WO2020013517A1 - 수직입사 타원계측기 및 이를 이용한 시편의 광물성 측정 방법 - Google Patents

수직입사 타원계측기 및 이를 이용한 시편의 광물성 측정 방법 Download PDF

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WO2020013517A1
WO2020013517A1 PCT/KR2019/008147 KR2019008147W WO2020013517A1 WO 2020013517 A1 WO2020013517 A1 WO 2020013517A1 KR 2019008147 W KR2019008147 W KR 2019008147W WO 2020013517 A1 WO2020013517 A1 WO 2020013517A1
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Prior art keywords
specimen
ellipsometer
polarizer
incident
fixed
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English (en)
French (fr)
Korean (ko)
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조용재
제갈원
조현모
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Korea Research Institute of Standards and Science
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Korea Research Institute of Standards and Science
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Priority to JP2021520898A priority Critical patent/JP7316355B2/ja
Priority to US17/256,966 priority patent/US11493433B2/en
Priority to CN201980046133.3A priority patent/CN112469987B/zh
Priority to EP19833613.3A priority patent/EP3798608A4/en
Publication of WO2020013517A1 publication Critical patent/WO2020013517A1/ko
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21—Polarisation-affecting properties
    • G01N21/211—Ellipsometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/26—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes
    • G01B11/27—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes for testing the alignment of axes
    • G01B11/272—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes for testing the alignment of axes using photoelectric detection means
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J4/00—Measuring polarisation of light
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/01—Arrangements or apparatus for facilitating the optical investigation
    • G01N21/13—Moving of cuvettes or solid samples to or from the investigating station
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21—Polarisation-affecting properties
    • G01N21/211—Ellipsometry
    • G01N2021/213—Spectrometric ellipsometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00—Features of devices classified in G01N21/00
    • G01N2201/02—Mechanical
    • G01N2201/023—Controlling conditions in casing
    • G01N2201/0231—Thermostating
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00—Features of devices classified in G01N21/00
    • G01N2201/06—Illumination; Optics
    • G01N2201/061—Sources
    • G01N2201/06113—Coherent sources; lasers
    • G01N2201/0612—Laser diodes
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00—Features of devices classified in G01N21/00
    • G01N2201/06—Illumination; Optics
    • G01N2201/063—Illuminating optical parts
    • G01N2201/0633—Directed, collimated illumination
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00—Features of devices classified in G01N21/00
    • G01N2201/06—Illumination; Optics
    • G01N2201/063—Illuminating optical parts
    • G01N2201/0636—Reflectors
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00—Features of devices classified in G01N21/00
    • G01N2201/06—Illumination; Optics
    • G01N2201/068—Optics, miscellaneous
    • G01N2201/0683—Brewster plate; polarisation controlling elements

Definitions

  • the present invention relates to a vertical incidence ellipsometer and a method for measuring the mineral properties of the specimen using the same. More specifically, the present invention relates to a vertical incidence ellipsometer used to measure and analyze the polarization state of the light reflected by the specimen to measure the mineral properties of the specimen and a method for measuring the mineral properties of the specimen using the same.
  • the thickness of thin films is getting smaller and smaller, reaching several atomic layer levels. Is a trend that is complicated from the existing two-dimensional structure to three-dimensional structure. Accordingly, the measurement technology for the process to more accurately analyze the shape and physical properties of the nano-scale specimens such as the thickness of the thin film, the shape of the nano-pattern, etc. while being made in a non-contact manner so as not to damage the nano specimens in the manufacturing process step of these products
  • the need is growing.
  • ellipsometers and methods using the same have been widely used with the development of light sources, photodetectors, and computers.
  • the vertical incidence method measures the change in the polarization state of light reflected vertically by the specimen when the measurement beam is incident perpendicularly to the specimen surface (that is, the incident angle is 0 ⁇ ). It is a method to measure to have a value arbitrarily selected within the range of 0 ⁇ ⁇ 90 ⁇ .
  • the vertical incidence method has an advantage of making the measuring device smaller, and making the measuring beam small so as to measure an internal area of a smaller area in the specimen.
  • the basic structure and principle of such a vertical incidence ellipsometer are well described in various patent documents such as U.S. Patent No. 7255708, U.S. Patent No. 7889340 and others.
  • Optical element-rotational ellipsometer is basically a light source (LS), a polarization state generator (PSG), a specimen (SP), a polarization state analyzer, a detection optical system (Detection). Optic System (DOS), and a photodetector element (PDE) may be included, which will be briefly described as follows.
  • the light source serves to make the light emitted from the lamp or the like into a parallel beam using an optical system.
  • the polarization state generator is a polarization optical system that serves to make the parallel beam emitted from the light source into a specific polarization state.
  • the specimen is placed on the path of travel of the modulated incident parallel beam.
  • the polarization state analyzer is a polarization optical system that serves to analyze the polarization state of the reflected parallel beam on the path of the reflected parallel beam reflected from the specimen.
  • the photodetecting device serves to measure the amount of light of the parallel reflection beam of a specified wavelength band passing through the polarization state analyzer to a value equal to a voltage or a current, and from the measured voltage or current values using a processor
  • the mineral values of the specimens can be calculated and stored or displayed on screen.
  • the detection optical system is disposed on the reflection parallel beam axis between the polarization state analyzer PSA and the photodetecting device PDE, and is a virtual polarization optical system having the same effect as optical elements that can change the polarization state of the reflection parallel beam. It may include a reflecting mirror and a grating mounted inside a beam splitter and a spectrometer.
  • the polarization state generator or the polarization state analyzer is configured in the form of a polarization optical system in which a plurality of rotatable polarization optical elements are appropriately arranged to perform their respective roles. At least one of the selected rotatable optical photoelements of the rotatable polarized photons rotates at a constant speed, and the other rotatable polarized optical elements except for the isotropically rotated polarized photonic elements are fixed polarized optical elements. It may be stopped during measurement by moving at the specified azimuth.
  • the type or arrangement of the rotatable polarizing optical elements may be appropriately changed according to the type of ellipsometer.
  • the rotatable polarizing optical elements may be configured as linear polarizers and compensators.
  • the linear polarizer when the linear polarizer is disposed in the polarization state generator, the linear polarizer is called a polarizer, and when the linear polarizer is disposed in the polarization state analyzer, the linear polarizer is called an analyzer.
  • the compensator when it is disposed in the polarization state generator, the compensator is referred to as an incident axis compensator.
  • Conventional optical element-rotational ellipsometer can be divided into the inclined incidence and vertical incidence based on the angle of incidence (Angle of Incidence).
  • the incidence angle is defined as an incident plane that includes the paths of the incidence parallel beam and the reflection parallel beam among the planes perpendicular to the specimen plane, and refers to an axis perpendicular to the specimen plane at the incident plane.
  • the angle between the incident parallel beam or the reflected parallel beam and the reference axis is defined as the incident angle and denoted by ⁇ .
  • the vertical incidence method adopts an optical structure having an incident angle of 0 mu s
  • the inclined incidence method employs an optical structure in which an incident angle is not 0 mu s.
  • the advantage of the vertical incidence method compared to the inclined incidence method is that the size of the measuring device can be made small, and the area of the beam incident on the specimen can be made smaller, so that the measurement inside the minute area is possible.
  • an incident parallel beam emitted from a light source is incident on a polarization state generator, and the incident parallel beam is changed to a specific polarization state which can be controlled by the polarization state generator, and polarization
  • the incident-parallel beam modulated in the state is irradiated onto the specimen and the polarization state is changed by the specimen to become the reflective parallel beam with the property information of the specimen, and the reflected parallel beam is incident on the polarization state analyzer and can be controlled once again.
  • the reflection parallel beam which has been changed to a state, and has undergone such a series of changes, is measured by an electrical signal such as a voltage or a current using a photodetector device, and finally the mineral information of the specimen is obtained from the electrical signals measured by a computer. A series of processes will take place.
  • a single-compensator-rotated vertical incident ellipsometer and one linear polarizer having only one linear polarizer and one constant velocity rotation compensator are arranged.
  • a dual compensator-rotated vertical incidence ellipsometer composed of only two constant speed compensators.
  • a single compensator-rotated vertical incident ellipsometer 10 which is an embodiment of a conventional vertical incident ellipsometer, includes a light source 11, a beam splitter 12, a linear polarizer 13, and a constant velocity. It includes a rotation compensator 14, a spectrometer (15, Spectrometer), a computer (16, Processor).
  • the single compensator-rotated vertical incident ellipsometer 10 of FIG. 1 is described in terms of the basic structure of the measuring principle.
  • the incident parallel beam L10a emitted from the light source 11 travels in a direction perpendicular to the plane of the specimen 1000 by the light splitter 12 and is incident as a fixed polarizer (implemented by the linear polarizer 13).
  • the incident parallel beam L10a incident on the fixed polarizer sequentially passes through the fixed polarizer and the constant-speed rotation incident axis compensator (implemented by the constant speed rotation compensator 14) and modulates the polarization state of the incident parallel beam L10. 1000) (L10b).
  • the reflected parallel beam L10c reflected by the specimen 1000 is incident on the constant velocity reflection axis compensator (also implemented by the constant velocity rotation compensator 14) and the reflection parallel beam L10c is incident on the constant velocity reflection axis compensator.
  • the polarization state is modulated again while passing through the constant velocity reflecting axis compensator and the fixed analyzer (also implemented as the linear polarizer 13) and is incident on the spectrometer 15 by the light splitter 12 (L10d).
  • the reflected parallel beam L10d incident on the spectrometer 15 is spectroscopically converted into each of the wavelengths and converted into an electrical digital signal value by a photodetecting device inherent in the spectroscope 15, and the measured digital signal values are calculated by the computer 16. It is used for the mineral analysis of the specimen 1000 by.
  • the detection optical system includes a light splitter 12, a reflecting mirror and grating inherent in the spectrometer 15, and the like.
  • the linear polarizer 13 performs not only the fixed polarizer but also the fixed analyzer, and the constant speed rotation compensator 14 performs the role of the constant speed rotation reflection axis compensator as well as the constant speed rotation incident axis compensator. . Therefore, there is an advantage that can make the size of the measuring device smaller than the oblique incidence method.
  • the linear polarizer is mainly produced by processing and assembling crystals having birefringence properties such as MgF 2 , CaCO 3 , and SiO 2 into prisms.
  • the component in the transmission axis direction of the linear polarizer can transmit, and the component perpendicular to the transmission axis cannot transmit, so the transmitted light is in a linear polarization state.
  • the linear polarization state of transmitted light is not affected by the type of wavelength, and 150 ⁇ in case of Rochon type linear polarizer made of MgF 2 . It can be used for a wide wavelength range of 6,500 nm.
  • the phase retardation difference between the passed components would be 90 kHz, ie, designed to act as a ⁇ / 4 waveplate.
  • a compensator suitable for the measurement wavelength region has to be made.
  • such manufacturing is difficult.
  • the phase delay value of compensator is different for each wavelength, it is necessary to find out the phase delay value through calibration process before it is used for measurement. Because of the complexity of this calibration method, errors may occur during the calibration procedure. There is a problem.
  • the dual compensator-rotated vertical incident ellipsometer 20 which is another embodiment of the conventional vertical incident ellipsometer, includes a light source 21, a light splitter 22, a linear polarizer 23, and a first constant-speed rotation.
  • Compensator 24a first wave plate 24aw, waveplate, first constant velocity hollow shaft motor 24am, second constant velocity compensator 24b, second wavelength plate 24bw, second constant velocity hollow shaft motor 24bm, a spectrometer 25, a computer 26, a shielding booth 27, and a gas supply device 28.
  • a wavelength plate 24aw and a second wavelength plate 24bw are further provided.
  • the measurement optical system is shielded with a shielding booth 27 to prevent this.
  • the gas supply device 28 further includes a purging system for filling the measuring beam path with a gas such as high purity nitrogen or high purity argon.
  • the dual compensator-rotated vertical incident ellipsometer 20 of FIG. 2 is described in terms of the basic structure of the measuring principle.
  • the incident parallel beam L20a emitted from the light source 21 is incident on the fixed polarizer (implemented by the linear polarizer 23) in the direction perpendicular to the plane of the specimen 1000 by the light splitter 22.
  • the incident parallel beam L20a incident on the fixed polarizer is implemented as a fixed polarizer on the incident light axis, a first constant speed rotational compensation axis compensator (implemented by the first constant speed rotation compensator 24a), and a second constant speed rotation compensator 24b.
  • the polarization state of the incident parallel beam is modulated while sequentially passing through the second constant-speed rotational incident axis compensator (L20b).
  • the reflected parallel beam L20c reflected by the specimen 1000 may include a first constant velocity reflecting axis compensator (also implemented as a second constant velocity compensator 24b) on the reflected light axis, and also a first constant velocity compensator 24a (also).
  • the polarized state of the reflected parallel beam is modulated again while passing through the second constant velocity reflection axis compensator (also implemented as the linear polarizer 23) and the reflected parallel beam in sequence. (L20d).
  • the reflected parallel beam L20d incident on the spectrometer 25 is spectroscopic for each wavelength (L20d), and is converted into an electrical digital signal value by the photodetecting device inherent in the spectrometer 25, and the measured digital signal values are computed. (26) is used for mineral analysis of the specimen (1000).
  • the linear polarizer 23 serves not only a fixed polarizer but also a fixed analyzer.
  • the first constant speed rotation compensator 24a and the first wavelength plate 24aw serve as the second constant speed rotation reflection axis compensator as well as the first constant speed rotation incident axis compensator
  • the second constant speed rotation compensator 24b and the second wavelength plate 24bw serve as the first constant speed rotation reflection axis compensator as well as the second constant speed rotation incident axis compensator.
  • This configuration has the advantage of making the size of the measuring device smaller than the oblique incidence method.
  • the double compensator-rotated vertical incident ellipsometer 20 like the single compensator-rotated vertical incident ellipsometer 10, still suffers from the complexity of manufacturing and calibration caused by the wavelength dependence of the compensators and the waveplates. It is implicated.
  • the ellipsometer basically includes a polarization state generator (PSG) and a polarization state analyzer (PSA).
  • PSG polarization state generator
  • PSA polarization state analyzer
  • one fixed linear polarizer and one or two constant velocity compensators are used as the configuration to specifically realize the polarization state generating unit and the polarization state analyzing unit.
  • the compensator since the compensator has a wavelength dependency in which the relative phase delay has a different value depending on the wavelength, it is necessary to calibrate the equipment, and there is a problem that an error may occur during a complicated calibration procedure.
  • a new compensator must be newly developed in order to extend the measurement wavelength range to improve measurement reliability.
  • Patent Document 1 U.S. Patent Registration No. 7255708 ("Normal incidence rotating compensator ellipsometer", 2008.04.08.)
  • Patent Document 2 United States Patent Registration No. 7889340 ("Normal incidence ellipsometer with complementary waveplate rotating compensators", February 15, 2011)
  • Non-Patent Document 1 R.M.A. Azzam, "PIE: Perpendicular-Incidence Ellipsometry-Application to the Determination of the Optical Properties of Uniaxial and Biaxial Absorbing Crystals," Opt. Commun. 19, 122 (1976).
  • Non-Patent Document 2 R.M.A. Azzam, "NIRSE: Normal-Incidence Rotating-Sample Ellipsometer,” Opt. Commun. 20, 405 (1977).
  • Non-Patent Document 3 3. Y. J. Cho, et. al., "Universal Evaluations and Expressions of Measuring Uncertainty for Rotating-Element Spectroscopic Ellipsometers," Opt. Express 23, 15481 (2015).
  • the present invention has been made to solve the problems of the prior art as described above, and an object of the present invention is to replace a compensator having a wavelength dependency with a linear polarizer having no wavelength dependency, thereby simplifying the equipment calibration procedure.
  • the present invention provides a vertical incidence ellipsometer and a method for measuring the mineral properties of a specimen using the same, which make it easy to realize the expansion of the measurement wavelength range.
  • the light source including a collimating optical system to emit an incident parallel beam toward the specimen;
  • a light splitter disposed between the light source and the specimen and directing a part of the incident parallel beam in a direction perpendicular to the specimen surface;
  • a fixed polarizer disposed between the light splitter and the specimen and fixed at a predetermined azimuth to pass the incident parallel beam only through linearly polarized light components in a predetermined direction;
  • a constant velocity polarizer disposed between the fixed polarizer and the specimen and rotating at a constant speed to regularly modulate the polarization state of the incident parallel beam according to the constant speed rotational frequency;
  • a photodetecting device that receives the reflected parallel beam reflected from the specimen and measures an exposure amount of the spectral radiant flux;
  • a constant velocity rotational analyzer disposed between the specimen and the photodetecting device and rotating at a constant velocity to regularly modulate the polarization state of the reflected parallel beam according to the constant velocity rotational frequency;
  • a fixed analyzer disposed between
  • the vertical incident ellipsometer, the light splitter, the fixed polarizer and the fixed analyzer may be integrally formed as one light split linear polarizer.
  • the light splitting linear polarizer may be a Wallaston Prism.
  • the photodetector may be at least one selected from pixels or binned pixels for a specific wavelength band, respectively, in a spectroscope including a CCD, CMOS, or photodiode array element in which pixels are arranged in a linear or two-dimensional planar structure.
  • the photodetector may be one spectrometer or at least one selected from pixels or binned pixels for a specific wavelength band in a spectroscope set including an s-polarizer and a p-polarizer.
  • the photodetector may be a single point photodetector including a PMT and a photodiode.
  • the single wavelength light source device may be at least one selected from a gas laser and a laser diode.
  • the photodetector may be one pixel selected from an imaging photodetector including color filters and a CCD or CMOS in which pixels are transmitted in a two-dimensional planar structure.
  • the vertical incident ellipsometer, the fixed polarizer and the fixed analyzer is provided with a hollow shaft stepping motor for adjusting the azimuth angle, the constant speed rotating hollow shaft motor for adjusting the constant speed angular velocity of the constant speed rotating polarizer and the constant speed rotating analyzer It may be provided.
  • the computing device may also calculate Fourier coefficient values for the spectral radiation flux waveform from exposure values of the spectral radiation flux of light measured by the photodetector device, calculate Muller-matrix component values of the specimen from the Fourier coefficient values, and An arithmetic unit for analyzing and calculating mineral values of the specimen from muller-matrix component values, azimuth angles of the fixed polarizer and the fixed analyzer using a hollow shaft stepping motor and remotely controlling the constant velocity of the constant velocity rotating polarizer and the constant velocity rotating analyzer A controller for remotely controlling the rotational angular velocity using a constant velocity hollow shaft motor, a measurement value for the exposure value of the spectral radiant flux, the Fourier coefficient value and the calculated value for the Muller-matrix component value, and the analysis value for the mineral value of the specimen. An output unit for outputting the measured value, the calculated value, the analysis value It can hamhal.
  • the light source may include at least one selected from a xenon lamp, a tungsten-halogen lamp, a deuterium lamp, a laser driven light source, a gas laser, and a laser diode. Or light emitted from them may be transmitted through the optical fiber.
  • the vertical incident ellipsometer a shielding booth for shielding the optical path from the outside atmosphere;
  • a gas supply device connected to the shielding booth to supply an inert gas; It may include.
  • the inert gas may be nitrogen gas or argon gas.
  • the vertical incident ellipsometer may further include a focusing optical system disposed between the constant velocity rotating polarizer and the specimen and converging the incident parallel beam to focus on a local region of the specimen; It may include.
  • the focus optical system may be one selected from at least one mirror, at least one lens, or at least one mirror and at least one lens set to correct chromatic aberration for a broadband wavelength.
  • the focus optical system may be coated with a single thin film or a multilayer thin film on the mirror or the lens in order to improve transmission or reflection efficiency.
  • the vertical incidence ellipsometer a specimen storage container for receiving and storing a plurality of the specimens, the plurality of specimens are sequentially taken out from the specimen storage container one by one according to a predetermined rule and disposed on the specimen support of the vertical incident ellipsometer
  • a specimen transport system including a specimen transport device for returning the measured specimen to the original position of the specimen storage container; It may include.
  • the vertical incident ellipsometer may further include an alignment laser for emitting light for aligning a specimen, an alignment optical system for injecting light emitted from the laser in a predetermined direction, and receiving light reflected and incident on the specimen.
  • a specimen alignment system including an alignment optical detector for determining a position of the specimen; It may include.
  • a vibration suppression system is provided below the vertical incidence ellipsometer to prevent the influence of the vibration of the measurement environment; It may include.
  • the vertical incident ellipsometer, a thermostat or a cooling device for maintaining or cooling the measurement environment temperature to prevent the occurrence of a measurement error due to temperature changes may include.
  • the specimen to measure the minerality is the specimen of the vertical incidence ellipsometer
  • a specimen mounting step of mounting and aligning the pedestal An azimuth angle selection step of selecting azimuth values of the fixed polarizer and the fixed analyzer by the computer; An azimuth shifting step for moving the fixed polarizer and the fixed analyzer by a setting azimuth angle by the computer;
  • the mineral properties may be at least one selected from interfacial properties, thin film thickness, complex refractive index, nano-shape, anisotropic properties, surface roughness, composition ratio, crystalline.
  • a linear polarizer having no wavelength dependence as a device for analyzing the polarization state in constructing a vertical incidence ellipsometer can be used to solve a large number of problems caused by using a compensator having a wavelength dependence. It works. More specifically, according to the present invention, there is an effect of simplifying the equipment calibration procedure due to the exclusion of the wavelength dependence, and thus an error occurring in the complicated equipment calibration procedure can also be greatly reduced. In addition, in the related art, in order to expand the measurement wavelength region, a compensator suitable for it has to be newly developed, but according to the present invention, there is no need to do so, and thus the measurement wavelength region expansion is much more free. In addition, according to the present invention, as the measurement wavelength region is expanded, an effect of ultimately improving the measurement reliability of the vertical incident ellipsometer can be obtained.
  • FIG. 1 is a schematic diagram of a conventional single compensator-rotated vertical incidence ellipsometer.
  • Figure 2 is a schematic diagram of a conventional double compensator-rotated vertical incidence ellipsometer.
  • FIG. 3 is a schematic diagram of a linear polarizer-rotating vertical incident ellipsometer according to a first embodiment of the present invention
  • FIG. 4 is a schematic diagram of a linear polarizer-rotating vertical incident ellipsometer according to a second embodiment of the present invention.
  • FIG. 5 is a schematic diagram of a linear polarizer-rotational vertical incidence ellipsometer according to a third embodiment of the present invention.
  • Figure 6 is a flow chart showing a method for measuring the mineral properties of the specimen using a linear polarizer-rotational vertical incident ellipsometer of the present invention.
  • linear polarizer 103m hollow shaft stepping motor
  • shielding booth 108 gas supply device
  • the vertical incident ellipsometer of the present invention basically includes a light source, a light splitter, a fixed polarizer, a constant speed rotating polarizer, a photodetecting device, a constant speed rotating analyzer, a fixed analyzer, and a computing device. The description of each part is as follows.
  • the light source includes a collimator and emits an incident collimated beam toward the specimen.
  • the light source may include at least one selected from a Xenon lamp, a Tungsten-halogen lamp, a deuterium lamp, a laser driven light source, a gas laser, and a laser diode. Alternatively, or light emitted from them may be transmitted through the optical fiber.
  • the beam splitter is disposed between the light source and the specimen, and serves to direct a part of the incident parallel beam in a direction perpendicular to the specimen surface.
  • the fixed polarizer is disposed between the light splitter and the specimen and is fixed at a predetermined azimuth to pass the linearly polarized light component in a predetermined direction.
  • the azimuth angle of the fixed polarizer is not always fixed, and the fixed polarizer itself is movable so that it can be adjusted to a desired azimuth angle when the specimen is to be measured, but is fixed because it is fixed at the time of measurement.
  • the term is used.
  • the fixed polarizer may be provided with a hollow shaft stepping motor.
  • the constant rotating polarizer is disposed between the fixed polarizer and the specimen, and rotates at a constant speed to regularly modulate the polarization state of the incident parallel beam according to the constant rotation frequency.
  • the constant speed rotation polarizer may be provided with a constant speed rotation hollow shaft motor.
  • the photodetecting device receives the reflected collimated beam reflected from the specimen and serves to measure the exposure amount of the Spectral Radiant Flux.
  • the photodetector may be at least one selected from among pixels or binned pixels for a specified wavelength band, respectively, in a spectroscope including a CCD, a CMOS, or a photodiode array element in which pixels are arranged in a linear or two-dimensional planar structure. have.
  • the photodetector may be one spectrometer or at least one selected from pixels or binned pixels for a specific wavelength band in a spectroscope set including an s-polarizer and a p-polarizer.
  • a spectroscope may be used as a means for detecting light, and the detecting light may be performed by each pixel or each binned pixel group in the light detector array provided in the spectrometer. Becomes In other words, it is understood that each pixel or each binned pixel group serves as one photodetector rather than the spectroscope itself.
  • the photodetector may be a single point photodetector including a PMT and a photodiode.
  • the single wavelength light source device may be at least one selected from a gas laser and a laser diode.
  • the photodetector may be one pixel selected from an imaging photodetector including a CCD or a CMOS in which pixels are arranged in a two-dimensional planar structure.
  • the light source is a light source device having a single wavelength, other components may not be needed, but if the light source is a multi-wavelength light source device having a plurality of wavelengths, the light source and an imaging photodetector including the CCD or CMOS may be used. Color filters may be further provided between the photodetector elements and transmit light of a specified wavelength band.
  • the photodetector maintains a standby state before an external trigger is transmitted, and then performs a measurement when an external trigger is delivered.
  • the photodetector is a single pixel selected from an integrated photodetector such as a CCD, CMOS, or photodiode array of a spectrometer.
  • the photodetector operates by outputting or temporarily storing an exposure dose value for a predetermined integration time for each photodetector, wherein the photodetector is a non-integral device such as a photodetector including a PMT and a photodiode.
  • a fluorescence detector it can be operated by outputting or temporarily storing an exposure value value for a very short integration time, that is, an approximate spectral radiant flux value of light.
  • the constant rotation analyzer is disposed between the specimen and the photodetector, and rotates at a constant speed to regularly modulate the polarization state of the reflected parallel beam according to the constant rotation frequency.
  • a separate name is used because the constant speed rotation analyzer has a different role from the constant speed rotation polarizer.
  • each is actually implemented as a separate component, but in the case of the vertical incident method. Substantially, it can be embodied as a single component.
  • an ellipsometer having a vertical incidence system can be further miniaturized than a sloped incidence method.
  • the constant speed rotation polarizer and the constant speed rotation analyzer are integrally formed as one constant speed rotation linear polarizer.
  • the fixed analyzer is disposed between the constant velocity rotational analyzer and the photodetector, and is fixed at a predetermined azimuth to pass only linearly polarized light components in a predetermined direction of the reflected parallel beam.
  • the fixed analyzer is movable, but the term 'fixed' is used because it is fixed at the time of measurement.
  • the fixed polarizer and the fixed analyzer are integrally formed as one linear polarizer.
  • the light splitter, the fixed polarizer and the fixed analyzer may be integrated as one light split linear polarizer so that the device can be further miniaturized and integrated.
  • the light splitting linear polarizer may be formed of a wallastone prism.
  • the processor controls the azimuth angle of the fixed polarizer and the fixed analyzer, the constant rotational angular velocity of the constant speed rotating polarizer and the constant speed rotating detector, and measures the spectral radiant flux measured by the light detecting element
  • the value of the exposure dose is analyzed to calculate the minerality of the specimen.
  • the computing device includes an operation unit for performing various operations, a control unit for controlling the operation of the above-described components, a storage unit for storing the values required for the operation, and an output unit for outputting an analysis result.
  • the calculating unit may calculate Fourier Coefficient values for a spectral radiant wave waveform from exposure values of spectral radiant flux of light measured from the photodetector, and from the Fourier coefficient values, the Muller- The Mueller Matrix component values may be calculated and the mineral values of the specimen may be analyzed and calculated from the Muller-matrix component values.
  • the control unit remotely controls the azimuth angle between the fixed polarizer and the fixed analyzer using a hollow shaft stepping motor, and uniformly rotates the constant velocity angular velocity of the constant velocity polarizer and the constant velocity rotating analyzer. It can be controlled remotely using a rotating hollow shaft motor.
  • the storage unit may include values necessary for an operation performed by the operation unit, that is, an exposure dose value (measured value) measured from the photodetecting device, a Fourier coefficient value for a spectral radiant flux waveform, and a muller-matrix component value (calculated value) of the specimen.
  • the output unit outputs the measured value, the calculated value, and the analyzed value in a form desired by a user such as a screen or a printed matter through a monitor or a printing apparatus.
  • the vertical incident ellipsometer of the present invention may further include a shielding booth for shielding the optical path from the outside atmosphere and a gas supply device connected to the shielding booth to supply an inert gas such as nitrogen gas and argon gas. .
  • a shielding booth for shielding the optical path from the outside atmosphere
  • a gas supply device connected to the shielding booth to supply an inert gas such as nitrogen gas and argon gas.
  • the vertical incident ellipsometer of the present invention having such a configuration replaces the constant velocity compensator with a constant velocity linear linear polarizer, unlike the conventional ellipsometer illustrated in FIG. 1 or 2.
  • the compensator used in the conventional ellipsometer has a wavelength dependence in which the phase delay value of the compensator varies for each wavelength as described above, and thus requires a complicated calibration procedure and an error occurs during the calibration procedure. .
  • the calibration procedure itself can be greatly simplified, and of course, the problem of occurrence of errors can be eliminated.
  • the linear polarizer (the role of the fixed polarizer and the fixed analyzer) is a polarization state error that may be generated by the light source and the light splitter on the incident parallel beam axis
  • the reflected parallel beam On the axis serves to remove the polarization state error that can be caused by the optical splitter and the detection optical system.
  • the constant speed rotation linear polarizer (the role of the constant speed rotation polarizer and the constant speed rotation analyzer) serves to modulate the polarization state of the incident parallel beam and the reflected parallel beam regularly according to the constant speed rotation frequency.
  • the vertical incident ellipsometer of the present invention does not use a polarization optical element having a wavelength dependency, it is very easy to calibrate the equipment, so that it is easy to match the equipments, and the measurement wavelength region can be easily extended to broadband to improve measurement reliability. have.
  • the vertical incident ellipsometer of the present invention may further include additional components such as a focusing optical system, a specimen carrying system, a specimen alignment system, a vibration suppression system, a thermostat, or a cooling device for improving measurement accuracy and user convenience.
  • additional components such as a focusing optical system, a specimen carrying system, a specimen alignment system, a vibration suppression system, a thermostat, or a cooling device for improving measurement accuracy and user convenience.
  • the size of the area to be measured in the specimen is very small, such as several tens of micrometers, so that the focusing optical system can smoothly focus the incident light on the local region of the specimen.
  • the focusing optical system may be configured to be selected from at least one mirror, at least one lens, or at least one mirror and at least one lens set to correct chromatic aberration for a wideband wavelength. At this time, in order to improve the transmission or reflection efficiency, it is preferable that a single thin film or a multilayer thin film is coated on the mirror or the lens.
  • the specimen transport system may be provided. Specifically, the specimen transport system, the specimen storage container for accommodating and storing the plurality of specimens, the specimen holder from the specimen storage container one by one in accordance with a predetermined rule in sequence to take out the specimen holder of the vertical incidence ellipsometer It may include a specimen carrying device disposed in and returning the measured specimen to the original position of the specimen storage container.
  • the specimen support is made of a six-degree of freedom system including a parallel movement of height and left and right three degrees of freedom, tilt control and rotation function having two degrees of freedom, so that the free alignment of the specimen and the change of measurement position can be made smoothly. Can be.
  • the specimen alignment system may be provided in order to make the alignment of the specimen in the process of measuring within such a fast time more accurately and quickly.
  • the specimen alignment system includes an alignment laser that emits light for aligning a specimen, an alignment optical system for injecting light emitted from the laser in a predetermined direction to the specimen, and light that is incident and reflected on the specimen. It may include an alignment photodetector for receiving the light to determine the position of the specimen.
  • the vibration suppression system may be provided under the vertical incident ellipsometer to prevent the influence of vibration of the measurement environment.
  • the light source, the polarized photons, the specimen, and the photodetecting device are provided with the constant temperature device so as to prevent the measurement error caused by the temperature change to maintain a measurement environment temperature, or the cooling device in the photodetecting device. It is preferable to provide a cooling.
  • Fig. 3 shows a schematic diagram of a linear polarizer-rotating vertical incident ellipsometer according to a first embodiment of the present invention.
  • the linear polarizer-rotational vertical incident ellipsometer 100 of the first embodiment of the present invention includes a light source 101, a light splitter 102, a linear polarizer 103, a hollow shaft stepping motor 103m, and a constant velocity linear polarizer ( 104, a constant speed hollow hollow shaft motor 104m, a photodetecting device 105, and a computer device 106.
  • the linear polarizer 103 in the basic configuration description serves as both the fixed polarizer and the fixed analyzer
  • the constant-speed rotation linear polarizer 104 is the constant-speed rotation polarizer and the constant-speed rotation sword Will act as a photon.
  • the vertical incident ellipsometer 100 of the first embodiment may include a shielding booth 107, a gas supply device 108 for the expansion of the measurement wavelength range, and also of the specimen 1000
  • a focusing optical system 109 may be included to facilitate focusing on the local area.
  • Fig. 4 shows a schematic diagram of a linear polarizer-rotating vertical incident ellipsometer according to a second embodiment of the present invention.
  • the linear polarizer-rotational vertical incident ellipsometer 200 of the second embodiment of the present invention includes a light source 201, a light split linear polarizer 203, a constant velocity linear polarizer 204, a constant velocity hollow shaft motor 204m, The photodetecting device 205 and the computing device 206 are included.
  • the light splitter polarizer 203 serves as the light splitter, the fixed polarizer, and the fixed analyzer in the basic configuration, thereby further miniaturizing and integrating equipment.
  • FIG. 4 Although a shielding booth, a gas supply device, a focusing optical system, etc. are not shown in FIG. 4, the second embodiment of FIG. 4 (and the third embodiment of FIG. 5 to be described later) additionally include these components. Of course it is possible.
  • Fig. 5 shows a schematic diagram of a linear polarizer-rotating vertical incident ellipsometer according to a third embodiment of the present invention.
  • the linear polarizer-rotational vertical incident ellipsometer 300 of the first embodiment of the present invention includes a light source 301, a light splitter 302, a light split linear polarizer 303, a constant velocity linear polarizer 304, and a constant velocity rotating hollow hole.
  • An axial motor 304m, an s-polarized light detecting element 305s, a p-polarized light detecting element 305p, and a computer 306 are included.
  • the s-polarized light detecting element 305s and the p-polarized light detecting element 305p serve as the light detecting element in the basic configuration description.
  • the light splitter linear polarizer 303 serves as both the light splitter, the fixed polarizer, and the fixed analyzer in the basic configuration.
  • the light splitter 302 is further provided to form an optical path for directing the light emitted from the light source 301 toward the specimen 1000.
  • the rotation of the constant velocity linear linear polarizer by the constant velocity rotating hollow shaft motor of the polarizing element may be one selected during constant velocity rotation or step rotation.
  • Each of the azimuth angles for the fixed polarizer, the constant rotation polarizer, the constant rotation polarizer, and the fixed analyzer used in the vertical incident ellipsometer of the present invention is a transmission axis of the linear polarizer in the fixed polarizer, the transmission axis of the linear polarizer in the constant velocity polarizer, The position of the transmission axis of the linear polarizer in the constant velocity analyzer and the position of the transmission axis of the linear polarizer in the fixed analyzer is based on the position of the arbitrarily selected reference axis. Describe as.
  • the spectral radiant flux value at the polychromatic wavelength measured by the photodetector at time t in the linear polarizer-rotated vertical incidence ellipsometers which is error-free ideal, is given by the following general waveform: Can be displayed.
  • Data measurement process of CCD or PD array can be classified into frame acquisition and frame reading process.
  • the rotation per one rotation by the constant-speed rotational angular velocity Cycle One reference pulse is generated each time, At equal intervals of Four isotimes pulses may be generated.
  • the reference pulse is the reference time indicating the start of the measurement in the ellipsometer, and the isochronous pulse can be delivered to an external trigger for measuring the data of the CCD or PD array.
  • Period after isochronous pulse is delivered to external trigger on CCD or PD array During the time period, the detailed process of data measurement of the CCD or PD array may proceed in the following sequence.
  • One photodetector in each pixel or group of binning pixels of a CCD or PD array receives an isochronous pulse with an external trigger before starting exposure Integral time after a time delay After the exposure measurement process of storing the photons of the incident light during the photoelectron, and then the frame acquisition process to convert the measured exposure to an electrical signal, it consists of a waiting time waiting for the next isochronous pulse . Therefore, the measured exposure dose data is described by the integration of the next waveform.
  • Period in equation (4) Measured over time Sets of two exposure doses of formula (2) Because it forms a group of linear equations consisting of four unknown Fourier coefficients You can simply write: Where the exposure dose And the Fourier coefficients Is a column vector, Is Is the coefficient matrix of. If the end Wow For one of the elements of the union of integer sets of, we use Least Squares Analysis Exposure dose ( Fourier coefficients from Can be solved.
  • a parallel beam emitted from a light source (LS) passes through a polarization state generator (PSG), and after being reflected by a specimen, passes through a polarization state analyzer (PSA).
  • PSG polarization state generator
  • PSA polarization state analyzer
  • PDE photodetector element
  • the rotatable polarization elements used in the optical element-rotational ellipsometer are classified into linear polarizers and compensators, which are classified according to the type of the optical element-rotational ellipsometer.
  • the polarization state generator and the polarization state analyzer are arranged differently.
  • At least one polarizing optical element among the rotatable polarizing optical elements in the optical element-rotational ellipsometer has to be rotated at constant angular frequency, and the other rotatable polarizing optical elements are stopped at their designated positions.
  • the azimuth angle of the rotatable polarizing optical elements can be remotely controlled by the hollow shaft motor and the characteristic axes of the rotatable polarizing optical elements may be at different positions when located at the azimuth reference point of the hollow shaft motor, that is, the index origin. Can be.
  • the azimuth position of each characteristic axis of the polarizing optical elements rotatable from an arbitrarily defined reference axis must be found.
  • Equation (2) is transformed with respect to the reference axis coordinate system, it is given as follows.
  • the data reduction function in the ellipsometer is used to extract the polarization ellipsometric parameters of the specimen from the calibrated Fourier coefficients, it is very important to find a suitable data cleansing method for the optical element-rotational ellipsometer used. It is important.
  • the Stokes vector of the light waves incident to pass through the polarization state generator Leave the Mueller-matrix of the psalm
  • the Mueller-matrix of the polarization state generator and the polarization state analyzer Wow are where Wow Are the effective transmission coefficients of the polarization state generator and the polarization state analyzer, respectively.
  • DOS detector optic system
  • the stokes vector of the light waves incident on the photodetecting device for the quasi-monochromatic light waves can be described as follows.
  • the area of the photodetecting device is Quantum efficiency When the spectral radiant flux measured by the photodetecting device
  • the solutions to the calibrated Fourier coefficients given by this relation are given in the form of simultaneous linear equations for the muller-matrix components of the specimen, respectively.
  • This simultaneous linear equation more simply We introduced a column vector with the muller-matrix components for the specimen as follows. here Wow Are integers given differently depending on the type of optical element-rotational ellipsometer used. Therefore, the corrected Fourier coefficients are given as scalar products as
  • Equation (19) can be used for the measurement results using reference specimens with well-known optical properties or on a straight line without specimens. It is possible to directly calculate the components of the muller-matrix of the specimen from the values of the Fourier coefficients corrected using Eq. It should be emphasized here that the solution of the vector for the Muller-matrix component calculated in this way can be applied to anisotropic specimens.
  • the linear polarizer-rotational vertical incidence ellipsometer is characterized by interfacial properties, thin film thickness, complex refractive index, nano-shape, anisotropy of the specimen from the measured Fourier coefficients or the measured Muller-matrix components.
  • the ellipsometer of the present invention is a high performance parallel computer, rigid coupled-wave analysis (RCWA), for quickly finding the properties of the specimen from the measured data of the Fourier coefficients or the Muller-matrix components measured for the specimen. It can include a large-capacity high-speed computing system composed of algorithm-based analysis software and large data storage devices.
  • RCWA rigid coupled-wave analysis
  • FIG. 6 is a flowchart illustrating a method of measuring the mineral properties of a specimen using the linear polarizer-rotational vertical incidence ellipsometer according to the present invention.
  • the method of measuring the mineral properties using the principles described above will be described.
  • a Fourier coefficient calculation step (S50), a Muller matrix component calculation step (S60) and a specimen mineral property analysis step (S70) may be included.
  • the specimen mounting step (S10) the specimen to measure the minerality is mounted and aligned on the specimen support of the vertical incident ellipsometer.
  • the azimuth selection step (S20) the azimuth value of the fixed polarizer and the fixed analyzer is selected by the computer.
  • the azimuth shifting step (S30) the fixed polarizer and the fixed analyzer are moved to a set azimuth angle by the computer.
  • the exposure dose measuring step S40 the exposure dose value of the reflected parallel beam is measured by the light detecting element according to a change in the azimuth angle of the constant speed rotation polarizer and the constant speed rotation detector.
  • the Fourier coefficient calculating step (S50) Fourier coefficient values of the spectral radiant flux waveform are calculated from the exposure values by the computer.
  • the muller matrix component calculation step (S60) the muller-matrix component values of the specimen are calculated by the computer using the Fourier coefficient values.
  • the specimen mineral property analysis step (S70) mineral values of the specimen are analyzed and calculated from the muller-matrix component values by the computer.
  • the measurement wavelength range is freer than in the related art, and thus the measurement reliability of the vertical incident ellipsometer can be improved.

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KR102139988B1 (ko) 2020-07-31
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