WO2019225470A1 - Film de persienne, dispositif source de lumière de surface et dispositif d'affichage à cristaux liquides - Google Patents

Film de persienne, dispositif source de lumière de surface et dispositif d'affichage à cristaux liquides Download PDF

Info

Publication number
WO2019225470A1
WO2019225470A1 PCT/JP2019/019486 JP2019019486W WO2019225470A1 WO 2019225470 A1 WO2019225470 A1 WO 2019225470A1 JP 2019019486 W JP2019019486 W JP 2019019486W WO 2019225470 A1 WO2019225470 A1 WO 2019225470A1
Authority
WO
WIPO (PCT)
Prior art keywords
light
liquid crystal
layer
openings
light source
Prior art date
Application number
PCT/JP2019/019486
Other languages
English (en)
Japanese (ja)
Inventor
恵 関口
高 玉田
晋也 渡邉
Original Assignee
富士フイルム株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 富士フイルム株式会社 filed Critical 富士フイルム株式会社
Publication of WO2019225470A1 publication Critical patent/WO2019225470A1/fr

Links

Images

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
    • B32B7/02—Physical, chemical or physicochemical properties
    • B32B7/023—Optical properties
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21—LIGHTING
    • F21S—NON-PORTABLE LIGHTING DEVICES; SYSTEMS THEREOF; VEHICLE LIGHTING DEVICES SPECIALLY ADAPTED FOR VEHICLE EXTERIORS
    • F21S2/00—Systems of lighting devices, not provided for in main groups F21S4/00 - F21S10/00 or F21S19/00, e.g. of modular construction
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21—LIGHTING
    • F21V—FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
    • F21V11/00—Screens not covered by groups F21V1/00, F21V3/00, F21V7/00 or F21V9/00
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements

Definitions

  • the present invention relates to a louver film, a surface light source device including the louver film, and a liquid crystal display device.
  • Liquid crystal display devices (hereinafter also referred to as LCDs (Liquid Crystal Displays)) have low power consumption and are increasingly used as space-saving image display devices year by year.
  • a liquid crystal display device is usually composed of a surface light source device and a liquid crystal panel.
  • the organic EL (Electro Luminescence) display device like the liquid crystal display device, has a low power consumption, and its application is expanding year by year as a space-saving image display device.
  • the various image display devices described above are generally required to have a wide viewing angle as viewing angle characteristics. However, depending on the installation location of the image display device, the display image of the image display device may be displayed in a place where it is not desired to be displayed.
  • the viewing angle of the image display device it is necessary to limit the viewing angle of the image display device.
  • the viewing angle is set so as not to be seen by others. Need to be restricted.
  • Patent Document 1 As a method for limiting the viewing angle described above, for example, there is an optical sheet used for illumination light path control in a display backlight unit disclosed in Patent Document 1.
  • the optical sheet of Patent Document 1 reflects light on a surface of a lenticular sheet having a lens portion in which convex cylindrical lens groups are formed in parallel and a surface on the opposite side of the lens portion, and a region including a non-condensing surface by the lens portion.
  • the lenticular sheet has a tangent line at a valley between adjacent unit lenses in a range of 35 to 60 ° at a boundary between adjacent unit lenses.
  • the aperture ratio of the opening and the distance from the opening to the lens are defined using equations.
  • Patent Document 1 as described above, the aperture ratio of the aperture and the distance from the aperture to the lens are defined using equations in order to reduce the sideband.
  • the louver film is a vehicle-mounted monitor, it is necessary to reduce not only the sideband but also the light leakage on the wide angle side.
  • the sideband cannot be reduced and the light leakage on the wide angle side cannot be reduced.
  • An object of the present invention is to provide a louver film, a surface light source device including the louver film, and a liquid crystal display device that eliminate the above-mentioned problems based on the prior art, maintain light utilization efficiency, and suppress light leakage on the wide-angle side. There is to do.
  • louver film Used in surface light source devices, A plurality of lenses arranged at a constant pitch on the light output side of the light source; A first support that is disposed closer to the light source than the lens and supports a plurality of lenses, the thickness being smaller than a certain pitch; and A light absorption layer that is disposed on the light source side of the first support and includes a plurality of first openings corresponding to the plurality of lenses; A light reflecting layer that is disposed closer to the light source than the light absorbing layer and includes a plurality of second openings corresponding to a plurality of lenses; The light absorption layer and the light reflection layer are arranged in a state where the plurality of first openings and the plurality of second openings are aligned, The light absorption layer has an opening ratio of the plurality of first openings of 25% to 50%, The light reflection layer has a reflectance of 90% or more, and the opening ratios of the plurality of second openings of the light
  • the louver film is a film with improved directivity, and in a liquid crystal display device provided with a surface light source device including this film, the directivity related to visibility is improved as compared with the case without this film, for example, It is a film that can suppress visual recognition from an oblique direction.
  • the film has a limited viewing angle and improved reflection in areas that are not desired to be displayed. The limitation on the viewing angle is that the viewing angle is visible in a certain angle range with respect to the louver film surface.
  • the luminance in a direction perpendicular to the surface of the louver film is used as a reference
  • the luminance in a direction inclined by 45 ° with respect to a line perpendicular to the surface of the louver film is lower than the reference luminance.
  • the viewing angle is limited near the front of the louver film.
  • the luminance in the direction inclined by 45 ° is higher than the reference luminance
  • the viewing angle is limited to the oblique direction of the louver film.
  • the light utilization efficiency mentioned above refers to a value measured by the following method.
  • ELDIM EZ-Contrast XL88
  • brightness in 1 ° increments from 0 ° (front direction) to 88 ° polar angle (Y0) Is measured, and the maximum luminance value is defined as the maximum luminance.
  • This maximum luminance is measured in a state where the louver film is not disposed on the surface light source device (T0) and in a state where the louver film is disposed (T), and the ratio (T / T0) is calculated to obtain the maximum luminance ratio.
  • T / T0 the ratio
  • the directivity mentioned above refers to a value evaluated by the following method.
  • EZ-Contrast XL88 manufactured by ELDIM
  • the S / N ratio is evaluated as a hem.
  • the larger the S / N ratio the better the hem and the higher the directivity.
  • the larger the S / N ratio the smaller the light leakage on the wide angle side.
  • the plurality of lenses are arranged two-dimensionally.
  • the first support has a thickness of 50% or less with respect to a constant pitch.
  • the further aspect of this invention is related with the surface light source device containing the above-mentioned louver film and a light source. In one mode, it has a reflective type polarizer arranged between a louver film and a light source.
  • the further aspect of this invention is related with the liquid crystal display device containing the above-mentioned louver film, a surface light source device, and a liquid crystal panel.
  • a louver film capable of maintaining light utilization efficiency and suppressing light leakage on the wide-angle side
  • a surface light source device including the louver film
  • a liquid crystal display device
  • FIG. 11 is a sectional view taken along line BB in FIG. 10. It is CC sectional view taken on the line of FIG. It is the DD sectional view taken on the line of FIG.
  • FIG. 1 is a schematic cross-sectional view showing a schematic configuration of a surface light source device according to an embodiment of the first aspect of the present invention.
  • a surface light source device 1 shown in FIG. 1 has a louver film 2.
  • the louver film of the present invention is used in a surface light source device, and is arranged at a constant pitch on the emission side of the light source 16 and a plurality of lenses arranged on the light source 16 side of the plurality of lenses 11. And a plurality of first openings corresponding to the plurality of lenses 11 disposed on the light source 16 side of the first support 12 and having a thickness smaller than a certain pitch.
  • the light absorption layer 18 and the light reflection layer 19 are disposed in a state where the one opening 18b and the plurality of second openings 19b are aligned, and the light absorption layer 18 includes the plurality of first openings.
  • the aperture ratio of the portion 18b is 25% to 50%, and light reflection 19 has a reflectance of 90% or more, and the aperture ratios of the plurality of second openings 19b of the light reflection layer 19 are larger than the aperture ratios of the plurality of first openings 18b of the light absorption layer 18.
  • the present invention relates to a louver film 2 having a ratio expressed by an aperture ratio of a plurality of first openings / an aperture ratio of a plurality of second openings of 65% to 99%.
  • the ratio represented by the aperture ratio of the plurality of first openings / the aperture ratio of the plurality of second openings is referred to as an aperture ratio.
  • the surface light source device 1 includes the louver film 2 described above, a diffusion plate 14 disposed on the light reflection layer 19 side of the louver film 2, a light source 16, and a reflection plate 15 in this order.
  • a first opening 18 b and a second opening 19 b are provided for each lens 11, and the first opening 18 b and the second opening 19 b are provided in one lens 11. Is provided.
  • louver film 2 of the above-described aspect enables further improvement in directivity with respect to visibility while maintaining the light utilization efficiency.
  • the thickness of the first support 12 is smaller than the pitch of the lenses 11, light from adjacent openings other than the openings on the optical axis CL of the lenses 11 is less likely to be guided, and the sidebands are reduced. Can be reduced.
  • the light absorbing layer 18 absorbs the light reflected by the lens or the light reflecting layer 19 or the like, or the light in which the light incident from the outside is repeatedly reflected in the first support 12, and the generation of stray light can be suppressed. Thereby, generation
  • a light absorption layer 18 is provided on the lens surface side of the light reflection layer 19 in order to eliminate light leakage on the wide angle side.
  • stray light generated between the lens 11 and the light reflecting layer 19 can be absorbed, and light leakage on the wide angle side can be reduced.
  • the aperture ratio of the light reflection layer 19 and the aperture ratio of the light absorption layer 18 are completely the same, the reflected light at the edge of the light reflection layer 19 enters the lens 11 and causes stray light. It was. By making the aperture ratio of the light absorption layer 18 smaller than the aperture ratio of the light reflection layer 19, stray light can be completely extinguished.
  • the louver film 2 can reduce sidebands, maintain light utilization efficiency, suppress light leakage on the wide-angle side, and realize further improvement in directivity regarding visibility.
  • a louver film is used for an in-vehicle monitor, reflection of an image on a windshield and a side glass can be suppressed.
  • the above includes inference by the present inventors and does not limit the present invention.
  • FIG. 2 is a schematic cross-sectional view schematically showing a first example of the louver film
  • FIG. 3 is a plan view schematically showing a first example of the louver film
  • FIG. 4 is a first view of the louver film. It is a top view which shows an example typically.
  • 3 is a plan view seen from the lens 11 side
  • FIG. 4 is a plan view seen from the light reflecting layer 19 side.
  • the configuration of the louver film When used in a surface light source device, the configuration of the louver film includes a plurality of lenses arranged on the light emission side of the light source, a first support disposed on the light source side of the lens, and the first support described above.
  • a light-absorbing layer having a first opening on the optical axes of the plurality of lenses arranged on the light source side of the body, and a light reflection having a second opening on the optical axes of the plurality of lenses.
  • the lens 11 is a hemispherical convex lens.
  • a plurality of lenses 11 are two-dimensionally arranged at a constant pitch Lp.
  • the first opening 18 b of the light absorption layer 18 and the second opening 19 b of the light reflection layer 19 are provided in alignment with respect to one lens 11. ing.
  • the center of the first opening 18b of the light absorption layer 18 and the center of the second opening 19b of the light reflecting layer 13 coincide with the optical axis CL (see FIG. 2) of the lens 11, but this It is not limited to.
  • the light absorption layer 18 is disposed closer to the light source 16 than the first support 12 and includes a plurality of first openings 18b corresponding to a plurality of lenses. In the light absorption layer 18, the aperture ratio of the plurality of first openings 18b is 25% to 50%.
  • the light reflection layer 19 is disposed on the light source 16 side of the light absorption layer 18 and is provided on the back surface 18c of the light absorption layer 18 on the opposite side of the first support 12 and includes a plurality of lenses corresponding to the plurality of lenses. A second opening 19b is provided.
  • the light reflection layer 19 has a reflectance of 90% or more.
  • the aperture ratio of the second opening 19b of the light reflecting layer 19 is larger than the aperture ratio of the plurality of first openings 18b of the light absorption layer 18, and the aperture ratio of the plurality of first openings / the plurality of second openings.
  • the ratio represented by the opening ratio of the opening is 65% to 99%.
  • the light absorption layer 18 and the light reflection layer 19 have the same opening pattern.
  • the light reflection layer 19 and the light absorption layer 18 are arranged in a state where the plurality of first openings 18b of the light absorption layer 18 and the plurality of second openings 19b of the light reflection layer 19 are aligned. Yes.
  • the second support 17 may be disposed closer to the light source 16 than the light reflecting layer 19.
  • the center of the first opening 18b of the light absorption layer 18 and the 13 second openings 19b of the light reflection layer are formed.
  • the center may be deviated from the optical axis CL of the lens 11.
  • the direction of directivity can be adjusted by setting the center position of the opening to a position shifted from the optical axis CL of the lens. Note that being off the optical axis CL of the lens 11 means that the optical axis CL does not pass through the center of the first opening 18 b of the light absorption layer 18.
  • the amount of deviation between the optical axis CL and the center of the first opening 18b and the second opening 19b is 5% or more with respect to the pitch of the lens, it is deviated from the optical axis CL of the lens 11.
  • “matching on the optical axis CL of the lens 11” means that the deviation amount between the optical axis CL and the center of the first opening 18b and the second opening 19b is 5% with respect to the pitch of the lens. Is less than.
  • All of the louver films 2 shown in FIG. 5 described above have a configuration in which the centers of all the openings are deviated from the optical axis CL of the lens 11, but are not limited thereto. For example, based on the relationship between the opening and the optical axis of the lens, which opening to remove from the optical axis of the lens may be determined in advance according to the direction of directivity or the like.
  • the lens is not limited to the hemispherical convex lens described above, and may be an aspheric lens.
  • the refractive index of the lens is preferably 1.4 to 1.6, more preferably 1.45 to 1.6 from the viewpoint of directivity.
  • the pitch Lp (see FIG. 2) and the radius of curvature of the two-dimensionally arranged lenses may be constant or random.
  • the lens pitch Lp is preferably twice the radius of curvature of the lens.
  • the thickness Dt (see FIG. 2) of the first support is smaller than the lens pitch Lp (see FIG. 2).
  • the lens pitch Lp (see FIG. 2) is constant, and the thickness Dt (see FIG. 2) of the first support is 50% or less with respect to the lens pitch Lp (see FIG. 2).
  • the sideband can be reduced.
  • the thickness is preferably 30 ⁇ m or less from the viewpoint of not deteriorating brittleness. More preferably, it is 10 ⁇ m or less, and more preferably around 1 ⁇ m.
  • the refractive index of the first support is preferably 1.4 to 1.6, more preferably 1.45 to 1.6 from the viewpoint of directivity.
  • the refractive index can be measured by a known refractive index measuring device.
  • a known refractive index measuring device there is a multi-wavelength Abbe refractometer DR-M2 manufactured by Atago Co., Ltd.
  • the refractive index in the present invention refers to a refractive index with respect to light having a wavelength of 550 nm.
  • the refractive index of the first support can be adjusted according to the type of components used to form the layer.
  • a component used in order to form a layer it can form using the polymeric composition containing a polymeric compound and a polymerization initiator.
  • the resin layer which has resin as a main component may be sufficient.
  • the main component means that the resin occupies most of the components constituting the layer.
  • the resin contained may be one kind or two or more kinds.
  • the resin amount in the resin layer is, for example, 50% by mass or more, preferably 70% by mass or more, with respect to the total mass of the resin layer.
  • the resin amount in the resin layer is based on the total mass of the resin layer. For example, it is 99 mass% or less, or 95 mass% or less, but may be 100 mass%.
  • the resin layer include a thermoplastic resin layer.
  • the thermoplastic resin include polymethyl methacrylate resin (PMMA), polycarbonate resin, polystyrene resin, polymethacryl styrene (MS) resin, acrylonitrile styrene (AS) resin, polypropylene resin, polyethylene resin, polyethylene terephthalate resin, polyvinyl chloride.
  • PMMA polymethyl methacrylate resin
  • MS polystyrene resin
  • AS acrylonitrile styrene
  • PVC resins
  • cellulose acylates cellulose triacetates
  • cellulose acetate propionates cellulose diacetates
  • thermoplastic elastomers copolymers thereof, and cycloolefin polymers.
  • Such a resin layer is preferably a cured layer formed by subjecting this composition to a polymerization treatment (curing treatment) using a polymerizable composition, from the viewpoint of ease of layer formation.
  • the polymerizable composition may be a photopolymerizable composition that is cured by light irradiation or a thermopolymerizable composition that is cured by heating. From the viewpoint of improving productivity, a photopolymerizable composition is preferable because the curing treatment can be completed in a short time.
  • Particles may be included for adjusting the refractive index of the first support.
  • the particles are not particularly limited, and may be inorganic particles or organic particles. Specific examples of the above-mentioned particles include inorganic particles such as ZrO 2 , TiO 2 , Al 2 O 3 , In 2 O 3 , ZnO, SnO 2 , Sb 2 O 3 , polymethyl methacrylate particles, crosslinked polymethyl methacrylate particles, Examples thereof include organic particles such as acrylic-styrene copolymer particles, melamine particles, polycarbonate particles, polystyrene particles, crosslinked polystyrene particles, polyvinyl chloride particles, and benzoguanamine-melamine formaldehyde particles.
  • so-called core-shell particles may be used.
  • core-shell particles may be organic-inorganic composite particles such as particles having an organic coating on the surface of the inorganic particles.
  • the above particles may be used alone or in combination of two or more. Smaller particles are preferable from the viewpoint of suppressing scattering. Therefore, the particle size is preferably 100 nm or less, more preferably 30 nm or less, and even more preferably 25 nm or less as the primary particle diameter. Moreover, it is preferable that a particle size is 1 nm or more as a primary particle diameter.
  • the primary particle size of the above-mentioned particles is a value obtained by measuring the particle size of 50 particles with a scanning electron microscope (SEM) and calculating the number average value.
  • the particle content in the layer containing the above-described particles is preferably set as appropriate so that the average refractive index in the above-mentioned range can be obtained.
  • the refractive index of the above-mentioned particles is preferably 2.00 or more and 3.00 or less, and preferably 2.05 or more and 2.50 or less from the viewpoint of adjusting the refractive index. More preferred.
  • the refractive index of the particles is a value measured by the following method. A resin material having a known refractive index is doped with particles to produce a resin material in which the particles are dispersed. The produced resin material is applied on a silicon substrate or a quartz substrate to form a resin film.
  • the refractive index of the formed resin film is measured with an ellipsometer, and the refractive index of the particles is determined from the resin material constituting the resin film and the volume fraction of the particles.
  • the refractive index of the titanium oxide particles used in Examples described later is a value obtained by the above-described method.
  • the light absorption layer absorbs the light reflected by the lens or the light reflection layer 19 or the like, or the light incident from the outside that repeats reflection in the first support 12 and suppresses stray light. Thereby, generation
  • the light absorption layer has a first opening for each lens.
  • the light absorption layer has a first opening on the optical axis of each of the plurality of lenses.
  • the light absorption layer and the light reflection layer have the same opening pattern, and the first opening of the light absorption layer and the second opening of the light reflection layer are aligned as described above.
  • the light reflection layer and the light absorption layer are arranged in a state where the two are aligned. If the aperture ratio of the first opening is too small, the light utilization efficiency is lowered. On the other hand, if it is too large, the directivity becomes worse. From this viewpoint, the aperture ratio of the first opening is 25% to 50%, preferably 25% to 45%.
  • the plurality of first openings in the light absorption layer are smaller than the plurality of second openings in the light reflection layer and have a size of 65 to 99%.
  • the first opening 18b and the second opening 19b are circular, for example, but are not limited to this, and may be rectangular.
  • the first opening 18b and the second opening 19b are defined by the width of the opening, regardless of whether the shape is a circle or a rectangle. In the case of a circle, the opening width corresponds to the diameter.
  • the opening width is obtained by acquiring an image including the light absorbing layer 18 including the first opening 18b and an image including the light reflecting layer 19 including the second opening 19b, and using each image, the first opening 18b, And it is obtained by calculating
  • the opening ratio of the first opening 18b of the light absorption layer 18 is defined by the opening width of the first opening 18b with respect to the pitch at which the first opening 18b is disposed. If the pitch is 100 ⁇ m and the opening width is 25 ⁇ m, the aperture ratio is 25% at 25/100. Also in the light reflection layer 19, as in the light absorption layer 18, the aperture ratio of the second opening 19b of the light absorption layer 13 is the second opening 19b with respect to the pitch at which the second opening 19b is disposed. Of the opening width. If the pitch is 100 ⁇ m and the opening width is 25 ⁇ m, the aperture ratio is 25% at 25/100.
  • the light absorption layer is not particularly limited.
  • carbon black, titanium nitride and silver ink can be used, and those used for black matrices such as LCD and organic EL (Electro Luminescence) are appropriately used. can do.
  • black matrices such as LCD and organic EL (Electro Luminescence) are appropriately used.
  • silver ink becomes a silver mirror after it becomes a black absorber in the heating process after ink application, after applying silver ink to the film, the ink surface is heated at a high temperature and the back surface is heated at a lower temperature.
  • the reflectance of the light absorption layer is preferably 20% or less, and in order to increase the light shielding property in the oblique direction, that is, to reduce the visibility in the oblique direction, 10% or less is better, and 7% or less is the best.
  • the reflectance of the light absorption layer is obtained as follows. Using a spectrophotometer (V-550 manufactured by JASCO Corporation), the material used for the light absorption layer is formed on a polyethylene terephthalate (PET) substrate, and light is incident from the formation surface to obtain a reflectance of 380 nm to 780 nm. Measure and obtain the average value. This average value is the reflectance of the light absorption layer.
  • the light reflection layer is made of, for example, white ink, metal foil, metal vapor deposition, or silver mirror ink. Similar to the light absorption layer, the light reflecting layer has a second opening for each lens. For example, the light reflecting layer has a second opening on the optical axis of each of the plurality of lenses. The light reflecting layer and the light absorbing layer have the same opening pattern. As described above, the light reflection layer and the light absorption layer are arranged in a state where the first opening of the light absorption layer and the second opening of the light reflection layer are aligned. If the aperture ratio of the second opening is too small, the light utilization efficiency is lowered. On the other hand, if it is too large, the directivity becomes worse.
  • the aperture ratio of the second opening of the light reflecting layer is defined by a ratio to the aperture ratio of the first opening of the light absorbing layer, and the aperture ratio of the first opening / the aperture ratio of the second opening. Is a ratio of 65% to 99%, preferably 70% to 99%. Since the opening ratio of the first opening is 25% to 50%, the opening ratio of the second opening is 25.25% to 76%.
  • the reflectance of the light reflecting layer is preferably 90% or more, more preferably 91% or more from the viewpoint of light utilization. More preferably, it is 92% or more.
  • the light utilization rate is defined by front luminance / maximum luminance.
  • the reflectance of the light reflecting layer is obtained as follows.
  • the material used for the light reflecting layer is formed on a polyethylene terephthalate (PET) substrate, and light is incident from the forming surface to obtain a reflectance of a wavelength of 380 nm to 780 nm. Measure and obtain the average value. This average value is the reflectance of the light reflecting layer.
  • the light absorption layer 18 and the light reflection layer 19 may have an integrated configuration or a separate configuration.
  • the surface of the light reflecting layer 19 functions as the light absorbing layer 18, and unlike the surface reflectance, it is less than 90% and absorbs light.
  • the reflectance of the surface functioning as the light absorption layer is preferably 20% or less as described above, more preferably 10% or less, and most preferably 7% or less.
  • the light absorption layer 18 and the light reflection layer 19 can be reduced in the number of parts in the integrated configuration compared to the separate configuration, and the configuration can be simplified.
  • a light absorption layer is not specifically limited,
  • the plate-shaped member used as a light absorption layer can be formed by an etching process or laser processing.
  • a light absorption layer can also be formed by forming a film to be a light absorption layer on a substrate using a vapor phase method such as vapor deposition or a liquid phase method such as coating.
  • the plurality of second openings of the light reflecting layer may be formed in a pattern that matches the arrangement of LED (light emitting diode) light sources used in the direct type backlight. That is, the plurality of second openings may not be provided immediately above the LED light source, and the opening ratio of the plurality of second openings may increase as the distance from the LED light source increases.
  • the lens diameter is changed in the plane so that the aperture ratio of the lens diameter and the second opening portion with respect to the lens diameter falls within the above-described preferable range. Thereby, an opening can be provided according to the light beam from the LED light source, and parallel light can be made while using light more efficiently. Further, at this time, it is easier to control the light beam by providing a mirror-like reflective layer on the back surface of the LED light source than from the case of providing a diffusive reflective layer.
  • the light reflecting layer may have a cholesteric liquid crystal layer.
  • the cholesteric liquid crystal layer includes a cholesteric liquid crystal phase and has wavelength selective reflectivity with respect to circularly polarized light in one turning direction (right circularly polarized light or left circularly polarized light) in a specific wavelength range.
  • the light reflecting layer includes, for example, a cholesteric liquid crystal layer that reflects the right circularly polarized light in the red wavelength range (620 nm to 750 nm) and the left side of the red wavelength range according to the configuration of the color filter of the liquid crystal display device described later.
  • a portion other than the second opening by having a cholesteric liquid crystal layer that reflects right circularly polarized light in a wavelength range of ⁇ 490 nm) and a cholesteric liquid crystal layer that reflects left circularly polarized light in a blue wavelength region , Red light, green light and blue light can be reflected.
  • the width of the selective reflection band can be controlled by adjusting ⁇ n.
  • ⁇ n can be adjusted by the type of liquid crystal compound forming the cholesteric liquid crystal layer, the mixing ratio thereof, and the temperature during alignment. It is also known that the reflectance in the cholesteric liquid crystal phase depends on ⁇ n. When obtaining a similar reflectance, the larger the ⁇ n, the smaller the number of spiral pitches, that is, the thinner the film thickness. it can.
  • the reflected light of the cholesteric liquid crystal phase is circularly polarized. Whether the reflected light is right-handed circularly polarized light or left-handed circularly polarized light depends on the twist direction of the spiral in the cholesteric liquid crystal phase.
  • the selective reflection of circularly polarized light by the cholesteric liquid crystal phase reflects right circularly polarized light when the helical twist direction of the cholesteric liquid crystal phase is right, and reflects left circularly polarized light when the helical twist direction is left.
  • the direction of rotation of the cholesteric liquid crystal phase can be adjusted by the type of liquid crystal compound forming the reflective region or the type of chiral agent added.
  • the selective reflection wavelength in the cholesteric liquid crystal layer can be set in any range of visible light (about 380 to 780 nm) and near infrared light (about 780 to 2000 nm), and the setting method is as described above. is there.
  • Examples of the material used for forming the cholesteric liquid crystal layer include a liquid crystal composition containing a liquid crystal compound.
  • the liquid crystal compound is preferably a polymerizable liquid crystal compound.
  • the liquid crystal composition containing a polymerizable liquid crystal compound may further contain a surfactant, a chiral agent, a polymerization initiator, and the like.
  • the surfactant, the chiral agent, and the polymerization initiator known liquid crystal compounds, surfactants, chiral agents, and polymerization initiators used for the cholesteric liquid crystal layer can be used.
  • the second opening may be physically formed, and a cholesteric liquid crystal phase may be formed in a region serving as the second opening.
  • a region having light transmittance may be formed as the second opening portion by not forming it and having no reflectivity.
  • a photoresist method may be used when producing the light reflecting layer.
  • a resist material is applied to the opposite surface of the lens, and light is irradiated and developed through a mask corresponding to the pattern of the reflective layer to be produced. Thereafter, for example, aluminum or silver is vapor-deposited, and then the resist material is washed and removed, whereby a reflective layer having a desired pattern can be produced.
  • a photomask is not used, parallel light can be irradiated from the lens side instead. The method of irradiating parallel light from the lens side is better than the case of using a photomask in that the alignment accuracy between the lens and the opening can be improved.
  • the light used for exposure includes ultraviolet rays such as g-line, h-line, i-line, and j-line, and i-line exposure is particularly preferable.
  • Drying (pre-baking) of the film with a photoresist material applied (preferably applied) on the substrate can be performed using a hot plate, oven, etc., at a temperature range of 50 to 140 ° C. for 10 to 300 seconds. it can.
  • the uncured part after exposure is eluted in the developer, leaving only the cured part.
  • the development temperature is usually 20 to 30 ° C., and the development time is 20 to 600 seconds. Any developer can be used as long as it dissolves the film of the photosensitive resin composition in the uncured portion while not dissolving the cured portion. Specifically, a combination of various organic solvents or an alkaline aqueous solution can be used.
  • organic solvent described above examples include those listed above as the solvents that can be used when preparing the photosensitive resin composition.
  • alkaline aqueous solution examples include sodium hydroxide, potassium hydroxide, sodium carbonate, sodium bicarbonate, sodium oxalate, sodium metasuccinate, aqueous ammonia, ethylamine, diethylamine, dimethylethanolamine, tetramethylammonium hydroxide.
  • An alkaline compound such as tetraethylammonium hydroxide (TMAH), choline, pyrrole, piperidine, 1,8-diazabicyclo- [5,4,0] -7-undecene, preferably in a concentration of 0.001 to 10% by mass, preferably Examples thereof include an alkaline aqueous solution dissolved so as to be 0.01 to 1% by mass. In the case where an alkaline aqueous solution is used as a developer, washing (rinsing) with water is generally performed after development.
  • the composition of the photoresist material includes (A) a photopolymerization initiator, (B) a solvent, (C) a polymerizable monomer and (D) an alkali-soluble resin, and (A) one or more photopolymerization initiators. Including an O-acyl oxime ester compound and one or more ⁇ -aminoacetophenone compounds, two or more independent patterns can be formed simultaneously. (D) At least one of the alkali-soluble resins has an acid value of 150 to 400 mgKOH / g. Furthermore, (E) a photosensitizer or a co-initiator is included.
  • the total addition amount of (A) photopolymerization initiator and (E) photosensitizer or co-initiator is 0.1 to 15.0% by mass in the total solid content of the photosensitive resin composition.
  • C) The polymerizable monomer has an acid group, and the acid value is 20 to 150 mgKOH / g.
  • the O-acyl oxime ester compound has an aromatic ring.
  • the O-acyl oxime ester compound has a condensed ring including an aromatic ring.
  • the O-acyl oxime ester compound has a condensed ring including a benzene ring and a hetero ring.
  • An O-acyl oxime ester compound and an ⁇ -aminoacetophenone compound are contained at a ratio of 10:90 to 80:20 (mass ratio).
  • D) The alkali-soluble resin is an acrylic resin.
  • the photosensitive resin composition of the present invention contains (A) a photopolymerization initiator, (B) a solvent, (C) a polymerizable monomer, and (D) an alkali-soluble resin. It includes the above O-acyloxime ester compound and one or more ⁇ -aminoacetophenone compounds, and is capable of forming two or more independent patterns simultaneously. By using the O-acyl oxime ester compound and the ⁇ -aminoacetophenone compound in combination, two or more kinds of independent patterns can be formed.
  • “two or more independent patterns can be formed simultaneously” means that two or more types of patterns having different heights are formed by one exposure. One exposure means exposure performed at the same time.
  • the exposure method is not limited, and examples thereof include a method using halftone masks having different transmittances, and a method in which exposure is performed by simultaneously irradiating two or more exposure amounts.
  • the pattern group (1) composed of a plurality of patterns having a high height and the pattern group (2 composed of a plurality of patterns having a low height) are provided.
  • the height difference between the pattern group (1) and the pattern group (2) is preferably 0.4 to 1.1 ⁇ m.
  • the height of the pattern group can be determined as an average value of each.
  • it is preferable that the height of each independent pattern group is constant, for example, it is preferable to set to ⁇ 0.1 ⁇ m with a standard deviation of 3 ⁇ .
  • Photopolymerization initiator In the present invention, an O-acyloxime ester compound and an ⁇ -aminoacetophenone compound are used as the photopolymerization initiator (A).
  • O-acyl oxime ester compound used in the present invention is not particularly defined as long as it has a —C ⁇ N—O—C ( ⁇ O) structure, but has an aromatic ring.
  • O-acyl oxime ester compound used in the present invention preferably has a structure in which the oxime ester group is directly bonded to the aforementioned condensed ring.
  • the condensed ring containing an aromatic ring should just be an aromatic ring at least 1 ring.
  • the O-acyl oxime ester compound can be appropriately selected from known photopolymerization initiators such as the O-acyl oxime ester compounds described in JP-A Nos. 2000-80068 and 2001-233842. Specifically, 1- (4-phenylsulfanyl-phenyl) -butane-1,2-dione 2-oxime-O-benzoate, 1- (4-phenylsulfanyl-phenyl) -octane-1,2-dione 2-oxime-O-benzoate, 1- (4-phenylsulfanyl-phenyl) -octane-1-one oxime-O-acetate, 1- (4-phenylsulfanyl-phenyl) -butan-1-one oxime-O-acetate Etc.
  • One type of O-acyl oxime ester compound may be used, or two or more types of compounds may be used in combination.
  • IRGACURE OXE01 or OXE02 manufactured by BASF can also be used as the oxime ester-based photopolymerization material.
  • ⁇ -Aminoacetophenone compound One ⁇ -aminoacetophenone compound may be used alone, or two or more types may be used in combination.
  • ⁇ -aminoacetophenone compound an acid adduct salt of the compound represented by the above general formula (4) can also be used.
  • ⁇ -aminoacetophenone compounds polymerization initiators available from Ciba Specialty Chemicals under the trade names Irgacure 907 (IRGACURE 907), Irgacure 369 (IRGACURE 369), and Irgacure 379 (IRGACURE 379) are available. It can be illustrated.
  • ⁇ -aminoacetophenone compounds include 2-dimethylamino-2-methyl-1-phenylpropan-1-one, 2-diethylamino-2-methyl-1-phenylpropan-1-one, and 2-methyl.
  • 2-morpholino-1-phenylpropan-1-one 2-dimethylamino-2-methyl-1- (4-methylphenyl) propan-1-one
  • 2-dimethylamino-1- (4-ethylphenyl) -2-Methylpropan-1-one 2-dimethylamino-1- (4-isopropylphenyl) -2-methylpropan-1-one
  • 1- (4-butylphenyl) -2-dimethylamino-2-methyl Propan-1-one 2-dimethylamino-1- (4-methoxyphenyl) -2-methylpropan-1-one
  • 2-dimethylamino-2-methyl -1- (4-methylthiophenyl) propan-1-one 2-methyl-1- (4-
  • the ⁇ -aminoacetophenone compound is preferably contained in a proportion of 0.1 to 10% by mass with respect to the total solid content excluding the solvent contained in the photosensitive resin composition of the present invention, and 0.3 to 8 More preferably, it is contained in a proportion of 0.5% by mass, and more preferably in a proportion of 0.5-5% by mass.
  • Photopolymerization Initiators in the present invention, other generally known photopolymerization initiators may be further used in combination as long as the effects of the combined use of the O-acyloxime ester compound and the ⁇ -aminoacetophenone compound are not impaired. it can.
  • the photopolymerization initiator that can be used in combination is not particularly limited, but the mass of the O-acyloxime ester compound and the ⁇ -aminoacetophenone compound with respect to the total photoinitiator mass is 80% or more from the viewpoint of halftone aptitude and sensitivity. Preferably, it is 90% or more. Even when other initiators are used in combination, the optimum addition mass ratio of the O-acyloxime ester compound and the ⁇ -aminoacetophenone compound is the same.
  • (B) Solvent The (B) solvent that can be used in the present invention is not particularly defined unless departing from the gist of the present invention, but is classified into esters, ethers, ketones, aromatic hydrocarbons, and the like. A solvent is mentioned.
  • esters used as a solvent include, for example, ethyl acetate, n-butyl acetate, isobutyl acetate, amyl formate, isoamyl acetate, isobutyl acetate, butyl propionate, isopropyl butyrate, ethyl butyrate, butyl butyrate,
  • alkyl esters methyl lactate, ethyl lactate, methyl oxyacetate, ethyl oxyacetate, butyl oxyacetate, methyl methoxyacetate, ethyl methoxyacetate, butyl methoxyacetate, methyl ethoxyacetate, ethyl ethoxyacetate, etc.
  • 3-oxypropion 3-oxypropionic acid alkyl esters such as methyl acid and ethyl 3-oxypropionate; methyl 2-oxypropionate, ethyl 2-oxypropionate, propyl 2-
  • ethers include, for example, diethylene glycol dimethyl ether, tetrahydrofuran, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, methyl cellosolve acetate, ethyl cellosolve acetate, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol monobutyl ether, propylene glycol methyl ether
  • Examples include acetate, propylene glycol ethyl ether acetate, propylene glycol propyl ether acetate and the like.
  • ketones include methyl ethyl ketone, cyclohexanone, 2-heptanone, 3-heptanone and the like.
  • aromatic hydrocarbons include toluene, xylene, and the like.
  • methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, ethyl cellosolve acetate, ethyl lactate, diethylene glycol dimethyl ether, butyl acetate, methyl 3-methoxypropionate, 2-heptanone, cyclohexanone, ethyl carbitol acetate Butyl carbitol acetate, propylene glycol methyl ether acetate and the like are preferable.
  • a solvent may be used independently and may be used in combination of 2 or more type.
  • the content of the solvent (B) in the photosensitive resin composition of the present invention is appropriately determined in consideration of the applicability of the photosensitive resin composition and the like.
  • the content of the solvent is 45 to 85% by mass.
  • (C) Polymerizable monomer In the photosensitive resin composition of this invention, 1 or more types of (C) polymerizable monomers are contained as a sclerosing
  • the polymerizable monomer a plurality of polymerizable monomers may be used in combination, or one or more of a polymerizable monomer containing an acid group and a polymerizable monomer having no acid group may be used in combination.
  • polymerizable monomers containing carboxyl groups include polyfunctional acrylates modified with carboxyl groups in addition to unsaturated fatty acids such as acrylic acid, methacrylic acid, phthalic acid, fumaric acid, maleic acid, itaconic acid, crotonic acid, and cinnamonic acid.
  • carboxyl group-modified polyfunctional acrylate compounds include succinic acid modified pentaerythritol triacrylate, succinic acid modified trimethylolpropane triacrylate, succinic acid modified pentaerythritol tetraacrylate, succinic acid modified dipentaerythritol pentaacrylate, and succinic acid modified dipenta.
  • Erythritol hexaacrylate adipic acid modified pentaerythritol triacrylate, adipic acid modified trimethylolpropane triacrylate, adipic acid modified pentaerythritol tetraacrylate, adipic acid modified dipentaerythritol pentaacrylate, adipic acid modified dipentaerythritol tetraacrylate, etc.
  • Aronix M-510, Aronix M-520, Aronix T -2349, Aronix TO-2359 can be preferably used commercially available compounds such as.
  • polymerizable monomers containing phenolic hydroxyl groups include p-hydroxystyrene, 3,4-dihydroxystyrene, 3,5-dihydroxystyrene, 2,4,6-trihydroxystyrene, (p-hydroxy) benzyl acrylate, and salicylic acid.
  • Modified pentaerythritol triacrylate, salicylic acid modified trimethylolpropane triacrylate, salicylic acid modified pentaerythritol tetraacrylate, salicylic acid modified dipentaerythritol pentaacrylate, salicylic acid modified dipentaerythritol hexaacrylate, etc. are preferred, salicylic acid modified dipentaerythritol Hexaacrylate, salicylic acid-modified dipentaerythritol pentaacrylate.
  • Examples of the polymerizable monomer containing a sulfonic acid group include vinyl sulfonic acid, allyl sulfonic acid, styrene sulfonic acid, and butyl sulfonic acid-modified acrylamide.
  • Examples of the polymerizable monomer containing a phosphoric acid group include vinyl phosphoric acid, styrene phosphoric acid, and butyl phosphoric acid-modified acrylamide. Of these, butylsulfonic acid-modified acrylamide is preferable, and a commercially available compound is ATBS (manufactured by Toagosei Co., Ltd.).
  • a polymerizable monomer having a carboxyl group and a polymerizable monomer having a phenolic hydroxyl group are preferable, and a polymerizable monomer having a carboxyl group is more preferable, from the viewpoint of production suitability and cost.
  • the polymerizable monomer having no acid group that can be used in combination with the polymerizable monomer having an acid group is not particularly limited as long as it can be polymerized, and is a low molecular compound having at least one ethylenic double bond, dimer Compounds capable of addition polymerization such as isomers, trimers, and oligomers can be preferably used.
  • Examples of the ethylenic compound include an ester of an unsaturated carboxylic acid and a monohydroxy compound, an ester of an aliphatic polyhydroxy compound and an unsaturated carboxylic acid, an ester of an aromatic polyhydroxy compound and an unsaturated carboxylic acid, and an unsaturated carboxylic acid. Reaction of ester, polyisocyanate compound and (meth) acryloyl-containing hydroxy compound obtained by esterification reaction of acid with polyhydric carboxylic acid and polyhydric hydroxy compound such as fatty acid polyhydroxy compound and aromatic polyhydroxy compound described above And an ethylenic compound having a urethane skeleton.
  • Specific polymerizable monomers can be classified and listed according to the number of polymerizable groups in one molecule as shown below, but are not limited thereto.
  • Compound having one polymerizable group in one molecule examples include, for example, hexyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, Stearyl (meth) acrylate, cyclohexyl (meth) acrylate, 4-n-butylcyclohexyl (meth) acrylate, bornyl (meth) acrylate, isobornyl (meth) acrylate, benzyl (meth) acrylate, 2-ethylhexyl glycol (meth) Acrylate, butoxyethyl (meth) acrylate, 2-chloroethyl (meth) acrylate, cyanoethyl (meth) acrylate, 3-methoxybutyl (meth) acrylate, 2- (2-methoxyethoxy) ethyl (meth) acrylate, 2,2, 2-tetraflu
  • Examples of a compound having two polymerizable groups in one molecule include two (meth) acryloyl groups in the same molecule as the polymerizable group.
  • Examples of the compound having three polymerizable groups in one molecule include, for example, trimethylolpropane tri (meth) acrylate, trimethylolethanetri ( (Meth) acrylate, trimethylolpropane alkylene oxide modified tri (meth) acrylate, pentaerythritol tri (meth) acrylate, dipentaerythritol tri (meth) acrylate, trimethylolpropane tri ((meth) acryloyloxypropyl) ether, isocyanuric acid Alkylene oxide modified tri (meth) acrylate, dipentaerythritol propionate tri (meth) acrylate, tri ((meth) acryloyloxyethyl) isocyanurate, hydroxypivalaldehyde modified dimethylol group
  • Examples include lopantri (meth) acrylate, sorbitol tri (meth) acryl
  • (meth) acrylate monomers having two or more (meth) acryloyl groups in the same molecule are preferable, and three or more The (meth) acrylate monomer having a (meth) acryloyl group is more preferable.
  • (meth) acrylate monomers having 4 or more (meth) acryloyl groups are advantageous.
  • the total of the polymerizable monomer having an acid group and the polymerizable monomer having no acid group is preferably 100 parts by mass.
  • the addition ratio is not particularly limited as long as it is within the preferable acid value range shown above.
  • the content of the polymerizable monomer is preferably 5 to 80% by mass, more preferably 10 to 70% by mass, based on the total solid content excluding the solvent of the photosensitive resin composition. %, More preferably in the range of 20 to 60% by mass.
  • (D) Alkali-soluble resin As the (D) alkali-soluble resin applicable to the present invention, any polymer compound that is soluble in a solvent can be used. Each of the alkali-soluble resins may be used as a single compound or a plurality of compounds may be used in combination. As a preferable alkali-soluble resin, a resin having an acid group (hereinafter, appropriately referred to as “alkali-soluble resin”) is preferable in view of alkali developability by a photolithography method.
  • alkali-soluble resin a resin having an acid group
  • the alkali-soluble resin is preferably a linear organic polymer, and an alkali-soluble polymer having at least one alkali-soluble group (for example, a carboxyl group, a phosphate group, a sulfonate group, etc.) therein. More preferably, it is soluble in an organic solvent and can be developed with a weak alkaline aqueous solution.
  • alkali-soluble group for example, a carboxyl group, a phosphate group, a sulfonate group, etc.
  • a known radical polymerization method can be applied to the production of the alkali-soluble resin.
  • Polymerization conditions such as temperature, pressure, type and amount of radical initiator, type of solvent, etc. when producing an alkali-soluble resin by radical polymerization can be easily set by those skilled in the art, and the conditions are determined experimentally. It can also be done.
  • a polymer having a carboxyl group in the side chain is preferable.
  • JP-A-59-44615, JP-B-54-34327, JP-B-58-12777, JP-B-54-25957, JP-A-59-53836, JP-A-59-71048 As described, methacrylic acid copolymer, acrylic acid copolymer, itaconic acid copolymer, crotonic acid copolymer, maleic acid copolymer, partially esterified maleic acid copolymer, etc., and side chain Examples thereof include acidic cellulose derivatives having a carboxylic acid, polymers obtained by adding an acid anhydride to a polymer having a hydroxyl group, and high molecular polymers having a (meth) acryloyl group in the side chain.
  • a benzyl (meth) acrylate / (meth) acrylic acid copolymer or a multi-component copolymer composed of benzyl (meth) acrylate / (meth) acrylic acid / other monomers is particularly preferable.
  • those obtained by copolymerizing 2-hydroxyethyl methacrylate are also useful.
  • the aforementioned polymers can be mixed and used in an arbitrary amount.
  • 2-hydroxypropyl (meth) acrylate / polystyrene macromonomer / benzyl methacrylate / methacrylic acid copolymer 2-hydroxy-3-phenoxypropyl acrylate / polymethyl described in JP-A-7-140654 Methacrylate macromonomer / benzyl methacrylate / methacrylic acid copolymer, 2-hydroxyethyl methacrylate / polystyrene macromonomer / methyl methacrylate / methacrylic acid copolymer, 2-hydroxyethyl methacrylate / polystyrene macromonomer / benzyl methacrylate / methacrylic acid copolymer Etc.
  • alkali-soluble resins examples include JP-A-7-207211, JP-A-8-259876, JP-A-10-300922, JP-A-11-140144, JP-A-11-174224, and JP-A-11-174224.
  • Known polymer compounds described in JP 2000-56118 A, JP 2003-233179 A, JP 2009-52020 A, and the like can be used.
  • the specific structural unit of the alkali-soluble resin in particular, a copolymer of (meth) acrylic acid and other monomers copolymerizable therewith can be easily obtained, and adjustment of alkali solubility and the like is easy. Therefore, it is preferably used.
  • Examples of other monomers copolymerizable with the above-mentioned (meth) acrylic acid include alkyl (meth) acrylates, aryl (meth) acrylates, vinyl compounds and the like.
  • the hydrogen atom of the alkyl group and the aryl group may be substituted with a substituent.
  • alkyl (meth) acrylate and aryl (meth) acrylate include methyl (meth) acrylate, ethyl (meth) acrylate, propyl (meth) acrylate, butyl (meth) acrylate, isobutyl (meth) acrylate, and pentyl.
  • vinyl compound examples include styrene, ⁇ -methylstyrene, vinyl toluene, glycidyl (meth) acrylate, acrylonitrile, vinyl acetate, N-vinylpyrrolidone, tetrahydrofurfuryl (meth) acrylate, polystyrene macromonomer, polymethyl methacrylate.
  • R 31 represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms
  • R 33 represents an alkyl group having 1 to 8 carbon atoms or 6 carbon atoms. Represents -12 aralkyl groups. ], Etc. can be mentioned.
  • copolymerizable monomers can be used singly or in combination of two or more.
  • Preferred other copolymerizable monomers are selected from CH 2 ⁇ CR 31 R 32 , CH 2 ⁇ C (R 31 ) (COOR 33 ), phenyl (meth) acrylate, benzyl (meth) acrylate and styrene. At least one, and particularly preferably CH 2 ⁇ CR 31 R 32 and / or CH 2 ⁇ C (R 31 ) (COOR 33 ). These R 31 , R 32 and R 33 are as defined above.
  • the content of the alkali-soluble resin in the photosensitive resin composition is preferably 5 to 60% by mass, more preferably 10%, based on the total solid content excluding the solvent contained in the photosensitive resin composition. It is -55 mass%, Most preferably, it is 15-50 mass%.
  • the alkali-soluble resin used in the present invention preferably has a weight average molecular weight (Mw) of 1,000 to 100,000, more preferably 5,000 to 50,000.
  • the acid value of the alkali-soluble resin used in the present invention is preferably 150 to 400 mgKOH / g, more preferably 180 to 380 mgKOH / g, and further preferably 200 to 350 mgKOH / g. By setting it as such a range, the photosensitive composition excellent in the halftone aptitude etc. is obtained.
  • Photosensitizer or co-initiator may be further added to the photosensitive resin composition of the present invention. By adding these, spectral sensitivity can be moved or expanded, and photopolymerization of the photosensitive resin composition of the present invention can be promoted. As the above-described photosensitizer or co-initiator, it is particularly preferable to use an aromatic compound.
  • thioxanthone examples include thioxanthone, 2-isopropylthioxanthone, 2-chlorothioxanthone, 1-chloro-4-propoxythioxanthone, 2-dodecylthioxanthone, 2,4-diethylthioxanthone, 2,4-dimethylthioxanthone, 1- Methoxycarbonylthioxanthone, 2-ethoxycarbonylthioxanthone, 3- (2-methoxyethoxycarbonyl) thioxanthone, 4-butoxycarbonylthioxanthone, 3-butoxycarbonyl-7-methylthioxanthone, 1-cyano-3-chlorothioxanthone, 1-ethoxycarbonyl -3-chlorothioxanthone, 1-ethoxycarbonyl-3-ethoxythioxanthone, 1-ethoxycarbonyl-3-aminothioxanthone, 1-ethoxy Carbon
  • benzophenone examples include benzophenone, 4-phenylbenzophenone, 4-methoxybenzophenone, 4,4′-dimethoxybenzophenone, 4,4′-dimethylbenzophenone, 4,4′-dichlorobenzophenone, and 4,4′-bis.
  • Examples of the coumarin include coumarin 1, coumarin 2, coumarin 6, coumarin 7, coumarin 30, coumarin 102, coumarin 106, coumarin 138, coumarin 152, coumarin 153, coumarin 307, coumarin 314, coumarin 314T, coumarin 334, Coumarin 337, Coumarin 500, 3-Benzoylcoumarin, 3-benzoyl-7-methoxycoumarin, 3-benzoyl-5,7-dimethoxycoumarin, 3-benzoyl-5,7-dipropoxycoumarin, 3-benzoyl-6,8 -Dichlorocoumarin, 3-benzoyl-6-chlorocoumarin, 3,3'-carbonyl-bis [5,7-di (propoxy) coumarin], 3,3'-carbonyl-bis (7-diethylaminocoumarin), 3- Isobutyroylcoumarin, 3-benzoyl 5,7-dimethoxycoumarin, 3-benzoyl-5,7-diethoxy
  • 3- (aroylmethylene) thiazoline examples include 3-methyl-2-benzoylmethylene- ⁇ -naphthothiazoline, 3-methyl-2-benzoylmethylene-benzothiazoline, 3-ethyl-2-propionylmethylene- ⁇ -. Naphthiazoline is mentioned.
  • rhodanine examples include 4-dimethylaminobenzalrhodanine, 4-diethylaminobenzalrhodanine, 3-ethyl-5- (3-octyl-2-benzothiazolinylidene) rhodanine, JP-A-8-305, And rhodanine derivatives represented by the formulas [1], [2] and [7] disclosed in Japanese Patent No. 019.
  • the photosensitizer or co-initiator (E) to be added to the photosensitive resin composition of the present invention is selected from benzophenone and derivatives thereof, thioxanthone and derivatives thereof, anthraquinone and derivatives thereof, and coumarin derivatives among the above.
  • Preferred is at least one photosensitizer compound.
  • the content of (E) photosensitizer or co-initiator in the photosensitive resin composition is 0.5 to 15 with respect to the total solid content excluding the solvent contained in the photosensitive resin composition. % By mass is preferable, more preferably 1 to 12% by mass, and particularly preferably 2 to 10% by mass. Further, the total amount of addition of (A) photopolymerization initiator and (E) photosensitizer or co-initiator is 0.1 to 15.0% by mass in the total solid content of the photosensitive resin composition. It is preferably 0.1 to 12.0% by mass.
  • a radical scavenger In the photosensitive resin composition of the present invention, if necessary, a radical scavenger, a light stabilizer, a curing aid, a thermal polymerization initiator, a surfactant, an adhesion assistant, a development accelerator, a thermal polymerization inhibitor, Various additives such as a dispersant and other additives (filler, ultraviolet absorber, anti-aggregation agent, etc.) can be contained.
  • Light stabilizer Various light stabilizers may be added to the present invention to improve light resistance.
  • the kind of the light stabilizer is not particularly limited, but from the viewpoint of versatility, a hindered amine light stabilizer; for example, bis (2,2,6,6-tetramethyl-4-piperidyl) adipate, bis (1,2,2) , 6,6-pentamethyl-4-piperidyl) adipate, bis (2,2,6,6-tetramethyl-4-piperidyl) sebacate, bis (1,2,2,6,6-pentamethyl-4-piperidyl) Sebacate, tetrakis (2,2,6,6-tetramethyl-4-piperidyl) -1,2,3,4-tetraacrylate, tetrakis (1,2,2,6,6-pentamethyl-4-piperidyl)- 1,2,3,4-tetraacrylate, hindered phenol light stabilizer; for example, pentaerythritol-tetrakis (3- (3 ′
  • the content of the light stabilizer in the present invention is preferably about 0.1 to 5.0% by mass, and preferably 0.2 to 4.0% by mass with respect to the total solid content of the photosensitive resin composition. More preferably, it is 0.5 to 2.0% by mass. If it is 0.1% by mass or less, the desired light resistance cannot be obtained, and if it is 5.0% by mass or more, the sensitivity decreases, which is not preferable.
  • a compound having an epoxy ring may be used in order to increase the strength of the formed coating film.
  • the use of a compound having an epoxy ring is preferable because thermal polymerization proceeds, solvent resistance is improved, and ITO sputtering suitability is improved.
  • the compound having an epoxy ring is a compound having two or more epoxy rings in the molecule such as bisphenol A type, cresol novolac type, biphenyl type, and alicyclic epoxy compound.
  • bisphenol A type includes Epototo YD-115, YD-118T, YD-127, YD-128, YD-134, YD-8125, YD-7011R, ZX-1059, YDF-8170, YDF-170, etc.
  • bisphenol F type and bisphenol S type similar to these can also be mentioned.
  • Epoxy acrylates such as Ebecryl 3700, 3701, and 600 (manufactured by Daicel UCB) can also be used.
  • cresol novolak type examples include Epototo YDPN-638, YDPN-701, YDPN-702, YDPN-703, YDPN-704, etc. (above, manufactured by Tohto Kasei), Denacol EM-125, etc.
  • Examples of the biphenyl type include 3,5,3 ′, 5′-tetramethyl-4,4′-diglycidylbiphenyl
  • examples of the alicyclic epoxy compound include Celoxide 2021, 2081, 2083, 2085, Epolide GT-301, GT-302, GT-401, GT-403, EHPE-3150 (above, manufactured by Daicel Chemical Co., Ltd.), Santo Tote ST-3000, ST-4000, ST-5080, ST-5100, etc. (above, manufactured by Tohto Kasei Co., Ltd.) Epilon 430, 673, 695, 850S, 4032 (above DIC) ), And the like.
  • 1,1,2,2-tetrakis (p-glycidyloxyphenyl) ethane, tris (p-glycidyloxyphenyl) methane, triglycidyltris (hydroxyethyl) isocyanurate, o-phthalic acid diglycidyl ester, terephthalic acid Diglycidyl ester, amine type epoxy resins such as Epototo YH-434 and YH-434L (manufactured by Nagase Kasei Co., Ltd.), glycidyl ester in which dimer acid is modified in the skeleton of bisphenol A type epoxy resin, and the like can also be used.
  • “molecular weight / number of epoxy rings” is preferably 100 or more, and more preferably 130 to 500. If the “molecular weight / number of epoxy rings” is small, the curability is high, the shrinkage during curing is large, and if it is too large, the curability is insufficient, the reliability is poor, and the flatness is poor.
  • Preferred compounds include Epototo YD-115, 118T, 127, YDF-170, YDPN-638, YDPN-701 (manufactured by Nagase Kasei Co., Ltd.), Plaxel GL-61, GL-62, 3, 5, 3 ′, Examples thereof include 5′-tetramethyl-4,4′diglycidylbiphenyl, ceroxide 2021, 2081, epolide GT-302, GT-403, and EHPE-3150 (manufactured by Daicel Chemical Industries, Ltd.).
  • the content of the curing aid in the present invention is preferably about 0.1 to 5.0% by mass, and preferably 0.2 to 4.0% by mass with respect to the total solid content of the photosensitive resin composition. More preferably, it is 0.5 to 2.0% by mass. If it is 0.1% by mass or less, the effect of promoting the curing cannot be obtained, and if it is 5.0% by mass or more, the light resistance is deteriorated, which is a problem.
  • thermal polymerization initiator It is also effective to contain a thermal polymerization initiator in the photosensitive resin composition of the present invention.
  • thermal polymerization initiator include various azo compounds and peroxide compounds.
  • azo compounds include azobis compounds.
  • peroxide compounds include Ketone peroxides, peroxyketals, hydroperoxides, dialkyl peroxides, diacyl peroxides, peroxyesters, peroxydicarbonates, and the like.
  • the photosensitive resin composition of the present invention is preferably constituted using various surfactants from the viewpoint of improving coating properties.
  • the surfactant can improve the liquid properties (particularly fluidity) when used as a coating liquid, and can improve the uniformity of the coating thickness and the liquid-saving property. In other words, the interfacial tension between the substrate and the coating liquid is lowered to improve the wettability to the substrate and the coating property to the substrate is improved. This is also effective in that a film having a uniform thickness with small thickness unevenness can be formed. It is also effective in slit coating that easily causes liquid breakage.
  • nonionic, cationic and anionic surfactants can be used.
  • a nonionic surfactant and a fluorosurfactant having a perfluoroalkyl group are preferable.
  • the fluorine content of the fluorosurfactant is preferably 3 to 40% by mass, more preferably 5 to 30% by mass, and particularly preferably 7 to 25% by mass.
  • the fluorine content is in the above-described range, it is effective in terms of coating thickness uniformity and liquid-saving properties, and the solubility in the composition is also good.
  • fluorosurfactant examples include Megafac F171, F172, F173, F173, F177, F141, F142, F143, F144, R30, F437 (above, manufactured by DIC), Florad FC430. FC431, FC171 (Sumitomo 3M), Surflon S-382, SC-101, SC-103, SC-104, SC-105, SC1068, SC-381, SC -383, S393, KH-40 (above, manufactured by AGC) and the like.
  • surfactants other than fluorine-based surfactants include phthalocyanine derivatives (commercially available product EFKA-745 (manufactured by Morishita Sangyo)), organosiloxane polymer KP341 (manufactured by Shin-Etsu Chemical Co., Ltd.), (meth) acrylic acid-based (co) heavy Combined polyflow no. 75, no. 90, no.
  • Cationic surfactants such as 95 (manufactured by Kyoeisha Yushi Chemical Co., Ltd.), W001 (manufactured by Yusho Co., Ltd.); Oxyethylene nonylphenyl ether, polyethylene glycol dilaurate, polyethylene glycol distearate, sorbitan fatty acid ester (manufactured by BASF Pluronic L10, L31, L61, L62, 10R5, 17R2, 25R2, Tetronic 304, 701, 704, 901, 904, Nonionic surfactants such as 150R1; anionic surfactants such as W004, W005, and W017 (manufactured by Yusho Co., Ltd.).
  • the addition amount of the surfactant is preferably 0.001 to 2.0% by mass, more preferably 0.005 to 1.0% by mass with respect to the total mass of the photosensitive resin composition.
  • the development accelerator is used as the photosensitive resin composition.
  • an organic carboxylic acid preferably a low molecular weight organic carboxylic acid having a molecular weight of 1000 or less is preferable.
  • aliphatic monocarboxylic acids such as formic acid, acetic acid, propionic acid, butyric acid, valeric acid, pivalic acid, caproic acid, diethyl acetic acid, enanthic acid, caprylic acid; oxalic acid, malonic acid, succinic acid, Aliphatic dicarboxylic acids such as glutaric acid, adipic acid, pimelic acid, suberic acid, azelaic acid, sebacic acid, brassic acid, methylmalonic acid, ethylmalonic acid, dimethylmalonic acid, methylsuccinic acid, tetramethylsuccinic acid, citraconic acid; Aliphatic tricarboxylic acids such as tricarballylic acid, aconitic acid, and camphoric acid; aromatic monocarboxylic acids such as benzoic acid, toluic acid, cumic acid, hemelitic acid, and mesitylene acid; phthalic acid
  • thermal polymerization inhibitor it is preferable to further add a thermal polymerization inhibitor to the photosensitive resin composition of the present invention.
  • a thermal polymerization inhibitor for example, hydroquinone, p-methoxyphenol, di-tert-butyl-p-cresol, pyrogallol, tert-butylcatechol, Benzoquinone, 4,4′-thiobis (3-methyl-6-tert-butylphenol), 2,2′-methylenebis (4-methyl-6-tert-butylphenol), 2-mercaptobenzimidazole and the like are useful.
  • fillers such as glass and alumina; ultraviolet absorbers such as 2- (3-tert-butyl-5-methyl-2-hydroxyphenyl) -5-chlorobenzotriazole and alkoxybenzophenone; and sodium polyacrylate And the like.
  • the photosensitive resin composition of the present invention comprises the components described above, that is, (A) a photopolymerization initiator, (B) a solvent, (C) a polymerizable monomer, (D) an alkali-soluble resin, and (E ) It can be prepared by adding and mixing other additives such as photosensitizers or co-initiators.
  • the thickness is preferably 30 ⁇ m or less from the viewpoint of not deteriorating brittleness. More preferably, it is 10 ⁇ m or less, and more preferably around 1 ⁇ m.
  • the refractive index of the second support is preferably 1.30 or more, more preferably 1.4 or more, and further preferably 1.6 or more, from the viewpoint of preventing generation of side bands. It is preferably 1.80 or more, most preferably 1.9 or more.
  • the refractive index is preferably 2.50 or less, more preferably 2.20 or less, and even more preferably less than 2.10. More preferably, it is 2.05 or less.
  • the refractive index of the second support can be adjusted by the type of components used for forming the layer in the same manner as the first support.
  • a component used for forming a layer it can form using the polymeric composition containing a polymeric compound and a polymerization initiator similarly to a 1st support body.
  • the resin layer which has resin as a main component similarly to a 1st support body may be sufficient.
  • particles may be contained in the same manner as the first support.
  • the particles are not particularly limited, and may be inorganic particles or organic particles.
  • One kind of the above-mentioned particles may be used, or two or more kinds may be mixed and used. Smaller particles are preferable from the viewpoint of suppressing scattering. Therefore, the particle size is preferably 100 nm or less, more preferably 30 nm or less, and even more preferably 25 nm or less as the primary particle diameter.
  • a particle size is 1 nm or more as a primary particle diameter.
  • the primary particle size of the above-mentioned particles is a value obtained by measuring the particle size of 50 particles with a scanning electron microscope (SEM) and calculating the number average value.
  • the particle content in the layer containing the above-mentioned particles is preferably set as appropriate so that the average refractive index in the above-mentioned range can be obtained.
  • the refractive index of the above-mentioned particles is preferably 2.00 or more and 3.00 or less, and preferably 2.05 or more and 2.50 or less from the viewpoint of adjusting the refractive index. More preferred.
  • the refractive index of the particles is a value measured by the following method. A resin material having a known refractive index is doped with particles to produce a resin material in which the particles are dispersed. The produced resin material is applied on a silicon substrate or a quartz substrate to form a resin film.
  • the refractive index of the formed resin film is measured with an ellipsometer, and the refractive index of the particles is determined from the resin material constituting the resin film and the volume fraction of the particles.
  • the refractive index of the titanium oxide particles used in Examples described later is a value obtained by the above-described method.
  • a surface light source device includes at least the above-described louver film and a light source.
  • the configuration of the surface light source device includes at least a light source and a light guide plate, and optionally an edge light system including a reflection plate, a diffusion plate, and the like, and at least a plurality of light sources and diffusion plates arranged on the reflection plate, the reflection plate There are direct type including.
  • the surface light source device described above may have any configuration. Details are described in publications such as Japanese Patent No. 3416302, Japanese Patent No. 3363565, Japanese Patent No. 4091978, and Japanese Patent No. 3448626, and the contents of these publications are incorporated in the present invention.
  • the light source may be a white light source or a monochromatic light source using a blue LED or an ultraviolet LED.
  • a white light source it is preferable that color conversion is not necessary and a simple configuration can be achieved.
  • a monochromatic light source is preferable in that the directivity of light can be controlled without chromatic aberration.
  • a wavelength conversion film using quantum dot particles or a phosphor may be provided between the louver film and the light source.
  • a color filter containing quantum dot particles or phosphors may be provided in the liquid crystal panel. Light that has passed through the liquid crystal layer of the liquid crystal panel with high directivity is color-converted into quantum dot particles, and the converted light is diffused, so that the viewing angle can be widened.
  • the surface light source device may have an optical film such as a reflective polarizer, a prism sheet, a diffusion sheet, and a wavelength conversion film.
  • the reflective polarizer 20 is provided between the louver film 2 and the diffusion plate 14, that is, between the louver film 2 and the light source 16. With the configuration having the reflective polarizer 20, light utilization efficiency can be improved by light recycling.
  • the various louver films 2 shown in FIGS. 2 and 5 can be used.
  • the reflective polarizer 20 a general reflective polarizer can be used.
  • the product name: DBEF manufactured by 3M may be used.
  • a liquid crystal display device includes at least the surface light source device described above and a liquid crystal panel.
  • the liquid crystal panel usually includes at least a viewing side polarizer, a liquid crystal cell, and a backlight side polarizer.
  • a liquid crystal cell having a liquid crystal layer sandwiched between substrates provided with electrodes on at least one opposite side, the liquid crystal cell is arranged between two polarizers.
  • the liquid crystal display device includes a liquid crystal cell in which liquid crystal is sealed between upper and lower substrates, and displays an image by changing the alignment state of the liquid crystal by applying a voltage. Furthermore, it has an accompanying functional layer such as a polarizing plate protective film, an optical compensation member that performs optical compensation, and an adhesive layer as necessary.
  • a color filter substrate thin layer transistor substrate, lens film, diffusion sheet, hard coat layer, antireflection layer, low reflection layer, antiglare layer, etc., forward scattering layer, primer layer, antistatic layer And a surface layer such as an undercoat layer may be disposed.
  • the above-described color filter containing quantum dot particles or phosphor or a lens film light on the viewing side of the viewing side polarizer You may provide the functional layer which eases the directivity of light, such as a diffusion sheet and a diffraction film.
  • the surface light source device included in the liquid crystal display device is as described above.
  • liquid crystal cell polarizing plate, polarizing plate protective film, and the like constituting the liquid crystal display device according to one embodiment of the present invention
  • those prepared by known methods and commercially available products can be used without any limitation. it can. It is of course possible to provide a known intermediate layer such as an adhesive layer between the layers.
  • a louver film 2 may be arranged between the liquid crystal cell 32 and the backlight side polarizer 34 as in the liquid crystal display device 30 shown in FIG.
  • the louver film 2 may be arranged between the backlight side polarizer 34 and the diffuser plate 14.
  • the backlight side polarizer may not be provided, and the viewing side polarizer 36 may be provided on the opposite side of the liquid crystal cell 32 from the light source 16 side.
  • various louver films 2 shown in FIGS. 2 to 5 can be used.
  • the arrangement position of the louver film 2 is not limited to being on the light source side with respect to the liquid crystal cell 32.
  • the louver film 2 is disposed between the liquid crystal cell 32 and the backlight side polarizer 34, but the louver film 2 is placed on the surface 32 a of the liquid crystal cell 32, that is, You may arrange
  • the louver film 2 is disposed between the backlight side polarizer 34 and the diffusion plate 14, but the louver film 2 is placed on the surface 32 a of the liquid crystal cell 32, that is, the display surface. You may arrange on top.
  • the louver film 2 is disposed between the backlight side polarizer 34 and the diffusion plate 14, but the louver film 2 is placed on the surface 32 a of the liquid crystal cell 32, that is, the display surface. You may arrange on top.
  • the louver film 2 is disposed between the backlight side polarizer 34 and the diffusion plate 14, but the louver film 2 is placed on the surface 32 a of the liquid crystal cell 32, that is, the
  • the louver film 2 is disposed between the liquid crystal cell 32 and the diffusion plate 14, but the louver film 2 is formed on the viewing side polarizer 36 provided on the liquid crystal cell 32. You may arrange
  • the louver film 2 can also be disposed on the outermost surface side of the liquid crystal display device 30. Even at such an arrangement position of the louver film 2, the directivity regarding further visibility can be improved while maintaining the light use efficiency, and reflection in an area that is not desired to be displayed can be suppressed.
  • the lenses of the louver film are two-dimensionally arranged as described above.
  • the lens arrangement is, for example, square when viewed from the optical axis direction, and the plurality of lenses are arranged in a square lattice. ing.
  • Moire prevention points are formed at the intersections of the arranged lenses, and the arrangement direction of the lenses is preferably inclined by 25 ° to 65 ° with respect to the arrangement direction of the pixels of the liquid crystal panel. This point will be described with reference to FIGS.
  • FIG. 10 is a schematic view showing a part of the louver film 2 and a part of the liquid crystal cell 32 as viewed from the optical axis direction of the lens while the relative positions are shifted in the plane direction.
  • 11 is a cross-sectional view taken along line BB in FIG. 12 is a cross-sectional view taken along the line CC of FIG. 13 is a cross-sectional view taken along the line DD of FIG.
  • the lens 11 is a two-dimensional lens array in which the shape of the lens 11 viewed from the optical axis direction is a square shape.
  • the plurality of lenses 11 are arranged in a square lattice shape.
  • the arrangement direction of the lenses 11 is inclined by about 45 ° with respect to the arrangement direction of the pixels 33 of the liquid crystal cell 32.
  • concave portions are formed as moiré prevention points 22 at the apexes (four corners in the surface direction) of the plurality of lenses 11 arranged in a square lattice pattern.
  • the arrangement of the lenses 11 may be two-dimensionally arranged, and the two-dimensional arrangement is not particularly limited, and may be arranged in a hexagonal manner other than the square arrangement. By arranging the lenses 11 in a hexagonal shape, the light utilization efficiency is improved and the luminance is improved.
  • moire may occur due to the relationship with other members having a regular arrangement.
  • moire may occur when a liquid crystal cell having a plurality of regularly arranged pixels and a louver film are arranged in an overlapping manner.
  • the moiré is reduced by tilting the arrangement direction of the lenses 11 with respect to the arrangement direction of the pixels of the liquid crystal panel by 25 ° to 65 ° and further forming the moire prevention point 22 at the apex portion of the lens 11.
  • moire occurs at a difference frequency between a plurality of regularly arranged pixel patterns of liquid crystal cells and a shadow (boundary line) pattern between the plurality of lenses 11.
  • the arrangement direction of the lenses 11 is inclined by about 45 ° with respect to the arrangement direction of the pixels 33 of the liquid crystal cell 32, a shadow (boundary line) pattern between the plurality of lenses 11 is represented by the pixels 33 of the liquid crystal cell 32.
  • Moire occurs at the difference frequency from the pattern that appears when integration is performed in the arrangement direction.
  • a pattern that appears when the pattern of shadows (boundary lines) between the plurality of lenses 11 is integrated in the arrangement direction of the pixels 33 of the liquid crystal cell 32 is a pattern on the lattice points of the plurality of lenses 11 arranged in a square lattice pattern.
  • the intensity is weak, and it appears because the pattern intensity is high except on the lattice points.
  • the pattern intensities on the lattice points and the portions other than the lattice points can be made equal, and the louver film
  • the side pattern can be erased. For this reason, it can be considered that a plurality of regularly arranged pixel patterns of liquid crystal cells and a pattern that can take a difference frequency disappear, and moire is less likely to occur.
  • the size (area) of the moire prevention point 22 is preferably 0.01% to 10% with respect to the size (area) of the lens 11 arranged two-dimensionally.
  • the depth of the moire prevention point 22 is preferably 0.1% to 40% with respect to the lens pitch.
  • the planar shape of the moire prevention point 22 is a square shape, but is not limited thereto, and may be various shapes such as a rectangular shape, a triangular shape, a polygonal shape, a circular shape, and an indefinite shape. it can. Further, the planar shape of the moire prevention point 22 may be symmetric or asymmetric.
  • the moire prevention point 22 is a recess, but the invention is not limited to this, and it is sufficient that the amount of light transmission can be changed.
  • the moire prevention point 22 may be a convex portion. Or what printed the dot with the ink may be used.
  • the method of forming the moire prevention point 22 formed of a recess there is no particular limitation on the method of forming the moire prevention point 22 formed of a recess.
  • a mold that forms the moire prevention point 22 at the same time as the formation of the lens 11 may be used.
  • the present invention is basically configured as described above. As described above, the louver film, the surface light source device, and the liquid crystal display device of the present invention have been described in detail. However, the present invention is not limited to the above-described embodiment, and various improvements or modifications can be made without departing from the gist of the present invention. Of course.
  • Example 1 In Example 1, a polyethylene terephthalate film (manufactured by Toyobo Co., Ltd., trade name: Cosmo Shine (registered trademark) A4300, thickness 38 ⁇ m, refractive index 1.57) was prepared as the first support. On the surface of the first support, the following 1. A titanium oxide particle-containing polymerizable composition (composition type 1) prepared so as to have a refractive index of 1.57 was applied by a bar coater, and a hemispherical arc (lens) having a radius of curvature of 50 ⁇ m was square with a pitch of 100 ⁇ m.
  • composition type 1 A titanium oxide particle-containing polymerizable composition prepared so as to have a refractive index of 1.57 was applied by a bar coater, and a hemispherical arc (lens) having a radius of curvature of 50 ⁇ m was square with a pitch of 100 ⁇ m.
  • a UV exposure machine (EXECURE 3000W manufactured by HOYA CANDEO OPTRONICS) was used while pressing a concavo-convex roller having a surface shape obtained by reversing the shape to be formed in a nitrogen atmosphere at 5 J / After being exposed and cured at cm 2 , it was peeled off from the uneven roller to produce an uneven shape on the surface. Thereafter, the following K pigment dispersion 1 is applied to the surface of the first support opposite to the surface on which the concavo-convex shape is formed through a mask having a plurality of openings with a pitch of 100 ⁇ m and a width of 32 ⁇ m and dried, and the pitch is 100 ⁇ m.
  • a light absorption layer having an aperture width of 32 ⁇ m, an aperture ratio of 32%, and a film thickness of 2 ⁇ m was formed so that the center in the aperture width direction was aligned with the apex of the lens convex portion.
  • Ag is vapor-deposited on the light absorption layer through a mask having the same pattern as the light absorption layer having a plurality of openings having a pitch of 100 ⁇ m and a width of 33 ⁇ m, and a light reflection layer having a pitch of 100 ⁇ m, an opening width of 33 ⁇ m, and an aperture ratio of 33% is formed.
  • the louver film A was produced by forming the center of the opening width direction so as to match the position of the apex of the lens convex portion.
  • the light absorption layer contains carbon black, and “CB” in the column of the material of the light absorption layer in Table 1 is carbon black.
  • K pigment dispersion 1 Carbon black, a dispersant, a polymer and a solvent were mixed so that the composition of the following K pigment dispersion 1 was obtained.
  • Titanium Oxide Particle-Containing Polymerizable Composition (Composition Type 1) Trimethylolpropane triacrylate 18.2 parts by mass, lauryl methacrylate 80.8 parts by mass, and photopolymerization initiator (Irgacure (registered trademark) 819 manufactured by BASF) ) 1 part by mass was mixed.
  • TiO 2 titanium oxide particles (primary particle diameter of 100 nm or less) are dispersed in the above mixture (hereinafter also referred to as a binder),
  • the mixture was sufficiently stirred to prepare a polymerizable composition containing titanium oxide particles.
  • the titanium oxide particles described above are titanium oxide particles that are surface-treated with aluminum oxide in order to suppress the photoactivity of titanium oxide, and have a refractive index of 2.40.
  • Example 2 In Example 2, in order to form on the surface a shape in which hemispherical arcs (lenses) having a radius of curvature of 50 ⁇ m are arranged in a hexagonal shape at a pitch of 100 ⁇ m, except for changing to a concavo-convex roller having a surface shape obtained by inverting the shape to be formed.
  • a louver film B was produced in the same manner as in Example 1.
  • Example 3 Ag is vapor-deposited on the light absorption layer through a mask having the same pattern as the light absorption layer having a plurality of openings with a pitch of 100 ⁇ m and a width of 47 ⁇ m, and light having a pitch of 100 ⁇ m, an opening width of 47 ⁇ m, and an aperture ratio of 47%.
  • a louver film C was produced in the same manner as in Example 1 except that the reflective layer was formed so that the center in the opening width direction matched the position of the apex of the lens convex portion.
  • Example 4 Ag was deposited on the light absorption layer through a mask having the same pattern as the light absorption layer having a plurality of openings with a pitch of 100 ⁇ m and a width of 32.32 ⁇ m, and the pitch was 100 ⁇ m, the opening width was 32.32 ⁇ m, and the opening ratio.
  • a louver film D was produced in the same manner as in Example 1 except that a 32.32% light reflecting layer was formed so that the center in the opening width direction was aligned with the apex of the lens convex portion.
  • Example 5 In Example 5, the above-mentioned K pigment dispersion 1 was applied and dried through a mask having a plurality of openings with a pitch of 100 ⁇ m and a width of 25 ⁇ m, and light having a pitch of 100 ⁇ m, an opening width of 25 ⁇ m, an opening ratio of 25%, and a film thickness of 2 ⁇ m.
  • the absorption layer was formed so that the center in the opening width direction matched the position of the apex of the lens convex portion.
  • a louver film E was produced in the same manner as in Example 1 except that the center in the opening width direction was formed so as to match the position of the apex of the lens convex portion.
  • Example 6 the K pigment dispersion 1 was applied and dried through a mask having a plurality of openings with a pitch of 100 ⁇ m and a width of 40 ⁇ m, and light having a pitch of 100 ⁇ m, an opening width of 40 ⁇ m, an opening ratio of 40%, and a film thickness of 2 ⁇ m.
  • the absorption layer was formed so that the center in the opening width direction matched the position of the apex of the lens convex portion.
  • Ag is vapor-deposited on the light absorption layer through a mask having the same pattern as the light absorption layer having a plurality of openings with a pitch of 100 ⁇ m and a width of 47 ⁇ m.
  • a louver film F was produced in the same manner as in Example 1 except that the center in the opening width direction was formed so as to match the position of the apex of the lens convex portion.
  • Example 7 the K pigment dispersion 1 was applied and dried through a mask having a plurality of openings with a pitch of 100 ⁇ m and a width of 47 ⁇ m, and light having a pitch of 100 ⁇ m, an opening width of 47 ⁇ m, an aperture ratio of 47%, and a film thickness of 2 ⁇ m.
  • the absorption layer was formed so that the center in the opening width direction matched the position of the apex of the lens convex portion.
  • Ag is vapor-deposited on the light absorption layer through a mask having the same pattern as the light absorption layer having a plurality of openings with a pitch of 100 ⁇ m and a width of 50 ⁇ m.
  • the center of the opening width direction is formed so as to match the position of the apex of the lens convex portion.
  • a polyethylene terephthalate film (trade name: Lumirror (registered trademark) T60, thickness 25 ⁇ m, refractive index 1.57) manufactured by Toray Industries, Inc. was prepared as the first support. Film G was produced.
  • Example 8 In Example 8, a louver film H was produced in the same manner as in Example 5 except that the thickness of the first support was 55 ⁇ m.
  • Example 9 a louver film I was produced in the same manner as in Example 4 except that the light reflecting layer formed on the light absorbing layer formed on the first support was composed of a cholesteric liquid crystal layer.
  • the cholesteric liquid crystal is expressed as “CLC”.
  • the following coating liquid was prepared as a composition for forming a cholesteric liquid crystal layer.
  • the surface of the first support opposite to the surface on which the uneven shape was formed was subjected to a rubbing treatment using a rubbing apparatus.
  • the longitudinal direction of the long film and the transport direction were parallel, and the rotation axis of the rubbing roller was set to a 45 ° clockwise direction with respect to the film longitudinal direction.
  • the coating liquid cholesteric liquid crystal layer forming composition was applied to the rubbing surface using a wire bar so as to have a film thickness of 3 ⁇ m to form a film made of a polymerizable liquid crystal composition.
  • this film was heated at 70 ° C. for 1 minute to give a cholesteric alignment treatment. Thereafter, the coating film cooled to 25 ° C.
  • UV irradiation apparatus EXECURE 3000-W manufactured by HOYA having a high-pressure mercury lamp, with a pitch of 100 ⁇ m and a width of 32.32 ⁇ m.
  • the OHP sheet on which black ink was printed in the same pattern as the light absorption layer having a plurality of openings was used as a mask to perform primary curing by irradiation from the coated surface side.
  • the above illuminance is the illuminance measured in the range of 300 nm to 390 nm using UVR-T1 (UD-T36; manufactured by TOPCON).
  • the film was secondarily cured by irradiating with ultraviolet rays from the coating surface side through a mask at 50 mW / cm 2 for 30 seconds under a nitrogen atmosphere. Thereafter, the mask is removed and the isotropic phase portion is irradiated with ultraviolet rays from the coating surface side at 50 mW / cm 2 in a nitrogen atmosphere for 40 seconds using a UV irradiation device while heating at 130 °.
  • a louver film I having a cholesteric liquid crystal layer having a cholesteric liquid crystal phase portion in one layer as a light reflecting layer was obtained.
  • Example 10 a louver film O was produced in the same manner as in Example 8 except that the light absorption layer formed on the first support was formed as follows without using a mask.
  • the following K pigment in which a chemically amplified positive photoresist (APEX-X: manufactured by Dow Chemical Co., Ltd.) and a black pigment were mixed on the surface opposite to the surface on which the uneven shape of the first support was formed.
  • Dispersion 2 was applied. Then, UV light was irradiated from the surface side where the concavo-convex shape was formed, and the coating layer of the K pigment dispersion 2 was exposed.
  • the UV light used for the exposure was a wavelength of 365 nm, and parallel UV light was diffused by 10 ° with a lens diffusion plate LSD10ACUVT30 (manufactured by Luminit).
  • the resist is exposed at the portion where the UV light is condensed by the lens function of the formed hemispherical arc (lens) with a radius of curvature of 50 ⁇ m, and in the subsequent development processing, the pitch is 100 ⁇ m, the opening width is 25 ⁇ m, the opening ratio is 25%, and the film A light-absorbing layer having a thickness of 2 ⁇ m was formed so that the center in the opening width direction matched the position of the apex of the lens convex portion.
  • Ag is vapor-deposited on the light absorption layer through a light absorption layer having a plurality of openings with a pitch of 100 ⁇ m and an opening width of 25 ⁇ m and a mask having a plurality of openings with a pitch of 100 ⁇ m and a width of 33 ⁇ m, and the pitch is 100 ⁇ m and the opening width is 33 ⁇ m.
  • a light reflecting layer having a rate of 33% was formed so that the center in the opening width direction was aligned with the position of the apex of the lens convex portion, and a louver film O was produced.
  • Comparative Example 1 In Comparative Example 1, the K pigment dispersion 1 was applied and dried through a mask having a plurality of openings with a pitch of 100 ⁇ m and a width of 32 ⁇ m, and light having a pitch of 100 ⁇ m, an opening width of 32 ⁇ m, an opening ratio of 32%, and a film thickness of 2 ⁇ m. The absorption layer was formed so that the center in the opening width direction matched the position of the apex of the lens convex portion.
  • a louver film J was prepared in the same manner as in Example 1 except that the center in the opening width direction was aligned with the position of the apex of the lens convex portion.
  • Comparative Example 2 In Comparative Example 2, the K pigment dispersion 1 was applied and dried through a mask having a plurality of openings with a pitch of 100 ⁇ m and a width of 32 ⁇ m, and light having a pitch of 100 ⁇ m, an opening width of 32 ⁇ m, an opening ratio of 32%, and a film thickness of 2 ⁇ m. The absorption layer was formed so that the center in the opening width direction matched the position of the apex of the lens convex portion.
  • Ag is vapor-deposited on the light absorption layer through a mask having the same pattern as the light absorption layer having a plurality of openings having a pitch of 100 ⁇ m and a width of 50 ⁇ m, and a light reflection layer having a pitch of 100 ⁇ m, an opening width of 50 ⁇ m, and an aperture ratio of 50% is formed.
  • a louver film K was produced in the same manner as in Example 1 except that the center in the opening width direction was formed so as to match the position of the apex of the lens convex portion.
  • Comparative Example 3 In Comparative Example 3, the above-mentioned K pigment dispersion 1 was applied and dried through a mask having a plurality of openings with a pitch of 100 ⁇ m and a width of 20 ⁇ m, and light having a pitch of 100 ⁇ m, an opening width of 20 ⁇ m, an aperture ratio of 20%, and a film thickness of 2 ⁇ m. The absorption layer was formed so that the center in the opening width direction matched the position of the apex of the lens convex portion.
  • Ag is vapor-deposited on the light absorption layer through a mask having the same pattern as the light absorption layer having a plurality of openings having a pitch of 100 ⁇ m and a width of 25 ⁇ m, and a light reflection layer having a pitch of 100 ⁇ m, an opening width of 25 ⁇ m, and an aperture ratio of 25% is formed.
  • a louver film L was produced in the same manner as in Example 1 except that the center in the opening width direction was formed so as to match the position of the apex of the lens convex portion.
  • Comparative Example 4 In Comparative Example 4, the above-mentioned K pigment dispersion 1 was applied and dried through a mask having a plurality of openings with a pitch of 100 ⁇ m and a width of 53 ⁇ m, and light having a pitch of 100 ⁇ m, an opening width of 53 ⁇ m, an aperture ratio of 53%, and a film thickness of 2 ⁇ m. The absorption layer was formed so that the center in the opening width direction matched the position of the apex of the lens convex portion.
  • a louver film M was produced in the same manner as in Example 1 except that the center in the opening width direction was aligned with the position of the apex of the lens convex portion.
  • Comparative Example 5 In Comparative Example 5, in order to form a hexagonal arc (lens) with a radius of curvature of 50 ⁇ m arranged in a hexagonal shape at a pitch of 100 ⁇ m on the surface, the shape is changed to an uneven roller having a surface shape obtained by reversing the shape, and The above K pigment dispersion 1 is applied and dried through a mask having a plurality of openings with a pitch of 100 ⁇ m and a width of 32 ⁇ m, and a light absorption layer having a pitch of 100 ⁇ m, an opening width of 32 ⁇ m, an opening ratio of 32%, and a film thickness of 2 ⁇ m is opened.
  • the center of the direction was formed so as to match the position of the apex of the lens convex portion.
  • Ag is vapor-deposited on the light absorption layer through a mask having the same pattern as the light absorption layer having a plurality of openings having a pitch of 100 ⁇ m and a width of 32 ⁇ m, and a light reflection layer having a pitch of 100 ⁇ m, an opening width of 32 ⁇ m, and an opening ratio of 32% is formed.
  • a louver film N was produced in the same manner as in Example 1 except that the center in the opening width direction was aligned with the position of the apex of the lens convex portion.
  • Example 1 to Comparative Example 4 are lenses arranged in a square
  • Example 2 and Comparative Example 5 are lenses arranged in a hexagon. It is.
  • the numerical value of the aperture ratio is shown as, for example, “25/5”, but the previous numerical value is a numerical value expressed by the opening width / pitch.
  • the latter numerical value is a numerical value represented by (opening area) / (square area with one side of the pitch).
  • a larger value of the maximum luminance ratio thus obtained means that the light use efficiency of the surface light source device is higher.
  • the measurement results are shown in Table 1. ⁇ Evaluation criteria> AA: 1.3 or more A: 1.25 or more and less than 1.3 B: 0.8 or more and less than 1.25 C: 0.65 or more and less than 0.8 D: Less than 0.65
  • the opening ratio in Table 1 is a ratio represented by the opening ratio of the plurality of first openings / the opening ratio of the plurality of second openings.
  • Comparative Example 1 and Comparative Example 5 have a large aperture ratio and a poor SN ratio.
  • the aperture ratio is small, the result of the maximum luminance ratio is poor, and the light utilization efficiency is poor.
  • the aperture ratio of the light absorption layer is small, the result of the maximum luminance ratio is poor, and the light utilization efficiency is poor.
  • Comparative Example 4 the aperture ratio of the light absorption layer is large, the result of the SN ratio is bad, and light leakage on the wide angle side cannot be suppressed.
  • the evaluation of the maximum luminance ratio is the same in Example 1 and Example 2, but the numerical value of the maximum luminance ratio is higher in Example 2, and the lens The hexagonal arrangement is preferred.
  • the larger the aperture ratio of the light absorption layer the higher the evaluation of the maximum luminance ratio.
  • Example 5 and Example 8 the thinner the first support, the better the SN ratio.
  • the larger the aperture ratio the higher the maximum luminance ratio.

Landscapes

  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Optical Elements Other Than Lenses (AREA)

Abstract

L'invention concerne un film de persienne selon lequel un rendement d'utilisation de lumière est maintenu et une fuite de lumière sur un côté grand angle est supprimée, et un dispositif de source de lumière de surface et un dispositif d'affichage à cristaux liquides comprenant le film de persienne. Ledit film de persienne comprend : une pluralité de lentilles disposées à un pas constant sur le côté d'émission d'une source de lumière ; un premier corps de support pour maintenir la pluralité de lentilles, le premier corps de support étant disposé plus près d'une source de lumière que les lentilles, et l'épaisseur du premier corps de support étant inférieure au pas constant ; une couche d'absorption de lumière comportant une pluralité de premières ouvertures correspondant à la pluralité de lentilles, la couche d'absorption de lumière étant disposée plus près de la source de lumière que le premier corps de support ; et une couche de réflexion de lumière pourvue d'une pluralité de secondes ouvertures correspondant à la pluralité de lentilles ; la couche d'absorption de lumière et la couche de réflexion de lumière étant disposées de telle sorte que les positions des premières ouvertures et des secondes ouvertures sont appariées, le rapport de surface ouverte des premières ouvertures dans la couche d'absorption de lumière étant de 25 % à 50 %, la réflectance de la couche de réflexion de lumière étant de 90 % ou plus, et le rapport exprimé en tant que rapport de zone ouverte des premières ouvertures/le rapport de zone ouverte des secondes ouvertures étant de 65 % à 99 %.
PCT/JP2019/019486 2018-05-25 2019-05-16 Film de persienne, dispositif source de lumière de surface et dispositif d'affichage à cristaux liquides WO2019225470A1 (fr)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2018-100670 2018-05-25
JP2018100670 2018-05-25
JP2019005360 2019-01-16
JP2019-005360 2019-01-16

Publications (1)

Publication Number Publication Date
WO2019225470A1 true WO2019225470A1 (fr) 2019-11-28

Family

ID=68615742

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2019/019486 WO2019225470A1 (fr) 2018-05-25 2019-05-16 Film de persienne, dispositif source de lumière de surface et dispositif d'affichage à cristaux liquides

Country Status (1)

Country Link
WO (1) WO2019225470A1 (fr)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001305306A (ja) * 2000-02-14 2001-10-31 Fuji Photo Film Co Ltd コリメート板および照明装置ならびに液晶表示装置
JP2009500662A (ja) * 2005-06-29 2009-01-08 リフレキサイト・コーポレーション コリメーティングマイクロレンズアレイ
JP2011064875A (ja) * 2009-09-16 2011-03-31 Sekisui Chem Co Ltd 光学シート及びその製造方法
US8177408B1 (en) * 2008-02-15 2012-05-15 Fusion Optix, Inc. Light filtering directional control element and light fixture incorporating the same

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001305306A (ja) * 2000-02-14 2001-10-31 Fuji Photo Film Co Ltd コリメート板および照明装置ならびに液晶表示装置
JP2009500662A (ja) * 2005-06-29 2009-01-08 リフレキサイト・コーポレーション コリメーティングマイクロレンズアレイ
US8177408B1 (en) * 2008-02-15 2012-05-15 Fusion Optix, Inc. Light filtering directional control element and light fixture incorporating the same
JP2011064875A (ja) * 2009-09-16 2011-03-31 Sekisui Chem Co Ltd 光学シート及びその製造方法

Similar Documents

Publication Publication Date Title
US20200292878A1 (en) Louver film, planar light source device, and liquid crystal display device
KR100964425B1 (ko) 방현성 필름용 조성물 및 방현성 필름의 제조 방법
JP5631280B2 (ja) フォトスペーサ用感光性樹脂組成物およびこれを用いたフォトスペーサ
US20120262793A1 (en) Black curable composition for wafer - level lens, and wafer - level lens
TWI644992B (zh) 著色組成物、硬化膜、圖案形成方法、彩色濾光片、彩色濾光片的製造方法、固體攝像元件及圖像顯示裝置
TWI577750B (zh) 著色組成物、彩色濾光片的製造方法、固體攝像元件的製造方法及圖像顯示裝置的製造方法
JP6249530B2 (ja) 硬化性樹脂組成物、これを用いた反射防止膜、固体撮像素子およびカメラモジュール
TWI483067B (zh) 晶圓級鏡頭用之黑色硬化性組成物及晶圓級透鏡
JP2013041153A (ja) フォトスペーサ用感光性樹脂組成物およびこれを用いたフォトスペーサ
KR20160102276A (ko) 착색 조성물, 및 이것을 이용한 경화막, 컬러 필터, 패턴 형성 방법, 컬러 필터의 제조 방법, 고체 촬상 소자, 화상 표시 장치와 염료 다량체
JP6251067B2 (ja) 着色組成物、硬化膜、カラーフィルタの製造方法、カラーフィルタ、固体撮像素子および画像表示装置
JP6647381B2 (ja) 近赤外線吸収組成物、硬化膜、近赤外線カットフィルタ、固体撮像素子、赤外線センサ、および化合物
WO2014192716A1 (fr) Procédé de fabrication de filtre coloré, composition pour formation de sous-couche, et dispositif d'affichage électroluminescent organique
JP2015151530A (ja) 複合体およびその製造方法、着色組成物、硬化膜、カラーフィルタ、カラーフィルタの製造方法、固体撮像素子および画像表示装置、ならびに、積層体よび積層体
WO2019045098A1 (fr) Film fonctionnel, dispositif source de lumière de surface, et dispositif d'affichage à cristaux liquides
JP5593174B2 (ja) 着色硬化性組成物、着色パターン、カラーフィルタ、カラーフィルタの製造方法、及び液晶表示素子
WO2019225470A1 (fr) Film de persienne, dispositif source de lumière de surface et dispositif d'affichage à cristaux liquides
JPWO2017150069A1 (ja) 樹脂組成物、樹脂膜、カラーフィルタ、遮光膜、固体撮像装置、及び、画像表示装置
TW201533535A (zh) 感放射線性組成物及其製造方法、硬化膜、彩色濾光片及其製造方法、圖案形成方法、固體攝像元件及圖像顯示裝置
JP6225254B2 (ja) 着色組成物、着色組成物の製造方法、カラーフィルタ、有機エレクトロルミネッセンス表示素子
WO2024154752A1 (fr) Composition de résine photosensible, produit durci, filtre coloré, couche de diffusion de lumière et dispositif d'affichage d'image
TW202436367A (zh) 感光性樹脂組合物、硬化物、彩色濾光器、光散射層及圖像顯示裝置
WO2020049930A1 (fr) Unité de phare de véhicule, film de protection contre la lumière de phare et procédé de production de film de protection contre la lumière de phare
JP6102219B2 (ja) 横電界を印加する表示方式の液晶表示装置用カラーフィルタ
KR20120109100A (ko) Ｕｖ 차단용 감광성 수지 조성물, 이를 이용하여 제조된 ｕｖ 차단막 및 이를 포함하는 디스플레이 장치

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 19807875

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 19807875

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: JP