WO2018152880A1 - 一种触摸显示屏及其制造方法 - Google Patents

一种触摸显示屏及其制造方法 Download PDF

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Publication number
WO2018152880A1
WO2018152880A1 PCT/CN2017/076472 CN2017076472W WO2018152880A1 WO 2018152880 A1 WO2018152880 A1 WO 2018152880A1 CN 2017076472 W CN2017076472 W CN 2017076472W WO 2018152880 A1 WO2018152880 A1 WO 2018152880A1
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Prior art keywords
touch electrode
electrode layer
layer
black matrix
touch
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PCT/CN2017/076472
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English (en)
French (fr)
Inventor
叶剑
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武汉华星光电技术有限公司
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Priority to US15/526,326 priority Critical patent/US10452172B2/en
Publication of WO2018152880A1 publication Critical patent/WO2018152880A1/zh

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    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0446—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a grid-like structure of electrodes in at least two directions, e.g. using row and column electrodes
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/0412—Digitisers structurally integrated in a display
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0443—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a single layer of sensing electrodes
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0445—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using two or more layers of sensing electrodes, e.g. using two layers of electrodes separated by a dielectric layer
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/80—Constructional details
    • H10K50/86—Arrangements for improving contrast, e.g. preventing reflection of ambient light
    • H10K50/865—Arrangements for improving contrast, e.g. preventing reflection of ambient light comprising light absorbing layers, e.g. light-blocking layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/30—Devices specially adapted for multicolour light emission
    • H10K59/38—Devices specially adapted for multicolour light emission comprising colour filters or colour changing media [CCM]
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/40—OLEDs integrated with touch screens
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/80—Constructional details
    • H10K59/8791—Arrangements for improving contrast, e.g. preventing reflection of ambient light
    • H10K59/8792—Arrangements for improving contrast, e.g. preventing reflection of ambient light comprising light absorbing layers, e.g. black layers
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04111—Cross over in capacitive digitiser, i.e. details of structures for connecting electrodes of the sensing pattern where the connections cross each other, e.g. bridge structures comprising an insulating layer, or vias through substrate
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K2102/00—Constructional details relating to the organic devices covered by this subclass
    • H10K2102/301—Details of OLEDs
    • H10K2102/351—Thickness
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H10K59/1201—Manufacture or treatment

Definitions

  • the present invention belongs to the field of display technologies, and in particular, to a touch display screen and a method of manufacturing the same.
  • touch display devices such as smart phones, tablet computers, etc.
  • touch display devices such as smart phones, tablet computers, etc.
  • the functions of touch display devices are more and more, providing users with More convenient.
  • the existing touch display device includes a touch display screen including a lower display unit and an upper touch unit, and the display unit is, for example, an OLED screen or an LCD screen, wherein the liquid crystal display includes a backlight (Backlight), Thin film transistor substrate (TFT), liquid crystal layer (LC) and color filter substrate (CF), the principle is that the thin film transistor controls the steering of the liquid crystal to select whether the white light emitted by the backlight passes, and the white light passing through the liquid crystal passes through the color filter.
  • the slice shows the corresponding color such as RGB.
  • the white organic light-emitting display has only a single white light-emitting material, which uses a white light LED as a backlight to display a color image through the RGB three primary color filters, and the thin film transistor controls the white light pixels.
  • the unit emits light or does not emit light; the white light-emitting pixel unit transmits a color filter layer to display a corresponding color such as RGB. Therefore, compared to the RGB three primary color self-luminous organic light emitting display, the white organic light emitting display still retains the color filter layer.
  • the touch unit includes a first touch electrode, a second touch electrode, and an insulating layer between the first touch electrode and the second touch electrode. The touch unit is located on the display unit, resulting in a thick overall thickness of the touch display screen, which is disadvantageous for achieving thinness and thinness.
  • a technical problem to be solved by embodiments of the present invention is to provide a touch display screen and a manufacturer thereof law. Can be used for thin and light touch screens.
  • a touch display screen including:
  • An upper substrate the upper substrate is disposed opposite to the lower substrate, the upper substrate is provided with a black matrix and a photoresist layer, the black matrix includes a plurality of lateral light shielding strips extending in the first direction and extending in the second direction a plurality of longitudinal light-shielding strips, wherein the first direction and the second direction are perpendicular to each other, and a plurality of the horizontal light-shielding strips and a plurality of the longitudinal light-shielding strips intersect to form a plurality of open areas, and the photoresist layer is located The open area; wherein
  • One of the lateral light-shielding strip and the longitudinal light-shielding strip includes a first black matrix layer and a first touch electrode layer, and the first black matrix layer is laminated with the first touch electrode layer.
  • the lateral light shielding strip and the longitudinal light shielding strip further comprise a second black matrix layer and a second touch electrode layer, wherein the second black matrix layer and the second touch electrode layer are stacked, the first The two touch electrode layers are electrically insulated from the first touch electrode layer.
  • the conductive substrate is electrically connected to the second touch electrode layer on both sides of the first touch electrode layer, and the conductive bridge is electrically insulated from the first touch electrode layer. .
  • a second touch electrode layer is disposed under the black matrix, and an extending direction of the second touch electrode layer is perpendicular to an extending direction of the first touch electrode layer, and the second touch electrode layer and the first An insulating layer is disposed between the touch electrode layers.
  • the second touch electrode layer is disposed on the surface of the upper substrate facing away from the black matrix, and the extending direction of the second touch electrode layer and the extending direction of the first touch electrode layer are perpendicular to each other.
  • the first black matrix layer is located on a lower surface of the upper substrate, the first touch electrode layer is stacked on a surface of the first black matrix layer; or the first touch electrode layer is located at the On the lower surface of the upper substrate, the first black matrix layer is laminated on the surface of the first touch electrode layer.
  • the first touch electrode layer has a thickness of 10 nm to 1000 nm, and the first black matrix layer has a thickness of 0.5 um to 50 um.
  • the first touch electrode layer is a mixed layer of a black photosensitive resin and a nano conductive wire.
  • the nano conductive wire is one or more of gold, silver, copper, aluminum, carbon or alloy, and the nano conductive wire has a diameter of 10 nm to 1000 nm and a length of 0.1 um to 50 um.
  • a second aspect of the embodiments of the present invention provides a method for manufacturing the touch display screen, including:
  • the black matrix including a plurality of lateral light-shielding strips extending in a first direction and a plurality of longitudinal light-shielding strips extending in a second direction, the first The direction and the second direction are perpendicular to each other, and the plurality of the horizontal light-shielding strips and the plurality of the longitudinal light-shielding strips intersect to form a plurality of open areas, and one of the horizontal light-shielding strips and the longitudinal light-shielding strips comprises a first black matrix a layer and a first touch electrode layer, wherein the first black matrix layer and the first touch electrode layer are stacked;
  • a photoresist layer is formed in the opening region.
  • one of the lateral shading strip and the longitudinal shading strip comprises a first black matrix layer and a first touch electrode layer
  • the first black matrix layer and the first touch electrode layer are stacked, such that one of the touch electrodes comprises In the black matrix, there is no need to additionally provide two touch electrodes as in the prior art, so that the thickness of the touch display screen can be reduced, which is beneficial to the thinness and thinness of the touch display screen, and can reduce the process and reduce the cost
  • the first black matrix layer and the first touch electrode layer are stacked to form one of the light shielding strips, so that the entire light shielding strip is formed by the touch electrode, and the cost is greatly reduced.
  • Figure 1 is a cross-sectional view of a touch display screen in accordance with a first embodiment of the present invention
  • FIG. 2 is a cross-sectional view showing an upper substrate, a black matrix, a photoresist layer, and a protective layer according to a first embodiment of the present invention
  • FIG. 3 is a top plan view of a black matrix and a photoresist layer according to a first embodiment of the present invention
  • Figure 4 is a cross-sectional view showing a horizontal light shielding strip and a longitudinal light shielding strip according to a first embodiment of the present invention
  • FIG. 5 is a top plan view of a first touch electrode layer and a second touch electrode layer according to a first embodiment of the present invention
  • Figure 6 is a flow chart showing the manufacture of a black matrix according to a first embodiment of the present invention.
  • Figure 7 is a cross-sectional view of a touch display screen in accordance with a second embodiment of the present invention.
  • Figure 8 is a cross-sectional view of a touch display screen in accordance with a third embodiment of the present invention.
  • Figure 9 is a cross-sectional view of a touch display screen in accordance with a fourth embodiment of the present invention.
  • the touch display screen includes a display unit and a touch unit, and the display unit may be a liquid crystal display (LCD) or an OLED (Organic Light Emitting Diode) or other display unit. Description The following describes the display unit as an OLED, and the touch unit is used to implement a touch function.
  • LCD liquid crystal display
  • OLED Organic Light Emitting Diode
  • the touch display screen includes a lower substrate 110 and an upper substrate 150 , the upper substrate 150 is opposite to the lower substrate 110 , and the upper substrate 150 is located at the lower substrate 110 .
  • the upper substrate 150 and the lower substrate 110 may be a rigid substrate, such as a glass substrate, or a flexible substrate, such as a polyimide plastic substrate.
  • a thin film transistor and an organic light emitting unit 120 are disposed on the lower substrate 110, and an output end of the thin film transistor is electrically connected to the organic light emitting unit 120.
  • the upper substrate 150 is provided with a black matrix 200 and a photoresist layer 140.
  • the black matrix 200 functions to block light and prevent color mixture.
  • the black matrix 200 includes a plurality of lateral light-shielding strips 210 and along the first direction. a plurality of longitudinal light-shielding strips 220 extending in a second direction, wherein the first direction and the second direction are perpendicular to each other.
  • a plurality of the horizontal light-shielding strips 210 extend in the X-axis direction
  • a plurality of the longitudinal light-shielding The strip 220 extends in the Y-axis direction.
  • the order of the arrangement is common knowledge of those skilled in the art, and details are not described herein; the photoresist layer 140 is also, for example, a red photoresist layer (R), a green photoresist layer (G), and a blue photoresist layer (B).
  • the white photoresist layer (W), the arrangement order of the red photoresist layer (R), the green photoresist layer (G), the blue photoresist layer (B), and the white photoresist layer (W) is common in the art. The common knowledge of the technicians will not be repeated here.
  • one of the lateral light-shielding strips 210 and the longitudinal light-shielding strips 220 includes a first black matrix layer 211 and a first touch electrode layer 212 , that is, the first touch electrode layer 212 is included in the black matrix 200 .
  • the horizontal light-shielding strip 210 includes a first black matrix layer 211 and a first touch electrode layer 212, and the first black matrix layer 211 is stacked with the first touch electrode layer 212, That is, the first black matrix layer 211 is stacked on the first touch electrode layer 212, or the first touch electrode layer 212 is stacked on the first black matrix layer 211.
  • the first black matrix layer 211 is used for shading
  • the first touch electrode layer 212 is used as one of the electrodes of the touch unit.
  • the one of the lateral light-shielding strips 210 and the longitudinal light-shielding strips 220 includes a first black matrix layer 211 and a first touch electrode layer 212, the first black matrix layer 211 and the first touch electrode layer 212 are stacked, Therefore, one of the touch electrodes is included in the black matrix 200, and there is no need to additionally provide two touch electrodes as in the prior art, so that the thickness of the touch display screen can be reduced, the thickness of the touch display screen can be reduced, and the process can be reduced. Reduced costs; and, due to the A black matrix layer 211 is laminated with the first touch electrode layer 212 to form one of the light shielding strips, so that the entire light shielding strip is formed by the touch electrodes, and the cost is greatly reduced.
  • the horizontal light shielding strip 210 and the longitudinal light shielding strip 220 further comprise a second black matrix layer 221 and a second touch electrode layer 222, that is, the second touch electrode layer 222 is included in the black matrix.
  • the longitudinal light-shielding strip 220 includes a second black matrix layer 221 and a second touch electrode layer 222, and the second black matrix layer 221 and the second touch electrode layer 222 are stacked. That is, the second black matrix layer 221 is stacked on the second touch electrode layer 222, or the second touch electrode layer 222 is stacked on the second black matrix layer 221.
  • the second black matrix layer 221 is used for shading, and the second touch electrode layer 222 is used as another electrode of the touch unit.
  • the extending direction of the second touch electrode layer 222 is perpendicular to the extending direction of the first touch electrode layer 212.
  • the first touch electrode layer 212 when the first touch electrode layer 212 is included in the horizontal light blocking strip 210, the The first touch electrode layer 212 extends in the X-axis direction, and when the second touch electrode layer 222 is included in the longitudinal light-shielding strip 220, the second touch electrode layer 222 extends in the Y-axis direction.
  • the first touch electrode and the second touch electrode are both included in the black matrix 200, so that it is not necessary to additionally set the touch electrode, and thus the touch unit is embedded in the display unit, so that the touch display screen can be greatly reduced.
  • the thickness of the touch screen further facilitates the thinning of the touch display screen, and also facilitates simplification of the process and cost reduction.
  • the extending direction of the second touch electrode layer 222 and the extending direction of the first touch electrode layer 212 are perpendicular to each other, and the horizontal light blocking strip 210 and the longitudinal light blocking strip 220 are both double-layered structures, in order to prevent the first A touch electrode layer 212 and a second touch electrode layer 222 are electrically connected to each other, and the second touch electrode layer 222 is electrically insulated from the first touch electrode layer 212.
  • the first touch electrode layer The second touch electrode layer 222 on both sides of the 212 is disconnected, and the upper substrate 150 is provided with a conductive bridge 180.
  • the conductive bridge 180 is made of a conductive material, such as gold, silver, copper, iron, graphite, or the like.
  • the conductive bridge 180 is electrically connected to the second touch electrode layer 222 that is disconnected on both sides of the first touch electrode layer 212.
  • the conductive bridge 180 is electrically insulated from the first touch electrode layer 212.
  • an insulating layer is disposed between the conductive bridge 180 and the first touch electrode layer 212, and the insulating layer is an intermediate insulating layer 190.
  • the first black matrix layer 211 and the second black matrix layer 221 are in close contact with the lower surface of the upper substrate 150, the first touch electrode layer 212 is laminated on the first black matrix layer 211, and the second touch electrode layer 222 is laminated on the second black matrix layer 221; in other embodiments of the invention, the first touch electrode layer and the first black matrix
  • the lamination order of the layers, the lamination order of the second touch electrode layer and the second black matrix layer may be reversed.
  • the first touch electrode layer in order to prevent the first touch electrode layer and the second touch electrode layer from being electrically connected, the first touch electrode layer is disposed close to a lower surface of the upper substrate, the first a black matrix layer laminated on the first touch electrode layer, the second black matrix layer being disposed on a lower surface of the upper substrate, and a second touch electrode layer laminated on the second black matrix layer Since the thickness of the black matrix layer is thick, the first touch electrode layer and the second touch electrode layer are not electrically connected, and the first touch electrode layer and the second touch electrode layer can be electrically insulated by the black matrix layer.
  • the horizontal light-shielding strip and the longitudinal light-shielding strip may also be three or more layers, and the first touch electrode layer and the second touch electrode layer may be electrically insulated.
  • the first black matrix layer 211 is located on the lower surface of the upper substrate 150, and the first touch electrode layer 212 is laminated on the surface of the first black matrix layer 211.
  • Two black matrix layers 221 are located on the lower surface of the upper substrate 150, and the second touch electrode layer 222 is laminated on the surface of the second black matrix layer 221, such that the first black matrix layer 211 and the second black matrix
  • the layer 221 is located in the same layer, and the first touch electrode layer 212 and the second touch electrode layer 222 are located on the same layer, and the process is simple.
  • the first touch electrode layer is located on a lower surface of the upper substrate, the first black matrix layer is laminated on a surface of the first touch electrode layer, and the second The touch electrode layer is on a lower surface of the upper substrate, and the second black matrix layer is laminated on a surface of the second touch electrode layer.
  • the horizontal light-shielding strips 210 and the longitudinal light-shielding strips 220 have a thickness of 0.5 ⁇ m to 50 ⁇ m, for example, 0.5 ⁇ m, 1 ⁇ m, 5 ⁇ m, 10 ⁇ m, 15 ⁇ m, 20 ⁇ m, 25 ⁇ m, 30 ⁇ m, 40 ⁇ m, 45 ⁇ m, 50 ⁇ m, and the like.
  • the thickness of the first touch electrode layer 212 is much smaller than the thickness of the first black matrix layer 211.
  • the thickness of the first touch electrode layer 212 is 10 nm to 1000 nm, for example, 10 nm, 50 nm, 100 nm, 200 nm, 300 nm, 400 nm, 500 nm, 600 nm, 700 nm, 800 nm, 900 nm, 1000 nm, etc.
  • the first black matrix layer 211 has a thickness of 0.5 ⁇ m to 50 ⁇ m, for example, 0.5 ⁇ m, 1 ⁇ m, 5 ⁇ m, 10 ⁇ m, 20 ⁇ m.
  • the thickness of the second touch electrode layer 222 is much smaller than the thickness of the second black matrix layer 221.
  • the second touch The thickness of the electrode layer 222 is 10 nm to 1000 nm, for example, 10 nm, 50 nm, 100 nm, 200 nm, 300 nm, 400 nm, 500 nm, 600 nm, 700 nm, 800 nm, 900 nm, 1000 nm, etc., and the thickness of the second black matrix layer 221 is 0.5. From ⁇ m to 50 ⁇ m, for example, 0.5 ⁇ m, 1 ⁇ m, 5 ⁇ m, 10 ⁇ m, 20 ⁇ m, 30 ⁇ m, 40 ⁇ m, 50 ⁇ m, or the like.
  • the first black matrix layer 211 and the second black matrix layer 221 are UV-curable black photosensitive resin, which functions as a light blocking effect;
  • the first touch electrode layer 212 and the second touch electrode layer 222 is a mixed layer of nano conductive wires and black photosensitive resin, the nano conductive wires being one or more of gold, silver, copper, aluminum, carbon or alloy, for example, the nano conductive wires are nano silver wires, each The nano conductive wire has a diameter of 10 nm to 1000 nm, for example, 10 nm, 50 nm, 100 nm, 200 nm, 300 nm, 400 nm, 500 nm, 600 nm, 700 nm, 800 nm, 900 nm, 1000 nm, and the like, and has a length of 0.1 um to 50 um, for example, 0.1 ⁇ m, 0.5 ⁇ m, 1 ⁇ m, 5 ⁇ m, 10 ⁇ m, 15 ⁇ m, 20 ⁇ m, 25 ⁇ m,
  • the organic light emitting unit 120 includes an anode 121, a cathode 123, and a light emitting layer 122 between the anode 121 and the cathode 123.
  • the anode 121 or the cathode 123 is electrically connected to the output end of the thin film transistor.
  • a polarizer 160 (Polarizer) is further disposed above the upper substrate 150, and a cover plate 170 (Cover Lens) is further disposed on the polarizer 160.
  • the method includes the following steps:
  • the touch electrode layer 214 is a mixed layer of a black photosensitive resin and a nano conductive wire.
  • the first direction and the second direction are perpendicular to each other, and the plurality of the horizontal light-shielding strips 210 and the plurality of the longitudinal light-shielding strips 220 intersect to form a plurality of open areas, the horizontal light-shielding strips 210 and the longitudinal light-shielding strips 220
  • One of the first black matrix layer 211 and the first touch electrode layer 212 is laminated with the first touch electrode layer 212.
  • the number of times of exposure and development is not limited to one time, and may be, for example, two or more times.
  • two exposures and development will be described as an example.
  • a first exposure is performed using a mask of a pre-designed pattern, the first exposure being a contact exposure, for example, between 10 mj (milli-joule) and 50 mj (milli-joule).
  • the purpose of the first exposure is mainly for the subsequent formation of a black matrix layer, and then development, the development process can completely expose the exposure Retained, no exposure is completely removed; then a second exposure is performed using a pre-designed mask, the second exposure being a non-contact front exposure, the exposure energy being between 50 mj and 100 mj, for example 50 mj 60mj, 70mj, 80mj, 90mj, 100mj, etc.
  • the purpose of this exposure is to remove part of the touch electrode layer 214 of the surface in the subsequent process, and then perform development, remove part of the touch electrode layer 214 after development, and keep the touch electrode layer 214 below.
  • the black matrix layer forms a black matrix 200.
  • the photoresist layer 140 is formed in the opening region, and the photoresist layer 140 is, for example, a red photoresist layer (R), a green photoresist layer (G), and a blue photoresist layer (B), and the red photoresist layer
  • R red photoresist layer
  • G green photoresist layer
  • B blue photoresist layer
  • the arrangement order of the (R), the green photoresist layer (G), and the blue photoresist layer (B) is common knowledge of those skilled in the art, and is not described herein again; the photoresist layer 140 is also, for example, a red photoresist.
  • the lateral light-shielding strips 210 and the longitudinal light-shielding strips 220 further comprise a second black matrix layer 221 and a second touch electrode layer 222, that is, the second touch electrode layer 222 is included in the black matrix 200.
  • the second black matrix layer 221 is stacked on the second touch electrode layer 222, that is, the second black matrix layer 221 is stacked on the second touch electrode layer 222, or the second touch electrode layer 222 is stacked on the second Two black matrix layers 221.
  • the second black matrix layer 221 For shading, the second touch electrode layer 222 is used as another electrode of the touch unit.
  • the extending direction of the second touch electrode layer 222 is perpendicular to the extending direction of the first touch electrode layer 212.
  • the first touch electrode layer 212 when the first touch electrode layer 212 is included in the horizontal light blocking strip 210, the The first touch electrode layer 212 extends in the X-axis direction, and when the second touch electrode layer 222 is included in the longitudinal light-shielding strip 220, the second touch electrode layer 222 extends in the Y-axis direction. Thus, both the first touch electrode and the second touch electrode are included in the black matrix 200.
  • the method further includes the steps of: forming a conductive bridge 180 on the upper substrate 150, the conductive bridge 180 is configured to connect second touch electrodes on both sides of the first touch electrode, the conductive bridge 180 and the conductive bridge 180
  • the first touch electrode is electrically insulated.
  • FIG. 7 is a touch display screen according to a second embodiment of the present invention.
  • the structure of FIG. 7 is similar to the structure of FIG. 1. Therefore, the same component symbols represent the same components.
  • the main difference between this embodiment and the first embodiment is that The setting of the two touch electrode layers.
  • the second touch electrode layer 322 is not included in the black matrix 300.
  • a thin film encapsulation layer 310 is disposed above the organic light emitting unit 120, and a coating layer 130 is disposed over the thin film encapsulation layer 310, and a second touch is disposed on the coating protection layer 130.
  • the electrode layer 322, the extending direction of the second touch electrode layer 322 is perpendicular to the extending direction of the first touch electrode layer 212, and the insulating layer is disposed between the second touch electrode layer 322 and the black matrix 300.
  • the insulating layer is an intermediate insulating layer 390, that is, the second touch electrode layer 322 is located below the black matrix 300 layer.
  • the touch display screen of this embodiment can also implement the touch function, and at the same time, it is also advantageous for thinning and thinning of the touch display screen, and at the same time reducing the cost.
  • the second touch electrode layer 322 is made of indium tin oxide (ITO).
  • ITO indium tin oxide
  • the second touch electrode layer is formed by a metal mesh (metal mesh), such as silver (Ag), titanium (Ti), Metal materials such as molybdenum (Mo) and aluminum (Al).
  • FIG. 8 is a touch display screen according to a third embodiment of the present invention, and the structure of FIG. 8 is similar to the structure of FIG. Therefore, the same element symbols represent the same elements, and the main difference between this embodiment and the first embodiment is the arrangement of the second touch electrode layer.
  • the second touch electrode layer 422 is not included in the black matrix 300 .
  • a thin film encapsulation layer 310 is disposed on the organic light emitting unit 120, and a second touch electrode layer 422 is disposed on the thin film encapsulation layer 310.
  • the second touch electrode layer 422 extends in a direction and a first touch electrode. The extending direction of the layer 212 is perpendicular to each other.
  • An insulating layer is disposed between the second touch electrode layer 422 and the black matrix 300, and the insulating layer is an over coating layer, that is, the second layer.
  • the touch electrode layer 422 is located below the layer of the black matrix 300.
  • the touch display screen of this embodiment can also implement the touch function, and at the same time, it is also advantageous for thinning and thinning of the touch display screen, and at the same time reducing the cost.
  • the second touch electrode layer 422 is made of indium tin oxide (ITO).
  • ITO indium tin oxide
  • the second touch electrode layer is formed by a metal mesh (metal mesh), such as silver (Ag), titanium (Ti), Metal materials such as molybdenum (Mo) and aluminum (Al).
  • FIG. 9 is a touch display screen according to a third embodiment of the present invention.
  • the structure of FIG. 9 is similar to the structure of FIG. 1. Therefore, the same component symbols represent the same components.
  • the main difference between this embodiment and the first embodiment is that The setting of the two touch electrode layers.
  • the second touch electrode layer 522 is not included in the black matrix 300.
  • the surface of the upper substrate 150 facing away from the black matrix 300 is provided with a second touch electrode layer 522, and the extending direction of the second touch electrode layer 522 and the extending direction of the first touch electrode layer 212 are mutually vertical.
  • the touch display screen of this embodiment can also implement the touch function, and at the same time, it is also advantageous for thinning and thinning of the touch display screen, and at the same time reducing the cost.
  • the second touch electrode layer 522 is made of indium tin oxide (ITO).
  • ITO indium tin oxide
  • the second touch electrode layer is formed by a metal mesh (metal mesh), such as silver (Ag), titanium (Ti), Metal materials such as molybdenum (Mo) and aluminum (Al).
  • the present invention has the following advantages:
  • one of the lateral shading strip and the longitudinal shading strip comprises a first black matrix layer and a first touch electrode layer
  • the first black matrix layer and the first touch electrode layer are stacked, such that one of the touch electrodes comprises In the black matrix, there is no need to additionally provide two touch electrodes as in the prior art, so that the thickness of the touch display screen can be reduced, which is beneficial to the thinness and thinness of the touch display screen, and can reduce the process and reduce the cost
  • the first black matrix layer and the first touch electrode layer are stacked to form one of the light shielding strips, so that the entire light shielding strip is formed by the touch electrode, and the cost is greatly reduced.

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Abstract

一种触摸显示屏以及触摸显示屏的制造方法，其中，触摸显示屏包括：下基板(110)，上基板(150)，上基板(150)与下基板(110)相对设置，上基板(150)上设有黑色矩阵(200,300)和光阻层(140)，黑色矩阵(200,300)包括沿第一方向延伸的多数个横向遮光条(210)和沿第二方向延伸的多数个纵向遮光条(220)，第一方向和第二方向互相垂直，多数个横向遮光条(210)和多数个纵向遮光条(220)交叉围成多数个开口区，光阻层(140)位于开口区；其中，横向遮光条(210)和纵向遮光条(220)其中一种包括第一黑色基质层(211)和第一触摸电极层(212)，第一黑色基质层(211)与第一触摸电极层(212)层叠设置。有利于触摸显示屏轻薄化。

Description

一种触摸显示屏及其制造方法
本发明要求2017年02月22日递交的发明名称为“一种触摸显示屏及其制造方法”的申请号201710096554.X的在先申请优先权，上述在先申请的内容以引入的方式并入本文本中。
技术领域
本发明属于显示技术领域，具体地讲，涉及一种触摸显示屏及其制造方法。
背景技术
近年来，随着电子技术的发展，触摸显示装置如智能手机、平板电脑等在人们日常生活中的应用越来越广泛，并且，现在的触摸显示装置的功能越来越多，为用户提供了更多的方便。
现有的触摸显示装置包括触摸显示屏，所述触摸显示屏包括下方的显示单元和上方的触摸单元，所述显示单元例如为OLED屏或者LCD屏，其中液晶显示屏包括背光源(Backlight)、薄膜晶体管基板(TFT)、液晶层(LC)以及彩色滤光片基板(CF)，其原理为薄膜晶体管控制液晶的转向来选择背光源发出的白光是否通过，穿过液晶的白光通过彩色滤光片来显示相应的RGB等不同的颜色。其中一种OLED屏为白光有机发光显示屏，白光有机发光显示屏其只有单一的白色发光材料，其利用白光LED作为背光源，透过RGB三原色滤光片显示彩色图像，薄膜晶体管控制发白光像素单元发光或者不发光；发白光的像素单元透过彩色滤光片层来显示相应的RGB等不同颜色。因此相比RGB三原色自发光有机发光显示器，白光有机发光显示器，其仍保留了彩色滤光片层。所述触摸单元包括第一触摸电极、第二触摸电极、位于第一触摸电极和第二触摸电极之间绝缘层。所述触摸单元位于显示单元上，导致触摸显示屏整体厚度较厚，不利于实现轻薄化。
发明内容
本发明实施例所要解决的技术问题在于，提供一种触摸显示屏及其制造方 法。可用于触摸显示屏的轻薄化。
为了解决上述技术问题，本发明第一方面提供了一种触摸显示屏，包括：
下基板；
上基板，所述上基板与所述下基板相对设置，所述上基板上设有黑色矩阵和光阻层，所述黑色矩阵包括沿第一方向延伸的多数个横向遮光条和沿第二方向延伸的多数个纵向遮光条，所述第一方向和所述第二方向互相垂直，多数个所述横向遮光条和多数个所述纵向遮光条交叉围成多数个开口区，所述光阻层位于所述开口区；其中，
所述横向遮光条和所述纵向遮光条其中一种包括第一黑色基质层和第一触摸电极层，所述第一黑色基质层与所述第一触摸电极层层叠设置。
其中，所述横向遮光条和所述纵向遮光条另一种包括第二黑色基质层和第二触摸电极层，所述第二黑色基质层与所述第二触摸电极层层叠设置，所述第二触摸电极层与所述第一触摸电极层电性绝缘。
其中，所述上基板上设有导电桥，所述导电桥用于电性连接第一触摸电极层两侧的第二触摸电极层，所述导电桥与所述第一触摸电极层电性绝缘。
其中，所述黑色矩阵下方设有第二触摸电极层，所述第二触摸电极层的延伸方向与所述第一触摸电极层的延伸方向互相垂直，所述第二触摸电极层与所述第一触摸电极层之间设有绝缘层。
其中，所述上基板背向所述黑色矩阵的表面上设有第二触摸电极层，所述第二触摸电极层的延伸方向与所述第一触摸电极层的延伸方向互相垂直。
其中，所述第一黑色基质层位于所述上基板的下表面上，所述第一触摸电极层层叠于所述第一黑色基质层表面；或者，所述第一触摸电极层第位于所述上基板的下表面上，所述第一黑色基质层层叠于所述第一触摸电极层表面。
其中，所述第一触摸电极层的厚度为10nm～1000nm，所述第一黑色基质层的厚度为0.5um～50um。
其中，所述第一触摸电极层为黑色感光树脂与纳米导电丝线形成的混合层。
其中，所述纳米导电丝线为金、银、铜、铝、碳或合金中的一种或者多种，所述纳米导电丝线的直径为10nm～1000nm，长度为0.1um～50um。
本发明实施例第二方面提供了一种上述触摸显示屏的制造方法，包括：
提供下基板；
提供上基板；
涂布黑色遮光层到所述上基板上；
涂覆触摸电极层到所述上基板上；
曝光、显影所述黑色遮光层和触摸电极层以形成黑色矩阵，所述黑色矩阵包括沿第一方向延伸的多数个横向遮光条和沿第二方向延伸的多数个纵向遮光条，所述第一方向和第二方向互相垂直，多数个所述横向遮光条和多数个所述纵向遮光条交叉围成多数个开口区，所述横向遮光条和所述纵向遮光条其中一种包括第一黑色基质层和第一触摸电极层，所述第一黑色基质层与所述第一触摸电极层层叠设置；
在所述开口区内形成光阻层。
实施本发明实施例，具有如下有益效果：
由于所述横向遮光条和纵向遮光条其中一种包括第一黑色基质层和第一触摸电极层，所述第一黑色基质层与所述第一触摸电极层层叠设置，从而其中一个触摸电极包含在黑色矩阵内，不需要像现有技术那样额外设置两个触摸电极，从而触摸显示屏的厚度可以得到降低，有利于触摸显示屏的轻薄化，而且可以减少制程，降低了成本；而且，由于所述第一黑色基质层与所述第一触摸电极层层叠设置形成其中一种遮光条，从而相对遮光条整个由触摸电极形成，成本得到了很大降低。
附图说明
为了更清楚地说明本发明实施例或现有技术中的技术方案，下面将对实施例或现有技术描述中所需要使用的附图作简单地介绍，显而易见地，下面描述中的附图仅仅是本发明的一些实施例，对于本领域普通技术人员来讲，在不付出创造性劳动的前提下，还可以根据这些附图获得其他的附图。
图1是本发明第一实施例触摸显示屏的剖视图；
图2是本发明第一实施例上基板、黑色矩阵、光阻层、涂覆保护层的剖视图；
图3是本发明第一实施例黑色矩阵、光阻层的俯视图；
图4是本发明第一实施例横向遮光条和纵向遮光条的剖视图；
图5是本发明第一实施例第一触摸电极层和第二触摸电极层的俯视图；
图6是本发明第一实施例黑色矩阵的制造流程图；
图7是本发明第二实施例触摸显示屏的剖视图；
图8是本发明第三实施例触摸显示屏的剖视图；
图9是本发明第四实施例触摸显示屏的剖视图。
具体实施方式
下面将结合本发明实施例中的附图，对本发明实施例中的技术方案进行清楚、完整地描述，显然，所描述的实施例仅仅是本发明一部分实施例，而不是全部的实施例。基于本发明中的实施例，本领域普通技术人员在没有作出创造性劳动前提下所获得的所有其他实施例，都属于本发明保护的范围。
本申请说明书、权利要求书和附图中出现的术语“包括”和“具有”以及它们任何变形，意图在于覆盖不排他的包含。例如包含了一系列步骤或单元的过程、方法、系统、产品或设备没有限定于已列出的步骤或单元，而是可选地还包括没有列出的步骤或单元，或可选地还包括对于这些过程、方法、产品或设备固有的其它步骤或单元。此外，术语“第一”、“第二”和“第三”等是用于区别不同的对象，而并非用于描述特定的顺序。
第一实施例
所述触摸显示屏包含显示单元和触摸单元，所述显示单元可以为液晶显示屏(Liquid Crystal Display，LCD)，也可以为OLED(Organic Light Emitting Diode，有机发光二极管)或者其他显示单元，为了方便描述，以下以显示单元为OLED为例进行描述，所述触摸单元用于实现触摸功能。
请参照图1-图5，所述触摸显示屏包括下基板110与上基板150，所述上基板150与所述下基板110相对设置，所述上基板150位于所述下基板110的 上方，所述上基板150和所述下基板110可以为硬性基板，例如为玻璃基板，也可以为柔性基板，例如为聚酰亚胺塑料基板。所述下基板110上设有薄膜晶体管和有机发光单元120，所述薄膜晶体管的输出端与所述有机发光单元120电连接。所述上基板150上设有黑色矩阵200和光阻层140，所述黑色矩阵200起到遮光、防止混色的作用，所述黑色矩阵200包括沿第一方向延伸的多数个横向遮光条210和沿第二方向延伸的多数个纵向遮光条220，所述第一方向和第二方向互相垂直，在本实施例中，多数个所述横向遮光条210沿X轴方向延伸，多数个所述纵向遮光条220沿Y轴方向延伸。多数个所述横向遮光条210和多数个纵向遮光条220交叉围成多数个开口区，所述开口区可透光，所述光阻层140位于所述开口区，所述光阻层140例如为红色光阻层(R)、绿色光阻层(G)、蓝色光阻层(B)，所述红色光阻层(R)、绿色光阻层(G)、蓝色光阻层(B)的排列顺序为本领域普通技术人员的公知常识，在此不再赘述；所述光阻层140还例如为红色光阻层(R)、绿色光阻层(G)、蓝色光阻层(B)、白色光阻层(W)，所述红色光阻层(R)、绿色光阻层(G)、蓝色光阻层(B)、白色光阻层(W)的排列顺序为本领域普通技术人员的公知常识，在此不再赘述。
请参见图4和图5，所述横向遮光条210和纵向遮光条220其中一种包括第一黑色基质层211和第一触摸电极层212，也即第一触摸电极层212包含在黑色矩阵200内，在本实施例中，所述横向遮光条210包括第一黑色基质层211和第一触摸电极层212，所述第一黑色基质层211与所述第一触摸电极层212层叠设置，也即第一黑色基质层211叠在第一触摸电极层212上，或者第一触摸电极层212叠在所述第一黑色基质层211上。在本实施例中，所述第一黑色基质层211用于遮光作用，所述第一触摸电极层212用于作为触摸单元的其中一个电极。
由于所述横向遮光条210和纵向遮光条220其中一种包括第一黑色基质层211和第一触摸电极层212，所述第一黑色基质层211与所述第一触摸电极层212层叠设置，从而其中一个触摸电极包含在黑色矩阵200内，不需要像现有技术那样额外设置两个触摸电极，从而触摸显示屏的厚度可以得到降低，有利于触摸显示屏的轻薄化，而且可以减少制程，降低了成本；而且，由于所述第 一黑色基质层211与所述第一触摸电极层212层叠设置形成其中一种遮光条，从而相对遮光条整个由触摸电极形成，成本得到了很大降低。
请继续参见图3-图5，所述横向遮光条210和纵向遮光条220另一种包括第二黑色基质层221和第二触摸电极层222，也即第二触摸电极层222包含在黑色矩阵200内，在本实施例中，所述纵向遮光条220包括第二黑色基质层221和第二触摸电极层222，所述第二黑色基质层221与所述第二触摸电极层222层叠设置，也即第二黑色基质层221叠在第二触摸电极层222上，或者第二触摸电极层222叠在所述第二黑色基质层221上。在本实施例中，所述第二黑色基质层221用于遮光作用，所述第二触摸电极层222用于作为触摸单元的另外一个电极。所述第二触摸电极层222的延伸方向与第一触摸电极层212的延伸方向互相垂直，在本实施例中，当所述第一触摸电极层212包含在横向遮光条210中时，所述第一触摸电极层212沿X轴方向延伸，当所述第二触摸电极层222包含在纵向遮光条220中时，所述第二触摸电极层222沿Y轴方向延伸。从而，所述第一触摸电极和第二触摸电极都包含在黑色矩阵200中，从而不需要在额外设置触摸电极，从而，触摸单元内嵌在显示单元内，从而可以极大的降低触摸显示屏幕的厚度，进一步有利于触摸显示屏的轻薄化，也有利于制程的简化和成本的降低。
在本实施例中，第二触摸电极层222的延伸方向与第一触摸电极层212的延伸方向互相垂直，所述横向遮光条210和纵向遮光条220均为双层结构，为了防止所述第一触摸电极层212和第二触摸电极层222电性连接，所述第二触摸电极层222与所述第一触摸电极层212电性绝缘，在本实施例中，所述第一触摸电极层212两侧的第二触摸电极层222断开，所述上基板150上设有导电桥180，所述导电桥180由导电材料构成，例如为金、银、铜、铁、石墨等材料或者合金构成，所述导电桥180用于电性连接所述第一触摸电极层212两侧对应断开的第二触摸电极层222，所述导电桥180与所述第一触摸电极层212电性绝缘，例如所述导电桥180与所述第一触摸电极层212之间设有绝缘层，所述绝缘层为中间绝缘层190。在本实施例中，所述第一黑色基质层211和第二黑色基质层221紧贴所述上基板150的下表面上，所述第一触摸电极层 212层叠在所述第一黑色基质层211上，所述第二触摸电极层222层叠在第二黑色基质层221上；在本发明的其他实施例中，第一触摸电极层与第一黑色基质层的层叠顺序、第二触摸电极层与第二黑色基质层的层叠顺序可以反过来。另外，在本发明的其他实施例中，为了防止第一触摸电极层和第二触摸电极层电性连接，所述第一触摸电极层紧贴所述上基板的下表面设置，所述第一黑色基质层层叠在所述第一触摸电极层上，所述第二黑色基质层紧贴所述上基板的下表面设置，所述第二触摸电极层层叠在所述第二黑色基质层上，由于黑色基质层的厚度较厚，从而第一触摸电极层和第二触摸电极层不会电性连接，可以通过黑色基质层使第一触摸电极层和第二触摸电极层电性绝缘。另外，在本发明的其他实施例中，所述横向遮光条和纵向遮光条还可以为三层或者更多层结构，同样可以实现第一触摸电极层和第二触摸电极层电性绝缘。
在本实施例中，所述第一黑色基质层211位于所述上基板150的下表面上，所述第一触摸电极层212层叠于所述第一黑色基质层211表面，同样，所述第二黑色基质层221位于所述上基板150的下表面上，所述第二触摸电极层222层叠于所述第二黑色基质层221表面，此种使第一黑色基质层211和第二黑色基质层221位于同一层，第一触摸电极层212和第二触摸电极层222位于同一层，制程简单。在本发明的其他实施例中，所述第一触摸电极层位于所述上基板的下表面上，所述第一黑色基质层层叠于所述第一触摸电极层表面，同样，所述第二触摸电极层位于所述上基板的下表面上，所述第二黑色基质层层叠于所述第二触摸电极层表面。
在本实施例中，所述横向遮光条210和纵向遮光条220的厚度为0.5μm～50μm，例如为0.5μm、1μm、5μm、10μm、15μm、20μm、25μm、30μm、40μm、45μm、50μm等。所述第一触摸电极层212的厚度远小于所述第一黑色基质层211的厚度，在本实施例中，所述第一触摸电极层212的厚度为10nm～1000nm，例如为10nm、50nm、100nm、200nm、300nm、400nm、500nm、600nm、700nm、800nm、900nm、1000nm等尺寸，所述第一黑色基质层211的厚度为0.5μm～50μm，例如为0.5μm、1μm、5μm、10μm、20μm、30μm、40μm、50μm等尺寸；同样的，所述第二触摸电极层222的厚度远小于所述第二黑色基质层221的厚度，在本实施例中，所述第二触摸 电极层222的厚度为10nm～1000nm，例如为10nm、50nm、100nm、200nm、300nm、400nm、500nm、600nm、700nm、800nm、900nm、1000nm等尺寸，所述第二黑色基质层221的厚度为0.5μm～50μm，例如为0.5μm、1μm、5μm、10μm、20μm、30μm、40μm、50μm等尺寸。
在本实施例中，所述第一黑色基质层211和第二黑色基质层221为可紫外光固化的黑色感光树脂，起到遮光作用；所述第一触摸电极层212和第二触摸电极层222为纳米导电丝线与黑色感光树脂的混合层，所述纳米导电丝线为金、银、铜、铝、碳或合金中的一种或者多种，例如所述纳米导电丝线为纳米银丝，每根所述纳米导电丝线的直径为10nm～1000nm，例如为10nm、50nm、100nm、200nm、300nm、400nm、500nm、600nm、700nm、800nm、900nm、1000nm等尺寸，长度为0.1um～50um，例如为0.1μm、0.5μm、1μm、5μm、10μm、15μm、20μm、25μm、30μm、40μm、45μm、50μm等；所述混合层的方块电阻为0.1欧姆/方块～500欧姆/方块，例如为0.1欧姆/方块、0.5欧姆/方块、1欧姆/方块、10欧姆/方块、50欧姆/方块、100欧姆/方块、200欧姆/方块、300欧姆/方块、400欧姆/方块、500欧姆/方块等。
另外，在本实施例中，所述有机发光单元120包括阳极121、阴极123和位于阳极121和阴极123之间的发光层122，所述阳极121或阴极123电连接所述薄膜晶体管的输出端。所述上基板150的上方还设有偏光片160(Polarizer)，所述偏光片160上还设有盖板170(Cover Lens)。
以下描述上述触摸显示屏的制造方法，请参见图1、图2和图6，该方法包括以下步骤：
提供下基板110；
提供上基板150，其中，提供上基板150和提供下基板110可以分别进行；
涂布未固化的黑色遮光层213到上基板150上；
涂覆触摸电极层214到上基板150上，在本实施例中，涂布黑色遮光层213和涂覆触摸电极层214的先后顺序不固定，可以先涂布黑色遮光层213到上基板150上后在涂布触摸电极层214到上基板150上，反过来也可以。在本实施例中，所述触摸电极层214为黑色感光树脂与纳米导电丝线形成的混合层。
曝光、显影所述黑色遮光层213和触摸电极层214以形成黑色矩阵200，所述黑色矩阵200包括沿第一方向延伸的多数个横向遮光条210和沿第二方向延伸的多数个纵向遮光条220，所述第一方向和第二方向互相垂直，多数个所述横向遮光条210和多数个所述纵向遮光条220交叉围成多数个开口区，所述横向遮光条210和纵向遮光条220其中一种包括第一黑色基质层211和第一触摸电极层212，所述第一黑色基质层211与所述第一触摸电极层212层叠设置。在本实施例中，曝光、显影的次数不限于一次，例如可以为两次或者多次，以下以两次曝光、显影为例进行说明。首先，利用预先设计好图案的光罩(mask)，进行第一次曝光，所述第一次曝光为接触式曝光，所述曝光能量例如为10mj(毫焦)～50mj(毫焦)之间，例如为10mj、15mj、20mj、15mj、30mj、35mj、40mj、45mj、50mj等，第一次曝光的目的主要是为了后续形成黑色基质层，然后进行显影，显影的过程可以将曝光的地方完全保留，没有曝光的地方完全除去；接着利用预先设计好图案的光罩，进行第二次曝光，第二次曝光为非接触式正面曝光，所述曝光能量在50mj～100mj之间，例如为50mj、60mj、70mj、80mj、90mj、100mj等，该次曝光的目的是为了后续过程中去掉表面的部分触摸电极层214，然后进行显影，显影后去掉部分触摸电极层214，保留触摸电极层214以下的黑色基质层，从而形成黑色矩阵200。
在开口区内形成所述光阻层140，所述光阻层140例如为红色光阻层(R)、绿色光阻层(G)、蓝色光阻层(B)，所述红色光阻层(R)、绿色光阻层(G)、蓝色光阻层(B)的排列顺序为本领域普通技术人员的公知常识，在此不再赘述；所述光阻层140还例如为红色光阻层(R)、绿色光阻层(G)、蓝色光阻层(B)、白色光阻层(W)，所述红色光阻层(R)、绿色光阻层(G)、蓝色光阻层(B)、白色光阻层(W)的排列顺序为本领域普通技术人员的公知常识，在此不再赘述。
在本实施例中，所述横向遮光条210和纵向遮光条220另一种包括第二黑色基质层221和第二触摸电极层222，也即第二触摸电极层222包含在黑色矩阵200内，所述第二黑色基质层221与所述第二触摸电极层222层叠设置，也即第二黑色基质层221叠在第二触摸电极层222上，或者第二触摸电极层222叠在所述第二黑色基质层221上。在本实施例中，所述第二黑色基质层221 用于遮光作用，所述第二触摸电极层222用于作为触摸单元的另外一个电极。所述第二触摸电极层222的延伸方向与第一触摸电极层212的延伸方向互相垂直，在本实施例中，当所述第一触摸电极层212包含在横向遮光条210中时，所述第一触摸电极层212沿X轴方向延伸，当所述第二触摸电极层222包含在纵向遮光条220中时，所述第二触摸电极层222沿Y轴方向延伸。从而，所述第一触摸电极和第二触摸电极都包含在黑色矩阵200中。
在本实施例中，还包括步骤：形成导电桥180在所述上基板150上，所述导电桥180用于连接第一触摸电极两侧的第二触摸电极，所述导电桥180与所述第一触摸电极电性绝缘。
第二实施例
图7为本发明第二实施例提供的触摸显示屏，图7的结构与图1的结构相似，因此相同的元件符号代表相同的元件，本实施例与第一实施例的主要不同点为第二触摸电极层的设置。
请参见图7，在本实施例中，所述第二触摸电极层322不是包含在所述黑色矩阵300中。具体说来，所述有机发光单元120上方设有薄膜封装层310，所述薄膜封装层310上方设有涂覆保护层130(Over Coating)，所述涂覆保护层130上方设有第二触摸电极层322，所述第二触摸电极层322的延伸方向与第一触摸电极层212的延伸方向互相垂直，所述第二触摸电极层322与所述黑色矩阵300之间设有绝缘层，所述绝缘层为中间绝缘层390，也即所述第二触摸电极层322位于所述黑色矩阵300层的下方。此实施例的触摸显示屏也可以实现触摸功能，同时，也有利于触摸显示屏的轻薄化，同时降低了成本。
在本实施例中，所述第二触摸电极层322为氧化铟锡(ITO)构成。另外，在本发明的其他实施例中，所述第二触摸电极层为金属网格(Metal Mesh)构成，所述金属网格由金属材料制成，如银(Ag)、钛(Ti)、钼(Mo)、铝(Al)等金属材料。
第三实施例
图8为本发明第三实施例提供的触摸显示屏，图8的结构与图1的结构相 似，因此相同的元件符号代表相同的元件，本实施例与第一实施例的主要不同点为第二触摸电极层的设置。
请参见图8，在本实施例中，所述第二触摸电极层422不是包含在所述黑色矩阵300中。具体说来，所述有机发光单元120上方设有薄膜封装层310，所述薄膜封装层310上设有第二触摸电极层422，所述第二触摸电极层422的延伸方向与第一触摸电极层212的延伸方向互相垂直，所述第二触摸电极层422与所述黑色矩阵300之间设有绝缘层，所述绝缘层为涂覆保护层130(Over Coating)，也即所述第二触摸电极层422位于所述黑色矩阵300层的下方。此实施例的触摸显示屏也可以实现触摸功能，同时，也有利于触摸显示屏的轻薄化，同时降低了成本。
在本实施例中，所述第二触摸电极层422为氧化铟锡(ITO)构成。另外，在本发明的其他实施例中，所述第二触摸电极层为金属网格(Metal Mesh)构成，所述金属网格由金属材料制成，如银(Ag)、钛(Ti)、钼(Mo)、铝(Al)等金属材料。
第四实施例
图9为本发明第三实施例提供的触摸显示屏，图9的结构与图1的结构相似，因此相同的元件符号代表相同的元件，本实施例与第一实施例的主要不同点为第二触摸电极层的设置。
请参见图9，在本实施例中，所述第二触摸电极层522不是包含在所述黑色矩阵300中。具体说来，所述上基板150背向所述黑色矩阵300的表面上设有第二触摸电极层522，所述第二触摸电极层522的延伸方向与第一触摸电极层212的延伸方向互相垂直。此实施例的触摸显示屏也可以实现触摸功能，同时，也有利于触摸显示屏的轻薄化，同时降低了成本。
在本实施例中，所述第二触摸电极层522为氧化铟锡(ITO)构成。另外，在本发明的其他实施例中，所述第二触摸电极层为金属网格(Metal Mesh)构成，所述金属网格由金属材料制成，如银(Ag)、钛(Ti)、钼(Mo)、铝(Al)等金属材料。
需要说明的是，本说明书中的各个实施例均采用递进的方式描述，每个实施例重点说明的都是与其它实施例的不同之处，各个实施例之间相同相似的部分互相参见即可。对于装置实施例而言，由于其与方法实施例基本相似，所以描述的比较简单，相关之处参见方法实施例的部分说明即可。
通过上述实施例的描述，本发明具有以下优点：
由于所述横向遮光条和纵向遮光条其中一种包括第一黑色基质层和第一触摸电极层，所述第一黑色基质层与所述第一触摸电极层层叠设置，从而其中一个触摸电极包含在黑色矩阵内，不需要像现有技术那样额外设置两个触摸电极，从而触摸显示屏的厚度可以得到降低，有利于触摸显示屏的轻薄化，而且可以减少制程，降低了成本；而且，由于所述第一黑色基质层与所述第一触摸电极层层叠设置形成其中一种遮光条，从而相对遮光条整个由触摸电极形成，成本得到了很大降低。
以上所揭露的仅为本发明较佳实施例而已，当然不能以此来限定本发明之权利范围，因此依本发明权利要求所作的等同变化，仍属本发明所涵盖的范围。

Claims (10)

  1. 一种触摸显示屏，其特征在于，包括：
    下基板；
    上基板，所述上基板与所述下基板相对设置，所述上基板上设有黑色矩阵和光阻层，所述黑色矩阵包括沿第一方向延伸的多数个横向遮光条和沿第二方向延伸的多数个纵向遮光条，所述第一方向和所述第二方向互相垂直，多数个所述横向遮光条和多数个所述纵向遮光条交叉围成多数个开口区，所述光阻层位于所述开口区；其中，
    所述横向遮光条和所述纵向遮光条其中一种包括第一黑色基质层和第一触摸电极层，所述第一黑色基质层与所述第一触摸电极层层叠设置。
  2. 如权利要求1所述的触摸显示屏，其特征在于，所述横向遮光条和所述纵向遮光条另一种包括第二黑色基质层和第二触摸电极层，所述第二黑色基质层与所述第二触摸电极层层叠设置，所述第二触摸电极层与所述第一触摸电极层电性绝缘。
  3. 如权利要求2所述的触摸显示屏，其特征在于，所述上基板上设有导电桥，所述导电桥用于电性连接第一触摸电极层两侧的第二触摸电极层，所述导电桥与所述第一触摸电极层电性绝缘。
  4. 如权利要求1所述的触摸显示屏，其特征在于，所述黑色矩阵下方设有第二触摸电极层，所述第二触摸电极层的延伸方向与所述第一触摸电极层的延伸方向互相垂直，所述第二触摸电极层与所述第一触摸电极层之间设有绝缘层。
  5. 如权利要求1所述的触摸显示屏，其特征在于，所述上基板背向所述黑色矩阵的表面上设有第二触摸电极层，所述第二触摸电极层的延伸方向与所述第一触摸电极层的延伸方向互相垂直。
  6. 如权利要求1-5任意一项所述的触摸显示屏，其特征在于，所述第一黑色基质层位于所述上基板的下表面上，所述第一触摸电极层层叠于所述第一黑色基质层表面；或者，所述第一触摸电极层第位于所述上基板的下表面上，所述第一黑色基质层层叠于所述第一触摸电极层表面。
  7. 如权利要求1-5任意一项所述的触摸显示屏，其特征在于，所述第一触摸电极层的厚度为10nm～1000nm，所述第一黑色基质层的厚度为0.5um～50um。
  8. 如权利要求1-5任意一项所述的触摸显示屏，其特征在于，所述第一触摸电极层为黑色感光树脂与纳米导电丝线形成的混合层。
  9. 如权利要求8所述的触摸显示屏，其特征在于，所述纳米导电丝线为金、银、铜、铝、碳或合金中的一种或者多种，所述纳米导电丝线的直径为10nm～1000nm，长度为0.1um～50um。
  10. 一种如权利要求1-9任意一项所述触摸显示屏的制造方法，其特征在于，包括：
    提供下基板；
    提供上基板；
    涂布黑色遮光层到所述上基板上；
    涂覆触摸电极层到所述上基板上；
    曝光、显影所述黑色遮光层和触摸电极层以形成黑色矩阵，所述黑色矩阵包括沿第一方向延伸的多数个横向遮光条和沿第二方向延伸的多数个纵向遮光条，所述第一方向和第二方向互相垂直，多数个所述横向遮光条和多数个所述纵向遮光条交叉围成多数个开口区，所述横向遮光条和所述纵向遮光条其中一种包括第一黑色基质层和第一触摸电极层，所述第一黑色基质层与所述第一触摸电极层层叠设置；
    在所述开口区内形成光阻层。
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