WO2019090967A1 - 坩埚及蒸镀方法 - Google Patents

坩埚及蒸镀方法 Download PDF

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Publication number
WO2019090967A1
WO2019090967A1 PCT/CN2018/072620 CN2018072620W WO2019090967A1 WO 2019090967 A1 WO2019090967 A1 WO 2019090967A1 CN 2018072620 W CN2018072620 W CN 2018072620W WO 2019090967 A1 WO2019090967 A1 WO 2019090967A1
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Prior art keywords
heating
heating member
crucible
disposed
wall surface
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PCT/CN2018/072620
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English (en)
French (fr)
Inventor
乔小平
李金川
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Shenzhen China Star Optoelectronics Semiconductor Display Technology Co Ltd
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Shenzhen China Star Optoelectronics Semiconductor Display Technology Co Ltd
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Priority to US16/057,944 priority Critical patent/US20190136366A1/en
Publication of WO2019090967A1 publication Critical patent/WO2019090967A1/zh
Anticipated expiration legal-status Critical
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B14/00—Crucible or pot furnaces
    • F27B14/04—Crucible or pot furnaces adapted for treating the charge in vacuum or special atmosphere

Definitions

  • the present application belongs to the field of vapor deposition technology, and in particular, to a crucible and an evaporation method.
  • OLED has the characteristics of self-illumination, light and thin, easy to realize flexible display, etc. It is a new generation display technology with good development prospects.
  • the evaporation of OLED materials generally adopts physical vapor deposition, that is, placing organic materials. Heating in a crucible in a vacuum chamber to sublimate or vaporize the organic material to form a film on the substrate; some metal materials need to be heated to a relatively high temperature (500 ° C or even 1000 ° C or higher) to be liquefied or vaporized, and evaporated. Metal materials require the use of high temperature resistant crucibles.
  • the general high-temperature metal crucibles are all in the shape of a cylinder. After the metal material is heated, it is liquefied and then vaporized. The vaporized metal atoms are ejected from the mouth. After the heating is stopped, the metal material in the metal crucible shrinks, causing a certain amount to the sidewall of the crucible. The pulling force causes the flaw to deform or even break.
  • the purpose of the present application is to provide a crucible to solve the problem of flaw deformation of the prior art.
  • a crucible in a first aspect, includes a first crucible body and a second crucible body disposed opposite to the first crucible body, and the first crucible body and the second crucible body are enclosed to form a cavity structure So that the cavity cross-section forms an annular shape, the cavity is for accommodating an evaporation material, and the first body is provided with a first heating member opposite to the outer wall surface of the second body.
  • a second heating member is disposed on the inner wall surface of the first body opposite the first body, the file further includes a heating control system, and the heating control system controls the first heating member and the second The heating time of the heating element is different.
  • the first heating component is disposed in close proximity to the first outer wall surface, and the second heating component is disposed adjacent to the second inner wall surface.
  • the first heating component and the second heating component provide a heating temperature range of 400 ° C ⁇ 1500 ° C.
  • the raft further includes a cover body, the cover body is disposed at an end of the top end of the cavity, and the cover body has an opening.
  • the opening of the cover body is a plurality of and is annular around the first body The array is arranged.
  • the first body and the second body are circular, and the diameter of the second body is 30% of the diameter of the first body ⁇ 60%.
  • the cavity is provided with a temperature sensor.
  • the application also provides an evaporation method, which adopts the following technical solutions:
  • a method of vapor deposition comprises the steps of:
  • the chamber is provided with an evaporation material
  • a first heating member is disposed on the outer wall surface of the first body opposite to the second body, and a second heating member is disposed on the inner wall surface of the second body opposite to the first body;
  • Heating the control system simultaneously turns on the first heating component and the second heating component, and the temperature is raised to sublimate or melt evaporation of the evaporation material;
  • the second heating member is first closed, and the first heating member is maintained in a heated state, and the vapor deposition material is separated from the first body and closed.
  • the first heating component and the second heating component are controlled to have a heating temperature ranging from 400 ° C to 1500 ° C.
  • the first heating component and the second heating component are controlled to have a heating temperature in the range of 500 ° C to 1200 ° C.
  • the present invention provides a crucible, by providing an annular cavity, enclosing a first heating member on the outer wall of the crucible, enclosing a second heating member on the inner wall of the crucible, and controlling the first heating member and the second heating member through a heating control system
  • the heating time is different, so that the flaw of the present application does not cause deformation or cracking.
  • FIG. 1 is a schematic structural view of a crucible in the prior art
  • Figure 2 is a schematic view showing the structure of the use state of Figure 1;
  • FIG. 3 is a schematic perspective view of a three-dimensional structure of an embodiment of the present application.
  • Figure 4 is a schematic cross-sectional view showing the structure of the crucible of Figure 3;
  • Fig. 5 is a schematic view showing the structure of the use state of Fig. 4;
  • FIG. 1 is a schematic view of a conventional crucible structure, including a crucible body 01 and a heating portion 03.
  • the crucible at the top of the crucible has an opening 02
  • the crucible body 01 has a barrel structure, including an internal cavity, and is filled with
  • the metal deposition material 04 and the heating unit 03 are disposed on the outer wall surface of the body 01.
  • FIG. 2 is a schematic diagram of the structure of the existing crucible.
  • the metal evaporation material 04 in the crucible gradually cools and shrinks. Due to thermal expansion and contraction, the metal evaporation material 04 will A tensile force is generated on the side wall of the body 01, which may cause deformation or even cracking of the body 01, which seriously affects the vapor deposition process.
  • an embodiment of the present application provides a first body 101 including a first body 101 and a second body 102 disposed opposite to the first body 101, the first body Enclosing a cavity structure between the 101 and the second body 102 such that the cavity cross-section forms an annular shape, the cavity is for accommodating the evaporation material 300, and the first body 101 is back a first heating member 201 is disposed on an outer wall surface of the second body 102, and a second heating member 202 is disposed on an inner wall surface of the second body 102 opposite to the first body 101.
  • the crucible further includes a heating control system (not shown) that controls the heating durations of the first heating member 201 and the second heating member 202 to be different.
  • the first heating member 201 is disposed around the outer wall of the crucible, and the second heating member 202 is surrounded by the inner wall of the crucible, and the first heating unit 201 and the second heating unit are controlled by the heating control system.
  • the different heating durations of 202 make the flaws of the present application not subject to deformation or cracking.
  • the workflow of the heating control system is: starting the vapor deposition, simultaneously starting the first heating component 201 and the second heating component 202; maintaining the heating state; ending the vapor deposition, first closing the second heating component 202, maintaining the first
  • the heating member 201 is maintained in a heated state, and the material to be vapor-deposited 300 is separated from the first body 101 and closed, so that the heating periods of the first heating member 201 and the second heating member 202 are different.
  • it is basically the same as the present embodiment, except that the first heating member 201 is turned off first, and then the second heating member 202 is turned off.
  • the temperature of the first heating member 201 on the side of the continuous heating is high, the temperature of the closed second heating member 202 is low, and the vapor deposition material 300 is on the side close to the first heating member 201. It is also in a high-temperature molten state, and has good fluidity.
  • the vapor-deposited material 300 flows toward the side of the second heating member 202 with a low temperature, and finally all of the vapor-deposited material 300 shrinks to the side of the second body 102, and There is no vapor deposition material 300 on the side wall of the first body 101 side, so that the vapor deposition material 300 is completely separated from the first body 101 and a gap 105 is formed.
  • the first heating member 101 is closed, since the evaporation material 300 is no longer connected between the first body 101 and the second body 102, no tension is generated on the first body 101, thereby solving the deformation of the file or The problem of damage.
  • the distance between the first heating member 201 and the outer wall surface of the first body 101 is in the range of 1 to 100 mm, and the distance between the second heating member 202 and the inner wall surface of the second body 102 is 1
  • the distance between the first heating member 201 and the outer wall surface of the first body 101 ranges from 5 to 50 mm, and the distance between the second heating member 202 and the inner wall surface of the second body 102 is in the range of 5 to 50 mm.
  • the material of the first body 101 and the second body 102 may be a high temperature resistant metal material such as steel or a high temperature resistant inorganic material such as ceramic. It can be understood that the bottom end faces of the first body 101 and the second body 102 are connected with a bottom plate (not labeled), the bottom plate is disposed at the end of the cavity, and the cavity is composed of the first body 101 and the second cavity 102. It is enclosed with a bottom plate.
  • the cover body 103 further includes a cover body 103.
  • the cover body 103 is disposed at an end of the top end of the cavity.
  • the cover body 103 has an opening 104. Further, the cover 104 has a plurality of openings 104.
  • the shape of the opening 104 may be circular or other shapes.
  • the first body 101 and the second body 102 are circular, and the diameter of the second body 102 is 30% to 60% of the diameter of the first body 101.
  • the first The diameter of the dimorph 102 is 40% to 50% of the diameter of the first cartridge 101.
  • the diameter of the second cartridge 102 is 40% or 50% of the diameter of the first cartridge 101.
  • the evaporation material 300 is a metal material, and is heated by the crucible of the present application to form vapor for vapor deposition on the substrate to form an OLED layer.
  • the first heating member 201 is disposed close to the outer wall surface of the first body 101, and the second heating member 202 is disposed adjacent to the inner wall surface of the second body 102.
  • the heating efficiency is higher and the heat loss is less, which is advantageous for improving the thermal efficiency of the crucible and reducing the energy consumption.
  • the first heating component 201 and the second heating component 202 provide a heating temperature ranging from 400 ° C to 1500 ° C.
  • the first heating component 201 and the second heating component The heating temperature range provided by 202 is 500 ° C to 1200 ° C.
  • the first heating member 201 and the second heating member 202 provide a heating temperature ranging from 800 ° C to 1000 ° C, and, in the present embodiment Providing, for example, that the heating temperature provided by the first heating member 201 and the second heating member 202 is 400 ° C, 500 ° C, 600 ° C, 700 ° C, 800 ° C, 900 ° C, 1000 ° C, 1100 ° C, 1200 ° C Any temperature value of 1300 ° C, 1400 ° C, 1500 ° C.
  • a temperature sensor (not shown) is disposed in the cavity. Through the temperature control of the present embodiment, the crucible has a good temperature application range, and by setting the temperature sensor, the temperature value in the crucible can be monitored in real time, so that the worker can perform the evaporation process according to a better operation.
  • an embodiment of the present application provides a method for vapor deposition, comprising the following steps:
  • a first body 101 and a second body 102 disposed in the first body 101 are disposed, and the first body 101 and the second body 102 are enclosed.
  • Forming a cavity structure the cavity body is provided with an evaporation material 300;
  • a first heating member 201 is disposed on the outer wall surface of the first body 101 opposite to the second body 102, and the second body 102 is disposed opposite to the inner wall surface of the first body 101 a second heating component 202;
  • the heating control system simultaneously turns on the first heating component 201 and the second heating component 202, and the temperature is raised to sublimate or melt evaporation of the evaporation material 300;
  • the second heating member 202 is first closed, and the first heating member 201 is maintained in a heated state, and the vapor deposition material 300 is separated from the first body 101 and closed.
  • the first body 101 and the second body 102 are not deformed or broken during the vapor deposition process, and the vapor deposition process is ensured.
  • the first heating member 201 and the second heating member 202 are controlled to have a heating temperature range of 400 ° C to 1500 ° C. Further, the first heating member and the second heating member are controlled to have a heating temperature ranging from 500 ° C to 1200 ° C.
  • the first heating member 201 and the second heating member 202 provide a heating temperature ranging from 800 ° C to 1000 ° C, and, in the present embodiment, providing, for example, the first heating member 201 and the The heating temperature provided by the second heating member 202 is any one of 400 ° C, 500 ° C, 600 ° C, 700 ° C, 800 ° C, 900 ° C, 1000 ° C, 1100 ° C, 1200 ° C, 1300 ° C, 1400 ° C, 1500 ° C. value.

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Engineering & Computer Science (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

一种坩埚及蒸镀方法，坩埚包括第一埚体（101）和设于相对第一埚体（101）内的第二埚体（102），第一埚体（101）和第二埚体（102）之间围合形成腔体结构，以使腔体横截面形成环形形状，腔体用于容纳蒸镀材料（300），第一埚体（101）背对第二埚体（102）的外壁面围设有第一加热部件（201），第二埚体背对第一埚体的内壁面围设有第二加热部件（202），坩埚还包括加热控制系统，加热控制系统控制第一加热部件（201）和第二加热部件（202）的加热时长不同，通过以上设置进行蒸镀，使得坩埚不会发生变形或者破裂的问题。

Description

坩埚及蒸镀方法
本申请要求于2017年11月08日提交中国专利局、申请号为201711093595.X、发明名称为“坩埚及蒸镀方法”的中国专利申请的优先权，上述在先申请的内容以引入的方式并入本文本中。
技术领域
本申请属于蒸镀技术领域，尤其涉及一种坩埚及蒸镀方法。
背景技术
OLED具有自发光，轻薄，易于实现柔性显示等特点，是一种具有良好发展前景的新一代显示技术；目前在OLED面板制程中，OLED材料的蒸镀一般采用物理气相沉积法，即将有机材料放置在真空腔体内的坩埚中加热，使有机材料升华或者气化，在衬底上成膜；一些金属材料需要加热到比较高的温度(500℃甚至1000℃以上)才能液化或者气化，蒸镀金属材料需要用到耐高温的坩埚。
一般的高温金属坩埚都是筒状，金属材料加热之后液化然后气化，气化的金属原子从坩埚口喷出，在停止加热之后，金属坩埚内的金属材料会收缩，对坩埚侧壁造成一定的拉力，导致坩埚出现变形甚至破损。
发明内容
本申请的目的是提供一种坩埚，以解决现有技术所存在的坩埚变形破损的问题。
为实现本申请的目的，本申请提供了如下的技术方案：
第一方面，一种坩埚，包括第一埚体和设于相对所述第一埚体内的第二埚体，所述第一埚体和所述第二埚体之间围合形成腔体结构，以使所述腔体横截面形成环形形状，所述腔体用于容纳蒸镀材料，所述第一埚体背对所述第二埚体的外壁面围设有第一加热部件，所述第二埚体背对所述第一埚体的内壁面围 设有第二加热部件，所述坩埚还包括加热控制系统，所述加热控制系统控制所述第一加热部件和所述第二加热部件的加热时长不同。
在第一方面的第一种可能的实现方式中，所述第一加热部件紧贴所述第一埚体外壁面设置，所述第二加热部件紧贴所述第二埚体内壁面设置。
结合第一方面及第一方面的第一种可能的实现方式，在第一方面的第二种可能的实现方式中，所述第一加热部件和所述第二加热部件提供的加热温度范围为400℃～1500℃。
在第一方面的第三种可能的实现方式中，所述坩埚还包括盖体，所述盖体盖设于所述腔体顶端的端部，所述盖体具有开口。
结合第一方面及第一方面的第三种可能的实现方式，在第一方面的第四种可能的实现方式中，所述盖体的开口为多个且绕所述第一埚体圆心环形阵列排布。
在第一方面的第五种可能的实现方式中，所述第一埚体和所述第二埚体为圆形，所述第二埚体的直径是所述第一埚体直径的30％～60％。
在第一方面的第六种可能的实现方式中，所述腔体内设有温度传感器。
本申请还提供了一种蒸镀方法，采用如下技术方案：
第二方面，一种坩埚蒸镀方法，包括以下步骤：
提供一坩埚，所述坩埚包括第一埚体和设于相对所述第一埚体内的第二埚体，所述第一埚体和所述第二埚体之间围合形成腔体结构，所述腔体内装有蒸镀材料；
在所述第一埚体背对所述第二埚体的外壁面围设第一加热部件，在所述第二埚体背对所述第一埚体的内壁面围设第二加热部件；
加热控制系统同时开启所述第一加热部件和所述第二加热部件，温度升高，以使所述蒸镀材料升华或熔融蒸发；
蒸镀结束，先关闭所述第二加热部件，保持所述第一加热部件维持加热状态，待所述蒸镀材料与所述第一埚体分离再关闭。
在第二方面的第一种可能的实现方式中，控制所述第一加热部件和所述第二加热部件加热温度范围为400℃～1500℃。
在第二方面的第二种可能的实现方式中，控制所述第一加热部件和所述第 二加热部件加热温度范围为500℃～1200℃。
本申请的有益效果：
本申请提供的一种坩埚，通过设置环形的腔体，并在坩埚外壁围设第一加热部件、在坩埚内壁围设第二加热部件，通过加热控制系统控制第一加热部件和第二加热部件的加热时长不同，使得本申请的坩埚不会发生变形或者破裂的问题。
附图说明
为了更清楚地说明本申请实施方式或现有技术中的技术方案，下面将对实施方式或现有技术描述中所需要使用的附图作简单地介绍，显而易见地，下面描述中的附图仅仅是本申请的一些实施方式，对于本领域普通技术人员来讲，在不付出创造性劳动的前提下，还可以根据这些附图获得其他的附图。
图1是现有技术中的坩埚的结构示意图；
图2是图1中的坩埚使用状态结构示意图；
图3是本申请一种实施方式的坩埚立体结构示意图；
图4是图3的坩埚的沿直径方向剖面结构示意图；
图5是图4中的坩埚使用状态结构示意图。
具体实施方式
下面将结合本申请实施例中的附图，对本申请实施例中的技术方案进行清楚、完整地描述，显然，所描述的实施例仅仅是本申请一部分实施例，而不是全部的实施例。基于本申请中的实施例，本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施例，都属于本申请保护的范围。
请参阅图1，是现有坩埚结构示意图，其中，包括埚体01和加热部03，埚体顶部的坩埚具有开口02、埚体01为桶型结构，包括有内部空腔，并盛放有金属蒸镀材料04，加热部03围设于埚体01的外壁面上。
请参阅图2，是现有坩埚的使用状态结构示意图，当坩埚使用完毕，关闭加热部03之后，坩埚内的金属蒸镀材料04逐渐冷却收缩，由于热胀冷缩，金属蒸镀材料04会对埚体01的侧壁产生拉力，可能会造成埚体01变形甚至破 裂，严重影响坩埚蒸镀制程。
请参阅图3至图5，本申请一种实施方式提供一种坩埚，包括第一埚体101和设于相对所述第一埚体101内的第二埚体102，所述第一埚体101和所述第二埚体102之间围合形成腔体结构，以使所述腔体横截面形成环形形状，所述腔体用于容纳蒸镀材料300，所述第一埚体101背对所述第二埚体102的外壁面围设有第一加热部件201，所述第二埚体102背对所述第一埚体101的内壁面围设有第二加热部件202，所述坩埚还包括加热控制系统(未图示)，所述加热控制系统控制所述第一加热部件201和所述第二加热部件202的加热时长不同。
本实施方式中，通过设置环形的腔体，并在坩埚外壁围设第一加热部件201、在坩埚内壁围设第二加热部件202，通过加热控制系统控制第一加热部件201和第二加热部件202的不同加热时长，使得本申请的坩埚不会发生变形或者破裂的问题。
本实施方式中，加热控制系统的工作流程为：蒸镀开始，同时启动第一加热部件201和第二加热部件202；维持加热状态；蒸镀结束，先关闭第二加热部件202，保持第一加热部件201维持加热状态，待蒸镀材料300与第一埚体101分离再关闭，使得第一加热部件201和第二加热部件202的加热时长不同。在其他实施方式中，与本实施方式基本相同，区别在于先关闭第一加热部件201，再关闭第二加热部件202。
请参阅图5，经过上述加热流程，由于持续加热的第一加热部件201一侧温度高，已关闭的第二加热部件202一侧温度低，蒸镀材料300在靠近第一加热部件201一侧还处于高温熔融状态，具有较好的流动性，蒸镀材料300会向温度低的靠近第二加热部件202一侧流动，最终所有的蒸镀材料300收缩在第二埚体102一侧，而在第一埚体101一侧的侧壁上已经没有蒸镀材料300，使蒸镀材料300与第一埚体101完全分离并形成了间隙105。此时，关闭第一加热部件101，由于蒸镀材料300不再连接在第一埚体101和第二埚体102之间，不会对第一埚体101产生拉力，从而解决了坩埚变形或者破损的问题。
本实施方式中，第一加热部件201与所述第一埚体101的外壁面的距离范围为1～100mm，第二加热部件202与所述第二埚体102的内壁面的距离范围 为1～100mm；优选的，第一加热部件201与所述第一埚体101的外壁面的距离范围为5～50mm，第二加热部件202与所述第二埚体102的内壁面的距离范围为5～50mm。
本实施方式中，第一埚体101和第二埚体102的材质可以是耐高温的金属材料，例如钢，也可以是耐高温的无机材料，例如陶瓷。可以理解的，第一埚体101和第二埚体102的底部端面连接有底板(未标号)，该底板设于腔体的端部，腔体由第一埚体101、第二腔体102和底板围合而成。所述坩埚还包括盖体103，所述盖体103盖设于所述腔体顶端的端部，所述盖体103具有开口104，进一步的，所述盖体103的开口104为多个且绕所述第一埚体101圆心环形阵列排布，开口104的形状可以为圆形，也可以为其他形状。所述第一埚体101和所述第二埚体102为圆形，所述第二埚体102的直径是所述第一埚体101直径的30％～60％，优选的，所述第二埚体102的直径是所述第一埚体101直径的40％～50％，优选的，所述第二埚体102的直径是所述第一埚体101直径的40％或50％。
该蒸镀材料300为金属材料，通过本申请的坩埚加热后形成蒸汽，用于向基板上蒸镀以形成OLED层。
一种实施方式中，所述第一加热部件201紧贴所述第一埚体101外壁面设置，所述第二加热部件202紧贴所述第二埚体102内壁面设置。通过紧贴设置第一加热部件201和第二加热部件202，使加热效率更高，热损失更少，有利于提高坩埚的热效率，降低能耗。
一种实施方式中，所述第一加热部件201和所述第二加热部件202提供的加热温度范围为400℃～1500℃，优选的，所述第一加热部件201和所述第二加热部件202提供的加热温度范围为500℃～1200℃，进一步优选的，所述第一加热部件201和所述第二加热部件202提供的加热温度范围为800℃～1000℃，并且，本实施方式中，提供实施例如所述第一加热部件201和所述第二加热部件202提供的加热温度为400℃、500℃、600℃、700℃、800℃、900℃、1000℃、1100℃、1200℃、1300℃、1400℃、1500℃中任一温度值。进一步的，所述腔体内设有温度传感器(未图示)。通过本实施方式的温度控制，使坩埚具有良好的温度适用范围，并且，通过设置温度传感器，可以实时 监测坩埚内的温度值，便于工作人员根据更好的操作蒸镀制程。
请参阅图3至图5，本申请的一种实施方式提供了一种坩埚蒸镀方法，包括以下步骤：
提供一坩埚，所述坩埚包括第一埚体101和设于相对所述第一埚体101内的第二埚体102，所述第一埚体101和所述第二埚体102之间围合形成腔体结构，所述腔体内装有蒸镀材料300；
在所述第一埚体101背对所述第二埚体102的外壁面围设第一加热部件201，在所述第二埚体102背对所述第一埚体101的内壁面围设第二加热部件202；
加热控制系统同时开启所述第一加热部件201和所述第二加热部件202，温度升高，以使所述蒸镀材料300升华或熔融蒸发；
蒸镀结束，先关闭所述第二加热部件202，保持所述第一加热部件201维持加热状态，待所述蒸镀材料300与所述第一埚体101分离再关闭。
通过本实施方式的蒸镀方法，使得坩埚在蒸镀过程中，第一埚体101和第二埚体102不会发生变形或者破裂，保证了蒸镀制程的进行。
本实施方式中，控制所述第一加热部件201和所述第二加热部件202加热温度范围为400℃～1500℃。进一步的，控制所述第一加热部件和所述第二加热部件加热温度范围为500℃～1200℃。进一步优选的，所述第一加热部件201和所述第二加热部件202提供的加热温度范围为800℃～1000℃，并且，本实施方式中，提供实施例如所述第一加热部件201和所述第二加热部件202提供的加热温度为400℃、500℃、600℃、700℃、800℃、900℃、1000℃、1100℃、1200℃、1300℃、1400℃、1500℃中任一温度值。
以上所揭露的仅为本申请一种较佳实施方式而已，当然不能以此来限定本申请之权利范围，本领域普通技术人员可以理解实现上述实施方式的全部或部分流程，并依本申请权利要求所作的等同变化，仍属于申请所涵盖的范围。

Claims (11)

  1. 一种坩埚，其中，包括第一埚体和设于相对所述第一埚体内的第二埚体，所述第一埚体和所述第二埚体之间围合形成腔体结构，以使所述腔体横截面形成环形形状，所述腔体用于容纳蒸镀材料，所述第一埚体背对所述第二埚体的外壁面围设有第一加热部件，所述第二埚体背对所述第一埚体的内壁面围设有第二加热部件，所述坩埚还包括加热控制系统，所述加热控制系统控制所述第一加热部件和所述第二加热部件的加热时长不同。
  2. 如权利要求1所述的坩埚，其中，所述第一加热部件紧贴所述第一埚体外壁面设置，所述第二加热部件紧贴所述第二埚体内壁面设置。
  3. 如权利要求1所述的坩埚，其中，所述第一加热部件和所述第二加热部件提供的加热温度范围为400℃～1500℃。
  4. 如权利要求2所述的坩埚，其中，所述第一加热部件和所述第二加热部件提供的加热温度范围为400℃～1500℃。
  5. 如权利要求1所述的坩埚，其中，所述坩埚还包括盖体，所述盖体盖设于所述腔体顶端的端部，所述盖体具有开口。
  6. 如权利要求5所述的坩埚，其中，所述盖体的开口为多个且绕所述第一埚体圆心环形阵列排布。
  7. 如权利要求1所述的坩埚，其中，所述第一埚体和所述第二埚体为圆形，所述第二埚体的直径是所述第一埚体直径的30％～60％。
  8. 如权利要求1所述的坩埚，其中，所述腔体内设有温度传感器。
  9. 一种坩埚蒸镀方法，其中，包括以下步骤：
    提供一坩埚，所述坩埚包括第一埚体和设于相对所述第一埚体内的第二埚体，所述第一埚体和所述第二埚体之间围合形成腔体结构，所述腔体内装有蒸镀材料；
    在所述第一埚体背对所述第二埚体的外壁面围设第一加热部件，在所述第二埚体背对所述第一埚体的内壁面围设第二加热部件；
    加热控制系统同时开启所述第一加热部件和所述第二加热部件，温度升高，以使所述蒸镀材料升华或熔融蒸发；
    蒸镀结束，先关闭所述第二加热部件，保持所述第一加热部件维持加热状态，待所述蒸镀材料与所述第一埚体分离再关闭。
  10. 如权利要求9所述的坩埚蒸镀方法，其中，控制所述第一加热部件和所述第二加热部件加热温度范围为400℃～1500℃。
  11. 如权利要求10所述的坩埚蒸镀方法，其中，控制所述第一加热部件和所述第二加热部件加热温度范围为500℃～1200℃。
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