WO2019036936A1

WO2019036936A1 - Developing solution recovery system

Info

Publication number: WO2019036936A1
Application number: PCT/CN2017/098669
Authority: WO
Inventors: 区炜锋
Original assignee: 深圳市柔宇科技有限公司
Priority date: 2017-08-23
Filing date: 2017-08-23
Publication date: 2019-02-28
Also published as: CN109791374A; CN109791374B

Abstract

Provided is a developing solution recovery system. The system comprises a developing solution storage tank, a developing machine, a developing solution recovery tank, and a photoresist filtering device. The developing solution storage tank is provided with a developing solution inlet and a developing solution outlet. The developing machine is provided with a developing solution nozzle, a printing plate inlet and a developing post-solution outlet, the developing solution nozzle is connected to the developing solution outlet, and the developing post-solution outlet is connected to the developing solution storage tank. The developing solution recovery tank is provided with a recovered developing solution inlet and a recovered developing solution outlet. The developing solution inlet is connected to the developing solution storage tank. The photoresist filtering device is provided with a recovered solution inlet, a filtered post-solution outlet and photoresist outlets. The recovered solution inlet is connected to the recovered developing solution outlet, the filtered post-solution outlet is connected to the developing solution inlet, and the solution outlet in the developing solution recovery tank is connected to at least one of the photoresist outlets and the developing solution storage tank.

Description

Developer recovery system

Technical field

The present invention is in the field of printed plate technology, and in particular, the present invention relates to a developer recovery system.

Background technique

The developer management system is a device for adjusting and stabilizing the concentration of TMAH, carbonate, and photoresist in the developer, which can manage multiple developers at the same time, but when the concentration of the photoresist in one of the developer tanks is low When the developer management system cannot add a high photoresist concentration solution to adjust the photoresist concentration, it is necessary to specially apply some photoresist coated glass to increase the photoresist concentration, and then put into the official product to cause the material. Cost and time cost is wasted.

Therefore, the existing developer treatment system needs to be further improved.

Summary of the invention

The present invention aims to solve at least one of the technical problems in the related art to some extent. Accordingly, it is an object of the present invention to provide a developer recovery system by which the recycling of photoresist in the system can be achieved, thereby significantly reducing development costs.

In one aspect of the invention, the invention provides a developer recovery system. According to an embodiment of the invention, the system comprises:

a developer storage tank having a developer inlet and a developer outlet;

a developing machine having a developer head, a plate inlet and a developed liquid outlet, the developer head being connected to the developer outlet, the developed liquid outlet being connected to the developer tank;

a developer recovery tank having a development recovery liquid inlet and a development recovery liquid outlet, the developer inlet being connected to the developer storage tank;

a photoresist filter device having a recovery liquid inlet, a filtered liquid outlet, and a photoresist outlet, the recovery liquid inlet being connected to the development recovery liquid outlet, the filtered liquid outlet and the The developer inlet is connected, and at least one of the liquid outlet on the developer recovery tank and the photoresist outlet is connected to the developer tank.

The developer recovery system according to an embodiment of the present invention supplies a recovery liquid containing a high-concentration photoresist or/and a photoresist obtained by a photoresist filter device in a developer recovery tank to a developer storage tank, The photoresist concentration in the developer supplied to the developing machine is stabilized, thereby realizing the recycling of the photoresist, and the photoresist is coated to supplement the photoresist compared with the prior art, and the present application is adopted. The system can significantly reduce the cost of raw materials, and the system is simple and easy to operate.

Further, the developer recovery system according to the above embodiment of the present invention may further have the following additional technical features:

In some embodiments of the invention, the liquid outlet on the developer recovery tank is connected to the developer reservoir. As a result, system material and time costs can be significantly reduced.

In some embodiments of the invention, the liquid outlet on the developer recovery tank is connected to the developer tank through a rehydration pump.

In some embodiments of the invention, the photoresist outlet is coupled to the developer reservoir. Thereby, the system raw material and time cost can be further reduced.

In some embodiments of the invention, the liquid outlet on the developer recovery tank and the photoresist outlet are both connected to the developer reservoir. Thereby, the system raw material and time cost can be further reduced.

In some embodiments of the invention, the development recovery liquid outlet is connected to the recovery liquid inlet by a pump.

In some embodiments of the present invention, the recycling developer system includes a plurality of the developer tanks and a plurality of the developing machines, and the developer tanks are in one-to-one correspondence with the developing machines. As a result, system utilization can be significantly improved.

In some embodiments of the invention, the recycled developer system includes five of the developer reservoirs and five of the developers. Thereby, the system utilization can be further improved.

The additional aspects and advantages of the invention will be set forth in part in the description which follows.

DRAWINGS

The above and/or additional aspects and advantages of the present invention will become apparent and readily understood from

1 is a schematic structural view of a developer recovery system according to an embodiment of the present invention;

2 is a schematic structural view of a developer recovery system according to still another embodiment of the present invention;

3 is a schematic structural view of a developer recovery system according to still another embodiment of the present invention;

4 is a schematic structural view of a developer recovery system according to still another embodiment of the present invention;

Figure 5 is a schematic structural view of a developer recovery system according to still another embodiment of the present invention;

Figure 6 is a schematic structural view of a developer recovery system according to still another embodiment of the present invention;

Figure 7 is a schematic structural view of a developer recovery system according to still another embodiment of the present invention;

Figure 8 is a schematic structural view of a developer recovery system according to still another embodiment of the present invention;

9 is a schematic structural view of a developer recovery system according to still another embodiment of the present invention;

Figure 10 is a schematic view showing the structure of a developer recovery system in accordance with still another embodiment of the present invention.

Detailed description of the invention

Embodiments of the invention are described in detail below, examples of which are illustrated in the accompanying drawings in which the same Or similar reference numerals indicate the same or similar elements or elements having the same or similar functions. The embodiments described below with reference to the drawings are intended to be illustrative of the invention and are not to be construed as limiting.

In the description of the present invention, it is to be understood that the terms "center", "longitudinal", "transverse", "length", "width", "thickness", "upper", "lower", "front", " Rear, Left, Right, Vertical, Horizontal, Top, Bottom, Inner, Out, Clockwise, Counterclockwise, Axial The orientation or positional relationship of the "radial", "circumferential" and the like is based on the orientation or positional relationship shown in the drawings, and is merely for the convenience of describing the present invention and simplifying the description, and does not indicate or imply the indicated device or The elements must have a particular orientation, are constructed and operated in a particular orientation and are therefore not to be construed as limiting.

Moreover, the terms "first" and "second" are used for descriptive purposes only and are not to be construed as indicating or implying a relative importance or implicitly indicating the number of technical features indicated. Thus, features defining "first" and "second" may include at least one of the features, either explicitly or implicitly. In the description of the present invention, the meaning of "a plurality" is at least two, such as two, three, etc., unless specifically defined otherwise.

In the present invention, the terms "installation", "connected", "connected", "fixed" and the like shall be understood broadly, and may be either a fixed connection or a detachable connection, unless explicitly stated and defined otherwise. , or integrated; can be mechanical or electrical connection; can be directly connected, or indirectly connected through an intermediate medium, can be the internal communication of two elements or the interaction of two elements, unless otherwise specified Limited. For those skilled in the art, the specific meanings of the above terms in the present invention can be understood on a case-by-case basis.

In the present invention, the first feature "on" or "under" the second feature may be a direct contact of the first and second features, or the first and second features may be indirectly through an intermediate medium, unless otherwise explicitly stated and defined. contact. Moreover, the first feature "above", "above" and "above" the second feature may be that the first feature is directly above or above the second feature, or merely that the first feature level is higher than the second feature. The first feature "below", "below" and "below" the second feature may be that the first feature is directly below or obliquely below the second feature, or merely that the first feature level is less than the second feature.

In one aspect of the invention, the invention provides a developer recovery system. According to an embodiment of the present invention, referring to FIG. 1, the system includes a developer tank 100, a developing machine 200, a developer recovery tank 300, and a photoresist filtering device 400.

According to an embodiment of the present invention, the developer tank 100 has a developer inlet 101 and a developer outlet 102, and is adapted to store a developer TMAH (tetramethylammonium hydroxide).

According to an embodiment of the present invention, the developing machine 200 has a developing head 201, a plate inlet 202, and a developing liquid outlet 203. The developing head 201 is connected to the developing solution outlet 102, and after development, the liquid outlet 203 is connected to the developing solution tank 100. And suitable for mixing the developer with the printing plate, so that the photoresist on the printing plate is dissolved in the developing solution to obtain a developing plate and a developing solution containing the photoresist, and the obtained photoresist-containing developing solution is obtained. The post liquid is supplied to the developer tank 100. Specifically, the developer head 201 on the developing machine 200 may include a plurality of, and those skilled in the art may select according to actual needs.

According to an embodiment of the present invention, the developer recovery tank 300 has a development recovery liquid inlet 301 and a development recovery liquid outlet 302, and the developer inlet 301 is connected to the developer storage tank 100, and is adapted to develop the developer in the developer storage tank 100. The mixed developing solution of the liquid and the developed solution containing the photoresist is supplied to the developer recovery tank 300, and after collection, a mixed developing solution containing a high concentration of the photoresist is obtained.

According to an embodiment of the present invention, the photoresist filter device 400 has a recovery liquid inlet 401, a filtered liquid outlet 402, and a photoresist outlet 403. The recovery liquid inlet 401 is connected to the development recovery liquid outlet 302, and the filtered liquid outlet 402 is developed. The liquid storage tank 100 is connected, at least one of the liquid outlet 303 and the photoresist outlet 403 on the developer recovery tank 300 is connected to the developer tank 100, and is adapted to contain a high concentration in the developer recovery tank 300. The mixed developing solution of the photoresist is subjected to a filtration treatment to separate the photoresist and the filtered liquid, and the filtered liquid is supplied to the developing solution storage tank 100 as a developing solution, and the developer in the developing solution recovery tank 300 is contained. The photoresist obtained in the mixed developer of the high-concentration photoresist and/or the photoresist filter device 400 is supplied to the developer tank 100, thereby maintaining the developer resist concentration in the developer tank 100 stable. The inventors have found that the photoresist obtained by the high-concentration photoresist contained in the developer recovery tank or/and the photoresist obtained by the photoresist filter device are supplied to the developer tank to ensure supply to the developing machine. The concentration of the photoresist in the developer is stable, thereby realizing the recycling of the photoresist. Compared with the prior art and the photoresist coated glass to supplement the photoresist, the system of the present application can significantly reduce the raw materials. Cost, and the system structure is simple and easy to operate.

According to an embodiment of the present invention, referring to FIG. 1, the liquid outlet 303 on the developer recovery tank 300 is connected to the developer tank 100, and is adapted to mix a high concentration photoresist in the developer recovery tank 300. The developer is supplied to the developer tank 100 in order to keep the concentration of the photoresist in the developer in the developer tank 100 stable, thereby realizing the recycling of the photoresist. As a result, system material and time costs can be significantly reduced.

According to still another embodiment of the present invention, referring to FIG. 2, the liquid outlet 303 on the developer recovery tank 300 may be connected to the developer tank 100 through the rehydration pump 500, and is adapted to be recovered by the replenishing pump 500. The mixed developing solution containing a high concentration of the photoresist in the can 300 is supplied to the developing solution storage tank 100.

According to still another embodiment of the present invention, referring to FIG. 3, the photoresist outlet 403 is connected to the developer tank 100, and is adapted to supply the photoresist separated in the photoresist filter device 400 to the developer tank 100. In order to keep the concentration of the photoresist in the developer in the developer tank 100 stable, recycling of the photoresist is achieved.

According to still another embodiment of the present invention, referring to FIG. 4, the liquid outlet 303 and the photoresist outlet 403 on the developer recovery tank 300 are both connected to the developer tank 100, and are adapted to collect the developer in the tank 300. The mixed developer containing the high-concentration photoresist and the photoresist obtained in the photoresist filtering device 400 are all supplied to the developer tank 100, thereby maintaining the developer resist concentration in the developer tank 100 stable.

According to still another embodiment of the present invention, with reference to FIGS. 5-7, the development recovery liquid outlet 302 and the recovery liquid inlet 401 are connected by a pump 600, and are adapted to employ a pump 600 to contain a high concentration of photoresist in the developer recovery tank 300. The mixed developing solution is supplied to the photoresist filtering device 400 for filtration treatment.

According to still another embodiment of the present invention, the recovery developer system may include a plurality of developer storage tanks 100 and a plurality of developing machines 200, and the developer storage tank 100 is in one-to-one correspondence with the developing machine 200, so that the system utilization rate can be remarkably improved. . It should be noted that "the developer tank 100 and the developing machine 200 are in one-to-one correspondence" herein can be understood as the same amount of the developer tank 100 and the developing machine 200, and one developer tank 100 is matched with a developing machine 200. use. For example, referring to Figures 8-10, the recovery developer system can include two developer reservoirs 100 and two developers 200 as an example.

According to still another embodiment of the present invention, the recovered developer system of the present invention may include five developer tanks 100 and five developers 200. Thus, by using five developing solution storage tanks 100 and five developing machines 200, one developing solution recovery tank 300 is shared, so that after the printing plate containing the printing plate obtained by mixing the printing plate and the developing solution in each developing machine 200, the photoresist is developed. The liquids are returned to the corresponding developer tanks 100, and then supplied to the developer recovery tank 300 through each of the developer tanks 100 to collect a mixed developer containing a high concentration of the photoresist, and finally the developer recovery tank 300 is collected. The mixed developing solution containing the high-concentration photoresist and/or the photoresist obtained by the photoresist filtering device 400 is supplied to the developing solution storage tank 100, so that the developing solution resist in the developing solution storage tank 100 can be maintained. The concentration is stable, thereby realizing the recycling of the photoresist, and the photoresist is coated to supplement the photoresist compared with the prior art, and the system of the present application can significantly reduce the raw material cost, and the system has a simple structure. Easy to operate and high equipment utilization.

For convenience of understanding, the specific operation of the developer recovery system of the present invention will be described below by taking two developer tanks 100 and two developing machines 200 as an example: first, two developer tanks 100 are used to correspond to respective developing machines. 200 is supplied with a developing solution to mix the developing solution with the printing plate, and the photoresist on the printing plate is dissolved in the developing solution to obtain a developing plate and a developing solution containing the photoresist, and the obtained product in each developing machine 200 is contained. The developing solution of the photoresist is supplied to the respective developer tanks 100 for storage, wherein a part of it is used as a developing solution, and another part is supplied to the developing solution collecting tank 300 through each of the developing solution tanks 100 to be collected. a mixed developing solution of a high concentration photoresist, and finally supplying a mixed developing solution containing a high concentration of photoresist in the developer recovery tank 300 and/or a photoresist obtained by the photoresist filtering device 400 to a developing solution storage tank In 100, the developer resist concentration in the developer tank 100 can be kept stable, and the recycling of the photoresist can be realized.

In the description of the present specification, the description with reference to the terms "one embodiment", "some embodiments", "example", "specific example", or "some examples" and the like means a specific feature described in connection with the embodiment or example. A structure, material or feature is included in at least one embodiment or example of the invention. In the present specification, the schematic representation of the above terms is not necessarily directed to the same embodiment or example. Furthermore, the particular features, structures, materials, or characteristics described may be combined in a suitable manner in any one or more embodiments or examples. In addition, various embodiments or examples described in the specification and features of various embodiments or examples may be combined and combined without departing from the scope of the invention.

Although the embodiments of the present invention have been shown and described above, it will be understood that the above embodiments are illustrative, It is to be understood that the invention is susceptible to variations, modifications, alterations and variations of the embodiments described herein.

Claims

A developer recovery system, comprising:

a developer storage tank having a developer inlet and a developer outlet;

a developing machine having a developer head, a plate inlet and a developed liquid outlet, the developer head being connected to the developer outlet, the developed liquid outlet being connected to the developer tank;

a developer recovery tank having a development recovery liquid inlet and a development recovery liquid outlet, the developer inlet being connected to the developer storage tank;

a photoresist filter device having a recovery liquid inlet, a filtered liquid outlet, and a photoresist outlet, the recovery liquid inlet being connected to the development recovery liquid outlet, the filtered liquid outlet and the The developer inlet is connected, and at least one of the liquid outlet on the developer recovery tank and the photoresist outlet is connected to the developer tank.
A developer recovery system according to claim 1, wherein a liquid outlet on said developer recovery tank is connected to said developer tank.
The developer recovery system according to claim 2, wherein the liquid outlet on the developer recovery tank is connected to the developer tank through a rehydration pump.
The developer recovery system according to claim 1, wherein said photoresist outlet is connected to said developer reservoir.
The developer recovery system according to claim 1, wherein both the liquid outlet on the developer recovery tank and the photoresist outlet are connected to the developer tank.
The developer recovery system according to any one of claims 2 to 5, wherein the development recovery liquid outlet and the recovery liquid inlet are connected by a pump.
A developer recovery system according to claim 6, comprising a plurality of said developer tanks and a plurality of said developing machines, and said developer tanks are in one-to-one correspondence with said developing machines.
A developer recovery system according to claim 7, comprising five of said developer tanks and five of said developers.