WO2020071221A1 - Appareil de formation d'image et procédé de formation d'image - Google Patents

Appareil de formation d'image et procédé de formation d'image

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Publication number
WO2020071221A1
WO2020071221A1 PCT/JP2019/037773 JP2019037773W WO2020071221A1 WO 2020071221 A1 WO2020071221 A1 WO 2020071221A1 JP 2019037773 W JP2019037773 W JP 2019037773W WO 2020071221 A1 WO2020071221 A1 WO 2020071221A1
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WO
WIPO (PCT)
Prior art keywords
region
image
pattern
ratio
liquid crystal
Prior art date
Application number
PCT/JP2019/037773
Other languages
English (en)
Japanese (ja)
Inventor
水野　知章
Original Assignee
富士フイルム株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 富士フイルム株式会社 filed Critical 富士フイルム株式会社
Priority to JP2020550346A priority Critical patent/JP7052065B2/ja
Publication of WO2020071221A1 publication Critical patent/WO2020071221A1/fr

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/435—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material
    • B41J2/465—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material using masks, e.g. light-switching masks
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J3/00—Typewriters or selective printing or marking mechanisms characterised by the purpose for which they are constructed
    • B41J3/407—Typewriters or selective printing or marking mechanisms characterised by the purpose for which they are constructed for marking on special material
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials

Definitions

  • the present invention relates to an image forming apparatus and an image forming method, and more particularly, to an image forming apparatus and an image forming method for forming an image on a cholesteric liquid crystal layer.
  • Examples of techniques for forming an image on a cholesteric liquid crystal layer include the techniques described in Patent Documents 1 and 2.
  • the techniques described in Patent Literatures 1 and 2 are techniques for forming an image composed of dots of three colors of R (red), G (green) and B (blue) on a cholesteric liquid crystal layer.
  • a cholesteric liquid crystal compound is irradiated with a laser beam at an irradiation amount according to each dot color.
  • the amount of laser light is controlled by the irradiation amount control means, and the irradiation position of the laser light (that is, the dot formation position) on the recording medium is controlled by the irradiation position control means. Controlled.
  • the laser light is condensed by the f ⁇ lens and is applied to each dot formation position while scanning the recording medium.
  • the laser beam whose light amount is controlled moves from top to bottom while scanning back and forth in the left and right directions.
  • a color image composed of RGB three-color dots is formed on the recording medium.
  • Patent Document 2 laser light is emitted using a cholesteric liquid crystal phase recording medium while scanning with each laser light source using laser light sources of RGB colors. As a result, a multicolor image including three colors of RGB is formed.
  • an object of the present invention is to provide an image forming apparatus and an image forming method capable of solving the above-mentioned problems of the related art and more rationally forming an image on a cholesteric liquid crystal layer.
  • an image forming apparatus is configured to form an image in which a first region, a second region, and a third region having different colors are arranged in a mesh on a cholesteric liquid crystal layer.
  • An exposure unit that performs exposure to the liquid crystal composition constituting the cholesteric liquid crystal layer, and an adjustment unit for adjusting each ratio of the first region, the second region, and the third region in each part of the image.
  • the first region is a region where the amount of exposure during exposure is higher
  • the second region is a region where the amount of exposure during exposure is smaller
  • the third region is a first region and a second region.
  • the region at the boundary position of the region, and the adjusting unit sets the color set for each part of the image based on the correspondence between the parameter set for adjusting the ratio and the value that changes according to the parameter.
  • the feature is to adjust the ratio according to To.
  • each area the ratio of each of the first area, the second area, and the third area (hereinafter, each area) in each part of the image is adjusted according to the set color of each part of the image, so that the set color is reproduced well. can do.
  • a third area is additionally formed accordingly. Therefore, it is not necessary to adjust the exposure conditions for each of the three regions, and it is possible to reduce the labor and cost accordingly. This makes it possible to more rationally form an image on the cholesteric liquid crystal layer as compared with the conventional image forming method.
  • the adjustment unit includes a single mask on which a mesh pattern is formed, and the mesh pattern includes a transmission unit through which light from the exposure unit transmits, and a light block from the exposure unit.
  • the parameter is the area ratio of each of the transmitting part and the blocking part in the mesh pattern and the number of lines per unit area in the mesh pattern.
  • the value is the chromaticity coordinate of the reproduced color reproduced under the ratio
  • the correspondence is the change of the chromaticity coordinate of the reproduced color when the area ratio and the number of lines change.
  • the tendency is more preferable.
  • the ratio of each region is adjusted based on the changing tendency of the chromaticity coordinates of the reproduced color when the area ratio and the number of lines of each of the transmitting portion and the blocking portion in the mesh pattern change. As a result, it is possible to adjust the ratio of each region based on the above change tendency so that the ratio of each region becomes a more appropriate value for reproducing the set color.
  • the adjusting unit is configured such that the transmissive unit and the blocking unit have a net-like pattern at the area ratio and the number of lines when the chromaticity coordinates of the reproduced color are closest to the chromaticity coordinates of the set color in the change tendency. It is more preferable to adjust the ratio using a mask provided. In the above configuration, by using the above-mentioned mask, it is possible to adjust the ratio of each region so that the ratio of each region becomes a more appropriate value for reproducing the set color.
  • the correspondence may be a change tendency when the area ratio changes in 11 steps and the number of lines changes in 8 steps.
  • the mesh pattern is formed by synthesizing the same number of unit patterns as the plurality of representative colors.
  • the number of lines and the number of lines may be determined according to the representative color corresponding to the unit pattern based on the change tendency.
  • the set color is separated into a plurality of representative colors, and a unit pattern for reproducing each representative color is created. Then, the unit pattern of each representative color is synthesized to form a net-like pattern. According to such a procedure, a mesh pattern for reproducing the set color can be appropriately produced.
  • the value may be a ratio
  • the correspondence may be a correspondence between the area ratio and the number of lines and the ratio.
  • the ratio of each region is adjusted based on the correspondence between the area ratio and the number of lines of each of the transmitting portion and the blocking portion in the mesh pattern and the ratio of each region. As a result, it is possible to adjust the ratio of each region so that the ratio of each region becomes a more appropriate value for reproducing the set color.
  • the adjusting unit adjusts the ratio by using a mask in which the transmitting unit and the blocking unit are provided in a mesh pattern at the area ratio and the number of lines corresponding to the ratio of obtaining the set color. You may. In the above configuration, by using the above-mentioned mask, it is possible to adjust the ratio of each region so that the ratio of each region becomes a more appropriate value for reproducing the set color.
  • the correspondence may be a correspondence between a combination of 11 area ratios and 8 line numbers and a ratio.
  • the ratio at which the set color is obtained is calculated based on the spectral reflectance distribution of the set color specified for each of the first region, the second region, and the third region. Is more preferable.
  • the ratio of each area is adjusted based on the spectral reflectance distribution of the set color. This makes it possible to adjust the ratio of each region so that the distribution of the spectral reflectance of the set color can be reproduced.
  • the mesh pattern is configured by arranging the same number of pattern fragments as the plurality of image fragments and arranging the area ratio in each pattern fragment.
  • the number of lines and the number of lines may be determined according to the set color set for the image fragment corresponding to the pattern fragment based on the correspondence relationship.
  • the image is decomposed into a plurality of image fragments, and a pattern fragment for reproducing the set color of each image fragment is produced. Then, by arranging the pattern fragments of each image piece side by side, a net-like pattern for the entire image is created. According to such a procedure, the above-described reticulated pattern can be appropriately produced.
  • the set color set for the image piece corresponding to the pattern fragment is a color averaged in the image piece.
  • the pattern fragment corresponding to the image piece becomes a simpler pattern. As a result, a net-like pattern can be more easily produced.
  • an image forming method comprising: forming an image in which a first region, a second region, and a third region having different colors are arranged in a mesh on a cholesteric liquid crystal layer.
  • a method for forming a liquid crystal composition constituting a cholesteric liquid crystal layer the step of performing exposure according to an image, and adjusting a ratio of each of a first region, a second region, and a third region in each part of the image.
  • the first region is a region where the exposure amount at the time of exposure is larger
  • the second region is a region where the exposure amount at the time of exposure is smaller
  • the third region is the first region and It is a region at the boundary position of the second region, in the step of adjusting the ratio, based on the correspondence between the parameter set for adjusting the ratio and the value that changes according to the parameter, for each part of the image Ratio according to the set color And adjusting the.
  • an image forming apparatus and an image forming method capable of more rationally forming an image on a cholesteric liquid crystal layer.
  • FIG. 3 is a diagram showing a basic procedure for forming an image on a cholesteric liquid crystal layer.
  • FIG. 4 is a diagram illustrating an example of a mask for pattern exposure processing. It is explanatory drawing about the 1st area
  • FIG. 1 is a diagram illustrating a configuration of an image forming apparatus according to an embodiment of the present disclosure.
  • FIG. 3 is a diagram illustrating an example of an image formed on a cholesteric liquid crystal layer.
  • FIG. 3 is a diagram illustrating an example of an image forming flow. It is a figure which shows the flow of a correspondence identification process.
  • FIG. 1 is a diagram illustrating a configuration of an image forming apparatus according to an embodiment of the present disclosure.
  • FIG. 3 is a diagram illustrating an example of an image formed on a cholesteric liquid crystal layer.
  • FIG. 3 is a diagram illustrating an
  • FIG. 4 is a diagram illustrating an example of a sample pattern. It is a figure showing an example of a sample image.
  • FIG. 7 is an explanatory diagram of a change tendency of chromaticity coordinates of a reproduced color. It is a figure which shows the changing tendency of the chromaticity coordinate of a reproduction color when the area ratio and the number of lines of each of a transmission part and a shielding part change. It is an image figure showing the flow of the pattern characteristic setting process concerning the first example (the 1). It is an image figure showing the flow of the pattern characteristic setting process concerning the first example (the 2).
  • FIG. 9 is an explanatory diagram of a procedure for determining a reproduction pattern characteristic. It is a figure showing the flow of the 2nd specific process.
  • FIG. 3 is a diagram showing a halftone image before digital filter processing.
  • FIG. 3 is a diagram showing a halftone image after digital filter processing.
  • FIG. 9 is a diagram illustrating a halftone image from which an area corresponding to a third area is extracted. It is an image figure showing the flow of the pattern characteristic setting process concerning the second example.
  • a numerical range represented by using “to” means a range including numerical values described before and after “to” as a lower limit and an upper limit.
  • “%” and “parts” representing the content and the amount used are based on mass unless otherwise specified.
  • “same”, “similar” and “identical” include an error range generally accepted in the technical field.
  • “all”, “all”, “all” and the like include 100% and include an error range generally accepted in the technical field, for example, 99% or more, It shall include the case of 95% or more, or 90% or more.
  • the “selective reflection wavelength” is defined as a half-value transmittance: T1 / expressed by the following equation, when the minimum value Tmin (%) of the transmittance of an object (member) is set. It means an average value of two wavelengths indicating 2 (%).
  • T1 / 2 100 ⁇ (100 ⁇ Tmin) ⁇ 2
  • image means an image actually formed on the cholesteric liquid crystal layer, particularly a color image.
  • image information The digital image (original image) data required for image formation is hereinafter referred to as “image information”.
  • an “area” is a unit area forming an image, and specifically, a point-like small area (dot) and an area between dots correspond to the “area”. I do.
  • the region in the film 51a described later is the same as the region in the image formed on the cholesteric liquid crystal layer.
  • a “part” of an image refers to a part of an image divided into a plurality of parts in accordance with a predetermined rule (for example, dividing the image by one inch). Including. Note that information of a plurality of pixels (for example, n ⁇ n pixels: n is a natural number of 2 or more) in the image information is associated with one portion in the image.
  • the cholesteric liquid crystal layer is a layer containing a cholesteric liquid crystal phase and is composed of a liquid crystal composition.
  • the cholesteric liquid crystal layer is preferably a layer formed by fixing a cholesteric liquid crystal phase, but is not limited thereto, and may not be fixed. When the cholesteric liquid crystal phase is exposed, the length of the helical pitch of the cholesteric liquid crystal phase changes in the exposed area.
  • the selective reflection wavelength of the cholesteric liquid crystal phase is determined according to the length of the helical pitch, and the cholesteric liquid crystal phase exhibits a color corresponding to the selective reflection wavelength (strictly speaking, it corresponds to the selective reflection wavelength). Reflects colored light).
  • FIG. 1 is a diagram showing a basic procedure for forming an image on a cholesteric liquid crystal layer.
  • the following first to fourth steps are sequentially performed as shown in FIG.
  • a liquid crystal composition containing a polymerizable liquid crystal compound and a photosensitive chiral agent is applied on the surface of a transparent substrate (not shown) made of a plastic film or a thin glass to form a film 51a (coating film).
  • a coating method a known method can be applied.
  • the plastic used as the material of the transparent substrate includes, for example, a cellulose polymer, a polycarbonate polymer, a polyester polymer, a (meth) acrylic polymer, a styrene polymer, a polyolefin polymer, a vinyl chloride polymer, and an amide polymer.
  • the transparent substrate means a transparent substrate having substantially no absorption region in the visible light region.
  • the average transmittance in the wavelength range of 380 nm to 780 nm is preferably 80% or more, more preferably 90% or more.
  • the thickness of the transparent substrate is not particularly limited, but is preferably 1 to 100 ⁇ m, more preferably 2 to 50 ⁇ m.
  • the film 51a is exposed using the light source S. Exposure is performed in, for example, two stages, and a pattern exposure process is performed in the first stage.
  • a pattern exposure process for example, a mask M having a predetermined net-like pattern is attached to a transparent base material, and light having a wavelength at which the photosensitive chiral agent is exposed is irradiated to the transparent base material via the mask M.
  • the film 51a light is irradiated (exposed) at a predetermined intensity to an unmasked region, and light is blocked in the masked region.
  • the mask M may be attached to the surface (back surface) of the transparent substrate opposite to the film 51a, in which case light is irradiated from the back side of the transparent substrate.
  • a mask M may be attached to the surface of the transparent substrate on the same side as the film 51a, in which case light is irradiated from the front side of the transparent substrate.
  • an entire surface exposure process of irradiating light from the light source S to the entire surface of the film 51a is performed.
  • the entire surface exposure process exposes the chiral agent in an area that has not been exposed in the pattern exposure process, so that a helical pitch is obtained so that a predetermined helical pitch (for example, a helical pitch in which the selective reflection wavelength falls within the wavelength range of blue light) is obtained.
  • the induced force can be adjusted.
  • the exposed film 51b is formed by the above two-stage exposure. In each region of the exposed film 51b, the structure of the photosensitive chiral agent changes according to the amount of exposure.
  • the exposure is not limited to the case of performing the two-step exposure, for example, by performing the exposure once using a mask or the like having two or more regions showing different transmission spectra, the above-described two-step exposure Exposure is similar. Further, while performing the pattern exposure, the entire surface exposure is omitted, and instead, each part of the film 51a (strictly, the exposed film 51b) is heated so that the selective reflection wavelength is changed by a heat treatment described later. Good.
  • the exposed film 51b is subjected to a heating treatment (aging treatment) using the heating source T to form a heated film 51c.
  • the liquid crystal compound is oriented to form a cholesteric liquid crystal phase.
  • the heated film 51c there are a plurality of regions having different exposure amounts. In each of the plurality of regions having different exposure amounts, the length of the helical pitch of the cholesteric liquid crystal phase differs according to the exposure amount, and the selective reflection wavelength differs accordingly. Each of the plurality of regions having different selective reflection wavelengths has a color corresponding to the selective reflection wavelength.
  • the fourth step ultraviolet rays are irradiated from the ultraviolet light source U toward the heated film 51c to cure the heated film 51c (that is, the film in a cholesteric liquid crystal phase).
  • a layer in which the cholesteric liquid crystal phase is fixed that is, the cholesteric liquid crystal layer 40 is formed.
  • a colored image formed by arranging a plurality of regions having different selective reflection wavelengths in a mesh pattern is formed on the cholesteric liquid crystal layer 40.
  • “arranged in a mesh” means that dots (dots) are arranged in a pattern corresponding to a color tone in order to reproduce an image of a predetermined color tone by a halftone dot technique.
  • a plurality of regions are arranged in a mesh means that at least one of the plurality of regions is arranged as a point and the remaining region is arranged in a space between the points.
  • the curing method is not particularly limited, and a curing method by heating can be used in addition to the curing method by light irradiation.
  • the cholesteric liquid crystal layer 40 on which an image is formed is obtained.
  • the obtained cholesteric liquid crystal layer 40 is transferred to a circularly polarizing plate via, for example, an adhesive layer.
  • the cholesteric liquid crystal layer 40 may be directly formed on the circularly polarizing plate using the circularly polarizing plate as a base material.
  • the cholesteric liquid crystal layer 40 is formed by performing the first to third steps without performing the fourth step. To form an image.
  • an image may be formed on the cholesteric liquid crystal layer 40 without performing the heat treatment in the third step in some cases.
  • the above basic procedure is a procedure for forming an image on a cholesteric liquid crystal layer when a photosensitive chiral agent is contained in a liquid crystal composition, but is not limited to this embodiment.
  • Other known methods such as the method described in JP-A-300662 can be employed.
  • the liquid crystal composition is applied to the surface of the base material to form the film 51a.
  • the application method is not particularly limited, and examples thereof include a wire bar coating method, an extrusion coating method, a direct gravure coating method, a reverse gravure coating method, and a die coating method.
  • the method for forming the film 51a is not limited to the coating method, and a method other than the coating method, for example, an inkjet method, a flexographic printing method, a spray coating method, or the like may be used.
  • the pattern exposure process is performed by mask exposure.
  • specific methods of mask exposure include, for example, contact exposure, proxy exposure, projection exposure, and the like.
  • the pattern exposure processing may be performed by scanning exposure for directly drawing by focusing on a predetermined position using a laser or an electron beam without using a mask.
  • the scanning exposure can be performed, for example, by applying a drawing apparatus that draws a desired pattern image or the like by modulating light.
  • a drawing apparatus As a typical example of such a drawing apparatus, a predetermined image is formed by scanning a light beam derived from a light beam generation unit on a scanned object via a light beam deflection scanning unit.
  • a type in which an image is formed by scanning a laser beam in a sub-scanning direction on a scanning target attached to an outer peripheral surface of a drum rotating in a main scanning direction and a type in which a cylindrical inner peripheral surface of the drum is formed
  • An apparatus of a type that forms an image by rotating and scanning a laser beam on the adhered object to be scanned (for example, see Japanese Patent No. 2784481) can also be used.
  • a drawing device that draws a pattern image or the like by a drawing head can be used.
  • an exposure apparatus that forms a desired pattern image on an exposed surface of a photosensitive material or the like by an exposure head, which is used in manufacturing a semiconductor substrate or a printing plate.
  • a typical example of such an exposure head is a head including a pixel array having a large number of pixels and generating a light spot group forming a desired pattern image.
  • a DMD digital micromirror device
  • a DMD memory cell is moved in accordance with the movement in the scanning direction.
  • JP-A-2006-327084 has been proposed (for example, see JP-A-2006-327084).
  • a spatial light modulator other than the above DMD can be used.
  • the spatial light modulator may be either a reflection type or a transmission type.
  • Examples of other spatial light modulators include a MEMS (Micro Electro Mechanical Systems) type spatial light modulator (SLM; Special Light Modulator), an optical element that modulates transmitted light by an electro-optic effect (PLZT element), and A liquid crystal shutter array such as a liquid crystal light shutter (FLC) is exemplified.
  • MEMS Micro Electro Mechanical Systems
  • SLM Small Light Modulator
  • PZT element optical element that modulates transmitted light by an electro-optic effect
  • FLC liquid crystal shutter array
  • MEMS is a general term for a micro system in which micro-sized sensors, actuators, and control circuits are integrated by a micro-machining technology based on an integrated circuit (IC) manufacturing process, and a MEMS-type spatial light modulator.
  • "" Means a spatial light modulator driven by electromechanical operation using electrostatic force.
  • GLV diffraction light valves
  • ⁇ About pattern exposure processing> In the pattern exposure process described above, a plurality of regions in the liquid crystal composition film 51a are respectively exposed under different exposure conditions. At this time, exposure may be performed a plurality of times for each exposure condition. However, from the viewpoint of image formation efficiency, it is more preferable to perform exposure only once using one mask M having two or more regions having different light transmittances from each other. In this case, since only one mask is used, cost and labor can be reduced as compared with the case where a plurality of masks are used.
  • FIG. 2 is a plan view showing an example of a mask M for pattern exposure processing.
  • a part of the mesh pattern Mp is shown in an enlarged manner.
  • “parts” in the mesh pattern Mp correspond to “parts” in the image, and both “parts” have the same size.
  • the area of each part in the mesh pattern Mp corresponds to a unit area.
  • the mask M is formed by forming (specifically, printing or transferring) a net-like pattern Mp on a colorless and transparent sheet material such as an OHP (overhead projector) sheet.
  • a net-like pattern Mp is provided with a transparent portion Mc that is transparent in FIG. 2 and a blocking portion Md that is painted black in FIG.
  • the transmissive portion Mc is a region through which light is transmitted during the pattern exposure processing
  • the blocking portion Md is a region through which light is blocked during the pattern exposure processing.
  • each portion of the mesh pattern Mp as shown in FIG. 2, one of the transmission portion Mc and the blocking portion Md is arranged as a dot, and the other is arranged between the dots.
  • the blocking portion Md is a circular dot, and the transmitting portion Mc is arranged between the dots.
  • the characteristics (pattern characteristics) of each portion of the mesh pattern Mp include an area ratio of each of the transmitting portion Mc and the blocking portion Md in each portion of the mesh pattern Mp, and a line per unit area in each portion of the mesh pattern Mp.
  • the “area ratio” is a ratio (%) of the area occupied by each of the transmitting portion Mc and the blocking portion Md to the area of each portion of the mesh pattern Mp. In the following description, when simply saying “area ratio”, the area ratio means the area ratio of the blocking portion Md.
  • the “number of lines per unit area” is the number of screen lines [unit lpi (line per inch)].
  • one of the transmission part Mc and the shielding part Md that exists as a dot Represents the density per unit length of the line constituted by.
  • the area that was the non-mask area during the pattern exposure processing becomes the first area that exhibits red, and the area that was the mask area during the pattern exposure processing exhibits the blue area. There are two areas.
  • the selective reflection wavelength is the wavelength region of green light. That is, at the boundary position between the first area and the second area, a bleeding area (hereinafter, referred to as a third area) appears as shown in FIG. 3, and the color of the area becomes green.
  • FIG. 3 is an explanatory diagram of a first region, a second region, and a third region formed in the cholesteric liquid crystal layer 40. Note that the upper diagram of FIG. 3 shows a mask on which the band-shaped pattern Mq is formed, and the lower diagram shows the cholesteric liquid crystal layer 40 when a pattern exposure process is performed using the mask.
  • each part of an image finally formed on the cholesteric liquid crystal layer 40 has a first area (denoted by a symbol A1 in FIG. 3). ) And a second region (denoted by a symbol A2 in FIG. 3) are present in stripes.
  • the first region is a region where the exposure amount at the time of exposure is larger, and the second region is a region where the exposure amount at the time of exposure is smaller.
  • a third area (indicated by a symbol A3 in FIG.
  • the line width of the third region is about 40 ⁇ m, but the line width is determined according to the composition of the liquid crystal composition, the thickness of a mask used at the time of exposure, and the like.
  • the image forming apparatus forms an image by forming a first area, a second area, and a third area in the cholesteric liquid crystal layer 40 using such a phenomenon.
  • the image forming apparatus according to the present embodiment will be described in detail.
  • FIG. 4 is a block diagram illustrating a configuration example of the image forming apparatus 10.
  • the image forming apparatus 10 is an apparatus that forms three color images of R (red), G (green), and B (blue) on the cholesteric liquid crystal layer 40. More specifically, the image forming apparatus 10 forms an image in which the first red region, the second blue region, and the third green region are arranged in a mesh on the cholesteric liquid crystal layer 40.
  • the first region, the second region, and the third region may be regions having different colors (in other words, selective reflection wavelengths), and the color of each region is not particularly limited.
  • the selective reflection wavelength of the first region is the longest (in other words, light hits the strongest)
  • the selective reflection wavelength of the second region is the shortest (in other words, the light hits the weakest)
  • the third region is selected. It is sufficient that the reflection wavelength has an intermediate length.
  • the color of the first region may be yellow
  • the second region may be purple, which is on the shorter wavelength side than yellow
  • the color of the third region may be blue to cyan.
  • FIG. 5 is a diagram illustrating an example of an image.
  • FIG. 5 shows an enlarged part of the image.
  • the first area indicated by the symbol A1 in FIG. 5 is a circular dot
  • the second area indicated by the symbol A2 in FIG. 5 is located between the dots.
  • the third area is arranged in an annular shape along the edge of the dot.
  • the image forming apparatus 10 includes a film forming unit 12, an exposing unit 14, an adjusting unit 16, a heating unit 18, an ultraviolet irradiation unit 20, a pattern characteristic. It has a setting unit 22 and a mask manufacturing unit 24.
  • the film forming section 12 forms the liquid crystal composition film 51a on one surface of the transparent base material.
  • the film forming unit 12 include a device for applying a liquid crystal composition such as a spin coater and a wire bar, a device for spraying a liquid crystal composition such as a spray nozzle, and a liquid crystal composition such as an ink jet printer.
  • a device for discharging an object or the like can be used.
  • the exposure unit 14 exposes the liquid crystal composition film 51a. More specifically, the exposure unit 14 performs a pattern exposure process in cooperation with the adjustment unit 16, and thereafter performs the entire surface exposure process by the exposure unit 14 alone. In this embodiment, mask exposure is performed only once in the pattern exposure processing.
  • an ultra-high pressure mercury lamp, a high pressure mercury lamp, a metal halide lamp, a blue laser, a He—Cd (helium cadmium) laser, or the like can be used as the exposure unit 14.
  • the adjustment unit 16 separates the mask region and the non-mask region in the film 51a in the pattern exposure process, increases the exposure amount in the non-mask region, and decreases the exposure amount in the mask region (strictly speaking, the mask region). Area is not exposed).
  • the adjustment unit 16 determines the ratio of each of the first region, the second region, and the third region (hereinafter, also referred to as “each region”) in each part of the image finally formed on the cholesteric liquid crystal layer 40. It is for adjustment.
  • the ratio of each region is the ratio (%) of the area occupied by each region to the area of each portion of the image.
  • the adjustment unit 16 has a single mask M.
  • a reticulated pattern Mp is formed on the mask M, and the reticulated pattern Mp is provided with a transmission portion Mc through which light from the exposure portion 14 is transmitted and a blocking portion Md through which light from the exposure portion 14 is blocked. (See FIG. 2).
  • the exposure unit 14 performs the pattern exposure process in cooperation with the adjustment unit 16
  • the mask exposure is performed once using the single mask M. That is, the adjustment unit 16 adjusts the ratio of each region in each part of the image in one mask exposure.
  • the pattern characteristics of each portion of the mesh pattern Mp formed on the mask M are set such that the ratio of each region in each portion of the image is adjusted to a predetermined value.
  • the mask M is produced according to the set color set for each part of the image based on the correspondence between the parameters described below and the values that change according to the parameters.
  • the adjusting unit 16 can adjust the ratio of each area in each part of the image according to the set color of each part of the image based on the above-described correspondence. The procedure for manufacturing the mask M will be described later in detail.
  • the adjustment of the exposure amount is not limited to the adjustment using the mask.
  • the pattern exposure is performed by scanning exposure, for example, by turning on / off the light emitted from the exposure unit 14 using a dot generator or the like, the light is emitted only to a portion corresponding to the first region in the film 51a. Can be irradiated. According to such a configuration, it is possible to adjust the ratio of each region in each part of the image without using the mask M.
  • the heating unit 18 heat-treats the film that has been subjected to the pattern exposure treatment (that is, the exposed film 51d) in order to align the liquid crystal compound (for example, a polymerizable liquid crystal compound) to a cholesteric liquid crystal phase. Is applied.
  • the heating unit 18 for example, an electric heater, a heater using a heating gas (including steam) as a heat source, or the like can be used.
  • the ultraviolet irradiation section 20 irradiates the heat-treated film (that is, the heated film 51c) with ultraviolet light in order to fix the cholesteric liquid crystal phase and form the cholesteric liquid crystal layer 40.
  • a metal highland lamp, a high-pressure mercury lamp, an ultraviolet LED (Light Emitting Diode), or the like can be used.
  • the pattern characteristic setting unit 22 sets the pattern characteristics of each portion of the net pattern Mp formed on the mask M included in the adjustment unit 16, that is, the area ratio and the number of lines of each of the transmission unit Mc and the blocking unit Md in a predetermined setting procedure. Set according to the rules. More specifically, the pattern characteristic setting unit 22 acquires the image information of the original image and analyzes the image information. Based on the result of this analysis, the set color of each part of the image formed on the cholesteric liquid crystal layer 40 is set. The setting of the setting color will be described in detail in a later section.
  • the pattern characteristic setting unit 22 reads out a correspondence relationship between the parameter and a value that changes according to the parameter from a storage unit (not illustrated).
  • the “parameter” is a value set for adjusting the ratio of each region in each part of the image formed on the cholesteric liquid crystal layer 40.
  • the area ratio and the number of lines of each of the transmission portion Mc and the blocking portion Md in each portion of the mesh pattern Mp of the mask M to be used correspond to the “parameter”. I do. Incidentally, only one of the area ratio and the number of lines may be adopted as a parameter.
  • the “parameters” when the scanning exposure is performed include the number of times of light irradiation (the number of times light is turned on and off), the area ratio of a portion to be irradiated with light, the number of lines when the light irradiated portion is regarded as a dot, And light irradiation intensity.
  • the “value that changes according to the parameter” corresponds to the ratio of each region in each part of the image formed on the cholesteric liquid crystal layer 40. Further, the chromaticity coordinates of the reproduced color reproduced under the ratio of each region may also correspond to the “value that changes according to the parameter”.
  • the “reproduced color” means that the red tones, the blue to blue regions, and the green to green regions are arranged in a mesh at a predetermined ratio, so that the color tone (from human eyes) Look) is the color reproduced.
  • the “chromaticity coordinates” are chromaticity values specified on a color coordinate space (more specifically, a chromaticity diagram) on the xy axis.
  • the pattern characteristic setting unit 22 sets the pattern characteristics of each part of the mesh pattern Mp according to the set color of each part of the image based on the read correspondence. More specifically, the pattern characteristic setting unit 22 sets each part of the mesh pattern Mp such that the ratio of each area in each part of the image formed on the cholesteric liquid crystal layer 40 has a value corresponding to the set color of each part of the image. Set the pattern characteristics of At this time, the pattern characteristic setting unit 22 sets the pattern characteristics of each part of the mesh pattern Mp, for example, so that the reproduced color of each part of the image becomes the same color as the set color.
  • the mask producing unit 24 is constituted by a printing device such as a printer, for example, and forms (for example, prints) a net-like pattern Mp on a colorless and transparent sheet material such as an OHP sheet to produce the mask M. More specifically, the mask manufacturing unit 24 forms the mask M by forming the mesh pattern Mp so that the pattern characteristics of each part of the mesh pattern Mp become the pattern characteristics set by the pattern characteristic setting unit 22.
  • FIG. 6 is a diagram illustrating an example of the image forming flow.
  • the image forming apparatus 10 forms an image on the cholesteric liquid crystal layer 40 by applying the image forming method of the present invention. Specifically, each step illustrated in FIG. 6 is performed by the image forming apparatus 10.
  • the film forming unit 12 of the image forming apparatus 10 performs a step of forming a liquid crystal composition film 51a on one surface of the transparent base material (S001).
  • the thickness of the coating film is not particularly limited, but is preferably from 0.1 to 20 ⁇ m, more preferably from 0.2 to 15 ⁇ m, and more preferably from 0.5 to 10 ⁇ m, since the cholesteric liquid crystal layer 40 has excellent reflectivity. More preferred.
  • the pattern characteristic setting unit 22 of the image forming apparatus 10 sets the pattern characteristic of each portion of the mesh pattern Mp with respect to the mask M used for the pattern exposure processing in the subsequent step (S002).
  • Step S002 will be described later in detail.
  • This step S002 may be performed before the step S001 for forming the film 51a, or may be performed at the same time.
  • the mask production unit 24 of the image forming apparatus 10 produces the mask M (S003).
  • the mask production unit 24 forms (prints) the net-like pattern Mp having the pattern characteristics for each part set in step S002 on a colorless and transparent sheet material.
  • the step S003 may be performed after the step S002 is completed.
  • the step S003 may be performed before the step S001 for forming the film 51a, or may be performed at the same time.
  • the exposure unit 14 of the image forming apparatus 10 exposes the film 51a (that is, the film-like liquid crystal composition) (S004, S005).
  • the exposure unit 14 performs a pattern exposure process together with the adjustment unit 16 (S004).
  • the pattern exposure processing is performed using the single mask M manufactured in step S003.
  • the mask M in each region of the film 51a, a region overlapping with the transmission portion Mc of the mesh pattern Mp (that is, a non-mask region) has a larger exposure amount.
  • the exposure amount is smaller in a region (that is, a mask region) overlapping with the blocking portion Md, and strictly, light is not irradiated.
  • a region with a larger exposure amount is a first region
  • a region with a smaller exposure amount is a second region.
  • a region at a boundary position between the first region and the second region is a third region.
  • step S004 of performing the pattern exposure processing corresponds to a step in which the adjustment unit 16 adjusts the ratio of each region in each part of the image formed on the cholesteric liquid crystal layer 40. Further, the ratio of each area is adjusted according to the set color of each part of the image based on the above-described correspondence.
  • each part of the film 51a (strictly, the exposed film 51b) has a first region having a selective reflection wavelength of red light and a blue light selection region.
  • a second region having a reflection wavelength and a third region having a selective reflection wavelength of green light are respectively formed at a predetermined ratio.
  • the pattern exposure processing can be performed without using a mask by scanning exposure as described above.
  • the exposure condition may be changed for each area by, for example, turning on and off a light source so that only the first area in the film 51a is exposed. Thereby, it is possible to adjust the ratio of each area in each part of the image.
  • the heating unit 18 of the image forming apparatus 10 performs a heating process on the exposed film 51b in order to align the liquid crystal compound to a cholesteric liquid crystal phase (S006).
  • the liquid crystal phase transition temperature of the liquid crystal composition is preferably from 10 to 250 ° C, and more preferably from 10 to 150 ° C, from the viewpoint of production suitability.
  • As a preferable heating condition it is desirable to perform heating at 40 to 100 ° C. (preferably 60 to 100 ° C.) for 0.5 to 5 minutes (preferably 0.5 to 2 minutes).
  • the ultraviolet irradiation unit 20 of the image forming apparatus 10 performs a curing process on the heated film 51c to fix the cholesteric liquid crystal phase and form the cholesteric liquid crystal layer 40 (S007). More specifically, the heated film 51c is irradiated with ultraviolet light in an environment where the temperature has reached room temperature in a nitrogen atmosphere or in an environment where the temperature has been about 60 ° C. in an oxygen atmosphere. No particular limitation is imposed on the irradiation amount of the ultraviolet, preferably about 100 ⁇ 800mJ / cm 2, 200mJ / cm 2 or less being more preferred.
  • the time for irradiating the ultraviolet rays is not particularly limited, but may be appropriately determined from the viewpoint of the strength and the productivity of the obtained reflective layer.
  • a pattern characteristic is set for each of a plurality of unit patterns Mt constituting the net pattern Mp, and thereafter, a pattern characteristic of the net pattern Mp is set using the plural unit patterns Mt.
  • the unit pattern Mt is a pattern for each color
  • the mesh pattern Mp according to the first example is configured by combining a plurality of unit patterns Mt (see FIG. 13 and the like).
  • the correspondence specifying step the correspondence between the pattern characteristics of the reticulated pattern Mp and the values related to each part of the image is specified.
  • the pattern characteristics of the reticulated pattern Mp include the area ratio of each of the transmitting portion Mc and the blocking portion Md in each portion of the unit pattern Mt constituting the reticulated pattern Mp, and the line per unit area in each portion of the unit pattern Mt. Is a number.
  • the value relating to each part of the image is a chromaticity coordinate of a reproduced color reproduced under a ratio of each of the first area, the second area, and the third area in each part of the image.
  • the correspondence specifying step proceeds, for example, according to the flow shown in FIG.
  • FIG. 7 is a diagram showing the flow of the correspondence specifying step. More specifically, in the correspondence specifying step, first, the sample pattern Ms shown in FIG. 8 is printed on a colorless and transparent sheet material (S011).
  • the sample pattern Ms is a pattern prepared in advance to set the pattern characteristics of the unit pattern Mt, and is configured by arranging i ⁇ j rectangular patches Msp as shown in FIG.
  • i and j are arbitrary natural numbers of 1 or more, but it is preferable that i is 11 and j is 8 as shown in FIG.
  • FIG. 8 is a diagram showing an example of the sample pattern Ms. In FIG. 8, a part of the patch Msp is shown in an enlarged manner.
  • each patch Msp the size and shape of each patch Msp are uniform among the patches. Further, in each patch Msp, the transmission portion Mc and the blocking portion Md are regularly arranged. However, the pattern characteristics in each patch Msp, that is, the area ratio of each of the transmission portion Mc and the blocking portion Md, and the unit area Are different between patches. In the sample pattern Ms shown in FIG. 8, each patch Msp is drawn uniformly for the sake of illustration.
  • the area ratio of each patch Msp is preferably changed in a plurality of steps, for example, in a range of 0 to 100%, preferably at 10% intervals, that is, at 11 steps.
  • the area ratio of the blocking portion Md increases as the patch Msp is positioned higher, and the area ratio of the blocking portion Md decreases as the patch Msp is positioned lower (in other words, The area ratio of the transmission portion Mc increases).
  • the number of lines per unit area in each patch Msp may be changed in a plurality of stages, for example, eight stages (for example, 50 lines, 100 lines, 150 lines, 200 lines, 300 lines, It is preferable to change the number between 400, 500 and 600).
  • the number of lines decreases as the patch Msp is located on the left side, and the number of lines increases as the patch Msp is located on the right side.
  • FIG. 9 is a diagram illustrating an example of the sample image Gs.
  • the sample image Gs is configured by arranging i ⁇ j rectangular patch images Gsp.
  • Each patch image Gsp corresponds to each patch Msp of the sample pattern Ms, and is formed by exposing using the corresponding patch Msp.
  • the first area, the second area, and the third area are formed at a ratio according to the pattern characteristics of the corresponding patch Msp.
  • each patch image Gsp presents a reproduced color according to the ratio of each area.
  • the reproduced color of each patch image Gsp is a single color, and differs between patches.
  • the types of reproduced colors of each patch image Gsp are smaller than the types of actual colors for the sake of illustration.
  • step S013 is performed by known colorimetry (chromaticity measurement technology), for example, tristimulus value measurement is performed using a tristimulus value chromaticity meter or a spectral chromaticity meter.
  • colorimetry is performed in consideration of the fact that the reflection characteristics of the cholesteric liquid crystal layer can be expressed (that is, the intensity of reflected light increases in the direction near regular reflection) and that the color changes depending on the observation angle. It is better to do.
  • the color is measured in a direction within ⁇ 30 degrees with respect to a direction perpendicular to the patch image Gsp, and that the illumination be set in a range within ⁇ 30 degrees.
  • the chromaticity measurement value is acquired as a coordinate value (chromaticity coordinate) in the chromaticity coordinate space for each patch image Gsp.
  • the correspondence between the measurement result of the chromaticity obtained for each patch image Gsp and the pattern characteristic of the patch Msp corresponding to each patch image Gsp is specified. Specifically, when the area ratio of each of the transmitting portion Mc and the blocking portion Md in each patch Msp and the number of lines per unit area in each patch Msp change, the chromaticity coordinates of the reproduced colors of the patch image Gsp are changed. The change tendency is specified (S014).
  • i patches Msp having the same number of lines in the patch Msp for example, a patch Msp in a row marked with a symbol R in FIG. Pay attention.
  • These patches Msp correspond to the patch images Gsp in the column indicated by the symbol R in FIG.
  • the patch Msp with the lowest area ratio of the blocking portion Md corresponds to the corresponding patch image Gsp (the lowermost patch in the row R in FIG. 9).
  • the chromaticity measurement value of the reproduced color of the image Gsp) is plotted in the xy color coordinate space.
  • the chromaticity measurement value of the reproduced color of the corresponding patch image Gsp (the second patch image Gsp from the bottom in the column R in FIG. Plot in coordinate space.
  • FIG. 10 is an explanatory diagram of the changing tendency of the chromaticity coordinates of the reproduced colors.
  • FIG. 7 illustrates the patch Msp corresponding to two plots in the change curve together with the above-mentioned change curve.
  • the plot located on the leftmost side shows the chromaticity measurement value of the reproduced color when the area ratio of the blocking portion Md in the patch Msp is the lowest.
  • the area ratio increases toward the right, and the plot located on the rightmost side shows the chromaticity measurement value of the reproduced color when the area ratio is the highest.
  • step S014 as the correspondence between the parameter and the value that changes according to the parameter, the change tendency of the chromaticity coordinates of the reproduced color when the area ratio and the number of lines change (specifically, the change Curve). More specifically, a change tendency when the area ratio changes in 11 steps and the number of lines changes in 8 steps is specified.
  • FIG. 11 is a diagram showing a change tendency of the chromaticity coordinates of the reproduced color when the area ratio and the number of lines change.
  • a patch Msp corresponding to a plot when the area ratio is the same in each of two different change curves is illustrated.
  • the change tendency located at the lowest position is the change tendency when the number of lines is the smallest. Further, the number of lines increases as going upward, and the change tendency located at the top is the change tendency when the number of lines is the largest.
  • the pattern characteristic setting unit 22 of the image forming apparatus 10 determines the relationship between the specified correspondence, that is, the change tendency of the chromaticity coordinates of the reproduced color, based on the change tendency of the chromaticity coordinates. Set the pattern characteristics of each part. Specifically, the pattern characteristic setting step is performed according to the flow shown in FIGS. 12 and 13 are image diagrams showing the flow of the pattern characteristic setting process according to the first example.
  • the pattern characteristic setting unit 22 acquires image information of an original image (hereinafter, referred to as an original image FG) and analyzes the image information (S021). By this analysis, the color of each part of the original image FG is specified.
  • the number of colors (in other words, colors that can be represented by image information) specified in step S021 is N (for example, 516 or 256).
  • the pattern characteristic setting unit 22 limits the number of colors on the original image FG (S022).
  • the color number limitation is a process for reducing the number of colors that can be expressed by posterization (gradation change). Due to this color number limitation, the color of each part of the original image FG is a color whose number of colors is limited. The color with the limited number of colors corresponds to the set color for each part of the image finally formed on the cholesteric liquid crystal layer 40.
  • the colors of each part of the original image FG whose number of colors is limited are configured by colors (representative colors) smaller than the number N of colors before the limitation. In other words, the set color of each part of the image is a color that can be separated into a plurality of representative colors.
  • the pattern characteristic setting unit 22 performs an image color division process on the image information with the limited number of colors (S023).
  • the image color division process is a process of dividing the original image FG2 indicated by the image information with the limited number of colors into a single-color image EG for each representative color.
  • the pattern characteristic setting unit 22 calculates the chromaticity coordinates of the representative color corresponding to the single color image EG for each single color image EG for each representative color (S024).
  • the representative color corresponding to each monochrome image EG is expressed as coordinate values in the xy color coordinate space.
  • the pattern characteristic setting unit 22 determines a pattern characteristic (hereinafter, a reproduction pattern characteristic) for reproducing the chromaticity coordinates of the color (representative color) of each monochrome image EG calculated in step S024 (S025). ).
  • a reproduction pattern characteristic for reproducing the chromaticity coordinates of the color (representative color) of each monochrome image EG calculated in step S024 (S025).
  • the pattern characteristic setting unit 22 changes the chromaticity coordinates of the reproduction color when the area ratio and the number of lines in the patch Msp change, specifically, the correspondence specified in the correspondence specification step. See trends. Then, the pattern characteristic setting unit 22 determines a reproduction pattern characteristic based on the above-mentioned change tendency.
  • the procedure for determining the reproduction pattern characteristics will be specifically described by taking as an example a case where the reproduction pattern characteristics for the chromaticity coordinates (x1, y1) of the representative color corresponding to a certain single-color image EG are determined.
  • FIG. 14 is an explanatory diagram of a procedure for determining a reproduction pattern characteristic.
  • a specific change tendency Ca in which the chromaticity coordinates of the reproduced color are closest to the plotted chromaticity coordinates (x1, y1) is specified.
  • the third change tendency from the top corresponds to the specific change tendency Ca.
  • the area ratio r1 and the number of lines k1 when the chromaticity coordinates of the reproduced color are closest to the plotted chromaticity coordinates (x1, y1) in the specific change tendency Ca are specified.
  • the area ratio r1 and the number of lines k1 specified in this manner are reproduction pattern characteristics for the chromaticity coordinates (x1, y1) of the representative color corresponding to a certain single-color image EG.
  • the reproduction pattern characteristics are determined by the above procedure.
  • the reproduction pattern characteristics are determined for the chromaticity coordinates of each representative color calculated in step S024 (in other words, the same number as the number of single-color images EG divided from the original image FG2).
  • the pattern characteristic setting unit 22 sets the pattern characteristics of the unit pattern Mt for forming each monochrome image EG (S027).
  • the pattern characteristic setting unit 22 specifies, in each monochrome image EG, a portion (colored portion) exhibiting the color of the monochrome image EG.
  • a hatched portion and a white portion correspond to a colored portion.
  • the pattern characteristic setting unit 22 sets the pattern characteristics of the unit pattern Mt corresponding to the above-mentioned colored portion. More specifically, the pattern characteristic setting unit 22 sets the reproduction pattern characteristic determined in step S026 as the pattern characteristic of the unit pattern Mt. That is, the area ratio and the number of lines in the unit pattern Mt are determined according to the representative color corresponding to the unit pattern Mt based on the change tendency illustrated in FIGS.
  • the pattern characteristics in the unit pattern Mt are set in the manner described above. Note that there are as many unit patterns Mt as the number of monochrome images EG (in other words, the same number as the representative colors). Therefore, the pattern characteristic in each portion of the unit pattern Mt is set for each single-color image EG by the same number of times as the single-color image EG.
  • the pattern characteristic setting unit 22 determines the mesh pattern Mp by synthesizing the same number of unit patterns Mt as the plurality of representative colors. As a result, the pattern characteristics of each portion of the mesh pattern Mp, that is, the area ratio of each of the transmission portion Mc and the blocking portion Md, and the number of lines per unit area are set (S027).
  • the pattern characteristic setting step is completed. Thereafter, as described above, the mesh pattern Mp having the pattern characteristics set in the pattern characteristic setting step is formed on a colorless and transparent sheet material, and the mask M is manufactured.
  • each portion of the mesh pattern Mp of the mask M is provided with a transmission portion Mc and a blocking portion Md at a predetermined area ratio and a predetermined number of lines.
  • the predetermined area ratio and the number of lines mean that the chromaticity coordinates of the reproduced color in the change tendency shown in FIG.
  • the set colors of each part of the image are the set colors of each part of the image (strictly speaking, of the plurality of representative colors constituting the set color, The area ratio and the number of lines when the chromaticity coordinates of the representative color corresponding to each part are closest. As a result, finally, in each part of the image, the set color of each part is properly reproduced.
  • the number of colors is limited on the original image FG, and the original image FG is divided into the single-color images EG for each representative color (clustering). Such a configuration is particularly effective when the resolution of the original image FG is relatively high.
  • the pattern characteristics of the mesh pattern Mp are set from the plurality of pattern fragments Mu.
  • an image formed on the cholesteric liquid crystal layer 40 is constituted by a plurality of image pieces Gt (see FIG. 20).
  • the image is decomposed (fragmented) into a plurality of image pieces Gt.
  • each of the plurality of image pieces Gt corresponds to a part of an image and includes one or more regions.
  • the pattern for forming each image piece Gt corresponds to the pattern fragment Mu. That is, the same number of the pattern fragments Mu as the number of the image fragments Gt exist.
  • the mesh pattern Mp is configured by arranging a plurality of image fragments Gt and the same number of pattern fragments Mu side by side (see FIG. 20).
  • the above-described step of specifying the correspondence is performed prior to setting the pattern characteristics for each pattern fragment Mu.
  • This step has a different content from the correspondence specifying step of the first example, and is hereinafter referred to as a “second specifying step” to distinguish it from the correspondence specifying step of the first example.
  • the correspondence between the pattern characteristics of the reticulated pattern Mp and the values related to each part of the image is specified.
  • the pattern characteristics of the reticulated pattern Mp are the area ratio of each of the transmitting portion Mc and the blocking portion Md in each of the pattern fragments Mu constituting the reticulated pattern Mp, and the number of lines per unit area in each of the pattern cross sections Mu.
  • the value related to each part of the image is a ratio of each of the first area, the second area, and the third area in each part of the image.
  • the second specifying step proceeds, for example, according to the flow shown in FIG.
  • FIG. 15 is a diagram showing the flow of the second specifying step. More specifically, in the second specifying step, first, a plurality of types of dot image information are generated (S031).
  • the halftone image information is image information indicating the halftone image HG shown in FIG.
  • the halftone image HG is an image of two colors of black and white, and is composed of dot patterns (dots) arranged regularly and uniformly.
  • FIG. 16 is a diagram illustrating an example of the halftone image HG.
  • the area ratio and the number of lines of the dots in the dot image HG, the type of the dot shape, and the like are set.
  • it is preferable to set a plurality of lines for example, eight values (for example, 50 lines, 100 lines, 150 lines, 200 lines, 300 lines, 400 lines, 500 lines, and 600 lines). Is good.
  • the type of dot shape is not particularly limited, but will be set to a circular dot below.
  • each halftone image HG is developed based on each of the plurality of types of halftone image information generated in step S031, and more specifically, each halftone image HG is drawn on a computer (S032). .
  • the dot image HG will be described again.
  • the dot image HG is an image corresponding to each part of the reticulated pattern Mp, strictly speaking, the pattern fragment Mu. That is, the area ratio of the dots in the halftone image HG set in step S031 corresponds to the area ratio of each of the transmission portion Mc and the blocking portion Md in the pattern fragment Mu.
  • the number of lines per unit area in the halftone image HG set in step S031 corresponds to the number of lines per unit area in the pattern fragment Mu.
  • the plurality of types of halftone image information generated in step S031 indicate combinations of 11 area ratios and 8 line numbers for each of the transparent portion Mc and the blocking portion Md in the pattern fragment Mu.
  • the dots in each halftone image HG are assumed to correspond to the blocking portions Md in the corresponding pattern fragments Mu, but are not limited thereto, and the above dots may correspond to the transmitting portions Mc. It may be.
  • the halftone image HG also corresponds to an image formed using the pattern fragments Mu, that is, an image fragment Gt.
  • an area located between dots corresponds to a first area in the image piece Gt
  • a dot corresponds to a second area, which is located around an edge of the dot.
  • the region corresponds to a third region. Therefore, the ratio of each area in each image piece Gt can be obtained from each halftone image HG developed.
  • a digital filter process is performed on the developed halftone image HG (S033).
  • This digital filter processing is processing for specifying an area located around the edge of the dot in the halftone image HG, that is, an area corresponding to the third area.
  • the third region has a predetermined width (specifically, a width determined according to a material of the cholesteric liquid crystal layer, a mask used at the time of exposure, and the like) at a boundary position between the first region and the second region.
  • a predetermined width specifically, a width determined according to a material of the cholesteric liquid crystal layer, a mask used at the time of exposure, and the like
  • the halftone image HG shown in FIG. 17 (strictly, the halftone image HG whose resolution has been adjusted) is converted into an area having a predetermined width around the edge of the dot as shown in FIG. (That is, the third area) can be converted into the halftone image HG to which the halftone image HG is added.
  • FIG. 17 shows the halftone image HG before the digital filter processing
  • FIG. 18 shows the halftone image HG after the digital filter processing.
  • the ratio of each area in the halftone image HG is calculated (S034). Specifically, first, the ratio of the area corresponding to the second area in the halftone image HG whose resolution has been adjusted in step S033 is calculated. More specifically, the halftone image HG shown in FIG. 17 is image-analyzed to calculate the ratio of the area occupied by the dots in the halftone image HG.
  • the ratio of the area corresponding to the third area in the halftone image HG subjected to the digital filter processing in step S033 is calculated. Specifically, based on the halftone image HG before the digital filter processing shown in FIG. 17 and the halftone image HG after the digital filter processing shown in FIG. Obtain a point image HG. In the halftone dot image HG shown in FIG. 19, only the area arranged around the edge of the dot (that is, the area corresponding to the third area) is extracted and appears as a white annular area. Then, the halftone image HG shown in FIG. 19 is analyzed, and the ratio of the above-described annular region in the halftone image HG is calculated.
  • FIG. 19 is a diagram showing a halftone image HG in which a region corresponding to the third region is extracted.
  • the ratio of the region corresponding to the first region is calculated from the ratio of the region corresponding to each of the second region and the third region in the halftone image HG calculated so far.
  • the correspondence between the type of the dot image information and the ratio of each area in the type-specific dot image HG is specified.
  • the dot image information indicates the area ratio and the number of lines of each of the transmitting portion Mc and the blocking portion Md in the pattern fragment Mu, as described above.
  • the ratio of each region in the halftone image HG corresponds to the ratio of each region in the image piece Gt. Therefore, in the second specifying step, the correspondence between the area ratio and the number of lines in each pattern fragment Mu and the ratio of each region in the image piece Gt becomes clear. More specifically, the correspondence between the combinations of 11 area ratios and 8 lines set for the pattern fragment Mu and the ratio of each region in the image piece Gt is specified.
  • the pattern characteristic setting unit 22 of the image forming apparatus 10 sets the pattern characteristic of each part of the mesh pattern Mp based on the above-described correspondence. Specifically, the pattern characteristic setting step is performed according to the flow shown in FIG. FIG. 20 is an image diagram showing a flow of a pattern characteristic setting step according to the second example.
  • the pattern characteristic setting unit 22 divides the original image FG into a plurality of image pieces Gt (S041).
  • the plurality of image fragments Gt obtained by dividing the original image FG are synonymous with the plurality of image fragments that finally form the image formed on the cholesteric liquid crystal layer 40.
  • each image piece Gt is also a full-color image. Further, as described above, each image piece Gt corresponds to one of the plurality of pattern fragments Mu forming the mesh pattern Mp.
  • the pattern characteristic setting unit 22 performs resolution conversion on each image piece Gt (S042).
  • the resolution conversion is a process of averaging the color of each image piece Gt within each image piece Gt. That is, the color of each of the image pieces Gt2 whose resolution has been converted is a single color, and is a color expressed by each of the three RGB colors.
  • the color of each of the image pieces Gt2 whose resolution has been converted corresponds to the set color of each part of the image finally formed on the cholesteric liquid crystal layer 40.
  • the pattern characteristic setting unit 22 performs RGB area ratio conversion on the color of each of the image pieces Gt2 whose resolution has been converted (S043).
  • the RGB area ratio conversion is a process of calculating the area ratio of each of the three RGB colors (strictly speaking, the area ratio with respect to the area of the image piece Gt2) required to represent the color of the resolution-converted image piece Gt2. It is.
  • the area ratio of the red (R) region is referred to as an R ratio
  • the area ratio of the green (G) region is referred to as a G ratio
  • the area ratio of the blue (B) region is referred to as B ratio.
  • the R rate, the G rate, and the B rate are collectively referred to as “RGB area rate”.
  • the procedure of the RGB area ratio conversion will be specifically described by taking as an example a case where the RGB area ratio conversion is performed on the color of one resolution-converted image piece Gt2 (hereinafter, conversion target color). It shall be.
  • the conversion target color is converted into a chromaticity value (chromaticity coordinates) in the xy color coordinate space.
  • the RGB spectral reflectance is specified for each chromaticity value.
  • the RGB spectral reflectances are reflectances of red (R), which is the color of the first area, blue (G), which is the color of the second area, and green (B), which is the third area. This is information indicating the distribution of (spectral reflectance).
  • the RGB spectral reflectance for the conversion target color for example, a plurality of patch images (not shown) having different chromaticity values are formed on the cholesteric liquid crystal layer 40 in advance. Then, for the chromaticity value of each patch image, a known measurement method (spectroscopy) is applied to measure the RGB spectral reflectance. Thereby, the correlation between the chromaticity value and the RGB spectral reflectance becomes clear.
  • the RGB area ratio is determined, the RGB spectral reflectance at that time is uniquely determined. In other words, the RGB area ratio is determined according to the RGB spectral reflectance. If the RGB spectral reflectance is determined from the correlation between the chromaticity value and the RGB spectral reflectance, the chromaticity value at that time is uniquely determined. In other words, the RGB spectral reflectance is determined according to the chromaticity value. From the above relationship, it is possible to specify the RGB area ratio for reproducing the conversion target color from the chromaticity value of the conversion target color. In such a manner, the RGB area ratio conversion is performed on the conversion target color.
  • the RGB area ratio obtained for the color of each of the image pieces Gt2 whose resolution has been converted corresponds to the ratio of each region in each image portion set so as to obtain the set color of each image portion. Further, the RGB area ratio is obtained based on the RGB spectral reflectance of the color of each resolution-converted image piece Gt2 (that is, the set color).
  • the pattern characteristic setting unit 22 sets the pattern characteristic of each pattern fragment Mu according to the RGB area ratio of each image piece Gt2 calculated in step S043 (S044). More specifically, the pattern characteristic setting unit 22 refers to the correspondence specified in the second specifying step when determining the pattern characteristics of each pattern fragment Mu. Then, the pattern characteristic setting unit 22 determines the pattern characteristic of each pattern fragment Mu according to the color (set color) of the corresponding image piece Gt2 based on the above correspondence.
  • the pattern characteristic setting unit 22 calculates the area ratio and the area ratio in the corresponding pattern fragment Mu from the RGB area ratio (ratio) of the color of one resolution-converted image piece Gt2 based on the above-described correspondence. Determine the number of lines. This process is repeated for each of the image pieces Gt2 whose resolution has been converted. Thereby, pattern characteristics are set for each of the same number of pattern fragments Mu as the image piece Gt2.
  • the pattern characteristic setting unit 22 determines the mesh pattern Mp by arranging and arranging a plurality of pattern fragments Mu at corresponding positions.
  • the pattern characteristics in each part of the mesh pattern Mp that is, the area ratio of each of the transmission part Mc and the blocking part Md in each part, and the number of lines per unit area in each part are set (S045).
  • the pattern characteristic setting step is completed. Thereafter, as described above, the mesh pattern Mp having the pattern characteristics set in the pattern characteristic setting step is formed on a colorless and transparent sheet material, and the mask M is manufactured.
  • each portion of the mesh pattern Mp of the mask M is provided with each of the transmission portion Mc and the blocking portion Md at an area ratio and the number of lines corresponding to a ratio at which the set color of each image portion is obtained.
  • the original image FG is divided into a plurality of image pieces Gt, the resolution of each image piece Gt is adjusted, and the color of each image piece Gt is averaged. To a single color.
  • Such a configuration is particularly effective when the number of gradations of the original image FG is relatively large.
  • the exposure unit 14 exposes the film 5a of the liquid crystal composition
  • the adjustment unit 16 controls the first region in each portion of the image, The ratio of each of the second region and the third region is adjusted.
  • the first region is a region where the exposure amount at the time of exposure is larger
  • the second region is a region where the exposure amount at the time of exposure is smaller
  • the third region is a region of the first region and the second region. This is an area generated at the boundary position.
  • the adjusting unit 16 adjusts the ratio according to the set color of each part of the image based on the correspondence between the parameter for adjusting the ratio of each area and the value that changes according to the parameter. Accordingly, an image can be more rationally formed on the cholesteric liquid crystal layer 40 as compared with the conventional image forming method.
  • the ratio of each of the three regions in each part of the image is adjusted according to the set color set for each part of the image. can do.
  • a third area is additionally formed accordingly. Therefore, in forming the three regions, it is not necessary to adjust the exposure conditions for each of the three regions, and it is possible to reduce labor and cost by that amount. This makes it possible to form an image on the cholesteric liquid crystal layer 40 in a shorter time with a cheaper configuration than in the conventional image forming method.
  • this embodiment only one mask M is used for adjusting the exposure condition in the pattern exposure processing. Therefore, labor and cost can be reduced as compared with the case where a plurality of masks are used for image formation. As a result, it is possible to more rationally form an image on the cholesteric liquid crystal layer 40.
  • Examples of a material used for forming the cholesteric liquid crystal layer include a liquid crystal composition containing a liquid crystal compound.
  • the liquid crystal compound is preferably a liquid crystal compound having a polymerizable group (polymerizable liquid crystal compound).
  • the liquid crystal composition including the polymerizable liquid crystal compound may further include a chiral agent, a polymerization initiator, and the like.
  • each component will be described in detail.
  • the polymerizable liquid crystal compound may be a rod-shaped liquid crystal compound or a disc-shaped liquid crystal compound, but is preferably a rod-shaped liquid crystal compound.
  • Examples of the rod-shaped polymerizable liquid crystal compound forming the cholesteric liquid crystal layer include a rod-shaped nematic liquid crystal compound.
  • rod-shaped nematic liquid crystal compound examples include azomethines, azoxys, cyanobiphenyls, cyanophenyl esters, benzoates, cyclohexanecarboxylic acid phenyl esters, cyanophenylcyclohexanes, cyano-substituted phenylpyrimidines, and alkoxy-substituted phenylpyrimidines.
  • Phenyldioxane, tolan and alkenylcyclohexylbenzonitrile are preferred. Not only low-molecular liquid crystal compounds but also high-molecular liquid crystal compounds can be used.
  • the polymerizable liquid crystal compound is obtained by introducing a polymerizable group into the liquid crystal compound.
  • the polymerizable group include an unsaturated polymerizable group, an epoxy group, and an aziridinyl group. An unsaturated polymerizable group is preferable, and an ethylenically unsaturated polymerizable group is more preferable.
  • the polymerizable group can be introduced into the molecule of the liquid crystal compound by various methods.
  • the number of polymerizable groups contained in the polymerizable liquid crystal compound is preferably 1 to 6, more preferably 1 to 3.
  • Examples of the polymerizable liquid crystal compound include Makromol. Chem. 190, 2255 (1989), Advanced Materials, Vol. 5, 107 (1993), U.S. Pat.
  • Two or more polymerizable liquid crystal compounds may be used in combination. When two or more polymerizable liquid crystal compounds are used in combination, the alignment temperature can be lowered.
  • the amount of the polymerizable liquid crystal compound in the liquid crystal composition is preferably 75 to 99.9% by mass, and more preferably 80 to 99% by mass based on the mass of the solid content of the liquid crystal composition (the mass excluding the solvent). %, More preferably from 85 to 90% by mass.
  • the chiral agent has a function of inducing a helical structure of a cholesteric liquid crystal phase.
  • the chiral compound has a different twist direction or spiral pitch of the helix induced by the compound, and thus may be selected according to the purpose.
  • the chiral agent is not particularly limited, and may be a known compound (eg, Liquid Crystal Device Handbook, Chapter 3, Section 4-3, TN (twisted nematic), chiral agent for STN (Super-twisted nematic), page 199, Japan Science) (Japan Society for the Promotion of Society, 142nd Committee, 1989)), isosorbide, and isomannide derivatives.
  • the chiral agent generally contains an asymmetric carbon atom, but an axially asymmetric compound or a planar asymmetric compound containing no asymmetric carbon atom can also be used as the chiral agent.
  • the axially asymmetric compound or the planar asymmetric compound include binaphthyl, helicene, paracyclophane, and derivatives thereof.
  • the chiral agent may have a polymerizable group. When both the chiral agent and the liquid crystal compound have a polymerizable group, the polymerization reaction between the polymerizable chiral agent and the polymerizable liquid crystal compound results in a repeating unit derived from the polymerizable liquid crystal compound, and a derivative derived from the chiral agent.
  • the polymerizable group of the polymerizable chiral agent is preferably a group of the same type as the polymerizable group of the polymerizable liquid crystal compound. Therefore, the polymerizable group of the chiral agent is also preferably an unsaturated polymerizable group, an epoxy group or an aziridinyl group, more preferably an unsaturated polymerizable group, and more preferably an ethylenically unsaturated polymerizable group. More preferred. Further, the chiral agent may be a liquid crystal compound.
  • a chiral agent capable of changing the helical pitch of the phase (hereinafter also referred to as a photosensitive chiral agent).
  • a photosensitive chiral agent is a compound that changes its structure by absorbing light and can change the helical pitch of a cholesteric liquid crystal phase.
  • a compound that causes at least one of a photoisomerization reaction, a photodimerization reaction, and a photolysis reaction is preferable.
  • the compound that causes a photoisomerization reaction refers to a compound that causes stereoisomerization or structural isomerization by the action of light.
  • the photoisomerizable compound include an azobenzene compound and a spiropyran compound.
  • a compound that causes a photodimerization reaction means a compound that undergoes an addition reaction between two groups to be cyclized by irradiation with light.
  • the photodimerizing compound include cinnamic acid derivatives, coumarin derivatives, chalcone derivatives, and benzophenone derivatives.
  • a chiral agent represented by the following formula (I) is preferably exemplified.
  • This chiral agent can change the orientation structure such as the helical pitch (twisting force and helical twist angle) of the cholesteric liquid crystal phase according to the amount of light at the time of light irradiation.
  • Ar 1 and Ar 2 represent an aryl group or a heteroaromatic ring group.
  • the aryl group represented by Ar 1 and Ar 2 may have a substituent, and preferably has 6 to 40 carbon atoms, and more preferably 6 to 30 carbon atoms.
  • the substituent include a halogen atom, an alkyl group, an alkenyl group, an alkynyl group, an alkoxy group, a hydroxyl group, an acyl group, an alkoxycarbonyl group, an aryloxycarbonyl group, an acyloxy group, a carboxyl group, a cyano group, or a heterocyclic group.
  • substituents are preferred, and halogen atoms, alkyl groups, alkenyl groups, alkoxy groups, hydroxyl groups, acyloxy groups, alkoxycarbonyl groups, or aryloxycarbonyl groups are more preferred.
  • Another preferred embodiment of the substituent includes a substituent having a polymerizable group.
  • the polymerizable group include an unsaturated polymerizable group, an epoxy group, and an aziridinyl group, and an acryloyl group or a methacryloyl group is preferable.
  • the substituent having a polymerizable group preferably further contains an arylene group.
  • Arylene groups include phenylene groups.
  • Preferred examples of the substituent having a polymerizable group include a group represented by the formula (A). * Represents a bonding position.
  • Formula (A) * -L A1- (Ar) n -L A2 -P Ar represents an arylene group.
  • P represents a polymerizable group.
  • L A1 and L A2 each independently represent a single bond or a divalent linking group. Examples of the divalent linking group include —O—, —S—, —NR F — (R F represents a hydrogen atom or an alkyl group), —CO—, an alkylene group, an arylene group, and these groups. Combinations of groups (eg, -O-alkylene group -O-) are mentioned.
  • n represents 0 or 1.
  • an aryl group represented by the following general formula (III) or (IV) is preferable.
  • R 1 in the general formula (III) and R 2 in the general formula (IV) each independently represent a hydrogen atom, a halogen atom, an alkyl group, an alkenyl group, an alkynyl group, an aryl group, a heterocyclic group, an alkoxy group, Represents a hydroxyl group, an acyl group, an alkoxycarbonyl group, an aryloxycarbonyl group, an acyloxy group, a carboxyl group, a cyano group, or a substituent having the above polymerizable group (preferably, a group represented by the formula (A)).
  • a hydrogen atom, a halogen atom, an alkyl group, an alkenyl group, an aryl group, an alkoxy group, a hydroxyl group, an alkoxycarbonyl group, an aryloxycarbonyl group, an acyloxy group, or a substituent having the above polymerizable group preferably, A group represented by the formula (A) is preferable, and an alkoxy group, a hydroxyl group, an acyloxy group, or a substituent having the above polymerizable group (preferably, a group represented by the formula (A)) is more preferable.
  • L 1 in the general formula (III) and L 2 in the general formula (IV) each independently represent a halogen atom, an alkyl group, an alkoxy group, or a hydroxyl group, and an alkoxy group having 1 to 10 carbon atoms; Alternatively, a hydroxyl group is preferred.
  • l represents an integer of 0, 1 to 4, and 0 and 1 are preferable.
  • m represents an integer of 0, 1 to 6, and 0 and 1 are preferable.
  • L 1 and L 2 may represent mutually different groups.
  • the heteroaromatic group represented by Ar 1 and Ar 2 may have a substituent, and preferably has 4 to 40 carbon atoms, and more preferably 4 to 30 carbon atoms.
  • a substituent for example, a halogen atom, an alkyl group, an alkenyl group, an alkynyl group, an aryl group, an alkoxy group, a hydroxyl group, an acyl group, an alkoxycarbonyl group, an aryloxycarbonyl group, an acyloxy group, or a cyano group is preferable.
  • a halogen atom, an alkyl group, an alkenyl group, an aryl group, an alkoxy group, or an acyloxy group is more preferred.
  • heteroaromatic ring group examples include a pyridyl group, a pyrimidinyl group, a furyl group, and a benzofuranyl group. Of these, a pyridyl group or a pyrimidinyl group is preferable.
  • the content of the chiral agent in the liquid crystal composition is preferably from 0.01 to 200 mol%, more preferably from 1 to 30 mol%, based on the total molar amount of the polymerizable liquid crystal compound.
  • the liquid crystal composition contains a polymerizable compound, it preferably contains a polymerization initiator.
  • the polymerization initiator used is preferably a photopolymerization initiator capable of initiating the polymerization reaction by irradiation with ultraviolet light.
  • the photopolymerization initiator include ⁇ -carbonyl compounds (described in US Pat. Nos. 2,367,661 and 2,367,670), acyloin ethers (described in US Pat. No. 2,448,828), and ⁇ -hydrocarbon-substituted aromatic compounds Group acyloin compounds (described in US Pat. No.
  • the content of the photopolymerization initiator in the liquid crystal composition is preferably from 0.1 to 20% by mass, more preferably from 0.5 to 12% by mass, based on the content of the polymerizable liquid crystal compound.
  • liquid crystal composition if necessary, a surfactant, a crosslinking agent, a polymerization inhibitor, an antioxidant, a horizontal alignment agent, an ultraviolet absorber, a light stabilizer, a coloring material, and metal oxide fine particles And the like can be added as long as the optical performance and the like are not reduced.

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Abstract

L'invention concerne un appareil de formation d'image et un procédé de formation d'image qui rendent possible une formation plus raisonnable d'une image sur une couche de cristaux liquides cholestériques. Dans l'appareil de formation d'image qui forme une image, dans laquelle une première région, une deuxième région et une troisième région ayant chacune une couleur différente sont agencées en un maillage et qui est formée sur une couche de cristaux liquides cholestériques, une unité d'exposition réalise une exposition sur une composition de cristaux liquides, et une unité de réglage règle chaque rapport de la première région, de la deuxième région et de la troisième région dans chaque partie d'une image. La première région est une région ayant une amplitude d'exposition plus grande pendant l'exposition, la deuxième région est une région ayant une amplitude d'exposition plus petite pendant l'exposition, et la troisième région est une région au niveau d'une position frontière entre la première région et la deuxième région. De plus, l'unité de réglage règle, sur la base d'une relation correspondante entre un ensemble de paramètres pour ajuster le rapport ci-dessus et une valeur qui change avec le paramètre, le rapport ci-dessus conformément à un ensemble de couleurs de réglage pour chaque partie de l'image.
PCT/JP2019/037773 2018-10-03 2019-09-26 Appareil de formation d'image et procédé de formation d'image WO2020071221A1 (fr)

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Citations (5)

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Publication number Priority date Publication date Assignee Title
JP2000226580A (ja) * 1999-02-03 2000-08-15 Dainichiseika Color & Chem Mfg Co Ltd コレステリック液晶による着色方法及びその着色物品
US20010051305A1 (en) * 1999-12-31 2001-12-13 Lee Hyun Kyu Method of fabricating color filter
WO2018079625A1 (fr) * 2016-10-25 2018-05-03 富士フイルム株式会社 Stratifié décoratif transmissif et son procédé de production, et substrat de verre équipé d'un stratifié décoratif transmissif
WO2018230395A1 (fr) * 2017-06-13 2018-12-20 富士フイルム株式会社 Procédé de production d'un film à cristaux liquides et procédé de production d'un film fonctionnel
WO2019142707A1 (fr) * 2018-01-16 2019-07-25 富士フイルム株式会社 Film, stratifié, dispositif d'imagerie, capteur et dispositif d'affichage tête haute

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Publication number Priority date Publication date Assignee Title
JP4287598B2 (ja) * 2000-06-27 2009-07-01 富士フイルム株式会社 光反応型カイラル剤、液晶組成物、液晶カラーフィルタ、光学フィルム、記録媒体、及び液晶の捻れ構造を変化させる方法
JP2003177395A (ja) * 2001-12-13 2003-06-27 Fuji Photo Film Co Ltd 反射型カラー液晶表示素子、及び反射型カラー液晶表示素子の表示方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000226580A (ja) * 1999-02-03 2000-08-15 Dainichiseika Color & Chem Mfg Co Ltd コレステリック液晶による着色方法及びその着色物品
US20010051305A1 (en) * 1999-12-31 2001-12-13 Lee Hyun Kyu Method of fabricating color filter
WO2018079625A1 (fr) * 2016-10-25 2018-05-03 富士フイルム株式会社 Stratifié décoratif transmissif et son procédé de production, et substrat de verre équipé d'un stratifié décoratif transmissif
WO2018230395A1 (fr) * 2017-06-13 2018-12-20 富士フイルム株式会社 Procédé de production d'un film à cristaux liquides et procédé de production d'un film fonctionnel
WO2019142707A1 (fr) * 2018-01-16 2019-07-25 富士フイルム株式会社 Film, stratifié, dispositif d'imagerie, capteur et dispositif d'affichage tête haute

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