WO2018188129A1 - 彩色滤光层基板及其制造方法与应用的显示面板 - Google Patents

彩色滤光层基板及其制造方法与应用的显示面板 Download PDF

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Publication number
WO2018188129A1
WO2018188129A1 PCT/CN2017/082367 CN2017082367W WO2018188129A1 WO 2018188129 A1 WO2018188129 A1 WO 2018188129A1 CN 2017082367 W CN2017082367 W CN 2017082367W WO 2018188129 A1 WO2018188129 A1 WO 2018188129A1
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Prior art keywords
layer
color filter
light shielding
conductive layer
substrate
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PCT/CN2017/082367
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English (en)
French (fr)
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陈猷仁
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惠科股份有限公司
重庆惠科金渝光电科技有限公司
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Priority to US15/540,985 priority Critical patent/US10747048B2/en
Publication of WO2018188129A1 publication Critical patent/WO2018188129A1/zh

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1343—Electrodes
    • G02F1/13439—Electrodes characterised by their electrical, optical, physical properties; materials therefor; method of making
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136209—Light shielding layers, e.g. black matrix, incorporated in the active matrix substrate, e.g. structurally associated with the switching element
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136227—Through-hole connection of the pixel electrode to the active element through an insulation layer
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters

Definitions

  • the present invention relates to a color filter layer substrate, a display panel thereof, and a method and a method for manufacturing the same, and more particularly to a color filter layer substrate capable of reducing the resistance value of a transparent electrode layer and a method of manufacturing the same.
  • TFT-LCD Thin Film Transistor Liquid Crystal Display
  • the TFT-LCD is a backlight type liquid crystal display, which is composed of a liquid crystal display panel and a backlight module.
  • the liquid crystal display panel includes: a first substrate-thin film transistor (TFT) substrate, and a second substrate-color a filter layer (CF, Color Filter) substrate, and a liquid crystal (LC) sandwiched between the color filter layer substrate and the thin film transistor substrate.
  • TFT substrate-thin film transistor
  • CF filter layer
  • Color Filter Color Filter
  • LC liquid crystal sandwiched between the color filter layer substrate and the thin film transistor substrate.
  • the transparent electrode layer (ITO) of the color filter layer substrate has a large resistance value, so that the transparent electrode layer signal of the color filter layer substrate is unstable, and the transparent electrode layer signal is susceptible to the data line signal when the TFT-LCD is displayed.
  • the crosstalk such as the crosstalk of the scan line signal adversely affects the display quality of the TFT-LCD.
  • an object of the present invention is to provide a color filter layer substrate and a method of fabricating the same, and more particularly to a color filter layer substrate capable of reducing the resistance value of a transparent electrode layer and a method of manufacturing the same.
  • the resistance value of the transparent electrode layer can be lowered, and the stability of the voltage of the transparent electrode layer can be improved, thereby improving display quality.
  • a method for manufacturing a color filter layer substrate includes: providing a first substrate; disposing a conductive layer on the first substrate; and providing a light shielding layer on the conductive layer; The light shielding layer is exposed to expose a portion of the conductive layer, and a plurality of light shielding layers having concave portions having different thicknesses are formed on the conductive layer; the conductive layer and the light shielding layer are etched to make the conductive layer Covering the light shielding layer, and forming a plurality of via holes on the light shielding layer, the conductive layer and the light shielding layer defining a plurality of pixel display regions; and providing a color filter layer in the pixel display region And a transparent electrode layer is disposed on the light shielding layer and the color filter layer; wherein the transparent electrode layer covers the via hole and is in communication with the conductive layer.
  • the conductive layer is etched by a wet etching so that the etched conductive layer is covered in the light shielding layer.
  • the concave portion of the light shielding layer is etched by a dry etching to form the via hole, and the conductive layer is exposed.
  • the array is provided with a plurality of first photoresist, second photoresist, and third photoresist on the pixel display area, which is the color filter layer.
  • the array is disposed between the photoresists of the same color system.
  • the array is disposed between the photoresists of the dissimilar color systems.
  • the light shielding layer is a black matrix layer.
  • a color filter layer substrate comprising: a first substrate; a conductive layer disposed on the first substrate; a light shielding layer disposed on the conductive layer and covering the a conductive layer, wherein the light shielding layer has a plurality of via holes, the via holes exposing the conductive layer, the conductive layer and the light shielding layer define a plurality of pixel display regions; a color filter layer, a plurality of first, second, and third photoresists, the array is disposed on the pixel display area; a transparent electrode layer is disposed on the light shielding layer and the color filter layer; The transparent electrode layer covers the via and is in communication with the conductive layer.
  • the conductive layer is a metal layer.
  • the conductive layer is disposed adjacent to the color filter layer and surrounds the first photoresist, the second photoresist, and the third photoresist.
  • the plurality of via holes are of equal width configuration, partial equal width configuration, or unequal width configuration.
  • the via holes are between photoresists of the same color system.
  • the via holes are located between photoresists of different color systems.
  • the light shielding layer is a black matrix layer.
  • a further aspect of the present application is to provide a display panel including an active switch array substrate, and a color filter layer substrate, wherein the color filter layer substrate includes: a first substrate; a conductive layer disposed on On the first substrate, a light shielding layer is disposed on the conductive layer and covers the conductive layer, wherein the light shielding layer has a plurality of via holes, and the via holes expose the conductive layer.
  • the conductive layer and the light shielding layer define a plurality of pixel display regions; a color filter layer includes a plurality of first photoresist, second photoresist, and third photoresist, and the array is disposed on the pixel display region; a transparent electrode layer disposed on the light shielding layer and the color filter layer, wherein the transparent electrode layer covers the via hole, and the transparent electrode layer communicates with the conductive layer through the via hole And covering the color filter layer substrate.
  • the first photoresist is a red photoresist
  • the second photoresist is a green photoresist
  • the third photoresist is a blue photoresist
  • the plurality of via holes are of equal width configuration, partial equal width configuration, or unequal width configuration.
  • the transparent electrode layer is in communication with the conductive layer, so that the resistance value of the transparent electrode layer can be reduced, and the stability of the voltage of the transparent electrode layer can be improved, thereby improving display quality.
  • 1 to 4 are schematic views showing a method of fabricating a color filter layer substrate according to an embodiment of the present application.
  • FIG. 5 is a top plan view of a color filter layer substrate according to an embodiment of the present application.
  • FIG. 6 is a top plan view of a color filter layer substrate according to another embodiment of the present application.
  • FIG. 7 is a top plan view of a color filter layer substrate according to still another embodiment of the present application.
  • the word “comprising” is to be understood to include the component, but does not exclude any other component.
  • “on” means located above or below the target component, and does not mean that it must be on the top based on the direction of gravity.
  • the liquid crystal display panel of the present application may be a curved display panel.
  • FIG. 1 is a schematic diagram of a method for fabricating a color filter layer substrate according to an embodiment of the present invention. Referring to FIG. 1 to FIG. 4 simultaneously, a method for manufacturing a color filter layer substrate includes:
  • a first substrate 100 is provided.
  • a conductive layer 110 is disposed on the first substrate 100, and a light shielding layer 120 is disposed on the conductive layer 110 (as shown in FIG. 1).
  • the light-shielding layer 120 is patterned by a mask 200 to expose a portion of the conductive layer 110, and a plurality of light-shielding layers 120 having concave portions having different thicknesses are formed on the conductive layer 110.
  • the light shielding layer comprises at least a convex portion 121 of a first thickness and a concave portion 122 of a second thickness (as shown in FIG. 2).
  • the conductive layer 110 and the light shielding layer 120 are etched, the conductive layer 110 is covered in the light shielding layer 120, and a plurality of via holes 123 are formed on the light shielding layer 120, and the conductive layer 110 and The light shielding layer 120 defines a plurality of pixel display regions (as shown in Figures 3a and 3b).
  • a color filter layer is disposed on the pixel display area; a transparent electrode layer 140 is disposed on the light shielding layer 110 and the color filter layer; wherein the transparent electrode layer 140 covers the via hole 123, And in communication with the conductive layer 120 (which is shown in Figure 4).
  • the etching method includes a wet etching and a dry etching. Etching the conductive layer 110 by the wet etching, so that the etched conductive layer 110 is covered in the light shielding layer 120 (as shown in FIG. 3a); by the dry etching Etching the light shielding layer 120, and through the structural design of the convex portion 121 and the concave portion 122, forming the via hole 123 on the conductive layer 110, and exposing the conductive layer 110 (such as Figure 3b).
  • the array is provided with a plurality of first photoresist 131, a second photoresist 132, and a third photoresist (not shown) on the pixel display area, which is the color filter layer. .
  • the array is provided with the vias 123 between photoresists of the same color system.
  • the array is provided with the vias 123 between photoresists of different color systems.
  • the light shielding layer 120 may be, for example, a black matrix layer.
  • the reticle 200 can be, for example, a halftone reticle having at least one light transmissive region 210, a light shielding region 220, and a half light transmitting region 230.
  • a plurality of light shielding layers 120 having concave portions having different thicknesses are formed on the conductive layer 110 to facilitate the subsequent panel process.
  • a color filter layer substrate 10 includes: a first substrate 100; a conductive layer 110 disposed at the On the first substrate 100, a light shielding layer 120 is disposed on the conductive layer 110 and covers the conductive layer 120.
  • the light shielding layer 120 has a plurality of via holes 123, and the via holes 123 are exposed.
  • the conductive layer 110, the conductive layer 110 and the light shielding layer 120 define a plurality of pixel display regions; and a color filter layer includes a plurality of first photoresists 131, second photoresists 132 and third photoresists 133, an array is disposed on the pixel display area; a transparent electrode layer 140 is disposed on the light shielding layer 120 and the color filter layer; wherein the transparent electrode layer 140 covers the via hole 123, and It is in communication with the conductive layer 110.
  • the conductive layer 110 may be, for example, a metal layer having a low resistivity.
  • the light shielding layer 120 may be, for example, a black matrix layer.
  • the conductive layer 110 is disposed adjacent to the color filter layer and surrounds the first photoresist 131, the second photoresist 132, and the third photoresist 133. .
  • the first photoresist 131 may be, for example, a red photoresist
  • the second photoresist 132 may be, for example, a green photoresist
  • the third photoresist 133 may be, for example, a blue photoresist.
  • the plurality of vias 123 are of equal width configuration, partial equal width configuration, or unequal width configuration.
  • the vias 123 are located between photoresists of different color systems. Specifically, the via 123 is located between the first photoresist 131 and the second photoresist 132; the via 123 is located between the second photoresist 132 and the third photoresist 133 The via 123 is located between the third photoresist 133 and the first photoresist 131.
  • a color filter layer substrate 20 includes: a first substrate 100; a conductive layer 110 disposed on On the first substrate 100, a light shielding layer 120 is disposed on the conductive layer 110 and covers the conductive layer 120.
  • the light shielding layer 120 has a plurality of via holes 123, and the via holes 123 are exposed.
  • the conductive layer 110 is defined, the conductive layer 110 and the light shielding layer 120 define a plurality of pixel display regions; and a color filter layer includes a plurality of first photoresist 131, second photoresist 132 and third light a transparent electrode layer 140 is disposed on the light-shielding layer 120 and the color filter layer; wherein the transparent electrode layer 140 covers the via hole 123, And communicating with the conductive layer 110.
  • the conductive layer 110 may be, for example, a metal layer having a low resistivity.
  • the light shielding layer 120 may be, for example, a black matrix layer.
  • the conductive layer 110 is disposed adjacent to the color filter layer and surrounds the first photoresist 131, the second photoresist 132, and the third photoresist 133. .
  • the first photoresist 131 may be, for example, a red photoresist
  • the second photoresist 132 may be, for example, a green photoresist
  • the third photoresist 133 may be, for example, a blue photoresist.
  • the plurality of vias 123 are of equal width configuration, partial equal width configuration, or unequal width configuration.
  • the vias 123 are located between photoresists of the same color system. Specifically, the via 123 is located between the adjacent first photoresists 131; the vias 123 are located between the adjacent second photoresists 132; the vias 123 are adjacent to each other Between the third photoresists 133.
  • a color filter layer substrate 30 includes: a first substrate 100; a conductive layer 110 disposed on On the first substrate 100, a light shielding layer 120 is disposed on the conductive layer 110 and covers the conductive layer 120.
  • the light shielding layer 120 has a plurality of via holes 123, and the via holes 123 are exposed.
  • the conductive layer 110 is defined, the conductive layer 110 and the light shielding layer 120 define a plurality of pixel display regions; and a color filter layer includes a plurality of first photoresist 131, second photoresist 132 and third light a resistor 133, the array is disposed on the pixel display area; A transparent electrode layer 140 is disposed on the light shielding layer 120 and the color filter layer; wherein the transparent electrode layer 140 covers the via hole 123 and is in communication with the conductive layer 110.
  • the conductive layer 110 may be, for example, a metal layer having a low resistivity.
  • the light shielding layer 120 may be, for example, a black matrix layer.
  • the conductive layer 110 is disposed adjacent to the color filter layer and surrounds the first photoresist 131, the second photoresist 132, and the third photoresist 133. .
  • the first photoresist 131 may be, for example, a red photoresist
  • the second photoresist 132 may be, for example, a green photoresist
  • the third photoresist 133 may be, for example, a blue photoresist.
  • the plurality of vias 123 are of equal width configuration, partial equal width configuration, or unequal width configuration.
  • the vias 123 are located at the intersection of adjacent photoresists. Specifically, the via hole 123 is located at the intersection of the plurality of pixel display regions, that is, at the intersection of the differently facing light shielding layers 120.
  • the via design can also be applied to a color filter layer substrate of a four-color photoresist layer, and the four-color photoresist layer includes: a first photoresist and a second photoresist. The third photoresist and the fourth photoresist.
  • the first photoresist may be, for example, a red photoresist
  • the second photoresist may be, for example, a green photoresist
  • the third photoresist may be, for example, a blue photoresist
  • the fourth photoresist may be, for example, White photoresist, which can be changed to a hybrid light-emitting photoresist of red sub-resist, green sub-resistance and blue sub-resistance according to the needs of the designer, or replace the white photoresist by other materials.
  • the corresponding executable structures are exemplified herein, and are not intended to be limiting.
  • a display panel includes an active switch array substrate and a color filter layer substrate, wherein the color filter layer substrate includes: a first substrate 100; a conductive layer The first substrate 100 is disposed on the first substrate 100.
  • the light shielding layer 120 is disposed on the conductive layer 110 and covers the conductive layer 120.
  • the light shielding layer 120 has a plurality of via holes 123. The via 123 exposes the conductive layer 110.
  • the conductive layer 110 and the light shielding layer 120 define a plurality of pixel display regions.
  • a color filter layer includes a plurality of first photoresists 131 and second photoresists 132.
  • the third photoresist 133 is disposed on the pixel display area; a transparent electrode layer 140 is disposed on the light shielding layer 120 and the color filter layer; wherein the transparent electrode layer 140 covers the The via 123 is in communication with the conductive layer 110.
  • the conductive layer 110 may be, for example, a metal layer having a low resistivity.
  • the light shielding layer 120 may be, for example, a black matrix layer.
  • the conductive layer 110 is disposed adjacent to the color filter layer and surrounds the first photoresist 131, the second photoresist 132, and the third photoresist 133. .
  • the first photoresist 131 may be, for example, a red photoresist
  • the second photoresist 132 may be, for example, a green photoresist
  • the third photoresist 133 may be, for example, a blue photoresist.
  • the plurality of vias 123 may be in an equal width configuration, a partial equal width configuration, or a unequal width configuration.
  • the transparent electrode layer 140 is in communication with the conductive layer 110 through the via 123 and covers the color filter layer substrate.
  • the present invention is connected to the conductive layer through the transparent electrode layer, and can be equivalent to the parallel connection of the resistors in principle, can reduce the resistance value of the transparent electrode layer, improve the stability of the voltage of the transparent electrode layer, and thereby improve the display quality.

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Optics & Photonics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Mathematical Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Optical Filters (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Liquid Crystal (AREA)

Abstract

一种彩色滤光层基板及其制造方法与应用的显示面板，制造方法包括：提供一第一基板（100）；设置一导电层（110）于第一基板（100）上；设置一遮光层（120）于导电层（110）上；图案化遮光层（120），使其暴露出部分导电层（110），并形成多个具有不同厚度的内凹部分的遮光层（120）于导电层（110）上；刻蚀导电层（110）和遮光层（120），使导电层（110）涵盖于遮光层（120）内，并于遮光层（120）上形成多个过孔（123），导电层（110）和遮光层（120）定义出多个像素显示区；设置一彩色滤光层于像素显示区上；设置一透明电极层（140）于遮光层（120）和彩色滤光层上；其中，透明电极层（140）覆盖过孔（123），并与导电层（110）相联通。

Description

彩色滤光层基板及其制造方法与应用的显示面板 技术领域
本申请涉及一种彩色滤光层基板及其制造方法与应用的显示面板，特别是涉及一种可降低透明电极层电阻值的彩色滤光层基板及其制造方法。
背景技术
随着科技进步，具有省电、无幅射、体积小、低耗电量、平面直角、高分辨率、画质稳定等多项优势的液晶显示器，尤其是现今各式信息产品如：手机、笔记本电脑、数字相机、PDA、液晶屏幕等产品越来越普及，亦使得液晶显示器(LCD)的需求量大大提升。因此如何满足日益要求高分辨率的像素设计，且具有高画质、空间利用效率佳、低消耗功率、无辐射等优越特性的薄膜晶体管液晶显示器(Thin Film Transistor Liquid Crystal Display，TFT-LCD)已逐渐成为市场的主流。其中，薄膜晶体管基板为组立液晶显示器的重要构件之一。
TFT-LCD为背光型液晶显示器，其是由液晶显示面板及背光模块(Backlight Module)所组成，液晶显示面板包括：第一基板-薄膜晶体管(TFT，Thin Film Transistor)基板、第二基板-彩色滤光层(CF，Color Filter)基板、夹于彩色滤光层基板与薄膜晶体管基板之间的液晶(LC，Liquid Crystal)。其中，彩色滤光层基板的透明电极层(ITO)的电阻值较大，使得彩色滤光层基板的透明电极层信号不稳定，在TFT-LCD显示时，透明电极层信号易受到数据线信号和扫描线信号的串扰等不良影响，从而影响TFT-LCD的显示品质。
发明内容
为了解决上述技术问题，本申请的目的在于，提供一种彩色滤光层基板及其制造方法，特别是涉及一种可降低透明电极层电阻值的彩色滤光层基板及其制造方法。可以降低透明电极层的电阻值，提高透明电极层电压的稳定性，从而提高显示品质。
本申请的目的及解决其技术问题是采用以下技术方案来实现的。依据本申请提出的一种彩色滤光层基板的制造方法，包括：提供一第一基板；设置一导电层于所述第一基板上；设置一遮光层于所述导电层上；图案化所述遮光层，使其暴露出部分导电层，并形成多个具有不同厚度的内凹部分的遮光层于所述导电层上；刻蚀所述导电层和所述遮光层，使所述导电层涵盖于所述遮光层内，并于所述遮光层上形成多个过孔，所述导电层和所述遮光层定义出多个像素显示区；设置一彩色滤光层于所述像素显示区上；设置一透明电极层于所述遮光层和所述彩色滤光层上；其中，所述透明电极层覆盖所述过孔，并与所述导电层相联通。
在本申请的一实施例中，通过一湿法刻蚀，刻蚀所述导电层，使刻蚀后的所述导电层涵盖于所述遮光层内。
在本申请的一实施例中，通过一干法刻蚀，刻蚀所述遮光层的内凹部分，形成所述过孔，并暴露出所述导电层。
在本申请的一实施例中，阵列设置多个第一光阻、第二光阻及第三光阻于所述像素显示区上，其为所述彩色滤光层。
在本申请的一实施例中，阵列设置所述过孔于相同色系的光阻之间。
在本申请的一实施例中，阵列设置所述过孔于相异色系的光阻之间。
在本申请的一实施例中，所述遮光层为一黑色矩阵层。
本申请的另一目的为一种彩色滤光层基板，包括：一第一基板；一导电层，设置于所述第一基板上；一遮光层，设置于所述导电层上，并涵盖所述导电层，其中所述遮光层上具有多个过孔，所述过孔暴露出所述导电层，所述导电层和所述遮光层定义出多个像素显示区；一彩色滤光层，包括多个第一光阻、第二光阻及第三光阻，阵列设置于所述像素显示区上；一透明电极层，设置于所述遮光层和所述彩色滤光层上；其中，所述透明电极层覆盖所述过孔，并与所述导电层相联通。
在本申请的一实施例中，所述导电层为一金属层。
在本申请的一实施例中，所述导电层与所述彩色滤光层相邻配置，并包围所述第一光阻、所述第二光阻及所述第三光阻。
在本申请的一实施例中，所述多个过孔为等宽配置、局部等宽配置或不等宽配置。
在本申请的一实施例中，所述过孔位于相同色系的光阻之间。
在本申请的一实施例中，所述过孔位于相异色系的光阻之间。
在本申请的一实施例中，所述遮光层为一黑色矩阵层。
本申请的又一目的为提供一种显示面板，包括一主动开关阵列基板，以及一彩色滤光层基板，其中所述彩色滤光层基板，包括：一第一基板；一导电层，设置于所述第一基板上；一遮光层，设置于所述导电层上，并涵盖所述导电层，其中所述遮光层上具有多个过孔，所述过孔暴露出所述导电层，所述导电层和所述遮光层定义出多个像素显示区；一彩色滤光层，包括多个第一光阻、第二光阻及第三光阻，阵列设置于所述像素显示区上；一透明电极层，设置于所述遮光层和所述彩色滤光层上，其中所述透明电极层覆盖所述过孔，所述透明电极层通过所述过孔，与所述导电层相联通，并涵盖所述彩色滤光层基板。
在本申请的一实施例中，所述第一光阻为红色光阻，所述第二光阻为绿色光阻，所述第三光阻为蓝色光阻。
在本申请的一实施例中，所述多个过孔为等宽配置、局部等宽配置或不等宽配置。
有益效果
本申请通过透明电极层与导电层相联通，可以降低透明电极层的电阻值，提高透明电极层电压的稳定性，从而提高显示品质。
附图说明
图1至图4为本申请一实施例的彩色滤光层基板制造方法的示意图。
图5为本申请一实施例的彩色滤光层基板的俯视图。
图6为本申请另一实施例的彩色滤光层基板的俯视图。
图7为本申请又一实施例的彩色滤光层基板的俯视图。
本发明的实施方式
以下各实施例的说明是参考附加的图式，用以例示本申请可用以实施的特定实施例。本申请所提到的方向用语，例如「上」、「下」、「前」、「后」、「左」、「右」、「内」、「外」、「侧面」等，仅是参考附加图式的方向。因此，使用的方向用语是用以说明及理解本申请，而非用以限制本申请。
附图和说明被认为在本质上是示出性的，而不是限制性的。在图中，结构相似的单元是以相同标号表示。另外，为了理解和便于描述，附图中示出的每个组件的尺寸和厚度是任意示出的，但是本申请不限于此。
在附图中，为了清晰起见，夸大了层、膜、面板、区域等的厚度。在附图中，为了理解和便于描述，夸大了一些层和区域的厚度。将理解的是，当例如层、膜、区域或基底的组件被称作“在”另一组件“上”时，所述组件可以直接在所述另一组件上，或者也可以存在中间组件。
另外，在说明书中，除非明确地描述为相反的，否则词语“包括”将被理解为意指包括所述组件，但是不排除任何其它组件。此外，在说明书中，“在......上”意指位于目标组件上方或者下方，而不意指必须位于基于重力方向的顶部上。
为更进一步阐述本申请为达成预定申请目的所采取的技术手段及功效，以下结合附图及较佳实施例，对依据本申请提出的一种彩色滤光层基板及其制造方法与应用的显示面板，其具体实施方式、结构、特征及其功效，详细说明如后。
在一实施例中，本申请的液晶显示面板可为曲面型显示面板。
图1至图4为为本申请一实施例的彩色滤光层基板制造方法的示意图，请同时参考图1至图4，一种彩色滤光层基板的制造方法，包括：
提供一第一基板100；设置一导电层110于所述第一基板100上，设置一遮光层120于所述导电层110上(其如图1所示)。
通过一光罩200，进行曝光显影等工序，图案化所述遮光层120，使其暴露出部分导电层110，并形成多个具有不同厚度的内凹部分的遮光层120于所述导电层110上，其中，所述遮光层至少包括一第一厚度的凸起部分121，以及一第二厚度的内凹部分122(其如图2所示)。
刻蚀所述导电层110和所述遮光层120，使所述导电层110涵盖于所述遮光层120内，并于所述遮光层120上形成多个过孔123，所述导电层110和所述遮光层120定义出多个像素显示区(其如图3a和图3b所示)。
设置一彩色滤光层于所述像素显示区上；设置一透明电极层140于所述遮光层110和所述彩色滤光层上；其中，所述透明电极层140覆盖所述过孔123，并与所述导电层120相联通(其如图4所示)。
在本申请的一实施例中，所述刻蚀方法，包括一湿法刻蚀和一干法刻蚀。通过所述湿法刻蚀，刻蚀所述导电层110，使刻蚀后的所述导电层110涵盖于所述遮光层120内(其如图3a所示)；通过所述干法刻蚀，刻蚀所述遮光层120，并通过其凸起部分121和内凹部分122的结构设计，在所述导电层110上形成所述过孔123，并暴露出所述导电层110(其如图3b所示)。
在本申请的一实施例中，阵列设置多个第一光阻131、第二光阻132及第三光阻(图未示)于所述像素显示区上，其为所述彩色滤光层。
在本申请的一实施例中，阵列设置所述过孔123于相同色系的光阻之间。
在本申请的一实施例中，阵列设置所述过孔123于相异色系的光阻之间。
在本申请的一实施例中，所述遮光层120可例如为一黑色矩阵层。
在本申请的一实施例中，所述光罩200可例如为半色调光罩，其具有至少一透光区210，一遮光区220及一半透光区230。通过所述光罩200，形成多个具有不同厚度的内凹部分的遮光层120于所述导电层110，以方便后续面板制程的进行。
图5为本申请一实施例的彩色滤光层基板的俯视图，请参考图4和图5，一种彩色滤光层基板10，包括：一第一基板100；一导电层110，设置于所述第一基板100上；一遮光层120，设置于所述导电层110上，并涵盖所述导电层120，其中所述遮光层120上具有多个过孔123，所述过孔123暴露出所述导电层110，所述导电层110和所述遮光层120定义出多个像素显示区；一彩色滤光层，包括多个第一光阻131、第二光阻132及第三光阻133，阵列设置于所述像素显示区上；一透明电极层140，设置于所述遮光层120和所述彩色滤光层上；其中，所述透明电极层140覆盖所述过孔123，并与所述导电层110相联通。
在本申请的一实施例中，所述导电层110可例如为一具有低电阻率的金属层。
在本申请的一实施例中，所述遮光层120可例如为一黑色矩阵层。
在本申请的一实施例中，所述导电层110与所述彩色滤光层相邻配置，并包围所述第一光阻131、所述第二光阻132及所述第三光阻133。
在本申请的一实施例中，所述第一光阻131可例如为红色光阻，所述第二光阻132可例如为绿色光阻，所述第三光阻133可例如为蓝色光阻。
在本申请的一实施例中，所述多个过孔123为等宽配置、局部等宽配置或不等宽配置。
在本申请的一实施例中，所述过孔123位于相异色系的光阻之间。具体而言，所述过孔123位于所述第一光阻131与所述第二光阻132之间；所述过孔123位于所述第二光阻132与所述第三光阻133之间；所述过孔123位于所述第三光阻133与所述第一光阻131之间。
图6为本申请另一实施例的彩色滤光层基板的俯视图，请参考图4和图6，一种彩色滤光层基板20，包括：一第一基板100；一导电层110，设置于所述第一基板100上；一遮光层120，设置于所述导电层110上，并涵盖所述导电层120，其中所述遮光层120上具有多个过孔123，所述过孔123暴露出所述导电层110，所述导电层110和所述遮光层120定义出多个像素显示区；一彩色滤光层，包括多个第一光阻131、第二光阻132及第三光阻133，阵列设置于所述像素显示区上；一透明电极层140，设置于所述遮光层120和所述彩色滤光层上；其中，所述透明电极层140覆盖所述过孔123，并与所述导电层110相联通。
在本申请的一实施例中，所述导电层110可例如为一具有低电阻率的金属层。
在本申请的一实施例中，所述遮光层120可例如为一黑色矩阵层。
在本申请的一实施例中，所述导电层110与所述彩色滤光层相邻配置，并包围所述第一光阻131、所述第二光阻132及所述第三光阻133。
在本申请的一实施例中，所述第一光阻131可例如为红色光阻，所述第二光阻132可例如为绿色光阻，所述第三光阻133可例如为蓝色光阻。
在本申请的一实施例中，所述多个过孔123为等宽配置、局部等宽配置或不等宽配置。
在本申请的一实施例中，所述过孔123位于相同色系的光阻之间。具体而言，所述过孔123位于相邻的所述第一光阻131之间；所述过孔123位于相邻的所述第二光阻132之间；所述过孔123位于相邻的所述第三光阻133之间。
图7为本申请又一实施例的彩色滤光层基板的俯视图，请参考图4和图7，一种彩色滤光层基板30，包括：一第一基板100；一导电层110，设置于所述第一基板100上；一遮光层120，设置于所述导电层110上，并涵盖所述导电层120，其中所述遮光层120上具有多个过孔123，所述过孔123暴露出所述导电层110，所述导电层110和所述遮光层120定义出多个像素显示区；一彩色滤光层，包括多个第一光阻131、第二光阻132及第三光阻133，阵列设置于所述像素显示区上； 一透明电极层140，设置于所述遮光层120和所述彩色滤光层上；其中，所述透明电极层140覆盖所述过孔123，并与所述导电层110相联通。
在本申请的一实施例中，所述导电层110可例如为一具有低电阻率的金属层。
在本申请的一实施例中，所述遮光层120可例如为一黑色矩阵层。
在本申请的一实施例中，所述导电层110与所述彩色滤光层相邻配置，并包围所述第一光阻131、所述第二光阻132及所述第三光阻133。
在本申请的一实施例中，所述第一光阻131可例如为红色光阻，所述第二光阻132可例如为绿色光阻，所述第三光阻133可例如为蓝色光阻。
在本申请的一实施例中，所述多个过孔123为等宽配置、局部等宽配置或不等宽配置。
在本申请的一实施例中，所述过孔123位于相邻光阻的交汇处。具体而言，所述过孔123位于所述多个像素显示区的交汇处，即不同走向的遮光层120的交叉位置处。
在本申请的一实施例中，所述过孔设计亦可应用于四色系光阻层的彩色滤光层基板，所述四色系光阻层包括：第一光阻、第二光阻、第三光阻以及第四光阻。其中，所述第一光阻可例如为红色光阻，所述第二光阻可例如为绿色光阻，所述第三光阻可例如为蓝色光阻，所述第四光阻可例如为白色光阻，其依据设计人员的需求，亦可改成红色子光阻、绿色子光阻以及蓝色子光阻的混合发光光阻，亦或是藉由其他材料替代所述白色光阻等等，本文例举相应的可实施结构，而非对其加以限制。
请同时参考图5至图7，一种显示面板，包括包括一主动开关阵列基板，以及一彩色滤光层基板，其中所述彩色滤光层基板，包括：一第一基板100；一导电层110，设置于所述第一基板100上；一遮光层120，设置于所述导电层110上，并涵盖所述导电层120，其中所述遮光层120上具有多个过孔123，所述过孔123暴露出所述导电层110，所述导电层110和所述遮光层120定义出多个像素显示区；一彩色滤光层，包括多个第一光阻131、第二光阻132及第三光阻133，阵列设置于所述像素显示区上；一透明电极层140，设置于所述遮光层120和所述彩色滤光层上；其中，所述透明电极层140覆盖所述过孔123，并与所述导电层110相联通。
在本申请的一实施例中，所述导电层110可例如为一具有低电阻率的金属层。
在本申请的一实施例中，所述遮光层120可例如为一黑色矩阵层。
在本申请的一实施例中，所述导电层110与所述彩色滤光层相邻配置，并包围所述第一光阻131、所述第二光阻132及所述第三光阻133。
在本申请的一实施例中，所述第一光阻131可例如为红色光阻，所述第二光阻132可例如为绿色光阻，所述第三光阻133可例如为蓝色光阻。
在本申请的一实施例中，所述多个过孔123可为等宽配置、局部等宽配置或不等宽配置。
在本申请的一实施例中，所述透明电极层140通过所述过孔123，与所述导电层110相联通，并涵盖所述彩色滤光层基板。
本申请通过透明电极层与导电层相联通，原理上可等效于电阻的并联连接，可以降低透明电极层的电阻值，提高透明电极层电压的稳定性，从而提高显示品质。
“在一些实施例中”及“在各种实施例中”等用语被重复地使用。所述用语通常不是指相同的实施例；但它也可以是指相同的实施例。“包含”、“具有”及“包括”等用词是同义词，除非其前后文意显示出其它意思。
以上所述，仅是本申请的较佳实施例而已，并非对本申请作任何形式上的限制，虽然本申请已以较佳实施例揭露如上，然而并非用以限定本申请，任何熟悉本专业的技术人员，在不脱离本申请技术方案范围内，当可利用上述揭示的技术内容作出些许更动或修饰为等同变化的等效实施例，但凡是未脱离本申请技术方案的内容，依据本申请的技术实质对以上实施例所作的任何简单修改、等同变化与修饰，均仍属于本申请技术方案的范围内。

Claims (15)

  1. 一种彩色滤光层基板的制造方法，包括：
    提供一第一基板；
    设置一导电层于所述第一基板上；
    设置一遮光层于所述导电层上；
    图案化所述遮光层，使其暴露出部分导电层，并形成多个具有不同厚度的内凹部分的遮光层于所述导电层上；
    刻蚀所述导电层和所述遮光层，使所述导电层涵盖于所述遮光层内，并于所述遮光层上形成多个过孔，所述导电层和所述遮光层定义出多个像素显示区；
    设置一彩色滤光层于所述像素显示区上；
    设置一透明电极层于所述遮光层和所述彩色滤光层上；
    其中，所述透明电极层覆盖所述过孔，并与所述导电层相联通。
  2. 如权利要求1所述的彩色滤光层基板的制造方法，通过一湿法刻蚀，刻蚀所述导电层，使刻蚀后的所述导电层涵盖于所述遮光层内。
  3. 如权利要求1所述的彩色滤光层基板的制造方法，通过一干法刻蚀，刻蚀所述遮光层的内凹部分，形成所述过孔，并暴露出所述导电层。
  4. 如权利要求1所述的彩色滤光层基板的制造方法，阵列设置多个光阻于所述像素显示区上，所述多个光阻包括第一光阻、第二光阻及第三光阻，其为所述彩色滤光层。
  5. 如权利要求1所述的彩色滤光层基板的制造方法，阵列设置所述过孔于相同色系的光阻之间。
  6. 如权利要求1所述的彩色滤光层基板的制造方法，阵列设置所述过孔于相异色系的光阻之间。
  7. 如权利要求1所述的彩色滤光层基板的制造方法，其中所述遮光层为一黑色矩阵层。
  8. 一种彩色滤光层基板，包括：
    一第一基板；
    一导电层，设置于所述第一基板上；
    一遮光层，设置于所述导电层上，并涵盖所述导电层，其中所述遮光层上具有多个过孔，所述过孔暴露出所述导电层，所述导电层和所述遮光层定义出多个像素显示区；
    一彩色滤光层，包括多个第一光阻、第二光阻及第三光阻，阵列设置于所述像素显示区上；
    一透明电极层，设置于所述遮光层和所述彩色滤光层上；
    其中，所述透明电极层覆盖所述过孔，并与所述导电层相联通。
  9. 如权利要求8所述的彩色滤光层基板，其中所述导电层为一金属层。
  10. 如权利要求8所述的彩色滤光层基板，其中所述导电层与所述彩色滤光层相邻配置，并包围所述第一光阻、所述第二光阻及所述第三光阻。
  11. 如权利要求8所述的彩色滤光层基板，其中所述多个过孔为等宽配置、局部等宽配置或不等宽配置。
  12. 如权利要求8所述的彩色滤光层基板，其中所述过孔阵列设置于相同色系的光阻之间。
  13. 如权利要求8所述的彩色滤光层基板，其中所述过孔阵列设置于相异色系的光阻之间。
  14. 如权利要求8所述的彩色滤光层基板，其中所述遮光层为一黑色矩阵层。
  15. 一种显示面板，包括一主动开关阵列基板，以及一彩色滤光层基板，其中所述彩色滤光层基板，包括：
    一第一基板；
    一导电层，设置于所述第一基板上；
    一遮光层，设置于所述导电层上，并涵盖所述导电层，其中所述遮光层上具有多个过孔，所述过孔暴露出所述导电层，所述导电层和所述遮光层定义出多个像素显示区；
    一彩色滤光层，包括多个第一光阻、第二光阻及第三光阻，阵列设置于所述像素显示区上；
    一透明电极层，设置于所述遮光层和所述彩色滤光层上，其中所述透明电极层覆盖所述过孔；
    其中，所述第一光阻为红色光阻，所述第二光阻为绿色光阻，所述第三光阻为蓝色光阻；
    其中，所述多个过孔为等宽配置、局部等宽配置或不等宽配置；
    其中，所述透明电极层通过所述过孔，与所述导电层相联通，并涵盖所述彩色滤光层基板。
PCT/CN2017/082367 2017-04-12 2017-04-28 彩色滤光层基板及其制造方法与应用的显示面板 WO2018188129A1 (zh)

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