WO2020189459A1 - Composition durcissable, film, filtre optique et son procédé de production, élément d'imagerie à semi-conducteurs, capteur infrarouge, module de caméra et encre pour impression par jet d'encre - Google Patents

Composition durcissable, film, filtre optique et son procédé de production, élément d'imagerie à semi-conducteurs, capteur infrarouge, module de caméra et encre pour impression par jet d'encre Download PDF

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WO2020189459A1
WO2020189459A1 PCT/JP2020/010666 JP2020010666W WO2020189459A1 WO 2020189459 A1 WO2020189459 A1 WO 2020189459A1 JP 2020010666 W JP2020010666 W JP 2020010666W WO 2020189459 A1 WO2020189459 A1 WO 2020189459A1
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group
curable composition
present disclosure
compound
film
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PCT/JP2020/010666
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English (en)
Japanese (ja)
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季彦 松村
賢 鮫島
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富士フイルム株式会社
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/44—Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/08—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated side groups
    • C08F290/12—Polymers provided for in subclasses C08C or C08F
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B23/00—Methine or polymethine dyes, e.g. cyanine dyes
    • C09B23/14—Styryl dyes
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144—Devices controlled by radiation
    • H01L27/146—Imager structures

Definitions

  • the present disclosure relates to a curable composition, a film, an optical filter and a method for manufacturing the same, a solid-state image sensor, an infrared sensor, a camera module, and an inkjet ink.
  • color filters are colored photosensitive by containing a polyfunctional monomer, a photopolymerization initiator, an alkali-soluble resin and other components in a pigment dispersion composition such as a curable composition in which an organic pigment or an inorganic pigment is dispersed. It is used as a composition and is produced by a photolitho method or the like. It is known that a squarylium compound having a dihydroperimidine skeleton is used as the pigment. Examples of the conventional squarylium compound having a dihydroperimidine skeleton include those of Patent Document 1 below. Moreover, as an example of the conventional naphthoxadiazole squarylium compound, the one described in Patent Document 2 can be mentioned.
  • Patent Document 1 describes a near-infrared absorbing dye [A] represented by the following general formula (1).
  • General formula (1) a near-infrared absorbing dye [A] represented by the following general formula (1).
  • R 1 to R 5 each independently contain a hydrogen atom, an alkyl group which may have a substituent, an aryl group which may have a substituent, an alkoxy group which may have a substituent, and a substituent. It represents an aryloxy group, a sulfo group, SO 3- M + , -SO 2 NR 6 R 7 , -COOR 6 , -CONR 6 R 7 , a nitro group, a cyano group, and a halogen atom which may have. At least one of 1 to R 5 represents a substituent other than a hydrogen atom.
  • Each of X 1 to X 10 independently has a hydrogen atom, an alkyl group which may have a substituent, an alkenyl group which may have a substituent, an aryl group which may have a substituent, and a substituent. May have an aralkyl group, an alkoxy group which may have a substituent, an aryloxy group which may have a substituent, an amino group, a substituted amino group, a sulfo group, -SO 2 NR 6 R 7 , -COOR. Represents 6 , -CONR 6 R 7 , nitro group, cyano group, halogen atom.
  • substituents may be bonded to each other to form a ring.
  • M + represents an inorganic or organic cation
  • R 6 and R 7 each independently represent a hydrogen atom and an alkyl group which may have a substituent.
  • Patent Document 2 describes a naphthooxadinin squarylium compound represented by the following general formula (1).
  • R 1 , R 2 , R 3 , R 4 , R 5 and R 6 represent a hydrogen atom, an alkyl group, a cycloalkyl group, an aryl group, a heterocyclic group or an aralkyl group, respectively, and R 1 and R 2 Alternatively, R 4 and R 5 may combine with each other to form a 5- or 6-membered ring.
  • R 7 and R 8 are hydrogen atoms, alkyl groups having 1 to 8 carbon atoms, alkoxy groups having 1 to 6 carbon atoms, aryloxy groups, halogen atoms, alkoxycarbonyl groups, cyano groups, nitro groups, amino groups, It represents a sulfo group or a carboxyl group, and the sulfo group and the carboxyl group may be a salt, and n represents an integer of 1 to 3.
  • Patent Document 1 Japanese Patent Application Laid-Open No. 2017-88765
  • Patent Document 2 Japanese Patent Application Laid-Open No. 3996234
  • a squarylium compound having a dihydroperimidine skeleton As a dye used in the formation of members such as color filters, a squarylium compound having a dihydroperimidine skeleton is known. However, as a result of diligent studies, the present inventors have found that a squarylium compound having a dihydroperimidine skeleton may not have sufficient moisture resistance in a membrane containing the above compound.
  • An object to be solved by one embodiment of the present invention is to provide a curable composition having excellent moisture resistance of the obtained cured film. Further, the problem to be solved by another embodiment of the present invention is to provide a film using the curable composition, an optical filter and a method for manufacturing the same, a solid-state image sensor, an infrared sensor, a camera module, and an inkjet ink. It is to be.
  • Means for solving the above problems include the following aspects. ⁇ 1> A curable composition containing a dye having a structure represented by the following formula (1) and a curable compound.
  • R 1 to R 6 each independently represent a hydrogen atom or a substituent
  • R 7 and R 8 each independently represent a substituent
  • A represents O or NR 9
  • R 9 represents a hydrogen atom or a substituent
  • n1 and n2 each independently represent an integer of 0 to 5
  • R 1 and R 2 may be bonded to each other to form a ring
  • R 4 may be formed.
  • R 5 may be combined with each other to form a ring.
  • X 1 , X 2 , Y 1 and Y 2 are independently alkylene groups, alkynylene groups, cycloalkylene groups, arylene groups, heteroarylene groups, or divalent groups obtained by binding two or more of them.
  • ⁇ 4> The curable composition according to ⁇ 3>, wherein one or more of X 1 , X 2 , Y 1 and Y 2 in the above formula (2) is a group having an aromatic ring or a hetero ring.
  • ⁇ 5> The curable composition according to ⁇ 3> or ⁇ 4>, wherein Z 1 and Z 2 in the above formula (2) are single bonds.
  • ⁇ 6> The curable composition according to any one of ⁇ 1> to ⁇ 5>, which further contains a photopolymerization initiator.
  • ⁇ 8> The curable composition according to any one of ⁇ 1> to ⁇ 7>, which further contains a dispersant.
  • a film comprising the curable composition according to any one of ⁇ 1> to ⁇ 8> or obtained by curing the curable composition.
  • the optical filter according to ⁇ 10> which is an infrared cut filter or an infrared transmission filter.
  • ⁇ 12> A solid-state image sensor having the film according to ⁇ 9>.
  • ⁇ 13> An infrared sensor having the film according to ⁇ 9>.
  • ⁇ 14> A step of applying the curable composition according to any one of ⁇ 1> to ⁇ 8> on a support to form a composition layer, and a step of exposing the composition layer in a pattern.
  • a method for manufacturing an optical filter which comprises a step of developing and removing an unexposed portion to form a pattern.
  • ⁇ 15> A step of applying the curable composition according to any one of ⁇ 1> to ⁇ 8> on a support to form a composition layer, and then curing to form a layer, on the layer.
  • Manufacture of an optical filter including a step of forming a photoresist layer, a step of patterning the photoresist layer by exposure and development to obtain a resist pattern, and a step of dry etching the layer using the resist pattern as an etching mask.
  • Method. ⁇ 16> A camera module having a solid-state image sensor and the optical filter according to ⁇ 10> or ⁇ 11>.
  • ⁇ 17> An inkjet ink containing the curable composition according to any one of ⁇ 1> to ⁇ 8>.
  • a curable composition having excellent moisture resistance of the obtained cured film. Further, according to another embodiment of the present invention, a film using the curable composition, an optical filter and a method for producing the same, a solid-state image sensor, an infrared sensor, a camera module, and an inkjet ink are provided.
  • total solid content refers to the total mass of the components excluding the solvent from the total composition of the composition.
  • solid content is a component excluding the solvent as described above, and may be, for example, a solid or a liquid at 25 ° C.
  • the notation not describing substitution and non-substitution includes those having no substituent as well as those having a substituent.
  • alkyl group includes not only an alkyl group having no substituent (unsubstituted alkyl group) but also an alkyl group having a substituent (substituted alkyl group).
  • the term "exposure” as used herein includes not only exposure using light but also drawing using particle beams such as an electron beam and an ion beam. Further, as the light used for exposure, generally, the emission line spectrum of a mercury lamp, far ultraviolet rays typified by an excima laser, extreme ultraviolet rays (EUV light), X-rays, active rays such as electron beams, or radiation can be mentioned.
  • EUV light extreme ultraviolet rays
  • X-rays active rays
  • (meth) acrylate” represents both acrylate and methacrylate, or either
  • (meth) acrylic” represents both acrylic and methacrylic, or either.
  • Acryloyl represents both acryloyl and / or methacrylic.
  • Me in the chemical formula is a methyl group
  • Et is an ethyl group
  • Pr is a propyl group
  • Bu is a butyl group
  • Ac is an acetyl group
  • Bn is a benzyl group
  • Ph is a phenyl group.
  • the term "process” is included in this term not only as an independent process but also as long as the desired action of the process is achieved even if it cannot be clearly distinguished from other processes. ..
  • “% by mass” and “% by weight” are synonymous, and “parts by mass” and “parts by weight” are synonymous.
  • a combination of two or more preferred embodiments is a more preferred embodiment.
  • the transmittance in the present disclosure is the transmittance at 25 ° C. unless otherwise specified.
  • the weight average molecular weight and the number average molecular weight are defined as polystyrene-equivalent values measured by gel permeation chromatography (GPC).
  • the curable composition according to the present disclosure includes a dye having a structure represented by the following formula (1) (hereinafter, also referred to as "specific dye”) and a curable compound.
  • R 1 to R 6 each independently represent a hydrogen atom or a substituent
  • R 7 and R 8 each independently represent a substituent
  • A represents O or NR 9
  • R 9 represents a hydrogen atom or a substituent
  • n1 and n2 each independently represent an integer of 0 to 5
  • R 1 and R 2 may be bonded to each other to form a ring
  • R 4 may be formed.
  • R 5 may be combined with each other to form a ring.
  • a cured film having excellent moisture resistance can be obtained.
  • the squarylium compound having a dihydroperimidine skeleton may not have sufficient moisture resistance in the membrane containing the compound.
  • the moisture resistance may not be sufficient when a film is formed. Therefore, as a result of diligent studies by the present inventors, a cured film having excellent moisture resistance can be obtained by using it in a curable composition containing a dye having a structure represented by the above formula (1) and a curable compound. Found to be obtained.
  • the dye having the structure represented by the above formula (1) absorbs less in the wavelength range of 450 nm to 600 nm in the solution than the conventional squarylium dye having a dihydroperimidine skeleton, but the spectral broadening occurs at the time of film formation.
  • the present inventors have found that there is a problem that the visible transparency is lowered.
  • a cured film having excellent spectral characteristics can be obtained in the above embodiment.
  • the width of the absorption spectrum (absorption band) becomes narrower.
  • the absorption in the visible light region becomes small, the spectroscopic broadening due to film formation can be suppressed, and the spectral characteristics (visible transparency) are also excellent.
  • the details are unknown, a cured film having excellent light resistance can be obtained.
  • the conventional squarylium dye having a dihydroperimidine skeleton has many NH structures, the resin and the dye molecules are easily aggregated by hydrogen bonding with each other, so that aggregates (foreign substances) are generated and foreign matter defects are generated. Likely to happen.
  • the dye having the structure represented by the above formula (1) has a small amount of NH, so that it is difficult to aggregate and has excellent foreign matter defect suppressing property.
  • the specific dye used in the present disclosure is a dye having a structure represented by the above formula (1).
  • the specific dye can be suitably used as an infrared absorbing dye.
  • the specific dye is a dye (also referred to as a "colorant"), preferably a pigment or a dye, and more preferably a pigment.
  • the pigment means a dye that is insoluble in a solvent.
  • the dye refers to a dye that dissolves in a solvent.
  • the pigment used in the present disclosure preferably has, for example, a dissolution amount in 100 g of propylene glycol monomethyl ether acetate at 25 ° C. and a dissolution amount in 100 g of water at 25 ° C. of 0.1 g or less.
  • the dye used in the present disclosure preferably has at least one of a dissolved amount in 100 g of propylene glycol monomethyl ether acetate at 25 ° C. and a dissolved amount in 100 g of water at 25 ° C. exceeding 0.1 g and 1 g or more. More preferably, it is more preferably 5 g or more.
  • the dye represented by the above formula (1) is described below when, for example, the naphthooxadinin ring structure and the squarylium structure are bonded at the ortho position of the amino group of the naphthooxadinin ring structure shown below. It may be represented by any of the resonance structure notations shown.
  • the compounds shown below represent the same compounds except that the notation positions of the resonance structures of cations and anions are different.
  • R 1 and R 2 in the formula (1) are independently substituents, or R 1 and R 2 are bonded to each other. It is preferable that a ring is formed, and it is more preferable that it is an alkyl group, an aryl group, or a heteroaryl group, or that R 1 and R 2 are bonded to each other to form a ring. It is further preferred that bonded to each other to form a ring R 1 and R 2, it is particularly preferable to combine with each other R 1 and R 2 form a ring having an aromatic ring structure.
  • R 4 and R 5 in the formula (1) are independently substituents, or R 4 and R 5 are bonded to each other. It is preferable that a ring is formed, and it is more preferable that it is an alkyl group, an aryl group, or a heteroaryl group, or that R 4 and R 5 are bonded to each other to form a ring. It is further preferred that bonded together R 4 and R 5 form a ring, it is particularly preferable to bond together with R 4 and R 5 form a ring having an aromatic ring structure.
  • R 1 and R 2 and R 4 and R 5 in the formula (1) are groups having the same structure.
  • the total carbon number of R 1 and R 2 in the formula (1) is preferably 2 to 60, preferably 4 to 40, independently from the viewpoint of the spectral characteristics, light resistance and moisture resistance of the obtained cured film. This is more preferable, and 8 to 20 is particularly preferable.
  • the total carbon number of R 4 and R 5 in the formula (1) is preferably 2 to 60, preferably 4 to 40, independently from the viewpoint of the spectral characteristics, light resistance and moisture resistance of the obtained cured film. Is more preferable, and 8 to 20 is particularly preferable.
  • any one of R 1 , R 2 , R 4 and R 5 in the formula (1) is preferably a group having an aromatic ring or a heterocycle, and R 1 , one of R 2, R 4 and R 5 is more preferably a group having an aromatic ring. Further, from the viewpoint of the spectral characteristics of the obtained cured film, any one of R 1 and R 2 in the formula (1) is preferably a group having an aromatic ring or a heterocycle, and R 1 and R 2 It is more preferable that any one is a group having an aromatic ring.
  • any one of R 4 and R 5 in the formula (1) is preferably a group having an aromatic ring or a heterocycle, and R 4 and R 5 It is more preferable that any one of them is a group having an aromatic ring.
  • the rings formed by R 1 and R 2 or R 4 and R 5 bonded to each other are independently obtained from the viewpoint of the spectral characteristics of the obtained cured film, and the aliphatic ring, Alternatively, it is preferably a heteroaliphatic ring, more preferably a 5- or 6-membered aliphatic ring, or a 5- or 6-membered heteroaliphatic ring, and the aromatic ring is a condensed ring. It is more preferably a 5-membered or 6-membered aliphatic ring, or a 5-membered or 6-membered heteroaliphatic ring in which the aromatic ring is fused, and a 5-membered ring or a condensed aromatic ring.
  • a 6-membered aliphatic ring is particularly preferable.
  • the ring formed by R 1 and R 2 or R 4 and R 5 bonded to each other has an aromatic ring condensed from the viewpoint of the spectral characteristics of the obtained cured film. It is more preferable that it is an aliphatic ring, which may be used.
  • the spectral characteristics, light resistance, and moisture resistance of the obtained cured film are independently obtained as a ring formed by R 1 and R 2 or R 4 and R 5 bonded to each other.
  • R 3 and R 6 in the formula (1) are each independently preferably a hydrogen atom or an alkyl group from the viewpoint of the spectral characteristics, light resistance and moisture resistance of the obtained cured film, and are preferably a hydrogen atom or an alkyl group. It is more preferably a methyl group and particularly preferably a hydrogen atom. Further, from the viewpoint of the spectral characteristics, light resistance and moisture resistance of the obtained cured film, it is preferable that R 3 and R 6 in the formula (1) have the same group.
  • R 7 and R 8 in the formula (1) are independently alkyl group, aryl group, heteroaryl group, halogen atom, carboxy group, hydroxy group, alkoxy group, allyloxy group, nitro group, cyano group, or sulfo group.
  • n1 and n2 in the formula (1) are preferably integers of 0 to 2, and more preferably 0 or 1.
  • n1 and n2 in the formula (1) have the same value. Further, when n1 and n2 in the formula (1) have the same value, it is preferable that the bonding positions of R 7 and R 8 in the formula (1) are the same positions in each naphthoxadiazole ring structure, respectively.
  • a in the formula (1) is preferably O or NH from the viewpoint of the spectral characteristics, light resistance and moisture resistance of the obtained cured film, and the spectral characteristics, light resistance, moisture resistance and foreign matter defects of the obtained cured film. From the viewpoint of suppressivity, it is more preferably O. From the viewpoint of spectral characteristics, light resistance and moisture resistance of the obtained cured film, R 9 in the formula (1) is preferably a hydrogen atom or an alkyl group, and preferably a hydrogen atom or a methyl group. More preferably, it is a hydrogen atom. Further, the dye having the structure represented by the above formula (1) is preferably a compound having point symmetry from the viewpoint of the spectral characteristics, light resistance and moisture resistance of the obtained cured film. Further, the bond position of the squarylium structure in the formula (1) is preferably the same position of each naphthoxadiazole ring structure.
  • the dye having the structure represented by the above formula (1) is a dye having the structure represented by the following formula (2) from the viewpoint of the spectral characteristics, light resistance, moisture resistance and foreign matter defect suppressing property of the obtained cured film. Is preferable.
  • X 1 , X 2 , Y 1 and Y 2 are independently alkylene groups, alkynylene groups, cycloalkylene groups, arylene groups, heteroarylene groups, or divalent groups obtained by binding two or more of them.
  • R 7, R 8, n1 and n2 in Formula (2) has the same meaning as R 7, R 8, n1 and n2 in Formula (1), a preferable embodiment thereof is also the same.
  • one or more of X 1 , X 2 , Y 1 and Y 2 in the formula (2) is preferably a group having an aromatic ring or a heterocycle, and X. It is more preferable that one or more of 1 , X 2 , Y 1 and Y 2 are groups having an aromatic ring.
  • X 1 and X 2 in the formula (2) are preferably an alkylene group, an arylene group, or a hetero-arylene group from the viewpoint of the spectral characteristics, light resistance and moisture resistance of the obtained cured film, and are arylene. It is more preferably a group or a heteroarylene group, further preferably an arylene group, particularly preferably a 1,2-phenylene group or a 2,3-naphthalenylene group, and particularly preferably a 1,2-phenylene group. Most preferably it is a group. Further, from the viewpoint of the spectral characteristics, light resistance and moisture resistance of the obtained cured film, it is preferable that X 1 and X 2 in the formula (2) are the same group.
  • Y 1 and Y 2 in the formula (2) are each independently preferably an alkylene group, an arylene group, or a hetero-arylene group from the viewpoint of the spectral characteristics, light resistance and moisture resistance of the obtained cured film. More preferably, it is a group or an arylene group, a methylene group, an ethylene group, a 1,3-propylene group, a 1,2-cyclopentandyl group, a 1,2-cyclohexanediyl group, or a 1,2-phenylene. It is more preferably a group, and particularly preferably a 1,2-phenylene group.
  • Y 1 and Y 2 in the formula (2) have the same group.
  • X 1 , X 2 , Y 1 and Y 2 in the formula (2) may further have a substituent on the above group.
  • substituent those mentioned above are preferably mentioned as the substituent in R 1 to R 9 .
  • Z 1 and Z 2 in the formula (2) are independently, single bond, -O-, carbonyl group, -S-, or -S from the viewpoint of the spectral characteristics, light resistance and moisture resistance of the obtained cured film, respectively.
  • R N in formula (2) is an alkyl group, or is preferably an aryl group, more preferably an alkyl group, particularly preferably a methyl group.
  • the dye having the structure represented by the above formula (1) is a dye having the structure represented by the following formula (3) from the viewpoint of the spectral characteristics, light resistance, moisture resistance and foreign matter defect suppressing property of the obtained cured film. Is more preferable.
  • R 7 and R 8 each independently represent a substituent
  • n1 and n2 each independently represent an integer of 0 to 5
  • R 10 to R 13 each independently represent a substituent.
  • n3 to n6 independently represent an integer of 0 to 4.
  • R 7, R 8, n1 and n2 in Formula (3) has the same meaning as R 7, R 8, n1 and n2 in Formula (1), a preferable embodiment thereof is also the same.
  • R 10 to R 13 in the formula (3) are independently each of an alkyl group, an aryl group, a heteroaryl group, a halogen atom, a carboxy group, and a hydroxy group from the viewpoint of the spectral characteristics, light resistance, and moisture resistance of the obtained cured film.
  • n3 to n6 in the formula (3) are preferably integers of 0 to 2, and more preferably 0 or 1.
  • the maximum absorption wavelength of the specific dye is preferably in the wavelength range of 700 nm to 1,100 nm, more preferably in the wavelength range of 760 nm to 960 nm, and particularly preferably in the wavelength range of 760 nm to 850 nm. ..
  • the maximum absorption wavelength is measured using a Cary5000 UV-Vis-NIR spectrophotometer (manufactured by Agilent Technologies, Inc.).
  • the half-value width of the peak wavelength at the maximum absorption wavelength is preferably 2,000 cm -1 or less, more preferably 1,500Cm -1 or less, 1,350Cm - 1 or less is more preferable.
  • the lower limit of the half width is not particularly limited, but is preferably 500 cm -1 or more.
  • the full width at half maximum is measured using a Cary5000 UV-Vis-NIR spectrophotometer (manufactured by Agilent Technologies, Inc.).
  • the molar extinction coefficient of the specific dye at the maximum absorption wavelength is preferably 1.0 ⁇ 10 5 L / (mol ⁇ cm) or more, and preferably 1.5 ⁇ 10 5 L / (mol ⁇ cm) or more. More preferred.
  • the molar extinction coefficient is measured by using a Cary5000 UV-Vis-NIR spectrophotometer (manufactured by Agilent Technologies).
  • the specific dye is preferably in a state of being dispersed in the form of particles. In the state of being dispersed in the form of particles, there is an advantage that the durability of the obtained cured film is improved. Further, in the case of the above-mentioned particulate and dispersed state, the specific dye is preferably a pigment. Further, the curable composition according to the present disclosure further contains a solvent described later, and in the curable composition, a dye having a structure represented by the above formula (1) is dispersed as particles in the solvent. It is preferably contained in.
  • the curable composition according to the present disclosure preferably contains particles of a specific dye having a number average particle size of 1 nm to 500 nm, more preferably contains particles of a specific dye having a number average particle size of 10 nm to 200 nm, and the number average particles. It is particularly preferable to contain particles of a specific dye having a diameter of 10 nm to 100 nm.
  • the number average particle size of the particles is 1 nm or more, the surface energy of the particles is small, so that the particles are less likely to aggregate, the particles are easily dispersed, and the dispersed state is easily maintained, which is preferable.
  • the average particle size of particles shall be measured by arithmetic mean (number average) using MICROTRAC UPA 150 manufactured by Nikkiso Co., Ltd.
  • the content of the specific dye in the curable composition according to the present disclosure is preferably 10% by mass to 70% by mass, more preferably 15% by mass to 60% by mass, and 20% by mass, based on the total solid content of the curable composition. More preferably, it is by mass% to 50% by mass.
  • SQ-1 to SQ-53 which are specific examples of specific dyes, will be shown, but the present invention is not limited thereto.
  • the method for producing the specific dye is not particularly limited, and can be appropriately produced by referring to a known production method.
  • a diaminonaphthalene compound is induced to an aminohydroxynaphthalene compound, and the aminohydroxynaphthalene compound and a ketone compound are reacted to obtain a naphthooxadinine compound, which is obtained by converting 2 molar equivalents of naphthoxadinin compound and 1 molar equivalent of squaric acid (quartic acid). )
  • a diaminonaphthalene compound is induced to an aminohydroxynaphthalene compound, and the aminohydroxynaphthalene compound and a ketone compound are reacted to obtain a naphthooxadinine compound, which is obtained by converting 2 molar equivalents of naphthoxadinin compound and 1 molar equivalent of squaric acid (quartic acid). )
  • squaric acid quartic acid
  • the crystal form can be adjusted by contacting with an organic solvent such as N, N-dimethylformamide, dimethyl sulfoxide, dimethylacetamide, N-methylpyrrolidone, tetrahydrofuran, 1,4-dioxane and the like. At that time, heating or cooling may be performed to adjust the particle size, or another solvent may be added before filtering.
  • an organic solvent such as N, N-dimethylformamide, dimethyl sulfoxide, dimethylacetamide, N-methylpyrrolidone, tetrahydrofuran, 1,4-dioxane and the like.
  • the curable composition according to the present disclosure is a curable composition from which a cured film is finally obtained by curing. Further, the curable composition according to the present disclosure is preferably a composition capable of forming a pattern of a cured film by pattern exposure, for example. That is, the curable composition according to the present disclosure is preferably a negative type composition. When the curable composition according to the present disclosure is a negative type composition, it is preferable to include, for example, a polymerization initiator, a polymerizable compound, and an alkali-soluble resin.
  • the curable composition according to the present disclosure is a positive composition
  • a photoacid generator for example, a polymer having a structural unit having an acid group protected by an acid-degradable group, and a polymer having a structural unit having an acid group protected by an acid-degradable group, and , A polymer having a structural unit having a crosslinkable group, and the like.
  • a negative type composition for example, each component contained in the embodiment in which the curable composition according to the present disclosure is a negative type composition.
  • each component described in International Publication No. 2014/003111 can be mentioned, and the preferred embodiment is also the same.
  • the curable composition according to the present disclosure contains a curable compound.
  • the curable compound that can be used in the present disclosure is preferably a polymerizable compound, more preferably an ethylenically unsaturated compound, and particularly preferably a compound having a terminal ethylenically unsaturated group.
  • known compounds can be used without particular limitation. They have chemical forms such as, for example, monomers, prepolymers, ie dimers, trimers and oligomers, or mixtures thereof and copolymers thereof.
  • Examples of the monomer and its copolymer include unsaturated carboxylic acids (for example, acrylic acid, methacrylic acid, itaconic acid, crotonic acid, isocrotonic acid, maleic acid, etc.), esters thereof, and amides, which are preferable. Is an ester of an unsaturated carboxylic acid and an aliphatic polyhydric alcohol compound, and an amide of an unsaturated carboxylic acid and an aliphatic polyvalent amine compound.
  • unsaturated carboxylic acids for example, acrylic acid, methacrylic acid, itaconic acid, crotonic acid, isocrotonic acid, maleic acid, etc.
  • esters thereof for example, esters thereof, and amides, which are preferable. Is an ester of an unsaturated carboxylic acid and an aliphatic polyhydric alcohol compound, and an amide of an unsaturated carboxylic acid and an aliphatic polyvalent amine compound.
  • a dehydration condensation reaction product with a functional carboxylic acid is also preferably used.
  • an unsaturated carboxylic acid ester having an electrophilic substituent such as an isocyanate group or an epoxy group
  • An unsaturated carboxylic acid ester having a desorbing substituent such as a tosyloxy group or a substitution reaction product of amides with monofunctional or polyfunctional alcohols, amines and thiols is also suitable. Further, as another example, it is also possible to use a compound group in which unsaturated phosphonic acid, styrene, vinyl ether or the like is replaced with unsaturated carboxylic acid.
  • the monomer of the ester of the aliphatic polyhydric alcohol compound and the unsaturated carboxylic acid include ethylene glycol diacrylate, triethylene glycol diacrylate, 1,3-butanediol diacrylate, and tetramethylene glycol as acrylic acid esters.
  • methacrylic acid esters examples include tetramethylene glycol dimethacrylate, triethylene glycol dimethacrylate, neopentyl glycol dimethacrylate, trimethylpropantrimethacrylate, trimethylol ethanetrimethacrylate, ethylene glycol dimethacrylate, and 1,3-butanediol dimethacrylate.
  • a urethane-based addition-polymerizable compound produced by using an addition reaction of an isocyanate group and a hydroxy group is also suitable, and specific examples thereof are described in, for example, Japanese Patent Publication No. 48-41708.
  • Two or more polymerizable vinyl groups are contained in one molecule obtained by adding a vinyl monomer containing a hydroxy group represented by the following general formula (I) to a polyisocyanate compound having two or more isocyanate groups in one molecule. Examples thereof include vinyl urethane compounds.
  • CH 2 C (R) COOCH 2 CH (R') OH (I) (However, R and R'indicate H or CH 3. )
  • urethane acrylates such as those described in JP-A-51-37193, Toku-Kohei 2-32293, Toku-Kohei 2-16765, Toku-Kosho 58-49860, Toku-Kosho 56-176654, and Toku-Kosho Urethane compounds having an ethylene oxide-based skeleton described in Kosho 62-39417 and Tokusho 62-39418 are also suitable.
  • examples of the polymerizable compound include the compounds described in paragraphs 0178 to 0190 of JP-A-2007-277514. Further, as the polymerizable compound, the epoxy compound described in JP-A-2015-187211 may be used.
  • the content of the curable compound in the curable composition is preferably 1% by mass to 90% by mass and 5% by mass to 80% by mass with respect to the total solid content of the curable composition. Is more preferable, and 10% by mass to 70% by mass is further preferable. When the content of the polymerizable compound is within the above range, the curable composition is excellent in curability.
  • the curable composition according to the present disclosure preferably further contains a polymerization initiator, and more preferably further contains a photopolymerization initiator.
  • the photopolymerization initiator is not particularly limited as long as it has the ability to initiate the polymerization of the polymerizable compound, and can be appropriately selected from known photopolymerization initiators.
  • a compound having photosensitivity to light rays in the ultraviolet region to the visible region is preferable. Further, it may be a compound that produces an active radical by causing some action with a photoexcited sensitizer.
  • the photopolymerization initiator is preferably a photoradical polymerization initiator.
  • the photopolymerization initiator examples include halogenated hydrocarbon derivatives (for example, compounds having a triazine skeleton, compounds having an oxadiazole skeleton, etc.), acylphosphine compounds, hexaarylbiimidazole, oxime compounds, organic peroxides, and the like.
  • halogenated hydrocarbon derivatives for example, compounds having a triazine skeleton, compounds having an oxadiazole skeleton, etc.
  • acylphosphine compounds examples include hexaarylbiimidazole, oxime compounds, organic peroxides, and the like.
  • oxime compounds examples include thio compounds, ketone compounds, aromatic onium salts, ⁇ -hydroxyketone compounds and ⁇ -aminoketone compounds.
  • the photopolymerization initiator includes trihalomethyltriazine compound, benzyldimethylketal compound, ⁇ -hydroxyketone compound, ⁇ -aminoketone compound, acylphosphine compound, phosphine oxide compound, metallocene compound, oxime compound, and triarylimidazole.
  • Dimer, onium compounds, benzothiazole compounds, benzophenone compounds, acetophenone compounds, cyclopentadiene-benzene-iron complexes, halomethyloxaziazole compounds and 3-aryl substituted coumarin compounds are preferred, oxime compounds, ⁇ -hydroxyketone compounds, ⁇ - A compound selected from an aminoketone compound and an acylphosphine compound is more preferable, and an oxime compound is further preferable.
  • the descriptions in paragraphs 0065 to 0111 of JP-A-2014-130173 and paragraphs 0274 to 0306 of JP-A-2013-29760 can be referred to, and these contents are incorporated in the present disclosure.
  • Examples of commercially available ⁇ -hydroxyketone compounds include IRGACURE 184, DAROCUR 1173, IRGACURE 500, IRGACURE 2959, and IRGACURE 127 (all manufactured by BASF).
  • Examples of commercially available ⁇ -aminoketone compounds include IRGACURE 907, IRGACURE 369, IRGACURE 379, and IRGACURE 379EG (all manufactured by BASF).
  • Examples of commercially available acylphosphine compounds include IRGACURE 819 and DAROCUR TPO (all manufactured by BASF).
  • Examples of the oxime compound include the compounds described in JP-A-2001-233842, the compounds described in JP-A-2000-80068, and the compounds described in JP-A-2006-342166.
  • 2-acetoxyimino-1-phenylpropane-1-one 2-benzoyloxyimino-1-phenylpropane-1-one, 3- (4-toluenesulfonyloxy) iminobutane-2-one, and 2-ethoxy Examples thereof include carbonyloxyimino-1-phenylpropan-1-one.
  • IRGACURE OXE01, IRGACURE OXE02, IRGACURE OXE03, and IRGACURE OXE04 are also preferably used.
  • TRONLY TR-PBG-304 TRONLY TR-PBG-309
  • TRONLY TR-PBG-305 manufactured by Changzhou Powerful Electronic New Materials Co., Ltd. (CHANGZHOU TRONLY NEW ELECTRONIC MATERIALS CO., LTD)
  • ADEKA Arkuru ADEKA PUTMER N-1919 (Photopolymerization Initiator 2 of JP2012-14052A) (all manufactured by ADEKA Corporation).
  • an oxime compound having a fluorene ring can also be used as the photopolymerization initiator.
  • Specific examples of the oxime compound having a fluorene ring include the compounds described in JP-A-2014-137466. This content is incorporated in this disclosure.
  • an oxime compound having a benzofuran skeleton can also be used as a photopolymerization initiator.
  • Specific examples thereof include compounds OE-01 to OE-75 described in International Publication No. 2015/036910.
  • an oxime compound having a skeleton in which at least one benzene ring of the carbazole ring is a naphthalene ring can also be used.
  • Specific examples of such an oxime compound include the compounds described in International Publication No. 2013/083505.
  • an oxime compound having a fluorine atom can also be used as the photopolymerization initiator.
  • Specific examples of the oxime compound having a fluorine atom are described in the compounds described in JP-A-2010-262028, the compounds 24, 36-40 described in JP-A-2014-500852, and JP-A-2013-164471.
  • Compound (C-3) and the like This content is incorporated in this disclosure.
  • an oxime compound having a nitro group can be used as a photopolymerization initiator.
  • the oxime compound having a nitro group is also preferably a dimer.
  • Specific examples of the oxime compound having a nitro group include the compounds described in paragraphs 0031 to 0047 of JP2013-114249A, paragraphs 0008 to 0012 and 0070 to 0079 of JP2014-137466, and Patent No. 4223071. Examples thereof include the compounds described in paragraphs 0007 to 0025 of the publication, ADEKA ARKULS NCI-831 (manufactured by ADEKA Corporation) and the like.
  • the oxime compound is preferably a compound having a maximum absorption wavelength in the wavelength region of 350 nm to 500 nm, and more preferably a compound having a maximum absorption wavelength in the wavelength region of 360 nm to 480 nm. Further, the oxime compound is preferably a compound having a large absorbance at wavelengths of 365 nm and 405 nm.
  • the molar extinction coefficient of the oxime compound at a wavelength of 365 nm or 405 nm is preferably 1,000 to 300,000, more preferably 2,000 to 300,000, and 5,000 to 200. It is particularly preferably 000.
  • the molar extinction coefficient of a compound can be measured using a known method. For example, it is preferable to measure at a concentration of 0.01 g / L using an ethyl acetate solvent with an ultraviolet-visible spectrophotometer (Cary-5 spectrophotometer manufactured by Varian).
  • a bifunctional or trifunctional or higher functional photopolymerization initiator may be used as the photopolymerization initiator.
  • Specific examples of such a photopolymerization initiator include paragraphs 0417 to 0412 of JP-A-2010-527339, JP-A-2011-524436, International Publication No. 2015/004565, and JP-A-2016-532675.
  • the polymerization initiator may be used alone or in combination of two or more.
  • the content of the polymerization initiator in the curable composition is preferably 0.1 to 50% by mass, more preferably 0.5 to 30% by mass, based on the total solid content of the composition. Particularly preferably, it is 1 to 20% by mass. In this range, good sensitivity and pattern formation can be obtained.
  • the curable composition according to the present disclosure preferably contains at least one of alkali-soluble resins.
  • the alkali-soluble resin is a polymer polymer having at least one group (for example, a molecule having an acrylic copolymer or a styrene copolymer as a main chain) that promotes alkali solubility in the molecule (preferably a molecule having an acrylic copolymer or a styrene copolymer as a main chain).
  • Carboxy group, phosphoric acid group, sulfonic acid group, etc. can be appropriately selected from the alkali-soluble resins.
  • it is soluble in an organic solvent and can be developed with a weak alkaline aqueous solution.
  • a known radical polymerization method For the production of the alkali-soluble resin, for example, a known radical polymerization method can be applied. Polymerization conditions such as temperature, pressure, type and amount of radical initiator, type of solvent, etc. when producing an alkali-soluble resin by a radical polymerization method can be easily set by those skilled in the art, and the conditions are experimentally determined. You can also do it.
  • a polymer polymer a polymer having a carboxylic acid in the side chain is preferable. For example, in JP-A-59-44615, Toku-Kosho 54-34327, Toku-Kosho 58-125777, Toku-Kosho 54-25957, JP-A-59-53836, and JP-A-59-71048.
  • Methacrylic acid copolymers acrylic acid copolymers, itaconic acid copolymers, crotonic acid copolymers, maleic acid copolymers, partially esterified maleic acid copolymers, etc., as described, and side chains.
  • examples thereof include an acidic cellulose derivative having a carboxylic acid, a polymer having a hydroxy group and an acid anhydride added thereto, and a polymer polymer having a (meth) acryloyl group in the side chain is also preferable.
  • a copolymer of (meth) acrylic acid and another monomer copolymerizable therewith is particularly preferable.
  • Other monomers copolymerizable with the above (meth) acrylic acid include (meth) acrylic acid esters, crotonic acid esters, vinyl esters, maleic acid diesters, fumaric acid diesters, and itaconic acid diesters. , (Meta) acrylamides, styrenes, vinyl ethers, vinyl ketones, olefins, maleimides, (meth) acrylonitrile and the like.
  • (meth) acrylic acid esters examples include methyl (meth) acrylic acid, ethyl (meth) acrylic acid, n-propyl (meth) acrylic acid, isopropyl (meth) acrylic acid, and n-butyl (meth) acrylic acid.
  • the weight average molecular weight of the alkali-soluble resin that can be used in the present disclosure is preferably 5,000 or more, more preferably 10,000 to 300,000, and the number average molecular weight is preferably 1,000 or more. Yes, more preferably in the range of 2,000 to 250,000.
  • the degree of polydispersity is preferably in the range of 1.1 to 10, and more preferably in the range of 1.2 to 5.
  • These alkali-soluble resins may be any of a random polymer, a block polymer, a graft polymer and the like.
  • the alkali-soluble resin is also preferably an alkali-soluble resin having a polymerizable group.
  • the polymerizable group include a (meth) allyl group and a (meth) acryloyl group.
  • the alkali-soluble resin having a polymerizable group is preferably a resin containing a repeating unit having a polymerizable group in the side chain and a repeating unit having an acid group in the side chain.
  • the alkali-soluble resin is a monomer component containing a compound represented by the following formula (ED1) and / or a compound represented by the following formula (ED2) (hereinafter, these compounds may be referred to as "ether dimer”). It is also preferable to include the derived structural repeating unit.
  • R ED1 or R ED2 each independently represents a hydrocarbon group having 1 to 25 carbon atoms which may have a hydrogen atom or a substituent.
  • R ED3 represents a hydrogen atom or an organic group having 1 to 30 carbon atoms.
  • the description in JP-A-2010-168539 can be referred to, and the contents thereof are incorporated in the present specification.
  • alkali-soluble resin examples include the compounds described in paragraphs 0162 to 0175 of JP-A-2007-277514.
  • the content of the alkali-soluble resin in the curable composition is preferably 1% by mass to 20% by mass, more preferably 2% by mass to 15% by mass, based on the total solid content of the curable composition. Particularly preferably, it is 3% by mass to 12% by mass.
  • the curable composition according to the present disclosure may contain a chromatic colorant.
  • the chromatic colorant means a colorant other than the white colorant and the black colorant.
  • the chromatic colorant is preferably a colorant having absorption in a wavelength range of 400 nm or more and less than 650 nm.
  • the chromatic colorant examples include a red colorant, a green colorant, a blue colorant, a yellow colorant, a purple colorant, and an orange colorant.
  • the chromatic colorant may be a pigment or a dye. Pigments and dyes may be used in combination. Further, the pigment may be either an inorganic pigment or an organic pigment. Further, as the pigment, an inorganic pigment or a material in which a part of the organic-inorganic pigment is replaced with an organic chromophore can be used. Hue design can be facilitated by replacing inorganic pigments and organic-inorganic pigments with organic chromophores.
  • the average primary particle size of the pigment is preferably 1 nm to 200 nm.
  • the lower limit is more preferably 5 nm or more, further preferably 10 nm or more.
  • the upper limit is more preferably 180 nm or less, further preferably 150 nm or less, and particularly preferably 100 nm or less.
  • the primary particle size of the pigment can be determined from an image photograph obtained by observing the primary particles of the pigment with a transmission electron microscope. Specifically, the projected area of the primary particles of the pigment is obtained, and the corresponding circle-equivalent diameter is calculated as the primary particle diameter of the pigment.
  • the average primary particle diameter in the present disclosure is an arithmetic mean value of the primary particle diameter for the primary particles of 400 pigments.
  • the primary particles of the pigment refer to independent particles without aggregation.
  • the chromatic colorant preferably contains a pigment.
  • the content of the pigment in the chromatic colorant is preferably 50% by mass or more, more preferably 70% by mass or more, further preferably 80% by mass or more, and 90% by mass or more. Is particularly preferred. Examples of the pigment include those shown below.
  • a green pigment halogenation having an average number of halogen atoms in one molecule of 10 to 14, an average number of bromine atoms of 8 to 12, and an average number of chlorine atoms of 2 to 5.
  • Zinc phthalocyanine pigments can also be used. Specific examples include the compounds described in International Publication No. 2015/118720. Further, as the green pigment, a compound described in Chinese Patent Application Publication No. 1069009027, a phthalocyanine compound having a phosphoric acid ester described in International Publication No. 2012/10395 as a ligand, and the like can also be used.
  • an aluminum phthalocyanine compound having a phosphorus atom can also be used. Specific examples include the compounds described in paragraphs 0022 to 0030 of JP2012-247591A and paragraph numbers 0047 of JP2011-157478A.
  • the yellow pigment the pigment described in JP-A-2008-074985, the compound described in JP-A-2008-074987, the quinophthalone compound described in JP-A-2013-061622, and the like.
  • Pigments described in JP-A-2018-203798, pigments described in JP-A-2018-062578, quinophthalone-based yellow pigments described in JP-A-2018-155881, JP-A-2018-0626444 , The quinophthalone compound described in Japanese Patent No. 6432077, and the pigment described in Japanese Patent No. 6443711 can also be used.
  • the compound described in JP-A-2018-062644 can also be used. This compound can also be used as a pigment derivative.
  • the diketopyrrolopyrrole compound described in WO2012 / 102399, the diketopyrrolopyrrole compound described in WO2012 / 117965, the naphtholazo compound described in JP2012-229344 can also be used. it can.
  • red pigment a compound having a structure in which an aromatic ring group having an oxygen atom, a sulfur atom or a nitrogen atom bonded to the aromatic ring is bonded to a diketopyrrolopyrrole skeleton can also be used. it can.
  • a dye can also be used as the colorant.
  • the dye is not particularly limited, and a known dye can be used.
  • pyrazole azo system anilino azo system, triarylmethane system, anthraquinone system, anthrapyridone system, benzylidene system, oxonol system, pyrazolotriazole azo system, pyridone azo system, cyanine system, phenothiazine system, pyrrolopyrazole azomethine system, xanthene system
  • Examples thereof include phthalocyanine-based, benzopyran-based, indigo-based, and pyrromethene-based dyes.
  • the thiazole compound described in JP2012-158649A, the azo compound described in JP2011-184493, and the azo compound described in JP2011-145540 can also be preferably used.
  • the yellow dye the quinophthalone compounds described in paragraphs 0011 to 0034 of JP2013-054339A, the quinophthalone compounds described in paragraphs 0013 to 0058 of JP2014-026228, and the like can also be used.
  • the content of the chromatic colorant is preferably 1% by mass to 50% by mass with respect to the total solid content of the curable composition.
  • the total amount thereof is preferably within the above range.
  • the curable composition according to the present disclosure is a colorant that transmits near infrared rays (light having a wavelength in the near infrared region) and blocks visible light (light having a wavelength in the visible region) (hereinafter, coloring that blocks visible light). It can also contain an agent).
  • a curable composition containing a colorant that blocks visible light is preferably used as a curable composition for forming a near-infrared transmission filter.
  • the colorant that blocks visible light is preferably a colorant that absorbs light in the violet to red wavelength range. Further, in the present disclosure, the colorant that blocks visible light is preferably a colorant that blocks light in the wavelength region of 450 nm to 650 nm. Further, the colorant that blocks visible light is preferably a colorant that transmits light having a wavelength of 900 nm to 1,300 nm. In the present disclosure, the colorant that blocks visible light preferably satisfies at least one of the following requirements (A) and (B).
  • B Contains an organic black colorant.
  • Examples of the chromatic colorant include those described above.
  • Examples of the organic black colorant include bisbenzofuranone compounds, azomethine compounds, perillene compounds, and azo compounds, and bisbenzofuranone compounds and perillene compounds are preferable.
  • Examples of the bisbenzofuranone compound include the compounds described in JP-A-2010-534726, JP-A-2012-515233, and JP-A-2012-515234.
  • Examples of the perillene compound include the compounds described in paragraphs 0016 to 0020 of JP-A-2017-226821, C.I. I. Pigment Black 31, 32 and the like can be mentioned.
  • Examples of the azomethine compound include the compounds described in JP-A-1-1706601 and JP-A-2-0346664, and are available as, for example, "Chromofine Black A1103" manufactured by Dainichiseika Kogyo Co., Ltd.
  • Examples of the combination of chromatic colorants when black is formed by the combination of two or more kinds of chromatic colorants include the following. (1) An embodiment containing a yellow colorant, a blue colorant, a purple colorant, and a red colorant. (2) An embodiment containing a yellow colorant, a blue colorant, and a red colorant. (3) An embodiment containing a yellow colorant, a purple colorant, and a red colorant. (4) An embodiment containing a yellow colorant and a purple colorant. (5) An embodiment containing a green colorant, a blue colorant, a purple colorant, and a red colorant. (6) An embodiment containing a purple colorant and an orange colorant. (7) An embodiment containing a green colorant, a purple colorant, and a red colorant. (8) An embodiment containing a green colorant and a red colorant.
  • the ratio (mass ratio) of each colorant is preferably, for example, the following ratio.
  • the yellow colorant is more preferably 0.1 to 0.3, the blue colorant is more preferably 0.1 to 0.5, and the purple colorant is more preferably 0.01 to 0.2.
  • the red colorant is more preferably 0.1 to 0.5.
  • the yellow colorant is more preferably 0.1 to 0.3, the blue colorant is more preferably 0.1 to 0.5, and the red colorant is more preferably 0.1 to 0.5. ..
  • the curable composition may contain only one type of visible colorant, or may contain two or more types.
  • the content of the visible colorant is preferably 0.1% by mass to 70% by mass, more preferably 0.5% by mass to 60% by mass, based on the total mass of the curable composition. It is more preferably from mass% to 50% by mass.
  • the curable composition according to the present disclosure may contain a pigment derivative.
  • the pigment derivative include compounds in which at least one group selected from the group consisting of an acid group, a basic group and a hydrogen-bonding group is bonded to the pigment skeleton.
  • the acid group include a sulfo group, a carboxyl group, a phosphoric acid group, a boronic acid group, a sulfonimide group, a sulfonamide group and salts thereof, and a desalted structure of these salts.
  • alkali metal ions Li + , Na + , K +, etc.
  • alkaline earth metal ions Ca 2+ , Mg 2+, etc.
  • ammonium ions imidazolium ions, pyridinium ions, etc.
  • examples of the desalting structure of the salt include groups in which atoms or atomic groups forming a salt are eliminated from the salt.
  • the desalting structure of a salt of a carboxyl group is a carboxylate group (-COO-).
  • Examples of the basic group include an amino group, a pyridinyl group and salts thereof, and a desalted structure of these salts.
  • Examples of the atom or atomic group constituting the salt include hydroxide ion, halide ion, carboxylic acid ion, sulfonic acid ion, and phenoxide ion.
  • examples of the desalting structure of the salt include groups in which atoms or atomic groups forming a salt are eliminated from the salt.
  • a hydrogen-bonding group is a group that interacts with a hydrogen atom. Specific examples of the hydrogen-bonding group include an amide group, a hydroxy group, -NHCONHR, -NHCOOR, and -OCONHR.
  • R is preferably an alkyl group or an aryl group.
  • Examples of the pigment derivative include a compound represented by the formula (B1).
  • P represents the dye skeleton
  • L represents a single bond or a linking group
  • X represents an acid group, a basic group or a hydrogen bonding group
  • m represents an integer of 1 or more
  • n represents an integer of 1 or more. It represents an integer of 1 or more, and when m is 2 or more, a plurality of Ls and Xs may be different from each other, and when n is 2 or more, a plurality of Xs may be different from each other.
  • the pigment skeleton represented by P includes squarylium pigment structure, pyrrolopyrrolop pigment skeleton, diketopyrrolopyrrole pigment skeleton, quinacridone pigment skeleton, anthraquinone pigment skeleton, dianthraquinone pigment skeleton, benzoisoindole pigment skeleton, thiazineindigo pigment skeleton, and azo.
  • the structure is particularly preferred.
  • the linking groups represented by L include 1 to 100 carbon atoms, 0 to 10 nitrogen atoms, 0 to 50 oxygen atoms, 1 to 200 hydrogen atoms, and 0 to 20.
  • a group consisting of a single sulfur atom is preferable, and it may be unsubstituted or further having a substituent. Examples of the substituent include a substituent T described later.
  • Substituents T include halogen atom, cyano group, nitro group, alkyl group, alkenyl group, alkynyl group, aryl group, heteroaryl group, -ORt 1 , -CORt 1 , -COORt 1 , -OCORt 1 , -NRt 1 Rt 2 , -NHCORt 1 , -CONRt 1 Rt 2 , -NHCONRT 1 Rt 2 , -NHCOORt 1 , -SRt 1 , -SO 2 Rt 1 , -SO 2 ORt 1 , -NHSO 2 Rt 1 or -SO 2 NRt 1 Rt 2 can be mentioned.
  • Rt 1 and Rt 2 independently represent a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group, an aryl group or a heteroaryl group, respectively. Rt 1 and Rt 2 may be combined to form a ring.
  • Examples of the acid group, basic group, and hydrogen-bonding group represented by X include the above-mentioned groups.
  • the pigment derivative When a pigment-type compound is used as the near-infrared absorbing dye, the pigment derivative preferably has a maximum absorption wavelength in the wavelength range of 700 nm to 1,200 nm, and a maximum absorption wavelength in the wavelength range of 700 nm to 1,100 nm. It is also preferable that the compound has a maximum absorption wavelength in the wavelength range of 700 nm to 1,000 nm.
  • a pigment derivative having a maximum absorption wavelength in the above wavelength range can easily have the spread of the ⁇ plane close to that of the near-infrared absorbing dye, improve the adsorptivity of the near-infrared absorbing dye, and easily obtain more excellent dispersion stability.
  • the pigment derivative is preferably a compound containing an aromatic ring, and more preferably a compound containing a structure in which two or more aromatic rings are condensed. Further, the pigment derivative is preferably a compound having a ⁇ -conjugated plane, and more preferably a compound having a ⁇ -conjugated plane having the same structure as the ⁇ -conjugated plane contained in the near-infrared absorbing dye. Further, the number of ⁇ electrons contained in the ⁇ -conjugated plane of the pigment derivative is preferably 8 to 100. The upper limit is preferably 90 or less, and more preferably 80 or less. The lower limit is preferably 10 or more, and more preferably 12 or more. Further, the pigment derivative is preferably a compound having a ⁇ -conjugated plane containing a partial structure represented by the following formula (SQ-a).
  • the wavy line part represents the connection position with other structures.
  • the pigment derivative is also preferably a compound represented by the following formula (Syn1).
  • Rsy 1 and Rsy 2 independently represent an organic group
  • L 1 represents a single bond or a p1 + 1 valent group
  • a 1 is a sulfo group, a carboxy group, a phosphoric acid group, and a boronic acid group.
  • a sulfonimide group, a sulfonamide group, an amino group, a pyridinyl group, a salt thereof or a group selected from the desalted structure thereof, and p1 and q1 each independently represent an integer of 1 or more. If p1 is 2 or more, a plurality of A 1 may be the same or different. If q1 is 2 or more, a plurality of L 1 and A 1 may be the same or different.
  • Examples of the organic group represented by Rsy 1 and Rsy 2 of the formula (Syn1) include an aryl group, a heteroaryl group, and a group represented by the following formula (R1).
  • X 11 represents a ring structure
  • a 11 represents O or NR 51
  • R 46 to R 51 represent hydrogen atoms or substituents independently of each other
  • R 47 and R 48 are They may be bonded to each other to form a ring
  • * represents the bonding position with other structures.
  • the p1 + 1 valent groups represented by L 1 in the formula (Syn1) include hydrocarbon groups, heterocyclic groups, -O-, -S-, -CO-, -COO-, -OCO-, -SO 2 -,-.
  • RL represents a hydrogen atom, an alkyl group or an aryl group.
  • the hydrocarbon group may be an aliphatic hydrocarbon group or an aromatic hydrocarbon group.
  • Examples of the hydrocarbon group include an alkylene group, an arylene group, or a group obtained by removing one or more hydrogen atoms from these groups.
  • the alkylene group preferably has 1 to 30 carbon atoms, more preferably 1 to 15 carbon atoms, and even more preferably 1 to 10 carbon atoms.
  • the alkylene group may be linear, branched or cyclic.
  • the cyclic alkylene group may be either monocyclic or polycyclic.
  • the number of carbon atoms of the arylene group is preferably 6 to 18, more preferably 6 to 14, and even more preferably 6 to 10.
  • the heterocyclic group is preferably a single ring or a condensed ring having 2 to 4 condensation numbers.
  • the number of heteroatoms constituting the ring of the heterocyclic group is preferably 1 to 3.
  • the hetero atom constituting the ring of the heterocyclic group is preferably a nitrogen atom, an oxygen atom or a sulfur atom.
  • the number of carbon atoms constituting the ring of the heterocyclic group is preferably 3 to 30, more preferably 3 to 18, and even more preferably 3 to 12.
  • the hydrocarbon group and the heterocyclic group may have a substituent. Examples of the substituent include the groups listed in the above-mentioned Substituent T.
  • the alkyl group represented by RL preferably has 1 to 20 carbon atoms, more preferably 1 to 15 carbon atoms, and even more preferably 1 to 8 carbon atoms.
  • the alkyl group may be linear, branched or cyclic, preferably linear or branched, more preferably linear.
  • the alkyl group represented by RL may further have a substituent. Examples of the substituent include the above-mentioned substituent T.
  • the number of carbon atoms of the aryl group represented by RL is preferably 6 to 30, more preferably 6 to 20, and even more preferably 6 to 12.
  • the aryl group represented by RL may further have a substituent. Examples of the substituent include the above-mentioned substituent T.
  • pigment derivative examples include compounds having the following structures, JP-A-56-118462, JP-A-63-264674, JP-A-1-2170777, JP-A-3-9961 and JP-A-3. -26767, Japanese Patent Application Laid-Open No. 3-153780, Japanese Patent Application Laid-Open No. 3-455662, Japanese Patent Application Laid-Open No. 4-285669, Japanese Patent Application Laid-Open No. 6-145546, Japanese Patent Application Laid-Open No. 6-212088, Japanese Patent Application Laid-Open No. 6-240158 No., Japanese Patent Application Laid-Open No. 10-30063, Japanese Patent Application Laid-Open No. 10-195326, Paragraphs 0083 to 098 of International Publication No. 2011/024896, Paragraphs 0063 to 0094 of International Publication No. 2012/102399, etc. Can be mentioned.
  • the content of the pigment derivative is preferably 1 part by mass to 30 parts by mass and 3 parts by mass to 20 parts by mass with respect to 100 parts by mass of the pigment among the specific dye and the above-mentioned colorant. Parts by mass are more preferred.
  • the curable composition according to the present disclosure may contain a specific dye and a dispersant for dispersing a pigment added as needed.
  • the dispersant is not particularly limited, and a known dispersant can be used as the dispersant for the pigment.
  • Polymer dispersants can be further classified into linear polymers, terminally modified polymers, graft-type polymers, and block-type polymers based on their structures.
  • the polymer dispersant acts on the surface of the pigment to prevent reaggregation. Therefore, a terminal-modified polymer, a graft polymer, and a block polymer having an anchor site on the pigment surface can be mentioned as preferable structures.
  • the dispersant described in paragraphs 0028 to 0124 of JP2011-070156 and the dispersant described in JP2007-277514 are also preferably used. These contents are incorporated in the present specification.
  • the resin used as the dispersant is preferably a resin having a structure in which a plurality of polymer chains are bonded to the core portion.
  • resins include dendrimers (including star-shaped polymers).
  • specific examples of the dendrimer include polymer compounds C-1 to C-31 described in paragraphs 0196 to 0209 of JP2013-043962.
  • the polymer dispersant is a graft copolymer. Since the graft copolymer has an affinity with a solvent due to the graft chain, it is excellent in the dispersibility of the pigment and the dispersion stability after aging.
  • the description in paragraphs 0025 to 0094 of JP2012-255128A can be referred to, and the content thereof is incorporated in the present specification.
  • examples of the graft copolymer include the resins described in paragraphs 0072 to 0094 of JP2012-255128A, the contents of which are incorporated in the present specification.
  • a polymer dispersant having an ethylenically unsaturated group may be used as the polymer dispersant.
  • the ethylenically unsaturated group include a vinyl group, a vinyloxy group, an allyl group, a metallicyl group, a (meth) acryloyl group, a vinylphenyl group, a cinnamoyl group and a maleimide group, and from the viewpoint of reactivity, a (meth) acryloyl group , Vinylphenyl group and maleimide group are preferable, (meth) acryloyl group is more preferable, and acryloyl group is particularly preferable.
  • the dispersant is preferably an acidic dispersant (acidic resin) or a basic dispersant (basic resin).
  • the acidic dispersant (acidic resin) represents a resin in which the amount of acid groups is larger than the amount of basic groups.
  • the acidic dispersant (acidic resin) is preferably a resin in which the amount of acid groups accounts for 70 mol% or more when the total amount of the amount of acid groups and the amount of basic groups is 100 mol%, and is substantially an acid. A resin consisting only of groups is more preferable.
  • the acid group contained in the acidic dispersant (acidic resin) is preferably a carboxyl group.
  • the basic dispersant represents a resin in which the amount of basic groups is larger than the amount of acid groups.
  • the basic dispersant (basic resin) is preferably a resin in which the amount of basic groups exceeds 50 mol% when the total amount of the amount of acid groups and the amount of basic groups is 100 mol%.
  • Examples of the basic dispersant include resins having a tertiary amino group and a quaternary ammonium base.
  • a resin having a tertiary amino group and a quaternary ammonium base is preferably used as a dispersant for a specific dye.
  • the resin having a tertiary amino group and a quaternary ammonium base is preferably a resin having a constituent repeating unit having a tertiary amino group and a constituent repeating unit having a quaternary ammonium base.
  • the resin having a tertiary amino group and a quaternary ammonium base may have a structural repeating unit further having an acid group.
  • the resin having a tertiary amino group and a quaternary ammonium base preferably has a block structure.
  • the resin having a tertiary amino group and a quaternary ammonium base preferably has an amine value of 10 mgKOH / g to 250 mgKOH / g and a quaternary ammonium salt value of 10 mgKOH / g to 90 mgKOH / g. It is more preferable that the amine value is 50 mgKOH / g to 200 mgKOH / g and the quaternary ammonium salt value is 10 mgKOH / g to 50 mgKOH / g.
  • the weight average molecular weight (Mw) of the resin having a tertiary amino group and a quaternary ammonium base is preferably 3,000 to 300,000, more preferably 5,000 to 30,000.
  • Resins having a tertiary amino group and a quaternary ammonium base include an ethylenically unsaturated compound having a tertiary amino group, an ethylenically unsaturated compound having a quaternary ammonium base, and other ethylenically as necessary. It can be produced by copolymerizing an unsaturated compound.
  • Examples of the ethylenically unsaturated compound having a tertiary amino group and the ethylenically unsaturated compound having a quaternary ammonium base include those described in Paragraphs 0150 to 0170 of International Publication No. 2018/230486. The content is incorporated herein by reference.
  • the resin contains a nitrogen atom in the main chain.
  • This resin is also preferably used as a dispersant.
  • Resins containing a nitrogen atom in the main chain are poly (lower alkyleneimine) -based constituent repeating units, polyallylamine-based constituent repeating units, polydialylamine-based constituent repeating units, and metaxylene diamine-epichlorohydrin weights. It preferably contains a structural repeating unit having at least one nitrogen atom selected from the group consisting of a condensate-based structural repeating unit and a polyvinylamine-based structural repeating unit.
  • oligoimine-based resin a structural repeating unit having a partial structure X having a functional group of pKa14 or less and a structural repeating unit having a side chain containing an oligomer chain or a polymer chain Y having 40 to 10,000 atoms are included. It is preferably a resin having.
  • the oligoimine-based resin may further have a structural repeating unit having an acid group.
  • the description in paragraphs 0102 to 0166 of JP2012-255128A can be referred to, and this content is incorporated in the present specification.
  • a commercially available product can also be used as the dispersant.
  • the product described in paragraph 0129 of JP2012-137564A can also be used as a dispersant.
  • Disperbyk-111 manufactured by BYK Chemie
  • the resin described as the dispersant can also be used for purposes other than the dispersant. For example, it can also be used as a binder.
  • the dispersant may be used alone or in combination of two or more.
  • the content of the dispersant may be appropriately adjusted according to the pigment used, but is preferably 1 to 200 parts by mass with respect to 100 parts by mass of the total content of the specific dye and the pigment.
  • the lower limit is preferably 5 parts by mass or more, and more preferably 10 parts by mass or more.
  • the upper limit is preferably 150 parts by mass or less, and more preferably 100 parts by mass or less.
  • the curable composition according to the present disclosure preferably contains a polymerization inhibitor from the viewpoint of storage stability.
  • the polymerization inhibitor is not particularly limited, and a known polymerization inhibitor can be used.
  • examples of the polymerization inhibitor include hydroquinone, p-methoxyphenol, di-t-butyl-p-cresol, pyrogallol, t-butylcatechol, benzoquinone, 4,4'-thiobis (3-methyl-6-t-butylphenol), and the like.
  • the polymerization inhibitor may be used alone or in combination of two or more.
  • the content of the polymerization inhibitor is preferably 0.1 ppm to 1,000 ppm, more preferably 1 ppm to 500 ppm, based on the total solid content of the curable composition. It is particularly preferably 1 ppm to 100 ppm.
  • the curable composition according to the present disclosure may contain a solvent.
  • the solvent include esters such as ethyl acetate, -n-butyl acetate, isobutyl acetate, amyl formate, isoamyl acetate, isobutyl acetate, butyl propionate, isopropyl butyrate, ethyl butyrate, butyl butyrate, alkyl esters, methyl lactate, and lactic acid.
  • Ethyl methyl oxyacetate, ethyl oxyacetate, butyl oxyacetate, methyl methoxyacetate, ethyl methoxyacetate, butyl methoxyacetate, methyl ethoxyacetate, ethyl ethoxyacetate, and methyl 3-oxypropionate and ethyl 3-oxypropionate, etc.
  • 3-Oxypropionic acid alkyl esters eg, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate
  • 2-Oxypropionic acid alkyl esters such as ethyl 2-oxypropionate and propyl 2-oxypropionate (eg, methyl 2-methoxypropionate, ethyl 2-methoxypropionate, propyl 2-methoxypropionate, 2- Methyl ethoxypropionate, ethyl 2-ethoxypropionate, methyl 2-oxy-2-methylpropionate, ethyl 2-oxy-2-methylpropionate, methyl 2-methoxy-2-methylpropionate, 2-ethoxy-2 -Ethyl propionate), as well as methyl pyruvate, ethyl pyruvate, propyl pyruvate,
  • Ethers such as diethylene glycol dimethyl ether, tetrahydrofuran, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, methyl cellosolve acetate, ethyl cellosolve acetate, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol monobutyl ether, propylene glycol methyl ether acetate, propylene glycol ethyl.
  • aromatic hydrocarbons benzene, toluene, xylene, ethylbenzene, etc.
  • organic solvents for environmental reasons (for example, 50 mass by mass with respect to the total mass of the organic solvent). It can be ppm (parts per million) or less, 10 mass ppm or less, or 1 mass ppm or less).
  • methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, ethyl cellosolve acetate, ethyl lactate, diethylene glycol dimethyl ether, butyl acetate, methyl 3-methoxypropionate, 2-heptanone, cyclohexanone, ethylcarbitol acetate, butyl Carbitol acetate, propylene glycol methyl ether acetate and the like are suitable.
  • the solvent may be used alone or in combination of two or more.
  • an organic solvent having a low metal content it is preferable to use an organic solvent having a low metal content, and the metal content of the organic solvent is preferably, for example, 10 mass ppb (parts per parts) or less. If necessary, an organic solvent at the mass ppt (parts per fraction) level may be used, and such an organic solvent is provided by, for example, Toyo Gosei Co., Ltd. (The Chemical Daily, November 2015). 13th).
  • Examples of the method for removing impurities such as metals from the organic solvent include distillation (molecular distillation, thin film distillation, etc.) and filtration using a filter.
  • the filter pore diameter of the filter used for filtration is preferably 10 ⁇ m or less, more preferably 5 ⁇ m or less, and even more preferably 3 ⁇ m or less.
  • the material of the filter is preferably polytetrafluoroethylene, polyethylene or nylon.
  • the organic solvent may contain isomers (compounds having the same number of atoms but different structures). Further, only one kind of isomer may be contained, or a plurality of kinds may be contained.
  • the content of peroxide in the organic solvent is preferably 0.8 mmol / L or less, and more preferably substantially free of peroxide.
  • the total solid content of the curable composition according to the present disclosure varies depending on the coating method and the presence or absence of a solvent, but is preferably 1% by mass to 100% by mass, for example.
  • the lower limit is more preferably 10% by mass or more.
  • the curable composition according to the present disclosure may contain a sensitizer for the purpose of improving the radical generation efficiency of the radical initiator and lengthening the photosensitive wavelength.
  • a sensitizer for the purpose of improving the radical generation efficiency of the radical initiator and lengthening the photosensitive wavelength.
  • the sensitizer that can be used in the present disclosure it is preferable that the above-mentioned photopolymerization initiator is sensitized by an electron transfer mechanism or an energy transfer mechanism.
  • Examples of the sensitizer that can be used in the present disclosure include those that belong to the compounds listed below and have an absorption wavelength in the wavelength region of 300 nm to 450 nm.
  • Examples of preferable sensitizers include those belonging to the following compounds and having an absorption wavelength in the range of 330 nm to 450 nm.
  • polynuclear aromatics eg, phenanthrene, anthracene, pyrene, perylene, triphenylene, 9,10-dialkoxyanthracene
  • xanthenes eg, fluoressein, eosin, erythrosin, rhodamine B, rosebenzene
  • thioxanthones eg, fluoressein, eosin, erythrosin, rhodamine B, rosebenzene
  • the sensitizer may be used alone or in combination of two or more.
  • the content of the sensitizer in the curable composition according to the present disclosure is 0.1 to 20% by mass with respect to the total solid content of the curable composition from the viewpoint of light absorption efficiency to a deep part and initial decomposition efficiency. Is preferable, and 0.5 to 15% by mass is more preferable.
  • the curable composition according to the present disclosure may contain a cosensitizer.
  • the co-sensitizer has an action of further improving the sensitivity of the sensitizing dye or the initiator to active radiation, or suppressing the polymerization inhibition of the polymerizable compound by oxygen.
  • examples of the co-sensitizer include the compounds described in paragraphs 0233 to 0241 of JP-A-2007-277514.
  • the content of these cosensitizers is 0.1% by mass to 30% by mass with respect to the mass of the total solid content of the curable composition from the viewpoint of improving the curing rate by balancing the polymerization growth rate and the chain transfer.
  • the range is preferable, the range of 0.5% by mass to 25% by mass is more preferable, and the range of 1% by mass to 20% by mass is further preferable.
  • the curable composition according to the present disclosure includes, if necessary, a fluoroorganic compound, a thermal polymerization inhibitor, a photopolymerization initiator, other fillers, polymer compounds other than alkali-soluble resins and dispersants, and surfactants. , Adhesion promoter, antioxidant, UV absorber, anti-aggregation agent and other various additives can be contained.
  • Examples of other components include the compounds described in paragraphs 0238 to 0249 of JP-A-2007-277514.
  • the curable composition according to the present disclosure can be prepared by mixing each of the above-mentioned components. Further, it is preferable to filter with a filter for the purpose of removing foreign substances and reducing defects.
  • the filter can be used without particular limitation as long as it has been conventionally used for filtration purposes and the like.
  • a fluororesin such as polytetrafluoroethylene (PTFE), a polyamide resin such as nylon (for example, nylon-6, nylon-6,6), and a polyolefin resin such as polyethylene and polypropylene (PP) (high density, ultrahigh molecular weight). ) Etc.) and the like.
  • polypropylene including high-density polypropylene
  • nylon is preferable.
  • the pore size of the filter is preferably 0.01 ⁇ m to 7.0 ⁇ m, more preferably 0.01 ⁇ m to 3.0 ⁇ m, and even more preferably 0.05 ⁇ m to 0.5 ⁇ m. Within this range, it is possible to reliably remove fine foreign substances that hinder the preparation of uniform and smooth compositions in the subsequent step. Further, it is also preferable to use a fibrous filter medium, and examples of the filter medium include polypropylene fiber, nylon fiber, glass fiber and the like. Specifically, SBP type series (SBP008, etc.) and TPR type series (TPR002) manufactured by Roki Techno Co., Ltd.
  • filters different filters may be combined. At that time, the filtration with the first filter may be performed only once or twice or more. Further, first filters having different pore diameters within the above-mentioned range may be combined. For the hole diameter here, the nominal value of the filter manufacturer can be referred to. As a commercially available filter, for example, it can be selected from various filters provided by Nippon Paul Co., Ltd. (DFA4201NXEY, etc.), Advantech Toyo Co., Ltd., Entegris Japan Co., Ltd., KITZ Micro Filter Co., Ltd., and the like. ..
  • the curable composition according to the present disclosure can be liquid, for example, a film can be easily produced by applying the curable composition according to the present disclosure to a substrate or the like and drying it.
  • the viscosity of the curable composition according to the present disclosure is preferably 1 mPa ⁇ s to 100 mPa ⁇ s from the viewpoint of coatability.
  • the lower limit is more preferably 2 mPa ⁇ s or more, and further preferably 3 mPa ⁇ s or more.
  • the upper limit is more preferably 50 mPa ⁇ s or less, further preferably 30 mPa ⁇ s or less, and particularly preferably 15 mPa ⁇ s or less.
  • the use of the curable composition according to the present disclosure is not particularly limited.
  • it can be preferably used for forming an infrared cut filter or the like.
  • it is preferably used as an infrared cut filter on the light receiving side of the solid-state image sensor (for example, for an infrared cut filter for a wafer level lens), an infrared cut filter on the back surface side of the solid-state image sensor (opposite the light receiving side), and the like.
  • it can.
  • it can be preferably used as an infrared cut filter on the light receiving side of the solid-state image sensor.
  • an infrared transmission filter capable of transmitting infrared rays having a specific wavelength or higher can be formed.
  • an infrared transmission filter capable of transmitting infrared rays having a wavelength of 850 nm or more by blocking light from a wavelength of 400 nm to 850 nm.
  • the curable composition according to the present disclosure is preferably stored in a storage container.
  • a storage container for the purpose of preventing impurities from being mixed into raw materials and compositions, a multi-layer bottle in which the inner wall of the container is composed of 6 types and 6 layers of resin or a bottle in which 6 types of resin is composed of 7 layers may be used. preferable. Examples of these containers include the containers described in JP-A-2015-123351.
  • the film according to the present disclosure is a film made of the curable composition according to the present disclosure or obtained by curing the curable composition. If the composition contains a solvent, it may be dried.
  • the film according to the present disclosure can be preferably used as an infrared cut filter. It can also be used as a heat ray shielding filter or an infrared ray transmitting filter.
  • the film according to the present disclosure may be used by being laminated on a support, or may be peeled off from the support and used.
  • the film according to the present disclosure may have a pattern or may be a film having no pattern (flat film).
  • the solvent may be removed, and it is not necessary to completely remove the solvent, and the amount of the solvent removed can be set as desired. Further, the above-mentioned curing may be performed as long as the hardness of the film is improved, but curing by polymerization is preferable.
  • the thickness of the film according to the present disclosure can be appropriately adjusted according to the purpose.
  • the thickness of the film is preferably 20 ⁇ m or less, more preferably 10 ⁇ m or less, and even more preferably 5 ⁇ m or less.
  • the lower limit of the film thickness is preferably 0.1 ⁇ m or more, more preferably 0.2 ⁇ m or more, and even more preferably 0.3 ⁇ m or more.
  • the film according to the present disclosure preferably has a maximum absorption wavelength in the wavelength range of 650 nm to 1,500 nm, more preferably has a maximum absorption wavelength in the wavelength range of 680 nm to 1,100 nm, and has a wavelength range of 700 nm to 850 nm. It is more preferable to have a maximum absorption wavelength.
  • the film according to the present disclosure preferably satisfies at least one of the following (1) to (4), and the above (1) to (4). It is more preferable that all the conditions are satisfied.
  • the transmittance at a wavelength of 400 nm is preferably 70% or more, more preferably 80% or more, further preferably 85% or more, and particularly preferably 90% or more.
  • the transmittance at a wavelength of 500 nm is preferably 70% or more, more preferably 80% or more, further preferably 90% or more, and particularly preferably 95% or more.
  • the transmittance at a wavelength of 600 nm is preferably 70% or more, more preferably 80% or more, further preferably 90% or more, and particularly preferably 95% or more.
  • the transmittance at a wavelength of 650 nm is preferably 70% or more, more preferably 80% or more, further preferably 90% or more, and particularly preferably 95% or more.
  • the film according to the present disclosure can also be used in combination with a color filter containing a chromatic colorant.
  • the color filter can be produced by using a color curable composition containing a chromatic colorant.
  • the chromatic colorant include the chromatic colorant described in the section of the curable composition according to the present disclosure.
  • the coloring composition can further contain a resin, a polymerizable compound, a polymerization initiator, a surfactant, a solvent, a polymerization inhibitor, an ultraviolet absorber and the like. For these details, the above-mentioned materials can be mentioned, and these can be used.
  • the color filter is arranged on the optical path of the film according to the present disclosure.
  • the film and the color filter according to the present disclosure can be laminated and used as a laminated body.
  • the film and the color filter according to the present disclosure may or may not be adjacent to each other in the thickness direction.
  • the film according to the present disclosure may be formed on a support different from the support on which the color filter is formed.
  • Other members for example, a microlens, a flattening layer, etc. constituting the solid-state image sensor may be interposed between the film and the color filter according to the disclosure.
  • the infrared cut filter means a filter that transmits light having a wavelength in the visible region (visible light) and blocks at least a part of light having a wavelength in the near infrared region (infrared light).
  • the infrared cut filter may transmit all the light having a wavelength in the visible region, and among the light having a wavelength in the visible region, the light having a specific wavelength region is passed through and the light having a specific wavelength region is blocked. It may be a thing.
  • the color filter means a filter that passes light in a specific wavelength region and blocks light in a specific wavelength region among light having a wavelength in the visible region.
  • the infrared transmission filter means a filter that blocks visible light and transmits at least a part of infrared rays.
  • the film according to the present disclosure can be used for solid-state imaging devices such as CCD (charge coupling element) and CMOS (complementary metal oxide semiconductor), and various devices such as infrared sensors and image display devices.
  • CCD charge coupling element
  • CMOS complementary metal oxide semiconductor
  • the film according to the present disclosure can be produced through a step of applying the curable composition according to the present disclosure.
  • the composition is applied on a support.
  • the support include a substrate made of a material such as silicon, non-alkali glass, soda glass, Pyrex (registered trademark) glass, and quartz glass.
  • An organic film, an inorganic film, or the like may be formed on these substrates.
  • the material of the organic film include the above-mentioned resin.
  • a substrate made of the above-mentioned resin can also be used.
  • the support may be formed with a charge coupling element (CCD), a complementary metal oxide semiconductor (CMOS), a transparent conductive film, or the like.
  • the support may be formed with a black matrix that separates each pixel.
  • the support may be provided with an undercoat layer for improving the adhesion with the upper layer, preventing the diffusion of substances, or flattening the surface of the substrate.
  • an undercoat layer for improving the adhesion with the upper layer, preventing the diffusion of substances, or flattening the surface of the substrate.
  • a known method can be used as a method for applying the composition.
  • a dropping method drop casting
  • a slit coating method for example, a spray method; a roll coating method; a rotary coating method (spin coating); a casting coating method; a slit and spin method; a pre-wet method (for example, JP-A-2009-145395).
  • Methods described in the publication Inkjet (for example, on-demand method, piezo method, thermal method), ejection system printing such as nozzle jet, flexographic printing, screen printing, gravure printing, reverse offset printing, metal mask printing, etc.
  • Various printing methods; transfer method using a mold or the like; nanoimprint method and the like can be mentioned.
  • the application method for inkjet is not particularly limited, and for example, the method shown in "Expandable / Usable Inkjet-Infinite Possibilities Seen in Patents-, Published in February 2005, Sumi Betechno Research" (especially from page 115). (Page 133), and the methods described in JP-A-2003-262716, JP-A-2003-185831, JP-A-2003-261827, JP-A-2012-126830, JP-A-2006-169325, and the like. Can be mentioned.
  • the composition layer formed by applying the composition may be dried (prebaked). Prebaking may not be required if the pattern is formed by a low temperature process.
  • the prebaking temperature is preferably 150 ° C. or lower, more preferably 120 ° C. or lower, and even more preferably 110 ° C. or lower.
  • the lower limit is, for example, preferably 50 ° C. or higher, and more preferably 80 ° C. or higher.
  • the prebaking time is preferably 10 seconds to 3,000 seconds, more preferably 40 seconds to 2,500 seconds, and even more preferably 80 seconds to 220 seconds. Drying can be performed on a hot plate, an oven, or the like.
  • the film manufacturing method according to the present disclosure may further include a step of forming a pattern.
  • the pattern forming method include a pattern forming method using a photolithography method and a pattern forming method using a dry etching method.
  • the film according to the present disclosure is used as a flat film, it is not necessary to perform the step of forming the pattern.
  • the process of forming the pattern will be described in detail.
  • the pattern forming method in the photolithography method includes a step of exposing the composition layer formed by applying the curable composition according to the present disclosure in a pattern (exposure step) and developing the composition layer of the unexposed portion. It is preferable to include a step of removing and forming a pattern (development step). If necessary, a step of baking the developed pattern (post-baking step) may be provided. Hereinafter, each step will be described.
  • the composition layer is exposed in a pattern.
  • the composition layer can be pattern-exposed by exposing the composition layer through a mask having a predetermined mask pattern using an exposure device such as a stepper.
  • the exposed portion can be cured.
  • the radiation (light) that can be used for exposure ultraviolet rays such as g-ray and i-line are preferable, and i-ray is more preferable.
  • Irradiation dose (exposure dose) for example, preferably 0.03J / cm 2 ⁇ 2.5J / cm 2, more preferably 0.05J / cm 2 ⁇ 1.0J / cm 2, 0.08J / cm 2 ⁇ 0.5 J / cm 2 is particularly preferable.
  • the oxygen concentration at the time of exposure can be appropriately selected, and in addition to the operation in the atmosphere, for example, in a low oxygen atmosphere having an oxygen concentration of 19% by volume or less (for example, 15% by volume, 5% by volume, substantially anoxic). ), Or in a high oxygen atmosphere where the oxygen concentration exceeds 21% by volume (for example, 22% by volume, 30% by volume, 50% by volume).
  • the exposure intensity is can be set appropriately, preferably 1,000W / m 2 ⁇ 100,000W / m 2 ( e.g., 5,000W / m 2, 15,000W / m 2, 35,000W / It can be selected from the range of m 2 ).
  • Oxygen concentration and exposure illuminance may appropriately combined conditions, for example, illuminance 10,000 W / m 2 at an oxygen concentration of 10 vol%, oxygen concentration of 35 vol% can be such illuminance 20,000W / m 2.
  • the composition layer in the unexposed portion of the composition layer after exposure is developed and removed to form a pattern.
  • the development and removal of the composition layer in the unexposed portion can be performed using a developing solution.
  • the composition layer of the unexposed portion in the exposure step is eluted in the developing solution, and only the photocured portion remains on the support.
  • the developing solution an alkaline developing solution that does not damage the underlying solid-state image sensor or circuit is desirable.
  • the temperature of the developing solution is preferably, for example, 20 ° C to 30 ° C.
  • the development time is preferably 20 seconds to 180 seconds. Further, in order to improve the residue removability, the steps of shaking off the developing solution every 60 seconds and further supplying a new developing solution may be repeated several times.
  • alkaline agent used in the developing solution examples include aqueous ammonia, ethylamine, diethylamine, dimethylethanolamine, diglycolamine, diethanolamine, hydroxyamine, ethylenediamine, tetramethylammonium hydroxide, tetraethylammonium hydroxide, and tetrapropylammonium hydroxide.
  • Organic alkalinity such as tetrabutylammonium hydroxide, benzyltrimethylammonium hydroxide, dimethylbis (2-hydroxyethyl) ammonium hydroxide, choline, pyrrol, piperidine, 1,8-diazabicyclo [5.4.0] -7-undecene.
  • Examples thereof include compounds and inorganic alkaline compounds such as sodium hydroxide, potassium hydroxide, sodium carbonate, sodium hydrogencarbonate, sodium silicate and sodium metasilicate.
  • an alkaline aqueous solution obtained by diluting these alkaline agents with pure water is preferably used.
  • the concentration of the alkaline agent in the alkaline aqueous solution is preferably 0.001% by mass to 10% by mass, more preferably 0.01% by mass to 1% by mass.
  • the surfactant include the surfactant described in the above-mentioned composition, and a nonionic surfactant is preferable.
  • the developer may be once produced as a concentrated solution and diluted to a concentration required for use.
  • the dilution ratio is not particularly limited, but can be set in the range of, for example, 1.5 by 100 times.
  • a developer composed of such an alkaline aqueous solution it is preferable to wash (rinse) it with pure water after development.
  • post-baking is a post-development heat treatment to complete the curing of the film.
  • the post-baking temperature is preferably, for example, 100 ° C. to 240 ° C. From the viewpoint of film hardening, 200 ° C. to 230 ° C. is more preferable.
  • the post-bake temperature is preferably 150 ° C. or lower, more preferably 120 ° C. or lower. It is preferably 100 ° C. or lower, more preferably 90 ° C.
  • Post-baking should be performed on the developed film in a continuous or batch manner using a heating means such as a hot plate, a convection oven (hot air circulation dryer), or a high-frequency heater so that the above conditions are met. Can be done. Further, when the pattern is formed by the low temperature process, post-baking may not be performed, and a step of re-exposure (post-exposure step) may be added.
  • a heating means such as a hot plate, a convection oven (hot air circulation dryer), or a high-frequency heater
  • the composition layer formed by applying the composition on a support or the like is cured to form a cured product layer, and then the photoresist layer patterned on the cured product layer is formed. Then, using the patterned photoresist layer as a mask, the cured product layer can be dry-etched with an etching gas.
  • the description in paragraphs 0010 to 0067 of JP2013-64993A can be referred to, and this content is incorporated in the present specification.
  • the optical filter according to the present disclosure has a film according to the present disclosure.
  • the optical filter according to the present disclosure can be preferably used as at least one optical filter selected from the group consisting of an infrared cut filter and an infrared transmission filter, and can be more preferably used as an infrared cut filter.
  • a mode having a film according to the present disclosure and a pixel selected from the group consisting of red, green, blue, magenta, yellow, cyan, black and colorless is also a preferable mode of the optical filter according to the present disclosure.
  • the laminate according to the present disclosure is a laminate having a film according to the present disclosure and a color filter containing a chromatic colorant.
  • the infrared cut filter according to the present disclosure has a film according to the present disclosure.
  • the infrared cut filter according to the present disclosure may be a filter that cuts only infrared rays having a wavelength of a part of the infrared region, or a filter that cuts the entire infrared region.
  • Examples of the filter that cuts only infrared rays having a wavelength of a part of the infrared region include a near-infrared ray cut filter.
  • Examples of near-infrared rays include infrared rays having a wavelength of 750 nm to 2,500 nm.
  • the infrared cut filter according to the present disclosure is preferably a filter that cuts infrared rays in the wavelength range of 750 nm to 1,000 nm, and more preferably a filter that cuts infrared rays in the wavelength range of 750 nm to 1,200 nm. It is preferable that the filter cuts infrared rays having a wavelength of 750 nm to 1,500 nm.
  • the infrared cut filter according to the present disclosure may further have a copper-containing layer, a dielectric multilayer film, an ultraviolet absorbing layer, and the like, in addition to the above film.
  • the infrared cut filter according to the present disclosure further has at least a copper-containing layer or a dielectric multilayer film, it is easy to obtain an infrared cut filter having a wide viewing angle and excellent infrared shielding property. Further, the infrared cut filter according to the present disclosure can be made into an infrared cut filter having excellent ultraviolet shielding property by further having an ultraviolet absorbing layer.
  • the ultraviolet absorbing layer for example, the absorbing layers described in paragraphs 0040 to 0070 and 0119 to 0145 of International Publication No. 2015/09960 can be referred to, and the contents thereof are incorporated in the present specification.
  • the description in paragraphs 0255 to 0259 of JP2014-413118A can be referred to, and the contents thereof are incorporated in the present specification.
  • a glass base material made of copper-containing glass (copper-containing glass base material) or a layer containing a copper complex (copper complex-containing layer) can also be used.
  • the copper-containing glass base material include copper-containing phosphate glass and copper-containing fluoride glass.
  • commercially available copper-containing glass products include NF-50 (manufactured by AGC Techno Glass Co., Ltd.), BG-60, BG-61 (all manufactured by Schott AG), CD5000 (manufactured by HOYA Corporation), and the like.
  • the infrared cut filter according to the present disclosure can be used for solid-state imaging devices such as CCD (charge coupling element) and CMOS (complementary metal oxide semiconductor), and various devices such as infrared sensors and image display devices.
  • CCD charge coupling element
  • CMOS complementary metal oxide semiconductor
  • the infrared cut filter according to the present disclosure is selected from the group consisting of the pixels (pattern) of the film obtained by using the curable composition according to the present disclosure, and red, green, blue, magenta, yellow, cyan, black and colorless.
  • a mode having at least one kind of pixel (pattern) is also a preferred mode.
  • the method for producing the optical filter according to the present disclosure is not particularly limited, but a step of applying the curable composition according to the present disclosure on a support to form a composition layer and a pattern of the composition layer. It is preferable that the method includes a step of exposing to the surface and a step of developing and removing the unexposed portion to form a pattern. Further, as a method for producing an optical filter according to the present disclosure, a step of applying the curable composition according to the present disclosure on a support to form a composition layer and curing to form a layer, on the above layer.
  • the method includes a step of forming a photoresist layer, a step of patterning the photoresist layer by exposure and development to obtain a resist pattern, and a step of dry etching the layer using the resist pattern as an etching mask. Is also preferable.
  • each step in the method for manufacturing an optical filter according to the present disclosure each step in the method for manufacturing a film according to the present disclosure can be referred to.
  • the solid-state image sensor according to the present disclosure has the film according to the present disclosure.
  • the configuration of the solid-state image sensor is not particularly limited as long as it has a film according to the present disclosure and functions as a solid-state image sensor. For example, the following configuration can be mentioned.
  • a transfer electrode made of a plurality of photodiodes and polysilicon or the like constituting the light receiving area of the solid-state image sensor is provided, and light shielding made of tungsten or the like in which only the light receiving portion of the photodiode is opened on the photodiode and the transfer electrode.
  • a configuration having a film, a device protective film made of silicon nitride or the like formed on the light-shielding film so as to cover the entire surface of the light-shielding film and a photodiode light-receiving portion, and a film according to the present disclosure on the device protective film. Is.
  • a structure having a condensing means for example, a microlens or the like; the same applies hereinafter
  • the color filter used in the solid-state image sensor may have a structure in which a film forming each pixel is embedded in a space partitioned by a partition wall, for example, in a grid pattern.
  • the partition wall in this case preferably has a lower refractive index than each pixel. Examples of the imaging device having such a structure include the devices described in JP-A-2012-227478 and JP-A-2014-179757.
  • the image display device has a film according to the present disclosure.
  • the image display device include a liquid crystal display device and an organic electroluminescence (organic EL) display device.
  • organic EL organic electroluminescence
  • the image display device for example, “Electronic Display Device (Akio Sasaki, Kogyo Chosakai Co., Ltd., 1990)", “Display Device (Junaki Ibuki, Sangyo Tosho Co., Ltd., 1989)” ) ”And so on.
  • the liquid crystal display device is described in, for example, “Next Generation Liquid Crystal Display Technology (edited by Tatsuo Uchida, published by Kogyo Chosakai Co., Ltd. in 1994)".
  • the liquid crystal display device applicable to the present disclosure is not particularly limited, and can be applied to, for example, various types of liquid crystal display devices described in the above-mentioned "next-generation liquid crystal display technology".
  • the image display device may have a white organic EL element.
  • the white organic EL element preferably has a tandem structure.
  • Japanese Patent Application Laid-Open No. 2003-45676 supervised by Akiyoshi Mikami, "Forefront of Organic EL Technology Development-High Brightness, High Precision, Long Life, Know-how Collection-", Technical Information Association, It is described on pages 326-328, 2008 and the like.
  • the spectrum of white light emitted by the organic EL element preferably has a strong maximum emission peak in the blue region (430 nm-485 nm), the green region (530 nm-580 nm), and the yellow region (580 nm-620 nm). In addition to these emission peaks, those having a maximum emission peak in the red region (650 nm-700 nm) are more preferable.
  • the infrared sensor according to the present disclosure has a film according to the present disclosure.
  • the configuration of the infrared sensor is not particularly limited as long as it functions as an infrared sensor.
  • an embodiment of the infrared sensor according to the present disclosure will be described with reference to the drawings.
  • reference numeral 110 is a solid-state image sensor.
  • the image pickup region provided on the solid-state image sensor 110 includes an infrared cut filter 111 and an infrared transmission filter 114. Further, a color filter 112 is laminated on the infrared cut filter 111.
  • a microlens 115 is arranged on the incident light h ⁇ side of the color filter 112 and the infrared transmission filter 114.
  • the flattening layer 116 is formed so as to cover the microlens 115.
  • the infrared cut filter 111 can be formed by using the curable composition according to the present disclosure.
  • the spectral characteristics of the infrared cut filter 111 are selected according to the emission wavelength of the infrared light emitting diode (infrared LED) used.
  • the color filter 112 is a color filter on which pixels that transmit and absorb light of a specific wavelength in the visible region are formed, and is not particularly limited, and a conventionally known color filter for pixel formation can be used.
  • a color filter in which red (R), green (G), and blue (B) pixels are formed is used.
  • R red
  • G green
  • B blue
  • the description in paragraphs 0214 to 0263 of JP2014-43556A can be referred to, and this content is incorporated in the present specification.
  • the characteristics of the infrared transmission filter 114 are selected according to the emission wavelength of the infrared LED used.
  • the infrared transmittance filter 114 preferably has a maximum value of the light transmittance in the film thickness direction in the wavelength range of 400 nm to 650 nm of 30% or less. It is more preferably% or less, further preferably 10% or less, and particularly preferably 0.1% or less. It is preferable that the transmittance satisfies the above conditions in the entire range of the wavelength range of 400 nm to 650 nm.
  • the infrared transmittance filter 114 preferably has a minimum value of the light transmittance in the film thickness direction in the wavelength range of 800 nm or more (preferably 800 nm to 1,300 nm) of 70% or more, preferably 80% or more. More preferably, it is more preferably 90% or more.
  • the above-mentioned transmittance preferably satisfies the above condition in a part of the wavelength range of 800 nm or more, and more preferably the above-mentioned condition at a wavelength corresponding to the emission wavelength of the infrared LED.
  • the film thickness of the infrared transmission filter 114 is preferably 100 ⁇ m or less, more preferably 15 ⁇ m or less, further preferably 5 ⁇ m or less, and particularly preferably 1 ⁇ m or less.
  • the lower limit is preferably 0.1 ⁇ m.
  • the film thickness is measured by using a stylus type surface shape measuring device (DEKTAK150 manufactured by ULVAC) on the dried substrate having the film.
  • the spectral characteristics of the film are values obtained by measuring the transmittance in the wavelength range of 300 nm to 1,300 nm using an ultraviolet-visible near-infrared spectrophotometer (U-4100 manufactured by Hitachi High-Technologies Corporation).
  • the infrared transmittance filter 114 has a maximum value of the light transmittance in the film thickness direction in the wavelength range of 450 nm to 650 nm of 20% or less, and the film.
  • the transmittance of light having a wavelength of 835 nm in the thickness direction of the film is 20% or less, and the minimum value of the transmittance of light in the thickness direction of the film in the wavelength range of 1,000 nm to 1,300 nm is 70% or more. Is preferable.
  • an infrared cut filter (another infrared cut filter) different from the infrared cut filter 111 may be further arranged on the flattening layer 116.
  • examples of other infrared cut filters include those having a copper-containing layer or at least a dielectric multilayer film. These details include those described above.
  • a dual bandpass filter may be used as another infrared cut filter.
  • the absorption wavelengths of the infrared transmission filter and the infrared cut filter used in the present disclosure are appropriately combined and used according to the light source used and the like.
  • the camera module according to the present disclosure includes a solid-state image sensor and an infrared cut filter according to the present disclosure. Further, it is preferable that the camera module according to the present disclosure further includes a lens and a circuit for processing an image pickup obtained from the solid-state image sensor.
  • the solid-state image sensor used in the camera module according to the present disclosure may be the solid-state image sensor according to the present disclosure or a known solid-state image sensor.
  • the lens used in the camera module according to the present disclosure and the circuit for processing the image pickup obtained from the solid-state image sensor known ones can be used.
  • the camera modules described in JP-A-2016-6476 or JP-A-2014-197190 can be referred to, and the contents thereof are incorporated in the present specification.
  • the curable composition according to the present disclosure can be used as a heat shield material, a heat storage material, or a photothermal conversion material.
  • the curable composition according to the present disclosure can also be used for paints, inkjet inks, or security inks.
  • the compound according to the present disclosure is a compound having a structure represented by the following formula (1).
  • the compound according to the present disclosure can be suitably used as a dye, and can be more preferably used as an infrared absorbing dye.
  • R 1 to R 6 each independently represent a hydrogen atom or a substituent
  • R 7 and R 8 each independently represent a substituent
  • A represents O or NR 9
  • R 9 represents a hydrogen atom or a substituent
  • n1 and n2 each independently represent an integer of 0 to 5
  • R 1 and R 2 may be bonded to each other to form a ring
  • R 4 may be formed.
  • R 5 may be combined with each other to form a ring.
  • the compound having the structure represented by the formula (1) in the compound according to the present disclosure is the same as the dye having the structure represented by the above formula (1) in the curable composition according to the present disclosure, and is a preferred embodiment. Is the same.
  • the molecular weight is the weight average molecular weight (Mw), and the ratio of the constituent units is a molar percentage, except for those specified specifically.
  • Mw weight average molecular weight
  • the weight average molecular weight (Mw) is a value measured as a polystyrene-equivalent value by a gel permeation chromatography (GPC) method.
  • GPC gel permeation chromatography
  • ⁇ Manufacturing of curable composition The raw materials shown in Table 1 or Table 2 below were mixed and filtered using a nylon filter having a pore size of 0.45 ⁇ m (manufactured by Nippon Pole Co., Ltd.) to prepare a curable composition.
  • the dispersion the dispersion prepared as follows was used.
  • the pigments, pigment derivatives, dispersants and solvent A of the types listed in the dispersion liquid column of Table 1 or Table 2 below are mixed by parts by mass described in the dispersion liquid column of Table 1 or Table 2 below, respectively. Further, 230 parts by mass of zirconia beads having a diameter of 0.3 mm was added, and dispersion treatment was performed for 5 hours using a paint shaker, and the beads were separated by filtration to produce a dispersion liquid.
  • Resin 1 Cyclomer P (ACA) 230AA (acrylic polymer having an acryloyl group and a carboxy group, manufactured by Daicel Corporation)
  • Curable Compound 1 Aronix M-350 (manufactured by Toagosei Co., Ltd.)
  • Curable compound 2 Compound having the following structure (M1)
  • Curable compound 3 Mixture of compound having the following structure (M2) (containing 55 mol% to 63 mol% of the left compound)
  • Curable compound 4 Compound having the following structure (M3)
  • Curable compound 5 Mixture of compound (M4) having the following structure (molar ratio of left compound to right compound is 7: 3)
  • Photopolymerization initiator 1 Compound of the following structure (F1)
  • Photopolymerization initiator 2 Compound of the following structure (F2)
  • Photopolymerization initiator 3 Compound of the following structure (F3)
  • Photopolymerization initiator 4 The following structure (F4)
  • Compound Photopolymerization Initiator 5 CPI-100P (manufactured by Sun Appro Co., Ltd.)
  • UV absorber 1 UV-503 (manufactured by Daito Kagaku Co., Ltd.)
  • Ultraviolet absorber 2 A compound having the following structure (UV2)
  • Surfactant 2 Futergent FTX-218 (manufactured by Neos Co., Ltd., fluorine-based surfactant)
  • Surfactant 3 KF-6001 (Silicon-based surfactant manufactured by Shinetsu Silicone Co., Ltd.)
  • the numerical value added to the main chain represents the molar ratio of the repeating unit.
  • the numerical value added to the main chain represents the molar ratio of the repeating unit, and the numerical value added to the side chain represents the number of repeating units.
  • the obtained film was irradiated with light of 20,000 lux through an ultraviolet cut filter with a xenon (Xe) lamp for 20 hours, and then before and after the light resistance test with a chromaticity meter MCPD-1000 (manufactured by Otsuka Electronics Co., Ltd.).
  • the ⁇ Eab value of the color difference of was measured. The smaller the ⁇ Eab value, the better the light resistance.
  • the ⁇ Eab value is a value obtained from the following color difference formula based on the CIE1976 (L * , a * , b * ) spatial color system (Japanese Color Society, New Edition, Color Science Handbook (1985), p.266). ..
  • ⁇ Eab ⁇ ( ⁇ L * ) 2 + ( ⁇ a * ) 2 + ( ⁇ b * ) 2 ⁇ 1/2 ⁇ Criteria >> A: ⁇ Eab value ⁇ 2.5 B: 2.5 ⁇ ⁇ Eab value ⁇ 5 C: 5 ⁇ ⁇ Eab value ⁇ 10 D: 10 ⁇ ⁇ Eab value ⁇ 15
  • Example 19 the same result was obtained when the same evaluation was performed except for the ultraviolet absorber. Similar results were obtained when the same evaluation was performed in Example 19 except for the surfactant. Similar results were obtained when the same evaluation was performed in Example 19 except for the polymerization inhibitor.
  • Example 101 to 150 Using the curable compositions of Examples 1 to 50, 2 ⁇ m square patterns (infrared cut filters) were formed by the following methods.
  • the curable compositions of Examples 1 to 6 formed a pattern by the following production method A
  • Examples 7 to 50 formed a pattern by the following production method B.
  • ⁇ Manufacturing method A> The curable compositions of Examples 1 to 6 were applied onto a silicon wafer by a spin coating method so that the film thickness after film formation was 1.0 ⁇ m. Then, using a hot plate, it was heated at 100 ° C. for 2 minutes. It was then heated at 200 ° C. for 5 minutes using a hot plate. Next, a 2 ⁇ m square pattern (infrared cut filter) was formed by a dry etching method.
  • ⁇ Manufacturing method B> The curable compositions of Examples 7 to 50 were applied onto a silicon wafer by a spin coating method so that the film thickness after film formation was 1.0 ⁇ m. Then, using a hot plate, it was heated at 100 ° C. for 2 minutes. Next, using an i-line stepper exposure apparatus FPA-3000i5 + (manufactured by Canon Inc.), exposure was performed at 1,000 mJ / cm 2 through a mask with a 2 ⁇ m square dot pattern. Then, paddle development was carried out at 23 ° C. for 60 seconds using a 0.3% by mass aqueous solution of tetramethylammonium hydroxide (TMAH). Then, it was rinsed with a spin shower and further washed with pure water. Next, a 2 ⁇ m square pattern (infrared cut filter) was formed by heating at 200 ° C. for 5 minutes using a hot plate.
  • TMAH tetramethylammonium hydroxide
  • the Red composition was applied onto the pattern of the infrared cut filter by a spin coating method so that the film thickness after film formation was 1.0 ⁇ m. Then, using a hot plate, it was heated at 100 ° C. for 2 minutes. Next, using an i-line stepper exposure apparatus FPA-3000i5 + (manufactured by Canon Inc.), exposure was performed at 1,000 mJ / cm 2 through a mask with a 2 ⁇ m square dot pattern. Then, paddle development was carried out at 23 ° C. for 60 seconds using a 0.3% by mass aqueous solution of tetramethylammonium hydroxide (TMAH). Then, it was rinsed with a spin shower and further washed with pure water.
  • TMAH tetramethylammonium hydroxide
  • the Red composition was then patterned on the infrared cut filter pattern by heating at 200 ° C. for 5 minutes using a hot plate.
  • the Green composition and the Blue composition were sequentially patterned to form red, green and blue coloring patterns (Bayer patterns).
  • the Bayer pattern is a red element, two green elements, and one blue element, as disclosed in US Pat. No. 3,971,065.
  • Elements and a 2 ⁇ 2 array of filter elements having one infrared transmission filter element were repeated to form a Bayer pattern.
  • composition for forming an infrared transmission filter (the following composition 100 or composition 101) was applied onto the patterned film by a spin coating method so that the film thickness after film formation was 2.0 ⁇ m. Then, using a hot plate, it was heated at 100 ° C. for 2 minutes. Next, using an i-line stepper exposure apparatus FPA-3000i5 + (manufactured by Canon Inc.), exposure was performed at 1,000 mJ / cm 2 through a 2 ⁇ m square Bayer pattern mask. Then, paddle development was carried out at 23 ° C. for 60 seconds using a 0.3% by mass aqueous solution of tetramethylammonium hydroxide (TMAH).
  • TMAH tetramethylammonium hydroxide
  • the infrared transmission filter was patterned in the missing portion of the Bayer pattern of the infrared cut filter in which the coloring pattern was not formed.
  • the obtained solid-state image sensor was irradiated with infrared rays by an infrared light emitting diode (infrared LED) in a low illuminance environment (0.001 lux), and an image was captured to evaluate the image performance.
  • infrared LED infrared light emitting diode
  • the Red composition, Green composition, Blue composition, and the composition for forming an infrared transmission filter used in Examples 101 to 150 are as follows.
  • Red pigment dispersion 51.7 parts by mass Resin 6 (40% by mass PGMEA solution): 0.6 parts by mass Polymerizable compound 4: 0.6 parts by mass Photopolymerization initiator A: 0.3 parts by mass Surfactant 1 : 4.2 parts by mass PGMEA: 42.6 parts by mass
  • Green pigment dispersion 73.7 parts by mass Resin 6 (40% by mass PGMEA solution): 0.3 parts by mass Polymerizable compound 1: 1.2 parts by mass Photopolymerization initiator A: 0.6 parts by mass Surface active agent 1 : 4.2 parts by mass UV absorber (UV-503, manufactured by Daito Kagaku Co., Ltd.): 0.5 parts by mass PGMEA: 19.5 parts by mass
  • Blue pigment dispersion 44.9 parts by mass Resin 6 (40% by mass PGMEA solution): 2.1 parts by mass Polymerizable compound 1: 1.5 parts by mass Polymerizable compound 4: 0.7 parts by mass Photoinitiator A : 0.8 parts by mass Surfactant 1: 4.2 parts by mass PGMEA: 45.8 parts by mass
  • composition for forming an infrared transmission filter The components having the following composition were mixed, stirred, and then filtered through a nylon filter (manufactured by Nippon Pole Co., Ltd.) having a pore size of 0.45 ⁇ m to prepare a composition for forming an infrared transmission filter.
  • Pigment dispersion 2-1 1,000 parts by mass Polymerizable compound (dipentaerythritol hexaacrylate): 50 parts by mass Resin: 17 parts by mass Photopolymerization initiator (1- [4- (phenylthio) phenyl] -1,2 -Octandion-2- (O-benzoyloxime)): 10 parts by mass PGMEA: 179 parts by mass Alkali-soluble polymer F-1: 17 parts by mass (solid content concentration 35 parts by mass)
  • This polymer had a polystyrene-equivalent weight average molecular weight of 9,700, a number average molecular weight of 5,700, and a Mw / Mn of 1.70.
  • the raw materials used for the Red composition, the Green composition, the Blue composition, and the composition for forming an infrared transmission filter are as follows.
  • a high-pressure disperser with a decompression mechanism NANO-3000-10 (manufactured by Nippon BEE Co., Ltd.) was used to perform dispersion treatment at a flow rate of 500 g / min under a pressure of 2,000 kg / cm 3 . This dispersion treatment was repeated 10 times to obtain a Red pigment dispersion.
  • -Green pigment dispersion C. I. Pigment Green 36 at 6.4 parts by mass
  • C.I. I. A mixed solution consisting of 5.3 parts by mass of Pigment Yellow 150, 5.2 parts by mass of a dispersant (Disperbyk-161, manufactured by BYK Chemie), and 83.1 parts by mass of PGMEA, bead mill (zirconia beads 0.3 mm diameter).
  • a pigment dispersion was prepared by mixing and dispersing for 3 hours. After that, a high-pressure disperser with a decompression mechanism NANO-3000-10 (manufactured by Nippon BEE Co., Ltd.) was used to perform dispersion treatment at a flow rate of 500 g / min under a pressure of 2,000 kg / cm 3 . This dispersion treatment was repeated 10 times to obtain a Green pigment dispersion.
  • Pigment dispersion 1-1 The mixed solution having the following composition is mixed and dispersed for 3 hours with a bead mill (high pressure disperser NANO-3000-10 with decompression mechanism (manufactured by Nippon BEE Co., Ltd.)) using zirconia beads having a diameter of 0.3 mm.
  • a pigment dispersion liquid 1-1 To prepare a pigment dispersion liquid 1-1.
  • Pigment dispersion 1-2 The mixed solution having the following composition is mixed and dispersed for 3 hours with a bead mill (high pressure disperser NANO-3000-10 with decompression mechanism (manufactured by Nippon BEE Co., Ltd.)) using zirconia beads having a diameter of 0.3 mm.
  • the pigment dispersion liquid 1-2 was prepared.
  • -Polymerizable compound 1 KAYARAD DPHA (mixture of dipentaerythritol hexaacrylate and dipentaerythritol pentaacrylate, manufactured by Nippon Kayaku Co., Ltd.)
  • -Polymerizable compound 4 The following structure
  • Polymerizable compound 5 The following structure (a mixture of the left compound and the right compound having a molar ratio of 7: 3)
  • -Silane coupling agent A compound having the following structure.
  • Et represents an ethyl group.
  • Example 201 to 250 The following compositions were mixed, stirred, and then filtered through a nylon filter (manufactured by Nippon Pole Co., Ltd.) having a pore size of 0.45 ⁇ m to prepare the pattern-forming composition of Example 201.
  • Curable composition of Example 1 22.67 parts by mass Pigment dispersion 2-1: 51.23 parts by mass Using the pattern-forming composition of Example 201, light resistance and light resistance and the same as in Example 1 When the foreign matter defect suppressing property was evaluated, the same effect as in Example 1 was obtained.
  • the cured film obtained by using the pattern forming composition of Example 201 blocks light having a wavelength in the visible region and transmits at least a part of light having a wavelength in the near infrared region (near infrared ray). I was able to.
  • the evaluation was carried out in the same manner as in Example 201 using the curable compositions of Examples 2 to 50 instead of the curable composition of Example 1, the same effects as those of Examples 2 to 50 were obtained. was gotten.
  • Examples 251-300 The following compositions were mixed, stirred, and then filtered through a nylon filter (manufactured by Nippon Pole Co., Ltd.) having a pore size of 0.45 ⁇ m to prepare the pattern-forming composition of Example 202.
  • Curable composition of Example 1 36.99 parts by mass Pigment dispersion 1-1: 46.5 parts by mass Pigment dispersion 1-2: 37.1 parts by mass Using the pattern-forming composition of Example 251 When the light resistance and the foreign matter defect suppressing property were evaluated in the same manner as in Example 1, the same effect as in Example 1 was obtained.
  • the cured film obtained by using the pattern forming composition of Example 251 shields light having a wavelength in the visible region and transmits at least a part of light having a wavelength in the near infrared region (near infrared ray). I was able to.
  • the evaluation was carried out in the same manner as in Example 251 using the curable compositions of Examples 2 to 50 instead of the curable composition of Example 1, the same effects as those of Examples 2 to 50 were obtained. was gotten.
  • Example 301 In the above Examples 1 to 50, Examples 101 to 150, and Examples 200 to 300, the substrate is changed to another substrate (change to a silicon wafer in the case of a glass substrate, change to a glass substrate in the case of a silicon wafer). When evaluated in the same manner, the same effect as in the above-mentioned Examples was obtained.
  • Example 401 -Making inkjet ink- Using 20 parts by mass of the dispersion liquid prepared by the same method as in Examples 7 to 50, the following components were stirred with a high-speed water-cooled stirrer to obtain ink compositions 7 to 50.
  • -Light acrylate LA (acrylic acid lauryl ester: monofunctional acrylate): 20.4 parts-Actilane 421 (propoxylated neopentyl glycol diacrylate: bifunctional acrylate, manufactured by Akcross): 16.0 parts-Photomer 2017 (Photomer 2017) EChem UV diluent): 23.0 parts ⁇ Genorad 16 (Rahn stabilizer): 0.05 parts ⁇ Rapi-Cure DVE-3 (ISP Europe vinyl ether): 8.0 parts ⁇ Omnirad TPO H (Photopolymerization initiator manufactured by IGM Resins BV): 8.5 parts, Omnirad 907 (Photopolymerization initiator manufactured by IGM Resins BV): 4.0 parts, Byk 307 (consumed by BYK Chemie) Foaming agent): 0.05 parts
  • the obtained ink compositions 7 to 50 are dropped onto a sheet made of polyvinyl chloride and irradiated by passing them under the light rays of an ultraviolet light emitting diode (UV-LED) at a specific speed to cure the ink.
  • UV-LED ultraviolet light emitting diode
  • the ink is ejected by a commercially available inkjet recording device having a piezo type inkjet nozzle, and the light emitting diode (UV-LED) for curing is NCCU033 manufactured by Nichia Corporation. There was.
  • the LED outputs ultraviolet light having a wavelength of 365 nm from one chip, and when a current of about 500 mA is applied, light of about 100 mW is emitted from the chip. A plurality of these are arranged at intervals of 7 mm, and a power of 0.3 W / cm 2 can be obtained on the surface of the recording medium (hereinafter, also referred to as a medium).
  • the time from drip to exposure and the exposure time can be changed depending on the media transport speed and the distance between the head and the LED in the transport direction. In this example, the exposure was performed about 0.5 seconds after the impact. The exposure energy on the media was adjusted to 1,500 mJ / cm 2 .
  • the ink supply system of the inkjet recording device used for the evaluation consists of the original tank, supply piping, ink supply tank immediately before the inkjet head, filter, and piezo type inkjet head, and heats and heats from the ink supply tank to the inkjet head part.
  • the temperature sensors were provided near the nozzles of the ink supply tank and the inkjet head, respectively, and the temperature was controlled so that the nozzle portion was always 70 ° C. ⁇ 2 ° C.
  • the piezo type inkjet head was driven so that multi-size dots of 8 pl to 30 pl could be ejected at a resolution of 720 ⁇ 720 dpi.
  • the dpi in the present disclosure represents the number of dots per 2.54 cm.
  • 110 Solid-state image sensor
  • 111 Infrared cut filter
  • 112 Color filter
  • 114 Infrared transmission filter
  • 115 Microlens
  • 116 Flattening layer

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  • Macromonomer-Based Addition Polymer (AREA)

Abstract

La présente invention concerne une composition durcissable contenant un composé durcissable et un colorant dont la structure est représentée par la formule (1), un film dans lequel est utilisée la composition durcissable, un filtre optique et son procédé de production, un élément d'imagerie à semi-conducteurs, un capteur infrarouge, un module de caméra et une encre pour impression par jet d'encre. Dans la formule (1), R1 à R6 représentent chacun indépendamment un atome d'hydrogène ou un substituant, R7 et R8 représentent chacun indépendamment un substituant, A représente O ou NR9, R9 représente un atome d'hydrogène ou un substituant, n1 et n2 représentent chacun indépendamment un nombre entier de 0 à 5, R1 et R2 peuvent se lier l'un à l'autre pour former un cycle et R4 et R5 peuvent se lier l'un à l'autre pour former un cycle.
PCT/JP2020/010666 2019-03-19 2020-03-11 Composition durcissable, film, filtre optique et son procédé de production, élément d'imagerie à semi-conducteurs, capteur infrarouge, module de caméra et encre pour impression par jet d'encre WO2020189459A1 (fr)

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Cited By (1)

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Publication number Priority date Publication date Assignee Title
WO2023219011A1 (fr) * 2022-05-13 2023-11-16 富士フイルム株式会社 Encre pour impression à jet d'encre, procédé d'impression à jet d'encre et matière imprimée

Citations (5)

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Publication number Priority date Publication date Assignee Title
JPH10158253A (ja) * 1996-10-02 1998-06-16 Fuji Photo Film Co Ltd ナフトオキサジニンスクアリリウム化合物とそれを含む記録材料
JP2000284403A (ja) * 1999-03-30 2000-10-13 Fuji Photo Film Co Ltd 光消色性着色層を有する記録材料及び熱現像感光材料
JP2003109676A (ja) * 2001-09-27 2003-04-11 Konica Corp 光電変換材料用半導体、光電変換素子及び太陽電池
JP2008250336A (ja) * 1996-11-07 2008-10-16 Fujifilm Corp 反射防止フイルムおよびそれを用いたプラズマディスプレイ
JP2018203844A (ja) * 2017-06-01 2018-12-27 東友ファインケム株式会社Ｄｏｎｇｗｏｏ Ｆｉｎｅ−Ｃｈｅｍ Ｃｏ．， Ｌｔｄ． 着色樹脂組成物

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10158253A (ja) * 1996-10-02 1998-06-16 Fuji Photo Film Co Ltd ナフトオキサジニンスクアリリウム化合物とそれを含む記録材料
JP2008250336A (ja) * 1996-11-07 2008-10-16 Fujifilm Corp 反射防止フイルムおよびそれを用いたプラズマディスプレイ
JP2000284403A (ja) * 1999-03-30 2000-10-13 Fuji Photo Film Co Ltd 光消色性着色層を有する記録材料及び熱現像感光材料
JP2003109676A (ja) * 2001-09-27 2003-04-11 Konica Corp 光電変換材料用半導体、光電変換素子及び太陽電池
JP2018203844A (ja) * 2017-06-01 2018-12-27 東友ファインケム株式会社Ｄｏｎｇｗｏｏ Ｆｉｎｅ−Ｃｈｅｍ Ｃｏ．， Ｌｔｄ． 着色樹脂組成物

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2023219011A1 (fr) * 2022-05-13 2023-11-16 富士フイルム株式会社 Encre pour impression à jet d'encre, procédé d'impression à jet d'encre et matière imprimée

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