WO2019206014A1 - Appareil de support et machine d'exposition - Google Patents

Appareil de support et machine d'exposition Download PDF

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Publication number
WO2019206014A1
WO2019206014A1 PCT/CN2019/083168 CN2019083168W WO2019206014A1 WO 2019206014 A1 WO2019206014 A1 WO 2019206014A1 CN 2019083168 W CN2019083168 W CN 2019083168W WO 2019206014 A1 WO2019206014 A1 WO 2019206014A1
Authority
WO
WIPO (PCT)
Prior art keywords
height range
preset height
disposed
carrying
mask
Prior art date
Application number
PCT/CN2019/083168
Other languages
English (en)
Chinese (zh)
Inventor
胡森文
Original Assignee
武汉华星光电技术有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 武汉华星光电技术有限公司 filed Critical 武汉华星光电技术有限公司
Publication of WO2019206014A1 publication Critical patent/WO2019206014A1/fr

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask

Definitions

  • the present invention relates to the field of display technologies, and in particular, to a carrying device and an exposure machine.
  • an exposure machine is required in a photolithography process, and a substrate to be exposed is exposed through a patterned mask.
  • the exposure machine includes a plurality of loading platforms arranged from top to bottom for holding the mask. Assuming that the exposure machine includes five stages, it is necessary to use a reticle trolley to pass the reticle to the corresponding stage. In this process, the mask version of the trolley is required to accurately align the mask and the carrier, otherwise the mask may be scratched.
  • the embodiment of the invention provides a carrying device applied to an exposure machine, comprising:
  • a loading platform disposed in the first preset height range, a plurality of loading platforms disposed in the second predetermined height range, a sensor, and a transposition structure
  • the sensors are respectively electrically connected to the carrying platform disposed in the first preset height range, and the plurality of carrying platforms disposed in the second preset height range; the sensors are used before the mask is placed Detecting, in the first preset height range, the carrying platform, and the plurality of loading platforms disposed in the second preset height range, whether to carry the mask;
  • the transposition structure is configured to: when the sensor detects that the loading platform disposed in the first preset height range carries a mask, and the sensor detects that the target carrier does not carry a mask version And performing positional swapping on the carrying platform disposed in the first preset height range and the target carrying platform to insert the mask into the carrying platform disposed in the first preset height range;
  • the transposition structure includes a mechanical arm, and the mechanical arm is configured to pick up and receive the loading platform disposed in a first preset height range, and the target loading platform.
  • the transposition structure further includes a locator
  • the positioner is configured to define a height range of the mechanical arm, so that the mechanical arm picks up the carrying platform disposed in a first preset height range, and the target carrying platform.
  • the locator includes a screw lifter.
  • the transposition structure further includes a buffer area
  • the buffer area is configured to store the loading platform disposed in the first preset height range when the mechanical arm takes out the loading platform disposed in the first preset height range, or the target loading platform Or the target carrier.
  • the embodiment of the invention provides a carrying device, which is applied to an exposure machine, comprising: a carrying platform disposed in a first preset height range, a plurality of carrying platforms disposed in a second preset height range, and a transposition structure ;
  • the transposition structure is configured to determine, before the mask is placed, whether the carrier set in the first preset height range carries a mask, such as carrying a mask, from the plurality of Positioning in a second preset height range of the carrying platform, acquiring a target carrying platform that does not carry the mask version, and performing position swapping on the carrying platform and the target carrying platform disposed in the first preset height range,
  • the mask is placed in a carrier set at a first preset height range.
  • the transposition structure comprises a mechanical arm
  • the mechanical arm is configured to pick up and place the carrying platform disposed in a first preset height range, and the target carrying platform.
  • the transposition structure further includes a locator
  • the positioner is configured to define a height range of the mechanical arm, so that the mechanical arm picks up the carrying platform disposed in a first preset height range, and the target carrying platform.
  • the locator includes a screw lifter.
  • the transposition structure further includes a buffer area
  • the buffer area is configured to store the loading platform disposed in the first preset height range when the mechanical arm takes out the loading platform disposed in the first preset height range, or the target loading platform Or the target carrier.
  • the carrying device further includes a sensor, and the sensor is electrically connected to the carrying platform disposed in the first preset height range, and the plurality of carrying platforms disposed in the second preset height range ;
  • the sensor is configured to detect the loading platform disposed in a first preset height range before the mask is placed, and the plurality of loading platforms disposed in the second preset height range, whether to carry the mask Version;
  • the transposition structure is configured to: when the sensor detects that the loading platform disposed in the first preset height range carries a mask, and the sensor detects that the target carrier does not carry a mask version Then, the position of the carrying platform disposed in the first preset height range and the target carrying platform are interchanged to place the mask into the carrying platform disposed in the first preset height range.
  • the embodiment of the invention further provides an exposure machine, comprising a carrying device, the carrying device comprises a carrying platform disposed in a first preset height range, a plurality of carrying platforms disposed in a second preset height range, and a loading platform Transposition structure
  • the transposition structure is configured to determine, before the mask is placed, whether the carrier set in the first preset height range carries a mask, such as carrying a mask, from the plurality of Positioning in a second preset height range of the carrying platform, acquiring a target carrying platform that does not carry the mask version, and performing position swapping on the carrying platform and the target carrying platform disposed in the first preset height range,
  • the mask is placed in a carrier set at a first preset height range.
  • the transposition structure comprises a mechanical arm
  • the mechanical arm is configured to pick up and place the carrying platform disposed in a first preset height range, and the target carrying platform.
  • the transposition structure further includes a locator
  • the positioner is configured to define a height range of the mechanical arm, so that the mechanical arm picks up the carrying platform disposed in a first preset height range, and the target carrying platform.
  • the locator includes a screw lifter.
  • the transposition structure further includes a buffer area
  • the buffer area is configured to store the loading platform disposed in the first preset height range when the mechanical arm takes out the loading platform disposed in the first preset height range, or the target loading platform Or the target carrier.
  • the carrying device further includes a sensor, and the sensor is electrically connected to the carrying platform disposed in the first preset height range, and the plurality of carrying platforms disposed in the second preset height range ;
  • the sensor is configured to detect the loading platform disposed in a first preset height range before the mask is placed, and the plurality of loading platforms disposed in the second preset height range, whether to carry the mask Version;
  • the transposition structure is configured to: when the sensor detects that the loading platform disposed in the first preset height range carries a mask, and the sensor detects that the target carrier does not carry a mask version Then, the position of the carrying platform disposed in the first preset height range and the target carrying platform are interchanged to place the mask into the carrying platform disposed in the first preset height range.
  • the position is exchanged with the target carrier table to place the mask plate in the set
  • the first preset height of the carrying platform reduces the damage rate of the mask.
  • FIG. 1 is a schematic structural diagram of a carrier device according to an embodiment of the present invention.
  • FIG. 2 is a schematic structural view of a conventional carrier device.
  • FIG. 3 is a schematic diagram of a scenario in which a carrier device is placed in a mask according to an embodiment of the present invention.
  • FIG. 4 is a schematic structural diagram of a transposition structure according to an embodiment of the present invention.
  • references to "an embodiment” herein mean that a particular feature, structure, or characteristic described in connection with the embodiments can be included in at least one embodiment of the invention.
  • the appearances of the phrases in various places in the specification are not necessarily referring to the same embodiments, and are not exclusive or alternative embodiments that are mutually exclusive. Those skilled in the art will understand and implicitly understand that the embodiments described herein can be combined with other embodiments.
  • FIG. 1 is a schematic structural diagram of a carrier device according to an embodiment of the present invention.
  • the carrying device 10 includes a loading platform 100 disposed at a first preset height range, a plurality of loading platforms 101 disposed at a second predetermined height range, and a transposition structure 102.
  • the carrying platform 100 disposed in the first preset height range and the plurality of carrying platforms 101 disposed in the second preset height range are used to carry the mask.
  • the conventional carrier device 20 in the conventional carrier device 20, five stages 201 arranged in order from top to bottom are included.
  • the carrier 201 is in a higher position, which may cause scratching of the mask.
  • the height range of the convenient manual alignment may be pre-selected and set to the first preset height range.
  • the height range of the two loading stations 201 at the lower position may be set. It is the first preset height range.
  • the remaining height range corresponding to the inconvenient manual is set to the second preset height range.
  • the transposition structure 102 is configured to determine whether the carrier 100 disposed in the first preset height range carries a mask before the mask is placed, and if the mask is carried, Positioned in the second preset height range of the carrying platform 101, acquiring the target carrying platform that does not carry the mask version, and performing positional swapping on the carrying platform 100 and the target carrying platform disposed in the first preset height range.
  • the mask can be stored. If the mask is not carried, the mask is directly placed in the carrier set at the first preset height range.
  • the first preset height range h1 is 40-50 meters
  • the second preset height range h2 is 10-39 meters, and 51-80 meters.
  • the carrying platform disposed at 40-50 meters in the carrying device is the carrying platform a
  • the carrying platforms disposed at 10-39 meters and 51-80 meters are b, c, d, and e.
  • the masks are carried in the carrying stations a, b, c and e in the carrying device, and only the carrying platform d does not carry the mask.
  • the indexing structure 102 determines that the deck a set at 40-50 meters carries the mask, so it is set at 10-39 meters, and 51-80 meters.
  • the carrying platform d that does not carry the mask is selected as the target carrying platform, and the carrying platform d and the carrying platform a are positionally interchanged.
  • the carrying table d is set at 40-50 meters, so the transposition structure 102 puts a new mask into the carrying table d set at 40-50 meters. In this way, the mask can be placed in the carrying platform set in a height range convenient for manual alignment, thereby preventing the mask from being scratched and reducing the damage rate of the mask.
  • the transposition structure 102 includes a robotic arm 1021.
  • the robot arm 1021 is configured to pick up and drop a carrier 100 disposed at a first preset height range, and a target carrier.
  • the transposition structure 102 further includes a locator 1022 for defining a height range of the robot arm 1021 to enable the robot arm 1021 to be placed in a first preset height range.
  • the positioner 1022 includes a screw lifter.
  • the transposition structure 102 further includes a buffer area for temporarily storing the temporary storage unit 100 when the robot arm 1021 takes out the loading platform 100 disposed at the first preset height range or the target loading platform.
  • the carrier device 10 further includes a sensor 103, and the sensor 103 is respectively disposed on the loading platform 100 disposed in the first preset height range, and the plurality of loading platforms disposed in the second preset height range. 101 electrical connection.
  • the sensor 103 is configured to detect the carrier 100 disposed in the first preset height range, and whether the plurality of carriers 101 disposed in the second preset height range carry the mask.
  • the transposition structure 102 will be set at the first preset height. The positions of the range of the carrier 100 and the target carrier are interchanged.
  • the position is exchanged with the target carrier table to place the mask plate in the set
  • the first preset height of the carrying platform reduces the damage rate of the mask.

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

L'invention concerne un appareil de support (10) et une machine d'exposition. L'appareil de support (10) comprend une plateforme de support (100) disposée dans une première plage de hauteur prédéfinie, de multiples plateformes de support (101) disposées dans une seconde plage de hauteur prédéfinie, et une structure de transposition (102) ; la structure de transposition (102) est conçue pour obtenir une plateforme de support cible sans porter une plaque de masque provenant des plateformes de support (101) disposées dans la seconde plage de hauteur prédéfinie après que la plateforme de support (100) disposée dans la première plage de hauteur prédéfinie ait porté la plaque de masque, et pour interchanger les positions de la plateforme de support (100) disposée dans la première plage de hauteur prédéfinie et de la plateforme de support cible.
PCT/CN2019/083168 2018-04-25 2019-04-18 Appareil de support et machine d'exposition WO2019206014A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN201810377953.8 2018-04-25
CN201810377953.8A CN108628108A (zh) 2018-04-25 2018-04-25 承载装置和曝光机

Publications (1)

Publication Number Publication Date
WO2019206014A1 true WO2019206014A1 (fr) 2019-10-31

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Application Number Title Priority Date Filing Date
PCT/CN2019/083168 WO2019206014A1 (fr) 2018-04-25 2019-04-18 Appareil de support et machine d'exposition

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CN (1) CN108628108A (fr)
WO (1) WO2019206014A1 (fr)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108628108A (zh) * 2018-04-25 2018-10-09 武汉华星光电技术有限公司 承载装置和曝光机

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6473157B2 (en) * 1992-02-07 2002-10-29 Nikon Corporation Method of manufacturing exposure apparatus and method for exposing a pattern on a mask onto a substrate
CN1424627A (zh) * 2001-12-06 2003-06-18 株式会社尼康 曝光方法和曝光装置
CN1493921A (zh) * 2002-07-29 2004-05-05 ASML�عɹɷ����޹�˾ 具有与真空室连通的真空掩模版库的光刻设备
CN1261334C (zh) * 2001-08-10 2006-06-28 Asml美国公司 光刻用的标线片转移系统和方法，基片转移盒及转移方法
CN102004398A (zh) * 2009-08-28 2011-04-06 优志旺电机株式会社 两面曝光装置
CN107243878A (zh) * 2017-07-28 2017-10-13 京东方科技集团股份有限公司 一种掩膜板存储装置
CN108628108A (zh) * 2018-04-25 2018-10-09 武汉华星光电技术有限公司 承载装置和曝光机

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07302748A (ja) * 1994-05-02 1995-11-14 Canon Inc 半導体露光装置
CN102697299B (zh) * 2012-06-05 2014-06-04 浙江工业大学 智能型整理鞋柜
CN102854756B (zh) * 2012-08-06 2014-10-22 京东方科技集团股份有限公司 曝光方法及曝光装置
CN105807574B (zh) * 2014-12-30 2018-03-02 上海微电子装备（集团）股份有限公司 掩模传输装置、曝光装置及掩模传输方法

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6473157B2 (en) * 1992-02-07 2002-10-29 Nikon Corporation Method of manufacturing exposure apparatus and method for exposing a pattern on a mask onto a substrate
CN1261334C (zh) * 2001-08-10 2006-06-28 Asml美国公司 光刻用的标线片转移系统和方法，基片转移盒及转移方法
CN1424627A (zh) * 2001-12-06 2003-06-18 株式会社尼康 曝光方法和曝光装置
CN1493921A (zh) * 2002-07-29 2004-05-05 ASML�عɹɷ����޹�˾ 具有与真空室连通的真空掩模版库的光刻设备
CN102004398A (zh) * 2009-08-28 2011-04-06 优志旺电机株式会社 两面曝光装置
CN107243878A (zh) * 2017-07-28 2017-10-13 京东方科技集团股份有限公司 一种掩膜板存储装置
CN108628108A (zh) * 2018-04-25 2018-10-09 武汉华星光电技术有限公司 承载装置和曝光机

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