WO2020118765A1 - 柔性显示面板及其制作方法 - Google Patents
柔性显示面板及其制作方法 Download PDFInfo
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- WO2020118765A1 WO2020118765A1 PCT/CN2018/123261 CN2018123261W WO2020118765A1 WO 2020118765 A1 WO2020118765 A1 WO 2020118765A1 CN 2018123261 W CN2018123261 W CN 2018123261W WO 2020118765 A1 WO2020118765 A1 WO 2020118765A1
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- display panel
- flexible
- flexible substrate
- ultraviolet light
- light absorbing
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K77/00—Constructional details of devices covered by this subclass and not covered by groups H10K10/80, H10K30/80, H10K50/80 or H10K59/80
- H10K77/10—Substrates, e.g. flexible substrates
- H10K77/111—Flexible substrates
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/549—Organic PV cells
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Definitions
- the invention relates to the field of display technology, in particular to a flexible display panel and a manufacturing method thereof.
- OLED Organic Light Emitting Diode
- OLED display technology is different from traditional liquid crystal display technology. It does not require a backlight, and uses a very thin organic material coating and glass substrate. When a current passes, these organic materials will emit light. However, because organic materials are easy to react with water vapor or oxygen, as a display device based on organic materials, OLED display screens have very high requirements for packaging. Therefore, the sealing of the OLED device is improved by the packaging of the OLED device, as much as possible with the external environment Isolation is essential for the stable light emission of OLED devices.
- Flexible OLED display adopts flexible substrate (Flexible Substrate) flexible display devices, usually using flexible polyimide (Polyimide, PI) substrate.
- OLED display panel completes Array and Emission layer on glass substrate Layer) process, began to enter the LLO section, the specific principle is that the bottom glass substrate is irradiated by laser, so that the van der Waals force between the glass substrate and the flexible PI substrate is reversely broken, weakening the force between the glass and the flexible PI substrate, Therefore, the purpose of peeling off the flexible OLED display panel from the glass substrate is achieved.
- the principle of the LLO process is: using a 308nm laser to irradiate the glass surface, this energy causes the van der Waals force between the Glass and PI layers to fracture retrogradely, thereby losing the viscosity, and then achieving the separation between Glass and PI.
- the disadvantage of this method is that because PI has almost no absorption at 308nm wavelength, the laser energy will directly penetrate the buffer layer and be transmitted to the thin film transistor (Thin Film Transistor (TFT) structure, causing burns and affecting the display effect of the device.
- TFT Thin Film Transistor
- an existing solution is used to prevent the ultraviolet light from damaging the superstructure by doping the buffer layer on the flexible substrate with a material having ultraviolet absorption capability.
- One of the solutions is to use titanium oxide (TiO 2 ) particles as ultraviolet absorbing materials.
- TiO 2 titanium oxide
- the introduction of this "solid" material will inevitably lead to an increase in the thickness of the OLED device, which is contrary to the trend of thinning and thinning of the display panel.
- the object of the present invention is to provide a flexible display panel, which can effectively improve the yield of the LLO process of the flexible display panel, and is conducive to the thinning of the flexible display panel.
- the purpose of the present invention is to provide a method for manufacturing a flexible display panel, which can effectively improve the yield of the LLO process of the flexible display panel, and is conducive to the thinning of the flexible display panel.
- the present invention provides a flexible display panel, including a flexible substrate and a display function layer provided on the flexible substrate;
- the flexible substrate contains ultraviolet light absorbing particles, and the material of the ultraviolet light absorbing particles is a metal organic framework compound.
- the ultraviolet light absorbing particles are titanium-containing metal organic framework compounds.
- the particle size of the ultraviolet light absorbing particles is 500-700nm
- the specific surface area of the ultraviolet light absorbing particles is greater than 1000 m 2 ⁇ g -1 .
- the maximum absorption light wavelength of the metal organic framework compound is 280-320 nm.
- the flexible substrate is a polyimide substrate
- the display function layer includes a buffer layer, a TFT layer, an OLED layer, and a thin-film encapsulation layer that are sequentially stacked on the flexible substrate.
- the invention also provides a method for manufacturing a flexible display panel, including the following steps:
- Step S1 providing a glass substrate, coating on the glass substrate to form a flexible substrate;
- the flexible substrate contains ultraviolet light absorbing particles, and the material of the ultraviolet light absorbing particles is a metal organic framework compound;
- Step S2 forming a display function layer on the flexible substrate
- Step S3 Using a laser to scan the glass substrate side of the flexible substrate to separate the flexible substrate from the glass substrate, and peeling off the flexible substrate from the glass substrate.
- the ultraviolet light absorbing particles are titanium-containing organic framework compounds.
- the particle size of the ultraviolet light absorbing particles is 500-700nm
- the specific surface area of the ultraviolet light absorbing particles is greater than 1000 m 2 ⁇ g -1 .
- the maximum absorption light wavelength of the metal organic framework compound is 280-320nm
- the wavelength of the laser used in step S3 is 308 nm.
- the flexible substrate formed in the step S1 is a polyimide substrate
- the display function layer formed in the step S2 includes a buffer layer, a TFT layer, an OLED layer and a thin-film encapsulation layer that are sequentially stacked on the flexible substrate.
- a flexible display panel provided by the present invention includes a flexible substrate and a display function layer provided on the flexible substrate.
- the flexible substrate contains ultraviolet light absorbing particles of a metal organic framework compound, and the ultraviolet light absorbs
- the particles can absorb the excess laser energy in the LLO process to prevent the excess laser energy in the LLO process from burning the display function layer on the flexible substrate, which can effectively improve the LLO process yield of the flexible display panel, reduce production costs, and have a large ratio
- the surface area of the metal organic framework compound can form a huge contact surface between the ultraviolet light absorbing particles and the laser, so that it can achieve a better ultraviolet laser absorption effect without increasing the thickness of the flexible substrate, which is conducive to the thinness of the flexible display panel Change.
- the present invention provides a method for manufacturing a flexible display panel, which is doped with ultraviolet light absorbing particles of a metal organic framework compound in a flexible substrate, the ultraviolet light absorbing particles can absorb excess laser energy in the LLO process and prevent the LLO process Excessive laser energy burns the display function layer on the flexible substrate, which can effectively improve the LLO process yield of the flexible display panel and reduce production costs, and the metal-organic framework compound with a large specific surface area can make ultraviolet light absorb particles and lasers. A huge contact surface is formed between them, so that a good ultraviolet laser absorption effect can be achieved without increasing the thickness of the flexible substrate, which is beneficial to the thinning and thinning of the flexible display panel.
- FIG. 1 is a schematic structural diagram of a flexible display panel of the present invention
- FIG. 2 is a schematic flowchart of a method for manufacturing a flexible display panel of the present invention
- step S1 of the method for manufacturing a flexible display panel of the present invention is a schematic diagram of step S1 of the method for manufacturing a flexible display panel of the present invention
- step S2 is a schematic diagram of step S2 of the method for manufacturing a flexible display panel of the present invention.
- 5-6 are schematic diagrams of step S3 of the method for manufacturing a flexible display panel of the present invention.
- the present invention first provides a flexible display panel, including a flexible substrate 10 And on flexible substrate 10 Display function layer 20 ;
- the flexible substrate 10 Contains metal-organic framework compounds for absorbing ultraviolet light ( Metal-organic framework , MOF ) UV-absorbing particles 15 ,
- the metal organic framework compound is a porous polymer material with a large specific surface area, so MOF The material's large specific surface area allows ultraviolet light to absorb particles 15 Able to provide a huge contact surface to contact with the laser, so that the flexible substrate 10 Ultraviolet light absorbing particles doped with less metal organic framework compounds 15 At the same time, it can also effectively absorb LLO The excess UV light in the process, and the traditional "solid" UV absorbing materials (such as TiO 2 ) Compared to the UV-absorbing particles of the metal organic framework compound 15 On flexible substrate 10 The introduction of the internal can ensure the thinness of the flexible display panel while ensuring LLO Yield of the craft.
- the ultraviolet absorption particles of the metal organic framework compound 15 Has a specific surface area greater than 1000m 2 ⁇ g -1 .
- the maximum absorption light wavelength of the metal organic framework compound is 280-320nm .
- the material is an organic framework compound containing titanium metal ( Ti-contained metal-organic framework , Ti-MOF ).
- the titanium-containing metal organic framework compound is obtained by reacting bis(acetylacetonyl) diisopropyl titanate with terephthalic acid under appropriate conditions.
- the particle size of the titanium-containing metal organic framework compound particles is 500-700nm , Its specific surface area ( Brunauer-Emmett-Teller , BET ) Up to 1364m 2 ⁇ g -1 , And because of titanium ( Ti )
- BET Brunauer-Emmett-Teller
- Ti titanium-containing organic framework compound
- 300nm It has excellent ultraviolet absorption capacity at the left and right, and LLO Laser wavelength used in the process ( 308nm ) To match.
- the flexible substrate 10 For polyimide ( PI ) Substrate.
- the display function layer 20 Including sequentially stacked on the flexible substrate 10 Buffer layer twenty one , TFT Floor twenty two , OLED Floor twenty three And film encapsulation twenty four .
- the buffer layer twenty one Is silicon nitride ( SiNx ) Layer, silicon oxide ( SiOx ) Stack of layers or both.
- the TFT Floor twenty two Used for the OLED Floor twenty three Row drive including multiple arrays TFT Device
- the TFT The device is low temperature polysilicon ( Low Temperature Poly-silicon , LTPS ) Type, or metal oxide semiconductor ( Metal-Oxide Semiconductor , MOS ) Type, such as indium gallium zinc oxide (IGZO ) Of metal oxide semiconductor type.
- the OLED Floor twenty three Including set in the TFT Floor twenty two The first electrode layer on the TFT Floor twenty two And a pixel definition layer on the first electrode layer, an organic functional layer provided on the first electrode layer, and a second electrode layer (not shown) provided on the pixel definition layer and the organic functional layer.
- the pixel definition layer surrounds a plurality of pixel openings arranged in an array on the first electrode layer; the organic functional layer is disposed in the pixel opening; the organic functional layer in each pixel opening, the corresponding An electrode layer and the corresponding second electrode layer above constitute a OLED Device.
- the first electrode layer and the second electrode layer are used as OLED
- the organic functional layer includes a hole injection layer, a hole transport layer, a light emitting layer, an electron transport layer, and an electron injection layer that are sequentially arranged from bottom to top.
- the thin film encapsulation layer twenty four It includes an inorganic barrier layer and an organic buffer layer (not shown) that are stacked.
- the flexible display panel and flexible substrate of the present invention 10 Ultraviolet light absorbing particles containing metal organic framework compound for absorbing ultraviolet light 15 ,
- the ultraviolet light absorbing particles 15 Able to LLO Absorb excess laser energy during the process to prevent LLO Excess laser energy burns the flexible substrate during the process 10 Display function layer 20 ,
- Which can effectively improve the flexible display panel LLO Process yield, reduce production costs, and metal-organic framework compounds with large specific surface area can make ultraviolet light absorb particles 15 Form a huge contact surface with the laser, so as not to increase the flexible substrate 10 In the case of thickness, it can also achieve a better ultraviolet laser absorption effect, which is conducive to the thinning of the flexible display panel.
- the present invention also provides a method for manufacturing a flexible display panel, which includes the following steps:
- step S1 As shown 3 As shown, a glass substrate is provided 50 , In the glass substrate 50 Coated to form a flexible substrate 10 .
- the flexible substrate 10 Ultraviolet light absorbing particles containing metal organic framework compound for absorbing ultraviolet light 15 , MOF
- the material's large specific surface area allows ultraviolet light to absorb particles 15 Able to provide a huge contact surface to contact with the laser, so that the flexible substrate 10 Less doped MOF UV-absorbing particles 15 At the same time, it can also effectively absorb LLO The excess UV light in the process, and the traditional "solid" UV absorbing materials (such as TiO 2 ) Compared to the MOF UV-absorbing particles 15
- the introduction of the internal can ensure the thinness of the flexible display panel while ensuring LLO Yield of the craft.
- the ultraviolet light absorbing particles 15 Has a specific surface area greater than 1000m 2 ⁇ g -1 .
- the maximum absorption light wavelength of the metal organic framework compound is 280-320nm .
- the flexible substrate 10 It is a polyimide substrate.
- the ultraviolet light absorbing particles 15 It is a titanium-containing organic framework compound.
- the titanium-containing metal organic framework compound is obtained by reacting bis(acetylacetonyl) diisopropyl titanate with terephthalic acid under appropriate conditions.
- the particle size of the titanium-containing metal organic framework compound particles is 500-700nm , Its specific surface area can be as high as 1364m 2 ⁇ g -1 , And due to the presence of titanium element, the titanium-containing metal organic framework compound in 300nm It has excellent ultraviolet absorption capacity at the left and right LLO Laser wavelength used in the process ( 308nm ) To match.
- step S2 As shown 4 As shown in the flexible substrate 10 Display function layer 20 .
- the steps S2 Display function layer 20 Including sequentially stacked on the flexible substrate 10 Buffer layer twenty one , TFT Floor twenty two , OLED Floor twenty three And film encapsulation twenty four .
- the buffer layer twenty one It is a silicon nitride layer, a silicon oxide layer, or a stack combination of the two.
- the steps S2 Formed in TFT Floor twenty two Used for the OLED Floor twenty three Row drive, including multiple arrays TFT Device, the TFT The device is a low-temperature polysilicon type or a metal oxide semiconductor type, such as a metal oxide semiconductor type of indium gallium zinc oxide.
- the OLED Floor twenty three Including set in the TFT Floor twenty two The first electrode layer on the TFT Floor twenty two And a pixel definition layer on the first electrode layer, an organic functional layer provided on the first electrode layer, and a second electrode layer (not shown) provided on the pixel definition layer and the organic functional layer.
- the pixel definition layer surrounds a plurality of pixel openings arranged in an array on the first electrode layer; the organic functional layer is disposed in the pixel opening; the organic functional layer in each pixel opening, the corresponding An electrode layer and the corresponding second electrode layer above constitute a OLED Device.
- the first electrode layer and the second electrode layer are used as OLED
- the anode and the cathode of the device; the organic functional layer includes a hole injection layer, a hole transport layer, a light emitting layer, an electron transport layer, and an electron injection layer arranged in this order from bottom to top.
- the thin film encapsulation layer twenty four It includes an inorganic barrier layer and an organic buffer layer (not shown) that are stacked.
- step S3 As shown 5-6 As shown, the laser is applied to the flexible substrate 10 Glass substrate 50 Scan one side to make the flexible substrate 10 With glass substrate 50 Separate the flexible substrate 10 From glass substrate 50 Peel off.
- the wavelength of the laser used in is 308nm .
- the manufacturing method of the flexible display panel of the present invention 10 Ultraviolet light absorbing particles doped with metal organic framework compounds for absorbing ultraviolet light 15 ,
- the ultraviolet light absorbing particles 15 Able to LLO Absorb excess laser energy during the process to prevent LLO Excess laser energy burns the flexible substrate during the process 10 Display function layer 20 ,
- Which can effectively improve the flexible display panel LLO Process yield, reduce production costs, and metal-organic framework compounds with large specific surface area can make ultraviolet light absorb particles 15 Form a huge contact surface with the laser, so as not to increase the flexible substrate 10 In the case of thickness, it can also achieve a better ultraviolet laser absorption effect, which is conducive to the thinning of the flexible display panel.
- the present invention provides a flexible display panel, which includes a flexible substrate and a display function layer provided on the flexible substrate, the flexible substrate contains ultraviolet light absorbing particles of a metal organic framework compound, the ultraviolet light absorbing particles Able to LLO Absorb excess laser energy during the process to prevent LLO Excess laser energy in the process burns the display function layer on the flexible substrate, which can effectively improve the flexible display panel LLO Process yield, reduce production costs, and metal-organic framework compounds with large specific surface area can make a huge contact surface between ultraviolet light absorbing particles and laser, so that it can achieve better without increasing the thickness of the flexible substrate
- the ultraviolet laser absorption effect is conducive to the thinning of the flexible display panel.
- the present invention provides a method for manufacturing a flexible display panel.
- the ultraviolet light absorbing particles can LLO Absorb excess laser energy during the process to prevent LLO Excess laser energy in the process burns the display function layer on the flexible substrate, which can effectively improve the flexible display panel LLO Process yield, reduce production costs, and metal-organic framework compounds with large specific surface area can make a huge contact surface between ultraviolet light absorbing particles and laser, so that it can achieve better without increasing the thickness of the flexible substrate
- the ultraviolet laser absorption effect is conducive to the thinning of the flexible display panel.
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Abstract
一种柔性显示面板及其制作方法。柔性显示面板包括柔性基板(10)及设于柔性基板(10)上的显示功能层(20)，柔性基板(10)内含有金属有机骨架化合物(MOF)的紫外光吸收粒子(15)，紫外光吸收粒子(15)能够将LLO制程中多余的激光能量吸收，防止LLO制程中多余的激光能量灼伤柔性基板上的显示功能层(20)，从而可有效提升柔性显示面板的LLO工艺良率，降低生产成本，且具有超大比表面积的金属有机骨架化合物(MOF)能够使紫外光吸收粒子与激光之间形成巨大接触面，从而在不增加柔性基板(10)厚度的情况下，也能够达到较好的紫外激光吸收效果，有利于柔性显示面板的轻薄化。
Description
本发明涉及显示技术领域，尤其涉及一种柔性显示面板及其制作方法。
有机发光二极管 ( Organic Light Emitting Diode，OLED ) 显示器具有自发光、驱动电压低、发光效率高、响应时间短、清晰度与对比度高、近180°视角、使用温度范围宽、可实现柔性显示与大面积全色显示等诸多优点，被业界公认为是最有发展潜力的显示装置。
OLED显示技术与传统的液晶显示技术不同，无需背光灯，采用非常薄的有机材料涂层和玻璃基板，当有电流通过时，这些有机材料就会发光。但是由于有机材料易与水汽或氧气反应，作为基于有机材料的显示设备，OLED显示屏对封装的要求非常高，因此，通过OLED器件的封装提高OLED器件内部的密封性，尽可能的与外部环境隔离，对于OLED器件的稳定发光至关重要。
对于OLED器件来说，最具竞争力的优势是能做成柔性器件，这将给器件相关的电子行业带来巨大的改革变化。为了得到柔性OLED器件，首先需要利用柔性基底取代传统的刚性玻璃基底，但从实际操作性考虑，目前行业内首先选择将柔性基底做在刚性玻璃基板表面，待完成所有工艺制程后，再通过激光剥离（Laser
Lift Off，LLO）制程将柔性基底从玻璃基板表面剥离，从而实现制备柔性OLED器件的目的。通过上述描述可以发现，LLO工艺是柔性OLED器件生产中的关键工艺，如何有效地提升该工艺的良率极为关键。
柔性OLED显示器是采用柔性基板（Flexible
Substrate）制成的可弯曲显示设备，通常采用柔性聚酰亚胺（Polyimide ，PI）基板。OLED显示面板在玻璃基板上完成阵列（Array）及发光层（Emission
Layer）制程后，开始进入LLO工段，其具体原理是通过激光照射底部玻璃基板，让与玻璃基板与柔性PI基板之间的范德华力反生断裂，弱化玻璃与柔性PI基板之间的作用力，从而到达将柔性OLED显示面板从玻璃基板上剥离下来的目的。
LLO制程的原理是：利用308nm激光对玻璃表面进行照射，该能量使得Glass与PI层之间的范德华力反生断裂，从而失去粘性，进而实现Glass与PI之间的分离。该方法的不足之处在于：由于PI对308nm波长的光几乎无吸收，激光能量将直接穿透缓冲层，传导至薄膜晶体管（Thin
Film Transistor，TFT）结构，对其造成灼伤，影响器件的显示效果。
为了解决以上问题，现有一种方案通过将具有紫外吸收能力的材料掺杂于柔性基板上的缓冲层中，用来防范多余紫外光对上层结构可能造成的灼伤。其中一种方案是使用氧化钛（TiO
2）颗粒作为紫外吸收材料。但是该“实心”材料的引入必然会导致OLED器件的厚度增加，这与显示面板轻薄化的趋势相背离。
本发明的目的在于提供一种柔性显示面板，可有效提升柔性显示面板的LLO工艺良率，有利于柔性显示面板的轻薄化。
本发明的目的在于提供一种柔性显示面板的制作方法，可有效提升柔性显示面板的LLO工艺良率，有利于柔性显示面板的轻薄化。
为实现上述目的，本发明提供一种柔性显示面板，包括柔性基板及设于柔性基板上的显示功能层；
所述柔性基板内含有紫外光吸收粒子，所述紫外光吸收粒子的材料为金属有机骨架化合物。
所述紫外光吸收粒子为含钛金属有机骨架化合物。
所述紫外光吸收粒子的粒径为500-700nm；
所述紫外光吸收粒子的比表面积大于1000m
2·g
-1。
所述金属有机骨架化合物的最大吸收光波长为280-320nm。
所述柔性基板为聚酰亚胺基板；
所述显示功能层包括依次层叠设于所述柔性基板上的缓冲层、TFT层、OLED层及薄膜封装层。
本发明还提供一种柔性显示面板的制作方法，包括如下步骤：
步骤S1、提供玻璃基板，在所述玻璃基板上涂布形成柔性基板；
所述柔性基板内含有紫外光吸收粒子，所述紫外光吸收粒子的材料为金属有机骨架化合物；
步骤S2、在所述柔性基板上形成显示功能层；
步骤S3、采用激光对柔性基板的玻璃基板一侧进行扫描，使所述柔性基板与玻璃基板分离，将所述柔性基板从玻璃基板上剥离下来。
所述步骤S1中，所述紫外光吸收粒子为含钛金属有机骨架化合物。
所述紫外光吸收粒子的粒径为500-700nm；
所述紫外光吸收粒子的比表面积大于1000m
2·g
-1。
所述金属有机骨架化合物的最大吸收光波长为280-320nm；
所述步骤S3中所采用的激光的波长为308nm。
所述步骤S1中所形成的柔性基板为聚酰亚胺基板；
所述步骤S2中所形成的显示功能层包括依次层叠设于所述柔性基板上的缓冲层、TFT层、OLED层及薄膜封装层。
本发明的有益效果：本发明提供的一种柔性显示面板，包括柔性基板及设于柔性基板上的显示功能层，所述柔性基板内含有金属有机骨架化合物的紫外光吸收粒子，该紫外光吸收粒子能够将LLO制程中多余的激光能量吸收，防止LLO制程中多余的激光能量灼伤柔性基板上的显示功能层，从而可有效提升柔性显示面板的LLO工艺良率，降低生产成本，且具有超大比表面积的金属有机骨架化合物能够使紫外光吸收粒子与激光之间形成巨大接触面，从而在不增加柔性基板厚度的情况下，也能够达到较好的紫外激光吸收效果，有利于柔性显示面板的轻薄化。本发明提供的一种柔性显示面板的制作方法，通过在柔性基板中掺杂有金属有机骨架化合物的紫外光吸收粒子，该紫外光吸收粒子能够将LLO制程中多余的激光能量吸收，防止LLO制程中多余的激光能量灼伤柔性基板上的显示功能层，从而可有效提升柔性显示面板的LLO工艺良率，降低生产成本，且具有超大比表面积的金属有机骨架化合物能够使紫外光吸收粒子与激光之间形成巨大接触面，从而在不增加柔性基板厚度的情况下，也能够达到较好的紫外激光吸收效果，有利于柔性显示面板的轻薄化。
为了能更进一步了解本发明的特征以及技术内容，请参阅以下有关本发明的详细说明与附图，然而附图仅提供参考与说明用，并非用来对本发明加以限制。
下面结合附图，通过对本发明的具体实施方式详细描述，将使本发明的技术方案及其它有益效果显而易见。
附图中，
图1为本发明柔性显示面板的结构示意图；
图2为本发明柔性显示面板的制作方法的流程示意图；
图3为本发明柔性显示面板的制作方法的步骤S1的示意图；
图4为本发明柔性显示面板的制作方法的步骤S2的示意图；
图5-6为本发明柔性显示面板的制作方法的步骤S3的示意图。
为更进一步阐述本发明所采取的技术手段及其效果，以下结合本发明的优选实施例及其附图进行详细描述。
请参阅图
1
，本发明首先提供一种柔性显示面板，包括柔性基板
10
及设于柔性基板
10
上的显示功能层
20
；
所述柔性基板
10
内含有用于吸收紫外光的金属有机骨架化合物（
Metal-organic
framework
，
MOF
）的紫外光吸收粒子
15
，金属有机骨架化合物是一种具有超大比表面积的多孔高分子聚合物材料，因此
MOF
材料的超大比表面积使得紫外光吸收粒子
15
能够提供巨大的接触面与激光接触，从而在柔性基板
10
内掺杂较少的金属有机骨架化合物的紫外光吸收粒子
15
的同时，也能有效吸收
LLO
制程中多余的紫外光，与传统的“实心”紫外吸收材料（如
TiO
2
）相比，该金属有机骨架化合物的紫外光吸收粒子
15
在柔性基板
10
内的引入，能够在维持柔性显示面板轻薄的同时，保证
LLO
的工艺良率。
具体地，该金属有机骨架化合物的紫外光吸收粒子
15
的比表面积大于
1000m
2
·
g
-1
。
具体地，所述金属有机骨架化合物的最大吸收光波长为
280-320nm
。
具体地，所述紫外光吸收粒子
15
的材料为含钛金属有机骨架化合物（
Ti-contained
metal-organic framework
，
Ti-MOF
）。
具体地，所述含钛金属有机骨架化合物是由双（乙酰丙酮基）二异丙基钛酸酯与对苯二甲酸在适当条件下反应得到。该含钛金属有机骨架化合物粒子的粒径大小为
500-700nm
，其比表面积（
Brunauer-Emmett-Teller
，
BET
）可高达
1364m
2
·
g
-1
，并由于钛（
Ti
）元素的存在，该含钛金属有机骨架化合物在
300nm
左右处具有优良的紫外吸收能力，与
LLO
制程所用激光波长（
308nm
）相匹配。
具体地，所述柔性基板
10
为聚酰亚胺（
PI
）基板。
具体地，所述显示功能层
20
包括依次层叠设于所述柔性基板
10
上的缓冲层
21
、
TFT
层
22
、
OLED
层
23
及薄膜封装层
24
。
具体地，缓冲层
21
为氮化硅（
SiNx
）层、氧化硅（
SiOx
）层或两者的堆栈组合。
具体地，所述
TFT
层
22
用于对所述
OLED
层
23
行驱动，包括多个阵列排布的
TFT
器件，所述
TFT
器件为低温多晶硅（
Low Temperature Poly-silicon
，
LTPS
）型、或者金属氧化物半导体（
Metal-Oxide
Semiconductor
，
MOS
）型，例如铟镓锌氧化物（
IGZO
）的金属氧化物半导体型。
具体地，所述
OLED
层
23
包括设于所述
TFT
层
22
上的第一电极层、设于所述
TFT
层
22
和第一电极层上的像素定义层、设于第一电极层上的有机功能层、以及设于像素定义层和有机功能层上的第二电极层（未图示）。所述像素定义层在第一电极层上围出多个阵列排布的像素开口；所述有机功能层设于所述像素开口内；每一像素开口内的有机功能层、其下方对应的第一电极层、以及其上方对应的第二电极层共同构成一
OLED
器件。
具体地，所述第一电极层、第二电极层分别用作
OLED
器件的阳极（
Anode
）和阴极（
Cathode
）；所述有机功能层包括由下到上依次设置的空穴注入层、空穴传输层、发光层、电子传输层和电子注入层。
具体地，薄膜封装层
24
包括层叠设置的无机阻挡层和有机缓冲层（未图示）。
本发明的柔性显示面板，柔性基板
10
内含有用于吸收紫外光的金属有机骨架化合物的紫外光吸收粒子
15
，该紫外光吸收粒子
15
能够将
LLO
制程中多余的激光能量吸收，防止
LLO
制程中多余的激光能量灼伤柔性基板
10
上的显示功能层
20
，从而可有效提升柔性显示面板的
LLO
工艺良率，降低生产成本，且具有超大比表面积的金属有机骨架化合物能够使紫外光吸收粒子
15
与激光之间形成巨大接触面，从而在不增加柔性基板
10
厚度的情况下，也能够达到较好的紫外激光吸收效果，有利于柔性显示面板的轻薄化。
基于上述的柔性显示面板，请参阅图
2
，本发明还提供一种柔性显示面板的制作方法，其特征在于，包括如下步骤：
步骤
S1
、如图
3
所示，提供玻璃基板
50
，在所述玻璃基板
50
上涂布形成柔性基板
10
。
所述柔性基板
10
内含有用于吸收紫外光的金属有机骨架化合物的紫外光吸收粒子
15
，
MOF
材料的超大比表面积使得紫外光吸收粒子
15
能够提供巨大的接触面与激光接触，从而在柔性基板
10
内掺杂较少的
MOF
的紫外光吸收粒子
15
的同时，也能有效吸收
LLO
制程中多余的紫外光，与传统的“实心”紫外吸收材料（如
TiO
2
）相比，该
MOF
的紫外光吸收粒子
15
在柔性基板
10
内的引入，能够在维持柔性显示面板轻薄的同时，保证
LLO
的工艺良率。
具体地，所述紫外光吸收粒子
15
的比表面积大于
1000m
2
·
g
-1
。
具体地，所述金属有机骨架化合物的最大吸收光波长为
280-320nm
。
具体地，所述柔性基板
10
为聚酰亚胺基板。
具体地，所述紫外光吸收粒子
15
为含钛金属有机骨架化合物。
具体地，所述含钛金属有机骨架化合物是由双（乙酰丙酮基）二异丙基钛酸酯与对苯二甲酸在适当条件下反应得到。该含钛金属有机骨架化合物粒子的粒径大小为
500-700nm
，其比表面积可高达
1364m
2
·
g
-1
，并由于钛元素的存在，该含钛金属有机骨架化合物在
300nm
左右处具有优良的紫外吸收能力，与后续
LLO
制程所用激光波长（
308nm
）相匹配。
步骤
S2
、如图
4
所示，在所述柔性基板
10
上形成显示功能层
20
。
具体地，所述步骤
S2
中所形成的显示功能层
20
包括依次层叠设于所述柔性基板
10
上的缓冲层
21
、
TFT
层
22
、
OLED
层
23
及薄膜封装层
24
。
具体地，所述缓冲层
21
为氮化硅层、氧化硅层或两者的堆栈组合。
具体地，所述步骤
S2
中所形成的
TFT
层
22
用于对所述
OLED
层
23
行驱动，包括多个阵列排布的
TFT
器件，所述
TFT
器件为低温多晶硅型、或者金属氧化物半导体型，例如铟镓锌氧化物的金属氧化物半导体型。
具体地，所述
OLED
层
23
包括设于所述
TFT
层
22
上的第一电极层、设于所述
TFT
层
22
和第一电极层上的像素定义层、设于第一电极层上的有机功能层、以及设于像素定义层和有机功能层上的第二电极层（未图示）。所述像素定义层在第一电极层上围出多个阵列排布的像素开口；所述有机功能层设于所述像素开口内；每一像素开口内的有机功能层、其下方对应的第一电极层、以及其上方对应的第二电极层共同构成一
OLED
器件。
具体地，所述第一电极层、第二电极层分别用作
OLED
器件的阳极和阴极；所述有机功能层包括由下到上依次设置的空穴注入层、空穴传输层、发光层、电子传输层和电子注入层。
具体地，薄膜封装层
24
包括层叠设置的无机阻挡层和有机缓冲层（未图示）。
步骤
S3
、如图
5-6
所示，采用激光对柔性基板
10
的玻璃基板
50
一侧进行扫描，使所述柔性基板
10
与玻璃基板
50
分离，将所述柔性基板
10
从玻璃基板
50
上剥离下来。
具体地，所述步骤
S3
中所采用的激光的波长为
308nm
。
本发明的柔性显示面板的制作方法，通过在柔性基板
10
中掺杂用于吸收紫外光的金属有机骨架化合物的紫外光吸收粒子
15
，该紫外光吸收粒子
15
能够将
LLO
制程中多余的激光能量吸收，防止
LLO
制程中多余的激光能量灼伤柔性基板
10
上的显示功能层
20
，从而可有效提升柔性显示面板的
LLO
工艺良率，降低生产成本，且具有超大比表面积的金属有机骨架化合物能够使紫外光吸收粒子
15
与激光之间形成巨大接触面，从而在不增加柔性基板
10
厚度的情况下，也能够达到较好的紫外激光吸收效果，有利于柔性显示面板的轻薄化。
综上所述，本发明提供的一种柔性显示面板，包括柔性基板及设于柔性基板上的显示功能层，所述柔性基板内含有金属有机骨架化合物的紫外光吸收粒子，该紫外光吸收粒子能够将
LLO
制程中多余的激光能量吸收，防止
LLO
制程中多余的激光能量灼伤柔性基板上的显示功能层，从而可有效提升柔性显示面板的
LLO
工艺良率，降低生产成本，且具有超大比表面积的金属有机骨架化合物能够使紫外光吸收粒子与激光之间形成巨大接触面，从而在不增加柔性基板厚度的情况下，也能够达到较好的紫外激光吸收效果，有利于柔性显示面板的轻薄化。本发明提供的一种柔性显示面板的制作方法，通过在柔性基板中掺杂有金属有机骨架化合物的紫外光吸收粒子，该紫外光吸收粒子能够将
LLO
制程中多余的激光能量吸收，防止
LLO
制程中多余的激光能量灼伤柔性基板上的显示功能层，从而可有效提升柔性显示面板的
LLO
工艺良率，降低生产成本，且具有超大比表面积的金属有机骨架化合物能够使紫外光吸收粒子与激光之间形成巨大接触面，从而在不增加柔性基板厚度的情况下，也能够达到较好的紫外激光吸收效果，有利于柔性显示面板的轻薄化。
以上所述，对于本领域的普通技术人员来说，可以根据本发明的技术方案和技术构思作出其他各种相应的改变和变形，而所有这些改变和变形都应属于本发明权利要求的保护范围。
Claims (10)
- 一种柔性显示面板，包括柔性基板及设于柔性基板上的显示功能层；所述柔性基板内含有紫外光吸收粒子，所述紫外光吸收粒子的材料为金属有机骨架化合物。
- 如权利要求1所述的柔性显示面板，其中，所述紫外光吸收粒子的材料为含钛金属有机骨架化合物。
- 如权利要求1所述的柔性显示面板，其中，所述紫外光吸收粒子的粒径为500-700nm；所述紫外光吸收粒子的比表面积大于1000m 2·g -1。
- 如权利要求1所述的柔性显示面板，其中，所述金属有机骨架化合物的最大吸收光波长为280-320nm。
- 如权利要求1所述的柔性显示面板，其中，所述柔性基板为聚酰亚胺基板；所述显示功能层包括依次层叠设于所述柔性基板上的缓冲层、TFT层、OLED层及薄膜封装层。
- 一种柔性显示面板的制作方法，包括如下步骤：步骤S1、提供玻璃基板，在所述玻璃基板上涂布形成柔性基板；所述柔性基板内含有紫外光吸收粒子，所述紫外光吸收粒子的材料为金属有机骨架化合物；步骤S2、在所述柔性基板上形成显示功能层；步骤S3、采用激光对柔性基板的玻璃基板一侧进行扫描，使所述柔性基板与玻璃基板分离，将所述柔性基板从玻璃基板上剥离下来。
- 如权利要求6所述的柔性显示面板的制作方法，其中，所述步骤S1中，所述紫外光吸收粒子为含钛金属有机骨架化合物。
- 如权利要求6所述的柔性显示面板的制作方法，其中，所述紫外光吸收粒子的粒径为500-700nm；所述紫外光吸收粒子的比表面积大于1000m 2·g -1。
- 如权利要求6所述的柔性显示面板的制作方法，其中，所述金属有机骨架化合物的最大吸收光波长为280-320nm；所述步骤S3中所采用的激光的波长为308nm。
- 如权利要求6所述的柔性显示面板的制作方法，其中，所述步骤S1中所形成的柔性基板为聚酰亚胺基板；所述步骤S2中所形成的显示功能层包括依次层叠设于所述柔性基板上的缓冲层、TFT层、OLED层及薄膜封装层。
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| CN110098225B (zh) * | 2019-04-18 | 2021-06-01 | 武汉华星光电半导体显示技术有限公司 | 柔性显示面板及其制备方法 |
| CN112331771A (zh) * | 2019-08-05 | 2021-02-05 | 上海和辉光电有限公司 | 一种柔性器件与基板的分离方法 |
| CN114122010B (zh) * | 2021-11-10 | 2023-06-27 | 武汉华星光电半导体显示技术有限公司 | Oled显示面板及其制备方法 |
| CN114613920A (zh) * | 2022-03-01 | 2022-06-10 | 深圳市华星光电半导体显示技术有限公司 | 柔性oled显示面板及其制作方法 |
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| CN119751086A (zh) * | 2024-12-27 | 2025-04-04 | 华中科技大学 | 一种基于金属有机框架包覆改性难固化陶瓷粉体及其制备方法与应用 |
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