WO2020048082A1 - 用于显示面板的柔性基板及其制作方法 - Google Patents

用于显示面板的柔性基板及其制作方法 Download PDF

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WO2020048082A1
WO2020048082A1 PCT/CN2019/072539 CN2019072539W WO2020048082A1 WO 2020048082 A1 WO2020048082 A1 WO 2020048082A1 CN 2019072539 W CN2019072539 W CN 2019072539W WO 2020048082 A1 WO2020048082 A1 WO 2020048082A1
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composite material
sio
flexible substrate
display panel
nanotubes
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French (fr)
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张福阳
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Wuhan China Star Optoelectronics Semiconductor Display Technology Co Ltd
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Wuhan China Star Optoelectronics Semiconductor Display Technology Co Ltd
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/80—Manufacture or treatment specially adapted for the organic devices covered by this subclass using temporary substrates
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K77/00—Constructional details of devices covered by this subclass and not covered by groups H10K10/80, H10K30/80, H10K50/80 or H10K59/80
    • H10K77/10—Substrates, e.g. flexible substrates
    • H10K77/111—Flexible substrates
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y02E10/549—Organic PV cells

Definitions

  • the present invention relates to the technical field of display panels, and in particular, to a flexible substrate for a display panel and a manufacturing method thereof.
  • An object of the present invention is to provide a flexible substrate for a display panel and a manufacturing method thereof, so as to solve the problems of poor optical transparency, mechanical properties, water and oxygen barrier properties, high temperature stability, and surface flatness of the substrate in the prior art. technical problem.
  • the present invention provides a flexible substrate for a display panel, including:
  • a composite film comprising a SiO 2 nanotube / polymer matrix, the polymer matrix being polyimide, polyetherimide, polyphenylene sulfide, polyarylate, or any combination thereof ;
  • the concentration of the SiO 2 nanotubes in the composite material film changes in a gradient along the x-axis direction, and the x-axis direction is a direction perpendicular to the surface of the composite material film;
  • the composite material film has two to five layers of composite material thin films, and the concentration of SiO 2 nanotubes in each composite material thin film is different, so that the concentration of the SiO 2 nanotubes in the composite material film As x increases in the x-axis direction, it gradually decreases and reaches 0, but changes in a gradient.
  • the flexible substrate has two composite material films, the flexible substrate further includes a water and oxygen barrier layer, and the two composite material films are respectively disposed on two opposite sides of the water and oxygen barrier layer. On the surface.
  • a material of the water-oxygen barrier layer is SiO 2 , amorphous silicon, SiNx, or any combination thereof.
  • the thickness of the composite material film is 5 to 20 ⁇ m, and the thickness of the water and oxygen barrier layer is 300 to 1000 nm.
  • the present invention also provides a flexible substrate for a display panel, including:
  • a composite material film comprising a SiO 2 nanotube / polymer matrix, the polymer matrix being polyimide, polyetherimide, polyphenylene sulfide, polyarylate, or any combination thereof;
  • the concentration of the SiO2 nanotubes in the composite material film changes in a gradient along the x-axis direction, and the x-axis direction is a direction perpendicular to the surface of the composite material film.
  • the flexible substrate has two composite material films, the flexible substrate further includes a water and oxygen barrier layer, and the two composite material films are respectively disposed on two opposite sides of the water and oxygen barrier layer. On the surface.
  • a material of the water-oxygen barrier layer is SiO 2 , amorphous silicon, SiNx, or any combination thereof.
  • the thickness of the composite material film is 5 to 20 ⁇ m, and the thickness of the water and oxygen barrier layer is 300 to 1000 nm.
  • the composite material film has two to five layers of composite material thin films, and the concentration of SiO 2 nanotubes in each composite material thin film is different, so that the SiO 2 nanotubes are in the The concentration in the composite material film gradually decreases with the increase of x in the x-axis direction and reaches 0, but changes in a gradient.
  • the present invention also provides a method for manufacturing a flexible substrate for a display panel, including the following steps:
  • the first composite material film including SiO 2 nanotubes / polymer matrix, the polymer matrix is polyimide, polyetherimide, polyphenylene sulfide Ether, polyarylate, or any combination thereof;
  • the concentration of the SiO 2 nanotubes in the first composite material film gradually decreases with the increase of x in the x-axis direction and reaches 0, and the x-axis direction is a surface perpendicular to the bottom plate. Direction.
  • the method further includes:
  • a second composite material film is formed on the water-oxygen barrier layer.
  • the second composite material film includes a SiO 2 nanotube / polymer matrix, and the polymer matrix is polyimide, polyetherimide, Polyphenylene sulfide, polyarylate, or any combination thereof; and
  • the concentration of the SiO 2 nanotubes in the second composite material film changes in a gradient along the x-axis direction, and the x-axis direction is a direction perpendicular to the surface of the bottom plate.
  • a material of the water-oxygen barrier layer is SiO 2 , amorphous silicon, SiNx, or any combination thereof.
  • the thickness of the first and second composite material films is 5 to 20 ⁇ m, and the thickness of the water and oxygen barrier layer is 300 to 1000 nm.
  • the step of forming the first and second composite material films includes: coating two to five layers of composite material liquid and curing the composite material liquid so that the SiO 2 nanotubes are in the The concentrations in the first and second composite films gradually decrease with increasing x in the x-axis direction and reach a gradient of 0; and
  • the maximum concentration of the SiO 2 nanotubes in the first and second composite material films is 5 vol.%.
  • the present invention provides a flexible substrate for a display panel and a manufacturing method thereof.
  • the flexible substrate has a composite material structure, and the composite material structure includes at least a SiO 2 nanotube / polymer matrix.
  • the optical transparency, mechanical properties, water and oxygen barrier properties of the traditional flexible polymer substrate, and stability under high temperature processes are improved, and the reliability of the flexible display panel is improved.
  • the present invention adds a one-dimensional structure of SiO 2 nanotubes to the polymer matrix, and makes the concentration of the one-dimensional structure of SiO 2 nanotubes have a gradient change to ensure the flatness of the substrate surface.
  • FIG. 1 is a schematic diagram of a film structure of a flexible substrate for a display panel manufactured according to a first embodiment of the present invention.
  • FIG. 2 is a schematic diagram of a film structure of a flexible substrate for a display panel made according to a second embodiment of the present invention.
  • the invention provides a flexible substrate for a display panel and a manufacturing method thereof.
  • the flexible substrate has a composite material structure, and the composite material structure includes at least a SiO 2 nanotube / polymer matrix, which improves the traditional flexible polymer substrate.
  • Optical transparency, mechanical properties, water and oxygen barrier properties, and stability under high temperature processes improve the reliability of flexible display panels.
  • the present invention adds a one-dimensional structure of SiO 2 nanotubes to the polymer matrix, and makes the concentration of the one-dimensional structure of SiO 2 nanotubes have a gradient change to ensure the flatness of the substrate surface.
  • the present invention has two substrate composite material structures, which can be selected according to requirements, as shown in FIGS. 1 and 2.
  • FIG. 1 is a schematic diagram of a film structure of a flexible substrate for a display panel made according to a first embodiment of the present invention.
  • the flexible substrate for a display panel has a composite material film 102 including a SiO 2 nanotube / polymer matrix, and the polymer matrix is polyimide, polyimide Etherimide, polyphenylene sulfide, polyarylate, or any combination thereof.
  • the composite material film 102 includes SiO 2 nanotubes 104 and a polymer matrix 105; wherein the concentration of the SiO 2 nanotubes 104 in the composite material film 102 increases with x in the x-axis direction.
  • the x-axis direction is a direction that is perpendicular to the surface of the composite material film 102 and gradually decreases and reaches 0 (that is, changes in a gradient).
  • the thickness of the composite material film 102 is 5 to 20 ⁇ m.
  • the composite material film 102 has two to five layers (for example, three layers) of composite material thin films, and the concentration of SiO 2 nanotubes in each composite material thin film is different, so that the SiO 2 nanotubes are in the composite material.
  • the concentration in the thin film 102 decreases gradually with the increase of x in the x-axis direction and reaches 0, but changes in a gradient.
  • the flexible substrate of the first embodiment of the present invention shown in FIG. 1 can be manufactured through the following steps:
  • a composite material film 102 is formed on the bottom plate 101.
  • the composite material film 102 includes a SiO 2 nanotube / polymer matrix, and the polymer matrix 105 is polyimide, polyetherimide, or polyphenylene sulfide. Ether, polyarylate, or any combination thereof;
  • the concentration of the SiO 2 nanotubes 104 in the composite material film 102 gradually decreases with the increase of x in the x-axis direction and reaches 0 (that is, changes in a gradient), and the x-axis direction is The direction perpendicular to the surface of the bottom plate 101.
  • the bottom plate 101 may be a glass bottom plate.
  • the composite material film 102 includes SiO 2 nanotubes 104 and a polymer matrix 105.
  • the thickness of the composite material film 102 is 5 to 20 ⁇ m.
  • the step of forming the composite material film 102 may include, for example, firstly sequentially coating two to five layers (for example, three layers) of composite material liquids having different concentrations, and then applying these The layer composite material is liquid-cured so that the concentration of the SiO 2 nanotubes in the composite material film gradually decreases with the increase of x in the x-axis direction and reaches a gradient of 0.
  • the maximum value of the concentration of the SiO 2 nanotubes 104 in the composite liquid is 5 vol.%.
  • the curing step is a high temperature process, for example, maintaining a constant temperature at 120 ° C. for 30 minutes, and then raising the temperature to 450 ° C. and maintaining the constant temperature for 60 minutes to solidify the composite material liquid.
  • the base plate 101 is removed to complete the manufacture of the display panel.
  • the invention also provides another substrate composite material structure.
  • FIG. 2 is a schematic diagram of a film structure of a flexible substrate for a display panel made according to a second embodiment of the present invention.
  • the flexible substrate for a display panel has two composite material films, that is, first and second composite material films 102A and 102B.
  • the flexible substrate further includes a water-oxygen barrier layer 103.
  • the two composite material films 102A and 102B are respectively disposed on two opposite surfaces of the water-oxygen barrier layer 103.
  • the first and second composite material films 102A and 102B include a SiO 2 nanotube / polymer matrix, and the polymer matrix 105 is polyimide, polyetherimide, polyphenylene sulfide, polyarylate, Or any combination thereof. That is, the first and second composite material films 102A and 102B include SiO 2 nanotubes 104 and a polymer matrix 105; wherein, the SiO 2 nanotubes 104 are in the first and second composite material films 102A, The concentration in 102B gradually decreases with increasing x in the x-axis direction and reaches 0 (that is, changes in a gradient), and the x-axis direction is a direction perpendicular to the surface of the bottom plate 101.
  • the material of the water-oxygen barrier layer 103 may be SiO 2 , amorphous silicon, SiNx, or any combination thereof.
  • the thickness of the first and second composite material films 102A and 102B is 5 to 20 ⁇ m, and the thickness of the water and oxygen barrier layer 103 is 300 to 1000 nm.
  • Each of the first and second composite material films 102A and 102B has two to five layers (for example, three layers) of composite material thin films, and the concentration of SiO 2 nanotubes in each composite material thin film is different, so that The concentration of SiO 2 nanotubes in the composite material films 102A and 102B gradually decreases with the increase of x in the x-axis direction, and reaches 0, but changes in a gradient.
  • the second embodiment of the present invention has two composite material films 102A, 102B and a water-oxygen barrier layer 103.
  • the water-oxygen barrier layer 103 can further prevent the water and oxygen below from entering the thin-film transistor layer through the substrate, which affects the electrical properties.
  • the flexible substrate of the second embodiment of the present invention shown in FIG. 2 can be manufactured through the following steps:
  • a first composite material film 102A is formed on the base plate 101.
  • the first composite material film 102A includes a SiO 2 nanotube / polymer matrix, and the polymer matrix 105 is polyimide or polyetherimide. , Polyphenylene sulfide, polyarylate, or any combination thereof; wherein the concentration of the SiO 2 nanotubes 104 in the first composite material film 102A gradually decreases with increasing x in the x-axis direction And up to 0 (that is, a gradient change), the x-axis direction is a direction perpendicular to the surface of the bottom plate;
  • a second composite material film 102B is formed on the water and oxygen barrier layer 103.
  • the second composite material film 102B includes a SiO 2 nanotube / polymer matrix, and the polymer matrix 105 is polyimide, polyacryl Imine, polyetherimide, polyphenylene sulfide, polyarylate, or any combination thereof; wherein the concentration of the SiO 2 nanotubes 104 in the second composite material film 102B varies along the x-axis direction As x increases, it gradually decreases and reaches 0 (that is, changes in a gradient), and the x-axis direction is a direction perpendicular to the surface of the bottom plate.
  • the bottom plate 101 may be a glass bottom plate.
  • the first and second composite liquids include SiO 2 nanotubes 104 and a polymer matrix 105.
  • the material of the water-oxygen barrier layer 103 may be SiO 2 , amorphous silicon, SiNx, or any combination thereof.
  • the thickness of the first and second composite material films 102A and 102B is 5 to 20 ⁇ m, and the thickness of the water and oxygen barrier layer 103 is 300 to 1000 nm.
  • the step of forming the first and second composite material films 102A and 102B may include, for example, firstly sequentially coating two to five layers (eg, three layers) of composite material liquids having different concentrations, And further solidifying the layers of the composite material, so that the concentration of the SiO 2 nanotubes in the composite film decreases gradually with the increase of x in the x-axis direction and reaches 0, and Gradient changes.
  • the maximum value of the concentration of the SiO 2 nanotubes 104 in the composite liquid is 5 vol.%.
  • the curing step is a high temperature process, for example, maintaining a constant temperature at 120 ° C. for 30 minutes, and then raising the temperature to 450 ° C. and maintaining the constant temperature for 60 minutes to solidify the composite material liquid.
  • the water-oxygen barrier layer 103 may be formed using a chemical vapor deposition technique.
  • the base plate 101 is removed to complete the manufacture of the display panel.
  • SiO 2 nanotube is an inorganic non-metallic material with a one-dimensional structure.
  • the SiO 2 nanotube is added to the polymer matrix, which can not only enhance the water and oxygen barrier properties of the polymer, but also make the mechanical properties of the substrate. Greatly improved.
  • the flatness of the surface of the substrate is very high. Compared with the substrate of the conventional technology including SiO 2 particles and polymer, the flatness of the substrate is poor. 2 nanotubes are added to the polymer matrix, and the concentration of the one-dimensional structure of SiO 2 nanotubes has a gradient change, which can reduce the roughness of the substrate surface and ensure the flatness of the substrate surface.
  • SiO 2 nanotubes have better light transmission and water and oxygen barrier properties than polymers (such as polyimide, polyimide, polyetherimide, polyphenylene sulfide, polyarylate, etc.). High temperature stability. Adding SiO2 nanotubes to the polymer matrix can improve the substrate's optical permeability, water and oxygen barrier properties, and high temperature stability.
  • the present invention provides a flexible substrate for a display panel and a manufacturing method thereof.
  • the flexible substrate has a composite material structure, and the composite material structure includes at least a SiO 2 nanotube / polymer matrix.
  • the optical transparency, mechanical properties, water and oxygen barrier properties of the traditional flexible polymer substrate, and stability under high temperature processes are improved, and the reliability of the flexible display panel is improved.
  • the present invention adds a one-dimensional structure of SiO 2 nanotubes to the polymer matrix, and makes the concentration of the one-dimensional structure of SiO 2 nanotubes have a gradient change to ensure the flatness of the substrate surface.

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Abstract

一种用于显示面板的柔性基板。所述柔性基板包括：一复合材料薄膜（102），所述复合材料薄膜（102）包括SiO 2纳米管（104）/聚合物基体（105），所述聚合物基体（105）为聚酰亚胺、聚醚酰亚胺、聚苯硫醚、聚芳酯、或其任意组合；其中，所述SiO 2纳米管（104）在所述复合材料薄膜（102）中的浓度在x轴方向上呈梯度变化，所述x轴方向为垂直于所述复合材料薄膜（102）的表面的方向。

Description

用于显示面板的柔性基板及其制作方法 技术领域
本发明涉及显示面板的技术领域，特别涉及一种用于显示面板的柔性基板及其制作方法。
 背景技术
随着显示面板的显示技术的发展，对用于显示面板的柔性基板的要求也越来越严格。和玻璃基板相比，聚合物基板具有轻质、柔软的特点，这符合现在柔性基板的发展趋势而自然受到了广泛的应用。但是，由于聚合物基板的一些材料特性，使得聚合物基板用在显示面板的发展仍遇到极大困难。尤其，为了能够替代传统玻璃基板，制造业者对于基板的光学透明性、机械性能、水氧阻隔性以及在高温制程下的稳定性等方面都提出了更高的要求。
因此，有必要提供一种用于显示面板的柔性基板及其制作方法，以解决现有技术所存在的问题。
 技术问题
本发明的目的在于提供一种用于显示面板的柔性基板及其制作方法，以解决现有技术中基板的光学透明性、机械性能、水氧阻隔性、高温稳定性及表面平整性不佳的技术问题。
 技术解决方案
为解决上述技术问题，本发明提供一种用于显示面板的柔性基板，包括：
一复合材料薄膜，所述复合材料薄膜包括SiO 2纳米管/聚合物基体，所述聚合物基体为聚酰亚胺、聚醚酰亚胺、聚苯硫醚、聚芳酯、或其任意组合；
其中，所述SiO 2纳米管在所述复合材料薄膜中的浓度在x轴方向上呈梯度变化，所述x轴方向为垂直于所述复合材料薄膜的表面的方向；
其中，所述复合材料薄膜具有二至五层的复合材料子薄膜，各个复合材料子薄膜中的SiO 2纳米管的浓度不相同，使得所述SiO 2纳米管在所述复合材料薄膜中的浓度在x轴方向上随着x的增大而逐渐降低且直至为0，而呈梯度变化。
根据本发明一优选实施例，所述柔性基板具有两个复合材料薄膜，所述柔性基板还包括一水氧阻隔层，所述两个复合材料薄膜分别设置在所述水氧阻隔层的两相对表面上。
根据本发明一优选实施例，所述水氧阻隔层的材质为SiO 2、非晶硅、SiNx、或其任意组合。
根据本发明一优选实施例，所述复合材料薄膜的厚度为5至20 μm，所述水氧阻隔层的厚度为300至1000 nm。
本发明还提供一种用于显示面板的柔性基板，包括：
一复合材料薄膜，所述复合材料薄膜包括SiO2纳米管/聚合物基体，所述聚合物基体为聚酰亚胺、聚醚酰亚胺、聚苯硫醚、聚芳酯、或其任意组合；
其中，所述SiO2纳米管在所述复合材料薄膜中的浓度在x轴方向上呈梯度变化，所述x轴方向为垂直于所述复合材料薄膜的表面的方向。
根据本发明一优选实施例，所述柔性基板具有两个复合材料薄膜，所述柔性基板还包括一水氧阻隔层，所述两个复合材料薄膜分别设置在所述水氧阻隔层的两相对表面上。
根据本发明一优选实施例，所述水氧阻隔层的材质为SiO 2、非晶硅、SiNx、或其任意组合。
根据本发明一优选实施例，所述复合材料薄膜的厚度为5至20 μm，所述水氧阻隔层的厚度为300至1000 nm。
根据本发明一优选实施例，所述复合材料薄膜具有二至五层的复合材料子薄膜，各个复合材料子薄膜中的SiO 2纳米管的浓度不相同，使得所述SiO 2纳米管在所述复合材料薄膜中的浓度在x轴方向上随着x的增大而逐渐降低且直至为0，而呈梯度变化。
本发明还提供一种制作用于显示面板的柔性基板的方法，包括以下步骤：
提供一底板；及
形成一第一复合材料薄膜于所述底板上，所述第一复合材料薄膜包括SiO 2纳米管/聚合物基体，所述聚合物基体为聚酰亚胺、聚醚酰亚胺、聚苯硫醚、聚芳酯、或其任意组合；
其中，所述SiO 2纳米管在述第一复合材料薄膜中的浓度在x轴方向上随着x的增大而逐渐降低且直至为0，所述x轴方向为垂直于所述底板的表面的方向。
根据本发明一优选实施例，所述方法还包括：
形成一水氧阻隔层于所述第一复合材料薄膜上；
形成一第二复合材料薄膜于所述水氧阻隔层上，所述第二复合材料薄膜包括SiO 2纳米管/聚合物基体，所述聚合物基体为聚酰亚胺、聚醚酰亚胺、聚苯硫醚、聚芳酯、或其任意组合；及
其中，所述SiO 2纳米管在所述第二复合材料薄膜中的浓度在x轴方向上呈梯度变化，所述x轴方向为垂直于所述底板的表面的方向。
根据本发明一优选实施例，所述水氧阻隔层的材质为SiO 2、非晶硅、SiNx、或其任意组合。
根据本发明一优选实施例，所述第一与第二复合材料薄膜的厚度为5至20 μm，所述水氧阻隔层的厚度为300至1000 nm。
根据本发明一优选实施例，形成所述第一与第二复合材料薄膜的步骤包括：涂覆二至五层复合材料液体且将复合材料液体固化，以使得所述SiO 2纳米管在所述第一与第二复合材料薄膜中的浓度在x轴方向上随着x的增大而逐渐降低且直至为0，而呈梯度变化；及
所述SiO 2纳米管在所述第一与第二复合材料薄膜中的浓度的最大值为5 vol.%。
有益效果
相较于现有技术，本发明提出一种用于显示面板的柔性基板及其制作方法，所述柔性基板具有复合材料结构，所述复合材料结构至少包括SiO 2纳米管/聚合物基体，改善了传统柔性聚合物基板的光学透明性、机械性能、水氧阻隔性以及在高温制程下的稳定性，提高了柔性显示面板的可靠性。另外，本发明将一维结构的SiO 2纳米管加入到聚合物基体中，并使一维结构的SiO 2纳米管的浓度具有梯度变化，确保基板表面的平整性。
附图说明
图1为根据本发明第一实施例所制作的一种用于显示面板的柔性基板的膜层结构示意图。
图2为根据本发明第二实施例所制作的一种用于显示面板的柔性基板的膜层结构示意图。
 本发明的实施方式
以下各实施例的说明是参考附加的图式，用以例示本发明可用以实施的特定实施例。本发明所提到的方向用语，例如「上」、「下」、「前」、「后」、「左」、「右」、「内」、「外」、「侧面」等，仅是参考附加图式的方向。因此，使用的方向用语是用以说明及理解本发明，而非用以限制本发明。在图中，结构相似的单元是以相同标号表示。
本发明提出一种用于显示面板的柔性基板及其制作方法，所述柔性基板具有复合材料结构，所述复合材料结构至少包括SiO 2纳米管/聚合物基体，改善了传统柔性聚合物基板的光学透明性、机械性能、水氧阻隔性以及在高温制程下的稳定性，提高了柔性显示面板的可靠性。另外，本发明将一维结构的SiO 2纳米管加入到聚合物基体中，并使一维结构的SiO 2纳米管的浓度具有梯度变化，确保基板表面的平整性。
根据本发明，本发明具有两种基板复合材料结构，可按需求选择，如图1与图2所示。
请参照图1，图1为根据本发明第一实施例所制作的一种用于显示面板的柔性基板的膜层结构示意图。如图1所示，所述用于显示面板的柔性基板具有一复合材料薄膜102，所述复合材料薄膜102包括SiO 2纳米管/聚合物基体，所述聚合物基体为聚酰亚胺、聚醚酰亚胺、聚苯硫醚、聚芳酯、或其任意组合。亦即，所述复合材料薄膜102包括SiO 2纳米管104与聚合物基体105；其中，所述SiO 2纳米管104在所述复合材料薄膜102中的浓度在x轴方向上随着x的增大而逐渐降低且直至为0(即呈梯度变化)，所述x轴方向为垂直于所述复合材料薄膜102的表面的方向。
优选地，所述复合材料薄膜102的厚度为5至20 μm。
所述复合材料薄膜102具有二至五层(例如三层)的复合材料子薄膜，各个复合材料子薄膜中的SiO 2纳米管的浓度不相同，使得所述SiO 2纳米管在所述复合材料薄膜102中的浓度在x轴方向上随着x的增大而逐渐降低且直至为0，而呈梯度变化。
可通过下述步骤来制作图1的本发明第一实施例的柔性基板：
提供一底板101；及
形成一复合材料薄膜102于所述底板101上，所述复合材料薄膜102包括SiO 2纳米管/聚合物基体，所述聚合物基体105为聚酰亚胺、聚醚酰亚胺、聚苯硫醚、聚芳酯、或其任意组合；
其中，所述SiO 2纳米管104在所述复合材料薄膜102中的浓度在x轴方向上随着x的增大而逐渐降低且直至为0(即呈梯度变化)，所述x轴方向为垂直于所述底板101的表面的方向。
优选地，所述底板101可以是一玻璃底板。所述复合材料薄膜102包括SiO 2纳米管104与聚合物基体105。
所述复合材料薄膜102的厚度为5至20 μm。
在本实施例中，形成所述复合材料薄膜102的步骤可以包括，例如，先依序涂覆二至五层(例如三层)分别具有不同浓度的复合材料液体，及再将所述该些层复合材料液体固化，以使得所述SiO 2纳米管在所述复合材料薄膜中的浓度在x轴方向上随着x的增大而逐渐降低且直至为0，而呈梯度变化。所述SiO 2纳米管104在所述复合材料液体中的浓度的最大值为5 vol.%。
所述固化步骤是采用高温制程，例如在120℃下保持恒温30分钟，再升温至450℃且保持恒温60分钟，以将复合材料液体固化。
最后，于所述柔性基板上形成薄膜晶体管(未示出)与有机发光二极管器件(未示出)后，底板101会被移除，以完成显示面板的制造。
本发明还提供另一种基板复合材料结构。请参照图2，图2为根据本发明第二实施例所制作的一种用于显示面板的柔性基板的膜层结构示意图。如图2所示，所述用于显示面板的柔性基板具有两个复合材料薄膜，即第一与第二复合材料薄膜102A、102B。所述柔性基板还包括一水氧阻隔层103。所述两个复合材料薄膜102A、102B分别设置在所述水氧阻隔层103的两相对表面上。所述第一与第二复合材料薄膜102A、102B包括SiO 2纳米管/聚合物基体，所述聚合物基体105为聚酰亚胺、聚醚酰亚胺、聚苯硫醚、聚芳酯、或其任意组合。亦即，所述第一与第二复合材料薄膜102A、102B包括SiO 2纳米管104与聚合物基体105；其中，所述SiO 2纳米管104在所述第一与第二复合材料薄膜102A、102B中的浓度在x轴方向上随着x的增大而逐渐降低且直至为0(即呈梯度变化)，所述x轴方向为垂直于所述底板101的表面的方向。
在本发明第二实施例中，所述水氧阻隔层103的材质可以为SiO 2、非晶硅、SiNx、或其任意组合。
优选地，所述第一与第二复合材料薄膜102A、102B的厚度为5至20 μm，所述水氧阻隔层103的厚度为300至1000 nm。
每个所述第一与第二复合材料薄膜102A、102B具有二至五层(例如三层)的复合材料子薄膜，各个复合材料子薄膜中的SiO 2纳米管的浓度不相同，使得所述SiO 2纳米管在所述复合材料薄膜102A、102B中的浓度在x轴方向上随着x的增大而逐渐降低且直至为0，而呈梯度变化。
本发明第二实施例与第一实施例相比，具有两个复合材料薄膜102A、102B与一水氧阻隔层103。水氧阻隔层103可进一步防止下方的水氧通过基板进入到薄膜电晶体层，对电性产生影响。
可通过下述步骤来制作图2的本发明第二实施例的柔性基板：
提供一底板101；
形成一第一复合材料薄膜102A于所述底板101上，所述第一复合材料薄膜102A包括SiO 2纳米管/聚合物基体，所述聚合物基体105为聚酰亚胺、聚醚酰亚胺、聚苯硫醚、聚芳酯、或其任意组合；其中，所述SiO 2纳米管104在所述第一复合材料薄膜102A中的浓度在x轴方向上随着x的增大而逐渐降低且直至为0(即呈梯度变化)，所述x轴方向为垂直于所述底板的表面的方向；
将所述第一复合材料液体固化，以形成一第一复合材料薄膜102A；
形成一水氧阻隔层103于所述第一复合材料薄膜102A上；及
形成一第二复合材料薄膜102B于所述水氧阻隔层103上，所述第二复合材料薄膜102B包括SiO 2纳米管/聚合物基体，所述聚合物基体105为聚酰亚胺、聚酰亚胺、聚醚酰亚胺、聚苯硫醚、聚芳酯、或其任意组合；其中，所述SiO 2纳米管104在所述第二复合材料薄膜102B中的浓度在x轴方向上随着x的增大而逐渐降低且直至为0(即呈梯度变化)，所述x轴方向为垂直于所述底板的表面的方向。
优选地，所述底板101可以是一玻璃底板。所述第一与第二复合材料液体包括SiO 2纳米管104与聚合物基体105。
在本发明第二实施例中，所述水氧阻隔层103的材质可以为SiO 2、非晶硅、SiNx、或其任意组合。
优选地，所述第一与第二复合材料薄膜102A、102B的厚度为5至20 μm，所述水氧阻隔层103的厚度为300至1000 nm。
在本实施例中，形成所述第一与第二复合材料薄膜102A、102B的步骤可以包括，例如，先依序涂覆二至五层(例如三层)分别具有不同浓度的复合材料液体，及再将所述该些层复合材料液体固化，以使得所述SiO 2纳米管在所述复合材料薄膜中的浓度在x轴方向上随着x的增大而逐渐降低且直至为0，而呈梯度变化。所述SiO 2纳米管104在所述复合材料液体中的浓度的最大值为5 vol.%。
所述固化步骤是采用高温制程，例如在120℃下保持恒温30分钟，再升温至450℃且保持恒温60分钟，以将复合材料液体固化。
优选地，可使用化学气相沉积技术来形成所述水氧阻隔层103。
最后，于所述柔性基板上形成薄膜晶体管(未示出)与有机发光二极管器件(未示出)后，底板101会被移除，以完成显示面板的制造。
SiO 2纳米管是一种无机非金属材料，具有一维结构，本发明将SiO 2纳米管加入到聚合物基体中，除了可增强聚合物的水氧阻隔性能的同时，亦使基板的力学性能大幅提升。此外，显示面板的制造过程中对基板表面的平整性要求很高，相较于传统技术的包括有SiO 2颗粒与聚合物的基板具有不佳的表面平整性，本发明将一维结构的SiO 2纳米管加入到聚合物基体中，并使一维结构的SiO 2纳米管的浓度具有梯度变化，可降低基板表面的粗糙度，确保基板表面的平整性。又，由于SiO 2纳米管比聚合物(例如聚酰亚胺、聚酰亚胺、聚醚酰亚胺、聚苯硫醚、聚芳酯等)具有更佳的透光性、水氧阻隔性、高温稳定性，将SiO2纳米管加入到聚合物基体中可以改善基板的光学透过性、水氧阻隔性、高温稳定性。
相较于现有技术，本发明提出一种用于显示面板的柔性基板及其制作方法，所述柔性基板具有复合材料结构，所述复合材料结构至少包括SiO 2纳米管/聚合物基体，改善了传统柔性聚合物基板的光学透明性、机械性能、水氧阻隔性以及在高温制程下的稳定性，提高了柔性显示面板的可靠性。另外，本发明将一维结构的SiO 2纳米管加入到聚合物基体中，并使一维结构的SiO 2纳米管的浓度具有梯度变化，确保基板表面的平整性。
综上所述，虽然本发明已以优选实施例揭露如上，但上述优选实施例并非用以限制本发明，本领域的普通技术人员，在不脱离本发明的精神和范围内，均可作各种更动与润饰，因此本发明的保护范围以权利要求界定的范围为准。

Claims (14)

  1. 一种用于显示面板的柔性基板，包括：
    一复合材料薄膜，所述复合材料薄膜包括SiO 2纳米管/聚合物基体，所述聚合物基体为聚酰亚胺、聚醚酰亚胺、聚苯硫醚、聚芳酯、或其任意组合；
    其中，所述SiO 2纳米管在所述复合材料薄膜中的浓度在x轴方向上呈梯度变化，所述x轴方向为垂直于所述复合材料薄膜的表面的方向；
    其中，所述复合材料薄膜具有二至五层的复合材料子薄膜，各个复合材料子薄膜中的SiO 2纳米管的浓度不相同，使得所述SiO 2纳米管在所述复合材料薄膜中的浓度在x轴方向上随着x的增大而逐渐降低且直至为0，而呈梯度变化。
  2. 根据权利要求1所述的用于显示面板的柔性基板，其中所述柔性基板具有两个复合材料薄膜，所述柔性基板还包括一水氧阻隔层，所述两个复合材料薄膜分别设置在所述水氧阻隔层的两相对表面上。
  3. 根据权利要求2所述的用于显示面板的柔性基板，其中所述水氧阻隔层的材质为SiO 2、非晶硅、SiNx、或其任意组合。
  4. 根据权利要求2所述的用于显示面板的柔性基板，其中所述复合材料薄膜的厚度为5至20 μm，所述水氧阻隔层的厚度为300至1000 nm。
  5. 一种用于显示面板的柔性基板，包括：
    一复合材料薄膜，所述复合材料薄膜包括SiO 2纳米管/聚合物基体，所述聚合物基体为聚酰亚胺、聚醚酰亚胺、聚苯硫醚、聚芳酯、或其任意组合；
    其中，所述SiO 2纳米管在所述复合材料薄膜中的浓度在x轴方向上呈梯度变化，所述x轴方向为垂直于所述复合材料薄膜的表面的方向。
  6. 根据权利要求5所述的用于显示面板的柔性基板，其中所述柔性基板具有两个复合材料薄膜，所述柔性基板还包括一水氧阻隔层，所述两个复合材料薄膜分别设置在所述水氧阻隔层的两相对表面上。
  7. 根据权利要求6所述的用于显示面板的柔性基板，其中所述水氧阻隔层的材质为SiO 2、非晶硅、SiNx、或其任意组合。
  8. 根据权利要求6所述的用于显示面板的柔性基板，其中所述复合材料薄膜的厚度为5至20 μm，所述水氧阻隔层的厚度为300至1000 nm。
  9. 根据权利要求6所述的用于显示面板的柔性基板，其中所述复合材料薄膜具有二至五层的复合材料子薄膜，各个复合材料子薄膜中的SiO 2纳米管的浓度不相同，使得所述SiO 2纳米管在所述复合材料薄膜中的浓度在x轴方向上随着x的增大而逐渐降低且直至为0，而呈梯度变化。
  10. 一种制作用于显示面板的柔性基板的方法，包括以下步骤：
    提供一底板；及
    形成一第一复合材料薄膜于所述底板上，所述第一复合材料薄膜包括SiO 2纳米管/聚合物基体，所述聚合物基体为聚酰亚胺、聚醚酰亚胺、聚苯硫醚、聚芳酯、或其任意组合；
    其中，所述SiO 2纳米管在述第一复合材料薄膜中的浓度在x轴方向上随着x的增大而逐渐降低且直至为0，所述x轴方向为垂直于所述底板的表面的方向。
  11. 根据权利要求10所述的制作用于显示面板的柔性基板的方法，其中所述方法还包括：
    形成一水氧阻隔层于所述第一复合材料薄膜上；
    形成一第二复合材料薄膜于所述水氧阻隔层上，所述第二复合材料薄膜包括SiO 2纳米管/聚合物基体，所述聚合物基体为聚酰亚胺、聚醚酰亚胺、聚苯硫醚、聚芳酯、或其任意组合；及
    其中，所述SiO 2纳米管在所述第二复合材料薄膜中的浓度在x轴方向上呈梯度变化，所述x轴方向为垂直于所述底板的表面的方向。
  12. 根据权利要求11所述的制作用于显示面板的柔性基板的方法，其中所述水氧阻隔层的材质为SiO 2、非晶硅、SiNx、或其任意组合。
  13. 根据权利要求11所述的制作用于显示面板的柔性基板的方法，其中所述第一与第二复合材料薄膜的厚度为5至20 μm，所述水氧阻隔层的厚度为300至1000 nm。
  14. 根据权利要求11所述的制作用于显示面板的柔性基板的方法，其中
    形成所述第一与第二复合材料薄膜的步骤包括：涂覆二至五层复合材料液体且将复合材料液体固化，以使得所述SiO 2纳米管在所述第一与第二复合材料薄膜中的浓度在x轴方向上随着x的增大而逐渐降低且直至为0，而呈梯度变化；及
    所述SiO 2纳米管在所述第一与第二复合材料薄膜中的浓度的最大值为5 vol.%。
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