WO2020202360A1 - Masque de dépôt en phase vapeur - Google Patents

Masque de dépôt en phase vapeur Download PDF

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Publication number
WO2020202360A1
WO2020202360A1 PCT/JP2019/014270 JP2019014270W WO2020202360A1 WO 2020202360 A1 WO2020202360 A1 WO 2020202360A1 JP 2019014270 W JP2019014270 W JP 2019014270W WO 2020202360 A1 WO2020202360 A1 WO 2020202360A1
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WO
WIPO (PCT)
Prior art keywords
vapor deposition
sheet
thin
superimposing portion
film
Prior art date
Application number
PCT/JP2019/014270
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English (en)
Japanese (ja)
Inventor
井上　智
Original Assignee
シャープ株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by シャープ株式会社 filed Critical シャープ株式会社
Priority to PCT/JP2019/014270 priority Critical patent/WO2020202360A1/fr
Publication of WO2020202360A1 publication Critical patent/WO2020202360A1/fr

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/30—Devices specially adapted for multicolour light emission
    • H10K59/35—Devices specially adapted for multicolour light emission comprising red-green-blue [RGB] subpixels

Definitions

  • the present invention relates to a vapor deposition mask.
  • FMM Full Metal Mask
  • a high-definition vapor deposition mask having vapor deposition holes (through holes) for each pixel is used.
  • an object of the present invention is to suppress deterioration of the quality of the substrate after vapor deposition.
  • the vapor deposition mask is With a mask frame A plurality of thin-film vapor deposition sheets, which are fixed to the mask frame and have thin-film deposition holes for discharging vapor-film deposition particles onto the surface to be vapor-deposited on the substrate, are provided.
  • the plurality of the vapor deposition sheets are arranged side by side in the lateral direction of the vapor deposition sheets.
  • first superimposing portion that protrudes from the main body of the first thin-film deposition sheet in the direction of the second thin-film deposition sheet.
  • a second superposed portion that protrudes from the main body of the second thin-film sheet in the direction of the first-deposited sheet is provided at the end of the second thin-film sheet in the lateral direction.
  • FIG. 1 is a diagram showing an outline of the vapor deposition process.
  • the film formation of the OLED element which is one element of the OLED panel, is performed in a vacuum chamber (not shown), and the thin-film film DV emitted from the thin-film deposition source DS is the thin-film deposition mask 40. It is carried out by passing through the pattern opening (deposited hole, not shown) and reaching the surface to be vapor-deposited 32 of the substrate (film-deposited substrate) 30.
  • a magnet plate 58 is arranged on the side of the substrate 30 opposite to the vapor deposition mask 40.
  • the vapor deposition mask 40 contains a magnetic material, and the vapor deposition mask 40 is brought into close contact with the substrate 30 by the magnetic force of the magnet plate 58 in which the magnet is housed.
  • the vapor deposition is performed in a state where the magnet plate 58 is brought close to the substrate 30, but the magnet plate 58 and the substrate 30 may be arranged apart from each other (with a gap) or may be brought into close contact with each other. Good.
  • Comparative Example 1 a conventional vapor deposition mask will be described with reference to FIGS. 2 and 3.
  • FIG. 2A and 2B are views showing an outline of a conventional vapor deposition mask 40, in which FIG. 2A is a top view of the vapor deposition mask 40, FIG. 2B is a sectional view taken along line BB'of FIG. ) Is a cross-sectional view taken along the line AA'.
  • FIG. 3A and 3B are views showing an outline of the conventional thin-film deposition mask 40, where FIG. 3A is a top view of the thin-film deposition mask 40 and FIG. 3B is a sectional view taken along line DD'of FIG.
  • the thin-film deposition mask 40 is placed between a mask frame 42, which is a framework thereof, a thin-film deposition sheet (deposited sheet, FMM sheet) 44, which is a strip-shaped mask, and adjacent vapor-deposited sheets 44.
  • the cover sheet 46 to be arranged and the alignment sheet 56 used for positioning are the main components thereof.
  • the thin-film sheet 44 is formed with thin-film holes 48 through which the thin-film particles pass.
  • the vapor deposition mask 40 is aligned at both ends in the lateral direction T.
  • the sheet 56 is arranged.
  • the cover sheet 46 is arranged between the alignment sheets 56 in the gap S1 between the adjacent vapor deposition sheets 44 and in the gap S1 between the alignment sheet 56 and the vapor deposition sheet 44.
  • the thin-film deposition mask 40 is used by stacking the mask frame 42, the thin-film deposition sheet 44, the substrate 30, and the magnet plate 58 in this order.
  • the cover sheet 46 is arranged on the surface of the vapor deposition sheet 44 opposite to the surface facing the substrate 30. Then, a step is formed between the vapor deposition sheet 44 and the cover sheet 46.
  • the arrangement of the cover sheet 46 can be considered other than the above.
  • the cover sheet 46 can be arranged on the surface of the thin-film deposition sheet 44 facing the substrate 30. .. That is, the surface of the vapor-deposited sheet 44 on which the cover sheet 46 is arranged is different between the configuration shown in FIG. 2 (a) and the configuration shown in FIG. 3 (b).
  • the CC'cross-sectional view of FIG. 3A is the same as the AA' cross-sectional view of FIG. 2A, as shown in FIG. 2C.
  • the stacking order of each member during vapor deposition is the same.
  • the vapor deposition sheet 44 is partially stronger than other parts (locations other than the vicinity of the cover sheet 46) in the vicinity where the cover sheet 46 is arranged, and is pressed against the substrate 30 by magnetic force or the like. , It is considered to be one of the causes.
  • FIG. 4 is a diagram showing an outline of the vapor deposition mask 40 of the present embodiment, (a) is a top view of the vapor deposition mask 40, and (b) is a sectional view taken along line EE'of (a).
  • the adjacent vapor deposition sheets 44, and the adjacent alignment sheets 56 and the vapor deposition sheet 44 are partially overlapped with each other.
  • the cover sheet 46 used to cover the gap S1 is not used.
  • the thin-film deposition sheets 44 (1) and the thin-film deposition sheets 44 (2) which are adjacent vapor deposition sheets 44, have their respective end portions 50 (1) and ends.
  • the superimposing portion 52 (1) and the superimposing portion 52 (2) are provided on the portions 50 (2), respectively.
  • the superimposing portion 52 (1) and the superimposing portion 52 (2) are superposed in the superimposing region R1. Therefore, when the superimposed region R1 is viewed in a plan view, the gap S1 does not exist there.
  • the thin-film deposition sheet 44 has a thin-film deposition sheet main body 45 and a superimposing portion 52 formed on an end portion 50 thereof.
  • the superimposing portion 52 has a shape that can be combined with the superimposing portion 52 of the adjacent vapor deposition sheets 44.
  • the first superposed portion 52 (1) of the first thin-film vapor deposition sheet 44 (1) has an end shape that descends to the right with respect to the drawing.
  • the second superimposing portion 52 (2) of the second vapor deposition sheet 44 (2) adjacent to the first vapor deposition sheet 44 (1) has an end shape that rises to the left with respect to the drawing.
  • the first superposed portion 52 (1) and the second superposed portion 52 (2) are superposed in the superposed region R1, so that the first vapor deposition sheet 44 (1) and the second vapor deposition sheet 44 ( The gap S1 is not formed between the two).
  • the second superimposing portion 52 (2) is located on the upper side and the first superimposing portion 52 (1) is located on the lower side when viewed from the paper surface, and they overlap each other.
  • the vertical relationship of the overlapping portion 52 may be replaced as appropriate.
  • the adjacent vapor deposition sheets 44 are taken as an example, but the same applies to the adjacent alignment sheet 56 and the vapor deposition sheet 44.
  • an alignment sheet superimposing portion 57 (2) extending from the main body 57 (1) of the alignment sheet is formed on the alignment sheet 56. Then, the shape of the alignment sheet superimposing portion 57 (2) can be formed in the same manner as the superimposing portion 52 of the vapor deposition sheet 44 so as to overlap with the superimposing portion 52 of the adjacent vapor deposition sheets 44.
  • the shape of the end face of the vapor-deposited sheet 44 is devised, and specifically, the end face is processed diagonally and the adjacent vapor-deposited sheets 44 are overlapped with each other. As a result, a gap S1 in a plan view is not generated between the adjacent vapor deposition sheets 44, and thus the use of the cover sheet 46 is unnecessary.
  • the cover sheet 46 since the cover sheet 46 is not used, the substrate 30 is not easily scratched. Further, since the cover sheet 46 is not provided, even if the vapor deposition sheet 44 is in close contact with the substrate 30, it is possible to prevent the vapor deposition sheet 44 from floating or being distorted.
  • the cover sheet 46 since the cover sheet 46 is not used, the number of members of the vapor deposition mask 40 can be reduced, and the throughput in producing the vapor deposition mask 40 can be improved.
  • the end faces of the thin-film deposition sheets 44 are slanted and overlapped with each other, for example, when the thin-film deposition sheets 44 are reattached, even if they are not attached well, it is easy to correct them. is there. This is because it is easy to move while sliding each other.
  • gap in cross section In the present embodiment, as described above, there is no gap S1 in a plan view between the adjacent vapor deposition sheets 44. On the other hand, as shown in FIG. 4B, it is preferable that a gap S2 in a cross-sectional view exists between the adjacent vapor deposition sheets 44. By interposing the gap S2, it is possible to suppress the contact between the adjacent vapor deposition sheets 44, and it is possible to suppress the occurrence of distortion or the like in the vapor deposition sheets 44.
  • the total film thickness of the first superimposition portion 52 (1) and the second superimposition portion 52 (2) is the main body 45 of the first vapor deposition sheet 44 (1) or the second vapor deposition sheet 44. It is thinner than the main body 45 of (2). Therefore, even if the gap S2 is interposed between the first superposed portion 52 (1) and the second superposed portion 52 (2), the total thickness of the thin-film deposited sheet 45 in the superposed region R1 is the first vapor-deposited sheet 44 (1). ) Does not exceed the main body 45 or the main body 45 of the second thin-film sheet 44 (2).
  • the region is thicker than the other regions and no problem occurs.
  • an arbitrary number of thin-film vapor deposition sheets 44 can be arranged in the lateral direction T, for example, depending on the size of the mask frame 42.
  • one type of thin-film deposition sheet 44 is a vapor-deposited sheet 44 that is continuous in the short-side direction T.
  • the gap S1 can be prevented from being formed between them.
  • one end of the end 50 in the lateral direction T is set as the first end 50 (1), and the other end is designated as the first end 50 (1).
  • Let 50 be the third end 50 (3).
  • the first overlapping portion 52 (1) of the first end portion 50 (1) has a convex cross-sectional shape
  • the third overlapping portion 52 (3) of the third end portion 50 (3) has a concave cross-sectional shape. ..
  • one type of thin-film deposition sheet 44 can be arranged in a plurality of sheets in succession without causing a gap S1 between them.
  • convex cross section and concave cross section are examples for understanding, and the shapes may be any shapes that can be combined or fitted with each other.
  • the combination of downward-sloping and upward-sloping as shown in FIG. 4B may be used.
  • the shape of the end portion is not limited to the above-mentioned unevenness or diagonal, and may be another structure. This will be described with reference to FIG.
  • FIG. 5A and 5B are views showing an outline of a modified example of the vapor-deposited sheet 44 of the present invention
  • FIG. 5A is a cross-sectional view showing a modified example of the superposed region R1 of FIG. 4B
  • FIG. 5B is shown in FIG.
  • the corresponding top view, (c) is a cross-sectional view showing a modified example of the superimposed region R1 of FIG. 4 (b). That is, (a) and (c) are sectional views taken along line FF'of (b).
  • the first superimposing portion 52 (1) and the second superimposing portion 52 (2) have a shape in which they are superposed on each other in a hook shape (which can also be expressed as a staircase shape). You can also do it.
  • A1, A2, B2, and B2 in FIG. 5 (b) correspond to A1, A2, B2, and B2 in FIG. 5 (a), respectively.
  • FIG. 5B even in the form shown in FIG. 5A, there is no gap S1 in the plan view in the superposed region.
  • FIG. 5C shows the shapes of another first superimposing portion 52 (1) and the second superimposing portion 52 (2). As shown in FIG. 5C, the shape may be wedge-shaped.
  • the shape of the three overlapping portions 52 (3) may be symmetrical or asymmetrical.
  • one kind of thin film deposition sheet 44 Therefore, it becomes easy to arrange a plurality of thin-film deposition sheets 44 without causing a gap S1.
  • FIG. 6A and 6B are views showing an outline of a modified example of the vapor-deposited sheet of the present invention
  • FIG. 6A is a top view of the vapor-deposited mask
  • FIG. 6B is a sectional view taken along line GG'of FIG. 6A
  • 7A and 7B are views showing an outline of another modification of the vapor-deposited sheet of the present invention, in which FIG. 7A is a top view of the vapor-deposited mask and FIG. 7B is a sectional view taken along line HH'of FIG. 7A. is there.
  • FIGS. 6 and 7 show an example of a typical configuration when, for example, three or more thin-film deposition sheets are continuously arranged. That is, in FIGS. 6 and 7, three thin-film vapor deposition sheets (first thin-film deposition sheet 44 (1), second thin-film deposition sheet 44 (2), third thin-film deposition sheet 44 (3)) are formed in the lateral direction T of the thin-film deposition sheet. ) Are placed next to each other. Then, in the superposed portion, the superposed portions of the adjacent vapor deposition sheets are located on the upper side and the lower side when viewed from the paper surface and overlap each other, whereby a gap in the plan view is not generated in the superposed portion.
  • first thin-film sheet 44 (1) and the second thin-film sheet 44 (2) are the first end portion 50 (1) of the first thin-film sheet 44 (1).
  • the first superimposing portion 52 (1) provided in 1) and the second superimposing portion 52 (2) provided in the second end portion 50 (2) of the second thin-film deposition sheet 44 (2) are superposed. Therefore, they are connected without creating a gap in a plan view.
  • the first superimposing portion 52 (1) is located on the upper side, while the second superimposing portion 52 (2) is located on the lower side.
  • Both the first thin-film sheet 44 (1) and the third thin-film sheet 44 (3) can be superposed in the same manner as the first thin-film sheet 44 (1) and the second thin-film sheet 44 (2) described above.
  • the third thin-film vapor deposition sheet 44 (3) means a thin-film deposition sheet arranged on the opposite side of the first thin-film deposition sheet 44 (1) from the second vapor deposition sheet 44 (2) in the lateral direction T. To do.
  • the first thin-film sheet 44 (1) and the third thin-film sheet 44 (3) are provided on the third end portion 50 (3) of the first thin-film sheet 44 (1).
  • the third superposed portion 52 (3) and the fourth superposed portion 52 (4) provided on the fourth end portion 50 (4) of the third thin-film vapor deposition sheet 44 (3) are superposed to each other in a plan view. They are connected without creating a gap.
  • the third superimposing portion 52 (3) is located on the lower side, and the fourth superimposing portion 52 (4) is located on the upper side.
  • the third superimposing portion 52 (3) is located on the upper side and the fourth superimposing portion 52 (4) is located on the lower side.
  • the third superposed portion 53 (3) of the third end 50 (3) is the second end of the second thin-film sheet 44 (2). It has the same shape as the second superposed portion 52 (2) of the portion 50 (2).
  • the third superposed portion 53 (3) of the third end 50 (3) is the first end of the first thin-film sheet 44 (1). It has the same shape as the first superposed portion 52 (1) of the portion 50 (1).
  • both ends of the thin-film deposition sheet have different shapes that can be fitted to each other.
  • both ends of the vapor-deposited sheet have the same shape.
  • a plurality of thin-film vapor deposition sheets can be joined together with one type of thin-film deposition sheet.
  • both the first superimposing portion 52 (1) and the third superimposing portion 53 (3) of the first thin-film deposition sheet 44 (1) can be arranged on the upper side. As a result, torsional stress can be less likely to occur on the vapor-deposited sheet.
  • FIG. 8 is a diagram showing an outline of a modified example of the vapor-deposited sheet of the present invention, and both (a) and (b) are top views showing a modified example of the superimposed region R2 of FIG. 4 (a). Further, FIG. 8C is a sectional view taken along line JJ'of FIG. 8B.
  • the first end portion 50 (1) and the second end portion 50 (2) of the thin-film deposition sheet 44 are linear in the longitudinal direction L. there were.
  • the shape of the end portion 50 in the longitudinal direction L is not limited to a linear shape, and may include, for example, a saw type (substantially zigzag structure), a rectangular shape (substantially square wave structure), staggered shapes, and various shapes. can do.
  • FIG. 8A shows an example thereof, and A1, A2, B2, and B2 in FIG. 8A correspond to A1, A2, B2, and B2 in FIG. 4B, respectively.
  • the ends of the first thin-film deposition sheet 44 (1) and the second thin-film deposition sheet 44 (2) have a zigzag structure.
  • This configuration is more effective, for example, when the distance between the vapor deposition source and the substrate is short, or when there is a linear vapor deposition source along the overlapping side direction of the vapor deposition sheet (longitudinal direction L of the vapor deposition sheet). Therefore, it is possible to suppress unnecessary film formation on the surface to be vapor-deposited due to leakage of thin-film deposition particles. Further, this effect is the same even when the shape of the end portion 50 in the longitudinal direction L is a substantially square wave structure.
  • the I-I'cross section of FIG. 8 (a) may have any of the configurations shown in FIGS. 5 (a) and 5 (c).
  • FIG. 8B in a plan view, the overlapping portions of the end portions on both sides of the center line (line along the longitudinal direction L) in the lateral direction T of the vapor deposition sheet have an asymmetrical shape.
  • the formed example is shown.
  • the first end portion 50 (1) is below the upper first superposition portion 52 (1) A located on the upper side when superposed with the adjacent vapor-film deposition sheets.
  • the lower first superposed portion 52 (1) B located on the side is provided alternately and in a rectangular shape.
  • the third end portion 50 (3), which is the other end portion is also located below the upper third overlapping portion 52 (3) A, which is located on the upper side when superposed on the adjacent vapor deposition sheets.
  • the lower third superposed portion 52 (3) B is provided alternately and in a rectangular shape.
  • FIG. 8 (c) The cross-sectional shape of the first thin-film vapor-deposited sheet 44 (1) is shown in FIG. 8 (c) as a JJ'line cross-sectional view of FIG. 8 (b).
  • the first end portion 50 (1) and the third end portion 50 (3) have an upper first overlapping portion 52 (1) A located on the upper side and a lower side on the lower side.
  • a lower first superimposing portion 52 (1) B located is provided.
  • the superimposing portion located on the upper side and the superimposing portion located on the lower side are arranged so as to be offset from each other. That is, the first end portion 50 (1) and the third end portion 50 (3) are in a mating relationship.
  • the superposed portion for example, the second vapor deposition sheet
  • the second superposed portion is properly fitted with the first superposed portion of the first thin-film deposition sheet 44 (1), and a gap S1 is formed between the first and second thin-film deposition sheets. Absent.
  • the thin-film deposition sheets can be continuously arranged without a gap S1 in one type of vapor-film deposition sheet. ..
  • the upper side and the lower side mean the upper side and the lower side when viewed from the paper surface in FIG. 8 (b).
  • howling sheet holding member arranged parallel to the lateral direction T
  • the so-called howling sheet is not mentioned, it may be provided as needed or may be omitted.
  • the vapor deposition mask according to aspect 1 of the present invention With a mask frame A plurality of thin-film vapor deposition sheets, which are fixed to the mask frame and have thin-film deposition holes for discharging vapor-film deposition particles onto the surface to be vapor-deposited on the substrate, are provided.
  • the plurality of the vapor deposition sheets are arranged side by side in the lateral direction of the vapor deposition sheets.
  • first and second thin-film deposition sheets which are the above-mentioned vapor deposition sheets, At the lateral end of the first thin-film deposition sheet, a first superimposing portion that protrudes from the main body of the first thin-film deposition sheet in the direction of the second thin-film deposition sheet is provided.
  • a second superposed portion protruding from the main body of the second thin-film sheet in the direction of the first-deposited sheet is provided at the end of the second-film sheet in the lateral direction.
  • the first superimposing portion and the second superimposing portion are superposed on the first superimposing portion and the second superimposing portion, one is on the upper side and the other is on the lower side, or one is on the lower side. Protruding from the body so that the other is located on the upper side
  • the first superimposing portion and the second superimposing portion are superposed on each other with a gap interposed therebetween in the vertical direction.
  • the vapor deposition mask according to the second aspect of the present invention is In the superimposition region where the first superimposition portion and the second superimposition portion overlap.
  • the total film thickness of the first superposed portion and the second superposed portion is thinner than the main body of the first thin-film deposition sheet or the main body of the second thin-film deposition sheet.
  • the vapor deposition mask according to the third aspect of the present invention is The first superimposing portion and the second superimposing portion are provided parallel to the longitudinal direction of the vapor-deposited sheet in a plan view.
  • the vapor deposition mask according to the fourth aspect of the present invention is The first superposed portion and the second superposed portion are formed in a zigzag shape along the longitudinal direction of the thin-film deposition sheet in a plan view.
  • the vapor deposition mask according to the fifth aspect of the present invention is The zigzag shape is triangular.
  • the vapor deposition mask according to the sixth aspect of the present invention is The zigzag shape is a square wave shape.
  • the vapor deposition mask according to the seventh aspect of the present invention is Each of the first superimposing portion and the second superimposing portion is located on the upper side when the first superimposing portion and the second superimposing portion are superposed along the longitudinal direction of the thin-film deposition sheet. And the superposed portion located on the lower side are provided alternately. When the first superimposing portion and the second superimposing portion are superposed, the superimposing portion located on the upper side and the superimposing portion located on the lower side are superposed.
  • the vapor deposition mask according to the eighth aspect of the present invention is At the end of the first vapor deposition sheet in the lateral direction, At the end on the side where the first superimposing portion is not provided, a third superimposing portion projecting in the direction opposite to the second superimposing portion is provided.
  • the third superimposing portion has the same shape as the second superimposing portion.
  • the vapor deposition mask according to the ninth aspect of the present invention is At the end of the first vapor deposition sheet in the lateral direction, At the end on the side where the first superimposing portion is not provided, a third superimposing portion projecting in the direction opposite to the second superimposing portion is provided.
  • the third superimposing portion has the same shape as the first superimposing portion.
  • the vapor deposition mask according to the tenth aspect of the present invention is Alignment sheets are fixed to both ends of the mask frame in the lateral direction of the vapor deposition sheet.
  • the vapor deposition mask mainly comprises the mask frame, the vapor deposition sheet, and the alignment sheet.
  • the vapor deposition mask according to the eleventh aspect of the present invention At the end of the alignment sheet in the lateral direction of the vapor deposition sheet, An alignment sheet superimposing portion that protrudes from the main body of the alignment sheet in the lateral direction and is superposed on the first superimposing portion or the second superimposing portion of the adjacent vapor deposition sheet is provided.
  • the display device is not particularly limited as long as it is a display panel provided with a display element such as a light emitting element.
  • the display element is a display element whose brightness and transmission rate are controlled by a current, and the display element for current control is an organic EL (Electro Luminescence) equipped with an OLED (Organic Light Emitting Diode).
  • OLED Organic Light Emitting Diode
  • Display or an EL display such as an inorganic EL display provided with an inorganic light emitting diode
  • QLED display provided with an EL display QLED (Quantum dot Light Emitting State: quantum dot light emitting diode).
  • the present invention is not limited to the display panel, and can be widely applied to various devices formed on the resin layer.
  • An example of this is a touch panel, a sensor such as an X-ray, or the like.
  • Substrate (Deposited substrate) 32 Evaporated surface 40 Evaporated mask 42 Mask frame 44 Evaporated sheet (mask sheet, FMM sheet) 44 (1) First vapor deposition sheet 44 (2) Second vapor deposition sheet 44 (3) Third vapor deposition sheet 45 Vapor deposition sheet body 46 Cover sheet 48 Thin film deposition holes 50 End portion 50 (1) First end portion 50 (2) First 2 end 50 (3) 3rd end 50 (4) 4th end 52 superimposing part 52 (1) superimposing part (first superimposing part) 52 (2) Superimposition part (second superimposition part) 53 (3) Superimposition part (third superimposition part) 53 (4) Superimposition part (4th superimposition part) 56 Alignment sheet 57 (1) Alignment sheet body 57 (2) Alignment sheet superimposing part 58 Magnet plate DS Evaporation source DV Evaporation particle L Longitudinal direction T Short direction R1 Overlapping area R2 Overlapping area S1 Gap in plan view S2 In cross-sectional view Gap

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Physical Vapour Deposition (AREA)
  • Electroluminescent Light Sources (AREA)

Abstract

L'invention concerne un masque de dépôt en phase vapeur qui est pourvu d'un cadre de masque (42) et de multiples feuilles de dépôt en phase vapeur (44) fixées au cadre de masque (42) et munies de trous de dépôt en phase vapeur (48) à travers lesquels éjecter des particules de dépôt en phase vapeur (DV) sur une surface de dépôt (32) d'un substrat (30), les multiples feuilles de dépôt en phase vapeur (44) étant disposées côte à côte dans la direction transversale (T) des feuilles de dépôt en phase vapeur (44), une première feuille de dépôt en phase vapeur (44 (1)) et une seconde feuille de dépôt en phase vapeur (44 (2)), qui sont des feuilles de dépôt en phase vapeur (44) adjacentes, sont formées de telle sorte qu'une première partie de chevauchement (52 (1)) se projetant du corps principal (45) de la première feuille de dépôt en phase vapeur (44 (1)) vers la seconde feuille de dépôt en phase vapeur (44 (2)) est située au niveau d'une partie d'extrémité (50) de la première feuille de dépôt en phase vapeur (44 (1)) dans la direction transversale (T) et qu'une seconde partie de chevauchement (52 (2)) se projetant du corps principal (45) de la seconde feuille de dépôt en phase vapeur (44 (2)) vers la première feuille de dépôt en phase vapeur (44 (1)) est située au niveau d'une partie d'extrémité (50) de la seconde feuille de dépôt en phase vapeur (44 (2)) dans la direction transversale (T), la première partie de chevauchement (52 (1)) et la seconde partie de chevauchement (52 (2)) se projettent depuis ls corps principaux (45) de telle sorte que, lorsque la première partie de chevauchement (52 (1)) et la seconde partie de chevauchement (52 (2)) se chevauchent l'une l'autre, l'une des parties de chevauchement est positionnée au-dessus de l'autre, l'autre étant positionnée en dessous, ou l'une des parties de chevauchement est positionnée sous l'autre, l'autre étant positionnée au dessus, et la première partie de chevauchement (52 (1)) et la seconde partie de chevauchement (52 (2)) se chevauchent l'une l'autre avec un espace S2 entre elles dans la direction haut-bas.
PCT/JP2019/014270 2019-03-29 2019-03-29 Masque de dépôt en phase vapeur WO2020202360A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
PCT/JP2019/014270 WO2020202360A1 (fr) 2019-03-29 2019-03-29 Masque de dépôt en phase vapeur

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2019/014270 WO2020202360A1 (fr) 2019-03-29 2019-03-29 Masque de dépôt en phase vapeur

Publications (1)

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WO2020202360A1 true WO2020202360A1 (fr) 2020-10-08

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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004014513A (ja) * 2002-06-03 2004-01-15 Samsung Nec Mobile Display Co Ltd 有機電子発光素子の薄膜蒸着用マスクフレーム組立体
WO2010047101A1 (fr) * 2008-10-21 2010-04-29 株式会社アルバック Masque et procédé de formation d'un film au moyen d'un masque
JP2014022374A (ja) * 2012-07-16 2014-02-03 Samsung Display Co Ltd 平板表示装置及びその製造方法
JP2015196874A (ja) * 2014-03-31 2015-11-09 大日本印刷株式会社 蒸着マスク、蒸着マスク準備体、多面付け蒸着マスク、有機半導体素子の製造方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004014513A (ja) * 2002-06-03 2004-01-15 Samsung Nec Mobile Display Co Ltd 有機電子発光素子の薄膜蒸着用マスクフレーム組立体
WO2010047101A1 (fr) * 2008-10-21 2010-04-29 株式会社アルバック Masque et procédé de formation d'un film au moyen d'un masque
JP2014022374A (ja) * 2012-07-16 2014-02-03 Samsung Display Co Ltd 平板表示装置及びその製造方法
JP2015196874A (ja) * 2014-03-31 2015-11-09 大日本印刷株式会社 蒸着マスク、蒸着マスク準備体、多面付け蒸着マスク、有機半導体素子の製造方法

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