WO2020168870A1 - 带混匀功能的化学发光免疫分析仪洗涤系统 - Google Patents

带混匀功能的化学发光免疫分析仪洗涤系统 Download PDF

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Publication number
WO2020168870A1
WO2020168870A1 PCT/CN2020/072271 CN2020072271W WO2020168870A1 WO 2020168870 A1 WO2020168870 A1 WO 2020168870A1 CN 2020072271 W CN2020072271 W CN 2020072271W WO 2020168870 A1 WO2020168870 A1 WO 2020168870A1
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WIPO (PCT)
Prior art keywords
washing
mixing
base
substrate
slide rail
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PCT/CN2020/072271
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English (en)
French (fr)
Inventor
胡晓雷
刘远建
Original Assignee
重庆科斯迈生物科技有限公司
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Publication of WO2020168870A1 publication Critical patent/WO2020168870A1/zh

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B9/00—Cleaning hollow articles by methods or apparatus specially adapted thereto 
    • B08B9/08—Cleaning containers, e.g. tanks
    • B08B9/20—Cleaning containers, e.g. tanks by using apparatus into or on to which containers, e.g. bottles, jars, cans are brought
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B13/00—Accessories or details of general applicability for machines or apparatus for cleaning

Definitions

  • the invention relates to the field of medical detection equipment, in particular to a washing system of a chemiluminescence immune analyzer with a mixing function.
  • chemiluminescence immunoassay methods are usually used to detect and analyze body fluids.
  • experimenters need to use special reaction cups to contain the body fluids to be tested, usually through filling, mixing, incubating, and washing
  • the incubation reagent bottle is mainly washed with drugs and filled with substrate.
  • the existing washing system occupies a large space and has a single function. During the detection process, the washing is completed After that, it is necessary to continue to put the reaction cup into another mixing mechanism by the gripper for mixing, which has low detection efficiency.
  • the present invention provides a chemiluminescence immunoassay analyzer washing system with mixing function, which can complete washing and mixing operations at the same time, reducing the system occupation space and the number of grabbing times, improving detection efficiency, and greatly shortening access
  • the washing time is extremely flexible.
  • a washing system for a chemiluminescence immunoassay analyzer with mixing function is to include:
  • the mixing base is movably set on the base plate and can slide relative to the base plate, and has three positions on its sliding stroke: loading and unloading, substrate filling and washing;
  • Washing cup holder which is arranged on the mixing base and has washing holes distributed along the length direction;
  • the mixing component fixed on the mixing base, is used to make the washing cup holder reciprocate in a horizontal plane to mix the liquid in the reaction cup in the washing hole;
  • the washing head is movably arranged on the substrate and can move up and down relative to the substrate. It has a washing needle group corresponding to the washing holes and at least one substrate filling needle. When the mixing base is in the washing position, the washing The needle set is located directly above the washing hole. When in the substrate filling position, the substrate filling needle is located directly above the washing hole.
  • the sliding cup holder is used to meet the basic functional requirements for loading, washing, and substrate filling of the reaction cup.
  • the mixing function is directly combined with the washing-related components, without the need for another mixing Uniform workstations help reduce space occupation and the number of gripper operations, improve detection efficiency, and at the same time help realize the miniaturization of the instrument.
  • the mixing assembly includes an eccentric shaft, a second mixing motor, and a guide mechanism, wherein the guide mechanism has a closed guide track, and the second mixing motor is used to drive the eccentric shaft to rotate, and the eccentric shaft rotates to drive the washing cup
  • the seat moves along the established trajectory of the guiding mechanism.
  • the eccentric shaft drives the washing cup holder to rotate with the guide mechanism, so as to ensure that the washing cup holder can return to the initial position after mixing is completed, which is convenient to improve the automation degree of the liquid container putting in and taking out operation.
  • the guide mechanism includes X-direction mixing slide rails and Y-direction mixing slide rails respectively arranged along the width and length directions of the mixing base, wherein the X-direction mixing slide rail has an X-direction mixing slide that is slidably matched with it.
  • the X-direction mixing slide block is fixed on the mixing base
  • the Y-direction mixing slide rail is fixedly connected with the X-direction mixing slide rail
  • the Y-direction mixing slide rail has a sliding fit with it Y-direction mixing slider, the washing cup holder and Y-direction mixing slider are fixedly connected;
  • the eccentric shaft is rotatably arranged at one end of the mixing base and fixedly connected with the washing cup holder.
  • the second mixing motor drives the eccentric shaft to rotate through a transmission belt.
  • the simple linear slide rail is driven by the eccentric shaft to form a closed guiding track, so that the washing cup holder is closed and reciprocated in the horizontal direction, and the structure is simple, easy to realize, good stability, and low economic cost.
  • the mixing base is located below the substrate, and the bottom of the substrate is provided with mixing base slide rails at positions corresponding to the two ends of the mixing base, and the mixing base slide rail is provided with a mixing base matched with the slide rails.
  • Base slider, the two ends of the mixing base are respectively fixedly connected with the corresponding mixing base slider;
  • the base plate is provided with a drive motor A for driving the mixing base to slide along the sliding rail of the mixing base, and a mounting opening is provided on the base plate corresponding to the sliding stroke of the mixing base.
  • the installation port is convenient to improve the assemblability of the system and prevents interference during the sliding of the washing cup holder.
  • the sliding stability of the washing cup holder can be better by mixing the base slide rail to prevent the solution from splashing.
  • the washing head includes a washing head mounting plate arranged in parallel with the washing cup holder, and one end of the base plate corresponding to the washing head mounting plate is provided with a Z-direction washing slide rail, and the Z-direction washing slide rail is vertically fixed on the base plate, so
  • the washing head mounting plate is provided with a Z-direction washing slider slidingly matched with the Z-direction washing slide rail, and a driving motor B for driving the washing head mounting plate to move up and down along the Z-direction washing slide rail is provided on the base plate.
  • the washing head mounting plate is provided with a Y-direction filling slide rail arranged along its length, and the Y-direction filling slide rail is provided with a Y-direction filling slider slidingly matched with the Y-direction filling slide rail.
  • a substrate needle seat fixedly connected to the slider, the substrate injection needle is fixed on the substrate needle seat, and one end of the washing head mounting plate close to the Z-direction washing slide rail is provided with a driving motor C,
  • the driving motor C is used to drive the substrate needle holder to slide horizontally along the Y-direction filling slide rail.
  • the substrate needle holder is slidingly arranged, so that the substrate filling of multiple reaction cups can be realized during the sliding process along the Y-direction filling slide rail, without the need to set a substrate for a single sink
  • the injection needle is helpful to improve its utilization rate and reduce production cost.
  • the washing position on the substrate corresponding to the mixing base is provided with an adsorption plate, and the adsorption plate is provided with magnets corresponding to the washing holes one-to-one, and the lower part of the washing hole is open to the side of the magnet.
  • the magnetic beads in the solution in the reaction cup are adsorbed to one side wall by a magnet, which can effectively prevent the magnetic particles from being deposited on the bottom wall of the reaction cup, causing the solution in the reaction cup to be washed and sucked If the magnetic particles are not clean, or the magnetic particles are in a freely moving state, the solution is sucked away along with the solution, which increases the loss rate of magnetic particles and reduces the accuracy of the detection results, which is beneficial to improve the washing effect and detection accuracy.
  • a pre-suction seat is provided on the substrate corresponding to the loading and unloading position of the mixing base, and the pre-suction seat has pre-suction holes distributed along the length direction, and each pre-suction hole is provided on the pre-suction seat.
  • Pre-attract magnet Pre-attract magnet.
  • it also includes a heating device for heating the washing liquid and the substrate.
  • a heating device for heating the washing liquid and the substrate.
  • the washing head is provided with an anti-puncture cup mechanism, and the anti-puncture cup mechanism is used to monitor whether the washing needle group and the substrate filling needle touch the reaction cup during the descending process of the washing head.
  • the anti-sticking cup mechanism is used to quickly monitor whether the washing needle set and the substrate filling needle are in contact with the reaction cup, and then feedback information to the background to take corresponding measures to avoid repeated mechanical actions of the action mechanism, that is, the washing head keeps facing Move down, causing damage to the washing needle set or the substrate filling needle, causing other failures or reducing detection efficiency.
  • the washing system of the chemiluminescence immunoassay analyzer with mixing function adopts the above technical scheme, through the sliding-type washing cup holder, it can meet the needs of washing related procedures, rationally simplify the structure, shorten the washing in and out time, and has high flexibility. At the same time, it cooperates with the mixing mechanism to improve the washing effect and the substrate mixing effect, which is beneficial to reduce the space occupation and the number of gripper operations, improve the detection efficiency and at the same time help realize the miniaturization of the instrument, and increase the anti-sticking cup function to make
  • the washing and substrate filling process is safer and more reliable, which helps reduce failures and improve detection efficiency.
  • Figure 1 is a schematic diagram of the structure of the present invention
  • Figure 2 is a schematic diagram of the rear structure of Figure 1;
  • Figure 3 is a schematic diagram of the bottom structure of Figure 1;
  • Figure 4 is a schematic diagram of the structure of the washing head
  • Figure 5 is an axonometric view of Figure 4.
  • Figure 6 is a schematic diagram of the installation structure of the mixing component
  • Figure 7 is a cross-sectional view of Figure 6;
  • Figure 8 is a schematic diagram of the structure of the heating device
  • Figure 9 is a schematic diagram of the substrate liquid heating structure
  • Figure 10 is a schematic diagram of the heating structure of the washing liquid
  • Figure 11 is a structural schematic diagram of the mixing base in the loading and unloading position
  • Figure 12 is a schematic structural view of the mixing base at the substrate liquid filling position
  • Figure 13 is a schematic diagram of the installation of the anti-pinch cup mechanism
  • Figure 14 is a schematic diagram of the internal structure of the connector
  • Figure 15 is a schematic diagram of the connector structure
  • Figure 16 is a schematic diagram of the structure of the anti-puncture trigger sheet.
  • the cleaning system of the chemiluminescence immunoassay analyzer with mixing function of the present invention mainly includes a substrate 1 having a rectangular plate structure, and a mixing base 2 movably arranged on the substrate 1.
  • the mixing base 2 can slide linearly relative to the substrate 1, and has a loading position, a substrate filling position, and a washing position on its sliding stroke, and the mixing base 2 can stay in the sliding process. Corresponding location, waiting or completing the process at the corresponding location.
  • the mixing base 2 is fixedly provided with a washing cup holder 3, and washing holes 30 are distributed on the washing cup holder 3.
  • the washing holes 30 are mainly used for placing the reaction cup and ensuring the stability of the reaction cup in the washing hole 30. Relative shaking occurs.
  • the washing holes 30 are distributed along the length of the washing cup holder 3. In the actual production process, it is not limited to linear distribution. It can be square or curved according to the size and requirements of the equipment.
  • a washing head 5 is provided above the substrate 1, and the washing head 5 can move up and down relative to the substrate 1, and has a washing needle group 50 corresponding to the washing holes and at least one substrate filling needle 51.
  • Each of the The washing needle set 50 includes a suction needle 500 and a filling needle 501.
  • the suction needle 500 is mainly used to suck up the liquid in the reaction cup, and the filling needle 501 is used to react Washing liquid is added to the cup for washing.
  • the lower end of the suction needle 500 is lower than the lower end of the filling needle 501 to ensure that the filling needle 501 is close to the bottom of the cuvette during the washing process. There is a sufficient gap between them, so that the suction needle 500 can suck the solution in the reaction cup cleanly, and the contamination of the filling needle 501 can be reduced or avoided.
  • the washing needle set 50 is just facing the washing hole 30 below.
  • the substrate filling needle 51 is in the washing hole 30 Directly above.
  • a mixing assembly 4 is arranged between the mixing base 2 and the washing cup holder 3, and the mixing assembly 4 can drive the washing cup holder 3 to reciprocate horizontally, so as to achieve the mixing of the solution in the reaction cup in the washing hole 30.
  • the mixing component 4 of the present application can realize two-step mixing. Firstly, after adding the washing liquid during the washing process, it is mixed to improve the washing effect; secondly, after washing is finished and the substrate filling is completed, The mixing is carried out to improve the mixing effect of the substrate and the magnetic particles, and avoid the aggregation of the magnetic particles in the substrate, thereby improving the accuracy of the detection result.
  • the mixing base 2 is located below the substrate 1 and arranged along the length direction of the substrate 1 (hereinafter referred to as the length direction of the substrate 1 is the Y direction, the width direction is the X direction, The thickness direction is the Z direction, as shown in Fig. 1 for the coordinate indication reference), the bottom of the substrate 1 is provided with mixing base slide rails 10 at the positions corresponding to the two ends of the mixing base 2, and the mixing base slide rails 10 are arranged along the X direction.
  • the mixing base slide rail 10 has a mixing base slider 11 slidingly matched with it, and both ends of the mixing base 2 are fixedly connected with the corresponding mixing base slider 11, so that the mixing base 2 is sufficient. Slide along the slide rail 10 of the mixing base.
  • the loading and unloading position, the substrate filling position and the washing position mentioned above are in the X upward direction.
  • a driving motor A 1a is provided under the substrate 1.
  • the mixing can be realized by the driving motor A 1a. Even the automatic sliding of the base 2.
  • a mounting opening 12 is provided on the corresponding base plate 1.
  • the size of the mounting opening 12 is adapted to the size of the bottom of the washing cup holder 3.
  • the washing cup holder 3 is fixed on the supporting and lower mixing base 2 through the mounting opening 12, and the washing cup holder One end of 3 has a trigger piece A31 extending outwards.
  • the substrate 1 is provided with an in-position sensor A13 and a reset sensor B14 at the corresponding washing position and the loading and unloading position respectively.
  • the trigger piece A31 slides with the washing cup holder 3, and when the in-position sensor A13 is triggered , Through the in-position sensor A13, you can feedback to the background that the mixing base 2 is in the washing position at this time, indicating that the washing operation can be performed.
  • the trigger piece A31 triggers the reset sensor B14, it will feedback to the background that the mixing base 2 is in loading and unloading.
  • the position indicates that the mixing operation can be performed, or the operation of loading or removing the reaction cup can be performed.
  • the mixing assembly 4 in this embodiment mainly includes an eccentric shaft 40 fixed on the mixing base 2, a second mixing motor 41, and a guide mechanism.
  • the mixing assembly 4 can slide together with the mixing base 2, thereby To achieve mixing for different working conditions.
  • the eccentric shaft 40 is vertically supported on the mixing base 2 in a rotatable manner through a bearing, and is close to one end of the mixing base 2.
  • the eccentric shaft 40 has two upper and lower eccentrics.
  • the second mixing motor 41 is located at the other end of the mixing base 2, and is also vertically arranged and located below the mixing base 2.
  • the second mixing motor 41 is connected to the lower end of the eccentric shaft 40 through a belt transmission mechanism.
  • the eccentric shaft 40 can be driven to rotate, and the upper end of the eccentric shaft 40 is fixedly connected with one end of the washing cup holder 3.
  • the guiding mechanism in this embodiment mainly includes the X-direction mixing slide rail 42 and the Y-direction mixing slide rail 43 respectively arranged along the X direction and the Y direction.
  • the mixing base 2 is embedded with grooves.
  • There is an X-direction slider 44 the X-direction slider 44 is fixedly connected with the mixing base 2, and the X-direction mixing slide rail 42 is slidingly matched with the X-direction mixing slide rail 42, and the X-direction mixing slide rail 42 is in an active state
  • the Y-direction mixing slide rail 43 is located above the X-direction mixing slide rail 42, and the two are fixedly connected by screws.
  • the Y-direction mixing slide rail 43 has a Y-direction mixing slider 45 slidingly matched with it, and the Y-direction mixing slide
  • the upper part of the smoothing slider 45 is fixedly connected to the washing cup holder 3, so that when the second mixing motor 41 drives the eccentric shaft 40 to rotate, the washing cup holder 3 can be mixed and smoothed along the X-direction mixing slide 42 and the Y-direction.
  • the track formed by the rail 43 slides, because the eccentric shaft 40 makes a rotary motion, which is fixed in the mixing process, and the washing cup holder 3 makes a horizontal circular closing motion correspondingly, which is beneficial to improve the mixing effect and prevent the reaction cup The solution sputtered out.
  • the washing head 5 in this application mainly includes a washing head mounting plate 52 arranged in parallel with the washing cup holder 3.
  • the washing head mounting plate 52 is a strip-shaped plate structure. One end is detachably connected with a connector 58.
  • the connector 58 and the washing head mounting plate 52 form an L-shaped structure.
  • the base plate 1 is provided with a Z-direction washing slide 15 and a Z-direction washing slide 15 at the corresponding end of the connector 58.
  • the connecting head 58 is provided with a Z-direction washing slider 53 slidingly fitted with the Z-direction washing slide rail 15.
  • the base plate 1 is provided with a washing slide rail 15 for driving the washing head mounting plate 52 along the Z direction.
  • the washing head mounting plate 52 and the Z-direction washing sliding rail 15 are also provided with matching trigger sheets and position sensors.
  • the washing head 5 is also provided with an anti-pinning cup mechanism for washing During the descending process of the head 5, it is monitored whether the washing needle group 50 or the substrate injection needle 51 collides with the reaction cup.
  • the anti-pinch cup mechanism in this embodiment is arranged on the connecting head 58, which mainly includes a nut seat 580, an anti-pinch trigger piece 581, and an anti-pinch sensor 582.
  • the nut seat 580 is a vertical cross section.
  • T" shaped stepped columnar structure, as shown in the figure, the connector 58 is a hollow structure with a mounting cavity 583 similar to the nut base 580.
  • the upper and lower ends of the mounting cavity 583 are open, and the nut base 580 is embedded In the installation cavity 583, and has a movable space in the height direction, the drive motor B 1b is a screw motor, and the Z-direction screw 1b0 is arranged vertically downward, and extends into the installation cavity 583 to be threaded with the nut seat 580 to connect
  • a pressing plate 584 is provided at the upper end of the head 58. The pressing plate 584 seals the nut seat 580 in the mounting cavity 583 to prevent it from falling out of the mounting cavity 583.
  • the connector 58 is elastically hung on the nut seat 580 under the dual action of gravity and the spring 585.
  • One side of the connector 58 is provided with a window 586 communicating with the mounting cavity 583.
  • the window 586 has a certain height.
  • the seat 580 is fixedly connected and protrudes from the window 586.
  • the anti-puncture sensor 582 is located on the connector 58 and is directly below the anti-puncture trigger sheet 581.
  • the nut base 580 is in a high position under the support of the spring 585, and the anti-pinch trigger piece 581 is also in the high position.
  • the nut base 580 is in contact with the pressure plate 584, and the whole can be moved up and down normally under the drive of the drive motor B 1b.
  • the relative position of the nut seat 580 and the mounting cavity 583 remains unchanged, and when the washing needle set 50 or the substrate filling needle 51 touches, the Z-direction washing slider 53 is blocked and cannot continue to slide down, and at the same time, the position of the connecting head 58 Do not move, but the drive motor B 1b is still working, the Z-direction screw 1b0 drives the nut holder 580 to slide down in the mounting cavity 583, the spring 585 is in a compressed state, and the nut holder 580 drives the anti-pinch trigger piece 581 downward.
  • the washing needle groups 50 on the washing head 5 are distributed along the length of the washing head mounting plate 52, and their distribution intervals are adapted to the washing holes 30.
  • the washing head mounting plate 52 also has a Y-direction filling slide rail arranged along the Y direction. 54.
  • the Y-direction filling slide rail 54 is provided with a Y-direction filling slider 55 slidably engaged with it.
  • the Y-direction filling slider 55 is fixedly provided with a substrate needle seat 56 and the substrate filling needle 51 is fixed on On the substrate needle holder 56, there are two substrate injection needles 51 in this embodiment, so as to prepare for the injection of two different substrates.
  • a drive motor C 57 is fixed to the end of the washing head mounting plate 52 close to the Z-direction washing slide rail 15. This arrangement is to keep the overall center of gravity of the washing head 5 stable, because the washing head mounting plate 52 is basically supported by the Z-direction washing slider 53 On the Z-direction washing slide rail 15, if the drive motor C 57 is installed at the other end, the weight of the other end will increase, and the washing head mounting plate 52 is prone to skew.
  • the drive motor C 57 is mainly used to drive the substrate needle seat 56 slides along the Y-direction filling slide 54 to add substrates to different reaction cups.
  • the vertical section of the washing cup holder 3 is similar to a "7" shape, and the washing hole 30 The lower end is open on both sides along the X direction.
  • the substrate 1 is provided with an adsorption plate 6 corresponding to the washing position of the mixing base 2, and the shape of the adsorption plate 6 and the shape of the back of the washing cup holder 3 form a complementary structure.
  • the adsorption plate 6 When the mixing base 2 is in the washing position, the adsorption plate 6 is located just behind the washing cup holder 3, and the adsorption plate 6 is connected to the washing position.
  • the bottom of the cup holder 3 is tightly attached, so that the magnetic beads in the reaction cup are adsorbed to the back side by the magnet 60, which improves the washing effect and can effectively prevent the magnetic beads from being lost.
  • a pre-adsorption seat 7 is also provided on the substrate 1.
  • the pre-adsorption seat 7 corresponds to the loading and unloading position of the mixing base 2, that is, when the mixing base 2 is in In the loading and unloading position, the pre-suction seat 7 is just flush with the washing cup seat 3.
  • the pre-suction seat 7 is provided with a pre-suction hole 70, and the lower end of the pre-suction hole 70 is open.
  • the open position of the suction hole 70 is fixedly provided with a pre-suction magnet 71.
  • the pre-suction magnet 71 can be used to adsorb the reaction cup placed in the pre-suction hole 70, so that the magnetic beads in the reaction cup are gathered to one side.
  • the pre-suction time is relatively long, and it can even achieve the purpose of further magnetization of the magnetic beads.
  • the reaction cup enters the washing hole 30 from the pre-suction hole 70, when the mixing base 2 reaches the washing position, it will adsorb to the magnet 60. It has stronger ability and can be quickly adsorbed to the side wall of the reaction cup, and its magnetic force is stronger, relatively speaking, it is less likely to be lost, thereby further reducing the loss rate of magnetic beads and improving the accuracy of detection results.
  • a heating device 8 is provided on the substrate 1 in this embodiment, and the heating device 8 is mainly used to treat the washing liquid and the washing liquid added to the reaction cup.
  • the substrate is heated.
  • the heating device 8 is located at the rear end of the substrate 1, which mainly includes a washing liquid heating chamber 80 and a substrate heating chamber 81.
  • the upper and lower ends of the washing liquid heating chamber 80 are respectively provided with washing pipeline inlets.
  • the washing liquid heating chamber 80 has a rounded distribution of rigid heating pipe groups 86, the washing liquid heating chamber 80 is provided with a connector 83 corresponding to the washing pipeline inlet 84, and a connector on the connector 83 The number and the number of rigid heating tube groups 86 are matched with the number of filling needles 501 on the washing head 5.
  • An electric heating belt 87 is fixed on the back side of the washing liquid heating chamber 80, and the substrate heating chamber 81 is fixed on the upper end of the back side of the washing liquid heating chamber 80, so that when the electric heating belt 87 is working, the substrate heating chamber 81 can be heated at the same time.
  • a temperature sensor 88 is provided on the washing liquid heating chamber 80 to monitor the heating temperature in real time.
  • the substrate heating chamber 81 has a hollow structure, and at least two reels 82 are vertically arranged inside.
  • the substrate pipeline extends from the lower end into the substrate heating chamber 81, and is wound around the reel 82 before passing through the upper end. To achieve heating of the substrate.
  • washing liquid filling line After one end of the washing liquid filling line is connected to the washing liquid bottle, it is connected to the washing liquid heating chamber 80, and after it comes out of the washing line outlet 85, it is connected to the filling needle 501 on the washing head 5, so that the reaction is injected
  • the washing liquid in the cup is heated by the washing liquid heating chamber 80.
  • one end of the substrate filling pipeline is connected to the substrate bottle, and the other end extends into the substrate heating chamber 81 and is wound on the reel 82 It is connected with the substrate injection needle 51 on the washing head 5 to realize the heating of the substrate, ensuring that both washing and substrate injection are performed at a constant temperature, which weakens the influence of temperature and is beneficial to improve the accuracy of the detection result.
  • the driving motor A1a, the driving motor B1b and the driving motor C57 in this application are all screw motors.
  • the screw of the driving motor A1a is arranged in parallel along the slide rail 10 of the mixing base , And threadedly connected with one end of the mixing base 2, the drive motor B1b is located above the Z-direction washing slide rail 15, and its screw rod is vertically downward and is threadedly connected with the washing head mounting plate.
  • the screw rod of the driving motor C57 is connected to Y
  • the filling slide rail 54 is arranged in parallel, and its screw rod is threadedly connected with the substrate needle seat 56 so that when the screw rod of the respective motor rotates, the corresponding connected component can be driven by the screw rod to slide along the corresponding slide rail.
  • the working process of the present invention is as follows. First, put the reaction cup into the pre-suction hole 70 by the gripper and mix well. The base 2 is in the loading and unloading position shown in Fig. 11. After a relatively long time of pre-adsorption, the pre-suction cups are successively grabbed into the washing hole 30, that is, when placed on the washing cup holder 3. After entering a reaction cup, the mixing base 2 is the washing position of the rear slide, and the washing head 5 is lifted to perform a washing of the reaction cup. At the same time, the gripper adds the reaction cup to the pre-suction hole 70.
  • the mixing base 2 slides to the loading position at the front end. At this time, the second reaction cup on the pre-adsorption seat 7 is grabbed and put into the washing hole 30, and mixed. The base 2 returns to the washing position. At this time, the first reaction cup on the washing cup holder 3 is washed for the second time, and the first cup is washed for the first time.
  • the washing cup holder 3 when the washing cup holder 3 is far away from the adsorption plate 6, it can be mixed by the mixing assembly 4, thereby improving the mixing effect, and after the first reaction cup completes the prescribed washing, the mixing base 2 Slide to the substrate filling position, and at the same time drive the substrate needle holder 56 to slide by the drive motor C57, so that the substrate needle 51 is located directly above the first reaction cup or extends into it, and the substrate is added to the reaction cup. And here it is mixed by the mixing assembly 4, and finally the mixing base 2 slides to the loading and unloading position, the first reaction cup is grabbed by the gripper, and the detection program is entered, and the mixing base 2 continues to slide Complete the washing of the next reaction cup.
  • the washing effect is greatly improved through multiple washings, combined with pre-adsorption and adsorption, and the loss rate of magnetic beads is reduced, so that the accuracy of the detection results is significantly improved.
  • the mixing and washing are combined to reduce the occupied space and further improve the washing
  • the quality ensures that the substrate and the magnetic beads are evenly mixed, which helps to improve the reliability of the detection results.

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Abstract

一种带混匀功能的化学发光免疫分析仪洗涤系统，包括基板（1）和滑动设置于基板（1）上的混匀基座（2），混匀基座（2）在其滑动行程上具有装取、底物加注和洗涤三个位置；洗涤杯座（3），固设于混匀基座（2）上，且具有沿长度方向分布的洗涤孔（30）；混匀组件（4），固设于混匀基座（2）上，用于使洗涤杯座（3）水平往复摆动，对处于洗涤孔（30）中反应杯内的溶液混匀；洗涤头（5），活动设置于基板（1）上，并可相对基板（1）做升降运动，其上具有与洗涤孔（30）一一对应的洗涤针组（50）以及至少一个底物加注针（51）。将洗涤与混匀机构配合，并增加预吸附和防扎杯功能，大大提高洗涤和底物混匀效果，有利于减少空间占用及抓手运转次数，提高检测效率和运转安全可靠性，同时有利于实现仪器的微型化发展。

Description

带混匀功能的化学发光免疫分析仪洗涤系统 技术领域
本发明涉及医学检测设备领域，具体涉及一种带混匀功能的化学发光免疫分析仪洗涤系统。
背景技术
免疫分析实验中，通常采用化学发光免疫分析方法对体液进行检测分析，在检测过程中，实验人员需要采用专用的反应杯来盛装待检测的体液，通常会经过加注、混匀、孵育、洗涤和检测等步骤，其中在洗涤阶段主要是对完成孵育的试剂瓶的进行药物冲洗，并加注底物，而现有的洗涤系统占用空间较大，且功能单一，在检测过程中，洗涤完成之后，需继续由抓手将反应杯放入另外的混匀机构中进行混匀，其检测效率较低。
发明内容
有鉴于此，本发明提供了一种带混匀功能的化学发光免疫分析仪洗涤系统，可同时完成洗涤混匀操作，减少系统占用空间及抓手抓取次数，提高检测效率，可以大大缩短进出洗涤时间，其灵活度极高。
其技术方案如下：
一种带混匀功能的化学发光免疫分析仪洗涤系统，其关键在于，包括：
基板；
混匀基座，活动设置于基板上，并可相对基板滑动，在其滑动行程上具有装取、底物加注和洗涤三个位置；
洗涤杯座，其设置于混匀基座上，且具有沿长度方向分布的洗涤孔；
混匀组件，固设于混匀基座上，用于使洗涤杯座在水平平面内往复摆动，将处于洗涤孔中反应杯内的液体混匀；
洗涤头，活动设置于基板上，并可相对基板做升降运动，其上具有与洗涤孔一一对应的洗涤针组以及至少一个底物加注针，当混匀基座处于洗涤位置时，洗涤针组位于洗涤孔正上方，当处于底物加注位置时，底物加注针位于洗涤孔正上方。
采用以上方案，通过滑动设置的洗涤杯座，满足对反应杯的装取、洗涤、底物加注基本功能需求，同时直接将混匀功能于洗涤相关部件结合，而不需再另外设置一个混匀工位，有利于减少空间占用及抓手运转次数，提高检测效率同时有利于实现仪器的微型化发展。
作为优选：所述混匀组件包括偏心轴、第二混匀电机和导向机构，其中导向机构具有闭合的导向轨迹，第二混匀电机用于驱动偏心轴转动，所述偏心轴转动带动洗涤杯
座沿导向机构既定轨迹运动。采用以上方案，通过偏心轴带动洗涤杯座随导向机构做回转运动，从而确保洗涤杯座混匀完成之后可回到初始位置，便于提高液体容器的放入取出操作的自动化程度。
作为优选：所述导向机构包括分别沿混匀基座宽度和长度方向设置的X向混匀滑轨和Y向混匀滑轨，其中X向混匀滑轨上具有与其滑动配合的X向混匀滑块，所述X向混匀滑块固设于混匀基座上，所述Y向混匀滑轨与X向混匀滑轨固定连接，Y向混匀滑轨具有与其滑动配合的Y向混匀滑块，所述洗涤杯座与Y向混匀滑块固定连接；
所述偏心轴以可转动方式设置于混匀基座的一端，并与洗涤杯座固定连接，第二混匀电机通过传动皮带带动偏心轴转动。
以简单直线滑轨在偏心轴带动下构成闭合的导向轨迹，使洗涤杯座在水平方向上闭合往复摆动，结构简单，便于实现，其稳定性好，经济成本较低。
作为优选：所述混匀基座位于基板的下方，基板底部对应混匀基座两端 的位置设有混匀基座滑轨，所述混匀基座滑轨上具有与其滑轨配合的混匀基座滑块，所述混匀基座两端分别与对应的混匀基座滑块固定连接；
所述基板上设有用于驱动混匀基座沿混匀基座滑轨滑动的驱动电机A，基板上对应混匀基座的滑动行程设有安装口。
采用以上方案，通过安装口便于提高系统的装配性，防止洗涤杯座滑动过程中产生干涉，同时通过混匀基座滑轨，可使洗涤杯座滑动稳定性更佳，防止溶液溅出。
作为优选：所述洗涤头包括与洗涤杯座平行设置的洗涤头安装板，基板对应洗涤头安装板的一端设有Z向洗涤滑轨，Z向洗涤滑轨竖向固设于基板上，所述洗涤头安装板上具有与Z向洗涤滑轨滑动配合的Z向洗涤滑块，所述基板上设有用于驱动洗涤头安装板沿Z向洗涤滑轨升降滑动的驱动电机B。采用以上方案，通过洗涤头安装板实现洗涤头整体活动安装，即达到升降功能满足冲洗和抽吸需求。
作为优选：所述洗涤头安装板上具有沿其长度方向设置的Y向加注滑轨，该Y向加注滑轨上具有与其滑动配合的Y向加注滑块，所述Y向加注滑块上具有与其固连的底物针座，所述底物加注针固设于该底物针座上，所述洗涤头安装板靠近Z向洗涤滑轨的一端设有驱动电机C，所述驱动电机C用于驱动底物针座沿Y向加注滑轨水平滑动。采用以上方案，通过滑动设置的底物针座，这样在沿Y向加注滑轨滑动过程中，即可实现多个反应杯的底物加注，而不需针对单个洗涤槽设置一个底物加注针，有利于提高其利用率，降低生产成本。
作为优选：所述基板上对应混匀基座的洗涤位置设有吸附板，所述吸附板上具有与洗涤孔一一对应的磁铁，所述洗涤孔下部正对磁铁的一侧敞口。采用以上方案，在洗涤的时候，通过磁铁将反应杯中溶液内的磁珠吸附至一 侧侧壁上，可有效防止磁微粒沉积在反应杯的底壁上，导致反应杯内溶液洗涤抽吸不干净，或磁微粒处于自由移动状态，溶液随溶液一起被抽吸走，导致磁微粒丢失率增加，降低检测结果精度，即有利于提高洗涤效果和检测精度。
作为优选：所述基板上对应混匀基座的装取位置设有预吸附座，该预吸附座，上具有沿长度方向分布的预吸孔，预吸附座上对应每个预吸孔设有预吸磁铁。采用以上方案，通过预吸附操作，可使反应杯内溶液中的磁微粒朝一侧聚集，便于在洗涤过程中在磁铁作用下吸附到一侧侧壁上，保证洗涤效果。
作为优选：还包括加热装置，所述加热装置用于对洗涤液和底物加热。采用以上方案，有利于降低洗涤液和底物温度对反应杯内磁微粒温度造成影响，确保洗涤混匀过程在恒温下进行，提高检测结果可靠性。
作为优选：所述洗涤头上设有防扎杯机构，所述防扎杯机构用于在洗涤头下降过程中监测洗涤针组和底物加注针是否与反应杯发生触碰。采用以上方案，通过防扎杯机构快速监测洗涤针组和底物加注针是否与反应杯发生触碰，然后反馈信息给后台做出相应措施，避免动作机构重复机械动作，即洗涤头一直朝下移动，导致洗涤针组或底物加注针损坏，进而引起其他故障或降低检测效率。
与现有技术相比，本发明的有益效果：
采用以上技术方案的带混匀功能的化学发光免疫分析仪洗涤系统，通过滑移式的洗涤杯座，使其满足洗涤相关工序需求，合理简化结构，缩短洗涤进出时间，具有较高的灵活性，同时与混匀机构配合，提高洗涤效果和底物混匀效果，有利于减少空间占用及抓手运转次数，提高检测效率同时有利于实现仪器的微型化发展，同时增加防扎杯功能，使洗涤和底物加注过程更加 安全可靠，有利于减少故障，提高检测效率。
附图说明
图1为本发明的结构示意图；
图2为图1后侧结构示意图；
图3为图1底部结构示意图；
图4为洗涤头结构示意图；
图5为图4的轴测图；
图6为混匀组件安装结构示意图；
图7为图6的剖视图；
图8为加热装置结构示意图；
图9为底物液加热结构示意图；
图10为洗涤液加热结构示意图；
图11为混匀基座处于装取位置的结构示意图；
图12为混匀基座处于底物液加注位置的结构示意图；
图13为防扎杯机构安装示意图；
图14为连接头内部结构示意图；
图15为连接头结构示意图；
图16为防扎触发片结构示意图。
具体实施方式
以下结合实施例和附图对本发明作进一步说明。
参考图1至图16所示本发明的带混匀功能的化学发光免疫分析仪洗涤系统，其主要包括呈矩形板状结构的基板1，以及活动设置于基板1上的混匀基座2，本申请中，混匀基座2可相对基板1直线滑动，并在其滑动行程上具有装取位置、底物加注位置和洗涤位置，及混匀基座2在滑动过程中，可停留 在相应位置，等候或完成对应位置的工序。
混匀基座2上固设有洗涤杯座3，洗涤杯座3上分布有洗涤孔30，洗涤孔30主要用于放置反应杯，并确保反应杯在洗涤孔30内的稳定性，不会发生相对晃动，本实施例中的洗涤孔30沿洗涤杯座3的长度方向分布，在实际生产过程中，并不局限于直线分布，可根据设备大小及需要进行方阵分布或曲线分布均可，基板1上方设有洗涤头5，洗涤头5可相对基板1做升降运动，并具有与洗涤孔一一对应的洗涤针组50和至少一个底物加注针51，本申请中的每个洗涤针组50包括一根抽吸针500和一根加注针501，洗涤过程中，抽吸针500主要用于将反应杯内的液体抽吸干净，而加注针501则用于向反应杯内加入洗涤液进行洗涤，相对而言，抽吸针500的下端比加注针501的下端低，以确保在洗涤过程中，抽吸针500靠近反应杯底部时，加注针501与底部之间留有充足的间隙，使得抽吸针500能够将反应杯内溶液抽吸干净，且减少或避免对加注针501的污染。
当混匀基座2处于洗涤位置时，洗涤针组50刚好正对下方的洗涤孔30，当混匀基座2处于底物加注位置时，底物加注针51则处于洗涤孔30的正上方。
其次，在混匀基座2与洗涤杯座3之间设置有混匀组件4，混匀组件4可带动洗涤杯座3水平往复摆动，从而达到对处于洗涤孔30内反应杯溶液的混匀，本申请的混匀组件4可实现两步混匀，第一在洗涤过程中加入洗涤液之后，对其混匀，从而提高洗涤效果，第二在洗涤结束，完成底物加注之后，再进行混匀，提高底物与磁微粒的混合效果，避免磁微粒在底物中聚集，从而提高检测结果精度。
参考图1至图12，其具体结构如下，混匀基座2位于基板1的下方，并沿基板1的长度方向设置(后文简称基板1的长度方向为Y向、宽度方向为X 向、厚度方向为Z向，如图1中坐标指示参考)，基板1底部对应混匀基座2两端的位置设有混匀基座滑轨10，混匀基座滑轨10沿X向设置，混匀基座滑轨10上具有与其滑动配合的混匀基座滑块11，混匀基座2的两端则与对应的混匀基座滑块11固定连接，这样混匀基座2即可沿混匀基座滑轨10滑动，前文所说的装取位置、底物加注位置和洗涤位置则处于X向上，基板1下方设有驱动电机A 1a，通过驱动电机A 1a即可实现混匀基座2的自动化滑动。
相应的基板1上设有安装口12，安装口12大小与洗涤杯座3底部大小相适应，洗涤杯座3通过安装口12固定于支撑与下方的混匀基座2上，且洗涤杯座3的一端具有向外延伸的触发片A31，基板1上在对应洗涤位置和装取位置则分别设有到位传感器A13和复位传感器B14，触发片A31随洗涤杯座3滑动，当触发到位传感器A13时，通过到位传感器A13即可向后台反馈混匀基座2此时处于洗涤位置，表示可以进行洗涤操作，同理当触发片A31触发复位传感器B14时，则向后台反馈混匀基座2处于装取位置，表示可以进行混匀操作，或者装入反应杯或取出反应杯操作。
本实施例中的混匀组件4主要包括固设于混匀基座2上的偏心轴40、第二混匀电机41和导向机构，混匀组件4可跟随混匀基座2一同滑动，从而达到针对不同工况的混匀。
如图1、图6和图7所示，偏心轴40通过轴承以可转动方式竖向支撑于混匀基座2上，且靠近混匀基座2的一端，偏心轴40具有上下偏心的两段，第二混匀电机41位于混匀基座2的另一端，同样竖向设置，且位于混匀基座2的下方，第二混匀电机41通过皮带传动机构与偏心轴40下端相连，可带动偏心轴40做回转运动，而偏心轴40的上端又与洗涤杯座3的一端固定连接。
本实施例中的导向机构主要包括分别沿X向和Y向设置的X向混匀滑轨42和Y向混匀滑轨43，如图所示，混匀基座2上通过凹槽嵌设有X向滑块44， X向滑块44与混匀基座2固定连接，而X向混匀滑轨42与X向混匀滑轨42滑动配合，X向混匀滑轨42处于活动状态，Y向混匀滑轨43位于X向混匀滑轨42上方，二者通过螺钉固定连接，Y向混匀滑轨43上具有与其滑动配合的Y向混匀滑块45，而Y向混匀滑块45的上部于洗涤杯座3固定连接，这样当第二混匀电机41带动偏心轴40转动时，即可使洗涤杯座3沿X向混匀滑轨42和Y向混匀滑轨43所构成的轨迹滑动，因为偏心轴40做回转运动，固在混匀过程中，洗涤杯座3则相应的做水平方向的圆周闭合运动，有利于提高混匀效果，且防止反应杯内的溶液溅射出来。
参考图1、图4和图5，本申请中的洗涤头5主要包括与洗涤杯座3平行设置的洗涤头安装板52，如图所示，洗涤头安装板52为条形板状结构，其一端可拆卸地连接有连接头58，连接头58与洗涤头安装板52构成L形结构，基板1上对应连接头58端部位置设有Z向洗涤滑轨15，Z向洗涤滑轨15竖向设置，而连接头58上具有与Z向洗涤滑轨15滑动配合的Z向洗涤滑块53，与此同时，基板1上设有用于驱动洗涤头安装板52沿Z向洗涤滑轨15升降滑动的驱动电机B 1b，而为了确保其升降位置合适，同样在洗涤头安装板52和Z向洗涤滑轨15上设有相互配合的的触发片和到位传感器。
通常情况下，当洗涤针组50或底物加注针51随洗涤头安装板52下降，如果触碰到下方的反应杯时，现有驱动电机B 1b会一直驱动洗涤头5持续下降，或机械性的重复升降动作，这样极易造成洗涤针组50或底物加注针51损坏，影响检测效率，故本实施例中在洗涤头5上还设置有防扎杯机构，用于在洗涤头5下降过程中监测洗涤针组50或底物加注针51是否与反应杯发生碰撞。
参考图13至图16，本实施例中的防扎杯机构设置于连接头58上，其主要包括螺母座580、防扎触发片581和防扎传感器582，其中螺母座580为竖 截面呈“T”字形的阶梯柱状结构，如图所示，连接头58呈中空结构，其内具有与螺母座580相似的安装腔583，该安装腔583的上下两端均敞口，螺母座580嵌设于安装腔583内，且具有高度方向的活动空间，驱动电机B 1b为丝杆电机，其Z向丝杆1b0竖直朝下设置，并伸入安装腔583中与螺母座580螺纹配合，连接头58上端端部设有压板584，压板584将螺母座580封闭于安装腔583内，防止其从安装腔583中脱出。
连接头58在重力和弹簧585的双重作用下弹性挂在螺母座580上，连接头58的一侧开设有与安装腔583连通的窗口586，窗口586具有一定高度，防扎触发片581与螺母座580固定连接，并从窗口586处伸出，防扎传感器582位于连接头58上，且处于防扎触发片581的正下方。
通常情况下，螺母座580在弹簧585支撑下，处于高位，此时防扎触发片581也处于高位，螺母座580与压板584抵接，整体在驱动电机B 1b驱动下可正常升降滑动，升降过程中螺母座580与安装腔583相对位置不变，而当洗涤针组50或底物加注针51发生触碰时，Z向洗涤滑块53受到阻挡，不能继续下滑，同时连接头58位置不动，但驱动电机B 1b仍处于工作状态，则Z向丝杆1b0带动螺母座580在安装腔583内向下滑动，弹簧585处于压缩状态，同时螺母座580带动防扎触发片581也朝下滑动，从而触发防扎传感器582，防扎传感器582再将信号传回后台，即可使工作人员或主控程序快速了解情况，并做出相应反应，避免驱动电机B 1b重复动作导致部件损坏，或长时间不能发现问题的情况发生。
洗涤头5上的洗涤针组50沿洗涤头安装板52的长度方向分布，其分布间隔与洗涤孔30相适应，同时洗涤头安装板52上还具有沿Y向设置的Y向加注滑轨54，Y向加注滑轨54上具有与其滑动配合的Y向加注滑块55，Y向加注滑块55上固设有底物针座56，底物加注针51则固设于底物针座56上， 本实施例中的底物加注针51有两根，以备加注不同的两种底物需要。
洗涤头安装板52靠近Z向洗涤滑轨15的一端固设有驱动电机C 57，这样设置在于，保持洗涤头5的整体重心稳定，因为洗涤头安装板52基本依靠Z向洗涤滑块53支撑于Z向洗涤滑轨15上，如将驱动电机C 57设置于另一端，则会导致另一端重量增加，洗涤头安装板52容易发生偏斜，驱动电机C 57主要用于驱动底物针座56沿Y向加注滑轨54滑动，从而向不同的反应杯中加入底物。
此外，本申请中在提高洗涤质量，降低磁珠丢失率方面亦做出重大改进，如图1、图2和图6所示，洗涤杯座3的竖截面类似“7”字形，洗涤孔30下端沿X向的两侧敞口，基板1上对应混匀基座2的洗涤位置设有吸附板6，且吸附板6的形状与洗涤杯座3后侧形状构成互补结构，吸附板6上正对每个洗涤孔30下部敞口的位置的均设有磁铁60，当混匀基座2的位于洗涤位置时，吸附板6刚好位于洗涤杯座3的正后方，且吸附板6与洗涤杯座3下部紧贴，从而通过磁铁60将反应杯内的磁珠吸附到后侧，提高洗涤效果，且能有效防止磁珠丢失。
在此基础之上，为扩大其效果，在基板1上还设有预吸附座7，本实施例中预吸附座7对应混匀基座2的装取位置，即当混匀基座2处于装取位置时，预吸附座7刚好与洗涤杯座3齐平，预吸附座7上设有预吸孔70，预吸孔70的下端后侧敞口，预吸附座7上对应每个预吸孔70的敞口位置固设有预吸磁铁71，通过预吸磁铁71可对放入预吸孔70中的反应杯进行吸附处理，使得反应杯内的磁珠聚集到一侧，同时因为预吸时间相对较长，甚至可达到对磁珠进一步磁化的目的，这样当反应杯从预吸孔70进入洗涤孔30中，随混匀基座2达到洗涤位置时，与磁铁60产生的吸附能力更强，可以快速被吸附至反应杯的侧壁上，且其磁力更强，相对而言，更不易丢失，从而进一步降低 磁珠丢失率，提高检测结果精确度。
参考图2、图8至图10，考虑到降低温度对洗涤或检测的影响，本实施例中在基板1上设有加热装置8，加热装置8主要用于对加入反应杯中的洗涤液和底物进行加热，如图所示，加热装置8位于基板1的后端，其主要包括洗涤液加热仓80和底物加热仓81，其中洗涤液加热仓80的上下端分别设有洗涤管线入口84和洗涤管线出口85，洗涤液加热仓80内具有迂回分布的钢性加热管组86，洗涤液加热仓80上对应洗涤管线入口84的设有接驳头83，接驳头83上的接头个数以及钢性加热管组86数量均与洗涤头5上加注针501的数量相匹配。
洗涤液加热仓80的背侧固定有电加热带87，底物加热仓81固设于洗涤液加热仓80背侧上端，这样当电加热带87工作时，即可同时对底物加热仓81和洗涤液加热仓80进行加热，为便于确保温度加热温度合适，故在洗涤液加热仓80上设有温度传感器88，以便实时监控加热温度。
底物加热仓81呈中空结构，其内竖向设置有至少两个卷筒82，使用时，底物管线从下端伸入底物加热仓81中，并绕卷筒82缠绕之后从其上端穿出，从而实现对底物的加热。
安装连接过程中，洗涤液加注管线一端与洗涤液瓶连接之后，接入洗涤液加热仓80中，从洗涤管线出口85出来之后再与洗涤头5上的加注针501连接，这样注入反应杯中的洗涤液均经过洗涤液加热仓80的加热作用，同样的，底物加注管线一端与底物瓶连接，另一端伸入底物加热仓81中，并在卷筒82上缠绕之后与洗涤头5上的底物加注针51连接，即实现底物的加热，保证洗涤与底物加注均在恒温下进行，弱化温度影响，有利于提高检测结果精度。
为简化结构，便于安装实施，本申请中的驱动电机A1a、驱动电机B1b和 驱动电机C57均为丝杆电机，如图所示，驱动电机A1a的丝杆沿混匀基座滑轨10平行设置，并与混匀基座2的一端螺纹连接，驱动电机B1b位于Z向洗涤滑轨15上方，其丝杆竖直朝下，并与洗涤头安装板螺纹连接，驱动电机C57的丝杆与Y向加注滑轨54平行设置，其丝杆与底物针座56螺纹连接，这样当各自电机的丝杆转动时，则可通过丝杆带动对应连接的部件沿对应的滑轨滑动。
参考图1至图12，本实施例中的预吸孔70有三个，洗涤孔30有六个，本发明的工作过程如下，首先通过抓手将反应杯放入预吸孔70中，混匀基座2处于如图11中的装取位置，经过相对较长时间的预吸附作用之后，再逐次将经过预吸作用的反应杯抓如洗涤孔30中，即当朝洗涤杯座3上放入一个反应杯之后，混匀基座2即后滑道洗涤位置，通过洗涤头5的升降进行该反应杯的一次洗涤，同时抓手向预吸孔70中补充反应杯，当洗涤杯座3上的第一个反应杯完成一次洗涤之后，混匀基座2又滑至前端的装取位置，此时将预吸附座7上第二个反应杯抓取放入洗涤孔30中，混匀基座2又回到洗涤位置，此时洗涤杯座3上第一个反应杯进行第二次洗涤，而第一个杯子进行第一次洗涤，依次逐杯进行多次洗涤。
在洗涤过程中，当洗涤杯座3远离吸附板6时，则可通过混匀组件4进行混匀，从而提高混匀效果，而当第一个反应杯完成规定次洗涤之后，混匀基座2则滑动至底物加注位置，同时通过驱动电机C57驱动底物针座56滑动，使底物针51位于第一反应杯的正上方或伸入其中，向该反应杯内加入底物，并在此通过混匀组件4对其混匀，最后混匀基座2滑至装取位置，由抓手将第一个反应杯抓走，进入检测程序，而混匀基座2继续滑移完成下一反应杯的洗涤。
通过多次洗涤作用、配合预吸附作用和吸附作用大大提高了洗涤效果， 同时降低磁珠丢失率，使检测结果精度显著提高，同时将混匀与洗涤结合，减少其占用空间，在进一步提高洗涤质量同时保证底物与磁珠的混合均匀，有利于提高检测结果可靠性。
最后需要说明的是，上述描述仅仅为本发明的优选实施例，本领域的普通技术人员在本发明的启示下，在不违背本发明宗旨及权利要求的前提下，可以做出多种类似的表示，这样的变换均落入本发明的保护范围之内。

Claims (10)

  1. 一种带混匀功能的化学发光免疫分析仪洗涤系统，其特征在于，包括：
    基板(1)；
    混匀基座(2)，活动设置于基板(1)上，并可相对基板(1)滑动，在其滑动行程上具有装取、底物加注和洗涤三个位置；
    洗涤杯座(3)，其设置于混匀基座(2)上，且具有沿长度方向分布的洗涤孔(30)；
    混匀组件(4)，固设于混匀基座(2)上，用于使洗涤杯座(3)在水平平面内往复摆动，将处于洗涤孔(30)中反应杯内的液体混匀；
    洗涤头(5)，活动设置于基板(1)上，并可相对基板(1)做升降运动，其上具有与洗涤孔(30)一一对应的洗涤针组(50)以及至少一个底物加注针(51)，当混匀基座(2)处于洗涤位置时，洗涤针组(50)位于洗涤孔(30)正上方，当处于底物加注位置时，底物加注针(51)位于洗涤孔(30)正上方。
  2. 根据权利要求1所述的带混匀功能的化学发光免疫分析仪洗涤系统，其特征在于：所述混匀组件(4)包括偏心轴(40)、第二混匀电机(41)和导向机构，其中导向机构具有闭合的导向轨迹，第二混匀电机(41)用于驱动偏心轴(40)转动，所述偏心轴(40)转动带动洗涤杯座(3)沿导向机构既定轨迹运动。
  3. 根据权利要求2所述的带混匀功能的化学发光免疫分析仪洗涤系统，其特征在于：所述导向机构包括分别沿混匀基座(2)宽度和长度方向设置的X向混匀滑轨(42)和Y向混匀滑轨(43)，其中X向混匀滑轨(42)上具有与其滑动配合的X向混匀滑块(44)，所述X向混匀滑块(44)固设于混匀基座(2)上，所述Y向混匀滑轨(43)与X向混匀滑轨(42)固定连接，Y向混匀滑轨(43)具有与其滑动配合的Y向混匀滑块(45)，所述洗涤杯座(3) 与Y向混匀滑块(45)固定连接；
    所述偏心轴(40)以可转动方式设置于混匀基座(2)的一端，并与洗涤杯座(3)固定连接，第二混匀电机(41)通过传动皮带带动偏心轴(40)转动。
  4. 根据权利要求1所述的带混匀功能的化学发光免疫分析仪洗涤系统，其特征在于：所述混匀基座(2)位于基板(1)的下方，基板(1)底部对应混匀基座(2)两端的位置设有混匀基座滑轨(10)，所述混匀基座滑轨(10)上具有与其滑轨配合的混匀基座滑块(11)，所述混匀基座(2)两端分别与对应的混匀基座滑块(11)固定连接；
    所述基板(1)上设有用于驱动混匀基座(2)沿混匀基座滑轨(10)滑动的驱动电机A(1a)，基板(1)上对应混匀基座(2)的滑动行程设有安装口(12)。
  5. 根据权利要求1至4中任意一项所述的带混匀功能的化学发光免疫分析仪洗涤系统，其特征在于：所述洗涤头(5)包括与洗涤杯座(3)平行设置的洗涤头安装板(52)，基板(1)对应洗涤头安装板(52)的一端设有Z向洗涤滑轨(15)，Z向洗涤滑轨(15)竖向固设于基板(1)上，所述洗涤头安装板(52)上具有与Z向洗涤滑轨(15)滑动配合的Z向洗涤滑块(53)，所述基板(1)上设有用于驱动洗涤头安装板(52)沿Z向洗涤滑轨(15)升降滑动的驱动电机B(1b)。
  6. 根据权利要求5所述的带混匀功能的化学发光免疫分析仪洗涤系统，其特征在于：所述洗涤头安装板(52)上具有沿其长度方向设置的Y向加注滑轨(54)，该Y向加注滑轨(54)上具有与其滑动配合的Y向加注滑块(55)，所述Y向加注滑块(55)上具有与其固连的底物针座(56)，所述底物加注针(51)固设于该底物针座(56)上，所述洗涤头安装板(52)靠近Z向洗涤 滑轨(15)的一端设有驱动电机C(57)，所述驱动电机C(57)用于驱动底物针座(56)沿Y向加注滑轨(54)水平滑动。
  7. 根据权利要求1所述的带混匀功能的化学发光免疫分析仪洗涤系统，其特征在于：所述基板(1)上对应混匀基座(2)的洗涤位置设有吸附板(6)，所述吸附板(6)上具有与洗涤孔(30)一一对应的磁铁(60)，所述洗涤孔(30)下部正对磁铁(60)的一侧敞口。
  8. 根据权利要求1或7所述的带混匀功能的化学发光免疫分析仪洗涤系统，其特征在于：所述基板(1)上对应混匀基座(2)的装取位置设有预吸附座(7)，该预吸附座(7)，上具有沿长度方向分布的预吸孔(70)，预吸附座(7)上对应每个预吸孔(70)设有预吸磁铁(71)。
  9. 根据权利要求1至4或7中任意一项所述的带混匀功能的化学发光免疫分析仪洗涤系统，其特征在于：还包括加热装置(8)，所述加热装置(8)用于对洗涤液和底物加热。
  10. 根据权利要求1所述的带混匀功能的化学发光免疫分析仪洗涤系统，其特征在于：所述洗涤头(5)上设有防扎杯机构，所述防扎杯机构用于在洗涤头(5)下降过程中监测洗涤针组(50)和底物加注针(51)是否与反应杯发生触碰。
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