WO2019074040A1 - Cleaning apparatus - Google Patents

Cleaning apparatus Download PDF

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Publication number
WO2019074040A1
WO2019074040A1 PCT/JP2018/037866 JP2018037866W WO2019074040A1 WO 2019074040 A1 WO2019074040 A1 WO 2019074040A1 JP 2018037866 W JP2018037866 W JP 2018037866W WO 2019074040 A1 WO2019074040 A1 WO 2019074040A1
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WO
WIPO (PCT)
Prior art keywords
cleaning
pipes
cleaning device
pipe
axis direction
Prior art date
Application number
PCT/JP2018/037866
Other languages
French (fr)
Japanese (ja)
Inventor
昌明 上田
隆雄 牛本
恒男 牧
孝義 池田
Original Assignee
日立造船株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日立造船株式会社 filed Critical 日立造船株式会社
Priority to EP18866343.9A priority Critical patent/EP3690380A4/en
Priority to CN201880066110.4A priority patent/CN111201417B/en
Publication of WO2019074040A1 publication Critical patent/WO2019074040A1/en

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Classifications

    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F28HEAT EXCHANGE IN GENERAL
    • F28GCLEANING OF INTERNAL OR EXTERNAL SURFACES OF HEAT-EXCHANGE OR HEAT-TRANSFER CONDUITS, e.g. WATER TUBES OR BOILERS
    • F28G1/00Non-rotary, e.g. reciprocated, appliances
    • F28G1/16Non-rotary, e.g. reciprocated, appliances using jets of fluid for removing debris
    • F28G1/166Non-rotary, e.g. reciprocated, appliances using jets of fluid for removing debris from external surfaces of heat exchange conduits
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B9/00Cleaning hollow articles by methods or apparatus specially adapted thereto 
    • B08B9/02Cleaning pipes or tubes or systems of pipes or tubes
    • B08B9/023Cleaning the external surface
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F22STEAM GENERATION
    • F22BMETHODS OF STEAM GENERATION; STEAM BOILERS
    • F22B37/00Component parts or details of steam boilers
    • F22B37/02Component parts or details of steam boilers applicable to more than one kind or type of steam boiler
    • F22B37/48Devices for removing water, salt, or sludge from boilers; Arrangements of cleaning apparatus in boilers; Combinations thereof with boilers
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F28HEAT EXCHANGE IN GENERAL
    • F28GCLEANING OF INTERNAL OR EXTERNAL SURFACES OF HEAT-EXCHANGE OR HEAT-TRANSFER CONDUITS, e.g. WATER TUBES OR BOILERS
    • F28G1/00Non-rotary, e.g. reciprocated, appliances
    • F28G1/16Non-rotary, e.g. reciprocated, appliances using jets of fluid for removing debris
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F28HEAT EXCHANGE IN GENERAL
    • F28GCLEANING OF INTERNAL OR EXTERNAL SURFACES OF HEAT-EXCHANGE OR HEAT-TRANSFER CONDUITS, e.g. WATER TUBES OR BOILERS
    • F28G15/00Details
    • F28G15/04Feeding and driving arrangements, e.g. power operation
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F28HEAT EXCHANGE IN GENERAL
    • F28GCLEANING OF INTERNAL OR EXTERNAL SURFACES OF HEAT-EXCHANGE OR HEAT-TRANSFER CONDUITS, e.g. WATER TUBES OR BOILERS
    • F28G3/00Rotary appliances
    • F28G3/10Rotary appliances having scrapers, hammers, or cutters, e.g. rigidly mounted
    • F28G3/14Rotary appliances having scrapers, hammers, or cutters, e.g. rigidly mounted thrown into working position by centrifugal force

Definitions

  • the technology disclosed herein relates to a cleaning device.
  • the cleaning apparatus which removes the deposit
  • the cleaning device disclosed in Patent Document 1 cleans a pipe while traveling on the pipe.
  • the traveling mechanism of the cleaning device slips on the pipe and slips over. If the running mechanism slips, the running mechanism can not advance properly. In particular, when the traveling mechanism turns on the pipe, if the traveling mechanism slips, the traveling mechanism moves in an unexpected direction.
  • the cleaning device disclosed herein includes an apparatus main body, a traveling mechanism provided on the apparatus main body, and traveling on at least two pipes included in a pipe group, and moving up and down from the apparatus main body. And a cleaning mechanism for cleaning deposits on the surface of the lower tube than the lower one, and the traveling mechanism comprises the at least two tubes in a state where the cleaning mechanism enters between the at least two tubes. It shall turn up.
  • the swing of the traveling mechanism can be appropriately performed.
  • FIG. 1 is a side view of the cleaning device according to the first embodiment.
  • FIG. 2 is a front view of the cleaning device.
  • FIG. 3 is a view of the cleaning mechanism in the Y-axis direction.
  • FIG. 4 is a cross-sectional view of the cleaning unit taken along the line SS in FIG. 3 with the scraper housed.
  • FIG. 5 is a cross-sectional view of the cleaning unit taken along line SS in FIG. 3 with the scraper expanded.
  • FIG. 6 is a view of the cleaning mechanism in a state in which the guide is contracted as viewed in the X-axis direction.
  • FIG. 7 is a view of the cleaning mechanism in a state in which the guide is expanded in the X-axis direction.
  • FIG. 1 is a side view of the cleaning device according to the first embodiment.
  • FIG. 2 is a front view of the cleaning device.
  • FIG. 3 is a view of the cleaning mechanism in the Y-axis direction.
  • FIG. 4 is a cross
  • FIG. 8 is a cross-sectional view of the first blade taken along a line TT in FIG.
  • FIG. 9 is a view of the cleaning mechanism cleaning the pipe as viewed in the X-axis direction.
  • FIG. 10 is a view of the cleaning device moving in parallel to the pipe as viewed in the X-axis direction.
  • FIG. 11 is a view of the cleaning device moving in parallel to the pipe as viewed in the Z-axis direction.
  • FIG. 12 is a view of the cleaning device pivoting on the pipe as viewed in the X-axis direction.
  • FIG. 13 is a view of the cleaning device pivoting on the pipe as viewed in the Z-axis direction.
  • FIG. 14 is a side view of the cleaning device according to the second embodiment.
  • FIG. 15 is a view of the cleaning mechanism cleaning the pipe as viewed in the Y-axis direction.
  • FIG. 16 is a view of the cleaning device in the X-axis direction when moving in parallel with the pipe and when pivoting on
  • Embodiment 1 The cleaning device 100 according to the first embodiment cleans the deposit attached to the surface of the tube included in the tube group.
  • FIG. 1 is a side view of the cleaning device 100.
  • FIG. 2 is a front view of the cleaning device 100, partially in cross section.
  • a tube group Q (see FIG. 2) formed by a plurality of tubes P is provided inside the pipe P. Inside the pipe P, a fluid such as water flows.
  • the pipe P is a heat transfer pipe, and exchanges heat with the heat generated in the combustion chamber of the boiler.
  • the plurality of tubes P extend in the horizontal direction, and are arranged in the horizontal direction and the vertical direction. That is, in the tube group Q, the plurality of tubes P are arranged in parallel with each other in the horizontal direction, and the plurality of tubes P are arranged in parallel with each other in the vertical direction.
  • One end of the pipe P and the other end of the pipe P may be connected to form one pipe. That is, in the tube group Q, one tube extends in the horizontal direction and then folded back and extends again in the horizontal direction, or one tube extends horizontally and then folded back and extends in the horizontal direction again. And may extend to meander as a whole.
  • each of the horizontally extending portions is regarded as one pipe P. Therefore, even if it is actually one continuous pipe, if there are a plurality of portions extending in the horizontal direction, they are treated as a plurality of pipes P.
  • the ash produced by the combustion may adhere to the pipe P. Some of the ash melts and becomes clinker. Thus, on the surface of the pipe P, deposits such as ash and clinker are attached.
  • the deposits are not limited to those in direct contact with the surface of the pipe P, but include those further stacked on those in direct contact with the surface of the pipe P. For example, not only the ash directly in contact with the surface of the pipe P, but also the ash further deposited thereon is included in the deposit.
  • the cleaning device 100 is placed on at least two pipes P aligned in the horizontal direction.
  • the cleaning device 100 is provided in the device main body 1 and the device main body 1 and moves up and down from the device main body 1 and travels above at least two pipes P, and is positioned lower than the travel mechanism 2 And a cleaning mechanism 3 for cleaning deposits on the surface of the pipe P.
  • the cleaning device 100 may include an elevation mechanism 7 that raises and lowers the cleaning mechanism 3 from the traveling mechanism 2.
  • the cleaning device 100 may include a main body controller 8 that controls the cleaning device 100.
  • the cleaning device 100 may include an external controller 9 that is operated when the operator inputs a command.
  • the cleaning device 100 lowers and raises the cleaning mechanism 3 by the lifting mechanism 7 between the two pipes P on which the traveling mechanism 1 is mounted, and adheres to the two pipes P and the pipes P arranged below them. Clean the kimono.
  • the lifting mechanism 7, the main body controller 8 and the external controller 9 are omitted.
  • the X axis is set in the traveling direction of the cleaning device 100 (that is, the traveling direction of the traveling mechanism 2), and the Z axis is set in the vertical direction of the cleaning device 100 (that is, the elevation direction of the elevating mechanism 7).
  • the Y axis is set in the width direction (ie, the direction orthogonal to both the traveling direction and the vertical direction).
  • U axis, V axis and W axis orthogonal to each other are defined with reference to the pipe group Q.
  • a U axis is set in a direction in which the pipe P extends
  • a V axis is set in a direction perpendicular to the U axis and in a horizontal direction
  • a W axis is set in a direction perpendicular to the U axis and in a vertical direction.
  • the apparatus body 1 has a flat plate-like base 11 extending on the XY plane, and a case 12 provided on the base 11 and accommodating the cleaning mechanism 3. At substantially the center of the base 11, an opening 11a (see FIG. 2) penetrating the base 11 is formed.
  • the case 12 is formed in a rectangular tube shape having a substantially rectangular cross section whose longitudinal direction is the X-axis direction. The case 12 penetrates the opening 11 a of the base 11. Further, the apparatus body 1 is provided with a plurality of sensors (not shown) for detecting the pipe P.
  • the traveling mechanism 2 has two crawlers 21 attached to the lower surface of the base 11.
  • the crawler 21 is configured to advance in the X-axis direction. That is, the rotation axis of the drive wheel of the crawler 21 extends in the Y-axis direction.
  • the two crawlers 21 are arranged in the Y-axis direction across the opening 11 a of the base 11.
  • the cleaning mechanism 3 will be described in detail later, when the frame 31 (see FIG. 1), the three cleaning units 4 (see FIG. 2) supported by the frame 31 and the cleaning mechanism 3 advance in the pipe group Q. And a guide 5 for guiding the cleaning mechanism 3 in the advancing direction.
  • the cleaning mechanism 3 is accommodated in the case 12 when cleaning is not performed. When cleaning is performed, the cleaning mechanism 3 descends from the case 12 and cleans the surface of the pipe P included in the pipe group Q while advancing in the pipe group Q.
  • the lifting mechanism 7 has two winches 71 and wires 72 wound up on each winch 71.
  • the winch 71 is installed on the upper surface of the base 11.
  • the two winches 71 are arranged to sandwich the case 12 in the X-axis direction.
  • the wire 72 is wound around a reel of the winch 71.
  • One end of the wire 72 is attached to the cleaning mechanism 3. That is, the cleaning mechanism 3 is suspended by the two wires 72 and is moved up and down in the Z-axis direction by the elevation mechanism 7.
  • the case 12 is formed with a notch (not shown) for avoiding interference with the reel of the winch 71 and the wire 72.
  • the main body controller 8 is mounted on the apparatus main body 1.
  • the main body controller 8 is formed of a processor.
  • the main body controller 8 controls each part of the cleaning device 100 in response to an instruction from the external controller 9.
  • the main body controller 8 determines the positional relationship between the apparatus main body 1 and the pipe P based on the output of the sensor that detects the pipe P described above.
  • the main body controller 8 moves the cleaning device 100 to the position according to the command from the external controller 9 while referring to the output of the sensor. Further, the main body controller 8 operates the cleaning mechanism 3 and the elevating mechanism 7.
  • the external controller 9 is connected to the main body controller 8 via a cable 91.
  • the operator operates the external controller 9 to input a command to the main body controller 8.
  • the external controller 9 can input an operation command to the cleaning device 100 as a command.
  • the external controller 9 may be able to input the movement distance associated with the operation.
  • FIG. 3 is a view of the cleaning mechanism 3 in the Y-axis direction.
  • FIG. 4 is a cross-sectional view of the cleaning unit 4 taken along line SS in FIG. 3 with the scraper 34 housed.
  • FIG. 5 is a cross-sectional view of the cleaning unit 4 taken along line SS in FIG. 3 with the scraper 34 spread out.
  • FIG. 6 is a view of the cleaning mechanism 3 in a state in which the guide 5 is contracted as viewed in the X-axis direction.
  • FIG. 7 is a view of the cleaning mechanism 3 in a state in which the guide 5 is expanded in the X-axis direction.
  • FIG. 8 is a cross-sectional view of the first blade 51A taken along line TT in FIG.
  • the frame 31 is formed in a substantially rectangular frame shape as shown in FIG.
  • the cover 31a is attached to the frame 31, and thereby, the frame 31 is formed in a box shape as a whole.
  • Locking portions 31 c to which the wires 72 of the elevating mechanism 7 are attached are provided on each of the pair of vertical frames 31 b provided at both ends in the X-axis direction of the frame 31 and extending in the Z-axis direction.
  • the shape of the frame 31 when viewed in the Z-axis direction is the distance G V in the V-axis direction of the two pipes P on which the cleaning device 100 is mounted (see FIG. 2) Extends beyond a circle with a diameter of.
  • the dimension in the Y-axis direction of the frame 31 is set smaller than the distance G V between the two pipes P.
  • the dimension in the X-axis direction of the frame 31 is set to be larger than the gap G V of the two pipes P. That is, when the X-axis direction of the cleaning device 100 and the U-axis direction of the pipe group Q coincide with each other, the frame 31 can enter between the two pipes P.
  • the frame 31 is an example of a support.
  • the three cleaning units 4 are supported by the frame 31.
  • the three cleaning units 4 project downward from the lower part of the frame 31.
  • the three cleaning units 4 are arranged in the X-axis direction.
  • the positions of the three cleaning units 4 in the Z-axis direction (that is, the lifting and lowering direction of the cleaning device 3) are different.
  • the cleaning unit 4 in the middle protrudes downward relative to the cleaning units 4 on both sides.
  • first cleaning unit 4A “second cleaning unit 4B”, and “third cleaning unit 4C” in the order of alignment in the X-axis direction.
  • the cleaning unit 4 is configured to be in contact with the pipe P and remove deposits on the surface of the pipe P while rotating around a rotation axis A parallel to the Z axis (that is, parallel to the elevation direction of the cleaning mechanism 3). ing. Specifically, as shown in FIG. 3, the cleaning unit 4 contacts the surface of the pipe P by contacting the surface of the pipe P with the rotary shaft 32 rotating around the rotation axis A extending parallel to the Z axis. It has a scraper 34 for removing a deposit, a disc 35 provided coaxially with the rotation axis A, and an excavated portion 36 provided on the rotation axis A and at the tip of the cleaning unit 4.
  • the rotating shaft 32 extends along the rotation axis A.
  • the rotating shaft 32 is rotationally driven by a motor (not shown) supported by the frame 31.
  • the cleaning unit 4 is an example of a cleaning unit
  • the scraper 34 is an example of a contact unit.
  • a disc 35, a scraper 34 and an excavating portion 36 are provided at the tip of the rotary shaft 32.
  • Four discs 35 are arranged coaxially with the rotation axis A at equal intervals.
  • the disc 35 is attached to the rotating shaft 32 in a non-rotatable state. That is, the disc 35 rotates integrally with the rotating shaft 32.
  • the diameter of the disc 35 is set smaller than the distance G V between the two pipes P.
  • Three gaps are formed by the four disks 35. As shown in FIGS. 4 and 5, three scrapers 34 are disposed in each gap. Between two adjacent disks 35, three rocking shafts 37 extending along a rocking axis B parallel to the rotation axis A are provided. The three rocking shafts 37 are provided at equal intervals around the rotation axis A at a position eccentric to the rotation axis A. Each scraper 34 is swingably connected to the swing shaft 37. The scraper 34 is formed in a substantially arc shape. The scraper 34 is made of, for example, an aluminum alloy, carbon steel, urethane rubber, or brass.
  • the scraper 34 As shown in FIG. 4, when the tip 34 a of the scraper 34, which is the end far from the swing axis B, is closest to the rotation axis A, the scraper 34 completely fills the gap between the two discs 35. Housed in That is, the scraper 34 is accommodated inside the outer peripheral edge E of the disc 35.
  • the shape of the cleaning unit 4 when viewed in the Z-axis direction (that is, the lifting and lowering direction of the cleaning mechanism 3) has a diameter G V of the two pipes P as a diameter. It is within the circle to be.
  • “to be accommodated inside the outer peripheral edge E” means that the scraper 34 does not protrude from the outer peripheral edge E. That is, the scraper 34 may be flush with the outer peripheral edge E when being accommodated between the disks 35.
  • the scraper 34 swings so that the tip portion 34 a is separated from the rotation axis A by the centrifugal force of the rotating shaft 32 and spreads radially outward about the rotation axis A. At this time, the scraper 34 protrudes outward beyond the outer peripheral edge E of the disc 35 (that is, protrudes outward from the outer peripheral edge E).
  • radial direction means a radial direction around the rotation axis A unless otherwise specified.
  • the direction in which the scraper 34 extends from the swing shaft 37 toward the tip 34a is opposite to the rotation direction of the rotary shaft 32. That is, the scraper 34 is accommodated inside the outer peripheral edge E of the disc 35 in a state where the tip end portion of the scraper 34 is positioned rearward of the swinging shaft 37 in the rotational direction of the rotary shaft 32. Therefore, even if the scraper 34 contacts something while the scraper 34 rotates around the rotation axis A in a spread state, the scraper 34 pivots in the direction to be accommodated in the disc 35, and the rotation is performed. Rotation of the scraper 34 about axis A is maintained.
  • the excavating portion 36 is disposed on the most distal side of the rotary shaft 32, as shown in FIG.
  • the drilling portion 36 is attached to the rotating shaft 32 in a non-rotatable state. That is, the drilling unit 36 rotates integrally with the rotating shaft 32.
  • the excavating portion 36 is formed in a substantially conical shape, that is, in a sharp shape.
  • the digging portion 36 is formed with a groove for releasing chips scraped by the digging portion 36.
  • guides 5 are provided on each of the pair of vertical frames 31 b of the frame 31.
  • the guide 5 has a pair of first blades 51A and a second blade 51B.
  • the guide 5 may further include four first to fourth links 61 to 64 that connect the first blade 51A and the second blade 51B to the vertical frame 31b.
  • the first blade 51A and the second blade 51B have symmetrical shapes in the left-right direction.
  • the first blade 51A and the second blade 51B guide the cleaning mechanism 3 by coming into contact with the pipe P outside the guide 5 in the Y-axis direction.
  • the first to fourth links 61 to 64 all have the same shape.
  • link 6 When the first link 61, the second link 62, the third link 63, and the fourth link 64 are not distinguished from one another, they are simply referred to as "link 6".
  • Each blade 51 has a shape extending in the Z-axis direction.
  • Each blade 51 has an edge 53 extending generally in the Z-axis direction on the outer side in the Y-axis direction (that is, the side far from the center of the frame 31 in the Y-axis direction).
  • An edge 53 contacts the pipe P.
  • both ends of the edge 53 in the Z-axis direction are inclined with respect to the Z-axis so as to be positioned inside in the Y-axis direction toward the tip end side.
  • the cross-sectional shape of the edge 53 according to the XY plane (that is, a plane orthogonal to the traveling direction of the cleaning mechanism 3) becomes thinner toward the Y axis direction outer side (that is, located outside the Y axis direction) as shown in FIG. The closer to the pipe P, the thinner the tip).
  • First to fourth links 61 to 64 are connected to each blade 51.
  • each link 6 is rotatably attached to the vertical frame 31 b.
  • the first link 61 and the second link 62 are attached to the same rotation axis C.
  • the third link 63 and the fourth link 64 are attached to the same rotation axis D.
  • One longitudinal end (hereinafter referred to as "first end") of each link 6 is connected to the first blade 51A, and the other longitudinal end (hereinafter referred to as "second end") of each link 6 Is connected to the second blade 51B.
  • the first end 61a of the first link 61 is rotatably and slidably mounted in the elongated hole 54 in the elongated hole 54 formed in the first blade 51A and extending in the Z-axis direction.
  • the second end 61b of the first link 61 is rotatably attached to the second blade 51B.
  • the first end 62a of the second link 62 is rotatably attached to the first blade 51A.
  • the second end 62 b of the second link 62 is rotatably and slidably attached to the inside of the elongated hole 54 in the elongated hole 54 formed in the second blade 51 B and extending in the Z-axis direction.
  • first end 63a of the third link 63 is rotatably and slidably attached to the elongated hole 54 formed in the first blade 51A and extending in the Z-axis direction.
  • the second end 63b of the third link 63 is rotatably attached to the second blade 51B.
  • the first end 64a of the fourth link 64 is rotatably attached to the first blade 51A.
  • the second end 64 b of the fourth link 64 is rotatably attached to an elongated hole 54 formed in the second blade 51 B and extending in the Z-axis direction so as to be slidable in the elongated hole 54.
  • first link 61 and the second link 62 the first end 61a of the first link 61 and the second end 62b of the second link 62 are separated in the Y-axis direction, and the second end of the first link 61
  • a coil spring urges the first end 62 a of the second link 62 and the first end 62 a of the second link 62 around the rotation axis C by a coil spring (not shown).
  • the first end 63 a of the third link 63 and the second end 64 b of the fourth link 64 are separated in the Y-axis direction.
  • a coil spring urges the two end 63 b and the first end 64 a of the fourth link 64 around the rotation axis D so as to be separated in the Y-axis direction.
  • the first blade 51A and the second blade 51B are urged away from each other in the Y-axis direction while maintaining the posture extending in the Z-axis direction. That is, the first blade 51A and the second blade 51B are biased so as to press the edge 53 against the pipe P located outside the guide 5 in the Y-axis direction.
  • the first blade 51A and the second blade 51B also move in the Z-axis direction when moving in the Y-axis direction.
  • the first blade 51 ⁇ / b> A and the second blade 51 ⁇ / b> B extend in the Y axis direction more than the frame 31 in the most expanded state.
  • the locking portion 31c is disposed at a position not to interfere with the first blade 51A and the second blade 51B, which move as described above, and the first to fourth links 61 to 64.
  • the cleaning mechanism 3 configured in this way can be accommodated in the case 12 as shown in FIGS.
  • the distance between the two edges 53 of the pair of blades 51 in the state of being most expanded in the Y-axis direction is larger than the dimension of the case 12 in the Y-axis direction. That is, in the state where the cleaning mechanism 3 is accommodated in the case 12, the pair of blades 51 is contracted inward in the Y-axis direction, and the two edges 53 are in contact with the inner surface of the case 12. As a result, the position of the cleaning mechanism 3 in the Y-axis direction in the case 12 is determined.
  • FIG. 9 is a view of the cleaning mechanism 3 cleaning the pipe P as viewed in the X-axis direction.
  • the cleaning device 100 cleans the two pipes P and the pipes P arranged below the two pipes P in the Z-axis direction by lowering and raising the cleaning mechanism 3 between the two pipes P. Do.
  • the operator places the cleaning device 100 on the pipe P.
  • the operator operates the external controller 9 to move the cleaning device 100 to the cleaning start position.
  • the cleaning start position two crawlers 21 are mounted on two pipes P in parallel with the pipe P, and the cleaning device 100 is located at one end of the two pipes P in the U-axis direction. And, it is a position where the cleaning mechanism 3 is positioned between the two pipes P in the V-axis direction.
  • the movement of the cleaning device 100 to the cleaning start position may be performed visually by the operator, or a sensor of the cleaning device 100 may detect the cleaning start position.
  • the input from the external controller 9 may be an operation command such as forward, backward or turning of the cleaning device 100, or may be a movement distance.
  • the main body controller 8 When the main body controller 8 receives a command to start cleaning, the rotary shaft 32 of the cleaning mechanism 3 is rotationally driven, and the cleaning mechanism 3 is lowered between the two pipes P by the elevation mechanism 7 in this state.
  • the centrifugal force caused by the rotation of the rotary shaft 32 spreads the scraper 34 radially outward around the rotation axis A.
  • the scraper 34 Since the scraper 34 spreads by centrifugal force, if there is not enough space, the scraper 34 will not spread to the maximum and will spread as far as possible. That is, when the radially outer space of the scraper 34 differs depending on the position in the Z-axis direction, the scraper 34 descends while changing the spread according to the radially outer space.
  • the cleaning mechanism 3 descends in the pipe group Q, as shown in FIG. 9, the position where the pipe P does not exist radially outside the scraper 34, or the pipe P exists radially outside the scraper 34, but the scraper In the position where 34 does not reach, the scraper 34 is in the state of being expanded to the maximum (see the scraper 34 of the relatively upper part of the first cleaning unit 4A in FIG. 9).
  • the scraper 34 expands to a state in contact with the pipe P (the relatively lower scraper of the first cleaning unit 4A in FIG. 34 and scraper 34 of second cleaning unit 4B). As a result, the scraper 34 contacts the surface of the pipe P while changing the radial spread according to the surface shape of the pipe P as it passes by the side of the pipe P.
  • the scraper 34 penetrates between the plurality of pipes P arranged along the direction of movement of the cleaning mechanism 3 (that is, arranged in the W-axis direction), and the deposits existing between the plurality of pipes P And contact with the surfaces of the plurality of tubes P to remove deposits on the tubes P.
  • the scraper 34 not only has a portion of the surface of the pipe P facing the space through which the cleaning mechanism 3 passes, but also a direction (for example, the V-axis direction) intersecting the advancing direction of the cleaning mechanism 3 from the space.
  • the deposit adhering to the part (that is, the recessed part) away from is also removed.
  • the diameter of the circumscribed circle F (see FIG. 5) of the scraper 34 in the most expanded state of the scraper 34 is set larger than the distance between the axes of the two tubes P aligned in the V-axis direction.
  • the scraper 34 can remove the deposit
  • the scraper 34 scrapes off deposits attached to the surface of the pipe P.
  • the scraper 34 is disposed between the two discs 35. Therefore, when the cleaning unit 4 rotates or when the scraper 34 contacts with another object such as the pipe P, the shake of the scraper 34 in the Z-axis direction can be reduced by the disc 35.
  • the minimum outer shape of the cleaning unit 4 when viewed in the Z-axis direction is the outer shape of the disc 35.
  • the minimum outer shape of the cleaning unit 4 is formed by the outer edges of the three scrapers 34 whose tip approaches the rotating shaft 32 (in the state where the disc 35 is omitted in FIG. 4).
  • the minimum outer shape of the cleaning unit 4 in this case is not a complete circle, but a recess is formed between two adjacent scrapers 34, and has an overall unevenness.
  • the scraper 34 can remove deposits on the radially outer side from the disc 35 but can not remove deposits on the lower side of the disc 35.
  • a digging portion 36 is provided at the tip of the cleaning unit 4. The digging portion 36 rotates integrally with the rotating shaft 32 when the cleaning mechanism 3 descends. Therefore, when the cleaning mechanism 3 descends, the digging portion 36 excavates the deposit present below the cleaning mechanism 3. Thereby, the cleaning mechanism 3 can be lowered smoothly.
  • the guide 5 guides the cleaning mechanism 3.
  • the first blade 51A and the second blade 51B of the guide 5 are biased in the direction away from each other in the Y-axis direction. Therefore, the first blade 51A contacts the pipe P on one side in the V-axis direction, and the second blade 51B contacts the pipe P on the other side in the V-axis direction.
  • the position of the cleaning mechanism 3 in the V-axis direction is determined with respect to the pipes P located on both sides in the V-axis direction.
  • the cleaning mechanism 3 is positioned at the center in the V axis direction of the tubes P aligned in the V axis direction.
  • the edge 53 of the first blade 51A and the second blade 51B in contact with the pipe P is sharp toward the outside in the Y-axis direction, deposits adhere to the surface of the pipe P Even so, the edge 53 cuts into the deposit and tends to come in contact with the surface of the pipe P. Thereby, the positioning accuracy of the cleaning mechanism 3 is improved.
  • both ends in the Z-axis direction of the edges 53 of the first blade 51A and the second blade 51B are inclined so as to be positioned inside in the Y-axis direction toward the tip end side. That is, in other words, the distance in the Y-axis direction between both edges 53 of the first blade 51A and the second blade 51B is shorter toward the tip end. Therefore, when the first blade 51A and the second blade 51B enter between the two pipes P, the ends in the Z-axis direction of the first blade 51A and the second blade 51B do not get caught in the pipe P, The first blade 51A and the second blade 51B smoothly enter between the two pipes P.
  • the cleaning mechanism 3 is raised by the elevating mechanism 7 when the cleaning unit 4 descends until the cleaning unit 4 passes the lowermost one of the pipes P to be cleaned.
  • the arrival of the cleaning mechanism 3 in the lowermost position may be confirmed visually by the operator, or a sensor may be provided in the cleaning device 3 and detected by the sensor. Alternatively, the operator may input the lowering distance of the cleaning mechanism 3 at the start of cleaning.
  • the cleaning mechanism 3 cleans the surface of the pipe P with the scraper 34 both at the time of descent and at the time of ascent.
  • the cleaning mechanism 3 Since the cleaning mechanism 3 is provided with three cleaning units 4 aligned in the X-axis direction, three lowering of the position in the U-axis direction in the pipe P is cleaned by one lowering and raising of the cleaning mechanism 3. Ru.
  • the cleaning device 100 moves along the two pipes P by a predetermined amount in the U-axis direction. After that, the cleaning mechanism 3 performs the lowering and the raising again. That is, the cleaning mechanism 3 cleans a portion of the pipe P in which the position in the U-axis direction is different from that at which the cleaning mechanism 3 descends and rises earlier.
  • the apparatus body 1 repeatedly moves and stops along at least two pipes P included in the pipe group Q as the traveling mechanism 2 travels, and the cleaning mechanism 3 is at the position where the apparatus body 1 is stopped. Move up and down to clean at least two pipes P.
  • the movement of the cleaning device 100 in the U-axis direction may be performed automatically by the cleaning device 100 when the lifting of the cleaning mechanism 3 is completed, or the operator may input a command via the external controller 9. You may go by.
  • the cleaning device 100 repeats lowering and raising of the cleaning mechanism 3 while changing the position in the U-axis direction.
  • the cleaning device 100 finishes moving the two pipes P on which the cleaning device 100 is mounted from one end to the other end in the U-axis direction, the cleaning device 100 is mounted on the two pipes P on which the cleaning device 100 is mounted. Finish the cleaning in between.
  • the arrival of the cleaning device 100 at the other end in the U-axis direction of the two pipes P may be confirmed visually by the operator or may be detected by a sensor provided in the cleaning device 100. Alternatively, the operator may input the moving distance of the cleaning device 100 in the U-axis direction at the start of cleaning.
  • the cleaning device 100 is moved in the V-axis direction, and the cleaning mechanism 3 is disposed between two different pipes P.
  • the cleaning device 100 turns from the state in which the two crawlers 21 are parallel to the pipe P to the state in which the two crawlers 21 are substantially orthogonal to the pipe P.
  • the cleaning device 100 moves across the pipes P until the cleaning mechanism 3 is positioned between the two adjacent pipes P between the two pipes P whose cleaning has been completed.
  • the cleaning device 100 turns so that the two crawlers 21 are parallel to the pipe P.
  • the cleaning device 100 moves to the end in the U-axis direction of the two pipes P.
  • one of the two new pipes P is one pipe P of the two pipes P whose cleaning has already been completed.
  • the cleaning device 100 cleans the two new pipes P and the lower pipe P in the same manner as described above.
  • the cleaning device 100 cleans the pipes P included in the pipe group Q by repeating the above-described cleaning while changing the two pipes P on which the cleaning device 100 is placed.
  • the movement of the cleaning device 100 to the end may be performed automatically by the cleaning device 100 or may be performed by the operator inputting a command via the external controller 9.
  • all of the turning, crossing, re-turning and moving of the cleaning device 100 may be performed by one command, and the operation of the turning, crossing, re-turning and moving of the cleaning device 100 A command may be input every time.
  • FIG. 10 is a view of the cleaning device 100 moving in parallel with the pipe P as viewed in the X-axis direction.
  • FIG. 11 is a view of the cleaning device 100 moving in parallel with the pipe P as viewed in the Z-axis direction.
  • FIG. 12 is a view of the cleaning device 100 pivoting on the pipe P as viewed in the X-axis direction.
  • FIG. 13 is a view of the cleaning device 100 pivoting on the pipe P as viewed in the Z-axis direction. 11 and 13 schematically show the cleaning device 100.
  • the cleaning device 100 when the cleaning device 100 cleans the pipe P included in the pipe group Q, the cleaning device 100 travels on the pipe P. Since the deposit adheres to the surface of the pipe P, the crawler 21 can slip and slip. Therefore, it may be difficult to drive the cleaning device 100 to a desired position. Therefore, the cleaning device 100 achieves movement to a desired position by using the cleaning unit 4 as a guide during traveling.
  • the cleaning unit 4 when the cleaning device 100 moves on the pipe P, the cleaning unit 4 is pulled up as shown in FIG. 2 so that the cleaning unit 4 does not interfere with the pipe P (the cleaning unit 4 It moves in a state where it does not project downward from the traveling mechanism 2).
  • the cleaning device 100 moves in the U-axis direction along the two pipes P in order to clean the portions in which the pipe P in the U-axis direction is different, the cleaning device 100 as shown in FIG.
  • the cleaning unit 4 is protruded below the traveling mechanism 2 and travels in a state where the cleaning unit 4 is advanced between the two pipes P on which the cleaning device 100 is mounted. Since the cleaning unit 4 enters between the two pipes P, the cleaning device 100 is deviated in the V-axis direction when moving along the two pipes P as shown in FIG. Is regulated. That is, the cleaning unit 4 functions as a guide when the cleaning device 100 moves in parallel with the pipe P.
  • a plurality of cleaning units 4 are in a state of entering between two pipes P.
  • the cleaning mechanism 3 since the first cleaning unit 4A and the third cleaning unit 4C have the same position in the Z-axis direction, the first cleaning unit 4A and the third cleaning unit 4C are made to enter between the two pipes P. Since the cleaning units 4 aligned in the X-axis direction enter between the two pipes P, the cleaning device 100 is restricted from rotating around the Z-axis when moving along the two pipes P. Ru.
  • the cleaning device 100 may move across the pipe P, for example, as in the case of changing the two pipes P that perform cleaning. In such a case, the cleaning device 100 needs to turn and change the crawler 21 from the parallel state to the pipe P.
  • the cleaning device 100 drives the two crawlers 21 in opposite directions when turning. That is, one crawler 21 is driven to move to one side in the X-axis direction, and the other crawler 21 is driven to move to the other side in the X-axis direction.
  • the cleaning device 100 pivots about an axis parallel to the Z axis.
  • a deposit for example, ashes
  • the crawler 21 may idle and the cleaning device 100 may not turn well. For example, when only one crawler 21 slips, the cleaning device 100 moves in the direction in which the other crawler 21 travels.
  • the cleaning device 100 turns in a state where only one cleaning unit 4 is inserted between two pipes P.
  • the cleaning mechanism 3 since the second cleaning unit 4B protrudes downward relative to the first cleaning unit 4A and the third cleaning unit 4C, the second cleaning unit 4B has two pipes P as shown in FIG. It is made to enter in the meantime.
  • the scraper 34 can be accommodated in the disc 35, and the outer diameter of the disc 35 is smaller than the distance between the two pipes P. That is, the outer shape of the second cleaning unit 4B when viewed in the Z-axis direction is within a circle whose diameter is the distance between the two pipes P. Therefore, even in a state where the second cleaning unit 4B enters between the two pipes P, the cleaning device 100 can pivot.
  • the transverse direction dimension of the frame 31 is smaller than the distance between the two pipes P, but the longitudinal dimension of the frame 31 is larger than the distance between the two pipes P . Therefore, the frame 31 does not enter between the two pipes P.
  • the cleaning device 100 can not move freely even if the driving force of one of the crawlers 21 is superior.
  • the cleaning device 100 continues to travel with the second cleaning unit 4B engaged with the two pipes P and the driving forces of the two crawlers 21 being unbalanced, the crawler 21 which has been idled is also brought into contact with the pipe P soon. Frictional force acts between them, and the cleaning device 100 pivots. As a result, as shown in FIG. 13, even if the cleaning device 100 can not pivot on the spot, it eventually pivots while slightly moving along the two pipes P.
  • the cleaning device 100 is configured such that the cleaning unit 4 that has entered between the two pipes P is pulled out from between the two pipes P.
  • the cleaning mechanism 4 is raised by the lifting mechanism 7.
  • the cleaning device 100 moves across the pipe P.
  • the cleaning device 100 moves until the second cleaning unit 4B is positioned between the two pipes P to be cleaned next in the V-axis direction.
  • the cleaning device 100 lowers the cleaning mechanism 4 so that only the second cleaning unit 4B enters between the two pipes P.
  • the cleaning device 100 turns as described above.
  • the cleaning device 100 pivots until the two crawlers 21 become parallel to the two pipes P.
  • the cleaning device 100 When the two crawlers 21 are parallel to the two pipes P, the cleaning device 100 is configured such that the plurality of cleaning units 4 (specifically, the first cleaning unit 4A and the third cleaning unit 4C) have two pipes P.
  • the cleaning mechanism 4 is lowered to enter during the period.
  • the cleaning device 100 moves along the two pipes P to a position where the cleaning is resumed, with the cleaning units 4 entering between the two pipes P as described above.
  • the cleaning device 100 turns when the cleaning unit 4 is advanced between the pipes P and in a state where the cleaning unit 4 is advanced between the pipes P.
  • the rotary shaft 32 is rotationally driven.
  • the rotating shaft 32 is rotating, when the scraper 34 contacts something, a component acts on the scraper 34 in the direction to accommodate the scraper 34 in the disc 35. Therefore, even if the scraper 34 contacts something, the scraper 34 is swung in the direction of being accommodated in the disc 35, and the rotation of the scraper 34 is maintained. That is, the movement of the cleaning device 100 is substantially restricted by the contact of the disc 35 with the pipe P.
  • the rotational speed of the rotary shaft 32 when the cleaning unit 4 functions as a guide is set to a lower speed than the rotational speed of the rotary shaft 32 when the cleaning unit 4 cleans the pipe P.
  • the cleaning device 100 is moved up and down from the device body 1 and the traveling mechanism 2 provided on the device body 1 and traveling on at least two pipes P included in the tube group Q.
  • the cleaning mechanism 3 for cleaning deposits on the surface of the pipe P located below the traveling mechanism 2, and the traveling mechanism 2 is in a state where the cleaning mechanism 3 enters between at least two pipes P. It pivots on at least two pipes P.
  • the cleaning mechanism 3 includes a cleaning unit 4 (cleaning unit) for removing deposits on the surface of the pipe P, and a frame 31 (supporting unit) positioned above the cleaning unit 4 and supporting the cleaning unit 4.
  • a cleaning unit 4 cleaning unit
  • the shape of the cleaning unit 4 is contained in a circle having a diameter G V between the two pipes P, while the shape of the frame 31 is two and it protrudes a distance G V of the pipe P from the circle to the diameter, when the traveling mechanism 2 pivots the frame 31 is not entered between at least two of the pipe P, and the cleaning unit 4 Has entered between at least two tubes P.
  • the shape of the cleaning unit 4 when viewed in the elevating direction of the cleaning mechanism 3 is within a circle having a diameter G V between the two pipes P as a diameter. Even in the state of entering between the pipes P, the cleaning unit 4 does not inhibit the turning of the traveling mechanism 2.
  • the frame 31 when viewed in the raising and lowering direction of the cleaning mechanism 3 protrudes from a circle having a diameter G V between the two pipes P, the frame 31 enters between the two pipes P In this state, the frame 31 may inhibit turning of the traveling mechanism 2. Therefore, when the traveling mechanism 2 turns, the cleaning unit 4 is made to enter between the two pipes P, while the frame 31 is not made to enter between the two pipes P. Thereby, the traveling mechanism 2 can be smoothly turned.
  • the cleaning mechanism 3 has a plurality of cleaning units 4 with different positions in the elevation direction of the cleaning mechanism 3, and when the traveling mechanism 2 turns, the lowermost one in the elevation direction among the plurality of cleaning units 4 2 Only the cleaning unit 4B is in a state of entering between at least two pipes P.
  • the cleaning mechanism 3 since the cleaning mechanism 3 has the plurality of cleaning units 4, when the plurality of cleaning units 4 enter between the two pipes P when the traveling mechanism 2 turns, The cleaning unit 4 may inhibit the turning of the traveling mechanism 2. Therefore, when the traveling mechanism 2 turns, the lowermost second cleaning unit 4B is made to enter between the two pipes P. That is, the cleaning units 4 other than the second cleaning unit 4B do not enter between the two pipes P. Thereby, the traveling mechanism 2 can be smoothly turned.
  • a plurality of cleaning units 4 are in a state of entering between at least two pipes P.
  • the turning of the traveling mechanism 2 is limited by the plurality of cleaning units 4 entering between the two pipes P. That is, the plurality of cleaning units 4 function as a guide for causing the traveling mechanism 2 to travel along the two pipes P.
  • the cleaning unit 4 is configured to contact the pipe P and remove deposits on the surface of the pipe P while rotating around a rotation axis A parallel to the elevating direction of the cleaning mechanism 3.
  • the cleaning unit 4 is formed in a shape that can rotate around the rotation axis A between the two pipes P. Even in the state where the cleaning unit 4 enters between the two pipes P, the cleaning unit 4 does not inhibit the turning of the traveling mechanism 2.
  • the cleaning unit 4 fits in a circle having a diameter G V of the two pipes P as a diameter when viewed in the raising and lowering direction of the cleaning mechanism 3 and the rotating shaft 32 rotating around the predetermined rotation axis A.
  • the deposit on the surface of the pipe P is connected to the surface of the pipe P by contacting the surface of the pipe P so as to expand beyond the circle radially outward around the rotational axis A by the centrifugal force of the rotational shaft 32 And a scraper 34 (contact portion) to be removed.
  • the scraper 34 is swingably connected to a swinging shaft 37 that rotates integrally with the rotating shaft 32, and is pivoted around the swinging shaft 37 by the centrifugal force of the rotating shaft 32 so that the rotation axis A is centered. Extend radially outward.
  • FIG. 14 is a side view of the cleaning device 200.
  • the cleaning device 200 mainly differs in the configuration of the cleaning mechanism 203 and the elevation mechanism 207 from the cleaning device 3 and the elevation mechanism 7 of the cleaning device 100.
  • components of the cleaning device 200 that are different from the cleaning device 100 will be mainly described.
  • symbol is attached
  • the cleaning device 200 is placed on at least two pipes P aligned in the horizontal direction.
  • the cleaning device 200 includes an apparatus main body 201, a traveling mechanism 2 traveling on at least two pipes P, and a cleaning mechanism 203 for cleaning deposits on the surface of the pipe P located below the traveling mechanism 2.
  • the elevating mechanism 207 which raises and lowers the cleaning mechanism 203 from the apparatus main body 201, the main body controller 8 which controls the cleaning device 200, and the external controller 9 which is operated when the operator inputs a command.
  • the cleaning device 200 causes the cleaning mechanism 203 to be lowered and raised between the two pipes P on which the traveling mechanism 1 is mounted by the elevating mechanism 207 and attached to the two pipes P and the pipes P lined below them. Clean the kimono.
  • the X axis, the Y axis, and the Z axis orthogonal to each other are defined with reference to the cleaning device 200.
  • the X axis is set in the traveling direction of the cleaning device 200 (that is, the traveling direction of the traveling mechanism 2)
  • the Z axis is set in the vertical direction of the cleaning device 200 (that is, the elevation direction of the elevating mechanism 207).
  • the Y axis is set in the width direction of the cleaning device 200 (that is, the direction orthogonal to both the traveling direction and the vertical direction).
  • the apparatus main body 201 has a flat base 211 extending in the XY plane, and a frame 212 provided on the base 211 and supporting the elevating mechanism 207.
  • An opening (not shown) passing through the base 211 is formed substantially at the center of the base 211.
  • the traveling mechanism 2 is attached to the lower surface of the base 211.
  • the configuration of the traveling mechanism 2 of the cleaning device 200 is substantially the same as the configuration of the traveling mechanism 2 of the cleaning device 100.
  • the cleaning mechanism 203 has a nozzle 204 for ejecting liquid, and a supply unit for supplying the liquid to the nozzle.
  • the nozzle 204 is configured to remove deposits on the surface of the pipe P by injecting a fluid.
  • the liquid to be jetted is water.
  • the nozzle 204 has a nozzle body 241 and a plurality of injection ports 242.
  • the nozzle body 241 is formed in a cylindrical shape having an axial center H extending in the Z-axis direction.
  • the plurality of injection ports 242 are arranged symmetrically with respect to the ZX plane. More specifically, the plurality of injection holes 242 are arranged at equal intervals in the circumferential direction centering on the axial center H in the nozzle body 241. From the injection port 242, the liquid is injected in the radial direction around the axis H. That is, from the nozzle 204, the liquid is jetted radially around the axis H.
  • the shape of the nozzle 204 when viewed in the Z-axis direction is the interval G V in the V-axis direction of the two pipes P on which the cleaning device 200 is mounted (see FIG. 2) In a circle with a diameter of.
  • the nozzle 204 is an example of a cleaning unit.
  • the supply unit includes a liquid supply source provided outside the cleaning device 200 and a hose 251 connecting the supply source and the nozzle 204.
  • the lifting mechanism 207 is a so-called pantograph.
  • the lifting and lowering mechanism 207 has a plurality of links 271 constituting a pantograph. Specifically, the longitudinal ends of one set of two links 271 form another set of two links, with the two links 271 rotatably connected at the longitudinal center in a crossing state as one set. It is rotatably connected to the longitudinal direction end of 271 respectively. Relatively short links 271 are rotatably connected to longitudinal ends of the lowermost set of two links 271 (ends not connected with another set of links).
  • the nozzles 204 (more specifically, the nozzle body 241) are connected to these short links 271.
  • the lifting mechanism 207 also functions as a support for supporting the nozzle 204 in the cleaning mechanism 203.
  • the longitudinal ends (the ends where the other set of links are not connected) of the topmost set of two links 271 are connected to the frame 212.
  • the frame 212 has a pair of vertical frames 212a extending from the base 211 in the Z-axis direction, and a horizontal frame 212b connected to the upper end of the pair of vertical frames 212a and extending in the X-axis direction.
  • One link 271 (hereinafter, referred to as “first link 271A”) of the uppermost set is coupled to the horizontal frame 212b in a rotatable and non-slidable manner in the X-axis direction.
  • the other top link 271 (hereinafter referred to as “second link 271 B”) is connected to the horizontal frame 212 b in a rotatable and slidable manner in the X-axis direction (see the arrow in FIG. 14). ).
  • the second link 271B is moved in the X-axis direction along the lateral frame 212b by a drive unit (not shown).
  • a drive unit not shown
  • the longitudinal end of the second link 271B is moved away from the longitudinal end of the first link 271A
  • the dimension in the Z-axis direction of the entire pantograph is reduced, and as a result, the nozzle 204 is lifted.
  • one end in the longitudinal direction of the second link 271B is moved in a direction approaching the one end in the longitudinal direction of the first link 271A
  • the dimension in the Z-axis direction of the whole pantograph becomes large, and as a result, the nozzle 204 descends.
  • the shape of the lifting mechanism 207 when viewed in the Z-axis direction protrudes from a circle having a diameter G V in the V-axis direction of the two pipes P.
  • the dimension of the elevating mechanism 207 in the Y-axis direction is smaller than the distance G V between the two pipes P, while the dimension of the elevating mechanism 207 in the X-axis direction is the distance G V between the two pipes P Greater than.
  • FIG. 15 is a view of the cleaning mechanism 203 cleaning the pipe P as viewed in the Y-axis direction.
  • the cleaning device 200 cleans the two pipes P and the pipes P arranged below the two pipes P by lowering and raising the cleaning mechanism 203 between the two pipes P. Cleaning is started from the state where the two crawlers 21 are mounted on the two pipes P in parallel with the pipe P and the nozzle 204 is positioned between the two pipes P in the V-axis direction.
  • the nozzle 204 is lowered between the two pipes P by the lift mechanism 207. At this time, liquid is jetted from the nozzle 204. The jetted liquid removes deposits on the surface of the pipe P. The nozzle 204 jets the liquid in the direction intersecting the Z axis, so that the liquid is drawn between the plurality of tubes P arranged along the traveling direction of the nozzle 204 (that is, arranged in the W axis direction). The spray is applied to remove deposits present between the plurality of tubes P and to remove deposits on the surfaces of the plurality of tubes P.
  • the nozzle 204 is not only in the portion of the surface of the pipe P facing the space through which the nozzle 204 passes, but also in a direction (for example, the V-axis direction) intersecting the traveling direction of the nozzle 204 from the space It also removes deposits attached to remote parts (ie, recessed parts).
  • the nozzle 204 jets the liquid radially about the axis H, and thus removes deposits on the pipes P on both sides of the nozzle 204 in the V-axis direction. At this time, the nozzle 204 receives a reaction force due to the ejection of the liquid.
  • the injection ports 242 of the nozzle 204 are disposed symmetrically with respect to the ZX plane. Therefore, the reaction force to one side in the V-axis direction received by the nozzle 204 and the reaction force to the other side in the V-axis direction cancel each other. As a result, movement of the nozzle 204 in the V-axis direction is suppressed by the reaction force from the injection. That is, even if the cleaning mechanism 203 does not have a guide mechanism such as the guide 5 of the cleaning mechanism 3, the positional deviation in the V-axis direction can be reduced.
  • the nozzle 204 removes deposits on the surface of the pipe P in a substantially semi-peripheral portion by passing through the side of the pipe P in the W-axis direction.
  • the nozzle 204 is raised by the raising and lowering mechanism 207 as it descends until it passes the lowermost pipe P of the pipes P to be cleaned. Even when the nozzle 204 ascends, the nozzle 204 jets the liquid to the pipe P to cut off the deposits on the pipe P. That is, the nozzle 204 cleans the surface of the pipe P both at the time of descent and at the time of ascent.
  • the cleaning device 200 moves along the two pipes P in the U axis direction by a predetermined amount. Thereafter, the nozzle 204 performs lowering and raising again. That is, the nozzle 204 cleans the portion of the pipe P which is different in U-axis direction position from the previous lowering and rising of the nozzle 204.
  • the cleaning device 200 repeats lowering and raising of the nozzle 204 while changing the position in the U-axis direction, and the two pipes P on which the cleaning device 200 is mounted are The movement from one end to the other end is ended. Subsequently, the cleaning device 200 is moved in the V-axis direction, the nozzle 204 is disposed between two different pipes P, and the two new pipes P and the pipes P therebelow are the same as described above. Clean up. Thus, the cleaning device 200 cleans the pipes P included in the pipe group Q by repeating the above-described cleaning while changing the two pipes P on which the cleaning device 200 is placed.
  • FIG. 16 is a view of the cleaning device 200 viewed in the X-axis direction when moving in parallel with the pipe P and when pivoting on the pipe P. As shown in FIG.
  • the cleaning device 200 when the cleaning device 200 cleans the pipe P included in the pipe group Q, the cleaning device 200 travels on the pipe P. At this time, the cleaning device 200 achieves movement to a desired position by using the nozzle 204 as a guide for traveling.
  • the nozzle 204 is pulled up as shown in FIG. 14 so that the nozzle 204 does not interfere with the pipe P (the nozzle 204 runs the traveling mechanism 2) Move out from the bottom).
  • the cleaning device 200 moves in the U-axis direction along the two pipes P in order to clean the portions in which the pipe P in the U-axis direction is different, the cleaning device 200 as shown in FIG.
  • the nozzle 204 is protruded below the traveling mechanism 2 and travels in a state in which the nozzle 204 enters between two pipes P on which the cleaning device 200 is mounted. Since the nozzle 204 has entered between the two pipes P, the cleaning device 200 is prevented from shifting in the V-axis direction.
  • the cleaning device 200 moves in the U-axis direction in a state where not only the nozzle 204 but a part of the lifting mechanism 207 (for example, the relatively lower link 271) is advanced between the two pipes P. You may go.
  • the cleaning device 200 turns in a state where the nozzle 204 is advanced between the two pipes P.
  • the outer shape of the nozzle 204 when viewed in the Z-axis direction is within a circle whose diameter is the distance G V between the two pipes P. Therefore, even in the state where the nozzle 204 enters between the two pipes P, the cleaning device 200 can pivot.
  • the lateral dimension of the pantograph of the lifting mechanism 207 is smaller than the distance between the two tubes P, but the longitudinal dimension of the pantograph is greater than the distance between the two tubes P. Too big.
  • the cleaning device 200 can not move freely even if the driving force of one of the crawlers 21 is superior.
  • the cleaning device 200 continues traveling with the nozzle 204 engaged with the two pipes P and the driving forces of the two crawlers 21 being unbalanced, the crawler 21 which has been idled will soon be in friction with the pipe P. Force will be exerted and the cleaning device 200 will pivot. As a result, the cleaning device 200 eventually pivots while moving slightly along the two pipes P.
  • the cleaning device 200 is provided to the device main body 201 and the device main body 201, and is moved up and down from the device main body 201 and the traveling mechanism 2 that travels on at least two pipes P included in the pipe group Q.
  • the cleaning mechanism 203 for cleaning the deposit on the surface of the pipe P located below the traveling mechanism 2 and the traveling mechanism 2 is in a state where the cleaning mechanism 203 enters between at least two pipes P. It pivots on at least two pipes P.
  • the cleaning mechanism 203 has a nozzle 204 (cleaning part) for removing deposits on the surface of the pipe P, and an elevation mechanism 207 (support part) located above the nozzle 204 and supporting the nozzle 204.
  • the shape of the nozzle 204 fits in a circle whose diameter is the distance G V between the two tubes P, while the shape of the lifting mechanism 207 protrudes from the circle whose diameter G is the distance G V between the two tubes P.
  • the shape of the nozzle 204 when viewed in the elevating direction of the cleaning mechanism 203 falls within a circle having a diameter G V between the two pipes P, so that the pipe 204 has two nozzles P.
  • the nozzle 204 does not inhibit the turning of the traveling mechanism 2 even in the state of entering between them.
  • the lifting and lowering mechanism 207 when viewed in the lifting and lowering direction of the cleaning mechanism 203 is out of the circle having a diameter G V between the two pipes P, the lifting and lowering mechanism 207 is between the two pipes P
  • the lifting mechanism 207 may inhibit the turning of the traveling mechanism 2. Therefore, when the traveling mechanism 2 turns, the nozzle 204 is made to enter between the two pipes P, while the elevating mechanism 207 is not made to enter between the two pipes P. Thereby, the traveling mechanism 2 can be smoothly turned.
  • the nozzle 204 is configured to remove deposits on the surface of the pipe P by injecting a fluid.
  • the cleaning mechanism 3 is provided in the cleaning device 100, it is not limited thereto.
  • the cleaning mechanism 3 is transported by the cleaning device 100 and moved up and down.
  • the cleaning mechanism 3 may be operated manually by the operator. That is, the operator may grip the cleaning mechanism 3 and clean the pipe P with the cleaning mechanism 3 while moving the cleaning mechanism 3 in the pipe group Q.
  • the configuration of the traveling mechanism 2 or the elevation mechanism 7 is not limited to the above-described configuration.
  • the traveling mechanism 2 may be not wheels but wheels.
  • the lifting mechanism 7 may be a rack and pinion or pantograph instead of a winch.
  • the number of cleaning units 4 provided in the cleaning mechanism 3 is not limited to three.
  • the cleaning unit 4 may be one, two or four or more.
  • the moving direction of the cleaning mechanism 3, that is, the position of each cleaning unit 4 in the Z-axis direction is not limited to the above-described position.
  • the positions of the three cleaning units 4 in the Z-axis direction may be the same.
  • the positions of the three cleaning units 4 in the Z-axis direction may all be different.
  • the configuration of the cleaning unit 4 is not limited to the above-described configuration.
  • the number of scrapers 34 included in the cleaning unit 4 is not limited to three, and may be one, two, or four or more.
  • the cleaning unit 4 may not have the disc 35 or the excavating portion 36.
  • a plurality of scrapers 34 are provided in each of three gaps formed by the four disks 35. That is, three sets of scrapers 34 are provided.
  • the number of sets of scrapers 34 may be one, two or four or more.
  • the shape of the scraper 34 may not be arc-shaped, but may be linear, for example.
  • the scraper 34 may be configured to slide instead of swinging.
  • an elongated hole may be formed in the scraper 34, and the scraper 34 may be connected to the pin so that the pin provided between the two disks 35 is inserted into the elongated hole. In this configuration, the scraper 34 can slide relative to the pin such that the pin moves relative to the slot. If the scraper 34 is configured to be slidable, when the centrifugal force of the rotating shaft 32 acts on the scraper 34, the scraper 34 slides according to the centrifugal force and spreads radially outward.
  • the cleaning mechanism 3 includes the guide 5, but the guide 5 may not be provided.
  • the configuration of the guide 5 is not limited to the above-described configuration.
  • the guide 5 may not have the link 6.
  • the blade 51 may be slidably connected to the frame 31 and may be biased outward in the Y-axis direction by a spring or the like.
  • the cross-sectional shape of the edge 53 of the blade 51 may be a sharp tip that is thinner toward the pipe P, and the portion closest to the pipe P, that is, the portion in contact with the pipe P may be somewhat rounded.
  • the configuration of the traveling mechanism 2 or the elevation mechanism 207 in the cleaning device 200 is not limited to the above-described configuration.
  • the traveling mechanism 2 may be not wheels but wheels.
  • the lifting mechanism 207 may be a winch or a rack and pinion instead of a pantograph.
  • the configuration of the nozzle 204 is not limited to the above-described configuration.
  • the number and arrangement of the injection ports 242 can be set arbitrarily.
  • the cleaning mechanism 203 may have a plurality of nozzles 204.
  • the Z-axis direction positions of the plurality of nozzles 204 may not coincide with each other. In that case, as in the cleaning device 100, when the traveling mechanism 2 travels along the two pipes P, the plurality of nozzles 204 enter between the two pipes P, and the traveling mechanism 2 turns In this case, only the lowermost nozzle 204 may enter between the two pipes P.
  • the substance injected from the nozzle 204 of the cleaning mechanism 203 is not limited to the liquid.
  • the nozzle 204 may inject a gas such as air or particles suitable for cleaning the pipe P.
  • particles also include fine particles such as powder.
  • binder is a minute sphere such as metal or ceramic.

Abstract

A cleaning apparatus 100 is provided with: an apparatus body 1; a traveling mechanism 2 that is provided to the apparatus body 1 and that travels on at least two tubes P included in a tube group Q; and a cleaning mechanism 3 that is lifted/lowered from the apparatus body 1, and cleans off substances adhering to the surfaces of the tubes P located below the traveling mechanism 2. The traveling mechanism 2 makes a turn above the at least two tubes P in a state where the cleaning mechanism 3 has entered an area between the at least two tubes P.

Description

清掃装置Cleaning device
 ここに開示された技術は、清掃装置に関する。 The technology disclosed herein relates to a cleaning device.
 従来より、ボイラ管等の管の表面に付着した付着物を除去する清掃装置が知られている。例えば、特許文献1に開示された清掃装置は、管上を走行しながら管の清掃を行う。 DESCRIPTION OF RELATED ART Conventionally, the cleaning apparatus which removes the deposit | attachment adhering to the surface of tubes, such as a boiler tube, is known. For example, the cleaning device disclosed in Patent Document 1 cleans a pipe while traveling on the pipe.
特開2001-336897号公報JP 2001-336897 A
 ところで、付着物が付着した管上を清掃装置が走行する場合、清掃装置の走行機構が管上で滑って、空転してしまう虞がある。走行機構が空転すると、走行機構が適切に進行することができない。特に、走行機構が管上で旋回する際には、走行機構が空転してしまうと、走行機構が予期せぬ方向へ移動してしまう。 By the way, when the cleaning device travels on the pipe on which the extraneous matter adheres, there is a possibility that the traveling mechanism of the cleaning device slips on the pipe and slips over. If the running mechanism slips, the running mechanism can not advance properly. In particular, when the traveling mechanism turns on the pipe, if the traveling mechanism slips, the traveling mechanism moves in an unexpected direction.
 ここに開示された技術は、かかる点に鑑みてなされたものであり、その目的とするところは、走行機構の旋回を適切に実行させることにある。 The technique disclosed herein has been made in view of such a point, and its purpose is to properly execute turning of the traveling mechanism.
 ここに開示された清掃装置は、装置本体と、前記装置本体に設けられ、管群に含まれる少なくとも2本の管の上を走行する走行機構と、前記装置本体から昇降して、前記走行機構よりも下方に位置する管の表面の付着物を清掃する清掃機構とを備え、前記走行機構は、前記清掃機構が前記少なくとも2本の管の間に進入した状態で前記少なくとも2本の管の上で旋回するものとする。 The cleaning device disclosed herein includes an apparatus main body, a traveling mechanism provided on the apparatus main body, and traveling on at least two pipes included in a pipe group, and moving up and down from the apparatus main body. And a cleaning mechanism for cleaning deposits on the surface of the lower tube than the lower one, and the traveling mechanism comprises the at least two tubes in a state where the cleaning mechanism enters between the at least two tubes. It shall turn up.
 前記清掃装置によれば、走行機構の旋回を適切に実行させることができる。 According to the cleaning device, the swing of the traveling mechanism can be appropriately performed.
図1は、実施形態1に係る清掃装置の側面図である。FIG. 1 is a side view of the cleaning device according to the first embodiment. 図2は、清掃装置を正面から見た図である。FIG. 2 is a front view of the cleaning device. 図3は、清掃機構をY軸方向に見た図である。FIG. 3 is a view of the cleaning mechanism in the Y-axis direction. 図4は、スクレーパが収容された状態の、図3のS-S線における清掃ユニットの断面図である。FIG. 4 is a cross-sectional view of the cleaning unit taken along the line SS in FIG. 3 with the scraper housed. 図5は、スクレーパが拡がった状態の、図3のS-S線における清掃ユニットの断面図である。FIG. 5 is a cross-sectional view of the cleaning unit taken along line SS in FIG. 3 with the scraper expanded. 図6は、ガイドが縮まった状態の清掃機構をX軸方向に見た図である。FIG. 6 is a view of the cleaning mechanism in a state in which the guide is contracted as viewed in the X-axis direction. 図7は、ガイドが拡がった状態の清掃機構をX軸方向に見た図である。FIG. 7 is a view of the cleaning mechanism in a state in which the guide is expanded in the X-axis direction. 図8は、図7のT-T線における第1ブレードの断面図である。FIG. 8 is a cross-sectional view of the first blade taken along a line TT in FIG. 図9は、清掃機構が管を清掃している状態をX軸方向に見た図である。FIG. 9 is a view of the cleaning mechanism cleaning the pipe as viewed in the X-axis direction. 図10は、管と平行に移動する清掃装置をX軸方向に見た図である。FIG. 10 is a view of the cleaning device moving in parallel to the pipe as viewed in the X-axis direction. 図11は、管と平行に移動する清掃装置をZ軸方向に見た図である。FIG. 11 is a view of the cleaning device moving in parallel to the pipe as viewed in the Z-axis direction. 図12は、管上で旋回する清掃装置をX軸方向に見た図である。FIG. 12 is a view of the cleaning device pivoting on the pipe as viewed in the X-axis direction. 図13は、管上で旋回する清掃装置をZ軸方向に見た図である。FIG. 13 is a view of the cleaning device pivoting on the pipe as viewed in the Z-axis direction. 図14は、実施形態2に係る清掃装置の側面図である。FIG. 14 is a side view of the cleaning device according to the second embodiment. 図15は、清掃機構が管を清掃している状態をY軸方向を向いて見た図である。FIG. 15 is a view of the cleaning mechanism cleaning the pipe as viewed in the Y-axis direction. 図16は、管と平行に移動する際、及び、管上で旋回する際の清掃装置をX軸方向に見た図である。FIG. 16 is a view of the cleaning device in the X-axis direction when moving in parallel with the pipe and when pivoting on the pipe.
 以下、例示的な実施形態を図面に基づいて詳細に説明する。 Hereinafter, exemplary embodiments will be described in detail based on the drawings.
 《実施形態1》
 実施形態1に係る清掃装置100は、管群に含まれる管の表面に付着した付着物を清掃する。ここでは、清掃装置100がボイラの伝熱管を清掃する場合について説明する。図1は、清掃装置100の側面図である。図2は、清掃装置100を正面から見た図であり、部分的に断面図となっている。
Embodiment 1
The cleaning device 100 according to the first embodiment cleans the deposit attached to the surface of the tube included in the tube group. Here, a case where the cleaning device 100 cleans the heat transfer tube of the boiler will be described. FIG. 1 is a side view of the cleaning device 100. FIG. 2 is a front view of the cleaning device 100, partially in cross section.
 ボイラ内には、複数の管Pによって形成された管群Q(図2参照)が設けられている。管Pの内部には、水等の流体が流通している。管Pは、伝熱管であり、ボイラの燃焼室で発生した熱と熱交換を行う。複数の管Pは、水平方向に延びており、水平方向及び鉛直方向に配列されている。つまり、管群Qにおいては、水平方向において複数の管Pが互いに平行な状態で配列されていると共に、鉛直方向において複数の管Pが互いに平行な状態で配列されている。 In the boiler, a tube group Q (see FIG. 2) formed by a plurality of tubes P is provided. Inside the pipe P, a fluid such as water flows. The pipe P is a heat transfer pipe, and exchanges heat with the heat generated in the combustion chamber of the boiler. The plurality of tubes P extend in the horizontal direction, and are arranged in the horizontal direction and the vertical direction. That is, in the tube group Q, the plurality of tubes P are arranged in parallel with each other in the horizontal direction, and the plurality of tubes P are arranged in parallel with each other in the vertical direction.
 尚、一の管Pと他の管Pとは、それぞれの端部が繋がって、1本の管を形成する場合もある。つまり、管群Qには、1本の管が水平方向に延びた後、折り返して再び水平方向に延びる場合や、1本の管が水平方向に延びた後、折り返して再び水平方向に延びることを繰り返し、全体として蛇行するように延びる場合がある。本明細書では、このような場合であっても、水平方向に延びる部分の1つ1つを1本の管Pとして捉えるものとする。そのため、実際には連続した1本の管であっても、水平方向に延びる部分が複数存在すれば、複数の管Pとして扱う。 One end of the pipe P and the other end of the pipe P may be connected to form one pipe. That is, in the tube group Q, one tube extends in the horizontal direction and then folded back and extends again in the horizontal direction, or one tube extends horizontally and then folded back and extends in the horizontal direction again. And may extend to meander as a whole. In this specification, even in such a case, each of the horizontally extending portions is regarded as one pipe P. Therefore, even if it is actually one continuous pipe, if there are a plurality of portions extending in the horizontal direction, they are treated as a plurality of pipes P.
 ボイラでは、燃焼により生じた灰が管Pに付着し得る。灰の一部は、溶融してクリンカになるものもある。このように、管Pの表面には、灰やクリンカ等の付着物が付着している。ここで、付着物とは、管Pの表面に直接的に接触しているものに限られず、管Pの表面に直接的に接触しているものにさらに積み重なっているものも含む。例えば、管Pの表面に直接的に接触している灰だけでなく、その上にさらに堆積している灰も付着物に含まれる。 In the boiler, the ash produced by the combustion may adhere to the pipe P. Some of the ash melts and becomes clinker. Thus, on the surface of the pipe P, deposits such as ash and clinker are attached. Here, the deposits are not limited to those in direct contact with the surface of the pipe P, but include those further stacked on those in direct contact with the surface of the pipe P. For example, not only the ash directly in contact with the surface of the pipe P, but also the ash further deposited thereon is included in the deposit.
 清掃装置100は、水平方向に並ぶ少なくとも2本の管Pの上に載置される。清掃装置100は、装置本体1と、装置本体1に設けられ、少なくとも2本の管Pの上を走行する走行機構2と、装置本体1から昇降して、走行機構2よりも下方に位置する管Pの表面の付着物を清掃する清掃機構3とを備えている。清掃装置100は、清掃機構3を走行機構2から昇降させる昇降機構7を備えていてもよい。清掃装置100は、清掃装置100を制御する本体コントローラ8を備えていてもよい。清掃装置100は、オペレータが指令を入力する際に操作する外部コントローラ9を備えていてもよい。清掃装置100は、走行機構1が載っている2本の管Pの間に清掃機構3を昇降機構7によって降下及び上昇させ、2本の管P及びそれらの下方に並ぶ管Pに付着した付着物を清掃する。尚、図2においては、昇降機構7、本体コントローラ8及び外部コントローラ9を省略している。 The cleaning device 100 is placed on at least two pipes P aligned in the horizontal direction. The cleaning device 100 is provided in the device main body 1 and the device main body 1 and moves up and down from the device main body 1 and travels above at least two pipes P, and is positioned lower than the travel mechanism 2 And a cleaning mechanism 3 for cleaning deposits on the surface of the pipe P. The cleaning device 100 may include an elevation mechanism 7 that raises and lowers the cleaning mechanism 3 from the traveling mechanism 2. The cleaning device 100 may include a main body controller 8 that controls the cleaning device 100. The cleaning device 100 may include an external controller 9 that is operated when the operator inputs a command. The cleaning device 100 lowers and raises the cleaning mechanism 3 by the lifting mechanism 7 between the two pipes P on which the traveling mechanism 1 is mounted, and adheres to the two pipes P and the pipes P arranged below them. Clean the kimono. In FIG. 2, the lifting mechanism 7, the main body controller 8 and the external controller 9 are omitted.
 以下、説明の便宜上、清掃装置100を基準に互いに直交するX軸、Y軸及びZ軸を規定する。清掃装置100の走行方向(即ち、走行機構2の走行方向)にX軸を設定し、清掃装置100の上下方向(即ち、昇降機構7の昇降方向)にZ軸を設定し、清掃装置100の幅方向(即ち、走行方向及び上下方向の両方に直交する方向)にY軸を設定する。 Hereinafter, for convenience of explanation, the X axis, the Y axis, and the Z axis which are orthogonal to each other with respect to the cleaning device 100 are defined. The X axis is set in the traveling direction of the cleaning device 100 (that is, the traveling direction of the traveling mechanism 2), and the Z axis is set in the vertical direction of the cleaning device 100 (that is, the elevation direction of the elevating mechanism 7). The Y axis is set in the width direction (ie, the direction orthogonal to both the traveling direction and the vertical direction).
 また、管群Qを基準に互いに直交するU軸、V軸及びW軸を規定する。管Pが延びる方向にU軸を設定し、U軸に直交し且つ水平な方向にV軸を設定し、U軸に直交し且つ鉛直な方向にW軸を設定する。 Further, U axis, V axis and W axis orthogonal to each other are defined with reference to the pipe group Q. A U axis is set in a direction in which the pipe P extends, a V axis is set in a direction perpendicular to the U axis and in a horizontal direction, and a W axis is set in a direction perpendicular to the U axis and in a vertical direction.
 装置本体1は、XY平面上に拡がる平板状のベース11と、ベース11に設けられ、清掃機構3を収容するケース12とを有している。ベース11の略中央には、ベース11を貫通する開口11a(図2参照)が形成されている。ケース12は、X軸方向を長手方向とする略長方形の断面を有する角筒状に形成されている。ケース12は、ベース11の開口11aを貫通している。また、装置本体1には、管Pを検出する複数のセンサ(図示省略)が設けられている。 The apparatus body 1 has a flat plate-like base 11 extending on the XY plane, and a case 12 provided on the base 11 and accommodating the cleaning mechanism 3. At substantially the center of the base 11, an opening 11a (see FIG. 2) penetrating the base 11 is formed. The case 12 is formed in a rectangular tube shape having a substantially rectangular cross section whose longitudinal direction is the X-axis direction. The case 12 penetrates the opening 11 a of the base 11. Further, the apparatus body 1 is provided with a plurality of sensors (not shown) for detecting the pipe P.
 走行機構2は、ベース11の下面に取り付けられた2本のクローラ21を有している。クローラ21は、X軸方向に進行するように構成されている。つまり、クローラ21の駆動輪の回転軸は、Y軸方向に延びている。2本のクローラ21は、ベース11の開口11aを挟んでY軸方向に並んでいる。 The traveling mechanism 2 has two crawlers 21 attached to the lower surface of the base 11. The crawler 21 is configured to advance in the X-axis direction. That is, the rotation axis of the drive wheel of the crawler 21 extends in the Y-axis direction. The two crawlers 21 are arranged in the Y-axis direction across the opening 11 a of the base 11.
 清掃機構3は、詳しくは後述するが、フレーム31(図1参照)と、フレーム31に支持された3つの清掃ユニット4(図2参照)と、清掃機構3が管群Q内を進行する際に清掃機構3を進行方向に案内するガイド5とを有している。清掃機構3は、清掃を行わないときには、ケース12内に収容されている。清掃機構3は、清掃を行うときには、ケース12から下方へ降下し、管群Q内を進行しながら、管群Qに含まれる管Pの表面を清掃する。 Although the cleaning mechanism 3 will be described in detail later, when the frame 31 (see FIG. 1), the three cleaning units 4 (see FIG. 2) supported by the frame 31 and the cleaning mechanism 3 advance in the pipe group Q. And a guide 5 for guiding the cleaning mechanism 3 in the advancing direction. The cleaning mechanism 3 is accommodated in the case 12 when cleaning is not performed. When cleaning is performed, the cleaning mechanism 3 descends from the case 12 and cleans the surface of the pipe P included in the pipe group Q while advancing in the pipe group Q.
 昇降機構7は、2基のウインチ71と、各ウインチ71に巻き上げられるワイヤ72とを有している。ウインチ71は、ベース11の上面に設置されている。2基のウインチ71は、X軸方向においてケース12を挟むように配置されている。ワイヤ72は、ウインチ71のリールに巻き掛けられている。ワイヤ72の一端は、清掃機構3に取り付けられている。つまり、清掃機構3は、2本のワイヤ72でつり下げられた状態となっており、昇降機構7によってZ軸方向に昇降させられる。尚、ケース12には、ウインチ71のリール及びワイヤ72との干渉を避けるための切欠き(図示省略)が形成されている。 The lifting mechanism 7 has two winches 71 and wires 72 wound up on each winch 71. The winch 71 is installed on the upper surface of the base 11. The two winches 71 are arranged to sandwich the case 12 in the X-axis direction. The wire 72 is wound around a reel of the winch 71. One end of the wire 72 is attached to the cleaning mechanism 3. That is, the cleaning mechanism 3 is suspended by the two wires 72 and is moved up and down in the Z-axis direction by the elevation mechanism 7. The case 12 is formed with a notch (not shown) for avoiding interference with the reel of the winch 71 and the wire 72.
 本体コントローラ8は、装置本体1に搭載されている。本体コントローラ8は、プロセッサで形成されている。本体コントローラ8は、外部コントローラ9からの指令を受けて、清掃装置100の各部を制御する。例えば、本体コントローラ8は、前述の管Pを検出するセンサの出力に基づいて、装置本体1と管Pとの位置関係を判断する。本体コントローラ8は、センサの出力を参照しながら、外部コントローラ9からの指令に応じた位置へ清掃装置100を移動させる。また、本体コントローラ8は、清掃機構3及び昇降機構7を作動させる。 The main body controller 8 is mounted on the apparatus main body 1. The main body controller 8 is formed of a processor. The main body controller 8 controls each part of the cleaning device 100 in response to an instruction from the external controller 9. For example, the main body controller 8 determines the positional relationship between the apparatus main body 1 and the pipe P based on the output of the sensor that detects the pipe P described above. The main body controller 8 moves the cleaning device 100 to the position according to the command from the external controller 9 while referring to the output of the sensor. Further, the main body controller 8 operates the cleaning mechanism 3 and the elevating mechanism 7.
 外部コントローラ9は、ケーブル91を介して本体コントローラ8に接続されている。オペレータは、外部コントローラ9を操作することによって、本体コントローラ8に指令を入力する。例えば、外部コントローラ9は、指令として、清掃装置100への動作指令が入力可能である。それに加えて、外部コントローラ9は、動作に関連する移動距離を入力可能であってもよい。 The external controller 9 is connected to the main body controller 8 via a cable 91. The operator operates the external controller 9 to input a command to the main body controller 8. For example, the external controller 9 can input an operation command to the cleaning device 100 as a command. In addition, the external controller 9 may be able to input the movement distance associated with the operation.
 以下、清掃機構3についてさらに詳細に説明する。図3は、清掃機構3をY軸方向に見た図である。図4は、スクレーパ34が収容された状態の、図3のS-S線における清掃ユニット4の断面図である。図5は、スクレーパ34が拡がった状態の、図3のS-S線における清掃ユニット4の断面図である。図6は、ガイド5が縮まった状態の清掃機構3をX軸方向に見た図である。図7は、ガイド5が拡がった状態の清掃機構3をX軸方向に見た図である。図8は、図7のT-T線における第1ブレード51Aの断面図である。 The cleaning mechanism 3 will be described in more detail below. FIG. 3 is a view of the cleaning mechanism 3 in the Y-axis direction. FIG. 4 is a cross-sectional view of the cleaning unit 4 taken along line SS in FIG. 3 with the scraper 34 housed. FIG. 5 is a cross-sectional view of the cleaning unit 4 taken along line SS in FIG. 3 with the scraper 34 spread out. FIG. 6 is a view of the cleaning mechanism 3 in a state in which the guide 5 is contracted as viewed in the X-axis direction. FIG. 7 is a view of the cleaning mechanism 3 in a state in which the guide 5 is expanded in the X-axis direction. FIG. 8 is a cross-sectional view of the first blade 51A taken along line TT in FIG.
 フレーム31は、図3に示すように、概ね四角形の枠状に形成されている。フレーム31は、カバー31aが取り付けられており、これにより、全体として箱状に形成されている。フレーム31のうちX軸方向の両端に設けられ、Z軸方向に延びる一対の縦フレーム31bのそれぞれには、昇降機構7のワイヤ72が取り付けられる係止部31cが設けられている。 The frame 31 is formed in a substantially rectangular frame shape as shown in FIG. The cover 31a is attached to the frame 31, and thereby, the frame 31 is formed in a box shape as a whole. Locking portions 31 c to which the wires 72 of the elevating mechanism 7 are attached are provided on each of the pair of vertical frames 31 b provided at both ends in the X-axis direction of the frame 31 and extending in the Z-axis direction.
 Z軸方向(即ち、清掃機構3の昇降方向)に見た場合のフレーム31の形状は、清掃装置100が載置された2本の管PのV軸方向の間隔G(図2参照)を直径とする円よりもはみ出している。具体的には、フレーム31のY軸方向の寸法は、2本の管Pの間隔Gよりも小さく設定されている。一方、フレーム31のX軸方向の寸法は、2本の管Pの間隔Gよりも大きく設定されている。つまり、清掃装置100のX軸方向と管群QのU軸方向とが一致する場合には、フレーム31は、2本の管Pの間に進入することができる。フレーム31は、支持部の一例である。 The shape of the frame 31 when viewed in the Z-axis direction (that is, the lifting and lowering direction of the cleaning mechanism 3) is the distance G V in the V-axis direction of the two pipes P on which the cleaning device 100 is mounted (see FIG. 2) Extends beyond a circle with a diameter of. Specifically, the dimension in the Y-axis direction of the frame 31 is set smaller than the distance G V between the two pipes P. On the other hand, the dimension in the X-axis direction of the frame 31 is set to be larger than the gap G V of the two pipes P. That is, when the X-axis direction of the cleaning device 100 and the U-axis direction of the pipe group Q coincide with each other, the frame 31 can enter between the two pipes P. The frame 31 is an example of a support.
 3つの清掃ユニット4は、フレーム31に支持されている。3つの清掃ユニット4は、フレーム31の下部から下方に突出している。 The three cleaning units 4 are supported by the frame 31. The three cleaning units 4 project downward from the lower part of the frame 31.
 3つの清掃ユニット4は、X軸方向に配列されている。3つの清掃ユニット4は、Z軸方向(即ち、清掃装置3の昇降方向)における位置が異なっている。具体的には、真ん中の清掃ユニット4は、両側の清掃ユニット4に比べて下方に突出している。以下、3つの清掃ユニット4をそれぞれ区別する場合には、X軸方向に並ぶ順に、「第1清掃ユニット4A」、「第2清掃ユニット4B」、「第3清掃ユニット4C」と称する。 The three cleaning units 4 are arranged in the X-axis direction. The positions of the three cleaning units 4 in the Z-axis direction (that is, the lifting and lowering direction of the cleaning device 3) are different. Specifically, the cleaning unit 4 in the middle protrudes downward relative to the cleaning units 4 on both sides. Hereinafter, in the case where the three cleaning units 4 are respectively distinguished, they are referred to as “first cleaning unit 4A”, “second cleaning unit 4B”, and “third cleaning unit 4C” in the order of alignment in the X-axis direction.
 清掃ユニット4は、Z軸と平行(即ち、清掃機構3の昇降方向と平行)な回転軸A回りに回転しながら管Pに接触して管Pの表面の付着物を除去するように構成されている。具体的には、清掃ユニット4は、図3に示すように、Z軸と平行に延びる回転軸A回りに回転する回転シャフト32と、管Pの表面に接触することによって管Pの表面の付着物を除去するスクレーパ34と、回転軸Aと同軸に設けられた円板35と、回転軸A上であって清掃ユニット4の先端に設けられた掘削部36とを有している。回転シャフト32は、回転軸Aに沿って延びている。回転シャフト32は、フレーム31に支持されたモータ(図示省略)によって回転駆動される。清掃ユニット4は、清掃部の一例であり、スクレーパ34は、接触部の一例である。 The cleaning unit 4 is configured to be in contact with the pipe P and remove deposits on the surface of the pipe P while rotating around a rotation axis A parallel to the Z axis (that is, parallel to the elevation direction of the cleaning mechanism 3). ing. Specifically, as shown in FIG. 3, the cleaning unit 4 contacts the surface of the pipe P by contacting the surface of the pipe P with the rotary shaft 32 rotating around the rotation axis A extending parallel to the Z axis. It has a scraper 34 for removing a deposit, a disc 35 provided coaxially with the rotation axis A, and an excavated portion 36 provided on the rotation axis A and at the tip of the cleaning unit 4. The rotating shaft 32 extends along the rotation axis A. The rotating shaft 32 is rotationally driven by a motor (not shown) supported by the frame 31. The cleaning unit 4 is an example of a cleaning unit, and the scraper 34 is an example of a contact unit.
 回転シャフト32の先端部に、円板35、スクレーパ34及び掘削部36が設けられている。4枚の円板35が、回転軸Aと同軸上に等間隔で配置されている。円板35は、回転シャフト32に回転不能な状態で取り付けられている。つまり、円板35は、回転シャフト32と一体的に回転する。円板35の直径は、2本の管Pの間隔Gよりも小さく設定されている。 A disc 35, a scraper 34 and an excavating portion 36 are provided at the tip of the rotary shaft 32. Four discs 35 are arranged coaxially with the rotation axis A at equal intervals. The disc 35 is attached to the rotating shaft 32 in a non-rotatable state. That is, the disc 35 rotates integrally with the rotating shaft 32. The diameter of the disc 35 is set smaller than the distance G V between the two pipes P.
 4枚の円板35によって3つの隙間が形成されている。図4,5に示すように、各隙間に3つのスクレーパ34が配置されている。隣り合う各2つの円板35の間には、回転軸Aと平行な揺動軸Bに沿って延びる3本の揺動シャフト37が設けられている。3本の揺動シャフト37は、回転軸Aから偏心した位置において、回転軸A回りに等間隔を空けて設けられている。各スクレーパ34は、揺動シャフト37に揺動可能な状態で連結されている。スクレーパ34は、概ね円弧状に形成されている。スクレーパ34は、例えば、アルミ合金、炭素鋼、ウレタンゴム又は真鍮で形成されている。 Three gaps are formed by the four disks 35. As shown in FIGS. 4 and 5, three scrapers 34 are disposed in each gap. Between two adjacent disks 35, three rocking shafts 37 extending along a rocking axis B parallel to the rotation axis A are provided. The three rocking shafts 37 are provided at equal intervals around the rotation axis A at a position eccentric to the rotation axis A. Each scraper 34 is swingably connected to the swing shaft 37. The scraper 34 is formed in a substantially arc shape. The scraper 34 is made of, for example, an aluminum alloy, carbon steel, urethane rubber, or brass.
 図4に示すように、スクレーパ34のうち揺動軸Bから遠い端部である先端部34aが回転軸Aに最も接近した状態においては、スクレーパ34は、2つの円板35の隙間内に完全に収容される。すなわち、スクレーパ34は、円板35の外周縁Eの内側に収容される。スクレーパ34が円板35内に収容された状態において、Z軸方向(即ち、清掃機構3の昇降方向)に見た場合の清掃ユニット4の形状は、2本の管Pの間隔Gを直径とする円内に収まっている。ここで、「外周縁Eの内側に収容される」とは、スクレーパ34が外周縁Eからはみ出さないことを意味している。つまり、スクレーパ34は、円板35の間に収容されたときに、外周縁Eと面一な状態であってもよい。 As shown in FIG. 4, when the tip 34 a of the scraper 34, which is the end far from the swing axis B, is closest to the rotation axis A, the scraper 34 completely fills the gap between the two discs 35. Housed in That is, the scraper 34 is accommodated inside the outer peripheral edge E of the disc 35. When the scraper 34 is accommodated in the disk 35, the shape of the cleaning unit 4 when viewed in the Z-axis direction (that is, the lifting and lowering direction of the cleaning mechanism 3) has a diameter G V of the two pipes P as a diameter. It is within the circle to be. Here, “to be accommodated inside the outer peripheral edge E” means that the scraper 34 does not protrude from the outer peripheral edge E. That is, the scraper 34 may be flush with the outer peripheral edge E when being accommodated between the disks 35.
 一方、図5に示すように、スクレーパ34は、回転シャフト32の遠心力によって先端部34aが回転軸Aから離れるように揺動し、回転軸Aを中心とする半径方向外側へ拡がる。このとき、スクレーパ34は、円板35の外周縁Eよりも外側へ突出する(即ち、外周縁Eから外側へはみ出す)。 On the other hand, as shown in FIG. 5, the scraper 34 swings so that the tip portion 34 a is separated from the rotation axis A by the centrifugal force of the rotating shaft 32 and spreads radially outward about the rotation axis A. At this time, the scraper 34 protrudes outward beyond the outer peripheral edge E of the disc 35 (that is, protrudes outward from the outer peripheral edge E).
 以下、特段の断りがない限り、「半径方向」とは、回転軸Aを中心とする半径方向を意味する。 Hereinafter, “radial direction” means a radial direction around the rotation axis A unless otherwise specified.
 尚、スクレーパ34が円板35内に収容された状態において、スクレーパ34が揺動シャフト37から先端部34aへ向かって延びる方向は、回転シャフト32の回転方向とは反対向きとなっている。すなわち、スクレーパ34の先端部が揺動シャフト37よりも回転シャフト32の回転方向における後方に位置する状態でスクレーパ34が円板35の外周縁Eの内側に収容される。そのため、スクレーパ34が拡がった状態で回転軸A回りに回転している際にスクレーパ34が何かに接触したとしても、スクレーパ34が円板35内に収容される方向へ揺動して、回転軸A回りのスクレーパ34の回転が維持される。 When the scraper 34 is accommodated in the disk 35, the direction in which the scraper 34 extends from the swing shaft 37 toward the tip 34a is opposite to the rotation direction of the rotary shaft 32. That is, the scraper 34 is accommodated inside the outer peripheral edge E of the disc 35 in a state where the tip end portion of the scraper 34 is positioned rearward of the swinging shaft 37 in the rotational direction of the rotary shaft 32. Therefore, even if the scraper 34 contacts something while the scraper 34 rotates around the rotation axis A in a spread state, the scraper 34 pivots in the direction to be accommodated in the disc 35, and the rotation is performed. Rotation of the scraper 34 about axis A is maintained.
 掘削部36は、図3に示すように、回転シャフト32の最も先端側に配置されている。掘削部36は、回転シャフト32に回転不能な状態で取り付けられている。つまり、掘削部36は、回転シャフト32と一体的に回転する。掘削部36は、概ね円錐状に、即ち、先鋭な形状に形成されている。掘削部36には、掘削部36によって削った切屑を逃がすための溝が形成されている。 The excavating portion 36 is disposed on the most distal side of the rotary shaft 32, as shown in FIG. The drilling portion 36 is attached to the rotating shaft 32 in a non-rotatable state. That is, the drilling unit 36 rotates integrally with the rotating shaft 32. The excavating portion 36 is formed in a substantially conical shape, that is, in a sharp shape. The digging portion 36 is formed with a groove for releasing chips scraped by the digging portion 36.
 さらに、図3,6,7に示すように、フレーム31のうち一対の縦フレーム31bのそれぞれに、ガイド5が設けられている。ガイド5は、一対の第1ブレード51A及び第2ブレード51Bを有している。ガイド5は、第1ブレード51A及び第2ブレード51Bを縦フレーム31bに連結する4つの第1~第4リンク61~64をさらに有していてもよい。第1ブレード51Aと第2ブレード51Bとは、左右対称な形状をしている。第1ブレード51A及び第2ブレード51Bは、Y軸方向におけるガイド5の外側の管Pと接触することによって、清掃機構3を案内する。第1ブレード51Aと第2ブレード51Bとを区別しない場合には、単に「ブレード51」と称する。第1~第4リンク61~64は全て、同じ形状をしている。第1リンク61、第2リンク62、第3リンク63及び第4リンク64のそれぞれを区別しない場合には、単に「リンク6」と称する。 Furthermore, as shown in FIGS. 3, 6 and 7, guides 5 are provided on each of the pair of vertical frames 31 b of the frame 31. The guide 5 has a pair of first blades 51A and a second blade 51B. The guide 5 may further include four first to fourth links 61 to 64 that connect the first blade 51A and the second blade 51B to the vertical frame 31b. The first blade 51A and the second blade 51B have symmetrical shapes in the left-right direction. The first blade 51A and the second blade 51B guide the cleaning mechanism 3 by coming into contact with the pipe P outside the guide 5 in the Y-axis direction. When the first blade 51A and the second blade 51B are not distinguished from one another, they are simply referred to as "blade 51". The first to fourth links 61 to 64 all have the same shape. When the first link 61, the second link 62, the third link 63, and the fourth link 64 are not distinguished from one another, they are simply referred to as "link 6".
 各ブレード51は、Z軸方向に延びる形状をしている。各ブレード51は、Y軸方向の外側(即ち、フレーム31のY軸方向中央から遠い側)に概ねZ軸方向に延びるエッジ53を有している。エッジ53が、管Pと接触する。エッジ53のうちZ軸方向の両端部は、図6,7に示すように、先端側ほどY軸方向の内側に位置するようにZ軸に対して傾斜している。XY平面(即ち、清掃機構3の進行方向と直交する平面)によるエッジ53の断面形状は、図8に示すように、Y軸方向外側に向かって細くなる(即ち、Y軸方向外側に位置する管Pに近いほど細い)先鋭な形状となっている。各ブレード51には、第1~第4リンク61~64が連結されている。 Each blade 51 has a shape extending in the Z-axis direction. Each blade 51 has an edge 53 extending generally in the Z-axis direction on the outer side in the Y-axis direction (that is, the side far from the center of the frame 31 in the Y-axis direction). An edge 53 contacts the pipe P. As shown in FIGS. 6 and 7, both ends of the edge 53 in the Z-axis direction are inclined with respect to the Z-axis so as to be positioned inside in the Y-axis direction toward the tip end side. The cross-sectional shape of the edge 53 according to the XY plane (that is, a plane orthogonal to the traveling direction of the cleaning mechanism 3) becomes thinner toward the Y axis direction outer side (that is, located outside the Y axis direction) as shown in FIG. The closer to the pipe P, the thinner the tip). First to fourth links 61 to 64 are connected to each blade 51.
 各リンク6の長手方向中央部は、縦フレーム31bに回転自在に取り付けられている。第1リンク61と第2リンク62とは、同じ回転軸Cに取り付けられている。第3リンク63と第4リンク64とは、同じ回転軸Dに取り付けられている。各リンク6の長手方向一端部(以下、「第1端部」と称する)が第1ブレード51Aに連結され、各リンク6の長手方向他端部(以下、「第2端部」と称する)が第2ブレード51Bに連結されている。 The longitudinal center of each link 6 is rotatably attached to the vertical frame 31 b. The first link 61 and the second link 62 are attached to the same rotation axis C. The third link 63 and the fourth link 64 are attached to the same rotation axis D. One longitudinal end (hereinafter referred to as "first end") of each link 6 is connected to the first blade 51A, and the other longitudinal end (hereinafter referred to as "second end") of each link 6 Is connected to the second blade 51B.
 詳しくは、第1リンク61の第1端部61aは、第1ブレード51Aに形成された、Z軸方向に延びる長孔54に、回転自在且つ長孔54内を摺動可能に取り付けられている。第1リンク61の第2端部61bは、第2ブレード51Bに回転自在に取り付けられている。第2リンク62の第1端部62aは、第1ブレード51Aに回転自在に取り付けられている。第2リンク62の第2端部62bは、第2ブレード51Bに形成された、Z軸方向に延びる長孔54に、回転自在且つ長孔54内を摺動可能に取り付けられている。 Specifically, the first end 61a of the first link 61 is rotatably and slidably mounted in the elongated hole 54 in the elongated hole 54 formed in the first blade 51A and extending in the Z-axis direction. . The second end 61b of the first link 61 is rotatably attached to the second blade 51B. The first end 62a of the second link 62 is rotatably attached to the first blade 51A. The second end 62 b of the second link 62 is rotatably and slidably attached to the inside of the elongated hole 54 in the elongated hole 54 formed in the second blade 51 B and extending in the Z-axis direction.
 同様に、第3リンク63の第1端部63aは、第1ブレード51Aに形成された、Z軸方向に延びる長孔54に、回転自在且つ長孔54内を摺動可能に取り付けられている。第3リンク63の第2端部63bは、第2ブレード51Bに回転自在に取り付けられている。第4リンク64の第1端部64aは、第1ブレード51Aに回転自在に取り付けられている。第4リンク64の第2端部64bは、第2ブレード51Bに形成された、Z軸方向に延びる長孔54に、回転自在且つ長孔54内を摺動可能に取り付けられている。 Similarly, the first end 63a of the third link 63 is rotatably and slidably attached to the elongated hole 54 formed in the first blade 51A and extending in the Z-axis direction. . The second end 63b of the third link 63 is rotatably attached to the second blade 51B. The first end 64a of the fourth link 64 is rotatably attached to the first blade 51A. The second end 64 b of the fourth link 64 is rotatably attached to an elongated hole 54 formed in the second blade 51 B and extending in the Z-axis direction so as to be slidable in the elongated hole 54.
 第1リンク61及び第2リンク62は、第1リンク61の第1端部61aと第2リンク62の第2端部62bとがY軸方向に離れ且つ、第1リンク61の第2端部61bと第2リンク62の第1端部62aとがY軸方向に離れるように、コイルバネ(図示省略)によって回転軸C回りに付勢されている。 In the first link 61 and the second link 62, the first end 61a of the first link 61 and the second end 62b of the second link 62 are separated in the Y-axis direction, and the second end of the first link 61 A coil spring (not shown) urges the first end 62 a of the second link 62 and the first end 62 a of the second link 62 around the rotation axis C by a coil spring (not shown).
 同様に、第3リンク63及び第4リンク64は、第3リンク63の第1端部63aと第4リンク64の第2端部64bとがY軸方向に離れ且つ、第3リンク63の第2端部63bと第4リンク64の第1端部64aとがY軸方向に離れるように、コイルバネ(図示省略)によって回転軸D回りに付勢されている。 Similarly, in the third link 63 and the fourth link 64, the first end 63 a of the third link 63 and the second end 64 b of the fourth link 64 are separated in the Y-axis direction. A coil spring (not shown) urges the two end 63 b and the first end 64 a of the fourth link 64 around the rotation axis D so as to be separated in the Y-axis direction.
 こうして、第1ブレード51A及び第2ブレード51Bは、Z軸方向に延びる姿勢を維持したまま、Y軸方向へ互いに離れるように付勢されている。つまり、第1ブレード51A及び第2ブレード51Bは、Y軸方向においてガイド5の外側に位置する管Pにエッジ53を押し付けるように付勢されている。尚、第1ブレード51A及び第2ブレード51Bは、Y軸方向に移動する際にZ軸方向にも移動する。図7に示すように、第1ブレード51A及び第2ブレード51Bは、最も拡がった状態においては、フレーム31よりもY軸方向へ拡がっている。尚、係止部31cは、前述のように移動する第1ブレード51A及び第2ブレード51B並びに第1~第4リンク61~64と干渉しない位置に配置されている。 Thus, the first blade 51A and the second blade 51B are urged away from each other in the Y-axis direction while maintaining the posture extending in the Z-axis direction. That is, the first blade 51A and the second blade 51B are biased so as to press the edge 53 against the pipe P located outside the guide 5 in the Y-axis direction. The first blade 51A and the second blade 51B also move in the Z-axis direction when moving in the Y-axis direction. As shown in FIG. 7, the first blade 51 </ b> A and the second blade 51 </ b> B extend in the Y axis direction more than the frame 31 in the most expanded state. The locking portion 31c is disposed at a position not to interfere with the first blade 51A and the second blade 51B, which move as described above, and the first to fourth links 61 to 64.
 このように構成された清掃機構3は、図1,2に示すように、ケース12内に収容可能となっている。Y軸方向へ最も拡がった状態における一対のブレード51の両エッジ53間の距離は、ケース12のY軸方向寸法よりも大きい。つまり、清掃機構3がケース12内に収容された状態においては、一対のブレード51がY軸方向内側へ縮まった状態となり、両エッジ53がケース12の内面に接触している。これにより、清掃機構3は、ケース12内においてY軸方向の位置が決められる。 The cleaning mechanism 3 configured in this way can be accommodated in the case 12 as shown in FIGS. The distance between the two edges 53 of the pair of blades 51 in the state of being most expanded in the Y-axis direction is larger than the dimension of the case 12 in the Y-axis direction. That is, in the state where the cleaning mechanism 3 is accommodated in the case 12, the pair of blades 51 is contracted inward in the Y-axis direction, and the two edges 53 are in contact with the inner surface of the case 12. As a result, the position of the cleaning mechanism 3 in the Y-axis direction in the case 12 is determined.
 続いて、清掃装置100の動作について説明する。図9は、清掃機構3が管Pを清掃している状態をX軸方向に見た図である。 Subsequently, the operation of the cleaning device 100 will be described. FIG. 9 is a view of the cleaning mechanism 3 cleaning the pipe P as viewed in the X-axis direction.
 清掃装置100は、2本の管Pの間に清掃機構3を降下及び上昇させることによって、2本の管P及び、Z軸方向において2本の管Pの下方に配列された管Pを清掃する。 The cleaning device 100 cleans the two pipes P and the pipes P arranged below the two pipes P in the Z-axis direction by lowering and raising the cleaning mechanism 3 between the two pipes P. Do.
 まず、オペレータは、清掃装置100を管Pの上に載置する。オペレータは、外部コントローラ9を操作して、清掃装置100を清掃開始位置まで移動させる。例えば、清掃開始位置は、2本のクローラ21が2本の管P上に管Pと平行な状態で載り、且つ、清掃装置100が2本の管PのU軸方向の一端部に位置し、且つ、清掃機構3がV軸方向において2本の管Pの間に位置する位置である。清掃開始位置までの清掃装置100の移動は、オペレータの目視で行ってもよいし、清掃装置100のセンサが清掃開始位置を検知するようにしてもよい。オペレータの目視による場合には、外部コントローラ9からの入力は、清掃装置100の前進、後退又は旋回等の動作指令であってもよいし、それに加えて移動距離であってもよい。 First, the operator places the cleaning device 100 on the pipe P. The operator operates the external controller 9 to move the cleaning device 100 to the cleaning start position. For example, in the cleaning start position, two crawlers 21 are mounted on two pipes P in parallel with the pipe P, and the cleaning device 100 is located at one end of the two pipes P in the U-axis direction. And, it is a position where the cleaning mechanism 3 is positioned between the two pipes P in the V-axis direction. The movement of the cleaning device 100 to the cleaning start position may be performed visually by the operator, or a sensor of the cleaning device 100 may detect the cleaning start position. In the case of visual observation by the operator, the input from the external controller 9 may be an operation command such as forward, backward or turning of the cleaning device 100, or may be a movement distance.
 清掃装置100が清掃開始位置まで移動すると、オペレータは、外部コントローラ9を介して清掃開始の指令を入力する。 When the cleaning device 100 moves to the cleaning start position, the operator inputs a cleaning start instruction via the external controller 9.
 本体コントローラ8は、清掃開始の指令を受けると、清掃機構3の回転シャフト32を回転駆動させ、この状態で清掃機構3を昇降機構7によって2本の管Pの間に降下させる。回転シャフト32の回転による遠心力によってスクレーパ34が回転軸Aを中心とする半径方向外側に拡がる。 When the main body controller 8 receives a command to start cleaning, the rotary shaft 32 of the cleaning mechanism 3 is rotationally driven, and the cleaning mechanism 3 is lowered between the two pipes P by the elevation mechanism 7 in this state. The centrifugal force caused by the rotation of the rotary shaft 32 spreads the scraper 34 radially outward around the rotation axis A.
 スクレーパ34は遠心力によって拡がるので、十分なスペースが存在しない場合には、スクレーパ34は最大には拡がらず、可能な範囲で拡がる。つまり、スクレーパ34の半径方向外側のスペースがZ軸方向位置によって異なる場合、スクレーパ34は、半径方向外側のスペースに応じて拡がりを変化させながら降下していく。清掃機構3が管群Q内を降下する場合、図9に示すように、スクレーパ34の半径方向外側に管Pが存在しない位置、又は、スクレーパ34の半径方向外側に管Pが存在するもののスクレーパ34が届かない位置においては、スクレーパ34は、最大限拡がった状態となる(図9における第1清掃ユニット4Aの比較的上部のスクレーパ34を参照)。スクレーパ34の半径方向外側に管Pが存在し且つスクレーパ34が管Pに届く位置においては、スクレーパ34が管Pに接触する状態まで拡がる(図9における第1清掃ユニット4Aの比較的下部のスクレーパ34及び第2清掃ユニット4Bのスクレーパ34を参照)。その結果、スクレーパ34は、管Pの横を通過する際に、管Pの表面形状に倣って半径方向への拡がりを変更しながら管Pの表面に接触する。 Since the scraper 34 spreads by centrifugal force, if there is not enough space, the scraper 34 will not spread to the maximum and will spread as far as possible. That is, when the radially outer space of the scraper 34 differs depending on the position in the Z-axis direction, the scraper 34 descends while changing the spread according to the radially outer space. When the cleaning mechanism 3 descends in the pipe group Q, as shown in FIG. 9, the position where the pipe P does not exist radially outside the scraper 34, or the pipe P exists radially outside the scraper 34, but the scraper In the position where 34 does not reach, the scraper 34 is in the state of being expanded to the maximum (see the scraper 34 of the relatively upper part of the first cleaning unit 4A in FIG. 9). In the position where the pipe P exists radially outward of the scraper 34 and the scraper 34 reaches the pipe P, the scraper 34 expands to a state in contact with the pipe P (the relatively lower scraper of the first cleaning unit 4A in FIG. 34 and scraper 34 of second cleaning unit 4B). As a result, the scraper 34 contacts the surface of the pipe P while changing the radial spread according to the surface shape of the pipe P as it passes by the side of the pipe P.
 つまり、清掃機構3の進行方向に沿って配列された(即ち、W軸方向に配列された)複数の管Pの間にスクレーパ34が入り込んで、該複数の管Pの間に存在する付着物を除去すると共に該複数の管Pの表面に接触して管Pの付着物を除去する。その結果、スクレーパ34は、管Pの表面のうち、清掃機構3が通過するスペースに面している部分だけでなく、該スペースから清掃機構3の進行方向と交差する方向(例えば、V軸方向)に離れた部分(即ち、奥まった部分)に付着した付着物も除去する。 That is, the scraper 34 penetrates between the plurality of pipes P arranged along the direction of movement of the cleaning mechanism 3 (that is, arranged in the W-axis direction), and the deposits existing between the plurality of pipes P And contact with the surfaces of the plurality of tubes P to remove deposits on the tubes P. As a result, the scraper 34 not only has a portion of the surface of the pipe P facing the space through which the cleaning mechanism 3 passes, but also a direction (for example, the V-axis direction) intersecting the advancing direction of the cleaning mechanism 3 from the space. The deposit adhering to the part (that is, the recessed part) away from is also removed.
 好ましくは、スクレーパ34が最も拡がった状態におけるスクレーパ34の外接円F(図5参照)の直径は、V軸方向に並ぶ2つの管Pの軸心間の距離よりも大きく設定されている。これにより、スクレーパ34は、管Pの側方をW軸方向に通過することによって、管Pの表面のうち概ね半周部分の付着物を除去することができる。 Preferably, the diameter of the circumscribed circle F (see FIG. 5) of the scraper 34 in the most expanded state of the scraper 34 is set larger than the distance between the axes of the two tubes P aligned in the V-axis direction. Thereby, the scraper 34 can remove the deposit | attachment of the substantially semicircle part among the surfaces of the pipe | tube P by passing the side of the pipe | tube P to the W-axis direction.
 こうして、スクレーパ34は、管Pの表面に付着した付着物を削り落としていく。 Thus, the scraper 34 scrapes off deposits attached to the surface of the pipe P.
 このとき、スクレーパ34は、2枚の円板35の間に配置されている。そのため、清掃ユニット4の回転時やスクレーパ34が管P等の他の物体と接触したときに、スクレーパ34のZ軸方向へのぶれを円板35によって低減することができる。 At this time, the scraper 34 is disposed between the two discs 35. Therefore, when the cleaning unit 4 rotates or when the scraper 34 contacts with another object such as the pipe P, the shake of the scraper 34 in the Z-axis direction can be reduced by the disc 35.
 また、清掃機構3が狭い隙間を通過する際にはスクレーパ34の拡がりが抑えられる。スクレーパ34の拡がりが最小となったときにはスクレーパ34が円板35内に収容される。すなわち、Z軸方向を向いて見た場合に清掃ユニット4の最小外形は、円板35の外形である。ここで、円板35が無ければ、清掃ユニット4の最小外形は、先端部が回転シャフト32に接近した3つのスクレーパ34の外縁によって形成される(図4において円板35を省略した状態)。この場合の清掃ユニット4の最小外形は、完全な円ではなく、隣り合う2つのスクレーパ34の間に凹部が形成され、全体として凹凸を有している。このような凹凸を有する回転体である清掃ユニット4が管P等に接触すると、管P等からの反発が大きくなる。それに対し、円板35が設けられていることによって、清掃ユニット4が管P等に接触した際の反発を低減することができる。 Further, when the cleaning mechanism 3 passes through the narrow gap, the spread of the scraper 34 is suppressed. The scraper 34 is accommodated in the disc 35 when the spread of the scraper 34 is minimized. That is, the minimum outer shape of the cleaning unit 4 when viewed in the Z-axis direction is the outer shape of the disc 35. Here, if there is no disc 35, the minimum outer shape of the cleaning unit 4 is formed by the outer edges of the three scrapers 34 whose tip approaches the rotating shaft 32 (in the state where the disc 35 is omitted in FIG. 4). The minimum outer shape of the cleaning unit 4 in this case is not a complete circle, but a recess is formed between two adjacent scrapers 34, and has an overall unevenness. When the cleaning unit 4 which is a rotating body having such irregularities is in contact with the pipe P and the like, the repulsion from the pipe P and the like becomes large. On the other hand, by providing the disc 35, it is possible to reduce the repulsion when the cleaning unit 4 contacts the pipe P and the like.
 ここで、清掃機構3が2本の管Pの間を降下していく際に、清掃機構3の進行方向の前方(即ち、清掃機構3の下方)に灰等の付着物が存在している場合がある。例えば、管Pの表面の付着物の厚みが増大すると、付着物で覆われた2本の管PのV軸方向の間隔が小さくなる。付着物が多い場合には、2本の管PのV軸方向の間隔が付着物で埋まっていることがあるかもしれない。この間隔が円板35の直径やフレーム31のY軸方向寸法よりも小さくなると、清掃機構3が降下する際に円板35及びフレーム31が付着物に干渉し、清掃機構3の降下が阻害される。スクレーパ34は、円板35から半径方向外側の付着物を除去することができるが、円板35の下方の付着物を除去することはできない。それに対し、清掃ユニット4の先端には、掘削部36が設けられている。掘削部36は、清掃機構3が降下する際に、回転シャフト32と一体的に回転している。そのため、清掃機構3が降下する際に清掃機構3の下方に存在する付着物を掘削部36が掘削していく。これにより、清掃機構3を円滑に降下させることができる。 Here, when the cleaning mechanism 3 descends between the two pipes P, a deposit such as ash is present on the front side (that is, below the cleaning mechanism 3) in the advancing direction of the cleaning mechanism 3 There is a case. For example, when the thickness of the deposit on the surface of the tube P increases, the distance between the two tubes P covered with the deposit in the V-axis direction decreases. If there is a large amount of deposits, the distance between the two tubes P in the V-axis direction may be filled with the deposits. If this interval becomes smaller than the diameter of the disc 35 or the dimension in the Y-axis direction of the frame 31, the disc 35 and the frame 31 interfere with the deposit when the cleaning mechanism 3 descends, and the descent of the cleaning mechanism 3 is inhibited. Ru. The scraper 34 can remove deposits on the radially outer side from the disc 35 but can not remove deposits on the lower side of the disc 35. On the other hand, a digging portion 36 is provided at the tip of the cleaning unit 4. The digging portion 36 rotates integrally with the rotating shaft 32 when the cleaning mechanism 3 descends. Therefore, when the cleaning mechanism 3 descends, the digging portion 36 excavates the deposit present below the cleaning mechanism 3. Thereby, the cleaning mechanism 3 can be lowered smoothly.
 さらに、清掃機構3が管群Q内を進行する際には、ガイド5が清掃機構3を案内している。詳しくは、ガイド5の第1ブレード51A及び第2ブレード51Bは、Y軸方向において互いに離間する方向へ付勢されている。そのため、第1ブレード51Aは、V軸方向一方側の管Pに接触し、第2ブレード51Bは、V軸方向他方側の管Pに接触する。こうして、清掃機構3は、V軸方向両側に位置する管Pに対してV軸方向位置が決められる。具体的には、清掃機構3は、V軸方向に並ぶ管PのV軸方向中央に位置決めされる。さらに、管Pに接触する第1ブレード51A及び第2ブレード51Bのエッジ53の断面形状がY軸方向外側に向かって先鋭な形状となっているので、管Pの表面に付着物が付着していたとしても、エッジ53は、付着物に切れ込んで管Pの表面に接触しやすくなる。これにより、清掃機構3の位置決め精度が向上する。 Furthermore, when the cleaning mechanism 3 advances in the pipe group Q, the guide 5 guides the cleaning mechanism 3. Specifically, the first blade 51A and the second blade 51B of the guide 5 are biased in the direction away from each other in the Y-axis direction. Therefore, the first blade 51A contacts the pipe P on one side in the V-axis direction, and the second blade 51B contacts the pipe P on the other side in the V-axis direction. Thus, the position of the cleaning mechanism 3 in the V-axis direction is determined with respect to the pipes P located on both sides in the V-axis direction. Specifically, the cleaning mechanism 3 is positioned at the center in the V axis direction of the tubes P aligned in the V axis direction. Furthermore, since the cross-sectional shape of the edge 53 of the first blade 51A and the second blade 51B in contact with the pipe P is sharp toward the outside in the Y-axis direction, deposits adhere to the surface of the pipe P Even so, the edge 53 cuts into the deposit and tends to come in contact with the surface of the pipe P. Thereby, the positioning accuracy of the cleaning mechanism 3 is improved.
 尚、第1ブレード51A及び第2ブレード51Bのエッジ53のうちZ軸方向の両端部は、先端側ほどY軸方向の内側に位置するように傾斜している。すなわち、即ち、第1ブレード51A及び第2ブレード51Bの両エッジ53のY軸方向の距離は、先端側ほど短くなっている。そのため、第1ブレード51A及び第2ブレード51Bが2本の管Pの間に進入する際には、第1ブレード51A及び第2ブレード51BのZ軸方向の端部が管Pに引っかかることなく、第1ブレード51A及び第2ブレード51Bが2本の管Pの間に円滑に進入していく。 Incidentally, both ends in the Z-axis direction of the edges 53 of the first blade 51A and the second blade 51B are inclined so as to be positioned inside in the Y-axis direction toward the tip end side. That is, in other words, the distance in the Y-axis direction between both edges 53 of the first blade 51A and the second blade 51B is shorter toward the tip end. Therefore, when the first blade 51A and the second blade 51B enter between the two pipes P, the ends in the Z-axis direction of the first blade 51A and the second blade 51B do not get caught in the pipe P, The first blade 51A and the second blade 51B smoothly enter between the two pipes P.
 清掃機構3は、清掃対象の管Pのうち最も下方の管Pを清掃ユニット4が通過するまで降下すると、昇降機構7によって上昇させられる。この清掃機構3の最下位への到達は、オペレータの目視で確認してもよいし、清掃装置3にセンサを設けて、センサによって検出するようにしてもよい。あるいは、清掃開始時にオペレータが清掃機構3の降下する距離を入力するようにしてもよい。 The cleaning mechanism 3 is raised by the elevating mechanism 7 when the cleaning unit 4 descends until the cleaning unit 4 passes the lowermost one of the pipes P to be cleaned. The arrival of the cleaning mechanism 3 in the lowermost position may be confirmed visually by the operator, or a sensor may be provided in the cleaning device 3 and detected by the sensor. Alternatively, the operator may input the lowering distance of the cleaning mechanism 3 at the start of cleaning.
 清掃機構3が上昇する際にも、スクレーパ34は、管Pの表面形状に倣って半径方向への拡がりを変更しながら管Pの表面に接触し、管Pの表面に付着した付着物を削り落としていく。つまり、清掃機構3は、降下時と上昇時との両方で、管Pの表面をスクレーパ34で清掃する。 Even when the cleaning mechanism 3 ascends, the scraper 34 contacts the surface of the pipe P while changing the radial expansion according to the surface shape of the pipe P, and scrapes the deposit adhering to the surface of the pipe P I will drop it. That is, the cleaning mechanism 3 cleans the surface of the pipe P with the scraper 34 both at the time of descent and at the time of ascent.
 清掃機構3には、X軸方向に並ぶ3つの清掃ユニット4が設けられているので、清掃機構3の1回の降下及び上昇によって、管PのうちU軸方向位置が異なる3箇所が清掃される。 Since the cleaning mechanism 3 is provided with three cleaning units 4 aligned in the X-axis direction, three lowering of the position in the U-axis direction in the pipe P is cleaned by one lowering and raising of the cleaning mechanism 3. Ru.
 清掃機構3の上下の往復が終了すると、清掃装置100は、2本の管Pに沿ってU軸方向へ所定量だけ移動する。その後、清掃機構3は、再度、降下及び上昇を実行する。つまり、清掃機構3は、管Pのうち、先の清掃機構3の降下及び上昇時とはU軸方向位置が異なる部分を清掃する。このように、装置本体1は、走行機構2の走行によって管群Qに含まれる少なくとも2本の管Pに沿った移動と停止とを繰り返し、清掃機構3は、装置本体1が停止した位置において昇降して少なくとも2本の管Pを清掃する。 When the upward and downward reciprocation of the cleaning mechanism 3 is completed, the cleaning device 100 moves along the two pipes P by a predetermined amount in the U-axis direction. After that, the cleaning mechanism 3 performs the lowering and the raising again. That is, the cleaning mechanism 3 cleans a portion of the pipe P in which the position in the U-axis direction is different from that at which the cleaning mechanism 3 descends and rises earlier. Thus, the apparatus body 1 repeatedly moves and stops along at least two pipes P included in the pipe group Q as the traveling mechanism 2 travels, and the cleaning mechanism 3 is at the position where the apparatus body 1 is stopped. Move up and down to clean at least two pipes P.
 尚、この清掃装置100のU軸方向への移動は、清掃機構3の上昇が完了したときに清掃装置100が自動で行ってもよいし、オペレータが外部コントローラ9を介して指令を入力することによって行ってもよい。 The movement of the cleaning device 100 in the U-axis direction may be performed automatically by the cleaning device 100 when the lifting of the cleaning mechanism 3 is completed, or the operator may input a command via the external controller 9. You may go by.
 こうして、清掃装置100は、U軸方向の位置を変更しながら、清掃機構3の降下及び上昇を繰り返す。清掃装置100は、清掃装置100が載置された2本の管PのU軸方向の一端部から他端部までの移動を終了すると、清掃装置100が載置された2本の管Pの間における清掃を終了する。 Thus, the cleaning device 100 repeats lowering and raising of the cleaning mechanism 3 while changing the position in the U-axis direction. When the cleaning device 100 finishes moving the two pipes P on which the cleaning device 100 is mounted from one end to the other end in the U-axis direction, the cleaning device 100 is mounted on the two pipes P on which the cleaning device 100 is mounted. Finish the cleaning in between.
 尚、2本の管PのU軸方向の他端部への清掃装置100の到達は、オペレータが目視で確認してもよいし、清掃装置100に設けられたセンサで検出してもよい。あるいは、清掃開始時にオペレータが清掃装置100のU軸方向への移動距離を入力するようにしてもよい。 The arrival of the cleaning device 100 at the other end in the U-axis direction of the two pipes P may be confirmed visually by the operator or may be detected by a sensor provided in the cleaning device 100. Alternatively, the operator may input the moving distance of the cleaning device 100 in the U-axis direction at the start of cleaning.
 続いて、清掃装置100は、V軸方向へ移動し、清掃機構3を異なる2本の管Pの間に配置させる。詳しくは、清掃装置100は、2本のクローラ21が管Pと平行な状態から2本のクローラ21が管Pと略直交する状態まで旋回する。そして、清掃装置100は、管Pを横断して、清掃が終了した2本の管Pの間の隣りの2本の管Pの間に清掃機構3が位置するようになるまで移動する。清掃機構3が隣りの2本の管Pの間に移動すると、清掃装置100は、2本のクローラ21が管Pと平行な状態まで旋回する。旋回後、清掃装置100は、2本の管PのU軸方向の端部まで移動する。尚、新たな2本の管Pの一方は、先に清掃が終了した2本の管Pの一方の管Pである。 Subsequently, the cleaning device 100 is moved in the V-axis direction, and the cleaning mechanism 3 is disposed between two different pipes P. Specifically, the cleaning device 100 turns from the state in which the two crawlers 21 are parallel to the pipe P to the state in which the two crawlers 21 are substantially orthogonal to the pipe P. Then, the cleaning device 100 moves across the pipes P until the cleaning mechanism 3 is positioned between the two adjacent pipes P between the two pipes P whose cleaning has been completed. When the cleaning mechanism 3 moves between the two adjacent pipes P, the cleaning device 100 turns so that the two crawlers 21 are parallel to the pipe P. After pivoting, the cleaning device 100 moves to the end in the U-axis direction of the two pipes P. In addition, one of the two new pipes P is one pipe P of the two pipes P whose cleaning has already been completed.
 そして、清掃装置100は、新たな2本の管P及びその下方の管Pに対して前述と同様の清掃を行う。こうして、清掃装置100は、清掃装置100が載置される2本の管Pを変更しながら前述の清掃を繰り返すことによって、管群Qに含まれる管Pの清掃を行う。 Then, the cleaning device 100 cleans the two new pipes P and the lower pipe P in the same manner as described above. Thus, the cleaning device 100 cleans the pipes P included in the pipe group Q by repeating the above-described cleaning while changing the two pipes P on which the cleaning device 100 is placed.
 ここで、一組の管Pの間の清掃終了後の清掃装置100の旋回、清掃装置100の管Pの横断、清掃装置100の再旋回、及び、別の一組の管PのU軸方向端部への清掃装置100の移動は、清掃装置100が自動で行ってもよいし、オペレータが外部コントローラ9を介して指令を入力することによって行ってもよい。オペレータが指令を入力する場合には、清掃装置100の旋回、横断、再旋回及び移動の全てを1度の指令で行ってもよいし、清掃装置100の旋回、横断、再旋回及び移動の動作ごとに指令が入力されてもよい。 Here, the pivoting of the cleaning device 100 after the end of cleaning between one set of pipes P, the crossing of the pipe P of the cleaning device 100, the re-pivoting of the cleaning device 100, and the U axis direction of another set of pipes P. The movement of the cleaning device 100 to the end may be performed automatically by the cleaning device 100 or may be performed by the operator inputting a command via the external controller 9. When the operator inputs a command, all of the turning, crossing, re-turning and moving of the cleaning device 100 may be performed by one command, and the operation of the turning, crossing, re-turning and moving of the cleaning device 100 A command may be input every time.
 続いて、清掃装置100の移動についてさらに詳しく説明する。図10は、管Pと平行に移動する清掃装置100をX軸方向に見た図である。図11は、管Pと平行に移動する清掃装置100をZ軸方向に見た図である。図12は、管P上で旋回する清掃装置100をX軸方向に見た図である。図13は、管P上で旋回する清掃装置100をZ軸方向に見た図である。尚、図11,13においては、清掃装置100を模式的に図示している。また、図11,13においては、3つの清掃ユニット4のうち、清掃装置100が載置された管PとW軸方向位置が同じ清掃ユニット4のみを図示している。 Subsequently, the movement of the cleaning device 100 will be described in more detail. FIG. 10 is a view of the cleaning device 100 moving in parallel with the pipe P as viewed in the X-axis direction. FIG. 11 is a view of the cleaning device 100 moving in parallel with the pipe P as viewed in the Z-axis direction. FIG. 12 is a view of the cleaning device 100 pivoting on the pipe P as viewed in the X-axis direction. FIG. 13 is a view of the cleaning device 100 pivoting on the pipe P as viewed in the Z-axis direction. 11 and 13 schematically show the cleaning device 100. Moreover, in FIG. 11, 13, among the three cleaning units 4, only the cleaning unit 4 with the same pipe | tube P and W axial direction position in which the cleaning apparatus 100 was mounted is shown in figure.
 前述の如く、清掃装置100が管群Qに含まれる管Pを清掃する際には、清掃装置100は、管Pの上を走行する。管Pの表面には付着物が付着しているので、クローラ21が滑って空転し得る。そのため、清掃装置100を所望の位置まで走行させることが困難な場合もあり得る。そこで、清掃装置100は、清掃ユニット4を走行時のガイドに用いることによって、所望の位置までの移動を実現している。 As described above, when the cleaning device 100 cleans the pipe P included in the pipe group Q, the cleaning device 100 travels on the pipe P. Since the deposit adheres to the surface of the pipe P, the crawler 21 can slip and slip. Therefore, it may be difficult to drive the cleaning device 100 to a desired position. Therefore, the cleaning device 100 achieves movement to a desired position by using the cleaning unit 4 as a guide during traveling.
 基本的には、清掃装置100は、管P上を移動する際には、清掃ユニット4が管Pと干渉しないように、図2に示すように清掃ユニット4を引き上げた状態(清掃ユニット4が走行機構2から下方に突出していない状態)で移動する。 Basically, when the cleaning device 100 moves on the pipe P, the cleaning unit 4 is pulled up as shown in FIG. 2 so that the cleaning unit 4 does not interfere with the pipe P (the cleaning unit 4 It moves in a state where it does not project downward from the traveling mechanism 2).
 ただし、管PのU軸方向位置が異なる部分を清掃するために清掃装置100が2本の管Pに沿ってU軸方向へ移動する際には、清掃装置100は、図10に示すように、清掃ユニット4を走行機構2よりも下方に突出させ、清掃装置100が載置された2本の管Pの間に進入させた状態で走行する。清掃ユニット4が2本の管Pの間に進入しているので、清掃装置100は、図11に示すように、2本の管Pに沿って移動する際にV軸方向へ逸れていくことが規制される。つまり、清掃ユニット4は、清掃装置100が管Pと平行に移動する際のガイドとして機能する。 However, when the cleaning device 100 moves in the U-axis direction along the two pipes P in order to clean the portions in which the pipe P in the U-axis direction is different, the cleaning device 100 as shown in FIG. The cleaning unit 4 is protruded below the traveling mechanism 2 and travels in a state where the cleaning unit 4 is advanced between the two pipes P on which the cleaning device 100 is mounted. Since the cleaning unit 4 enters between the two pipes P, the cleaning device 100 is deviated in the V-axis direction when moving along the two pipes P as shown in FIG. Is regulated. That is, the cleaning unit 4 functions as a guide when the cleaning device 100 moves in parallel with the pipe P.
 このとき、複数の清掃ユニット4が2本の管Pの間に進入した状態となっていることが好ましい。清掃機構3では第1清掃ユニット4Aと第3清掃ユニット4CのZ軸方向位置が同じなので、第1清掃ユニット4A及び第3清掃ユニット4Cが2本の管Pの間に進入させられる。X軸方向に並ぶ複数の清掃ユニット4が2本の管Pの間に進入しているので、清掃装置100は、2本の管Pに沿って移動する際にZ軸回りの回転が規制される。 At this time, it is preferable that a plurality of cleaning units 4 are in a state of entering between two pipes P. In the cleaning mechanism 3, since the first cleaning unit 4A and the third cleaning unit 4C have the same position in the Z-axis direction, the first cleaning unit 4A and the third cleaning unit 4C are made to enter between the two pipes P. Since the cleaning units 4 aligned in the X-axis direction enter between the two pipes P, the cleaning device 100 is restricted from rotating around the Z-axis when moving along the two pipes P. Ru.
 また、清掃装置100は、例えば清掃を行う2本の管Pを変更する場合のように、管Pを横切って移動する場合がある。このような場合、清掃装置100は、クローラ21が管Pに平行な状態から旋回して方向転換する必要がある。清掃装置100は、旋回を行う際には、2つのクローラ21を互いに反対方向に駆動する。つまり、一方のクローラ21がX軸方向の一方側へ進行するように駆動され、他方のクローラ21がX軸方向の他方側へ進行するように駆動される。これにより、清掃装置100は、Z軸と平行な軸回りに旋回する。しかし、クローラ21が接している管Pの表面に付着物(例えば、灰)が付着していると、クローラ21が空転して、清掃装置100がうまく旋回しない場合がある。例えば、一方のクローラ21だけが空転すると、他方のクローラ21の進行方向へ清掃装置100が移動していく。 In addition, the cleaning device 100 may move across the pipe P, for example, as in the case of changing the two pipes P that perform cleaning. In such a case, the cleaning device 100 needs to turn and change the crawler 21 from the parallel state to the pipe P. The cleaning device 100 drives the two crawlers 21 in opposite directions when turning. That is, one crawler 21 is driven to move to one side in the X-axis direction, and the other crawler 21 is driven to move to the other side in the X-axis direction. Thus, the cleaning device 100 pivots about an axis parallel to the Z axis. However, if a deposit (for example, ashes) adheres to the surface of the pipe P with which the crawler 21 is in contact, the crawler 21 may idle and the cleaning device 100 may not turn well. For example, when only one crawler 21 slips, the cleaning device 100 moves in the direction in which the other crawler 21 travels.
 これを防止するために、清掃装置100は、清掃ユニット4を1つだけ2本の管Pの間に進入させた状態で旋回を行う。清掃機構3では第2清掃ユニット4Bが第1清掃ユニット4A及び第3清掃ユニット4Cに比べて下方に突出しているので、図12に示すように、第2清掃ユニット4Bが2本の管Pの間に進入させられる。スクレーパ34は円板35内に収容可能であり、円板35の外径は、2本の管Pの間隔よりも小さい。すなわち、Z軸方向に見た場合の第2清掃ユニット4Bの外形は、2本の管Pの間隔を直径とする円内に収まっている。そのため、第2清掃ユニット4Bが2本の管Pの間に進入した状態であっても、清掃装置100は旋回することができる。尚、Z軸方向に見た場合において、フレーム31の短手方向寸法は、2本の管Pの間隔よりも小さいものの、フレーム31の長手方向寸法は、2本の管Pの間隔よりも大きい。そのため、フレーム31は、2本の管Pの間に進入していない。 In order to prevent this, the cleaning device 100 turns in a state where only one cleaning unit 4 is inserted between two pipes P. In the cleaning mechanism 3, since the second cleaning unit 4B protrudes downward relative to the first cleaning unit 4A and the third cleaning unit 4C, the second cleaning unit 4B has two pipes P as shown in FIG. It is made to enter in the meantime. The scraper 34 can be accommodated in the disc 35, and the outer diameter of the disc 35 is smaller than the distance between the two pipes P. That is, the outer shape of the second cleaning unit 4B when viewed in the Z-axis direction is within a circle whose diameter is the distance between the two pipes P. Therefore, even in a state where the second cleaning unit 4B enters between the two pipes P, the cleaning device 100 can pivot. When viewed in the Z-axis direction, the transverse direction dimension of the frame 31 is smaller than the distance between the two pipes P, but the longitudinal dimension of the frame 31 is larger than the distance between the two pipes P . Therefore, the frame 31 does not enter between the two pipes P.
 こうして、第2清掃ユニット4Bが2本の管Pの間に進入していると、一方のクローラ21の駆動力が優位であったとしても、清掃装置100は自由に移動することができない。第2清掃ユニット4Bが2本の管Pに係合し且つ2つのクローラ21の駆動力が不均衡な状態で清掃装置100が走行を継続すると、空転していたクローラ21もやがて管Pとの間に摩擦力が作用するようになり、清掃装置100が旋回するようになる。その結果、図13に示すように、清掃装置100は、その場で旋回できないとしても、2本の管Pに沿って少し移動しながら最終的には旋回していく。 In this way, when the second cleaning unit 4B enters between the two pipes P, the cleaning device 100 can not move freely even if the driving force of one of the crawlers 21 is superior. When the cleaning device 100 continues to travel with the second cleaning unit 4B engaged with the two pipes P and the driving forces of the two crawlers 21 being unbalanced, the crawler 21 which has been idled is also brought into contact with the pipe P soon. Frictional force acts between them, and the cleaning device 100 pivots. As a result, as shown in FIG. 13, even if the cleaning device 100 can not pivot on the spot, it eventually pivots while slightly moving along the two pipes P.
 そして、2本のクローラ21が管Pと概ね直交するようになると、清掃装置100は、2本の管Pの間に進入していた清掃ユニット4が2本の管Pの間から引き抜かれるように昇降機構7によって清掃機構4を上昇させる。 Then, when the two crawlers 21 are substantially orthogonal to the pipes P, the cleaning device 100 is configured such that the cleaning unit 4 that has entered between the two pipes P is pulled out from between the two pipes P. The cleaning mechanism 4 is raised by the lifting mechanism 7.
 清掃ユニット4が走行機構2から下方に突出していない状態となると、清掃装置100は、管Pを横切るように移動する。清掃装置100は、第2清掃ユニット4BがV軸方向において、次の清掃対象となる2本の管Pの間に位置するまで移動する。清掃装置100が該位置まで移動すると、清掃装置100は、第2清掃ユニット4Bだけが2本の管Pの間に進入するように清掃機構4を降下させる。この状態で、清掃装置100は、前述のように旋回を行う。このときは、清掃装置100は、2本のクローラ21が2本の管Pと平行となるまで旋回する。 When the cleaning unit 4 does not protrude downward from the traveling mechanism 2, the cleaning device 100 moves across the pipe P. The cleaning device 100 moves until the second cleaning unit 4B is positioned between the two pipes P to be cleaned next in the V-axis direction. When the cleaning device 100 moves to the position, the cleaning device 100 lowers the cleaning mechanism 4 so that only the second cleaning unit 4B enters between the two pipes P. In this state, the cleaning device 100 turns as described above. At this time, the cleaning device 100 pivots until the two crawlers 21 become parallel to the two pipes P.
 2本のクローラ21が2本の管Pと平行となると、清掃装置100は、複数の清掃ユニット4(具体的には、第1清掃ユニット4A及び第3清掃ユニット4C)が2本の管Pの間に進入するように清掃機構4を降下させる。清掃装置100は、前述のように複数の清掃ユニット4が2本の管Pの間に進入した状態で、清掃を再開する位置まで2本の管Pに沿って移動する。 When the two crawlers 21 are parallel to the two pipes P, the cleaning device 100 is configured such that the plurality of cleaning units 4 (specifically, the first cleaning unit 4A and the third cleaning unit 4C) have two pipes P. The cleaning mechanism 4 is lowered to enter during the period. The cleaning device 100 moves along the two pipes P to a position where the cleaning is resumed, with the cleaning units 4 entering between the two pipes P as described above.
 このように、清掃装置100は、清掃ユニット4をガイドとして用いる場合には、清掃ユニット4を管Pの間に進入させる際、並びに、清掃ユニット4を管Pの間に進入させた状態で旋回又は移動する際には、回転シャフト32を回転駆動している。回転シャフト32が回転していると、スクレーパ34が何かに接触した場合には、スクレーパ34にはスクレーパ34を円板35内へ収容する方向への成分が作用する。そのため、スクレーパ34が何かに接触したとしても、スクレーパ34が円板35内に収容される方向へ揺動して、スクレーパ34の回転が維持される。つまり、実質的には、円板35が管Pと接触することによって、清掃装置100の移動を規制する。尚、清掃ユニット4がガイドとして機能する際の回転シャフト32の回転速度は、清掃ユニット4が管Pの清掃する際の回転シャフト32の回転速度よりも低速に設定されている。 Thus, when using the cleaning unit 4 as a guide, the cleaning device 100 turns when the cleaning unit 4 is advanced between the pipes P and in a state where the cleaning unit 4 is advanced between the pipes P. Alternatively, when moving, the rotary shaft 32 is rotationally driven. When the rotating shaft 32 is rotating, when the scraper 34 contacts something, a component acts on the scraper 34 in the direction to accommodate the scraper 34 in the disc 35. Therefore, even if the scraper 34 contacts something, the scraper 34 is swung in the direction of being accommodated in the disc 35, and the rotation of the scraper 34 is maintained. That is, the movement of the cleaning device 100 is substantially restricted by the contact of the disc 35 with the pipe P. The rotational speed of the rotary shaft 32 when the cleaning unit 4 functions as a guide is set to a lower speed than the rotational speed of the rotary shaft 32 when the cleaning unit 4 cleans the pipe P.
 以上のように、清掃装置100は、装置本体1と、装置本体1に設けられ、管群Qに含まれる少なくとも2本の管Pの上を走行する走行機構2と、装置本体1から昇降して、走行機構2よりも下方に位置する管Pの表面の付着物を清掃する清掃機構3とを備え、走行機構2は、清掃機構3が少なくとも2本の管Pの間に進入した状態で少なくとも2本の管Pの上で旋回する。 As described above, the cleaning device 100 is moved up and down from the device body 1 and the traveling mechanism 2 provided on the device body 1 and traveling on at least two pipes P included in the tube group Q. And the cleaning mechanism 3 for cleaning deposits on the surface of the pipe P located below the traveling mechanism 2, and the traveling mechanism 2 is in a state where the cleaning mechanism 3 enters between at least two pipes P. It pivots on at least two pipes P.
 この構成によれば、2本の管Pの上に付着物等が存在して走行機構2が2本の管P上を滑って適切に走行できない場合であっても、清掃機構3が2本の管Pの間に進入しているので、走行機構2が無制限に走行してしまうことがない。少なくとも清掃機構3が2本の管Pの間に進入した状態が維持されるので、走行機構2による旋回走行を継続していると、やがて、走行機構2の滑りが緩和又は解消されて、走行機構2は旋回することができる。 According to this configuration, two cleaning mechanisms 3 are provided even when there are deposits or the like on the two tubes P and the traveling mechanism 2 can not travel properly by sliding on the two tubes P. Since it has entered between the pipes P, the traveling mechanism 2 never travels without restriction. Since the state where at least the cleaning mechanism 3 has entered between the two pipes P is maintained, if the turning movement by the traveling mechanism 2 is continued, the slip of the traveling mechanism 2 is alleviated or eliminated in the end, and the traveling is continued The mechanism 2 can pivot.
 また、清掃機構3は、管Pの表面の付着物を除去する清掃ユニット4(清掃部)と、清掃ユニット4よりも上方に位置し、清掃ユニット4を支持するフレーム31(支持部)とを有し、清掃機構3の昇降方向に見た場合に、清掃ユニット4の形状は、2本の管Pの間隔Gを直径とする円に収まっている一方、フレーム31の形状は、2本の管Pの間隔Gを直径とする円からはみ出ており、走行機構2が旋回する際には、フレーム31が少なくとも2本の管Pの間に進入しておらず、且つ、清掃ユニット4が少なくとも2本の管Pの間に進入した状態となっている。 In addition, the cleaning mechanism 3 includes a cleaning unit 4 (cleaning unit) for removing deposits on the surface of the pipe P, and a frame 31 (supporting unit) positioned above the cleaning unit 4 and supporting the cleaning unit 4. When viewed in the elevating direction of the cleaning mechanism 3, the shape of the cleaning unit 4 is contained in a circle having a diameter G V between the two pipes P, while the shape of the frame 31 is two and it protrudes a distance G V of the pipe P from the circle to the diameter, when the traveling mechanism 2 pivots the frame 31 is not entered between at least two of the pipe P, and the cleaning unit 4 Has entered between at least two tubes P.
 この構成によれば、清掃機構3の昇降方向に見た場合の清掃ユニット4の形状は2本の管Pの間隔Gを直径とする円に収まっているので、清掃ユニット4が2本の管Pの間に進入した状態であっても、清掃ユニット4が走行機構2の旋回を阻害することがない。一方、清掃機構3の昇降方向に見た場合のフレーム31の形状は2本の管Pの間隔Gを直径とする円からはみ出ているので、フレーム31が2本の管Pの間に進入した状態では、フレーム31が走行機構2の旋回を阻害する可能性がある。そこで、走行機構2の旋回時には清掃ユニット4を2本の管Pの間に進入させる一方で、フレーム31は2本の管Pの間に進入させない。これにより、走行機構2を円滑に旋回させることができる。 According to this configuration, the shape of the cleaning unit 4 when viewed in the elevating direction of the cleaning mechanism 3 is within a circle having a diameter G V between the two pipes P as a diameter. Even in the state of entering between the pipes P, the cleaning unit 4 does not inhibit the turning of the traveling mechanism 2. On the other hand, since the shape of the frame 31 when viewed in the raising and lowering direction of the cleaning mechanism 3 protrudes from a circle having a diameter G V between the two pipes P, the frame 31 enters between the two pipes P In this state, the frame 31 may inhibit turning of the traveling mechanism 2. Therefore, when the traveling mechanism 2 turns, the cleaning unit 4 is made to enter between the two pipes P, while the frame 31 is not made to enter between the two pipes P. Thereby, the traveling mechanism 2 can be smoothly turned.
 さらに、清掃機構3は、清掃機構3の昇降方向における位置が異なる複数の清掃ユニット4を有し、走行機構2が旋回する際には、複数の清掃ユニット4のうち昇降方向における最も下方の第2清掃ユニット4Bだけが少なくとも2本の管Pの間に進入した状態となっている。 Furthermore, the cleaning mechanism 3 has a plurality of cleaning units 4 with different positions in the elevation direction of the cleaning mechanism 3, and when the traveling mechanism 2 turns, the lowermost one in the elevation direction among the plurality of cleaning units 4 2 Only the cleaning unit 4B is in a state of entering between at least two pipes P.
 この構成によれば、清掃機構3は複数の清掃ユニット4を有しているので、走行機構2の旋回時に複数の清掃ユニット4が2本の管Pの間に進入していると、複数の清掃ユニット4が走行機構2の旋回を阻害する可能性がある。そこで、走行機構2の旋回時には最も下方の第2清掃ユニット4Bを2本の管Pの間に進入させる。つまり、第2清掃ユニット4B以外の清掃ユニット4は、2本の管Pの間に進入していない。これにより、走行機構2を円滑に旋回させることができる。 According to this configuration, since the cleaning mechanism 3 has the plurality of cleaning units 4, when the plurality of cleaning units 4 enter between the two pipes P when the traveling mechanism 2 turns, The cleaning unit 4 may inhibit the turning of the traveling mechanism 2. Therefore, when the traveling mechanism 2 turns, the lowermost second cleaning unit 4B is made to enter between the two pipes P. That is, the cleaning units 4 other than the second cleaning unit 4B do not enter between the two pipes P. Thereby, the traveling mechanism 2 can be smoothly turned.
 また、走行機構2が少なくも2本の管Pに沿って走行する際には、複数の清掃ユニット4が少なくとも2本の管Pの間に進入した状態となっている。 When the traveling mechanism 2 travels along at least two pipes P, a plurality of cleaning units 4 are in a state of entering between at least two pipes P.
 この構成によれば、2本の管Pの間に進入した複数の清掃ユニット4によって走行機構2の旋回が制限される。つまり、複数の清掃ユニット4は、走行機構2を2本の管Pに沿って走行させるためのガイドとして機能する。 According to this configuration, the turning of the traveling mechanism 2 is limited by the plurality of cleaning units 4 entering between the two pipes P. That is, the plurality of cleaning units 4 function as a guide for causing the traveling mechanism 2 to travel along the two pipes P.
 さらに、清掃ユニット4は、清掃機構3の昇降方向と平行な回転軸A回りに回転しながら管Pに接触して管Pの表面の付着物を除去するように構成されている。 Furthermore, the cleaning unit 4 is configured to contact the pipe P and remove deposits on the surface of the pipe P while rotating around a rotation axis A parallel to the elevating direction of the cleaning mechanism 3.
 この構成によれば、清掃ユニット4は、2本の管Pの間で回転軸A回りに回転できる形状に形成されている。2本の管Pの間に清掃ユニット4が進入した状態であっても、清掃ユニット4が走行機構2の旋回を阻害しない。 According to this configuration, the cleaning unit 4 is formed in a shape that can rotate around the rotation axis A between the two pipes P. Even in the state where the cleaning unit 4 enters between the two pipes P, the cleaning unit 4 does not inhibit the turning of the traveling mechanism 2.
 また、清掃ユニット4は、所定の回転軸A回りに回転する回転シャフト32と、清掃機構3の昇降方向に見た場合に2本の管Pの間隔Gを直径とする円に収まる一方、回転シャフト32の遠心力によって回転軸Aを中心とする半径方向外側へ前記円を越えて拡がるように回転シャフト32に連結され、管Pの表面に接触することによって管Pの表面の付着物を除去するスクレーパ34(接触部)とを有する。 Further, the cleaning unit 4 fits in a circle having a diameter G V of the two pipes P as a diameter when viewed in the raising and lowering direction of the cleaning mechanism 3 and the rotating shaft 32 rotating around the predetermined rotation axis A. The deposit on the surface of the pipe P is connected to the surface of the pipe P by contacting the surface of the pipe P so as to expand beyond the circle radially outward around the rotational axis A by the centrifugal force of the rotational shaft 32 And a scraper 34 (contact portion) to be removed.
 さらに、スクレーパ34は、回転シャフト32と一体的に回転する揺動シャフト37に揺動可能に連結され、回転シャフト32の遠心力によって揺動シャフト37回りに揺動して回転軸Aを中心とする半径方向外側へ拡がる。 Furthermore, the scraper 34 is swingably connected to a swinging shaft 37 that rotates integrally with the rotating shaft 32, and is pivoted around the swinging shaft 37 by the centrifugal force of the rotating shaft 32 so that the rotation axis A is centered. Extend radially outward.
 《実施形態2》
 続いて、実施形態2に係る清掃装置200について説明する。図14は、清掃装置200の側面図である。
<< Embodiment 2 >>
Subsequently, the cleaning device 200 according to the second embodiment will be described. FIG. 14 is a side view of the cleaning device 200. FIG.
 清掃装置200は、主に清掃機構203及び昇降機構207の構成が清掃装置100の清掃装置3及び昇降機構7と異なる。以下、清掃装置200のうち清掃装置100と異なる構成を中心に説明する。清掃装置200のうち清掃装置100と同様の構成については同様の符号を付して、説明を省略する。 The cleaning device 200 mainly differs in the configuration of the cleaning mechanism 203 and the elevation mechanism 207 from the cleaning device 3 and the elevation mechanism 7 of the cleaning device 100. Hereinafter, components of the cleaning device 200 that are different from the cleaning device 100 will be mainly described. About the structure similar to the cleaning apparatus 100 among the cleaning apparatuses 200, the same code | symbol is attached | subjected and description is abbreviate | omitted.
 清掃装置200は、水平方向に並ぶ少なくとも2本の管Pの上に載置される。清掃装置200は、装置本体201と、少なくとも2本の管Pの上を走行する走行機構2と、走行機構2よりも下方に位置する管Pの表面の付着物を清掃する清掃機構203と、清掃機構203を装置本体201から昇降させる昇降機構207と、清掃装置200を制御する本体コントローラ8と、オペレータが指令を入力する際に操作する外部コントローラ9とを備えている。清掃装置200は、走行機構1が載っている2本の管Pの間に清掃機構203を昇降機構207によって降下及び上昇させ、2本の管P及びそれらの下方に並ぶ管Pに付着した付着物を清掃する。 The cleaning device 200 is placed on at least two pipes P aligned in the horizontal direction. The cleaning device 200 includes an apparatus main body 201, a traveling mechanism 2 traveling on at least two pipes P, and a cleaning mechanism 203 for cleaning deposits on the surface of the pipe P located below the traveling mechanism 2. The elevating mechanism 207 which raises and lowers the cleaning mechanism 203 from the apparatus main body 201, the main body controller 8 which controls the cleaning device 200, and the external controller 9 which is operated when the operator inputs a command. The cleaning device 200 causes the cleaning mechanism 203 to be lowered and raised between the two pipes P on which the traveling mechanism 1 is mounted by the elevating mechanism 207 and attached to the two pipes P and the pipes P lined below them. Clean the kimono.
 尚、清掃装置100の場合と同様に、説明の便宜上、清掃装置200を基準に互いに直交するX軸、Y軸及びZ軸を規定する。具体的には、清掃装置200の走行方向(即ち、走行機構2の走行方向)にX軸を設定し、清掃装置200の上下方向(即ち、昇降機構207の昇降方向)にZ軸を設定し、清掃装置200の幅方向(即ち、走行方向及び上下方向の両方に直交する方向)にY軸を設定する。 As in the case of the cleaning device 100, for convenience of description, the X axis, the Y axis, and the Z axis orthogonal to each other are defined with reference to the cleaning device 200. Specifically, the X axis is set in the traveling direction of the cleaning device 200 (that is, the traveling direction of the traveling mechanism 2), and the Z axis is set in the vertical direction of the cleaning device 200 (that is, the elevation direction of the elevating mechanism 207). The Y axis is set in the width direction of the cleaning device 200 (that is, the direction orthogonal to both the traveling direction and the vertical direction).
 装置本体201は、XY平面上に拡がる平板状のベース211と、ベース211に設けられ、昇降機構207を支持するフレーム212とを有している。ベース211の略中央には、ベース211を貫通する開口(図示省略)が形成されている。 The apparatus main body 201 has a flat base 211 extending in the XY plane, and a frame 212 provided on the base 211 and supporting the elevating mechanism 207. An opening (not shown) passing through the base 211 is formed substantially at the center of the base 211.
 走行機構2は、ベース211の下面に取り付けられている。清掃装置200の走行機構2の構成は、清掃装置100の走行機構2の構成と概ね同じである。 The traveling mechanism 2 is attached to the lower surface of the base 211. The configuration of the traveling mechanism 2 of the cleaning device 200 is substantially the same as the configuration of the traveling mechanism 2 of the cleaning device 100.
 清掃機構203は、液体を噴射するノズル204と、ノズルに液体を供給する供給部とを有している。ノズル204は、流体を噴射することによって管Pの表面の付着物を除去するように構成されている。この例では、噴射される液体は、水である。 The cleaning mechanism 203 has a nozzle 204 for ejecting liquid, and a supply unit for supplying the liquid to the nozzle. The nozzle 204 is configured to remove deposits on the surface of the pipe P by injecting a fluid. In this example, the liquid to be jetted is water.
 ノズル204は、ノズル本体241と、複数の噴口242とを有している。ノズル本体241は、Z軸方向に延びる軸心Hを有する円柱状に形成されている。複数の噴口242は、ZX平面に対して対称に配置されている。より詳しくは、複数の噴口242は、ノズル本体241において軸心Hを中心とする周方向に等間隔で配置されている。噴口242からは、軸心Hを中心とする半径方向に液体が噴射される。つまり、ノズル204からは、軸心Hを中心に放射状に液体が噴射される。また、Z軸方向(即ち、ノズル204の昇降方向)に見た場合のノズル204の形状は、清掃装置200が載置される2本の管PのV軸方向の間隔G(図2参照)を直径とする円内に収まっている。ノズル204は、清掃部の一例である。 The nozzle 204 has a nozzle body 241 and a plurality of injection ports 242. The nozzle body 241 is formed in a cylindrical shape having an axial center H extending in the Z-axis direction. The plurality of injection ports 242 are arranged symmetrically with respect to the ZX plane. More specifically, the plurality of injection holes 242 are arranged at equal intervals in the circumferential direction centering on the axial center H in the nozzle body 241. From the injection port 242, the liquid is injected in the radial direction around the axis H. That is, from the nozzle 204, the liquid is jetted radially around the axis H. Further, the shape of the nozzle 204 when viewed in the Z-axis direction (that is, the raising and lowering direction of the nozzle 204) is the interval G V in the V-axis direction of the two pipes P on which the cleaning device 200 is mounted (see FIG. 2) In a circle with a diameter of. The nozzle 204 is an example of a cleaning unit.
 供給部は、清掃装置200の外部に設けられた、液体の供給源と、供給源とノズル204とを接続するホース251とを有している。 The supply unit includes a liquid supply source provided outside the cleaning device 200 and a hose 251 connecting the supply source and the nozzle 204.
 昇降機構207は、いわゆるパンタグラフである。昇降機構207は、パンタグラフを構成する複数のリンク271を有している。具体的には、交差する状態で長手方向中央部が回転自在に連結された2つのリンク271を1組として、一の組の2つのリンク271の長手方向端部が別の組の2つのリンク271の長手方向端部とそれぞれ回転自在に連結されている。最下位の組の2つのリンク271の長手方向一端部(別の組のリンクが連結されていない端部)にはそれぞれ、比較的短いリンク271が回転自在に連結されている。これらの短いリンク271には、ノズル204(詳しくは、ノズル本体241)が連結されている。昇降機構207は、清掃機構203においてノズル204を支持する支持部としても機能する。 The lifting mechanism 207 is a so-called pantograph. The lifting and lowering mechanism 207 has a plurality of links 271 constituting a pantograph. Specifically, the longitudinal ends of one set of two links 271 form another set of two links, with the two links 271 rotatably connected at the longitudinal center in a crossing state as one set. It is rotatably connected to the longitudinal direction end of 271 respectively. Relatively short links 271 are rotatably connected to longitudinal ends of the lowermost set of two links 271 (ends not connected with another set of links). The nozzles 204 (more specifically, the nozzle body 241) are connected to these short links 271. The lifting mechanism 207 also functions as a support for supporting the nozzle 204 in the cleaning mechanism 203.
 最上位の組の2つのリンク271の長手方向一端部(別の組のリンクが連結されていない端部)は、フレーム212に連結されている。フレーム212は、ベース211からZ軸方向に延びる一対の縦フレーム212aと、一対の縦フレーム212aの上端部に接続され、X軸方向に延びる横フレーム212bとを有している。最上位の組の一方のリンク271(以下、「第1リンク271A」と称する)は、回転自在且つX軸方向に摺動不能な状態で横フレーム212bに連結されている。最上位の組の他方のリンク271(以下、「第2リンク271B」と称する)は、回転自在且つX軸方向に摺動可能な状態で横フレーム212bに連結されている(図14の矢印参照)。 The longitudinal ends (the ends where the other set of links are not connected) of the topmost set of two links 271 are connected to the frame 212. The frame 212 has a pair of vertical frames 212a extending from the base 211 in the Z-axis direction, and a horizontal frame 212b connected to the upper end of the pair of vertical frames 212a and extending in the X-axis direction. One link 271 (hereinafter, referred to as “first link 271A”) of the uppermost set is coupled to the horizontal frame 212b in a rotatable and non-slidable manner in the X-axis direction. The other top link 271 (hereinafter referred to as “second link 271 B”) is connected to the horizontal frame 212 b in a rotatable and slidable manner in the X-axis direction (see the arrow in FIG. 14). ).
 第2リンク271Bは、駆動部(図示省略)によって、横フレーム212bに沿ってX軸方向へ移動させられる。第2リンク271Bの長手方向一端部が第1リンク271Aの長手方向一端部から離れる方向へ移動させられると、パンタグラフ全体のZ軸方向寸法が縮まり、その結果、ノズル204が上昇する。一方、第2リンク271Bの長手方向一端部が第1リンク271Aの長手方向一端部へ近づく方向へ移動させられると、パンタグラフ全体のZ軸方向寸法が大きくなり、その結果、ノズル204が降下する。 The second link 271B is moved in the X-axis direction along the lateral frame 212b by a drive unit (not shown). When the longitudinal end of the second link 271B is moved away from the longitudinal end of the first link 271A, the dimension in the Z-axis direction of the entire pantograph is reduced, and as a result, the nozzle 204 is lifted. On the other hand, when one end in the longitudinal direction of the second link 271B is moved in a direction approaching the one end in the longitudinal direction of the first link 271A, the dimension in the Z-axis direction of the whole pantograph becomes large, and as a result, the nozzle 204 descends.
 Z軸方向(即ち、ノズル204の昇降方向)に見た場合の昇降機構207の形状は、2本の管PのV軸方向の間隔Gを直径とする円からはみ出している。具体的には、昇降機構207のY軸方向の寸法は、2本の管Pの間隔Gよりも小さい一方、昇降機構207のX軸方向の寸法は、2本の管Pの間隔Gよりも大きい。清掃装置200のX軸方向と管群QのU軸方向とが一致する場合には、昇降機構207は、2本の管Pの間に進入することができる。 The shape of the lifting mechanism 207 when viewed in the Z-axis direction (that is, the lifting and lowering direction of the nozzle 204) protrudes from a circle having a diameter G V in the V-axis direction of the two pipes P. Specifically, the dimension of the elevating mechanism 207 in the Y-axis direction is smaller than the distance G V between the two pipes P, while the dimension of the elevating mechanism 207 in the X-axis direction is the distance G V between the two pipes P Greater than. When the X-axis direction of the cleaning device 200 coincides with the U-axis direction of the pipe group Q, the lifting mechanism 207 can enter between the two pipes P.
 続いて、清掃装置200の動作について説明する。図15は、清掃機構203が管Pを清掃している状態をY軸方向を向いて見た図である。 Subsequently, the operation of the cleaning device 200 will be described. FIG. 15 is a view of the cleaning mechanism 203 cleaning the pipe P as viewed in the Y-axis direction.
 清掃装置200は、2本の管Pの間に清掃機構203を降下及び上昇させることによって、2本の管P及び2本の管Pの下方に配列された管Pを清掃する。2本のクローラ21が2本の管P上に管Pと平行な状態で載り、且つ、ノズル204がV軸方向において2本の管Pの間に位置する状態から清掃が開始される。 The cleaning device 200 cleans the two pipes P and the pipes P arranged below the two pipes P by lowering and raising the cleaning mechanism 203 between the two pipes P. Cleaning is started from the state where the two crawlers 21 are mounted on the two pipes P in parallel with the pipe P and the nozzle 204 is positioned between the two pipes P in the V-axis direction.
 ノズル204が昇降機構207によって2本の管Pの間に降下させられる。このとき、ノズル204からは液体が噴射されている。噴射された液体は、管Pの表面の付着物を除去する。ノズル204は、Z軸と交差する方向に液体を噴射しているので、ノズル204の進行方向に沿って配列された(即ち、W軸方向に配列された)複数の管Pの間に液体を噴射して、該複数の管Pの間に存在する付着物を除去すると共に該複数の管Pの表面の付着物を除去する。その結果、ノズル204は、管Pの表面のうち、ノズル204が通過するスペースに面している部分だけでなく、該スペースからノズル204の進行方向と交差する方向(例えば、V軸方向)に離れた部分(即ち、奥まった部分)に付着した付着物も除去する。 The nozzle 204 is lowered between the two pipes P by the lift mechanism 207. At this time, liquid is jetted from the nozzle 204. The jetted liquid removes deposits on the surface of the pipe P. The nozzle 204 jets the liquid in the direction intersecting the Z axis, so that the liquid is drawn between the plurality of tubes P arranged along the traveling direction of the nozzle 204 (that is, arranged in the W axis direction). The spray is applied to remove deposits present between the plurality of tubes P and to remove deposits on the surfaces of the plurality of tubes P. As a result, the nozzle 204 is not only in the portion of the surface of the pipe P facing the space through which the nozzle 204 passes, but also in a direction (for example, the V-axis direction) intersecting the traveling direction of the nozzle 204 from the space It also removes deposits attached to remote parts (ie, recessed parts).
 ノズル204は、軸心Hを中心に放射状に液体を噴射するので、V軸方向においてノズル204の両側の管Pの付着物を除去する。このとき、ノズル204は、液体の噴射による反力を受ける。ノズル204の噴口242は、ZX平面に対して対称に配置されている。そのため、ノズル204が受けるV軸方向の一方側への反力とV軸方向の他方側への反力が相殺される。その結果、噴射による反力によってノズル204がV軸方向へ移動することが抑制される。つまり、清掃機構203は、清掃機構3のガイド5のような案内機構を有していなくても、V軸方向への位置ずれを低減することができる。 The nozzle 204 jets the liquid radially about the axis H, and thus removes deposits on the pipes P on both sides of the nozzle 204 in the V-axis direction. At this time, the nozzle 204 receives a reaction force due to the ejection of the liquid. The injection ports 242 of the nozzle 204 are disposed symmetrically with respect to the ZX plane. Therefore, the reaction force to one side in the V-axis direction received by the nozzle 204 and the reaction force to the other side in the V-axis direction cancel each other. As a result, movement of the nozzle 204 in the V-axis direction is suppressed by the reaction force from the injection. That is, even if the cleaning mechanism 203 does not have a guide mechanism such as the guide 5 of the cleaning mechanism 3, the positional deviation in the V-axis direction can be reduced.
 こうして、ノズル204は、管Pの側方をW軸方向に通過することによって、管Pの表面のうち概ね半周部分の付着物を除去していく。 Thus, the nozzle 204 removes deposits on the surface of the pipe P in a substantially semi-peripheral portion by passing through the side of the pipe P in the W-axis direction.
 ノズル204は、清掃対象の管Pのうち最も下方の管Pを通過するまで降下すると、昇降機構207によって上昇させられる。ノズル204が上昇する際にも、ノズル204は、管Pに液体を噴射して、管Pの付着物を削り落としていく。つまり、ノズル204は、降下時と上昇時との両方で管Pの表面を清掃する。 The nozzle 204 is raised by the raising and lowering mechanism 207 as it descends until it passes the lowermost pipe P of the pipes P to be cleaned. Even when the nozzle 204 ascends, the nozzle 204 jets the liquid to the pipe P to cut off the deposits on the pipe P. That is, the nozzle 204 cleans the surface of the pipe P both at the time of descent and at the time of ascent.
 ノズル204の上下の往復が終了すると、清掃装置200は、2本の管Pに沿ってU軸方向へ所定量だけ移動する。その後、ノズル204は、再度、降下及び上昇を実行する。つまり、ノズル204は、管Pのうち、先のノズル204の降下及び上昇時とはU軸方向位置が異なる部分を清掃する。 When the up and down reciprocation of the nozzle 204 is completed, the cleaning device 200 moves along the two pipes P in the U axis direction by a predetermined amount. Thereafter, the nozzle 204 performs lowering and raising again. That is, the nozzle 204 cleans the portion of the pipe P which is different in U-axis direction position from the previous lowering and rising of the nozzle 204.
 清掃装置200は、清掃装置100と同様に、U軸方向の位置を変更しながらノズル204の降下及び上昇を繰り返していき、清掃装置200が載置された2本の管PのU軸方向の一端部から他端部までの移動を終了する。続いて、清掃装置200は、V軸方向へ移動し、ノズル204を異なる2本の管Pの間に配置させ、新たな2本の管P及びその下方の管Pに対して前述と同様の清掃を行う。こうして、清掃装置200は、清掃装置200が載置される2本の管Pを変更しながら前述の清掃を繰り返すことによって、管群Qに含まれる管Pの清掃を行う。 Like the cleaning device 100, the cleaning device 200 repeats lowering and raising of the nozzle 204 while changing the position in the U-axis direction, and the two pipes P on which the cleaning device 200 is mounted are The movement from one end to the other end is ended. Subsequently, the cleaning device 200 is moved in the V-axis direction, the nozzle 204 is disposed between two different pipes P, and the two new pipes P and the pipes P therebelow are the same as described above. Clean up. Thus, the cleaning device 200 cleans the pipes P included in the pipe group Q by repeating the above-described cleaning while changing the two pipes P on which the cleaning device 200 is placed.
 続いて、清掃装置200の移動について説明する。図16は、管Pと平行に移動する際、及び、管P上で旋回する際の清掃装置200をX軸方向に見た図である。 Subsequently, movement of the cleaning device 200 will be described. FIG. 16 is a view of the cleaning device 200 viewed in the X-axis direction when moving in parallel with the pipe P and when pivoting on the pipe P. As shown in FIG.
 前述の如く、清掃装置200が管群Qに含まれる管Pを清掃する際には、清掃装置200は、管Pの上を走行する。その際、清掃装置200は、ノズル204を走行時のガイドに用いることによって、所望の位置までの移動を実現している。 As described above, when the cleaning device 200 cleans the pipe P included in the pipe group Q, the cleaning device 200 travels on the pipe P. At this time, the cleaning device 200 achieves movement to a desired position by using the nozzle 204 as a guide for traveling.
 基本的には、清掃装置200は、管P上を移動する際には、ノズル204が管Pと干渉しないように、図14に示すようにノズル204を引き上げた状態(ノズル204が走行機構2から下方に突出していない状態)で移動する。 Basically, when the cleaning device 200 moves on the pipe P, the nozzle 204 is pulled up as shown in FIG. 14 so that the nozzle 204 does not interfere with the pipe P (the nozzle 204 runs the traveling mechanism 2) Move out from the bottom).
 ただし、管PのU軸方向位置が異なる部分を清掃するために清掃装置200が2本の管Pに沿ってU軸方向へ移動する際には、清掃装置200は、図16に示すように、ノズル204を走行機構2よりも下方に突出させ、清掃装置200が載置された2本の管Pの間に進入させた状態で走行する。ノズル204が2本の管Pの間に進入しているので、清掃装置200がV軸方向へずれていくことが防止される。 However, when the cleaning device 200 moves in the U-axis direction along the two pipes P in order to clean the portions in which the pipe P in the U-axis direction is different, the cleaning device 200 as shown in FIG. The nozzle 204 is protruded below the traveling mechanism 2 and travels in a state in which the nozzle 204 enters between two pipes P on which the cleaning device 200 is mounted. Since the nozzle 204 has entered between the two pipes P, the cleaning device 200 is prevented from shifting in the V-axis direction.
 尚、清掃装置200は、ノズル204だけでなく、昇降機構207の一部(例えば、比較的下方のリンク271)を2本の管Pの間に進入させた状態でU軸方向への移動を行ってもよい。 The cleaning device 200 moves in the U-axis direction in a state where not only the nozzle 204 but a part of the lifting mechanism 207 (for example, the relatively lower link 271) is advanced between the two pipes P. You may go.
 また、清掃装置200は、ノズル204を2本の管Pの間に進入させた状態で旋回を行う。Z軸方向に見た場合のノズル204の外形は、2本の管Pの間隔Gを直径とする円内に収まっている。そのため、ノズル204が2本の管Pの間に進入した状態であっても、清掃装置200は旋回することができる。尚、Z軸方向に見た場合において、昇降機構207のパンタグラフの短手方向寸法は、2本の管Pの間隔よりも小さいものの、パンタグラフの長手方向寸法は、2本の管Pの間隔よりも大きい。すなわち、Z軸方向に見た場合の昇降機構207のパンタグラフの外形は、2本の管Pの間隔Gを直径とする円からはみ出ている。そのため、パンタグラフは、2本の管Pの間に進入していない。 In addition, the cleaning device 200 turns in a state where the nozzle 204 is advanced between the two pipes P. The outer shape of the nozzle 204 when viewed in the Z-axis direction is within a circle whose diameter is the distance G V between the two pipes P. Therefore, even in the state where the nozzle 204 enters between the two pipes P, the cleaning device 200 can pivot. When viewed in the Z-axis direction, the lateral dimension of the pantograph of the lifting mechanism 207 is smaller than the distance between the two tubes P, but the longitudinal dimension of the pantograph is greater than the distance between the two tubes P. Too big. That is, the outer shape of the pantograph of the lifting and lowering mechanism 207 when viewed in the Z-axis direction protrudes from a circle having a diameter G V between the two pipes P. Therefore, the pantograph does not enter between the two pipes P.
 こうして、ノズル204が2本の管Pの間に進入していると、一方のクローラ21の駆動力が優位であったとしても、清掃装置200は自由に移動することができない。ノズル204が2本の管Pに係合し且つ2つのクローラ21の駆動力が不均衡な状態で清掃装置200が走行を継続すると、空転していたクローラ21もやがて管Pとの間に摩擦力が作用するようになり、清掃装置200が旋回するようになる。その結果、清掃装置200は、2本の管Pに沿って少し移動しながら最終的には旋回していく。 Thus, when the nozzle 204 enters between the two pipes P, the cleaning device 200 can not move freely even if the driving force of one of the crawlers 21 is superior. When the cleaning device 200 continues traveling with the nozzle 204 engaged with the two pipes P and the driving forces of the two crawlers 21 being unbalanced, the crawler 21 which has been idled will soon be in friction with the pipe P. Force will be exerted and the cleaning device 200 will pivot. As a result, the cleaning device 200 eventually pivots while moving slightly along the two pipes P.
 以上のように、清掃装置200は、装置本体201と、装置本体201に設けられ、管群Qに含まれる少なくとも2本の管Pの上を走行する走行機構2と、装置本体201から昇降して、走行機構2よりも下方に位置する管Pの表面の付着物を清掃する清掃機構203とを備え、走行機構2は、清掃機構203が少なくとも2本の管Pの間に進入した状態で少なくとも2本の管Pの上で旋回する。 As described above, the cleaning device 200 is provided to the device main body 201 and the device main body 201, and is moved up and down from the device main body 201 and the traveling mechanism 2 that travels on at least two pipes P included in the pipe group Q. And the cleaning mechanism 203 for cleaning the deposit on the surface of the pipe P located below the traveling mechanism 2, and the traveling mechanism 2 is in a state where the cleaning mechanism 203 enters between at least two pipes P. It pivots on at least two pipes P.
 この構成によれば、2本の管Pの上に付着物等が存在して走行機構2が2本の管P上を滑って適切に走行できない場合であっても、清掃機構203が2本の管Pの間に進入しているので、走行機構2が無制限に走行してしまうことがない。少なくとも清掃機構203が2本の管Pの間に進入した状態が維持されるので、走行機構2による旋回走行を継続していると、やがて、走行機構2の滑りが緩和又は解消されて、走行機構2は旋回することができる。 According to this configuration, even if there are deposits or the like on the two pipes P and the traveling mechanism 2 can not properly travel by sliding on the two pipes P, two cleaning mechanisms 203 are provided. Since it has entered between the pipes P, the traveling mechanism 2 never travels without restriction. Since the state where at least the cleaning mechanism 203 has entered between the two pipes P is maintained, if the turning travel by the traveling mechanism 2 is continued, the slip of the traveling mechanism 2 is alleviated or eliminated in a short time, and the traveling The mechanism 2 can pivot.
 また、清掃機構203は、管Pの表面の付着物を除去するノズル204(清掃部)と、ノズル204よりも上方に位置し、ノズル204を支持する昇降機構207(支持部)とを有し、ノズル204の形状は、2本の管Pの間隔Gを直径とする円に収まっている一方、昇降機構207の形状は、2本の管Pの間隔Gを直径とする円からはみ出ており、走行機構2が旋回する際には、昇降機構207が少なくとも2本の管Pの間に進入しておらず、且つ、ノズル204が少なくとも2本の管Pの間に進入した状態となっている。 Further, the cleaning mechanism 203 has a nozzle 204 (cleaning part) for removing deposits on the surface of the pipe P, and an elevation mechanism 207 (support part) located above the nozzle 204 and supporting the nozzle 204. The shape of the nozzle 204 fits in a circle whose diameter is the distance G V between the two tubes P, while the shape of the lifting mechanism 207 protrudes from the circle whose diameter G is the distance G V between the two tubes P. When the traveling mechanism 2 turns, the elevating mechanism 207 does not enter between at least two pipes P, and the nozzle 204 enters between at least two pipes P. It has become.
 この構成によれば、清掃機構203の昇降方向に見た場合のノズル204の形状は2本の管Pの間隔Gを直径とする円に収まっているので、ノズル204が2本の管Pの間に進入した状態であっても、ノズル204が走行機構2の旋回を阻害することがない。一方、清掃機構203の昇降方向に見た場合の昇降機構207の形状は2本の管Pの間隔Gを直径とする円からはみ出ているので、昇降機構207が2本の管Pの間に進入した状態では、昇降機構207が走行機構2の旋回を阻害する可能性がある。そこで、走行機構2の旋回時にはノズル204を2本の管Pの間に進入させる一方で、昇降機構207は2本の管Pの間に進入させない。これにより、走行機構2を円滑に旋回させることができる。 According to this configuration, the shape of the nozzle 204 when viewed in the elevating direction of the cleaning mechanism 203 falls within a circle having a diameter G V between the two pipes P, so that the pipe 204 has two nozzles P. The nozzle 204 does not inhibit the turning of the traveling mechanism 2 even in the state of entering between them. On the other hand, since the shape of the lifting and lowering mechanism 207 when viewed in the lifting and lowering direction of the cleaning mechanism 203 is out of the circle having a diameter G V between the two pipes P, the lifting and lowering mechanism 207 is between the two pipes P In the state in which the vehicle moves in, the lifting mechanism 207 may inhibit the turning of the traveling mechanism 2. Therefore, when the traveling mechanism 2 turns, the nozzle 204 is made to enter between the two pipes P, while the elevating mechanism 207 is not made to enter between the two pipes P. Thereby, the traveling mechanism 2 can be smoothly turned.
 さらに、ノズル204は、流体を噴射することによって管Pの表面の付着物を除去するように構成されている。 Furthermore, the nozzle 204 is configured to remove deposits on the surface of the pipe P by injecting a fluid.
 《その他の実施形態》
 以上のように、本出願において開示する技術の例示として、前記実施形態を説明した。しかしながら、本開示における技術は、これに限定されず、適宜、変更、置き換え、付加、省略などを行った実施の形態にも適用可能である。また、前記実施形態で説明した各構成要素を組み合わせて、新たな実施の形態とすることも可能である。また、添付図面および詳細な説明に記載された構成要素の中には、課題解決のために必須な構成要素だけでなく、前記技術を例示するために、課題解決のためには必須でない構成要素も含まれ得る。そのため、それらの必須ではない構成要素が添付図面や詳細な説明に記載されていることをもって、直ちに、それらの必須ではない構成要素が必須であるとの認定をするべきではない。
<< Other Embodiments >>
As mentioned above, the said embodiment was described as an illustration of the technique disclosed in this application. However, the technology in the present disclosure is not limited to this, and is also applicable to embodiments in which changes, replacements, additions, omissions, and the like are appropriately made. Moreover, it is also possible to combine each component demonstrated by the said embodiment, and to set it as a new embodiment. Further, among components described in the attached drawings and the detailed description, not only components that are essential for solving the problem but also components that are not essential for solving the problem in order to illustrate the above-mentioned technology. May also be included. Therefore, the fact that those non-essential components are described in the attached drawings and the detailed description should not immediately mean that those non-essential components are essential.
 例えば、清掃機構3は、清掃装置100に備えられているが、これに限られるものではない。前述の構成では、清掃機構3は、清掃装置100によって搬送され且つ昇降させられる。しかし、清掃機構3は、オペレータが手動で操作するものであってもよい。つまり、オペレータが清掃機構3を把持して、管群Q内で清掃機構3を移動させつつ清掃機構3で管Pの清掃を行ってもよい。また、清掃機構3が清掃装置100に備えられた構成であったとしても、走行機構2又は昇降機構7の構成は、前述の構成に限られるものではない。例えば、走行機構2は、クローラではなく、車輪であってもよい。昇降機構7は、ウインチではなく、ラックアンドピニオンやパンタグラフであってもよい。 For example, although the cleaning mechanism 3 is provided in the cleaning device 100, it is not limited thereto. In the above-described configuration, the cleaning mechanism 3 is transported by the cleaning device 100 and moved up and down. However, the cleaning mechanism 3 may be operated manually by the operator. That is, the operator may grip the cleaning mechanism 3 and clean the pipe P with the cleaning mechanism 3 while moving the cleaning mechanism 3 in the pipe group Q. Further, even if the cleaning mechanism 3 is provided in the cleaning device 100, the configuration of the traveling mechanism 2 or the elevation mechanism 7 is not limited to the above-described configuration. For example, the traveling mechanism 2 may be not wheels but wheels. The lifting mechanism 7 may be a rack and pinion or pantograph instead of a winch.
 清掃機構3が備える清掃ユニット4の個数は、3個に限られるものではない。清掃ユニット4は、1個、2個又は4個以上であってもよい。清掃機構3の昇降方向、即ち、Z軸方向における各清掃ユニット4の位置は、前述の位置に限られるものではない。例えば、3個の清掃ユニット4のZ軸方向の位置は、同じであってもよい。あるいは、3個の清掃ユニット4のZ軸方向の位置は、全て異なっていてもよい。 The number of cleaning units 4 provided in the cleaning mechanism 3 is not limited to three. The cleaning unit 4 may be one, two or four or more. The moving direction of the cleaning mechanism 3, that is, the position of each cleaning unit 4 in the Z-axis direction is not limited to the above-described position. For example, the positions of the three cleaning units 4 in the Z-axis direction may be the same. Alternatively, the positions of the three cleaning units 4 in the Z-axis direction may all be different.
 清掃ユニット4の構成は、前述の構成に限られるものではない。例えば、清掃ユニット4が有するスクレーパ34の個数は、3個に限られず、1個、2個又は4個以上であってもよい。清掃ユニット4は、円板35又は掘削部36を有していなくてもよい。前述の清掃ユニット4は、4枚の円板35によって形成される3つの隙間のそれぞれに複数のスクレーパ34が設けられている。つまり、3組のスクレーパ34が設けられている。しかし、スクレーパ34の組数は、1組、2組又は4組以上であってもよい。 The configuration of the cleaning unit 4 is not limited to the above-described configuration. For example, the number of scrapers 34 included in the cleaning unit 4 is not limited to three, and may be one, two, or four or more. The cleaning unit 4 may not have the disc 35 or the excavating portion 36. In the cleaning unit 4 described above, a plurality of scrapers 34 are provided in each of three gaps formed by the four disks 35. That is, three sets of scrapers 34 are provided. However, the number of sets of scrapers 34 may be one, two or four or more.
 スクレーパ34の形状は、円弧状でなく、例えば直線状であってもよい。スクレーパ34は、揺動する構成ではなく、摺動する構成であってもよい。例えば、スクレーパ34に長孔が形成され、2つの円板35の間に設けられたピンが長孔に挿通されるようにスクレーパ34がピンに連結される構成であってもよい。この構成の場合、スクレーパ34は、長孔内をピンが相対的に移動するようにピンに対して摺動可能である。スクレーパ34が摺動可能な構成であれば、回転シャフト32の遠心力がスクレーパ34に作用すると、スクレーパ34は遠心力に従って摺動し、半径方向外側へ拡がる。 The shape of the scraper 34 may not be arc-shaped, but may be linear, for example. The scraper 34 may be configured to slide instead of swinging. For example, an elongated hole may be formed in the scraper 34, and the scraper 34 may be connected to the pin so that the pin provided between the two disks 35 is inserted into the elongated hole. In this configuration, the scraper 34 can slide relative to the pin such that the pin moves relative to the slot. If the scraper 34 is configured to be slidable, when the centrifugal force of the rotating shaft 32 acts on the scraper 34, the scraper 34 slides according to the centrifugal force and spreads radially outward.
 清掃機構3は、ガイド5を備えているが、ガイド5を備えていなくてもよい。ガイド5の構成は、前述の構成に限られるものではない。ガイド5は、リンク6を有していなくてもよい。例えば、ブレード51は、フレーム31に対して摺動可能に連結され、且つ、バネ等でY軸方向外側へ付勢された構成であってもよい。 The cleaning mechanism 3 includes the guide 5, but the guide 5 may not be provided. The configuration of the guide 5 is not limited to the above-described configuration. The guide 5 may not have the link 6. For example, the blade 51 may be slidably connected to the frame 31 and may be biased outward in the Y-axis direction by a spring or the like.
 また、ブレード51のエッジ53の断面形状は、管Pに近いほど細い先鋭な形状であればよく、最も管Pに近い部分、即ち、管Pと接触する部分は多少丸まっていてもよい。 In addition, the cross-sectional shape of the edge 53 of the blade 51 may be a sharp tip that is thinner toward the pipe P, and the portion closest to the pipe P, that is, the portion in contact with the pipe P may be somewhat rounded.
 清掃装置200において走行機構2又は昇降機構207の構成は、前述の構成に限られるものではない。例えば、走行機構2は、クローラではなく、車輪であってもよい。昇降機構207は、パンタグラフではなく、ウインチやラックアンドピニオンであってもよい。 The configuration of the traveling mechanism 2 or the elevation mechanism 207 in the cleaning device 200 is not limited to the above-described configuration. For example, the traveling mechanism 2 may be not wheels but wheels. The lifting mechanism 207 may be a winch or a rack and pinion instead of a pantograph.
 ノズル204の構成は、前述の構成に限られるものではない。噴口242の個数及び配置は、任意に設定することができる。また、清掃機構203は、ノズル204を複数有していてもよい。複数のノズル204が設けられている場合、複数のノズル204のZ軸方向位置は、一致していなくてもよい。その場合、清掃装置100と同様に、走行機構2が2本の管Pに沿って走行する際には複数のノズル204が2本の管Pの間に進入しており、走行機構2が旋回する際には最も下方に位置するノズル204だけが2本の管Pの間に進入していてもよい。 The configuration of the nozzle 204 is not limited to the above-described configuration. The number and arrangement of the injection ports 242 can be set arbitrarily. Further, the cleaning mechanism 203 may have a plurality of nozzles 204. When the plurality of nozzles 204 are provided, the Z-axis direction positions of the plurality of nozzles 204 may not coincide with each other. In that case, as in the cleaning device 100, when the traveling mechanism 2 travels along the two pipes P, the plurality of nozzles 204 enter between the two pipes P, and the traveling mechanism 2 turns In this case, only the lowermost nozzle 204 may enter between the two pipes P.
 また、清掃機構203のノズル204から噴射する物質は、液体に限られない。例えば、ノズル204は、空気等の気体や、管Pの清掃に適した粒体を噴射してもよい。ここで、「粒体」とは、粉のような微粒子も含む。例えば、「粉体」は、金属又はセラミック等の微小な球体である。 Further, the substance injected from the nozzle 204 of the cleaning mechanism 203 is not limited to the liquid. For example, the nozzle 204 may inject a gas such as air or particles suitable for cleaning the pipe P. Here, "particles" also include fine particles such as powder. For example, "powder" is a minute sphere such as metal or ceramic.
 以上説明したように、ここに開示された技術は、清掃装置について有用である。 As discussed above, the techniques disclosed herein are useful for cleaning devices.
100,200 清掃装置
1,201   装置本体
2       走行機構
3,203   清掃機構
31      フレーム(支持部)
4A      第1清掃ユニット(清掃部)
4B      第2清掃ユニット(清掃部)
4C      第3清掃ユニット(清掃部)
204     ノズル(清掃部)
207     昇降機構(支持部)
       間隔
Q       管群
P       管
100, 200 cleaning device 1, 201 main body 2 traveling mechanism 3, 203 cleaning mechanism 31 frame (support portion)
4A 1st cleaning unit (cleaning unit)
4B Second cleaning unit (cleaning unit)
4C 3rd cleaning unit (cleaning unit)
204 nozzle (cleaning unit)
207 Lifting mechanism (support part)
G V interval Q tube group P tube

Claims (8)

  1.  装置本体と、
     前記装置本体に設けられ、管群に含まれる少なくとも2本の管の上を走行する走行機構と、
     前記装置本体から昇降して、前記走行機構よりも下方に位置する管の表面の付着物を清掃する清掃機構とを備え、
     前記走行機構は、前記清掃機構が前記少なくとも2本の管の間に進入した状態で前記少なくとも2本の管の上で旋回することを特徴とする清掃装置。
    The device body,
    A traveling mechanism provided on the device body and traveling on at least two pipes included in the pipe group;
    A cleaning mechanism for lifting deposits on the surface of the tube located below the traveling mechanism by moving up and down from the main body of the device;
    The cleaning device is characterized in that the traveling mechanism pivots on the at least two pipes with the cleaning mechanism entering between the at least two pipes.
  2.  請求項1に記載の清掃装置において、
     前記清掃機構は、管の表面の付着物を除去する清掃部と、前記清掃部よりも上方に位置し、前記清掃部を支持する支持部とを有し、
     前記清掃機構の昇降方向に見た場合に、前記清掃部の形状は、前記2本の管の間隔を直径とする円に収まっている一方、前記支持部の形状は、前記2本の管の間隔を直径とする円からはみ出ており、
     前記走行機構が旋回する際には、前記支持部が前記少なくとも2本の管の間に進入しておらず、且つ、前記清掃部が前記少なくとも2本の管の間に進入した状態となっていることを特徴とする清掃装置。
    In the cleaning device according to claim 1,
    The cleaning mechanism has a cleaning unit that removes deposits on the surface of a pipe, and a support unit that is positioned above the cleaning unit and supports the cleaning unit.
    The shape of the cleaning part, when viewed in the raising and lowering direction of the cleaning mechanism, falls within a circle whose diameter is the distance between the two pipes, while the shape of the support part is that of the two pipes. It protrudes from the circle whose diameter is the interval,
    When the traveling mechanism turns, the support does not enter between the at least two pipes, and the cleaning part enters between the at least two pipes. Cleaning device characterized by
  3.  請求項2に記載の清掃装置において、
     前記清掃機構は、前記清掃機構の昇降方向における位置が異なる複数の前記清掃部を有し、
     前記走行機構が旋回する際には、複数の前記清掃部のうち前記昇降方向における最も下方の清掃部だけが前記少なくとも2本の管の間に進入した状態となっていることを特徴とする清掃装置。
    In the cleaning device according to claim 2,
    The cleaning mechanism includes a plurality of the cleaning units having different positions in the raising and lowering direction of the cleaning mechanism,
    When the traveling mechanism turns, only the lowermost cleaning portion in the elevating direction among the plurality of cleaning portions is in a state of entering between the at least two pipes. apparatus.
  4.  請求項3に記載の清掃装置において、
     前記走行機構が前記少なくも2本の管に沿って走行する際には、複数の前記清掃部が前記少なくとも2本の管の間に進入した状態となっていることを特徴とする清掃装置。
    In the cleaning device according to claim 3,
    A cleaning apparatus characterized in that when the traveling mechanism travels along the at least two pipes, a plurality of the cleaning parts enter between the at least two pipes.
  5.  請求項2乃至4の何れか1つに記載の清掃装置において、
     前記清掃部は、前記清掃機構の昇降方向と平行な回転軸回りに回転しながら前記管に接触して前記管の表面の付着物を除去するように構成されていることを特徴とする清掃装置。
    In the cleaning device according to any one of claims 2 to 4,
    The cleaning unit is configured to be in contact with the pipe to remove deposits on the surface of the pipe while rotating around a rotation axis parallel to the raising and lowering direction of the cleaning mechanism. .
  6.  請求項5に記載の清掃装置において、
     前記清掃部は、
      所定の回転軸回りに回転する回転シャフトと、
      前記清掃機構の昇降方向に見た場合に前記2本の管の間隔を直径とする円に収まる一方、前記回転シャフトの遠心力によって前記回転軸を中心とする半径方向外側へ前記円を越えて拡がるように前記回転シャフトに連結され、前記管の表面に接触することによって前記管の表面の付着物を除去する接触部とを有することを特徴とする清掃装置。
    In the cleaning device according to claim 5,
    The cleaning unit is
    A rotating shaft that rotates about a predetermined rotation axis;
    When viewed in the raising and lowering direction of the cleaning mechanism, the space between the two pipes falls within a circle whose diameter is the diameter, while the centrifugal force of the rotating shaft exceeds the circle radially outward centering on the rotating shaft And a contact portion connected to the rotating shaft so as to expand and removing deposits on the surface of the tube by contacting the surface of the tube.
  7.  請求項6に記載の清掃装置において、
     前記接触部は、前記回転シャフトと一体的に回転する揺動シャフトに揺動可能に連結され、前記回転シャフトの遠心力によって前記揺動シャフト回りに揺動して前記回転軸を中心とする半径方向外側へ拡がることを特徴とする清掃装置。
    In the cleaning device according to claim 6,
    The contact portion is swingably connected to a swinging shaft that rotates integrally with the rotating shaft, and is oscillated around the swinging shaft by a centrifugal force of the rotating shaft and has a radius centered on the rotating shaft A cleaning device characterized in that it spreads out in the direction.
  8.  請求項2乃至4の何れか1つに記載の清掃装置において、
     前記清掃部は、液体、気体又は粒体を噴射することによって前記管の表面の付着物を除去するように構成されていることを特徴とする清掃装置。
    In the cleaning device according to any one of claims 2 to 4,
    The cleaning device according to claim 1, wherein the cleaning unit is configured to remove deposits on the surface of the tube by injecting liquid, gas or particles.
PCT/JP2018/037866 2017-10-12 2018-10-11 Cleaning apparatus WO2019074040A1 (en)

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EP18866343.9A EP3690380A4 (en) 2017-10-12 2018-10-11 Cleaning apparatus
CN201880066110.4A CN111201417B (en) 2017-10-12 2018-10-11 Cleaning device

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JP2017198621A JP6837951B2 (en) 2017-10-12 2017-10-12 Cleaning device

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CN115452175A (en) * 2022-09-05 2022-12-09 徐州盛安化工科技有限公司 Pipeline temperature detection device for natural gas distribution station

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WO2022181053A1 (en) * 2021-02-26 2022-09-01 三菱重工業株式会社 Cleaning device and heat transfer tube cleaning method
CN115452175A (en) * 2022-09-05 2022-12-09 徐州盛安化工科技有限公司 Pipeline temperature detection device for natural gas distribution station
CN115452175B (en) * 2022-09-05 2023-09-01 徐州盛安化工科技有限公司 Pipeline temperature detection device for natural gas sub-station

Also Published As

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CN111201417A (en) 2020-05-26
EP3690380A4 (en) 2020-12-09
EP3690380A1 (en) 2020-08-05
JP6837951B2 (en) 2021-03-03
JP2019074228A (en) 2019-05-16
CN111201417B (en) 2021-10-29

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