CN109791374A - 显影液回收系统 - Google Patents

显影液回收系统 Download PDF

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Publication number
CN109791374A
CN109791374A CN201780060322.7A CN201780060322A CN109791374A CN 109791374 A CN109791374 A CN 109791374A CN 201780060322 A CN201780060322 A CN 201780060322A CN 109791374 A CN109791374 A CN 109791374A
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China
Prior art keywords
developer solution
development
storage tank
liquid storage
outlet
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CN201780060322.7A
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CN109791374B (zh
Inventor
区炜锋
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Shenzhen Royole Technologies Co Ltd
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Shenzhen Royole Technologies Co Ltd
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

提供了显影液回收系统，该系统包括：显影液储罐，所述显影液储罐具有显影液入口和显影液出口；显影机，所述显影机具有显影液喷头、印版入口和显影后液出口，所述显影液喷头与所述显影液出口相连，所述显影后液出口与所述显影液储罐相连；显影液回收罐，所述显影液回收罐具有显影回收液入口和显影回收液出口，所述显影液入口与所述显影液储罐相连；光刻胶过滤装置，所述光刻胶过滤装置具有回收液入口、过滤后液出口和光刻胶出口，所述回收液入口与所述显影回收液出口相连，所述过滤后液出口与所述显影液入口相连，所述显影液回收罐上的出液口和所述光刻胶出口中的至少之一与所述显影液储罐相连。

Description

PCT国内申请，说明书已公开。

Claims (8)

  1. PCT国内申请，权利要求书已公开。
CN201780060322.7A 2017-08-23 2017-08-23 显影液回收系统 Active CN109791374B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/CN2017/098669 WO2019036936A1 (zh) 2017-08-23 2017-08-23 显影液回收系统

Publications (2)

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CN109791374A true CN109791374A (zh) 2019-05-21
CN109791374B CN109791374B (zh) 2022-05-17

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CN201780060322.7A Active CN109791374B (zh) 2017-08-23 2017-08-23 显影液回收系统

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CN (1) CN109791374B (zh)
WO (1) WO2019036936A1 (zh)

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040067453A1 (en) * 2002-09-27 2004-04-08 Chiao-Chung Huang System and method for recycling developer solution containing tetra-methyl-ammonia hydroxide (TMAH)
KR20040042875A (ko) * 2002-11-15 2004-05-20 동경 엘렉트론 주식회사 현상방법 및 현상장치
CN203433266U (zh) * 2013-08-06 2014-02-12 杭州格林达化学有限公司 一种显影液中光刻胶树脂回收再利用装置
CN203433267U (zh) * 2013-08-06 2014-02-12 杭州格林达化学有限公司 显影液中光刻胶树脂回收再利用装置
CN105353591A (zh) * 2015-11-05 2016-02-24 刘幸 一种用于回收涂布机管道内光刻胶的装置
CN106371295A (zh) * 2015-07-22 2017-02-01 株式会社平间理化研究所 显影液的管理方法及装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5753135A (en) * 1995-10-23 1998-05-19 Jablonsky; Julius James Apparatus and method for recovering photoresist developers and strippers
CN100555084C (zh) * 2005-11-21 2009-10-28 友达光电股份有限公司 显影液成分调整方法及其显影系统
US9360758B2 (en) * 2013-12-06 2016-06-07 Taiwan Semiconductor Manufacturing Company, Ltd. Semiconductor device process filter and method
CN104846377A (zh) * 2015-06-02 2015-08-19 成都虹华环保科技股份有限公司 一种全自动蚀刻液回收装置

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040067453A1 (en) * 2002-09-27 2004-04-08 Chiao-Chung Huang System and method for recycling developer solution containing tetra-methyl-ammonia hydroxide (TMAH)
KR20040042875A (ko) * 2002-11-15 2004-05-20 동경 엘렉트론 주식회사 현상방법 및 현상장치
CN203433266U (zh) * 2013-08-06 2014-02-12 杭州格林达化学有限公司 一种显影液中光刻胶树脂回收再利用装置
CN203433267U (zh) * 2013-08-06 2014-02-12 杭州格林达化学有限公司 显影液中光刻胶树脂回收再利用装置
CN106371295A (zh) * 2015-07-22 2017-02-01 株式会社平间理化研究所 显影液的管理方法及装置
CN105353591A (zh) * 2015-11-05 2016-02-24 刘幸 一种用于回收涂布机管道内光刻胶的装置

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Publication number Publication date
CN109791374B (zh) 2022-05-17
WO2019036936A1 (zh) 2019-02-28

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