WO2020118817A1 - 一种oled显示器 - Google Patents
一种oled显示器 Download PDFInfo
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- WO2020118817A1 WO2020118817A1 PCT/CN2019/070584 CN2019070584W WO2020118817A1 WO 2020118817 A1 WO2020118817 A1 WO 2020118817A1 CN 2019070584 W CN2019070584 W CN 2019070584W WO 2020118817 A1 WO2020118817 A1 WO 2020118817A1
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/40—OLEDs integrated with touch screens
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/125—Active-matrix OLED [AMOLED] displays including organic TFTs [OTFT]
Definitions
- the invention relates to the field of display technology, in particular to an OLED display.
- organic light emitting diode organic light emitting diode
- OLED organic light emitting diode
- one solution is to separately manufacture the touch screen and the OLED display screen, and then attach the touch screen to the upper surface of the OLED display screen by optical transparent adhesive to form a complete OLED Touch display; another solution is to make the touch unit above the encapsulation layer of the OLED display, but the touch unit and signal lead settings of these two solutions will increase the thickness or manufacturing process of the OLED touch display , Not conducive to the thinning of OLED touch screen.
- the touch unit and its signal leads increase the thickness or manufacturing process of the OLED touch display, which is not conducive to the technical problem of thinning and thinning of the OLED touch screen.
- An OLED display including:
- a buffer layer provided on the substrate
- a semiconductor layer provided on the buffer layer
- a gate insulating layer provided on the buffer layer and covering the semiconductor layer
- a first metal layer disposed on the gate insulating layer, the first metal layer includes gate metal traces and scan lines;
- An interlayer insulating layer provided on the gate insulating layer and covering the first metal layer;
- a flat layer provided on the interlayer insulating layer and covering the second metal layer;
- a cathode metal layer provided on the pixel definition layer
- the cathode metal layer is provided with a channel located above the pixel definition layer, the channel divides the cathode metal layer into at least two mutually independent sensing electrodes, and each of the sensing electrodes passes through a
- the touch wire is electrically connected to the binding end, and the touch wire is located in a layer below the cathode metal layer.
- the touch wire and the anode are located in the same layer and are independent of each other, the pixel defining layer is provided with a first via, and the sensing electrode passes through the first via and the touch wire Electrical connection.
- the anode metal layer includes the anode and the touch wire, and the touch wire and the anode are made by the same manufacturing process.
- the touch wire and the data line are located in the same layer and are independent of each other.
- the pixel definition layer is provided with a second via penetrating the pixel definition layer and the flat layer, and the sensing electrode The second via hole is electrically connected to the touch wire.
- the second metal layer includes the data line and the touch wire, and the touch wire and the data wire are made by the same manufacturing process.
- the touch wire and the scanning line are located at the same layer and are independent of each other, and the pixel defining layer is provided with a third via hole penetrating the pixel defining layer, the flat layer and the interlayer insulating layer , The sensing electrode is electrically connected to the touch wire through the third via hole.
- the first metal layer includes the scan line and the touch wire, and the touch wire and the scan wire are made by the same manufacturing process.
- At least part of the touch wires includes at least two of the first metal layer, the second metal layer, and the anode metal layer; wherein, one of the touch wires is located at different layers and adjacent metals
- the layers are electrically connected by overlapping holes, and the uppermost metal layer of one of the touch wires and the corresponding sensing electrode are electrically connected by a fourth via hole.
- the touch wire connected to the sensing electrode far from the binding end includes at least two of the first metal layer, the second metal layer, and the anode metal layer.
- the width of the touch wire connected to the sensing electrode is proportional to the distance between the sensing electrode and the binding end.
- the beneficial effects of the present invention are: using the cathode metal layer as the sensing electrode, and at the same time setting the touch wire connecting the sensing electrode and the binding end in the layer below the cathode metal layer, reducing the thickness of the OLED display, thereby enabling the OLED The display is lighter and thinner.
- the touch wire is made of the same material as one or at least two of the anode, the data line and the scanning line, which reduces the production process and the production cost.
- the distance between the touch wire and the binding end Adaptively adjust the width of the touch wires and the number of metal layers to reduce the resistance difference between different touch wires and improve the sensitivity of touch.
- FIG. 1 is a schematic diagram of the distribution of sensing electrodes and binding ends in a specific embodiment of the invention
- FIG. 2 is a schematic structural diagram of an OLED display in Embodiment 1 of the present invention.
- FIG. 3 is a schematic structural diagram of an OLED display in Embodiment 2 of the present invention.
- FIG. 4 is a schematic structural diagram of an OLED display in Embodiment 3 of the present invention.
- FIG. 5 to 7 are schematic structural diagrams of an OLED display in Embodiment 4 of the present invention.
- the present invention is directed to the technical problem that the touch unit and its signal leads increase the thickness or manufacturing process of the OLED touch display screen in the existing OLED display, which is not conducive to the thinning and thinning of the OLED touch screen.
- the present invention can solve the above-mentioned problems.
- the OLED display is an in-cell touch display.
- the OLED display includes a substrate 11, a buffer layer 12, a semiconductor layer 13, a gate insulating layer 14, a first metal layer 15, and an interlayer insulating layer that are sequentially stacked 16.
- the buffer layer 12 is provided on the substrate 11; the semiconductor layer 13 is provided on the buffer layer 12; and the gate insulating layer 14 is provided on the buffer layer 12 and covers the semiconductor layer 13; the first metal layer 15 is provided on the gate insulating layer 14, the first metal layer 15 includes gate metal traces 151 and scanning lines; the interlayer insulating layer 16 is provided on the gate On the electrode insulating layer 14 and covering the first metal layer 15; the second metal layer 17 is disposed on the interlayer insulating layer 16, the second metal layer 17 includes source and drain metal traces 171 and data lines
- the flat layer 18 is provided on the interlayer insulating layer 16 and covers the second metal layer 17; the light-emitting layer includes an anode metal layer 21, a light-emitting material layer 22, and a cathode metal layer 23.
- the OLED display further includes a binding end 30; the cathode metal layer 23 is provided with a partition 191 above the pixel definition layer 19, and the partition 191 divides the cathode metal layer 23 into at least Two mutually independent sensing electrodes 231, each of the sensing electrodes 231 is electrically connected to the binding end 30 through a touch wire 40, the touch wire 40 is located in a layer below the cathode metal layer 23 in.
- the cathode metal layer 23 is used as the sensing electrode 231, and at the same time, the touch wire 40 connecting the sensing electrode 231 and the binding end 30 is arranged in the layer below the cathode metal layer 23 to reduce the thickness of the OLED display, thereby enabling the OLED The display is thinner and lighter.
- the anode metal layer 21 includes an anode, the touch wire 40 and the anode are located in the same layer and are independent of each other; the pixel defining layer 19 is provided with a first via 51, and the sensing electrode 231 The first via 51 is electrically connected to the touch wire 40.
- FIG. 2 only illustrates the position of the first via hole 51.
- the first via hole 51 may be located anywhere under the corresponding sensing electrode 231. List them one by one.
- the anode metal layer 21 includes the anode and the touch wire 40.
- the touch wire 40 and the anode are made by the same manufacturing process.
- the touch wire 40 and the anode are made of the same material and the same process, reducing the manufacturing process, while not increasing the number of additional photomasks, and reducing production costs.
- the width of the touch wire 40 connected to the sensing electrode 231 is proportional to the distance between the sensing electrode 231 and the binding end 30.
- An OLED display differs from the first embodiment only in that the position and material of the touch wire 40 are different.
- the touch wire 40 and the data line are located at the same layer and are independent of each other.
- the pixel definition layer 19 is provided with a second via 52 penetrating the pixel definition layer 19 and the flat layer 18
- the sensing electrode 231 is electrically connected to the touch wire 40 through the second via 52.
- the second metal layer 17 includes the data line and the touch wire 40.
- the touch wire 40 and the data wire are made by the same manufacturing process.
- An OLED display differs from the first embodiment only in that the position and material of the touch wire 40 are different.
- the touch wire 40 and the scan line are located at the same layer and are independent of each other.
- the pixel definition layer 19 is provided with a through-pixel definition layer 19, a flat layer 18, and the interlayer insulating layer 16
- the third via 53, the sensing electrode 231 is electrically connected to the touch wire 40 through the third via 53.
- the first metal layer 15 includes the scan line and the touch wire 40, and the touch wire 40 and the scan wire are made by the same manufacturing process.
- An OLED display as shown in FIGS. 5 to 7, is different from the first embodiment only in that the position and material of the touch wire 40 are different.
- At least part of the touch wires 40 includes at least two of the first metal layer 15, the second metal layer 17, and the anode metal layer 21, that is, at least part of the touch wires 40 is formed by the first At least two of the metal layer 15, the second metal layer 17, and the anode metal layer 21 are made.
- one of the touch wires 40 is located at different layers and adjacent metal layers are electrically connected through the overlapping holes 60, and the one of the touch wires 40 is located at the uppermost metal layer and the corresponding sensing electrode
- the 231 is electrically connected through the fourth via 54.
- Some touch wires 40 are composed of multiple metal layers, which reduces the difference in resistance between different touch wires 40 and improves the sensitivity of touch.
- the touch wire 40 connected to the sensing electrode 231 away from the binding end 30 includes at least two of the first metal layer 15, the second metal layer 17 and the anode metal layer 21.
- FIG. 5 illustrates the case where all the touch wires 40 are composed of the second metal layer 17 and the anode metal layer 21;
- FIG. 6 illustrates that in the touch wires 40, some of the touch wires 40 are composed of The second metal layer 17 and the anode metal layer 21 are formed, and part of the touch wire 40 is composed of the anode metal layer 21;
- FIG. 7 illustrates the touch wire 40, and part of the touch wire 40 is composed of the first metal layer 15.
- the second metal layer 17 and the anode metal layer 21 are formed, and some of the touch wires 40 are composed of the anode metal layer 21.
- the touch wire 40 may also be composed of the other three or both of the first metal layer 15, the second metal layer 17, and the anode metal layer 21 or One is formed, not listed here one by one.
- the beneficial effects of the present invention are: using the cathode metal layer 23 as the sensing electrode 231, and at the same time setting the touch wire 40 connecting the sensing electrode 231 and the binding end 30 in the layer below the cathode metal layer 23, reducing the OLED display Thickness, so that the OLED display is lighter and thinner.
- the touch wire 40 is made of the same material as one or at least two of the anode, the data line, and the scan line, which reduces the production process and the production cost.
- the distance between the wire 40 and the binding end 30 can adaptively adjust the width of the touch wire 40 and the number of metal layers to reduce the difference in resistance between different touch wires 40 and enhance the sensitivity of touch.
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Abstract
一种OLED显示器,包括基板(11)以及平坦层(18),平坦层(18)上设置有像素定义层(19)和阴极金属层(23);其中,所述OLED显示器还包括绑定端(30);阴极金属层(23)上设置有位于像素定义层(19)上方的隔道(191),隔道(191)将阴极金属层(23)分割为至少两个相互独立的感应电极(231),每个感应电极(231)通过一触控导线(40)与绑定端(30)电性连接,触控导线(40)位于阴极金属层(23)下方的层别中。
Description
本发明涉及显示技术领域,尤其涉及一种OLED显示器。
目前,有机发光二极管(organic light emitting diode, OLED)显示器作为用于显示图像的显示设备已备受关注,OLED显示器具有自发光特性,并且不采用单独的光源,因此可以被制造的比采用单独光源的显示设备薄和轻。
目前现有技术中,为实现OLED显示器的触控功能,一种方案是将触摸屏与OLED显示屏均单独制作,然后通过光学透明胶将触摸屏贴合在OLED显示屏的上表面以形成完整的OLED触控显示屏;另一种方案是将触控单元制作在OLED显示屏的封装层上方,但这两种方案的触控单元及其信号引线设置会增加OLED触控显示屏的厚度或制造工序,不利于OLED触控屏的轻薄化。
OLED显示器中,触控单元及其信号引线会增加OLED触控显示屏的厚度或制造工序,不利于OLED触控屏的轻薄化的技术问题。
一种OLED显示器,包括:
基板;
设置在所述基板上的缓冲层;
设置在所述缓冲层上的半导体层;
设置在所述缓冲层上且覆盖所述半导体层的栅极绝缘层;
设置在所述栅极绝缘层上的第一金属层,所述第一金属层包括栅极金属走线和扫描线;
设置在所述栅极绝缘层上且覆盖所述第一金属层上的层间绝缘层;
设置在所述层间绝缘层上的第二金属层,所述第二金属层包括源漏金属走线和数据线;
设置在所述层间绝缘层上且覆盖所述第二金属层的平坦层;
设置在所述平坦层上的阳极金属层和像素定义层,所述阳极金属层包括阳极;
设置在所述像素定义层上的阴极金属层;以及
绑定端;
其中,所述阴极金属层上设置有位于所述像素定义层上方的隔道,所述隔道将所述阴极金属层分割为至少两个相互独立的感应电极,每个所述感应电极通过一触控导线与绑定端电性连接,所述触控导线位于所述阴极金属层下方的层别中。
进一步的,所述触控导线与所述阳极位于同一层别且相互独立,所述像素定义层上设置有第一过孔,所述感应电极通过所述第一过孔与所述触控导线电性连接。
进一步的,所述阳极金属层包括所述阳极和所述触控导线,所述触控导线与所述阳极通过同一道制程制成。
进一步的,所述触控导线与所述数据线位于同一层别且相互独立,所述像素定义层上设置有贯穿所述像素定义层和所述平坦层的第二过孔,所述感应电极通过所述第二过孔与所述触控导线电性连接。
进一步的,所述第二金属层包括所述数据线和所述触控导线,所述触控导线与所述数据线通过同一道制程制成。
进一步的,所述触控导线与所述扫描线位于同一层别且相互独立,所述像素定义层上设置有贯穿所述像素定义层、平坦层以及所述层间绝缘层的第三过孔,所述感应电极通过所述第三过孔与所述触控导线电性连接。
进一步的,所述第一金属层包括所述扫描线和所述触控导线,所述触控导线与所述扫描线通过同一道制程制成。
进一步的,至少部分所述触控导线包括所述第一金属层、第二金属层和阳极金属层中的至少两者;其中,一条所述触控导线中位于不同层别且相邻的金属层之间通过搭接孔电性连接,一条所述触控导线中位于最上层的金属层与对应的感应电极之间通过第四过孔电性连接。
进一步的,远离所述绑定端的所述感应电极所连接的触控导线包括所述第一金属层、第二金属层和所述阳极金属层中的至少两者。
进一步的,所述感应电极所连接的触控导线的宽度与所述感应电极和所述绑定端之间的距离成正比。
本发明的有益效果为:利用阴极金属层充当感应电极,同时将连接感应电极与绑定端的触控导线设置在所述阴极金属层下方的层别中,减小OLED显示器的厚度,从而使OLED显示器更加轻薄化,同时触控导线与阳极、数据线和扫描线中的一者或至少两者同材料同工序制成,减少生产工序,降低生产成本,同时根据触控导线与绑定端的距离,适应性调整触控导线的宽度和金属层的数量,减小不同触控导线之间的电阻差异,提升触控的灵敏性。
为了更清楚地说明实施例或现有技术中的技术方案,下面将对实施例或现有技术描述中所需要使用的附图作简单介绍,显而易见地,下面描述中的附图仅仅是发明的一些实施例,对于本领域普通技术人员来讲,在不付出创造性劳动的前提下,还可以根据这些附图获得其他的附图。
图1为本发明具体实施方式中感应电极与绑定端的分布示意图;
图2为本发明实施例一中OLED显示器的结构示意图;
图3为本发明实施例二中OLED显示器的结构示意图;
图4为本发明实施例三中OLED显示器的结构示意图;
图5至图7为本发明实施例四中OLED显示器的结构示意图。
附图标记:
11、基板;12、缓冲层;13、半导体层;14、栅极绝缘层;15、第一金属层;151、栅极金属走线;16、层间绝缘层;17、第二金属层;171、源漏金属走线;18、平坦层;19、像素定义层;191、隔道;21、阳极金属层;22、发光材料层;23、阴极金属层;231、感应电极;30、绑定端;40、触控导线;51、第一过孔;52、第二过孔;53、第三过孔;54、第四过孔;60、搭接孔。
以下各实施例的说明是参考附加的图示,用以例示本发明可用以实施的特定实施例。本发明所提到的方向用语,例如[上]、[下]、[前]、[后]、[左]、[右]、[内]、[外]、[侧面]等,仅是参考附加图式的方向。因此,使用的方向用语是用以说明及理解本发明,而非用以限制本发明。在图中,结构相似的单元是用以相同标号表示。
本发明针对现有的OLED显示器中,触控单元及其信号引线会增加OLED触控显示屏的厚度或制造工序,不利于OLED触控屏的轻薄化的技术问题,本发明可以解决上述问题。
需要说明的是,本实施方案中,OLED显示器为内嵌式触控显示器。
实施例一:
一种OLED显示器,如图1和图2所示,所述OLED显示器包括依次层叠设置的基板11、缓冲层12、半导体层13、栅极绝缘层14、第一金属层15、层间绝缘层16、第二金属层17以及平坦层18,所述平坦层18上设置有像素定义层19和发光层。
其中,所述缓冲层12设置在所述基板11上;所述半导体层13设置在所述缓冲层12上;所述栅极绝缘层14设置在所述缓冲层12上且覆盖所述半导体层13;所述第一金属层15设置在所述栅极绝缘层14上,所述第一金属层15包括栅极金属走线151和扫描线;所述层间绝缘层16设置在所述栅极绝缘层14上且覆盖所述第一金属层15;所述第二金属层17设置在所述层间绝缘层16上,所述第二金属层17包括源漏金属走线171和数据线;所述平坦层18设置在所述层间绝缘层16上且覆盖所述第二金属层17;所述发光层包括阳极金属层21、发光材料层22和阴极金属层23。
其中,所述OLED显示器还包括绑定端30;所述阴极金属层23上设置有位于所述像素定义层19上方的隔道191,所述隔道191将所述阴极金属层23分割为至少两个相互独立的感应电极231,每个所述感应电极231通过一触控导线40与所述绑定端30电性连接,所述触控导线40位于所述阴极金属层23下方的层别中。
利用阴极金属层23充当感应电极231,同时将连接感应电极231与绑定端30的触控导线40设置在所述阴极金属层23下方的层别中,减小OLED显示器的厚度,从而使OLED显示器更加轻薄化。
具体的,所述阳极金属层21包括阳极,所述触控导线40与所述阳极位于同一层别且相互独立;所述像素定义层19上设置有第一过孔51,所述感应电极231通过所述第一过孔51与所述触控导线40电性连接。
需要说明的是,图2中仅示意了一种第一过孔51的位置情况,在具体实施中,所述第一过孔51可位于对应的感应电极231的下方的任意处,在此不一一列举。
进一步的,所述阳极金属层21包括所述阳极和所述触控导线40,所述触控导线40与所述阳极通过同一道制程制成。将触控导线40与阳极通过同材料和同工序制成,减少制造工序,同时不增加额外的光罩数量,降低生产成本。
进一步的,所述感应电极231所连接的触控导线40的宽度与所述感应电极231和所述绑定端30之间的距离成正比。
所述感应电极231与所述绑定端30的距离越大,所述感应电极231连接的触控导线40的宽度越大,减小不同触控导线40之间的电阻差异,提升触控的灵敏性。
实施例二:
一种OLED显示器,如图3所示,其与实施例一的不同之处仅在于触控导线40的位置和材料不同。
具体的,所述触控导线40与所述数据线位于同一层别且相互独立,所述像素定义层19上设置有贯穿所述像素定义层19和所述平坦层18的第二过孔52,所述感应电极231通过所述第二过孔52与所述触控导线40电性连接。
其中,所述第二金属层17包括所述数据线和所述触控导线40,所述触控导线40与所述数据线通过同一道制程制成。
实施例三:
一种OLED显示器,如图4所示,其与实施例一的不同之处仅在于触控导线40的位置和材料不同。
具体的,所述触控导线40与所述扫描线位于同一层别且相互独立,所述像素定义层19上设置有贯穿所述像素定义层19、平坦层18以及所述层间绝缘层16的第三过孔53,所述感应电极231通过所述第三过孔53与所述触控导线40电性连接。
其中,所述第一金属层15包括所述扫描线和所述触控导线40,所述触控导线40与所述扫描线通过同一道制程制成。
实施例四:
一种OLED显示器,如图5至图7所示,其与实施例一的不同之处仅在于所述触控导线40的位置和材料不同。
具体的,至少部分所述触控导线40包括所述第一金属层15、第二金属层17和阳极金属层21中的至少两者,即至少部分所述触控导线40由所述第一金属层15、第二金属层17和所述阳极金属层21中的至少两者制成。
其中,一条所述触控导线40中位于不同层别且相邻的金属层之间通过搭接孔60电性连接,一条所述触控导线40中位于最上层的金属层与对应的感应电极231之间通过第四过孔54电性连接。
部分触控导线40由多层金属层构成,减小不同触控导线40之间的电阻差异,提升触控的灵敏性。
进一步的,远离所述绑定端30的所述感应电极231所连接的触控导线40包括所述第一金属层15、第二金属层17和所述阳极金属层21中的至少两者。
需要说明的是,图5示意了所有所述触控导线40均由第二金属层17和阳极金属层21构成的情况;图6示意了触控导线40中,部分所述触控导线40由第二金属层17和阳极金属层21构成,部分所述触控导线40由阳极金属层21构成的情况;图7示意了触控导线40中,部分所述触控导线40由第一金属层15、第二金属层17和阳极金属层21构成,部分所述触控导线40由阳极金属层21构成的情况。
对于本领域技术人员而言,可以理解的是,在实际实施中,触控导线40还可以由第一金属层15、第二金属层17和阳极金属层21中的其他三者、两者或一者形成,在此不一一列举。
本发明的有益效果为:利用阴极金属层23充当感应电极231,同时将连接感应电极231与绑定端30的触控导线40设置在阴极金属层23下方的层别中,减小OLED显示器的厚度,从而使OLED显示器更加轻薄化,同时触控导线40与阳极、数据线和扫描线中的一者或至少两者同材料同工序制成,减少生产工序,降低生产成本,同时根据触控导线40与绑定端30的距离,适应性调整触控导线40的宽度和金属层的数量,减小不同触控导线40之间的电阻差异,提升触控的灵敏性。
综上所述,虽然本发明已以优选实施例揭露如上,但上述优选实施例并非用以限制本发明,本领域的普通技术人员,在不脱离本发明的精神和范围内,均可作各种更动与润饰,因此本发明的保护范围以权利要求界定的范围为准。
Claims (10)
- 一种OLED显示器,其中,所述OLED显示器包括:基板;设置在所述基板上的缓冲层;设置在所述缓冲层上的半导体层;设置在所述缓冲层上且覆盖所述半导体层的栅极绝缘层;设置在所述栅极绝缘层上的第一金属层,所述第一金属层包括栅极金属走线和扫描线;设置在所述栅极绝缘层上且覆盖所述第一金属层上的层间绝缘层;设置在所述层间绝缘层上的第二金属层,所述第二金属层包括源漏金属走线和数据线;设置在所述层间绝缘层上且覆盖所述第二金属层的平坦层;设置在所述平坦层上的阳极金属层和像素定义层,所述阳极金属层包括阳极;设置在所述像素定义层上的阴极金属层;以及绑定端;其中,所述阴极金属层上设置有位于所述像素定义层上方的隔道,所述隔道将所述阴极金属层分割为至少两个相互独立的感应电极,每个所述感应电极通过一触控导线与绑定端电性连接,所述触控导线位于所述阴极金属层下方的层别中。
- 根据权利要求1所述的OLED显示器,其中,所述触控导线与所述阳极位于同一层别且相互独立,所述像素定义层上设置有第一过孔,所述感应电极通过所述第一过孔与所述触控导线电性连接。
- 根据权利要求2所述的OLED显示器,其中,所述阳极金属层包括所述阳极和所述触控导线,所述触控导线与所述阳极通过同一道制程制成。
- 根据权利要求1所述的OLED显示器,其中,所述触控导线与所述数据线位于同一层别且相互独立,所述像素定义层上设置有贯穿所述像素定义层和所述平坦层的第二过孔,所述感应电极通过所述第二过孔与所述触控导线电性连接。
- 根据权利要求4所述的OLED显示器,其中,所述第二金属层包括所述数据线和所述触控导线,所述触控导线与所述数据线通过同一道制程制成。
- 根据权利要求1所述的OLED显示器,其中,所述触控导线与所述扫描线位于同一层别且相互独立,所述像素定义层上设置有贯穿所述像素定义层、平坦层以及所述层间绝缘层的第三过孔,所述感应电极通过所述第三过孔与所述触控导线电性连接。
- 根据权利要求6所述的OLED显示器,其中,所述第一金属层包括所述扫描线和所述触控导线,所述触控导线与所述扫描线通过同一道制程制成。
- 根据权利要求1所述的OLED显示器,其中,至少部分所述触控导线包括所述第一金属层、第二金属层和阳极金属层中的至少两者;其中,一条所述触控导线中位于不同层别且相邻的金属层之间通过搭接孔电性连接,一条所述触控导线中位于最上层的金属层与对应的感应电极之间通过第四过孔电性连接。
- 根据权利要求8所述的OLED显示器,其中,远离所述绑定端的所述感应电极所连接的触控导线包括所述第一金属层、第二金属层和所述阳极金属层中的至少两者。
- 根据权利要求1所述的OLED显示器,其中,所述感应电极所连接的触控导线的宽度与所述感应电极和所述绑定端之间的距离成正比。
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| CN110164942A (zh) * | 2019-05-31 | 2019-08-23 | 江苏集萃有机光电技术研究所有限公司 | 一种显示面板及其制备方法、显示装置 |
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| CN112230803B (zh) * | 2020-10-28 | 2024-03-15 | 京东方科技集团股份有限公司 | 触控基板及其制备方法、显示装置 |
| CN112947794B (zh) * | 2021-04-16 | 2024-03-12 | 京东方科技集团股份有限公司 | 触控显示面板和显示装置 |
| CN114784020A (zh) * | 2022-04-20 | 2022-07-22 | 华映科技(集团)股份有限公司 | 一种低电阻触控线的像素结构及其制备方法 |
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