WO2020007066A1 - 像素界定结构、显示面板及其制造方法和显示装置 - Google Patents

像素界定结构、显示面板及其制造方法和显示装置 Download PDF

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Publication number
WO2020007066A1
WO2020007066A1 PCT/CN2019/078722 CN2019078722W WO2020007066A1 WO 2020007066 A1 WO2020007066 A1 WO 2020007066A1 CN 2019078722 W CN2019078722 W CN 2019078722W WO 2020007066 A1 WO2020007066 A1 WO 2020007066A1
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layer
pixel
substrate
defining
mass percentage
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PCT/CN2019/078722
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English (en)
French (fr)
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宋莹莹
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京东方科技集团股份有限公司
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Priority to US16/494,516 priority Critical patent/US11145699B2/en
Publication of WO2020007066A1 publication Critical patent/WO2020007066A1/zh

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41MPRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00Duplicating or marking methods; Sheet materials for use therein
    • B41M5/0041Digital printing on surfaces other than ordinary paper
    • B41M5/0047Digital printing on surfaces other than ordinary paper by ink-jet printing
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10OLED displays
    • H10K59/12Active-matrix OLED [AMOLED] displays
    • H10K59/122Pixel-defining structures or layers, e.g. banks
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass

Definitions

  • the present disclosure relates to the field of display technology, and in particular, to a pixel-defining structure, a display panel, a manufacturing method thereof, and a display device.
  • OLED organic light-emitting diode
  • an OLED light-emitting material is formed in the opening of the pixel-defining layer.
  • inkjet printing technology is generally used to form a light-emitting material layer.
  • a pixel defining structure including: a pixel defining layer on a substrate, the pixel defining layer including a plurality of stacked layers, the plurality of layers including at least a first layer and a second layer Layer, the first layer is located between the substrate and the second layer; wherein the mass percentage of the lyophobic material in the second layer is higher than the mass percentage of the lyophobic material in the first layer.
  • the mass percentage of the lyophobic material in each of the multiple layers gradually increases in a direction from near the substrate to far from the substrate.
  • the pixel defining layer in addition to the lyophobic material, further includes at least one of polyimide and polymethyl methacrylate.
  • the shape of the pixel defining layer is mesh.
  • the projection of the second layer on the substrate is within the projection of the first layer on the substrate.
  • the pixel defining layer has a thickness ranging from 0.5 micrometers to 5 micrometers.
  • the multilayer includes 3 to 6 layers.
  • the lyophobic material includes one or more of the following: a fluorine-containing polymer material, a chlorine-containing polymer material.
  • a display panel including the pixel defining structure according to any one of the above embodiments.
  • the display panel further includes: a substrate; and an electrode disposed on the substrate, wherein the pixel defining layer has an opening that exposes at least a portion of an upper surface of the electrode.
  • a display device including the display panel according to any one of the above embodiments.
  • a method for manufacturing a display panel including: providing a substrate; forming a patterned mask layer on the substrate; and an area where the mask layer is not formed on the substrate A pixel-defining layer is formed on the pixel-defining layer, and the pixel-defining layer includes a plurality of stacked layers.
  • the plurality of layers includes at least a first layer and a second layer.
  • the first layer is located between the substrate and the second layer.
  • the mass percentage of the lyophobic material in the second layer is higher than the mass percentage of the lyophobic material in the first layer; and removing the mask layer.
  • the pixel defining layer is formed by an inkjet printing process.
  • forming the pixel defining layer by an inkjet printing process includes printing a first solution containing a lyophobic material on an area of the substrate where the mask layer is not formed to form the first layer. Print the second solution containing the lyophobic material on the first layer to form the second layer, wherein the mass percentage of the lyophobic material in the second solution is higher than that in the first solution The mass percentage of the liquid material.
  • forming the pixel-defining layer by an inkjet printing process includes: sequentially printing a plurality of solutions of a lyophobic material from low to high masses on a region of the substrate where the mask layer is not formed, To form the multilayer, the plurality of solutions include the first solution and the second solution.
  • the mass ratio of the lyophobic material to the solute material in each of the plurality of solutions is less than or equal to one.
  • the method before forming the mask layer, the method further includes: forming an electrode on the substrate, the mask layer covering at least a portion of an upper surface of the electrode.
  • the method further includes: printing a luminescent material in an opening of the pixel defining layer.
  • the forming a patterned mask layer on the substrate includes: forming a photoresist layer on the substrate; exposing and developing the photoresist layer to Forming the mask layer.
  • the multilayer includes 3 to 6 layers.
  • the lyophobic material includes one or more of the following: a fluorine-containing polymer material, a chlorine-containing polymer material.
  • FIG. 1 is a schematic structural diagram of a pixel defining structure according to an embodiment of the present disclosure
  • FIG. 2 is a schematic flowchart of a method for manufacturing a display panel according to an embodiment of the present disclosure
  • 3A-3C are schematic cross-sectional views of structures formed at different stages of forming a display panel according to some embodiments of the present disclosure
  • FIG. 4 is a schematic structural diagram of a display panel according to an embodiment of the present disclosure.
  • FIG. 5 is a schematic structural diagram of a display device according to an embodiment of the present disclosure.
  • an intermediate component may or may not exist between the specific component and the first component or the second component.
  • the specific component may be directly connected to the other components without an intervening component, or may be directly connected to the other components without an intervening component.
  • the inventors have studied the above problems, and found that after curing the pixel-defining layer, the upper surface of the pixel-defining layer has stronger liquid-repellent properties, but the liquid-repellent properties of the sides of the openings of the pixel-defining layer are weak. Therefore, when printing the luminescent material in the opening of the pixel defining layer, the ink easily climbs upward on the side of the opening, so that the thickness of the luminescent material formed by printing is not uniform.
  • FIG. 1 is a schematic structural diagram of a pixel defining structure according to an embodiment of the present disclosure.
  • the pixel defining structure includes a pixel defining layer 102 on a substrate 101.
  • the thickness of the pixel defining layer 102 may be, for example, 0.5 micrometers to 5 micrometers, for example, 2 micrometers, 4 micrometers, or the like.
  • An electrode 103 such as an anode, may be formed on the substrate 101. Different electrodes 103 may be spaced by the pixel defining layer 102. It should be understood that a thin film transistor (TFT) array, a capacitor, a resistor, a wiring (not shown in the figure), a planarization layer, and the like may also be formed in the substrate 101. The pixel defining layer 102 and the electrode 103 are located on a planarization layer.
  • TFT thin film transistor
  • the pixel defining layer 102 may have, for example, an opening 104 that exposes at least a portion of an upper surface of the electrode 103.
  • FIG. 1 shows a case where the opening 104 exposes the entire upper surface of the electrode 103.
  • the opening 104 may expose a part of the upper surface of the electrode 103, for example, the pixel defining layer 102 may cover a part of the upper surface of the electrode 103.
  • the shape of the pixel-defining layer 102 may be a mesh, that is, the pixel-defining layer 102 has a plurality of openings 104.
  • the pixel defining layer 102 includes multiple layers stacked.
  • the stacked layers include at least a first layer 112 and a second layer 122, and the first layer 112 is located between the substrate 101 and the second layer 122.
  • the mass percentage of the lyophobic material in the second layer 122 is higher than the mass percentage of the lyophobic material in the first layer 112.
  • the projection of the second layer 122 on the substrate 101 is within the projection of the first layer 112 on the substrate 101.
  • the material of the pixel defining layer 102 may include other materials besides the lyophobic material, such as at least one of polyimide (PI) and polymethyl methacrylate (PMMA).
  • the stacked layers may include only the first layer 112 and the second layer 122.
  • the mass percentage of the lyophobic material contained in the relatively upper second layer 122 is higher than the mass percentage of the lyophobic material contained in the relatively lower first layer 112.
  • the stacked layers may include other layers in addition to the first layer 112 and the second layer 122, such as a third layer 132 between the first layer 112 and the second layer 122, etc. .
  • the mass percentage of the lyophobic material in the other layers of the stacked multilayer may be higher than the mass percentage of the lyophobic material in the second layer 122 or lower than the mass percentage of the lyophobic material in the first layer 112. It may be between the mass percentage of the lyophobic material in the second layer 122 and the mass percentage of the lyophobic material in the first layer 112.
  • the lyophobic material may include one or more of the following: a fluorine-containing polymer material, a chlorine-containing polymer material.
  • the fluorine-containing polymer material may include, for example, polyvinylidene fluoride (PVDF).
  • the chlorine-containing polymer material may include, for example, chlorinated polyethylene.
  • the lyophobic material may be a material having a hydrophobic group.
  • the mass percentage of the liquid-repellent material in the relatively upper second layer is higher than the mass percentage of the liquid-repellent material in the relatively lower first layer, so that when the luminescent material is subsequently printed in the opening of the pixel-defining layer, The solution is not easy to climb upward from the side of the opening, so that the uniformity of the thickness of the luminescent material can be improved.
  • the mass percentage of the lyophobic material contained in each of the stacked multilayers gradually increases high.
  • the mass percentage of the liquid-repellent material in the first layer 112, the third layer 132, and the second layer 122 gradually increases.
  • the mass percentage of the lyophobic material from the bottom to the top of the pixel defining layer gradually increases. This makes it more difficult for the solution to climb upward from the side of the opening when the luminescent material is subsequently printed in the opening of the pixel-defining layer, thereby further improving the uniformity of the thickness of the luminescent material.
  • the stacked multiple layers include 3 to 6 layers, such as 4 layers and 5 layers.
  • Such a pixel-defining layer 102 makes it harder for the solution to climb upward from the side of the opening when printing a luminescent material in the opening of the pixel-defining layer 102, thereby further improving the uniformity of the thickness of the luminescent material.
  • An embodiment of the present disclosure provides a display panel including the pixel defining structure 300 provided by any one of the above embodiments.
  • the display panel further includes a substrate 101 shown in FIG. 1 and an electrode 103 disposed on the substrate 101.
  • the pixel defining layer 102 has an opening 104 that exposes at least a portion of the upper surface of the electrode 103.
  • FIG. 2 is a schematic flowchart of a method for manufacturing a display panel according to an embodiment of the present disclosure.
  • 3A-3D are schematic cross-sectional views of structures formed at different stages of forming a display panel according to some embodiments of the present disclosure.
  • step 202 a substrate 101 is provided, as shown in FIG. 3A.
  • the electrode 103 may be formed on the substrate 101.
  • the material of the electrode 103 may be indium tin oxide (ITO) or a stack including ITO.
  • a patterned mask layer 301 is formed on the substrate 101, as shown in FIG. 3B.
  • a mask material layer such as a photoresist layer
  • the mask material layer is first coated on the substrate 101.
  • the mask material layer is patterned, for example, exposed and developed to form a patterned mask layer 301.
  • the mask layer 301 covers at least a part, that is, a part or the whole, of the upper surface of the electrode 103.
  • FIG. 3B shows a case where the mask layer 301 covers the entire upper surface of the electrode 103.
  • the thickness of the mask layer 301 may be 1 micrometer to 5 micrometers, for example, 2 micrometers to 4 micrometers, such as 3 micrometers and the like.
  • a pixel defining layer 102 is formed in a region where the mask layer 301 is not formed on the substrate 101, as shown in FIG. 3C.
  • the pixel-defining layer 102 includes a plurality of stacked layers, which includes at least a first layer 112 and a second layer 122, and the first layer 112 is located between the substrate 101 and the second layer 122.
  • the mass percentage of the lyophobic material in the second layer 122 is higher than the mass percentage of the lyophobic material in the first layer 112.
  • the lyophobic material may include one or more of the following: a fluorine-containing polymer material, a chlorine-containing polymer material.
  • the pixel defining layer 102 may be formed by an inkjet printing process.
  • a first solution containing a lyophobic material may be printed on an area of the substrate 101 where the mask layer 301 is not formed to form a first layer 112; Two solutions are printed on the first layer 112 to form a second layer 122 above the first layer 112.
  • the mass percentage of the lyophobic material in the second solution is higher than the mass percentage of the lyophobic material in the first solution, so that the mass percentage of the lyophobic material in the formed second layer 122 is higher than the lyophobic material in the first layer 112 Mass percentage.
  • various solutions of the liquid-repellent material with a mass percentage from low to high may be printed on the region of the substrate 101 where the mask layer 301 is not formed to form multiple layers of the pixel defining layer 102.
  • the mass percentage of lyophobic material in each layer gradually increases from bottom to top.
  • the multilayer includes a first layer 112, a third layer 132, and a second layer 122 in this order from bottom to top. It should be understood that a multilayer may include more than three layers, for example, a multilayer may include 4, 5, or 6 layers.
  • the mass ratio of the lyophobic material to the solute material in each of the plurality of solutions used to form the pixel defining layer 102 is less than or equal to one.
  • the viscosity of the solution may be 1 cP-1000 cP, such as 10 cP-800 cP, such as 30 Cp, 400 cP, and the like.
  • step 208 the mask layer 301 is removed. After the mask layer 301 is removed, the opening 104 of the pixel defining layer 102 is defined (see FIG. 1).
  • a luminescent material such as an organic luminescent material, may be printed in the opening of the pixel defining layer 102.
  • FIG. 4 is a schematic structural diagram of a display panel according to an embodiment of the present disclosure.
  • the display panel 400 may include the pixel defining structure 300 of any one of the above embodiments. Since the mass percentage of the liquid-repellent material in the relatively upper second layer in the pixel-defining layer is higher than the mass percentage of the liquid-repellent material in the relatively lower first layer, the uniformity of the thickness of the subsequently formed light-emitting material can be improved, and Improve the display effect of the display panel.
  • FIG. 5 is a schematic structural diagram of a display device according to an embodiment of the present disclosure.
  • the display device 500 may include the display panel 400 of any one of the above embodiments.
  • the display device may be, for example, any product or component having a display function, such as a mobile terminal, a television, a display, a notebook computer, a digital photo frame, a navigator, and an electronic paper.

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Abstract

本公开提供了一种像素界定结构、显示面板及其制造方法和显示装置,涉及显示技术领域,所述像素界定结构包括叠置的多层,所述多层至少包括第一层和第二层,所述第一层位于所述基板和所述第二层之间;其中,所述第二层中疏液材料的质量百分比高于所述第一层中疏液材料的质量百分比。

Description

像素界定结构、显示面板及其制造方法和显示装置
相关申请的交叉引用
本申请是以CN申请号为201810719283.3,申请日为2018年7月2日的申请为基础,并主张其优先权,该CN申请的公开内容在此作为整体引入本申请中。
技术领域
本公开涉及显示技术领域,尤其涉及一种像素界定结构、显示面板及其制造方法和显示装置。
背景技术
近年来,由于具有主动发光、发光亮度高、色彩艳、宽视角、响应速度快等特点,有机发光二极管(Organic Light-Emitting Diode,OLED)显示面板逐渐受到更多的关注。
在形成像素界定层(PDL)后,会在像素界定层的开口中形成OLED的发光材料。目前,由于喷墨打印技术的材料利用率较高,为了实现OLED的量产,一般采用喷墨打印技术来形成发光材料层。
发明内容
根据本公开实施例的一方面,提供一种像素界定结构,包括:位于基板上的像素界定层,所述像素界定层包括叠置的多层,所述多层至少包括第一层和第二层,所述第一层位于所述基板和所述第二层之间;其中,所述第二层中疏液材料的质量百分比高于所述第一层中疏液材料的质量百分比。
在一些实施例中,在从靠近所述基板到远离所述基板的方向上,所述多层中每一层中疏液材料的质量百分比逐渐升高。
在一些实施例中,除所述疏液材料之外,所述像素界定层还包括聚酰亚胺和聚甲基丙烯酸甲酯中的至少一种。
在一些实施例中,所述像素界定层的形状为网状。
在一些实施例中,所述第二层在所述基板上的投影在所述第一层在所述基板上的投影之内。
在一些实施例中,所述像素界定层的厚度范围为0.5微米-5微米。
在一些实施例中,所述多层包括3层至6层。
在一些实施例中,所述疏液材料包括下列中的一种或多种:含氟的聚合物材料、含氯的聚合物材料。
根据本公开实施例的另一方面,提供一种显示面板,包括:上述任意一个实施例所述的像素界定结构。
在一些实施例中,所述显示面板还包括:基板;和设置在所述基板上的电极,其中,所述像素界定层具有开口,所述开口使得所述电极的上表面的至少一部分露出。
根据本公开实施例的又一方面,提供一种显示装置,包括:上述任意一个实施例所述的显示面板。
根据本公开实施例的又一方面,提供一种显示面板的制造方法,包括:提供基板;在所述基板上形成图案化的掩模层;在所述基板未形成所述掩模层的区域上形成像素界定层,所述像素界定层包括叠置的多层,所述多层至少包括第一层和第二层,所述第一层位于所述基板和所述第二层之间,其中,所述第二层中疏液材料的质量百分比高于所述第一层中疏液材料的质量百分比;和去除所述掩模层。
在一些实施例中,通过喷墨打印工艺形成所述像素界定层。
在一些实施例中,通过喷墨打印工艺形成所述像素界定层包括:将包含疏液材料的第一溶液打印在所述基板未形成所述掩模层的区域,以形成所述第一层;将包含疏液材料的第二溶液打印在所述第一层上,以形成所述第二层,其中,所述第二溶液中疏液材料的质量百分比高于所述第一溶液中疏液材料的质量百分比。
在一些实施例中,通过喷墨打印工艺形成所述像素界定层包括:依次将疏液材料的质量百分比从低到高的多种溶液打印在所述基板未形成所述掩模层的区域,以形成所述多层,所述多种溶液包括所述第一溶液和所述第二溶液。
在一些实施例中,所述多种溶液中的每一种溶液中的疏液材料与溶质材料的质量比小于或等于1。
在一些实施例中,在形成所述掩模层之前,所述方法还包括:在所述基板上形成电极,所述掩模层覆盖所述电极的上表面的至少一部分。
在一些实施例中,在去除所述掩模层后,所述方法还包括:在所述像素界定层的开口中打印发光材料。
在一些实施例中,所述在所述基板上形成图案化的掩模层包括:在所述基板上形 成光致抗蚀剂层;对所述光致抗蚀剂层进行曝光和显影,以形成所述掩模层。
在一些实施例中,所述多层包括3层至6层。
在一些实施例中,所述疏液材料包括下列中的一种或多种:含氟的聚合物材料、含氯的聚合物材料。
附图说明
构成说明书的一部分的附图描述了本公开的实施例,并且连同说明书一起用于解释本公开的原理。
参照附图,根据下面的详细描述,可以更加清楚地理解本公开,其中:
图1是根据本公开一个实施例的像素界定结构的结构示意图;
图2是根据本公开一个实施例的显示面板的制造方法的流程示意图;
图3A-3C是根据本公开一些实施例的在形成显示面板的不同阶段所形成的结构的截面示意图;
图4是根据本公开一个实施例的显示面板的结构示意图;
图5是根据本公开一个实施例的显示装置的结构示意图。
应当明白,附图中所示出的各个部分的尺寸并不是按照实际的比例关系绘制的。此外,相同或类似的参考标号表示相同或类似的构件。
具体实施方式
现在将参照附图来详细描述本公开的各种示例性实施例。对示例性实施例的描述仅仅是说明性的,决不作为对本公开及其应用或使用的任何限制。本公开可以以许多不同的形式实现,不限于这里所述的实施例。提供这些实施例是为了使本公开透彻且完整,并且向本领域技术人员充分表达本公开的范围。应注意到:除非另外具体说明,否则在这些实施例中阐述的部件和步骤的相对布置、材料的组分、数字表达式和数值应被解释为仅仅是示例性的,而不是作为限制。
本公开中使用的“第一”、“第二”以及类似的词语并不表示任何顺序、数量或者重要性,而只是用来区分不同的部分。“包括”或者“包含”等类似的词语意指在该词前的要素涵盖在该词后列举的要素,并不排除也涵盖其他要素的可能。“上”、“下”等仅用于表示相对位置关系,当被描述对象的绝对位置改变后,则该相对位置关系也可能相应地改变。
在本公开中,当描述到特定部件位于第一部件和第二部件之间时,在该特定部件与第一部件或第二部件之间可以存在居间部件,也可以不存在居间部件。当描述到特定部件连接其它部件时,该特定部件可以与所述其它部件直接连接而不具有居间部件,也可以不与所述其它部件直接连接而具有居间部件。
本公开使用的所有术语(包括技术术语或者科学术语)与本公开所属领域的普通技术人员理解的含义相同,除非另外特别定义。还应当理解,在诸如通用字典中定义的术语应当被解释为具有与它们在相关技术的上下文中的含义相一致的含义,而不应用理想化或极度形式化的意义来解释,除非这里明确地这样定义。
对于相关领域普通技术人员已知的技术、方法和设备可能不作详细讨论,但在适当情况下,所述技术、方法和设备应当被视为说明书的一部分。
发明人注意到,在像素界定层形成的开口中打印发光材料时,形成的发光材料的厚度不均匀,这导致OLED的发光不均匀,从而影响OLED显示面板的显示效果。
发明人对上述问题进行了研究后,发现:在对像素界定层进行固化后,像素界定层的上表面的疏液性较强,但是像素界定层的开口的侧面的疏液性较弱。因此,在像素界定层的开口中打印发光材料时,墨水容易在开口的侧面向上攀爬,从而使得打印形成的发光材料的厚度不均匀。
据此,本公开实施例提供了如下技术方案。
图1是根据本公开一个实施例的像素界定结构的结构示意图。
如图1所示,像素界定结构包括位于基板101上的像素界定层102。像素界定层102的厚度例如可以是0.5微米-5微米,例如2微米、4微米等。
基板101上可以形成有电极103,例如阳极。不同的电极103可以由像素界定层102间隔开。应理解,基板101中还可以形成有薄膜晶体管(TFT)阵列、电容器、电阻器、布线(图中未示出)、平坦化层等。像素界定层102和电极103位于平坦化层上。
像素界定层102例如可以具有开口104,开口104使得电极103的上表面的至少一部分露出。图1示出的是开口104使得电极103的上表面的全部露出的情况。在某些情况下,开口104可以使得电极103的上表面的一部分露出,例如,像素界定层102可以覆盖电极103的上表面的一部分。在一些实施例中,像素界定层102的形状可以为网状,即像素界定层102具有多个开口104。
像素界定层102包括叠置的多层。这里,叠置的多层至少包括第一层112和第二 层122,第一层112位于基板101和第二层122之间。第二层122中疏液材料的质量百分比高于第一层112中疏液材料的质量百分比。在一些实施例中,第二层122在基板101上的投影在第一层112在基板101上的投影之内。应理解,像素界定层102的材料除了包含疏液材料外,还可以包含其他材料,例如聚酰亚胺(PI)和聚甲基丙烯酸甲酯(PMMA)中的至少一种等。
在一些实施例中,叠置的多层可以仅包括第一层112和第二层122。这种情况下,相对靠上的第二层122包含的疏液材料的质量百分比高于相对靠下的第一层112包含的疏液材料的质量百分比。
在另一些实施例中,叠置的多层除了包括第一层112和第二层122外,还可以包括其他层,例如位于第一层112和第二层122之间的第三层132等。这里,叠置的多层中的其他层中疏液材料的质量百分比可以高于第二层122中疏液材料的质量百分比,也可以低于第一层112中疏液材料的质量百分比,还可以介于第二层122中疏液材料的质量百分比与第一层112中疏液材料的质量百分比之间。
在一些实施例中,疏液材料可以包括下列中的一种或多种:含氟的聚合物材料、含氯的聚合物材料。含氟的聚合物材料例如可以包括聚偏氟乙烯(PVDF)等。含氯的聚合物材料例如可以包括氯化聚乙烯等。在一个或多个实施例中,疏液材料可以是具有疏水基团的材料。
上述实施例中,相对靠上的第二层的疏液材料的质量百分比高于相对靠下的第一层中疏液材料的质量百分比,使得后续在像素界定层的开口中打印发光材料时,溶液不容易从开口的侧面向上攀爬,从而可以提高发光材料厚度的均匀性。
在一些实施例中,在从靠近基板101到远离基板101的方向上(即,在从下到上的方向上),叠置的多层中每一层包含的疏液材料的质量百分比逐渐升高。参见图1,以叠置的多层包括三层为例,第一层112、第三层132、第二层122中疏液材料的质量百分比逐渐升高。
上述实施例中,像素界定层从下到上的疏液材料的质量百分比逐渐升高。这使得后续在像素界定层的开口中打印发光材料时,溶液更不容易从开口的侧面向上攀爬,从而可以进一步提高发光材料厚度的均匀性。
在一个或多个实施例中,叠置的多层包括3层至6层,例如4层、5层。这样的像素界定层102使得在像素界定层102的开口中打印发光材料时,溶液更不容易从开口的侧面向上攀爬,从而可以更进一步提高发光材料厚度的均匀性。
本公开实施例提供了一种显示面板,包括上述任意一个实施例提供的像素界定结构300。
在一些实施例中,显示面板还包括图1示出的基板101和设置在基板101上的电极103。像素界定层102具有开口104,开口104使得电极103的上表面的至少一部分露出。
图2是根据本公开一个实施例的显示面板的制造方法的流程示意图。图3A-3D是根据本公开一些实施例的在形成显示面板的不同阶段所形成的结构的截面示意图。
以下结合图2、图3A-3D对显示面板的制造过程进行详细介绍。
首先,在步骤202,提供基板101,如图3A所示。
在一些实施例中,在提供基板101后,可以基板101上形成电极103。在一些实施例中,电极103的材料可以是氧化铟锡(ITO)或包括ITO的叠层。
然后,在步骤204,在基板101上形成图案化的掩模层301,如图3B所示。
例如,可以先在基板101上涂覆掩模材料层,例如光致抗蚀剂层。然后,对掩模材料层进行图案化,例如曝光、显影,从而形成图案化的掩模层301。在基板101上形成有电极103的情况下,掩模层301覆盖电极103的上表面的至少一部分,即一部分或全部。图3B示出的是掩模层301覆盖电极103的上表面的全部的情况。在一些实施例中,掩模层301的厚度可以为1微米-5微米,例如,2微米-4微米,例如3微米等。
接下来,在步骤206,在基板101未形成掩模层301的区域形成像素界定层102,如图3C所示。像素界定层102包括叠置的多层,该多层至少包括第一层112和第二层122,第一层112位于基板101和第二层122之间。第二层122中疏液材料的质量百分比高于第一层112中疏液材料的质量百分比。例如,疏液材料可以包括下列中的一种或多种:含氟的聚合物材料、含氯的聚合物材料。
在一些实施例中,可以通过喷墨打印工艺形成像素界定层102。
在一些实现方式中,如图3C所示,可以将包含疏液材料的第一溶液打印在基板101未形成掩模层301的区域,以形成第一层112;然后将包含疏液材料的第二溶液打印第一层112上,以形成位于第一层112上方的第二层122。这里,第二溶液中疏液材料的质量百分比高于第一溶液中疏液材料的质量百分比,从而使得形成的第二层122中疏液材料的质量百分比高于第一层112中疏液材料的质量百分比。
需要说明的是,在形成第一层112之前,或者在形成第一层112和形成第二层122 之间,或者在形成第二层122之后,还可以将包含疏液材料的其他溶液打印在基板101未形成掩模层301的区域,以形成其他层,例如图3C所示的第三层132。
在某些实施例中,可以依次将疏液材料的质量百分比从低到高的多种溶液打印在基板101未形成掩模层301的区域,以形成像素界定层102的多层,多层中每一层中疏液材料的质量百分比从下向上逐渐升高。参见图3C,例如,多层从下向上依次包括第一层112、第三层132和第二层122。应理解,多层可以包括不止三层,例如,多层可以包括4层、5层或6层。
在一些实施例中,用于形成像素界定层102的多种溶液中的每一种溶液中的疏液材料与溶质材料的质量比小于或等于1。在一些实施例中,溶液的粘度可以为1cP-1000cP,例如10cP-800cP,例如,30Cp、400cP等。
之后,在步骤208,去除掩模层301。在去除掩模层301后,限定了像素界定层102的开口104(参见图1)。
在一些实施例中,在去除掩模层301后,还可以在像素界定层102的开口中打印发光材料,例如有机发光材料。
图4是根据本公开一个实施例的显示面板的结构示意图。
如图4所示,显示面板400可以包括上述任意一个实施例的像素界定结构300。由于像素界定层中相对靠上的第二层中疏液材料的质量百分比高于相对靠下的第一层中疏液材料的质量百分比,可以提高后续形成的发光材料厚度的均匀性,进而可以提高显示面板的显示效果。
图5是根据本公开一个实施例的显示装置的结构示意图。
如图5所示,显示装置500可以包括上述任意一个实施例的显示面板400。在一些实施例中,显示装置例如可以是移动终端、电视机、显示器、笔记本电脑、数码相框、导航仪、电子纸等任何具有显示功能的产品或部件。
至此,已经详细描述了本公开的各实施例。为了避免遮蔽本公开的构思,没有描述本领域所公知的一些细节。本领域技术人员根据上面的描述,完全可以明白如何实施这里公开的技术方案。
虽然已经通过示例对本公开的一些特定实施例进行了详细说明,但是本领域的技术人员应该理解,以上示例仅是为了进行说明,而不是为了限制本公开的范围。本领域的技术人员应该理解,可在不脱离本公开的范围和精神的情况下,对以上实施例进行修改或者对部分技术特征进行等同替换。本公开的范围由所附权利要求来限定。

Claims (21)

  1. 一种像素界定结构,包括:
    位于基板上的像素界定层,所述像素界定层包括叠置的多层,所述多层至少包括第一层和第二层,所述第一层位于所述基板和所述第二层之间;
    其中,所述第二层中疏液材料的质量百分比高于所述第一层中疏液材料的质量百分比。
  2. 根据权利要求1所述的像素界定结构,其中,在从靠近所述基板到远离所述基板的方向上,所述多层中每一层中疏液材料的质量百分比逐渐升高。
  3. 根据权利要求1所述的像素界定结构,其中,除所述疏液材料之外,所述像素界定层还包括聚酰亚胺和聚甲基丙烯酸甲酯中的至少一种。
  4. 根据权利要求1所述的像素界定结构,其中,所述像素界定层的形状为网状。
  5. 根据权利要求1所述的像素界定结构,其中,所述第二层在所述基板上的投影在所述第一层在所述基板上的投影之内。
  6. 根据权利要求1所述的像素界定结构,其中,所述像素界定层的厚度范围为0.5微米-5微米。
  7. 根据权利要求1所述的像素界定结构,其中,所述多层包括3层至6层。
  8. 根据权利要求1-7任意一项所述的像素界定结构,其中,所述疏液材料包括下列中的一种或多种:含氟的聚合物材料、含氯的聚合物材料。
  9. 一种显示面板,包括:权利要求1-8任意一项所述的像素界定结构。
  10. 根据权利要求9所述的显示面板,还包括:
    基板;和
    设置在所述基板上的电极,其中,所述像素界定层具有开口,所述开口使得所述电极的上表面的至少一部分露出。
  11. 一种显示装置,包括:权利要求9或10所述的显示面板。
  12. 一种显示面板的制造方法,包括:
    提供基板;
    在所述基板上形成图案化的掩模层;
    在所述基板未形成所述掩模层的区域上形成像素界定层,所述像素界定层包括叠置的多层,所述多层至少包括第一层和第二层,所述第一层位于所述基板和所述第二层之间,其中,所述第二层中疏液材料的质量百分比高于所述第一层中疏液材料的质量百分比;和
    去除所述掩模层。
  13. 根据权利要求12所述的方法,其中,通过喷墨打印工艺形成所述像素界定层。
  14. 根据权利要求13所述的方法,其中,通过喷墨打印工艺形成所述像素界定层包括:
    将包含疏液材料的第一溶液打印在所述基板未形成所述掩模层的区域,以形成所述第一层;
    将包含疏液材料的第二溶液打印在所述第一层上,以形成所述第二层,其中,所述第二溶液中疏液材料的质量百分比高于所述第一溶液中疏液材料的质量百分比。
  15. 根据权利要求14所述的方法,其中,通过喷墨打印工艺形成所述像素界定层包括:
    依次将疏液材料的质量百分比从低到高的多种溶液打印在所述基板未形成所述掩模层的区域,以形成所述多层,所述多种溶液包括所述第一溶液和所述第二溶液。
  16. 根据权利要求15所述的方法,其中,所述多种溶液中的每一种溶液中的疏液材料与溶质材料的质量比小于或等于1。
  17. 根据权利要求12所述的方法,其中,在形成所述掩模层之前,所述方法还包括:
    在所述基板上形成电极,所述掩模层覆盖所述电极的上表面的至少一部分。
  18. 根据权利要求17所述的方法,其中,在去除所述掩模层后,所述方法还包括:
    在所述像素界定层的开口中打印发光材料。
  19. 根据权利要求12所述的方法,其中,所述在所述基板上形成图案化的掩模层包括:
    在所述基板上形成光致抗蚀剂层;
    对所述光致抗蚀剂层进行曝光和显影,以形成所述掩模层。
  20. 根据权利要求12所述的方法,其中,所述多层包括3层至6层。
  21. 根据权利要求12-20任意一项所述的方法,其中,所述疏液材料包括下列中的一种或多种:含氟的聚合物材料、含氯的聚合物材料。
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