WO2019188884A1 - ヒートシンク付き絶縁回路基板 - Google Patents
ヒートシンク付き絶縁回路基板 Download PDFInfo
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- WO2019188884A1 WO2019188884A1 PCT/JP2019/012325 JP2019012325W WO2019188884A1 WO 2019188884 A1 WO2019188884 A1 WO 2019188884A1 JP 2019012325 W JP2019012325 W JP 2019012325W WO 2019188884 A1 WO2019188884 A1 WO 2019188884A1
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- Prior art keywords
- metal layer
- heat sink
- circuit board
- thickness
- bonded
- Prior art date
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- 229910052751 metal Inorganic materials 0.000 claims abstract description 163
- 239000002184 metal Substances 0.000 claims abstract description 163
- 239000000919 ceramic Substances 0.000 claims abstract description 77
- 239000000758 substrate Substances 0.000 claims abstract description 55
- 239000000463 material Substances 0.000 claims abstract description 31
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims abstract description 21
- 229910052802 copper Inorganic materials 0.000 claims abstract description 21
- 239000010949 copper Substances 0.000 claims abstract description 21
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 20
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims abstract description 20
- 229910000838 Al alloy Inorganic materials 0.000 claims abstract description 17
- 229910000881 Cu alloy Inorganic materials 0.000 claims abstract description 16
- 238000009792 diffusion process Methods 0.000 claims description 6
- 239000007790 solid phase Substances 0.000 claims description 6
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 5
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 5
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 claims description 4
- 238000005219 brazing Methods 0.000 description 16
- 238000004519 manufacturing process Methods 0.000 description 12
- 238000011156 evaluation Methods 0.000 description 10
- 238000010438 heat treatment Methods 0.000 description 8
- 238000005304 joining Methods 0.000 description 8
- 238000005259 measurement Methods 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- 239000011888 foil Substances 0.000 description 5
- 229910018125 Al-Si Inorganic materials 0.000 description 4
- 229910018520 Al—Si Inorganic materials 0.000 description 4
- 229910017945 Cu—Ti Inorganic materials 0.000 description 4
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 230000017525 heat dissipation Effects 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 229910000679 solder Inorganic materials 0.000 description 3
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 2
- PIGFYZPCRLYGLF-UHFFFAOYSA-N Aluminum nitride Chemical compound [Al]#N PIGFYZPCRLYGLF-UHFFFAOYSA-N 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 2
- 238000005476 soldering Methods 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 229910018134 Al-Mg Inorganic materials 0.000 description 1
- 229910018131 Al-Mn Inorganic materials 0.000 description 1
- 229910018182 Al—Cu Inorganic materials 0.000 description 1
- 229910018459 Al—Ge Inorganic materials 0.000 description 1
- 229910018467 Al—Mg Inorganic materials 0.000 description 1
- 229910018461 Al—Mn Inorganic materials 0.000 description 1
- 229910018566 Al—Si—Mg Inorganic materials 0.000 description 1
- 229910017888 Cu—P Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910021426 porous silicon Inorganic materials 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/34—Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
- H01L23/36—Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
- H01L23/373—Cooling facilitated by selection of materials for the device or materials for thermal expansion adaptation, e.g. carbon
- H01L23/3736—Metallic materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/12—Mountings, e.g. non-detachable insulating substrates
- H01L23/14—Mountings, e.g. non-detachable insulating substrates characterised by the material or its electrical properties
- H01L23/142—Metallic substrates having insulating layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/34—Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
- H01L23/36—Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
- H01L23/373—Cooling facilitated by selection of materials for the device or materials for thermal expansion adaptation, e.g. carbon
- H01L23/3735—Laminates or multilayers, e.g. direct bond copper ceramic substrates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/48—Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the subgroups H01L21/06 - H01L21/326
- H01L21/4814—Conductive parts
- H01L21/4871—Bases, plates or heatsinks
- H01L21/4882—Assembly of heatsink parts
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/12—Mountings, e.g. non-detachable insulating substrates
- H01L23/13—Mountings, e.g. non-detachable insulating substrates characterised by the shape
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/12—Mountings, e.g. non-detachable insulating substrates
- H01L23/14—Mountings, e.g. non-detachable insulating substrates characterised by the material or its electrical properties
- H01L23/15—Ceramic or glass substrates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/34—Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
- H01L23/36—Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/34—Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
- H01L23/36—Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
- H01L23/367—Cooling facilitated by shape of device
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/482—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of lead-in layers inseparably applied to the semiconductor body
- H01L23/485—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of lead-in layers inseparably applied to the semiconductor body consisting of layered constructions comprising conductive layers and insulating layers, e.g. planar contacts
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K7/00—Constructional details common to different types of electric apparatus
- H05K7/20—Modifications to facilitate cooling, ventilating, or heating
- H05K7/2039—Modifications to facilitate cooling, ventilating, or heating characterised by the heat transfer by conduction from the heat generating element to a dissipating body
- H05K7/20509—Multiple-component heat spreaders; Multi-component heat-conducting support plates; Multi-component non-closed heat-conducting structures
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L2224/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
- H01L2224/321—Disposition
- H01L2224/32151—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/32221—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/32225—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
Definitions
- the present invention relates to an insulating circuit board with a heat sink in which a heat sink is bonded to an insulating circuit board such as a power module board used in a semiconductor device that controls a large current and a high voltage.
- An insulating circuit board with a heat sink is known in which a circuit layer is bonded to one surface of an insulating layer made of a ceramic substrate such as aluminum nitride, and an aluminum heat sink is bonded to the other surface via an aluminum plate. ing.
- an insulating circuit board with a heat sink disclosed in Patent Document 1 has a circuit layer made of any one of a pure aluminum plate, an aluminum alloy plate, a pure copper plate, a copper alloy plate, etc. on one surface of an insulating layer made of a ceramic substrate.
- a metal layer made of pure aluminum or an aluminum alloy metal plate is bonded to the other surface of the insulating layer, and a heat sink made of aluminum or an aluminum alloy is bonded to the metal layer via a copper layer.
- the insulating layer and the metal layer are bonded using a brazing material, and the metal layer and the heat sink are bonded by solid phase diffusion between the copper layer interposed therebetween.
- Patent Document 3 a first metal plate is bonded to one surface of a first ceramic substrate, and a second metal plate is bonded to the other surface of the first ceramic substrate and one surface of the second ceramic substrate.
- a metal-ceramic bonding substrate (insulated circuit substrate with a heat sink) in which a plate-like heat radiation member having a plurality of fins is bonded to the other surface of the second ceramic substrate is disclosed.
- This metal-ceramic bonding substrate is formed by arranging a first ceramic substrate and a second ceramic substrate in a carbon mold at intervals and pouring a molten aluminum alloy into the mold to cool and solidify. .
- the metal / ceramic bonding substrate disclosed in Patent Document 3 is manufactured by placing two ceramic substrates at intervals in a mold and pouring a molten aluminum alloy into the mold.
- the metal plate, the heat radiating member, and the fin are the same aluminum alloy.
- This invention is made in view of such a situation, and it aims at suppressing the curvature of the insulated circuit board with a heat sink by which the heat sink consisting of the metal of a composition different from the metal layer of an insulated circuit board is joined. .
- An insulated circuit board with a heat sink of the present invention comprises a ceramic substrate, a circuit layer bonded to one surface of the ceramic substrate, and a metal layer made of aluminum or an aluminum alloy bonded to the other surface of the ceramic substrate.
- the thickness T1 of the first metal layer is not less than 0.3 mm and not more than 3.0 mm, and the thickness ratio T1 / T2 is not less than 1.0.
- the heat sink includes a first metal layer bonded to the metal layer of the insulating circuit board, a ceramic plate material bonded to the first metal layer, and a second metal layer bonded to the ceramic plate material. ing. That is, since the ceramic plate material is incorporated inside the first metal layer and the second metal layer made of copper or copper alloy, the linear expansion coefficient of the heat sink can be reduced, and the difference in linear expansion from the insulating circuit board can be reduced. it can. Thereby, the amount of warp change between the high temperature and low temperature of the insulated circuit board with the heat sink can be suppressed.
- the thickness T1 of the first metal layer is set to 0.3 mm or more and 3.0 mm or less. If the thickness T1 of the first metal layer is less than 0.3 mm, the heat dissipation effect of the heat sink may be reduced. Yes, if the thickness T1 exceeds 3.0 mm, the influence of expansion of the first metal layer made of copper or copper alloy is increased, and the linear expansion of the joined body (heat sink) with the ceramic plate material is increased. This is because warpage of an insulating circuit board with a heat sink, which is a joined body of the board and the heat sink, increases.
- the thickness T1 of the first metal layer is less than the thickness T1 of the second metal layer, there is a possibility that the insulating circuit substrate with a heat sink warps in a convex shape toward the insulating circuit side, so that T1 / T2 is 1.0 or more.
- the thickness ratio T1 / T2 is preferably 10.0 or less.
- the thickness T2 of the second metal layer is preferably 0.3 or more.
- the circuit layer may be made of aluminum or an aluminum alloy
- the ceramic substrate may be made of aluminum nitride
- the ceramic plate material may be made of silicon nitride.
- the metal layer and the first metal layer may be bonded by solid phase diffusion bonding.
- the curvature of the insulated circuit board with a heat sink formed by joining the insulated circuit board which has a metal layer, and the heat sink which has a metal layer of a composition different from the metal layer of an insulated circuit board can be suppressed.
- FIG. 1 It is sectional drawing which shows the power module using the insulated circuit board with a heat sink concerning one Embodiment of this invention. It is the top view which looked at the insulated circuit board with a heat sink in the said embodiment from the circuit layer side. It is sectional drawing explaining the manufacturing method of the insulated circuit board with a heat sink shown in FIG. It is sectional drawing explaining the manufacturing method of the insulated circuit board with a heat sink shown in FIG. It is sectional drawing explaining the manufacturing method of the insulated circuit board with a heat sink shown in FIG.
- an insulated circuit board 100 with a heat sink is formed by bonding a heat sink 2 to an insulated circuit board 1, and is used as, for example, a power module board.
- an element 30 is mounted to form a power module.
- This element 30 is an electronic component including a semiconductor, and various elements such as IGBT (Insulated Gate Bipolar Transistor), MOSFET (Metal Oxide Semiconductor Field Transistor), FWD (Free Wheeled Semiconductor) are selected.
- the element 30 is provided with an upper electrode part at the upper part and a lower electrode part at the lower part, and the lower electrode part is joined to the upper surface of the circuit layer 12 by solder 31 or the like.
- the element 30 is mounted on the upper surface of the circuit layer 12.
- the upper electrode portion of the element 30 is connected to the circuit electrode portion and the like of the circuit layer 12 via a lead frame and the like joined by solder or the like, and the power module is manufactured.
- the insulated circuit board 1 includes a ceramic substrate 11, a circuit layer 12 bonded to one surface of the ceramic substrate 11, and a metal layer 13 bonded to the other surface of the ceramic substrate 11.
- the ceramic substrate 11 is a rectangular plate-like insulating substrate that prevents electrical connection between the circuit layer 12 and the metal layer 13.
- the ceramic substrate 11 is aluminum nitride (AlN), silicon nitride (Si 3 N 4 ), aluminum oxide ( Al 2 O 3 ), a zirconia reinforced alumina substrate or the like, and its thickness is 0.2 mm to 1.2 mm.
- AlN aluminum nitride
- Si 3 N 4 silicon nitride
- Al 2 O 3 aluminum oxide
- zirconia reinforced alumina substrate or the like and its thickness is 0.2 mm to 1.2 mm.
- both the circuit layer 12 and the metal layer 13 joined to both surfaces of the ceramic substrate 11 are made of aluminum or an aluminum alloy, it is preferable to be made of aluminum nitride.
- the planar size of the ceramic substrate 11 is not particularly limited, but is set to 40 mm to 140 mm ⁇ 40 mm to 100 mm in the present embodiment.
- the circuit layer 12 is bonded to the upper surface (surface) of the ceramic substrate 11, pure aluminum or aluminum alloy having a purity of 99% by mass or more is used, and the thickness thereof is, for example, 0.2 mm or more and 0.9 mm.
- the planar size of the circuit layer 12 is smaller than that of the ceramic substrate 11 and is not particularly limited, but is set to 36 mm to 136 mm ⁇ 36 mm to 96 mm in this embodiment.
- the metal layer 13 is bonded to the lower surface (back surface) of the ceramic substrate 11 and is made of pure aluminum or aluminum alloy having a purity of 99% by mass or more. According to the JIS standard, aluminum in the 1000s, particularly 1N99 (purity of 99.99% by mass or more). : So-called 4N aluminum) can be used.
- the thickness is, for example, 0.2 mm to 0.9 mm.
- the planar size of the metal layer 13 is smaller than that of the ceramic substrate 11 and is not particularly limited. However, in this embodiment, it is set to 36 mm to 136 mm ⁇ 36 mm to 96 mm and the same as the circuit layer 12.
- the circuit layer 12 and the metal layer 13 preferably have the same composition and the same thickness and size.
- the heat sink 2 is bonded to the insulated circuit board 1 and radiates heat transferred from the insulated circuit board 1.
- the heat sink 2 includes a first metal layer 21 bonded to the metal layer 13 of the insulating circuit board 1, a ceramic plate material 23 bonded to the lower surface (back surface) of the first metal layer 21, and a lower surface (back surface) of the ceramic plate material 23. ) And the second metal layer 22 joined to each other.
- the first metal layer 21 is made of copper or a copper alloy, and its thickness T1 is set to 0.3 mm or more and 3.0 mm or less.
- the 2nd metal layer 22 consists of copper or a copper alloy, and the thickness T2 is set to 0.3 mm or more and 3.0 mm or less.
- the thickness of the first metal layer 21 is less than 0.3 mm, the heat dissipation effect of the heat sink 2 may be reduced. If the thickness exceeds 3.0 mm, the bonded body (heat sink 2) of the ceramic plate member 23 may be reduced. Since the linear expansion increases, the warpage of the insulating circuit board 100 with the heat sink, which is a joined body of the insulating circuit board 1 and the heat sink 2, increases. Further, if the thickness of the first metal layer 21 is smaller than the thickness of the second metal layer 22, the heat sink 2 may be warped convexly toward the first metal layer 21 during heating.
- the thickness T1 of the first metal layer 21 is not less than 0.3 mm and not more than 3.0 mm and not less than the thickness T2 of the second metal layer 22 (is equal to or equal to the thickness T2 of the second metal layer 22). Thicker than T2).
- the thickness ratio T1 / T2 between the thickness T1 of the first metal layer 21 and the thickness T2 of the second metal layer 22 is 1.0 or more and preferably 10.0 or less.
- the ceramic plate material 23 is provided in order to reduce the difference in linear expansion between the heat sink 2 and the insulating circuit board 1, and silicon nitride (Si 3 N 4 ), aluminum nitride (AlN), and aluminum oxide (Al 2 O 3 ).
- Si 3 N 4 silicon nitride
- AlN aluminum nitride
- Al 2 O 3 aluminum oxide
- a zirconia reinforced alumina substrate or the like, and its thickness T3 is set to 0.2 mm to 1.2 mm.
- the planar size of the first metal layer 21, the second metal layer 22, and the ceramic plate member 23 is larger than that of the ceramic substrate 11 and is not particularly limited. However, all are set to the same size, for example, 50 mm to 180 mm ⁇ 60 mm to It is set to 140 mm.
- plate material 23 is more preferably comprised by silicon nitride.
- the ceramic substrate 11 is larger than the circuit layer 12 and the heat sink 2 (the first metal layer 21, the second metal layer 21 is larger than the ceramic substrate 11 as shown in FIG.
- the metal layer 22 and the ceramic plate 23) are large.
- the heat sink 2 has a structure in which the ceramic plate material 23 is built inside the first metal layer 21 and the second metal layer 22 made of copper or a copper alloy.
- a method of manufacturing an insulating circuit board 100 with a heat sink is obtained by joining a circuit layer metal plate 120 and a metal layer metal plate 130 made of pure aluminum or an aluminum alloy to a ceramic substrate 11.
- Manufacturing process FIG. 3A
- heat sink manufacturing process FIG. 3B
- insulated circuit board 1 and the heat sink 2 FIG. 3C
- the circuit layer metal plate 120 and the metal layer metal plate 130 are joined to the ceramic substrate 11 using an Al—Si brazing material.
- a circuit layer metal plate 120 and a metal layer metal plate 130 are laminated on the front surface (upper surface) and back surface (lower surface) of the ceramic substrate 11 with an Al—Si brazing foil 14 interposed therebetween, respectively.
- These laminates are sandwiched between carbon plates and heated in a vacuum while applying a load in the laminating direction, thereby joining the ceramic substrate 11 to the circuit layer metal plate 120 and the metal layer metal plate 130.
- the circuit layer 12 is bonded to the surface (upper surface) of the ceramic substrate 11 via the bonding portion (brazing portion), and the metal layer 13 is bonded to the rear surface (lower surface) via the bonding portion (brazing portion). Insulated circuit board 1 is formed.
- the pressing force in the stacking direction is preferably 0.3 MPa to 1.5 MPa, and the heating temperature is preferably 630 ° C. or more and 655 ° C. or less.
- the Al—Si brazing foil may have a thickness of 5 ⁇ m to 15 ⁇ m.
- an Al—Ge based, Al—Cu based, Al—Mg based, Al—Mn based, or Al—Si—Mg based brazing material can also be used.
- the metal plates 220 for the second metal layer having a thickness of 0.3 mm to 3.0 mm and T1 or less are joined using an Ag—Cu—Ti brazing material.
- the metal plate 210 for the first metal layer and the second metal layer are disposed on the front surface (upper surface) and the back surface (lower surface) of the ceramic plate material 23 with an Ag—Cu—Ti brazing material foil 14 interposed therebetween, respectively.
- the metal plates 220 are laminated, these laminates are sandwiched between carbon plates, and heated in a vacuum while applying a load in the laminating direction, whereby the ceramic plate material 23, the first metal layer metal plate 210, and the second metal layer.
- the metal plate 220 is joined.
- the first metal layer 21 having a thickness T1 of 0.3 mm to 3.0 mm is bonded to the front surface (upper surface) of the ceramic plate material 23 via the bonding portion (brazing portion), and the thickness is applied to the rear surface (lower surface).
- a heat sink 2 is formed in which a second metal layer 22 having a T2 of 0.3 mm to 3.0 mm and a thickness T1 or less of the first metal layer 21 is bonded via a bonding portion (brazing portion).
- the pressure in the stacking direction is preferably 0.1 MPa to 1.0 MPa, and the heating temperature is preferably 800 ° C. to 930 ° C.
- the Ag—Cu—Ti brazing foil may have a thickness of 5 ⁇ m to 15 ⁇ m.
- a Cu—P brazing material can also be used.
- the insulating circuit board 1 and the heat sink 2 are solid phase diffusion bonded.
- the metal layer 13 of the insulating circuit board 1 is laminated on the heat sink 2, and the laminated body is heated to the bonding temperature in a vacuum atmosphere in a state where the laminated body is pressurized in the lamination direction.
- the metal layer 13 and the heat sink 2 are solid-phase diffusion bonded.
- the applied pressure is, for example, 0.5 MPa to 2.0 MPa
- the heating temperature is 500 ° C. to 540 ° C.
- this pressurization and heating state is maintained for 30 minutes to 120 minutes.
- the metal layer 13 and the heat sink 2 are joined, and as shown in FIG. 1, the insulated circuit board 100 with a heat sink is obtained.
- the joint surface of the metal layer 13 and the joint surface of the heat sink 2 are solid phase diffusion bonded after the scratches are removed and smoothed in advance.
- the heat sink is composed of a single plate of copper or copper alloy, since the linear expansion difference with the metal layer 13 made of aluminum or aluminum alloy of the insulating circuit board 1 is large, The shrinkage rate at a low temperature is different, and the warpage of the insulating circuit board 100 with the heat sink increases.
- the first metal layer 21 bonded to the metal layer 13 of the insulating circuit board 1, the ceramic plate material 23 bonded to the first metal layer 21, and the ceramic plate material 23 are bonded.
- the heat sink 2 is constituted by the second metal layer 22. That is, since the ceramic plate material 23 is built inside the first metal layer 21 and the second metal layer 22 made of copper or copper alloy, the linear expansion coefficient of the heat sink 2 can be reduced, and the insulating circuit board 1 can be reduced. The difference in linear expansion can be reduced.
- the thickness T1 of the first metal layer 21 is 0.3 mm or more and 3.0 mm or less and the thickness T2 of the second metal layer 22 is more than T2 (T1 ⁇ T2), the heat dissipation effect of the heat sink 2 is maintained.
- the warpage of the heat sink 2 can be suppressed, and as a result, the amount of warpage change between the high temperature and the low temperature of the insulated circuit board 100 with the heat sink can be further suppressed.
- the circuit layer 12 is made of aluminum or an aluminum alloy.
- the circuit layer 12 is not limited thereto, and may be made of oxygen-free copper, for example. That is, the composition of the circuit layer 12 does not matter.
- the insulating circuit board 100 with a heat sink is used as a power module board with a heat sink.
- the insulating circuit board 100 with a heat sink can be used as various insulating boards such as an LED element substrate. You can also.
- Insulating circuit boards constituting the samples of Examples 1 to 18, Comparative Examples 1 to 3 and the conventional example include a ceramic layer having a thickness of 0.635 mm, a planar size of 120 mm ⁇ 90 mm, and a circuit layer having a thickness of 0.4 mm and A metal layer having a thickness of 0.4 mm was manufactured by the manufacturing method described in the above embodiment, and circuit layers and metal layers having the compositions shown in Table 1 were prepared.
- the heat sinks constituting the materials of Examples 1 to 18 and Comparative Examples 1 to 3 include a first metal layer made of oxygen-free copper on a ceramic substrate having a thickness of 0.32 mm and a planar size of 140 mm ⁇ 100 mm, and The second metal layer was manufactured by the manufacturing method described in the above embodiment, and the first metal layer and the second metal layer having thicknesses shown in Table 1 were prepared.
- the heat sink comprised by the single plate of oxygen free copper of thickness 5.0mm and plane size 140mm x 100mm was manufactured.
- the amount of warpage was measured using a moire type three-dimensional shape measuring machine (Akerometrics thermal warpage / strain measuring machine Thermoire PS200) with the center of the second metal layer of the heat sink (100 mm ⁇ 80 mm range) as the measurement surface. More specifically, the least square surface was obtained from the profile of the measurement surface, and the difference (absolute value) between the highest point and the lowest point was obtained on the basis of the surface to obtain the warpage amount.
- a moire type three-dimensional shape measuring machine Akerometrics thermal warpage / strain measuring machine Thermoire PS200
- the least square surface was obtained from the profile of the measurement surface, and the difference (absolute value) between the highest point and the lowest point was obtained on the basis of the surface to obtain the warpage amount.
- the positive / negative is set according to the warpage state for the warpage amount thus obtained. That is, when the center of the measurement range is closer to the circuit layer side than the surface formed by the four corners of the measurement range (the second metal layer protrudes toward the circuit layer side), and the center of the measurement range is on the surface formed by the four corners of the measurement range Is set to a positive value, and when the center of the measurement range is farther from the circuit layer side than the surface formed by the four corners of the measurement range (the second metal layer protrudes toward the heat sink), the negative value is set.
- the difference between the amount of warpage when heated at 285 ° C. and the amount of warpage when cooled at 30 ° C. (the amount of warpage when heated at 285 ° C. where positive and negative are set minus the amount of warpage when cooled at 30 ° C. where positive and negative are set)
- the absolute value of (amount) was defined as the amount of warpage change.
- the amount of warpage change was as small as 1.20 mm or less, and the evaluation of the element position deviation and the thermal cycle reliability were both “A”. For this reason, it is an effective range that the thickness T1 of the first metal layer of the heat sink is 0.3 mm or more and 3.0 mm or less and the thickness T2 or more (T1 ⁇ T2) of the second metal layer. I understood.
- Comparative Examples 1 and 2 Although the amount of change in warpage was relatively large, the evaluation of the element position deviation was good “A”. B ". For this reason, when the thickness of the 1st metal layer was 4.0 mm, it turned out that an effective result cannot be obtained.
- Comparative Example 3 although the evaluation of the reliability of the thermal cycle was good “A”, the warpage change amount was as large as 1.3 mm or more and the element position deviation occurred, so the evaluation was “B”. . For this reason, it turned out that an effective result cannot be obtained when thickness T2 of the 2nd metal layer is larger than thickness T1 of the 1st metal layer.
- Warpage of an insulated circuit board with a heat sink formed by joining an insulated circuit board having a metal layer and a heat sink having a metal layer having a composition different from the metal layer of the insulated circuit board can be suppressed.
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Abstract
Description
本発明に係るヒートシンク付き絶縁回路基板100は、図1に示すように、絶縁回路基板1にヒートシンク2が接合されてなり、例えば、パワーモジュール用基板として用いられる。このヒートシンク付き絶縁回路基板100の表面(上面)には、図1の二点鎖線で示すように、素子30が搭載されパワーモジュールとなる。
絶縁回路基板1は、セラミックス基板11と、セラミックス基板11の一方の面に接合された回路層12と、セラミックス基板11の他方の面に接合された金属層13とを備える。
ヒートシンク2は、絶縁回路基板1に接合されて、前記絶縁回路基板1から伝達された熱を放熱する。このヒートシンク2は、絶縁回路基板1の金属層13に接合された第1金属層21と、第1金属層21の下面(裏面)に接合されたセラミックス板材23と、セラミックス板材23の下面(裏面)に接合された第2金属層22とからなる。
次に、本実施形態のヒートシンク付き絶縁回路基板100の製造方法について説明する。
まず、図3Aに示すように、セラミックス基板11に回路層用金属板120及び金属層用金属板130をそれぞれAl-Si系のろう材を用いて接合する。具体的には、セラミックス基板11の表面(上面)及び裏面(下面)に、それぞれAl-Si系のろう材箔14を介在させて回路層用金属板120及び金属層用金属板130を積層し、これらの積層体をカーボン板により挟持し、積層方向に荷重をかけながら真空中で加熱することにより、セラミックス基板11と回路層用金属板120及び金属層用金属板130を接合する。これにより、セラミックス基板11の表面(上面)に回路層12が接合部(ろう付け部)を介して接合され、裏面(下面)に金属層13が接合部(ろう付け部)を介して接合された絶縁回路基板1が形成される。
次に、図3Bに示すように、厚さT3が0.2mm~1.2mmのセラミックス板材23に厚さT1が0.3mm~3.0mmの第1金属層用金属板210及び厚さT2が0.3mm~3.0mmかつT1以下の第2金属層用金属板220をそれぞれAg-Cu-Ti系のろう材を用いて接合する。具体的には、セラミックス板材23の表面(上面)及び裏面(下面)に、それぞれAg-Cu-Ti系のろう材箔14を介在させて第1金属層用金属板210及び第2金属層用金属板220を積層し、これらの積層体をカーボン板により挟持し、積層方向に荷重をかけながら真空中で加熱することにより、セラミックス板材23と第1金属層用金属板210及び第2金属層用金属板220を接合する。これにより、セラミックス板材23の表面(上面)に厚さT1が0.3mm~3.0mmの第1金属層21が接合部(ろう付け部)を介して接合され、裏面(下面)に厚さT2が0.3mm~3.0mmで、かつ第1金属層21の厚さT1以下の第2金属層22が接合部(ろう付け部)を介して接合されたヒートシンク2が形成される。
そして、絶縁回路基板1とヒートシンク2とを固相拡散接合する。具体的には、図3Cに示すように、絶縁回路基板1の金属層13をヒートシンク2上に積層し、これらの積層体を積層方向に加圧した状態で、真空雰囲気下で接合温度に加熱することにより、金属層13とヒートシンク2を固相拡散接合する。この場合の加圧力としては例えば0.5MPa~2.0MPa、加熱温度としては500℃~540℃とされ、この加圧及び加熱状態を30分~120分保持する。これにより、金属層13とヒートシンク2とが接合され、図1に示すように、ヒートシンク付き絶縁回路基板100が得られる。
得られた各試料につき、30℃から285℃に加熱した後冷却して30℃とする一連の加熱試験において、285℃加熱時の反り量及び285℃に加熱した後冷却して30℃となった際の反り量(30℃冷却時の反り量)をそれぞれ測定し、温度変化による各試料の変形を反り変化量として確認した。
素子位置ずれの評価は、電子部品を回路層にはんだ付けした後に、そのはんだ付け位置を計測することにより、位置ずれ発生の有無を、試料を30個製作して確認した。そして、0.2mm以上の位置ずれが生じた場合を不合格とし、0.2mm未満の位置ずれの場合は合格と評価した。
また、実施例1~18、比較例1~3及び従来例のヒートシンク付き絶縁回路基板に対して、-50℃~175℃の間で1000回変化させる温度サイクル試験を実行した後、絶縁回路基板のセラミックス基板に割れがあるか否かを目視にて判定した。この際、セラミックス基板に割れがあるものを否「B」、セラミックス基板に割れがないものを良「A」と判定した。反り変化量、素子位置ずれの評価及び冷熱サイクル信頼性の評価について、表2に結果を示す。
2 ヒートシンク
11 セラミックス基板
12 回路層
13 金属層
14 ろう材箔
21 第1金属層
22 第2金属層
23 セラミックス板材
30 素子
31 はんだ
100 ヒートシンク付き絶縁回路基板
120 回路層用金属板
130 金属層用金属板
210 第1金属層用金属板
220 第2金属層用金属板
Claims (5)
- セラミックス基板、前記セラミックス基板の一方の面に接合された回路層、および前記セラミックス基板の他方の面に接合されたアルミニウム又はアルミニウム合金からなる金属層を備える絶縁回路基板と;前記金属層に接合されたヒートシンクと;を備えるヒートシンク付絶縁回路基板であって、
前記ヒートシンクは、前記金属層に接合された銅又は銅合金からなる厚さT1の第1金属層と、前記第1金属層の前記金属層とは反対側の面に接合されたセラミックス板材と、前記セラミックス板材の前記第1金属層とは反対側の面に接合された銅又は銅合金からなる厚さT2の第2金属層と、を有し、
前記第1金属層の前記厚さT1は0.3mm以上3.0mm以下であり、厚さ比率T1/T2が1.0以上であることを特徴とするヒートシンク付き絶縁回路基板。 - 前記厚さ比率T1/T2が10.0以下であることを特徴とする請求項1に記載のヒートシンク付き絶縁回路基板。
- 前記第2金属層の前記厚さT2が0.3mm以上であることを特徴とする請求項1または2に記載のヒートシンク付き絶縁回路基板。
- 前記回路層は、アルミニウム又はアルミニウム合金により構成され、
前記セラミックス基板は、窒化アルミニウムにより構成され、
前記セラミックス板材は、窒化珪素により構成されている
ことを特徴とする請求項1又は2に記載のヒートシンク付き絶縁回路基板。 - 前記金属層と前記第1金属層とは、固相拡散接合していることを特徴とする請求項1から3のいずれか一項に記載のヒートシンク付き絶縁回路基板。
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JP2020510020A JP7054073B2 (ja) | 2018-03-27 | 2019-03-25 | ヒートシンク付き絶縁回路基板 |
CN201980017185.8A CN111819681A (zh) | 2018-03-27 | 2019-03-25 | 带散热器的绝缘电路基板 |
EP19774225.7A EP3780084A4 (en) | 2018-03-27 | 2019-03-25 | Insulated circuit board with heat sink |
US17/040,236 US11289390B2 (en) | 2018-03-27 | 2019-03-25 | Insulation circuit board with heat sink |
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