WO2018219434A1 - Appareil, dispositif à écran, système et procédé de sérigraphie sur un substrat servant à la fabrication d'une photopile - Google Patents

Appareil, dispositif à écran, système et procédé de sérigraphie sur un substrat servant à la fabrication d'une photopile Download PDF

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Publication number
WO2018219434A1
WO2018219434A1 PCT/EP2017/063022 EP2017063022W WO2018219434A1 WO 2018219434 A1 WO2018219434 A1 WO 2018219434A1 EP 2017063022 W EP2017063022 W EP 2017063022W WO 2018219434 A1 WO2018219434 A1 WO 2018219434A1
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WO
WIPO (PCT)
Prior art keywords
screen
substrate
line pattern
printing
devices
Prior art date
Application number
PCT/EP2017/063022
Other languages
English (en)
Inventor
Davide Colla
Marco Galiazzo
Giorgio Cellere
Original Assignee
Applied Materials Italia S.R.L.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Italia S.R.L. filed Critical Applied Materials Italia S.R.L.
Priority to PCT/EP2017/063022 priority Critical patent/WO2018219434A1/fr
Priority to CN201780091363.2A priority patent/CN110710001A/zh
Publication of WO2018219434A1 publication Critical patent/WO2018219434A1/fr

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41F—PRINTING MACHINES OR PRESSES
    • B41F15/00—Screen printers
    • B41F15/08—Machines
    • B41F15/0881—Machines for printing on polyhedral articles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41F—PRINTING MACHINES OR PRESSES
    • B41F15/00—Screen printers
    • B41F15/14—Details
    • B41F15/34—Screens, Frames; Holders therefor
    • B41F15/36—Screens, Frames; Holders therefor flat
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41P—INDEXING SCHEME RELATING TO PRINTING, LINING MACHINES, TYPEWRITERS, AND TO STAMPS
    • B41P2215/00—Screen printing machines
    • B41P2215/10—Screen printing machines characterised by their constructional features
    • B41P2215/11—Registering devices
    • B41P2215/112—Registering devices with means for displacing the frame
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41P—INDEXING SCHEME RELATING TO PRINTING, LINING MACHINES, TYPEWRITERS, AND TO STAMPS
    • B41P2215/00—Screen printing machines
    • B41P2215/50—Screen printing machines for particular purposes

Definitions

  • Embodiments of the present disclosure relate to an apparatus for screen printing on a substrate used in the manufacture of a solar cell, a screen device for screen printing on a substrate used in the manufacture of a solar cell, a system for screen printing on a substrate used in the manufacture of a solar cell, and a method for screen printing on a substrate used in the manufacture of a solar cell.
  • Embodiments of the present disclosure particularly relate to apparatuses, screen devices, systems, and methods for the printing of line patterns, such as fingers and/or busbars, of a solar cell.
  • Solar cells are photovoltaic (PV) devices that convert sunlight directly into electrical power.
  • PV photovoltaic
  • a substrate such as a crystalline silicon base
  • printing techniques such as screen printing
  • the line patterns can be subsequently printed in a plurality of printing processes, for example, using a plurality of printing stations and screen devices.
  • the line patterns printed during the printing processes should be aligned with respect to the substrate and/or with respect to each other in view of a quality of the manufactured solar cell.
  • the alignment of the line patterns with respect to each other can affect electrical characteristics, such as a conductivity of the line pattern and/or an output power of the manufactured solar cell.
  • the present disclosure aims at providing an apparatus, a screen device, a system, and a method that allows for an improved alignment of the printing tracks with respect to the substrate and/or each other.
  • an apparatus for screen printing on a substrate used in the manufacture of a solar cell includes a detection device configured to recognize, e.g. read, identification means on one or more screen devices to obtain information about one or more characteristics of the one or more screen devices, and a positioning device configured for positioning the one or more screen devices with respect to at least one of the substrate and a line pattern on the substrate based on the one or more characteristics obtained by the detection device.
  • an apparatus for screen printing on a substrate used in the manufacture of a solar cell includes a detection device configured to recognize, e.g. read, identification means on one or more screen devices to obtain information about one or more characteristics of the one or more screen devices, and a controller configured for selecting the one or more screen devices for a printing process based on the one or more characteristics obtained by the detection device.
  • a screen device for screen printing on a substrate used in the manufacture of a solar cell is provided.
  • the screen device includes one or more apertures defining a line pattern to be deposited over the substrate, and identification means, wherein the identification means are configured to provide access to one or more characteristics of the screen device.
  • a method for screen printing on a substrate used in the manufacture of a solar cell includes recognizing, e.g. reading, identification means on one or more screen devices to obtain information about one or more characteristics of the one or more screen devices, and at least one of selecting the one or more screen devices and aligning the one or more screen devices with respect to at least one of the substrate and a line pattern on the substrate based on the obtained information about the one or more characteristics.
  • Embodiments are also directed at apparatuses for carrying out the disclosed methods and include apparatus parts for performing each described method aspect. These method aspects may be performed by way of hardware components, a computer programmed by appropriate software, by any combination of the two or in any other manner. Furthermore, embodiments according to the disclosure are also directed at methods for operating the described apparatus. It includes method aspects for carrying out every function of the apparatus.
  • FIG. 1 shows a schematic view of an apparatus for screen printing on a substrate used in the manufacture of a solar cell according to embodiments described herein;
  • FIG. 2 shows a schematic view of a screen device for screen printing on a substrate used in the manufacture of a solar cell according to embodiments described herein;
  • FIGs. 3A-C show schematic views of an aperture of a screen device and a line according to embodiments described herein;
  • FIGs. 4A and B illustrate a pairing of screens according to embodiments described herein;
  • FIG. 5 shows a screen having a line pattern according to embodiments described herein;
  • FIG. 6 shows apertures and nodes of a screen according to embodiments described herein;
  • FIG. 7 illustrates a pairing of screens and a double printing process according to embodiments described herein;
  • FIG. 8 shows a schematic view of a system for screen printing on a substrate used in the manufacture of a solar cell according to embodiments described herein;
  • FIG. 9 shows a flowchart of a method for screen printing on a substrate used in the manufacture of a solar cell according to embodiments described herein.
  • the present disclosure uses one or more characteristics of one or more screen devices used for forming the line pattern(s) during a screen printing process for selecting and/or aligning the one or more screen devices.
  • the one or more characteristics can be related to the apertures of the screen device defining the line pattern and/or a wire mesh within the apertures.
  • two or more screen devices can be paired based on the one or more characteristics obtained for each of the two or more screen devices in order to ensure an optimal printing result, and particularly an optimal match between the line patterns printed on top of each other.
  • the screen device can be aligned with respect to the substrate and/or a line pattern previously printed on the substrate e.g. by applying an offset to the screen device based on the one or more characteristics in order to ensure an optimal printing result.
  • the proper selection and/or alignment of the one or more screen devices can improve the quality of the printed line pattern(s). In particular, interruptions of the line pattern(s) can be avoided. Further, electrical characteristics of the line pattern(s), such as conductivity, can be improved.
  • FIG. 1 shows a schematic view of an apparatus 100 for screen printing on a substrate 10 used in the manufacture of a solar cell according to embodiments described herein.
  • the apparatus 100 can be configured for multiple printing, such as double printing, e.g., fine line double printing (FLDP).
  • double printing e.g., fine line double printing (FLDP).
  • FLDP fine line double printing
  • the apparatus 100 includes a detection device 110 configured to recognize, e.g. read, identification means 220 on one or more screen devices 200 ("smart screens") to obtain information about one or more characteristics of the one or more screen devices, and a positioning device 120 configured for positioning the one or more screen devices 200 with respect to at least one of the substrate 10 and a line pattern on the substrate 10 based on the one or more characteristics obtained by the detection device 110.
  • the positioning device 120 which can be, or include, a controller, can be configured to select and position the one or more screen devices 200 based on the obtained information. Additionally or alternatively, the positioning device 120 can be configured to align the one or more screen devices 200 based on the obtained information.
  • the one or more characteristics can be selected from the group consisting of geometrical properties of the one or more screen devices 200, a categorization of the one or more screen devices 200, layout properties, and application properties of the one or more screen devices 200.
  • the geometrical properties can be related to the apertures of the respective screen device defining the line pattern and/or a wire mesh within the apertures.
  • the geometrical properties can be selected from the group consisting of the positions of the one or more apertures, the positions of nodes of the wire structure in the one or more apertures, the angle between the wires of the mesh and the aperture, and the position of the portion of the wire mesh of the screen in reference to a wire mesh raw supply.
  • the present disclosure is not limited thereto and the geometrical properties can be other geometrical properties that are suitable for the intended purpose, such as all the properties related to the geometry of the screen.
  • the categorization can include a screen class, such as a precision class and/or an offset/opening class, and a type of line pattern to be printed on a substrate.
  • the layout properties can include properties of (or data about) an aperture layout of the screen and/or a solar cell layout.
  • the application properties can include the properties of (data about) a printing material and/or an emulsion of the screen device.
  • Data on the printing material can include information on at least one of the following: (a) Identification of the printing paste with which the screen has been tested/qualified by the screen vendor; (b) identification of the printing paste by one or more of a paste vendor, model type, vendor code, customized code (as for instance agreed on by paste vendor, user and screen vendor), and the like.
  • the properties on the emulsion can include at least one of: (a) Emulsion type, (b) thickness of an over-mesh (that is the thickness of the emulsion which exceeds the thickness of the wires) on a squeegee side and on a wafer side, and (c) a tapering of the cross section of the aperture on the screen.
  • Tapering can be achieved by tweaking the emulsion process.
  • the manufacturer can determine different values of the opening at the squeegee side and at the wafer side. For instance the nominal opening for the finger (aperture) of a screen can be 35 ⁇ , the wafer side opening can be 38 ⁇ , and the squeegee side can be 32 ⁇ ,
  • the screen class and particularly the precision class, can be used for the matching of a solar cell layout for double printing.
  • the offset/opening class can be used for establishing a correlation between the one or more apertures and a position of the wire mesh, and particularly of nodes of the wire mesh.
  • a categorizing, matching and pairing of screens is illustrated in FIGs. 4 to 7.
  • the one or more characteristics can include data e.g. related to the manufacturing of the screen.
  • the one or more characteristics can include at least one of screen data, the screen class, and the layout properties.
  • the screen data may include data about a bi-dimensional geometry and/or data about a non- bi-dimensional geometry.
  • the non-bi- dimensional geometry elements can be selected from the group consisting of a composition of layers, a thickness of emulsion over the mesh (referred to as "EOM"), a wire calendering, and the like.
  • the screen data can include data about the one or more apertures (also referred to as "openings"), the printing material, the emulsion of the screen device, and the like.
  • the layout data may include a digital scan of the respective layout(s), such as a jpeg.
  • the layout data can include one or more among the following: (a) A vectorial drawing of the printed pattern (e.g. CAD file in DXF (DWG format), (b) a high precision image scan obtained by an automatic microscope system (like Vertex Micro- Vu; format JPG/BMP or other; the image can be at high resolution), and (c) a picture JPG/BMP at low resolution for immediate recognition of a pattern type.
  • the layout data can include some or all geometrical characteristics which can be represented by a bi-dimensional scanning.
  • the apparatus 100 can be configured to select the one or more screens devices 200 based on the one or more characteristics, such as the categorization.
  • the apparatus 100 can be configured to select two or more screens of the one or more screens devices 200 for a multiple printing process on the substrate 10 based on the one or more characteristics obtained by the detection device 110.
  • the apparatus 100 is configured to select two screen devices for a double printing process.
  • the two screen devices can be paired or combined based on the one or more characteristics in order to achieve an optimal printing result.
  • the selection can be done automatically by the system or the operators can manually scan the screens with a mobile device and the system can for instance instruct which screens to select to perform the double printing.
  • a plurality of screen devices can be provided, such as a first screen device, a second screen device, and a third screen device.
  • the first screen device can be used for printing of a first line pattern on the substrate 10 and the second screen device can be used for printing of a second line pattern on top of the first line pattern.
  • the first line pattern and the second line pattern may together form fingers and/or busbars of the solar cell.
  • the present disclosure is not limited thereto and the same screen device can be used for the printing of both the first line pattern and the second line pattern.
  • the apparatus 100 can be configured to select the one or more screen devices by determining a match between the plurality of screen devices based on the one or more characteristics obtained for each screen device of the plurality of screen devices. For instance, the first screen device may not match with the second screen device or the third screen device, and the second screen device may match with the third screen device.
  • the second screen device and the third screen device can be selected and paired and can for example be used in a double printing process.
  • An overlap of the first line pattern and the second line pattern can be provided without an enlargement, such as a finger enlargement, improving the quality of the printing process.
  • the apparatus 100 can be configured to align the one or more screen devices 200 based on the one or more characteristics, such as the geometrical properties and/or classification, of the one or more screen devices 200.
  • the positioning device 120 can be configured for aligning the one or more screen devices 200 with respect to at least one of the substrate 10 and a line pattern, such as the first line pattern, on the substrate 10 based on the one or more characteristics obtained by the detection device.
  • the positioning device 120 can be configured to align the one or more screen devices 200 for a double printing process to form e.g. fingers and/or busbars of the solar cell.
  • the one or more screen devices 200 can be aligned based on the one or more characteristics in order to achieve an optimal printing result.
  • the same screen device can be used for the double printing process, e.g., for the printing of two or more line patterns on top of each other.
  • the screen device can be aligned, e.g., offset, with respect to the first line pattern based on the one or more characteristics of the screen device in order to ensure an optimal printing result.
  • the database which may be a web-based database, can include the one or more characteristics of the one or more screen devices 200.
  • the database can be web based and accessible by remote connection. In this case the data can be downloaded by the system. In other implementations, the database can be local in the system.
  • the data may be updated using an upload e.g. from a USB device or another storage medium.
  • the one or more characteristics or data about the one or more characteristics can be downloaded by reading the identification means 220, such as the barcode, provided on the screen device.
  • the identification means 220 may be one of a barcode, an RFID device, and an identification code. The reading may be done through an RF interface, bar code laser scanning, optical inspection by vision system, and the like.
  • the apparatus 100 can for example match the screen devices for an optimal positioning of the second line pattern with respect to the first line pattern in a double printing process and/or can assign a score to the selected pairs of screen devices.
  • the score may be assigned in regards to the expected results of the screen matching on the device performances. If one matches a screen Axx with a screen Ayy the assigned score is the best one: 100%.
  • An example for the classification is illustrated in the table below. 2 B36
  • the match between A17 screen and B36 screen can have a score of about 90%.
  • the match between A17 screen and L23 screen can have a score of about 15%.
  • the different letters (A, B, ... L) determine the score of the match.
  • the system has limited influence to improve the results on the device performance.
  • the different numbers do not affect the score since the system can compensate with an offset.
  • the aforementioned classification is by way of example only. Other possibilities to add classifications based on screen properties can be used, such as an angle formed by the wires and the apertures.
  • the detection device 110 includes, or is, a reader, such as a barcode reader, configured to read the identification means 220 to obtain the information about the one or more characteristics.
  • the detection device 110 can be either on board of the system or a mobile device interfaced with the system. For example, an operator can use the mobile device to scan the screens.
  • the identification means 220 can be selected from the group consisting of a barcode, an RFID (radio frequency identification) chip, an identification code, and any combination thereof. The reading may be done through an RF interface, bar code laser scanning, optical inspection by vision system, and the like.
  • the detection device 110 can be another device configured to recognize the identification means 220.
  • the detection device 110 can include, or be, an optical device, such as a vision system.
  • a CCD camera can be used to spot a specific feature/code on the screen.
  • the identification means 220 include, e.g. stores, the information about the one or more characteristics, and particularly includes, e.g., stores, the one or more characteristics.
  • the apparatus 100 can retrieve the one or more characteristics directly from the identification means 220.
  • the RFID chip can include a storage medium configured for storing the one or more characteristics, such as the categorization and/or the geometrical properties of the screen.
  • the apparatus 100 includes a communication unit 130 configured for communication with the database, such as a server (e.g. illustrated in FIG. 4), to obtain the information about the one or more characteristics from the database.
  • the database includes, e.g. stores, the one or more characteristics.
  • the database can be a web-based database.
  • the communication between the communication unit 130 and the database can be performed via a network, such as the Internet.
  • the identification means 220 can include, e.g. store, information such as access information for accessing the database for retrieving the one or more characteristics. In other words, the apparatus 100 can retrieve the one or more characteristics from the database using the access information provided by the identification means 220.
  • the apparatus 100 can be configured for multiple printing, such as double printing, on the substrate 10.
  • the apparatus 100 can be configured for printing of fingers and/or busbars of the solar cell using the multiple printing process.
  • two or more layers can be printed on top of each other using two different screen devices or the same screen device to form the fingers and/or busbars.
  • a first layer of the two or more layers e.g. the first line pattern
  • the second layer of the two or more layers e.g., the second line pattern
  • a printing material used in the multiple printing may include, or be, silver.
  • the printing material can be selected from the group consisting of silver, aluminum, copper, tin, nickel, silicon based pastes, and any combination thereof.
  • the one or more screen devices 200 can be two or more screen devices including a first screen device and a second screen device.
  • the first screen device can have first identification means configured to provide access to one or more first characteristics with respect to one or more apertures of the first screen device.
  • the second screen device can have second identification means configured to provide access to one or more second characteristics with respect to one or more apertures of the second screen device.
  • the positioning device can be configured for at least one of selecting the first screen device and aligning the first screen device with respect to the substrate 10 based on the one or more first characteristics obtained by the detection device 110 for deposition of a first line pattern.
  • the positioning device 120 can be configured for at least one of selecting the second screen device and aligning the second screen device with respect to the first line pattern based on the one or more second characteristics obtained by the detection device 110 for deposition of a second line pattern over the first line pattern.
  • a width of the fingers formed by the first line pattern and the second line pattern superimposed on the first line pattern can be less than 100 micrometers, specifically less than 80 micrometers, and more specifically less than 60 micrometers.
  • a thickness of the fingers formed by the first line pattern and the second line pattern superimposed on the first line pattern can be more than 15 micrometers, specifically more than 20 micrometers, and more specifically more than 30 micrometers.
  • the indication of finger width and height can be considered qualitative.
  • a state-of-art finger width can be 45-50 ⁇ for single printing.
  • Double printing is slightly lower, such as about 40-45 ⁇ .
  • the finger height one can consider that for single printing the lower the width is, the lower the height is. It can be about 15-20 ⁇ for a single print at 45-50 ⁇ . Double printing can achieve the same or higher height with at a lower width.
  • the term “over” is used to define an order of printed patterns or layers, wherein the starting point is the substrate 10. This is irrespective of whether the substrate 10 or solar cell is depicted upside down or not.
  • the second line pattern is superimposed on (or congruent with) the first line pattern.
  • the second line pattern is not printed on the substrate 10 but is completely printed on top of the first line pattern.
  • the second line pattern is partially superimposed on the first line pattern.
  • the second line pattern can be offset with respect to the first line pattern.
  • the substrate 10 may include at least one of a conductive material, particularly with silicon or aluminum, a plate, a wafer, a foil, a semiconductor wafer, a solar cell wafer, a silicon solar cell waver, or a green-tape circuit board, which can particularly be used to form solar cells.
  • FIG. 2 shows a schematic view of a screen device 200 for screen printing on a substrate used in the manufacture of a solar cell according to embodiments described herein.
  • the screen device 200 includes one or more apertures 215 defining a line pattern, such as the first line pattern and/or the second line pattern, to be deposited over the substrate, and identification means 220, wherein the identification means 220 are configured to provide access to one or more characteristics of the screen device 200.
  • the one or more characteristics can be selected from the group consisting of geometrical properties of the one or more screen devices 200, a categorization of the one or more screen devices 200, layout properties, and application properties of the one or more screen devices 200.
  • the screen device 200 can include a frame 210 and a screen attached to the frame 210.
  • the identification means 220 can be provided at the frame 210.
  • the identification means 220 can be attached to, or embedded in, the frame 210.
  • the barcode can for instance be printed or stuck on the frame 210.
  • the RFID chip can be affixed to, or embedded in, the frame 210.
  • the screen may include at least one of a net, a printing mask, a sheet, a metal sheet, a plastic sheet, a plate, a metal plate, and a plastic plate.
  • the screen defines a pattern corresponding to a structure to be printed on the substrate, wherein the pattern may include the one or more apertures 215.
  • the pattern can correspond to the conductive line pattern to be printed on the substrate 10, such as fingers and/or busbars of the solar cell.
  • the screen device 200, and particularly the screen can have the one or more apertures defining the conductive line pattern and a wire mesh provided within the one or more apertures.
  • the material to be deposited on the substrate 10 can be provided as an essentially uniform layer on the screen e.g.
  • a floodbar By use of a floodbar.
  • the material does not flow through the one or more apertures 215 due to the presence of the wire mesh.
  • a squeegee can exert a force or pressure on the material and urges the material through the one or more apertures such that the material is transferred to (i.e., deposited on) the substrate 10.
  • FIGs. 3A-C show schematic views of an aperture 310 and a line 320, such as a finger or busbar, according to embodiments described herein.
  • a line 320 such as a finger or busbar
  • the screen device includes a wire structure, such as a net or mesh, within the one or more apertures.
  • the wire structure can be provided by a plurality of first wires 312 extending in a first direction and a plurality of second wires 314 extending in a second direction different from the first direction.
  • the wire structure can be a woven net or mesh of wires.
  • the plurality of first wires 312 and the plurality of second wires 314 can have a diameter in a range of 10 to 30 micrometers, and specifically in a range of 15 to 20 micrometers.
  • the plurality of first wires 312 and the plurality of second wires 314 can cross each other to define a plurality of openings 316 therebetween.
  • the openings 316 can have a size (e.g., a pitch of the mesh) in a range of 1 to 500 micrometers, specifically in a range of 10 to 150 micrometers, and more specifically in a range of 15 to 100 micrometers.
  • the size can be about 60 micrometers.
  • Other screens are possible, such as 380-14 (380 wires per inch having a diameter of 14 ⁇ ) and 440-13 (440 wires per inch having a diameter of 13 ⁇ ).
  • the first direction and the second direction can be substantially perpendicular to each other.
  • the term "substantially perpendicular" relates to a substantially perpendicular orientation e.g. of the first direction and the second direction, wherein a deviation of a few degrees, e.g.
  • the wires can be angled at 80°.
  • the first direction and/or the second direction can be inclined with respect to a lengthwise extension of the aperture 310 and/or a length direction of the line 320 defined by the aperture 310, such as a length direction of the finger or busbar.
  • the first direction and the second direction can be inclined with respect to the lengthwise extension of the aperture 310 by an angle in a range of about 20 degrees to about 60 degrees.
  • the first direction and the second direction can be inclined by about 22.5 degrees, about 30 degrees, or about 45 degrees.
  • the wire structure can include a plurality of nodes 318. The nodes can be defined by crossing wires of the wire structure, such as crossings between the plurality of first wires 312 and the plurality of second wires 314.
  • FIG. 3 A illustrates a mesh that is angled with respect to a length direction of the aperture
  • the wire structure can be substantially parallel to the apertures.
  • the irregularities of the height of the finger will not be caused by the wire nodes but by the wires.
  • a node position perpendicular to the length direction of the line 320 such as a finger direction, can change.
  • a connection line along the nodes and connecting the nodes can have a constant angle. The change in the node position can affect a shape of the printed line.
  • the one or more characteristics of the screen device can include geometrical characteristics or information about the node position in the aperture and/or information about the position of the aperture(s) on the screen. Irregularities caused by the nodes 318 can be smoothened or even eliminated by selecting a proper alignment of the screen device based on the one or more characteristics, such as the node positon in the aperture(s), for the printing of the second line pattern on top of the first line pattern.
  • FIG. 3B illustrates a top view of the line 320, such as a finger, formed using the aperture 310 of FIG. 3A.
  • FIG. 3C shows a cross-sectional side view, i.e., a profile, of the line 320 of FIG. 3B.
  • the line 320 can be an irregular shape caused by the structure of the screen device, and particularly the wire structure provided in the aperture 310 as illustrated in FIG. 3 A.
  • a line width such as a finger width
  • the line 320 can have a varying thickness.
  • the line width and/or the line thickness can vary approximately sinusoidal.
  • the line width can have maxima (a maximal width) and minima (a minimal width).
  • the line thickness can have maxima (peaks; a maximal height or thickness) and minima (valleys; a minimal height or thickness).
  • the maxima and minima can have a periodicity corresponding to a pitch between the nodes 318 of the wire structure, such as the wire mesh.
  • the present disclosure can smoothen the profile and/or the thickness of patterns printed on top of each other, such as a second line pattern printed on top of the first line pattern to form fingers and/or busbars of the solar cell.
  • the one or more screen devices are positioned with respect to at least one of the substrate and the first line pattern on the substrate based on the one or more characteristics, such as the node position, obtained by the detection device.
  • the screen device for the printing of the second line pattern can be selected and/or positioned such that the width variation and/order thickness variation is evened out.
  • a minimum of the second line pattern can be positioned on top of a maximum of the first line pattern, and a maximum of the second line pattern can be positioned on top of a minimum of the first line pattern.
  • the screen device for printing of the second line pattern can be the same screen device or another screen device used for the printing of the first line pattern.
  • the apparatus is configured to select and optionally align at least one screen device of the one or more screen devices based on the one or more characteristics, such as the geometrical properties and/or the categorization, of the at least one screen device.
  • the positioning device is configured for aligning the at least one screen device with respect to at least one of the substrate 10 and a line pattern, such as the first line pattern, on the substrate 10 based on the one or more characteristics obtained by the detection device.
  • the aligning can include applying an offset with respect to a line pattern, such as the first line pattern, on the substrate 10 based on the one or more characteristics obtained by the detection device.
  • the terms “offsetting” and “offset” can also be understood in the sense of "shifted” or "displaced”.
  • the offset can be selected based on at least one of the one or more characteristics of the screen device used for the printing of the first line pattern and the one or more characteristics of the screen device used for the printing of the second line pattern. Additionally or alternatively, the offset may be selected based on a periodicity of the width variation and/or the thickness variation of the first line pattern and/or the second line pattern. For example, the offset can correspond to the periodicity of the width variation and/or the thickness variation of the first line pattern. According to some embodiments, the periodicity of the first line pattern can be derived from the one or more characteristics of the screen device used for the printing of the first line pattern.
  • the periodicity of the first line pattern can be measured, for example, in-situ between a first printing process for printing the first line pattern and a second printing process for printing the second line pattern. The so determined periodicity can then be used to apply a predetermined offset for the second printing process.
  • the system can vary the offset incrementally and find the values which give the optimal device performances.
  • the system can apply an incremental offset to subsequent batches of consecutive cells, for instance 10 ⁇ offset for first batch of 500 cells, 20 ⁇ offset for second batch of 500 cells, and so on.
  • the batches of wafers can be tracked down the equipment till to a testing section where the electronic properties are measured.
  • the batch which has the optimal electronic results e.g. optimal device performances, such as a cell efficiency
  • the same screen device can be used for the printing of the first line pattern and the second line pattern.
  • the first line pattern can be printed on the substrate 10 in the first printing process using the screen device.
  • the substrate 10 and the screen device can be offset with respect to each other, and a second line pattern can be printed over the first line pattern in the second printing process using the screen device (i.e., the same screen device).
  • the present disclosure is not limited thereto and the alignment using the offset can be applied to multiple printing processes using different screen devices, such as the first screen device and second screen device, for the printing of line patterns on top of each other.
  • Interruptions in the printed line pattern can be reduced or even avoided by offsetting (shifting, displacing) the substrate 10 and the screen device with respect to each other after the first printing process and before the second printing process.
  • offsetting shifting, displacing
  • the substrate 10 and the screen device with respect to each other after the first printing process and before the second printing process.
  • an interruption can be present in the first line pattern printed in the first printing process.
  • the second line pattern may also have an interruption.
  • this interruption in the second line pattern will be offset with respect to the interruption in the first line pattern.
  • the second line pattern provides a bridge over the interruption in the first line pattern, and no interruption is present in the printed line pattern, e.g., in a finger of the solar cell. This can increase the efficiency of the manufactured solar cell.
  • offsetting the substrate 10 and the screen device with respect to each other between the printing processes can provide for a reduction of a number of cleaning processes for the screen device, since possible interruptions in the first line pattern can be cured (bridged) by the second line pattern, and vice versa.
  • a downtime for, e.g., maintenance of the apparatus for manufacture of the solar cells can be reduced and production yield can be increased.
  • the offset is provided in a direction substantially parallel to a first lengthwise extension of one or more lines of the first line pattern.
  • the one or more lines can be fingers of the solar cell.
  • the offset is substantially parallel to a lengthwise extension of the fingers of the solar cell.
  • the term "substantially parallel” relates to a substantially parallel orientation e.g. of the offset direction and the lengthwise extension of the fingers, wherein a deviation of a few degrees, e.g. up to 10° or even up to 15°, from an exact parallel orientation is still considered as “substantially parallel”.
  • the term "lengthwise extension” is to be understood as an extension of the lines of the first line pattern (and the second line pattern) in a direction of the length of the lines.
  • the length of the lines refers to the longer dimension of the lines, wherein the width of the lines refers to the shorter dimension of the lines.
  • the offset can be provided by a movement of the substrate 10 and the screen device with respect to each other in a plane substantially parallel to a surface of the substrate 10 on which the first line pattern and the second line pattern are to be printed.
  • the offset is provided by a linear movement of the substrate 10 and the screen device with respect to each other.
  • the linear movement can be substantially parallel or substantially perpendicular to the lengthwise extension of the one or more lines of the first line pattern.
  • the offset is provided by a linear movement of the substrate 10 and/or the screen device substantially parallel to the lengthwise extension of the fingers of the solar cell.
  • the offset is provided by a two-dimensional movement of the substrate 10 and the screen device with respect to each other.
  • the two- dimensional movement can be a movement in a plane substantially parallel to a surface of the substrate 10 on which the first line pattern and the second line pattern are to be printed.
  • the offset is provided by a two-dimensional movement of the substrate 10 and/or the screen device with movement components substantially parallel and perpendicular to the lengthwise extension of the one or more lines of the first line pattern.
  • the positioning device can include one or more actuators configured for moving the screen device e.g. to align the screen device and/or offset the screen device.
  • the one or more actuators can be selected from the group consisting of electric motors, electromagnetic motors, linear motors, stepper motors, pneumatic devices, piezoelectric devices, and any combination thereof.
  • the offset e.g., an amount of displacement
  • the offset e.g. in the lengthwise extension of the one or more lines of the first line pattern is in a range of 10 to 1000 micrometers, specifically in the range of 10 to 500 micrometers, and more specifically in the range of 100 to 200 micrometers.
  • the offset can be at least 10 micrometers, and specifically at least 50 micrometers.
  • offsetting the substrate 10 and the screen device with respect to each other includes a moving of the substrate 10 using, for example, a transport device, such as a shuttle.
  • the screen device can be stationary while the substrate 10 is moved.
  • the first printing process and the second printing process can be performed in the same printing station.
  • the printing station can have the screen device that is in a stationary position.
  • the substrate 10 can be moved to provide the offset using, for example, a moveable substrate support on which the substrate 10 is positioned.
  • offsetting the substrate 10 and the screen device with respect to each other includes a moving of the screen device.
  • the substrate 10 can be stationary while the screen device is moved using, for example, the one or more actuators.
  • the first printing process and the second printing process can be performed in the same printing station.
  • the printing station can have the screen device that is moveably provided therein.
  • the offset printing as described above can be used for fine line double printing (FLDP) e.g. in high-volume production (HVM).
  • FLDP fine line double printing
  • HVM high-volume production
  • the benefit of achieving a lower roughness can lead to an increase in cell efficiency and/or to a lower paste deposit compared to a baseline cell efficiency.
  • applying the offset can make use of the fact that the finger roughness is correlated to a pitch of the mesh nodes inside the apertures or openings. If the second print is shifted with a calculated offset along the finger direction, then the overall roughness or rugosity can be lower than the roughness or rugosity of each single print.
  • the offset printing can be beneficially used when the same screen device is used for the printing of the multiple line patterns.
  • the substrate 10 can be aligned with respect to the screen device prior to the printing of the first line pattern.
  • the alignment of the substrate 10 with respect to the screen device prior to the printing of the first line pattern can be performed based on the one or more characteristics of the screen device.
  • the geometrical characteristics related to the one or more apertures of the screen device can be obtained using the identification means.
  • An alignment with respect to the substrate 10 can be done based on the geometrical characteristics, such as a position of the one or more apertures at the screen device.
  • the alignment of the substrate 10 with respect to the screen device prior to the printing of the first line pattern can use, for example, a vision system including one or more cameras.
  • the method further includes an alignment of the substrate 10 with respect to the screen device prior to the printing of the second line pattern.
  • At least one of the alignment processes prior to the printing of the first line pattern and the second line pattern can use a camera that is configured to take a picture of the substrate 10.
  • a processing device can evaluate a position of the substrate 10 with respect to, for example, at least one of the substrate support, a printing device and the screen device.
  • the processing device can adjust a positon of at least one of the substrate 10, the substrate support, and the screen device so as to adjust the relative positon of the substrate 10 and the screen device.
  • FIGs. 4 A and B illustrate a pairing of screens according to embodiments described herein.
  • the screens can be paired for a double printing process.
  • reference numeral 410 indicates a nominal dimension of a print layout, such as fingers and/or busbars of a solar cell.
  • An actual dimension can be defined by, or correspond to, one or more apertures of the screen.
  • the actual dimension 412 which can be a regular square, is larger than the nominal dimension 410.
  • the actual dimension 414 is smaller than the nominal dimension 410.
  • (c) and (d) illustrate non-regular actual dimensions.
  • FIG. 4B illustrates a pairing of screens.
  • the screens having the actual dimension 412 that is larger than the nominal dimension 410 can be paired.
  • the screens having the actual dimension 416 of (c) can be paired and the screens having the actual dimension 418 of (d) can be paired.
  • the screens of (a) and (b) cannot be paired.
  • FIGs. 5 and 6 illustrate an exemplary categorization of screens.
  • FIG. 5 shows a screen 500 having a line pattern 510 according to embodiments described herein.
  • screens may be categorized according to geometry of the pattern as indicated in the following example:
  • FIG. 6 shows apertures 310 and nodes 318 of a screen according to embodiments described herein.
  • screens may be categorized according to the position of the wires as indicated in the following example:
  • the screen categorization may be defined as a combination of one letter and two numbers:
  • FIG. 7 illustrates a double printing process using the screens matched based on a categorization, such as a screen B36 and a screen A17 with an offset of 15 ⁇ .
  • a first print 710 and a second print 720 are formed on top of each other to form fingers of a solar cell.
  • FIG. 8 shows a schematic view of a system 800 for screen printing on a substrate used in the manufacture of a solar cell according to embodiments described herein.
  • the system 800 includes the apparatus and the screen device according to the present disclosure.
  • the apparatus can at least partially be included in a printing station 830 of the system 800.
  • the positioning device and optionally the detection device can be included in the printing station 830.
  • aspects of the apparatus can be provided at different locations within system 800.
  • the system 800 can further include a server 820 having the database with the one or more characteristics. Communication between the apparatus and the server 820 can be performed via a network 810, such as the Internet.
  • the system includes a plurality of process stations, such as the printing station 830, a drying station 840, and one or more further process stations 850 such as at least one of another printing station, an inspection station and another drying station.
  • the screen device is provided in the printing station 830.
  • the drying station 840 can be configured for drying the first line pattern and/or the second line pattern printed on the substrate in the printing station 830.
  • the drying station 840 can, for example, include an oven.
  • the one or more further process stations 850 can include another printing station configured for, e.g., the printing of the busbars on the substrate having the fingers printed thereon.
  • the inspection station can be configured for a quality control of the line patterns printed on the substrate.
  • the inspection system can include a vision system including one or more cameras.
  • a camera can take a picture of the substrate or portions of the substrate having the line patterns printed thereon.
  • a processing device can determine a position of the line patterns or portions of the line patterns with respect to, for example, features (e.g., an edge) of the substrate and/or each other.
  • the processing device can determine a quality of the printed line pattern and optionally determine whether the substrate is to be dumped or not.
  • the system 800 can include a transport arrangement configured for moving the substrate between at least some of the process stations.
  • the transport arrangement is configured for moving the substrate from the printing station 830 to the drying station 840 (indicated with arrow 1) for a drying of the first line pattern.
  • the transport arrangement can be configured for moving the substrate from the drying station 840 back towards the printing station 830 (indicated with arrow 2) for printing of the second line pattern.
  • the transport arrangement can further be configured for moving the substrate from the printing station 830 or the drying station 840 to the one or more further process stations 850 (indicated with arrow 3) for, e.g., at least one of a quality control, a further printing and/or a further drying process.
  • the substrate is positioned on a substrate support, such as a moveable substrate support ("shuttle").
  • the substrate support may include a nest or other support, on which the substrate can be placed for screen printing.
  • the printing device such as the squeegee may move along the printing direction with respect to the substrate support.
  • the transport arrangement can be configured for transportation of the moveable substrate support between at least some of the process stations.
  • FIG. 8 exemplarily one printing station is illustrated.
  • the same screen can be used in the printing station for printing of the first line pattern and the second line pattern on top of the first line pattern.
  • the present disclosure is not limited thereto and two or more printing stations each having a respective screen device can be provided.
  • a first printing station can include the first screen device for the printing of the first line pattern and the second printing station can include the second screen device for the printing of the second line pattern.
  • the first screen device and the second screen device can be paired based on the one or more characteristics obtained by the detection device.
  • a screen stock can be provided, wherein the first screen device and the second screen device are selected from the screen stock and moved to the first printing station and the second printing station, respectively.
  • FIG. 9 shows a flowchart of a method 900 for screen printing on a substrate used in the manufacture of a solar cell according to embodiments described herein.
  • the method 900 can utilize the apparatus and system according to the present disclosure.
  • the method 900 includes, in block 910, reading identification means on one or more screen devices to obtain information about one or more characteristics of the one or more screen devices, and, in block 920, selecting the one or more screen devices and/or aligning the one or more screen devices.
  • the one or more screen devices can be aligned with respect to the substrate and/or a line pattern on the substrate based on the information obtained about the one or more characteristics.
  • the method 900 can further include accessing a data base having the one or more characteristics based on identification information read from the identification means.
  • the one or more screen devices are two or more screen devices, such as a first screen device for the printing of a first line pattern and a second screen device for the printing of a second line pattern over the first line pattern.
  • the first line pattern and the second line pattern can together form 4 example fingers of a solar cell.
  • the two or more screen devices can be selected and combined based on the one or more characteristics to perform a multiple printing process on the substrate, such as a double printing process for forming fingers and/or busbars of the solar cell.
  • the present disclosure is not limited thereto and the same screen device can be used for performing the multiple printing process.
  • the aligning of at least one screen device of the one or more screen devices includes applying an offset to the at least one screen device of the one or more screen devices with respect to at least one of the substrate and the line pattern, such as the first line pattern, on the substrate.
  • the same screen device can be used for the printing of the first line pattern and the second line pattern.
  • Aligning the at least one screen device can include offsetting the at least one screen device with respect to the first line pattern. Irregularities caused by the wire mesh inside the apertures of the at least one screen device can be compensated.
  • the present disclosure uses one or more characteristics of one or more screen devices used for forming the line pattern(s) during a screen printing process for selecting and/or aligning the one or more screen devices.
  • the one or more characteristics can be related to the apertures of the screen device defining the line pattern and/or a wire mesh within the apertures.
  • two or more screen devices can be paired based on the one or more characteristics obtained for each of the two more screen devices in order to ensure an optimal printing result, and particularly an optimal match between the line patterns printed on top of each other.
  • the screen device can be aligned with respect to the substrate and/or a line pattern previously printed on the substrate e.g.
  • the proper selection and/or alignment of the one or more screen devices can improve the quality of the printed line pattern(s). In particular, interruptions of the line pattern(s) can be avoided. Further, electrical characteristics of the line pattern(s), such as the conductivity, can be improved.

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Electromagnetism (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Screen Printers (AREA)
  • Photovoltaic Devices (AREA)
  • Printing Methods (AREA)

Abstract

La présente invention concerne un appareil (100) de sérigraphie sur un substrat (10) servant à la fabrication d'une photopile. L'appareil (100) est pourvu d'un dispositif de détection (110) configuré pour lire des moyens d'identification (220) sur un ou plusieurs dispositifs à écran (200) afin d'obtenir des informations concernant au moins une caractéristique desdits dispositifs à écran (200), et d'un dispositif de positionnement (120) configuré pour positionner lesdits dispositifs à écran (200) par rapport au substrat (10) et/ou un motif de ligne sur le substrat (10) sur la base de ladite caractéristique obtenue par le dispositif de détection (110).
PCT/EP2017/063022 2017-05-30 2017-05-30 Appareil, dispositif à écran, système et procédé de sérigraphie sur un substrat servant à la fabrication d'une photopile WO2018219434A1 (fr)

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PCT/EP2017/063022 WO2018219434A1 (fr) 2017-05-30 2017-05-30 Appareil, dispositif à écran, système et procédé de sérigraphie sur un substrat servant à la fabrication d'une photopile
CN201780091363.2A CN110710001A (zh) 2017-05-30 2017-05-30 用于制造太阳能电池的基板上的丝网印刷的设备、丝网装置、系统和方法

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PCT/EP2017/063022 WO2018219434A1 (fr) 2017-05-30 2017-05-30 Appareil, dispositif à écran, système et procédé de sérigraphie sur un substrat servant à la fabrication d'une photopile

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CN115214225A (zh) * 2021-04-16 2022-10-21 洛阳兰迪玻璃机器股份有限公司 真空玻璃用封边浆料印刷方法及印刷线

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4893556A (en) * 1987-02-23 1990-01-16 Tdk Corporation Screen printer with double doctor/squeegee, printing pressure sensor and aligning mechanism
JP2006289792A (ja) * 2005-04-11 2006-10-26 Yamaha Motor Co Ltd 印刷装置および印刷方法
JP2007234705A (ja) * 2006-02-28 2007-09-13 Nec Saitama Ltd 両面クリームはんだ印刷機及び両面クリームはんだ印刷方法
JP2011255512A (ja) * 2010-06-04 2011-12-22 Panasonic Corp スクリーン印刷用マスク、並びに、スクリーン印刷装置及びスクリーン印刷方法
WO2013069506A1 (fr) * 2011-11-09 2013-05-16 富士機械製造株式会社 Machine d'impression
WO2014080010A1 (fr) * 2012-11-26 2014-05-30 Applied Materials Italia S.R.L. Appareil et procédé d'impression sur un substrat
US20150129641A1 (en) * 2013-11-14 2015-05-14 Panasonic Intellectual Property Management Co., Ltd. Screen printing machine, electronic component mounting system, and screen printing method
WO2016021043A1 (fr) * 2014-08-08 2016-02-11 富士機械製造株式会社 Appareil de sérigraphie

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IT1392992B1 (it) * 2009-02-23 2012-04-02 Applied Materials Inc Procedimento e apparecchiatura per la stampa serigrafica di uno schema a strato multiplo

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4893556A (en) * 1987-02-23 1990-01-16 Tdk Corporation Screen printer with double doctor/squeegee, printing pressure sensor and aligning mechanism
JP2006289792A (ja) * 2005-04-11 2006-10-26 Yamaha Motor Co Ltd 印刷装置および印刷方法
JP2007234705A (ja) * 2006-02-28 2007-09-13 Nec Saitama Ltd 両面クリームはんだ印刷機及び両面クリームはんだ印刷方法
JP2011255512A (ja) * 2010-06-04 2011-12-22 Panasonic Corp スクリーン印刷用マスク、並びに、スクリーン印刷装置及びスクリーン印刷方法
WO2013069506A1 (fr) * 2011-11-09 2013-05-16 富士機械製造株式会社 Machine d'impression
WO2014080010A1 (fr) * 2012-11-26 2014-05-30 Applied Materials Italia S.R.L. Appareil et procédé d'impression sur un substrat
US20150129641A1 (en) * 2013-11-14 2015-05-14 Panasonic Intellectual Property Management Co., Ltd. Screen printing machine, electronic component mounting system, and screen printing method
WO2016021043A1 (fr) * 2014-08-08 2016-02-11 富士機械製造株式会社 Appareil de sérigraphie

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