyl groups Graphene is used as a reactant, and the isocyanate in 2-isocyanoethyl methacrylate reacts with the hydroxyl groups on the surface of graphene oxide, and the hydroxyl-rich graphene oxide is connected through the prepolymerization reaction.
  • Groups with biocompatibility: 2-methacrylic acid, the remaining oxygen-containing functional groups in graphene oxide make it highly water-soluble, thereby synthesizing a graphene oxide with excellent water-soluble and photocurable properties Modified resin.
  • R in the above formula is a graphene oxide carbocyclic ring.
  • the preparation method of the product of the present invention specifically includes the following steps:
  • the ratio of graphene oxide and hydrogen peroxide added is 1g: (1 ⁇ 5)mL to form a mixed solution A; after stirring, add FeCl 3 aqueous solution as a catalyst, the amount of FeCl 3 added and anhydrous ethanol
  • the volume ratio is 1: (3 ⁇ 10), and the mass concentration of FeCl 3 aqueous solution is 3% ⁇ 7% to ensure that the graphene oxide flakes can be fully dissolved to form reaction system B; heat the water bath of reaction system B to 65-85 °C, continue to stir and irradiate with a 300W xenon lamp and a cut-off filter for 2 hours.
  • the cut-off filter requires a wavelength of> 400nm to cause photocatalysis and make the hydroxyl group adhere to the carbon of the graphene oxide.
  • the graphene oxide is prepared through the above steps, and the graphene oxide in the hydrogen peroxide has more hydroxyl groups attached through photocatalysis, which is the next step.
  • the entire reaction proceeded smoothly, and the reaction product C was obtained as rich Hydroxyl graphene oxide is dried in a vacuum drying box to remove water in the hydroxyl-rich graphene oxide to prepare anhydrous hydroxyl-rich graphene oxide.
  • the reaction vessel needs to be dried in an oven at 150°C for 24 hours to remove moisture before use.
  • the reaction vessel in the present invention is a round bottom flask; the catalyst needs to be dried in an oven at 150°C for 24 hours to remove moisture before use.
  • the dried catalyst was placed in a dried round bottom flask, and anhydrous dimethyl sulfoxide was added as a solvent.
  • the ratio of the added catalyst to anhydrous dimethyl sulfoxide was 1g: (100 ⁇ 150) mL, and the catalyst was Stir the lithium bromide or lithium chloride evenly.
  • the cleaning solution is cold ethanol, acetone or a mixture of the two; centrifuge for 2-3 times at a centrifuge speed of 6 ⁇ 10kr/min, the centrifugation temperature is 2 ⁇ 20°C, the reaction product E is obtained by centrifugation, the supernatant is removed, and the reaction product E is treated by freeze-drying or vacuum drying to obtain a pure, biocompatible and water-soluble Light-curable graphene oxide.
  • the baking and drying treatment is carried out to prevent the formation of by-products during the reaction process, and to improve the generation rate and purity of the reactants.
  • the reaction temperature is controlled at 50-80°C to satisfy the reaction conditions.
  • the isocyanoate in the isocyanoethyl methacrylate reacts with the hydroxyl group on the surface of the graphene oxide, and the biocompatible group 2-methyl is attached through the prepolymerization reaction.
  • Acrylic acid, the remaining oxygen-containing functional groups in graphene oxide make it highly water-soluble, thereby synthesizing a biocompatible and water-soluble photo-curable graphene oxide.
  • the photocurable graphene oxide with biocompatibility and water solubility prepared by this method can be used for photolithography and photocurable graphene oxide patterned structures.
  • the specific steps are: take biocompatible water-soluble photocurable graphene oxide Put the alkene into a 100mL beaker, start stirring, add appropriate amount of solvent and photoinitiator, the solvent is 2,2,2-trifluoroethanol, tetrahydrofuran or its aqueous solution, and the photoinitiator is Irgacure 2959 or Darocur 1173 or (2, 4,6-trimethylbenzoyl chloride) diphenyl phosphine oxide or photoinitiator 819.
  • the mixed solution into a vacuum chamber with a pressure of -1MPa to remove stirring bubbles, and coat it on The surface of the substrate (glass/Si/PDMS/PI) is dried on a hot plate at 70 ⁇ 100°C for 5 minutes. After the drying is complete, put it in the photoetching machine together with the mask for UV curing, and put it into development after completion
  • the developer is an aqueous sodium hydroxide solution with a mass concentration of 0.1-0.5%, and the graphene oxide patterned structured resin film can be obtained.
  • directly use the SLA or DLP3D printer to directly print the three-dimensional structure or pattern, using this method does not require the above drying step.
  • Xaar micro-infrared spectrometer can be used to be biocompatible and photocurable Fourier transform infrared spectroscopy (FTIR) of the graphene oxide modified resin, analysis of the synthesized powder (1.0 mg), and data collection between 4000-350 cm -1 and scanning with a spatial resolution of 4 microns, obtained Figure 2 shows; from Figure 2 it can be seen that graphene oxide containing methacrylic acid groups is generated.
  • FTIR Fourier transform infrared spectroscopy
  • the film plate is put into the lithography machine for UV curing, and then put into the developer solution to obtain the graphene oxide patterned structure resin film; after synthesis, the patterned electrode pattern shown in Figure 3 is obtained, using SU -8010 field emission scanning electron microscope under 10.0kV acceleration voltage to observe the patterned electrode boundary by scanning electron microscope (SEM), as shown in Figure 4; the material prepared from Figure 3 and Figure 4 has clear boundaries and photocurable properties it is good.
  • SEM scanning electron microscope

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Carbon And Carbon Compounds (AREA)
  • Battery Electrode And Active Subsutance (AREA)
  • Paints Or Removers (AREA)
  • Polymerisation Methods In General (AREA)

Abstract

提供一种可光固化氧化石墨烯及其制备方法,该可光固化氧化石墨烯的化学结构式如(A)。其中,R为氧化石墨烯碳环。其制备方法为,由无水富羟基氧化石墨烯和甲基丙烯酸酯异氰基乙酯反应,形成具备生物兼容性和水溶性的可光固化氧化石墨烯分子。该可光固化氧化石墨烯因保存有甲基丙烯酸基团,使得该物质仍然具有光敏性,且因为羟基基团与异氰基醇根接枝反应,从物质的内部结构进行了改变,使得制备出的物质应用于光刻及光固化时,不会发生固化速度降低和光敏性降低的问题,能够正常的进行光固化的制备。

Description

一种可光固化氧化石墨烯及其制备方法 【技术领域】
本发明属于光固化技术领域,具体涉及一种可光固化氧化石墨烯及其制备方法。
【背景技术】
立体光刻(SLA)作为一种经典的快速成型技术,由于其效率高、精度分辨率好、致密度优以及可以打印复杂形状等优点,因此得到了广泛的关注。但低聚物(打印原材料)成为影响光固化产物综合性能最大的瓶颈。氧化石墨烯因其具备优异的水溶性、活泼易修饰化学官能团、卓越的生物兼容性以及柔韧性等良好的性能,得到了科学家们的广泛关注。石墨烯通常被分散在可光固化树脂中作为纳米填料增强复合材料的性能,但随着石墨烯所占复合材料比例的增高,会导致光敏性降低、固化速度降低、光敏树脂与石墨烯易分离以及反应效率降低等一系列问题。截止目前,鲜有报道将氧化石墨烯利用简单高效的化学合成反应修饰适当官能团用来制造光固化材料,使其直接具备光固化性质。
【发明内容】
本发明的目的在于克服上述现有技术的缺点,提供一种可光固化氧化石墨烯及其制备方法。该方法通过对氧化石墨烯进行特征官能团氧化得到富羟基氧化石墨烯,通过氧化石墨烯上的羟基基团与异氰基醇根反应,接枝光敏基团,得到水溶性可光固化生物兼容性优异的氧化石墨烯树脂。
为达到上述目的,本发明采用以下技术方案予以实现:
一种可光固化氧化石墨烯,所述可光固化氧化石墨烯的化学结构式为:
Figure PCTCN2019091166-appb-000001
其中,R为氧化石墨烯碳环。
一种可光固化氧化石墨烯的制备方法,所述可光固化氧化石墨烯由无水富羟基化氧化石墨烯和甲基丙烯酸异氰基乙酯反应制成,反应前,无水富羟基化氧化石墨烯和甲基丙烯酸异氰基乙酯按照等化学计量混合。
本发明的进一步改进在于:
优选的,制备过程中以溴化锂或氯化锂为催化剂,以无水二甲基亚砜为溶剂,催化剂和无水二甲基亚砜的混合比例为1g:(100~150)mL。
优选的,反应前,催化剂和反应容器通过烘烤干燥处理。
优选的,反应温度为50~80℃。
优选的,反应结束后的反应体系与清洗液混合后,离心分离得到反应产物,将反应产物通过冻干法或真空干燥法处理后,制得具备生物兼容性和水溶性的可光固化氧化石墨烯。
优选的,无水富羟基化氧化石墨烯由氧化石墨烯和过氧化氢按照比例1g:(1~5)mL混合后反应制成,整个反应过程通过光照射催化,反应结束后,得到反应产物;将反应产物洗涤并干燥后制得无水富羟基化氧化石墨烯。
优选的,氧化石墨烯和过氧化氢的反应过程以FeCl 3水溶液作为催化剂,无水乙醇作为溶剂,FeCl 3水溶液和无水乙醇的体积比为1:(3~10),FeCl 3水溶液的质量浓度为3%~7%。
优选的,氧化石墨烯和过氧化氢的反应开始和过程温度为65~85℃,将反应结束后,整个反应体系的温度降至30℃以下,得到反应产物;整个反应过程中通过截止滤光器的氙灯照射。
优选的,所述截止滤光器的波长>400nm。
与现有技术相比,本发明具有以下有益效果:
本发明公开了一种可光固化氧化石墨烯,该石墨烯在具有可光固化的基团—甲基丙烯酸基团的基础上,接枝具备水溶性的氧化石墨烯,使得氧化石墨烯和甲基丙烯酸异氰基乙酯发生预聚反应,形成具备生物兼容性和水溶性的可光固化氧化石墨烯,该可光固化氧化石墨烯因保存有甲基丙烯酸基团,使得该物质仍然具有光敏性和生物兼容性,且因为不是现有掺和反应(反应原材料简单的掺和在一起),而是羟基基团与异氰基醇根接枝反应,从物质的内部结构进行了改变,使得制备出的物质应用于光刻及光固化时,不会发生固化速度降低和光敏性降低的问题,能够正常的进行光固化的制备。
本发明还公开了一种可光固化氧化石墨烯的制备方法,该制备方法通过对石墨烯进行氧化得到富羟基氧化石墨烯,通过氧化石墨烯上的羟基基团与异氰基醇根反应,接枝亲水基团,得到水溶性可光固化且生物兼容性优异的氧化石墨烯树脂。
进一步的,反应前无论是反应容器、催化剂还是反应物,均要求无水,因此进行烘烤干燥处理,防止反应过程中生成副产物,提高反应物的生成率和纯度。反应过程中控制反应温度在50~80℃,使得满足反应条件。
进一步的,现有的氧化石墨烯表面虽然附着有羟基,但含量较少,该氧化石墨烯的制备方法通过对氧化石墨烯使用过氧化氢和光照射催化发生光化学反应, 最终通过真空干燥箱中的干燥,去除富羟基氧化石墨烯中的水,制备无水富羟基氧化石墨烯;该制备方法通过光催化作用,使得过氧化氢中的氧化石墨烯附着有较多的羟基,为制备终产物做准备工作。
进一步的,反应过程在光照射的同时以FeCl 3水溶液作为催化剂,在光催化和化学催化剂(FeCl 3)的双重作用下,使得整个反应顺利进行,得到反应产物即为富羟基氧化石墨烯。
进一步的,通过控制整个反应体系的温度,控制反应的开始与结束。
进一步的,通过限定光催化光线的使用类型和波长,保证使用的光催化剂为特定的催化剂,能够促进反应的发生。
【附图说明】
图1为本发明的制备出的富羟基氧化石墨烯的XRD图;
图2为本发明的制备出的可光固化氧化石墨烯的傅里叶红外光谱图;
图3为本发明的制备出的可光固化氧化石墨烯经过光固化处理的宏观图;
图4为本发明的制备出的可光固化氧化石墨烯经过光固化处理所制备电极的扫描电镜图;
【具体实施方式】
下面结合附图和具体实施例对本发明做进一步详细描述,本发明公开了一种可光固化氧化石墨烯及其制备方法;参见下式(1),该方法利用含有较多羟基基团的氧化石墨烯作为反应物,利用2-甲基丙烯酸异氰基乙酯中的异氰基醇根和氧化石墨烯表面的羟基基团反应,通过预聚反应,使得富含羟基的氧化石墨烯接上具备生物兼容性的基团:2-甲基丙烯酸,氧化石墨烯中剩余的含氧官能团使其具 有很好的水溶性,从而合成了一种具备水溶性可光固化综合性能优异的氧化石墨烯改性树脂。
Figure PCTCN2019091166-appb-000002
上式中的R为氧化石墨烯碳环。
本发明中产物的制备方法具体包括以下步骤:
(1)富羟基化氧化石墨烯的制备
在烧瓶中加入无水乙醇,搅拌下加入氧化石墨烯,无水乙醇作为溶剂,加入量能够满足溶解氧化石墨烯即可;再分若干次加入一定量过氧化氢,每次过氧化氢的加入间隔时间不可过长,加入的氧化石墨烯和过氧化氢的比例为1g:(1~5)mL形成混合溶液A;搅拌均匀后加入FeCl 3水溶液作为催化剂,FeCl 3的加入量和无水乙醇的体积比为1:(3~10),FeCl 3水溶液的质量浓度为3%~7%,以保证氧化石墨烯薄片能够充分溶解,形成反应体系B;将反应体系B水浴加热到65-85℃,继续搅拌并使用300W氙灯和截止滤光器照射2小时,其中截止滤光器要求波长>400nm,以发生光催化作用,使得羟基附着在氧化石墨烯的碳上,确认反应基本结束后,将整个反应体系的温度降至小于30℃,保证整个反应体系中的反应彻底结束,同时得到反应产物C;将反应产物C用去离子水洗涤2-5次后,置于50℃的真空干燥箱中充分干燥,保存备用,制得无水富羟基氧化石墨烯。
现有的氧化石墨烯表面虽然附着有羟基,但含量较少,通过上述步骤制备氧化石墨烯,通过光催化作用,使得过氧化氢中的氧化石墨烯附着有较多的羟基,为下一步反应做准备,上述制备过程中,通过控制整个反应体系的温度,控制反应的开始与结束,通过光催化和化学催化剂(FeCl 3)的双重作用,使得整个反应 顺利进行,得到反应产物C即为富羟基氧化石墨烯,通过真空干燥箱中的干燥,去除富羟基氧化石墨烯中的水,制备无水富羟基氧化石墨烯。
(2)生物兼容性水溶性可光固化氧化石墨烯树脂的合成
(2-1)干燥反应容器和催化剂
反应容器使用前需经过在150℃烘箱环境下干燥24小时处理以去除水分,本发明中的反应容器选用圆底烧瓶;催化剂在使用前需经过150℃烘箱环境下干燥24小时处理以去除水分。
(2-2)合成生物兼容性水溶性可光固化氧化石墨烯树脂
干燥后的催化剂放置于干燥后的圆底烧瓶中,加入无水二甲基亚砜作为溶剂,加入的催化剂和无水二甲基亚砜的比例为1g:(100~150)mL,催化剂为溴化锂或氯化锂搅拌均匀,将圆底烧瓶放置于水浴锅中加热,保持温度为50~80℃;在圆底烧瓶中通入干燥氮气,加入的无水富羟基化氧化石墨烯,搅拌均匀或采用超声的方法后,缓慢滴加化学计算等量的甲基丙烯酸异氰基乙酯,便于甲基丙烯酸异氰基乙酯能够充分的溶解在溶液中,形成反应体系D,反应体系在50~80℃下反应至少4小时后,将反应后的生成物体系倒入离心管中并加入清洗液,清洗液为冷乙醇、丙酮或二者混合物;离心分离2-3次,离心速率为6~10kr/min,离心温度为2~20℃,离心得到反应产物E,去除上层清液,通过冻干法或真空干燥法处理反应产物E,即可得到纯净的具备生物兼容性和水溶性的可光固化氧化石墨烯。
上述制备过程中,无论是反应容器、催化剂还是反应物,均要求无水,因此进行烘烤干燥处理,防止反应过程中生成副产物,提高反应物的生成率和纯度。反应过程中控制反应温度在50~80℃,使得满足反应条件。该步骤中,利用2- 甲基丙烯酸异氰基乙酯中的异氰基醇根和氧化石墨烯表面的羟基基团反应,通过预聚反应,接上具备生物兼容性的基团2-甲基丙烯酸,氧化石墨烯中剩余的含氧官能团使其具有很好的水溶性,从而合成了一种具备生物兼容性和水溶性的可光固化氧化石墨烯。
将该方法制备的具备生物兼容性和水溶性的可光固化氧化石墨烯能够用于光刻及光固化氧化石墨烯图案化结构,其具体步骤为:取生物兼容性水溶性可光固化氧化石墨烯放入100mL的烧杯中,开启搅拌,加入适量的溶剂及光引发剂,溶剂为2,2,2-三氟乙醇、四氢呋喃或其水溶液,光引发剂为Irgacure 2959或Darocur 1173或(2,4,6-三甲基苯甲酰氯)二苯基氧化膦或光引发剂819等中的一种,将混合后的溶液放入压强为-1MPa的真空腔室中去除搅拌气泡,涂布在基体表面(玻璃/Si/PDMS/PI),放在70~100℃热板上干燥5分钟,干燥完全后将其与掩膜版一同放入光刻机进行紫外光固化,完成后放入显影液中,显影液为质量浓度为0.1~0.5%的氢氧化钠水溶液,即可得到氧化石墨烯图案化结构树脂膜。或直接利用SLA或DLP3D打印机直接打印三维结构或图案,利用此方法不需要上述烘干步骤。
实施例1
(1)富羟基化氧化石墨烯的制备:在50mL的烧瓶中加入15mL的无水乙醇,搅拌下加入2g氧化石墨烯,再分2次加入2mL过氧化氢,搅拌均匀后加入5mL质量浓度为5%的FeCl 3水溶液,水浴加热到70℃,继续搅拌并使用300W氙灯和420nm截止滤光器照射2小时,待反应结束后将温度降至20℃,用去离子水洗涤3次后,置于50℃的真空干燥箱中充分干燥,保存备用;为了确认富羟基氧化石墨烯确实在羟基含氧官能团增多,使用Bruker D8 ADVANCE X射线衍射仪 对氧化石墨烯进行X射线衍射图谱试验,并在2θ角度在5~120度收集数据,步长设置为0.01度,积分时间设置为0.1秒,得到了如图1所示氧化石墨烯X射线衍射图谱;从图1中可以看出,生成了羟基含量较多的氧化石墨烯。
(2)生物兼容性水溶性可光固化氧化石墨烯树脂的合成:称取0.7455g的氯化锂,置于圆底烧瓶中,并加入74.55mL的无水二甲基亚砜(LiCl:DMSO=1g:100mL),开启搅拌,将圆底烧瓶置于水浴锅中加热,保持温度为60℃,通入干燥氮气,加入10mg的无水富羟基化氧化石墨烯,搅拌45分钟,溶液均匀后,缓慢滴加化学计算等量的甲基丙烯酸异氰基乙酯,反应6小时后,倒入离心管并加入适量的冷乙醇使用9kr/min转速离心分离3次,后使用冻干法,即得纯净的生物兼容性水溶性可光固化氧化石墨烯树脂;为了确认富羟基氧化石墨烯确实与甲基丙烯酸酯结合,使用赛尔公司的显微红外光谱仪对可以具有生物兼容性可光固化化的氧化石墨烯改性树脂进行傅里叶变换红外光谱(FTIR),分析合成粉末(1.0mg),并且在4000-350cm -1之间收集数据,以4微米的空间分辨率进行扫描,得到了图2所示;从图2可以看出生成了包含甲基丙烯酸基团的氧化石墨烯。
(3)光刻及光固化氧化石墨烯图案化结构的制备:取30mg的生物兼容性水溶性可光固化氧化石墨烯树脂放入100mL的烧杯中,开启搅拌,加入10mL的2,2,2-三氟乙醇及Irgacure 2959光引发剂,放入压强为-1MPa的真空腔室中去除搅拌气泡,涂布在基体表面,放在80℃热板上干燥5分钟,干燥完全后将其与掩膜版一同放入光刻机进行紫外光固化,完成后放入显影液中,即可得到氧化石墨烯图案化结构树脂膜;合成后得到了如图3所示的图案化电极图样,使用SU-8010场发射扫描电子显微镜在10.0kV加速电压下进行扫描电子显微镜(SEM)观察其图案化电极边界,如图4所示;从图3和图4制备出材料的边界清晰,可光固 化性能好。
实施例2
(1)富羟基化氧化石墨烯的制备:在50mL的烧瓶中加入15mL的无水乙醇,搅拌下加入2g氧化石墨烯,再分2次加入2mL过氧化氢,搅拌均匀后加入5mL的质量浓度为5%的FeCl 3水溶液,水浴加热到70℃,继续搅拌并使用300W氙灯和420nm截止滤光器照射2小时,待反应结束后将温度降至20℃,用去离子水洗涤3次后,置于50℃的真空干燥箱中充分干燥,保存备用;
(2)生物兼容性水溶性可光固化氧化石墨烯树脂的合成:称取0.7455g的氯化锂,置于圆底烧瓶中,并加入74.55ml的无水二甲基亚砜(LiCl:DMSO=1g:100mL),开启搅拌,将圆底烧瓶置于水浴锅中加热,保持温度为60℃,通入干燥氮气,加入10mg的无水富羟基化氧化石墨烯,搅拌45分钟后,缓慢滴加化学计算等量的甲基丙烯酸异氰基乙酯,反应6小时后,倒入离心管并加入适量的冷乙醇使用9kr/min转速离心分离3次,后使用冻干法,即得纯净的生物兼容性水溶性可光固化氧化石墨烯树脂;
(3)光刻及光固化氧化石墨烯图案化结构的制备:取30mg的生物兼容性水溶性可光固化氧化石墨烯树脂放入100mL的烧杯中,开启搅拌,加入10mL的四氢呋喃及Irgacure 2959光引发剂,放入压强为-1MPa的真空腔室中去除搅拌气泡,涂布在基体表面,放在80℃热板上干燥5分钟,干燥完全后将其与掩膜版一同放入光刻机进行紫外光固化,完成后放入显影液中,即可得到氧化石墨烯图案化结构树脂膜。
实施例3
(1)富羟基化氧化石墨烯的制备:在50mL的烧瓶中加入15mL的无水乙醇, 搅拌下加入2g氧化石墨烯,再分2次加入4mL过氧化氢,搅拌均匀后加入3mL质量浓度为7%的FeCl 3水溶液,水浴加热到65℃,继续搅拌并使用300W氙灯和430nm截止滤光器照射2小时,待反应结束后将温度降至28℃,用去离子水洗涤2次后,置于50℃的真空干燥箱中充分干燥,保存备用;
(2)生物兼容性水溶性可光固化氧化石墨烯树脂的合成:称取0.7455g的氯化锂,置于圆底烧瓶中,并加入112mL的无水二甲基亚砜(LiCl:DMSO=1g:150mL),开启搅拌,将圆底烧瓶置于水浴锅中加热,保持温度为70℃,通入干燥氮气,加入10mg的无水富羟基化氧化石墨烯,搅拌溶液均匀后,缓慢滴加化学计算等量的甲基丙烯酸异氰基乙酯,反应6小时后,倒入离心管并加入适量的冷乙醇使用8kr/min转速离心分离2次,后使用冻干法,即得纯净的生物兼容性水溶性可光固化氧化石墨烯树脂;
(3)光刻及光固化氧化石墨烯图案化结构的制备:取30mg的生物兼容性水溶性可光固化氧化石墨烯树脂放入100mL的烧杯中,开启搅拌,加入10mL的四氢呋喃及Darocur 1173光引发剂,放入压强为-1MPa的真空腔室中去除搅拌气泡,涂布在基体表面,放在80℃热板上干燥5分钟,干燥完全后将其与掩膜版一同放入光刻机进行紫外光固化,完成后放入显影液中,即可得到氧化石墨烯图案化结构树脂膜。
实施例4
(1)富羟基化氧化石墨烯的制备:在50mL的烧瓶中加入15mL的无水乙醇,搅拌下加入2g氧化石墨烯,再分2次加入6mL过氧化氢,搅拌均匀后加入1.5mL质量浓度为7%的FeCl 3水溶液,水浴加热到85℃,继续搅拌并使用300W氙灯和430nm截止滤光器照射2小时,待反应结束后将温度降至25℃,用去离子水 洗涤5次后,置于50℃的真空干燥箱中充分干燥,保存备用;
(2)生物兼容性水溶性可光固化氧化石墨烯树脂的合成:称取0.7455g的氯化锂,置于圆底烧瓶中,并加入89mL的无水二甲基亚砜(LiCl:DMSO=1g:120mL),开启搅拌,将圆底烧瓶置于水浴锅中加热,保持温度为55℃,通入干燥氮气,加入10mg的无水富羟基化氧化石墨烯,搅拌溶液均匀后,缓慢滴加化学计算等量的甲基丙烯酸异氰基乙酯,反应6小时后,倒入离心管并加入适量的冷乙醇使用7kr/min转速离心分离2次,后使用冻干法,即得纯净的生物兼容性水溶性可光固化氧化石墨烯树脂;
(3)光刻及光固化氧化石墨烯图案化结构的制备:取30mg的生物兼容性水溶性可光固化氧化石墨烯树脂放入100mL的烧杯中,开启搅拌,加入10mL的2,2,2-三氟乙醇及Irgacure 2959光引发剂,放入压强为-1MPa的真空腔室中去除搅拌气泡,涂布在基体表面,放在80℃热板上干燥5分钟,干燥完全后将其与掩膜版一同放入光刻机进行紫外光固化,完成后放入显影液中,即可得到氧化石墨烯图案化结构树脂膜。
实施例5
(1)富羟基化氧化石墨烯的制备:在50mL的烧瓶中加入15mL的无水乙醇,搅拌下加入2g氧化石墨烯,再分2次加入8mL过氧化氢,搅拌均匀后加入1.9mL质量浓度为3%的FeCl 3水溶液,水浴加热到70℃,继续搅拌并使用300W氙灯和450nm截止滤光器照射2小时,待反应结束后将温度降至15℃,用去离子水洗涤4次后,置于50℃的真空干燥箱中充分干燥,保存备用;
(2)生物兼容性水溶性可光固化氧化石墨烯树脂的合成:称取0.7455g的氯化锂,置于圆底烧瓶中,并加入97mL的无水二甲基亚砜(LiCl:DMSO=1g: 130mL),开启搅拌,将圆底烧瓶置于水浴锅中加热,保持温度为50℃,通入干燥氮气,加入10mg的无水富羟基化氧化石墨烯,搅拌溶液均匀后,缓慢滴加化学计算等量的甲基丙烯酸异氰基乙酯,反应6小时后,倒入离心管并加入适量的冷乙醇使用9kr/min转速离心分离2次,后使用冻干法,即得纯净的生物兼容性水溶性可光固化氧化石墨烯树脂;
(3)光刻及光固化氧化石墨烯图案化结构的制备:取30mg的生物兼容性水溶性可光固化氧化石墨烯树脂放入100mL的烧杯中,开启搅拌,加入10mL的2,2,2-三氟乙醇及光引发剂819,放入压强为-1MPa的真空腔室中去除搅拌气泡,涂布在基体表面,放在70℃热板上干燥5分钟,干燥完全后将其与掩膜版一同放入光刻机进行紫外光固化,完成后放入显影液中,即可得到氧化石墨烯图案化结构树脂膜。
实施例6
(1)富羟基化氧化石墨烯的制备:在50mL的烧瓶中加入15mL的无水乙醇,搅拌下加入2g氧化石墨烯,再分2次加入10mL过氧化氢,搅拌均匀后加入3.8mL质量浓度为6%的FeCl 3水溶液,水浴加热到75℃,继续搅拌并使用300W氙灯和450nm截止滤光器照射2小时,待反应结束后将温度降至22℃,用去离子水洗涤3次后,置于50℃的真空干燥箱中充分干燥,保存备用;
(2)生物兼容性水溶性可光固化氧化石墨烯树脂的合成:称取0.7455g的氯化锂,置于圆底烧瓶中,并加入104mL的无水二甲基亚砜(LiCl:DMSO=1g:140mL),开启搅拌,将圆底烧瓶置于水浴锅中加热,保持温度为80℃,通入干燥氮气,加入10mg的无水富羟基化氧化石墨烯,搅拌溶液均匀后,缓慢滴加化学计算等量的甲基丙烯酸异氰基乙酯,反应6小时后,倒入离心管并加入适量的 冷乙醇使用9kr/min转速离心分离3次,后使用真空干燥法,即得纯净的生物兼容性水溶性可光固化氧化石墨烯树脂;
(3)光刻及光固化氧化石墨烯图案化结构的制备:取30mg的生物兼容性水溶性可光固化氧化石墨烯树脂放入100mL的烧杯中,开启搅拌,加入10mL的2,2,2-三氟乙醇及(2,4,6-三甲基苯甲酰氯)二苯基氧化膦,放入压强为-1MPa的真空腔室中去除搅拌气泡,涂布在基体表面,放在80℃热板上干燥5分钟,干燥完全后将其与掩膜版一同放入光刻机进行紫外光固化,完成后放入显影液中,即可得到氧化石墨烯图案化结构树脂膜。
实施例7
(1)富羟基化氧化石墨烯的制备:在50mL的烧瓶中加入15mL的无水乙醇,搅拌下加入2g氧化石墨烯,再分2次加入6mL过氧化氢,搅拌均匀后加入1.5mL质量浓度为7%的FeCl 3水溶液,水浴加热到85℃,继续搅拌并使用300W氙灯和430nm截止滤光器照射2小时,待反应结束后将温度降至25℃,用去离子水洗涤5次后,置于50℃的真空干燥箱中充分干燥,保存备用;
(2)生物兼容性水溶性可光固化氧化石墨烯树脂的合成:称取1.53g的溴化锂,置于圆底烧瓶中,并加入89mL的无水二甲基亚砜(LiCl:DMSO=1g:120mL),开启搅拌,将圆底烧瓶置于水浴锅中加热,保持温度为55℃,通入干燥氮气,加入10mg的无水富羟基化氧化石墨烯,搅拌溶液均匀后,缓慢滴加化学计算等量的甲基丙烯酸异氰基乙酯,反应6小时后,倒入离心管并加入适量的冷乙醇使用8kr/min转速离心分离2次,后使用冻干法,即得纯净的生物兼容性水溶性可光固化氧化石墨烯树脂;
(3)光刻及光固化氧化石墨烯图案化结构的制备:取30mg的生物兼容性水 溶性可光固化氧化石墨烯树脂放入100mL的烧杯中,开启搅拌,加入10mL的2,2,2-三氟乙醇及Irgacure 2959光引发剂,放入压强为-1MPa的真空腔室中去除搅拌气泡,涂布在基体表面,放在80℃热板上干燥5分钟,干燥完全后将其与掩膜版一同放入光刻机进行紫外光固化,完成后放入显影液中,即可得到氧化石墨烯图案化结构树脂膜。
以上所述仅为本发明的较佳实施例而已,并不用以限制本发明,凡在本发明的精神和原则之内,所作的任何修改、等同替换、改进等,均应包含在本发明的保护范围之内。

Claims (10)

  1. 一种可光固化氧化石墨烯,其特征在于,所述可光固化氧化石墨烯的化学结构式为:
    Figure PCTCN2019091166-appb-100001
    其中,R为氧化石墨烯碳环。
  2. 一种可光固化氧化石墨烯的制备方法,其特征在于,所述可光固化氧化石墨烯由无水富羟基化氧化石墨烯和甲基丙烯酸异氰基乙酯反应制成,反应前,无水富羟基化氧化石墨烯和甲基丙烯酸异氰基乙酯按照等化学计量混合。
  3. 根据权利要求2所述的一种可光固化氧化石墨烯的制备方法,其特征在于,制备过程中以溴化锂或氯化锂为催化剂,以无水二甲基亚砜为溶剂,催化剂和无水二甲基亚砜的混合比例为1g:(100~150)mL。
  4. 根据权利要求3所述的一种可光固化氧化石墨烯的制备方法,其特征在于,反应前,催化剂和反应容器通过烘烤干燥处理。
  5. 根据权利要求2所述的一种可光固化氧化石墨烯的制备方法,其特征在于,反应温度为50~80℃。
  6. 根据权利要求2所述的一种可光固化氧化石墨烯的制备方法,其特征在于,反应结束后的反应体系与清洗液混合后,离心分离得到反应产物,将反应产物通过冻干法或真空干燥法处理后,制得具备生物兼容性和水溶性的可光固化氧化石墨烯。
  7. 根据权利要求2-6任意一项所述的可光固化氧化石墨烯的制备方法,其特征在于,无水富羟基化氧化石墨烯由氧化石墨烯和过氧化氢按照比例1g:(1~5) mL混合后反应制成,整个反应过程通过光照射催化,反应结束后,得到反应产物;将反应产物洗涤并干燥后制得无水富羟基化氧化石墨烯。
  8. 根据权利要求7所述的一种可光固化氧化石墨烯的制备方法,其特征在于,氧化石墨烯和过氧化氢的反应过程以FeCl 3水溶液作为催化剂,无水乙醇作为溶剂,FeCl 3水溶液和无水乙醇的体积比为1:(3~10),FeCl 3水溶液的质量浓度为3%~7%。
  9. 根据权利要求7所述的一种可光固化氧化石墨烯的制备方法,其特征在于,氧化石墨烯和过氧化氢的反应开始和过程温度为65~85℃,反应结束后,将整个反应体系的温度降至30℃以下,得到反应产物;整个反应过程中通过截止滤光器的氙灯照射。
  10. 根据权利要求9所述的一种可光固化氧化石墨烯的制备方法,其特征在于,所述截止滤光器的波长>400nm。
PCT/CN2019/091166 2019-04-19 2019-06-13 一种可光固化氧化石墨烯及其制备方法 WO2020211183A1 (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN201910318224.XA CN110083013B (zh) 2019-04-19 2019-04-19 一种可光固化氧化石墨烯及其制备方法
CN201910318224.X 2019-04-19

Publications (2)

Publication Number Publication Date
WO2020211183A1 true WO2020211183A1 (zh) 2020-10-22
WO2020211183A9 WO2020211183A9 (zh) 2021-08-05

Family

ID=67415718

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/CN2019/091166 WO2020211183A1 (zh) 2019-04-19 2019-06-13 一种可光固化氧化石墨烯及其制备方法

Country Status (2)

Country Link
CN (1) CN110083013B (zh)
WO (1) WO2020211183A1 (zh)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114121502A (zh) * 2021-10-28 2022-03-01 西安交通大学 一种紫外光固化石墨烯超级电容器及其制备方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105038412A (zh) * 2015-09-06 2015-11-11 江南大学 光敏石墨烯的制备方法及紫外光固化导电油墨
CN106832220A (zh) * 2016-12-30 2017-06-13 长沙乐远化工科技有限公司 一种石墨烯接枝改性的环氧丙烯酸酯的制备及其在光固化涂料中的应用
CN108795107A (zh) * 2018-03-24 2018-11-13 成都迪泰化工有限公司 一种石墨烯的改性方法及其产物和uv光固化涂料
CN108822494A (zh) * 2018-06-13 2018-11-16 东莞市原力无限打印科技有限公司 一种高导热高强度高韧性的光固化三维打印材料

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105038412A (zh) * 2015-09-06 2015-11-11 江南大学 光敏石墨烯的制备方法及紫外光固化导电油墨
CN106832220A (zh) * 2016-12-30 2017-06-13 长沙乐远化工科技有限公司 一种石墨烯接枝改性的环氧丙烯酸酯的制备及其在光固化涂料中的应用
CN108795107A (zh) * 2018-03-24 2018-11-13 成都迪泰化工有限公司 一种石墨烯的改性方法及其产物和uv光固化涂料
CN108822494A (zh) * 2018-06-13 2018-11-16 东莞市原力无限打印科技有限公司 一种高导热高强度高韧性的光固化三维打印材料

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
WANG, LUFANG: "Synthesis and Characterization of Reinforced Photosensitive Resin by Functionalized Graphene Oxide Nanosheets", SCIENCE-ENGINEERING (A), CHINA MASTER’S THESES FULL-TEXT DATABASE, no. 3, 15 March 2018 (2018-03-15), DOI: 20200117191855X *

Also Published As

Publication number Publication date
WO2020211183A9 (zh) 2021-08-05
CN110083013A (zh) 2019-08-02
CN110083013B (zh) 2020-05-22

Similar Documents

Publication Publication Date Title
CN108273541A (zh) 一种绿色高效制备石墨相氮化碳纳米片的方法和应用
Zhang et al. UV-curable photosensitive silicone resins based on a novel polymerizable photoinitiator and GO-modified TiO2 nanoparticles
WO2020211183A1 (zh) 一种可光固化氧化石墨烯及其制备方法
CN108276593A (zh) 一种集紫外-可见-近红外光诱导的自修复纳米复合水凝胶的制备方法
CN113929105B (zh) 一种金属有机框架衍生硅酸镍的制备方法
CN111467563B (zh) 一种RGO/MWCNT/HA/Fe3O4复合材料的合成方法
Fan et al. Conformally anchoring nanocatalyst onto quartz fibers enables versatile microreactor platforms for continuous-flow catalysis
CN108358187A (zh) 一种发金黄色荧光碳点的制备方法
CN107999072B (zh) 一种光热催化剂、其制备方法和催化环己烷氧化的方法
CN109126829B (zh) 一种三维异质结构CdS-MoS2复合粉体的制备方法
CN115386100B (zh) 一种含可控晶面的铜基金属有机框架光催化材料的制备方法及其应用
CN111151301A (zh) 一种双官能团非均相Pd@MIL-101@SGO复合材料及其制备方法和应用
Buruiana et al. Influence of UV irradiation and two photon processing on the cinnamate monomers polymerization and formation of hybrid composites with nanosized ZnO
CN113480893B (zh) 一种无机分散剂改性纳米银线的uv导电油墨制备方法
CN112844478B (zh) 一种基于多酸插层层状硅酸盐手性二维材料的制备方法及其应用
CN108394887A (zh) 一种发橙黄色荧光碳点的制备方法
RU2323876C1 (ru) СПОСОБ ПОЛУЧЕНИЯ МЕТАЛЛСОДЕРЖАЩИХ УГЛЕРОДНЫХ НАНОСТРУКТУР ВЗАИМОДЕЙСТВИЕМ ОРГАНИЧЕСКИХ ВЕЩЕСТВ И СОЛЕЙ d-МЕТАЛЛОВ
CN111659429A (zh) 一种硫化镉-磷钨酸铯复合材料的制备方法及其作为可见光催化剂制取氢的用途
CN113583668A (zh) 一种环保的石墨烯量子点的制备方法
JP2004174295A (ja) 新規固体酸触媒
Tian et al. Nickel (II) dibenzotetramethyltetraaza [14] annulene supported on DFNS nanoparticles catalyst in carbonylative sonogashira coupling
CN116023936B (zh) 一种网状纳米聚集体的制备方法及其在光催化领域的应用
CN113120922B (zh) 一种纳米片状形貌的La-SAPO-34分子筛的合成方法及应用
Somasekharan et al. Multiwalled carbon nanotubes@ octavinyl polyhedral oligomeric silsesquioxanes nanocomposite preparation via cross-linking reaction in acidic media
CN114797866B (zh) 一种棕榈叶状结构还原二氧化碳的光催化剂复合材料及其制备方法和应用

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 19925175

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 19925175

Country of ref document: EP

Kind code of ref document: A1