WO2020107503A1 - 显示面板、制造方法和显示装置 - Google Patents

显示面板、制造方法和显示装置 Download PDF

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Publication number
WO2020107503A1
WO2020107503A1 PCT/CN2018/119077 CN2018119077W WO2020107503A1 WO 2020107503 A1 WO2020107503 A1 WO 2020107503A1 CN 2018119077 W CN2018119077 W CN 2018119077W WO 2020107503 A1 WO2020107503 A1 WO 2020107503A1
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WO
WIPO (PCT)
Prior art keywords
color resist
support column
color
auxiliary support
display panel
Prior art date
Application number
PCT/CN2018/119077
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English (en)
French (fr)
Inventor
杨春辉
Original Assignee
惠科股份有限公司
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Application filed by 惠科股份有限公司 filed Critical 惠科股份有限公司
Priority to US16/319,485 priority Critical patent/US11307449B2/en
Publication of WO2020107503A1 publication Critical patent/WO2020107503A1/zh

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133371—Cells with varying thickness of the liquid crystal layer
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13394—Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars

Definitions

  • the present application relates to the field of display technology, and in particular, to a display panel, a manufacturing method, and a display device.
  • liquid crystal displays have many advantages such as thin body, power saving, no radiation, etc., and have been widely used.
  • Most of the liquid crystal displays on the market are backlight type liquid crystal displays, which include a liquid crystal panel and a backlight module (Backlight Module).
  • the liquid crystal panel includes a color filter substrate (Color Filter Substrate, CF Substrate, also called a color filter substrate), a thin film transistor array substrate (Thin Film Transistor Substrate, TFT Substrate), and a transparent electrode exists on the opposite inner side of the substrate.
  • a layer of liquid crystal molecules Liquid Crystal, LC is sandwiched between the two substrates.
  • the color resist film thickness is different.
  • the difference between the first and second steps of the support column is different, which is very unfavorable for the lower limit of the liquid crystal edge, that is, the amount of liquid crystal at the vacuum bubble boundary will become larger. The edge of the liquid crystal becomes smaller. Not conducive to process production.
  • the present application provides a display panel, a manufacturing method, and a display device to facilitate the manufacturing process.
  • the present application provides a display panel including: a substrate, a color resist layer and a support pillar; a color resist layer formed on the substrate, the color resist layer includes three types of side-by-side and different height A color resist, a second color resist, and a third color resist; a support pillar; the support pillar is disposed on the color resist layer; the support pillar includes: a main support pillar, the main support pillar is disposed on the first color resist; the first auxiliary The supporting column is provided on the second color resist; the second auxiliary supporting column is on the third color resist; the height difference between the main supporting column and the first auxiliary supporting column is the first step difference; The height difference of the second auxiliary support column is a second step difference; the first step difference is equal to the second step difference.
  • a boss is provided on the third color resist, the second auxiliary support column is provided on the boss, and the heights of the second auxiliary support column and the first auxiliary support column are equal.
  • the second color resist is provided with a groove, and the first auxiliary support column is provided in the groove; the heights of the first auxiliary support column and the second auxiliary support column are equal.
  • the heights of the second auxiliary support column and the first auxiliary support column are different, and the surfaces of the second color resist and the third color resist are flat.
  • the height of the first auxiliary support column is reduced, the heights of the second color resist and the third color resist are different, and the surfaces of the second color resist and the third color resist are flat.
  • the height of the second auxiliary support column is increased, the heights of the second color resist and the third color resist are different, and the surfaces of the second color resist and the third color resist are flat.
  • the substrate further includes a substrate, a black matrix layer, a color resist layer and a transparent electrode layer; a black matrix layer is formed on the substrate; a color resist layer is formed on the black matrix layer; a transparent electrode layer is covered Support column and color resist layer.
  • the substrate includes a color filter substrate.
  • the first color resist is a red resist
  • the second color resist is a green resist
  • the third color resist is a blue resist
  • the surface of the boss is flat.
  • a display device includes: a substrate, a black matrix, a color resist layer, a support column, and a transparent electrode layer; a black matrix layer is formed on a glass plate;
  • a color resist layer is formed on the substrate.
  • the color resist layer includes three first color resists, a second color resist, and a third color resist that are arranged side by side and have no height; a support post; the support post is disposed on the color resist On the layer; a transparent electrode layer covering the support pillar and the color resist layer;
  • the support pillar includes: a main support pillar, the main support pillar is disposed on the first color resist; a first auxiliary support pillar is disposed on the second color resist;
  • the second auxiliary support column is on the third color resister;
  • the height difference between the main support column and the first auxiliary support column is the first step difference;
  • the height difference between the main support column and the second auxiliary support column is Second step difference; the first step difference is equal to the second step difference;
  • the second color resist is provided with a groove, the first auxiliary support column is provided in the groove; the first auxiliary support column and the first The height of the second auxiliary support column is equal.
  • a boss is provided on the third color resist, the second auxiliary support column is provided on the boss, and the heights of the second auxiliary support column and the first auxiliary support column are equal.
  • the shape of the groove is an isosceles ladder shape.
  • a method for manufacturing a display panel includes:
  • Support pillars are formed on the color resist layer
  • the color resist layer includes three first color resists, second color resists and third color resists arranged side by side and having different heights.
  • the support column includes:
  • Main support column the main support column is set on the first color resistance
  • the first auxiliary support column is set on the second color resistance
  • the height difference between the main support column and the first auxiliary support column is the first step difference
  • the height difference between the main support column and the second auxiliary support column is the second step difference
  • the first segment difference is equal to the second segment difference
  • the step of forming a color resist layer on the substrate includes:
  • the step of forming the support pillar on the color resist layer includes:
  • the first auxiliary support column is formed on the groove.
  • the step of forming a color resist layer on the substrate includes:
  • the step of forming the support pillar on the color resist layer includes:
  • the second auxiliary support column is formed on the boss.
  • the step of forming a color resist layer on the substrate includes:
  • the step of forming a support pillar on the color resist layer includes:
  • the first auxiliary support pillar and the second auxiliary support pillar are formed on the second color resist and the third color resist.
  • the transmittance of the second color resist area and the third color resist area is reduced, and the actual film thickness is relatively
  • the completely light-transmitting area has been reduced, and through the adjustment of the process parameters, the equal step difference can be achieved.
  • the thickness of the three color resist layers are different, and the height of the support columns is the same, resulting in the difference between the first and second steps, that is, at low temperatures, only one auxiliary support column plays a supporting role. It is very unfavorable for the lower limit of the liquid crystal edge, that is, the amount of liquid crystal at the vacuum bubble boundary will become larger, and the liquid crystal edge will become smaller, which is not conducive to the production of the process.
  • the first and second steps are equal to make the liquid crystal volume smaller and the liquid crystal edge larger, which is conducive to the manufacturing process and improves the product yield.
  • FIG. 1 is a schematic cross-sectional view of a substrate structure according to one embodiment of the present application.
  • FIG. 2 is a schematic cross-sectional view of a substrate groove structure according to one embodiment of the present application.
  • FIG. 3 is a schematic cross-sectional view of a low structure of a supporting column according to one embodiment of the present application.
  • FIG. 4 is a schematic cross-sectional view of a supporting column of one embodiment of the present application as a tall structure
  • FIG. 5 is a schematic diagram of the steps of the substrate method according to one embodiment of the present application.
  • FIG. 6 is a schematic diagram of steps of a color resist layer method according to one embodiment of the present application.
  • FIG. 7 is a schematic diagram of steps of a groove method according to one embodiment of the present application.
  • FIG. 9 is a schematic diagram of the method steps of the support column according to one embodiment of the present application.
  • connection should be understood in a broad sense, for example, it can be fixed connection or detachable Connected, or connected integrally; either mechanically or electrically; directly connected, or indirectly connected through an intermediary, or internally connected between two components.
  • installation should be understood in a broad sense, for example, it can be fixed connection or detachable Connected, or connected integrally; either mechanically or electrically; directly connected, or indirectly connected through an intermediary, or internally connected between two components.
  • the applicant uses an undisclosed technical solution: there are generally two kinds of support columns in the liquid crystal cell: one is the main support column that maintains the thickness of the liquid crystal cell under normal conditions, and the other is only supported by external force.
  • one is the main support column that maintains the thickness of the liquid crystal cell under normal conditions, and the other is only supported by external force.
  • the thickness of the red/green/blue resist film is different in order to perfectly reproduce the color.
  • the first step difference and the second step difference are different.
  • the substrate 10 of the present application will be described by taking the color filter substrate as an example.
  • an embodiment of the present application discloses a display panel including:
  • the support pillar 30 includes: a main support pillar 31, the main support pillar 31 is disposed on the first color resist 21; a first auxiliary support pillar 32, is disposed on The second color resister 22; the second auxiliary support pillar 33, the third color resister 23; the height difference between the main support pillar 31 and the first auxiliary support pillar 32 is the first step difference D1; the main support pillar 31 and the second auxiliary support
  • the height difference of the column 33 is the second difference D2; the first difference D1 is equal to the second difference D2.
  • the thicknesses of the three color resist layers 20 are different, and the height of the support pillars 30 is the same, resulting in the difference between the first step difference D1 and the second step difference D2, that is, at low temperatures, the auxiliary support column has only One has a supporting effect, which is very unfavorable for the lower limit of the liquid crystal edge, that is, the amount of liquid crystal at the vacuum bubble boundary will become larger, and the liquid crystal edge will become smaller, which is not conducive to process production.
  • the height of the color resist layer 20 and the support pillar 30 on the substrate 10 To make the first and second step difference D2 equal, so that the amount of liquid crystal becomes smaller, the edge of the liquid crystal becomes larger, which is conducive to the manufacturing process.
  • the third color resist 23 is provided with a boss 25, and the second auxiliary support post 33 is provided on the boss 25.
  • the second auxiliary support post 33 and the first auxiliary support post 32 The height is equal.
  • the second auxiliary support column 33 and the first auxiliary support column 32 have the same height during the manufacturing process, so they can be carried out simultaneously under the same manufacturing process. There is no need to use different manufacturing processes to produce different supporting columns.
  • the manufacturing process is simple. Reproduce the color perfectly, the height of each color resist layer 20 is different, the third color resist layer 23 is provided with a boss 25, the material of the boss 25 is the same as the material of the third color resist 23, integrated, and the color resist layer Co-manufactured by 20, not only saves the manufacturing process, but also raises the overall height of the third color resister 23 and the second auxiliary support column 33. When it drops, the boundary liquid crystal becomes smaller and the edge of the liquid crystal increases.
  • the second color resist 22 is provided with a groove 24, and the first auxiliary support post 32 is provided in the groove 24; the first auxiliary support post 32 and the second auxiliary support post 33 Are of equal height.
  • the first auxiliary support column 32 and the second auxiliary support column 33 have the same height during the manufacturing process, so they can be carried out simultaneously under the same manufacturing process.
  • the manufacturing process of the supporting column with the same manufacturing process is simple.
  • the second color resister 22 is provided with
  • the groove 24 is provided on the surface of the second color resist 22.
  • the material of the groove 24 is the same as the material of the second color resist 22.
  • the groove 24 is integrated with the second color resist 22 to save the manufacturing process.
  • the groove 24 is easy to be locked, and the first auxiliary support column 32 is disposed in the groove 24, and the groove 24 reinforces the first auxiliary support column 32.
  • the heights of the second auxiliary support columns 33 and the first auxiliary support columns 32 are different, and the heights of the second color resist 22 and the third color resist 23 are different.
  • the color resist layer 20 has the same height as the exemplary one, the color saturation is good, the display effect does not change, no additional compensation is required, and the heights of the first auxiliary support column 32 and the second auxiliary support column 33 are not.
  • the height of the first auxiliary support post 32 is shortened, the heights of the second color resister 22 and the third color resister 23 are different, and the heights of the second color resister 22 and the third color resister 23 flat surface.
  • the color resist layer 20 is the same as the example, and the color saturation is also the same as the example.
  • the display effect does not change, no additional compensation is required, the height of the first auxiliary support column 32 is shortened, and the process time is shortened. At the same time, the step difference is shortened, and the step difference is equal, which is convenient for the manufacturing process.
  • the second auxiliary support column 33 is raised to a height, the heights of the second color resist 22 and the third color resist 23 are different, and the surfaces of the second color resist 22 and the third color resist 23 smooth.
  • This technical solution does not need to change the process of the exemplary color resist layer 20, but achieves the same break through the different heights of the first auxiliary support pillar 32 and the second auxiliary support pillar 33. Since the color resist layer 20 remains unchanged, the color resist layer 20 As the original height does not change, the color saturation is good, the display effect is good, no additional compensation is required, the step difference is reduced, and the liquid crystal volume of the vacuum bubble will gradually decrease when shrinking. In the same process, it has increased The height and height of the first auxiliary supporting column become higher. When the liquid crystal is supported, the second auxiliary supporting column increases in shape and elasticity, and does not directly crush the color resist layer 20 below.
  • the substrate 10 includes a substrate 80, a black matrix 60 layer, a color resist layer 20 and a transparent electrode layer 70; a black matrix 60 layer is formed on the substrate 80; a color resist layer 20 is formed on the black matrix 60 Layer; a transparent electrode layer 70, covering the support column 30 and the color resist layer 20.
  • the substrate 10 is a key material for color display.
  • a black matrix 60 layer is formed on the substrate 10 to shield light and leak light.
  • a color resist layer and a color resist layer 20 are formed on the black matrix 60
  • first color resist 21, B is blue resist
  • second color resist 22, G is green resist 20
  • third color The resistance 23, R is the red resistance
  • a support pillar 30 is formed on the color resist layer 20
  • the support pillar plays a role of maintaining the gap between the other substrate 10 and the substrate 10, improving the stability of the liquid crystal cell, and the main support pillar 31 is thermally supported
  • the gap plays a key role.
  • the first auxiliary support column 32 and the second auxiliary support column 33 are supported by the external force.
  • the transparent electrode layer 70 covers the support column and the color resist layer 20, so that the entire substrate 10 forms an electric field for electricity Connect and transmit signals.
  • the surface of the boss 25 is flat.
  • the surface of the boss 25 is a flat surface, which provides a better environment for the process support column and provides a bedding for stabilizing the process. If the plane is not flat, the process support column will collapse and fall, which cannot effectively support and improve the panel. Reliability.
  • a display device including a display panel includes: a substrate 80 and a color resist layer 20, a support pillar 30, and a transparent electrode layer 70; a color resist layer 20.
  • the color resist layer 20 includes three different heights of the first color resist 21, the second color resist 22, and the third color resist 23; the support pillar 30; the support pillar 30 is disposed on the color resist layer 20 Upper; transparent electrode layer 70, covering the support column 30 and the color resist layer 20
  • the support column 30 includes: a main support column 31, the main support column 31 is provided on the first color resister 21; a first auxiliary support column 32, is provided on the second On the color resister 22; the second auxiliary support pillar 33 and the third color resister 23; the height difference between the main support pillar 31 and the first auxiliary support pillar 32 is the first step difference D1; the main support pillar 31 and the second auxiliary support pillar 33 The height difference is the second segment difference D2; the first
  • the second color resister 22 is provided with a groove 24, and the first auxiliary support post 32 is provided in the groove 24; the heights of the first auxiliary support post 32 and the second auxiliary support post 33 are equal.
  • the first auxiliary support column 32 and the second auxiliary support column 33 have the same height during the manufacturing process, so they can be carried out simultaneously under the same manufacturing process. There is no need to produce different supporting columns with another manufacturing process.
  • the manufacturing process is simple.
  • the dichroic resistance 22 is provided with a groove 24, the groove 24 is easy to be locked, and the first auxiliary support post 32 is provided in the groove 24, and the groove 24 reinforces the first auxiliary support post 32.
  • the shape of the groove 24 is an isosceles trapezoidal groove 24.
  • the groove 24 is an isosceles trapezoid-shaped groove 24, which has a large contact area with the first auxiliary support column 32 and sufficient surface contact. It is in the shape of an isosceles ladder, echoing it.
  • a method for manufacturing a display panel includes steps:
  • the color resist layer includes three different heights of the first color resist, the second color resist and the third color resist;
  • Support columns include:
  • Main support column the main support column is set on the first color resistance
  • the first auxiliary support column is set on the second color resistance
  • the height difference between the main support column 31 and the first auxiliary support column 32 is the first step difference D1;
  • the height difference between the main support column 31 and the second auxiliary support column 33 is the second step difference D2;
  • the first segment difference D1 is equal to the second segment difference D2.
  • a color resist layer is formed on the substrate to make its pixels clearer, and the color display is better.
  • a support column is formed on the color resist layer to maintain the interval between the substrates.
  • the step of forming a color resist layer on the substrate includes:
  • the step of forming the support pillar on the color resist layer includes:
  • a first auxiliary support column is formed on the groove.
  • the step of forming a color resist layer on the substrate includes:
  • the steps for forming the support pillar on the color resist layer include:
  • the step of forming a color resist layer on the substrate includes:
  • the steps for forming the support pillar on the color resist layer include:
  • the transmittance of the second color resist area and the third color resist area is reduced, and the actual film thickness is relatively
  • the completely light-transmitting area has been reduced, and through the adjustment of the process parameters, the equal step difference can be achieved.
  • the panel of this application may be a TN panel (full name Twisted Nematic, namely twisted nematic panel), IPS panel (In-PaneSwitcing, plane conversion), VA panel (Multi-domain Vertica Aignment, multi-quadrant vertical alignment technology) , Can also be other types of panels, just apply.
  • TN panel full name Twisted Nematic, namely twisted nematic panel
  • IPS panel In-PaneSwitcing, plane conversion
  • VA panel Multi-domain Vertica Aignment, multi-quadrant vertical alignment technology

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Abstract

一种显示面板、制造方法和显示装置。一种显示面板包括：色阻层（20），形成于基板（10）上，色阻层（20）包括三种并排设置不同高度的第一色阻（21）、第二色阻（22）、第三色阻（23）；支撑柱（30）设于色阻层（20）上；支撑柱（30）包括：主支撑柱（31），主支撑柱（31）设于第一色阻（21）上；第一辅支撑柱（32），设于第二色阻（22）上；第二辅支撑柱（33），第三色阻（23）上；主支撑柱（31）与第一辅支撑柱（32）的高度差为第一段差（D1）；主支撑柱（31）与第二辅支撑柱（33）的高度差为第二段差（D2）；第一段差（D1）与第二段差（D2）相等。

Description

显示面板、制造方法和显示装置
本申请要求于2018年11月26日提交中国专利局，申请号为CN201821960017.1，申请名称为“一种显示面板和显示装置”的中国专利申请的优先权，其全部内容通过引用结合在本申请中。
技术领域
本申请涉及显示技术领域，尤其涉及一种显示面板、制造方法和显示装置。
背景技术
应当理解的是，这里的陈述仅提供与本申请有关的背景信息，而不必然地构成现有技术。
随着科技的发展和进步，液晶显示器具有机身薄、省电、无辐射等众多优点，得到了广泛的应用。市场上的液晶显示器大部分为背光型液晶显示器，其包括液晶面板及背光模组(Backlight Module)。液晶面板包括彩膜基板(Color Filter Substrate，CF Substrate，也称彩色滤光片基板)、薄膜晶体管阵列基板(Thin Film Transistor Substrate，TFTSubstrate)，上述基板的相对内侧存在透明电极。两片基板之间夹一层液晶分子(LiquidCrystal，LC)。
为了完美重现色彩，色阻膜厚不一样，在实际基板制程中，支撑柱的第一段差与第二段差不等，这对于液晶边缘下限十分不利，即真空气泡边界液晶量会变大，液晶边缘变小。不利于制程生产。
申请内容
本申请提供一种显示面板、制造方法和显示装置，以便于制程。
为实现上述目的，本申请提供了一种显示面板包括：基板、色阻层和支撑柱；色阻层，形成于所述基板上，所述色阻层包括三种并排设置且不同高度的第一色阻、第二色阻、第三色阻；支撑柱；支撑柱设于色阻层上；所述支撑柱包括：主支撑柱，主支撑柱设于第一色阻上；第一辅支撑柱，设于第二色阻上；第二辅支撑柱，第三色阻上；所述主支撑柱与所述第一辅支撑柱的高度差为第一段差；所述主支撑柱与所述第二辅支撑柱的高度差为第二段差；所述第一段差与第二段差相等。
可选的，所述第三色阻上设有凸台，所述第二辅支撑柱设于所述凸台上，所述第二辅支撑柱和第一辅支撑柱的高度相等。
可选的，所述第二色阻设有凹槽，所述第一辅支撑柱设于所述凹槽内；所述第一辅支撑柱和第二辅支撑柱的高度相等。
可选的，所述第二辅支撑柱与第一辅支撑柱高度不等，所述第二色阻和第三色阻的表面平整。
可选的，所述第一辅支撑柱降低了高度，所述第二色阻和所述第三色阻高度不等，所述第二色阻和所述第三色阻的表面平整。
可选的，所述第二辅支撑柱增加了高度，所述第二色阻和所述第三色阻高度不等，所述第二色阻和所述第三色阻的表面平整。
可选的，所述基板还包括衬底、黑矩阵层、色阻层和透明电极层；黑矩阵层，形成于衬底上；色阻层，形成于黑矩阵层上；透明电极层，覆盖支撑柱和色阻层。
可选的，所述基板包括彩膜基板。
可选的，所述第一色阻为红色阻，所述第二色阻为绿色阻，所述第三色阻为蓝色阻。
可选的，所述凸台表面为平面。
本申请还公开了一种显示装置。一种显示装置包括：衬底、黑矩阵、色阻层、支撑柱和透明电极层；黑矩阵层，形成于玻璃板上；
色阻层，形成于所述衬底上，所述色阻层包括三种并排设置且不高度的第一色阻、第二色阻、第三色阻；支撑柱；支撑柱设于色阻层上；透明电极层，覆盖支撑柱和色阻层；所述支撑柱包括：主支撑柱，主支撑柱设于第一色阻上；第一辅支撑柱，设于第二色阻上；第二辅支撑柱，第三色阻上；所述主支撑柱与所述第一辅支撑柱的高度差为第一段差；所述主支撑柱与所述第二辅支撑柱的高度差为第二段差；所述第一段差与第二段差相等；所述第二色阻设有凹槽，所述第一辅支撑柱设于所述凹槽内；所述第一辅支撑柱和第二辅支撑柱的高度相等。
可选的，所述第三色阻上设有凸台，所述第二辅支撑柱设于所述凸台上，所述第二辅支撑柱和所述第一辅支撑柱的高度相等。
可选的，所述凹槽的形状为等腰梯形状。
本申请还公开了一种显示面板的制造方法。一种显示面板的方法包括：
在基板上形成色阻层；
在色阻层上形成支撑柱；
其中，所述色阻层包括三种并排设置且不同高度的第一色阻、第二色阻和第三色阻。
所述支撑柱包括：
主支撑柱，主支撑柱设于第一色阻上；
第一辅支撑柱，设于第二色阻上；
第二辅支撑柱，第三色阻上；
所述主支撑柱与所述第一辅支撑柱的高度差为第一段差；
所述主支撑柱与所述第二辅支撑柱的高度差为第二段差；
所述第一段差与第二段差相等；
可选的，所述在基板上形成色阻层的步骤包括：
利用半透光掩膜板在所述第二色阻上形成凹槽；
所述在色阻层上形成所述支撑柱的步骤包括：
在所述凹槽上形成所述第一辅支撑柱。
利用掩膜板上的半透膜或是图形狭缝对紫外线的衍射原理来降低局部紫外线透过率，实现第二色阻区域、透过率下降，其实际膜厚较完全透光区域有所下降，通过制程参数调整，可以实现段差相等。
可选的，所述在基板上形成色阻层的步骤包括：
利用半透光掩膜板在所述第三色阻上形成凸台；
所述在色阻层上形成所述支撑柱的步骤包括：
在所述凸台上形成所述第二辅支撑柱。
利用掩膜板上的半透膜或是图形狭缝对紫外线的衍射原理来降低局部紫外线透过率，实现第三色阻区域的透过率下降，其实际膜厚较完全透光区域有所下降，通过制程参数调整，可以实现段差相等。
可选的，所述在基板上形成色阻层的步骤包括：
利用全透光掩膜板行程表面平整的所述第二色阻和所述第三色阻；
可选的，所述在色阻层上形成支撑柱的步骤包括：
在所述所述第二色阻和所述第三色阻上形成所述第一辅支撑柱和所述第二辅支撑柱。
利用掩膜板上的半透膜或是图形狭缝对紫外线的衍射原理来降低局部紫外线透过率，实现第二色阻区域和第三色阻区域的透过率下降，其实际膜厚较完全透光区域有所下降，通过制程参数调整，可以实现段差相等。
为了完美重现色彩，三层色阻层的膜厚各不同，支撑柱高度相同，造成了第一段差与第二段差不等，即在低温时，辅支撑柱只有一个起到支撑作用，这对于液晶边缘下限十分不利，即真空气泡边界液晶量会变大，液晶边缘变小，不利于制程生产，通过调节基板上的色阻层和支撑柱的高度，使其第一和第二段差相等，使液晶量变小，液晶边缘变大，利于制程，提升产品良率。
附图说明
所包括的附图用来提供对本申请实施例的的理解，其构成了说明书的一部分，用于例示本申请的实施方式，并与文字描述一起来阐释本申请的原理。显而易见地，下面描述中的附图仅仅是本申请的一些实施例，对于本领域普通技术人员来讲，在不付出创造性劳动性的前提下，还可以根据这些附图获得其他的附图。在附图中：
图1是本申请的其中一个实施例的基板结构的剖面示意图；
图2是本申请的其中一个实施例的基板凹槽结构的剖面示意图；
图3是本申请的其中一个实施例的支撑柱做低结构的剖面示意图；
图4是本申请的其中一个实施例的支撑柱做高结构的剖面示意图；
图5是本申请的其中一个实施例的基板方法步骤的示意图；
图6是本申请的其中一个实施例的色阻层方法步骤的示意图；
图7是本申请的其中一个实施例的凹槽方法步骤的示意图；
图8是本申请的其中一个实施例的凸台方法步骤的示意图；
图9是本申请的其中一个实施例的支撑柱方法步骤的示意图。
具体实施方式
这里所公开的具体结构和功能细节仅仅是代表性的，并且是用于描述本申请的示例性实施例的目的。但是本申请可以通过许多替换形式来具体实现，并且不应当被解释成仅仅受限于这里所阐述的实施例。
在本申请的描述中，需要理解的是，术语“中心”、“横向”、“上”、“下”、“左”、“右”、“竖直”、“水平”、“顶”、“底”、“内”、“外”等指示的方位或位置关系为基于附图所示的方位或位置关系，仅是为了便于描述本申请和简化描述，而不是指示或暗示所指的装置或元件必须具有特定的方位、以特定的方位构造和操作，因此不能理解为对本申请的限制。此外，术语“第一”、“第二”仅用于描述目的，而不能理解为指示或暗示相对重要性或者隐含指明所指示的技术特征的数量。由此，限定有“第一”、“第二”的特征可以明示或者隐含地包括一个或者更多个该特征。在本申请的描述中，除非另有说明，“多个”的含义是两个或两个以上。另外，术语“包括”及其任何变形，意图在于覆盖不排他的包含。
在本申请的描述中，需要说明的是，除非另有明确的规定和限定，术语“安装”、“相连”、“连接”应做广义理解，例如，可以是固定连接，也可以是可拆卸连接，或一体地连接；可以是机械连接，也可以是电连接；可以是直接相连，也可以通过中间媒介间接相连，可以是两个元件内部的连通。对于本领域的普通技术人员而言，可以具体情况理解上述术语在本申请中的具体含义。
这里所使用的术语仅仅是为了描述具体实施例而不意图限制示例性实施例。除非上下文明确地另有所指，否则这里所使用的单数形式“一个”、“一项”还意图包括复数。还应当理解的是，这里所使用的术语“包括”和/或“包含”规定所陈述的特征、整数、步骤、操作、单元和/或组件的存在，而不排除存在或添加一个或更多其他特征、整数、步骤、操作、单元、组件和/或其组合。
申请人使用一种未公开的技术方案:液晶盒内一般有两种支撑柱：一种是正常情况下维持液晶盒厚的主支撑柱，另外一种是在外力挤压下才起到支撑的辅支撑柱在实际基板制程 中，由于红/绿/蓝波长不同及人眼对色彩感知力等原因，为了完美重现色彩，红/绿/蓝色阻膜厚不一样。在做完基板制程后，第一段差与第二段差不等，当温度过高时，液晶体积膨胀，主支撑柱支撑力减小，增加的液晶会局部聚集在一起出现显示亮度不均匀，定义重力显示亮度不均匀，边界液晶量为体积(L1)，即在低温时，辅支撑柱只有一个起到支撑作用，这对于液晶边缘下限十分不利，真空气泡边界液晶体积(L2)，液晶边缘变小。不利于制程生产。本专利通过优化设计，使第一段差等于第二段差，液晶边缘变大，利于制程，提高良率，不会出现显示屏显示不均匀，显示饱和度不够，造成显示效果不佳。
下面结合附图和实施例对本申请作说明。
本申请的基板10以彩膜基板为例进行说明。
如图1至图5所示，本申请实施例公布了一种显示面板包括：
基板10、色阻层20和支撑柱30；色阻层20，形成于基板10上，色阻层20包括三种并排设置且不同高度的第一色阻21、第二色阻22、第三色阻23；支撑柱30；支撑柱设于色阻层20上；支撑柱30包括：主支撑柱31，主支撑柱31设于第一色阻21上；第一辅支撑柱32，设于第二色阻22上；第二辅支撑柱33，第三色阻23上；主支撑柱31与第一辅支撑柱32的高度差为第一段差D1；主支撑柱31与第二辅支撑柱33的高度差为第二段差D2；第一段差D1与第二段差D2相等。
本案中，为了完美重现色彩，三层色阻层20的膜厚各不同，支撑柱30高度相同，造成了第一段差D1与第二段差D2不等，即在低温时，辅支撑柱只有一个起到支撑作用，这对于液晶边缘下限十分不利，即真空气泡边界液晶量会变大，液晶边缘变小，不利于制程生产，通过调节基板10上的色阻层20和支撑柱30的高度，使其第一和第二段差D2相等，使液晶量变小，液晶边缘变大，利于制程。
如图1所示，在一实施例中，第三色阻23设有凸台25，第二辅支撑柱33设于凸台25上，第二辅支撑柱33和第一辅支撑柱32的高度相等。
本案中，制程时，第二辅支撑柱33和第一辅支撑柱32的高度相等，所以在同一制程下可以同时进行，不需要用另一种制程制得不同的支撑柱，制程简单，为了完美重现色彩，每个色阻层20的高度都不同，第三色阻23层设有凸台25，凸台25的材质与第三色阻23的材质相同，一体化，与色阻层20共同制得，不仅节省了制程，同时也抬高了第三色阻23和第二辅支撑柱33的整体高度，段差减小，可以提前起到支撑作用，就更早阻止液晶盒厚的下降，边界液晶变小，增大液晶边缘。
如图2所示，在一实施例中，第二色阻22上设有凹槽24，第一辅支撑柱32设于凹槽24内；第一辅支撑柱32和第二辅支撑柱33的高度相等。
本案中，制程时，第一辅支撑柱32和第二辅支撑柱33的高度相等，所以在同一制程下 可以同时进行，同一制程制得支撑柱，制程简单，第二色阻22上设有凹槽24，设于第二色阻22上的表面，凹槽24的材质与第二色阻层22的材质相同，一体化，是与第二色阻层22共同制得，节省制程，凹槽24易于卡位，第一辅支撑柱32设于凹槽24内，凹槽24加固第一辅支撑柱32。
在一实施例中，第二辅支撑柱33与第一辅支撑柱32高度不等，第二色阻22和第三色阻23高度不等。
本案中，色阻层20和范例性的一样高度不发生改变，色彩饱和度好，显示效果不发生改变，不需要进行额外的补偿，第一辅支撑柱32和第二辅支撑柱33高度不等，段差减小，液晶收缩时，真空气泡边界的液晶量会变小，液晶边缘会增大，便于制程。
如图3所示，本实施例可选的，第一辅支撑柱32缩短了高度，第二色阻22和第三色阻23高度不等，第二色阻22和第三色阻23的表面平整。
本案中，色阻层20和范例性的一样，色彩饱和度也和范例性一样，显示效果不发生改变，不需要进行额外的补偿，缩短了第一辅支撑柱32的高度，制程时间减短同时缩短了段差，段差相等，便于制程。
如图4所示，在一实施例中，第二辅支撑柱33拔高了高度，第二色阻22和第三色阻23高度不等，第二色阻22和第三色阻23的表面平整。
本技术方案无须改变范例性色阻层20制程，而是通过第一辅支撑柱32和第二辅支撑柱33高度不等实现断差相同，由于色阻层20保持不变，色阻层20和原本的一样高度不发生改变，色彩饱和度好，显示效果佳，不需要进行额外的补偿，段差减小，真空气泡的液晶体积在收缩时，会慢慢变小，同一制程里，增加了第一辅支撑柱的高度，高度变高，当支撑液晶时，第二辅支撑柱形变量增大，弹性加强，不会直接压坏下面的色阻层20。
在一实施例中，基板10包括衬底80、黑矩阵60层、色阻层20和透明电极层70；黑矩阵60层，形成于衬底80上；色阻层20，形成于黑矩阵60层上；透明电极层70，覆盖支撑柱30和色阻层20.
本案中，基板10是色彩显示的关键材料，在基板10上形成黑矩阵60层，进行遮光漏光，通过光罩，为了重现完美色彩，在黑矩阵60上形成色阻层，色阻层20有三种不同的第一色阻21第二色阻22层和第三色阻23，第一色阻21，B为蓝色阻20，第二色阻22,G为绿色阻20，第三色阻23,R为红色阻20，在色阻层20上形成支撑柱30，支撑柱起到维持其他基板10与基板10之间的间隙，提高液晶盒的稳定作用，主支撑柱31隔热支撑间隙起到关键作用，第一辅支撑柱32和第二辅支撑柱33在外力挤压的作用下辅助支撑，透明电极层70覆盖支撑柱和色阻层20，使整个基板10形成电场进行电连接，传输讯号。
在一实施例中，凸台25表面为平面。
本方案中，凸台25的表面为平面，为制程支撑柱提供更好的环境，为使制程稳定提供了铺垫，如果平面不平整，制程的支撑柱会坍塌滑落，不能有效的支撑，改善面板的可靠性。
作为本申请的另一实施例，参考图1所示，公开了一种显示装置包括显示面板，显示面板包括：衬底80和色阻层20、支撑柱30和透明电极层70；色阻层20，形成于衬底80上，色阻层20包括三种不同高度的第一色阻21、第二色阻22、第三色阻23；支撑柱30；支撑柱30设于色阻层20上；透明电极层70，覆盖支撑柱30和色阻层20支撑柱30包括：主支撑柱31，主支撑柱31设于第一色阻21上；第一辅支撑柱32，设于第二色阻22上；第二辅支撑柱33，第三色阻23上；主支撑柱31与第一辅支撑柱32的高度差为第一段差D1；主支撑柱31与第二辅支撑柱33的高度差为第二段差D2；第一段差D1与第二段差D2相等；
第二色阻22设有凹槽24，第一辅支撑柱32设于凹槽24内；第一辅支撑柱32和第二辅支撑柱33的高度相等。
本案中，制程时，第一辅支撑柱32和第二辅支撑柱33的高度相等，所以在同一制程下可以同时进行，不需要用另一种制程制得不同的支撑柱，制程简单，第二色阻22上设有凹槽24，凹槽24易于卡位，第一辅支撑柱32设于凹槽24内，凹槽24加固第一辅支撑柱32。
在一实施例中，凹槽24的形状为等腰梯形状的凹槽24。
本方案中，凹槽24为等腰梯形状状凹槽24，与第一辅支撑柱32接触面积大，充分的表面接触，也为制程支撑柱的形状做良好的铺垫，辅支撑柱的形状为等腰梯形状，与之呼应。
作为本申请的另一实施例，参考图1至图5所示，公开了一种显示面板的制造方法。方法包括步骤：
S51：在基板上形成色阻层；
S52：在色阻层上形成支撑柱；
色阻层包括三种不同高度的第一色阻、第二色阻和第三色阻；
支撑柱包括：
主支撑柱，主支撑柱设于第一色阻上；
第一辅支撑柱，设于第二色阻上；
第二辅支撑柱，第三色阻上；
主支撑柱31与第一辅支撑柱32的高度差为第一段差D1；
主支撑柱31与第二辅支撑柱33的高度差为第二段差D2；
第一段差D1与第二段差D2相等。
基板上形成色阻层，使其像素更清晰，色彩显示度更好，色阻层上形成支撑柱，保持基板之间的间隔。
参考图7，本实施例可选的，在基板上形成色阻层的步骤包括：
利用半透光掩膜板在第二色阻上形成凹槽；
本实施例可选的，在色阻层上形成支撑柱的步骤包括：
在凹槽上形成第一辅支撑柱。
利用掩膜板上的半透膜或是图形狭缝对紫外线的衍射原理来降低局部紫外线透过率，实现第二色阻区域、透过率下降，其实际膜厚较完全透光区域有所下降，通过制程参数调整，可以实现段差相等。
参考图8，本实施例可选的，在基板上形成色阻层的步骤包括：
S81：利用半透光掩膜板在第三色阻上形成凸台；
在色阻层上形成支撑柱的步骤包括：
S82：在凸台上形成第二辅支撑柱。
利用掩膜板上的半透膜或是图形狭缝对紫外线的衍射原理来降低局部紫外线透过率，实现第三色阻区域的透过率下降，其实际膜厚较完全透光区域有所下降，通过制程参数调整，可以实现段差相等。
参考图9，本实施例可选的，在基板上形成色阻层的步骤包括：
S91：利用全透光掩膜板形成表面平整的第二色阻和第三色阻；
在色阻层上形成支撑柱的步骤包括：
S92：在第二色阻和第三色阻上形成第一辅支撑柱和第二辅支撑柱。
利用掩膜板上的半透膜或是图形狭缝对紫外线的衍射原理来降低局部紫外线透过率，实现第二色阻区域和第三色阻区域的透过率下降，其实际膜厚较完全透光区域有所下降，通过制程参数调整，可以实现段差相等。
本申请的面板可以是TN面板(全称为Twisted Nematic，即扭曲向列型面板)、IPS面板(In-PaneSwitcing，平面转换)、VA面板(Multi-domain Vertica Aignment，多象限垂直配向技术)，当然，也可以是其他类型的面板，适用即可。
以上内容是结合具体实施方式对本申请所作的详细说明，不能认定本申请的具体实施只局限于这些说明。对于本申请所属技术领域的普通技术人员来说，在不脱离本申请构思的前提下，还可以做出若干简单推演或替换，都应当视为属于本申请的保护范围。

Claims (17)

  1. 一种显示面板，包括：
    基板；
    色阻层，形成于所述基板上，所述色阻层包括三种并排设置且不同高度的第一色阻、第二色阻和第三色阻；
    支撑柱；所述支撑柱设于所述色阻层上；
    所述支撑柱包括：
    主支撑柱，所述主支撑柱设于所述第一色阻上；
    第一辅支撑柱，设于所述第二色阻上；
    第二辅支撑柱，设于所述第三色阻上；
    所述主支撑柱与所述第一辅支撑柱的高度差为第一段差；
    所述主支撑柱与所述第二辅支撑柱的高度差为第二段差；
    其中，所述第一段差与所述第二段差相等。
  2. 如权利要求1所述的一种显示面板，其中，所述第三色阻上设有凸台，所述第二辅支撑柱设于所述凸台上，所述第二辅支撑柱和所述第一辅支撑柱的高度相等。
  3. 如权利要求1所述的一种显示面板，其中，所述第二色阻上设有凹槽，所述第一辅支撑柱设于所述凹槽内；所述第一辅支撑柱和第二辅支撑柱的高度相等。
  4. 如权利要求1所述的一种显示面板，其中，所述第二辅支撑柱与第一辅支撑柱高度不等，所述第二色阻和所述第三色阻的表面平整。
  5. 如权利要求4所述的一种显示面板，其中，所述第一辅支撑柱降低了高度，所述第二色阻和所述第三色阻高度不等，所述第二色阻和所述第三色阻的表面平整。
  6. 如权利要求4所述的一种显示面板，其中，所述第二辅支撑柱增加了高度，所述第二色阻和所述第三色阻高度不等，所述第二色阻和所述第三色阻的表面平整。
  7. 如权利要求1所述的一种显示面板，其中，所述基板包括彩膜基板。
  8. 如权利要求1所述的一种显示面板，其中，所述第一色阻为红色阻，所述第二色阻为绿色阻，所述第三色阻为蓝色阻。
  9. 如权利要求2所述的一种显示面板，其中，所述凸台表面为平面。
  10. 如权利要求1所述的一种显示面板，其中，所述基板还包括
    衬底；
    黑矩阵层，形成于衬底上；所述色阻层形成于所述黑矩阵层上；以及
    透明电极层，覆盖所述支撑柱和所述色阻层。
  11. 一种显示装置，包括显示面板，显示面板包括：
    衬底；
    黑矩阵层，形成于衬底上；
    色阻层，形成于所述衬底上，所述色阻层包括三种不同高度的所述第一色阻、第二色阻、第三色阻；
    支撑柱；支撑柱设于色阻层上；
    透明电极层，覆盖所述支撑柱和所述色阻层；
    所述支撑柱包括：
    主支撑柱，主支撑柱设于第一色阻上；
    第一辅支撑柱，设于第二色阻上；
    第二辅支撑柱，第三色阻上；
    所述主支撑柱与所述第一辅支撑柱的高度差为第一段差；
    所述主支撑柱与所述第二辅支撑柱的高度差为第二段差；
    所述第一段差与第二段差相等；
    其中，所述第二色阻设有凹槽，所述第一辅支撑柱设于所述凹槽内；所述第一辅支撑柱和第二辅支撑柱的高度相等。
  12. 如权利要求11所述的一种显示装置，其中，所述第三色阻上设有凸台，所述第二辅支撑柱设于所述凸台上，所述第二辅支撑柱和所述第一辅支撑柱的高度相等。
  13. 如权利要求11所述的一种显示装置，其中，所述凹槽的形状为等腰梯形状。
  14. 一种显示面板的制造方法，包括步骤：
    在基板上形成色阻层；
    在色阻层上形成支撑柱；
    其中，所述色阻层包括三种并排设置且不同高度的第一色阻、第二色阻和第三色阻；
    所述支撑柱包括：
    主支撑柱，主支撑柱设于第一色阻上；
    第一辅支撑柱，设于第二色阻上；
    第二辅支撑柱，第三色阻上；
    所述主支撑柱与所述第一辅支撑柱的高度差为第一段差；
    所述主支撑柱与所述第二辅支撑柱的高度差为第二段差；
    所述第一段差与第二段差相等。
  15. 如权利要求14所述的一种显示面板的制造方法，其中，所述在基板上形成色阻层的步骤包括：
    利用半透光掩膜板在所述第二色阻上形成凹槽；
    所述在色阻层上形成所述支撑柱的步骤包括：
    在所述凹槽上形成所述第一辅支撑柱。
  16. 如权利要求14所述的一种显示面板的制造方法，其中，所述在基板上形成色阻层的步骤包括：
    利用半透光掩膜板在所述第三色阻上形成凸台；
    所述在色阻层上形成所述支撑柱的步骤包括：
    在所述凸台上形成所述第二辅支撑柱。
  17. 如权利要求14所述的一种显示面板的制造方法，其中，所述在基板上形成色阻层的步骤包括：
    利用全透光掩膜板形成表面平整的所述第二色阻和所述第三色阻；
    所述在色阻层上形成支撑柱的步骤包括：
    在所述第二色阻和所述第三色阻上分别形成所述第一辅支撑柱和所述第二辅支撑柱。
PCT/CN2018/119077 2018-11-26 2018-12-04 显示面板、制造方法和显示装置 WO2020107503A1 (zh)

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