WO2020133737A1 - 配向膜涂布机 - Google Patents

配向膜涂布机 Download PDF

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Publication number
WO2020133737A1
WO2020133737A1 PCT/CN2019/078694 CN2019078694W WO2020133737A1 WO 2020133737 A1 WO2020133737 A1 WO 2020133737A1 CN 2019078694 W CN2019078694 W CN 2019078694W WO 2020133737 A1 WO2020133737 A1 WO 2020133737A1
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Prior art keywords
groove
flange
alignment film
alignment
transfer
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PCT/CN2019/078694
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English (en)
French (fr)
Inventor
黄建龙
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武汉华星光电技术有限公司
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Publication of WO2020133737A1 publication Critical patent/WO2020133737A1/zh

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41F—PRINTING MACHINES OR PRESSES
    • B41F16/00—Transfer printing apparatus
    • B41F16/0006—Transfer printing apparatus for printing from an inked or preprinted foil or band
    • B41F16/0093—Attachments or auxiliary devices

Definitions

  • the present application relates to the field of display, in particular to an alignment film coating machine.
  • the existing APR board (a relief plate made of ultraviolet-curable polyurethane resin as a raw material), as shown in FIG. 1, includes a transfer substrate and a flange, and PI (polyimide, polyimide) is fixed between the transfer board flanges Amine) liquid, in the process of transferring PI liquid, as shown in FIG. 2, the alignment film corresponding to the position of the flange is thinner than the adjacent position, and the thickness of the alignment film is uneven.
  • PI polyimide, polyimide
  • the existing alignment liquid transfer technology has a technical problem of uneven thickness of the formed alignment film.
  • the present application provides an alignment film coating machine to alleviate the technical problem of uneven thickness of the alignment film formed by the existing alignment liquid transfer technology.
  • the alignment film coating machine includes:
  • the transfer plate includes a transfer substrate and a flange, at least one flange is provided with a groove, and the groove is used to contain an alignment liquid;
  • a coating head for coating the alignment liquid on the transfer plate
  • the height of the flange provided with the groove is smaller than the height of the flange not provided with the groove;
  • the depth of the groove is equal to the height of the flange.
  • the flange corresponding to the groove position of the pixel defining layer of the array substrate is provided with a groove.
  • the flange corresponding to the display area of the array substrate is provided with a groove.
  • the cross-sectional shape of the groove is semicircular.
  • the material of the flange is polyurethane acrylic resin.
  • the alignment film coating machine includes:
  • the transfer plate includes a transfer substrate and a flange, at least one flange is provided with a groove, and the groove is used to contain an alignment liquid;
  • a coating head for coating the alignment liquid on the transfer plate
  • a transfer member for transferring the alignment liquid on the transfer plate to the array substrate is
  • the flange corresponding to the groove position of the pixel defining layer of the array substrate is provided with a groove.
  • the flange corresponding to the display area of the array substrate is provided with a groove.
  • the flanges are all provided with grooves.
  • the height of the flange provided with grooves is smaller than the height of the flange not provided with grooves.
  • the height of the flange provided with grooves is equal to the height of the flange provided with no grooves.
  • the height of the flange provided with grooves is greater than the height of the flange provided with no grooves.
  • the cross-sectional shape of the groove is rectangular.
  • the cross-sectional shape of the groove is trapezoidal.
  • the cross-sectional shape of the groove is semicircular.
  • the cross-sectional shape of the groove is triangular.
  • the depth of the groove is equal to the depth of the groove of the pixel definition layer of the array substrate.
  • the depth of the groove is equal to the height of the flange.
  • the depth of the groove is equal to the sum of the height of the flange and the height of the transfer substrate.
  • the material of the flange is polyurethane acrylic resin.
  • the present application provides an alignment film coating machine.
  • the alignment film coating machine includes a machine table, a transfer plate, a coating head, and a transfer member.
  • the machine table is used to place an array substrate;
  • the transfer plate includes a transfer A printed circuit board and a flange, at least one flange is provided with a groove, the groove is used to contain an alignment liquid;
  • the coating head is used to apply the alignment liquid to the transfer plate;
  • the transfer member It is used to transfer the alignment liquid on the transfer plate to the array substrate; in this application, the groove is provided on the flange, and the alignment liquid is installed in the groove.
  • the alignment liquid in the groove Filled into the corresponding area of the flange, increasing the thickness of the alignment liquid in the corresponding area of the flange, alleviating or even solving the technical problem of uneven thickness of the alignment film formed by the existing alignment liquid transfer technology, making the surface of the alignment film tend to be flat or flat .
  • Figure 1 is a schematic diagram of the surface microstructure of the existing transfer plate
  • Figure 2 is a schematic diagram of the surface of the existing alignment film
  • FIG. 3 is a first schematic diagram of an alignment film coating machine in an embodiment of this application.
  • FIG. 4 is a schematic diagram of the surface of the alignment film in the embodiment of the present application.
  • FIG. 5 is a second schematic diagram of an alignment film coating machine in an embodiment of the present application.
  • This application addresses the technical problem of uneven thickness of the alignment film formed by the existing alignment liquid transfer technology, and the embodiments of this application can alleviate or even solve this problem.
  • the existing transfer plate includes a transfer substrate 101 and a flange 102 provided on the transfer substrate, and an alignment liquid 103 is provided between the flanges 102.
  • the transfer The plate includes a transfer substrate 201 and a flange 202.
  • the transfer plate transfers the alignment liquid between the flange 202 to the array substrate 204 to form an alignment film 203, but since the flange occupies a certain volume, Therefore, the surface of the alignment film formed on the array substrate will become uneven, making the thickness of the alignment film corresponding to the position of the flange smaller than the thickness of the alignment film at the adjacent position, resulting in uneven thickness of the alignment film.
  • the present application provides an alignment film coating machine, which includes a coating head 301, a transfer plate, a transfer member 307, and a machine table 308.
  • the transfer plate includes a transfer A substrate 305 and a flange 303 provided on the transfer substrate, a groove 304 is provided on the flange 303, an array substrate 306 is provided on the machine table 308, and the coating head 301 is used for alignment
  • the liquid 302 is applied between the flanges 303 and the grooves 304, and the transfer member 307 is used to rotate the transfer plate coated with the alignment liquid 304 onto the array substrate 306 to rotate the alignment liquid 304 Printed on the array substrate 306 to form the alignment film; because the groove is provided on the flange of the transfer plate, and the alignment liquid is contained in the groove, in the process of transferring the alignment liquid to the array substrate to form the alignment film
  • the alignment liquid in the groove will be filled to the corresponding position of the flange, increasing the thickness of the alignment film at the corresponding position of the f
  • the groove may be obtained by digging holes after forming the flange, or a flange provided with grooves may be directly formed when forming the transfer board; and only part of the flange may be digged, Or dig holes on all flanges to form grooves; and for grooved flanges, the height of the flanges can be set smaller than the height of flanges without grooves, or flanges with grooves
  • the height of the flange is equal to the height of the flange without the groove, or the height of the flange with the groove is larger than the height of the flange without the groove.
  • the material of the flange may be polyurethane acrylic resin.
  • a flange is formed on the transfer substrate, and then a hole is formed on the flange to form a groove, the flange is arranged in an array on the transfer substrate, and then coated on the transfer plate
  • the alignment liquid if the alignment liquid is provided in the groove, the surface of the alignment film can be flattened.
  • the array substrate is placed on the machine table, the coating head applies the alignment liquid between the flanges and the grooves, and then the alignment liquid on the transfer plate is applied to the array using a transfer member On the substrate, the alignment liquid in the groove on the flange will fill up to the corresponding position on the flange, so that the surface of the alignment film tends to be flat.
  • the present application provides an alignment film surface structure.
  • the transfer plate includes a transfer substrate 401 and a flange 402 provided on the transfer substrate. By providing a groove in the flange, the concave The alignment liquid is contained in the groove. During the transfer process, the transfer plate transfers the alignment liquid to the array substrate 404. The alignment liquid in the groove fills the corresponding position of the flange 402, so that the thickness of the alignment film corresponding to the position of the flange As a result of this increase, the surface of the formed alignment film 403 becomes flat.
  • the alignment liquid in the groove will be filled to the corresponding position of the flange, so that the protrusion provided with the groove
  • the alignment film corresponding to the edge position tends to be flat or even flat.
  • the groove can be set to various shapes, such as the groove can be set to have a rectangular, trapezoidal, semicircular, or triangular cross-sectional shape Shape; the grooves are provided on the flanges with more quantity, and the alignment liquid is contained in the grooves, which will make the alignment film flatter and even make the alignment film flat.
  • the present application provides an alignment film coater, provided with a pixel definition layer groove 504 on an array substrate 505, a transfer plate includes a transfer substrate 501 and a flange 502 provided on the transfer substrate , A groove is provided on the flange 502, and the transfer plate transfers the alignment liquid to the array substrate to form an alignment film 503; during the transfer process, the flange 502 will cover the pixel definition layer groove On the groove 504, the alignment liquid in the groove will fill the corresponding positions of the groove and the flange of the pixel definition layer, so that the alignment film formed tends to be flat or even flat.
  • the transfer plate flange when the alignment liquid is transferred to the array substrate provided with the pixel definition layer groove for the transfer plate, the transfer plate flange may cover the pixel definition layer groove, resulting in the pixel definition layer groove There is no alignment liquid or only a small amount of alignment liquid inside.
  • the thickness of the alignment film formed at the groove position of the corresponding pixel definition layer due to the flow of the alignment liquid is smaller than the thickness of the alignment film at the adjacent position;
  • a groove is provided on the flange of the groove, and an alignment liquid is provided in the groove, so that when the flange covers the groove of the pixel definition layer, the alignment liquid in the groove will flow into the groove of the pixel definition layer, so that the array
  • the alignment film formed on the substrate tends to be flat; and the depth of the groove can be set equal to the depth of the groove of the pixel definition layer, or the depth of the groove can be set equal to the height of the flange, or the groove The depth of is equal to the sum of the height of the flange and the height of the transfer substrate; all flanges can also be provided with grooves, and alignment liquid is provided in the grooves, so that the alignment film formed after the transfer tends to be flat or even flat.
  • An embodiment of the present application provides an alignment film coating machine.
  • the alignment film coating machine includes a machine table, a transfer plate, a coating head, and a transfer member.
  • the machine table is used to place an array substrate;
  • the transfer plate It includes a transfer substrate and a flange, at least one flange is provided with a groove, the groove is used to contain the alignment liquid;
  • the coating head is used to apply the alignment liquid to the transfer plate;
  • the transfer The printing member is used to transfer the alignment liquid on the transfer plate to the array substrate; by providing a groove on the flange of the transfer plate and containing the alignment liquid in the groove, during the transfer process, the groove
  • the alignment liquid filled in the corresponding area of the flange increases the thickness of the alignment liquid in the corresponding area of the flange, alleviating or even solving the technical problem of uneven thickness of the alignment film formed by the existing alignment liquid transfer technology, making the surface of the alignment film tend to Flat or flat; and for array substrates with pixel-defining layer trenches, the
  • a groove is provided on the flange corresponding to the pixel-defining layer trench position, in The alignment liquid is contained in the groove, so that the alignment liquid in the groove enters the groove of the pixel definition layer during the transfer, and the thickness of the alignment film corresponding to the groove position of the pixel definition layer increases when the alignment film is formed, so that the surface of the alignment film tends to be flat Or flat; and by setting the depth of the groove equal to the depth of the pixel definition layer, the thickness of the alignment film corresponding to the position of the pixel definition layer is effectively increased, so that the surface of the alignment film tends to be flat or flat.

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
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Abstract

一种配向膜涂布机，包括机台（308）、转印板、涂布头（301）和转印构件（307），机台（308）用于放置阵列基板（306）；转印板包括转印基板（305）和凸缘（303），至少一个凸缘（303）设置有凹槽（304），凹槽（304）用于容纳配向液（302）；涂布头（301）用于将配向液（302）涂布在转印板上；转印构件（307）用于将转印板上的配向液（302）转印至阵列基板（305）。该涂布机解决了配向膜厚度不均的问题。

Description

配向膜涂布机 技术领域
本申请涉及显示领域，尤其涉及一种配向膜涂布机。
 背景技术
现有的APR板（一种以紫外线固化聚氨酯类树脂为原料的凸版）如图1所示，包括转印基板和凸缘，在转印板凸缘之间固定有PI（polyimide，聚酰亚胺）液，在转印PI液的过程中，如图2所示，对应凸缘的位置配向膜相较于相邻位置较薄，配向膜厚度不均。
即现有配向液转印技术存在形成的配向膜厚度不均的技术问题。
 技术问题
本申请提供一种配向膜涂布机，用以缓解现有配向液转印技术存在形成的配向膜厚度不均的技术问题。
 技术解决方案
为解决上述问题，本申请提供的技术方案如下：
本申请提供一种配向膜涂布机，该配向膜涂布机包括：
机台，用于放置阵列基板；
转印板，包括转印基板和凸缘，至少一个凸缘设置有凹槽，所述凹槽用于容纳配向液；
涂布头，用于将配向液涂布在所述转印板上；
转印构件，用于将所述转印板上的配向液转印至阵列基板；
其中，设置有凹槽的凸缘的高度小于未设置凹槽的凸缘的高度；
所述凹槽的深度等于凸缘的高度。
在本申请提供的配向膜涂布机中，对应阵列基板像素定义层沟槽位置的凸缘设置有凹槽。
在本申请提供的配向膜涂布机中，对应阵列基板显示区内的凸缘设置有凹槽。
在本申请提供的配向膜涂布机中，所述凹槽的截面形状为半圆形。
在本申请提供的配向膜涂布机中，所述凸缘的材料为聚氨酯丙烯酸树脂。
本申请提供一种配向膜涂布机，该配向膜涂布机包括：
机台，用于放置阵列基板；
转印板，包括转印基板和凸缘，至少一个凸缘设置有凹槽，所述凹槽用于容纳配向液；
涂布头，用于将配向液涂布在所述转印板上；
转印构件，用于将所述转印板上的配向液转印至阵列基板。
在本申请提供的配向膜涂布机中，对应阵列基板像素定义层沟槽位置的凸缘设置有凹槽。
在本申请提供的配向膜涂布机中，对应阵列基板显示区内的凸缘设置有凹槽。
在本申请提供的配向膜涂布机中，所述凸缘均设置有凹槽。
在本申请提供的配向膜涂布机中，设置有凹槽的凸缘的高度小于未设置凹槽的凸缘的高度。
在本申请提供的配向膜涂布机中，设置有凹槽的凸缘的高度等于未设置凹槽的凸缘的高度。
在本申请提供的配向膜涂布机中，设置有凹槽的凸缘的高度大于未设置凹槽的凸缘的高度。
在本申请提供的配向膜涂布机中，所述凹槽的截面形状为矩形。
在本申请提供的配向膜涂布机中，所述凹槽的截面形状为梯形。
在本申请提供的配向膜涂布机中，所述凹槽的截面形状为半圆形。
在本申请提供的配向膜涂布机中，所述凹槽的截面形状为三角形。
在本申请提供的配向膜涂布机中，所述凹槽的深度等于阵列基板的像素定义层沟槽的深度。
在本申请提供的配向膜涂布机中，所述凹槽的深度等于凸缘的高度。
在本申请提供的配向膜涂布机中，所述凹槽的深度等于凸缘的高度与转印基板的高度之和。
在本申请提供的配向膜涂布机中，所述凸缘的材料为聚氨酯丙烯酸树脂。
 有益效果
本申请提供一种配向膜涂布机，该配向膜涂布机包括机台、转印板、涂布头和转印构件，所述机台用于放置阵列基板；所述转印板包括转印基板和凸缘，至少一个凸缘设置有凹槽，所述凹槽用于容纳配向液；所述涂布头用于将配向液涂布在所述转印板上；所述转印构件用于将所述转印板上的配向液转印至阵列基板；本申请通过在凸缘上设置凹槽，并在凹槽内装有配向液，在转印过程中，凹槽内的配向液填充到凸缘对应区域，增加了凸缘对应区域内的配向液厚度，缓解甚至解决了现有配向液转印技术存在形成的配向膜厚度不均的技术问题，使得配向膜表面趋向平整或平整。
 附图说明
为了更清楚地说明实施例或现有技术中的技术方案，下面将对实施例或现有技术描述中所需要使用的附图作简单介绍，显而易见地，下面描述中的附图仅仅是申请的一些实施例，对于本领域普通技术人员来讲，在不付出创造性劳动的前提下，还可以根据这些附图获得其他的附图。
图1为现有转印板表面微观结构示意图；
图2为现有配向膜表面示意图；
图3为本申请实施例中配向膜涂布机第一示意图；
图4为本申请实施例中配向膜表面示意图；
图5为本申请实施例中配向膜涂布机第二示意图。
 本发明的实施方式
以下各实施例的说明是参考附加的图示，用以例示本申请可用以实施的特定实施例。本申请所提到的方向用语，例如[上]、[下]、[前]、[后]、[左]、[右]、[内]、[外]、[侧面]等，仅是参考附加图式的方向。因此，使用的方向用语是用以说明及理解本申请，而非用以限制本申请。在图中，结构相似的单元是用以相同标号表示。
本申请针对现有配向液转印技术存在形成的配向膜厚度不均的技术问题，本申请实施例可以缓解甚至解决该问题。
如图1所示，现有转印板包括转印基板101和设置在转印基板上的凸缘102，在所述凸缘102之间设置有配向液103，如图2所示，转印板包括转印基板201和凸缘202，在转印过程中，转印板将凸缘202之间的配向液转印到阵列基板204上形成配向膜203，但由于凸缘占有一定的体积，所以在阵列基板上形成的配向膜的表面将变的凹凸不平，使对应凸缘位置的配向膜的厚度小于相邻位置的配向膜厚度，造成配向膜厚度不均。
如图3所示，本申请提供一种配向膜涂布机，该配向膜涂布机包括涂布头301、转印板、转印构件307和机台308，所述转印板包括转印基板305和设置在所述转印基板上的凸缘303，所述凸缘303上设有凹槽304，所述机台308上设有阵列基板306，所述涂布头301用于将配向液302涂布到所述凸缘303之间以及所述凹槽304内，所述转印构件307用于将涂有配向液304的转印板旋转到阵列基板306上，使配向液304转印到阵列基板306上形成配向膜；由于在转印板的凸缘上设置了凹槽，并在凹槽内容纳有配向液，在将配向液转印到阵列基板上形成配向膜的过程中，凹槽中的配向液将填充到凸缘对应位置，增加凸缘对应位置配向膜厚度，使得配向膜表面趋向平整甚至平整。
在本申请实施例中，所述凹槽可在形成凸缘后挖孔得到，也可以在形成转印板时直接形成设有凹槽的凸缘；且可只对部分凸缘进行挖孔，或者在全部凸缘上进行挖孔形成凹槽；而对于设置凹槽的凸缘，其凸缘的高度可设置的比未设置凹槽的凸缘的高度小，或者设置有凹槽的凸缘的高度等于未设置凹槽的凸缘的高度，或者设置有凹槽的凸缘的高度大于未设置凹槽的凸缘的高度，凸缘的材料可为聚氨酯丙烯酸树脂。
在一种实施例中，在转印基板上形成凸缘，然后在所述凸缘上进行挖孔形成凹槽，所述凸缘在转印基板上呈阵列设置，然后在转印板上涂布配向液，所述凹槽内设置有配向液，则可以使配向膜表面趋向平整。
在一种实施例中，在机台上放置阵列基板，涂布头将配向液涂布到凸缘之间以及凹槽内，然后使用转印构件将转印板上的配向液涂布到阵列基板上，而凸缘上的凹槽内的配向液将会填补到凸缘对应位置，使得配向膜表面趋向平整。
如图4所示，本申请提供一种配向膜表面结构，转印板包括转印基板401和设置在转印基板上的凸缘402，通过在所述凸缘内设置凹槽，并在凹槽内容纳配向液，在转印过程中，转印板将配向液转印到阵列基板404上，凹槽内的配向液填补到凸缘402的对应位置，使得对应凸缘位置的配向膜厚度增加，形成的配向膜403的表面变的平整。
在本申请实施例中，通过在至少一个凸缘上设置凹槽，并在凹槽内容纳配向液，将使得凹槽内的配向液填补到凸缘的对应位置，使得设有凹槽的凸缘位置对应的配向膜趋于平整甚至平整，在形成凹槽的过程中，可将凹槽设置为各种形状，如可将凹槽设置为截面形状为矩形、梯形、半圆形、三角形的形状；在数量越多的凸缘上设置凹槽，并在凹槽内容纳配向液，将使配向膜变的更加平整甚至会使配向膜变得平整。
如图5所示，本申请提供一种配向膜涂布机，在阵列基板505上设有像素定义层沟槽504，转印板包括转印基板501和设置在转印基板上的凸缘502，在所述凸缘502上设置有凹槽，转印板将配向液转印到阵列基板上形成配向膜503；在转印过程中，所述凸缘502会覆盖在所述像素定义层沟槽504上，而凹槽内的配向液将填充到像素定义层沟槽和凸缘对应位置上，使得形成的配向膜趋于平整甚至平整。
在本申请实施例中，针对转印板将配向液转印到设有像素定义层沟槽的阵列基板上时，转印板凸缘可能会覆盖像素定义层沟槽从而造成像素定义层沟槽内没有配向液或只有少量的配向液，由于配向液的流动造成形成的配向膜在对应像素定义层沟槽位置的配向膜厚度小于相邻位置配向膜厚度；本申请实施例在对应像素定义层沟槽的凸缘上设置凹槽，并在凹槽内设置配向液，使得在凸缘覆盖到像素定义层沟槽时凹槽内的配向液将流到像素定义层沟槽中，使得在阵列基板上形成的配向膜趋于平整；且可将凹槽的深度设置为与像素定义层沟槽的深度相等，或者可将凹槽的深度设置为与凸缘的高度相等，或者所述凹槽的深度等于凸缘的高度与转印基板的高度之和；还可以将所有凸缘均设置凹槽，在凹槽内设置配向液，使得在转印后形成的配向膜趋于平整甚至平整。
根据以上实施例可知：
本申请实施例提供一种配向膜涂布机，该配向膜涂布机包括机台、转印板、涂布头和转印构件，所述机台用于放置阵列基板；所述转印板包括转印基板和凸缘，至少一个凸缘设置有凹槽，所述凹槽用于容纳配向液；所述涂布头用于将配向液涂布在所述转印板上；所述转印构件用于将所述转印板上的配向液转印至阵列基板；通过在转印板凸缘上设置凹槽，并在凹槽内容纳配向液，在转印过程中，凹槽内的配向液填充到凸缘对应区域，增加了凸缘对应区域内的配向液厚度，缓解甚至解决了现有配向液转印技术存在形成的配向膜厚度不均的技术问题，使得配向膜表面趋向平整或平整；而针对具有像素定义层沟槽的阵列基板，凸缘会覆盖在像素定义层沟槽上，本申请实施例在对应像素定义层沟槽位置的凸缘上设置有凹槽，在凹槽内容纳有配向液，使得在转印时凹槽内的配向液进入像素定义层沟槽，在形成配向膜时对应像素定义层沟槽位置的配向膜厚度增加，使得配向膜表面趋向平整或平整；而通过将凹槽的深度设置为与像素定义层深度相等，将有效的增加像素定义层对应位置的配向膜厚度，使得配向膜表面趋向平整或平整。
综上所述，虽然本申请已以优选实施例揭露如上，但上述优选实施例并非用以限制本申请，本领域的普通技术人员，在不脱离本申请的精神和范围内，均可作各种更动与润饰，因此本申请的保护范围以权利要求界定的范围为准。

Claims (20)

  1. 一种配向膜涂布机，其包括：
    机台，用于放置阵列基板；
    转印板，包括转印基板和凸缘，至少一个凸缘设置有凹槽，所述凹槽用于容纳配向液；
    涂布头，用于将配向液涂布在所述转印板上；
    转印构件，用于将所述转印板上的配向液转印至阵列基板；
    其中，设置有凹槽的凸缘的高度小于未设置凹槽的凸缘的高度；
    所述凹槽的深度等于凸缘的高度。
  2. 如权利要求1所述配向膜涂布机，其中，对应阵列基板像素定义层沟槽位置的凸缘设置有凹槽。
  3. 如权利要求1所述配向膜涂布机，其中，对应阵列基板显示区内的凸缘设置有凹槽。
  4. 如权利要求1所述的配向膜涂布机，其中，所述凹槽的截面形状为半圆形。
  5. 如权利要求1所述的配向膜涂布机，其中，所述凸缘的材料为聚氨酯丙烯酸树脂。
  6. 一种配向膜涂布机，其包括：
    机台，用于放置阵列基板；
    转印板，包括转印基板和凸缘，至少一个凸缘设置有凹槽，所述凹槽用于容纳配向液；
    涂布头，用于将配向液涂布在所述转印板上；
    转印构件，用于将所述转印板上的配向液转印至阵列基板。
  7. 如权利要求6所述的配向膜涂布机，其中，对应阵列基板像素定义层沟槽位置的凸缘设置有凹槽。
  8. 如权利要求6所述的配向膜涂布机，其中，对应阵列基板显示区内的凸缘设置有凹槽。
  9. 如权利要求6所述的配向膜涂布机，其中，所述凸缘均设置有凹槽。
  10. 如权利要求6所述的配向膜涂布机，其中，设置有凹槽的凸缘的高度小于未设置凹槽的凸缘的高度。
  11. 如权利要求6所述的配向膜涂布机，其中，设置有凹槽的凸缘的高度等于未设置凹槽的凸缘的高度。
  12. 如权利要求6所述的配向膜涂布机，其中，设置有凹槽的凸缘的高度大于未设置凹槽的凸缘的高度。
  13. 如权利要求6所述的配向膜涂布机，其中，所述凹槽的截面形状为矩形。
  14. 如权利要求6所述的配向膜涂布机，其中，所述凹槽的截面形状为梯形。
  15. 如权利要求6所述的配向膜涂布机，其中，所述凹槽的截面形状为半圆形。
  16. 如权利要求6所述的配向膜涂布机，其中，所述凹槽的截面形状为三角形。
  17. 如权利要求6所述的配向膜涂布机，其中，所述凹槽的深度等于阵列基板的像素定义层沟槽的深度。
  18. 如权利要求6所述的配向膜涂布机，其中，所述凹槽的深度等于凸缘的高度。
  19. 如权利要求6所述的配向膜涂布机，其中，所述凹槽的深度等于凸缘的高度与转印基板的高度之和。
  20. 如权利要求6所述的配向膜涂布机，其中，所述凸缘的材料为聚氨酯丙烯酸树脂。
PCT/CN2019/078694 2018-12-27 2019-03-19 配向膜涂布机 WO2020133737A1 (zh)

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JPS60141562A (ja) * 1983-12-28 1985-07-26 Toppan Printing Co Ltd 凹曲面への転写方法
US20120286450A1 (en) * 2007-03-08 2012-11-15 Toshiba Kikai Kabushiki Kaisha Method of forming micropattern, die formed by this method of forming micropattern, transfer method and micropattern forming method using this die
CN105644135A (zh) * 2016-02-02 2016-06-08 京东方科技集团股份有限公司 转印设备和涂布机
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