WO2020001121A1 - 一种封装结构、显示面板、显示装置及其制作方法 - Google Patents
一种封装结构、显示面板、显示装置及其制作方法 Download PDFInfo
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- WO2020001121A1 WO2020001121A1 PCT/CN2019/081510 CN2019081510W WO2020001121A1 WO 2020001121 A1 WO2020001121 A1 WO 2020001121A1 CN 2019081510 W CN2019081510 W CN 2019081510W WO 2020001121 A1 WO2020001121 A1 WO 2020001121A1
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- layer
- photocatalytic
- display panel
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- absorbing layer
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Images
Classifications
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/84—Passivation; Containers; Encapsulations
- H10K50/846—Passivation; Containers; Encapsulations comprising getter material or desiccants
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J20/00—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof
- B01J20/22—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof comprising organic material
- B01J20/223—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof comprising organic material containing metals, e.g. organo-metallic compounds, coordination complexes
- B01J20/226—Coordination polymers, e.g. metal-organic frameworks [MOF], zeolitic imidazolate frameworks [ZIF]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/84—Passivation; Containers; Encapsulations
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J21/00—Catalysts comprising the elements, oxides, or hydroxides of magnesium, boron, aluminium, carbon, silicon, titanium, zirconium, or hafnium
- B01J21/06—Silicon, titanium, zirconium or hafnium; Oxides or hydroxides thereof
- B01J21/063—Titanium; Oxides or hydroxides thereof
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
- B01J23/06—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of zinc, cadmium or mercury
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J27/00—Catalysts comprising the elements or compounds of halogens, sulfur, selenium, tellurium, phosphorus or nitrogen; Catalysts comprising carbon compounds
- B01J27/24—Nitrogen compounds
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J35/00—Catalysts, in general, characterised by their form or physical properties
- B01J35/30—Catalysts, in general, characterised by their form or physical properties characterised by their physical properties
- B01J35/39—Photocatalytic properties
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/84—Passivation; Containers; Encapsulations
- H10K50/842—Containers
- H10K50/8423—Metallic sealing arrangements
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/84—Passivation; Containers; Encapsulations
- H10K50/844—Encapsulations
- H10K50/8445—Encapsulations multilayered coatings having a repetitive structure, e.g. having multiple organic-inorganic bilayers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/10—Organic polymers or oligomers
- H10K85/141—Organic polymers or oligomers comprising aliphatic or olefinic chains, e.g. poly N-vinylcarbazol, PVC or PTFE
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/30—Coordination compounds
- H10K85/381—Metal complexes comprising a group IIB metal element, e.g. comprising cadmium, mercury or zinc
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K2102/00—Constructional details relating to the organic devices covered by this subclass
- H10K2102/301—Details of OLEDs
- H10K2102/351—Thickness
Definitions
- the present disclosure relates to the field of display technology, and particularly to a packaging structure, a display panel, a display device, and a manufacturing method thereof.
- OLEDs Organic electroluminescence devices
- OLEDs are widely used because they have the advantages of self-luminous, high contrast, and can be used in flexible panels. Because the materials used to make OLEDs are particularly sensitive to oxygen and water vapor, they are easily eroded by oxygen and water vapor and lose their normal performance. Therefore, before using OLEDs, the OLEDs need to be packaged.
- the following methods are mainly used to package the OLED: glass is selected as the substrate, and glass or metal is selected as the cover plate, and the substrate and the cover plate after the box are sealed with an adhesive such as epoxy resin, so Packaging of OLEDs on a substrate.
- an adhesive such as epoxy resin
- the present disclosure provides a display panel to solve the problems of poor barrier properties of an adhesive such as epoxy resin to oxygen and water vapor in the background art, resulting in poor packaging effect of the OLED and short service life of the OLED.
- a display panel which includes a substrate, an organic electroluminescent device, and an absorption layer;
- the organic electroluminescent device is disposed on the substrate;
- the absorption layer covers the organic electroluminescence device and the substrate, and the organic electroluminescence device is packaged in a space formed by the absorption layer and the substrate.
- the absorption layer includes an oxygen absorption layer and a photocatalytic layer for catalyzing water decomposition
- the photocatalytic layer covers the organic electroluminescent device and the substrate around it, and the oxygen absorbing layer covers the photocatalytic layer and the substrate around it.
- the absorption layer further includes a hydrogen absorption layer, the hydrogen absorption layer covers the organic electroluminescence device and the surrounding substrate, and the photocatalytic layer covers the hydrogen absorption layer and On the substrate around it, the oxygen absorbing layer covers the photocatalytic layer and the substrate around it.
- the absorption layer includes at least two layers of the photocatalytic layer and at least two layers of the oxygen absorbing layer;
- the photocatalytic layer and the oxygen absorbing layer are alternately stacked.
- a material of the photocatalytic layer is a semiconductor photocatalytic material, and a band gap of the semiconductor photocatalytic material is greater than 1.23eV.
- the semiconductor photocatalytic material includes at least one of a titanium dioxide composite material, a zinc oxide composite material, and a carbon nitride composite material.
- the material of the hydrogen absorbing layer is a hydrogen storage material.
- the hydrogen storage material includes metal-organic frameworks (MOFs).
- MOFs metal-organic frameworks
- the metal-organic framework is a MOFs material centered on ZnO 4 .
- the metal-organic framework is MOF-5 (Zn 4 O (BDC) 3 , wherein BDC is 1,4 terephthalate.
- the metal-organic framework is MOF-177 (Zn 4 O (BTB) 2 , wherein BTB is 1,3,5-benzenetribenzoate.
- the thickness of the photocatalytic layer is about 0.3-0.5 ⁇ m.
- the material of the oxygen absorbing layer includes at least one of an organic polyester-based material and iron powder.
- the thickness of the oxygen absorbing layer is about 0.6-1 ⁇ m.
- a display device which includes the display panel described above.
- a method for manufacturing a display panel as described above includes:
- the absorption layer includes an oxygen absorption layer and a photocatalytic layer for catalyzing water decomposition, and the step of forming an absorption layer on the organic electroluminescent device and the substrate for absorbing external substances includes:
- the oxygen absorbing layer is formed, and the oxygen absorbing layer covers the photocatalytic layer and the substrate around it.
- the step of forming the photocatalytic layer further includes:
- a hydrogen absorbing layer is formed, the hydrogen absorbing layer is located on a surface of the photocatalytic layer away from the oxygen absorbing layer, and the hydrogen absorbing layer covers the organic electroluminescent device and the surrounding substrate, and the light A catalytic layer covers the hydrogen absorbing layer and the substrate around it.
- the forming the photocatalytic layer includes:
- the forming the oxygen absorbing layer includes:
- the vapor absorption method or the magnetron sputtering method is used to form the oxygen absorbing layer.
- a material of the photocatalytic layer is a semiconductor photocatalytic material
- a band gap width of the semiconductor photocatalytic material is greater than 1.23eV
- a material of the oxygen absorbing layer includes at least one of an organic polyester material and iron powder.
- the thickness of the photocatalytic layer is about 0.3-0.5 ⁇ m, and the thickness of the oxygen-absorbing layer is about 0.6-1 ⁇ m.
- FIG. 1 is a schematic structural diagram of a first display panel according to an embodiment of the present disclosure
- FIG. 2 is a working schematic diagram of a display panel provided by an embodiment of the present disclosure
- FIG. 3 is a schematic structural diagram of a second display panel according to an embodiment of the present disclosure.
- FIG. 4 is a schematic structural diagram of a third display panel according to an embodiment of the present disclosure.
- FIG. 5 is a schematic structural diagram of a fourth display panel according to an embodiment of the present disclosure.
- FIG. 6 is a method flowchart of a method for manufacturing a first display panel according to an embodiment of the present disclosure
- FIG. 7 is a method flowchart of a method for manufacturing a second display panel according to an embodiment of the present disclosure.
- Substrate 1.
- Organic light emitting device 3.
- Photocatalytic layer 4.
- Oxygen-absorbing layer 5.
- Hydrogen-absorbing layer
- An embodiment of the present disclosure provides a display panel including a substrate, an organic electroluminescent device, and an absorption layer, wherein the organic electroluminescent device is disposed on the substrate, and the absorption layer covers the organic electroluminescent device and the substrate. , The organic electroluminescence device is packaged in the absorption layer and the substrate forming space.
- the embodiment of the present disclosure proposes a packaging design concept of actively consuming foreign substances.
- An absorption layer is introduced into a display panel.
- the absorption layer actively absorbs foreign substances, eliminates foreign substances from the source, and effectively isolates the foreign substances from contact with the organic electroluminescent device.
- the arrangement of the visible absorption layer ensures the stable performance of the organic electroluminescent device, so that the organic electroluminescent device has a longer service life.
- the absorbing layer has a function of absorbing external substances, and the type of the absorbing layer can be provided according to the type of external substances that need to be absorbed.
- the absorbing layer may include an oxygen absorbing layer and a photocatalytic layer, wherein the oxygen absorbing layer has a function of absorbing oxygen, and the photocatalytic layer has a function of catalyzing water decomposition.
- the display panel includes a substrate 1 and an organic electrolyte.
- Light-emitting device 2, photocatalytic layer 3, and oxygen-absorbing layer 4 organic electroluminescent device 2 is disposed on substrate 1; photocatalytic layer 3 covers organic electroluminescent device 2 and a liner adjacent to organic electroluminescent device 2.
- the organic electroluminescent device 2 is enclosed in a space formed by the photocatalytic layer 3 and the substrate 1.
- the oxygen absorbing layer 4 covers the photocatalytic layer 3 and the substrate 1 adjacent to the photocatalytic layer 3.
- the electroluminescent device 2 and the photocatalytic layer 3 are encapsulated in a space formed by the oxygen absorbing layer 4 and the substrate 1.
- the visible light emitted by the organic electroluminescent device 2 is irradiated to the photocatalytic layer 3.
- the oxygen and water vapor outside the display panel reach the display panel shown in FIG. 1, the oxygen and water vapor First contact the oxygen absorbing layer 4, the oxygen absorbing layer 4 absorbs oxygen, water vapor passes through the oxygen absorbing layer 4 to reach the photocatalytic layer 3, and the photocatalytic layer 3 catalyzes the decomposition of water vapor under the irradiation of visible light to generate oxygen and hydrogen.
- the oxygen absorbing layer 4 absorbs.
- the photocatalytic layer 3 is composed of a catalyst. Based on the characteristic that the catalyst does not participate in the reaction, there is no problem of catalyst failure.
- the photocatalytic layer can always protect the organic electroluminescent device from water.
- the catalyst does not change its chemical properties before and after the reaction, and can be reused. Therefore, the use of a photocatalytic layer to make a display panel conforms to the concept of green environmental protection.
- the oxygen absorbing layer 4 has an oxygen absorbing function, and can absorb external oxygen and photocatalytic oxygen, and protect the organic electroluminescent device 2 from oxygen.
- the material of the photocatalytic layer may be a semiconductor photocatalytic material.
- the band gap of the semiconductor photocatalytic material is limited to be greater than 1.23eV.
- different metals such as Pt, etc.
- metal oxides such as RuO 2 etc.
- active sites promote hydrogen and oxygen to escape from different active sites on the catalyst surface. Because hydrogen and oxygen have a certain overpotential when they are precipitated on different metals or metal oxides, the forbidden band width of the semiconductor photocatalytic material can be selected to be more than 2.0-2.2eV.
- the titanium dioxide composite material may be a titanium dioxide-based composite material.
- the composite material of zinc oxide may be a composite material with zinc oxide as the main agent.
- the semiconductor photocatalytic material may be a composite material using titanium dioxide as a main agent.
- the thickness of the photocatalytic layer may be 0.3-0.5 ⁇ m.
- the material type and layer thickness of the photocatalytic layer can be set according to the actual situation.
- the material of the oxygen absorbing layer can be organic polyester materials.
- Organic polyester materials contain active groups such as double bonds and hydroxyl groups on the main chain or side chains, or organic polyester materials contain active methylene in the main chain. base.
- olefin copolymer polyisoprene, polybutadiene, nylon 6 (also known as polyamide-6), polyadipyl metaphenylene diamine (MXD6), (ethylene / vinyl alcohol) copolymer (E / VAL) and so on.
- the active iron powder can be used as the material of the oxygen absorbing layer.
- the active iron powder can be used as the main agent, carbon powder, sodium salt, halide and the like as the compound, and the active iron powder and the compound can be used to make the oxygen absorbing layer.
- the thickness of the oxygen-absorbing layer may be selected from 0.6 to 1 ⁇ m.
- the material type and layer thickness of the oxygen absorbing layer can be set according to the actual situation.
- the material can be selected so that the oxygen-absorbing layer has a smaller thickness when meeting the requirements for absorbing oxygen, and the photocatalytic layer has a smaller thickness when meeting the requirements for catalytically decomposed water.
- the use of a smaller thickness of the absorbing layer and the photocatalytic layer to make the display panel makes the display panel have the advantages of small size and the like, which is beneficial to the light and thin design of the display panel.
- the photocatalytic layer catalyzes the decomposition of water to generate hydrogen.
- the present disclosure adds hydrogen absorption to the display panel.
- Layer for absorbing hydrogen can be set according to the actual location, for example, the hydrogen absorbing layer is arranged on the side of the photocatalytic layer facing away from the oxygen absorbing layer.
- the material used to make the hydrogen absorbing layer is a hydrogen storage material.
- hydrogen storage materials such as metal-organic frameworks (MOFs).
- MOFs metal-organic frameworks
- This type of hydrogen storage material has low density, large specific surface area, and high porosity.
- the advantage is that the structure and pore size of the metal-organic framework can be controlled by assembly.
- metal-organic frameworks For example, the ZnO 4 tetrahedron material is a MOFs material at the center of a metal cluster.
- MOF-5 Zn 4 O (BDC) 3 material, where BDC is 1,4-terephthalate
- MOF-177 Zn 4 O (BTB) 2 , where BTB is 1, 3, 5 -Benzotribenzoate, etc.
- the type of hydrogen storage material can be selected according to the actual situation.
- the absorption layer provided in the embodiment of the present disclosure may include at least two photocatalytic layers and at least two oxygen absorbing layers, at least two photocatalytic layers and at least two oxygen absorbing layers.
- the layers are arranged alternately.
- the arrangement of multiple oxygen absorbing layers improves the absorption performance of oxygen
- the arrangement of multiple photocatalytic layers improves the catalytic decomposition performance of water vapor, thereby effectively improving the effect of the oxygen absorbing layer and the photocatalytic layer on the organic electroluminescent device.
- the packaging effect ensures the working performance of the organic electroluminescent device.
- the material types and thicknesses of the at least two photocatalytic layers may be the same or different.
- the material types and thicknesses of the at least two oxygen absorbing layers may be the same or different. Based on the packaging design ideas provided by the embodiments of the present disclosure, the material type, thickness, and number of layers of the photocatalytic layer and the absorbing layer can be set according to the actual situation.
- the display panel includes two photocatalytic layers 3 and two oxygen absorbing layers 4.
- the two photocatalytic layers 3 and two oxygen absorbing layers 4 are alternately stacked to form a photocatalytic layer 3- oxygen absorbing layer.
- the multilayer protective structure of the 4-photocatalytic layer 3-the oxygen absorbing layer 4 has a better packaging effect than the display panel shown in FIG. 1.
- the display panel includes two photocatalytic layers 3, two oxygen absorbing layers 4 and one hydrogen absorbing layer 5, and the two photocatalytic layers 3 and two oxygen absorbing layers 4 are alternately stacked on the hydrogen absorbing layer 5.
- the arrangement constitutes a multilayer protective structure of hydrogen absorbing layer 5-photocatalytic layer 3-oxygen absorbing layer 4-photocatalytic layer 3-oxygen absorbing layer 4, compared with the display panel shown in FIG.
- the display panel has a better packaging effect.
- An embodiment of the present disclosure further provides a display panel including the display panel provided above in the embodiments of the present disclosure.
- An embodiment of the present disclosure further provides a display device, including the display panel provided above in the embodiments of the present disclosure.
- the display device has the advantages of a display panel, and the advantages of the display device are not described herein again.
- the embodiment of the present disclosure also provides a method for manufacturing a display panel, which is used for manufacturing the display panel provided by the embodiment of the present disclosure.
- a method for manufacturing a display panel according to an embodiment of the present disclosure includes:
- Step 101 Provide a substrate.
- a substrate When manufacturing a display panel, a substrate is first provided.
- the substrate may be manufactured in advance, or it may be manufactured according to needs when the display panel is manufactured.
- the substrate may be a glass substrate based on the kind of manufacturing material.
- Step 102 forming an organic electroluminescent device on the substrate.
- An organic electroluminescent device mainly includes an anode, an organic light emitting material layer, and a cathode.
- the step of forming an organic electroluminescent device on a substrate may include: forming an anode on a substrate, forming an organic light emitting material layer on the anode, and organic light emitting A cathode is formed on the material layer.
- the specific process of making the anode, the organic light-emitting material layer, and the cathode can be set according to the actual situation.
- Step 103 An absorption layer including an oxygen absorption layer and a photocatalytic layer is formed on the organic electroluminescence device and the substrate, and the organic electroluminescence device is packaged in a space formed by the absorption layer and the substrate.
- an absorption layer for decomposing water vapor and absorbing external oxygen and oxygen generated by water vapor decomposition is formed.
- the absorption layer covers the organic electroluminescence device and the substrate, and the organic electroluminescence
- the electroluminescent device is packaged in a space formed by the absorption layer and the substrate.
- the absorption layer has the function of absorbing external oxygen.
- the arrangement of the absorption layer prevents the invasion of external oxygen and prevents the organic electroluminescent device from being attacked by external oxygen. This ensures that the performance of the organic electroluminescent device is stable and makes the organic electroluminescent device relatively stable. Long service life.
- the absorbing layer may include an oxygen absorbing layer and a photocatalytic layer for catalyzing water decomposition.
- the step of forming an absorption layer for absorbing external substances on the organic electroluminescent device and the substrate may include: forming a photocatalytic layer, the photocatalytic layer covering the organic electroluminescent device and the On the surrounding substrate; an oxygen absorbing layer is formed, and the oxygen absorbing layer covers the absorbing layer and the surrounding substrate.
- a photocatalytic layer such as a vapor deposition process, a magnetron sputtering process (Sputter), and the like.
- the vapor deposition process may include a variety of processes, such as a plasma enhanced chemical vapor deposition process (PECVD).
- PECVD plasma enhanced chemical vapor deposition process
- oxygen absorbing layer such as a vapor deposition process and a magnetron sputtering process.
- the photocatalytic layer and the oxygen absorbing layer can also be made by other applicable processes.
- the embodiment of the present disclosure also provides another method for manufacturing a display panel, which is used for manufacturing the display panel provided by the embodiment of the present disclosure.
- a method for manufacturing a display panel provided by an embodiment of the present disclosure includes:
- Step 101 Provide a substrate.
- a substrate When manufacturing a display panel, a substrate is first provided.
- the substrate may be manufactured in advance, or it may be manufactured according to needs when the display panel is manufactured. Based on the type of manufacturing materials, the substrate can be divided into glass substrates and the like.
- Step 102 forming an organic electroluminescent device on the substrate.
- An organic electroluminescent device mainly includes an anode, an organic light emitting material layer, and a cathode.
- the step of forming an organic electroluminescent device on a substrate may include: forming an anode on a substrate, forming an organic light emitting material layer on the anode, and organic light emitting A cathode is formed on the material layer.
- the specific process of making the anode, the organic light-emitting material layer, and the cathode can be set according to the actual situation.
- Step 103 An absorption layer including a hydrogen absorption layer, a photocatalytic layer and an oxygen absorption layer is formed on the organic electroluminescence device and the substrate, and the organic electroluminescence device is encapsulated in a space formed by the absorption layer and the substrate.
- the present disclosure provides a display panel, a display device, and a manufacturing method thereof.
- the display panel provided by the present disclosure includes a substrate, an organic electroluminescence device, and an absorption layer for absorbing external substances.
- the organic electroluminescence device is encapsulated in a space formed by the absorption layer and the substrate. Absorption prevents external substances from coming into contact with organic electroluminescent devices and prevents organic electroluminescent devices from being corroded by external materials. Therefore, the setting of the absorption layer ensures the stable performance of organic electroluminescent devices, which makes organic electroluminescent devices have a Service life.
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Abstract
Description
Claims (19)
- 一种显示面板,包括衬底、有机电致发光器件以及吸收层;所述有机电致发光器件设置在所述衬底上;所述吸收层覆盖在所述有机电致发光器件和所述衬底上;其中,所述吸收层包括吸氧层和用于催化水分解的光催化层;所述光催化层覆盖在所述有机电致发光器件及其周围的所述衬底上,所述吸氧层覆盖在所述光催化层及其周围的所述衬底上。
- 根据权利要求1所述的显示面板,其中,所述吸收层还包括吸氢层,所述吸氢层覆盖在所述有机电致发光器件及其周围的所述衬底上,所述光催化层覆盖在所述吸氢层及其周围的所述衬底上。
- 根据权利要求1或2所述的显示面板,其中,所述吸收层包括至少两层所述光催化层和至少两层所述吸氧层;所述光催化层和所述吸氧层交替层叠设置。
- 根据权利要求1-3任一项所述的显示面板,其中,所述光催化层的材料为半导体光催化材料,所述半导体光催化材料的禁带宽度大于1.23eV。
- 根据权利要求4所述的显示面板,其中,所述半导体光催化材料包括二氧化钛的复合材料、氧化锌的复合材料和氮化碳的复合材料中的至少一种。
- 根据权利要求2所述的显示面板,其中,所述吸氢层的材料为储氢材料。
- 根据权利要求6所述的显示面板,其中,所述储氢材料包括金属-有机框架物(MOFs)。
- 根据权利要求7所述的显示面板,其中,金属-有机框架物为以ZnO 4为中心的MOFs材料。
- 根据权利要求8所述的显示面板,其中,所述金属-有机框架物为MOF-5(Zn 4O(BDC) 3,其中,BDC为1,4对苯二甲酸盐。
- 根据权利要求8所述的显示面板,其中,所述金属-有机框架物为MOF-177(Zn 4O(BTB) 2,其中,BTB为1,3,5-苯三安息香酸盐。
- 根据权利要求5所述的显示面板,其中,所述光催化层的厚度约为 0.3-0.5μm。
- 根据权利要求1所述的显示面板,其中,所述吸氧层的材料包括有机聚酯类材料和铁粉中的至少一种。
- 根据权利要求12所述的显示面板,其中,所述吸氧层的厚度约为0.6-1μm。
- 一种显示装置,包括权利要求13所述的显示面板。
- 一种如权利要求1-13任一项所述的显示面板的制作方法,所述方法包括:提供衬底;在所述衬底上形成有机电致发光器件;在所述有机电致发光器件和所述衬底上形成吸收层;其中,所述吸收层包括吸氧层和用于催化水分解的光催化层,所述在所述有机电致发光器件和所述衬底上形成吸收层的步骤包括:形成所述光催化层,所述光催化层覆盖在所述有机电致发光器件及其周围的所述衬底上;形成所述吸氧层,所述吸氧层覆盖在所述光催化层及其周围的所述衬底上。
- 根据权利要求15所述的显示面板的制作方法,其中,形成所述光催化层的步骤还包括:形成吸氢层,所述吸氢层位于所述光催化层远离吸氧层的表面,所述吸氢层覆盖在所述有机电致发光器件及其周围的所述衬底上,所述光催化层覆盖在所述吸氢层及其周围的所述衬底上。
- 根据权利要求16所述的显示面板的制作方法,其中,所述形成所述光催化层,包括:采用气相沉积法或磁控溅射法,形成所述光催化层;所述形成所述吸氧层,包括:采用气相沉积法或磁控溅射法,形成所述吸氧层。
- 根据权利要求17所述的显示面板的制作方法,其中,所述光催化 层的材料为半导体光催化材料,所述半导体光催化材料的禁带宽度大于1.23eV,所述吸氧层的材料包括有机聚酯类材料和铁粉中的至少一种。
- 根据权利要求18所述的显示面板的制作方法,其中,所述光催化层的厚度约为0.3-0.5μm,所述吸氧层的厚度约为0.6-1μm。
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