WO2018233039A1 - 进气机构及预清洗腔室 - Google Patents

进气机构及预清洗腔室 Download PDF

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Publication number
WO2018233039A1
WO2018233039A1 PCT/CN2017/099889 CN2017099889W WO2018233039A1 WO 2018233039 A1 WO2018233039 A1 WO 2018233039A1 CN 2017099889 W CN2017099889 W CN 2017099889W WO 2018233039 A1 WO2018233039 A1 WO 2018233039A1
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WIPO (PCT)
Prior art keywords
plate
passage
intake mechanism
disposed
air outlet
Prior art date
Application number
PCT/CN2017/099889
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English (en)
French (fr)
Inventor
郭浩
郑金果
赵梦欣
徐奎
陈鹏
丁培军
Original Assignee
北京北方华创微电子装备有限公司
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Publication of WO2018233039A1 publication Critical patent/WO2018233039A1/zh

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32458—Vessel
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
    • H01J37/32853—Hygiene
    • H01J37/32862—In situ cleaning of vessels and/or internal parts
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation
    • H01J2237/327—Arrangements for generating the plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation
    • H01J2237/33—Processing objects by plasma generation characterised by the type of processing
    • H01J2237/335—Cleaning

Definitions

  • the present disclosure relates to the field of semiconductor devices, and in particular to an air intake mechanism and a pre-cleaning chamber.
  • a pre-clean process chamber is required for pre-cleaning processes to deposit metal Before the film, remove contaminants from the surface of the wafer, or residues from the bottom of the trench and perforations.
  • the general pre-cleaning process is to excite a process gas, such as Ar (argon), He (helium), etc., into a plasma, and use the chemical reaction of the plasma and physical bombardment to perform impurity removal treatment on the wafer.
  • an upper air intake mechanism is generally provided at the top of the reaction chamber for conveying process gas into the reaction chamber.
  • Fig. 1 is a structural view of a conventional upper air intake mechanism.
  • Figure 2 is a bottom plan view of the upper air intake mechanism of Figure 1.
  • Figure 3 is a partial cross-sectional view of the upper air intake mechanism of Figure 1.
  • the upper air intake mechanism includes an upper cover 1 and a protection plate 2 disposed at the bottom of the upper cover 1.
  • the upper cover 1 is provided with an intake passage 3, and the protection plate is 2 is provided with a plurality of air outlets 4, and the plurality of air outlets 4 are located at the edge of the protection panel 2, and are symmetrically distributed along the circumferential direction of the protection panel 2, as shown in FIG.
  • a groove is formed in the lower surface of the upper cover 1, and the groove forms an intermediate passage 5 with the upper surface of the protection plate 2, and the intermediate passage 5 is respectively connected to the outlet end of the intake passage 3 and the respective air outlets 4
  • the process gas flows into the reaction chamber through the intake passage 3, the intermediate passage 5 and the respective air outlets 4 in sequence, and the flow direction of the process gas is as indicated by an arrow in FIG.
  • the inventors have found in the course of carrying out the invention that the above-mentioned upper air intake mechanism has at least the following problems in practical applications. As shown in FIG. 4, contaminants in the reaction chamber can pass through the gas outlet 4 from bottom to top and enter the intermediate passage 5, and adhere to the inner wall of the upper cover 1, thereby causing the upper cover 1 to be caused. Contamination, because it is difficult to clean and replace the upper cover 1, thereby reducing the service life of the device.
  • the present disclosure is directed to at least partially solving the technical problems existing in the prior art, and proposes an air intake mechanism and a pre-cleaning chamber that can at least partially avoid the problem of contamination of the cover plate, thereby Can increase the life of the device.
  • an air intake mechanism including: a cover plate in which an intake passage is disposed; a protection plate in which an air outlet is provided; a buffer chamber, and a setting Between the cover plate and the protection plate, the air inlet passage, the buffer chamber and the air outlet are sequentially connected, and further comprising a blocking member fixed in the buffer cavity and located at the air outlet In opposite positions, the projection of the blocking member on the protective plate covers the air outlet.
  • the blocking member includes: a plate-shaped body, wherein the plate-shaped body and the cover plate have a first passage, and the first passage is connected to the intake passage through.
  • the first passage includes: a first recess disposed on the plate-like body, and/or a second recess disposed on the cover; wherein the first The recess and the second recess are respectively disposed on a surface of the plate-shaped body opposite to the cover plate.
  • the plate body has a second passage therein, or a second passage between the plate body and the side wall of the buffer chamber, the first passage and the The second channel is connected.
  • the plate-shaped body has a second passage therein; the second passage is a through hole disposed along a thickness direction of the plate-shaped body, and the through hole is offset from the air outlet Relative position.
  • a third passage is formed between the plate-shaped body and the protection plate, the second passage is in communication with the third passage, and the third passage and the outlet are The ports are connected.
  • the third channel includes: a third recess disposed on the plate-shaped body, and/or a fourth recess disposed on the protection plate; wherein the third The recess and the fourth recess are respectively disposed on a surface of the plate-shaped body opposite to the protection plate.
  • the air outlet corresponds to a center of the plate-shaped body; the plurality of through holes are distributed, and the plurality of the through holes are distributed at a center of the center of the plate-shaped body A circle.
  • the third recess includes a plurality of grooves; wherein one ends of the plurality of the grooves converge at a position corresponding to the air outlet; a plurality of the grooves The other end extends one-to-one correspondingly to a position corresponding to the plurality of through holes, and communicates with the corresponding through hole.
  • the air outlet is a tapered through hole, and an end of the tapered through hole having a larger radial cross-sectional area faces the outer side of the protection plate.
  • a plurality of the buffer chambers and a plurality of the air outlets are included between the cover plate and the protection plate, and the plurality of buffer chambers and the plurality of air outlets are a corresponding arrangement, and the blocking member is disposed in each buffer cavity;
  • the air inlet passage provided in the cover plate includes a plurality of air outlet ends, and the plurality of air outlet ends and the plurality of buffer chambers One-to-one correspondence and connectivity.
  • a buffer chamber and one of the air outlets are included between the cover plate and the protection plate, and the air outlet is located at a center position of the protection plate.
  • a buffer chamber and a plurality of the air outlets are included between the cover plate and the protection plate, and a plurality of the blocking members are disposed in the buffer chamber.
  • a buffer chamber and a plurality of the air outlets are included between the cover plate and the protection plate, and one of the blocking members is disposed in the buffer chamber.
  • a pre-cleaning chamber comprising a cavity and an air intake mechanism disposed on the wall of the cavity, wherein the air intake mechanism employs any of the above-described air intake mechanisms.
  • a blocking member is disposed in the buffer cavity, and the blocking member can block an air outlet in the protection plate to block particles entering the buffer cavity from the air outlet to reach the cover plate, thereby preventing the cover plate from being contaminated, thereby preventing the cover plate from being contaminated. Can increase the life of the device.
  • Figure 1 is a structural view of a conventional upper air intake mechanism
  • Figure 2 is a bottom plan view of the upper air intake mechanism of Figure 1;
  • Figure 3 is a partial cross-sectional view of the upper air intake mechanism of Figure 1;
  • Figure 4 is a schematic view of contaminants entering the intermediate passage
  • FIG. 5 is a cross-sectional view of an intake mechanism in accordance with an embodiment of the present disclosure.
  • FIG. 6 is a bottom view of an intake mechanism in accordance with an embodiment of the present disclosure.
  • Figure 7 is an enlarged view of the area I in Figure 5;
  • FIG. 8 is a cross-sectional view of an intake mechanism in accordance with another embodiment of the present disclosure.
  • FIG. 9A is a top structural view of a blocking member according to another embodiment of the present disclosure.
  • FIG. 9B is a lower structural view of a blocking member according to another embodiment of the present disclosure.
  • Figure 10 is a schematic view showing the distribution of pollutants
  • FIG. 11 is a structural view of a cover plate according to another embodiment of the present disclosure.
  • FIG. 12 is a structural view of a protective plate according to another embodiment of the present disclosure.
  • FIG. 13 is a cross-sectional view of an intake mechanism according to still another embodiment of the present disclosure.
  • FIG. 14 is a bottom view of a protector according to still another embodiment of the present disclosure.
  • FIG. 15 is a cross-sectional view of an intake mechanism in accordance with yet another embodiment of the present disclosure.
  • FIG. 16 is a cross-sectional view of an intake mechanism in accordance with still another embodiment of the present disclosure.
  • FIG. 17 is a structural diagram of a pre-cleaning chamber in accordance with an embodiment of the present disclosure.
  • the air intake mechanism is located at the top of the process chamber, and includes a cover plate 6 and a protection plate 7 disposed at the bottom of the cover plate 6 through the plurality of screws.
  • 11 Fixed connection, as shown in FIG. 6, a plurality of screws 11 are symmetrically distributed along the circumferential direction of the cover plate 6.
  • an air inlet passage 61 is provided in the cover plate 6, the intake end 611 of the air inlet passage 61 extends to the bottom edge of the cover plate 6, and is connected with a gas source (not shown in the drawing) The connection; the outlet end 612 of the intake passage 61 extends to the center of the cover plate 6.
  • a buffer chamber 9 is provided between the cover plate 6 and the protective plate 7. Further, an air outlet 71 is provided in the protective plate 7, and the air outlet 71 is also located at the center of the cover 6.
  • the process gas supplied by the above gas source sequentially enters the process chamber through the intake passage 61, the buffer chamber 9, and the air outlet 71.
  • the air outlet 71 is a tapered through hole, and the end of the tapered through hole having a larger radial cross-sectional area is disposed toward the process chamber, that is, facing downward in the example shown in FIG.
  • the uniformity of gas distribution can be improved.
  • a blocking member 8 is disposed at a position opposite to the air outlet 71 in the buffer chamber 9, and the projection of the blocking member 8 on the protective plate 7 covers the air outlet 71 to block the self-venting port 71 from entering the buffer chamber.
  • the particulate matter of 9 reaches the cover plate 6 to prevent the cover plate 6 from being contaminated, thereby improving the service life of the device.
  • the above-mentioned blocking member 8 is configured to pass the gas entering the buffer chamber and enter the air outlet 71 while blocking the particulate matter from reaching the cover plate 6.
  • the blocking member 8 includes a plate-shaped body, wherein the plate-like body and the cover plate 6 have a first passage, that is, an upper surface of the plate-shaped body and a top wall of the buffer chamber 9. a horizontal gap between the plate-like body and the side wall of the buffer chamber 9 , that is, an annular gap between the side of the plate-shaped body and the side wall of the buffer chamber 9; the plate-shaped body and the protection There is a third passage between the plates 7, that is, a horizontal gap between the lower surface of the plate-like body and the bottom wall of the buffer chamber 9.
  • the process gas enters the process chamber through the intake passage 61, the first passage, the second passage, the third passage, and the outlet port 71 in sequence.
  • the structure of the above-mentioned blocking member 8 satisfies the passage of the gas entering the buffer chamber and enters the air outlet 71 while blocking the particulate matter from reaching the cover plate 6.
  • the blocking member 8 should be fixed in the buffer chamber 9 to prevent its position from changing due to the movement of the intake structure, and the position of the air outlet 71 is shifted.
  • the blocking member 8 can be fixed to the bottom wall, the top wall and/or the side wall of the buffer chamber 9 by the support member to fix the position thereof, and the arrangement of the support member does not affect the first passage, the second passage and the first The formation of three channels.
  • the air intake mechanism is located at the top of the process chamber, but the disclosure is not limited thereto. In practical applications, the air intake mechanism may also be located in other parts of the process chamber. The location, such as the side of the process chamber.
  • the intake mechanism according to another embodiment of the present disclosure is substantially the same as the intake structure according to the above embodiment except that the structure of the blocking member 8 is different.
  • differences between the two embodiments will be mainly described.
  • the blocking member 8 includes a plate-like body that almost occupies the inner space of the entire buffer chamber 9, the buffer chamber 9 limits the blocking member 8 to fix the blocking member, and the plate-like body and the cover plate 6 There is a first passage between them, as shown in FIG. 9A, the first passage includes a first recess 81 disposed on the plate-shaped body, the first recess 81 being located on the upper surface of the plate-like body, and buffering opposite thereto The top wall of the cavity 9 forms the first passage described above.
  • a second recess 62 may be disposed on the cover plate 6, as shown in FIG.
  • the second recess 62 is located on the lower surface of the cover 6, and The opposite plate-like body forms the first passage.
  • the first recessed portion 81 and the second recessed portion 62 may be simultaneously provided, and the two may be butted to form the first passage.
  • the second passage is a through hole 82 disposed along the thickness direction of the plate-shaped body, and the through hole 82 is offset from the air outlet. 71 relative position.
  • the air outlet 71 corresponds to the center of the plate-shaped body, and the number of the through holes 82 is plural, and the plurality of through holes 82 are distributed at least one turn centered on the center of the plate-shaped body, so that the process gas can pass.
  • Each of the through holes 82 simultaneously flows into the air outlet 71.
  • a third passage is formed between the plate-shaped body and the protection plate 7, and the third passage includes a third recess 83 disposed on the plate-shaped body, and the third recess 83 is located on the lower surface of the plate-shaped body. And forming a third passage as described above with the bottom wall of the buffer chamber 9 opposite thereto.
  • a fourth recess 72 may be disposed on the protective plate 7, as shown in FIG. 12, the fourth recess 72 is located on the upper surface of the protective plate 7, and The opposite plate-like body forms the third passage described above.
  • the third recessed portion 83 and the fourth recessed portion 72 may be simultaneously provided, and the two may be butted to form the third passage.
  • the third recess 83 includes a plurality of (three shown in the example of FIG. 9B), and one end of the plurality of grooves (the end near the center of the blocking member 8 in FIG. 9B) is concentrated at the air outlet.
  • the other ends of the plurality of grooves are in communication with the plurality of through holes 82 in a one-to-one correspondence.
  • the gas entering the space defined by the first concave portion 81 enters each of the grooves through the respective through holes 82, and then The grooves are gathered to a position corresponding to the air outlet 71, and finally enter the air outlet 71.
  • the recess is narrow, contaminants entering from the air outlet 71 cannot pass through the recess, so that the blocking effect on the contaminant can be further enhanced.
  • the fourth recess 72 includes a plurality of (three shown in the example of FIG. 12) recesses, one end of the plurality of recesses converges on the air outlet 71, and the other ends of the plurality of channels are in one-to-one correspondence with the plurality of passes
  • the holes 82 are in communication.
  • the gas entering the space defined by the first concave portion 81 enters each of the grooves through the respective through holes 82, and is condensed by the respective grooves and enters the air outlet 71.
  • a first groove and a second groove are respectively formed on the opposite surfaces of the cover plate 6 and the protective plate 7, and the two are butted to constitute the buffer chamber 9.
  • the plate-like body of the air intake member 8 substantially occupies the inner space of the entire buffer chamber 9, i.e., the overall shape of the plate-like body completely coincides with the shape of the buffer chamber 9 described above to ensure the blocking effect on the contaminants.
  • the cover 6 is usually required to be grounded.
  • a first attracting coil 24 is disposed between the blocking member 8 and the cover 6 (see FIG. 13).
  • a second attracting coil 10 is disposed between the cover plate 6 and the protective plate 7 to enhance the electrical conductivity between the protective plate 7 and the cover plate 6, thereby improving the grounding effect of the protective plate 7.
  • the buffer cavity 9 is located at the center of the cover plate 6, but the disclosure is not limited thereto. In practical applications, the buffer cavity 9 may also be located on the offset cover plate 6. Any position of the center position, and the positions of the air outlet end 612 and the air outlet port 71 of the intake passage 61 should correspond to the position of the buffer chamber 9.
  • the intake mechanism according to the embodiment of the present disclosure is substantially the same as the intake structure according to the above embodiment except that the buffer chamber 9 is plural.
  • the buffer chamber 9 is plural.
  • a plurality of buffer chambers 9 are respectively located at the edge position and the center position of the cover plate 6, and a plurality of buffer chambers 9 located at the edge positions of the cover plate 6 are symmetrically distributed along the circumferential direction of the cover plate 6.
  • the above-described blocking member 8 is disposed in each of the buffer chambers 9.
  • the number of the air outlet ends 612 of the intake passage 61 The amount corresponds to the number of the buffer chambers 9, and the outlet ends 612 of the respective intake passages 61 are in communication with the respective buffer chambers 9 in a one-to-one correspondence; as shown in FIG. 14, the number of the outlet ports 71 is plural, and the number and buffer are provided.
  • the number of the cavities 9 corresponds to each other, and the respective air outlets 71 are in communication with the respective buffer chambers 9 in one-to-one correspondence.
  • the plurality of buffer cavities 9 may also be located only at the edge positions of the cover plate 6 and symmetrically distributed along the circumferential direction of the cover plate 6.
  • the arrangement of the plurality of buffer chambers 9 may be freely set according to different needs, and the positions of the air outlet ends 612 and the air outlet ports 71 of the intake passage 61 correspond to the positions of the buffer chambers 9.
  • the air intake mechanism takes the intermediate passage 5 formed by the groove of the lower surface of the upper cover 1 in FIG. 3 and the upper surface of the protective plate 2 as
  • the buffer chamber is provided with a blocking member at a position corresponding to each air outlet 4 in the intermediate passage 5, and the blocking member may be the blocking member 8 shown in FIG. 7, such that the plate-shaped body and the upper cover 1 of the blocking member
  • a first passage is formed between the plate-shaped body and the side wall of the intermediate passage 5; a third passage is formed between the plate-shaped body and the protective plate 2.
  • the process gas enters the process chamber from the outlet end of the intake passage 3 through the intermediate passage 5, the first passage, the second passage, the third passage, and the outlet port 4 in sequence.
  • the blocking member 8 can also block the air outlet 4 to block the particles entering the buffer chamber from the air outlet 4 from reaching the upper cover 1 and preventing the upper cover 1 from being contaminated, thereby improving the service life of the device.
  • the embodiment does not need to specially process the groove on the upper cover plate and the protection plate as the buffer cavity for accommodating the blocking plate, which simplifies the processing process, reduces the processing cost, and is convenient for processing and production.
  • the blocking member 8 includes a plate-shaped body that substantially occupies the inner space of the entire intermediate passage 5, and the intermediate passage 5 limits the blocking member.
  • the upper surface of the plate-like body is similar to the structure of FIG. 9A, and a first passage is formed between the plate-shaped body and the upper cover 1, the first passage including a first recess disposed on the plate-like body .
  • the plate-shaped body has a plurality of second passages respectively corresponding to the plurality of outlet holes 4, wherein the second passages are through holes disposed along the thickness direction of the plate-shaped body, and each of the through holes is offset from the same Corresponding position of the air outlet 4.
  • the through hole is located outside the corresponding air outlet 4, that is, on the side close to the edge of the plate body.
  • the through hole may also be located in the pair.
  • the inner side of the air outlet 4, that is, the side close to the center of the plate body may also be located at a position shifted from the corresponding air outlet 4 by a certain angle in the circumferential direction, so that the process gas can flow into each air outlet through each through hole. 4 in.
  • the plate-shaped body and the protection plate 2 have a plurality of third passages respectively corresponding to the plurality of second passages, and the third passage includes a third recess disposed on the lower surface of the plate-shaped body.
  • the third recess is a recess, and for each of the recesses, one end is located at its corresponding air outlet 4, and the other end is in communication with its corresponding second passage.
  • the gas entering the space defined by the first concave portion enters each of the concave passages through the respective through holes, and then flows from the respective concave passages to the corresponding positions of the respective air outlets, and finally enters the respective air outlets 4.
  • the blocking member can also block the air outlet 4 to block the particles entering the buffer chamber from the air outlet 4 from reaching the upper cover 1 to prevent the upper cover 1 from being contaminated, thereby improving the service life of the device;
  • the cover plate and the protective plate process the groove as a buffer cavity for accommodating the blocking plate.
  • a blocking member is disposed in the buffer cavity, and the blocking member can block an air outlet in the protection plate to block particles entering the buffer cavity from the air outlet to reach the cover plate, thereby preventing the cover plate from being contaminated, thereby preventing the cover plate from being contaminated. Can increase the life of the device.
  • the embodiment of the present disclosure further provides a pre-cleaning chamber 201 including a cavity and an air intake mechanism 202 disposed on the top wall of the cavity.
  • the air intake mechanism 202 employs an air intake mechanism provided by the various embodiments of the present disclosure for conveying process gas into the pre-cleaning chamber 201.
  • a medium cylinder 203 is disposed in the side wall of the cavity of the pre-cleaning chamber 201, and a radio frequency coil 204 is disposed around the medium cylinder 203, which passes through the upper matching unit 207 and The RF power source 206 is electrically connected.
  • the upper RF power source 206 is used to load RF power to the RF coil 204.
  • the electromagnetic field generated by the RF coil 204 can be fed into the pre-cleaning chamber 201 through the dielectric cylinder 203 to excite the pre-cleaning chamber 201.
  • the process gas forms a plasma.
  • a pedestal 205 is further disposed in the pre-cleaning chamber 201, which is electrically connected to the lower RF power source 208 through the lower matching unit 209, and the lower RF power source 208 is used to apply a radio frequency negative bias to the susceptor 205 to attract the plasma. Etching the surface of the substrate.
  • the pre-cleaning chamber provided by the embodiment of the present disclosure can improve the service life of the device by adopting the above-described air intake mechanism provided by the above various embodiments of the present disclosure.
  • ordinal numbers such as “first,” “second,” “third,” and the like, as used in the ⁇ Desc/Clms Page number> Representing the order of one component and another component, or the order of the manufacturing method, the use of these ordinal numbers is only used to make a component with a certain name clearly distinguishable from another component with the same name.

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
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  • Filtering Of Dispersed Particles In Gases (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

一种进气机构（202）及预清洗腔室（201）。该进气机构包括盖板（6），在盖板内设置有进气通道（61）；保护板（7），在保护板中设置有出气口（71）；缓冲腔（9），固定于盖板和保护板之间，工艺气体依次通过进气通道、缓冲腔和出气口进入工艺腔；阻挡件（8），设置于缓冲腔内，与出气口位置对应，其在保护板的投影覆盖出气口。该预清洗腔室包括该进气机构。

Description

进气机构及预清洗腔室 技术领域
本公开涉及半导体设备领域，具体地，涉及一种进气机构及预清洗腔室。
背景技术
在物理气相沉积工艺设备中，特别是对于集成电路(IC)、硅穿孔(TSV)、封装(Packaging)制造工艺，需要一种预清洗(Preclean)工艺腔，进行预清洗工艺，以在沉积金属膜之前，清除晶圆表面的污染物，或者沟槽和穿孔底部的残余物。一般的预清洗工艺，是将工艺气体，如Ar(氩气)、He(氦气)等，激发为等离子体，利用等离子体的化学反应和物理轰击作用，对晶圆进行去杂质的处理。
目前，通常在反应腔室顶部设置上进气机构，用以向反应腔室内输送工艺气体。图1为现有的上进气机构的结构图。图2为图1中上进气机构的仰视图。图3为图1中上进气机构的局部剖视图。请一并参阅图1～图3，上进气机构包括上盖板1和设置在该上盖板1底部的保护板2，在上盖板1中设置有进气通道3，且在保护板2中设置有多个出气口4，多个出气口4位于保护板2的边缘，且沿保护板2的周向对称分布，如图2所示。而且，在所述上盖板1的下表面形成有凹槽，该凹槽与保护板2的上表面形成中间通道5，该中间通道5分别与进气通道3的出气端和各个出气口4相连通，工艺气体依次经由进气通道3、中间通道5和各个出气口4流入反应腔室中，该工艺气体的流动方向如图3中的箭头所示。
发明人在实现本发明的过程中发现，上述上进气机构在实际应用中至少存在以下问题。如图4所示，在反应腔室中的污染物能够由下而上穿过出气口4，并进入中间通道5中，附着在上盖板1的内壁上，从而对上盖板1造成了污染，由于很难对上盖板1进行清洗和更换，从而降低了设备的使用寿命。
发明内容
本公开旨在至少部分地解决现有技术中存在的技术问题，提出了一种进气机构及预清洗腔室，其可以至少部分地避免盖板被污染的问题，从而 可以提高设备的使用寿命。
根据本公开的一方面，提供了一种进气机构，包括：盖板，在所述盖板内设置有进气通道；保护板，在所述保护板中设置有出气口；缓冲腔，设置于所述盖板和所述保护板之间，所述进气通道、所述缓冲腔和所述出气口依次连通，还包括阻挡件，固定于所述缓冲腔内，位于与所述出气口相对的位置，所述阻挡件在所述保护板的投影覆盖所述出气口。
在本公开的一些实施例中，所述阻挡件包括：板状本体，其中，所述板状本体与所述盖板之间具有第一通道，所述第一通道与所述进气通道相连通。
在本公开的一些实施例中，所述第一通道包括：设置在所述板状本体上的第一凹部，和/或设置在所述盖板上的第二凹部；其中，所述第一凹部和所述第二凹部分别设置于所述板状本体与所述盖板相对的表面上。
在本公开的一些实施例中，所述板状本体中具有第二通道，或在所述板状本体与所述缓冲腔的侧壁之间具有第二通道，所述第一通道与所述第二通道相连通。
在本公开的一些实施例中，所述板状本体中具有第二通道；所述第二通道为沿所述板状本体厚度方向设置的通孔，且所述通孔偏离与所述出气口相对的位置。
在本公开的一些实施例中，所述板状本体与所述保护板之间具有第三通道，所述第二通道与所述第三通道相连通，且所述第三通道与所述出气口相连通。
在本公开的一些实施例中，所述第三通道包括：设置在所述板状本体上的第三凹部，和/或设置在所述保护板上的第四凹部；其中，所述第三凹部和所述第四凹部分别设置于所述板状本体与所述保护板相对的表面上。
在本公开的一些实施例中，所述出气口与所述板状本体的中心对应；所述通孔为多个，且多个所述通孔以所述板状本体的中心为圆心分布至少一圈。
在本公开的一些实施例中，所述第三凹部包括多条凹道；其中，多条所述凹道的一端汇聚在与所述出气口相对应的位置处；多条所述凹道的另一端一一对应地延伸至与多个所述通孔对应的位置处，并与其对应的所述通孔连通。
在本公开的一些实施例中，所述出气口为锥形通孔，所述锥形通孔的径向截面面积较大的一端朝向所述保护板外侧。
在本公开的一些实施例中，在所述盖板和所述保护板之间包括多个所述缓冲腔和多个所述出气口，多个所述缓冲腔与多个所述出气口一一对应设置，且在每个缓冲腔中均设置有所述阻挡件；所述盖板中设置的所述进气通道包括多个出气端，多个所述出气端与多个所述缓冲腔一一对应设置并连通。
在本公开的一些实施例中，在所述盖板和所述保护板之间包括一个所述缓冲腔和一个所述出气口，所述出气口位于所述保护板的中心位置。
在本公开的一些实施例中，在所述盖板和所述保护板之间包括一个所述缓冲腔和多个所述出气口，在所述缓冲腔中设置有多个所述阻挡件。
在本公开的一些实施例中，在所述盖板和所述保护板之间包括一个所述缓冲腔和多个所述出气口，在所述缓冲腔中设置有一个所述阻挡件。
根据本公开的另一方面，还提供了一种预清洗腔室，包括腔体和设置于腔体壁上的进气机构，其中，所述进气机构采用上述任一进气机构。
根据本公开的实施例，在缓冲腔内设置有阻挡件，该阻挡件能够遮挡保护板中的出气口，以阻挡自该出气口进入缓冲腔的颗粒物到达盖板，防止盖板被污染，从而可以提高设备的使用寿命。
附图说明
附图是用来提供对本公开的进一步理解，并且构成说明书的一部分，与下面的具体实施方式一起用于解释本公开，但并不构成对本公开的限制。 在附图中：
图1为现有的上进气机构的结构图；
图2为图1中上进气机构的仰视图；
图3为图1中上进气机构的局部剖视图；
图4为污染物进入中间通道的示意图；
图5为根据本公开实施例的进气机构的剖视图；
图6为根据本公开实施例的进气机构的仰视图；
图7为图5中I区域的放大图；
图8为根据本公开另一实施例的进气机构的剖视图；
图9A为根据本公开另一实施例的阻挡件的上部结构图；
图9B为根据本公开另一实施例的阻挡件的下部结构图；
图10为污染物的分布示意图；
图11为根据本公开另一实施例的盖板的结构图；
图12为根据本公开另一实施例的保护板的结构图；
图13为根据本公开又一实施例的进气机构的剖视图；
图14为根据本公开又一实施例的保护件的仰视图；
图15为根据本公开又一实施例的进气机构的剖视图；
图16为根据本公开又一实施例的进气机构的剖视图；
图17为根据本公开实施例的预清洗腔室的结构图。
具体实施方式
为使本公开的目的、技术方案和优点更加清楚明白，以下结合具体实施例，并参照附图，对本公开进一步详细说明。
下面将结合本公开实施例中的附图，对本公开实施例中的技术方案进行清楚、完整地描述，显然，所描述的实施例仅仅是本公开一部分实施例，而不是全部的实施例。基于本公开中的实施例，本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施例，都属于本公开保护的范围。
请一并参阅图5～图7，根据本公开实施例的进气机构位于工艺腔的顶部，且包括盖板6和设置在该盖板6底部的保护板7，二者通过多个螺钉 11固定连接，如图6所示，多个螺钉11沿盖板6的周向对称分布。并且，如图5所示，在盖板6中设置有进气通道61，该进气通道61的进气端611延伸至盖板6的底部边缘处，且与气源(图中未示出)连接；进气通道61的出气端612延伸至盖板6的中心位置处。在盖板6和保护板7之间设置有缓冲腔9。并且，在该保护板7中设置有出气口71，该出气口71同样位于盖板6的中心位置处。上述气源提供的工艺气体依次通过进气通道61、缓冲腔9和出气口71进入工艺腔。优选的，如图7所示，出气口71为锥形通孔，该锥形通孔的径向截面面积较大的一端朝向工艺腔设置，即，在图7所示的示例中朝下设置，以增大自出气口71喷出的气体的扩散范围，从而可以提高气体的分布均匀性。
而且，如图7所示，在上述缓冲腔9内与出气口71相对的位置设置有阻挡件8，阻挡件8在保护板7的投影覆盖出气口71，以阻挡自出气口71进入缓冲腔9的颗粒物到达盖板6，防止盖板6被污染，从而可以提高设备的使用寿命。上述阻挡件8的结构应满足在阻挡颗粒物到达盖板6的同时，使进入缓冲腔中的气体通过，并进入出气口71。
具体地，在本实施例中，阻挡件8包括板状本体，其中，该板状本体与盖板6之间具有第一通道，即，在板状本体的上表面与缓冲腔9的顶壁之间的水平间隙；在板状本体与缓冲腔9的侧壁之间具有第二通道，即，在板状本体的侧面与缓冲腔9的侧壁之间的环形间隙；板状本体与保护板7之间具有第三通道，即，板状本体的下表面与缓冲腔9的底壁之间的水平间隙。工艺气体依次通过进气通道61、上述第一通道、第二通道、第三通道和出气口71进入工艺腔。由此，上述阻挡件8的结构满足阻挡颗粒物到达盖板6的同时，使进入缓冲腔中的气体通过，并进入出气口71。
在图7中，阻挡件8应固定于缓冲腔9中，以防止其位置由于进气结构的移动而发生变化，与出气口71位置错开的情况出现。具体来说，阻挡件8可以通过支撑件固定于缓冲腔9的底壁、顶壁和/或侧壁，从而将其位置固定，并且支撑件的设置不影响第一通道、第二通道和第三通道的形成。
需要说明的是，在本实施例中，进气机构位于工艺腔的顶部，但是本公开并不局限于此，在实际应用中，进气机构还可以位于工艺腔的其他任 意位置，例如工艺腔的一侧。
请一并参阅图8～图10，根据本公开另一实施例的进气机构与根据上述实施例的进气结构基本上相同，除了阻挡件8的结构不同之外。以下，将主要描述这两个实施例之间的不同之处。
具体地，阻挡件8包括板状本体，该板状本体几乎占满整个缓冲腔9的内部空间，缓冲腔9将阻挡件8限位以使阻挡件固定，并且，板状本体与盖板6之间具有第一通道，如图9A所示，该第一通道包括设置在板状本体上的第一凹部81，该第一凹部81位于板状本体的上表面，且和与之相对的缓冲腔9的顶壁形成上述第一通道。在实际应用中，也可以不设置第一凹部81，而是在盖板6上设置第二凹部62，如图11所示，该第二凹部62位于盖板6的下表面，且和与之相对的板状本体形成上述第一通道。或者，还可以同时设置上述第一凹部81和第二凹部62，二者对接形成上述第一通道。
在本实施例中，在板状本体中具有第二通道，如图9A和图9B所示，该第二通道为沿板状本体厚度方向设置的通孔82，且通孔82偏离与出气口71相对的位置。在本实施例中，出气口71与板状本体的中心对应，并且通孔82为多个，且多个通孔82以板状本体的中心为圆心分布至少一圈，从而使工艺气体能够通过各个通孔82同时流入出气口71中。
在本实施例中，板状本体与保护板7之间具有第三通道，该第三通道包括设置在板状本体上的第三凹部83，该第三凹部83位于板状本体的下表面，且和与之相对的缓冲腔9的底壁形成上述第三通道。在实际应用中，也可以不设置第三凹部83，而是在保护板7上设置第四凹部72，如图12所示，该第四凹部72位于保护板7的上表面，且和与之相对的板状本体形成上述第三通道。或者，还可以同时设置上述第三凹部83和第四凹部72，二者对接形成上述第三通道。
优选的，上述第三凹部83包括多个(图9B的示例中示出了三个)凹道，多个凹道的一端(图9B中靠近阻挡件8的中心的一端)汇聚在与出气口71相对应的位置处，多个凹道的另一端(图9B中靠近阻挡件8的边缘的一端)一一对应地与多个通孔82相连通。这样，进入由上述第一凹部81限定的空间中的气体，通过各个通孔82分别进入各个凹道，再由各 个凹道汇聚至与出气口71相对应的位置处，最终进入出气口71中。如图10所示，由于凹道较窄，自出气口71进入的污染物无法穿过凹道，从而可以进一步增强对污染物的阻挡作用。
上述第四凹部72包括多个(图12的示例中示出了三个)凹道，多个凹道的一端汇聚于出气口71，多个凹道的另一端一一对应地与多个通孔82相连通。这样，进入由上述第一凹部81限定的空间中的气体，通过各个通孔82分别进入各个凹道，再由各个凹道汇聚并进入出气口71。
在本实施例中，在盖板6和保护板7相对的两个表面上分别形成有第一凹槽和第二凹槽，二者对接构成上述缓冲腔9。进气部件8的板状本体基本上占满整个缓冲腔9的内部空间，即，板状本体的整体形状与上述缓冲腔9的形状完全吻合，以保证对污染物的阻挡作用。当然，在实际应用中，也可以仅在盖板6的下表面(即，与保护板7相对的表面)上形成有凹槽，该凹槽与保护板7的上表面(即，与盖板6相对的表面)构成上述缓冲腔9。或者，还可以仅在保护板7的上表面上形成有凹槽，该凹槽与盖板6的下表面构成上述缓冲腔9。
优选的，为了避免出现打火现象，通常需要盖板6接地，在这种情况下，优选的，在阻挡件8与盖板6之间设置有第一诱电线圈24(参见图13)，以增强阻挡件8与盖板6之间的导电性，从而提高阻挡件8的接地效果。与之相类似的，在盖板6与保护板7之间设置有第二诱电线圈10，以增强保护板7与盖板6之间的导电性，从而提高保护板7的接地效果。
还需要说明的是，在本实施例中，上述缓冲腔9位于盖板6的中心位置处，但是本公开并不局限于此，在实际应用中，上述缓冲腔9也可以位于偏离盖板6的中心位置的任意位置，并且进气通道61的出气端612和出气口71的位置应与该缓冲腔9的位置相对应。
请一并参阅图13和图14，根据本公开实施例的进气机构与根据上述实施例的进气结构基本上相同，除了缓冲腔9为多个之外。以下，将主要描述这两个实施例之间的不同之处。
具体地，多个缓冲腔9分别位于盖板6的边缘位置和中心位置处，并且位于盖板6的边缘位置处的多个缓冲腔9沿盖板6的周向对称分布。每个缓冲腔9中设置有上述阻挡件8。并且，进气通道61的出气端612的数 量与上述缓冲腔9的数量相对应，且各个进气通道61的出气端612一一对应地与各个缓冲腔9相连通；如图14所示，出气口71为多个，其数量与缓冲腔9的数量相对应，且各个出气口71一一对应地与各个缓冲腔9相连通。
当然，在实际应用中，多个缓冲腔9也可以仅位于盖板6的边缘位置，且沿盖板6的周向对称分布。或者，也可以根据不同需要，自由设定多个缓冲腔9的排布方式，并且进气通道61的出气端612和出气口71的位置均与缓冲腔9的位置相对应。
在根据本公开又一实施例的进气机构中，请参见图15，该进气机构将图3中的上盖板1下表面的凹槽与保护板2的上表面形成的中间通道5作为缓冲腔，在上述中间通道5内与每个出气口4对应的位置均设置阻挡件，该阻挡件可以是图7所示的阻挡件8，这样，阻挡件的板状本体与上盖板1之间形成第一通道；在板状本体与中间通道5的侧壁之间形成第二通道；板状本体与保护板2之间形成第三通道。工艺气体由进气通道3的出气端依次经中间通道5、上述第一通道、第二通道、第三通道和出气口4进入工艺腔。该阻挡件8同样能够遮挡出气口4，以阻挡自出气口4进入缓冲腔的颗粒物到达上盖板1，防止上盖板1被污染，从而可以提高设备的使用寿命。
与上述实施例相比，该实施例无需专门在上盖板和保护板加工凹槽作为容置阻挡板的缓冲腔，简化了加工工艺，降低了加工成本，便于加工和生产。
在根据本公开又一实施例的进气机构中，请参见图16，阻挡件8包括板状本体，该板状本体基本上占满整个中间通道5的内部空间，中间通道5将阻挡件限位以使阻挡件固定，板状本体的上表面与图9A的结构类似，板状本体与上盖板1之间形成第一通道，该第一通道包括设置在板状本体上的第一凹部。
在本实施例中，板状本体中具有多个第二通道，分别与多个出口孔4一一对应，该第二通道为沿板状本体厚度方向设置的通孔，且每一通孔偏离其对应的出气口4的位置。在图16中，通孔位于其对应的出气口4的外侧，即靠近板状本体边缘的一侧，在本实施例中，通孔也可以位于其对 应的出气口4的内侧，即靠近板状本体中心的一侧，也可以位于与其对应的出气口4在周向错开一定角度的位置，从而使工艺气体能够通过各个通孔分别流入各个出气口4中。
在本实施例中，板状本体与保护板2之间具有多个第三通道，分别与多个第二通道一一对应，该第三通道包括设置在板状本体下表面的第三凹部。第三凹部为凹道，对于每一凹道，其一端位于其对应的出气口4的位置处，其另一端与其对应的第二通道相连通。这样，进入由上述第一凹部限定的空间中的气体，通过各个通孔分别进入各个凹道，再由各个凹道分别流至各个出气口相对应的位置处，最终进入各个出气口4中。
同样，该阻挡件也能够遮挡出气口4，以阻挡自出气口4进入缓冲腔的颗粒物到达上盖板1，防止上盖板1被污染，从而可以提高设备的使用寿命；并且无需专门在上盖板和保护板加工凹槽作为容置阻挡板的缓冲腔。
根据本公开的实施例，在缓冲腔内设置有阻挡件，该阻挡件能够遮挡保护板中的出气口，以阻挡自该出气口进入缓冲腔的颗粒物到达盖板，防止盖板被污染，从而可以提高设备的使用寿命。
如图17所示，本公开实施例还提供一种预清洗腔室201，该预清洗腔室201包括腔体和设置于腔体顶壁上的进气机构202。该进气机构202采用了本公开上述各个实施例提供的进气机构，用于向预清洗腔室201中输送工艺气体。
而且，在本实施例中，在上述预清洗腔室201的腔体侧壁中设置有介质筒203，且在该介质筒203的周围环绕设置有射频线圈204，其通过上匹配器207与上射频电源206电连接，上射频电源206用于向射频线圈204加载射频功率，由射频线圈204产生的电磁场能够通过介质筒203馈入至预清洗腔室201中，以激发预清洗腔室201中的工艺气体形成等离子体。并且，在预清洗腔室201中还设置有基座205，其通过下匹配器209和下射频电源208电连接，下射频电源208用于向基座205加载射频负偏压，以吸引等离子体刻蚀衬底表面。
本公开实施例提供的预清洗腔室，其通过采用本公开上述各个实施例提供的上述进气机构，可以提高设备的使用寿命。
以上描述了本公开的实施例。需要说明的，这些实施例仅用于理解本 公开，并不用于限制本公开的保护范围。并且，实施例中的特征，在无特别注明的情况下，在相同或不同实施例中出现的技术特征在不相互冲突的情况下可以组合使用。
还需要说明的是，实施例中提到的方向用语，例如“上”、“下”、“前”、“后”、“左”、“右”等，仅是参考附图的方向，并非用来限制本公开的保护范围。贯穿附图，相同的元素由相同或相近的附图标记来表示。在可能导致对本公开的理解造成混淆时，将省略常规结构或构造。并且图中各部件的形状和尺寸不反映真实大小和比例，而仅示意本公开实施例的内容。
再者，单词“包含”不排除存在未列在权利要求中的部件。位于部件之前的单词“一”或“一个”不排除存在多个这样的部件。
说明书与权利要求中所使用的序数例如“第一”、“第二”、“第三”等的用词，以修饰相应的部件，其本身并不意味着该部件有任何的序数，也不代表某一部件与另一部件的顺序、或是制造方法上的顺序，该些序数的使用仅用来使具有某命名的一部件得以和另一具有相同命名的部件能做出清楚区分。
类似地，应当理解，为了精简本公开并帮助理解各个公开方面中的一个或多个，在上面对本公开的示例性实施例的描述中，本公开的各个特征有时被一起分组到单个实施例、图、或者对其的描述中。然而，并不应将该公开解释成反映如下意图：即所要求保护的本公开要求比在每个权利要求中所明确记载的特征更多的特征。更确切地说，如下面的权利要求书所反映的那样，公开方面在于少于前面公开的单个实施例的所有特征。因此，遵循具体实施方式的权利要求书由此明确地并入该具体实施方式，其中每个权利要求本身都作为本公开的单独实施例。

Claims (15)

  1. 一种进气机构，包括：
    盖板，在所述盖板内设置有进气通道；
    保护板，在所述保护板中设置有出气口；
    缓冲腔，设置于所述盖板和所述保护板之间，所述进气通道、所述缓冲腔和所述出气口依次连通，其特征在于，
    还包括阻挡件，固定于所述缓冲腔内，位于与所述出气口相对的位置，所述阻挡件在所述保护板的投影覆盖所述出气口。
  2. 根据权利要求1所述的进气机构，其中，所述阻挡件包括：板状本体，其中，
    所述板状本体与所述盖板之间具有第一通道，所述第一通道与所述进气通道相连通。
  3. 根据权利要求2所述的进气机构，其中，所述第一通道包括：
    设置在所述板状本体上的第一凹部，和/或设置在所述盖板上的第二凹部；其中，
    所述第一凹部和所述第二凹部分别设置于所述板状本体与所述盖板相对的表面上。
  4. 根据权利要求2所述的进气机构，其中，所述板状本体中具有第二通道，或在所述板状本体与所述缓冲腔的侧壁之间具有第二通道，所述第一通道与所述第二通道相连通。
  5. 根据权利要求4所述的进气机构，其中，所述板状本体中具有第二通道；
    所述第二通道为沿所述板状本体厚度方向设置的通孔，且所述通孔偏离与所述出气口相对的位置。
  6. 根据权利要求4所述的进气机构，其中，所述板状本体与所述保护板之间具有第三通道，所述第二通道与所述第三通道相连通，且所述第三通道与所述出气口相连通。
  7. 根据权利要求6所述的进气机构，其中，所述第三通道包括：
    设置在所述板状本体上的第三凹部，和/或设置在所述保护板上的第四凹部；
    其中，所述第三凹部和所述第四凹部分别设置于所述板状本体与所述保护板相对的表面上。
  8. 根据权利要求7所述的进气机构，其中，
    所述出气口与所述板状本体的中心对应；
    所述通孔为多个，且多个所述通孔以所述板状本体的中心为圆心分布至少一圈。
  9. 根据权利要求8所述的进气机构，其中，所述第三凹部包括多条凹道；其中，
    多条所述凹道的一端汇聚在与所述出气口相对应的位置处；
    多条所述凹道的另一端一一对应地延伸至与多个所述通孔对应的位置处，并与其对应的所述通孔连通。
  10. 根据权利要求1所述的进气机构，其中，所述出气口为锥形通孔，所述锥形通孔的径向截面面积较大的一端朝向所述保护板外侧。
  11. 根据权利要求1-10任一项所述的进气机构，其中，在所述盖板和所述保护板之间包括多个所述缓冲腔和多个所述出气口，多个所述缓冲腔与多个所述出气口一一对应设置，且在每个缓冲腔中均设置有所述阻挡件；所述盖板中设置的所述进气通道包括多个出气端，多个所述出气端与多个所述缓冲腔一一对应设置并连通。
  12. 根据权利要求1-10任一项所述的进气机构，其中，在所述盖板和所述保护板之间包括一个所述缓冲腔和一个所述出气口，所述出气口位于所述保护板的中心位置。
  13. 根据权利要求1-10任一项所述的进气机构，其中，在所述盖板和所述保护板之间包括一个所述缓冲腔和多个所述出气口，在所述缓冲腔中设置有多个所述阻挡件。
  14. 根据权利要求1-10任一项所述的进气机构，其中，在所述盖板和所述保护板之间包括一个所述缓冲腔和多个所述出气口，在所述缓冲腔中设置有一个所述阻挡件。
  15. 一种预清洗腔室，包括腔体和设置于腔体壁上的进气机构，其中，所述进气机构采用权利要求1至14任一所述的进气机构。
PCT/CN2017/099889 2017-06-19 2017-08-31 进气机构及预清洗腔室 WO2018233039A1 (zh)

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