WO2019036936A1 - Developing solution recovery system - Google Patents
Developing solution recovery system Download PDFInfo
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- WO2019036936A1 WO2019036936A1 PCT/CN2017/098669 CN2017098669W WO2019036936A1 WO 2019036936 A1 WO2019036936 A1 WO 2019036936A1 CN 2017098669 W CN2017098669 W CN 2017098669W WO 2019036936 A1 WO2019036936 A1 WO 2019036936A1
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- developer
- photoresist
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- recovery
- developing solution
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
Definitions
- the present invention is in the field of printed plate technology, and in particular, the present invention relates to a developer recovery system.
- the developer management system is a device for adjusting and stabilizing the concentration of TMAH, carbonate, and photoresist in the developer, which can manage multiple developers at the same time, but when the concentration of the photoresist in one of the developer tanks is low
- the developer management system cannot add a high photoresist concentration solution to adjust the photoresist concentration, it is necessary to specially apply some photoresist coated glass to increase the photoresist concentration, and then put into the official product to cause the material. Cost and time cost is wasted.
- the present invention aims to solve at least one of the technical problems in the related art to some extent. Accordingly, it is an object of the present invention to provide a developer recovery system by which the recycling of photoresist in the system can be achieved, thereby significantly reducing development costs.
- the invention provides a developer recovery system.
- the system comprises:
- a developer storage tank having a developer inlet and a developer outlet
- a developing machine having a developer head, a plate inlet and a developed liquid outlet, the developer head being connected to the developer outlet, the developed liquid outlet being connected to the developer tank;
- a developer recovery tank having a development recovery liquid inlet and a development recovery liquid outlet, the developer inlet being connected to the developer storage tank;
- a photoresist filter device having a recovery liquid inlet, a filtered liquid outlet, and a photoresist outlet, the recovery liquid inlet being connected to the development recovery liquid outlet, the filtered liquid outlet and the The developer inlet is connected, and at least one of the liquid outlet on the developer recovery tank and the photoresist outlet is connected to the developer tank.
- the developer recovery system supplies a recovery liquid containing a high-concentration photoresist or/and a photoresist obtained by a photoresist filter device in a developer recovery tank to a developer storage tank,
- the photoresist concentration in the developer supplied to the developing machine is stabilized, thereby realizing the recycling of the photoresist, and the photoresist is coated to supplement the photoresist compared with the prior art, and the present application is adopted.
- the system can significantly reduce the cost of raw materials, and the system is simple and easy to operate.
- developer recovery system may further have the following additional technical features:
- the liquid outlet on the developer recovery tank is connected to the developer reservoir.
- the liquid outlet on the developer recovery tank is connected to the developer tank through a rehydration pump.
- the photoresist outlet is coupled to the developer reservoir.
- the liquid outlet on the developer recovery tank and the photoresist outlet are both connected to the developer reservoir. Thereby, the system raw material and time cost can be further reduced.
- the development recovery liquid outlet is connected to the recovery liquid inlet by a pump.
- the recycling developer system includes a plurality of the developer tanks and a plurality of the developing machines, and the developer tanks are in one-to-one correspondence with the developing machines.
- the recycled developer system includes five of the developer reservoirs and five of the developers. Thereby, the system utilization can be further improved.
- FIG. 1 is a schematic structural view of a developer recovery system according to an embodiment of the present invention.
- FIG. 2 is a schematic structural view of a developer recovery system according to still another embodiment of the present invention.
- FIG. 3 is a schematic structural view of a developer recovery system according to still another embodiment of the present invention.
- FIG. 4 is a schematic structural view of a developer recovery system according to still another embodiment of the present invention.
- Figure 5 is a schematic structural view of a developer recovery system according to still another embodiment of the present invention.
- Figure 6 is a schematic structural view of a developer recovery system according to still another embodiment of the present invention.
- Figure 7 is a schematic structural view of a developer recovery system according to still another embodiment of the present invention.
- Figure 8 is a schematic structural view of a developer recovery system according to still another embodiment of the present invention.
- FIG. 9 is a schematic structural view of a developer recovery system according to still another embodiment of the present invention.
- Figure 10 is a schematic view showing the structure of a developer recovery system in accordance with still another embodiment of the present invention.
- first and second are used for descriptive purposes only and are not to be construed as indicating or implying a relative importance or implicitly indicating the number of technical features indicated.
- features defining “first” and “second” may include at least one of the features, either explicitly or implicitly.
- the meaning of "a plurality” is at least two, such as two, three, etc., unless specifically defined otherwise.
- the terms “installation”, “connected”, “connected”, “fixed” and the like shall be understood broadly, and may be either a fixed connection or a detachable connection, unless explicitly stated and defined otherwise. , or integrated; can be mechanical or electrical connection; can be directly connected, or indirectly connected through an intermediate medium, can be the internal communication of two elements or the interaction of two elements, unless otherwise specified Limited.
- the specific meanings of the above terms in the present invention can be understood on a case-by-case basis.
- the first feature "on” or “under” the second feature may be a direct contact of the first and second features, or the first and second features may be indirectly through an intermediate medium, unless otherwise explicitly stated and defined. contact.
- the first feature "above”, “above” and “above” the second feature may be that the first feature is directly above or above the second feature, or merely that the first feature level is higher than the second feature.
- the first feature “below”, “below” and “below” the second feature may be that the first feature is directly below or obliquely below the second feature, or merely that the first feature level is less than the second feature.
- the invention provides a developer recovery system.
- the system includes a developer tank 100, a developing machine 200, a developer recovery tank 300, and a photoresist filtering device 400.
- the developer tank 100 has a developer inlet 101 and a developer outlet 102, and is adapted to store a developer TMAH (tetramethylammonium hydroxide).
- TMAH tetramethylammonium hydroxide
- the developing machine 200 has a developing head 201, a plate inlet 202, and a developing liquid outlet 203.
- the developing head 201 is connected to the developing solution outlet 102, and after development, the liquid outlet 203 is connected to the developing solution tank 100. And suitable for mixing the developer with the printing plate, so that the photoresist on the printing plate is dissolved in the developing solution to obtain a developing plate and a developing solution containing the photoresist, and the obtained photoresist-containing developing solution is obtained.
- the post liquid is supplied to the developer tank 100.
- the developer head 201 on the developing machine 200 may include a plurality of, and those skilled in the art may select according to actual needs.
- the developer recovery tank 300 has a development recovery liquid inlet 301 and a development recovery liquid outlet 302, and the developer inlet 301 is connected to the developer storage tank 100, and is adapted to develop the developer in the developer storage tank 100.
- the mixed developing solution of the liquid and the developed solution containing the photoresist is supplied to the developer recovery tank 300, and after collection, a mixed developing solution containing a high concentration of the photoresist is obtained.
- the photoresist filter device 400 has a recovery liquid inlet 401, a filtered liquid outlet 402, and a photoresist outlet 403.
- the recovery liquid inlet 401 is connected to the development recovery liquid outlet 302, and the filtered liquid outlet 402 is developed.
- the liquid storage tank 100 is connected, at least one of the liquid outlet 303 and the photoresist outlet 403 on the developer recovery tank 300 is connected to the developer tank 100, and is adapted to contain a high concentration in the developer recovery tank 300.
- the mixed developing solution of the photoresist is subjected to a filtration treatment to separate the photoresist and the filtered liquid, and the filtered liquid is supplied to the developing solution storage tank 100 as a developing solution, and the developer in the developing solution recovery tank 300 is contained.
- the photoresist obtained in the mixed developer of the high-concentration photoresist and/or the photoresist filter device 400 is supplied to the developer tank 100, thereby maintaining the developer resist concentration in the developer tank 100 stable.
- the inventors have found that the photoresist obtained by the high-concentration photoresist contained in the developer recovery tank or/and the photoresist obtained by the photoresist filter device are supplied to the developer tank to ensure supply to the developing machine.
- the concentration of the photoresist in the developer is stable, thereby realizing the recycling of the photoresist.
- the system of the present application can significantly reduce the raw materials. Cost, and the system structure is simple and easy to operate.
- the liquid outlet 303 on the developer recovery tank 300 is connected to the developer tank 100, and is adapted to mix a high concentration photoresist in the developer recovery tank 300.
- the developer is supplied to the developer tank 100 in order to keep the concentration of the photoresist in the developer in the developer tank 100 stable, thereby realizing the recycling of the photoresist. As a result, system material and time costs can be significantly reduced.
- the liquid outlet 303 on the developer recovery tank 300 may be connected to the developer tank 100 through the rehydration pump 500, and is adapted to be recovered by the replenishing pump 500.
- the mixed developing solution containing a high concentration of the photoresist in the can 300 is supplied to the developing solution storage tank 100.
- the photoresist outlet 403 is connected to the developer tank 100, and is adapted to supply the photoresist separated in the photoresist filter device 400 to the developer tank 100. In order to keep the concentration of the photoresist in the developer in the developer tank 100 stable, recycling of the photoresist is achieved.
- the liquid outlet 303 and the photoresist outlet 403 on the developer recovery tank 300 are both connected to the developer tank 100, and are adapted to collect the developer in the tank 300.
- the mixed developer containing the high-concentration photoresist and the photoresist obtained in the photoresist filtering device 400 are all supplied to the developer tank 100, thereby maintaining the developer resist concentration in the developer tank 100 stable.
- the development recovery liquid outlet 302 and the recovery liquid inlet 401 are connected by a pump 600, and are adapted to employ a pump 600 to contain a high concentration of photoresist in the developer recovery tank 300.
- the mixed developing solution is supplied to the photoresist filtering device 400 for filtration treatment.
- the recovery developer system may include a plurality of developer storage tanks 100 and a plurality of developing machines 200, and the developer storage tank 100 is in one-to-one correspondence with the developing machine 200, so that the system utilization rate can be remarkably improved.
- the developer tank 100 and the developing machine 200 are in one-to-one correspondence" herein can be understood as the same amount of the developer tank 100 and the developing machine 200, and one developer tank 100 is matched with a developing machine 200. use.
- the recovery developer system can include two developer reservoirs 100 and two developers 200 as an example.
- the recovered developer system of the present invention may include five developer tanks 100 and five developers 200.
- five developing solution storage tanks 100 and five developing machines 200 one developing solution recovery tank 300 is shared, so that after the printing plate containing the printing plate obtained by mixing the printing plate and the developing solution in each developing machine 200, the photoresist is developed.
- the liquids are returned to the corresponding developer tanks 100, and then supplied to the developer recovery tank 300 through each of the developer tanks 100 to collect a mixed developer containing a high concentration of the photoresist, and finally the developer recovery tank 300 is collected.
- the mixed developing solution containing the high-concentration photoresist and/or the photoresist obtained by the photoresist filtering device 400 is supplied to the developing solution storage tank 100, so that the developing solution resist in the developing solution storage tank 100 can be maintained.
- the concentration is stable, thereby realizing the recycling of the photoresist, and the photoresist is coated to supplement the photoresist compared with the prior art, and the system of the present application can significantly reduce the raw material cost, and the system has a simple structure. Easy to operate and high equipment utilization.
- two developer tanks 100 and two developing machines 200 are used to correspond to respective developing machines. 200 is supplied with a developing solution to mix the developing solution with the printing plate, and the photoresist on the printing plate is dissolved in the developing solution to obtain a developing plate and a developing solution containing the photoresist, and the obtained product in each developing machine 200 is contained.
- the developing solution of the photoresist is supplied to the respective developer tanks 100 for storage, wherein a part of it is used as a developing solution, and another part is supplied to the developing solution collecting tank 300 through each of the developing solution tanks 100 to be collected.
- the developer resist concentration in the developer tank 100 can be kept stable, and the recycling of the photoresist can be realized.
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Abstract
Provided is a developing solution recovery system. The system comprises a developing solution storage tank, a developing machine, a developing solution recovery tank, and a photoresist filtering device. The developing solution storage tank is provided with a developing solution inlet and a developing solution outlet. The developing machine is provided with a developing solution nozzle, a printing plate inlet and a developing post-solution outlet, the developing solution nozzle is connected to the developing solution outlet, and the developing post-solution outlet is connected to the developing solution storage tank. The developing solution recovery tank is provided with a recovered developing solution inlet and a recovered developing solution outlet. The developing solution inlet is connected to the developing solution storage tank. The photoresist filtering device is provided with a recovered solution inlet, a filtered post-solution outlet and photoresist outlets. The recovered solution inlet is connected to the recovered developing solution outlet, the filtered post-solution outlet is connected to the developing solution inlet, and the solution outlet in the developing solution recovery tank is connected to at least one of the photoresist outlets and the developing solution storage tank.
Description
本发明属于印制版技术领域,具体而言,本发明涉及显影液回收系统。The present invention is in the field of printed plate technology, and in particular, the present invention relates to a developer recovery system.
显影液管理系统是用于调节并稳定显影液中TMAH、碳酸根以及光刻胶浓度的设备,其可以同时管理多台显影机,然而当其中一台显影液储罐中光刻胶浓度偏低时,显影液管理系统无法添加高光刻胶浓度的药液来调整光刻胶浓度,而需要专门投入一些涂布了光刻胶的玻璃来提高光刻胶浓度,再投入正式产品,造成物料成本和时间成本浪费。The developer management system is a device for adjusting and stabilizing the concentration of TMAH, carbonate, and photoresist in the developer, which can manage multiple developers at the same time, but when the concentration of the photoresist in one of the developer tanks is low When the developer management system cannot add a high photoresist concentration solution to adjust the photoresist concentration, it is necessary to specially apply some photoresist coated glass to increase the photoresist concentration, and then put into the official product to cause the material. Cost and time cost is wasted.
因此,现有的显影液处理系统有待进一步改进。Therefore, the existing developer treatment system needs to be further improved.
发明内容Summary of the invention
本发明旨在至少在一定程度上解决相关技术中的技术问题之一。为此,本发明的一个目的在于提出一种显影液回收系统,采用该系统可以实现系统内光刻胶的循环利用,从而可以显著降低显影成本。The present invention aims to solve at least one of the technical problems in the related art to some extent. Accordingly, it is an object of the present invention to provide a developer recovery system by which the recycling of photoresist in the system can be achieved, thereby significantly reducing development costs.
在本发明的一个方面,本发明提出了一种显影液回收系统。根据本发明的实施例,所述系统包括:In one aspect of the invention, the invention provides a developer recovery system. According to an embodiment of the invention, the system comprises:
显影液储罐,所述显影液储罐具有显影液入口和显影液出口;a developer storage tank having a developer inlet and a developer outlet;
显影机,所述显影机具有显影液喷头、印版入口和显影后液出口,所述显影液喷头与所述显影液出口相连,所述显影后液出口与所述显影液储罐相连;a developing machine having a developer head, a plate inlet and a developed liquid outlet, the developer head being connected to the developer outlet, the developed liquid outlet being connected to the developer tank;
显影液回收罐,所述显影液回收罐具有显影回收液入口和显影回收液出口,所述显影液入口与所述显影液储罐相连;a developer recovery tank having a development recovery liquid inlet and a development recovery liquid outlet, the developer inlet being connected to the developer storage tank;
光刻胶过滤装置,所述光刻胶过滤装置具有回收液入口、过滤后液出口和光刻胶出口,所述回收液入口与所述显影回收液出口相连,所述过滤后液出口与所述显影液入口相连,所述显影液回收罐上的出液口和所述光刻胶出口中的至少之一与所述显影液储罐相连。a photoresist filter device having a recovery liquid inlet, a filtered liquid outlet, and a photoresist outlet, the recovery liquid inlet being connected to the development recovery liquid outlet, the filtered liquid outlet and the The developer inlet is connected, and at least one of the liquid outlet on the developer recovery tank and the photoresist outlet is connected to the developer tank.
根据本发明实施例的显影液回收系统通过将显影液回收罐中的含有的高浓度光刻胶的回收液或/和经光刻胶过滤装置得到的光刻胶供给至显影液储罐中,保证供给到显影机中的显影液中光刻胶浓度稳定,从而实现了光刻胶的循环使用,相较于现有技术外加涂布了光刻胶的玻璃来补充光刻胶,采用本申请的系统可以显著降低原料成本,并且该系统结构简单易于操作。The developer recovery system according to an embodiment of the present invention supplies a recovery liquid containing a high-concentration photoresist or/and a photoresist obtained by a photoresist filter device in a developer recovery tank to a developer storage tank, The photoresist concentration in the developer supplied to the developing machine is stabilized, thereby realizing the recycling of the photoresist, and the photoresist is coated to supplement the photoresist compared with the prior art, and the present application is adopted. The system can significantly reduce the cost of raw materials, and the system is simple and easy to operate.
另外,根据本发明上述实施例的显影液回收系统还可以具有如下附加的技术特征:
Further, the developer recovery system according to the above embodiment of the present invention may further have the following additional technical features:
在本发明的一些实施例中,所述显影液回收罐上的出液口与所述显影液储罐相连。由此,可以显著降低系统原料和时间成本。In some embodiments of the invention, the liquid outlet on the developer recovery tank is connected to the developer reservoir. As a result, system material and time costs can be significantly reduced.
在本发明的一些实施例中,所述显影液回收罐上的出液口通过补液泵与所述显影液储罐相连。In some embodiments of the invention, the liquid outlet on the developer recovery tank is connected to the developer tank through a rehydration pump.
在本发明的一些实施例中,所述光刻胶出口与所述显影液储罐相连。由此,可以进一步降低系统原料和时间成本。In some embodiments of the invention, the photoresist outlet is coupled to the developer reservoir. Thereby, the system raw material and time cost can be further reduced.
在本发明的一些实施例中,所述显影液回收罐上的出液口和所述光刻胶出口均与所述显影液储罐相连。由此,可以进一步降低系统原料和时间成本。In some embodiments of the invention, the liquid outlet on the developer recovery tank and the photoresist outlet are both connected to the developer reservoir. Thereby, the system raw material and time cost can be further reduced.
在本发明的一些实施例中,所述显影回收液出口与所述回收液入口通过泵相连。In some embodiments of the invention, the development recovery liquid outlet is connected to the recovery liquid inlet by a pump.
在本发明的一些实施例中,所述回收显影液系统包括多个所述显影液储罐和多个所述显影机,并且所述显影液储罐与所述显影机一一对应。由此,可以显著提高系统利用率。In some embodiments of the present invention, the recycling developer system includes a plurality of the developer tanks and a plurality of the developing machines, and the developer tanks are in one-to-one correspondence with the developing machines. As a result, system utilization can be significantly improved.
在本发明的一些实施例中,所述回收显影液系统包括五台所述显影液储罐和五台所述显影机。由此,可以进一步提高系统利用率。In some embodiments of the invention, the recycled developer system includes five of the developer reservoirs and five of the developers. Thereby, the system utilization can be further improved.
本发明的附加方面和优点将在下面的描述中部分给出,部分将从下面的描述中变得明显,或通过本发明的实践了解到。The additional aspects and advantages of the invention will be set forth in part in the description which follows.
本发明的上述和/或附加的方面和优点从结合下面附图对实施例的描述中将变得明显和容易理解,其中:The above and/or additional aspects and advantages of the present invention will become apparent and readily understood from
图1是根据本发明一个实施例的显影液回收系统的结构示意图;1 is a schematic structural view of a developer recovery system according to an embodiment of the present invention;
图2是根据本发明再一个实施例的显影液回收系统的结构示意图;2 is a schematic structural view of a developer recovery system according to still another embodiment of the present invention;
图3是根据本发明又一个实施例的显影液回收系统的结构示意图;3 is a schematic structural view of a developer recovery system according to still another embodiment of the present invention;
图4是根据本发明又一个实施例的显影液回收系统的结构示意图;4 is a schematic structural view of a developer recovery system according to still another embodiment of the present invention;
图5是根据本发明又一个实施例的显影液回收系统的结构示意图;Figure 5 is a schematic structural view of a developer recovery system according to still another embodiment of the present invention;
图6是根据本发明又一个实施例的显影液回收系统的结构示意图;Figure 6 is a schematic structural view of a developer recovery system according to still another embodiment of the present invention;
图7是根据本发明又一个实施例的显影液回收系统的结构示意图;Figure 7 is a schematic structural view of a developer recovery system according to still another embodiment of the present invention;
图8是根据本发明又一个实施例的显影液回收系统的结构示意图;Figure 8 is a schematic structural view of a developer recovery system according to still another embodiment of the present invention;
图9是根据本发明又一个实施例的显影液回收系统的结构示意图;9 is a schematic structural view of a developer recovery system according to still another embodiment of the present invention;
图10是根据本发明又一个实施例的显影液回收系统的结构示意图。Figure 10 is a schematic view showing the structure of a developer recovery system in accordance with still another embodiment of the present invention.
发明详细描述Detailed description of the invention
下面详细描述本发明的实施例,所述实施例的示例在附图中示出,其中自始至终相同
或类似的标号表示相同或类似的元件或具有相同或类似功能的元件。下面通过参考附图描述的实施例是示例性的,旨在用于解释本发明,而不能理解为对本发明的限制。Embodiments of the invention are described in detail below, examples of which are illustrated in the accompanying drawings in which the same
Or similar reference numerals indicate the same or similar elements or elements having the same or similar functions. The embodiments described below with reference to the drawings are intended to be illustrative of the invention and are not to be construed as limiting.
在本发明的描述中,需要理解的是,术语“中心”、“纵向”、“横向”、“长度”、“宽度”、“厚度”、“上”、“下”、“前”、“后”、“左”、“右”、“竖直”、“水平”、“顶”、“底”、“内”、“外”、“顺时针”、“逆时针”、“轴向”、“径向”、“周向”等指示的方位或位置关系为基于附图所示的方位或位置关系,仅是为了便于描述本发明和简化描述,而不是指示或暗示所指的装置或元件必须具有特定的方位、以特定的方位构造和操作,因此不能理解为对本发明的限制。In the description of the present invention, it is to be understood that the terms "center", "longitudinal", "transverse", "length", "width", "thickness", "upper", "lower", "front", " Rear, Left, Right, Vertical, Horizontal, Top, Bottom, Inner, Out, Clockwise, Counterclockwise, Axial The orientation or positional relationship of the "radial", "circumferential" and the like is based on the orientation or positional relationship shown in the drawings, and is merely for the convenience of describing the present invention and simplifying the description, and does not indicate or imply the indicated device or The elements must have a particular orientation, are constructed and operated in a particular orientation and are therefore not to be construed as limiting.
此外,术语“第一”、“第二”仅用于描述目的,而不能理解为指示或暗示相对重要性或者隐含指明所指示的技术特征的数量。由此,限定有“第一”、“第二”的特征可以明示或者隐含地包括至少一个该特征。在本发明的描述中,“多个”的含义是至少两个,例如两个,三个等,除非另有明确具体的限定。Moreover, the terms "first" and "second" are used for descriptive purposes only and are not to be construed as indicating or implying a relative importance or implicitly indicating the number of technical features indicated. Thus, features defining "first" and "second" may include at least one of the features, either explicitly or implicitly. In the description of the present invention, the meaning of "a plurality" is at least two, such as two, three, etc., unless specifically defined otherwise.
在本发明中,除非另有明确的规定和限定,术语“安装”、“相连”、“连接”、“固定”等术语应做广义理解,例如,可以是固定连接,也可以是可拆卸连接,或成一体;可以是机械连接,也可以是电连接;可以是直接相连,也可以通过中间媒介间接相连,可以是两个元件内部的连通或两个元件的相互作用关系,除非另有明确的限定。对于本领域的普通技术人员而言,可以根据具体情况理解上述术语在本发明中的具体含义。In the present invention, the terms "installation", "connected", "connected", "fixed" and the like shall be understood broadly, and may be either a fixed connection or a detachable connection, unless explicitly stated and defined otherwise. , or integrated; can be mechanical or electrical connection; can be directly connected, or indirectly connected through an intermediate medium, can be the internal communication of two elements or the interaction of two elements, unless otherwise specified Limited. For those skilled in the art, the specific meanings of the above terms in the present invention can be understood on a case-by-case basis.
在本发明中,除非另有明确的规定和限定,第一特征在第二特征“上”或“下”可以是第一和第二特征直接接触,或第一和第二特征通过中间媒介间接接触。而且,第一特征在第二特征“之上”、“上方”和“上面”可是第一特征在第二特征正上方或斜上方,或仅仅表示第一特征水平高度高于第二特征。第一特征在第二特征“之下”、“下方”和“下面”可以是第一特征在第二特征正下方或斜下方,或仅仅表示第一特征水平高度小于第二特征。In the present invention, the first feature "on" or "under" the second feature may be a direct contact of the first and second features, or the first and second features may be indirectly through an intermediate medium, unless otherwise explicitly stated and defined. contact. Moreover, the first feature "above", "above" and "above" the second feature may be that the first feature is directly above or above the second feature, or merely that the first feature level is higher than the second feature. The first feature "below", "below" and "below" the second feature may be that the first feature is directly below or obliquely below the second feature, or merely that the first feature level is less than the second feature.
在本发明的一个方面,本发明提出了一种显影液回收系统。根据本发明的实施例,参考图1,该系统包括:显影液储罐100、显影机200、显影液回收罐300和光刻胶过滤装置400。In one aspect of the invention, the invention provides a developer recovery system. According to an embodiment of the present invention, referring to FIG. 1, the system includes a developer tank 100, a developing machine 200, a developer recovery tank 300, and a photoresist filtering device 400.
根据本发明的实施例,显影液储罐100具有显影液入口101和显影液出口102,且适于存储显影液TMAH(四甲基氢氧化铵)。According to an embodiment of the present invention, the developer tank 100 has a developer inlet 101 and a developer outlet 102, and is adapted to store a developer TMAH (tetramethylammonium hydroxide).
根据本发明的实施例,显影机200具有显影液喷头201、印版入口202和显影后液出口203,显影液喷头201与显影液出口102相连,显影后液出口203与显影液储罐100相连,且适于将显影液与印版混合,使得印版上的光刻胶溶解在显影液中,得到显影印版和含有光刻胶的显影后液,并将得到的含有光刻胶的显影后液供给显影液储罐100中。具体的,显影机200上的显影液喷头201可以包括多个,对此本领域技术人员可以根据实际需要进行选择。
According to an embodiment of the present invention, the developing machine 200 has a developing head 201, a plate inlet 202, and a developing liquid outlet 203. The developing head 201 is connected to the developing solution outlet 102, and after development, the liquid outlet 203 is connected to the developing solution tank 100. And suitable for mixing the developer with the printing plate, so that the photoresist on the printing plate is dissolved in the developing solution to obtain a developing plate and a developing solution containing the photoresist, and the obtained photoresist-containing developing solution is obtained. The post liquid is supplied to the developer tank 100. Specifically, the developer head 201 on the developing machine 200 may include a plurality of, and those skilled in the art may select according to actual needs.
根据本发明的实施例,显影液回收罐300具有显影回收液入口301和显影回收液出口302,显影液入口301与显影液储罐100相连,且适于将显影液储罐100中的含有显影液和含有光刻胶的显影后液的混合显影液供给至显影液回收罐300中,经汇集后即可得到含有高浓度的光刻胶的混合显影液。According to an embodiment of the present invention, the developer recovery tank 300 has a development recovery liquid inlet 301 and a development recovery liquid outlet 302, and the developer inlet 301 is connected to the developer storage tank 100, and is adapted to develop the developer in the developer storage tank 100. The mixed developing solution of the liquid and the developed solution containing the photoresist is supplied to the developer recovery tank 300, and after collection, a mixed developing solution containing a high concentration of the photoresist is obtained.
根据本发明的实施例,光刻胶过滤装置400具有回收液入口401、过滤后液出口402和光刻胶出口403,回收液入口401与显影回收液出口302相连,过滤后液出口402与显影液储罐100相连,显影液回收罐300上的出液口303和光刻胶出口403中的至少之一与显影液储罐100相连,且适于将显影液回收罐300中的含有高浓度光刻胶的混合显影液进行过滤处理,以便分离得到光刻胶和过滤后液,并将过滤后液供给至显影液储罐100中作为显影液使用,并将显影液回收罐300中的含有高浓度光刻胶的混合显影液和/或光刻胶过滤装置400中得到的光刻胶供给至显影液储罐100中,从而保持显影液储罐100中显影液光刻胶浓度稳定。发明人发现,通过将显影液回收罐中的含有的高浓度光刻胶的回收液或/和经光刻胶过滤装置得到的光刻胶供给至显影液储罐中,保证供给到显影机中的显影液中光刻胶浓度稳定,从而实现了光刻胶的循环使用,相较于现有技术外加涂布了光刻胶的玻璃来补充光刻胶,采用本申请的系统可以显著降低原料成本,并且该系统结构简单易于操作。According to an embodiment of the present invention, the photoresist filter device 400 has a recovery liquid inlet 401, a filtered liquid outlet 402, and a photoresist outlet 403. The recovery liquid inlet 401 is connected to the development recovery liquid outlet 302, and the filtered liquid outlet 402 is developed. The liquid storage tank 100 is connected, at least one of the liquid outlet 303 and the photoresist outlet 403 on the developer recovery tank 300 is connected to the developer tank 100, and is adapted to contain a high concentration in the developer recovery tank 300. The mixed developing solution of the photoresist is subjected to a filtration treatment to separate the photoresist and the filtered liquid, and the filtered liquid is supplied to the developing solution storage tank 100 as a developing solution, and the developer in the developing solution recovery tank 300 is contained. The photoresist obtained in the mixed developer of the high-concentration photoresist and/or the photoresist filter device 400 is supplied to the developer tank 100, thereby maintaining the developer resist concentration in the developer tank 100 stable. The inventors have found that the photoresist obtained by the high-concentration photoresist contained in the developer recovery tank or/and the photoresist obtained by the photoresist filter device are supplied to the developer tank to ensure supply to the developing machine. The concentration of the photoresist in the developer is stable, thereby realizing the recycling of the photoresist. Compared with the prior art and the photoresist coated glass to supplement the photoresist, the system of the present application can significantly reduce the raw materials. Cost, and the system structure is simple and easy to operate.
根据本发明的一个实施例,参考图1,显影液回收罐300上的出液口303与显影液储罐100相连,且适于将显影液回收罐300中的含有高浓度光刻胶的混合显影液供给至显影液储罐100中,以便保持显影液储罐100中显影液中光刻胶浓度稳定,实现光刻胶的循环使用。由此,可以显著降低系统原料和时间成本。According to an embodiment of the present invention, referring to FIG. 1, the liquid outlet 303 on the developer recovery tank 300 is connected to the developer tank 100, and is adapted to mix a high concentration photoresist in the developer recovery tank 300. The developer is supplied to the developer tank 100 in order to keep the concentration of the photoresist in the developer in the developer tank 100 stable, thereby realizing the recycling of the photoresist. As a result, system material and time costs can be significantly reduced.
根据本发明的再一个实施例,参考图2,显影液回收罐300上的出液口303可以通过补液泵500与显影液储罐100相连,且适于采用补液泵500将储存在显影液回收罐300中的含有高浓度光刻胶的混合显影液供给至显影液储罐100中。According to still another embodiment of the present invention, referring to FIG. 2, the liquid outlet 303 on the developer recovery tank 300 may be connected to the developer tank 100 through the rehydration pump 500, and is adapted to be recovered by the replenishing pump 500. The mixed developing solution containing a high concentration of the photoresist in the can 300 is supplied to the developing solution storage tank 100.
根据本发明的又一个实施例,参考图3,光刻胶出口403与显影液储罐100相连,且适于将光刻胶过滤装置400中分离得到的光刻胶供给至显影液储罐100中,以便保持显影液储罐100中显影液中光刻胶浓度稳定,实现光刻胶的循环使用。According to still another embodiment of the present invention, referring to FIG. 3, the photoresist outlet 403 is connected to the developer tank 100, and is adapted to supply the photoresist separated in the photoresist filter device 400 to the developer tank 100. In order to keep the concentration of the photoresist in the developer in the developer tank 100 stable, recycling of the photoresist is achieved.
根据本发明的又一个实施例,参考图4,显影液回收罐300上的出液口303和光刻胶出口403均与显影液储罐100相连,且适于将显影液回收罐300中的含有高浓度光刻胶的混合显影液和光刻胶过滤装置400中得到的光刻胶均供给至显影液储罐100中,从而保持显影液储罐100中显影液光刻胶浓度稳定。According to still another embodiment of the present invention, referring to FIG. 4, the liquid outlet 303 and the photoresist outlet 403 on the developer recovery tank 300 are both connected to the developer tank 100, and are adapted to collect the developer in the tank 300. The mixed developer containing the high-concentration photoresist and the photoresist obtained in the photoresist filtering device 400 are all supplied to the developer tank 100, thereby maintaining the developer resist concentration in the developer tank 100 stable.
根据本发明的又一个实施例,参考图5-7,显影回收液出口302与回收液入口401通过泵600相连,且适于采用泵600将显影液回收罐300中的含有高浓度光刻胶的混合显影液供给至光刻胶过滤装置400中进行过滤处理。
According to still another embodiment of the present invention, with reference to FIGS. 5-7, the development recovery liquid outlet 302 and the recovery liquid inlet 401 are connected by a pump 600, and are adapted to employ a pump 600 to contain a high concentration of photoresist in the developer recovery tank 300. The mixed developing solution is supplied to the photoresist filtering device 400 for filtration treatment.
根据本发明的又一个实施例,回收显影液系统可以包括多个显影液储罐100和多个显影机200,并且显影液储罐100与显影机200一一对应,从而可以显著提高系统利用率。需要解释的是,本文中“显影液储罐100与显影机200一一对应”可以理解为显影液储罐100与显影机200数量相同,并且一台显影液储罐100搭配一台显影机200使用。例如参考图8-10,以回收显影液系统可以包括两台显影液储罐100和两台显影机200为例。According to still another embodiment of the present invention, the recovery developer system may include a plurality of developer storage tanks 100 and a plurality of developing machines 200, and the developer storage tank 100 is in one-to-one correspondence with the developing machine 200, so that the system utilization rate can be remarkably improved. . It should be noted that "the developer tank 100 and the developing machine 200 are in one-to-one correspondence" herein can be understood as the same amount of the developer tank 100 and the developing machine 200, and one developer tank 100 is matched with a developing machine 200. use. For example, referring to Figures 8-10, the recovery developer system can include two developer reservoirs 100 and two developers 200 as an example.
根据本发明的又一个实施例,本发明的回收显影液系统可以包括五台显影液储罐100和五台显影机200。由此,通过采用五台显影液储罐100和五台显影机200共用一台显影液回收罐300,使得每台显影机200中印版与显影液混合后得到的含有光刻胶的显影后液返回各自对应的显影液储罐100中,然后再经每台显影液储罐100供给至显影液回收罐300中汇集得到含有高浓度光刻胶的混合显影液,最后将显影液回收罐300中的含有高浓度光刻胶的混合显影液和/或经光刻胶过滤装置400得到的光刻胶供给至显影液储罐100中,从而可以保持显影液储罐100中显影液光刻胶浓度稳定,从而实现了光刻胶的循环使用,相较于现有技术外加涂布了光刻胶的玻璃来补充光刻胶,采用本申请的系统可以显著降低原料成本,并且该系统结构简单易于操作,并且设备利用率高。According to still another embodiment of the present invention, the recovered developer system of the present invention may include five developer tanks 100 and five developers 200. Thus, by using five developing solution storage tanks 100 and five developing machines 200, one developing solution recovery tank 300 is shared, so that after the printing plate containing the printing plate obtained by mixing the printing plate and the developing solution in each developing machine 200, the photoresist is developed. The liquids are returned to the corresponding developer tanks 100, and then supplied to the developer recovery tank 300 through each of the developer tanks 100 to collect a mixed developer containing a high concentration of the photoresist, and finally the developer recovery tank 300 is collected. The mixed developing solution containing the high-concentration photoresist and/or the photoresist obtained by the photoresist filtering device 400 is supplied to the developing solution storage tank 100, so that the developing solution resist in the developing solution storage tank 100 can be maintained. The concentration is stable, thereby realizing the recycling of the photoresist, and the photoresist is coated to supplement the photoresist compared with the prior art, and the system of the present application can significantly reduce the raw material cost, and the system has a simple structure. Easy to operate and high equipment utilization.
为了方便理解,下面以采用两个显影液储罐100和两个显影机200为例对本发明的显影液回收系统的具体操作进行描述:首先通过两个显影液储罐100向各自对应的显影机200中供给显影液,使显影液与印版混合,印版上的光刻胶溶解在显影液中,得到显影印版和含有光刻胶的显影后液,每台显影机200中得到的含有光刻胶的显影后液供给至各自的显影液储罐100中储存,其中,一部分作为显影液使用,而另一部分再经每台显影液储罐100供给至显影液回收罐300中汇集得到含有高浓度光刻胶的混合显影液,最后将显影液回收罐300中的含有高浓度光刻胶的混合显影液和/或经光刻胶过滤装置400得到的光刻胶供给至显影液储罐100中,从而可以保持显影液储罐100中显影液光刻胶浓度稳定,实现了光刻胶的循环使用。For convenience of understanding, the specific operation of the developer recovery system of the present invention will be described below by taking two developer tanks 100 and two developing machines 200 as an example: first, two developer tanks 100 are used to correspond to respective developing machines. 200 is supplied with a developing solution to mix the developing solution with the printing plate, and the photoresist on the printing plate is dissolved in the developing solution to obtain a developing plate and a developing solution containing the photoresist, and the obtained product in each developing machine 200 is contained. The developing solution of the photoresist is supplied to the respective developer tanks 100 for storage, wherein a part of it is used as a developing solution, and another part is supplied to the developing solution collecting tank 300 through each of the developing solution tanks 100 to be collected. a mixed developing solution of a high concentration photoresist, and finally supplying a mixed developing solution containing a high concentration of photoresist in the developer recovery tank 300 and/or a photoresist obtained by the photoresist filtering device 400 to a developing solution storage tank In 100, the developer resist concentration in the developer tank 100 can be kept stable, and the recycling of the photoresist can be realized.
在本说明书的描述中,参考术语“一个实施例”、“一些实施例”、“示例”、“具体示例”、或“一些示例”等的描述意指结合该实施例或示例描述的具体特征、结构、材料或者特点包含于本发明的至少一个实施例或示例中。在本说明书中,对上述术语的示意性表述不必须针对的是相同的实施例或示例。而且,描述的具体特征、结构、材料或者特点可以在任一个或多个实施例或示例中以合适的方式结合。此外,在不相互矛盾的情况下,本领域的技术人员可以将本说明书中描述的不同实施例或示例以及不同实施例或示例的特征进行结合和组合。In the description of the present specification, the description with reference to the terms "one embodiment", "some embodiments", "example", "specific example", or "some examples" and the like means a specific feature described in connection with the embodiment or example. A structure, material or feature is included in at least one embodiment or example of the invention. In the present specification, the schematic representation of the above terms is not necessarily directed to the same embodiment or example. Furthermore, the particular features, structures, materials, or characteristics described may be combined in a suitable manner in any one or more embodiments or examples. In addition, various embodiments or examples described in the specification and features of various embodiments or examples may be combined and combined without departing from the scope of the invention.
尽管上面已经示出和描述了本发明的实施例,可以理解的是,上述实施例是示例性的,
不能理解为对本发明的限制,本领域的普通技术人员在本发明的范围内可以对上述实施例进行变化、修改、替换和变型。
Although the embodiments of the present invention have been shown and described above, it will be understood that the above embodiments are illustrative,
It is to be understood that the invention is susceptible to variations, modifications, alterations and variations of the embodiments described herein.
Claims (8)
- 一种显影液回收系统,其特征在于,包括:A developer recovery system, comprising:显影液储罐,所述显影液储罐具有显影液入口和显影液出口;a developer storage tank having a developer inlet and a developer outlet;显影机,所述显影机具有显影液喷头、印版入口和显影后液出口,所述显影液喷头与所述显影液出口相连,所述显影后液出口与所述显影液储罐相连;a developing machine having a developer head, a plate inlet and a developed liquid outlet, the developer head being connected to the developer outlet, the developed liquid outlet being connected to the developer tank;显影液回收罐,所述显影液回收罐具有显影回收液入口和显影回收液出口,所述显影液入口与所述显影液储罐相连;a developer recovery tank having a development recovery liquid inlet and a development recovery liquid outlet, the developer inlet being connected to the developer storage tank;光刻胶过滤装置,所述光刻胶过滤装置具有回收液入口、过滤后液出口和光刻胶出口,所述回收液入口与所述显影回收液出口相连,所述过滤后液出口与所述显影液入口相连,所述显影液回收罐上的出液口和所述光刻胶出口中的至少之一与所述显影液储罐相连。a photoresist filter device having a recovery liquid inlet, a filtered liquid outlet, and a photoresist outlet, the recovery liquid inlet being connected to the development recovery liquid outlet, the filtered liquid outlet and the The developer inlet is connected, and at least one of the liquid outlet on the developer recovery tank and the photoresist outlet is connected to the developer tank.
- 根据权利要求1所述的显影液回收系统,其特征在于,所述显影液回收罐上的出液口与所述显影液储罐相连。A developer recovery system according to claim 1, wherein a liquid outlet on said developer recovery tank is connected to said developer tank.
- 根据权利要求2所述的显影液回收系统,其特征在于,所述显影液回收罐上的出液口通过补液泵与所述显影液储罐相连。The developer recovery system according to claim 2, wherein the liquid outlet on the developer recovery tank is connected to the developer tank through a rehydration pump.
- 根据权利要求1所述的显影液回收系统,其特征在于,所述光刻胶出口与所述显影液储罐相连。The developer recovery system according to claim 1, wherein said photoresist outlet is connected to said developer reservoir.
- 根据权利要求1所述的显影液回收系统,其特征在于,所述显影液回收罐上的出液口和所述光刻胶出口均与所述显影液储罐相连。The developer recovery system according to claim 1, wherein both the liquid outlet on the developer recovery tank and the photoresist outlet are connected to the developer tank.
- 根据权利要求2-5中任一项所述的显影液回收系统,其特征在于,所述显影回收液出口与所述回收液入口通过泵相连。The developer recovery system according to any one of claims 2 to 5, wherein the development recovery liquid outlet and the recovery liquid inlet are connected by a pump.
- 根据权利要求6所述的显影液回收系统,其特征在于,包括多个所述显影液储罐和多个所述显影机,并且所述显影液储罐与所述显影机一一对应。A developer recovery system according to claim 6, comprising a plurality of said developer tanks and a plurality of said developing machines, and said developer tanks are in one-to-one correspondence with said developing machines.
- 根据权利要求7所述的显影液回收系统,其特征在于,包括五台所述显影液储罐和五台所述显影机。 A developer recovery system according to claim 7, comprising five of said developer tanks and five of said developers.
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US5753135A (en) * | 1995-10-23 | 1998-05-19 | Jablonsky; Julius James | Apparatus and method for recovering photoresist developers and strippers |
US20040067453A1 (en) * | 2002-09-27 | 2004-04-08 | Chiao-Chung Huang | System and method for recycling developer solution containing tetra-methyl-ammonia hydroxide (TMAH) |
CN1760765A (en) * | 2005-11-21 | 2006-04-19 | 友达光电股份有限公司 | Method for adjusting compositions of developing solution, and toning system |
CN203433266U (en) * | 2013-08-06 | 2014-02-12 | 杭州格林达化学有限公司 | Device for recycling photoresist resin in developing solution |
CN104698774A (en) * | 2013-12-06 | 2015-06-10 | 台湾积体电路制造股份有限公司 | Semiconductor device process filter and method |
CN104846377A (en) * | 2015-06-02 | 2015-08-19 | 成都虹华环保科技股份有限公司 | Full automatic etching solution recovery device |
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JP3894104B2 (en) * | 2002-11-15 | 2007-03-14 | 東京エレクトロン株式会社 | Developing method, developing apparatus, and developer regenerating apparatus |
CN203433267U (en) * | 2013-08-06 | 2014-02-12 | 杭州格林达化学有限公司 | Device for recycling photoresist resin in developing solution |
JP6505534B2 (en) * | 2015-07-22 | 2019-04-24 | 株式会社平間理化研究所 | Method and apparatus for managing developer |
CN105353591A (en) * | 2015-11-05 | 2016-02-24 | 刘幸 | Device for recovering photoresist in coating machine pipeline |
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- 2017-08-23 CN CN201780060322.7A patent/CN109791374B/en active Active
- 2017-08-23 WO PCT/CN2017/098669 patent/WO2019036936A1/en active Application Filing
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US5753135A (en) * | 1995-10-23 | 1998-05-19 | Jablonsky; Julius James | Apparatus and method for recovering photoresist developers and strippers |
US20040067453A1 (en) * | 2002-09-27 | 2004-04-08 | Chiao-Chung Huang | System and method for recycling developer solution containing tetra-methyl-ammonia hydroxide (TMAH) |
CN1760765A (en) * | 2005-11-21 | 2006-04-19 | 友达光电股份有限公司 | Method for adjusting compositions of developing solution, and toning system |
CN203433266U (en) * | 2013-08-06 | 2014-02-12 | 杭州格林达化学有限公司 | Device for recycling photoresist resin in developing solution |
CN104698774A (en) * | 2013-12-06 | 2015-06-10 | 台湾积体电路制造股份有限公司 | Semiconductor device process filter and method |
CN104846377A (en) * | 2015-06-02 | 2015-08-19 | 成都虹华环保科技股份有限公司 | Full automatic etching solution recovery device |
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CN109791374A (en) | 2019-05-21 |
CN109791374B (en) | 2022-05-17 |
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