WO2020079797A1 - Film deposition device - Google Patents

Film deposition device Download PDF

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Publication number
WO2020079797A1
WO2020079797A1 PCT/JP2018/038808 JP2018038808W WO2020079797A1 WO 2020079797 A1 WO2020079797 A1 WO 2020079797A1 JP 2018038808 W JP2018038808 W JP 2018038808W WO 2020079797 A1 WO2020079797 A1 WO 2020079797A1
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WO
WIPO (PCT)
Prior art keywords
squeegee
film forming
tray
opening
recess
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Application number
PCT/JP2018/038808
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French (fr)
Japanese (ja)
Inventor
明宏 川尻
重義 稲垣
Original Assignee
株式会社Ｆｕｊｉ
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 株式会社Ｆｕｊｉ filed Critical 株式会社Ｆｕｊｉ
Priority to JP2020551666A priority Critical patent/JP6950102B2/en
Priority to CN201880097869.9A priority patent/CN112739539B/en
Priority to PCT/JP2018/038808 priority patent/WO2020079797A1/en
Publication of WO2020079797A1 publication Critical patent/WO2020079797A1/en

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41F—PRINTING MACHINES OR PRESSES
    • B41F15/00—Screen printers
    • B41F15/08—Machines
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/30—Assembling printed circuits with electric components, e.g. with resistor
    • H05K3/32—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
    • H05K3/34—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by soldering

Definitions

  • the present disclosure relates to a film forming apparatus that forms a thin film of a conductive paste.
  • Patent Document 1 a technique described in Patent Document 1 below is a screen printing apparatus for cream solder, in which a moving table arranged above a mask plate of a screen mask having pattern holes formed therein and the moving table in the X direction.
  • X-direction moving means for horizontally moving the moving table
  • Y-direction moving means for horizontally moving the moving table in the Y direction orthogonal to the X direction
  • rotating means integrally provided on the moving table
  • cream solder inside a cylindrical squeegee which is driven by the rotating means to rotate in the horizontal direction on the mask plate.
  • an object of the present disclosure is to provide a film forming apparatus suitable for forming a thin film of a conductive paste.
  • the present specification describes a film forming tray having a supply surface on which a conductive paste is placed, a squeegee having a lower surface pressed against the supply surface of the film forming tray, and a film forming tray provided on the supply surface of the film forming tray.
  • a film forming apparatus including: a first recess having a first opening formed therein, and a first recess configured so that the conductive paste scraped out on the lower surface of the squeegee is inserted through the first opening.
  • the film forming apparatus is suitable for forming a thin film of conductive paste.
  • FIG. 2 is a view showing a cross section of the film forming apparatus of FIG. 1 taken along line I-I of FIG. 1.
  • FIG. 2 is a view showing a cross section of the film forming apparatus taken along line I-I in FIG. 1.
  • FIG. 2 is a view showing a cross section of the film forming apparatus taken along line I-I in FIG. 1.
  • FIG. 7 is a view showing a cross section of the film forming apparatus of FIG. 6 taken along line II of FIG. 6. It is a top view which shows a film-forming apparatus. It is a top view which shows a film-forming apparatus.
  • FIG. 9 is a view showing a cross section of the film forming apparatus of FIG. 7 taken along line II of FIG.
  • FIG. 9 is a view showing a cross section of the film forming apparatus of FIG. 7 taken along line II of FIG. 7.
  • FIG. 13 is a diagram showing a cross section of the film forming apparatus of FIG. 12 taken along line I-I of FIG. 12.
  • FIG. 14 is a diagram showing a cross section of the film forming apparatus of FIG. 13 taken along line I-I of FIG. 13. It is a top view which shows a film-forming apparatus. It is a top view which shows a film-forming apparatus.
  • the film forming apparatus 1 includes a film forming tray 10, a squeegee 30, a slide mechanism 50, and a controller 52.
  • the film forming tray 10 has a supply surface 12.
  • the supply surface 12, on which the squeegee 30 is placed, has a generally rectangular shape.
  • the X-axis direction indicates the longitudinal direction of the supply surface 12
  • the Y-axis direction indicates the lateral direction of the supply surface 12.
  • the Z-axis direction is a direction orthogonal to both the X-axis direction and the Y-axis direction, and indicates the vertical direction.
  • a first recess 14 and a first opening 16 are provided in the approximate center of the supply surface 12.
  • the first recess 14 and the first opening 16 are very small compared to the supply surface 12.
  • the first recess 14 is continuous with the first opening 16 and is recessed downward.
  • the squeegee 30, like the supply surface 12 of the film forming tray 10, has a generally rectangular shape. However, the length of the squeegee 30 in the lateral direction is shorter than that of the supply surface 12 and is about one third of the length of the supply surface 12 in the lateral direction. As a result, when the squeegee 30 is located on the end edge side of the supply surface 12 in the Y-axis direction, the squeegee 30 does not overlap the first recess 14 and the first opening 16 of the supply surface 12.
  • the squeegee 30 has a lower surface 32.
  • a second recess 34 and a second opening 36 are provided at approximately the center of the lower surface 32.
  • the second recess 34 is continuous with the second opening 36, and is in a state of being recessed upward.
  • the second opening 36 of the squeegee 30 is larger than the first opening 16 of the film deposition tray 10 in plan view.
  • the slide mechanism 50 is connected to the longitudinal end of the squeegee 30 outside the film deposition tray 10, and slides the squeegee 30 mounted on the supply surface 12 of the film deposition tray 10 in the Y-axis direction. It is a thing. As a result, the film forming tray 10 and the squeegee 30 are moved relatively. Further, since the slide mechanism 50 presses the lower surface 32 of the squeegee 30 against the supply surface 12 of the film forming tray 10, the second recess 34 of the squeegee 30 is in a hermetically sealed state. The lower surface 32 of the squeegee 30 may be pressed against the supply surface 12 by a height adjusting mechanism (not shown) or the like.
  • the control device 52 is connected to the slide mechanism 50. Thereby, the control device 52 can move the squeegee 30 to an arbitrary position in the Y-axis direction on the supply surface 12 of the film forming tray 10 by controlling the slide mechanism 50. Since the slide mechanism 50 and the control device 52 are configured by known techniques, detailed description thereof will be omitted.
  • a supply passage 38 and a supply port 40 are provided on the upper portion of the squeegee 30.
  • the upper part of the supply path 38 is connected to the supply port 40.
  • the lower side of the supply passage 38 communicates with the second recess 34 of the squeegee 30.
  • a plug 42 is detachably attached to the supply port 40.
  • the worker can supply the conductive paste 54 to the second recess 34 of the squeegee 30 by removing the stopper 42 from the supply port 40. Therefore, the operator prepares the syringe 70.
  • the syringe 70 includes a needle tube 72, a barrel 74, and a plunger 76.
  • the barrel 74 is filled with the conductive paste 54.
  • the conductive paste 54 is used by a pin transfer method for forming an electrode pad, joining between conductive circuits, and the like in the manufacture of a three-dimensional laminated electronic device, for example.
  • the worker inserts the needle tube 72 of the syringe 70 into the supply port 40 and the supply passage 38 to pass the needle tube 72 up to the second recess 34 of the squeegee 30. Further, the operator pushes the plunger 76 of the syringe 70 into the barrel 74. As a result, the conductive paste 54 is transferred from the barrel 74 of the syringe 70 through the needle tube 72 to the second recess 34 of the squeegee 30. In this way, the conductive paste 54 is supplied to the second recess 34 of the squeegee 30.
  • the conductive paste 54 is placed on the supply surface 12 of the film forming tray 10 in a raised state.
  • the conductive paste 54 placed on the supply surface 12 of the film forming tray 10 (hereinafter, referred to as the conductive paste 54 on the supply surface 12 of the film forming tray 10) is opened in the second opening 36 of the squeegee 30. It is housed in the second recess 34 of the squeegee 30 while being surrounded by the edge.
  • the worker attaches the stopper 42 to the supply port 40.
  • the second recess 34 of the squeegee 30 is hermetically sealed in a state where the conductive paste 54 on the supply surface 12 of the film forming tray 10 is contained. That is, the conductive paste 54 on the supply surface 12 of the film forming tray 10 is capped by the second recess 34 of the squeegee 30.
  • the conductive paste 54 is removed from the squeegee 30 in the second recess 34 of the squeegee 30. It is moved on the supply surface 12 of the film forming tray 10 by being pushed by the inner wall surface of the second recess 34 of the squeegee 30 while being scraped out by the edge of the lower surface 32.
  • the first concave portion 14 that is much smaller than the supply surface 12 of the film forming tray 10 is A thin film of the conductive paste 54 having a film thickness equal to the depth of the first recess 14 is formed. Therefore, the film thickness of the conductive paste 54 is controlled by the depth of the first recess 14 of the film forming tray 10.
  • the conductive paste 54 is placed on the lower surface of the squeegee 30 in the same manner as when the squeegee 30 is slid toward the first opening 16 side of the film forming tray 10.
  • the squeegee 30 moves on the supply surface 12 of the film forming tray 10.
  • the squeegee 30 is stopped by the control device 52 and the slide mechanism 50 in a state of passing over the first opening 16 of the film forming tray 10.
  • the transfer pin 78 used for manufacturing a three-dimensional laminated electronic device or the like is formed in the first recess 14 of the film forming tray 10. It is possible to dip the thin film of the conductive paste 54 thus formed.
  • the squeegee 30 is slid in the opposite direction to the above-described slide by the control device 52 and the slide mechanism 50. As a result, a thin film of the conductive paste 54 is formed in the first recess 14 of the film forming tray 10 as in the case of the above-described slide. At that time, as shown in FIGS. 10 and 12, the squeegee 30 moves to the first opening 16 of the film forming tray 10, and further, as shown in FIGS. Is stopped after passing through the first opening 16 of the film forming tray 10.
  • the squeegee 30 is removed from the film forming tray 10 by the control device 52 and the slide mechanism 50 every time the conductive paste 54 in the first recess 14 of the film forming tray 10 is reduced.
  • a thin film of the conductive paste 54 can be formed in the first recess 14 of the film forming tray 10.
  • the conductive paste 54 is applied by the syringe 70 described above. 54 is replenished in the second recess 34 of the squeegee 30.
  • the film forming apparatus 1 of the present embodiment forms the squeegee 30 by the control device 52 and the slide mechanism 50 even when the conductive paste 54 in the first recess 14 of the film forming tray 10 is no longer used. Slide on the supply surface 12 of the tray 10.
  • the control device 52 and the slide mechanism 50 cause the squeegee 30 to be in the state shown in FIG. 6 or 12, that is, the second opening 36 of the squeegee 30 is the film forming tray 10.
  • the first opening 16 is stopped in a state of overlapping with the entire area of the first opening 16.
  • the second recess 34 of the squeegee 30 is in a state of covering the first recess 14 of the film forming tray 10, so that the conductivity inside the first recess 14 of the film forming tray 10 is increased.
  • the paste 54 is capped in (the second recess 34 of) the squeegee 30.
  • Such capping of the squeegee 30 is released by sliding the squeegee 30 on the supply surface 12 of the film forming tray 10 by the control device 52 and the slide mechanism 50. At that time, when the squeegee 30 is separated from the first opening 16 of the film forming tray 10, a thin film of the conductive paste 54 is formed in the first recess 14 of the film forming tray 10. That is, in the film forming apparatus 1 of the present embodiment, the thin film formation of the conductive paste 54 and the capping release of the squeegee 30 are simultaneously performed.
  • the film forming apparatus 1 of this embodiment is suitable for forming a thin film of the conductive paste 54.
  • the slide mechanism 50 is an example of a “drive unit”.
  • the control device 52 is an example of a “control unit”.
  • the film deposition tray 10 and the squeegee 30 may be moved relatively by sliding the film deposition tray 10. Further, the film deposition tray 10 and the squeegee 30 may be moved relatively by sliding both the film deposition tray 10 and the squeegee 30.
  • the film forming apparatus 1 controls the control device 52 and the slide mechanism 50 so that the squeegee 30 is The lower surface 32 is stopped in a state where it overlaps the entire area of the first opening 16 of the film forming tray 10.
  • the conductive paste 54 in the first recess 14 of the film forming tray 10 is capped on the lower surface 32 of the squeegee 30.
  • film forming apparatus 10 film forming tray 12 supply surface 14 first recess 16 first opening 30 squeegee 32 lower surface 34 second recess 36 second opening 40 supply port 42 plug 50 slide mechanism 52 controller 54 conductive paste

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Mechanical Engineering (AREA)
  • Screen Printers (AREA)
  • Electric Connection Of Electric Components To Printed Circuits (AREA)
  • Manufacturing Of Printed Wiring (AREA)

Abstract

A film deposition device is provided with: a film deposition tray (10) having a supplying surface (12) on which a conductive paste (54) is placed; a squeegee (30) having a lower surface (32) pressed against the supplying surface (12) of the film deposition tray (10); and a first recessed part (14) which is provided on the film deposition tray (10), has a first opening part (16) formed on the supplying surface (12) of the film deposition tray (10), and is configured to allow the conductive paste (54) scraped out by the lower surface (32) of the squeegee (30) to enter via the first opening part (16).

Description

成膜装置Film forming equipment
　本開示は、導電性ペーストの薄膜を形成する成膜装置に関するものである。 The present disclosure relates to a film forming apparatus that forms a thin film of a conductive paste.
　従来、成膜装置に関する種々の技術が提案されている。例えば、下記特許文献１に記載の技術は、クリーム半田のスクリーン印刷装置であって、パターン孔が開孔されたスクリーンマスクのマスクプレートの上方に配置される移動台と、この移動台をＸ方向に水平移動させるＸ方向移動手段と、この移動台を前記Ｘ方向と直交するＹ方向に水平移動させるＹ方向移動手段と、この移動台に一体的に設けられた回転手段と、内部にクリーム半田が貯溜されてこの回転手段に駆動されて前記マスクプレート上を水平方向に回転する筒状のスキージとを備えたことを特徴とする。 Conventionally, various technologies related to film forming apparatuses have been proposed. For example, a technique described in Patent Document 1 below is a screen printing apparatus for cream solder, in which a moving table arranged above a mask plate of a screen mask having pattern holes formed therein and the moving table in the X direction. X-direction moving means for horizontally moving the moving table, Y-direction moving means for horizontally moving the moving table in the Y direction orthogonal to the X direction, rotating means integrally provided on the moving table, and cream solder inside. And a cylindrical squeegee which is driven by the rotating means to rotate in the horizontal direction on the mask plate.
　このような特徴は、下記特許文献１によれば、クリーム半田を十分に練り合わせながら、マスクプレートのパターン孔に密に充填できる。 According to Patent Document 1 below, such a feature allows the pattern holes of the mask plate to be densely filled while sufficiently mixing the cream solder.
特開平６－２３４２０４号公報JP-A-6-234204
　これにより、マスクプレートのパターン孔には、クリーム半田の薄膜が形成されているとも言えるが、上記特許文献１に記載の技術は、クリーム半田のスクリーン印刷装置であるため、ピン転写される導電性ペーストの薄膜を形成するには不向きであった。 As a result, it can be said that a cream solder thin film is formed in the pattern hole of the mask plate. However, since the technique described in Patent Document 1 is a screen printing device for cream solder, it is possible to perform pin transfer conductive It was not suitable for forming a thin film of paste.
　そこで、本開示は、上述した点を鑑みてなされたものであり、導電性ペーストの薄膜を形成するのに好適な成膜装置を提供することを課題とする。 Therefore, the present disclosure has been made in view of the above points, and an object of the present disclosure is to provide a film forming apparatus suitable for forming a thin film of a conductive paste.
　本明細書は、導電性ペーストが載せられる供給面を有する成膜トレイと、成膜トレイの供給面に押し付けられる下面を有するスキージと、成膜トレイに設けられ、成膜トレイの供給面に形成された第１開口部を有し、スキージの下面で掻き出された導電性ペーストが第１開口部を通って入れられるように構成された第１凹部とを備える成膜装置を開示する。 The present specification describes a film forming tray having a supply surface on which a conductive paste is placed, a squeegee having a lower surface pressed against the supply surface of the film forming tray, and a film forming tray provided on the supply surface of the film forming tray. Disclosed is a film forming apparatus including: a first recess having a first opening formed therein, and a first recess configured so that the conductive paste scraped out on the lower surface of the squeegee is inserted through the first opening.
　本開示によれば、成膜装置は、導電性ペーストの薄膜を形成するのに好適である。 According to the present disclosure, the film forming apparatus is suitable for forming a thin film of conductive paste.
成膜装置を示す平面図である。It is a top view which shows a film-forming apparatus. 図１の成膜装置が図１の線Ｉ－Ｉで切断された断面を示す図である。FIG. 2 is a view showing a cross section of the film forming apparatus of FIG. 1 taken along line I-I of FIG. 1. 成膜装置が図１の線Ｉ－Ｉで切断された断面を示す図である。FIG. 2 is a view showing a cross section of the film forming apparatus taken along line I-I in FIG. 1. 成膜装置が図１の線Ｉ－Ｉで切断された断面を示す図である。FIG. 2 is a view showing a cross section of the film forming apparatus taken along line I-I in FIG. 1. 図６の成膜装置が図６の線Ｉ－Ｉで切断された断面を示す図である。FIG. 7 is a view showing a cross section of the film forming apparatus of FIG. 6 taken along line II of FIG. 6. 成膜装置を示す平面図である。It is a top view which shows a film-forming apparatus. 成膜装置を示す平面図である。It is a top view which shows a film-forming apparatus. 図７の成膜装置が図７の線Ｉ－Ｉで切断された断面を示す図である。FIG. 9 is a view showing a cross section of the film forming apparatus of FIG. 7 taken along line II of FIG. 7. 図７の成膜装置が図７の線Ｉ－Ｉで切断された断面を示す図である。FIG. 9 is a view showing a cross section of the film forming apparatus of FIG. 7 taken along line II of FIG. 7. 図１２の成膜装置が図１２の線Ｉ－Ｉで切断された断面を示す図である。FIG. 13 is a diagram showing a cross section of the film forming apparatus of FIG. 12 taken along line I-I of FIG. 12. 図１３の成膜装置が図１３の線Ｉ－Ｉで切断された断面を示す図である。FIG. 14 is a diagram showing a cross section of the film forming apparatus of FIG. 13 taken along line I-I of FIG. 13. 成膜装置を示す平面図である。It is a top view which shows a film-forming apparatus. 成膜装置を示す平面図である。It is a top view which shows a film-forming apparatus.
　以下、本開示の好適な実施形態を、図面を参照しつつ詳細に説明する。但し、図面では、構成の一部が省略されて描かれており、描かれた各部の寸法比等は必ずしも正確ではない。 Hereinafter, preferred embodiments of the present disclosure will be described in detail with reference to the drawings. However, in the drawings, a part of the configuration is omitted and drawn, and the dimensional ratios of the drawn parts are not necessarily accurate.
　図１及び図２に示されるように、成膜装置１は、成膜トレイ１０、スキージ３０、スライド機構５０、及び制御装置５２を備えている。成膜トレイ１０は、供給面１２を有している。供給面１２は、スキージ３０が載せられるものであって、概して長方形状をなしている。尚、図面において、Ｘ軸方向は供給面１２の長手方向を示し、Ｙ軸方向は供給面１２の短手方向を示している。Ｚ軸方向は、Ｘ軸方向及びＹ軸方向の両方に直交する方向であり、上下方向を示している。 As shown in FIGS. 1 and 2, the film forming apparatus 1 includes a film forming tray 10, a squeegee 30, a slide mechanism 50, and a controller 52. The film forming tray 10 has a supply surface 12. The supply surface 12, on which the squeegee 30 is placed, has a generally rectangular shape. In the drawings, the X-axis direction indicates the longitudinal direction of the supply surface 12, and the Y-axis direction indicates the lateral direction of the supply surface 12. The Z-axis direction is a direction orthogonal to both the X-axis direction and the Y-axis direction, and indicates the vertical direction.
　成膜トレイ１０において、供給面１２の略中央には、第１凹部１４及び第１開口部１６が設けられている。第１凹部１４及び第１開口部１６は、供給面１２と比べて、非常に小さい。第１凹部１４は、第１開口部１６と連なっており、下方向へ窪んだ状態にある。 In the film forming tray 10, a first recess 14 and a first opening 16 are provided in the approximate center of the supply surface 12. The first recess 14 and the first opening 16 are very small compared to the supply surface 12. The first recess 14 is continuous with the first opening 16 and is recessed downward.
　スキージ３０は、成膜トレイ１０の供給面１２と同様にして、概して長方形状をなしている。但し、スキージ３０の短手方向の長さは、供給面１２の短手方向よりも短く、供給面１２の短手方向の長さの３分の１程度である。これにより、スキージ３０は、供給面１２のＹ軸方向の端縁側に位置する場合には、供給面１２の第１凹部１４及び第１開口部１６とは重ならない状態にある。 The squeegee 30, like the supply surface 12 of the film forming tray 10, has a generally rectangular shape. However, the length of the squeegee 30 in the lateral direction is shorter than that of the supply surface 12 and is about one third of the length of the supply surface 12 in the lateral direction. As a result, when the squeegee 30 is located on the end edge side of the supply surface 12 in the Y-axis direction, the squeegee 30 does not overlap the first recess 14 and the first opening 16 of the supply surface 12.
　スキージ３０は、下面３２を有している。下面３２の略中央には、第２凹部３４及び第２開口部３６が設けられている。第２凹部３４は、第２開口部３６と連なっており、上方向へ窪んだ状態にある。スキージ３０の第２開口部３６は、平面視において、成膜トレイ１０の第１開口部１６よりも大きい。 The squeegee 30 has a lower surface 32. A second recess 34 and a second opening 36 are provided at approximately the center of the lower surface 32. The second recess 34 is continuous with the second opening 36, and is in a state of being recessed upward. The second opening 36 of the squeegee 30 is larger than the first opening 16 of the film deposition tray 10 in plan view.
　スライド機構５０は、成膜トレイ１０の外方において、スキージ３０の長手方向側の端部に連結されており、成膜トレイ１０の供給面１２に載せられたスキージ３０をＹ軸方向でスライドさせるものである。これにより、成膜トレイ１０とスキージ３０が相対的に動かされる。更に、スライド機構５０は、スキージ３０の下面３２を成膜トレイ１０の供給面１２に押し付けるので、スキージ３０の第２凹部３４が密閉状態になる。尚、スキージ３０の下面３２は、不図示の高さ調節機構等によって、供給面１２に押し付けられてもよい。 The slide mechanism 50 is connected to the longitudinal end of the squeegee 30 outside the film deposition tray 10, and slides the squeegee 30 mounted on the supply surface 12 of the film deposition tray 10 in the Y-axis direction. It is a thing. As a result, the film forming tray 10 and the squeegee 30 are moved relatively. Further, since the slide mechanism 50 presses the lower surface 32 of the squeegee 30 against the supply surface 12 of the film forming tray 10, the second recess 34 of the squeegee 30 is in a hermetically sealed state. The lower surface 32 of the squeegee 30 may be pressed against the supply surface 12 by a height adjusting mechanism (not shown) or the like.
　制御装置５２は、スライド機構５０に接続されている。これにより、制御装置５２は、スライド機構５０を制御することによって、成膜トレイ１０の供給面１２上でスキージ３０をＹ軸方向の任意の位置に移動させることができる。尚、スライド機構５０及び制御装置５２は、公知技術で構成されるため、その詳細な説明は省略する。 The control device 52 is connected to the slide mechanism 50. Thereby, the control device 52 can move the squeegee 30 to an arbitrary position in the Y-axis direction on the supply surface 12 of the film forming tray 10 by controlling the slide mechanism 50. Since the slide mechanism 50 and the control device 52 are configured by known techniques, detailed description thereof will be omitted.
　図２乃至図４に示されるように、スキージ３０の上部には、供給路３８及び供給口部４０が設けられている。供給路３８の上方は、供給口部４０と連なっている。これに対して、供給路３８の下方は、スキージ３０の第２凹部３４に連通している。供給口部４０には、栓部４２が着脱自在に設けられている。 As shown in FIGS. 2 to 4, a supply passage 38 and a supply port 40 are provided on the upper portion of the squeegee 30. The upper part of the supply path 38 is connected to the supply port 40. On the other hand, the lower side of the supply passage 38 communicates with the second recess 34 of the squeegee 30. A plug 42 is detachably attached to the supply port 40.
　作業者は、栓部４２を供給口部４０から外すと、スキージ３０の第２凹部３４に導電性ペースト５４を供給することが可能である。そのために、作業者は、シリンジ７０を用意する。シリンジ７０は、針管７２、バレル７４、及びプランジャー７６を備えている。バレル７４には、導電性ペースト５４が詰められる。 The worker can supply the conductive paste 54 to the second recess 34 of the squeegee 30 by removing the stopper 42 from the supply port 40. Therefore, the operator prepares the syringe 70. The syringe 70 includes a needle tube 72, a barrel 74, and a plunger 76. The barrel 74 is filled with the conductive paste 54.
　尚、導電性ペースト５４は、例えば、３次元積層電子デバイスの製造において、電極パットの作成や導電回路間の接合等にピン転写の方法で使用されるものである。 Note that the conductive paste 54 is used by a pin transfer method for forming an electrode pad, joining between conductive circuits, and the like in the manufacture of a three-dimensional laminated electronic device, for example.
　作業者は、シリンジ７０の針管７２を、供給口部４０及び供給路３８に差し入れることによって、スキージ３０の第２凹部３４にまで通す。更に、作業者は、シリンジ７０のプランジャー７６をバレル７４に押し込む。これにより、導電性ペースト５４は、シリンジ７０のバレル７４から針管７２を通って、スキージ３０の第２凹部３４に移される。このようにして、スキージ３０の第２凹部３４には、導電性ペースト５４が供給される。 The worker inserts the needle tube 72 of the syringe 70 into the supply port 40 and the supply passage 38 to pass the needle tube 72 up to the second recess 34 of the squeegee 30. Further, the operator pushes the plunger 76 of the syringe 70 into the barrel 74. As a result, the conductive paste 54 is transferred from the barrel 74 of the syringe 70 through the needle tube 72 to the second recess 34 of the squeegee 30. In this way, the conductive paste 54 is supplied to the second recess 34 of the squeegee 30.
　スキージ３０の第２凹部３４では、導電性ペースト５４が盛り上がった状態で成膜トレイ１０の供給面１２に載せられている。これにより、成膜トレイ１０の供給面１２に載せられた導電性ペースト５４（以下、成膜トレイ１０の供給面１２上の導電性ペースト５４という）は、スキージ３０の第２開口部３６の開口縁に囲まれた状態で、スキージ３０の第２凹部３４に収められる。 In the second recess 34 of the squeegee 30, the conductive paste 54 is placed on the supply surface 12 of the film forming tray 10 in a raised state. As a result, the conductive paste 54 placed on the supply surface 12 of the film forming tray 10 (hereinafter, referred to as the conductive paste 54 on the supply surface 12 of the film forming tray 10) is opened in the second opening 36 of the squeegee 30. It is housed in the second recess 34 of the squeegee 30 while being surrounded by the edge.
　その後、作業者は、栓部４２を供給口部４０に付ける。これにより、スキージ３０の第２凹部３４は、成膜トレイ１０の供給面１２上の導電性ペースト５４を収めた状態で密閉される。つまり、成膜トレイ１０の供給面１２上の導電性ペースト５４は、スキージ３０の第２凹部３４でキャッピングされた状態になる。 After that, the worker attaches the stopper 42 to the supply port 40. As a result, the second recess 34 of the squeegee 30 is hermetically sealed in a state where the conductive paste 54 on the supply surface 12 of the film forming tray 10 is contained. That is, the conductive paste 54 on the supply surface 12 of the film forming tray 10 is capped by the second recess 34 of the squeegee 30.
　スキージ３０が、制御装置５２及びスライド機構５０によって、成膜トレイ１０の第１開口部１６側へ向けてスライドさせられると、スキージ３０の第２凹部３４では、導電性ペースト５４が、スキージ３０の下面３２のエッジで掻き出されながらスキージ３０の第２凹部３４の内壁面で押されることによって、成膜トレイ１０の供給面１２上を移動する。 When the squeegee 30 is slid toward the first opening 16 side of the film forming tray 10 by the control device 52 and the slide mechanism 50, the conductive paste 54 is removed from the squeegee 30 in the second recess 34 of the squeegee 30. It is moved on the supply surface 12 of the film forming tray 10 by being pushed by the inner wall surface of the second recess 34 of the squeegee 30 while being scraped out by the edge of the lower surface 32.
　そして、図５及び図６に示されるように、スキージ３０が成膜トレイ１０の第１開口部１６まで移動すると、スキージ３０の第２凹部３４では、導電性ペースト５４の一部が成膜トレイ１０の第１開口部１６を通って第１凹部１４に入り込む。 Then, as shown in FIG. 5 and FIG. 6, when the squeegee 30 moves to the first opening 16 of the film forming tray 10, in the second recess 34 of the squeegee 30, a part of the conductive paste 54 is part of the film forming tray. The first concave portion 14 is inserted into the first concave portion 14 through the first opening portion 16.
　更に、図７及び図８に示されるように、スキージ３０が成膜トレイ１０の第１開口部１６を通り越すと、成膜トレイ１０の供給面１２よりも非常に小さい第１凹部１４において、第１凹部１４の深さを膜厚とする、導電性ペースト５４の薄膜が形成される。従って、導電性ペースト５４の膜厚は、成膜トレイ１０の第１凹部１４の深さでコントロールされる。 Further, as shown in FIGS. 7 and 8, when the squeegee 30 passes through the first opening 16 of the film forming tray 10, the first concave portion 14 that is much smaller than the supply surface 12 of the film forming tray 10 is A thin film of the conductive paste 54 having a film thickness equal to the depth of the first recess 14 is formed. Therefore, the film thickness of the conductive paste 54 is controlled by the depth of the first recess 14 of the film forming tray 10.
　これに対して、スキージ３０の第２凹部３４では、スキージ３０が成膜トレイ１０の第１開口部１６側へ向けてスライドさせられる場合と同様にして、導電性ペースト５４が、スキージ３０の下面３２のエッジで掻き出されながらスキージ３０の第２凹部３４の内壁面に押されることによって、成膜トレイ１０の供給面１２上を移動する。 On the other hand, in the second recess 34 of the squeegee 30, the conductive paste 54 is placed on the lower surface of the squeegee 30 in the same manner as when the squeegee 30 is slid toward the first opening 16 side of the film forming tray 10. By being pushed by the inner wall surface of the second recess 34 of the squeegee 30 while being scraped out by the edge of 32, the squeegee 30 moves on the supply surface 12 of the film forming tray 10.
　そして、スキージ３０が、制御装置５２及びスライド機構５０によって、成膜トレイ１０の第１開口部１６を通り越した状態で停止させられる。これにより、本実施形態の成膜装置１では、図９に示されるようにして、３次元積層電子デバイスの製造等で使用される転写ピン７８が、成膜トレイ１０の第１凹部１４に形成された導電性ペースト５４の薄膜に対して、ディップすることが可能となる。 Then, the squeegee 30 is stopped by the control device 52 and the slide mechanism 50 in a state of passing over the first opening 16 of the film forming tray 10. As a result, in the film forming apparatus 1 of the present embodiment, as shown in FIG. 9, the transfer pin 78 used for manufacturing a three-dimensional laminated electronic device or the like is formed in the first recess 14 of the film forming tray 10. It is possible to dip the thin film of the conductive paste 54 thus formed.
　その後、成膜トレイ１０の第１凹部１４内の導電性ペースト５４が少なくなった場合には、スキージ３０が、制御装置５２及びスライド機構５０によって、上述したスライドとは反対方向へスライドさせられる。これにより、上述したスライドのときと同様にして、成膜トレイ１０の第１凹部１４には、導電性ペースト５４の薄膜が形成される。その際には、図１０及び図１２に示されるようにして、スキージ３０が成膜トレイ１０の第１開口部１６まで移動し、更に、図１１及び図１３に示されるようにして、スキージ３０が成膜トレイ１０の第１開口部１６を通り越した状態で停止させられる。 After that, when the amount of the conductive paste 54 in the first recess 14 of the film forming tray 10 becomes low, the squeegee 30 is slid in the opposite direction to the above-described slide by the control device 52 and the slide mechanism 50. As a result, a thin film of the conductive paste 54 is formed in the first recess 14 of the film forming tray 10 as in the case of the above-described slide. At that time, as shown in FIGS. 10 and 12, the squeegee 30 moves to the first opening 16 of the film forming tray 10, and further, as shown in FIGS. Is stopped after passing through the first opening 16 of the film forming tray 10.
　従って、本実施形態の成膜装置１は、成膜トレイ１０の第１凹部１４内の導電性ペースト５４が少なくなる度に、制御装置５２及びスライド機構５０によって、スキージ３０を成膜トレイ１０の供給面１２上でスライドさせると、導電性ペースト５４の薄膜を成膜トレイ１０の第１凹部１４に形成させることができる。尚、成膜トレイ１０の供給面１２上の導電性ペースト５４（つまり、スキージ３０の第２凹部３４内の導電性ペースト５４）が少なくなった場合には、上述したシリンジ７０によって、導電性ペースト５４がスキージ３０の第２凹部３４に補充される。 Therefore, in the film forming apparatus 1 of the present embodiment, the squeegee 30 is removed from the film forming tray 10 by the control device 52 and the slide mechanism 50 every time the conductive paste 54 in the first recess 14 of the film forming tray 10 is reduced. By sliding on the supply surface 12, a thin film of the conductive paste 54 can be formed in the first recess 14 of the film forming tray 10. When the amount of the conductive paste 54 on the supply surface 12 of the film forming tray 10 (that is, the conductive paste 54 in the second recess 34 of the squeegee 30) becomes small, the conductive paste 54 is applied by the syringe 70 described above. 54 is replenished in the second recess 34 of the squeegee 30.
　また、本実施形態の成膜装置１は、成膜トレイ１０の第１凹部１４内の導電性ペースト５４が使用されなくなった場合にも、制御装置５２及びスライド機構５０によって、スキージ３０を成膜トレイ１０の供給面１２上でスライドさせる。但し、本実施形態の成膜装置１は、制御装置５２及びスライド機構５０によって、スキージ３０を、図６又は図１２に示される状態、つまり、スキージ３０の第２開口部３６が成膜トレイ１０の第１開口部１６の全域と重なる状態で停止させる。 Further, the film forming apparatus 1 of the present embodiment forms the squeegee 30 by the control device 52 and the slide mechanism 50 even when the conductive paste 54 in the first recess 14 of the film forming tray 10 is no longer used. Slide on the supply surface 12 of the tray 10. However, in the film forming apparatus 1 of the present embodiment, the control device 52 and the slide mechanism 50 cause the squeegee 30 to be in the state shown in FIG. 6 or 12, that is, the second opening 36 of the squeegee 30 is the film forming tray 10. The first opening 16 is stopped in a state of overlapping with the entire area of the first opening 16.
　これにより、本実施形態の成膜装置１では、スキージ３０の第２凹部３４が成膜トレイ１０の第１凹部１４を覆う状態になるので、成膜トレイ１０の第１凹部１４内の導電性ペースト５４が、スキージ３０（の第２凹部３４）でキャッピングされる。 As a result, in the film forming apparatus 1 of the present embodiment, the second recess 34 of the squeegee 30 is in a state of covering the first recess 14 of the film forming tray 10, so that the conductivity inside the first recess 14 of the film forming tray 10 is increased. The paste 54 is capped in (the second recess 34 of) the squeegee 30.
　そのようなスキージ３０のキャッピングは、制御装置５２及びスライド機構５０によって、スキージ３０を成膜トレイ１０の供給面１２上でスライドさせることによって解除される。その際、スキージ３０が成膜トレイ１０の第１開口部１６から離間すると、成膜トレイ１０の第１凹部１４には、導電性ペースト５４の薄膜が形成される。つまり、本実施形態の成膜装置１では、導電性ペースト５４の薄膜形成と、スキージ３０のキャッピング解除とが、同時に行われる。 Such capping of the squeegee 30 is released by sliding the squeegee 30 on the supply surface 12 of the film forming tray 10 by the control device 52 and the slide mechanism 50. At that time, when the squeegee 30 is separated from the first opening 16 of the film forming tray 10, a thin film of the conductive paste 54 is formed in the first recess 14 of the film forming tray 10. That is, in the film forming apparatus 1 of the present embodiment, the thin film formation of the conductive paste 54 and the capping release of the squeegee 30 are simultaneously performed.
　以上詳細に説明したように、本実施形態の成膜装置１は、導電性ペースト５４の薄膜を形成するのに好適である。 As described in detail above, the film forming apparatus 1 of this embodiment is suitable for forming a thin film of the conductive paste 54.
　ちなみに、本実施形態において、スライド機構５０は、「駆動部」の一例である。制御装置５２は、「制御部」の一例である。 Incidentally, in the present embodiment, the slide mechanism 50 is an example of a “drive unit”. The control device 52 is an example of a “control unit”.
　尚、本開示は上記実施形態に限定されるものでなく、その趣旨を逸脱しない範囲で様々な変更が可能である。
　例えば、成膜トレイ１０をスライドさせることによって、成膜トレイ１０とスキージ３０を相対的に動かしてもよい。また、成膜トレイ１０及びスキージ３０の双方をスライドさせることによって、成膜トレイ１０とスキージ３０を相対的に動かしてもよい。 The present disclosure is not limited to the above embodiment, and various modifications can be made without departing from the spirit of the present disclosure.
For example, the film deposition tray 10 and the squeegee 30 may be moved relatively by sliding the film deposition tray 10. Further, the film deposition tray 10 and the squeegee 30 may be moved relatively by sliding both the film deposition tray 10 and the squeegee 30.
　また、スキージ３０の下面３２が成膜トレイ１０の第１開口部１６の全域と重なることが可能な場合には、成膜装置１は、制御装置５２及びスライド機構５０によって、スキージ３０を、その下面３２が成膜トレイ１０の第１開口部１６の全域と重なる状態で停止させる。これにより、成膜トレイ１０の第１凹部１４内の導電性ペースト５４が、スキージ３０の下面３２でキャッピングされる。 When the lower surface 32 of the squeegee 30 can overlap the entire area of the first opening 16 of the film forming tray 10, the film forming apparatus 1 controls the control device 52 and the slide mechanism 50 so that the squeegee 30 is The lower surface 32 is stopped in a state where it overlaps the entire area of the first opening 16 of the film forming tray 10. As a result, the conductive paste 54 in the first recess 14 of the film forming tray 10 is capped on the lower surface 32 of the squeegee 30.
　１　成膜装置
１０　成膜トレイ
１２　供給面
１４　第１凹部
１６　第１開口部
３０　スキージ
３２　下面
３４　第２凹部
３６　第２開口部
４０　供給口部
４２　栓部
５０　スライド機構
５２　制御装置
５４　導電性ペースト 1 film forming apparatus 10 film forming tray 12 supply surface 14 first recess 16 first opening 30 squeegee 32 lower surface 34 second recess 36 second opening 40 supply port 42 plug 50 slide mechanism 52 controller 54 conductive paste

Claims (4)

  1. 　導電性ペーストが載せられる供給面を有する成膜トレイと、
    　前記成膜トレイの前記供給面に押し付けられる下面を有するスキージと、
    　前記成膜トレイに設けられ、前記成膜トレイの前記供給面に形成された第１開口部を有し、前記スキージの前記下面で掻き出された導電性ペーストが前記第１開口部を通って入れられるように構成された第１凹部とを備える成膜装置。     A film forming tray having a supply surface on which the conductive paste is placed,
    A squeegee having a lower surface pressed against the supply surface of the film forming tray;
    The film forming tray has a first opening formed on the supply surface of the film forming tray, and the conductive paste scraped out on the lower surface of the squeegee passes through the first opening. A film forming apparatus comprising: a first recess configured to be inserted.
  2. 　前記スキージに設けられ、前記スキージの前記下面に形成された第２開口部を有し、前記成膜トレイの前記供給面上の導電性ペーストが前記第２開口部を介して収められるように構成された第２凹部を備える請求項１に記載の成膜装置。 The squeegee has a second opening formed on the lower surface of the squeegee, and the conductive paste on the supply surface of the film forming tray is accommodated through the second opening. The film forming apparatus according to claim 1, further comprising a second recess formed therein.
  3. 　前記スキージに形成され、前記第２凹部に連通する供給口部と、
    　前記供給口部に着脱自在な栓部とを備える請求項２に記載の成膜装置。     A supply port formed on the squeegee and communicating with the second recess;
    The film forming apparatus according to claim 2, further comprising a plug portion that is detachably attached to the supply port portion.
  4. 　前記スキージの前記第２開口部は、前記成膜トレイの前記第１開口部よりも大きく、
    　前記成膜トレイと前記スキージを相対的に動かす駆動部と、
    　前記駆動部を制御し、前記成膜トレイの前記第１開口部の全域が前記スキージの前記第２開口部と重なるように、前記成膜トレイ又は前記スキージを停止させる制御部とを備える請求項２又は請求項３に記載の成膜装置。     The second opening of the squeegee is larger than the first opening of the film forming tray,
    A drive unit that relatively moves the film forming tray and the squeegee,
    A control unit that controls the drive unit and stops the film formation tray or the squeegee so that the entire area of the first opening of the film formation tray overlaps the second opening of the squeegee. The film forming apparatus according to claim 2 or claim 3.
PCT/JP2018/038808 2018-10-18 2018-10-18 Film deposition device WO2020079797A1 (en)

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