WO2020181787A1 - 一种高芯包同心度的光纤及其制备方法 - Google Patents

一种高芯包同心度的光纤及其制备方法 Download PDF

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Publication number
WO2020181787A1
WO2020181787A1 PCT/CN2019/114351 CN2019114351W WO2020181787A1 WO 2020181787 A1 WO2020181787 A1 WO 2020181787A1 CN 2019114351 W CN2019114351 W CN 2019114351W WO 2020181787 A1 WO2020181787 A1 WO 2020181787A1
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Prior art keywords
optical fiber
rod
core
layer
diameter
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PCT/CN2019/114351
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English (en)
French (fr)
Inventor
莫思铭
李凡
纪明辉
邵珠峰
周莉
李想
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江苏永鼎光纤科技有限公司
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Publication of WO2020181787A1 publication Critical patent/WO2020181787A1/zh

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    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01—Manufacture of glass fibres or filaments
    • C03B37/012—Manufacture of preforms for drawing fibres or filaments
    • C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C03B37/01446—Thermal after-treatment of preforms, e.g. dehydrating, consolidating, sintering
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01—Manufacture of glass fibres or filaments
    • C03B37/012—Manufacture of preforms for drawing fibres or filaments
    • C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C03B37/018—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD] by glass deposition on a glass substrate, e.g. by inside-, modified-, plasma-, or plasma modified- chemical vapour deposition [ICVD, MCVD, PCVD, PMCVD], i.e. by thin layer coating on the inside or outside of a glass tube or on a glass rod
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01—Manufacture of glass fibres or filaments
    • C03B37/012—Manufacture of preforms for drawing fibres or filaments
    • C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C03B37/018—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD] by glass deposition on a glass substrate, e.g. by inside-, modified-, plasma-, or plasma modified- chemical vapour deposition [ICVD, MCVD, PCVD, PMCVD], i.e. by thin layer coating on the inside or outside of a glass tube or on a glass rod
    • C03B37/01853—Thermal after-treatment of preforms, e.g. dehydrating, consolidating, sintering
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01—Manufacture of glass fibres or filaments
    • C03B37/012—Manufacture of preforms for drawing fibres or filaments
    • C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C03B37/018—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD] by glass deposition on a glass substrate, e.g. by inside-, modified-, plasma-, or plasma modified- chemical vapour deposition [ICVD, MCVD, PCVD, PMCVD], i.e. by thin layer coating on the inside or outside of a glass tube or on a glass rod
    • C03B37/01861—Means for changing or stabilising the diameter or form of tubes or rods
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01—Manufacture of glass fibres or filaments
    • C03B37/02—Manufacture of glass fibres or filaments by drawing or extruding, e.g. direct drawing of molten glass from nozzles; Cooling fins therefor
    • C03B37/025—Manufacture of glass fibres or filaments by drawing or extruding, e.g. direct drawing of molten glass from nozzles; Cooling fins therefor from reheated softened tubes, rods, fibres or filaments, e.g. drawing fibres from preforms
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/02—Optical fibres with cladding with or without a coating

Definitions

  • This application belongs to the technical field of optical fiber preparation, and in particular relates to an optical fiber with high core-wrap concentricity and a preparation method thereof.
  • Optical fiber is a medium for transmitting optical signals.
  • Optical fiber communication has many advantages such as large communication capacity, long transmission distance, small signal crosstalk, good security performance, anti-electromagnetic interference and good transmission quality. It plays a pivotal role in modern telecommunication networks.
  • Optical fiber loss is one of the important indicators of optical fiber performance. The level of optical fiber loss directly affects the distance of communication transmission or the distance between relay stations and the performance of communication equipment such as SDH and WDM. The system cost is mainly concentrated on controlling loss. Therefore, Optical fiber loss is of great practical significance to whether optical fiber can adapt to the development of future communication technology.
  • the difference in the core/cladding concentricity (core-package concentricity) of the optical fiber is one of the main causes of optical fiber loss, and the bow of the optical fiber preform will directly cause a larger core package in the fiber after the preform is drawn. Concentricity error, but in the production process of optical fiber preform, it is difficult to control the bow degree and diameter uniformity of the preform.
  • the technical problem to be solved by the present invention is to solve the technical problem of poor core-pack concentricity of the optical fiber in the prior art, thereby providing an optical fiber with high core-pack concentricity and a preparation method thereof.
  • a method for preparing an optical fiber with high core-wrap concentricity the steps are as follows:
  • the upward movement speed of the rod is calculated in advance according to the required diameter of the core rod after stretching, the upward movement speed of the stretching furnace, and the diameter of the fiber core rod mother rod of the stretched section before the stretching.
  • the bow of the rod is less than 0.8mm/m;
  • the optical fiber preform is directly drawn by wire, or drawn and then drawn into a single-mode fiber with ultra-low loss and large effective area.
  • V 1 k ⁇ V 2 ⁇ V 3 (D 1 2 -D 2 2 )/D 1 2
  • V 1 is the upper stretching rod Real-time moving speed
  • V 2 is the rotation speed of the fiber core rod mother rod
  • V 3 is the preset moving speed of the drawing furnace upwards
  • D 1 is the diameter of the fiber core rod mother rod of the stretched section
  • D 2 is the drawing
  • the required diameter of the back core rod is 0.1-0.12 for k, 7-9mm/min for V 2 and 30-40mm/min for V 3
  • the temperature of the fiber core rod mother rod heated by the drawing furnace is controlled at 2000-2500°C .
  • the sintering treatment method is as follows: the optical fiber preform to be sintered rotates in the sintering furnace, and the gas inside the sintering furnace is heated by the up and down movement of the heating coil outside the sintering furnace to complete the sintering.
  • the moving speed of the heating coil is preferably 5 -10mm/min, the rotation speed is preferably 3-6rpm.
  • the sintering treatment method is as follows: firstly, inert gas and chlorine gas are introduced into the sintering furnace, so that the temperature in the sintering furnace reaches 600-800°C at a heating rate of 15-25 mm/min, holding for 2-3 hours, and then sintering The temperature in the furnace reaches 1000-1200°C at a heating rate of 30-45mm/min, and the temperature is kept for 2-3h; the chlorine gas is turned off and only inert gas is introduced into the sintering furnace to make the temperature in the sintering furnace rise at a heating rate of 10-20mm/min Reach 1300 ⁇ 1500°C, keep for 4-6h.
  • the fluorine-doped quartz tube is heated to 600-800°C, and the fluorine-doped quartz tube is passed into the fluorine-doped quartz tube. Fluorine gas chemically etches the inner surface of the quartz tube.
  • the relative refractive index of the inner core layer is ⁇ n 1
  • the relative refractive index of the outer core layer is ⁇ n 2
  • the relative refractive index of the inner cladding layer is ⁇ n 3
  • the relative refractive index of the depressed layer is ⁇ n 4
  • the outer cladding is pure silica, and the relative refractive index is: ⁇ n 1 > ⁇ n 2 >0> ⁇ n 3 > ⁇ n 4 .
  • the relative refractive index ⁇ n 1 of the inner core layer is 0.35% to 0.5%
  • the relative refractive index ⁇ n 2 of the outer core layer is 0.1% to 0.25%
  • the relative refractive index ⁇ n 3 of the inner cladding layer is -0.05% to -0.01%
  • the relative refractive index ⁇ n 4 of the depressed layer is -0.25% to -0.1%.
  • the inner core layer and the outer core layer are silica glass layers doped with B 2 O 3
  • the inner cladding layer is a silica glass layer doped with P 2 O 5 -F mixture.
  • the layer is a fluorine-doped silica glass layer.
  • the ratio b/a of the outer core layer diameter b to the inner core layer diameter a is 1.5-2.5
  • the ratio c/a of the inner cladding diameter c to the inner core layer diameter a is 3-4
  • the sinking layer diameter d is The ratio d/a of the core diameter a is 7-9
  • the ratio d/c of the diameter d of the optical fiber preform to the diameter c of the preformed core rod after stretching is 2.5-3.5.
  • the present invention also provides an optical fiber prepared by the above method.
  • the present invention uses the MCVD process to prepare the preformed core rod mother rod including the inner core layer, the outer core layer, the inner cladding layer and the depressed layer, and then heats and stretches the preformed core rod mother rod to make the bow of the optical fiber core rod after stretching Less than 0.8mm/m, and then prepare the outer coating through the OVD process to obtain the optical fiber preform. Finally, the optical fiber preform is directly drawn or drawn and then drawn to obtain the optical fiber. Among them: (1) After the MCVD process step, the preform core rod mother The rod is stretched vertically upwards.
  • the diameter of the optical fiber preform prepared by the present invention can reach 218mm, the length of a single preform can reach 3015km, the attenuation of the optical fiber at 1310nm wavelength is ⁇ 0.311dB/km, and the attenuation coefficient at 1383nm wavelength is ⁇ 0.272dB/km , The attenuation coefficient at 1550nm wavelength is ⁇ 0.171dB/km.
  • This embodiment provides a method for preparing an optical fiber with high core-wrap concentricity, and the steps are as follows:
  • the fluorine-doped quartz tube is heated to 600°C, SiF 4 gas is introduced into the fluorine-doped quartz tube to chemically etch the inner surface of the quartz tube, and the inner cladding layer and outer core layer are deposited on the inner wall of the fluorine-doped quartz tube as the lower limit layer by the MCVD process And the inner core layer to obtain a deposition tube, and the deposition tube is fused at 2300°C to obtain a prefabricated core rod mother rod; the inner core layer and the outer core layer are silica glass layers doped with B 2 O 3 , The relative refractive index ⁇ n 1 of the inner core layer is 0.35%, and the relative refractive index ⁇ n 2 of the outer core layer is 0.1%.
  • the inner cladding layer is a silica glass layer doped with a P 2 O 5 -F mixture.
  • the relative refractive index ⁇ n 3 is -0.05%, and the relative refractive index ⁇ n 4 of the depressed layer is -0.25%;
  • the ratio b/a of the outer core layer diameter b to the inner core layer diameter a is 1.5, and the inner cladding diameter c
  • the ratio c/a to the inner core layer diameter a is 3, and the ratio d/a of the sinking layer diameter d to the inner core layer diameter a is 7;
  • V 1 k ⁇ V 2 ⁇ V 3 (D 1 2 -D 2 2 )/D 1 2
  • V 1 is the real-time moving speed of the upper drawing rod
  • V 2 is the fiber core
  • the rotation speed of the core rod of the rod V 3 is the preset speed of upward movement of the stretching furnace
  • D 1 is the diameter of the fiber core rod of the stretched section
  • D 2 is the required diameter of the core rod after stretching
  • k V 2 is 9 mm/min
  • V 3 is 30 mm/min
  • the temperature of the fiber core rod mother rod heated by the stretching furnace is controlled at 2000 °C
  • the bow degree of the preformed core rod after the stretching is less than 0.8 mm/min. m;
  • the OVD process is used to deposit the loose body of the outer covering on the outside of the preformed mandrel after stretching, and then sintering is performed to obtain the optical fiber preform.
  • the outer covering is pure silica, and the diameter d of the optical fiber preform is the same as that of the stretched preform.
  • the ratio d/c of the core rod diameter c is 2.5;
  • the sintering treatment method is as follows: firstly, helium and chlorine gas are introduced into the sintering furnace, so that the optical fiber preform to be sintered rotates at a speed of 3 rpm in the sintering furnace. The up and down movement of the heating coil outside the furnace heats the gas inside the sintering furnace.
  • the moving speed of the heating coil is 5 mm/min, so that the temperature in the sintering furnace reaches 600 °C at a heating rate of 15 mm/min, and the temperature is kept for 3 hours.
  • the heating rate of 30mm/min reaches 1000°C, and the temperature is kept for 3h; the chlorine gas is turned off, and only helium gas is introduced into the sintering furnace to maintain the optical fiber preform to rotate in the sintering furnace and the heating coil to move up and down, so that the temperature in the sintering furnace is 10mm/
  • the heating rate in min reaches 1300°C and the temperature is kept for 6h.
  • the diameter of the optical fiber preform reaches 198mm
  • the length of a single rod can reach 2815km
  • the fiber attenuation at 1310nm after drawing is 0.302dB/km
  • the attenuation at 1383nm is 0.268dB/km
  • the attenuation at 1550nm It is 0.169dB/km.
  • This embodiment provides a method for preparing an optical fiber with high core-wrap concentricity, and the steps are as follows:
  • the fluorine-doped quartz tube is heated to 800°C, and CF 4 gas is introduced into the fluorine-doped quartz tube to chemically etch the inner surface of the quartz tube, and the inner cladding and outer core layer are deposited on the inner wall of the fluorine-doped quartz tube as the lower limit layer by the MCVD process
  • the inner core layer to obtain a deposition tube, and the deposition tube is fused at 2300°C to obtain a prefabricated core rod mother rod;
  • the inner core layer and the outer core layer are silica glass layers doped with B 2 O 3 ,
  • the relative refractive index ⁇ n 1 of the inner core layer is 0.5%
  • the relative refractive index ⁇ n 2 of the outer core layer is 0.25%.
  • the inner cladding layer is a silica glass layer doped with a P 2 O 5 -F mixture.
  • the relative refractive index ⁇ n 3 is -0.01%, the relative refractive index ⁇ n 4 of the depressed layer is -0.1%;
  • the ratio b/a of the outer core layer diameter b to the inner core layer diameter a is 2.5, and the inner cladding diameter c
  • the ratio c/a to the inner core layer diameter a is 4, and the ratio d/a of the depressed layer diameter d to the inner core layer diameter a is 9;
  • V 1 k ⁇ V 2 ⁇ V 3 (D 1 2 -D 2 2 )/D 1 2
  • V 1 is the real-time moving speed of the upper drawing rod
  • V 2 is the fiber core Rotation speed of the rod mother rod
  • V 3 is the preset speed of upward movement of the drawing furnace
  • D 1 is the diameter of the fiber core rod mother rod in the stretched section
  • D 2 is the required diameter of the core rod after drawing
  • k It is 0.12
  • V 2 is 7mm/min
  • V 3 40mm/min
  • the temperature of the fiber core rod mother rod heated by the stretching furnace is controlled at 2500°C
  • the bow degree of the preformed core rod after the stretching is less than 0.8mm/min.
  • the OVD process is used to deposit the loose body of the outer covering on the outside of the preformed mandrel after stretching, and then sintering is performed to obtain the optical fiber preform.
  • the outer covering is pure silica, and the diameter d of the optical fiber preform is the same as that of the stretched preform.
  • the ratio d/c of the core rod diameter c is 3.5;
  • the sintering method is as follows: first pass helium and chlorine gas into the sintering furnace, so that the optical fiber preform to be sintered rotates at a speed of 6 rpm in the sintering furnace. The up and down movement of the heating coil outside the furnace heats the gas inside the sintering furnace.
  • the moving speed of the heating coil is 10mm/min, so that the temperature in the sintering furnace reaches 800°C at a heating rate of 25mm/min, and the temperature is kept for 2h.
  • the heating rate of 45mm/min reaches 1200°C and the temperature is kept for 3h; the chlorine gas is turned off, and only helium gas is introduced into the sintering furnace to maintain the optical fiber preform to rotate in the sintering furnace and the heating coil to move up and down, so that the temperature in the sintering furnace is 20mm/
  • the heating rate in min reaches 1500°C and the temperature is kept for 4h.
  • the diameter of the optical fiber preform reaches 218mm
  • the length of a single rod can reach 3015km
  • the fiber attenuation at 1310nm after drawing is 0.311dB/km
  • the attenuation at 1383nm is 0.272dB/km
  • the attenuation at 1550nm It is 0.171dB/km.
  • This embodiment provides a method for preparing an optical fiber with high core-wrap concentricity, and the steps are as follows:
  • the fluorine-doped quartz tube is heated to 700°C, SiF 4 gas is introduced into the fluorine-doped quartz tube to chemically etch the inner surface of the quartz tube, and the inner cladding and outer core layer are deposited on the inner wall of the fluorine-doped quartz tube as the lower limit layer by MCVD process And the inner core layer to obtain a deposition tube, and the deposition tube is fused at 2300°C to obtain a prefabricated core rod mother rod; the inner core layer and the outer core layer are silica glass layers doped with B 2 O 3 ,
  • the relative refractive index ⁇ n 1 of the inner core layer is 0.4%
  • the relative refractive index ⁇ n 2 of the outer core layer is 0.2%.
  • the inner cladding layer is a silica glass layer doped with a P 2 O 5 -F mixture.
  • the relative refractive index ⁇ n 3 is -0.07%, the relative refractive index ⁇ n 4 of the depressed layer is -0.2%;
  • the ratio b/a of the outer core layer diameter b to the inner core layer diameter a is 2, and the inner cladding diameter c
  • the ratio c/a to the inner core layer diameter a is 3, and the ratio d/a of the sinking layer diameter d to the inner core layer diameter a is 8;
  • V 1 k ⁇ V 2 ⁇ V 3 (D 1 2 -D 2 2 )/D 1 2
  • V 1 is the real-time moving speed of the upper drawing rod
  • V 2 is the fiber core Rotation speed of the rod mother rod
  • V 3 is the preset speed of upward movement of the drawing furnace
  • D 1 is the diameter of the fiber core rod mother rod in the stretched section
  • D 2 is the required diameter of the core rod after drawing
  • V 2 is 8mm/min
  • V 3 35mm/min
  • the temperature at which the drawing furnace heats the mother rod of the optical fiber core rod is controlled at 2300°C
  • the bow degree of the preformed core rod after the stretching is less than 0.8 mm/min.
  • the OVD process is used to deposit the loose body of the outer covering on the outside of the preformed mandrel after stretching, and then sintering is performed to obtain the optical fiber preform.
  • the outer covering is pure silica, and the diameter d of the optical fiber preform is the same as that of the stretched preform.
  • the ratio d/c of the core rod diameter c is 3;
  • the sintering method is as follows: first pass helium and chlorine gas into the sintering furnace, so that the optical fiber preform to be sintered rotates at a speed of 5 rpm in the sintering furnace. The up and down movement of the heating coil outside the furnace heats the gas inside the sintering furnace.
  • the moving speed of the heating coil is 5-10mm/min, so that the temperature in the sintering furnace reaches 700°C at a heating rate of 20mm/min.
  • the temperature is kept for 2.5h, and then the sintering furnace
  • the internal temperature reaches 1100°C at a heating rate of 40mm/min, and the temperature is kept for 2.5h; the chlorine gas is turned off, and only helium gas is introduced into the sintering furnace to maintain the optical fiber preform to rotate in the sintering furnace and the heating coil to move up and down to make the sintering furnace
  • the temperature reaches 1400°C at a heating rate of 15 mm/min, and the temperature is kept for 5 hours.
  • the diameter of the optical fiber preform reaches 212mm, and the length of a single rod can reach 2951km.
  • the fiber attenuation at 1310nm is 0.295dB/km
  • the attenuation at 1383nm is 0.251dB/km
  • the attenuation at 1550nm It is 0.165dB/km.

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Abstract

一种高芯包同心度的光纤及其制备方法，所述光纤的制备方法为：利用MCVD工艺制备包括内芯层、外芯层、内包层和下陷层的预制芯棒母棒，然后对预制芯棒母棒进行加热拉伸，使拉伸后光纤芯棒的弓曲度小于0.8mm/m，再通过OVD工艺制备外包层，得到光纤预制棒，最后将光纤预制棒直接拉丝或经拉伸后再拉丝得到光纤。光纤预制棒的直径可达218mm，单根预制棒拉纤长度可达到3015km，光纤在1310nm波长处的衰减≤0.311dB/km，在1383nm波长处的衰减系数≤0.272dB/km，在1550nm波长处的衰减系数≤0.171dB/km。

Description

一种高芯包同心度的光纤及其制备方法 技术领域
本申请属于光纤制备技术领域，尤其是涉及一种高芯包同心度的光纤及其制备方法。
背景技术
光纤作为传输光信号的媒介，光纤通信具有通信容量大、传输距离远、信号串扰小、保密性能好、抗电磁干扰和传输质量佳等诸多优点，在现代电信网中起着举足轻重的作用。光纤损耗是光纤性能的重要指标之一，光纤损耗的高低直接影响着通信传输的距离或中继站距离间隔的远近以及SDH、WDM等通信设备的性能，系统成本也主要集中在控制损耗上，因此，光纤损耗对于光纤能否适应未来通信技术的发展有着重大的现实意义。
光纤的纤芯/包层同心度(芯包同心度)差是导致光纤损耗的主要原因之一，而光纤预制棒的弓曲度差会直接造成预制棒拉丝后的光纤存在较大的芯包同心度误差，但在光纤预制棒的生产过程中，很难控制预制棒的弓曲度和直径均匀性。
发明内容
本发明要解决的技术问题是：为解决现有技术中光纤的芯包同心度差的技术问题，从而提供一种高芯包同心度的光纤及其制备方法。
本发明解决其技术问题所采用的技术方案是：
一种高芯包同心度的光纤制备方法，步骤如下：
利用MCVD工艺在作为下限层的石英管内壁沉积内包层、外芯层和内芯层，获得沉积管，并将沉积管熔缩，得到预制芯棒母棒；
将预制芯棒母棒两端分别对接上拉伸引棒和下拉伸引棒，并使预制芯棒母棒竖直穿过拉伸炉，使上拉伸引棒和下拉伸引棒以相同的转速同步旋转，使拉伸炉对预制芯棒母棒从下到上进行加热，并使上拉伸引棒向上移动，对预制芯棒母棒进行加热拉伸，所述上拉伸引棒向上移动的速度根据拉伸后芯棒所需要的直径、拉伸炉向上移动的速度以及被拉伸段光纤芯棒母棒的直径在拉伸前提前计算得到，所述拉伸后预制芯棒的弓曲度小于0.8mm/m；
利用OVD工艺在拉伸后预制芯棒的外部沉积外包层疏松体，然后进行烧结处理，得到光纤预制棒；
将光纤预制棒直接拉丝而成，或经拉伸后再拉丝而成超超低损耗大有效面积的单模光纤。
优选地，在对预制芯棒母棒加热拉伸过程中满足：V 1＝k×V 2×V 3(D 1 2-D 2 2)/D 1 2，V 1为上拉伸引棒的实时移动速度，V 2为光纤芯棒母棒自转的转速，V 3为预设的拉伸炉向上移动的速度，D 1为被拉伸段光纤芯棒母棒的直径，D 2为拉伸后芯棒所需要的直径，k为0.1-0.12，V 2为7-9mm/min，V 3为30-40mm/min，拉伸炉对光纤芯棒母棒加热的温度控制在2000-2500℃。
优选地，所述烧结处理方法为：使待烧结的光纤预制棒在烧结炉内自转，通过烧结 炉外加热线圈的上下移动对烧结炉内部气体加热，完成烧结，加热线圈的移动速度优选为5-10mm/min，自转速度优选为3-6rpm。
优选地，所述烧结处理方法为：首先向烧结炉内通入惰性气体和氯气，使烧结炉内温度以15～25mm/min的升温速率达到600～800℃，保温2-3h，再使烧结炉内温度以30～45mm/min的升温速率达到1000～1200℃，保温2-3h；关闭氯气，向烧结炉内只通入惰性气体，使烧结炉内温度以10～20mm/min的升温速率达到1300～1500℃，保温4-6h。
优选地，利用MCVD工艺在作为下限层的掺氟石英管内壁沉积内包层、外芯层和内芯层前，将掺氟石英管加热到600-800℃，向掺氟石英管中通入含氟气体对石英管内表面进行化学刻蚀。
优选地，所述内芯层的相对折射率为△n 1，外芯层的相对折射率为△n 2，内包层的相对折射率为△n 3，下陷层的相对折射率为△n 4，外包层为纯二氧化硅，相对折射率大小为：Δn 1>Δn 2>0>Δn 3>Δn 4。
优选地，所述内芯层的相对折射率Δn 1为0.35％～0.5％，外芯层的相对折射率Δn 2为0.1％～0.25％，内包层的相对折射率Δn 3为-0.05％～-0.01％，下陷层的相对折射率Δn 4为-0.25％～-0.1％。
优选地，所述内芯层和外芯层为掺入B 2O 3的二氧化硅玻璃层，所述内包层为掺入P 2O 5-F混合物的二氧化硅玻璃层，所述下陷层为掺氟的二氧化硅玻璃层。
优选地，外芯层直径b与内芯层直径a的比值b/a为1.5-2.5，内包层直径c与内芯层直径a的比值c/a为3-4，下陷层直径d与内芯层直径a的比值d/a为7～9，光纤预制棒的直径d与拉伸后的预制芯棒直径c的比值d/c为2.5～3.5。
本发明还提供一种由上述方法制备的光纤。
本发明的有益效果是：
本发明利用MCVD工艺制备包括内芯层、外芯层、内包层和下陷层的预制芯棒母棒，然后对预制芯棒母棒进行加热拉伸，使拉伸后光纤芯棒的弓曲度小于0.8mm/m，再通过OVD工艺制备外包层，得到光纤预制棒，最后将光纤预制棒直接拉丝或经拉伸后再拉丝得到光纤，其中：(1)MCVD工艺步骤后对预制芯棒母棒的拉伸采用竖直向上拉伸的方式，同时在拉伸前根据拉伸后芯棒所需要的直径、拉伸炉向上移动的速度以及被拉伸段光纤芯棒母棒的直径提前计算出上拉伸引棒沿向上的移动速度，保证了拉伸后预制芯棒的弓曲度和直径均匀性；(2)OVD工艺步骤中合理的烧结工艺，不仅有效脱除了羟基，还保证了光纤预制棒直径的均匀性，最终降低了拉制光纤的芯包同心度误差；(3)对内芯层、外芯层、内包层和下陷层的折射率和直径等进行了进一步限定，可以保证光纤预制棒的拉纤长度，降低光纤损耗。最终，本发明制备的光纤预制棒的直径可达218mm，单根预制棒拉纤长度可达到3015km，光纤在1310nm波长处的衰减≤0.311dB/km，在1383nm波长处的衰减系数≤0.272dB/km，在1550nm波长处的衰减系数≤0.171dB/km。
具体实施方式
需要说明的是，在不冲突的情况下，本申请中的实施例及实施例中的特征可以相互组合。
实施例1
本实施例提供一种高芯包同心度的光纤制备方法，步骤如下：
将掺氟石英管加热到600℃，向掺氟石英管中通入SiF 4气体对石英管内表面进行化学刻蚀，利用MCVD工艺在作为下限层的掺氟石英管内壁沉积内包层、外芯层和内芯层，获得沉积管，并将沉积管在2300℃下熔缩，得到预制芯棒母棒；所述内芯层和外芯层为掺入B 2O 3的二氧化硅玻璃层，内芯层的相对折射率Δn 1为0.35％，外芯层的相对折射率Δn 2为0.1％，所述内包层为掺入P 2O 5-F混合物的二氧化硅玻璃层，内包层的相对折射率Δn 3为-0.05％，所述下陷层的相对折射率Δn 4为-0.25％；所述外芯层直径b与内芯层直径a的比值b/a为1.5，内包层直径c与内芯层直径a的比值c/a为3，下陷层直径d与内芯层直径a的比值d/a为7；
将预制芯棒母棒两端分别对接上拉伸引棒和下拉伸引棒，并使预制芯棒母棒竖直穿过拉伸炉，使上拉伸引棒和下拉伸引棒以相同的转速同步旋转，使拉伸炉对预制芯棒母棒从下到上进行加热，并使上拉伸引棒向上移动，对预制芯棒母棒进行加热拉伸，在对预制芯棒母棒加热拉伸过程中满足：V 1＝k×V 2×V 3(D 1 2-D 2 2)/D 1 2，V 1为上拉伸引棒的实时移动速度，V 2为光纤芯棒母棒自转的转速，V 3为预设的拉伸炉向上移动的速度，D 1为被拉伸段光纤芯棒母棒的直径，D 2为拉伸后芯棒所需要的直径，k为0.1，V 2为9mm/min，V 3为30mm/min，拉伸炉对光纤芯棒母棒加热的温度控制在2000℃，所述拉伸后预制芯棒的弓曲度小于0.8mm/m；
利用OVD工艺在拉伸后预制芯棒的外部沉积外包层疏松体，然后进行烧结处理，得到光纤预制棒，所述外包层为纯二氧化硅，光纤预制棒的直径d与拉伸后的预制芯棒直径c的比值d/c为2.5；所述烧结处理方法为：首先向烧结炉内通入氦气和氯气，使待烧结的光纤预制棒在烧结炉内以3rpm的速度自转，通过烧结炉外加热线圈的上下移动对烧结炉内部气体加热，加热线圈的移动速度为5mm/min，使烧结炉内温度以15mm/min的升温速率达到600℃，保温3h，再使烧结炉内温度以30mm/min的升温速率达到1000℃，保温3h；关闭氯气，向烧结炉内只通入氦气，维持光纤预制棒在烧结炉内自转和加热线圈的上下移动，使烧结炉内温度以10mm/min的升温速率达到1300℃，保温6h。
经测试，光纤预制棒的直径达到198mm，单根棒拉纤长度可达到2815km，拉丝后光纤在1310nm的衰耗为0.302dB/km，在1383nm的衰耗为0.268dB/km，在1550nm的衰耗为0.169dB/km。
实施例2
本实施例提供一种高芯包同心度的光纤制备方法，步骤如下：
将掺氟石英管加热到800℃，向掺氟石英管中通入CF 4气体对石英管内表面进行化学刻蚀，利用MCVD工艺在作为下限层的掺氟石英管内壁沉积内包层、外芯层和内芯层，获得沉积管，并将沉积管在2300℃下熔缩，得到预制芯棒母棒；所述内芯层和外芯层为掺入B 2O 3的二氧化硅玻璃层，内芯层的相对折射率Δn 1为0.5％，外芯层的相对折射率Δn 2为0.25％，所述内包层为掺入P 2O 5-F混合物的二氧化硅玻璃层，内包层的相对折射率Δn 3为-0.01％，所述下陷层的相对折射率Δn 4为-0.1％；所述外芯层直径b与内芯层直径a的比值b/a为2.5，内包层直径c与内芯层直径a的比值c/a为4，下陷层直径d与内芯层直径a的比值d/a为9；
将预制芯棒母棒两端分别对接上拉伸引棒和下拉伸引棒，并使预制芯棒母棒竖直穿过拉伸炉，使上拉伸引棒和下拉伸引棒以相同的转速同步旋转，使拉伸炉对预制芯棒母 棒从下到上进行加热，并使上拉伸引棒向上移动，对预制芯棒母棒进行加热拉伸，在对预制芯棒母棒加热拉伸过程中满足：V 1＝k×V 2×V 3(D 1 2-D 2 2)/D 1 2，V 1为上拉伸引棒的实时移动速度，V 2为光纤芯棒母棒自转的转速，V 3为预设的拉伸炉向上移动的速度，D 1为被拉伸段光纤芯棒母棒的直径，D 2为拉伸后芯棒所需要的直径，k为0.12，V 2为7mm/min，V 3为40mm/min，拉伸炉对光纤芯棒母棒加热的温度控制在2500℃，所述拉伸后预制芯棒的弓曲度小于0.8mm/m；
利用OVD工艺在拉伸后预制芯棒的外部沉积外包层疏松体，然后进行烧结处理，得到光纤预制棒，所述外包层为纯二氧化硅，光纤预制棒的直径d与拉伸后的预制芯棒直径c的比值d/c为3.5；所述烧结处理方法为：首先向烧结炉内通入氦气和氯气，使待烧结的光纤预制棒在烧结炉内以6rpm的速度自转，通过烧结炉外加热线圈的上下移动对烧结炉内部气体加热，加热线圈的移动速度为10mm/min，使烧结炉内温度以25mm/min的升温速率达到800℃，保温2h，再使烧结炉内温度以45mm/min的升温速率达到1200℃，保温3h；关闭氯气，向烧结炉内只通入氦气，维持光纤预制棒在烧结炉内自转和加热线圈的上下移动，使烧结炉内温度以20mm/min的升温速率达到1500℃，保温4h。
经测试，光纤预制棒的直径达到218mm，单根棒拉纤长度可达到3015km，拉丝后光纤在1310nm的衰耗为0.311dB/km，在1383nm的衰耗为0.272dB/km，在1550nm的衰耗为0.171dB/km。
实施例3
本实施例提供一种高芯包同心度的光纤制备方法，步骤如下：
将掺氟石英管加热到700℃，向掺氟石英管中通入SiF 4气体对石英管内表面进行化学刻蚀，利用MCVD工艺在作为下限层的掺氟石英管内壁沉积内包层、外芯层和内芯层，获得沉积管，并将沉积管在2300℃下熔缩，得到预制芯棒母棒；所述内芯层和外芯层为掺入B 2O 3的二氧化硅玻璃层，内芯层的相对折射率Δn 1为0.4％，外芯层的相对折射率Δn 2为0.2％，所述内包层为掺入P 2O 5-F混合物的二氧化硅玻璃层，内包层的相对折射率Δn 3为-0.07％，所述下陷层的相对折射率Δn 4为-0.2％；所述外芯层直径b与内芯层直径a的比值b/a为2，内包层直径c与内芯层直径a的比值c/a为3，下陷层直径d与内芯层直径a的比值d/a为8；
将预制芯棒母棒两端分别对接上拉伸引棒和下拉伸引棒，并使预制芯棒母棒竖直穿过拉伸炉，使上拉伸引棒和下拉伸引棒以相同的转速同步旋转，使拉伸炉对预制芯棒母棒从下到上进行加热，并使上拉伸引棒向上移动，对预制芯棒母棒进行加热拉伸，在对预制芯棒母棒加热拉伸过程中满足：V 1＝k×V 2×V 3(D 1 2-D 2 2)/D 1 2，V 1为上拉伸引棒的实时移动速度，V 2为光纤芯棒母棒自转的转速，V 3为预设的拉伸炉向上移动的速度，D 1为被拉伸段光纤芯棒母棒的直径，D 2为拉伸后芯棒所需要的直径，k为0.11，V 2为8mm/min，V 3为35mm/min，拉伸炉对光纤芯棒母棒加热的温度控制在2300℃，所述拉伸后预制芯棒的弓曲度小于0.8mm/m；
利用OVD工艺在拉伸后预制芯棒的外部沉积外包层疏松体，然后进行烧结处理，得到光纤预制棒，所述外包层为纯二氧化硅，光纤预制棒的直径d与拉伸后的预制芯棒直径c的比值d/c为3；所述烧结处理方法为：首先向烧结炉内通入氦气和氯气，使待烧结的光纤预制棒在烧结炉内以5rpm的速度自转，通过烧结炉外加热线圈的上下移动对烧结炉内部气体 加热，加热线圈的移动速度为5-10mm/min，使烧结炉内温度以20mm/min的升温速率达到700℃，保温2.5h，再使烧结炉内温度以40mm/min的升温速率达到1100℃，保温2.5h；关闭氯气，向烧结炉内只通入氦气，维持光纤预制棒在烧结炉内自转和加热线圈的上下移动，使烧结炉内温度以15mm/min的升温速率达到1400℃，保温5h。
经测试，光纤预制棒的直径达到212mm，单根棒拉纤长度可达到2951km，拉丝后光纤在1310nm的衰耗为0.295dB/km，在1383nm的衰耗为0.251dB/km，在1550nm的衰耗为0.165dB/km。
以上述依据本申请的理想实施例为启示，通过上述的说明内容，相关工作人员完全可以在不偏离本项申请技术思想的范围内，进行多样的变更以及修改。本项申请的技术性范围并不局限于说明书上的内容，必须要根据权利要求范围来确定其技术性范围。

Claims (10)

  1. 一种高芯包同心度的光纤制备方法，其特征在于，步骤如下：
    利用MCVD工艺在作为下限层的石英管内壁沉积内包层、外芯层和内芯层，获得沉积管，并将沉积管熔缩，得到预制芯棒母棒；
    将预制芯棒母棒两端分别对接上拉伸引棒和下拉伸引棒，并使预制芯棒母棒竖直穿过拉伸炉，使上拉伸引棒和下拉伸引棒以相同的转速同步旋转，使拉伸炉对预制芯棒母棒从下到上进行加热，并使上拉伸引棒向上移动，对预制芯棒母棒进行加热拉伸，所述上拉伸引棒向上移动的速度根据拉伸后芯棒所需要的直径、拉伸炉向上移动的速度以及被拉伸段光纤芯棒母棒的直径在拉伸前提前计算得到，所述拉伸后预制芯棒的弓曲度小于0.8mm/m；
    利用OVD工艺在拉伸后预制芯棒的外部沉积外包层疏松体，然后进行烧结处理，得到光纤预制棒；
    将光纤预制棒直接拉丝而成，或经拉伸后再拉丝而成超超低损耗大有效面积的单模光纤。
  2. 根据权利要求1所述的高芯包同心度的光纤制备方法，其特征在于，在对预制芯棒母棒加热拉伸过程中满足：V 1＝k×V 2×V 3(D 1 2-D 2 2)/D 1 2，V 1为上拉伸引棒的实时移动速度，V 2为光纤芯棒母棒自转的转速，V 3为预设的拉伸炉向上移动的速度，D 1为被拉伸段光纤芯棒母棒的直径，D 2为拉伸后芯棒所需要的直径，k为0.1-0.12，V 2为7-9mm/min，V 3为30-40mm/min，拉伸炉对光纤芯棒母棒加热的温度控制在2000-2500℃。
  3. 根据权利要求1或2所述的高芯包同心度的光纤制备方法，其特征在于，所述烧结处理方法为：使待烧结的光纤预制棒在烧结炉内自转，通过烧结炉外加热线圈的上下移动对烧结炉内部气体加热，完成烧结，加热线圈的移动速度优选为5-10mm/min，自转速度优选为3-6rpm。
  4. 根据权利要求3所述的高芯包同心度的光纤制备方法，其特征在于，所述烧结处理方法为：首先向烧结炉内通入惰性气体和氯气，使烧结炉内温度以15～25mm/min的升温速率达到600～800℃，保温2-3h，再使烧结炉内温度以30～45mm/min的升温速率达到1000～1200℃，保温2-3h；关闭氯气，向烧结炉内只通入惰性气体，使烧结炉内温度以10～20mm/min的升温速率达到1300～1500℃，保温4-6h。
  5. 根据权利要求1-4任一项所述的高芯包同心度的光纤制备方法，其特征在于，利用MCVD工艺在作为下限层的掺氟石英管内壁沉积内包层、外芯层和内芯层前，将掺氟石英管加热到600-800℃，向掺氟石英管中通入含氟气体对石英管内表面进行化学刻蚀。
  6. 根据权利要求1-5任一项所述的高芯包同心度的光纤制备方法，其特征在于，所述内芯层的相对折射率为△n 1，外芯层的相对折射率为△n 2，内包层的相对折射率为△n 3，下陷层的相对折射率为△n 4，外包层为纯二氧化硅，相对折射率大小为：Δn 1>Δn 2>0>Δn 3>Δn 4。
  7. 根据权利要求6所述的高芯包同心度的光纤制备方法，其特征在于，所述内芯层的相对折射率Δn 1为0.35％～0.5％，外芯层的相对折射率Δn 2为0.1％～0.25％，内包层的相对折射率Δn 3为-0.05％～-0.01％，下陷层的相对折射率Δn 4为-0.25％～-0.1％。
  8. 根据权利要求1-7任一项所述的高芯包同心度的光纤制备方法，其特征在于，所述内芯层和外芯层为掺入B 2O 3的二氧化硅玻璃层，所述内包层为掺入P 2O 5-F混合物的二氧化硅玻璃层，所述下陷层为掺氟的二氧化硅玻璃层。
  9. 根据权利要求1-8任一项所述的高芯包同心度的光纤制备方法，其特征在于，外芯层 直径b与内芯层直径a的比值b/a为1.5-2.5，内包层直径c与内芯层直径a的比值c/a为3-4，下陷层直径d与内芯层直径a的比值d/a为7～9，光纤预制棒的直径d与拉伸后的预制芯棒直径c的比值d/c为2.5～3.5。
  10. 一种由权利要求1-9任一项所述的方法制备的光纤。
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