WO2019049219A1 - Substrate rotating device and substrate processing device - Google Patents

Substrate rotating device and substrate processing device Download PDF

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Publication number
WO2019049219A1
WO2019049219A1 PCT/JP2017/032008 JP2017032008W WO2019049219A1 WO 2019049219 A1 WO2019049219 A1 WO 2019049219A1 JP 2017032008 W JP2017032008 W JP 2017032008W WO 2019049219 A1 WO2019049219 A1 WO 2019049219A1
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WO
WIPO (PCT)
Prior art keywords
outer frame
inner frame
substrate
magnetic field
container
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PCT/JP2017/032008
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French (fr)
Japanese (ja)
Inventor
横田　博
英昭 樋川
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倉敷紡績株式会社
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Priority to PCT/JP2017/032008 priority Critical patent/WO2019049219A1/en
Publication of WO2019049219A1 publication Critical patent/WO2019049219A1/en

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    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16H—GEARING
    • F16H49/00—Other gearings
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping

Definitions

  • the present invention relates to a substrate rotation apparatus or substrate processing apparatus that can be used in a semiconductor manufacturing process or the like.
  • the semiconductor manufacturing process includes many processes of processing the wafer with a chemical solution or the like, such as application / development of a photoresist, etching, and cleaning.
  • a single-wafer type substrate rotating apparatus and an immersion apparatus for immersing the wafer in a treatment tank filled with a chemical solution are used, each having advantages and disadvantages.
  • the immersion method is advantageous in that no static electricity is generated and that the cleaning efficiency can be increased by the addition of ultrasonic vibration.
  • the rotation method has advantages such as a large number of control parameters of the processing conditions and an excellent uniformity of processing within the wafer surface.
  • the rotary plate housed in the closed vessel is magnetically levitated by the type II superconductor disposed below the outside of the vessel, and rotationally driven by the rotating magnetic field coil disposed around the vessel. A magnetic levitation and rotation processing apparatus is described.
  • Patent Document 1 has a problem that the equipment becomes large in order to cool the superconductor, and the container shape is complicated, and there is room for improvement in the workability of maintenance work such as cleaning. was there.
  • the present invention has been made in consideration of the above, and it is an object of the present invention to provide a substrate rotation apparatus which reduces the sources of contamination in the container and is easier to maintain.
  • the substrate rotating apparatus comprises an outer frame body provided with magnetic field generating means and capable of rotating the generated magnetic field around a central axis, a container disposed inside the outer frame body, and disposed in the container
  • An inner frame body including a substrate holding means and magnets or ferromagnetic members dispersed in the circumferential direction, the outer frame body and the inner frame body magnetically coupled to float the inner frame body;
  • a magnetic coupling means for rotating the inner frame following the rotational change of the magnetic field, keeping a constant distance between the outer frame and the inner frame, and making the inner frame concentric with the outer frame.
  • gap adjusting means for maintaining.
  • the central axis of the outer frame is a straight line passing through the center of the outer frame and perpendicular to the surface of the outer frame. Further, rotating the magnetic field about the central axis means changing the magnetic field as if the distribution of the magnetic flux density is rotating about the central axis.
  • the inner ring holding the substrate can be floated and rotated in the container, so that the rotating shaft and the like do not penetrate the container, and the contamination source in the container can be reduced.
  • the inner ring and the outer ring are disposed concentrically in the same plane, a simpler shape can be adopted as the container shape.
  • the magnetic field generation means is an electromagnet distributed in the circumferential direction of the outer frame so as to face the magnet or ferromagnetic material of the inner frame, and the rotation of the magnetic field is performed. Is realized by the rotational movement of the outer frame, and the magnetic coupling means is constituted by the magnet or ferromagnetic of the inner frame and the electromagnet of the outer frame.
  • the magnetic field generating means is an electromagnet aligned in the circumferential direction of the outer frame, and rotation of the magnetic field is realized by sequentially changing the polarity of the aligned electromagnets.
  • the magnetic coupling means is composed of the magnet or the ferromagnetic member of the inner frame and the electromagnet of the outer frame.
  • the outer frame is a non-rotating portion occupying the outer circumferential side of the outer frame and an inner circumferential side of the outer frame, and portions having different magnetic permeability are joined in the circumferential direction. It consists of the rotation part formed.
  • the non-rotational part includes electromagnets aligned in the circumferential direction as the magnetic field generating means, wherein rotation of the magnetic field is realized by rotational movement of the rotating part, and the magnetic coupling means is of the inner frame It comprises a magnet or a ferromagnetic body, an electromagnet of the rotating part and the non-rotating part.
  • the outer frame is further rotatable and tiltable around a straight line intersecting the central axis. According to this configuration, the substrate can be rotated while being inclined from the horizontal surface.
  • the outer frame is further translatable in the central axis direction. This makes it easier to mount and remove the substrate.
  • the container has a chemical solution supply unit and a drainage unit at the bottom, and can be processed by storing the chemical solution inside and immersing the substrate held by the inner frame.
  • the chemical solution contains pure water.
  • the substrate can be rotated in a state of being immersed in the chemical solution.
  • the substrate processing apparatus comprises a magnetic field generating means, an outer frame body capable of rotating the generated magnetic field around a central axis, and a container which is disposed inside the outer frame body and can accommodate the processing chemical solution inside.
  • an inner frame body disposed in the container and provided with the substrate holding means and magnets or ferromagnetic members distributed in the circumferential direction, and the outer frame body and the inner frame body are magnetically coupled, Magnetic coupling means for floating the inner frame and rotating the inner frame following the rotational change of the magnetic field, and keeping the distance between the outer frame and the inner frame constant, the inner frame And gap adjusting means for keeping the frame concentric with the outer frame.
  • the inner frame holding the substrate can be floated and rotated in the container, so that the rotary shaft and the like do not penetrate the container and the contamination source in the container can be reduced. It can be reduced.
  • the inner and outer frames are concentrically arranged in the same plane, a simpler container shape can be adopted.
  • FIG. 3 is a vertical cross-sectional view along line AA of FIG. 2; It is a figure which shows the example of the rotation mechanism of an outer ring. It is a figure which shows the structure of an inner ring. It is a figure for demonstrating the usage method of the board
  • a first embodiment of the present invention will be described based on FIGS. 1 to 6.
  • the substrate rotation apparatus of this embodiment can be rotated while immersing a circular substrate in a chemical solution.
  • the substrate rotation device 10 of the present embodiment includes an outer ring (outer frame) 20, a container 40 disposed inside the outer ring, and an inner ring (inner frame disposed in the container). Body) and 50). The substrate 60 is held by the inner ring.
  • the outer ring 20 is provided with a plurality of magnetic coupling electromagnets 23 and a plurality of holding claw driving electromagnets 24 between the outer ring upper member 21 and the outer ring lower member 22.
  • electromagnet simply refers to "magnetic coupling electromagnet 23".
  • the electromagnets 23 are distributed in the circumferential direction of the outer ring 20.
  • an air core solenoid, a solenoid having a permanent magnet or a ferromagnetic core, or the like can be used as the electromagnet 23.
  • a magnetic field is generated by the electromagnet 23.
  • the magnitude of the magnetic force of the electromagnet 23 is controlled by a control device (not shown).
  • the number of electromagnets 23 is three or more.
  • the upper limit of the number of electromagnets 23 is not particularly limited, but is preferably 7 or less, more preferably 3 so as not to complicate the structure.
  • the electromagnets 23 are arranged such that at least one of the triangles having the three electromagnets as apexes is an acute triangle.
  • the electromagnets 23 are preferably arranged to equally divide the circumference of the outer ring.
  • the holding claw driving electromagnet 24 is for driving a holding claw 54 of an inner ring 50 described later.
  • the outer ring 20 is rotatable about a central axis Z.
  • the rotation of the outer ring causes the magnetic field generated by the electromagnet 23 to rotate around the central axis Z.
  • the outer ring can be pivoted and inclined about a straight line intersecting the central axis Z.
  • Such an operation can be realized by the gimbal mechanism. As an example, it is as follows in FIG.
  • the first support frame 61 is horizontally supported by a support mechanism (not shown).
  • the second support frame 62 is supported by the first support frame so as to be rotatable around the X axis, and can be rotated and tilted around the X axis by the first motor 63 (T).
  • the outer ring 20 is disposed on a bearing 65 fixed to a support 64 extending from the second support frame, and is rotated about the Z axis (R) by a belt (68) drive or the like by the second motor 66. As a result, the outer ring can rotate and tilt around the X axis, and can rotate around the Z axis.
  • container 40 is disposed inside outer ring 20 and supported by a support mechanism (not shown).
  • the shape of the container should not interfere with the inclination and rotation of the outer ring and the inner ring.
  • the container shape of this embodiment is a spherical shape whose top and bottom are cut, and even if the outer ring is inclined and rotated, it does not interfere with the outer ring and the inner ring.
  • the container 40 comprises a side wall 41, a lid 42 and a bottom 43, and the side wall constitutes a spherical surface. Bottom portion 43 is joined to the lower end of the side wall portion in a fluid-tight manner.
  • the chemical solution supply pipe 44 and the drainage pipe 45 are connected to the bottom.
  • the lid 42 can also be joined fluid-tightly to the upper end of the side wall. This is because the container itself can be tilted in a state in which the drug solution is stored inside the container.
  • the material of the container 40 is a dielectric having a relative permeability close to 1, which is not corroded by a chemical solution to be used and does not become a contamination source of the substrate.
  • the material of the container is preferably quartz.
  • pure water, ammonia, ammonia / hydrogen peroxide mixed solution, hydrochloric acid, hydrochloric acid / hydrogen peroxide mixed solution, sulfuric acid, sulfuric acid / hydrogen peroxide mixed solution Hydrogen peroxide, ozone water, a mixed solution of hydrofluoric acid and ozone water, a mixture of sulfuric acid and ozone water, and the like are used.
  • isopropyl alcohol, ethanol, methanol or the like is used for the substrate drying process.
  • inner ring 50 is disposed within container 40.
  • the inner ring 50 is provided with a plurality of magnetic coupling permanent magnets 53 and a plurality of holding claws 54 for gripping the substrate between the inner ring upper member 51 and the inner ring lower member 52.
  • the term "permanent magnet” refers to the "magnetic coupling permanent magnet 53".
  • the material of the inner ring upper member 51 and the inner ring lower member 52 is one that does not corrode depending on the chemical solution used and does not become a contamination source of the substrate.
  • the material of the inner ring upper member and the inner ring lower member is preferably quartz.
  • the permanent magnets 53 are distributed in the circumferential direction of the inner ring 50.
  • the number of permanent magnets 53 is three or more.
  • the permanent magnet 53 is disposed to be able to face the electromagnet 23 of the outer ring 20 in a one-on-one manner.
  • the permanent magnet 53 is enclosed in a quartz tube. This structure can be realized, for example, by inserting a permanent magnet into a quartz tube, closing both ends of the quartz tube with a quartz plate, and welding the end face of the quartz tube and the peripheral edge of the quartz plate.
  • the holding claws 54 are distributed in the circumferential direction of the inner ring 50.
  • the holding claw has a through hole 55 perpendicular to the surface of the inner ring, and is rotatable around a pin 56 inserted in the through hole.
  • the pin is fixed to the inner ring upper member 51 and the inner ring lower member 52 by welding or the like.
  • the holding claw driving permanent magnet 58 is embedded in the base end portion 57 of the holding claw, and the entire holding claw is rotated around the pin 56 by suction or repulsion with the holding claw driving electromagnet 24 of the outer ring 20. Do.
  • the tip 59 of the holding claw holds the substrate 60.
  • the number of holding claws 54 is three or more.
  • the upper limit of the number of holding claws is not particularly limited, but preferably 7 or less, more preferably 3 so as not to complicate the structure.
  • the holding claws are arranged such that at least one of the triangles whose apexes are three tips 59 is an acute triangle.
  • the holding claws are preferably arranged such that the tip 59 equally divides the outer periphery of the substrate 60.
  • the material of the holding claw 54 and the pin 56 is one that does not corrode by the chemical solution used and does not become a contamination source of the substrate.
  • the material of the holding claws and the pins is preferably quartz.
  • the electromagnets 23 distributed in the circumferential direction of the outer ring 20 and the permanent magnets 53 of the inner ring 50 face each other in a pair to form a magnetic coupling means.
  • the outer ring and the inner ring are magnetically coupled across the side wall of the container 40, and the inner ring is held floating in the container.
  • the larger the distance between the outer ring and the inner ring the more freedom in device design is preferred.
  • the feasible distance depends on the weight of the inner ring, the magnitude of the magnetic force of the electromagnet 23 and the permanent magnet 53, etc. According to the experimental results of the present inventors, the distance is increased to about 40 mm using a generally available material. be able to.
  • the distance between the outer ring 20 and the inner ring 50 is unstable only by the magnetic coupling means. Therefore, by detecting the distance between the outer ring and the inner ring by a sensor and adjusting the magnetic force of the electromagnet 23, the distance is kept constant. This keeps the inner ring concentric with the outer ring in the same plane.
  • the sensor detects the distance between the outer ring and the inner ring in at least three places. Preferably, detection at the position of the electromagnet 23 and the permanent magnet 53 facilitates control of the magnetic force of the electromagnet 23.
  • a sensor for example, a laser displacement sensor can be provided on the outer ring.
  • the lid of the container 40 is removed and opened upward, the substrate 60 is held by the robot arm 71 or the like and inserted into the container, and the substrate is lowered to a predetermined position (FIG. 6A).
  • the holding claws of the inner ring 50 grip the substrate.
  • the robot arm is pulled upward.
  • the lid 42 is attached to the container in a liquid-tight manner, and the outer ring 20 is tilted to tilt the inner ring and the substrate 60.
  • the chemical solution 46 (sulfuric acid / hydrogen peroxide mixed solution, etc.) is supplied from the chemical solution supply pipe 44 at the bottom of the container to fill the inside of the container (FIG. 6B).
  • the substrate 60 While the substrate 60 is immersed in the chemical solution, it is rotated about the central axis Z of the outer ring to process the substrate (FIG. 6C). After substrate processing, the container 40 and the outer ring 20 are tilted to further tilt the substrate, preferably to stand vertically (FIG. 6D). The chemical solution is drained from the drainage pipe 45 at the bottom of the container (FIG. 6E). The substrate 60 is returned to horizontal (FIG. 6F). Thereafter, the lid of the container is removed, and the substrate is taken out by a robot arm or the like.
  • a second embodiment of the present invention will be described based on FIG.
  • the present embodiment differs from the first embodiment in that the magnetic field is rotated using the principle of the linear motor.
  • the outer ring 25 in the substrate processing apparatus 11 of the present embodiment includes electromagnets 26 aligned in the circumferential direction as magnetic field generating means. Then, the outer ring itself does not rotate around the central axis, but with the outer ring stationary, the magnetic field is rotated by sequentially turning on and off the electromagnet 26 in the circumferential direction or reversing the polarity. Thereby, the inner ring 50 is rotated following the rotational change of the magnetic field by attraction and / or repulsion between the electromagnet 26 and the permanent magnet 53.
  • the holding claw 54 is driven by an electromagnet (26A in FIG. 7) at a position facing the holding claw driving permanent magnet 58 among the electromagnets 26. Specifically, when opening and closing the holding claw 54 when the inner ring 50 is stopped, the polarity of the electromagnet 26A at a position facing the holding claw driving permanent magnet 58 is appropriately reversed. Then, during rotation of the inner ring, the polarity and the magnetic force of the electromagnet 26 are controlled so that the holding claw holds the substrate.
  • the configurations of the other parts of the outer ring 20, the container 40 and the inner ring 50 are the same as in the first embodiment.
  • the rotation mechanism and the like of the outer ring become unnecessary, and the device structure can be simplified.
  • a third embodiment of the present invention will be described based on FIG.
  • the present embodiment is different from the first embodiment in that the outer frame includes a non-rotating portion and a rotating portion.
  • the outer frame body 30 in the substrate processing apparatus 12 of the present embodiment includes a non-rotating portion 31 occupying the outer peripheral side and a rotating portion 33 occupying the inner peripheral side.
  • the rotating portion 33 is mechanically joined to the non-rotating portion via a support mechanism such as a bearing (not shown), and both are arranged concentrically in the same plane, and the relative positional relationship remains unchanged.
  • the non-rotating unit 31 includes electromagnets 32 aligned in the circumferential direction as magnetic field generating means.
  • the rotating portion 33 is formed by joining portions having different magnetic permeability along the circumferential direction.
  • the dark portion in FIG. 8 is a portion 34 with high permeability, and is made of, for example, a ferromagnetic material or a permanent magnet.
  • the light colored portion in FIG. 8 is a portion 35 with low permeability, and is made of, for example, various dielectrics.
  • the lines of magnetic force of the electromagnet 32 easily pass through the high permeability portion 34, so the magnetic flux density is high inside the high permeability portion 34 of the rotating portion 33. Conversely, the magnetic flux density is low inside the low magnetic permeability portion 35 of the rotating portion 33.
  • the high magnetic permeability portion 34 is disposed so as to be able to face the permanent magnet 53 distributed in the circumferential direction of the inner ring 50 and the permanent magnet 58 for driving a holding claw.
  • the electromagnet 32 of the non-rotating portion 31, the high magnetic permeability portion 34 of the rotating portion 33, and the permanent magnet 53 of the inner ring 50 are magnetically coupled, and the inner ring is held floating in the container 40. Further, when the non-rotating portion 31 is stationary, the rotating portion 33 rotationally moves around the central axis Z, whereby the magnetic field is rotated, and the inner ring is rotated following the rotational change of the magnetic field.
  • the driving method of the holding claw 54 is the same as that of the second embodiment. That is, when the holding claw 54 is opened and closed when the inner ring 50 is stopped, the polarity of the electromagnet 32A at the position facing the holding claw driving permanent magnet 58 is appropriately reversed.
  • the non-rotation portion 31 in which the electromagnet 32 is disposed does not rotate, wiring of the electromagnet 32 can be simplified.
  • the substrate rotation apparatus of the first to third embodiments has the advantages of the conventional immersion type substrate processing apparatus and the rotary type substrate processing apparatus.
  • the immersion method there is no problem of static electricity, and the addition of ultrasonic vibration makes it possible to improve the cleaning effect.
  • the uniformity of processing within the substrate surface is improved by rotating the substrate.
  • the substrate since the substrate is rotated in a state of being immersed in the chemical solution, it is possible to expect a lift-off effect in which dirt attached to the surface of the substrate is easily peeled off from the surface particularly in the cleaning step.
  • the shapes of the inner and outer frames are not limited to this, and may be, for example, a regular octagon or other polygons. .
  • the inner frame is provided with the magnetic coupling permanent magnet 53 and the holding claw driving permanent magnet 58, but a permanent magnet may be used instead of the permanent magnet.
  • the freedom of rotation of the outer frame in each of the above embodiments is 2, but the outer frame The degree of freedom of rotation may be three. That is, the outer frame may be rotatable about the central axis and may be pivotable and tiltable about two straight lines intersecting the central axis. This allows the substrate to be processed while moving more complexly.
  • the degree of freedom of rotation of the outer frame may be one. That is, although the outer frame is rotatable around the central axis, the outer frame may not be inclined, and the direction of the central axis may be fixed. This can simplify the device structure.
  • the shape of the container may be substantially cylindrical rather than spherical. Even if the container is cylindrical, it does not interfere with the rotation of the outer frame and the inner frame. In this case, preferably, by centering the central axis not vertically but obliquely, it is difficult for the chemical solution or the like to remain on the substrate when the chemical solution is discharged.
  • the outer frame may also be translatable in the direction of its central axis. This facilitates mounting and removal of the substrate.
  • the substrate rotation apparatus of the present invention can be used as a substitute for a conventional substrate rotation apparatus such as a spin coater without immersing the substrate in a chemical solution.
  • a conventional substrate rotation apparatus such as a spin coater
  • processing conditions closer to the optimum can be selected. Even if the degree of freedom of rotation is 1, the rotary shaft and the like do not penetrate the container, and the source of contamination in the container can be reduced.
  • the substrate rotation apparatus of the present invention can be used in a dry process that does not use a chemical solution. In that case, provide the container with the required airtightness.

Abstract

[Problem] To provide a substrate rotating device with which a contamination source in a container can be reduced and which is easier to maintain. [Solution] A substrate rotating device 10 comprises: an outer frame body 20 which is provided with a magnetic field generating means and which can cause a generated magnetic field to rotate about a central axis; a container 40 disposed on the inside of the outer frame body; an inner frame body 50 which is disposed in the container and is provided with a substrate 60 holding means and circumferentially distributed magnets or ferromagnetic materials; a magnetic coupling means which magnetically couples the outer frame body with the inner frame body to cause the inner frame body to float, and which causes the inner frame body to rotate so as to follow a rotational change in the magnetic field; and a gap adjusting means which keeps a constant interval between the outer frame body and the inner frame body, and which maintains the inner frame body concentric with the outer frame body.

Description

基板回転装置および基板処理装置Substrate rotation apparatus and substrate processing apparatus
　本発明は、半導体製造工程などで利用可能な基板回転装置ないし基板処理装置に関する。 The present invention relates to a substrate rotation apparatus or substrate processing apparatus that can be used in a semiconductor manufacturing process or the like.
　半導体製造工程は、フォトレジストの塗布・現像、エッチング、洗浄など、ウェハを薬液等で処理する工程を多く含む。これらの工程には、枚葉式の基板回転装置や、薬液で満たされた処理槽にウェハを浸漬する浸漬装置が用いられ、それぞれに一長一短がある。浸漬方式では、静電気の発生がない点、超音波振動の付加により洗浄効率を上げられる点などが長所として、処理槽内の薬液の不均一などが短所として挙げられる。回転方式では、処理条件の制御パラメータが多い点、ウェハ面内での処理の均一性に優れる点などが長所として挙げられる。 The semiconductor manufacturing process includes many processes of processing the wafer with a chemical solution or the like, such as application / development of a photoresist, etching, and cleaning. In these steps, a single-wafer type substrate rotating apparatus and an immersion apparatus for immersing the wafer in a treatment tank filled with a chemical solution are used, each having advantages and disadvantages. The immersion method is advantageous in that no static electricity is generated and that the cleaning efficiency can be increased by the addition of ultrasonic vibration. The rotation method has advantages such as a large number of control parameters of the processing conditions and an excellent uniformity of processing within the wafer surface.
　一方、従来の基板回転装置では、ウェハを固定するステージの回転軸（シャフト）が容器底部を貫通するため、貫通部のシール部分の腐食や、シール部分からの汚染などの問題があった。これに対して、特許文献１には、密閉容器内に収容する回転板を、容器外部下方に配置された第二種超電導体により磁気浮上させ、容器周囲に配置された回転磁界コイルにより回転駆動する、磁気的浮上回転処理装置が記載されている。 On the other hand, in the conventional substrate rotation apparatus, since the rotation shaft (shaft) of the stage for fixing the wafer penetrates the bottom of the container, there are problems such as corrosion of the sealing portion of the penetrating portion and contamination from the sealing portion. On the other hand, according to Patent Document 1, the rotary plate housed in the closed vessel is magnetically levitated by the type II superconductor disposed below the outside of the vessel, and rotationally driven by the rotating magnetic field coil disposed around the vessel. A magnetic levitation and rotation processing apparatus is described.
特開２００８－７３６３６号公報JP, 2008-73636, A
　しかし、特許文献１に記載された装置では、超伝導体を冷却するために設備が大がかりになるという問題があり、また、容器形状が複雑なため清掃等の保守作業の作業性に改善の余地があった。 However, the apparatus described in Patent Document 1 has a problem that the equipment becomes large in order to cool the superconductor, and the container shape is complicated, and there is room for improvement in the workability of maintenance work such as cleaning. was there.
　本発明は、上記を考慮してなされたものであり、容器内の汚染源を減らし、より保守が容易な基板回転装置を提供することを目的とする。 The present invention has been made in consideration of the above, and it is an object of the present invention to provide a substrate rotation apparatus which reduces the sources of contamination in the container and is easier to maintain.
　本発明の基板回転装置は、磁場発生手段を備え、発生した磁場を中心軸の周りに回転可能な外枠体と、前記外枠体の内側に配置された容器と、前記容器内に配置され、基板保持手段と周方向に分散配置された磁石または強磁性体とを備える内枠体と、前記外枠体と前記内枠体を磁気的に結合して、該内枠体を浮上させるとともに、該内枠体を前記磁場の回転変化に追随させて回転させる磁気結合手段と、前記外枠体と前記内枠体の間隔を一定に保ち、該内枠体を該外枠体と同心に維持するギャップ調整手段とを有する。 The substrate rotating apparatus according to the present invention comprises an outer frame body provided with magnetic field generating means and capable of rotating the generated magnetic field around a central axis, a container disposed inside the outer frame body, and disposed in the container An inner frame body including a substrate holding means and magnets or ferromagnetic members dispersed in the circumferential direction, the outer frame body and the inner frame body magnetically coupled to float the inner frame body; And a magnetic coupling means for rotating the inner frame following the rotational change of the magnetic field, keeping a constant distance between the outer frame and the inner frame, and making the inner frame concentric with the outer frame. And gap adjusting means for maintaining.
　ここで、外枠体の中心軸とは、外枠体の中心を通り、外枠体の面に垂直な直線である。また、磁場を中心軸の周りに回転させるとは、磁束密度の分布が中心軸の周りに回転しているかのように磁場を変化させることをいう。 Here, the central axis of the outer frame is a straight line passing through the center of the outer frame and perpendicular to the surface of the outer frame. Further, rotating the magnetic field about the central axis means changing the magnetic field as if the distribution of the magnetic flux density is rotating about the central axis.
　この構成により、基板を保持した内リングを容器内に浮上させて回転させられるので、回転シャフト等が容器を貫通することがなく、容器内の汚染源を減らすことができる。また、内リングと外リングが同一平面内で同心に配されるので、容器形状としてより単純な形状を採用することができる。 With this configuration, the inner ring holding the substrate can be floated and rotated in the container, so that the rotating shaft and the like do not penetrate the container, and the contamination source in the container can be reduced. In addition, since the inner ring and the outer ring are disposed concentrically in the same plane, a simpler shape can be adopted as the container shape.
　本発明の一つの態様において、前記磁場発生手段が、前記内枠体の前記磁石または強磁性体と対向するように前記外枠体の周方向に分散配置された電磁石であり、前記磁場の回転が前記外枠体の回転運動によって実現され、前記磁気結合手段が前記内枠体の磁石または強磁性体と前記外枠体の電磁石とで構成される。 In one aspect of the present invention, the magnetic field generation means is an electromagnet distributed in the circumferential direction of the outer frame so as to face the magnet or ferromagnetic material of the inner frame, and the rotation of the magnetic field is performed. Is realized by the rotational movement of the outer frame, and the magnetic coupling means is constituted by the magnet or ferromagnetic of the inner frame and the electromagnet of the outer frame.
　本発明の他の態様において、前記磁場発生手段が前記外枠体の周方向に整列配置された電磁石であり、前記磁場の回転が前記整列配置された電磁石の極性を順次変化させることにより実現され、前記磁気結合手段が前記内枠体の磁石または強磁性体と前記外枠体の電磁石とで構成される。 In another aspect of the present invention, the magnetic field generating means is an electromagnet aligned in the circumferential direction of the outer frame, and rotation of the magnetic field is realized by sequentially changing the polarity of the aligned electromagnets. The magnetic coupling means is composed of the magnet or the ferromagnetic member of the inner frame and the electromagnet of the outer frame.
　本発明の他の態様において、前記外枠体は、該外枠体の外周側を占める非回転部と、該外枠体の内周側を占め、透磁率の異なる部分が周方向に繋ぎ合わされて形成された回転部からなる。そして、前記非回転部は、前記磁場発生手段として、周方向に整列配置された電磁石を備え、前記磁場の回転が前記回転部の回転運動によって実現され、前記磁気結合手段が前記内枠体の磁石または強磁性体、前記回転部および前記非回転部の電磁石で構成される。 In another aspect of the present invention, the outer frame is a non-rotating portion occupying the outer circumferential side of the outer frame and an inner circumferential side of the outer frame, and portions having different magnetic permeability are joined in the circumferential direction. It consists of the rotation part formed. The non-rotational part includes electromagnets aligned in the circumferential direction as the magnetic field generating means, wherein rotation of the magnetic field is realized by rotational movement of the rotating part, and the magnetic coupling means is of the inner frame It comprises a magnet or a ferromagnetic body, an electromagnet of the rotating part and the non-rotating part.
　上記いずれかの基板回転装置において、好ましくは、前記外枠体はさらに、前記中心軸と交差する直線の周りに回動して傾斜可能である。この構成により、基板を水平面から傾斜させた状態で回転させることができる。 In any one of the above-described substrate rotating apparatuses, preferably, the outer frame is further rotatable and tiltable around a straight line intersecting the central axis. According to this configuration, the substrate can be rotated while being inclined from the horizontal surface.
　好ましくは、前記外枠体はさらに、前記中心軸方向に並進可能である。これにより、基板の装着や取り外し作業がより容易になる。 Preferably, the outer frame is further translatable in the central axis direction. This makes it easier to mount and remove the substrate.
　好ましくは、前記容器は、底部に薬液供給手段および排液手段を有し、内部に薬液を貯留して前記内枠体に保持された基板を浸漬して処理可能である。ここで、薬液には純水を含む。この構成により、基板を薬液に浸漬した状態で回転させることができる。 Preferably, the container has a chemical solution supply unit and a drainage unit at the bottom, and can be processed by storing the chemical solution inside and immersing the substrate held by the inner frame. Here, the chemical solution contains pure water. With this configuration, the substrate can be rotated in a state of being immersed in the chemical solution.
　本発明の基板処理装置は、磁場発生手段を備え、発生した磁場を中心軸の周りに回転可能な外枠体と、前記外枠体の内側に配置され、内部に処理薬液を収容可能な容器と、前記容器内に配置され、基板保持手段と周方向に分散配置された磁石または強磁性体とを備える内枠体と、前記外枠体と前記内枠体を磁気的に結合して、該内枠体を浮上させるとともに、該内枠体を前記磁場の回転変化に追随させて回転させる磁気結合手段と、前記外枠体と前記内枠体の間隔を一定に保ち、該内枠体を該外枠体と同心に維持するギャップ調整手段とを有する。 The substrate processing apparatus according to the present invention comprises a magnetic field generating means, an outer frame body capable of rotating the generated magnetic field around a central axis, and a container which is disposed inside the outer frame body and can accommodate the processing chemical solution inside. And an inner frame body disposed in the container and provided with the substrate holding means and magnets or ferromagnetic members distributed in the circumferential direction, and the outer frame body and the inner frame body are magnetically coupled, Magnetic coupling means for floating the inner frame and rotating the inner frame following the rotational change of the magnetic field, and keeping the distance between the outer frame and the inner frame constant, the inner frame And gap adjusting means for keeping the frame concentric with the outer frame.
　本発明の基板回転装置または基板処理装置によれば、基板を保持した内枠体を容器内に浮上させて回転させられるので、回転シャフト等が容器を貫通することがなく、容器内の汚染源を減らすことができる。また、内枠体と外枠体が同一平面内で同心状に配されるので、より単純な容器形状を採用することができる。 According to the substrate rotation apparatus or the substrate processing apparatus of the present invention, the inner frame holding the substrate can be floated and rotated in the container, so that the rotary shaft and the like do not penetrate the container and the contamination source in the container can be reduced. It can be reduced. In addition, since the inner and outer frames are concentrically arranged in the same plane, a simpler container shape can be adopted.
本発明の第１実施形態の基板回転装置の斜視図である。It is a perspective view of a substrate rotation device of a 1st embodiment of the present invention. 本発明の第１実施形態の基板回転装置を内リングおよび外リングの厚さ方向の中央で切断した断面図である。It is sectional drawing which cut | disconnected the center of the thickness direction of the inner ring and the outer ring of the board | substrate rotation apparatus of 1st Embodiment of this invention. 図２のＡＡ線に沿った垂直断面図である。FIG. 3 is a vertical cross-sectional view along line AA of FIG. 2; 外リングの回転機構の例を示す図である。It is a figure which shows the example of the rotation mechanism of an outer ring. 内リングの構成を示す図である。It is a figure which shows the structure of an inner ring. 本発明の第１実施形態の基板回転装置の使用方法を説明するための図である。It is a figure for demonstrating the usage method of the board | substrate rotation apparatus of 1st Embodiment of this invention. 本発明の第２実施形態の基板回転装置を内リングおよび外リングの厚さ方向の中央で切断した断面図である。It is sectional drawing which cut | disconnected the center of the thickness direction of the inner ring and the outer ring of the board | substrate rotation apparatus of 2nd Embodiment of this invention. 本発明の第３実施形態の基板回転装置を内リングおよび外枠体の厚さ方向の中央で切断した断面図である。It is sectional drawing which cut | disconnected the center of the thickness direction of the inner ring and the outer frame of the board | substrate rotation apparatus of 3rd Embodiment of this invention.
　本発明の第１実施形態を図１～図６に基づいて説明する。この実施形態の基板回転装置は、円形の基板を薬液に浸漬しながら回転させることができる。 A first embodiment of the present invention will be described based on FIGS. 1 to 6. The substrate rotation apparatus of this embodiment can be rotated while immersing a circular substrate in a chemical solution.
　図１を参照して、本実施形態の基板回転装置１０は、外リング（外枠体）２０と、外リングの内側に配置された容器４０と、容器内に配置された内リング（内枠体）５０とを有する。内リングには基板６０が保持される。 Referring to FIG. 1, the substrate rotation device 10 of the present embodiment includes an outer ring (outer frame) 20, a container 40 disposed inside the outer ring, and an inner ring (inner frame disposed in the container). Body) and 50). The substrate 60 is held by the inner ring.
　図２および図３を参照して、外リング２０は、外リング上部材２１と外リング下部材２２の間に、複数の磁気結合用電磁石２３と複数の保持爪駆動用電磁石２４とを備える。なお、本明細書中で単に「電磁石」というときは「磁気結合用電磁石２３」を指す。 Referring to FIGS. 2 and 3, the outer ring 20 is provided with a plurality of magnetic coupling electromagnets 23 and a plurality of holding claw driving electromagnets 24 between the outer ring upper member 21 and the outer ring lower member 22. In the present specification, the term "electromagnet" simply refers to "magnetic coupling electromagnet 23".
　電磁石２３は、外リング２０の周方向に分散配置されている。電磁石２３としては、空芯のソレノイドや、永久磁石または強磁性体のコアを有するソレノイド等を用いることができる。この電磁石２３によって磁場が発生する。電磁石２３は図示しない制御装置によって磁力の大小が制御される。電磁石２３の数は３個以上である。電磁石２３の数の上限は特に限定されないが、構造が複雑になり過ぎないよう、好ましくは７個以下であり、より好ましくは３個である。電磁石２３は、３個の電磁石を頂点とする三角形のうち、少なくとも１つが鋭角三角形となるように配置される。電磁石２３は、好ましくは、外リングの周を等分するように配置される。 The electromagnets 23 are distributed in the circumferential direction of the outer ring 20. As the electromagnet 23, an air core solenoid, a solenoid having a permanent magnet or a ferromagnetic core, or the like can be used. A magnetic field is generated by the electromagnet 23. The magnitude of the magnetic force of the electromagnet 23 is controlled by a control device (not shown). The number of electromagnets 23 is three or more. The upper limit of the number of electromagnets 23 is not particularly limited, but is preferably 7 or less, more preferably 3 so as not to complicate the structure. The electromagnets 23 are arranged such that at least one of the triangles having the three electromagnets as apexes is an acute triangle. The electromagnets 23 are preferably arranged to equally divide the circumference of the outer ring.
　保持爪駆動用電磁石２４は、後述する内リング５０の保持爪５４を駆動するためのものである。 The holding claw driving electromagnet 24 is for driving a holding claw 54 of an inner ring 50 described later.
　外リング２０は、中心軸Ｚの周りに回転可能である。外リングが回転することにより、電磁石２３によって発生した磁場が中心軸Ｚの周りに回転する。外リングはさらに、中心軸Ｚと交差する直線を軸として回動して傾斜可能である。かかる動作はジンバル機構によって実現できる。一例として、図４では次のとおりである。第１支持枠６１は図示しない支持機構に水平に支持されている。第２支持枠６２はＸ軸周りに回動可能に第１支持枠に支持され、第１モーター６３によってＸ軸周りに回動して傾斜可能である（Ｔ）。外リング２０は、第２支持枠から延びる支柱６４に固定されたベアリング６５上に配され、第２モーター６６によって、ベルト（６８）駆動等によりＺ軸周りに回転する（Ｒ）。これにより、外リングはＸ軸周りに回動して傾斜可能で、Ｚ軸周りに回転可能となる。 The outer ring 20 is rotatable about a central axis Z. The rotation of the outer ring causes the magnetic field generated by the electromagnet 23 to rotate around the central axis Z. Further, the outer ring can be pivoted and inclined about a straight line intersecting the central axis Z. Such an operation can be realized by the gimbal mechanism. As an example, it is as follows in FIG. The first support frame 61 is horizontally supported by a support mechanism (not shown). The second support frame 62 is supported by the first support frame so as to be rotatable around the X axis, and can be rotated and tilted around the X axis by the first motor 63 (T). The outer ring 20 is disposed on a bearing 65 fixed to a support 64 extending from the second support frame, and is rotated about the Z axis (R) by a belt (68) drive or the like by the second motor 66. As a result, the outer ring can rotate and tilt around the X axis, and can rotate around the Z axis.
　図１および図３を参照して、容器４０は外リング２０の内側に配置され、図示しない支持機構に支持されている。容器の形状は、外リングおよび内リングの傾斜・回転に干渉しないことを要する。本実施形態の容器形状は上下が切断された球状であり、外リングが傾斜・回転しても、外リングおよび内リングと干渉することがない。容器４０は側壁部４１と蓋部４２と底部４３からなり、側壁部が球面を構成している。底部４３は側壁部下端と液密に接合される。底部には薬液供給管４４および排液管４５が接続されている。好ましくは、蓋部４２も側壁部上端と液密に接合可能とする。容器内部に薬液を貯留した状態で、容器自体を傾けられるからである。 Referring to FIGS. 1 and 3, container 40 is disposed inside outer ring 20 and supported by a support mechanism (not shown). The shape of the container should not interfere with the inclination and rotation of the outer ring and the inner ring. The container shape of this embodiment is a spherical shape whose top and bottom are cut, and even if the outer ring is inclined and rotated, it does not interfere with the outer ring and the inner ring. The container 40 comprises a side wall 41, a lid 42 and a bottom 43, and the side wall constitutes a spherical surface. Bottom portion 43 is joined to the lower end of the side wall portion in a fluid-tight manner. The chemical solution supply pipe 44 and the drainage pipe 45 are connected to the bottom. Preferably, the lid 42 can also be joined fluid-tightly to the upper end of the side wall. This is because the container itself can be tilted in a state in which the drug solution is stored inside the container.
　容器４０の材質は、比透磁率が１に近い誘電体であって、使用する薬液によって腐食せず、基板の汚染源とならないものを用いる。容器の材質は、好ましくは石英である。容器内に充填される処理薬液として、例えば基板洗浄処理であれば、純水、アンモニア、アンモニア・過酸化水素混合液、塩酸、塩酸・過酸化水素混合液、硫酸、硫酸・過酸化水素混合液、過酸化水素、オゾン水、フッ酸・オゾン水混合液、硫酸・オゾン水混合液等が使用される。エッチング処理であれば、硝酸、フッ酸、酢酸、フッ酸・過酸化水素混合液、フッ酸・硝酸混合液、フッ酸・硝酸・酢酸混合液、フッ酸・塩酸混合液、硫酸・塩酸混合液、硫酸・硝酸混合液、硝酸・塩酸混合液等が使用される。基板乾燥処理であれば、イソプロピルアルコール、エタノール、メタノール等が使用される。 The material of the container 40 is a dielectric having a relative permeability close to 1, which is not corroded by a chemical solution to be used and does not become a contamination source of the substrate. The material of the container is preferably quartz. For example, in the case of substrate cleaning processing, as a processing chemical solution filled in the container, pure water, ammonia, ammonia / hydrogen peroxide mixed solution, hydrochloric acid, hydrochloric acid / hydrogen peroxide mixed solution, sulfuric acid, sulfuric acid / hydrogen peroxide mixed solution Hydrogen peroxide, ozone water, a mixed solution of hydrofluoric acid and ozone water, a mixture of sulfuric acid and ozone water, and the like are used. If it is an etching process, nitric acid, hydrofluoric acid, acetic acid, hydrofluoric acid / hydrogen peroxide mixed solution, hydrofluoric acid / nitric acid mixed solution, hydrofluoric acid / nitric acid / acetic acid mixed solution, hydrofluoric acid / hydrochloric acid mixed solution, sulfuric acid / hydrochloric acid mixed solution A mixed solution of sulfuric acid and nitric acid, a mixed solution of nitric acid and hydrochloric acid, etc. is used. For the substrate drying process, isopropyl alcohol, ethanol, methanol or the like is used.
　図２、図３および図５を参照して、内リング５０は、容器４０内に配置される。内リング５０は、内リング上部材５１と内リング下部材５２の間に、複数の磁気結合用永久磁石５３と、基板を把持するための複数の保持爪５４とを備える。なお、本明細書中で単に「永久磁石」というときは、この「磁気結合用永久磁石５３」を指す。 Referring to FIGS. 2, 3 and 5, inner ring 50 is disposed within container 40. The inner ring 50 is provided with a plurality of magnetic coupling permanent magnets 53 and a plurality of holding claws 54 for gripping the substrate between the inner ring upper member 51 and the inner ring lower member 52. In the present specification, the term "permanent magnet" refers to the "magnetic coupling permanent magnet 53".
　内リング上部材５１および内リング下部材５２の材質は、使用する薬液によって腐食しないもので、基板の汚染源とならないものを用いる。内リング上部材および内リング下部材の材質は、好ましくは石英である。 The material of the inner ring upper member 51 and the inner ring lower member 52 is one that does not corrode depending on the chemical solution used and does not become a contamination source of the substrate. The material of the inner ring upper member and the inner ring lower member is preferably quartz.
　永久磁石５３は、内リング５０の周方向に分散配置されている。永久磁石５３の数は３個以上である。永久磁石は５３、外リング２０の電磁石２３と一対一に対向可能であるように配置される。永久磁石５３は石英管に封入される。この構造は、例えば、永久磁石を石英管に挿入し、石英管の両端部を石英板で塞ぎ、石英管端面と石英板周縁部を溶接することにより実現できる。 The permanent magnets 53 are distributed in the circumferential direction of the inner ring 50. The number of permanent magnets 53 is three or more. The permanent magnet 53 is disposed to be able to face the electromagnet 23 of the outer ring 20 in a one-on-one manner. The permanent magnet 53 is enclosed in a quartz tube. This structure can be realized, for example, by inserting a permanent magnet into a quartz tube, closing both ends of the quartz tube with a quartz plate, and welding the end face of the quartz tube and the peripheral edge of the quartz plate.
　保持爪５４は、内リング５０の周方向に分散配置されている。保持爪は、内リングの面に垂直な貫通孔５５を有し、貫通孔に挿通されたピン５６の周りに回動可能である。ピンは内リング上部材５１および内リング下部材５２に溶接等で固定されている。保持爪の基端部５７には保持爪駆動用永久磁石５８が埋め込まれており、外リング２０の保持爪駆動用電磁石２４との吸引または反発によって、保持爪全体がピン５６の周りに回動する。保持爪の先端部５９は、基板６０を把持する。 The holding claws 54 are distributed in the circumferential direction of the inner ring 50. The holding claw has a through hole 55 perpendicular to the surface of the inner ring, and is rotatable around a pin 56 inserted in the through hole. The pin is fixed to the inner ring upper member 51 and the inner ring lower member 52 by welding or the like. The holding claw driving permanent magnet 58 is embedded in the base end portion 57 of the holding claw, and the entire holding claw is rotated around the pin 56 by suction or repulsion with the holding claw driving electromagnet 24 of the outer ring 20. Do. The tip 59 of the holding claw holds the substrate 60.
　保持爪５４の数は３個以上である。保持爪の数の上限は特に限定されないが、構造が複雑になり過ぎないよう、好ましくは７個以下であり、より好ましくは３個である。保持爪は、３つの先端部５９を頂点とする三角形のうち、少なくとも１つが鋭角三角形となるように配置される。保持爪は、好ましくは、先端部５９が基板６０の外周を等分するように配置される。 The number of holding claws 54 is three or more. The upper limit of the number of holding claws is not particularly limited, but preferably 7 or less, more preferably 3 so as not to complicate the structure. The holding claws are arranged such that at least one of the triangles whose apexes are three tips 59 is an acute triangle. The holding claws are preferably arranged such that the tip 59 equally divides the outer periphery of the substrate 60.
　保持爪５４およびピン５６の材質は、使用する薬液によって腐食しないもので、基板の汚染源とならないものを用いる。保持爪およびピンの材質は、好ましくは石英である。 The material of the holding claw 54 and the pin 56 is one that does not corrode by the chemical solution used and does not become a contamination source of the substrate. The material of the holding claws and the pins is preferably quartz.
　図２および図３を参照して、外リング２０の周方向に分散配置された電磁石２３と内リング５０の永久磁石５３は一対一に対向して磁気結合手段と構成する。これにより、外リングと内リングは容器４０の側壁を挟んで磁気的に結合され、内リングは容器内で宙に浮いた状態に保持される。外リングと内リングの間隔は、それが大きいほど装置設計の自由度が増すので好ましい。実現可能な間隔は、内リングの重さ、電磁石２３と永久磁石５３の磁力の大きさなどによるが、本発明者らの実験結果からは、一般に入手可能な材料を用いて４０ｍｍ程度まで大きくすることができる。 Referring to FIGS. 2 and 3, the electromagnets 23 distributed in the circumferential direction of the outer ring 20 and the permanent magnets 53 of the inner ring 50 face each other in a pair to form a magnetic coupling means. As a result, the outer ring and the inner ring are magnetically coupled across the side wall of the container 40, and the inner ring is held floating in the container. The larger the distance between the outer ring and the inner ring, the more freedom in device design is preferred. The feasible distance depends on the weight of the inner ring, the magnitude of the magnetic force of the electromagnet 23 and the permanent magnet 53, etc. According to the experimental results of the present inventors, the distance is increased to about 40 mm using a generally available material. be able to.
　内リング５０が容器４０内で宙に浮いた状態で、外リング２０が中心軸Ｚの周りに回転運動すると、内リングは外リングの回転運動に追随して回転する。 When the outer ring 20 rotationally moves about the central axis Z with the inner ring 50 floating in the air within the container 40, the inner ring rotates following the rotational movement of the outer ring.
　しかし、上記磁気結合手段のみによっては、外リング２０と内リング５０の間隔は不安定である。そこで、外リングと内リングの間隔をセンサーで検出し、電磁石２３の磁力を調整することによって、当該間隔が一定に保たれる。これにより、内リングが外リングと同一平面内で同心に維持される。センサーは、外リングと内リングの間隔を、少なくとも３か所で検出する。好ましくは電磁石２３と永久磁石５３の位置で検出することで、電磁石２３の磁力の制御が容易になる。センサーとしては、例えば、外リングにレーザー式変位センサーを設けることができる。 However, the distance between the outer ring 20 and the inner ring 50 is unstable only by the magnetic coupling means. Therefore, by detecting the distance between the outer ring and the inner ring by a sensor and adjusting the magnetic force of the electromagnet 23, the distance is kept constant. This keeps the inner ring concentric with the outer ring in the same plane. The sensor detects the distance between the outer ring and the inner ring in at least three places. Preferably, detection at the position of the electromagnet 23 and the permanent magnet 53 facilitates control of the magnetic force of the electromagnet 23. As a sensor, for example, a laser displacement sensor can be provided on the outer ring.
　次に、本実施形態の基板回転装置の使用方法を、図６を参照して説明する。 Next, a method of using the substrate rotation apparatus of the present embodiment will be described with reference to FIG.
　まず、容器４０の蓋部を外して上方に開放し、ロボットアーム７１等により基板６０を保持して容器内に挿入し、基板を所定の位置まで下降させる（図６Ａ）。内リング５０の保持爪で基板を把持する。基板を内リングに受け渡した後、ロボットアームを上方に引き抜く。容器に蓋部４２を液密に装着して、外リング２０を傾斜させることにより、内リングおよび基板６０を傾斜させる。容器底部の薬液供給管４４から薬液４６（硫酸・過酸化水素混合液等）を供給して、容器内を満たす（図６Ｂ）。基板６０を薬液に浸漬した状態で、外リングの中心軸Ｚの周りに回転させて基板を処理する（図６Ｃ）。基板処理終了後、容器４０および外リング２０を傾斜させ、基板をさらに傾け、好ましくは垂直に立てる（図６Ｄ）。容器底部の排液管４５から薬液を排出する（図６Ｅ）。基板６０を水平に戻す（図６Ｆ）。その後、容器の蓋部を外して、ロボットアーム等により基板を取り出す。 First, the lid of the container 40 is removed and opened upward, the substrate 60 is held by the robot arm 71 or the like and inserted into the container, and the substrate is lowered to a predetermined position (FIG. 6A). The holding claws of the inner ring 50 grip the substrate. After delivering the substrate to the inner ring, the robot arm is pulled upward. The lid 42 is attached to the container in a liquid-tight manner, and the outer ring 20 is tilted to tilt the inner ring and the substrate 60. The chemical solution 46 (sulfuric acid / hydrogen peroxide mixed solution, etc.) is supplied from the chemical solution supply pipe 44 at the bottom of the container to fill the inside of the container (FIG. 6B). While the substrate 60 is immersed in the chemical solution, it is rotated about the central axis Z of the outer ring to process the substrate (FIG. 6C). After substrate processing, the container 40 and the outer ring 20 are tilted to further tilt the substrate, preferably to stand vertically (FIG. 6D). The chemical solution is drained from the drainage pipe 45 at the bottom of the container (FIG. 6E). The substrate 60 is returned to horizontal (FIG. 6F). Thereafter, the lid of the container is removed, and the substrate is taken out by a robot arm or the like.
　本発明の第２実施形態を図７に基づいて説明する。本実施形態は、リニアモーターの原理を利用して磁場を回転させる点で第１実施形態と異なる。 A second embodiment of the present invention will be described based on FIG. The present embodiment differs from the first embodiment in that the magnetic field is rotated using the principle of the linear motor.
　図７を参照して、本実施形態の基板処理装置１１における外リング２５は、磁場発生手段として、周方向に整列配置された電磁石２６を備える。そして、外リング自体が中心軸の周りに回転運動するのではなく、外リングが静止した状態で、電磁石２６を周方向に順次オンオフしたり、極性を反転させることにより、磁場を回転させる。これにより、電磁石２６と永久磁石５３との吸引および／または反発により、内リング５０を磁場の回転変化に追随させて回転させる。 Referring to FIG. 7, the outer ring 25 in the substrate processing apparatus 11 of the present embodiment includes electromagnets 26 aligned in the circumferential direction as magnetic field generating means. Then, the outer ring itself does not rotate around the central axis, but with the outer ring stationary, the magnetic field is rotated by sequentially turning on and off the electromagnet 26 in the circumferential direction or reversing the polarity. Thereby, the inner ring 50 is rotated following the rotational change of the magnetic field by attraction and / or repulsion between the electromagnet 26 and the permanent magnet 53.
　保持爪５４は、上記電磁石２６のうち、保持爪駆動用永久磁石５８と対向する位置にある電磁石（図７の２６Ａ）によって駆動される。具体的には、内リング５０の停止時に保持爪５４を開閉するときは、保持爪駆動用永久磁石５８と対向する位置にある電磁石２６Ａの極性を適当に反転させる。そして、内リング回転中は、保持爪が基板を保持した状態を維持できるように、電磁石２６の極性や磁力を制御する。 The holding claw 54 is driven by an electromagnet (26A in FIG. 7) at a position facing the holding claw driving permanent magnet 58 among the electromagnets 26. Specifically, when opening and closing the holding claw 54 when the inner ring 50 is stopped, the polarity of the electromagnet 26A at a position facing the holding claw driving permanent magnet 58 is appropriately reversed. Then, during rotation of the inner ring, the polarity and the magnetic force of the electromagnet 26 are controlled so that the holding claw holds the substrate.
　外リング２０のその他の部分、容器４０および内リング５０の構成は、第１実施形態と同様である。 The configurations of the other parts of the outer ring 20, the container 40 and the inner ring 50 are the same as in the first embodiment.
　本実施形態によれば、外リングの回転機構等が不要となり、装置構造を単純化できる。 According to the present embodiment, the rotation mechanism and the like of the outer ring become unnecessary, and the device structure can be simplified.
　本発明の第３実施形態を図８に基づいて説明する。本実施形態は、外枠体が非回転部と回転部からなる点で第１実施形態と異なる。 A third embodiment of the present invention will be described based on FIG. The present embodiment is different from the first embodiment in that the outer frame includes a non-rotating portion and a rotating portion.
　図８を参照して、本実施形態の基板処理装置１２における外枠体３０は、その外周側を占める非回転部３１と、内周側を占める回転部３３からなる。回転部３３は、図示しないベアリング等の支持機構を介して非回転部と機械的に接合されており、両者は同一平面内で同心に配置され、相対的な位置関係は不変である。 Referring to FIG. 8, the outer frame body 30 in the substrate processing apparatus 12 of the present embodiment includes a non-rotating portion 31 occupying the outer peripheral side and a rotating portion 33 occupying the inner peripheral side. The rotating portion 33 is mechanically joined to the non-rotating portion via a support mechanism such as a bearing (not shown), and both are arranged concentrically in the same plane, and the relative positional relationship remains unchanged.
　非回転部３１は、磁場発生手段として、周方向に整列配置された電磁石３２を備える。回転部３３は、周方向に沿って透磁率の異なる部分が繋ぎ合わせれて形成されている。図８の濃色部は透磁率の高い部分３４であって、例えば、強磁性体や永久磁石からなる。図８の淡色部は透磁率の低い部分３５であって、例えば、各種誘電体からなる。電磁石３２による磁力線は高透磁率部分３４を通りやすいので、回転部３３の高透磁率部分３４の内側は磁束密度が高くなる。逆に、回転部３３の低透磁率部分３５の内側は磁束密度が低くなる。高透磁率部分３４は、内リング５０の周方向に分散配置された永久磁石５３および保持爪駆動用永久磁石５８と対向可能なように配置される。 The non-rotating unit 31 includes electromagnets 32 aligned in the circumferential direction as magnetic field generating means. The rotating portion 33 is formed by joining portions having different magnetic permeability along the circumferential direction. The dark portion in FIG. 8 is a portion 34 with high permeability, and is made of, for example, a ferromagnetic material or a permanent magnet. The light colored portion in FIG. 8 is a portion 35 with low permeability, and is made of, for example, various dielectrics. The lines of magnetic force of the electromagnet 32 easily pass through the high permeability portion 34, so the magnetic flux density is high inside the high permeability portion 34 of the rotating portion 33. Conversely, the magnetic flux density is low inside the low magnetic permeability portion 35 of the rotating portion 33. The high magnetic permeability portion 34 is disposed so as to be able to face the permanent magnet 53 distributed in the circumferential direction of the inner ring 50 and the permanent magnet 58 for driving a holding claw.
　非回転部３１の電磁石３２、回転部３３の高透磁率部分３４および内リング５０の永久磁石５３は磁気的に結合され、内リングは容器４０内で宙に浮いた状態に保持される。また、非回転部３１が静止した状態で、回転部３３が中心軸Ｚの周りに回転運動することにより、磁場が回転し、内リングが磁場の回転変化に追随して回転する。 The electromagnet 32 of the non-rotating portion 31, the high magnetic permeability portion 34 of the rotating portion 33, and the permanent magnet 53 of the inner ring 50 are magnetically coupled, and the inner ring is held floating in the container 40. Further, when the non-rotating portion 31 is stationary, the rotating portion 33 rotationally moves around the central axis Z, whereby the magnetic field is rotated, and the inner ring is rotated following the rotational change of the magnetic field.
　保持爪５４の駆動方法は第２実施形態と同様である。すなわち、内リング５０の停止時に保持爪５４を開閉するときは、保持爪駆動用永久磁石５８と対向する位置にある電磁石３２Ａの極性を適当に反転させる。 The driving method of the holding claw 54 is the same as that of the second embodiment. That is, when the holding claw 54 is opened and closed when the inner ring 50 is stopped, the polarity of the electromagnet 32A at the position facing the holding claw driving permanent magnet 58 is appropriately reversed.
　本実施形態によれば、電磁石３２が配置された非回転部３１が回転運動しないので、電磁石３２の配線を簡素化できる。 According to the present embodiment, since the non-rotation portion 31 in which the electromagnet 32 is disposed does not rotate, wiring of the electromagnet 32 can be simplified.
　上記第１～第３実施形態の基板回転装置は、従来の浸漬式基板処理装置と回転式基板処理装置の長所を併せ持つ。例えば、浸漬方式の長所として、静電気の問題がなく、超音波振動の付加により洗浄効果の向上が可能である。そして、回転方式の長所として、基板を回転させることにより基板面内での処理の均一性が改善される。また、基板を薬液に浸漬した状態で回転させるので、特に洗浄工程において、基板表面に付着した汚れが表面から剥がれやすくなるリフトオフ効果が期待できる。 The substrate rotation apparatus of the first to third embodiments has the advantages of the conventional immersion type substrate processing apparatus and the rotary type substrate processing apparatus. For example, as an advantage of the immersion method, there is no problem of static electricity, and the addition of ultrasonic vibration makes it possible to improve the cleaning effect. And, as an advantage of the rotation method, the uniformity of processing within the substrate surface is improved by rotating the substrate. In addition, since the substrate is rotated in a state of being immersed in the chemical solution, it is possible to expect a lift-off effect in which dirt attached to the surface of the substrate is easily peeled off from the surface particularly in the cleaning step.
　本発明は上記の実施形態に限られるものではなく、その技術的思想の範囲内で種々の変形が可能である。以下にいくつかの変形例を説明する。 The present invention is not limited to the embodiments described above, and various modifications are possible within the scope of the technical idea thereof. Several variations are described below.
　上記各実施形態の内枠体および外枠体は円環状であったが、内枠体および外枠体の形状はこれに限定されず、例えば、正８角形その他の多角形であってもよい。 Although the inner frame and the outer frame in each of the above embodiments are annular, the shapes of the inner and outer frames are not limited to this, and may be, for example, a regular octagon or other polygons. .
　また、上記各実施形態では、内枠体が磁気結合用永久磁石５３と保持爪駆動用永久磁石５８を備えるが、永久磁石に代えて強磁性体を備えるようにしてもよい。 In each of the above embodiments, the inner frame is provided with the magnetic coupling permanent magnet 53 and the holding claw driving permanent magnet 58, but a permanent magnet may be used instead of the permanent magnet.
　また、外枠体の回転または回動の軸の数を「回転の自由度」と呼ぶことにすると、上記各実施形態の外枠体の回転の自由度は２であったが、外枠体の回転の自由度は３であってもよい。すなわち、外枠体は中心軸の周りに回転可能で、中心軸と交差する２本の直線の周りに回動して傾斜可能であってもよい。これにより、基板をより複雑に運動させながら処理することができる。 In addition, when the number of axes of rotation or rotation of the outer frame is referred to as "rotation freedom", the freedom of rotation of the outer frame in each of the above embodiments is 2, but the outer frame The degree of freedom of rotation may be three. That is, the outer frame may be rotatable about the central axis and may be pivotable and tiltable about two straight lines intersecting the central axis. This allows the substrate to be processed while moving more complexly.
　あるいは、外枠体の回転の自由度は１であってもよい。すなわち、外枠体は中心軸周りに回転可能であるが、外枠体は傾斜せず、中心軸の向きが固定されていてもよい。これにより、装置構造を単純化できる。また、容器形状を球形ではなく略円筒形にすることもできる。容器が円筒形でも外枠体および内枠体の回転に干渉しないからである。この場合、好ましくは、中心軸を鉛直ではなく斜めにしておくことで、薬液排出時に基板上に薬液等が残留しにくい。 Alternatively, the degree of freedom of rotation of the outer frame may be one. That is, although the outer frame is rotatable around the central axis, the outer frame may not be inclined, and the direction of the central axis may be fixed. This can simplify the device structure. Also, the shape of the container may be substantially cylindrical rather than spherical. Even if the container is cylindrical, it does not interfere with the rotation of the outer frame and the inner frame. In this case, preferably, by centering the central axis not vertically but obliquely, it is difficult for the chemical solution or the like to remain on the substrate when the chemical solution is discharged.
　また、外枠体は、その中心軸の方向に並進可能であってもよい。これにより、基板の装着や取り外し作業が容易になる。 The outer frame may also be translatable in the direction of its central axis. This facilitates mounting and removal of the substrate.
　また、本発明の基板回転装置は、基板を薬液に浸漬しないで、スピンコーター等の従来の基板回転装置の代替として用いることができる。その場合、回転の自由度が２であれば、基板を水平から傾斜させた状態で回転できるので、より最適に近い処理条件を選択することができる。回転の自由度が１であっても、回転シャフト等が容器を貫通することがなく、容器内の汚染源を減らすことができる。 Further, the substrate rotation apparatus of the present invention can be used as a substitute for a conventional substrate rotation apparatus such as a spin coater without immersing the substrate in a chemical solution. In that case, if the degree of freedom of rotation is 2, since the substrate can be rotated while being inclined from the horizontal, processing conditions closer to the optimum can be selected. Even if the degree of freedom of rotation is 1, the rotary shaft and the like do not penetrate the container, and the source of contamination in the container can be reduced.
　また、本発明の基板回転装置は、薬液を使用しないドライプロセスに用いることができる。その場合は、容器に所要の気密性を持たせる。 In addition, the substrate rotation apparatus of the present invention can be used in a dry process that does not use a chemical solution. In that case, provide the container with the required airtightness.
　１０－１２　基板回転装置
　２０　外リング（外枠体）
　２１　外リング上部材
　２２　外リング下部材
　２３　磁気結合用電磁石（電磁石）
　２４　保持爪駆動用電磁石
　２５　外リング（外枠体）
　２６、２６Ａ　電磁石
　３０　外枠体
　３１　非回転部
　３２、３２Ａ　電磁石
　３３　回転部
　３４　高透磁率部分
　３５　低透磁率部分
　４０　容器
　４１　側壁部
　４２　蓋部
　４３　底部
　４４　薬液供給管
　４５　排液管
　４６　薬液
　５０　内リング（内枠体）
　５１　内リング上部材
　５２　内リング下部材
　５３　磁気結合用永久磁石（永久磁石）
　５４　保持爪（基板保持手段）
　５５　貫通孔
　５６　ピン
　５７　基端部
　５８　保持爪駆動用永久磁石
　５９　先端部
　６１　第１支持枠
　６２　第２支持枠
　６３　第１モーター（回動・傾斜用）
　６４　支柱
　６５　ベアリング
　６６　第２モーター（回転用）
　６８　ベルト
　６０　基板
　７１　ロボットアーム
　Ｚ　　外リング・外枠体の中心軸 10-12 Substrate rotation device 20 Outer ring (outer frame)
21 Outer ring upper member 22 Outer ring lower member 23 Magnetic coupling electromagnet (electromagnet)
24 Magnet for holding claw drive 25 Outer ring (outer frame)
26, 26A Electromagnet 30 Outer frame body 31 Non-rotational part 32, 32A Electromagnet 33 Rotating part 34 High permeability part 35 Low permeability part 40 Container 41 Side wall part 42 Lid part 43 Bottom part 44 Chemical solution supply pipe 45 Drain pipe 46 Chemical solution 50 Inner ring (inner frame)
51 inner ring upper member 52 inner ring lower member 53 magnetic coupling permanent magnet (permanent magnet)
54 Holding claws (substrate holding means)
55 through hole 56 pin 57 base end 58 permanent magnet for holding claws 59 tip 61 first support frame 62 second support frame 63 first motor (for rotation / tilting)
64 post 65 bearing 66 second motor (for rotation)
68 Belt 60 Substrate 71 Robot arm Z Outer ring, central axis of outer frame

Claims (8)

  1. 　磁場発生手段を備え、発生した磁場を中心軸の周りに回転可能な外枠体と、
    　前記外枠体の内側に配置された容器と、
    　前記容器内に配置され、基板保持手段と周方向に分散配置された磁石または強磁性体とを備える内枠体と、
    　前記外枠体と前記内枠体を磁気的に結合して、該内枠体を浮上させるとともに、該内枠体を前記磁場の回転変化に追随させて回転させる磁気結合手段と、
    　前記外枠体と前記内枠体の間隔を一定に保ち、該内枠体を該外枠体と同心に維持するギャップ調整手段と、
    を有する基板回転装置。     An outer frame body provided with magnetic field generating means and capable of rotating the generated magnetic field about a central axis;
    A container disposed inside the outer frame;
    An inner frame disposed in the container and including a substrate holding means and a magnet or a ferromagnetic member distributed in the circumferential direction;
    Magnetic coupling means for magnetically coupling the outer frame and the inner frame to float the inner frame and rotating the inner frame to follow the rotational change of the magnetic field.
    Gap adjusting means for keeping the distance between the outer frame and the inner frame constant and keeping the inner frame concentric with the outer frame;
    A substrate rotation apparatus having:
  2. 　前記磁場発生手段が、前記内枠体の前記磁石または強磁性体と対向するように前記外枠体の周方向に分散配置された電磁石であり、
    　前記磁場の回転が前記外枠体の回転運動によって実現され、
    　前記磁気結合手段が前記内枠体の磁石または強磁性体と前記外枠体の電磁石とで構成される、
    請求項１に記載の基板回転装置。     The magnetic field generating means is an electromagnet distributed in the circumferential direction of the outer frame so as to face the magnet or ferromagnetic material of the inner frame.
    The rotation of the magnetic field is realized by the rotational movement of the outer frame,
    The magnetic coupling means is constituted by the magnet or ferromagnetic body of the inner frame and the electromagnet of the outer frame,
    The substrate rotation apparatus according to claim 1.
  3. 　前記磁場発生手段が前記外枠体の周方向に整列配置された電磁石であり、
    　前記磁場の回転が前記整列配置された電磁石の極性を順次変化させることにより実現され、
    　前記磁気結合手段が前記内枠体の磁石または強磁性体と前記外枠体の電磁石とで構成される、
    請求項１に記載の基板回転装置。     The magnetic field generating means is an electromagnet aligned in the circumferential direction of the outer frame,
    The rotation of the magnetic field is realized by sequentially changing the polarity of the aligned electromagnets,
    The magnetic coupling means is constituted by the magnet or ferromagnetic body of the inner frame and the electromagnet of the outer frame,
    The substrate rotation apparatus according to claim 1.
  4. 　前記外枠体は、該外枠体の外周側を占める非回転部と、該外枠体の内周側を占め、透磁率の異なる部分が周方向に繋ぎ合わされて形成された回転部からなり、
    　前記非回転部は、前記磁場発生手段として、周方向に整列配置された電磁石を備え、
    　前記磁場の回転が前記回転部の回転運動によって実現され、
    　前記磁気結合手段が前記内枠体の磁石または強磁性体、前記回転部および前記非回転部の電磁石で構成される、
    請求項１に記載の基板回転装置。     The outer frame comprises a non-rotating portion occupying the outer circumferential side of the outer frame and a rotating portion occupying the inner circumferential side of the outer frame and portions having different magnetic permeability are joined together in the circumferential direction. ,
    The non-rotational part includes an electromagnet arranged in a circumferential direction as the magnetic field generating means,
    The rotation of the magnetic field is realized by the rotational movement of the rotating unit,
    The magnetic coupling means is composed of a magnet or ferromagnetic material of the inner frame, an electromagnet of the rotating part and an electromagnet of the non-rotating part,
    The substrate rotation apparatus according to claim 1.
  5. 　前記外枠体はさらに、前記中心軸と交差する直線の周りに回動して傾斜可能である、
    請求項１～４のいずれか一項に記載の基板回転装置。     The outer frame is further pivotable about a straight line intersecting the central axis and tiltable.
    The substrate rotation apparatus according to any one of claims 1 to 4.
  6. 　前記外枠体はさらに、前記中心軸方向に並進可能である、
    請求項１～５のいずれか一項に記載の基板回転装置。     The outer frame is further translatable in the central axis direction.
    The substrate rotation apparatus according to any one of claims 1 to 5.
  7. 　前記容器は、底部に薬液供給手段および排液手段を有し、内部に薬液を貯留して前記内枠体に保持された基板を浸漬して処理可能である、
    請求項１～６のいずれか一項に記載の基板回転装置。     The container has a chemical solution supply unit and a drainage unit at the bottom and can be processed by immersing the substrate held in the inner frame by storing the chemical solution inside.
    The substrate rotation apparatus according to any one of claims 1 to 6.
  8. 　磁場発生手段を備え、発生した磁場を中心軸の周りに回転可能な外枠体と、
    　前記外枠体の内側に配置され、内部に処理薬液を収容可能な容器と、
    　前記容器内に配置され、基板保持手段と周方向に分散配置された磁石または強磁性体とを備える内枠体と、
    　前記外枠体と前記内枠体を磁気的に結合して、該内枠体を浮上させるとともに、該内枠体を前記磁場の回転変化に追随させて回転させる磁気結合手段と、
    　前記外枠体と前記内枠体の間隔を一定に保ち、該内枠体を該外枠体と同心に維持するギャップ調整手段と、
    を有する基板処理装置。     An outer frame body provided with magnetic field generating means and capable of rotating the generated magnetic field about a central axis;
    A container disposed inside the outer frame body and capable of containing the treatment liquid therein;
    An inner frame disposed in the container and including a substrate holding means and a magnet or a ferromagnetic member distributed in the circumferential direction;
    Magnetic coupling means for magnetically coupling the outer frame and the inner frame to float the inner frame and rotating the inner frame to follow the rotational change of the magnetic field.
    Gap adjusting means for keeping the distance between the outer frame and the inner frame constant and keeping the inner frame concentric with the outer frame;
    Substrate processing apparatus having:
PCT/JP2017/032008 2017-09-05 2017-09-05 Substrate rotating device and substrate processing device WO2019049219A1 (en)

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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11179306A (en) * 1997-12-24 1999-07-06 Dainippon Screen Mfg Co Ltd Single wafer processing cleaner
JPH11354617A (en) * 1998-06-10 1999-12-24 Sumiere Sez Kk Substrate processing apparatus and method therefor
JP2006237084A (en) * 2005-02-22 2006-09-07 Kokusai Electric Semiconductor Service Inc Thermal treatment apparatus and thermal treatment method
JP2013062417A (en) * 2011-09-14 2013-04-04 Toshiba Corp Supercritical drying method of semiconductor substrate and device

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11179306A (en) * 1997-12-24 1999-07-06 Dainippon Screen Mfg Co Ltd Single wafer processing cleaner
JPH11354617A (en) * 1998-06-10 1999-12-24 Sumiere Sez Kk Substrate processing apparatus and method therefor
JP2006237084A (en) * 2005-02-22 2006-09-07 Kokusai Electric Semiconductor Service Inc Thermal treatment apparatus and thermal treatment method
JP2013062417A (en) * 2011-09-14 2013-04-04 Toshiba Corp Supercritical drying method of semiconductor substrate and device

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