WO2020103206A1 - 一种偏振无关的滤光片 - Google Patents

一种偏振无关的滤光片

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Publication number
WO2020103206A1
WO2020103206A1 PCT/CN2018/119814 CN2018119814W WO2020103206A1 WO 2020103206 A1 WO2020103206 A1 WO 2020103206A1 CN 2018119814 W CN2018119814 W CN 2018119814W WO 2020103206 A1 WO2020103206 A1 WO 2020103206A1
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WIPO (PCT)
Prior art keywords
polarization
less
index film
independent filter
refractive index
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PCT/CN2018/119814
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English (en)
French (fr)
Inventor
苏炎
于光龙
刘哲
李昱
林志强
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福州高意光学有限公司
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Publication of WO2020103206A1 publication Critical patent/WO2020103206A1/zh

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/201—Filters in the form of arrays
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/207—Filters comprising semiconducting materials
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements

Definitions

  • the invention relates to the fields of 3D sensing, laser radar, and optical communication, especially polarization-independent filters.
  • polarization-independent filters require two or more refractive index dielectric films or metal films to be alternately stacked due to depolarization design.
  • High-refractive-index films are usually formed with different oxides, such as TiO 2 , Nb 2 O 5 , Ta 2 O 5 and their mixtures.
  • Medium-refractive-index films are usually made of Al 2 O 3 and oxide mixtures (Al x Pr y O z , Al x La y O z , Al x Ta y O z, etc.), the low-refractive index film layer usually uses SiO 2 , MgF 2 , metal Ag, etc.
  • Polarization-independent filters mixed with metal films and dielectric films due to their extremely poor reliability and low service life, are far inferior to hard dielectric oxide films.
  • polarization-independent filters based on hard dielectric oxide films can only achieve depolarization in a small angle range.
  • the ideal measure is to keep the polarization spectrum of P light and S light with the same angular wavelength drift effect.
  • the object of the present invention is to provide a polarization-independent filter that is reliable in implementation, easy to prepare, and capable of being in the range of an incident angle of 0-40 degrees.
  • Polarization-independent filter including a substrate, the substrate has a plurality of high-refractive-index film layers and low-refractive-index film layers stacked alternately, the refractive index and low refraction of the material of the high-refractive-index film layer
  • the ratio of the refractive index of the coating material is less than 2.
  • the material of the high refractive index film layer is SiH, SiO x H y, or a mixture of SiH and SiO x H y .
  • the material of the low refractive index film layer is at least one mixture of Nb 2 O 5 , Ta 2 O 5 , TiO 2 and Si x N y .
  • the substrate is formed of silica material, or colored glass based on silica material, or silicon material.
  • the refractive index of the high-refractive-index film layer in the wavelength range of 800-4000 nm is all greater than 3, and the extinction coefficients are all less than 0.0005.
  • one end surface of the substrate is plated with a polarization-independent long wave pass, and the other end surface is plated with a polarized and dark short wave pass.
  • the same end surface of the substrate is superimposed with polarized and dull long and short wave passes, and the other end surface is coated with an AR antireflection film.
  • the Cut-ON wavelength separation of P light and S light at each angle is less than 3nm, and the typical value is less than 1nm; the Cut-OFF wavelength separation of P light and S light at each angle is less than 3nm Typical values are less than 1nm.
  • the FWHM difference between P light and S light at various angles is less than 5 nm, and the typical value is less than 3 nm.
  • the aforementioned polarization-independent filter is applied to angle tuning in the range of 0-40 degrees.
  • the substrate material of the present invention is a glass material based on silica material, or colored glass molding based on silica material , Or silicon material molding, high refractive index film layer made of SiH / SiO x H y mixture, and Nb 2 O 5 , Ta 2 O 5 , Al 2 O 3 , Al x Pr y O z , Al x La y
  • At least one low refractive index film layer made of O z and Al x Ta y O z is alternately stacked on the substrate to form a film system, and each SiH / SiO x H y layer (that is, high refractive index film layer) is at 800 nm
  • the refractive index in the wavelength range to 4000nm is all greater than 3, and the extinction coefficient in the wavelength range from 800nm to 4000nm is less than 0.0005.
  • the entire film system partially overlaps in the wavelength range of 800nm to 4000nm, achieving low absorption, and achieving polarization-independent splitting filters at large angles or within a wide angle range, making this solution also applicable to 3D sensing, lidar, and imaging instruments , Testing equipment, data center, optical communication comb filter (Interleaver) and other fields.
  • FIG. 1 is a schematic diagram of an embodiment of the present invention
  • Example 2 is a graph showing the relationship between the transmittance of P-light and S-light polarization at 40 degrees and the wavelength of Example 1 of the present invention
  • FIG. 3 is a graph showing the relationship between the transmittance of P-light and S-light polarization at 30 degrees and wavelength of Example 1 of the present invention
  • Example 4 is a graph showing the relationship between the transmittance of P-light and S-light polarization at 40 degrees and the wavelength of Example 2 of the present invention
  • FIG. 5 is a graph showing the relationship between the transmittance of P-light and S-light polarization at 30 degrees and the wavelength of Example 2 of the present invention
  • Example 6 is a graph showing the relationship between the transmittance of P-light and S-light polarization at 40 degrees and the wavelength of Example 3 of the present invention
  • Example 7 is a graph showing the relationship between the transmittance and wavelength of P-light and S-light polarization at 30 degrees in Example 3 of the present invention.
  • Example 8 is a graph showing the relationship between the transmittance and wavelength of P polarization and S polarization at 0 degrees, 30 degrees, and 40 degrees of Example 3 of the present invention.
  • the polarization-independent filter of the present invention includes a substrate 1, and the substrate 1 has a plurality of high-refractive-index film layers 2 and low-refractive-index film layers 3 stacked alternately.
  • the ratio of the refractive index of the material of the high-refractive-index film layer 2 to the refractive index of the low-refractive-index film layer 3 is less than 2.
  • the material of the high refractive index film layer is SiH, SiO x H y or a mixture of SiH and SiO x H y ;
  • the material of the low refractive index film layer is Nb 2 O 5 , Ta 2 O 5 , TiO 2. At least one mixture of Si x N y ;
  • the substrate is formed of silicon dioxide material, or colored glass based on silicon dioxide material, or formed of silicon material.
  • the refractive index of the high-refractive-index film layer in the wavelength range of 800-4000 nm is all greater than 3, and the extinction coefficients are all less than 0.0005;
  • one end surface of the substrate is plated A polarization-independent long wave pass is provided, and the other end face is plated with polarized and dull short wave pass; as another preferred implementation, the same end face of the substrate is superimposed with polarized and dull long and short pass pass, and the other end face AR anti-reflection coating.
  • the Cut-ON wavelength separation of P light and S light at each angle is less than 3nm, and the typical value is less than 1nm; the Cut-OFF wavelength separation of P light and S light at each angle is less than 3nm , The typical value is less than 1nm; the FWHM difference between P light and S light at various angles is less than 5nm, and the typical value is less than 3nm.
  • the material of the substrate 1 is a glass material based on silica material, or colored glass molding based on silica material, or silicon material molding, which is made of a mixture of SiH / SiO x H y High-refractive-index film layer 2, made of at least one of Nb 2 O 5 , Ta 2 O 5 , Al 2 O 3 , Al x Pr y O z , Al x La y O z , Al x Ta y O z
  • the low-refractive-index film layer 3 is alternately stacked on the substrate to form a film system.
  • Each SiH / SiO x H y layer (that is, a high-refractive-index film layer) has a refractive index greater than 3 in the wavelength range of 800 nm to 4000 nm and 800 nm to 4000 nm
  • the extinction coefficients in the wavelength range are all less than 0.0005.
  • the entire film system partially overlaps in the wavelength range of 800nm to 4000nm, achieving low absorption, and achieving polarization-independent splitting filters at large angles or within a wide angle range, making this solution also applicable to 3D sensing, lidar, and imaging instruments , Testing equipment, data center, optical communication comb filter (Interleaver) and other fields.
  • This embodiment is one of the embodiments in which the high-refractive-index film layer and the low-refractive-index film layer of the present invention are alternately stacked on a substrate.
  • a film system formed by alternately stacking two materials.
  • the stacking order is as follows:
  • the material of the high refractive index film layer is SiH, and the refractive index around 940 nm is 3.6546.
  • the material of the low refractive index film layer is Ta 2 O 5 , and the refractive index near 940 nm is 2.1056.
  • the base material is ordinary K9 optical glass.
  • the film is made of 30 layers of two kinds of materials alternately stacked.
  • polarized matte short wave pass in the range of 0 to 40 degrees, the cut-off wavelengths of P and S polarizations are not separated, the difference is less than 1.5nm; the hard dielectric coating is sputtered. And it can meet the reliability requirements of friction resistance, high temperature resistance and high humidity of communication and automotive products;
  • FIG. 2 is the relationship between the transmittance and wavelength of P polarization and S polarization at 40 degrees of this embodiment;
  • FIG. 3 is Example The relationship between the transmittance and wavelength of P polarization and S polarization at 30 degrees.
  • This embodiment is one of the embodiments in which the high-refractive-index film layer and the low-refractive-index film layer of the present invention are alternately stacked on a substrate.
  • a film system formed by alternately stacking two materials.
  • the stacking order is as follows:
  • the material of the high refractive index film layer is SiH, and the refractive index around 940 nm is 3.6546.
  • the material of the low refractive index film layer is Ta 2 O 5 , and the refractive index near 940 nm is 2.1056.
  • the base material is ordinary K9 optical glass.
  • the film is made of 29 layers of two kinds of materials alternately stacked.
  • the polarized matte long wave pass in the range of 0 to 40 degrees, the Cut-ON wavelengths of P and S polarization are not separated, the difference is less than 1nm; the hard dielectric coating is sputtered. And it can meet the reliability requirements of friction resistance, high temperature resistance and high humidity of communication products and automotive products;
  • FIG. 4 is the relationship between the transmittance and wavelength of P polarization and S polarization at 40 degrees of this embodiment;
  • FIG. 5 is Example The relationship between the transmittance and wavelength of P polarization and S polarization at 30 degrees.
  • Example 1 and Example 2 were plated on both surfaces of the substrate, respectively.
  • the polarization-independent long wave pass and polarized matte short waveforms became polarized matte band-pass filters.
  • the polarized and matte band-pass filter has a waveform separation difference of P and S polarizations of less than 1.5 nm and a FWHM difference of less than 2 nm in the range of 0 to 40 degrees; a hard medium using sputtering Coating. And it can meet the reliability requirements of friction resistance, high temperature resistance and high humidity of communication products and automotive products;
  • FIG. 6 is the relationship between the transmittance and wavelength of P polarization and S polarization at 40 degrees of this embodiment;
  • FIG. 7 is An example of the relationship between the transmittance and wavelength of P polarization and S polarization at 30 degrees;
  • FIG. 8 is a relationship between the transmittance and wavelength of P polarization and S polarization at 0 degrees, 30 degrees, and 40 degrees.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Optical Filters (AREA)
  • Polarising Elements (AREA)

Abstract

一种偏振无关的滤光片，包括基片（1），基片（1）上具有多个高折射率膜层（2）和低折射率膜层（3）交替堆叠而成的膜系，高折射率膜层（2）的材料为SiH、SiO xH y或SiH与SiO xH y的混合物，其中有至少与800nm至4000nm波长范围部分重叠的通带，每个SiH/SiO xH y层在800nm至4000nm波长范围内折射率均大于3，在800nm至4000nm波长范围内的消光系数均小于0.0005，整个膜系在800nm至4000nm波长范围内部分重叠，实现低吸收，大角度或宽角度范围内的偏振无关的滤光片。可以应用于3D传感、激光雷达、成像仪器、检测仪器、数据中心、光通讯的梳妆滤波器等领域。

Description

一种偏振无关的滤光片 技术领域
本发明涉及3D传感，激光雷达，光通讯领域，尤其是偏振无关的滤光片。
背景技术
常规情况下,偏振无关的滤光片，由于消偏振设计需要两种或两种以上的折射率介质膜或者金属膜交替堆叠形成。高折射率膜层通常采用不同氧化物形成，例如TiO 2、Nb 2O 5、Ta 2O 5及它们的混合物，中折射率膜层通常采用Al 2O 3及氧化物混合物(Al xPr yO z、Al xLa yO z、Al xTa yO z等)，低折射率膜层通常采用SiO 2、MgF 2，金属Ag等。金属膜和介质膜混合镀制的偏振无关滤光片，由于其极差的可靠性，使用寿命低，远远不如硬介质氧化膜。然而，基于硬介质氧化膜的偏振无关滤光片，只能实现很小角度范围内的消偏。
为了使偏振无关滤光片在更大角度范围内实现消偏振，理想的措施是保持P光和S光偏振光谱有着一致的角度波长漂移效应。
发明内容
针对现有技术的情况，本发明的目的在于提供一种实施可靠、制备便利且能够在0-40度入射角度范围内的偏振无关的滤光片。
为了实现上述的技术目的，本发明采用的技术方案为：
偏振无关的滤光片，包括基片，基片上具有多个高折射率膜层、低折射率膜层交替堆叠而成的膜系，所述高折射率膜层的材料的折射率与低折射率膜层材料的折射率的比值小于2。
进一步，所述高折射率膜层的材料为SiH、SiO xH y或SiH与SiO xH y的混合物。
进一步，所述的低折射率膜层的材料为Nb 2O 5、Ta 2O 5、TiO 2、Si xN y中的至少一种混合物。
进一步，所述的基片为二氧化硅材料成型，或者基于二氧化硅材料的有色玻璃成型，或者硅材料成型。
进一步，所述的高折射率膜层在800～4000nm波长范围内的折射率均大于3，消光系数均小于0.0005。
作为基片上的其中一种实施，进一步，所述基片的一端面面镀设有偏振无关的长波通，另一端面镀设有偏振无光的短波通。
作为基片上的另一种实施，进一步，所述基片的同一端面上迭加有偏振无光的长短波通，另外一端面镀设有AR增透膜。
进一步，在0～40度范围内，各个角度下的P光与S光的Cut-ON波长分离小于3nm，典型值小于1nm；各个角度下P光与S光的Cut-OFF波长分离小于3nm，典型值小于1nm。
进一步，在0～40度范围内，各个角度下P光与S光的FWHM差异小于5nm，典型值小 于3nm。
进一步，将前述的偏振无关的滤光片应用于0～40度范围内的角度调谐。
采用上述的技术方案，本发明相较于现有技术而言，其具有的有益效果为：本发明的基片材料为基于二氧化硅材料的玻璃材料，或者基于二氧化硅材料的有色玻璃成型，或者硅材料成型，采用SiH/SiO xH y混合物制成的高折射率膜层，和Nb 2O 5、Ta 2O 5、Al 2O 3、Al xPr yO z、Al xLa yO z、Al xTa yO z至少一种混合制成的低折射率膜层在基片上进行交替堆叠成膜系，每个SiH/SiO xH y层(即高折射率膜层)在800nm至4000nm波长范围内折射率均大于3，在800nm至4000nm波长范围内的消光系数均小于0.0005。整个膜系在800nm至4000nm波长范围内部分重叠，实现低吸收，实现大角度下或大角度范围内的偏振无关分滤光片，使得该方案还可以应用于3D传感，激光雷达，成像仪器，检测仪器，数据中心，光通讯的梳状滤波器(Interleaver)等领域。
附图说明
下面结合附图和具体实施方式对本发明做进一步的阐述：
图1为本发明的实施方式的示意图；
图2为本发明的实施例1在40度的P光和S光偏振的透射率和波长的关系图；
图3为本发明的实施例1在30度的P光和S光偏振的透射率和波长的关系图；
图4为本发明的实施例2在40度的P光和S光偏振的透射率和波长的关系图；
图5为本发明的实施例2在30度的P光和S光偏振的透射率和波长的关系图；
图6为本发明的实施例3在40度的P光和S光偏振的透射率和波长的关系图；
图7为本发明的实施例3在30度的P光和S光偏振的透射率和波长的关系图；
图8为本发明的实施例3在0度、30度和40度的P偏振和S偏振的透射率和波长的关系图。
具体实施方式
如图1所示，本发明偏振无关的滤光片，包括基片1，基片1上具有多个高折射率膜层2、低折射率膜层3交替堆叠而成的膜系，所述高折射率膜层2的材料的折射率与低折射率膜层材料3的折射率的比值小于2。
其中，所述高折射率膜层的材料为SiH、SiO xH y或SiH与SiO xH y的混合物；所述的低折射率膜层的材料为Nb 2O 5、Ta 2O 5、TiO 2、Si xN y中的至少一种混合物；所述的基片为二氧化硅材料成型，或者基于二氧化硅材料的有色玻璃成型，或者硅材料成型。
另外，所述的高折射率膜层在800～4000nm波长范围内的折射率均大于3，消光系数均小于0.0005；作为基片的其中一种优选实施方式，所述基片的一端面面镀设有偏振无关的长 波通，另一端面镀设有偏振无光的短波通；作为另外一种优选实施，所述基片的同一端面上迭加有偏振无光的长短波通，另外一端面镀设有AR增透膜。
再者，在0～40度范围内，各个角度下的P光与S光的Cut-ON波长分离小于3nm，典型值小于1nm；各个角度下P光与S光的Cut-OFF波长分离小于3nm，典型值小于1nm；各个角度下P光与S光的FWHM差异小于5nm，典型值小于3nm。
本发明采用上述的技术方案，其中基片1材料为基于二氧化硅材料的玻璃材料，或者基于二氧化硅材料的有色玻璃成型，或者硅材料成型，采用SiH/SiO xH y混合物制成的高折射率膜层2，和Nb 2O 5、Ta 2O 5、Al 2O 3、Al xPr yO z、Al xLa yO z、Al xTa yO z至少一种混合制成的低折射率膜层3在基片上进行交替堆叠成膜系，每个SiH/SiO xH y层(即高折射率膜层)在800nm至4000nm波长范围内折射率均大于3，在800nm至4000nm波长范围内的消光系数均小于0.0005。整个膜系在800nm至4000nm波长范围内部分重叠，实现低吸收，实现大角度下或大角度范围内的偏振无关分滤光片，使得该方案还可以应用于3D传感，激光雷达，成像仪器，检测仪器，数据中心，光通讯的梳状滤波器(Interleaver)等领域。
实施例1
本实施例为本发明高折射率膜层和低折射率膜层在基片上交替堆叠的其中一种实施例，其具有0～40度范围内的消偏振效应的短波通，其结构包含30层由两种材料交替堆叠而成的膜系。
其中堆叠的层次顺序如下表所示：
Figure PCTCN2018119814-appb-000001
Figure PCTCN2018119814-appb-000002
其中，
高折射率膜层的材料为SiH，在940nm附近的折射率为3.6546。
低折射率膜层的材料为Ta 2O 5，在940nm附近的折射率为2.1056。
基底材料为普通的K9光学玻璃。
膜系由30层两种种材料交替堆叠而成的。
本实施具有以下有益效果：本实施偏振无光短波通，在0到40度范围，P和S偏振的Cut-Off波长不分离，差异小于1.5nm；采用溅射的硬介质镀膜。并且可以满足通讯类、汽车类产品的耐摩擦、耐高温高湿的可靠性需求；图2为本实施例在40度的P偏振和S偏振的透射率和波长的关系图；图3为本实例在30度的P偏振和S偏振的透射率和波长的关系图。
实施例2
本实施例为本发明高折射率膜层和低折射率膜层在基片上交替堆叠的其中一种实施例，其具有0～40度范围内的消偏振效应的长波通，其结构包含29层由两种材料交替堆叠而成的膜系。
其中堆叠的层次顺序如下表所示：
Figure PCTCN2018119814-appb-000003
Figure PCTCN2018119814-appb-000004
其中，
高折射率膜层的材料为SiH，在940nm附近的折射率为3.6546。
低折射率膜层的材料为Ta 2O 5，在940nm附近的折射率为2.1056。
基底材料为普通的K9光学玻璃。
膜系由29层两种种材料交替堆叠而成的。
本实施具有以下有益效果：本实施偏振无光长波通，在0到40度范围，P和S偏振的Cut-ON波长不分离，差异小于1nm；采用溅射的硬介质镀膜。并且可以满足通讯类、汽车类产品的耐摩擦、耐高温高湿的可靠性需求；图4为本实施例在40度的P偏振和S偏振的透射率和波长的关系图；图5为本实例在30度的P偏振和S偏振的透射率和波长的关系图。
实施例3
本实施例为将实施例1和实施例2分别镀制在基片的两个面，偏振无关的长波通和偏振无光的短波形成了偏振无光的带通滤光片。
Figure PCTCN2018119814-appb-000005
Figure PCTCN2018119814-appb-000006
本实施具有以下有益效果：本实施偏振无光的带通滤光片，在0到40度范围，P和S偏振的波形分离差异小于1.5nm，FWHM差异变化小于2nm；采用溅射的硬介质镀膜。并且可以满足通讯类、汽车类产品的耐摩擦、耐高温高湿的可靠性需求；图6为本实施例在40度的P偏振和S偏振的透射率和波长的关系图；图7为本实例在30度的P偏振和S偏振的透射率和波长的关系图；图8为本实例在0度、30度和40度的P偏振和S偏振的透射率和波长的关系图。
以上详细描述了本发明的较佳具体实施例。应当理解，本领域的普通技术无需创造性劳动就可以根据本发明的构思作出诸多修改和变化。因此，凡本技术领域中技术人员依本发明的构思在现有技术的基础上通过逻辑分析、推理或者有限的实验可以得到的技术方案，皆应在由权利要求书所确定的保护范围内。

Claims (10)

  1. 偏振无关的滤光片，包括基片，基片上具有多个高折射率膜层、低折射率膜层交替堆叠而成的膜系，其特征在于：所述高折射率膜层的材料的折射率与低折射率膜层材料的折射率的比值小于2。
  2. 根据权利要求1所述的偏振无关的滤光片，其特征在于：所述高折射率膜层的材料为SiH、SiO xH y或SiH与SiO xH y的混合物。
  3. 根据权利要求1所述的偏振无关的滤光片，其特征在于：所述的低折射率膜层的材料为Nb 2O 5、Ta 2O 5、TiO 2、Si xN y中的至少一种混合物。
  4. 根据权利要求1所述的偏振无关的滤光片，其特征在于：所述的基片为二氧化硅材料成型，或者基于二氧化硅材料的有色玻璃成型，或者硅材料成型。
  5. 根据权利要求1所述的偏振无关的滤光片，其特征在于：所述的高折射率膜层在800～4000nm波长范围内的折射率均大于3，消光系数均小于0.0005。
  6. 根据权利要求1所述的偏振无关的滤光片，其特征在于：所述基片的一端面面镀设有偏振无关的长波通，另一端面镀设有偏振无光的短波通。
  7. 根据权利要求1所述的偏振无关的滤光片，其特征在于：所述基片的同一端面上迭加有偏振无光的长短波通，另外一端面镀设有AR增透膜。
  8. 根据权利要求1所述的偏振无关的滤光片，其特征在于：在0～40度范围内，各个角度下的P光与S光的Cut-ON波长分离小于3nm，典型值小于1nm；各个角度下P光与S光的Cut-OFF波长分离小于3nm，典型值小于1nm。
  9. 根据权利要求1所述的偏振无关的滤光片，其特征在于：在0～40度范围内，各个角度下P光与S光的FWHM差异小于5nm，典型值小于3nm。
  10. 根据权利要求1所述的偏振无关的滤光片，其特征在于：其应用于0～40度范围内的角度调谐。
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112114402A (zh) * 2020-10-12 2020-12-22 东莞市微科光电科技有限公司 一种cwdm滤光片

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109683225A (zh) * 2019-02-27 2019-04-26 成都国泰真空设备有限公司 一种用于消偏振的平板薄膜截止滤光片
CN113960707A (zh) * 2021-10-13 2022-01-21 苏州众为光电有限公司 一种角度可调谐的消偏振滤光片

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006251763A (ja) * 2005-03-09 2006-09-21 Asia Optical Co Ltd 分光レンズのフィルム層構造
CN1959447A (zh) * 2006-11-24 2007-05-09 中国科学院上海技术物理研究所 45°入射宽光谱消偏振滤光片的构建方法
CN103713395A (zh) * 2014-01-15 2014-04-09 福建福特科光电股份有限公司 红外消偏振分光器件
CN105242340A (zh) * 2015-11-17 2016-01-13 沈阳仪表科学研究院有限公司 荧光分析用消偏振分色滤光片
CN105717564A (zh) * 2016-04-12 2016-06-29 三明福特科光电有限公司 消偏振五角棱镜及其制作方法
CN106405716A (zh) * 2016-11-24 2017-02-15 福建福特科光电股份有限公司 消偏振分光片
CN107515438A (zh) * 2017-09-06 2017-12-26 天津津航技术物理研究所 一种红外宽谱段截止窄带激光分光元件

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101893730A (zh) * 2010-07-26 2010-11-24 无锡海达安全玻璃有限公司 一种高增透滤波片及其加工方法
TWI648561B (zh) * 2012-07-16 2019-01-21 美商唯亞威方案公司 光學濾波器及感測器系統
CN203178510U (zh) * 2013-03-29 2013-09-04 杭州科汀光学技术有限公司 一种截止滤光片
CN204631282U (zh) * 2015-05-15 2015-09-09 杭州科汀光学技术有限公司 一种双消短波通光学滤波器
US10914961B2 (en) * 2017-02-13 2021-02-09 Viavi Solutions Inc. Optical polarizing filter
CN108761614A (zh) * 2018-08-06 2018-11-06 信阳舜宇光学有限公司 滤光片及包含该滤光片的红外图像传感系统

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006251763A (ja) * 2005-03-09 2006-09-21 Asia Optical Co Ltd 分光レンズのフィルム層構造
CN1959447A (zh) * 2006-11-24 2007-05-09 中国科学院上海技术物理研究所 45°入射宽光谱消偏振滤光片的构建方法
CN103713395A (zh) * 2014-01-15 2014-04-09 福建福特科光电股份有限公司 红外消偏振分光器件
CN105242340A (zh) * 2015-11-17 2016-01-13 沈阳仪表科学研究院有限公司 荧光分析用消偏振分色滤光片
CN105717564A (zh) * 2016-04-12 2016-06-29 三明福特科光电有限公司 消偏振五角棱镜及其制作方法
CN106405716A (zh) * 2016-11-24 2017-02-15 福建福特科光电股份有限公司 消偏振分光片
CN107515438A (zh) * 2017-09-06 2017-12-26 天津津航技术物理研究所 一种红外宽谱段截止窄带激光分光元件

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112114402A (zh) * 2020-10-12 2020-12-22 东莞市微科光电科技有限公司 一种cwdm滤光片

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