WO2020177576A1 - 检测器、检测系统及物质浓度的检测方法 - Google Patents
检测器、检测系统及物质浓度的检测方法 Download PDFInfo
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- WO2020177576A1 WO2020177576A1 PCT/CN2020/076589 CN2020076589W WO2020177576A1 WO 2020177576 A1 WO2020177576 A1 WO 2020177576A1 CN 2020076589 W CN2020076589 W CN 2020076589W WO 2020177576 A1 WO2020177576 A1 WO 2020177576A1
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
- G01N27/02—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance
- G01N27/04—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance
- G01N27/06—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance of a liquid
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- the present disclosure relates to the field of semiconductor technology, and in particular to a detector, a detection system, and a detection method of substance concentration.
- the detector used to detect the liquid concentration is generally a probe-type liquid concentration detector.
- This type of detector has a large volume and cannot be integrated on a chip, which is not convenient enough to use; and the detection efficiency is low, and it cannot achieve simultaneous Detect the concentration of multiple liquids.
- a detector including: a substrate; an active layer provided on the substrate; a first electrical conductor and a second electrical conductor both provided on the substrate; On the first surface of the active layer, the first surface is the surface of the active layer away from the substrate; the insulating layer is disposed on the first surface and covers the first surface. An electrical conductor and the second electrical conductor; wherein a cavity is provided in the insulating layer, and the cavity is located between the first electrical conductor and the second electrical conductor and is used to carry the substance to be detected,
- the substance to be detected is a conductive substance.
- it further includes: a buffer layer disposed between the substrate and the active layer.
- the distance between the surface of the first electrical conductor close to the cavity and the surface of the second electrical conductor close to the cavity is 10 nm-5um.
- the distance between the furthest point of the first electrical conductor from the first surface and the first surface is The distance between the furthest point of the second electrical conductor from the first surface and the first surface is
- a first channel is further provided on the insulating layer for measuring the current between the first electrical conductor and the second electrical conductor.
- the semiconductor includes at least one of the following: amorphous silicon, oxide semiconductor, and low-temperature polysilicon.
- a detection system including: a processor and the detector according to any one of the embodiments of the present disclosure; the processor is configured to The predetermined parameters of the substance to be detected, the current in the substance to be detected, and the potential of the predetermined detection point determine the concentration of the substance to be detected.
- the detection system further includes: a power generator and a power detector; wherein the power generator is configured to apply a voltage to the substance to be detected in the detector; the power detector , Configured to detect the current in the substance to be detected and the potential of the predetermined detection point.
- a method for detecting the concentration of a substance using the detector described in any one of the embodiments of the present disclosure or the detection system described in any one of the embodiments of the present disclosure, and
- the detection method includes: acquiring a first potential of a first predetermined detection point of the substance to be detected in the cavity, wherein the first predetermined detection point is a first surface far from the active layer, and Detection point; obtain the first current at the second predetermined detection point of the substance to be detected; determine the second potential of the third predetermined detection point of the substance to be detected, wherein the third predetermined detection point is close to the The first surface of the active layer and the detection point in the substance to be detected; wherein the second predetermined detection point is between the plane where the first predetermined detection point is located and the plane where the third predetermined detection point is located The detection point in the substance to be detected; the concentration of the substance to be detected is determined according to predetermined parameters of the substance to be detected, the first potential, the second potential, and the
- the third predetermined detection point is located between the first electrical conductor and the second electrical conductor.
- determining the second potential of the third predetermined detection point on the first surface includes: obtaining a second current between the first electrical conductor and the second electrical conductor; The corresponding relationship and the second current determine the second potential of the third predetermined detection point, wherein the predetermined current-voltage corresponding relationship is determined according to the material of the detector.
- the predetermined parameters include at least: the distance between the first predetermined detection point and the third predetermined detection point, and the cross-section of the substance to be detected where the second predetermined detection point is located. area.
- Figure 1 is a cross-sectional view of a detector according to an embodiment of the present disclosure
- Figure 2 is a cross-sectional view of a specific embodiment of a detector according to an embodiment of the present disclosure
- Fig. 5 is a schematic diagram of a predetermined current-voltage relationship of a detector according to an embodiment of the present disclosure
- Fig. 6 is a top view of the detector shown in Fig. 2.
- FIG. 2 is a cross-sectional view of a specific embodiment of a detector according to an embodiment of the present disclosure.
- the detector 100 further includes: a buffer layer 107 disposed between the substrate 101 and the active layer 102, In order to make the growth environment of the active layer 102 better.
- the buffer layer 107 uses an insulating oxide material.
- the insulating oxide material may be carbon oxide, titanium oxide, etc., which is not specifically limited here.
- the distance between the surface of the first electrical conductor 103 close to the cavity 106 and the surface of the second electrical conductor 104 close to the cavity 106 is 10 nm ⁇ 5 um. Specifically, the distance of this size makes the size of the cavity 106 located between the first electrical conductor 103 and the second electrical conductor 104 smaller, which in turn makes the volume of the structured detector 100 smaller, which makes it easier to use. It is more convenient, so that it can be integrated on the chip, and the amount of the substance to be detected carried by the smaller-sized cavity 106 is also less, avoiding waste.
- the insulating layer 105 is further provided with a first channel 108 for measuring the current between the first electrical conductor 103 and the second electrical conductor 104.
- the first channel 108 may communicate with the first conductive body 103, the second conductive body 104 or the active layer 102, which is not specifically limited here.
- the first channel 108 is connected to the source of the thin film transistor (ie, the first conductor 103), and is used to carry a wire for detecting the current between the source and drain of the thin film transistor.
- the detection terminal of the detection device is in contact with the wire, and the current between the source and drain of the thin film transistor can be detected.
- a second channel 109 is further provided on the insulating layer 105, and the second channel 109 communicates with the cavity 106.
- the second channel 109 is used to carry a wire for applying electricity to the substance to be tested.
- the output terminal of the external voltage applying device is in contact with the wire to apply a voltage to the substance to be tested so that the thin film transistor is in position. Conduction state in order to detect the current between the source and drain.
- the second channel 109 and the channel for adding the substance to be detected can be implemented as one channel.
- the cavity 106, the second channel 109 and the insulating layer 105 are formed by one-step deposition by sputtering technology.
- the current between the source and drain determines the potential of a predetermined detection point of the substance to be detected, and the processor 201 is based on the applied voltage, the potential of a predetermined detection point of the substance to be detected, the current in the substance to be detected, and the potential of the substance to be detected.
- the predetermined parameters of the substance determine the concentration of the substance to be detected.
- the design principle of the detection system 200 provided by the embodiments of the present disclosure is based on a thin film transistor array, has a simple structure, can be produced in a small volume, and is convenient to use.
- the detection system 200 further includes: a power generator and a power detector (not shown in the figure); wherein the power generator is configured to apply a voltage to the substance to be detected in the detector 100, so that The thin film transistor of the detector 100 is turned on; the power detector is configured to detect the current in the substance to be detected and the potential of the predetermined detection point.
- the power generator and the power detector can be directly connected to the processor 201, and the acquired information can also be sent to the processor 201 through a communication module (not shown in the figure) for processing to determine the concentration of the substance to be detected.
- the detection system 200 further includes: a display (not shown in the figure) configured to display the concentration of the substance to be detected, so as to facilitate the user to read.
- detectors 100 there are several detectors 100, and several detectors 100 are integrated on a chip. Due to the small volume of the detector 100, it can be integrated on a chip. The integration of several detectors 100 on the chip can simultaneously detect the concentration of multiple substances to be detected, thereby improving the detection efficiency.
- the embodiment of the present disclosure also provides a method for detecting a substance concentration, which applies any of the embodiments of the present disclosure.
- the detection method includes the following steps:
- S101 Acquire a first potential of a first predetermined detection point of a substance to be detected in a cavity, where the first predetermined detection point is a first surface away from the active layer and a detection point in the substance to be detected.
- the concentration of the substance to be detected and the resistivity of the substance to be detected.
- the resistivity of the substance to be detected can be obtained according to the potential difference, current and predetermined parameters between the predetermined detection points of the substance to be detected.
- the method for detecting the concentration of a substance determines the concentration of the substance to be detected according to the potential of the predetermined detection point of the substance to be detected, the current in the substance to be detected, and predetermined parameters, which is convenient and has high detection efficiency.
- the third predetermined detection point is located between the first electrical conductor 103 and the second electrical conductor 104.
- the second potential is the potential at the third predetermined detection point between the source and drain of the thin film transistor of the detector 100 when the thin film transistor is in the on state.
- FIG. 5 is a schematic diagram of a predetermined current-voltage relationship of a detector according to an embodiment of the present disclosure.
- the current (Isd) and voltage (Vg) between the source and drain of the thin film transistor of the detector 100 Both the on state and the off state have a predetermined current-voltage relationship.
- the second current is the current (Isd) between the source and drain of the thin film transistor in the on state, according to The second potential (Vg) can be determined by the predetermined current-voltage correspondence and the second current (Isd) of the thin film transistor in the on state.
- the material of the thin film transistor of the detector 100 has a correlation with the predetermined current-voltage correspondence.
- the material of the insulating layer 105 and the material of the active layer 102 Determine the corresponding relationship between the predetermined current and voltage.
- determining the concentration of the substance to be detected according to the predetermined parameters, the first potential, the second potential, and the first current of the substance to be detected includes: according to the predetermined parameters of the substance to be detected, the first potential, the second potential, and the The first current determines the resistivity of the substance to be detected; the concentration of the substance to be detected is determined according to the resistivity and a predetermined constant.
- the substance to be detected is a liquid
- U is the potential difference between the first potential and the second potential
- I is the first current, that is, the detection When the thin film transistor of the device 100 is turned on, the current flowing in the substance to be detected.
- the predetermined parameters include the cross-sectional area of the liquid and the distance between the first predetermined detection point and the second predetermined detection point of the liquid or other cross-sectional area that can be obtained.
- the related parameters of the cross-sectional area and the distance between the first predetermined detection point and the second predetermined detection point of the liquid are not specifically limited herein.
- the predetermined parameters include at least: the distance between the first predetermined detection point and the third predetermined detection point, and the cross-sectional area of the substance to be detected where the second predetermined detection point is located.
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Abstract
Description
Claims (16)
- 一种检测器,包括:衬底;有源层,设置在所述衬底上;第一导电体和第二导电体,均设置在所述有源层的第一表面上,所述第一表面为所述有源层远离所述衬底一侧的表面;绝缘层,设置在所述第一表面上,并包覆所述第一导电体和所述第二导电体;其中,所述绝缘层内设置有空腔,所述空腔位于所述第一导电体和所述第二导电体之间,用于承载待检测物质,所述待检测物质为导电物质。
- 根据权利要求1所述的检测器,其中,所述第一导电体靠近所述空腔的表面和所述第二导电体靠近所述空腔的表面之间的距离为10nm~5um。
- 根据权利要求1所述的检测器,其中,所述绝缘层上还设有第一通道,用于测量所述第一导电体与所述第二导电体之间的电流。
- 根据权利要求1或4所述的检测器,其中,所述绝缘层上还设有第二通道,所述第二通道与所述空腔连通。
- 根据权利要求1所述的检测器,还包括:缓冲层,设置在所述衬底与所述有源层之间。
- 根据权利要求6所述的检测器,其中,所述缓冲层采用绝缘氧化材料。
- 一种检测系统,包括:处理器和权利要求1-7中任一项所述的检测器;所述处理器,被配置为根据所述检测器中的待检测物质的预定参数、所述待检测物质中的电流以及预定检测点的电位确定所述待检测物质的浓度。
- 根据权利要求8所述的检测系统,还包括:电力发生器和电力检测器;其中,所述电力发生器,被配置为向所述检测器中的待检测物质施加电压;所述电力检测器,被配置为检测所述待检测物质中的电流以及所述预定检测点的电位。
- 根据权利要求8所述的检测系统,还包括:显示器,被配置为显示所述待检测物质的浓度。
- 根据权利要求8至10中任一项所述的检测系统,其中,所述检测器为数个,数个所述检测器集成于芯片上。
- 一种物质浓度的检测方法,应用权利要求1-7中任一项所述的检测器或权利要求8-11中任一项所述的检测系统,所述检测方法包括:获取空腔内的待检测物质的第一预定检测点的第一电位,其中,所述第一预定检测点为远离有源层的第一表面、所述待检测物质中的检测点;获取所述待检测物质的第二预定检测点处的第一电流;确定所述待检测物质的第三预定检测点的第二电位,其中,所述第三预定检测点为靠近所述有源层的第一表面、所述待检测物质中的检测点;其中,所述第二预定检测点为所述第一预定检测点所在平面与所述第三预定检测点所在平面之间的所述待检测物质中的检测点;根据所述待检测物质的预定参数、所述第一电位、所述第二电位及所述第一电流确定所述待检测物质的浓度。
- 根据权利要求12所述的检测方法,其中,所述第三预定检测点位于第一导电体和第二导电体之间。
- 根据权利要求13所述的检测方法,其中,确定所述第一表面上第三预定检测点的第二电位,包括:获取所述第一导电体和所述第二导电体之间的第二电流;根据预定电流电压对应关系和所述第二电流确定所述第三预定检测点的第二电位,其中,所述预定电流电压对应关系是根据所述检测器的材料确定的。
- 根据权利要求12所述的检测方法,其中,根据所述待检测物质的预 定参数、所述第一电位、所述第二电位及所述第一电流确定所述待检测物质的浓度,包括:根据所述待检测物质的预定参数、所述第一电位、所述第二电位及所述第一电流确定所述待检测物质的电阻率;根据所述电阻率和预定常量确定所述待检测物质的浓度。
- 根据权利要求11至15中任一项所述的检测方法,其中,所述预定参数至少包括:所述第一预定检测点与所述第三预定检测点之间的距离以及所述第二预定检测点所在的所述待检测物质的横截面积。
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CN109060922B (zh) * | 2018-08-03 | 2020-06-05 | 京东方科技集团股份有限公司 | 一种薄膜晶体管及其制备方法、传感器 |
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