WO2019036936A1 - Système de récupération de bain révélateur - Google Patents

Système de récupération de bain révélateur Download PDF

Info

Publication number
WO2019036936A1
WO2019036936A1 PCT/CN2017/098669 CN2017098669W WO2019036936A1 WO 2019036936 A1 WO2019036936 A1 WO 2019036936A1 CN 2017098669 W CN2017098669 W CN 2017098669W WO 2019036936 A1 WO2019036936 A1 WO 2019036936A1
Authority
WO
WIPO (PCT)
Prior art keywords
developer
photoresist
tank
recovery
developing solution
Prior art date
Application number
PCT/CN2017/098669
Other languages
English (en)
Chinese (zh)
Inventor
区炜锋
Original Assignee
深圳市柔宇科技有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 深圳市柔宇科技有限公司 filed Critical 深圳市柔宇科技有限公司
Priority to CN201780060322.7A priority Critical patent/CN109791374B/zh
Priority to PCT/CN2017/098669 priority patent/WO2019036936A1/fr
Publication of WO2019036936A1 publication Critical patent/WO2019036936A1/fr

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor

Definitions

  • the present invention is in the field of printed plate technology, and in particular, the present invention relates to a developer recovery system.
  • the developer management system is a device for adjusting and stabilizing the concentration of TMAH, carbonate, and photoresist in the developer, which can manage multiple developers at the same time, but when the concentration of the photoresist in one of the developer tanks is low
  • the developer management system cannot add a high photoresist concentration solution to adjust the photoresist concentration, it is necessary to specially apply some photoresist coated glass to increase the photoresist concentration, and then put into the official product to cause the material. Cost and time cost is wasted.
  • the present invention aims to solve at least one of the technical problems in the related art to some extent. Accordingly, it is an object of the present invention to provide a developer recovery system by which the recycling of photoresist in the system can be achieved, thereby significantly reducing development costs.
  • the invention provides a developer recovery system.
  • the system comprises:
  • a developer storage tank having a developer inlet and a developer outlet
  • a developing machine having a developer head, a plate inlet and a developed liquid outlet, the developer head being connected to the developer outlet, the developed liquid outlet being connected to the developer tank;
  • a developer recovery tank having a development recovery liquid inlet and a development recovery liquid outlet, the developer inlet being connected to the developer storage tank;
  • a photoresist filter device having a recovery liquid inlet, a filtered liquid outlet, and a photoresist outlet, the recovery liquid inlet being connected to the development recovery liquid outlet, the filtered liquid outlet and the The developer inlet is connected, and at least one of the liquid outlet on the developer recovery tank and the photoresist outlet is connected to the developer tank.
  • the developer recovery system supplies a recovery liquid containing a high-concentration photoresist or/and a photoresist obtained by a photoresist filter device in a developer recovery tank to a developer storage tank,
  • the photoresist concentration in the developer supplied to the developing machine is stabilized, thereby realizing the recycling of the photoresist, and the photoresist is coated to supplement the photoresist compared with the prior art, and the present application is adopted.
  • the system can significantly reduce the cost of raw materials, and the system is simple and easy to operate.
  • developer recovery system may further have the following additional technical features:
  • the liquid outlet on the developer recovery tank is connected to the developer reservoir.
  • the liquid outlet on the developer recovery tank is connected to the developer tank through a rehydration pump.
  • the photoresist outlet is coupled to the developer reservoir.
  • the liquid outlet on the developer recovery tank and the photoresist outlet are both connected to the developer reservoir. Thereby, the system raw material and time cost can be further reduced.
  • the development recovery liquid outlet is connected to the recovery liquid inlet by a pump.
  • the recycling developer system includes a plurality of the developer tanks and a plurality of the developing machines, and the developer tanks are in one-to-one correspondence with the developing machines.
  • the recycled developer system includes five of the developer reservoirs and five of the developers. Thereby, the system utilization can be further improved.
  • FIG. 1 is a schematic structural view of a developer recovery system according to an embodiment of the present invention.
  • FIG. 2 is a schematic structural view of a developer recovery system according to still another embodiment of the present invention.
  • FIG. 3 is a schematic structural view of a developer recovery system according to still another embodiment of the present invention.
  • FIG. 4 is a schematic structural view of a developer recovery system according to still another embodiment of the present invention.
  • Figure 5 is a schematic structural view of a developer recovery system according to still another embodiment of the present invention.
  • Figure 6 is a schematic structural view of a developer recovery system according to still another embodiment of the present invention.
  • Figure 7 is a schematic structural view of a developer recovery system according to still another embodiment of the present invention.
  • Figure 8 is a schematic structural view of a developer recovery system according to still another embodiment of the present invention.
  • FIG. 9 is a schematic structural view of a developer recovery system according to still another embodiment of the present invention.
  • Figure 10 is a schematic view showing the structure of a developer recovery system in accordance with still another embodiment of the present invention.
  • first and second are used for descriptive purposes only and are not to be construed as indicating or implying a relative importance or implicitly indicating the number of technical features indicated.
  • features defining “first” and “second” may include at least one of the features, either explicitly or implicitly.
  • the meaning of "a plurality” is at least two, such as two, three, etc., unless specifically defined otherwise.
  • the terms “installation”, “connected”, “connected”, “fixed” and the like shall be understood broadly, and may be either a fixed connection or a detachable connection, unless explicitly stated and defined otherwise. , or integrated; can be mechanical or electrical connection; can be directly connected, or indirectly connected through an intermediate medium, can be the internal communication of two elements or the interaction of two elements, unless otherwise specified Limited.
  • the specific meanings of the above terms in the present invention can be understood on a case-by-case basis.
  • the first feature "on” or “under” the second feature may be a direct contact of the first and second features, or the first and second features may be indirectly through an intermediate medium, unless otherwise explicitly stated and defined. contact.
  • the first feature "above”, “above” and “above” the second feature may be that the first feature is directly above or above the second feature, or merely that the first feature level is higher than the second feature.
  • the first feature “below”, “below” and “below” the second feature may be that the first feature is directly below or obliquely below the second feature, or merely that the first feature level is less than the second feature.
  • the invention provides a developer recovery system.
  • the system includes a developer tank 100, a developing machine 200, a developer recovery tank 300, and a photoresist filtering device 400.
  • the developer tank 100 has a developer inlet 101 and a developer outlet 102, and is adapted to store a developer TMAH (tetramethylammonium hydroxide).
  • TMAH tetramethylammonium hydroxide
  • the developing machine 200 has a developing head 201, a plate inlet 202, and a developing liquid outlet 203.
  • the developing head 201 is connected to the developing solution outlet 102, and after development, the liquid outlet 203 is connected to the developing solution tank 100. And suitable for mixing the developer with the printing plate, so that the photoresist on the printing plate is dissolved in the developing solution to obtain a developing plate and a developing solution containing the photoresist, and the obtained photoresist-containing developing solution is obtained.
  • the post liquid is supplied to the developer tank 100.
  • the developer head 201 on the developing machine 200 may include a plurality of, and those skilled in the art may select according to actual needs.
  • the developer recovery tank 300 has a development recovery liquid inlet 301 and a development recovery liquid outlet 302, and the developer inlet 301 is connected to the developer storage tank 100, and is adapted to develop the developer in the developer storage tank 100.
  • the mixed developing solution of the liquid and the developed solution containing the photoresist is supplied to the developer recovery tank 300, and after collection, a mixed developing solution containing a high concentration of the photoresist is obtained.
  • the photoresist filter device 400 has a recovery liquid inlet 401, a filtered liquid outlet 402, and a photoresist outlet 403.
  • the recovery liquid inlet 401 is connected to the development recovery liquid outlet 302, and the filtered liquid outlet 402 is developed.
  • the liquid storage tank 100 is connected, at least one of the liquid outlet 303 and the photoresist outlet 403 on the developer recovery tank 300 is connected to the developer tank 100, and is adapted to contain a high concentration in the developer recovery tank 300.
  • the mixed developing solution of the photoresist is subjected to a filtration treatment to separate the photoresist and the filtered liquid, and the filtered liquid is supplied to the developing solution storage tank 100 as a developing solution, and the developer in the developing solution recovery tank 300 is contained.
  • the photoresist obtained in the mixed developer of the high-concentration photoresist and/or the photoresist filter device 400 is supplied to the developer tank 100, thereby maintaining the developer resist concentration in the developer tank 100 stable.
  • the inventors have found that the photoresist obtained by the high-concentration photoresist contained in the developer recovery tank or/and the photoresist obtained by the photoresist filter device are supplied to the developer tank to ensure supply to the developing machine.
  • the concentration of the photoresist in the developer is stable, thereby realizing the recycling of the photoresist.
  • the system of the present application can significantly reduce the raw materials. Cost, and the system structure is simple and easy to operate.
  • the liquid outlet 303 on the developer recovery tank 300 is connected to the developer tank 100, and is adapted to mix a high concentration photoresist in the developer recovery tank 300.
  • the developer is supplied to the developer tank 100 in order to keep the concentration of the photoresist in the developer in the developer tank 100 stable, thereby realizing the recycling of the photoresist. As a result, system material and time costs can be significantly reduced.
  • the liquid outlet 303 on the developer recovery tank 300 may be connected to the developer tank 100 through the rehydration pump 500, and is adapted to be recovered by the replenishing pump 500.
  • the mixed developing solution containing a high concentration of the photoresist in the can 300 is supplied to the developing solution storage tank 100.
  • the photoresist outlet 403 is connected to the developer tank 100, and is adapted to supply the photoresist separated in the photoresist filter device 400 to the developer tank 100. In order to keep the concentration of the photoresist in the developer in the developer tank 100 stable, recycling of the photoresist is achieved.
  • the liquid outlet 303 and the photoresist outlet 403 on the developer recovery tank 300 are both connected to the developer tank 100, and are adapted to collect the developer in the tank 300.
  • the mixed developer containing the high-concentration photoresist and the photoresist obtained in the photoresist filtering device 400 are all supplied to the developer tank 100, thereby maintaining the developer resist concentration in the developer tank 100 stable.
  • the development recovery liquid outlet 302 and the recovery liquid inlet 401 are connected by a pump 600, and are adapted to employ a pump 600 to contain a high concentration of photoresist in the developer recovery tank 300.
  • the mixed developing solution is supplied to the photoresist filtering device 400 for filtration treatment.
  • the recovery developer system may include a plurality of developer storage tanks 100 and a plurality of developing machines 200, and the developer storage tank 100 is in one-to-one correspondence with the developing machine 200, so that the system utilization rate can be remarkably improved.
  • the developer tank 100 and the developing machine 200 are in one-to-one correspondence" herein can be understood as the same amount of the developer tank 100 and the developing machine 200, and one developer tank 100 is matched with a developing machine 200. use.
  • the recovery developer system can include two developer reservoirs 100 and two developers 200 as an example.
  • the recovered developer system of the present invention may include five developer tanks 100 and five developers 200.
  • five developing solution storage tanks 100 and five developing machines 200 one developing solution recovery tank 300 is shared, so that after the printing plate containing the printing plate obtained by mixing the printing plate and the developing solution in each developing machine 200, the photoresist is developed.
  • the liquids are returned to the corresponding developer tanks 100, and then supplied to the developer recovery tank 300 through each of the developer tanks 100 to collect a mixed developer containing a high concentration of the photoresist, and finally the developer recovery tank 300 is collected.
  • the mixed developing solution containing the high-concentration photoresist and/or the photoresist obtained by the photoresist filtering device 400 is supplied to the developing solution storage tank 100, so that the developing solution resist in the developing solution storage tank 100 can be maintained.
  • the concentration is stable, thereby realizing the recycling of the photoresist, and the photoresist is coated to supplement the photoresist compared with the prior art, and the system of the present application can significantly reduce the raw material cost, and the system has a simple structure. Easy to operate and high equipment utilization.
  • two developer tanks 100 and two developing machines 200 are used to correspond to respective developing machines. 200 is supplied with a developing solution to mix the developing solution with the printing plate, and the photoresist on the printing plate is dissolved in the developing solution to obtain a developing plate and a developing solution containing the photoresist, and the obtained product in each developing machine 200 is contained.
  • the developing solution of the photoresist is supplied to the respective developer tanks 100 for storage, wherein a part of it is used as a developing solution, and another part is supplied to the developing solution collecting tank 300 through each of the developing solution tanks 100 to be collected.
  • the developer resist concentration in the developer tank 100 can be kept stable, and the recycling of the photoresist can be realized.

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

L'invention concerne un système de récupération de bain révélateur. Le système comprend un réservoir de stockage de bain révélateur, une machine à développer, un réservoir de récupération de bain révélateur et un dispositif de filtration de résine photosensible. Le réservoir de stockage de bain révélateur est pourvu d'une entrée de bain révélateur et d'une sortie de bain révélateur. La machine à développer est pourvue d'une buse de bain révélateur, d'une entrée de plaque d'impression et d'une sortie de post-bain révélateur, la buse de bain révélateur est reliée à la sortie de bain révélateur, et la sortie de post-bain révélateur est reliée au réservoir de stockage de bain révélateur. Le réservoir de récupération de bain révélateur est pourvu d'une entrée de bain révélateur récupéré et d'une sortie de bain révélateur récupéré. L'entrée de bain révélateur est reliée au réservoir de stockage de bain révélateur. Le dispositif de filtration de résine photosensible est pourvu d'une entrée de bain récupéré, d'une sortie de post-bain filtré et de sorties de résine photosensible. L'entrée de bain récupéré est reliée à la sortie de bain révélateur récupéré, la sortie de post-bain filtré est reliée à l'entrée de bain révélateur, et la sortie de bain dans le réservoir de récupération de bain révélateur est reliée aux sorties de résine photosensible et/ou au réservoir de stockage de bain révélateur.
PCT/CN2017/098669 2017-08-23 2017-08-23 Système de récupération de bain révélateur WO2019036936A1 (fr)

Priority Applications (2)

Application Number Priority Date Filing Date Title
CN201780060322.7A CN109791374B (zh) 2017-08-23 2017-08-23 显影液回收系统
PCT/CN2017/098669 WO2019036936A1 (fr) 2017-08-23 2017-08-23 Système de récupération de bain révélateur

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/CN2017/098669 WO2019036936A1 (fr) 2017-08-23 2017-08-23 Système de récupération de bain révélateur

Publications (1)

Publication Number Publication Date
WO2019036936A1 true WO2019036936A1 (fr) 2019-02-28

Family

ID=65438581

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/CN2017/098669 WO2019036936A1 (fr) 2017-08-23 2017-08-23 Système de récupération de bain révélateur

Country Status (2)

Country Link
CN (1) CN109791374B (fr)
WO (1) WO2019036936A1 (fr)

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5753135A (en) * 1995-10-23 1998-05-19 Jablonsky; Julius James Apparatus and method for recovering photoresist developers and strippers
US20040067453A1 (en) * 2002-09-27 2004-04-08 Chiao-Chung Huang System and method for recycling developer solution containing tetra-methyl-ammonia hydroxide (TMAH)
CN1760765A (zh) * 2005-11-21 2006-04-19 友达光电股份有限公司 显影液成分调整方法及其显影系统
CN203433266U (zh) * 2013-08-06 2014-02-12 杭州格林达化学有限公司 一种显影液中光刻胶树脂回收再利用装置
CN104698774A (zh) * 2013-12-06 2015-06-10 台湾积体电路制造股份有限公司 半导体器件工艺过滤器和方法
CN104846377A (zh) * 2015-06-02 2015-08-19 成都虹华环保科技股份有限公司 一种全自动蚀刻液回收装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3894104B2 (ja) * 2002-11-15 2007-03-14 東京エレクトロン株式会社 現像方法及び現像装置及び現像液再生装置
CN203433267U (zh) * 2013-08-06 2014-02-12 杭州格林达化学有限公司 显影液中光刻胶树脂回收再利用装置
JP6505534B2 (ja) * 2015-07-22 2019-04-24 株式会社平間理化研究所 現像液の管理方法及び装置
CN105353591A (zh) * 2015-11-05 2016-02-24 刘幸 一种用于回收涂布机管道内光刻胶的装置

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5753135A (en) * 1995-10-23 1998-05-19 Jablonsky; Julius James Apparatus and method for recovering photoresist developers and strippers
US20040067453A1 (en) * 2002-09-27 2004-04-08 Chiao-Chung Huang System and method for recycling developer solution containing tetra-methyl-ammonia hydroxide (TMAH)
CN1760765A (zh) * 2005-11-21 2006-04-19 友达光电股份有限公司 显影液成分调整方法及其显影系统
CN203433266U (zh) * 2013-08-06 2014-02-12 杭州格林达化学有限公司 一种显影液中光刻胶树脂回收再利用装置
CN104698774A (zh) * 2013-12-06 2015-06-10 台湾积体电路制造股份有限公司 半导体器件工艺过滤器和方法
CN104846377A (zh) * 2015-06-02 2015-08-19 成都虹华环保科技股份有限公司 一种全自动蚀刻液回收装置

Also Published As

Publication number Publication date
CN109791374A (zh) 2019-05-21
CN109791374B (zh) 2022-05-17

Similar Documents

Publication Publication Date Title
CN207274166U (zh) 陶瓷喷墨打印机循环墨路系统
TW201029852A (en) Continuous ink supplying system
CN101804736B (zh) 连续供墨系统
CN205915806U (zh) 一种印刷机配套用的油墨箱
WO2019036936A1 (fr) Système de récupération de bain révélateur
CN207842359U (zh) 一种凹版塑料高速印刷油墨分散过滤消泡装置
CN201913888U (zh) 环保型墨盒供墨结构
CN209123702U (zh) 一种票证印刷机润版液的混合输送系统
CN206394246U (zh) 一种提高图纸批量打印供墨效率的喷绘机墨桶
CN211251655U (zh) 一种高速轮转胶印润版液循环过滤系统
CN106142847B (zh) 连续供墨系统
CN104742498A (zh) 一种印刷机的补液系统
CN207856468U (zh) 一种绿色印刷润版液循环回收处理装置
CN207105892U (zh) 一种pos机用喷墨打印头结构
CN102101388B (zh) 可长期连续供墨的墨盒
KR20110072932A (ko) 연속식 혼합장치를 이용한 재생약액 공급 장치
CN205823254U (zh) 一种海上平台注聚系统
CN208682353U (zh) 一种打印头、墨盒一体化及可叠拼的压电式喷码机
CN206660688U (zh) 一种提高固液分离效果的板框压滤机
CN209159221U (zh) 书法书写装置
CN110356119A (zh) 一种喷绘机用墨路系统
CN213920260U (zh) 一种印刷专用自动循环供水装置
CN207294930U (zh) 一种电镀槽过滤机
CN207859760U (zh) 一种可循环利用的环保墨盒
CN201410777Y (zh) 胶印机的印刷用水供给装置

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 17922487

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 17922487

Country of ref document: EP

Kind code of ref document: A1