WO2020022295A1 - Élément optique, système optique et dispositif optique - Google Patents

Élément optique, système optique et dispositif optique Download PDF

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Publication number
WO2020022295A1
WO2020022295A1 PCT/JP2019/028727 JP2019028727W WO2020022295A1 WO 2020022295 A1 WO2020022295 A1 WO 2020022295A1 JP 2019028727 W JP2019028727 W JP 2019028727W WO 2020022295 A1 WO2020022295 A1 WO 2020022295A1
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WO
WIPO (PCT)
Prior art keywords
optical element
light
absorbing layer
flange portion
light absorbing
Prior art date
Application number
PCT/JP2019/028727
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English (en)
Japanese (ja)
Inventor
浩司 宮坂
Original Assignee
Ａｇｃ株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ａｇｃ株式会社 filed Critical Ａｇｃ株式会社
Priority to CN201980049572.XA priority Critical patent/CN112470043A/zh
Priority to JP2020532394A priority patent/JPWO2020022295A1/ja
Publication of WO2020022295A1 publication Critical patent/WO2020022295A1/fr

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses

Definitions

  • the present invention relates to an optical element capable of reducing stray light, an optical system having the optical element, and an optical device having the optical element.
  • stray light may be generated due to reflection inside the lens or an imaging system including the lens. Then, so-called ghosts and flares may occur due to stray light.
  • Patent Literature 1 also discloses a method in which a peripheral portion of a lens is roughened and light is scattered by the roughened portion.
  • an object of one embodiment of the present invention to provide an optical element capable of reducing stray light without significantly impairing the accuracy of a flange surface, an optical system having the optical element, and an optical device having the optical element.
  • An optical element is an optical element including a curved surface and a flange portion having an annular flat portion extending in the outer radial direction from the curved surface, and at least a part of the flange portion includes an optical element.
  • a light absorbing layer for reducing the reflectance when light enters from the inside is provided, and the thickness of the light absorbing layer is 2 ⁇ m or less.
  • an optical element is an optical element including a curved surface and a flange portion having an annular flat portion extending in the outer radial direction from the curved surface, wherein the side surface of the flange portion complies with JIS B0601.
  • the arithmetic average roughness Ra is 0.1 ⁇ m or less, and at least a part of the flange portion has a light absorbing layer containing a metal, a semiconductor, or a dielectric.
  • An optical system includes the optical element.
  • An optical device includes the optical element.
  • stray light can be reduced without significantly impairing the accuracy of the flange surface.
  • FIG. 1 is a cross-sectional view schematically illustrating a first embodiment of an optical element according to one aspect of the present invention.
  • FIG. 4 is an explanatory diagram for describing stray light generated inside an optical element. It is sectional drawing which shows the mode at the time of forming a light absorption layer typically. 4 is a flowchart illustrating a method for forming a light absorbing layer.
  • FIG. 4 is a cross-sectional view schematically illustrating a second embodiment of the optical element according to one aspect of the present invention. It is sectional drawing which shows the optical system assembled using the optical element typically. It is explanatory drawing which shows the refractive index and extinction coefficient of chromium oxide and chromium.
  • FIG. 4 is an explanatory diagram for describing stray light generated inside an optical element. It is sectional drawing which shows the mode at the time of forming a light absorption layer typically. 4 is a flowchart illustrating a method for forming a light absorbing layer.
  • 9 is an explanatory diagram showing calculation results of transmittance and reflectance when light is incident on the light absorption layer of the example. It is explanatory drawing which shows the reflectance at the time of light in the range of 5 degrees-85 degrees with respect to a light absorption layer in glass. It is explanatory drawing which shows the reflectance of light at the incident angle of 65 degrees when the film thickness of a light absorption layer is 70% and 50%.
  • FIG. 1 is a sectional view schematically showing a first embodiment of an optical element 10 according to one aspect of the present invention.
  • the optical element 10 has a first curved surface 11, a second curved surface 12, a flange 13, and a light absorbing layer 14 covering at least a part of a flat portion of the flange 13.
  • the material of the optical element 10 is, for example, glass. As long as the optical element 10 is transparent in the wavelength band used, a material such as ceramics, plastic, or a mixed material of organic and inorganic materials may be used.
  • FIG. 1 shows a cross section of the optical element 10. In the plan view, the flat portion of the flange portion 13 is annular, and the outer diameter of the optical element 10 extends from the outer periphery of the first curved surface 11.
  • the flat portion of the flange portion 13 is annular, and the outer diameter of the optical element 10 extends from the outer periphery of the first curved surface 11.
  • Direction the plan view, the flat portion of the flange
  • the first curved surface 11 is a convex surface
  • the second curved surface 12 is a convex surface.
  • the shape of the optical element 10 is not limited to such a shape.
  • Each of the first curved surface 11 and the second curved surface 12 may be either a convex surface or a concave surface, or may be a flat surface.
  • FIG. 2 illustrates a concave second curved surface 12.
  • FIG. 3 illustrates a case where the second curved surface 12 is flat.
  • the outer periphery of the flange portion 13 is not centered.
  • the roughness of the outermost side surface of the flange portion 13 is Ra 0.1 ⁇ m or less. Note that Ra of 0.1 ⁇ m or less is an example, and the roughness may be smaller, such as 0.01 ⁇ m.
  • an antireflection layer may be provided on the optical surfaces of the first curved surface 11 and the second curved surface 12.
  • the light absorbing layer 14 is formed on at least a part of the flat portion (the flange surface A on the front surface) or the side surface of the flange portion 13, or at least a part of the flange surface A and the side surface.
  • the light absorption layer 14 is a thin film having a maximum thickness of 2 ⁇ m or less. Since the light absorbing layer 14 is a thin film, the flatness of the flange surface A and the accuracy of the outer shape can be prevented from deteriorating.
  • the light absorption layer 14 is not limited to one layer.
  • the light absorbing layer 14 may be an optical multilayer film in which two or more different materials are stacked.
  • the light absorbing layer 14 partially includes a member having absorption in at least a part of the visible wavelength range.
  • a material various materials such as a metal, a semiconductor, and a dielectric can be used.
  • silicon, silicon compounds, carbon, carbon compounds, nickel compounds, zinc compounds, chromium compounds, phosphorus compounds, titanium compounds, molybdenum compounds, alloys thereof, organic materials, and the like can be used.
  • chromium oxide and silicon are widely used as materials for vacuum deposition and sputtering and have a large technical accumulation, these materials may be used.
  • FIG. 2 is an explanatory diagram for explaining stray light generated inside the optical element 10.
  • the light when light 21 enters the optical element 10 from an unintended direction, the light is reflected inside the optical element 10 and emitted from the optical element 10. If the light absorbing layer 14 does not exist, such light finally reaches an image sensor (not shown) as stray light, and generates flare and ghost.
  • Light incident from an unintended direction corresponds to light incident on a portion outside the effective area (for example, the area of the first curved surface 11) of the optical element 10 (for example, the flange portion 13).
  • the light absorbing layer 14 is formed on at least a part of the flat portion and the side surface of the flange portion 13. In the path until the light 21 is emitted from the optical element 10, the intensity of the reflected light is reduced by the light absorbing layer 14.
  • the reflectance of the light absorbing layer 14 is sufficiently small when light enters from the glass side (the inside of the optical element 10).
  • the incident angle satisfies the condition of satisfying the total reflection
  • the light is guided inside the optical element 10 without being attenuated. Therefore, it is preferable that the reflectance is sufficiently small even at the incident angle at which the total reflection occurs.
  • the flange portion 13 is not roughened or black is not applied to the non-roughened flange portion 13, stray light can be generated without impairing the accuracy of the flange surface A. It becomes possible to reduce.
  • the angle satisfying the total reflection condition is 41 °. That is, when light enters the incident surface (for example, the flange surface A) at an incident angle of 41 ° or more, the incident light is totally reflected on the incident surface.
  • the reflectance should be 50% or less in the visible light wavelength range (for example, a wavelength band of 400 to 700 nm). Is preferred. More preferably, the reflectance is 30% or less.
  • the light 21 can be made to enter the light absorbing layer 14 twice. For example, even when the reflectance of the light absorption layer 14 is 30%, the reflectance after the second reflection can be 9%.
  • the thickness of the light absorbing layer covering the side surface of the flange 13 may be reduced.
  • the reflectance spectrum generally shifts to the shorter wavelength side in the region where the film thickness is reduced. Therefore, it is preferable that the reflectance spectrum at an incident angle of 65 ° has a minimum value in a wavelength band of 500 to 900 nm.
  • the light absorbing layer 14 can be formed by vacuum evaporation, sputtering, CVD (Chemical Vapor Deposition), or the like.
  • FIG. 3 is a cross-sectional view schematically showing a state when the light absorption layer 14 is formed.
  • FIG. 4 is a flowchart showing a method for forming the light absorbing layer 14.
  • the evaporation material 30 comes to the optical element 10 from an evaporation source (not shown in FIG. 3).
  • the mask member 33 is installed in a vacuum evaporation apparatus or a sputtering apparatus so that the light absorption layer 14 is not formed on the functional surface of the optical element 10 (step S11).
  • the optical element 10 on which the light absorption layer 14 is not formed is mounted on a vacuum evaporation apparatus or a sputtering apparatus (Step S12).
  • vapor deposition or sputtering is performed (step S13).
  • step S11 the order of execution of the processing in step S11 and the processing in step S12 may be reversed.
  • the amount of the vapor deposition material 32 is generally equal to the amount of the vapor deposition material 31.
  • the flat portion of the flange portion 13 faces the vapor deposition source to install the optical element 10, and the flat portion has a larger solid angle at which the vapor deposition material 30 can fly.
  • the mask member 33 is not in contact with the optical element 10, but the mask member 33 may be in contact with the optical element 10, for example, by applying a resist agent or the like directly to the optical element 10. Further, the light absorbing layer 14 may be formed only on the side surface of the optical element 10 by increasing the size of the mask member 33. Further, by providing a notch or the like in the mask member 33, a marking function may be given to the light absorbing layer 14.
  • the optical element 10 may be cut, and the thickness of each layer may be measured with an electron microscope or the like, and the optical characteristics (reflectance R) may be evaluated based on equation (1).
  • n 0 is the refractive index of the incident medium
  • n r is the refractive index of each layer of the multilayer film
  • d r is the respective layers of the multilayer film thickness
  • n m represents the refractive index of the exit medium .
  • a complex refractive index having an extinction coefficient as an imaginary part may be used as the refractive index.
  • FIG. FIG. 5 is a sectional view schematically showing a second embodiment of the optical element 50 according to one aspect of the present invention.
  • the light absorbing layer 51 and the light absorbing layer 52 are formed over both surfaces of the flange portion 13 (the front flange surface A and the rear flange surface B). ing.
  • the intensity of stray light can be further reduced.
  • the flat part of the flange portion 13 is annular, and the outer diameter of the optical element 50 extends from the outer periphery of the first curved surface 11.
  • a material such as ceramics, plastic, or a mixed material of organic and inorganic materials may be used.
  • the flange portion 13 is not roughened or black is not applied to the non-roughened flange portion 13, the accuracy of the flange surfaces A and B is not impaired. It becomes possible to reduce stray light.
  • the optical element 50 of the present embodiment can be molded in the same manner as the optical element 10 of the first embodiment (see FIGS. 3 and 4). That is, for example, a film can be formed by vacuum evaporation, sputtering, or a CVD (Chemical Vapor Deposition) method. However, in this embodiment, when vacuum evaporation or sputtering is used, after forming the light absorption layer 51 in the same manner as in the first embodiment, a mask member is provided between the evaporation source and the second curved surface 12. Then, the light absorption layer 52 is formed.
  • the number of molding steps is increased compared to the first embodiment.
  • a method capable of forming the light absorbing layer 51 and the light absorbing layer 52 simultaneously is described. May be used.
  • Embodiment 3 In the first and second embodiments, examples in which the flange portion is not roughened have been described. It is preferable that the flange portion not have a rough surface, but one embodiment of the present invention is not limited thereto, and does not exclude a case where the flange portion is roughened. When the flange portion is roughened, it is preferable that the flange portion be roughened so that the flatness of the flange portion is not impaired. The roughening that does not impair the flatness of the flange portion is preferably, for example, the following rough surface. Two adjacent areas of 100 ⁇ m ⁇ 100 ⁇ m in the roughened flange portion are referred to as a first area and a second area, respectively.
  • the highest convex portion is defined as a first convex portion.
  • the highest convex portion is defined as a second convex portion.
  • the difference in height between the first projection and the second projection is within 5 ⁇ m.
  • the difference between the heights of the first convex portion and the second convex portion is preferably within 3 ⁇ m, more preferably within 2 ⁇ m, and further preferably within 1 ⁇ m. Even when the flange portion is roughened, it is possible to prevent the accuracy of the flange surface from being significantly impaired by the roughened flange portion satisfying the above conditions.
  • the flange portion can be used as a reference for assembly. Further, by satisfying the above-mentioned range even in the case of a roughened flange portion, it is possible to prevent the flat plate from being pressed against the flange portion to prevent deformation and play, thereby causing tilt.
  • the configuration other than the roughened flange portion may be similar to the configuration of the first and second embodiments, and therefore, detailed description is omitted.
  • FIG. 6 is a cross-sectional view schematically showing an optical system 60 assembled using the optical element 10.
  • an optical element 10 a lens member 20, and a spacer 63 are arranged inside a lens barrel 61.
  • FIG. 6 illustrates the optical element 10 of the first embodiment, but the optical element 50 of the second embodiment may be used.
  • the precision of the flange surface A (or the flange surfaces A and B) of the optical element 10 is not impaired. Therefore, the clearance between the optical element 10 and the lens barrel 61 can be made sufficiently small. Therefore, the center of the opening of the lens barrel 61 and the axis of the optical element 10 can be accurately adjusted.
  • the flange surface A (or the flange surfaces A and B) of the optical element 10 is sufficiently flat, the optical element 10 is not tilted with the surface of the lens barrel 61 that receives the flange portion 13, and the optical element 10 is not tilted. 61 can be assembled.
  • the optical element of one embodiment of the present invention can be applied (for example, incorporated) to various optical systems and optical devices. That is, one embodiment of the present invention can provide an optical system including the optical element of one embodiment of the present invention.
  • the optical system of one embodiment of the present invention can include, in addition to the optical element, a lens that cooperates with the optical element, an optical filter such as an antireflection film or a bandpass filter, a cover glass, and an aperture.
  • an optical filter such as an antireflection film or a bandpass filter
  • cover glass such as an antireflection film or a bandpass filter
  • an aperture such as an antireflection film or a bandpass filter
  • cover glass such as an antireflection film or a bandpass filter
  • an aperture such as an antireflection film or a bandpass filter
  • cover glass such as an antireflection film or a bandpass filter
  • an aperture such as an antireflection film or a bandpass filter
  • cover glass such as an antireflection film or
  • optical element 10 of the first embodiment shown in FIG. 1 Glass having a refractive index of 1.52 is subjected to glass preform processing and molded into a lens shape (the optical element 10 in a state where the light absorbing layer 14 is not formed) by molding.
  • the end surface of the optical element 10 is a glass molding surface.
  • the roughness of the side surface of the flange portion 13 is Ra 0.1 ⁇ m or less.
  • chromium oxide (Cr 2 O 3 ) and chromium (Cr) are deposited as the light absorbing layer 14 to a thickness of 60 nm and 10 nm, respectively, by sputtering. Therefore, the thickness of the light absorption layer 14 thus formed is 2 ⁇ m or less.
  • FIG. 7 is an explanatory diagram showing the refractive index and the extinction coefficient of chromium oxide and chromium used in this example.
  • FIG. 7A shows the refractive index (Refractive @ Index) and the extinction coefficient (Extinction @ coefficient) of chromium oxide.
  • FIG. 7B shows the refractive index and extinction coefficient of chromium.
  • n dashed line
  • k solid line
  • FIG. 8 is an explanatory diagram showing calculation results of the transmittance (Transmittance) and the reflectance (Reflectance) when light is vertically incident on the light absorbing layer 14 in the glass in the present embodiment.
  • the values of the transmittance and the reflectance are average values of the p-polarized light and the s-polarized light.
  • FIG. 9A shows the reflectance when light is incident on the light absorbing layer 14 in the glass 90 within a range of 5 ° to 85 °.
  • FIG. 9B shows a structure assumed when calculating the transmittance and the reflectance.
  • a chromium oxide (Cr 2 O 3 ) of 60 nm is formed on the glass 90, and the chromium (Cr) is formed.
  • Cr chromium
  • the reflectance becomes 30% or less in a wavelength band of 400 to 700 nm. I have.
  • the minimum value of the reflectance at the incident angle of 65 ° is about 560 nm.
  • FIG. 10 shows that the thickness of the light absorbing layer 14 made of chromium oxide and chromium is 70% (chromium oxide ⁇ 42 nm, chromium 7 nm) and 50% (relative to the light absorbing layer 14 shown in FIG. 9B).
  • the reflectance of light at an incident angle of 65 ° is shown. The minimum value of the reflectance shifts to the shorter wavelength side as the film thickness decreases, but the reflectance is 30% or less at each thickness.
  • the refractive index of glass is set to 1.52 at the average incident angle 65 ° of the angle 41 ° satisfying the total reflection condition and the maximum incident angle 90 °. .), It can be said that the reflectance is sufficiently small. That is, stray light is reduced.
  • stray light can be reduced without greatly impairing the accuracy of the flange surface.
  • the present invention having this effect is useful for an optical element, an optical system, and an imaging optical device.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Lens Barrels (AREA)
  • Surface Treatment Of Optical Elements (AREA)

Abstract

L'invention concerne un élément optique (10) qui comprend : une partie de rebord (13) ayant une section plate annulaire s'étendant dans une direction de diamètre externe à partir d'une surface incurvée ; et une couche d'absorption de lumière (14) pour réduire, dans au moins une portion de la partie de rebord (13), la réflectance lorsqu'une lumière est rendue incidente à partir de l'intérieur de l'élément optique (10), la couche d'absorption de lumière ayant une épaisseur d'au maximum 2 µm. En variante, un élément optique (10) comprend une partie de rebord (13) ayant une section plate annulaire s'étendant dans une direction de diamètre externe à partir d'une surface incurvée, la partie de rebord (13) ayant la rugosité moyenne arithmétique de Ra 0,1 µm au maximum sur sa surface latérale, et au moins une portion de la partie de rebord (13) ayant une couche d'absorption de lumière (14) contenant un métal, un semi-conducteur ou un corps diélectrique.
PCT/JP2019/028727 2018-07-26 2019-07-22 Élément optique, système optique et dispositif optique WO2020022295A1 (fr)

Priority Applications (2)

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CN201980049572.XA CN112470043A (zh) 2018-07-26 2019-07-22 光学元件、光学系统、以及光学装置
JP2020532394A JPWO2020022295A1 (ja) 2018-07-26 2019-07-22 光学素子、光学系、および光学装置

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JP2018-139972 2018-07-26

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Cited By (1)

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WO2022045012A1 (fr) * 2020-08-31 2022-03-03 Ａｇｃ株式会社 Élément optique

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