WO2020087650A1 - 显影装置及基板显影方法 - Google Patents

显影装置及基板显影方法 Download PDF

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Publication number
WO2020087650A1
WO2020087650A1 PCT/CN2018/119243 CN2018119243W WO2020087650A1 WO 2020087650 A1 WO2020087650 A1 WO 2020087650A1 CN 2018119243 W CN2018119243 W CN 2018119243W WO 2020087650 A1 WO2020087650 A1 WO 2020087650A1
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Prior art keywords
substrate
nozzle
nozzles
spray
developing device
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English (en)
French (fr)
Inventor
丁鹏
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Wuhan China Star Optoelectronics Technology Co Ltd
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Wuhan China Star Optoelectronics Technology Co Ltd
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Priority to US16/463,237 priority Critical patent/US20210356808A1/en
Publication of WO2020087650A1 publication Critical patent/WO2020087650A1/zh
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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/10—Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
    • B05C11/1002—Means for controlling supply, i.e. flow or pressure, of liquid or other fluent material to the applying apparatus, e.g. valves
    • B05C11/1005—Means for controlling supply, i.e. flow or pressure, of liquid or other fluent material to the applying apparatus, e.g. valves responsive to condition of liquid or other fluent material already applied to the surface, e.g. coating thickness, weight or pattern
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3042—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations
    • G03F7/3064—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations characterised by the transport means or means for confining the different units, e.g. to avoid the overflow
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0448—Apparatus for applying a liquid, a resin, an ink or the like
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/30—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations
    • H10P72/32—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations between different workstations
    • H10P72/3211—Changing orientation of the substrate, e.g. from a horizontal position to a vertical position
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/30—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations
    • H10P72/33—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations into and out of processing chamber
    • H10P72/3314—Continuous loading and unloading into and out of a processing chamber, e.g. transporting belts within processing chambers

Definitions

  • the present invention relates to the field of display technology, and in particular, to a developing device and a substrate developing method.
  • Thin film transistor is the current liquid crystal display (Liquid Crystal Display, LCD) and active matrix driven organic electroluminescence display device (Active Matrix Organic Light-Emitting The main driving element in Diode, AMOLED) is directly related to the display performance of the flat panel display device.
  • liquid crystal displays which include a liquid crystal display panel and a backlight module.
  • the working principle of the liquid crystal display panel is based on the thin film transistor array substrate (Thin Film Transistor Array Substrate, TFT Array Substrate) and the color filter (Color Filter, CF) liquid crystal molecules are poured in between the substrates, and pixel voltage and common voltage are applied to the two substrates respectively.
  • the electric field formed between the pixel voltage and the common voltage controls the rotation direction of the liquid crystal molecules to change the backlight module ’s
  • the light is transmitted out to produce the picture.
  • the 6th generation LTPS (Low Temperature Poly-silicon (low-temperature polysilicon) production line for example, the developing machine used in the manufacture of CF substrates has changed the substrate from the horizontal transfer method to the inclined transfer method.
  • the oblique conveying method has the following advantages: 1. The flow direction of the chemical liquid is more consistent, and the possibility of Mura is less; 2. The drying effect is good, the force required when blowing out is small, and the probability of Mura is less; 3. The replacement rate of new and old chemical solutions Higher, better for regional concentration control, and strong cleaning ability, which is more beneficial for saving the amount of deionized water; 4.
  • the liquid film of the chemical liquid is thinner, which is better for reducing the amount of chemical liquid.
  • the inclined part is the production cycle time (Tact Time) The bottleneck, the overall length of the device will be longer; 3.
  • the uniform distribution of the chemical solution will produce a concentration gradient, and the critical dimension (CD) in the substrate will show a gradient distribution, which is not conducive to controlling the consistency of the critical dimension.
  • the object of the present invention is to provide a developing device, which can prevent the gradient of the concentration of the chemical solution distributed on the substrate, improve the consistency of the distribution of the chemical solution, and thereby improve the consistency of the key dimensions in the substrate.
  • the object of the present invention is also to provide a method for developing a substrate, which can prevent the gradient of the concentration of the chemical solution distributed on the substrate, improve the consistency of the distribution of the chemical solution, and thereby improve the consistency of the key dimensions in the substrate.
  • the present invention provides a developing device, including: a conveying platform and a spray mechanism provided above the conveying platform; the spray mechanism includes a spray pipe and a spray pipe provided on the spray pipe Multiple first nozzles and multiple second nozzles;
  • the conveying platform is used to drive the substrate, and the substrate is inclined relative to the horizontal direction during the transmission process;
  • the first nozzle is used to continuously spray the liquid medicine to the substrate
  • the second nozzle is used for turning on the spraying chemical liquid or closing the spraying chemical liquid according to the preset spraying density.
  • the conveying platform is provided with a plurality of guide rollers inclined relative to the horizontal direction.
  • the inclined angle of the substrate with respect to the horizontal direction is 5 °.
  • the second nozzle has a thread therein, and the second nozzle is closed by a T-shaped nut matching with the thread.
  • the plurality of second nozzles are respectively located between every two adjacent first nozzles.
  • the invention also provides a substrate developing method, including the following steps:
  • Step S1 Provide a developing device;
  • the developing device includes: a conveying platform and a spray mechanism provided above the conveying platform;
  • the spray mechanism includes a spray tube and a plurality of first devices provided on the spray tube One nozzle and multiple second nozzles;
  • Step S2 the transmission platform drives the substrate, and tilts the substrate relative to the horizontal direction during the transmission process
  • Step S3 The first nozzle continuously sprays the chemical solution to the substrate; the second nozzle turns on the spraying chemical solution or turns off the spraying chemical solution according to a preset spraying density.
  • the conveying platform is provided with a plurality of guide rollers inclined relative to the horizontal direction.
  • the inclined angle of the substrate with respect to the horizontal direction is 5 °.
  • the second nozzle has a thread therein, and in step S3, the second nozzle is closed by cooperating with the T-shaped nut.
  • the plurality of second nozzles are respectively located between every two adjacent first nozzles.
  • the developing device of the present invention includes: a conveying platform and a spray mechanism provided above the conveying platform; the spray mechanism includes a spray pipe and a plurality of One nozzle and multiple second nozzles; the transfer platform is used to drive the substrate, and the substrate is inclined relative to the horizontal direction during the transmission process, which can make the chemical liquid flow direction more consistent and reduce the possibility of the substrate producing Mura; The liquid replacement rate is high, and the regional concentration control is good.
  • a small blowing force is required to dry the substrate, which further reduces the possibility of Mura generation on the substrate.
  • the first nozzle is used to continuously spray the chemical solution to the substrate; the second nozzle is used to turn on the sprayed chemical solution or turn off the sprayed chemical solution according to the preset spray density, which can prevent the concentration of the chemical solution distributed on the substrate A gradient is generated, which improves the consistency of the distribution of the chemical solution, thereby improving the consistency of the key dimensions in the substrate.
  • the substrate developing method of the present invention can prevent the gradient of the concentration of the chemical solution distributed on the substrate, improve the consistency of the distribution of the chemical solution, and thereby improve the consistency of the key dimensions in the substrate.
  • FIG. 1 is a schematic structural view of the developing device of the present invention.
  • FIG. 2 is a flowchart of a substrate development method of the present invention.
  • the present invention provides a developing device, including: a conveying platform 10 And on the transmission platform 10 Spraying mechanism above 20 ;
  • the spray mechanism 20 Including spray pipe twenty one And in the spray pipe twenty one Multiple first nozzles twenty two And multiple second nozzles twenty three ;
  • the second nozzle twenty three It is used to start spraying chemical liquid or close spraying chemical liquid according to preset spraying density.
  • the present invention uses a transmission platform 10 Transmission substrate 30
  • the process of making the substrate 30 Inclined with respect to the horizontal direction it can make the chemical liquid flow direction more consistent and reduce the substrate 30 produce Mura Possibility; and the replacement rate of new and old chemicals is higher, and the regional concentration control is better, and the substrate is subsequently dried by blowing 30 Only requires a small blowing force to dry the substrate, further reducing the substrate 30 produce Mura Possibility.
  • the invention is further in the spray pipe twenty one Multiple second nozzles twenty three , The second nozzle twenty three According to the preset spray density, turn on the spray liquid or turn off the spray liquid.
  • the transmission platform 10 There are multiple guide rollers inclined relative to the horizontal 11 ,
  • the guide roller 11 Transmission substrate 30 And in the transmission process can make the substrate 30 Tilt relative to horizontal.
  • the guide roller 11 Will gradually wear out, the substrate 30
  • the inclination angle of will also change accordingly, the present invention can open or close the second nozzle according to the inclination angle after the change twenty three Without the need to adjust the guide rollers frequently 11 Angle of inclination to improve the consistency of the chemical distribution and avoid substrates 30 Fragmentation risk.
  • the spray pipe twenty one With substrate 30 Parallel, ie spray pipe twenty one Tilt angle and substrate 30 The angle of inclination is the same in order to better towards the substrate 30 Spray liquid medicine.
  • the substrate 30 The angle relative to the horizontal is 5 °, when the chemical liquid from the substrate 30 When one end flows to the other end, the substrate 30 produce Mura It is less likely.
  • the second nozzle twenty three Threaded inside, through T Type nut cooperates with the thread to close the second nozzle twenty three .
  • the plurality of second nozzles twenty three Located in every two adjacent first nozzles twenty two In order to better adjust the spray density.
  • the present invention also provides a substrate developing method, including the following steps:
  • step S1 Provide a developing device; the developing device includes: a delivery platform 10 And on the transmission platform 10 Spraying mechanism above 20 ; The spray mechanism 20 Including spray pipe twenty one And in the spray pipe twenty one Multiple first nozzles twenty two And multiple second nozzles twenty three ;
  • step S2 The delivery platform 10 Transmission substrate 30 , And make the substrate in the transmission process 30 Inclined relative to the horizontal direction;
  • step S3 The first nozzle twenty two Continue to the substrate 30 Spraying liquid medicine; the second nozzle twenty three According to the preset spraying density, the spraying liquid medicine is turned on or the spraying liquid medicine is turned off.
  • the present invention uses a transmission platform 10 Transmission substrate 30
  • the process of making the substrate 30 Inclined with respect to the horizontal direction it can make the chemical liquid flow direction more consistent and reduce the substrate 30 produce Mura Possibility; and the replacement rate of new and old chemicals is higher, and the regional concentration control is better, and the substrate is subsequently dried by blowing 30 Only requires a small blowing force to dry the substrate, further reducing the substrate 30 produce Mura Possibility.
  • the invention is further in the spray pipe twenty one Multiple second nozzles twenty three , The second nozzle twenty three According to the preset spray density, turn on the spray liquid or turn off the spray liquid.
  • the transmission platform 10 There are multiple guide rollers inclined relative to the horizontal 11 ,
  • the guide roller 11 Transmission substrate 30 And in the transmission process can make the substrate 30 Tilt relative to horizontal.
  • the guide roller 11 Will gradually wear out, the substrate 30
  • the inclination angle of will also change accordingly, the present invention can open or close the second nozzle according to the inclination angle after the change twenty three Without the need to adjust the guide rollers frequently 11 Angle of inclination to improve the consistency of the chemical distribution and avoid substrates 30 Fragmentation risk.
  • the spray pipe twenty one With substrate 30 Parallel, ie spray pipe twenty one Tilt angle and substrate 30 The angle of inclination is the same in order to better towards the substrate 30 Spray liquid medicine.
  • the substrate 30 The angle relative to the horizontal is 5 °, when the chemical liquid from the substrate 30 When one end flows to the other end, the substrate 30 produce Mura It is less likely.
  • the steps S3 Pass in T Type nut cooperates with the thread to close the second nozzle twenty three .
  • the plurality of second nozzles twenty three Located in every two adjacent first nozzles twenty two In order to better adjust the spray density.
  • the developing device of the present invention includes: a conveying platform and a spray mechanism provided above the conveying platform; the spray mechanism includes a spray tube and a plurality of firsts provided on the spray tube Nozzle and multiple second nozzles; the transfer platform is used to drive the substrate, and during the transmission process, the substrate is inclined relative to the horizontal direction, which can make the chemical liquid flow direction more consistent and reduce the production of the substrate Mura The possibility of replacement of new and old chemical solutions is higher, and the regional concentration control is better.
  • the substrate is subsequently dried by blowing, only a small blowing force is required to dry the substrate, which further reduces the production of the substrate Mura Possibility.
  • the first nozzle is used to continuously spray the chemical solution to the substrate; the second nozzle is used to turn on the sprayed chemical solution or turn off the sprayed chemical solution according to the preset spray density, which can prevent the concentration of the chemical solution distributed on the substrate A gradient is generated, which improves the consistency of the distribution of the chemical solution, thereby improving the consistency of the key dimensions in the substrate.
  • the substrate developing method of the present invention can prevent the gradient of the concentration of the chemical solution distributed on the substrate, improve the consistency of the distribution of the chemical solution, and thereby improve the consistency of the key dimensions in the substrate.

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
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  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
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Abstract

一种显影装置及基板显影方法。该显影装置包括：传送平台（10）以及设于传送平台（10）上方的喷淋机构（20）；喷淋机构（20）包括喷淋管（21）以及设于喷淋管（21）上的多个第一喷嘴（22）和多个第二喷嘴（23）；传送平台（10）用于传动基板（30），并在传动过程中使基板（30）相对于水平方向倾斜，可以使药液流向较为一致，降低基板产生Mura的可能性；且新旧药液置换率较高，对于区域性浓度控制较好，后续只需要较小的吹风力道即可干燥基板，进一步降低基板产生Mura的可能性，第一喷嘴（22）用于持续向基板（30）喷淋药液；第二喷嘴（23）用于根据预设的喷淋密度开启喷淋药液或关闭喷淋药液，可以防止基板（30）上分布的药液浓度有梯度产生，提高药液分布的一致性，进而提高基板（30）内的关键尺寸的一致性。

Description

显影装置及基板显影方法 技术领域
本发明涉及显示技术领域，尤其涉及一种显影装置及基板显影方法。
 背景技术
薄膜晶体管（Thin Film Transistor，TFT）是目前液晶显示装置（Liquid Crystal Display，LCD）和有源矩阵驱动式有机电致发光显示装置（Active Matrix Organic Light-Emitting Diode，AMOLED）中的主要驱动元件，直接关系平板显示装置的显示性能。
现有市场上的液晶显示器大部分为背光型液晶显示器，其包括液晶显示面板及背光模组（backlight module）。液晶显示面板的工作原理是在薄膜晶体管阵列基板（Thin Film Transistor Array Substrate，TFT Array Substrate）与彩色滤光片（Color Filter，CF）基板之间灌入液晶分子，并在两片基板上分别施加像素电压和公共电压，通过像素电压和公共电压之间形成的电场控制液晶分子的旋转方向，以将背光模组的光线透射出来产生画面。
随着小尺寸TFT-LCD越做越精细，对应工艺设备也在不断更新换代以满足工艺需求，以6代LTPS（Low Temperature Poly-silicon，低温多晶硅）产线为例，在CF基板制造中使用的显影机，已将基板从水平搬送方式变更为倾斜搬送方式。倾斜搬送方式有如下优点：1、药液流向较为一致，Mura发生可能性较小；2、干燥效果好，吹除时所需力道小，Mura发生可能性较小；3、新旧药液置换率较高，对于区域性浓度控制较好，同时洗净能力较强，对节省去离子水用量比较有利；4、药液水膜较薄，对减少药液持出量较好。尽管倾斜搬送方式有上述优点，但仍有不足的地方：1、导辊（Guide Roller）磨损会比较严重，水平线调整频繁，基板破片问题较为严重；2、倾斜部是生产周期时间（Tact Time）的瓶颈，设备总体长度会偏长一些；3、药液均匀分布会有浓度梯度产生，基板内的关键尺寸(Critical Dimension，CD)会呈现梯度分布，不利于控制关键尺寸一致性。
 技术问题
本发明的目的在于提供一种显影装置，可以防止基板上分布的药液浓度有梯度产生，提高药液分布的一致性，进而提高基板内的关键尺寸的一致性。
本发明的目的还在于提供一种基板显影方法，可以防止基板上分布的药液浓度有梯度产生，提高药液分布的一致性，进而提高基板内的关键尺寸的一致性。
 技术解决方案
为实现上述目的，本发明提供了一种显影装置，包括：传送平台以及设于所述传送平台上方的喷淋机构；所述喷淋机构包括喷淋管以及设于所述喷淋管上的多个第一喷嘴和多个第二喷嘴；
所述传送平台用于传动基板，并在传动过程中使基板相对于水平方向倾斜；
所述第一喷嘴用于持续向基板喷淋药液；
所述第二喷嘴用于根据预设的喷淋密度开启喷淋药液或关闭喷淋药液。
所述传送平台中设有多个相对于水平方向倾斜的导辊。
所述基板相对于水平方向倾斜的角度为5°。
所述第二喷嘴内具有螺纹，通过T型螺帽与螺纹配合来关闭第二喷嘴。
所述多个第二喷嘴分别位于每相邻两个第一喷嘴之间。
本发明还提供一种基板显影方法，包括如下步骤：
步骤S1、提供显影装置；所述显影装置包括：传送平台以及设于所述传送平台上方的喷淋机构；所述喷淋机构包括喷淋管以及设于所述喷淋管上的多个第一喷嘴和多个第二喷嘴；
步骤S2、所述传送平台传动基板，并在传动过程中使基板相对于水平方向倾斜；
步骤S3、所述第一喷嘴持续向基板喷淋药液；所述第二喷嘴根据预设的喷淋密度开启喷淋药液或关闭喷淋药液。
所述传送平台中设有多个相对于水平方向倾斜的导辊。
所述基板相对于水平方向倾斜的角度为5°。
所述第二喷嘴内具有螺纹，所述步骤S3中通过T型螺帽与螺纹配合来关闭第二喷嘴。
所述多个第二喷嘴分别位于每相邻两个第一喷嘴之间。
 有益效果
本发明的有益效果：本发明的显影装置包括：传送平台以及设于所述传送平台上方的喷淋机构；所述喷淋机构包括喷淋管以及设于所述喷淋管上的多个第一喷嘴和多个第二喷嘴；所述传送平台用于传动基板，并在传动过程中使基板相对于水平方向倾斜，可以使药液流向较为一致，降低基板产生Mura的可能性；且新旧药液置换率较高，对于区域性浓度控制较好，后续通过吹风干燥基板时，只需要较小的吹风力道即可干燥基板，进一步降低基板产生Mura的可能性。所述第一喷嘴用于持续向基板喷淋药液；所述第二喷嘴用于根据预设的喷淋密度开启喷淋药液或关闭喷淋药液，可以防止基板上分布的药液浓度有梯度产生，提高药液分布的一致性，进而提高基板内的关键尺寸的一致性。本发明的基板显影方法，可以防止基板上分布的药液浓度有梯度产生，提高药液分布的一致性，进而提高基板内的关键尺寸的一致性。
 附图说明
为了能更进一步了解本发明的特征以及技术内容，请参阅以下有关本发明的详细说明与附图，然而附图仅提供参考与说明用，并非用来对本发明加以限制。
附图中，
图1为本发明的显影装置的结构示意图；
图2为本发明的基板显影方法的流程图。
 本发明的实施方式
为更进一步阐述本发明所采取的技术手段及其效果，以下结合本发明的优选实施例及其附图进行详细描述。
请参阅图 1 ，本发明提供一种显影装置，包括：传送平台 10 以及设于所述传送平台 10 上方的喷淋机构 20 ；所述喷淋机构 20 包括喷淋管 21 以及设于所述喷淋管 21 上的多个第一喷嘴 22 和多个第二喷嘴 23 ；
所述传送平台 10 用于传动基板 30 ，并在传动过程中使基板 30 相对于水平方向倾斜；
所述第一喷嘴 22 用于持续向基板 30 喷淋药液；
所述第二喷嘴 23 用于根据预设的喷淋密度开启喷淋药液或关闭喷淋药液。
需要说明的是，本发明通过传送平台 10 传动基板 30 的过程中使基板 30 相对于水平方向倾斜，可以使药液流向较为一致，降低基板 30 产生 Mura 的可能性；且新旧药液置换率较高，对于区域性浓度控制较好，后续通过吹风干燥基板 30 时，只需要较小的吹风力道即可干燥基板，进一步降低基板 30 产生 Mura 的可能性。本发明进一步在喷淋管 21 上设置多个第二喷嘴 23 ，该第二喷嘴 23 根据预设的喷淋密度开启喷淋药液或关闭喷淋药液，在实际显影过程中，当需要对基板 30 上的某一区域增加或减少药液量，可以通过第二喷嘴 23 的开启或关闭来对应增加或减少基板 30 上的某一区域的药液量，防止基板 30 上分布的药液浓度有梯度产生，提高药液分布的一致性，进而提高基板 30 内的关键尺寸的一致性。此外，由于设置有第二喷嘴 23 ，因此不需要将传送平台 10 设置的过长，以降低显影装置的成本。
具体的，所述传送平台 10 中设有多个相对于水平方向倾斜的导辊 11 ，该导辊 11 传动基板 30 并在传动过程中可以使基板 30 相对于水平方向倾斜。在显影过程中，导辊 11 会逐渐磨损，基板 30 的倾斜角度也会随之发生变化，本发明可以根据发生变化之后的倾斜角度来开启或关闭第二喷嘴 23 ，而不要需要频繁调整导辊 11 的倾斜角度来提高药液分布的一致性，避免基板 30 破片的风险。此外，所述喷淋管 21 与基板 30 平行，即喷淋管 21 倾斜的角度与基板 30 倾斜的角度相同，以便更好地向基板 30 喷淋药液。
具体的，所述基板 30 相对于水平方向倾斜的角度为 5 °，当药液从基板 30 的一端流向另一端时，基板 30 产生 Mura 可能性较小。
具体的，所述第二喷嘴 23 内具有螺纹，通过 T 型螺帽与螺纹配合来关闭第二喷嘴 23 。
具体的，所述多个第二喷嘴 23 分别位于每相邻两个第一喷嘴 22 之间，以便更好地调整喷淋密度。
请参阅图 2 ，基于上述显影装置，本发明还提供一种基板显影方法，包括如下步骤：
步骤 S1 、提供显影装置；所述显影装置包括：传送平台 10 以及设于所述传送平台 10 上方的喷淋机构 20 ；所述喷淋机构 20 包括喷淋管 21 以及设于所述喷淋管 21 上的多个第一喷嘴 22 和多个第二喷嘴 23 ；
步骤 S2 、所述传送平台 10 传动基板 30 ，并在传动过程中使基板 30 相对于水平方向倾斜；
步骤 S3 、所述第一喷嘴 22 持续向基板 30 喷淋药液；所述第二喷嘴 23 根据预设的喷淋密度开启喷淋药液或关闭喷淋药液。
需要说明的是，本发明通过传送平台 10 传动基板 30 的过程中使基板 30 相对于水平方向倾斜，可以使药液流向较为一致，降低基板 30 产生 Mura 的可能性；且新旧药液置换率较高，对于区域性浓度控制较好，后续通过吹风干燥基板 30 时，只需要较小的吹风力道即可干燥基板，进一步降低基板 30 产生 Mura 的可能性。本发明进一步在喷淋管 21 上设置多个第二喷嘴 23 ，该第二喷嘴 23 根据预设的喷淋密度开启喷淋药液或关闭喷淋药液，在实际显影过程中，当需要对基板 30 上的某一区域增加或减少药液量，可以通过第二喷嘴 23 的开启或关闭来对应增加或减少基板 30 上的某一区域的药液量，防止基板 30 上分布的药液浓度有梯度产生，提高药液分布的一致性，进而提高基板 30 内的关键尺寸的一致性。此外，由于设置有第二喷嘴 23 ，因此不需要将传送平台 10 设置的过长，以降低显影装置的成本。
具体的，所述传送平台 10 中设有多个相对于水平方向倾斜的导辊 11 ，该导辊 11 传动基板 30 并在传动过程中可以使基板 30 相对于水平方向倾斜。在显影过程中，导辊 11 会逐渐磨损，基板 30 的倾斜角度也会随之发生变化，本发明可以根据发生变化之后的倾斜角度来开启或关闭第二喷嘴 23 ，而不要需要频繁调整导辊 11 的倾斜角度来提高药液分布的一致性，避免基板 30 破片的风险。此外，所述喷淋管 21 与基板 30 平行，即喷淋管 21 倾斜的角度与基板 30 倾斜的角度相同，以便更好地向基板 30 喷淋药液。
具体的，所述基板 30 相对于水平方向倾斜的角度为 5 °，当药液从基板 30 的一端流向另一端时，基板 30 产生 Mura 可能性较小。
具体的，所述第二喷嘴 23 内具有螺纹，所述步骤 S3 中通过 T 型螺帽与螺纹配合来关闭第二喷嘴 23 。
具体的，所述多个第二喷嘴 23 分别位于每相邻两个第一喷嘴 22 之间，以便更好地调整喷淋密度。
综上所述，本发明的显影装置包括：传送平台以及设于所述传送平台上方的喷淋机构；所述喷淋机构包括喷淋管以及设于所述喷淋管上的多个第一喷嘴和多个第二喷嘴；所述传送平台用于传动基板，并在传动过程中使基板相对于水平方向倾斜，可以使药液流向较为一致，降低基板产生 Mura 的可能性；且新旧药液置换率较高，对于区域性浓度控制较好，后续通过吹风干燥基板时，只需要较小的吹风力道即可干燥基板，进一步降低基板产生 Mura 的可能性。所述第一喷嘴用于持续向基板喷淋药液；所述第二喷嘴用于根据预设的喷淋密度开启喷淋药液或关闭喷淋药液，可以防止基板上分布的药液浓度有梯度产生，提高药液分布的一致性，进而提高基板内的关键尺寸的一致性。本发明的基板显影方法，可以防止基板上分布的药液浓度有梯度产生，提高药液分布的一致性，进而提高基板内的关键尺寸的一致性。
以上所述，对于本领域的普通技术人员来说，可以根据本发明的技术方案和技术构思作出其他各种相应的改变和变形，而所有这些改变和变形都应属于本发明权利要求的保护范围。

Claims (10)

  1. 一种显影装置，包括：传送平台以及设于所述传送平台上方的喷淋机构；所述喷淋机构包括喷淋管以及设于所述喷淋管上的多个第一喷嘴和多个第二喷嘴；
    所述传送平台用于传动基板，并在传动过程中使基板相对于水平方向倾斜；
    所述第一喷嘴用于持续向基板喷淋药液；
    所述第二喷嘴用于根据预设的喷淋密度开启喷淋药液或关闭喷淋药液。
  2. 如权利要求1所述的显影装置，其中，所述传送平台中设有多个相对于水平方向倾斜的导辊。
  3. 如权利要求1所述的显影装置，其中，所述基板相对于水平方向倾斜的角度为5°。
  4. 如权利要求1所述的显影装置，其中，所述第二喷嘴内具有螺纹，通过T型螺帽与螺纹配合来关闭第二喷嘴。
  5. 如权利要求1所述的显影装置，其中，所述多个第二喷嘴分别位于每相邻两个第一喷嘴之间。
  6. 一种基板显影方法，包括如下步骤：
    步骤S1、提供显影装置；所述显影装置包括：传送平台以及设于所述传送平台上方的喷淋机构；所述喷淋机构包括喷淋管以及设于所述喷淋管上的多个第一喷嘴和多个第二喷嘴；
    步骤S2、所述传送平台传动基板，并在传动过程中使基板相对于水平方向倾斜；
    步骤S3、所述第一喷嘴持续向基板喷淋药液；所述第二喷嘴根据预设的喷淋密度开启喷淋药液或关闭喷淋药液。
  7. 如权利要求6所述的基板显影方法，其中，所述传送平台中设有多个相对于水平方向倾斜的导辊。
  8. 如权利要求6所述的基板显影方法，其中，所述基板相对于水平方向倾斜的角度为5°。
  9. 如权利要求6所述的基板显影方法，其中，所述第二喷嘴内具有螺纹，所述步骤S3中通过T型螺帽与螺纹配合来关闭第二喷嘴。
  10. 如权利要求6所述的基板显影方法，其中，所述多个第二喷嘴分别位于每相邻两个第一喷嘴之间。
PCT/CN2018/119243 2018-10-29 2018-12-04 显影装置及基板显影方法 Ceased WO2020087650A1 (zh)

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