WO2020011222A1 - 曝光机 - Google Patents

曝光机 Download PDF

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Publication number
WO2020011222A1
WO2020011222A1 PCT/CN2019/095542 CN2019095542W WO2020011222A1 WO 2020011222 A1 WO2020011222 A1 WO 2020011222A1 CN 2019095542 W CN2019095542 W CN 2019095542W WO 2020011222 A1 WO2020011222 A1 WO 2020011222A1
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WO
WIPO (PCT)
Prior art keywords
locking member
exposure
connecting bolt
frame
measurement
Prior art date
Application number
PCT/CN2019/095542
Other languages
English (en)
French (fr)
Inventor
葛黎黎
杨志勇
朱岳彬
Original Assignee
上海微电子装备（集团）股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 上海微电子装备（集团）股份有限公司 filed Critical 上海微电子装备（集团）股份有限公司
Priority to KR1020217004236A priority Critical patent/KR102537339B1/ko
Publication of WO2020011222A1 publication Critical patent/WO2020011222A1/zh

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load

Definitions

  • This document relates to the field of lithography technology, for example to an exposure machine.
  • the size of the glass substrate in the conventional lithography machine is small, and the moving mass of the worktable is also small. Therefore, the movement of the worktable has a small influence on the deformation of the exposure machine.
  • the size of glass substrates has continued to increase, which has also greatly increased the moving mass of workpiece tables.
  • the productivity requires that the movement speed of the moving table must be fast.
  • the increase in the moving mass and speed of the work table has also led to a significant increase in the reaction force.
  • a large-tonnage work table moves rapidly in a large area, the relative position of the exposure system and measurement system interface supported on the main frame will change due to the limited interface stiffness. As a result, the relative position of the projection objective lens and the mask stage changes, which causes a large system error and seriously affects the exposure imaging quality. Therefore, it is urgent to provide an exposure machine that can quickly and stably meet the exposure requirements of large-sized substrates.
  • This paper proposes an exposure machine that can meet the exposure requirements of large-sized substrates and ensure the exposure accuracy of large-sized substrates.
  • An exposure machine includes: an exposure system, a measurement system, and a motion table system.
  • the exposure machine further includes:
  • a position adjustment component is connected to the core exposure measurement frame and the internal support frame, respectively.
  • the position adjustment component is configured so that when the internal support frame deforms with the movement of the motion table system, the position adjustment component can undergo structural deformation to adjust the motion table system.
  • the relative position with the exposure system is such that the relative position of the motion table system and the exposure system is adjusted unchanged.
  • FIG. 1 is a schematic structural diagram of an exposure machine in an embodiment
  • FIG. 2 is a plan view of a measurement substrate in an embodiment
  • FIG. 3 is a side view of the measurement substrate shown in FIG. 2;
  • FIG. 4 is a schematic structural diagram of a first connecting member in an embodiment
  • FIG. 5 is a schematic structural diagram of a second connecting member in an embodiment
  • FIG. 6 is a schematic structural diagram of a third connecting member in an embodiment
  • FIG. 7 is a partial structural schematic diagram of the connection between the shock absorption system and the internal support frame in an embodiment
  • FIG. 8 is a schematic layout diagram of a shock absorption system in an embodiment
  • FIG. 9 is a schematic layout diagram of a shock absorption system in another embodiment.
  • an exposure machine includes an exposure system, a measurement system, a motion table system, an illumination system, and a mask transmission system 703, an external frame, a core exposure measurement frame, an internal support frame, and a position adjustment assembly.
  • the outer frame is mounted with a lighting system and a mask transfer system 703.
  • the core exposure measurement frame is set inside the outer frame, and an exposure system and a measurement system are installed.
  • the internal support frame is disposed between the external frame and the core exposure measurement frame, and is connected to the core exposure frame, and a motion table system is installed.
  • the position adjustment component is connected to the core exposure measurement frame and the internal support frame, respectively.
  • the position adjustment component is configured to shift and deform the direction of the internal support frame to the internal support frame when the internal support frame moves with the movement of the motion table system. Structural deformation occurs in the same direction to adjust the relative positions of the moving platform system and the exposure system, so that the relative positions of the moving platform system and the exposure system remain unchanged.
  • the exposure system may be configured to expose the substrate; the measurement system may be configured to measure the relative position of the motion stage system and the exposure system; and the motion stage system may be configured to drive
  • the substrate moves on the internal support frame; the lighting system may be configured to illuminate the exposure machine; and the mask transfer system 703 may be configured to transfer a mask.
  • the exposure system includes a left mask table interferometer 502, a right mask table interferometer 503, a left lens 505, a right lens 506, and a work table interferometer 509.
  • the measurement system includes an off-axis alignment system 507 and a leveling and focusing system 508.
  • the core exposure measurement frame includes a measurement substrate 101, a mask stage interferometer holder 102, and a work table interferometer holder 103.
  • the measurement substrate 101 is connected to the internal support frame through a position adjustment component, and the left lens 505 and the right lens 506
  • the off-axis alignment system 507 and the leveling and focusing system 508 are all disposed on the measurement substrate 101.
  • a mask stage interferometer holder 102 is disposed above the measurement substrate 101, and a left mask stage interferometer 502 and a right mask stage interferometer 503 are disposed on the mask stage interferometer holder 102.
  • the work table interferometer holder 103 is connected below the measurement substrate 101, and the work table interferometer 509 is mounted on the work table interferometer holder 103.
  • the motion stage system includes a left mask stage 501, a right mask stage 504, and a workpiece stage 510.
  • the internal support frame includes a mask stage support 301, a main substrate 302, support legs 303, and a hanging frame 304.
  • the main substrate 302 is connected to the measurement substrate 101 through a position adjustment component, and the mask stage support 301 is disposed on the main substrate.
  • the hanging frame 304 is connected to the bottom of the main substrate 302 through the supporting legs 303. In one embodiment, as shown in FIG.
  • the mask stage holder 301 is located above the measurement substrate 101, the left mask stage 501 and the right mask stage 504 are both disposed on the mask stage holder 301, and the left mask stage 501
  • the left mask stage interferometer 502 is located on the left side, and the right mask stage 504 is located on the right side of the right mask stage interferometer 503.
  • the suspension frame 304 is disposed below the measurement substrate 101, the workpiece stage 510 is disposed on the suspension frame 304, and the workpiece stage 510 is disposed adjacent to the workpiece stage interferometer 509.
  • the lighting system includes a left lighting 701 and a right lighting 702.
  • the outer frame includes a first column 601, a second column 602, a top bracket 603, and a mask transfer bracket 604.
  • the first column 601 and the second column 602 are disposed on both sides of the internal support frame, and the top bracket 603 and the first column 601 are respectively Connected to the second column 602, the left lighting 701 and the right lighting 702 are both arranged on the top bracket 603, the mask transfer bracket 604 is arranged adjacent to the first column 601 or the second column 602, and the mask transfer system 703 is arranged on the mask On the transmission bracket 604.
  • the above-mentioned exposure machine further includes a control cabinet 704 and an environmental cabinet 705.
  • the control cabinet 704 and the environmental cabinet 705 are independently placed outside the outer frame to avoid the vibration of the control cabinet 704 and the environmental cabinet 705 from affecting the exposure of the substrate. Precision.
  • the position adjustment assembly includes at least a first connection member 201, a second connection member 202, and a third connection member 203.
  • a triangular layout is formed between the first connecting member 201, the second connecting member 202, and the third connecting member 203, which can ensure stable and reliable adjustment of the relative position between the measurement substrate 101 and the main substrate 302, and ensure substrate exposure accuracy.
  • the first connecting member 201, the second connecting member 202, and the third connecting member 203 are arranged in an isosceles triangle or an equilateral triangle.
  • the first connecting member 201 includes a rigid member 204 and a piezoelectric ceramic sheet 205.
  • the rigid member 204 is provided with a mounting groove 206 and a plurality of adjusting holes 207.
  • the piezoelectric ceramic sheet 205 is disposed in the mounting groove 206, and a plurality of adjustment holes 207 are disposed adjacent to the mounting groove 206.
  • an adjustment hole 207 is opened in the rigid member 204, and a piezoelectric ceramic sheet 205 is provided in the rigid member 204.
  • the piezoelectric ceramic sheet 205 is extended or shortened to control the diameter of the adjustment hole 207 to be larger or smaller.
  • the rigid member 204 is extended or shortened as a whole, and fine adjustment of the relative positions of the measurement substrate 101 and the main substrate 302 is achieved. Specifically, when the rigid member 204 needs to be extended, an electric field is applied to the piezoelectric ceramic sheet 205, so that the piezoelectric ceramic sheet 205 is elongated, and the piezoelectric ceramic sheet 205 is elongated along the polarization direction, so that the diameter of the adjustment hole 207 is increased.
  • the rigid member 204 when the rigid member 204 needs to be shortened, on the contrary, when the rigid member 204 needs to be shortened, a reverse electric field is applied to the piezoelectric ceramic sheet 205, and the piezoelectric ceramic sheet 205 is shortened along the polarization direction, so that the aperture of the adjustment hole 207 becomes smaller.
  • the rigid member 204 is shortened as a whole.
  • a process hole is provided at the end of the adjustment hole 207. Setting the process hole can prevent the adjustment hole 207 from penetrating the rigid member 204 and cause the rigid member 204 to break as a whole, thereby ensuring that the rigid member 204 has a stable and reliable structure.
  • the second connecting member 202 and the third connecting member 203 also include a rigid member 204 and a piezoelectric ceramic sheet 205.
  • the rigid member 204 is provided with a mounting groove 206 and a plurality of members.
  • a plurality of adjustment holes 207 are formed in the mounting groove 206, and a plurality of adjustment holes 207 are disposed adjacent to the mounting groove 206.
  • the working principles of the second connecting member 202 and the third connecting member 203 are the same as those of the first connecting member 201 described above, and details are not described herein again.
  • the process of adjusting the relative position between the measurement substrate 101 and the main substrate 302 through the above-mentioned position adjustment component is as follows:
  • the internal support frame undergoes static deformation, and the main substrate 302 is low on the left side and high on the right side.
  • an electric field is applied to the piezoelectric ceramic piece of the second connecting piece 202 to shorten the piezoelectric ceramic piece of the second connecting piece 202, and the rigid piece 204 of the second connecting piece 202 is shortened as a whole.
  • the piezoelectric ceramic sheet of the third connecting member 203 applies a reverse electric field, so that the piezoelectric ceramic sheet of the third connecting member 203 is extended, and the rigid member 204 of the third connecting member 203 is extended as a whole; correspondingly, according to the deformation
  • the piezoelectric ceramic sheet of the first connecting member 201 is adjusted by the amount, so that the rigid member 204 of the first connecting member 201 is shortened or extended, so that the entire measuring substrate 101 is shifted to the left and the left side of the measuring substrate 101 is low.
  • the right side is high and has the same deformation as the main substrate 302, so that the relative positions of the measurement substrate 101 and the main substrate 302 are not changed.
  • the piezoelectric ceramic sheet of the second connecting member 202 is adjusted to extend, so that the rigid member 204 of the second connecting member 202 is extended as a whole, and at the same time, the piezoelectric ceramic of the third connecting member 203 is adjusted.
  • the sheet is shortened, so that the rigid piece 204 of the third connecting piece 203 is shortened as a whole, and the piezoelectric ceramic piece of the first connecting piece 201 is adjusted correspondingly according to the amount of deformation, so that the rigid piece 204 of the first connecting piece 201 is extended or shortened, so that
  • the measurement substrate 101 is shifted to the right along with the main substrate 302 to ensure that the relative position of the measurement substrate 101 with the main substrate 302 does not change.
  • the structures of the corresponding rigid member 204 of the first connecting member 201, the rigid member 204 of the second connecting member 202, and the rigid member 204 of the third connecting member 203 are changed, thereby adjusting.
  • the relative position of the measurement substrate 101 and the main substrate 302 keeps the relative position of the measurement substrate 101 and the main substrate 302 unchanged during the movement of the table 510, thereby ensuring the accuracy of the substrate exposure and avoiding the large-tonnage workpiece table to move rapidly and widely in a wide range.
  • the effect of accuracy improves the exposure accuracy of large-size substrates.
  • the position adjustment component further includes a position detection sensor and a controller.
  • a position detection sensor and a piezoelectric ceramic sheet are both connected to the controller, and the position detection sensor is disposed on the main substrate 302, and the position detection sensor is configured to detect the position of the main substrate 302 and detect the position of the main substrate 302
  • the information is sent to the controller.
  • the controller calculates the amount of deformation of the main substrate 302 according to the position information of the main substrate 302, and controls the application of different electric fields to the piezoelectric ceramic pieces of each connector according to the amount of deformation of the main substrate 302 to control each piezoelectric ceramic.
  • the position detection sensor may be a photoelectric sensor, and the controller may be integrated in the control system of the exposure machine.
  • the position adjustment component further includes:
  • the first locking member 801 includes a connecting bolt 804 and a first stopper 805, the connecting bolt 804 of the first locking member 801 passes through the core exposure measurement frame, and the first end of the connecting bolt 804 of the first locking member 801
  • the nut is fixed on the core exposure measurement frame, and the second end of the connecting bolt 804 of the first locking member 801 is connected to the rigid member 204 of the first connecting member 201 through the first limiting member 805.
  • the upper surface of the rigid member 204 is provided with a limiting plane 2041, a first end of the first limiting member 805 is in contact with the limiting plane 2041, and a second end of the first limiting member 805 is in contact with the core exposure measurement frame.
  • the connecting bolt 804 passes through the measurement base plate 101 and the first limiting member 805 and is connected to the rigid member 204 of the first connecting member 201.
  • the first end of the first limiting member 805 is in contact with the limiting plane 2041.
  • the second end of the first limiter 805 is in contact with the measurement substrate 101;
  • the second locking member 802 includes a connecting bolt 804 and a second stopper 806, the connecting bolt 804 of the second locking member 802 passes through the core exposure measurement frame, and the first end of the connecting bolt 804 of the second locking member 802
  • the nut is fixed on the core exposure measurement frame by a nut.
  • the second end of the connecting bolt 804 of the second locking member 802 is connected to the rigid member 204 of the second connecting member 202 through the second stopper 806.
  • the upper surface of the rigid member 204 is provided with a spherical limiting groove 208, a first end of the second limiting member 806 is inserted into the spherical limiting groove 208, and a second end of the second limiting member abuts against the core exposure measurement frame.
  • the connecting bolt 804 passes through the measurement base plate 101 and the second limiting member 806 and is connected to the rigid member 204 of the second connecting member 202.
  • the first end of the second limiting member 806 is inserted into the spherical limiting slot 208.
  • the second end of the second stopper 806 is in contact with the measurement substrate 101;
  • the third locking member 803 includes a connecting bolt 804 and a third stopper 807, the connecting bolt 804 of the third locking member 803 passes through the core exposure measurement frame, and the first end of the connecting bolt 804 of the third locking member 803 It is fixed to the core exposure measurement frame by a nut, and the second end of the connecting bolt 804 of the third locking member 803 is connected to the rigid member 204 of the third connecting member 203 through the third stopper 807.
  • the upper surface of the rigid member 204 is provided with a V-shaped limiting groove 209.
  • the first end of the third limiting member 807 is inserted into the V-shaped limiting groove 209.
  • the second end of the third limiting member 807 is in contact with the core exposure measurement frame. Pick up.
  • the connecting bolt 804 passes through the measurement base plate 101 and the third limiting member 807 and is connected to the rigid member 204 of the third connecting member 203.
  • the first end of the third limiting member 807 is inserted into the V-shaped limiting groove 209.
  • the second end of the third stopper 807 is in contact with the measurement substrate 101.
  • the first limiter 805 is a flat limiter.
  • the second limiter 806 and the third limiter 807 are both ball-end limiters.
  • the geometric center of the measurement substrate 101 is taken as the origin
  • the horizontal direction is the positive direction of the X axis
  • the direction in which the second connector 202 and the third connector 203 extend in the horizontal direction is the positive direction of the Y axis.
  • the flat stopper and the stopper plane 2041 can limit the Z-direction freedom of the first connection member 201; the second stopper 806 is a ball stopper, and the ball stopper is inserted into the rigid member of the second connection member 202
  • the spherical limiting groove 208 on the surface of 204 can limit the degree of freedom of the second connecting member 202 in the X, Y, and Z directions;
  • the third limiting member 807 is a ball joint limiting member, and the ball joint limiting member is inserted into the third connection.
  • the V-shaped limiting groove 209 on the surface of the rigid piece 204 of the piece 203 can limit the degree of freedom of the third connecting piece in the X and Z directions.
  • the combination of the three connecting pieces together limits the degrees of freedom of the Rx, Ry, and Rz.
  • Six degrees of freedom decoupling so that the first connecting piece 201, the second connecting piece 202, and the third connecting piece 203 will not loose or shift parts during the movement of the workpiece table 510, ensuring that the first connecting piece 201, the second connecting piece
  • the connecting member 202 and the third connecting member 203 are installed stably and reliably to further ensure exposure accuracy.
  • the first locking member 801, the second locking member 802, and the third locking member 803 further include a flexible member 808.
  • the flexible member 808 of the first locking member 801 is sleeved on the first locking member.
  • the connecting bolt 804 of the first locking member 801 is arranged between the core exposure measurement frame and the nut of the connecting bolt 804 of the first locking member 801; the flexible member 808 of the second locking member 802 is sleeved on the second locking member 802
  • the connecting bolt 804 is disposed between the core exposure measurement frame and the nut of the connecting bolt 804 of the second locking member 802; the flexible member 808 of the third locking member 803 is sleeved on the connection of the third locking member 803
  • the bolt 804 is disposed between the core exposure measurement frame and the nut of the connecting bolt 804 of the third locking member 803.
  • the flexible member 808 is disposed between the measurement substrate 101 and the nut, and the flexible member 808 can avoid the component abrasion caused by the rigid connection between the measurement substrate 101 and the nut, which is beneficial to extending the service life of the measurement substrate 101 and the connecting bolt 804, and It helps to improve the stability of the connection between the measurement substrate 101 and the connection bolt 804.
  • the flexible member 808 is made of flexible metal.
  • the first locking member 801, the second locking member 802, and the third locking member 803 further include a gasket 809, and the gasket 809 of the first locking member 801 is sleeved on the first lock.
  • the connecting bolt 804 of the fastening member 801 is arranged between the flexible member 808 of the first locking member 801 and the nut of the connecting bolt 804 of the first locking member 801, and the gasket 809 of the second locking member 802 is sleeved.
  • the connecting bolt 804 of the second locking member 802 is disposed between the flexible member 808 of the second locking member 802 and the nut of the connecting bolt 804 of the second locking member 802; the pad of the third locking member 803
  • the sheet 809 is sleeved on the connecting bolt 804 of the third locking member 803 and is provided between the flexible member 808 of the third locking member 803 and the nut of the connecting bolt 804 of the third locking member 803, so as to ensure flexibility Piece 808 is uniformly stressed.
  • the structural stiffnesses of the first connecting member 201, the second connecting member 202, and the third connecting member 203 are all different. Specifically, the setting positions of the three connectors are different, and the force of each connector is different. Therefore, in order to ensure the rigidity design, the structural stiffnesses of the first connector 201, the second connector 202, and the third connector 203 are different. Specifically, the structural rigidity of the first connecting member 201, the second connecting member 202, and the third connecting member 203 can be specifically set according to the actual force.
  • the rigid member 204 of the first connecting member 201, the rigid member 204 of the second connecting member 202, and the rigid member 204 of the third connecting member 203 may be made of hard metal or hard alloy.
  • the exposure machine further includes a shock absorber 401 disposed between the internal support frame and the ground, and the shock absorber 401 is arranged at the center of the zero-length stroke of the motion table system.
  • the plurality of shock absorbers 401 are symmetrically arranged with the center position of the zero position long stroke of the motion table system as the center of symmetry.
  • the more reasonable the distribution of the shock absorbers 401 the less the internal support frame of the whole machine is affected by the movement of the workpiece table 510, that is, the smaller the amount of deformation of the internal support frame of the whole machine, thereby affecting the objective lens.
  • the shock absorber 401 should be arranged at the position of the node that is sensitive to static deformation, so that the relative deformation of the guide rail at the extreme position relative to the zero position of the workpiece table 510 is minimized.
  • a shock absorber 401 is arranged at the center position of the zero-length long stroke of the motion table system.
  • Each shock absorber 401 is symmetrically arranged with the center position of the zero-length stroke of the motion table system as the center of symmetry.
  • the exposure machine includes seven shock absorbers 401. Among the seven shock absorbers 401, one shock absorber 401 is disposed at the center of the zero-length stroke of the motion table system. Position, the other six shock absorbers 401 are arranged symmetrically on both sides of the center position of the zero-length stroke of the motion table system.
  • the exposure machine includes eight shock absorbers 401.
  • two shock absorbers 401 follow the centerline of the zero-length stroke of the motion table system. Symmetrically disposed on both sides of the center position of the zero-length stroke of the motion table system, and every other group of six shock absorbers 401 is symmetrically disposed on both sides of the center line of the zero-length stroke of the motion table system.
  • the above exposure machine divides the frame structure from the inside to the outside into a core exposure measurement frame, an internal support frame, and an external frame.
  • the core exposure measurement frame is provided with an exposure system and a measurement system
  • the internal support frame is installed with a motion table system
  • a position adjustment component is provided between the core exposure measurement frame and the internal support frame.
  • the relative positions of the motion table system and the exposure system can be adjusted to make the motion table
  • the relative position of the system and the exposure system is unchanged, and the core exposure measurement frame and the internal support frame are quickly aligned during the movement of the motion table system to ensure that the relative positions of the motion table system and the exposure system are accurate, thereby avoiding system errors caused by static deformation of the frame interface
  • the above-mentioned exposure machine places the lighting system, mask transmission system 703, etc. on an external frame, which is fully isolated from components that require high precision such as imaging, measurement, positioning, etc., and can avoid the impact of weight on the complete system compensation measurement, further To ensure the accuracy of exposure of large substrates.

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  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
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  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

一种曝光机，包括：核心曝光测量框架、内部支撑框架和位置调节组件，核心曝光测量框架安装有曝光系统和测量系统；内部支撑框架安装有运动台系统；位置调节组件分别与核心曝光测量框架和内部支撑框架连接，位置调节组件被配置为当内部支撑框架随运动台系统运动发生变形时，位置调节组件能够发生结构形变，以调节运动台系统和曝光系统的相对位置，使运动台系统和曝光系统的相对位置不变。

Description

曝光机
本公开要求在2018年07月11日提交中国专利局、申请号为201810757869.9的中国专利申请的优先权，以上申请的全部内容通过引用结合在本公开中。
技术领域
本文涉及光刻技术领域，例如涉及一种曝光机。
背景技术
传统光刻机中玻璃基板的尺寸较小，工件台的运动质量也较小，因此，工件台的运动对曝光机整机的形变影响较小。然而，随着光刻机向大世代发展，玻璃基板尺寸不断增大，使得工件台的移动质量也大幅增加。同时，设备向大世代发展时，产率要求运动台运动速度必须快。工件台移动质量及移动速度的增加导致运动反力也大幅增加，当大吨位工件台大范围快速移动时，由于接口刚度有限，主体框架上支撑的曝光系统、测量系统接口的相对位置会产生变化，会导致投影物镜和掩模台的相对位置发生变化，造成较大的系统误差，严重影响曝光成像质量。因此，急需提供一种能够快速稳定的曝光机，以满足大尺寸基板的曝光需求。
发明内容
本文提出了一种曝光机，能够满足大尺寸基板的曝光需求，确保大尺寸基板曝光精度。
本文采用以下技术方案：
一种曝光机，包括：曝光系统、测量系统和运动台系统，所述曝光机还包括：
核心曝光测量框架，安装有曝光系统和测量系统；
内部支撑框架，安装有运动台系统；以及，
位置调节组件，分别与核心曝光测量框架和内部支撑框架连接，位置调节组件被配置为当内部支撑框架随运动台系统运动发生变形时，位置调节组件能够发生结构形变，以调节所述运动台系统和所述曝光系统的相对位置，使调节所述运动台系统和所述曝光系统的相对位置不变。
附图说明
图1是一个实施例中曝光机的结构示意图；
图2是一个实施例中测量基板的俯视图；
图3是图2所示的测量基板的侧视图；
图4是一个实施例中第一连接件的结构示意图；
图5是一个实施例中第二连接件的结构示意图；
图6是一个实施例中第三连接件的结构示意图；
图7是一个实施例中减震系统与内部支撑框架连接的局部结构示意图；
图8是一个实施例中减震系统的布局示意图；
图9是又一个实施例中减震系统的布局示意图。
附图标记说明：
101-测量基板，102-掩模台干涉仪支架，103-工件台干涉仪支架；
201-第一连接件，202-第二连接件，203-第三连接件，204-刚性件，205-压电陶瓷片，206-安装槽，207-调节孔，208-球形限位槽，209-V形限位槽，2041-限位平面；
301-掩模台支架，302-主基板，303-支撑腿，304-吊框；
401-减振器；
501-左掩模台，502-左掩模台干涉仪，503-右掩模台干涉仪，504-右掩模台，505-左镜头，506-右镜头，507-离轴对准系统，508-调平调焦系统，509-工件台干涉仪，510-工件台；
601-第一立柱，602-第二立柱，603-顶部支架，604-掩模传输支架；
701-左照明，702-右照明，703-掩模传输系统，704-控制柜，705-环境柜；
801-第一锁紧件，802-第二锁紧件，803-第三锁紧件，804-连接螺栓，805-第一限位件，806-第二限位件，807-第三限位件，808-柔性件，809-垫片。
具体实施方式
下面结合附图并通过具体实施方式来进一步说明本文的技术方案。
在本文的描述中，需要理解的是，术语“上”、“下”、“前”、“后”、“左”、“右”、“竖直”、“水平”、“顶”、“底”、“内”、“外”等指示的方位或位置关系为基于附图所示的方位或位置关系，仅是为了便于描述本文和简化描述，而不是指示或暗示所指的装置或元件必须具有特定的方位、以特定的方位构造和操作，因此不 能理解为对本文的限制。
本文提供一种曝光机，以提高大尺寸基板的曝光精度。请参阅图1，一实施例的曝光机包括：曝光系统、测量系统、运动台系统、照明系统和掩模传输系统703、外部框架、核心曝光测量框架、内部支撑框架和位置调节组件。外部框架安装有照明系统和掩模传输系统703。核心曝光测量框架设置在外部框架内侧，安装有曝光系统和测量系统。内部支撑框架设置在外部框架和核心曝光测量框架之间，且与核心曝光框架连接，安装有运动台系统。位置调节组件分别与核心曝光测量框架和内部支撑框架连接，位置调节组件被配置为当内部支撑框架随运动台系统运动发生偏移变形时，位置调节组件能够向与内部支撑框架的偏移变形方向相同的方向发生结构形变，以调节运动台系统和曝光系统的相对位置，使运动台系统和曝光系统的相对位置不变。
需要说明的是，所述曝光系统可以被配置为对基板曝光；所述测量系统可以被配置为测量所述运动台系统和所述曝光系统的相对位置；所述运动台系统可以被配置为驱动基板在所述内部支撑框架上运动；所述照明系统可以被配置为对所述曝光机进行照明；所述掩模传输系统703可以被配置为传输掩模。
在一个实施例中，如图1所示，曝光系统包括左掩模台干涉仪502、右掩模台干涉仪503、左镜头505，右镜头506和工件台干涉仪509。测量系统包括离轴对准系统507和调平调焦系统508。在一个实施例中，核心曝光测量框架包括测量基板101、掩模台干涉仪支架102和工件台干涉仪支架103，测量基板101通过位置调节组件与内部支撑框架连接，左镜头505、右镜头506、离轴对准系统507和调平调焦系统508均设置在测量基板101上。掩模台干涉仪支架102设置在测量基板101上方，左掩模台干涉仪502、右掩模台干涉仪503设置在掩模台干涉仪支架102上。工件台干涉仪支架103连接至测量基板101下方，工件台干涉仪509安装在工件台干涉仪支架103上。
在一个实施例中，运动台系统包括左掩模台501、右掩模台504和工件台510。在一个实施例中，内部支撑框架包括掩模台支架301、主基板302、支撑腿303和吊框304，主基板302通过位置调节组件与测量基板101连接，掩模台支架301设置在主基板302上方，吊框304通过支撑腿303连接至主基板302下方。在一个实施例中，如图1所示，掩模台支架301位于测量基板101上方，左掩模台501和右掩模台504均设置在掩模台支架301上，且左掩模台501位于左掩模台干涉仪502左侧，右掩模台504位于右掩模台干涉仪503右侧。吊 框304设置在测量基板101下方，工件台510设置在吊框304上，且工件台510与工件台干涉仪509相邻设置。
在一个实施例中，照明系统包括左照明701和右照明702。外部框架包括第一立柱601、第二立柱602、顶部支架603和掩模传输支架604，第一立柱601和第二立柱602分别设置在内部支撑框架两侧，顶部支架603分别与第一立柱601和第二立柱602连接，左照明701和右照明702均设置在顶部支架603上，掩模传输支架604与第一立柱601或第二立柱602相邻设置，掩模传输系统703设置在掩模传输支架604上。
进一步地，在一个实施例中，上述的曝光机还包括控制柜704和环境柜705，控制柜704和环境柜705位于外部框架外侧独立放置，以避免控制柜704和环境柜705震动影响基板曝光精度。
如图2至图4所示，在一个实施例中，位置调节组件至少包括第一连接件201、第二连接件202和第三连接件203。本实施例中，第一连接件201、第二连接件202和第三连接件203之间呈三角形布局，能够保证测量基板101和主基板302之间的相对位置调节稳定可靠，确保基板曝光精度。进一步地，在一个实施例中，第一连接件201、第二连接件202和第三连接件203之间呈等腰三角形或等边三角形布置。
在一个实施例中，如图4所示，在一个实施例中，第一连接件201包括刚性件204和压电陶瓷片205，刚性件204上开设有安装槽206和多个调节孔207，压电陶瓷片205设置在安装槽206内，多个调节孔207与安装槽206相邻设置。本实施例中，在刚性件204上开设调节孔207，并在刚性件204内设置压电陶瓷片205，通过压电陶瓷片205伸长或缩短以控制调节孔207的孔径变大或变小，从而使刚性件204整体伸长或缩短，实现对测量基板101和主基板302的相对位置的微动调节。具体地，当刚性件204需要伸长时，对压电陶瓷片205施加电场，使压电陶瓷片205伸长，压电陶瓷片205沿极化方向伸长，使调节孔207的孔径变大，从而使刚性件204伸长；反之，当刚性件204需要缩短时，对压电陶瓷片205施加反向电场，压电陶瓷片205沿极化方向缩短，使调节孔207的孔径变小，刚性件204整体缩短。在一个实施例中，如图4所示，调节孔207的末端设置有工艺孔，设置工艺孔能够避免调节孔207贯穿刚性件204而造成刚性件204整体断裂，确保刚性件204结构稳定可靠。
在一个实施例中，如图5、图6所示，第二连接件202和第三连接件203也 均包括刚性件204和压电陶瓷片205，刚性件204上开设有安装槽206和多个调节孔207，压电陶瓷片205设置在安装槽206内，多个调节孔207与安装槽206相邻设置。具体第二连接件202和第三连接件203的工作原理与上述第一连接件201的工作原理相同，在此不再赘述。
具体地，工作台510运动过程中，通过上述位置调节组件调节测量基板101和主基板302之间的相对位置的过程如下：当工作台510向左运动时，内部支撑框架发生静变形，主基板302左侧低，右侧高，此时，对第二连接件202的压电陶瓷片施加电场，使第二连接件202的压电陶瓷片缩短，第二连接件202的刚性件204整体缩短；同时，第三连接件203的压电陶瓷片施加反向电场，使第三连接件203的压电陶瓷片伸长，第三连接件203的刚性件204整体伸长；对应的，根据变形量大小调整第一连接件201的压电陶瓷片，使第一连接件201的刚性件204缩短或伸长，从而使测量基板101整体向左侧偏移，使测量基板101的左侧低，右侧高，与主基板302的形变相同，使测量基板101和主基板302的相对位置不变。反之，当工作台510右运动时，调节第二连接件202的压电陶瓷片伸长，使第二连接件202的刚性件204整体伸长，同时，调节第三连接件203的压电陶瓷片缩短，使第三连接件203的刚性件204整体缩短，并根据变形量大小对应调整第一连接件201的压电陶瓷片，使第一连接件201的刚性件204伸长或缩短，使测量基板101随主基板302一起向右侧偏移，确保测量基板101随主基板302相对位置不变。本实施例通过控制压电陶瓷片的形变使对应的第一连接件201的刚性件204、第二连接件202的刚性件204和第三连接件203的刚性件204的结构发生变化，从而调节测量基板101和主基板302的相对位置，使测量基板101和主基板302的相对位置在工作台510运动过程中始终保持不变，从而确保基板曝光精度，避免大吨位工件台大范围快速移动对曝光精度的影响，提高大尺寸基板的曝光精度。
进一步地，在一个实施例中，位置调节组件还包括位置检测传感器和控制器。具体地，位置检测传感器和压电陶瓷片均与控制器连接，位置检测传感器设置在主基板302上，所述位置检测传感器被配置为检测主基板302的位置并将检测到主基板302的位置信息发送至控制器，控制器根据主基板302的位置信息计算主基板302的变形量，并根据主基板302的变形量控制对各个连接件的压电陶瓷片施加不同电场，控制各压电陶瓷片以调节测量基板101和主基板302的相对位置。在一个实施例中，位置检测传感器可采用光电传感器，控制器 可集成在曝光机的控制系统中。
在一个实施例中，位置调节组件还包括：
第一锁紧件801，包括连接螺栓804和第一限位件805，第一锁紧件801的连接螺栓804穿过核心曝光测量框架,第一锁紧件801的连接螺栓804的第一端通过螺帽固定在核心曝光测量框架上，第一锁紧件801的连接螺栓804的第二端通过第一限位件805与第一连接件201的刚性件204连接，第一连接件201的刚性件204的上表面设置有限位平面2041，第一限位件805的第一端与限位平面2041抵接，第一限位件805的第二端与核心曝光测量框架抵接。在一个实施例中，连接螺栓804穿过测量基板101和第一限位件805与第一连接件201的刚性件204连接，第一限位件805的第一端与限位平面2041抵接，第一限位件805的第二端与测量基板101抵接；
第二锁紧件802，包括连接螺栓804和第二限位件806，第二锁紧件802的连接螺栓804穿过核心曝光测量框架,第二锁紧件802的连接螺栓804的第一端通过螺帽固定在核心曝光测量框架上，第二锁紧件802的连接螺栓804的第二端通过第二限位件806与第二连接件202的刚性件204连接，第二连接件202的刚性件204的上表面开设有球形限位槽208，第二限位件806的第一端插入球形限位槽208内，第二限位件的第二端与核心曝光测量框架抵接。在一个实施例中，连接螺栓804穿过测量基板101和第二限位件806与第二连接件202的刚性件204连接，第二限位件806的第一端插入球形限位槽208内，第二限位件806的第二端与测量基板101抵接；以及，
第三锁紧件803，包括连接螺栓804和第三限位件807，第三锁紧件803的连接螺栓804穿过核心曝光测量框架，第三锁紧件803的连接螺栓804的第一端通过螺帽固定在核心曝光测量框架上，第三锁紧件803的连接螺栓804的第二端通过第三限位件807与第三连接件203的刚性件204连接，第三连接件203的刚性件204的上表面开设有V形限位槽209，第三限位件807的第一端插入V形限位槽209内，第三限位件807的第二端与核心曝光测量框架抵接。在一个实施例中，连接螺栓804穿过测量基板101和第三限位件807与第三连接件203的刚性件204连接，第三限位件807的第一端插入V形限位槽209内，第三限位件807的第二端与测量基板101抵接。
在一个实施例中，第一限位件805为平板限位件，在一个实施例中，第二限位件806和第三限位件807均为球头限位件。具体地，如图2所示，以测量 基板101的几何中心为原点，水平向左为X轴正方向，水平方向上第二连接件202和第三连接件203延伸的方向为Y轴正方向，竖直向上为Z轴正方向建立坐标系。平板限位件与限位平面2041，能够限制第一连接件201的Z向自由度；第二限位件806为球头限位件，球头限位件插入第二连接件202的刚性件204表面的球形限位槽208内，能够限制第二连接件202在X,Y,Z向的自由度；第三限位件807为球头限位件，球头限位件插入第三连接件203的刚性件204表面的V形限位槽209内，能够限制第三连接件在X，Z向的自由度，三个连接件组合在一起共同限制了Rx,Ry,Rz自由度，实现六自由度解耦，使第一连接件201、第二连接件202及第三连接件203在工件台510运动过程中都不会出现部件松动或偏移，确保第一连接件201、第二连接件202及第三连接件203安装稳定可靠，以进一步确保曝光精度。
在一个实施例中，第一锁紧件801、第二锁紧件802和第三锁紧件803均还包括柔性件808；第一锁紧件801的柔性件808套设在第一锁紧件801的连接螺栓804上并设置在核心曝光测量框架和第一锁紧件801的连接螺栓804的螺帽之间；第二锁紧件802的柔性件808套设在第二锁紧件802的连接螺栓804上并设置在核心曝光测量框架和第二锁紧件802的连接螺栓804的螺帽之间；第三锁紧件803的柔性件808套设在第三锁紧件803的连接螺栓804上并设置在核心曝光测量框架和第三锁紧件803的连接螺栓804的螺帽之间。
具体地，柔性件808设置在测量基板101和螺帽之间，柔性件808能够避免测量基板101直接与螺帽硬性连接造成部件磨损，有利于延长测量基板101和连接螺栓804的使用寿命，并有助于提高测量基板101与连接螺栓804连接的稳定性。在一个实施例中，柔性件808采用柔性金属制成。
在其中一个实施例中，第一锁紧件801、第二锁紧件802和第三锁紧件803均还包括垫片809，第一锁紧件801的垫片809套设在第一锁紧件801的连接螺栓804上并设置在第一锁紧件801的柔性件808和第一锁紧件801的连接螺栓804的螺帽之间，第二锁紧件802的垫片809套设在第二锁紧件802的连接螺栓804上并设置在第二锁紧件802的柔性件808和第二锁紧件802的连接螺栓804的螺帽之间；第三锁紧件803的垫片809套设在第三锁紧件803的连接螺栓804上并设置在第三锁紧件803的柔性件808和第三锁紧件803的连接螺栓804的螺帽之间，这样可以确保柔性件808受力均匀。
在一个实施例中，第一连接件201、第二连接件202和第三连接件203的结 构刚度均不同。具体地，三个连接件的设置位置不同，每个连接件的受力不同，因此，为保证刚度设计，第一连接件201、第二连接件202和第三连接件203的结构刚度均不同，具体第一连接件201、第二连接件202和第三连接件203的结构刚度可根据实际受力情况具体设置。在一个实施例中，第一连接件201的刚性件204、第二连接件202的刚性件204和第三连接件203的刚性件204可采用硬性金属或硬质合金制成。
在一个实施例中，上述曝光机还包括：减振器401，减振器401设置在内部支撑框架与地面之间，且减振器401布置在运动台系统的零位长行程的中心位置。在一个实施例中，多个减振器401以运动台系统的零位长行程的中心位置为对称中心呈中心对称布置。
具体地，在减振器布局中，减振器401分布的越合理，整机内部支撑框架受到工件台510运动的影响越小，即对整机内部支撑框架变形量就越小，从而对物镜曝光性能的影响就越小。减振器401应布局在静变形敏感的节点位置，可使得极限工位相对于工件台510零位的导轨相对变形最小。由于在工件台下方因环境回风通道空间尺寸及减振系统控制方面难易程度等因素的影响，本实施例中，在运动台系统的零位长行程的中心位置布置减振器401，多个减振器401以运动台系统的零位长行程的中心位置为对称中心呈中心对称布置。如图7、图8所示，在一个实施例中，曝光机包括七个减振器401，七个减振器401中，一个减振器401设置在运动台系统的零位长行程的中心位置，另外六个减振器401每三个一组对称设置在运动台系统的零位长行程的中心位置两侧。又如图9所示，在又一个实施例中，曝光机包括八个减振器401，八个减振器401中，两个减振器401沿运动台系统的零位长行程的中心线对称设置在运动台系统的零位长行程的中心位置两侧，另外六个减振器401每三个一组对称设置在运动台系统的零位长行程的中心线两侧。
上述的曝光机将框架结构由内向外分成核心曝光测量框架、内部支撑框架、外部框架三部分。其中，核心曝光测量框架安装有曝光系统和测量系统，内部支撑框架安装有运动台系统，并且在核心曝光测量框架和内部支撑框架之间设置位置调节组件。当内部支撑框架随运动台系统运动发生偏移变形时，位置调节组件能够向与内部支撑框架的偏移变形方向相同的方向发生结构形变，调节运动台系统和曝光系统的相对位置，使运动台系统和曝光系统的相对位置不变，实现运动台系统运动过程中核心曝光测量框架和内部支撑框架快速对准，确保 运动台系统和曝光系统相对位置准确，从而避免框架接口静变形造成的系统误差，提高大尺寸基板的曝光精度。另外，上述的曝光机将照明系统、掩模传输系统703等置于外部框架上，与成像、测量、定位等高精度需求部件充分隔离，能够避免重量的对整机系统补偿测量的影响，进一步确保大尺寸基板的曝光精度。
以上所述实施例的各技术特征可以进行任意的组合，为使描述简洁，未对上述实施例中的各个技术特征所有可能的组合都进行描述，然而，只要这些技术特征的组合不存在矛盾，都应当认为是本说明书记载的范围。

Claims (15)

  1. 一种曝光机，包括：曝光系统、测量系统和运动台系统，所述曝光机还包括：
    核心曝光测量框架，安装有所述曝光系统和所述测量系统；
    内部支撑框架，安装有所述运动台系统；以及，
    位置调节组件，分别与所述核心曝光测量框架和所述内部支撑框架连接，所述位置调节组件被配置为当所述内部支撑框架随所述运动台系统运动发生变形时，所述位置调节组件能够发生结构形变，以调节所述运动台系统和所述曝光系统的相对位置，使所述运动台系统和所述曝光系统的相对位置不变。
  2. 根据权利要求1所述的曝光机，其中，所述位置调节组件至少包括第一连接件(201)，第二连接件(202)和第三连接件(203)，所述第一连接件(201)、所述第二连接件(202)以及所述第三连接件(203)均包括刚性件(204)和压电陶瓷片(205)，所述刚性件(204)上开设有安装槽(206)和多个调节孔(207)，所述压电陶瓷片(205)设置在所述安装槽(206)内，多个所述调节孔(207)与所述安装槽(206)相邻设置。
  3. 根据权利要求2所述的曝光机，其中，所述第一连接件(201)，所述第二连接件(202)和所述第三连接件(203)之间呈三角形布局。
  4. 根据权利要求2所述的曝光机，其中，所述位置调节组件还包括：
    第一锁紧件(801)，包括连接螺栓(804)和第一限位件(805)，所述第一锁紧件(801)的连接螺栓(804)的第一端设置有螺帽，所述第一锁紧件(801)的连接螺栓(804)的第二端穿过所述核心曝光测量框架与所述第一连接件(201)的刚性件(204)连接，所述第一连接件(201)的刚性件(204)的上表面设置有限位平面(2041)，所述第一限位件(805)的第一端与所述限位平面(2041)抵接，所述第一限位件(805)的第二端与所述核心曝光测量框架抵接；
    第二锁紧件(802)，包括连接螺栓(804)和第二限位件(806)，所述第二锁紧件(802)的连接螺栓(804)的第一端设置有螺帽，所述第二锁紧件(802)的连接螺栓(804)的第二端穿过所述核心曝光测量框架与所述第二连接件(202)的刚性件(204)连接，所述第二连接件(202)的刚性件(204)的上表面开设有球形限位槽(208)，所述第二限位件(806)的第一端插入所述球形限位槽(208)内，所述第二限位件(806)的第二端与所述核心曝光测量框架抵接；
    第三锁紧件(803)，包括连接螺栓(804)和第三限位件(807)，所述第三锁紧件(803)的连接螺栓(804)的第一端设置有螺帽，所述第三锁紧件(803) 的连接螺栓(804)的第二端穿过所述核心曝光测量框架与所述第三连接件(203)的刚性件(204)连接，所述第三连接件(203)的刚性件(204)的上表面开设有V形限位槽(209)，所述第三限位件(807)的第一端插入所述V形限位槽(209)内，所述第三限位件(807)的第二端与所述核心曝光测量框架抵接。
  5. 根据权利要求4所述的曝光机，其中，所述第一限位件(805)为平板限位件。
  6. 根据权利要求4所述的曝光机，其中，第二限位件(806)和第三限位件(807)均为球头限位件。
  7. 根据权利要求4或6所述的曝光机，其中，所述第一锁紧件(801)、第二锁紧件(802)和第三锁紧件(803)均还包括：柔性件(808)；
    所述第一锁紧件(801)的柔性件(808)套设在所述第一锁紧件(801)的连接螺栓(804)上并设置在所述核心曝光测量框架和所述第一锁紧件(801)的连接螺栓(804)的螺帽之间；
    所述第二锁紧件(802)的柔性件(808)套设在所述第二锁紧件(802)的连接螺栓(804)上并设置在所述核心曝光测量框架和所述第二锁紧件(802)的连接螺栓(804)的螺帽之间；
    所述第三锁紧件(803)的柔性件(808)套设在所述第三锁紧件(803)的连接螺栓(804)上并设置在所述核心曝光测量框架和所述第三锁紧件(803)的连接螺栓(804)的螺帽之间。
  8. 根据权利要求7所述的曝光机，其中，所述第一锁紧件(801)、第二锁紧件(802)和第三锁紧件(803)均还包括：垫片(809)；
    所述第一锁紧件(801)的垫片(809)套设在所述第一锁紧件(801)的连接螺栓(804)上并设置在所述第一锁紧件(801)的柔性件(808)和所述第一锁紧件(801)的连接螺栓(804)的螺帽之间；
    所述第二锁紧件(802)的垫片(809)套设在所述第二锁紧件(802)的连接螺栓(804)上并设置在所述第二锁紧件(802)的柔性件(808)和所述第二锁紧件(802)的连接螺栓(804)的螺帽之间；
    所述第三锁紧件(803)的垫片(809)套设在所述第三锁紧件(803)的连接螺栓(804)上并设置在所述第三锁紧件(803)的柔性件(808)和所述第三锁紧件(803)的连接螺栓(804)的螺帽之间。
  9. 根据权利要求2所述的曝光机，其中，所述第一连接件(201)、第二连接 件(202)和第三连接件(203)的结构刚度均不同。
  10. 根据权利要求1所述的曝光机，其中，所述核心曝光测量框架包括：测量基板(101)、掩模台干涉仪支架(102)和工件台干涉仪支架(103)，所述测量基板(101)通过所述位置调节组件与所述内部支撑框架连接，所述掩模台干涉仪支架(102)设置在所述测量基板(101)上方，所述工件台干涉仪支架(103)连接至所述测量基板(101)下方。
  11. 根据权利要求10所述的曝光机，其中，所述内部支撑框架包括：掩模台支架(301)、主基板(302)、支撑腿(303)和吊框(304)，所述主基板(302)通过所述位置调节组件与所述测量基板(101)连接，所述掩模台支架(301)设置在所述主基板(302)上方，所述吊框(304)通过所述支撑腿(303)连接至所述主基板(302)下方。
  12. 根据权利要求1所述的曝光机，所述曝光机还包括照明系统和掩模传输系统(703)，所述曝光机还包括：
    外部框架，安装有所述照明系统和所述掩模传输系统(703)，所述核心曝光测量框架设置在所述外部框架内侧，所述内部支撑框架设置在所述外部框架和所述核心曝光测量框架之间。
  13. 根据权利要求12所述的曝光机，其中，所述外部框架包括：第一立柱(601)、第二立柱(602)、顶部支架(603)和掩模传输支架(604)，所述第一立柱(601)和第二立柱(602)分别设置在所述内部支撑框架两侧，所述顶部支架(603)分别与所述第一立柱(601)和所述第二立柱(602)连接，所述照明系统设置在所述顶部支架(603)上，所述掩模传输支架(604)与所述第一立柱(601)或所述第二立柱(602)相邻设置，所述掩模传输系统(703)设置在所述掩模传输支架(604)上。
  14. 根据权利要求1所述的曝光机，其中，还包括：
    减振器(401)，所述减振器(401)被配置为设置在所述内部支撑框架与地面之间，且所述减振器(401)布置在所述运动台系统的零位长行程的中心位置。
  15. 根据权利要求1或14所述的曝光机，其中，还包括：减振器(401)，所述减振器设有多个，每个所述减振器(401)被配置为设置在所述内部支撑框架与地面之间；
    所述多个减振器(401)以运动台系统的零位长行程的中心位置为对称中心呈中心对称布置。
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Publication number Priority date Publication date Assignee Title
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Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030043360A1 (en) * 2001-08-30 2003-03-06 Farnworth Warren M. Methods and apparatus for stereolithographic processing of components and assemblies
CN102243440A (zh) * 2010-05-10 2011-11-16 上海微电子装备有限公司 一种能监测硅片台位置精度的光刻机
CN102608879A (zh) * 2011-01-24 2012-07-25 上海华虹Nec电子有限公司 光刻机进行工程光刻露光时的对准方法
CN102944982A (zh) * 2008-05-13 2013-02-27 株式会社尼康 曝光设备、曝光方法以及器件制造方法
CN103901733A (zh) * 2012-12-28 2014-07-02 上海微电子装备有限公司 曝光装置
CN208351246U (zh) * 2018-07-11 2019-01-08 上海微电子装备（集团）股份有限公司 大尺寸基板曝光机

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3193586B2 (ja) * 1995-04-21 2001-07-30 キヤノン株式会社 半導体露光装置
JP3825921B2 (ja) * 1998-07-23 2006-09-27 キヤノン株式会社 走査露光装置およびデバイス製造方法
US7049585B2 (en) * 2000-07-27 2006-05-23 Ebara Corporation Sheet beam-type testing apparatus
JP2005311165A (ja) * 2004-04-23 2005-11-04 Canon Inc アクティブマウントおよび露光装置
KR101178755B1 (ko) * 2004-06-10 2012-08-31 가부시키가이샤 니콘 엔지니어링 노광 장치, 노광 방법 및 디바이스 제조 방법
NL1036511A1 (nl) * 2008-02-13 2009-08-14 Asml Netherlands Bv Movable support, position control system, lithographic apparatus and method of controlling a position of an exchangeable object.
WO2010098474A1 (ja) * 2009-02-27 2010-09-02 株式会社 ニコン 光学素子保持装置、光学系、露光装置、デバイスの製造方法及び光学素子の交換方法
CN102323720B (zh) * 2011-08-03 2013-03-27 河北工业大学 一种基于压电陶瓷驱动的柔性微定位平台
KR101969470B1 (ko) * 2012-04-27 2019-04-16 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치
CN104678711B (zh) * 2013-11-26 2017-06-27 上海微电子装备有限公司 运动台反力抵消装置

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030043360A1 (en) * 2001-08-30 2003-03-06 Farnworth Warren M. Methods and apparatus for stereolithographic processing of components and assemblies
CN102944982A (zh) * 2008-05-13 2013-02-27 株式会社尼康 曝光设备、曝光方法以及器件制造方法
CN102243440A (zh) * 2010-05-10 2011-11-16 上海微电子装备有限公司 一种能监测硅片台位置精度的光刻机
CN102608879A (zh) * 2011-01-24 2012-07-25 上海华虹Nec电子有限公司 光刻机进行工程光刻露光时的对准方法
CN103901733A (zh) * 2012-12-28 2014-07-02 上海微电子装备有限公司 曝光装置
CN208351246U (zh) * 2018-07-11 2019-01-08 上海微电子装备（集团）股份有限公司 大尺寸基板曝光机

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