WO2019224346A2 - Procédés et dispositifs pour déterminer et corriger des défauts d'alignement de sources de faisceau - Google Patents

Procédés et dispositifs pour déterminer et corriger des défauts d'alignement de sources de faisceau Download PDF

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Publication number
WO2019224346A2
WO2019224346A2 PCT/EP2019/063438 EP2019063438W WO2019224346A2 WO 2019224346 A2 WO2019224346 A2 WO 2019224346A2 EP 2019063438 W EP2019063438 W EP 2019063438W WO 2019224346 A2 WO2019224346 A2 WO 2019224346A2
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WO
WIPO (PCT)
Prior art keywords
collimator
beam source
plane
determining
alignment error
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Application number
PCT/EP2019/063438
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German (de)
English (en)
Other versions
WO2019224346A3 (fr
Inventor
Hannes Scheibe
Andreas Lütz
Stefan Frank
Original Assignee
Carl Zeiss Jena Gmbh
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Application filed by Carl Zeiss Jena Gmbh filed Critical Carl Zeiss Jena Gmbh
Publication of WO2019224346A2 publication Critical patent/WO2019224346A2/fr
Publication of WO2019224346A3 publication Critical patent/WO2019224346A3/fr

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/24—Coupling light guides
    • G02B6/42—Coupling light guides with opto-electronic elements
    • G02B6/4201—Packages, e.g. shape, construction, internal or external details
    • G02B6/4219—Mechanical fixtures for holding or positioning the elements relative to each other in the couplings; Alignment methods for the elements, e.g. measuring or observing methods especially used therefor
    • G02B6/422—Active alignment, i.e. moving the elements in response to the detected degree of coupling or position of the elements
    • G02B6/4221—Active alignment, i.e. moving the elements in response to the detected degree of coupling or position of the elements involving a visual detection of the position of the elements, e.g. by using a microscope or a camera
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/26—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes
    • G01B11/27—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes for testing the alignment of axes
    • G01B11/272—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes for testing the alignment of axes using photoelectric detection means
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02—Testing optical properties
    • G01M11/0221—Testing optical properties by determining the optical axis or position of lenses
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/24—Coupling light guides
    • G02B6/42—Coupling light guides with opto-electronic elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/24—Coupling light guides
    • G02B6/42—Coupling light guides with opto-electronic elements
    • G02B6/4201—Packages, e.g. shape, construction, internal or external details
    • G02B6/4204—Packages, e.g. shape, construction, internal or external details the coupling comprising intermediate optical elements, e.g. lenses, holograms
    • G02B6/4206—Optical features
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/24—Coupling light guides
    • G02B6/42—Coupling light guides with opto-electronic elements
    • G02B6/4201—Packages, e.g. shape, construction, internal or external details
    • G02B6/4204—Packages, e.g. shape, construction, internal or external details the coupling comprising intermediate optical elements, e.g. lenses, holograms
    • G02B6/4213—Packages, e.g. shape, construction, internal or external details the coupling comprising intermediate optical elements, e.g. lenses, holograms the intermediate optical elements being polarisation selective optical elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/30—Collimators

Definitions

  • the present application relates to methods and apparatus for the determination of
  • Alignment, azimuth and direction errors collectively referred to as alignment errors, from beam sources, particularly collimators and directional beam sources, and for correcting such errors.
  • Collimators in particular fiber outcouplers, with which light guided in a glass fiber is coupled out as a collimated light beam, have to be adjusted in many applications in order to correct misalignment, azimuth and direction errors.
  • Azimuth errors can occur in the case of beam sources whose light beam is not rotationally symmetrical with respect to a property such as intensity distribution or polarization.
  • Adjustment points which allows adjustment of the alignment and direction of the collimator. Such adjustment require installation space, which can lead to disadvantages in space-critical applications. Also, such adjustment points increase system complexity and manufacturing costs. By adjustment points, the system is also sensitive to environmental influences, such as shocks or temperature changes, since such environmental influences can affect the setting of such adjustment points. The adjustment also has to be done for each system, which is expensive, and different adjustment points are usually at least partially coupled together (i.e., adjustment of one adjustment point may require adjustment of another adjustment point), which requires iterative adjustment, which in turn is more time consuming.
  • An adjustment point is a device at which the orientation (translation, tilting) of the collimator can be changed, for example by means of mechanical adjustment elements.
  • the resolution of adjustment points may be limited by stick-slip effects (also referred to as stick-slip effect), so that it may be difficult to achieve a required accuracy of adjustment. If a collimator fails, a used replacement collimator must then also be adjusted, ie a new collimator can not simply be installed in the respective system.
  • stick-slip effects also referred to as stick-slip effect
  • the adjustment of a collimator also requires at least one device for determining the alignment, azimuth and / or direction errors in order to then adjust them by adjusting the
  • electromagnetic radiation especially light
  • electromagnetic radiation especially light
  • Embodiments and methods and devices for correcting misalignment and / or direction errors of collimators and other beam sources are described.
  • an apparatus for determining an alignment error of a collimating apparatus comprising:
  • At least one light source for emitting light of at least one wavelength different from a working wavelength of the collimating device
  • a measuring device for measuring a focal position of the collimator device at the at least one wavelength, which differs from the working wavelength
  • the device is arranged to determine an alignment error of the collimating device based on the focus position.
  • the working wavelength is a wavelength for which the collimator is designed, d. H. for which he generates a collimated beam.
  • the focus position ie position of a focal point can be detected in the case of a divergent Ray is a "virtual" focal point from which the rays seemingly emanate.
  • an alignment error misalignment and / or direction error
  • the collimator device can be rotatably storable in the device.
  • the measuring device may be configured to measure a beat circle of the focus position while the collimator device is rotated.
  • determining the alignment error may include determining a location of an optical axis of the collimating device.
  • the at least one light source may for each wavelength of the at least one
  • Measuring wavelength comprise a light source, which emits light according to the measurement wavelength in particular narrowband, z. B. LEDs.
  • the at least one light source may comprise a broadband light source
  • the apparatus further comprising at least one filter, e.g. Color filter or bandpass filter, for selecting the at least one measuring wavelength comprises.
  • the filtering can be z. B. before the decoupling of the light in the collimator or even in the measuring device.
  • the measuring device may comprise an image sensor for recording the focus position.
  • the device can also have a variable optics, z. B. by means of offset lines, for adjusting a cutting width of the measuring device to the focus position.
  • a device for correcting a collimator device comprising:
  • Collimator device depending on the alignment error of the collimator device.
  • a reference surface determines the position in which the collimator device is installed in a system.
  • the processing device can be a tool for material removal, e.g. a turning tool, a milling tool, a grinding tool and / or blast-based tools such as
  • Ultra short pulse lasers include.
  • the processing device may be configured to process protrusions on an outer side of a housing of the collimator device so as to define the reference surface. Alternatively or additionally, the generation of azimuth references on the housing of the
  • Collimator device possible to set an azimuth house direction of the collimator. Under the Azimuthausraum is to understand a rotation angle about the optical axis. This is important if the beam profile is not rotationally symmetric and / or has a non-rotationally symmetric polarization, in particular a linear polarization.
  • These azimuth references can be: holes and countersinks, (V-) grooves, radial surfaces and other suitable and product-specific solutions for
  • the azimuth references may comprise one or more grooves or a Hirth toothing.
  • a Hirth serration is a self-centering orientation that is robust over many cycles of the collimator or other beam source is possible.
  • an apparatus for determining an alignment error of a directional beam source comprising:
  • a measuring device for measuring a beam profile of the directional beam source in a first plane and a second plane, wherein the first plane and the second plane have different distances to the directional beam source
  • the device is arranged to cause an alignment error of the directed
  • the features include maxima of the intensity profiles, but are not limited thereto and may be e.g. B. include minima.
  • the directional radiation source may be rotatably storable in the device, wherein the
  • Measuring device is designed to measure a beat circle of the intensity profiles, while the directional beam source is rotated, similar to the impact circle measurement of the
  • the measuring device may include an image sensor for capturing a first-level and second-level image.
  • devices for correcting a directional beam source according to the above-defined devices for correcting a collimator device are provided.
  • a method of determining an alignment error of a collimating device comprising:
  • Coupling light of a first measuring wavelength which differs from a
  • the launching and the measuring can be repeated at at least one further wavelength, wherein each wavelength of the at least one further wavelength either corresponds to or differs from the operating wavelength. Multiple measurements can increase accuracy.
  • the method may include rotating the collimating device about a suitable axis of the collimating device during measuring to pick up a beat circle.
  • Invariance properties are averaged out.
  • a center point of a turn circle recorded by the rotation can serve as a reference for the determination of the alignment error.
  • Also provided is a method for correcting an alignment error of a collimating device comprising:
  • the machining may include fine-machining turning or other machining as described above. Also, azimuth references can be generated as explained above.
  • a method of determining an alignment error of a directional beam source comprising:
  • the first plane and the second plane can be perpendicular to a mechanical axis of the directed beam source.
  • Determining the alignment error may include determining a location of an optical axis of the directional beam source based on characteristics of the intensity profiles.
  • the method may further comprise rotating the directional beam source about an axis of the directional beam source to capture beat circles of the intensity distribution in the first plane and the second plane.
  • methods of correcting an alignment error of a directional beam source according to the above methods of correcting an alignment error are described in US Pat
  • an apparatus for correcting a collimator device or a directed beam source comprising:
  • a measuring device for determining an alignment of a non-rotationally symmetrical beam profile or a polarization of the collimator device or directed beam source
  • a processing device for providing the collimator device or the directed beam source with at least one azimuth reference based on the orientation.
  • the azimuth reference may include a groove and / or a Hirth toothing.
  • the device for determining the orientation of the polarization can comprise a plane-parallel plate, which is arranged approximately at the Brewster angle to a beam of the collimator device or the directed beam source, and a detector for detecting light from the plane-parallel plate.
  • Approximately below the Brewster angle can mean a tolerance of 1 5 or +/- 10 °.
  • Collimator device or a directed beam source comprising:
  • FIG. 1 shows a collimator device according to an embodiment
  • Fig. 2 is an illustration of the collimator of Fig. 1 with production-related
  • 3 is a diagram for explaining the use of a working wavelength different wavelength
  • FIGS. 4A and 4B are diagrams illustrating a position measurement of an optical axis of a collimator device according to embodiments
  • 6 is a diagram for illustrating a correction of alignment errors
  • FIG. 7 is a view of a system according to an embodiment
  • FIG. 8 shows an illustration of a device according to an exemplary embodiment
  • FIG. 9 is a flowchart for illustrating a method according to FIG.
  • FIG. 10 is a diagram for explaining a position measurement of an optical axis in a directional beam source according to an embodiment
  • 1 1 is a diagram for explaining a position measurement of an optical axis in a directional beam source with Schlagnik Stamm for asymmetrical beam characteristics (ellipse) and their Azimuthbeées according to an embodiment, and
  • FIG. 12 is a flow chart illustrating a method according to a
  • 13A is an illustration of an apparatus for determining an azimuth error according to an embodiment
  • FIG. 13B shows a representation of an apparatus for determining an azimuth error according to a further exemplary embodiment
  • FIGS. 15A and 15B are illustrations of another possibility of an azimuth mark
  • FIGS Fig. 16 is an illustration of another possibility of an azimuth mark.
  • Embodiments alternative features, fewer features and / or additional features, especially in conventional collimator devices, eg. As fiber collimators, or directional beam sources used features have.
  • a collimator device is generally a device which generates light beam collimated on the basis of light from a light source.
  • the light source is coupled to the collimator device by means of an optical fiber, for example glass fiber.
  • Collimator devices typically have one or more operating wavelengths.
  • Lenses or other elements used in collimator devices have chromatic dispersion, i. H. the refraction of light in such lenses depends on the wavelength of the light.
  • the optical elements, such as lenses are then arranged such that for the
  • FIG. 1 shows a collimator device 1 in the form of a fiber collimator, as shown in FIG.
  • FIG. 1 shows a cross-sectional view through the collimator device.
  • the collimator device 1 is housed in a collimator housing 4, which has projections 4A in the illustrated embodiment. By means of the projections 4A, the collimator device 1 can then later be fitted in a housing of a system.
  • the collimator device 1 is fed by an optical fiber 2 light, which is coupled out at a fiber output 3.
  • a collimating optics 5 collimates the light emerging from the fiber 3, which has the operating wavelength of the collimator device 1, into a collimated light beam 6. This working wavelength is referred to below as A m .
  • the collimating optics 5 may comprise, for example, one or more lenses, but also other optical elements, such as diffractive elements or reflective elements.
  • FIG. 2 again shows the collimator device 1, errors having occurred here for example due to manufacturing tolerances, and in particular the optical axis deviates from the mechanical axis. These errors are shown very clearly in FIG. 2 for illustration purposes. With a correspondingly accurate production, the errors are smaller than shown schematically in FIG. 2, which also leads to correspondingly lower effects.
  • Collimation optics 5 tilted by an angle a (direction error).
  • alignment error Such errors, which are generated by an offset b (misalignment) or the tilt by the angle a (direction error), will hereinafter be referred to collectively as an alignment error.
  • methods and apparatuses are described for measuring such alignment errors in order to be able to carry out a correction. To the measurement becomes
  • the optical axis 8 used according to the invention light having a wavelength which differs from the operating wavelength.
  • the position of the optical axis 8 can be determined relative to the mechanical axis 7, and then appropriate corrections can be performed by.
  • FIG. 3 illustrates the use of different wavelengths for the collimator apparatus 1 with the registration errors described with reference to FIG. 3 shows a light beam 9 with a wavelength Ai smaller than that
  • Materials (such as glass) light beams 9 and 10 are not collimated. In the case of a wavelength smaller than the operating wavelength, a convergent light beam is produced toward a focal point 23. In the case of a wavelength greater than the working wavelength as in the light beam 10 is formed by the collimating optics 5, a divergent light beam with a "virtual" focus point from which the divergent light beam emanates apparently. This is in embodiments for determining the position of the optical axis of
  • Collimator device 1 used.
  • the collimated light beam 6 having the working wavelength ⁇ m is recorded by means of a measuring telescope 11 which has a CCD camera 12.
  • a measuring telescope 11 which has a CCD camera 12.
  • optics of the measuring telescope 1 1 of the collimated light beam 6 is focused on the image sensor 12, for example, a CCD camera, a CCD image sensor or a CMOS image sensor, and thus recorded a position of a point.
  • the measuring telescope 1 for example, a
  • a focus on the image sensor 12 is achieved by an optical attachment 13, a change in position of the measuring telescope 11 or by an adjustable optics of the measuring telescope.
  • the cutting width of the measuring telescope 1 1 can be adjusted to a plane of the focal point 23 so that it is imaged on the image sensor 12.
  • the plane of the focal point 23 is at least substantially known from the properties of the collimating optics, in particular their chromatic dispersion.
  • the position of the image of the focal point on the image sensor 12 differs from the case of FIG. 4A. From the position of the image of the focal point on the image sensor 12, the position of the focal point 18 in its plane can then be determined by simple optical calculations from the properties of the optical attachment 13, so that the position of the
  • Focus point 18 can be determined. It is also possible to carry out further measurements with further wavelengths. In particular, wavelengths greater than the operating wavelength can be used, in which case the attachment optics 13 or another optics serve to focus the then divergent beam, such as the beam 10 in FIG. 3, onto the image sensor 12 and thus the image Imagine "virtual" focus point of the divergent beam on the image sensor.
  • the focal point 23 of FIG. 3 is located at different locations on the axis 8
  • the position of the optical axis 8 are determined by the position of the image of the focus points on the image sensor 12, the
  • focal position In the context of this application also referred to as focal position, the position of the optical axis 8 is then determined as the connection of these focus points.
  • the position of the optical axis is thus determined on the basis of the position of the focus points on the image sensor 12.
  • Collimator 1 for measuring about an axis of rotation, which coincides with the mechanical axis 7, or another suitable axis rotatably mounted.
  • the image sensor 12 With the image sensor 12, the image of the focal point is recorded in a plurality of positions that lie on a so-called beat circle.
  • This recording technique is referred to in the context of this application shortly as "Schlag Vietnamese" and has the advantage that by the Schlagnikability alignment error of the measuring telescope 11 against the Kollimatorvorides 1 can be averaged out.
  • the collimator device 1 is rotatably supported as shown by the arrow 25.
  • the optical axis 8 also rotates accordingly if the optical axis 8 does not coincide with the axis of rotation, which in this case corresponds to the mechanical axis 7.
  • the focal point 28 which has already been explained, lies in a plane 40.
  • the focal point lies in a second plane 41.
  • the focal point is the plane 40 is denoted by Pi, which is located in a radius n from the axis of rotation; fi denotes a
  • Rotation position of the collimator 1, and Zi denotes the plane 40.
  • the point Pi moves on a beat circle 42nd
  • the focal point for the drawn position of the optical axis 8 in the plane 41 is denoted by P 2 and is located in a radius r 2 from the axis of rotation.
  • Z 2 denotes the level 41.
  • a beat circle image, as created by the image sensor 12, is shown as a beat circle image 44 in FIG. 5.
  • the focus points can be recorded, for example, for eight positions # 1 to # 8, wherein each position is associated with a corresponding angle fi or cp 2 .
  • corresponding positions of the optical axis 8 can then be determined for a multiplicity of different positions of the collimator device 1 during rotation in accordance with the arrow 25.
  • the position of the optical axis for the collimator device 1 can then be determined, wherein by combining the plurality of layers misalignments of the measuring telescope 1 1 to the
  • the center of the striking circle can be used as a reference for the correct position of the optical axis corresponding to the position of the mechanical axis 7 in the Schlag Vietnamese use.
  • a measurement with different wavelengths of light either by appropriate light sources whose light is supplied via the fiber 2, or by using a broadband light source, such as a white light source, connected to a corresponding filtering, for example by a in the measuring telescope usable color filter can be achieved.
  • a measurement at different wavelengths of light can thus be done in different ways.
  • the collimator device 1 is clamped in a turning device such that the optical axis 8 determined by the above means coincides with a rotation axis 14 of the turning tool. Then, the projections 4A are processed with a tool 15, for. B. fine machining, the outer surfaces of the projections 4A on a schematically indicated cylindrical surface 26 as
  • Frequency surface lie which also has the optical axis 8 as the axis of symmetry.
  • a mechanical axis 7 of the collimator device 1 (symmetry axis of the cylinder jacket surface 26) is adapted to the specific optical axis 8.
  • the projections 4A are therefore used here as azimuth references which determine an angular position of the collimator device 1.
  • the turning can be done according to the approach of classic Justiermosens. This requires an adjustment of the workpiece relative to the axis of rotation of
  • Alignment error in the same device as the processing e.g. the
  • Measuring device is connected to the rotary tool so that the collimator device 1 is measured in the tool. In this case, the adjustment is simplified.
  • the reworking of the lateral surface 26, which corresponds to a reference surface, shown in FIG. 6, is brought into a desired position relative to the optical axis 8.
  • the axis of the lateral surface 26 thus has after the post-processing (adjustment) the same alignment as well as the direction as the optical axis.
  • Collimator optics 15 are adjusted along the optical axis.
  • the projections 4A can be dispensed with and the collimator housing 4 can have a single simple cylindrical shape, which is then also reworked as shown in FIG.
  • the provision of the projections 4A has the advantage that less material removal is required for processing and thus the processing time is reduced. Another subdivision of the surface to be machined into segments (in this case the projections 4A) is possible.
  • the generation and / or processing of other elements than the protrusions 4A on the housing of the collimator 1 is possible.
  • a lathe tool for lathe machining especially fine-cutting lathe machining
  • other tools for material removal e.g. a milling tool, a grinding tool and / or a beam-based tool such as an ultrashort pulse laser can be used.
  • the collimator device 1 thus processed can then be inserted in a housing 17 of a system, as shown in FIG.
  • the alignment errors are compensated, and the mechanical axis 7 and optical axis 8 of the system coincide.
  • a machining tip of the tool 10 of FIG. 6 at the end of machining is so far away from the axis 14, that a diameter of the lateral surface 24 substantially corresponds to an inner diameter of the housing 17.
  • the fine-chipping machining illustrated in FIG. 6 associated with the protrusions 4A or other form of machining provides an efficient way to install the collimator apparatus 1 in the housing 17.
  • a simple exchange of the collimator device is thus possible as well.
  • FIG. 8 shows an exemplary embodiment of a receptacle of a device for carrying out the above-described measurements and / or the machining operations of FIG. 5.
  • the apparatus of Fig. 8 comprises a chuck 18, with which the collimator device 1 is clamped in the device of Fig. 8.
  • the device of FIG. 8 can then be part of a Turning device, over which the measurements shown in Fig. 4 with the rotation about the axis of rotation, as indicated by the arrow 25, and / or the post-processing with rotation about the axis 14 is feasible.
  • the device of FIG. 8 further comprises two light sources 19, 20, which have different wavelengths, which are different from the operating wavelength of the collimator device 1. In other embodiments, only one light source or more than two light sources may be present. In some embodiments, as explained, as a light source, a white light source can also be used in conjunction with corresponding filters.
  • the light sources 19, 20 can then each be connected to the collimator device 1 via an optical fiber (not shown in FIG. 8). to
  • Power supply of the light sources 19, 20 is a rechargeable battery 22 is provided.
  • Other types of power supply, for example on the basis of power supplies are possible.
  • Control for example, a control computer, done.
  • This calculation of the optical axis can then be carried out, for example, computer-assisted with a control computer (not shown) on the basis of the image recordings.
  • FIG. 9 shows a flowchart of a method according to an exemplary embodiment, which can be implemented by means of the devices described above.
  • FIG. 9 To avoid repetition, the method of Fig. 9 will be described with reference to the preceding explanations and Figs. However, the use of the method of FIG. 9 is not limited to the use of the devices of FIGS. 1-7.
  • step 30 the collimator device is mounted in a receptacle, for example, clamped in the tensioning device 18 of FIG.
  • step 31 light of a first measurement wavelength is then coupled into the collimator device, for example, by a corresponding light source (for example, the
  • Light source 19 in Fig. 7 is connected to the collimator device.
  • the white light containing the first measurement wavelength is coupled into the collimator device, and the subsequent measurement then takes place using a color filter, as also already described.
  • the color filling can take place before the coupling and / or on the side of a measuring device used.
  • a first measurement of a position of a focal point is then measured, as explained with reference to FIG. 4B.
  • steps 31 and 32 have been shown separately only for clarity. Individual processes of these steps can also be set alternately.
  • a measuring telescope or other measuring device can be set (for example by the choice of a suitable attachment optics 13 in FIG. 4B), then the light source can be switched on , whereby light is coupled in, and then the actual measurement can be performed.
  • the first measurement may be performed with a rotating receptacle, as explained with reference to FIG. 4B (arrow 25), whereby a beat circle is measured, or also as a static measurement, whereby a single focal point is measured, as explained.
  • Measurement wavelength which differs from the first measurement wavelength and the operating wavelength of the collimator, repeated.
  • the first measurement wavelength and the second measurement wavelength may both be less than the operating wavelength, both greater than the operating wavelength or one of the first measurement wavelength and the second measurement wavelength may be greater than the operating wavelength and another may be less than that
  • the alignment error of the collimator device is then determined in step 35, for example by determining the position of the optical axis of the collimator device.
  • a correction of the collimator for example, by a post-processing, as shown in Figs. 6 and 7.
  • the illustrated method can be fully automated, in which case the
  • Process steps such as the determination of the alignment error from the measurements are automated, in particular computer-aided.
  • Alignment error of a collimator device can be easily determined and / or corrected.
  • directed beam source encompasses beam sources which have a non-diffuse radiation characteristic and thus have an inhomogeneous intensity distribution, in particular in one plane.
  • Such directed beam sources may be laser diodes, light-emitting diodes, lasers and the like.
  • the directed beam source can be a
  • Beam shaping device such as an optical system, include, which serves to generate a desired radiation characteristic.
  • a beam shaping device may comprise a collimator optics as described above, a focusing optics, beam homogenizers and the like.
  • the directional, non-diffuse radiation characteristic can thus be an inherent property of the light source used, for example laser or laser diode or light-emitting diode, but can also be generated by the respective beam shaping device or to be influenced.
  • the directional radiation characteristic may also be non-rotationally symmetric with respect to the beam shape or the polarization (eg linear polarization).
  • FIG. 10 shows a light-emitting diode 51 which has approximately a Gaussian intensity profile.
  • the light-emitting diode 51 serves only as an example and other directional beam sources as mentioned above, in particular also including beam-shaping devices, can be used.
  • 7 denotes a mechanical axis of symmetry of the light-emitting diode 51.
  • a maximum of the Gaussian distribution of the intensity profile always lies on the mechanical axis 7.
  • deviations may occur here due to manufacturing tolerances, for example of components within the light-emitting diode 51. Such deviations may cause the maximum of the Gaussian profile to move away from the mechanical axis 7 with increasing distance from the light emitting diode 51.
  • Reference numeral 54A denotes a Gaussian
  • Intensity profile of the light beam emanating from the light emitting diode 51 in the plane 52 and the reference numeral 54B denotes a Gaussian-shaped intensity profile of the light beam emanating from the light-emitting diode 51 in the plane 53rd
  • the Gaussian intensity profile is thereby increasing with distance from the
  • Light emitting diode 51 to a wider (which is also the case in the ideal case without alignment error), and also removed in the example of FIG. 10 due to alignment errors, the maximum of the intensity profile with increasing distance from the light emitting diode 51 from the mechanical axis 7.
  • a Connection line of the maxima of the intensity profiles 54A, 54B is referred to as optical axis 8 based on the previously described embodiments.
  • FIG. 10 shows a picture 55A in the plane 52 and a picture 55B in the plane 53.
  • the maximum moves away from the mechanical axis 7, which in the pictures 55A, 55B represents an intersection of two lines is. In this way, the position of the optical axis 8 and thus the alignment error can be determined.
  • Radiation sources are performed a Schlagnikank to eliminate errors in the alignment of a measuring device such as the measuring device 11 to the directional beam source can. An example of this is shown in FIG. 11.
  • FIG. 11 shows a directed beam source 50 which has a housing which corresponds to the already discussed housing 4 of the collimator device 1 with the projections 4A.
  • a directional light source such as the light-emitting diode 51 of FIG. 10 is accommodated in the housing, and / or a beam-shaping device is accommodated, so that as a whole a directed beam is generated. Due to alignment errors, the optical axis 8 does not coincide with the mechanical axis 7, as in the embodiment of FIG.
  • the beam profile of the directed beam source 50 has a maximum. This can be detected in several levels, as described for FIG. 10, two levels 52, 53 of which are illustrated.
  • the beam profile or a maximum thereof is denoted by 56A in the plane 51 and 56B in the plane 53.
  • the elliptical beam profile, which is shown in FIG. 11, can be achieved by a combination of the beam profile of a light source of the directed
  • Beam source 50 with a beam shaping device for example, by combining a Gauss-shaped beam profile with a rectangular beam shaping device generated.
  • FIG. 11 also shows an example of a non-rotationally symmetrical beam profile, in this case an elliptical beam profile. Through the images shown can also be
  • Alignment of the beam profile in the planes 51, 53 are determined.
  • Another example is a linearly polarized light source.
  • e.g. be determined by measuring with a polarizer between the measuring device 1 1 and beam source 50 by measuring the intensity in the different rotational positions of the beam source 50. Examples of polarization measurement will be explained later with reference to Figs. 13A and 13B.
  • the directional beam source 50 may also be a collimator if, for example, the collimated light beam has an inhomogeneous beam profile, such as a Gaussian beam profile.
  • a correction can then take place in the manner already described for the collimator device 1.
  • the protrusions of the housing of the collimator apparatus 50 may be processed as described with reference to FIG. 5, or other processing may be performed as described for the collimator apparatus 1.
  • azimuth directors can also be used on the housing of the beam source 50 on the basis of the above-described determination of the orientation of the beam profile in the plane.
  • These azimuth references may include, for example, holes and countersinks, (V) grooves, radial surfaces, and / or other suitable and product specific angular assignment solutions, and indicate the orientation of the beam profile in the plane relative to the housing, e.g. a direction of the major axis of the ellipse of the elliptical beam profile of Fig. 11 or a direction of linear polarization of the beam.
  • the azimuth or azimuth angle is understood as meaning an angular position about the optical axis (with correct alignment substantially corresponding to the rotation according to the arrow 25). Examples of such
  • Fig. 12 shows a method according to an embodiment. To explain the method of FIG. 12, reference is made to the explanations made with reference to FIGS. 10 and 11.
  • a light source of a directional beam source is activated, for example the light-emitting diode 51 of FIG. 10 or a light source of the directed beam source 50 of FIG. 1 1.
  • a measurement in particular of the beam expert, takes place in a first plane, in particular by means of an image acquisition, as for the image acquisition 55A for the plane 52 or the image acquisition 57A also for the plane 52 of FIG. 11.
  • a corresponding second measurement of the beam profile in a second plane as the plane 53 of Figures 10 and 1 1.
  • the planes may be in particular perpendicular to a mechanical axis of the directed beam source.
  • the measurement can take place with rotation of the beam source in order to produce a beat circle recording, as explained with reference to FIG. 11.
  • an alignment error is then determined.
  • the optical axis can be determined as a connection of certain features of the beam profiles in the planes, for example connections of maxima of the beam profile as explained with reference to FIGS. 10 and 11.
  • an alignment of a non-rotationally symmetrical beam profile of the beam source can be detected.
  • step 64 the directional beam source may be corrected according to the correction of the collimator apparatus 1 explained with reference to FIG. 5, and azimuth references may be added as discussed.
  • Polarized beams may be linear or circularly polarized.
  • Figures 13A and 13B show devices which can serve to determine the azimuth error in polarized light.
  • a collimator 100 serves as an example of a beam source
  • Fiber outcoupler which emits polarized light.
  • the light is linearly polarized light.
  • a collimator such as collimator 100
  • other directional beam sources may be used.
  • a plane-parallel plate 101 For determining the polarization position, light from the collimator 100 strikes a plane-parallel plate 101 in FIG. 13A.
  • the position of the plane-parallel plate 101 is selected such that the light strikes the plane-parallel plate 101 approximately at the Brewster angle.
  • a detector 102 for example a photodiode or arrangement of photodiodes, the light reflected at the plane-parallel plate 101 is detected.
  • p-polarized light in which the polarization in the plane of incidence, i. is in the plane of the plane-parallel plate 101 is not reflected, while s-polarized light is reflected with a polarization perpendicular to the plane of incidence.
  • the device of FIG. 13A is advantageously arranged directly in a turning tool or other machining tool, so that the attachment of the azimuth marker without re-adjustment in a new device, to which the results of the measurement must be transmitted, can take place.
  • the plane-parallel plate 101 is particularly well suited for this purpose, since it can be aligned relatively easily to a machine axis of a machining tool.
  • a conventional polarization meter 104 is provided to measure the polarization.
  • non-linear polarizations for example elliptical polarizations, can also be measured here.
  • the polarization meter 104 is preferably directly in a
  • Integrated machining tool for integrating an azimuth mark and aligned with a tool axis of the machining device.
  • an azimuth marker is attached to a milling tool 11 which may be mounted in a turning tool to the machining discussed above with reference to FIG. 6.
  • grooves 1 10 can be milled in here.
  • the collimator 100 may then be inserted into a shell 112, and the azimuthal position is determined by a pin 1 13 engaging one or both of the grooves 1 10 shown.
  • FIG. 15A is a perspective view
  • Fig. 15B is a cross-sectional view.
  • a housing 130 with a Hirth serration 132A In the housing 130, for example, a fiber output coupler 133 is used.
  • the Faserauskoppler 133 may be fixedly connected to the housing 130. In this case, according to the specific
  • the Hirth serration 132 A milled into the housing 130 to set the alignment.
  • the fiber outcoupler 133 or other element such as the collimator 100 of Figs. 14A and 14B, may be inserted into the housing with existing Hirth serration, and discussed there by a further azimuth mark as discussed with reference to Figs. 14A and 14B Grooves are used in the correct orientation.
  • An element 131 of a system into which the beam source is to be inserted has a Hirth spline 132B complementary to the Hirth spline 132A. Due to the Hirth serration, the housing 130 is then aligned self-centering on the part 131 when it is inserted into the system. By the Hirth toothing a robust system is achieved, which over many
  • the Hirth serration can also be used with rotationally symmetrical beam sources.
  • a collimator which is processed as shown in Fig. 6, are used in a housing with a Hirth toothing.
  • FIG. 15B Another example of an azimuth marker is shown in FIG.
  • a fiber out coupler 144 is disposed in a housing 140.
  • fiber out coupler 144 may be fixedly connected to housing 140, or may be inserted into it with another azimuth indicia, such as those of FIGS. 14A and 14B.
  • azimuth mark three grooves 142, which are brought into engagement with three balls 143 of a system-side member 141 when installed in the system.
  • the azimuth indicia 142 may be milled in some embodiments depending on the particular location of the polarization or beam profile when the fiber outcoupler is fixed to the housing 140 or the housing 140 is otherwise directly part of the beam source.
  • azimuth markers there are several possibilities for azimuth markers.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)

Abstract

L'invention concerne des procédés et des dispositifs pour déterminer des défauts d'alignement d'un dispositif collimateur (1 ; 100). Pour déterminer une erreur d'alignement, de la lumière d'une longueur d'onde différente d'une longueur d'onde de travail du dispositif collimateur (1 ; 100) est couplée dans le dispositif collimateur (1 ; 100). Une position de mise au point (18) est déterminée au moyen d'un dispositif de mesure (11) et l'erreur d'alignement est déterminée sur la base de la position de mise au point, par exemple en déterminant la position d'un axe optique du dispositif collimateur (1 ; 100). Le collimateur (1 ; 100) peut alors être corrigé en fonction du défaut d'alignement spécifique.
PCT/EP2019/063438 2018-05-24 2019-05-24 Procédés et dispositifs pour déterminer et corriger des défauts d'alignement de sources de faisceau WO2019224346A2 (fr)

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