WO2019225470A1

WO2019225470A1 - Louver film, surface light source device, and liquid crystal display device

Info

Publication number: WO2019225470A1
Application number: PCT/JP2019/019486
Authority: WO
Inventors: 恵関口; 高玉田; 晋也渡邉
Original assignee: 富士フイルム株式会社
Priority date: 2018-05-25
Filing date: 2019-05-16
Publication date: 2019-11-28

Abstract

Provided are a louver film in which light utilization efficiency is maintained and light leakage on a wide-angle side is suppressed, and a surface light source device and a liquid crystal display device provided with the louver film. This louver film has: a plurality of lenses arranged at a constant pitch on the emission side of a light source; a first support body for supporting the plurality of lenses, the first support body being disposed further toward a light source than the lenses, and the thickness of the first support body being less than the constant pitch; a light-absorbing layer provided with a plurality of first openings corresponding to the plurality of lenses, the light-absorbing layer being disposed further toward the light source than the first support body; and a light-reflecting layer provided with a plurality of second openings corresponding to the plurality of lenses; the light-absorbing layer and the light-reflecting layer being disposed so that the positions of the first openings and the second openings are matched, the open area ratio of the first openings in the light-absorbing layer being 25% to 50%, the reflectance of the light-reflecting layer being 90% or greater, and the ratio expressed as the open area ratio of the first openings/the open area ratio of the second openings being 65% to 99%.

Description

Louver film, surface light source device and liquid crystal display device

The present invention relates to a louver film, a surface light source device including the louver film, and a liquid crystal display device.

Liquid crystal display devices (hereinafter also referred to as LCDs (Liquid Crystal Displays)) have low power consumption and are increasingly used as space-saving image display devices year by year. A liquid crystal display device is usually composed of a surface light source device and a liquid crystal panel. In addition, the organic EL (Electro Luminescence) display device, like the liquid crystal display device, has a low power consumption, and its application is expanding year by year as a space-saving image display device. The various image display devices described above are generally required to have a wide viewing angle as viewing angle characteristics.
However, depending on the installation location of the image display device, the display image of the image display device may be displayed in a place where it is not desired to be displayed. In this case, it is necessary to limit the viewing angle of the image display device. For example, when a display image including highly confidential documents and images, and personal information and highly confidential information such as passwords is displayed on an image display device, the viewing angle is set so as not to be seen by others. Need to be restricted. Thus, it is necessary to limit the viewing angle depending on the application of the image display apparatus.

As a method for limiting the viewing angle described above, for example, there is an optical sheet used for illumination light path control in a display backlight unit disclosed in Patent Document 1. The optical sheet of Patent Document 1 reflects light on a surface of a lenticular sheet having a lens portion in which convex cylindrical lens groups are formed in parallel and a surface on the opposite side of the lens portion, and a region including a non-condensing surface by the lens portion. The lenticular sheet has a tangent line at a valley between adjacent unit lenses in a range of 35 to 60 ° at a boundary between adjacent unit lenses. In Patent Document 1, in order to reduce the sideband, the aperture ratio of the opening and the distance from the opening to the lens are defined using equations.

Japanese Patent No. 4389938

In Patent Document 1, as described above, the aperture ratio of the aperture and the distance from the aperture to the lens are defined using equations in order to reduce the sideband. However, when the use of the louver film is a vehicle-mounted monitor, it is necessary to reduce not only the sideband but also the light leakage on the wide angle side. In Patent Document 1 described above, the sideband cannot be reduced and the light leakage on the wide angle side cannot be reduced.

An object of the present invention is to provide a louver film, a surface light source device including the louver film, and a liquid crystal display device that eliminate the above-mentioned problems based on the prior art, maintain light utilization efficiency, and suppress light leakage on the wide-angle side. There is to do.

As a result of intensive studies to achieve the above object, the present inventors have obtained the following louver film:
Used in surface light source devices,
A plurality of lenses arranged at a constant pitch on the light output side of the light source;
A first support that is disposed closer to the light source than the lens and supports a plurality of lenses, the thickness being smaller than a certain pitch; and
A light absorption layer that is disposed on the light source side of the first support and includes a plurality of first openings corresponding to the plurality of lenses;
A light reflecting layer that is disposed closer to the light source than the light absorbing layer and includes a plurality of second openings corresponding to a plurality of lenses;
The light absorption layer and the light reflection layer are arranged in a state where the plurality of first openings and the plurality of second openings are aligned,
The light absorption layer has an opening ratio of the plurality of first openings of 25% to 50%,
The light reflection layer has a reflectance of 90% or more, and the opening ratios of the plurality of second openings of the light reflection layer are larger than the opening ratios of the plurality of first openings of the light absorption layer. A louver film having a ratio represented by the opening ratio of the first opening / the opening ratio of the plurality of second openings of 65% to 99%,
Was newly found and the present invention was completed.

Here, the louver film is a film with improved directivity, and in a liquid crystal display device provided with a surface light source device including this film, the directivity related to visibility is improved as compared with the case without this film, for example, It is a film that can suppress visual recognition from an oblique direction. In addition, the film has a limited viewing angle and improved reflection in areas that are not desired to be displayed.
The limitation on the viewing angle is that the viewing angle is visible in a certain angle range with respect to the louver film surface. For example, when the luminance in a direction perpendicular to the surface of the louver film is used as a reference, the luminance in a direction inclined by 45 ° with respect to a line perpendicular to the surface of the louver film is lower than the reference luminance. In this case, the viewing angle is limited near the front of the louver film. On the other hand, when the luminance in the direction inclined by 45 ° is higher than the reference luminance, the viewing angle is limited to the oblique direction of the louver film.

The light utilization efficiency mentioned above refers to a value measured by the following method.
On the light exit surface of the surface light source device, using the measuring device “EZ-Contrast XL88” (ELDIM), brightness in 1 ° increments from 0 ° (front direction) to 88 ° polar angle (Y0) Is measured, and the maximum luminance value is defined as the maximum luminance. This maximum luminance is measured in a state where the louver film is not disposed on the surface light source device (T0) and in a state where the louver film is disposed (T), and the ratio (T / T0) is calculated to obtain the maximum luminance ratio. The larger the maximum luminance ratio, the higher the light utilization efficiency.

The directivity mentioned above refers to a value evaluated by the following method.
Using a measuring instrument “EZ-Contrast XL88” (manufactured by ELDIM), measure the luminance (Y0) in 1 ° increments from a polar angle of 0 ° (front direction) to a polar angle of 88 °. The ratio of the luminance value in the direction and the minimum luminance value at the polar angle of 60 ° is taken as the SN ratio (= luminance in the front direction / minimum luminance value at the polar angle of 60 °). The S / N ratio is evaluated as a hem. The larger the S / N ratio, the better the hem and the higher the directivity. The larger the S / N ratio, the smaller the light leakage on the wide angle side.

In one aspect, the plurality of lenses are arranged two-dimensionally.
In one embodiment, the first support has a thickness of 50% or less with respect to a constant pitch.

The further aspect of this invention is related with the surface light source device containing the above-mentioned louver film and a light source.
In one mode, it has a reflective type polarizer arranged between a louver film and a light source.
The further aspect of this invention is related with the liquid crystal display device containing the above-mentioned louver film, a surface light source device, and a liquid crystal panel.

According to the present invention, it is possible to provide a louver film capable of maintaining light utilization efficiency and suppressing light leakage on the wide-angle side, a surface light source device including the louver film, and a liquid crystal display device.

It is a cross-sectional schematic diagram which shows schematic structure of the surface light source device of one Embodiment of the 1st aspect of this invention. It is a cross-sectional schematic diagram which shows typically the 1st example of a louver film. It is a top view which shows typically the 1st example of a louver film. It is a top view which shows typically the 1st example of a louver film. It is a cross-sectional schematic diagram which shows the 2nd example of a louver film typically. It is a cross-sectional schematic diagram which shows typically another example of a surface light source device. It is a cross-sectional schematic diagram which shows an example of a liquid crystal display device typically. It is a cross-sectional schematic diagram which shows typically another example of a liquid crystal display device. It is a cross-sectional schematic diagram which shows typically another example of a liquid crystal display device. It is the schematic diagram which looked at the condensing lens and the liquid crystal cell from the optical axis direction. FIG. 11 is a sectional view taken along line BB in FIG. 10. It is CC sectional view taken on the line of FIG. It is the DD sectional view taken on the line of FIG.

Hereinafter, a louver film, a surface light source device, and a liquid crystal display device of the present invention will be described in detail based on preferred embodiments shown in the accompanying drawings.
In addition, the figure demonstrated below is an illustration for demonstrating this invention, and this invention is not limited to the figure shown below.
In the following, “to” indicating a numerical range includes numerical values written on both sides. For example, when ε is a numerical value α to a numerical value β, the range of ε is a range including the numerical value α and the numerical value β, and expressed by mathematical symbols, α ≦ ε ≦ β.
Unless otherwise specified, the “angle represented by specific numerical values” and the “parallel” angle include an error range generally allowed in the corresponding technical field. Further, “same” includes an error range generally allowed in the corresponding technical field.

[Louvre film]
FIG. 1 is a schematic cross-sectional view showing a schematic configuration of a surface light source device according to an embodiment of the first aspect of the present invention. A surface light source device 1 shown in FIG. 1 has a louver film 2.
The louver film of the present invention is used in a surface light source device, and is arranged at a constant pitch on the emission side of the light source 16 and a plurality of lenses arranged on the light source 16 side of the plurality of lenses 11. And a plurality of first openings corresponding to the plurality of lenses 11 disposed on the light source 16 side of the first support 12 and having a thickness smaller than a certain pitch. A light-absorbing layer 18 including 18b, a light-reflecting layer 19 disposed on the light source 16 side of the light-absorbing layer 18 and including a plurality of second openings 19b corresponding to the plurality of lenses 11. The light absorption layer 18 and the light reflection layer 19 are disposed in a state where the one opening 18b and the plurality of second openings 19b are aligned, and the light absorption layer 18 includes the plurality of first openings. The aperture ratio of the portion 18b is 25% to 50%, and light reflection 19 has a reflectance of 90% or more, and the aperture ratios of the plurality of second openings 19b of the light reflection layer 19 are larger than the aperture ratios of the plurality of first openings 18b of the light absorption layer 18. The present invention relates to a louver film 2 having a ratio expressed by an aperture ratio of a plurality of first openings / an aperture ratio of a plurality of second openings of 65% to 99%.
The ratio represented by the aperture ratio of the plurality of first openings / the aperture ratio of the plurality of second openings is referred to as an aperture ratio.

The surface light source device 1 includes the louver film 2 described above, a diffusion plate 14 disposed on the light reflection layer 19 side of the louver film 2, a light source 16, and a reflection plate 15 in this order. In the louver film 2, for example, a first opening 18 b and a second opening 19 b are provided for each lens 11, and the first opening 18 b and the second opening 19 b are provided in one lens 11. Is provided.

The following is not intended to limit the present invention, but the reason why the louver film 2 of the above-described aspect enables further improvement in directivity with respect to visibility while maintaining the light utilization efficiency. Thinks as follows.
When the thickness of the first support 12 is smaller than the pitch of the lenses 11, light from adjacent openings other than the openings on the optical axis CL of the lenses 11 is less likely to be guided, and the sidebands are reduced. Can be reduced.
Further, the light absorbing layer 18 absorbs the light reflected by the lens or the light reflecting layer 19 or the like, or the light in which the light incident from the outside is repeatedly reflected in the first support 12, and the generation of stray light can be suppressed. Thereby, generation | occurrence | production of a side band can be suppressed.

Further, a light absorption layer 18 is provided on the lens surface side of the light reflection layer 19 in order to eliminate light leakage on the wide angle side. As a result, stray light generated between the lens 11 and the light reflecting layer 19 can be absorbed, and light leakage on the wide angle side can be reduced. However, when the aperture ratio of the light reflection layer 19 and the aperture ratio of the light absorption layer 18 are completely the same, the reflected light at the edge of the light reflection layer 19 enters the lens 11 and causes stray light. It was. By making the aperture ratio of the light absorption layer 18 smaller than the aperture ratio of the light reflection layer 19, stray light can be completely extinguished. That is, stray light can be completely extinguished by making the aperture ratio of the light reflection layer 19 larger than the aperture ratio of the light absorption layer 18.
As a result, the louver film 2 can reduce sidebands, maintain light utilization efficiency, suppress light leakage on the wide-angle side, and realize further improvement in directivity regarding visibility. For example, when a louver film is used for an in-vehicle monitor, reflection of an image on a windshield and a side glass can be suppressed.
However, the above includes inference by the present inventors and does not limit the present invention.

Hereinafter, the above-described louver film will be described in more detail.
2 is a schematic cross-sectional view schematically showing a first example of the louver film, FIG. 3 is a plan view schematically showing a first example of the louver film, and FIG. 4 is a first view of the louver film. It is a top view which shows an example typically. 3 is a plan view seen from the lens 11 side, and FIG. 4 is a plan view seen from the light reflecting layer 19 side.

<Configuration of louver film>
When used in a surface light source device, the configuration of the louver film includes a plurality of lenses arranged on the light emission side of the light source, a first support disposed on the light source side of the lens, and the first support described above. A light-absorbing layer having a first opening on the optical axes of the plurality of lenses arranged on the light source side of the body, and a light reflection having a second opening on the optical axes of the plurality of lenses. With layers.
In the louver film, for example, as shown in FIG. 2, the lens 11 is a hemispherical convex lens. As shown in FIG. 3, a plurality of lenses 11 are two-dimensionally arranged at a constant pitch Lp. Further, for example, as shown in FIG. 4, the first opening 18 b of the light absorption layer 18 and the second opening 19 b of the light reflection layer 19 are provided in alignment with respect to one lens 11. ing. The center of the first opening 18b of the light absorption layer 18 and the center of the second opening 19b of the light reflecting layer 13 coincide with the optical axis CL (see FIG. 2) of the lens 11, but this It is not limited to.

The light absorption layer 18 is disposed closer to the light source 16 than the first support 12 and includes a plurality of first openings 18b corresponding to a plurality of lenses. In the light absorption layer 18, the aperture ratio of the plurality of first openings 18b is 25% to 50%.
The light reflection layer 19 is disposed on the light source 16 side of the light absorption layer 18 and is provided on the back surface 18c of the light absorption layer 18 on the opposite side of the first support 12 and includes a plurality of lenses corresponding to the plurality of lenses. A second opening 19b is provided.
The light reflection layer 19 has a reflectance of 90% or more. The aperture ratio of the second opening 19b of the light reflecting layer 19 is larger than the aperture ratio of the plurality of first openings 18b of the light absorption layer 18, and the aperture ratio of the plurality of first openings / the plurality of second openings. The ratio represented by the opening ratio of the opening is 65% to 99%.
The light absorption layer 18 and the light reflection layer 19 have the same opening pattern. The light reflection layer 19 and the light absorption layer 18 are arranged in a state where the plurality of first openings 18b of the light absorption layer 18 and the plurality of second openings 19b of the light reflection layer 19 are aligned. Yes.
As shown in FIG. 5, the second support 17 may be disposed closer to the light source 16 than the light reflecting layer 19.

In the louver film 2 shown in FIG. 2 to FIG. 4, like the louver film 2 shown in FIG. 5, the center of the first opening 18b of the light absorption layer 18 and the 13 second openings 19b of the light reflection layer are formed. The center may be deviated from the optical axis CL of the lens 11. The direction of directivity can be adjusted by setting the center position of the opening to a position shifted from the optical axis CL of the lens.
Note that being off the optical axis CL of the lens 11 means that the optical axis CL does not pass through the center of the first opening 18 b of the light absorption layer 18. If the amount of deviation between the optical axis CL and the center of the first opening 18b and the second opening 19b is 5% or more with respect to the pitch of the lens, it is deviated from the optical axis CL of the lens 11. To do.
Further, “matching on the optical axis CL of the lens 11” means that the deviation amount between the optical axis CL and the center of the first opening 18b and the second opening 19b is 5% with respect to the pitch of the lens. Is less than.
All of the louver films 2 shown in FIG. 5 described above have a configuration in which the centers of all the openings are deviated from the optical axis CL of the lens 11, but are not limited thereto. For example, based on the relationship between the opening and the optical axis of the lens, which opening to remove from the optical axis of the lens may be determined in advance according to the direction of directivity or the like.

(lens)
In the louver film described above, the lens is not limited to the hemispherical convex lens described above, and may be an aspheric lens.
The refractive index of the lens is preferably 1.4 to 1.6, more preferably 1.45 to 1.6 from the viewpoint of directivity.
The pitch Lp (see FIG. 2) and the radius of curvature of the two-dimensionally arranged lenses may be constant or random.
The lens pitch Lp is preferably twice the radius of curvature of the lens. As a result, the lens shape becomes a hemisphere, and the distance between the top of the lens and the first support increases, so the thickness Dt (see FIG. 2) of the first support can be reduced. By reducing the thickness Dt of the first support, the sideband can be reduced.

(First support)
The thickness Dt (see FIG. 2) of the first support is smaller than the lens pitch Lp (see FIG. 2). As described above, the lens pitch Lp (see FIG. 2) is constant, and the thickness Dt (see FIG. 2) of the first support is 50% or less with respect to the lens pitch Lp (see FIG. 2). Preferably there is. By reducing the thickness of the first support, the sideband can be reduced.
When a high refractive index material is used as the first support, the thickness is preferably 30 μm or less from the viewpoint of not deteriorating brittleness. More preferably, it is 10 μm or less, and more preferably around 1 μm.
The refractive index of the first support is preferably 1.4 to 1.6, more preferably 1.45 to 1.6 from the viewpoint of directivity.

The refractive index can be measured by a known refractive index measuring device. As an example of the refractive index measuring apparatus, there is a multi-wavelength Abbe refractometer DR-M2 manufactured by Atago Co., Ltd. In addition, the refractive index in the present invention refers to a refractive index with respect to light having a wavelength of 550 nm.

The refractive index of the first support can be adjusted according to the type of components used to form the layer. As a component used in order to form a layer, it can form using the polymeric composition containing a polymeric compound and a polymerization initiator. Or the resin layer which has resin as a main component may be sufficient. Here, the main component means that the resin occupies most of the components constituting the layer. The resin contained may be one kind or two or more kinds. The resin amount in the resin layer is, for example, 50% by mass or more, preferably 70% by mass or more, with respect to the total mass of the resin layer. The resin amount in the resin layer is based on the total mass of the resin layer. For example, it is 99 mass% or less, or 95 mass% or less, but may be 100 mass%. Specific examples of the resin layer include a thermoplastic resin layer. Examples of the thermoplastic resin include polymethyl methacrylate resin (PMMA), polycarbonate resin, polystyrene resin, polymethacryl styrene (MS) resin, acrylonitrile styrene (AS) resin, polypropylene resin, polyethylene resin, polyethylene terephthalate resin, polyvinyl chloride. Examples thereof include resins (PVC), cellulose acylates, cellulose triacetates, cellulose acetate propionates, cellulose diacetates, thermoplastic elastomers, copolymers thereof, and cycloolefin polymers. Such a resin layer is preferably a cured layer formed by subjecting this composition to a polymerization treatment (curing treatment) using a polymerizable composition, from the viewpoint of ease of layer formation. The polymerizable composition may be a photopolymerizable composition that is cured by light irradiation or a thermopolymerizable composition that is cured by heating. From the viewpoint of improving productivity, a photopolymerizable composition is preferable because the curing treatment can be completed in a short time.

Particles may be included for adjusting the refractive index of the first support. The particles are not particularly limited, and may be inorganic particles or organic particles.
Specific examples of the above-mentioned particles include inorganic particles such as ZrO ₂ , TiO ₂ , Al ₂ O ₃ , In ₂ O ₃ , ZnO, SnO ₂ , Sb ₂ O ₃ , polymethyl methacrylate particles, crosslinked polymethyl methacrylate particles, Examples thereof include organic particles such as acrylic-styrene copolymer particles, melamine particles, polycarbonate particles, polystyrene particles, crosslinked polystyrene particles, polyvinyl chloride particles, and benzoguanamine-melamine formaldehyde particles. Further, as the above-mentioned particles, particles whose surface is treated for the purpose of suppressing the activity of the particle surface, improving the dispersibility in the layer, and the like, so-called core-shell particles may be used. For such particles, reference can be made, for example, to paragraphs 0022 to 0025 of JP2013-251067A. The particles described above may be organic-inorganic composite particles such as particles having an organic coating on the surface of the inorganic particles.

The above particles may be used alone or in combination of two or more. Smaller particles are preferable from the viewpoint of suppressing scattering. Therefore, the particle size is preferably 100 nm or less, more preferably 30 nm or less, and even more preferably 25 nm or less as the primary particle diameter. Moreover, it is preferable that a particle size is 1 nm or more as a primary particle diameter. The primary particle size of the above-mentioned particles is a value obtained by measuring the particle size of 50 particles with a scanning electron microscope (SEM) and calculating the number average value. The particle content in the layer containing the above-described particles is preferably set as appropriate so that the average refractive index in the above-mentioned range can be obtained.

In general, the smaller the particle size, the worse the dispersibility in the resin. For example, the fine particles by the one-end adsorptive resin described in Fujifilm research report No. 58, 2013 research report “Development of thermoplastic nanocomposite optical materials” It can be dispersed while maintaining transparency by grafting or the like.

The refractive index of the above-mentioned particles (refractive index for light having a wavelength of 550 nm) is preferably 2.00 or more and 3.00 or less, and preferably 2.05 or more and 2.50 or less from the viewpoint of adjusting the refractive index. More preferred. Here, the refractive index of the particles is a value measured by the following method. A resin material having a known refractive index is doped with particles to produce a resin material in which the particles are dispersed. The produced resin material is applied on a silicon substrate or a quartz substrate to form a resin film. The refractive index of the formed resin film is measured with an ellipsometer, and the refractive index of the particles is determined from the resin material constituting the resin film and the volume fraction of the particles. The refractive index of the titanium oxide particles used in Examples described later is a value obtained by the above-described method.

(Light absorption layer)
The light absorption layer absorbs the light reflected by the lens or the light reflection layer 19 or the like, or the light incident from the outside that repeats reflection in the first support 12 and suppresses stray light. Thereby, generation | occurrence | production of a side band can be suppressed and light utilization efficiency can further be improved.
The light absorption layer has a first opening for each lens. For example, the light absorption layer has a first opening on the optical axis of each of the plurality of lenses. The light absorption layer and the light reflection layer have the same opening pattern, and the first opening of the light absorption layer and the second opening of the light reflection layer are aligned as described above. The light reflection layer and the light absorption layer are arranged in a state where the two are aligned.
If the aperture ratio of the first opening is too small, the light utilization efficiency is lowered. On the other hand, if it is too large, the directivity becomes worse. From this viewpoint, the aperture ratio of the first opening is 25% to 50%, preferably 25% to 45%.
The plurality of first openings in the light absorption layer are smaller than the plurality of second openings in the light reflection layer and have a size of 65 to 99%.

The first opening 18b and the second opening 19b are circular, for example, but are not limited to this, and may be rectangular. The first opening 18b and the second opening 19b are defined by the width of the opening, regardless of whether the shape is a circle or a rectangle. In the case of a circle, the opening width corresponds to the diameter.
The opening width is obtained by acquiring an image including the light absorbing layer 18 including the first opening 18b and an image including the light reflecting layer 19 including the second opening 19b, and using each image, the first opening 18b, And it is obtained by calculating | requiring the length of the position corresponded to the opening width of the 2nd opening part 19b.
The opening ratio of the first opening 18b of the light absorption layer 18 is defined by the opening width of the first opening 18b with respect to the pitch at which the first opening 18b is disposed. If the pitch is 100 μm and the opening width is 25 μm, the aperture ratio is 25% at 25/100.
Also in the light reflection layer 19, as in the light absorption layer 18, the aperture ratio of the second opening 19b of the light absorption layer 13 is the second opening 19b with respect to the pitch at which the second opening 19b is disposed. Of the opening width. If the pitch is 100 μm and the opening width is 25 μm, the aperture ratio is 25% at 25/100.

The light absorption layer is not particularly limited. For example, carbon black, titanium nitride and silver ink can be used, and those used for black matrices such as LCD and organic EL (Electro Luminescence) are appropriately used. can do.
Since silver ink becomes a silver mirror after it becomes a black absorber in the heating process after ink application, after applying silver ink to the film, the ink surface is heated at a high temperature and the back surface is heated at a lower temperature. Can be a mirror mirror that plays the role of a reflective layer, and the back surface can be a black absorber, so that the reflective layer and the black absorber layer can be easily produced in the process.

The reflectance of the light absorption layer is preferably 20% or less, and in order to increase the light shielding property in the oblique direction, that is, to reduce the visibility in the oblique direction, 10% or less is better, and 7% or less is the best.
The reflectance of the light absorption layer is obtained as follows. Using a spectrophotometer (V-550 manufactured by JASCO Corporation), the material used for the light absorption layer is formed on a polyethylene terephthalate (PET) substrate, and light is incident from the formation surface to obtain a reflectance of 380 nm to 780 nm. Measure and obtain the average value. This average value is the reflectance of the light absorption layer.

(Light reflecting layer)
The light reflection layer is made of, for example, white ink, metal foil, metal vapor deposition, or silver mirror ink. Similar to the light absorption layer, the light reflecting layer has a second opening for each lens. For example, the light reflecting layer has a second opening on the optical axis of each of the plurality of lenses. The light reflecting layer and the light absorbing layer have the same opening pattern. As described above, the light reflection layer and the light absorption layer are arranged in a state where the first opening of the light absorption layer and the second opening of the light reflection layer are aligned.
If the aperture ratio of the second opening is too small, the light utilization efficiency is lowered. On the other hand, if it is too large, the directivity becomes worse.
The aperture ratio of the second opening of the light reflecting layer is defined by a ratio to the aperture ratio of the first opening of the light absorbing layer, and the aperture ratio of the first opening / the aperture ratio of the second opening. Is a ratio of 65% to 99%, preferably 70% to 99%. Since the opening ratio of the first opening is 25% to 50%, the opening ratio of the second opening is 25.25% to 76%.
The reflectance of the light reflecting layer is preferably 90% or more, more preferably 91% or more from the viewpoint of light utilization. More preferably, it is 92% or more. The light utilization rate is defined by front luminance / maximum luminance.
The reflectance of the light reflecting layer is obtained as follows. Using a spectrophotometer (V-550 manufactured by JASCO Corporation), the material used for the light reflecting layer is formed on a polyethylene terephthalate (PET) substrate, and light is incident from the forming surface to obtain a reflectance of a wavelength of 380 nm to 780 nm. Measure and obtain the average value. This average value is the reflectance of the light reflecting layer.

In addition, the light absorption layer 18 and the light reflection layer 19 may have an integrated configuration or a separate configuration. In the case of an integral configuration, the surface of the light reflecting layer 19 functions as the light absorbing layer 18, and unlike the surface reflectance, it is less than 90% and absorbs light. In this case, the reflectance of the surface functioning as the light absorption layer is preferably 20% or less as described above, more preferably 10% or less, and most preferably 7% or less.
The light absorption layer 18 and the light reflection layer 19 can be reduced in the number of parts in the integrated configuration compared to the separate configuration, and the configuration can be simplified. In the case of a separate configuration, alignment of the plurality of first openings 18b of the light absorption layer 18 and the plurality of second openings 19b of the light reflection layer 19 is necessary. Since the above alignment is unnecessary, the manufacturing process can be simplified.
The manufacturing method of a light absorption layer is not specifically limited, For example, the plate-shaped member used as a light absorption layer can be formed by an etching process or laser processing. In addition, a light absorption layer can also be formed by forming a film to be a light absorption layer on a substrate using a vapor phase method such as vapor deposition or a liquid phase method such as coating.

The plurality of second openings of the light reflecting layer may be formed in a pattern that matches the arrangement of LED (light emitting diode) light sources used in the direct type backlight. That is, the plurality of second openings may not be provided immediately above the LED light source, and the opening ratio of the plurality of second openings may increase as the distance from the LED light source increases. In this case, the lens diameter is changed in the plane so that the aperture ratio of the lens diameter and the second opening portion with respect to the lens diameter falls within the above-described preferable range. Thereby, an opening can be provided according to the light beam from the LED light source, and parallel light can be made while using light more efficiently. Further, at this time, it is easier to control the light beam by providing a mirror-like reflective layer on the back surface of the LED light source than from the case of providing a diffusive reflective layer.

The light reflecting layer may have a cholesteric liquid crystal layer.
The cholesteric liquid crystal layer includes a cholesteric liquid crystal phase and has wavelength selective reflectivity with respect to circularly polarized light in one turning direction (right circularly polarized light or left circularly polarized light) in a specific wavelength range.
Accordingly, the light reflecting layer includes, for example, a cholesteric liquid crystal layer that reflects the right circularly polarized light in the red wavelength range (620 nm to 750 nm) and the left side of the red wavelength range according to the configuration of the color filter of the liquid crystal display device described later. A cholesteric liquid crystal layer that reflects circularly polarized light, a cholesteric liquid crystal layer that reflects right circularly polarized light in the green wavelength range (495 nm to 570 nm), a cholesteric liquid crystal layer that reflects left circularly polarized light in the green wavelength range, and blue (420 nm) A portion other than the second opening by having a cholesteric liquid crystal layer that reflects right circularly polarized light in a wavelength range of ˜490 nm) and a cholesteric liquid crystal layer that reflects left circularly polarized light in a blue wavelength region , Red light, green light and blue light can be reflected.

The selective reflection wavelength λ of the cholesteric liquid crystal phase depends on the pitch P (= spiral period) of the helical structure in the cholesteric liquid crystal phase, and follows the relationship between the average refractive index n of the cholesteric liquid crystal phase and λ = n × P. Therefore, the selective reflection wavelength can be adjusted by adjusting the pitch of the spiral structure. Since the pitch of the cholesteric liquid crystal phase depends on the type of chiral agent used together with the polymerizable liquid crystal compound or the concentration of the chiral agent, the desired pitch can be obtained by adjusting these.
Further, the half-value width Δλ (nm) of the selective reflection band (circular polarization reflection band) indicating selective reflection depends on the refractive index anisotropy Δn of the cholesteric liquid crystal phase and the helical pitch P, and Δλ = Δn × P Follow the relationship. Therefore, the width of the selective reflection band can be controlled by adjusting Δn. Δn can be adjusted by the type of liquid crystal compound forming the cholesteric liquid crystal layer, the mixing ratio thereof, and the temperature during alignment. It is also known that the reflectance in the cholesteric liquid crystal phase depends on Δn. When obtaining a similar reflectance, the larger the Δn, the smaller the number of spiral pitches, that is, the thinner the film thickness. it can.
For the measurement of spiral sense and pitch, it is possible to use the method described in “Introduction to Liquid Crystal Chemistry Experiments”, edited by the Japanese Liquid Crystal Society, Sigma Publishing 2007, page 46, and “Liquid Crystal Handbook”, Liquid Crystal Handbook Editorial Committee Maruzen 196 pages. it can.

The reflected light of the cholesteric liquid crystal phase is circularly polarized. Whether the reflected light is right-handed circularly polarized light or left-handed circularly polarized light depends on the twist direction of the spiral in the cholesteric liquid crystal phase. The selective reflection of circularly polarized light by the cholesteric liquid crystal phase reflects right circularly polarized light when the helical twist direction of the cholesteric liquid crystal phase is right, and reflects left circularly polarized light when the helical twist direction is left.
The direction of rotation of the cholesteric liquid crystal phase can be adjusted by the type of liquid crystal compound forming the reflective region or the type of chiral agent added.

The selective reflection wavelength in the cholesteric liquid crystal layer can be set in any range of visible light (about 380 to 780 nm) and near infrared light (about 780 to 2000 nm), and the setting method is as described above. is there.

Examples of the material used for forming the cholesteric liquid crystal layer include a liquid crystal composition containing a liquid crystal compound. The liquid crystal compound is preferably a polymerizable liquid crystal compound.
The liquid crystal composition containing a polymerizable liquid crystal compound may further contain a surfactant, a chiral agent, a polymerization initiator, and the like.
As the liquid crystal compound, the surfactant, the chiral agent, and the polymerization initiator, known liquid crystal compounds, surfactants, chiral agents, and polymerization initiators used for the cholesteric liquid crystal layer can be used.

Here, in the case where the light reflecting layer has a cholesteric liquid crystal layer, the second opening may be physically formed, and a cholesteric liquid crystal phase may be formed in a region serving as the second opening. A region having light transmittance may be formed as the second opening portion by not forming it and having no reflectivity.

Also, a photoresist method may be used when producing the light reflecting layer. A resist material is applied to the opposite surface of the lens, and light is irradiated and developed through a mask corresponding to the pattern of the reflective layer to be produced. Thereafter, for example, aluminum or silver is vapor-deposited, and then the resist material is washed and removed, whereby a reflective layer having a desired pattern can be produced. When a photomask is not used, parallel light can be irradiated from the lens side instead. The method of irradiating parallel light from the lens side is better than the case of using a photomask in that the alignment accuracy between the lens and the opening can be improved.

In this case, the light used for exposure includes ultraviolet rays such as g-line, h-line, i-line, and j-line, and i-line exposure is particularly preferable.

Drying (pre-baking) of the film with a photoresist material applied (preferably applied) on the substrate can be performed using a hot plate, oven, etc., at a temperature range of 50 to 140 ° C. for 10 to 300 seconds. it can.

In development, the uncured part after exposure is eluted in the developer, leaving only the cured part. The development temperature is usually 20 to 30 ° C., and the development time is 20 to 600 seconds. Any developer can be used as long as it dissolves the film of the photosensitive resin composition in the uncured portion while not dissolving the cured portion. Specifically, a combination of various organic solvents or an alkaline aqueous solution can be used.

Examples of the organic solvent described above include those listed above as the solvents that can be used when preparing the photosensitive resin composition.

Examples of the alkaline aqueous solution include sodium hydroxide, potassium hydroxide, sodium carbonate, sodium bicarbonate, sodium oxalate, sodium metasuccinate, aqueous ammonia, ethylamine, diethylamine, dimethylethanolamine, tetramethylammonium hydroxide. An alkaline compound such as tetraethylammonium hydroxide (TMAH), choline, pyrrole, piperidine, 1,8-diazabicyclo- [5,4,0] -7-undecene, preferably in a concentration of 0.001 to 10% by mass, preferably Examples thereof include an alkaline aqueous solution dissolved so as to be 0.01 to 1% by mass.
In the case where an alkaline aqueous solution is used as a developer, washing (rinsing) with water is generally performed after development.

The composition of the photoresist material includes (A) a photopolymerization initiator, (B) a solvent, (C) a polymerizable monomer and (D) an alkali-soluble resin, and (A) one or more photopolymerization initiators. Including an O-acyl oxime ester compound and one or more α-aminoacetophenone compounds, two or more independent patterns can be formed simultaneously. (D) At least one of the alkali-soluble resins has an acid value of 150 to 400 mgKOH / g. Furthermore, (E) a photosensitizer or a co-initiator is included.
The total addition amount of (A) photopolymerization initiator and (E) photosensitizer or co-initiator is 0.1 to 15.0% by mass in the total solid content of the photosensitive resin composition. (C) The polymerizable monomer has an acid group, and the acid value is 20 to 150 mgKOH / g. The O-acyl oxime ester compound has an aromatic ring. The O-acyl oxime ester compound has a condensed ring including an aromatic ring. The O-acyl oxime ester compound has a condensed ring including a benzene ring and a hetero ring. An O-acyl oxime ester compound and an α-aminoacetophenone compound are contained at a ratio of 10:90 to 80:20 (mass ratio). (D) The alkali-soluble resin is an acrylic resin.

The photosensitive resin composition of the present invention contains (A) a photopolymerization initiator, (B) a solvent, (C) a polymerizable monomer, and (D) an alkali-soluble resin. It includes the above O-acyloxime ester compound and one or more α-aminoacetophenone compounds, and is capable of forming two or more independent patterns simultaneously. By using the O-acyl oxime ester compound and the α-aminoacetophenone compound in combination, two or more kinds of independent patterns can be formed.
Here, “two or more independent patterns can be formed simultaneously” means that two or more types of patterns having different heights are formed by one exposure. One exposure means exposure performed at the same time. As the exposure performed at the same time, the exposure method is not limited, and examples thereof include a method using halftone masks having different transmittances, and a method in which exposure is performed by simultaneously irradiating two or more exposure amounts.
For example, when there are two types of patterns, the pattern group (1) composed of a plurality of patterns having a high height and the pattern group (2 composed of a plurality of patterns having a low height) are provided. ) Exists. The height difference between the pattern group (1) and the pattern group (2) is preferably 0.4 to 1.1 μm. The height of the pattern group can be determined as an average value of each. Moreover, it is preferable that the height of each independent pattern group is constant, for example, it is preferable to set to ± 0.1 μm with a standard deviation of 3σ.
Hereinafter, each component of the present invention will be described in detail.

(A) Photopolymerization initiator In the present invention, an O-acyloxime ester compound and an α-aminoacetophenone compound are used as the photopolymerization initiator (A).

O-acyl oxime ester compound The O-acyl oxime ester compound used in the present invention is not particularly defined as long as it has a —C═N—O—C (═O) structure, but has an aromatic ring. Are preferred, those having a condensed ring containing an aromatic ring are more preferred, and those having a fused ring containing a benzene ring and a heterocycle are more preferred. Further, the O-acyl oxime ester compound used in the present invention preferably has a structure in which the oxime ester group is directly bonded to the aforementioned condensed ring. Here, the condensed ring containing an aromatic ring should just be an aromatic ring at least 1 ring.
The O-acyl oxime ester compound can be appropriately selected from known photopolymerization initiators such as the O-acyl oxime ester compounds described in JP-A Nos. 2000-80068 and 2001-233842. Specifically, 1- (4-phenylsulfanyl-phenyl) -butane-1,2-dione 2-oxime-O-benzoate, 1- (4-phenylsulfanyl-phenyl) -octane-1,2-dione 2-oxime-O-benzoate, 1- (4-phenylsulfanyl-phenyl) -octane-1-one oxime-O-acetate, 1- (4-phenylsulfanyl-phenyl) -butan-1-one oxime-O-acetate Etc. One type of O-acyl oxime ester compound may be used, or two or more types of compounds may be used in combination.

Further, IRGACURE OXE01 or OXE02 manufactured by BASF can also be used as the oxime ester-based photopolymerization material.

α-Aminoacetophenone compound One α-aminoacetophenone compound may be used alone, or two or more types may be used in combination.

Furthermore, as the α-aminoacetophenone compound, an acid adduct salt of the compound represented by the above general formula (4) can also be used.
Further, as commercially available α-aminoacetophenone compounds, polymerization initiators available from Ciba Specialty Chemicals under the trade names Irgacure 907 (IRGACURE 907), Irgacure 369 (IRGACURE 369), and Irgacure 379 (IRGACURE 379) are available. It can be illustrated.

Specific examples of α-aminoacetophenone compounds include 2-dimethylamino-2-methyl-1-phenylpropan-1-one, 2-diethylamino-2-methyl-1-phenylpropan-1-one, and 2-methyl. -2-morpholino-1-phenylpropan-1-one, 2-dimethylamino-2-methyl-1- (4-methylphenyl) propan-1-one, 2-dimethylamino-1- (4-ethylphenyl) -2-Methylpropan-1-one, 2-dimethylamino-1- (4-isopropylphenyl) -2-methylpropan-1-one, 1- (4-butylphenyl) -2-dimethylamino-2-methyl Propan-1-one, 2-dimethylamino-1- (4-methoxyphenyl) -2-methylpropan-1-one, 2-dimethylamino-2-methyl -1- (4-methylthiophenyl) propan-1-one, 2-methyl-1- (4-methylthiophenyl) -2-morpholinopropan-1-one (IRGACURE 907), 2-benzyl-2-dimethylamino -1- (4-morpholinophenyl) -butan-1-one (IRGACURE 369), 2-benzyl-2-dimethylamino-1- (4-dimethylaminophenyl) -butan-1-one, 2-dimethylamino -2-[(4-methylphenyl) methyl] -1- [4- (4-morpholinyl) phenyl] -1-butanone (IRGACURE 379) and the like.

The α-aminoacetophenone compound is preferably contained in a proportion of 0.1 to 10% by mass with respect to the total solid content excluding the solvent contained in the photosensitive resin composition of the present invention, and 0.3 to 8 More preferably, it is contained in a proportion of 0.5% by mass, and more preferably in a proportion of 0.5-5% by mass.

Other Photopolymerization Initiators In the present invention, other generally known photopolymerization initiators may be further used in combination as long as the effects of the combined use of the O-acyloxime ester compound and the α-aminoacetophenone compound are not impaired. it can. The photopolymerization initiator that can be used in combination is not particularly limited, but the mass of the O-acyloxime ester compound and the α-aminoacetophenone compound with respect to the total photoinitiator mass is 80% or more from the viewpoint of halftone aptitude and sensitivity. Preferably, it is 90% or more. Even when other initiators are used in combination, the optimum addition mass ratio of the O-acyloxime ester compound and the α-aminoacetophenone compound is the same.

(B) Solvent The (B) solvent that can be used in the present invention is not particularly defined unless departing from the gist of the present invention, but is classified into esters, ethers, ketones, aromatic hydrocarbons, and the like. A solvent is mentioned.
(B) Examples of esters used as a solvent include, for example, ethyl acetate, n-butyl acetate, isobutyl acetate, amyl formate, isoamyl acetate, isobutyl acetate, butyl propionate, isopropyl butyrate, ethyl butyrate, butyl butyrate, In addition to alkyl esters, methyl lactate, ethyl lactate, methyl oxyacetate, ethyl oxyacetate, butyl oxyacetate, methyl methoxyacetate, ethyl methoxyacetate, butyl methoxyacetate, methyl ethoxyacetate, ethyl ethoxyacetate, etc., 3-oxypropion 3-oxypropionic acid alkyl esters such as methyl acid and ethyl 3-oxypropionate; methyl 2-oxypropionate, ethyl 2-oxypropionate, propyl 2-oxypropionate, 2-oxy-2-methylpropionic acid Methyl, 2-oxy -2-alkyl 2-hydroxypropionates such as ethyl 2-methylpropionate; methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, 2-methoxypropionate Acid methyl, ethyl 2-methoxypropionate, propyl 2-methoxypropionate, methyl 2-ethoxypropionate, ethyl 2-ethoxypropionate, methyl 2-methoxy-2-methylpropionate, 2-ethoxy-2-methylpropion Examples include alkyl propionate alkyl esters such as ethyl acetate; methyl pyruvate, ethyl pyruvate, propyl pyruvate, methyl acetoacetate, ethyl acetoacetate, methyl 2-oxobutanoate, ethyl 2-oxobutanoate and the like.

Examples of ethers include, for example, diethylene glycol dimethyl ether, tetrahydrofuran, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, methyl cellosolve acetate, ethyl cellosolve acetate, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol monobutyl ether, propylene glycol methyl ether Examples include acetate, propylene glycol ethyl ether acetate, propylene glycol propyl ether acetate and the like.
Examples of ketones include methyl ethyl ketone, cyclohexanone, 2-heptanone, 3-heptanone and the like.
Examples of aromatic hydrocarbons include toluene, xylene, and the like.

Among these solvents, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, ethyl cellosolve acetate, ethyl lactate, diethylene glycol dimethyl ether, butyl acetate, methyl 3-methoxypropionate, 2-heptanone, cyclohexanone, ethyl carbitol acetate Butyl carbitol acetate, propylene glycol methyl ether acetate and the like are preferable.
A solvent may be used independently and may be used in combination of 2 or more type.
The content of the solvent (B) in the photosensitive resin composition of the present invention is appropriately determined in consideration of the applicability of the photosensitive resin composition and the like. B) The content of the solvent is 45 to 85% by mass.

(C) Polymerizable monomer In the photosensitive resin composition of this invention, 1 or more types of (C) polymerizable monomers are contained as a sclerosing | hardenable component. As the polymerizable monomer, a plurality of polymerizable monomers may be used in combination, or one or more of a polymerizable monomer containing an acid group and a polymerizable monomer having no acid group may be used in combination.

Examples of polymerizable monomers containing carboxyl groups include polyfunctional acrylates modified with carboxyl groups in addition to unsaturated fatty acids such as acrylic acid, methacrylic acid, phthalic acid, fumaric acid, maleic acid, itaconic acid, crotonic acid, and cinnamonic acid. Compounds. Examples of the carboxyl group-modified polyfunctional acrylate compounds include succinic acid modified pentaerythritol triacrylate, succinic acid modified trimethylolpropane triacrylate, succinic acid modified pentaerythritol tetraacrylate, succinic acid modified dipentaerythritol pentaacrylate, and succinic acid modified dipenta. Erythritol hexaacrylate, adipic acid modified pentaerythritol triacrylate, adipic acid modified trimethylolpropane triacrylate, adipic acid modified pentaerythritol tetraacrylate, adipic acid modified dipentaerythritol pentaacrylate, adipic acid modified dipentaerythritol tetraacrylate, etc. Aronix M-510, Aronix M-520, Aronix T -2349, Aronix TO-2359 (manufactured by Toagosei Co., Ltd.) can be preferably used commercially available compounds such as.

Examples of polymerizable monomers containing phenolic hydroxyl groups include p-hydroxystyrene, 3,4-dihydroxystyrene, 3,5-dihydroxystyrene, 2,4,6-trihydroxystyrene, (p-hydroxy) benzyl acrylate, and salicylic acid. Modified pentaerythritol triacrylate, salicylic acid modified trimethylolpropane triacrylate, salicylic acid modified pentaerythritol tetraacrylate, salicylic acid modified dipentaerythritol pentaacrylate, salicylic acid modified dipentaerythritol hexaacrylate, etc. are preferred, salicylic acid modified dipentaerythritol Hexaacrylate, salicylic acid-modified dipentaerythritol pentaacrylate.

Examples of the polymerizable monomer containing a sulfonic acid group include vinyl sulfonic acid, allyl sulfonic acid, styrene sulfonic acid, and butyl sulfonic acid-modified acrylamide. Examples of the polymerizable monomer containing a phosphoric acid group include vinyl phosphoric acid, styrene phosphoric acid, and butyl phosphoric acid-modified acrylamide. Of these, butylsulfonic acid-modified acrylamide is preferable, and a commercially available compound is ATBS (manufactured by Toagosei Co., Ltd.).

Among these polymerizable monomers having an acid group, a polymerizable monomer having a carboxyl group and a polymerizable monomer having a phenolic hydroxyl group are preferable, and a polymerizable monomer having a carboxyl group is more preferable, from the viewpoint of production suitability and cost. .

(Polymerizable monomer having no acid group)
In the present invention, the polymerizable monomer having no acid group that can be used in combination with the polymerizable monomer having an acid group is not particularly limited as long as it can be polymerized, and is a low molecular compound having at least one ethylenic double bond, dimer Compounds capable of addition polymerization such as isomers, trimers, and oligomers can be preferably used.
Examples of the ethylenic compound include an ester of an unsaturated carboxylic acid and a monohydroxy compound, an ester of an aliphatic polyhydroxy compound and an unsaturated carboxylic acid, an ester of an aromatic polyhydroxy compound and an unsaturated carboxylic acid, and an unsaturated carboxylic acid. Reaction of ester, polyisocyanate compound and (meth) acryloyl-containing hydroxy compound obtained by esterification reaction of acid with polyhydric carboxylic acid and polyhydric hydroxy compound such as fatty acid polyhydroxy compound and aromatic polyhydroxy compound described above And an ethylenic compound having a urethane skeleton.

Specific polymerizable monomers can be classified and listed according to the number of polymerizable groups in one molecule as shown below, but are not limited thereto.

(1) Compound having one polymerizable group in one molecule Examples of the compound having one polymerizable group in one molecule include, for example, hexyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, Stearyl (meth) acrylate, cyclohexyl (meth) acrylate, 4-n-butylcyclohexyl (meth) acrylate, bornyl (meth) acrylate, isobornyl (meth) acrylate, benzyl (meth) acrylate, 2-ethylhexyl glycol (meth) Acrylate, butoxyethyl (meth) acrylate, 2-chloroethyl (meth) acrylate, cyanoethyl (meth) acrylate, 3-methoxybutyl (meth) acrylate, 2- (2-methoxyethoxy) ethyl (meth) acrylate, 2,2, 2-tetrafluoro Ethyl (meth) acrylate, 1H, 1H, 2H, 2H perfluorodecyl (meth) acrylate, phenyl (meth) acrylate, 2,4,5-tetramethylphenyl (meth) acrylate, 4-chlorophenyl (meth) acrylate, phenoxy Methyl (meth) acrylate, glycidyl (meth) acrylate, glycidyloxybutyl (meth) acrylate, glycidyloxyethyl (meth) acrylate, 2-hydroxyethyl (meth) acrylate, 3-hydroxypropyl (meth) acrylate, 2- Hydroxypropyl (meth) acrylate, 2-hydroxybutyl (meth) acrylate, 4-hydroxybutyl (meth) acrylate, 3-hydroxypropyl (meth) acrylate, polyethylene oxide monomethyl ether ( ) Acrylate, oligoethylene oxide monomethyl ether (meth) acrylate, polyethylene oxide (meth) acrylate, oligoethylene oxide (meth) acrylate, 2-hydroxy-3-phenoxypropyl (meth) acrylate, EO modified phenol (meth) acrylate, EO modified Examples include cresol (meth) acrylate, EO-modified nonylphenol (meth) acrylate, PO-modified nonylphenol (meth) acrylate, and EO-modified-2-ethylhexyl (meth) acrylate.

(2) Compound having two polymerizable groups in one molecule Examples of a compound having two polymerizable groups in one molecule include two (meth) acryloyl groups in the same molecule as the polymerizable group. For example, ethylene glycol di (meth) acrylate, diethylene glycol di (meth) acrylate, triethylene glycol di (meth) acrylate, polyethylene glycol di (meth) acrylate, 1,3-butylene glycol di (meth) ) Acrylate, 1,4-butanediol di (meth) acrylate, 1,6-hexanediol di (meth) acrylate, neopentyl glycol di (meth) acrylate, propylene glycol di (meth) acrylate, dipropylene glycol di (meth) ) Acrylate, tripropylene glycol Di (meth) acrylate, polypropylene glycol di (meth) acrylate, 2-hydroxy-1,3-diaacryloxypropane, 2,2-bis [4- (acryloxyethoxy) phenyl] propane, 2,2-bis [ 4- (acryloxydiethoxy) phenyl] propane, bis (acryloyloxyethyl) ether of bisphenol A, (meth) acrylic acid modified product of bisphenol A type epoxy resin, 3-methylpentanediol di (meth) acrylate, 2 -Hydroxy-3-acryloyloxypropyl methacrylate, dimethylol-tricyclodecane di (meth) acrylate and the like, preferably dimethylol-tricyclodecane di (meth) acrylate, neopentyl glycol di (meth) acrylate, ethoxylation Bisfe Lumpur A di (meth) acrylate, (meth) acrylic acid-modified product of bisphenol A type epoxy resins.

(3) Compound having three polymerizable groups in one molecule Examples of the compound having three polymerizable groups in one molecule include, for example, trimethylolpropane tri (meth) acrylate, trimethylolethanetri ( (Meth) acrylate, trimethylolpropane alkylene oxide modified tri (meth) acrylate, pentaerythritol tri (meth) acrylate, dipentaerythritol tri (meth) acrylate, trimethylolpropane tri ((meth) acryloyloxypropyl) ether, isocyanuric acid Alkylene oxide modified tri (meth) acrylate, dipentaerythritol propionate tri (meth) acrylate, tri ((meth) acryloyloxyethyl) isocyanurate, hydroxypivalaldehyde modified dimethylol group Examples include lopantri (meth) acrylate, sorbitol tri (meth) acrylate, propoxylated trimethylolpropane tri (meth) acrylate, and ethoxylated glycerin triacrylate.

(4) Compound having four or more polymerizable groups in one molecule Examples of the compound having four or more polymerizable groups in one molecule include pentaerythritol tetra (meth) acrylate and sorbitol tetra (meth) acrylate. , Ditrimethylolpropane tetra (meth) acrylate, dipentaerythritol propionate tetra (meth) acrylate, ethoxylated pentaerythritol tetra (meth) acrylate, dipentaerythritol penta (meth) acrylate, dipentaerythritol hexa (meth) acrylate, sorbitol Penta (meth) acrylate, sorbitol hexa (meth) acrylate, phosphazene alkylene oxide modified hexa (meth) acrylate, captolactone modified dipentaerythritol hexa (me And urethane acrylates such as UA-306H, UA-306T, and UA-306I manufactured by Kyoeisha Chemical Co., Ltd.

Among these, from the viewpoint of suitably maintaining solvent resistance and ITO (Indium Tin Oxide) sputtering suitability, (meth) acrylate monomers having two or more (meth) acryloyl groups in the same molecule are preferable, and three or more The (meth) acrylate monomer having a (meth) acryloyl group is more preferable.
In particular, (meth) acrylate monomers having 4 or more (meth) acryloyl groups are advantageous. For example, dipentaerythritol pentaacrylate and dipentaerythritol hexaacrylate are preferable from the viewpoint of solvent resistance and suitability for ITO sputtering. (The mixing ratio in terms of mass is dipentaerythritol pentaacrylate: dipentaerythritol hexaacrylate = 2-4: 8-6) is preferably used.

When a polymerizable monomer having an acid group and a polymerizable monomer having no acid group are used in combination, the total of the polymerizable monomer having an acid group and the polymerizable monomer having no acid group is preferably 100 parts by mass. The addition ratio is not particularly limited as long as it is within the preferable acid value range shown above.

In the photosensitive resin composition of the present invention, the content of the polymerizable monomer is preferably 5 to 80% by mass, more preferably 10 to 70% by mass, based on the total solid content excluding the solvent of the photosensitive resin composition. %, More preferably in the range of 20 to 60% by mass.

(D) Alkali-soluble resin As the (D) alkali-soluble resin applicable to the present invention, any polymer compound that is soluble in a solvent can be used. Each of the alkali-soluble resins may be used as a single compound or a plurality of compounds may be used in combination. As a preferable alkali-soluble resin, a resin having an acid group (hereinafter, appropriately referred to as “alkali-soluble resin”) is preferable in view of alkali developability by a photolithography method.

The alkali-soluble resin is preferably a linear organic polymer, and an alkali-soluble polymer having at least one alkali-soluble group (for example, a carboxyl group, a phosphate group, a sulfonate group, etc.) therein. More preferably, it is soluble in an organic solvent and can be developed with a weak alkaline aqueous solution.

For example, a known radical polymerization method can be applied to the production of the alkali-soluble resin.
Polymerization conditions such as temperature, pressure, type and amount of radical initiator, type of solvent, etc. when producing an alkali-soluble resin by radical polymerization can be easily set by those skilled in the art, and the conditions are determined experimentally. It can also be done.

As the linear organic polymer used as the alkali-soluble resin, a polymer having a carboxyl group in the side chain is preferable.
For example, JP-A-59-44615, JP-B-54-34327, JP-B-58-12777, JP-B-54-25957, JP-A-59-53836, JP-A-59-71048 As described, methacrylic acid copolymer, acrylic acid copolymer, itaconic acid copolymer, crotonic acid copolymer, maleic acid copolymer, partially esterified maleic acid copolymer, etc., and side chain Examples thereof include acidic cellulose derivatives having a carboxylic acid, polymers obtained by adding an acid anhydride to a polymer having a hydroxyl group, and high molecular polymers having a (meth) acryloyl group in the side chain.

Among these, a benzyl (meth) acrylate / (meth) acrylic acid copolymer or a multi-component copolymer composed of benzyl (meth) acrylate / (meth) acrylic acid / other monomers is particularly preferable. In addition, those obtained by copolymerizing 2-hydroxyethyl methacrylate are also useful.
The aforementioned polymers can be mixed and used in an arbitrary amount.

In addition to the above, 2-hydroxypropyl (meth) acrylate / polystyrene macromonomer / benzyl methacrylate / methacrylic acid copolymer, 2-hydroxy-3-phenoxypropyl acrylate / polymethyl described in JP-A-7-140654 Methacrylate macromonomer / benzyl methacrylate / methacrylic acid copolymer, 2-hydroxyethyl methacrylate / polystyrene macromonomer / methyl methacrylate / methacrylic acid copolymer, 2-hydroxyethyl methacrylate / polystyrene macromonomer / benzyl methacrylate / methacrylic acid copolymer Etc.

Examples of other alkali-soluble resins include JP-A-7-207211, JP-A-8-259876, JP-A-10-300922, JP-A-11-140144, JP-A-11-174224, and JP-A-11-174224. Known polymer compounds described in JP 2000-56118 A, JP 2003-233179 A, JP 2009-52020 A, and the like can be used.

Regarding the specific structural unit of the alkali-soluble resin, in particular, a copolymer of (meth) acrylic acid and other monomers copolymerizable therewith can be easily obtained, and adjustment of alkali solubility and the like is easy. Therefore, it is preferably used.

Examples of other monomers copolymerizable with the above-mentioned (meth) acrylic acid include alkyl (meth) acrylates, aryl (meth) acrylates, vinyl compounds and the like. Here, the hydrogen atom of the alkyl group and the aryl group may be substituted with a substituent.

Specific examples of the aforementioned alkyl (meth) acrylate and aryl (meth) acrylate include methyl (meth) acrylate, ethyl (meth) acrylate, propyl (meth) acrylate, butyl (meth) acrylate, isobutyl (meth) acrylate, and pentyl. (Meth) acrylate, hexyl (meth) acrylate, octyl (meth) acrylate, phenyl (meth) acrylate, benzyl acrylate, tolyl acrylate, naphthyl acrylate, cyclohexyl acrylate, and the like.

Examples of the vinyl compound include styrene, α-methylstyrene, vinyl toluene, glycidyl (meth) acrylate, acrylonitrile, vinyl acetate, N-vinylpyrrolidone, tetrahydrofurfuryl (meth) acrylate, polystyrene macromonomer, polymethyl methacrylate. Macromonomer, CH ₂ = CR ³¹ R ³² [wherein R ³¹ represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, and R ³² represents an aromatic hydrocarbon ring having 6 to 10 carbon atoms. CH ₂ ═C (R ³¹ ) (COOR ³³ ) [wherein R ³¹ represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, and R ³³ represents an alkyl group having 1 to 8 carbon atoms or 6 carbon atoms. Represents -12 aralkyl groups. ], Etc. can be mentioned.

These other copolymerizable monomers can be used singly or in combination of two or more.
Preferred other copolymerizable monomers are selected from CH ₂ ═CR ³¹ R ³² , CH ₂ ═C (R ³¹ ) (COOR ³³ ), phenyl (meth) acrylate, benzyl (meth) acrylate and styrene. At least one, and particularly preferably CH ₂ ═CR ³¹ R ³² and / or CH ₂ ═C (R ³¹ ) (COOR ³³ ). These R ³¹ , R ³² and R ³³ are as defined above.

The content of the alkali-soluble resin in the photosensitive resin composition is preferably 5 to 60% by mass, more preferably 10%, based on the total solid content excluding the solvent contained in the photosensitive resin composition. It is -55 mass%, Most preferably, it is 15-50 mass%.
The alkali-soluble resin used in the present invention preferably has a weight average molecular weight (Mw) of 1,000 to 100,000, more preferably 5,000 to 50,000.

The acid value of the alkali-soluble resin used in the present invention is preferably 150 to 400 mgKOH / g, more preferably 180 to 380 mgKOH / g, and further preferably 200 to 350 mgKOH / g. By setting it as such a range, the photosensitive composition excellent in the halftone aptitude etc. is obtained.

(E) Photosensitizer or co-initiator (E) A photosensitizer or co-initiator may be further added to the photosensitive resin composition of the present invention. By adding these, spectral sensitivity can be moved or expanded, and photopolymerization of the photosensitive resin composition of the present invention can be promoted.
As the above-described photosensitizer or co-initiator, it is particularly preferable to use an aromatic compound. For example, benzophenone and derivatives thereof, thioxanthone and derivatives thereof, anthraquinone and derivatives thereof, coumarin or phenothiazine and derivatives thereof, 3- ( Aroylmethylene) thiazoline, rhodanine, camphorquinone, eosin, rhodamine, erythrosine, xanthene, thioxanthene, acridine (eg 9-phenylacridine), 1,7-bis (9-acridinyl) heptane, 1,5-bis ( 9-Acridinyl) pentane, cyanine, merocyanine dyes.

Examples of the thioxanthone include thioxanthone, 2-isopropylthioxanthone, 2-chlorothioxanthone, 1-chloro-4-propoxythioxanthone, 2-dodecylthioxanthone, 2,4-diethylthioxanthone, 2,4-dimethylthioxanthone, 1- Methoxycarbonylthioxanthone, 2-ethoxycarbonylthioxanthone, 3- (2-methoxyethoxycarbonyl) thioxanthone, 4-butoxycarbonylthioxanthone, 3-butoxycarbonyl-7-methylthioxanthone, 1-cyano-3-chlorothioxanthone, 1-ethoxycarbonyl -3-chlorothioxanthone, 1-ethoxycarbonyl-3-ethoxythioxanthone, 1-ethoxycarbonyl-3-aminothioxanthone, 1-ethoxy Carbonyl-3-phenyl sulfuryl thioxanthone, 3,4-di - [2- (2-methoxyethoxy) ethoxycarbonyl] thioxanthone, 1,3-dimethyl-2-hydroxy -9H- thioxanthene-9-one,
2-ethylhexyl ether, 1-ethoxycarbonyl-3- (1-methyl-1-morpholinoethyl) thioxanthone, 2-methyl-6-dimethoxymethylthioxanthone, 2-methyl-6- (1,1-dimethoxybenzyl) thioxanthone, 2-morpholinomethylthioxanthone, 2-methyl-6-morpholinomethylthioxanthone, N-allylthioxanthone-3,4-dicarboximide, N-octylthioxanthone-3,4-dicarboximide, N- (1,1,3 , 3-tetramethylbutyl) thioxanthone-3,4-dicarboximide, 1-phenoxythioxanthone, 6-ethoxycarbonyl-2-methoxythioxanthone, 6-ethoxycarbonyl-2-methylthioxanthone, thioxanthone-2-carboxylic acid polyester Glycol esters, 2-hydroxy-3- (3,4-dimethyl-9-oxo -9H- thioxanthone-2-yloxy) -N, N, include N- trimethyl-1-propanaminium chloride.

Examples of the benzophenone include benzophenone, 4-phenylbenzophenone, 4-methoxybenzophenone, 4,4′-dimethoxybenzophenone, 4,4′-dimethylbenzophenone, 4,4′-dichlorobenzophenone, and 4,4′-bis. (Dimethylamino) benzophenone, 4,4′-bis (diethylamino) benzophenone, 4,4′-bis (methylethylamino) benzophenone, 4,4′-bis (p-isopropylphenoxy) benzophenone, 4-methylbenzophenone, 2 , 4,6-trimethylbenzophenone, 4- (4-methylthiophenyl) benzophenone, 3,3′-dimethyl-4-methoxybenzophenone, methyl-2-benzoylbenzoate, 4- (2-hydroxyethylthio) benzophenone, 4 -(4- Rilthio) benzophenone, 1- [4- (4-benzoylphenylsulfanyl) phenyl] -2-methyl-2- (toluene-4-sulfonyl) propan-1-one, 4-benzoyl-N, N, N-trimethylbenzene Metanaminium chloride, 2-hydroxy-3- (4-benzoylphenoxy) -N, N, N-trimethyl-1-propanaminium chloride monohydrate, 4- (13-acryloyl-1,4,7, 10,13-pentaoxatridecyl) benzophenone, 4-benzoyl-N, N-dimethyl-N- [2- (1-oxo-2-propenyl) oxy] ethylbenzenemethananium chloride.

Examples of the coumarin include coumarin 1, coumarin 2, coumarin 6, coumarin 7, coumarin 30, coumarin 102, coumarin 106, coumarin 138, coumarin 152, coumarin 153, coumarin 307, coumarin 314, coumarin 314T, coumarin 334, Coumarin 337, Coumarin 500, 3-Benzoylcoumarin, 3-benzoyl-7-methoxycoumarin, 3-benzoyl-5,7-dimethoxycoumarin, 3-benzoyl-5,7-dipropoxycoumarin, 3-benzoyl-6,8 -Dichlorocoumarin, 3-benzoyl-6-chlorocoumarin, 3,3'-carbonyl-bis [5,7-di (propoxy) coumarin], 3,3'-carbonyl-bis (7-diethylaminocoumarin), 3- Isobutyroylcoumarin, 3-benzoyl 5,7-dimethoxycoumarin, 3-benzoyl-5,7-diethoxycoumarin, 3-benzoyl-5,7-dibutoxycoumarin, 3-benzoyl-5,7-di (methoxyethoxy) coumarin, 3-benzoyl- 5,7-di (allyloxy) coumarin, 3-benzoyl-7-dimethylaminocoumarin, 3-benzoyl-7-diethylaminocoumarin, 3-isobutyroyl-7-dimethylaminocoumarin, 5,7-dimethoxy-3- (1- Naphthoyl) coumarin, 5,7-diethoxy-3- (1-naphthoyl) coumarin, 3-benzoylbenzo [f] coumarin, 7-diethylamino-3-thienoylcoumarin, 3- (4-cyanobenzoyl) -5,7 -Dimethoxycoumarin, 3- (4-cyanobenzoyl) -5,7-dipropoxycoumarin, 7- Dimethylamino-3-phenylcoumarin, 7-diethylamino-3-phenylcoumarin, coumarin derivatives disclosed in JP-A-9-179,299 and 9-325,209, such as 7-[{4-chloro -6- (diethylamino) -S-triazin-2-yl} amino] -3-phenylcoumarin.

Examples of 3- (aroylmethylene) thiazoline include 3-methyl-2-benzoylmethylene-β-naphthothiazoline, 3-methyl-2-benzoylmethylene-benzothiazoline, 3-ethyl-2-propionylmethylene-β-. Naphthiazoline is mentioned.

Examples of the aforementioned rhodanine include 4-dimethylaminobenzalrhodanine, 4-diethylaminobenzalrhodanine, 3-ethyl-5- (3-octyl-2-benzothiazolinylidene) rhodanine, JP-A-8-305, And rhodanine derivatives represented by the formulas [1], [2] and [7] disclosed in Japanese Patent No. 019.

In addition to the aforementioned compounds, acetophenone, 3-methoxyacetophenone, 4-phenylacetophenone, benzyl, 4,4′-bis (dimethylamino) benzyl, 2-acetylnaphthalene, 2-naphthaldehyde, dansylic acid derivative, 9, 10-anthraquinone, anthracene, pyrene, aminopyrene, perylene, phenatrene, phentolenquinone, 9-fluorenone, dibenzosuberone, curcumin, xanthone, thiomichlerketone, α- (4-dimethylaminobenzylidene) ketone, 2,5- Bis (4-diethylaminobenzylidenecyclopentanone, 2- (4-dimethylaminobenzylidene) indan-1-one, 3- (4-dimethylaminophenyl) -1-indan-5-ylpropenone, 3-phenylthiophthalimide, N - Tyl-3,5-di (ethylthio) phthalimide, N-methyl-3,5-di (ethylthio) phthalimide, phenothiazine, methylphenothiazine, amine, N-phenylglycine, ethyl 4-dimethylaminobenzoate, 4-dimethylamino Use butoxyethyl benzoate, 4-dimethylaminoacetophenone, triethanolamine, methyldiethanolamine, dimethylaminoethanol, 2- (dimethylamino) ethylbenzoate, poly (propylene glycol) -4- (dimethylamino) benzoate, etc. Can do.

The photosensitizer or co-initiator (E) to be added to the photosensitive resin composition of the present invention is selected from benzophenone and derivatives thereof, thioxanthone and derivatives thereof, anthraquinone and derivatives thereof, and coumarin derivatives among the above. Preferred is at least one photosensitizer compound.

The content of (E) photosensitizer or co-initiator in the photosensitive resin composition is 0.5 to 15 with respect to the total solid content excluding the solvent contained in the photosensitive resin composition. % By mass is preferable, more preferably 1 to 12% by mass, and particularly preferably 2 to 10% by mass.
Further, the total amount of addition of (A) photopolymerization initiator and (E) photosensitizer or co-initiator is 0.1 to 15.0% by mass in the total solid content of the photosensitive resin composition. It is preferably 0.1 to 12.0% by mass.

(Other ingredients)
In the photosensitive resin composition of the present invention, if necessary, a radical scavenger, a light stabilizer, a curing aid, a thermal polymerization initiator, a surfactant, an adhesion assistant, a development accelerator, a thermal polymerization inhibitor, Various additives such as a dispersant and other additives (filler, ultraviolet absorber, anti-aggregation agent, etc.) can be contained.

(Light stabilizer)
Various light stabilizers may be added to the present invention to improve light resistance. The kind of the light stabilizer is not particularly limited, but from the viewpoint of versatility, a hindered amine light stabilizer; for example, bis (2,2,6,6-tetramethyl-4-piperidyl) adipate, bis (1,2,2) , 6,6-pentamethyl-4-piperidyl) adipate, bis (2,2,6,6-tetramethyl-4-piperidyl) sebacate, bis (1,2,2,6,6-pentamethyl-4-piperidyl) Sebacate, tetrakis (2,2,6,6-tetramethyl-4-piperidyl) -1,2,3,4-tetraacrylate, tetrakis (1,2,2,6,6-pentamethyl-4-piperidyl)- 1,2,3,4-tetraacrylate, hindered phenol light stabilizer; for example, pentaerythritol-tetrakis (3- (3 ′, 5′-di-tert-butyl-4′- Hydroxyphenyl) propionate and the like are preferably used.

The content of the light stabilizer in the present invention is preferably about 0.1 to 5.0% by mass, and preferably 0.2 to 4.0% by mass with respect to the total solid content of the photosensitive resin composition. More preferably, it is 0.5 to 2.0% by mass. If it is 0.1% by mass or less, the desired light resistance cannot be obtained, and if it is 5.0% by mass or more, the sensitivity decreases, which is not preferable.

(Curing aid)
As a curing aid, a compound having an epoxy ring may be used in order to increase the strength of the formed coating film. The use of a compound having an epoxy ring is preferable because thermal polymerization proceeds, solvent resistance is improved, and ITO sputtering suitability is improved.

The compound having an epoxy ring is a compound having two or more epoxy rings in the molecule such as bisphenol A type, cresol novolac type, biphenyl type, and alicyclic epoxy compound.
For example, bisphenol A type includes Epototo YD-115, YD-118T, YD-127, YD-128, YD-134, YD-8125, YD-7011R, ZX-1059, YDF-8170, YDF-170, etc. As described above, manufactured by Toto Kasei Co., Ltd.), Denacol EX-1101, EX-1102, EX-1103, etc. Besides these, bisphenol F type and bisphenol S type similar to these can also be mentioned. Epoxy acrylates such as Ebecryl 3700, 3701, and 600 (manufactured by Daicel UCB) can also be used.

Examples of the cresol novolak type include Epototo YDPN-638, YDPN-701, YDPN-702, YDPN-703, YDPN-704, etc. (above, manufactured by Tohto Kasei), Denacol EM-125, etc. Examples of the biphenyl type include 3,5,3 ′, 5′-tetramethyl-4,4′-diglycidylbiphenyl, and examples of the alicyclic epoxy compound include Celoxide 2021, 2081, 2083, 2085, Epolide GT-301, GT-302, GT-401, GT-403, EHPE-3150 (above, manufactured by Daicel Chemical Co., Ltd.), Santo Tote ST-3000, ST-4000, ST-5080, ST-5100, etc. (above, manufactured by Tohto Kasei Co., Ltd.) Epilon 430, 673, 695, 850S, 4032 (above DIC) ), And the like.
1,1,2,2-tetrakis (p-glycidyloxyphenyl) ethane, tris (p-glycidyloxyphenyl) methane, triglycidyltris (hydroxyethyl) isocyanurate, o-phthalic acid diglycidyl ester, terephthalic acid Diglycidyl ester, amine type epoxy resins such as Epototo YH-434 and YH-434L (manufactured by Nagase Kasei Co., Ltd.), glycidyl ester in which dimer acid is modified in the skeleton of bisphenol A type epoxy resin, and the like can also be used.

Among these, “molecular weight / number of epoxy rings” is preferably 100 or more, and more preferably 130 to 500. If the “molecular weight / number of epoxy rings” is small, the curability is high, the shrinkage during curing is large, and if it is too large, the curability is insufficient, the reliability is poor, and the flatness is poor. Preferred compounds include Epototo YD-115, 118T, 127, YDF-170, YDPN-638, YDPN-701 (manufactured by Nagase Kasei Co., Ltd.), Plaxel GL-61, GL-62, 3, 5, 3 ′, Examples thereof include 5′-tetramethyl-4,4′diglycidylbiphenyl, ceroxide 2021, 2081, epolide GT-302, GT-403, and EHPE-3150 (manufactured by Daicel Chemical Industries, Ltd.).

The content of the curing aid in the present invention is preferably about 0.1 to 5.0% by mass, and preferably 0.2 to 4.0% by mass with respect to the total solid content of the photosensitive resin composition. More preferably, it is 0.5 to 2.0% by mass. If it is 0.1% by mass or less, the effect of promoting the curing cannot be obtained, and if it is 5.0% by mass or more, the light resistance is deteriorated, which is a problem.

(Thermal polymerization initiator)
It is also effective to contain a thermal polymerization initiator in the photosensitive resin composition of the present invention. Examples of the thermal polymerization initiator include various azo compounds and peroxide compounds. Examples of the azo compounds include azobis compounds. Examples of the peroxide compounds include Ketone peroxides, peroxyketals, hydroperoxides, dialkyl peroxides, diacyl peroxides, peroxyesters, peroxydicarbonates, and the like.

(Surfactant)
The photosensitive resin composition of the present invention is preferably constituted using various surfactants from the viewpoint of improving coating properties. The surfactant can improve the liquid properties (particularly fluidity) when used as a coating liquid, and can improve the uniformity of the coating thickness and the liquid-saving property. In other words, the interfacial tension between the substrate and the coating liquid is lowered to improve the wettability to the substrate and the coating property to the substrate is improved. This is also effective in that a film having a uniform thickness with small thickness unevenness can be formed. It is also effective in slit coating that easily causes liquid breakage.

As the surfactant, various nonionic, cationic and anionic surfactants can be used. Among these, a nonionic surfactant and a fluorosurfactant having a perfluoroalkyl group are preferable.

The fluorine content of the fluorosurfactant is preferably 3 to 40% by mass, more preferably 5 to 30% by mass, and particularly preferably 7 to 25% by mass. When the fluorine content is in the above-described range, it is effective in terms of coating thickness uniformity and liquid-saving properties, and the solubility in the composition is also good.

Examples of the fluorosurfactant include Megafac F171, F172, F173, F173, F177, F141, F142, F143, F144, R30, F437 (above, manufactured by DIC), Florad FC430. FC431, FC171 (Sumitomo 3M), Surflon S-382, SC-101, SC-103, SC-104, SC-105, SC1068, SC-381, SC -383, S393, KH-40 (above, manufactured by AGC) and the like.

Examples of surfactants other than fluorine-based surfactants include phthalocyanine derivatives (commercially available product EFKA-745 (manufactured by Morishita Sangyo)), organosiloxane polymer KP341 (manufactured by Shin-Etsu Chemical Co., Ltd.), (meth) acrylic acid-based (co) heavy Combined polyflow no. 75, no. 90, no. Cationic surfactants such as 95 (manufactured by Kyoeisha Yushi Chemical Co., Ltd.), W001 (manufactured by Yusho Co., Ltd.); Oxyethylene nonylphenyl ether, polyethylene glycol dilaurate, polyethylene glycol distearate, sorbitan fatty acid ester (manufactured by BASF Pluronic L10, L31, L61, L62, 10R5, 17R2, 25R2, Tetronic 304, 701, 704, 901, 904, Nonionic surfactants such as 150R1; anionic surfactants such as W004, W005, and W017 (manufactured by Yusho Co., Ltd.).

The addition amount of the surfactant is preferably 0.001 to 2.0% by mass, more preferably 0.005 to 1.0% by mass with respect to the total mass of the photosensitive resin composition.

Development accelerator In addition, when the alkali solubility of the uncured portion of the photosensitive resin composition layer is promoted to further improve the developability of the photosensitive resin composition, the development accelerator is used as the photosensitive resin composition. Can be used for
As such a development accelerator, an organic carboxylic acid, preferably a low molecular weight organic carboxylic acid having a molecular weight of 1000 or less is preferable. Specifically, for example, aliphatic monocarboxylic acids such as formic acid, acetic acid, propionic acid, butyric acid, valeric acid, pivalic acid, caproic acid, diethyl acetic acid, enanthic acid, caprylic acid; oxalic acid, malonic acid, succinic acid, Aliphatic dicarboxylic acids such as glutaric acid, adipic acid, pimelic acid, suberic acid, azelaic acid, sebacic acid, brassic acid, methylmalonic acid, ethylmalonic acid, dimethylmalonic acid, methylsuccinic acid, tetramethylsuccinic acid, citraconic acid; Aliphatic tricarboxylic acids such as tricarballylic acid, aconitic acid, and camphoric acid; aromatic monocarboxylic acids such as benzoic acid, toluic acid, cumic acid, hemelitic acid, and mesitylene acid; phthalic acid, isophthalic acid, terephthalic acid, trimellitic acid, Aromatic polycarboxylic acids such as trimesic acid, melophanoic acid, pyromellitic acid; phenylacetic acid Hydratropic acid, hydrocinnamic acid, mandelic acid, phenyl succinic acid, atropic acid, cinnamic acid, methyl cinnamate, benzyl cinnamate, cinnamylidene acetic acid, coumaric acid, other carboxylic acids such as umbellic acid.

(Thermal polymerization inhibitor)
It is preferable to further add a thermal polymerization inhibitor to the photosensitive resin composition of the present invention. For example, hydroquinone, p-methoxyphenol, di-tert-butyl-p-cresol, pyrogallol, tert-butylcatechol, Benzoquinone, 4,4′-thiobis (3-methyl-6-tert-butylphenol), 2,2′-methylenebis (4-methyl-6-tert-butylphenol), 2-mercaptobenzimidazole and the like are useful.

(Other additives)
In addition to the above, fillers such as glass and alumina; ultraviolet absorbers such as 2- (3-tert-butyl-5-methyl-2-hydroxyphenyl) -5-chlorobenzotriazole and alkoxybenzophenone; and sodium polyacrylate And the like.

The photosensitive resin composition of the present invention comprises the components described above, that is, (A) a photopolymerization initiator, (B) a solvent, (C) a polymerizable monomer, (D) an alkali-soluble resin, and (E ) It can be prepared by adding and mixing other additives such as photosensitizers or co-initiators.

(Second support)
In the case where a high refractive index material is used as the second support, the thickness is preferably 30 μm or less from the viewpoint of not deteriorating brittleness. More preferably, it is 10 μm or less, and more preferably around 1 μm.
The refractive index of the second support is preferably 1.30 or more, more preferably 1.4 or more, and further preferably 1.6 or more, from the viewpoint of preventing generation of side bands. It is preferably 1.80 or more, most preferably 1.9 or more. Further, from the viewpoint of not deteriorating the brittleness of the second support, the refractive index is preferably 2.50 or less, more preferably 2.20 or less, and even more preferably less than 2.10. More preferably, it is 2.05 or less.

The refractive index of the second support can be adjusted by the type of components used for forming the layer in the same manner as the first support. As a component used for forming a layer, it can form using the polymeric composition containing a polymeric compound and a polymerization initiator similarly to a 1st support body. Or the resin layer which has resin as a main component similarly to a 1st support body may be sufficient.

In order to adjust the refractive index of the second support, particles may be contained in the same manner as the first support. The particles are not particularly limited, and may be inorganic particles or organic particles.
One kind of the above-mentioned particles may be used, or two or more kinds may be mixed and used. Smaller particles are preferable from the viewpoint of suppressing scattering. Therefore, the particle size is preferably 100 nm or less, more preferably 30 nm or less, and even more preferably 25 nm or less as the primary particle diameter. Moreover, it is preferable that a particle size is 1 nm or more as a primary particle diameter. The primary particle size of the above-mentioned particles is a value obtained by measuring the particle size of 50 particles with a scanning electron microscope (SEM) and calculating the number average value. The particle content in the layer containing the above-mentioned particles is preferably set as appropriate so that the average refractive index in the above-mentioned range can be obtained.

[Surface light source device]
A surface light source device according to an aspect of the present invention includes at least the above-described louver film and a light source.
<Configuration of surface light source device>
The configuration of the surface light source device includes at least a light source and a light guide plate, and optionally an edge light system including a reflection plate, a diffusion plate, and the like, and at least a plurality of light sources and diffusion plates arranged on the reflection plate, the reflection plate There are direct type including. The surface light source device described above may have any configuration. Details are described in publications such as Japanese Patent No. 3416302, Japanese Patent No. 3363565, Japanese Patent No. 4091978, and Japanese Patent No. 3448626, and the contents of these publications are incorporated in the present invention. The light source may be a white light source or a monochromatic light source using a blue LED or an ultraviolet LED. In the case of a white light source, it is preferable that color conversion is not necessary and a simple configuration can be achieved. A monochromatic light source is preferable in that the directivity of light can be controlled without chromatic aberration. In the case of a blue or ultraviolet light source, a wavelength conversion film using quantum dot particles or a phosphor may be provided between the louver film and the light source. Instead of the wavelength conversion film, a color filter containing quantum dot particles or phosphors may be provided in the liquid crystal panel. Light that has passed through the liquid crystal layer of the liquid crystal panel with high directivity is color-converted into quantum dot particles, and the converted light is diffused, so that the viewing angle can be widened.

The surface light source device may have an optical film such as a reflective polarizer, a prism sheet, a diffusion sheet, and a wavelength conversion film.
For example, in the example shown in FIG. 6, the reflective polarizer 20 is provided between the louver film 2 and the diffusion plate 14, that is, between the louver film 2 and the light source 16.
With the configuration having the reflective polarizer 20, light utilization efficiency can be improved by light recycling. In the example shown in FIG. 6, the various louver films 2 shown in FIGS. 2 and 5 can be used.
As the reflective polarizer 20, a general reflective polarizer can be used. For example, the product name: DBEF manufactured by 3M may be used.

[Liquid Crystal Display]
A liquid crystal display device according to one embodiment of the present invention includes at least the surface light source device described above and a liquid crystal panel.

<Configuration of liquid crystal display device>
The liquid crystal panel usually includes at least a viewing side polarizer, a liquid crystal cell, and a backlight side polarizer.

In one embodiment of the liquid crystal display device, a liquid crystal cell having a liquid crystal layer sandwiched between substrates provided with electrodes on at least one opposite side, the liquid crystal cell is arranged between two polarizers. . The liquid crystal display device includes a liquid crystal cell in which liquid crystal is sealed between upper and lower substrates, and displays an image by changing the alignment state of the liquid crystal by applying a voltage. Furthermore, it has an accompanying functional layer such as a polarizing plate protective film, an optical compensation member that performs optical compensation, and an adhesive layer as necessary. Along with (or instead of) a color filter substrate, thin layer transistor substrate, lens film, diffusion sheet, hard coat layer, antireflection layer, low reflection layer, antiglare layer, etc., forward scattering layer, primer layer, antistatic layer And a surface layer such as an undercoat layer may be disposed.

In addition, in order to widen the viewing angle of light after passing through the liquid crystal layer of the liquid crystal panel with high directivity, the above-described color filter containing quantum dot particles or phosphor or a lens film, light on the viewing side of the viewing side polarizer You may provide the functional layer which eases the directivity of light, such as a diffusion sheet and a diffraction film.

The surface light source device included in the liquid crystal display device is as described above.

There are no particular limitations on the liquid crystal cell, polarizing plate, polarizing plate protective film, and the like constituting the liquid crystal display device according to one embodiment of the present invention, and those prepared by known methods and commercially available products can be used without any limitation. it can. It is of course possible to provide a known intermediate layer such as an adhesive layer between the layers.

As the liquid crystal display device, a louver film 2 may be arranged between the liquid crystal cell 32 and the backlight side polarizer 34 as in the liquid crystal display device 30 shown in FIG. Alternatively, as shown in FIG. 8, the louver film 2 may be arranged between the backlight side polarizer 34 and the diffuser plate 14. Alternatively, as shown in FIG. 9, the backlight side polarizer may not be provided, and the viewing side polarizer 36 may be provided on the opposite side of the liquid crystal cell 32 from the light source 16 side. In the liquid crystal display devices shown in FIGS. 7 to 9, various louver films 2 shown in FIGS. 2 to 5 can be used.

Further, the arrangement position of the louver film 2 is not limited to being on the light source side with respect to the liquid crystal cell 32. For example, in the liquid crystal display device 30 shown in FIG. 7, the louver film 2 is disposed between the liquid crystal cell 32 and the backlight side polarizer 34, but the louver film 2 is placed on the surface 32 a of the liquid crystal cell 32, that is, You may arrange | position on a display surface.
In the liquid crystal display device 30 shown in FIG. 8, the louver film 2 is disposed between the backlight side polarizer 34 and the diffusion plate 14, but the louver film 2 is placed on the surface 32 a of the liquid crystal cell 32, that is, the display surface. You may arrange on top.
Also in the liquid crystal display device 30 shown in FIG. 9, the louver film 2 is disposed between the liquid crystal cell 32 and the diffusion plate 14, but the louver film 2 is formed on the viewing side polarizer 36 provided on the liquid crystal cell 32. You may arrange | position on the surface 36a. Thus, the louver film 2 can also be disposed on the outermost surface side of the liquid crystal display device 30. Even at such an arrangement position of the louver film 2, the directivity regarding further visibility can be improved while maintaining the light use efficiency, and reflection in an area that is not desired to be displayed can be suppressed.

Further, the lenses of the louver film are two-dimensionally arranged as described above. The lens arrangement is, for example, square when viewed from the optical axis direction, and the plurality of lenses are arranged in a square lattice. ing. Moire prevention points are formed at the intersections of the arranged lenses, and the arrangement direction of the lenses is preferably inclined by 25 ° to 65 ° with respect to the arrangement direction of the pixels of the liquid crystal panel. This point will be described with reference to FIGS.

FIG. 10 is a schematic view showing a part of the louver film 2 and a part of the liquid crystal cell 32 as viewed from the optical axis direction of the lens while the relative positions are shifted in the plane direction. 11 is a cross-sectional view taken along line BB in FIG. 12 is a cross-sectional view taken along the line CC of FIG. 13 is a cross-sectional view taken along the line DD of FIG.

As shown in FIG. 10, the lens 11 is a two-dimensional lens array in which the shape of the lens 11 viewed from the optical axis direction is a square shape. The plurality of lenses 11 are arranged in a square lattice shape. Further, as shown in FIG. 10, the arrangement direction of the lenses 11 is inclined by about 45 ° with respect to the arrangement direction of the pixels 33 of the liquid crystal cell 32.
Here, as shown in FIGS. 10 and 11, concave portions are formed as moiré prevention points 22 at the apexes (four corners in the surface direction) of the plurality of lenses 11 arranged in a square lattice pattern.
The arrangement of the lenses 11 may be two-dimensionally arranged, and the two-dimensional arrangement is not particularly limited, and may be arranged in a hexagonal manner other than the square arrangement. By arranging the lenses 11 in a hexagonal shape, the light utilization efficiency is improved and the luminance is improved.

When a plurality of lenses of the louver film are regularly arranged, moire may occur due to the relationship with other members having a regular arrangement.
For example, when a liquid crystal cell having a plurality of regularly arranged pixels and a louver film are arranged in an overlapping manner, moire may occur.

On the other hand, the moiré is reduced by tilting the arrangement direction of the lenses 11 with respect to the arrangement direction of the pixels of the liquid crystal panel by 25 ° to 65 ° and further forming the moire prevention point 22 at the apex portion of the lens 11. I found that I can do it. Usually, moire occurs at a difference frequency between a plurality of regularly arranged pixel patterns of liquid crystal cells and a shadow (boundary line) pattern between the plurality of lenses 11. On the other hand, when the arrangement direction of the lenses 11 is inclined by about 45 ° with respect to the arrangement direction of the pixels 33 of the liquid crystal cell 32, a shadow (boundary line) pattern between the plurality of lenses 11 is represented by the pixels 33 of the liquid crystal cell 32. Moire occurs at the difference frequency from the pattern that appears when integration is performed in the arrangement direction. A pattern that appears when the pattern of shadows (boundary lines) between the plurality of lenses 11 is integrated in the arrangement direction of the pixels 33 of the liquid crystal cell 32 is a pattern on the lattice points of the plurality of lenses 11 arranged in a square lattice pattern. The intensity is weak, and it appears because the pattern intensity is high except on the lattice points. By making the shadows on the lattice points of the plurality of lenses 11 arranged in a square lattice shape thicker or thicker, the pattern intensities on the lattice points and the portions other than the lattice points can be made equal, and the louver film The side pattern can be erased. For this reason, it can be considered that a plurality of regularly arranged pixel patterns of liquid crystal cells and a pattern that can take a difference frequency disappear, and moire is less likely to occur.

The size (area) of the moire prevention point 22 is preferably 0.01% to 10% with respect to the size (area) of the lens 11 arranged two-dimensionally.
The depth of the moire prevention point 22 is preferably 0.1% to 40% with respect to the lens pitch.

In the example shown in FIG. 10, the planar shape of the moire prevention point 22 is a square shape, but is not limited thereto, and may be various shapes such as a rectangular shape, a triangular shape, a polygonal shape, a circular shape, and an indefinite shape. it can.
Further, the planar shape of the moire prevention point 22 may be symmetric or asymmetric.

In the example shown in FIG. 11, the moire prevention point 22 is a recess, but the invention is not limited to this, and it is sufficient that the amount of light transmission can be changed. For example, the moire prevention point 22 may be a convex portion. Or what printed the dot with the ink may be used.

There is no particular limitation on the method of forming the moire prevention point 22 formed of a recess. For example, when the lens 11 is formed by stamping, a mold that forms the moire prevention point 22 at the same time as the formation of the lens 11 may be used.

The present invention is basically configured as described above. As described above, the louver film, the surface light source device, and the liquid crystal display device of the present invention have been described in detail. However, the present invention is not limited to the above-described embodiment, and various improvements or modifications can be made without departing from the gist of the present invention. Of course.

Hereinafter, the features of the present invention will be described more specifically with reference to examples. The materials, reagents, substance amounts and ratios thereof, and operations shown in the following examples can be appropriately changed without departing from the spirit of the present invention. Therefore, the scope of the present invention is not limited to the following examples.

[Example 1]
In Example 1, a polyethylene terephthalate film (manufactured by Toyobo Co., Ltd., trade name: Cosmo Shine (registered trademark) A4300, thickness 38 μm, refractive index 1.57) was prepared as the first support. On the surface of the first support, the following 1. A titanium oxide particle-containing polymerizable composition (composition type 1) prepared so as to have a refractive index of 1.57 was applied by a bar coater, and a hemispherical arc (lens) having a radius of curvature of 50 μm was square with a pitch of 100 μm. In order to form the shape arranged on the surface, a UV exposure machine (EXECURE 3000W manufactured by HOYA CANDEO OPTRONICS) was used while pressing a concavo-convex roller having a surface shape obtained by reversing the shape to be formed in a nitrogen atmosphere at 5 J / After being exposed and cured at cm ² , it was peeled off from the uneven roller to produce an uneven shape on the surface.
Thereafter, the following K pigment dispersion 1 is applied to the surface of the first support opposite to the surface on which the concavo-convex shape is formed through a mask having a plurality of openings with a pitch of 100 μm and a width of 32 μm and dried, and the pitch is 100 μm. A light absorption layer having an aperture width of 32 μm, an aperture ratio of 32%, and a film thickness of 2 μm was formed so that the center in the aperture width direction was aligned with the apex of the lens convex portion. Thereafter, Ag is vapor-deposited on the light absorption layer through a mask having the same pattern as the light absorption layer having a plurality of openings having a pitch of 100 μm and a width of 33 μm, and a light reflection layer having a pitch of 100 μm, an opening width of 33 μm, and an aperture ratio of 33% is formed. The louver film A was produced by forming the center of the opening width direction so as to match the position of the apex of the lens convex portion. The light absorption layer contains carbon black, and “CB” in the column of the material of the light absorption layer in Table 1 is carbon black.

・ K pigment dispersion 1
Carbon black, a dispersant, a polymer and a solvent were mixed so that the composition of the following K pigment dispersion 1 was obtained.
(K pigment dispersion 1)
・ Resin-coated carbon black prepared according to the description in paragraph Nos. [0036] to [0042] of Japanese Patent No. 5320652 3.4 mass%
-Dispersant 1 [the following structure] 0.13 mass%
・ Polymer 16.47% by mass
(Random copolymer of benzyl methacrylate / methacrylic acid = 72/28 molar ratio, weight average molecular weight 37,000)
Propylene glycol monomethyl ether acetate 80.0% by mass

1. Preparation of Titanium Oxide Particle-Containing Polymerizable Composition (Composition Type 1) Trimethylolpropane triacrylate 18.2 parts by mass, lauryl methacrylate 80.8 parts by mass, and photopolymerization initiator (Irgacure (registered trademark) 819 manufactured by BASF) ) 1 part by mass was mixed.
Dope a slurry (solvent: methyl ethyl ketone, titanium oxide particle concentration of 30% by mass) in which titanium oxide (TiO ₂ ) particles (primary particle diameter of 100 nm or less) are dispersed in the above mixture (hereinafter also referred to as a binder), The mixture was sufficiently stirred to prepare a polymerizable composition containing titanium oxide particles. The titanium oxide particles described above are titanium oxide particles that are surface-treated with aluminum oxide in order to suppress the photoactivity of titanium oxide, and have a refractive index of 2.40. In order to adjust the average refractive index of each layer described later, the addition amount of the titanium oxide particle slurry to the binder was set in the range of binder: titanium oxide particle slurry = 7: 3 to 6: 4 on a mass basis.

[Example 2]
In Example 2, in order to form on the surface a shape in which hemispherical arcs (lenses) having a radius of curvature of 50 μm are arranged in a hexagonal shape at a pitch of 100 μm, except for changing to a concavo-convex roller having a surface shape obtained by inverting the shape to be formed. A louver film B was produced in the same manner as in Example 1.

[Example 3]
In Example 3, Ag is vapor-deposited on the light absorption layer through a mask having the same pattern as the light absorption layer having a plurality of openings with a pitch of 100 μm and a width of 47 μm, and light having a pitch of 100 μm, an opening width of 47 μm, and an aperture ratio of 47%. A louver film C was produced in the same manner as in Example 1 except that the reflective layer was formed so that the center in the opening width direction matched the position of the apex of the lens convex portion.

[Example 4]
In Example 4, Ag was deposited on the light absorption layer through a mask having the same pattern as the light absorption layer having a plurality of openings with a pitch of 100 μm and a width of 32.32 μm, and the pitch was 100 μm, the opening width was 32.32 μm, and the opening ratio. A louver film D was produced in the same manner as in Example 1 except that a 32.32% light reflecting layer was formed so that the center in the opening width direction was aligned with the apex of the lens convex portion.

[Example 5]
In Example 5, the above-mentioned K pigment dispersion 1 was applied and dried through a mask having a plurality of openings with a pitch of 100 μm and a width of 25 μm, and light having a pitch of 100 μm, an opening width of 25 μm, an opening ratio of 25%, and a film thickness of 2 μm. The absorption layer was formed so that the center in the opening width direction matched the position of the apex of the lens convex portion. Thereafter, Ag is vapor-deposited on the light absorption layer through a mask having the same pattern as the light absorption layer having a plurality of openings having a pitch of 100 μm and a width of 33 μm, and a light reflection layer having a pitch of 100 μm, an opening width of 33 μm, and an aperture ratio of 33% A louver film E was produced in the same manner as in Example 1 except that the center in the opening width direction was formed so as to match the position of the apex of the lens convex portion.

[Example 6]
In Example 6, the K pigment dispersion 1 was applied and dried through a mask having a plurality of openings with a pitch of 100 μm and a width of 40 μm, and light having a pitch of 100 μm, an opening width of 40 μm, an opening ratio of 40%, and a film thickness of 2 μm. The absorption layer was formed so that the center in the opening width direction matched the position of the apex of the lens convex portion. Thereafter, Ag is vapor-deposited on the light absorption layer through a mask having the same pattern as the light absorption layer having a plurality of openings with a pitch of 100 μm and a width of 47 μm. A louver film F was produced in the same manner as in Example 1 except that the center in the opening width direction was formed so as to match the position of the apex of the lens convex portion.

[Example 7]
In Example 7, the K pigment dispersion 1 was applied and dried through a mask having a plurality of openings with a pitch of 100 μm and a width of 47 μm, and light having a pitch of 100 μm, an opening width of 47 μm, an aperture ratio of 47%, and a film thickness of 2 μm. The absorption layer was formed so that the center in the opening width direction matched the position of the apex of the lens convex portion. Thereafter, Ag is vapor-deposited on the light absorption layer through a mask having the same pattern as the light absorption layer having a plurality of openings with a pitch of 100 μm and a width of 50 μm. The center of the opening width direction is formed so as to match the position of the apex of the lens convex portion. In the same manner as in Example 1 except that a polyethylene terephthalate film (trade name: Lumirror (registered trademark) T60, thickness 25 μm, refractive index 1.57) manufactured by Toray Industries, Inc. was prepared as the first support. Film G was produced.

[Example 8]
In Example 8, a louver film H was produced in the same manner as in Example 5 except that the thickness of the first support was 55 μm.

[Example 9]
In Example 9, a louver film I was produced in the same manner as in Example 4 except that the light reflecting layer formed on the light absorbing layer formed on the first support was composed of a cholesteric liquid crystal layer.
In Table 1, the cholesteric liquid crystal is expressed as “CLC”.
Next, a method for forming a cholesteric liquid crystal layer that is a light reflecting layer will be described.
The following coating liquid was prepared as a composition for forming a cholesteric liquid crystal layer.
――――――――――――――――――――――――――――――――――
Cholesteric liquid crystal layer forming composition ――――――――――――――――――――――――――――――――――
-100 parts by mass of the following liquid crystal compound (LC1)-2.5 parts by mass of the following chiral agent (C1)-Photopolymerization initiator (Irgacure 819; manufactured by BASF) 0.75 parts by mass-The following surfactant (W1 ) 0.05 parts by mass • The following surfactant (W2) 0.01 parts by mass • Methyl ethyl ketone 250 parts by mass • Cyclohexanone 50 parts by mass ――――――――――――――――――― ――――――――――――――

Liquid crystal compound (LC1)

Chiral agent (C1)

Surfactant (W1)

Surfactant (W2)

The surface of the first support opposite to the surface on which the uneven shape was formed was subjected to a rubbing treatment using a rubbing apparatus. At this time, the longitudinal direction of the long film and the transport direction were parallel, and the rotation axis of the rubbing roller was set to a 45 ° clockwise direction with respect to the film longitudinal direction.
The coating liquid cholesteric liquid crystal layer forming composition was applied to the rubbing surface using a wire bar so as to have a film thickness of 3 μm to form a film made of a polymerizable liquid crystal composition. Next, this film was heated at 70 ° C. for 1 minute to give a cholesteric alignment treatment.
Thereafter, the coating film cooled to 25 ° C. was irradiated with ultraviolet rays for 10 seconds at 10 mW / cm ² in an air atmosphere using an ultraviolet irradiation apparatus EXECURE 3000-W (manufactured by HOYA) having a high-pressure mercury lamp, with a pitch of 100 μm and a width of 32.32 μm. The OHP sheet on which black ink was printed in the same pattern as the light absorption layer having a plurality of openings was used as a mask to perform primary curing by irradiation from the coated surface side. The above illuminance is the illuminance measured in the range of 300 nm to 390 nm using UVR-T1 (UD-T36; manufactured by TOPCON). Furthermore, the film was secondarily cured by irradiating with ultraviolet rays from the coating surface side through a mask at 50 mW / cm ² for 30 seconds under a nitrogen atmosphere.
Thereafter, the mask is removed and the isotropic phase portion is irradiated with ultraviolet rays from the coating surface side at 50 mW / cm ² in a nitrogen atmosphere for 40 seconds using a UV irradiation device while heating at 130 °. A louver film I having a cholesteric liquid crystal layer having a cholesteric liquid crystal phase portion in one layer as a light reflecting layer was obtained.

[Example 10]
In Example 10, a louver film O was produced in the same manner as in Example 8 except that the light absorption layer formed on the first support was formed as follows without using a mask.
In Example 10, the following K pigment in which a chemically amplified positive photoresist (APEX-X: manufactured by Dow Chemical Co., Ltd.) and a black pigment were mixed on the surface opposite to the surface on which the uneven shape of the first support was formed. Dispersion 2 was applied. Then, UV light was irradiated from the surface side where the concavo-convex shape was formed, and the coating layer of the K pigment dispersion 2 was exposed. The UV light used for the exposure was a wavelength of 365 nm, and parallel UV light was diffused by 10 ° with a lens diffusion plate LSD10ACUVT30 (manufactured by Luminit). The resist is exposed at the portion where the UV light is condensed by the lens function of the formed hemispherical arc (lens) with a radius of curvature of 50 μm, and in the subsequent development processing, the pitch is 100 μm, the opening width is 25 μm, the opening ratio is 25%, and the film A light-absorbing layer having a thickness of 2 μm was formed so that the center in the opening width direction matched the position of the apex of the lens convex portion. Thereafter, Ag is vapor-deposited on the light absorption layer through a light absorption layer having a plurality of openings with a pitch of 100 μm and an opening width of 25 μm and a mask having a plurality of openings with a pitch of 100 μm and a width of 33 μm, and the pitch is 100 μm and the opening width is 33 μm. A light reflecting layer having a rate of 33% was formed so that the center in the opening width direction was aligned with the position of the apex of the lens convex portion, and a louver film O was produced.

・ K pigment dispersion 2
K pigment dispersion 1: 60% by mass
Chemically amplified positive photoresist: 40% by mass

[Comparative Example 1]
In Comparative Example 1, the K pigment dispersion 1 was applied and dried through a mask having a plurality of openings with a pitch of 100 μm and a width of 32 μm, and light having a pitch of 100 μm, an opening width of 32 μm, an opening ratio of 32%, and a film thickness of 2 μm. The absorption layer was formed so that the center in the opening width direction matched the position of the apex of the lens convex portion. Thereafter, Ag is vapor-deposited on the light absorption layer through a mask having the same pattern as the light absorption layer having a plurality of openings having a pitch of 100 μm and a width of 32 μm, and a light reflection layer having a pitch of 100 μm, an opening width of 32 μm, and an opening ratio of 32% A louver film J was prepared in the same manner as in Example 1 except that the center in the opening width direction was aligned with the position of the apex of the lens convex portion.

[Comparative Example 2]
In Comparative Example 2, the K pigment dispersion 1 was applied and dried through a mask having a plurality of openings with a pitch of 100 μm and a width of 32 μm, and light having a pitch of 100 μm, an opening width of 32 μm, an opening ratio of 32%, and a film thickness of 2 μm. The absorption layer was formed so that the center in the opening width direction matched the position of the apex of the lens convex portion. Thereafter, Ag is vapor-deposited on the light absorption layer through a mask having the same pattern as the light absorption layer having a plurality of openings having a pitch of 100 μm and a width of 50 μm, and a light reflection layer having a pitch of 100 μm, an opening width of 50 μm, and an aperture ratio of 50% is formed. A louver film K was produced in the same manner as in Example 1 except that the center in the opening width direction was formed so as to match the position of the apex of the lens convex portion.
[Comparative Example 3]
In Comparative Example 3, the above-mentioned K pigment dispersion 1 was applied and dried through a mask having a plurality of openings with a pitch of 100 μm and a width of 20 μm, and light having a pitch of 100 μm, an opening width of 20 μm, an aperture ratio of 20%, and a film thickness of 2 μm. The absorption layer was formed so that the center in the opening width direction matched the position of the apex of the lens convex portion. Thereafter, Ag is vapor-deposited on the light absorption layer through a mask having the same pattern as the light absorption layer having a plurality of openings having a pitch of 100 μm and a width of 25 μm, and a light reflection layer having a pitch of 100 μm, an opening width of 25 μm, and an aperture ratio of 25% is formed. A louver film L was produced in the same manner as in Example 1 except that the center in the opening width direction was formed so as to match the position of the apex of the lens convex portion.

[Comparative Example 4]
In Comparative Example 4, the above-mentioned K pigment dispersion 1 was applied and dried through a mask having a plurality of openings with a pitch of 100 μm and a width of 53 μm, and light having a pitch of 100 μm, an opening width of 53 μm, an aperture ratio of 53%, and a film thickness of 2 μm. The absorption layer was formed so that the center in the opening width direction matched the position of the apex of the lens convex portion. Thereafter, Ag is vapor-deposited on the light absorption layer through a mask having the same pattern as the light absorption layer having a plurality of openings having a pitch of 100 μm and a width of 55 μm, and a light reflection layer having a pitch of 100 μm, an opening width of 55 μm, and an aperture ratio of 55% is formed. A louver film M was produced in the same manner as in Example 1 except that the center in the opening width direction was aligned with the position of the apex of the lens convex portion.
[Comparative Example 5]
In Comparative Example 5, in order to form a hexagonal arc (lens) with a radius of curvature of 50 μm arranged in a hexagonal shape at a pitch of 100 μm on the surface, the shape is changed to an uneven roller having a surface shape obtained by reversing the shape, and The above K pigment dispersion 1 is applied and dried through a mask having a plurality of openings with a pitch of 100 μm and a width of 32 μm, and a light absorption layer having a pitch of 100 μm, an opening width of 32 μm, an opening ratio of 32%, and a film thickness of 2 μm is opened. The center of the direction was formed so as to match the position of the apex of the lens convex portion. Thereafter, Ag is vapor-deposited on the light absorption layer through a mask having the same pattern as the light absorption layer having a plurality of openings having a pitch of 100 μm and a width of 32 μm, and a light reflection layer having a pitch of 100 μm, an opening width of 32 μm, and an opening ratio of 32% is formed. A louver film N was produced in the same manner as in Example 1 except that the center in the opening width direction was aligned with the position of the apex of the lens convex portion.

The above-mentioned Example 1, Example 3 to Example 9, and Comparative Example 1 to Comparative Example 4 are lenses arranged in a square, and Example 2 and Comparative Example 5 are lenses arranged in a hexagon. It is. The numerical value of the aperture ratio is shown as, for example, “25/5”, but the previous numerical value is a numerical value expressed by the opening width / pitch. The latter numerical value is a numerical value represented by (opening area) / (square area with one side of the pitch).

[Evaluation]
(Evaluation of maximum brightness)
Using the measuring device “EZ-Contrast XL88” (manufactured by ELDIM) on the light exit surface of the surface light source device produced above, the polar angle is 0 ° (front direction) and the polar angle is 88 °. The luminance (Y0) is measured, and the maximum luminance value is set as the maximum luminance. This maximum luminance was measured in a state where the louver film was not disposed on the surface light source device (T0) and in a state where the louver film was disposed (T), and the ratio (T / T0) was calculated to obtain the maximum luminance ratio. The maximum luminance ratio was divided into the following four stages and evaluated as light utilization efficiency. A larger value of the maximum luminance ratio thus obtained means that the light use efficiency of the surface light source device is higher. The measurement results are shown in Table 1.
<Evaluation criteria>
AA: 1.3 or more A: 1.25 or more and less than 1.3 B: 0.8 or more and less than 1.25 C: 0.65 or more and less than 0.8 D: Less than 0.65

(Evaluation of hem cut)
Using the measuring device “EZ-Contrast XL88” (manufactured by ELDIM) on the light exit surface of the surface light source device produced above, the polar angle is 0 ° (front direction) and the polar angle is 88 °. The luminance (Y0) is measured, and the ratio of the luminance value in the front direction and the minimum luminance value at the polar angle of 60 ° is taken as the SN ratio (= luminance in the front direction / minimum luminance value at the polar angle of 60 °). And was evaluated as a hem cut. The evaluation result of the tail cut is shown in the column of SN ratio in Table 1.
<Evaluation criteria>
A: 50 or more B: 25 or more and less than 50 C: 10 or more and less than 25 D: less than 10

From the results shown in Table 1, it can be confirmed that the louver films of Examples 1 to 10 have an improved SN ratio while maintaining the light utilization efficiency as compared with the louver films of Comparative Examples 1 to 5.
The opening ratio in Table 1 is a ratio represented by the opening ratio of the plurality of first openings / the opening ratio of the plurality of second openings.
Comparative Example 1 and Comparative Example 5 have a large aperture ratio and a poor SN ratio.
In Comparative Example 2, the aperture ratio is small, the result of the maximum luminance ratio is poor, and the light utilization efficiency is poor.
In Comparative Example 3, the aperture ratio of the light absorption layer is small, the result of the maximum luminance ratio is poor, and the light utilization efficiency is poor.
In Comparative Example 4, the aperture ratio of the light absorption layer is large, the result of the SN ratio is bad, and light leakage on the wide angle side cannot be suppressed.
From the comparison between Example 1 and Example 2, the evaluation of the maximum luminance ratio is the same in Example 1 and Example 2, but the numerical value of the maximum luminance ratio is higher in Example 2, and the lens The hexagonal arrangement is preferred.
From the comparison between Example 1 and Example 5, the larger the aperture ratio of the light absorption layer, the higher the evaluation of the maximum luminance ratio.
From the comparison between Example 5 and Example 8, the thinner the first support, the better the SN ratio.
From the comparison between Example 3 and Example 4, the larger the aperture ratio, the higher the maximum luminance ratio.

DESCRIPTION OF SYMBOLS 1 Surface light source device 2 Louver film 11 Lens 12

1st support body

13a, 32a, 36a Surface 14 Diffusion plate 15 Reflection plate 16 Light source 17 2nd support body 18 Light absorption layer 18b 1st opening part 18c Back surface 19 Light reflection Layer 19b Second opening 20 Reflective polarizer 22 Moire prevention point 30 Liquid crystal display device 32 Liquid crystal cell 33 Pixel 34 Backlight side polarizer 36 Viewing side polarizer CL Optical axis Dt Thickness Lp Pitch

Claims

Used in surface light source devices,
A plurality of lenses arranged at a constant pitch on the light output side of the light source;
A first support that is disposed closer to the light source than the lens, supports the plurality of lenses, and has a thickness smaller than the fixed pitch;
A light absorption layer that is disposed on the light source side of the first support and includes a plurality of first openings corresponding to the plurality of lenses;
A light reflection layer that is disposed on the light source side of the light absorption layer and includes a plurality of second openings corresponding to the plurality of lenses;
The light absorption layer and the light reflection layer are arranged in a state where the plurality of first openings and the plurality of second openings are aligned,
The light absorption layer has an opening ratio of the plurality of first openings of 25% to 50%,
The light reflecting layer has a reflectance of 90% or more, and the opening ratio of the plurality of second openings of the light reflecting layer is the opening ratio of the plurality of first openings of the light absorbing layer. And a ratio represented by the opening ratio of the plurality of first openings / the opening ratio of the plurality of second openings is 65% to 99%.
The louver film according to claim 1, wherein the plurality of lenses are two-dimensionally arranged.
The louver film according to claim 1 or 2, wherein the first support has a thickness of 50% or less with respect to the constant pitch.
A surface light source device comprising the louver film according to any one of claims 1 to 3 and the light source.
The surface light source device according to claim 4, further comprising a reflective polarizer disposed between the louver film and the light source.
A liquid crystal display device comprising the surface light source device according to claim 4 or 5 and a liquid crystal panel.