WO2018133514A1 - 一种自支撑的电润湿显示器及其制备方法 - Google Patents

一种自支撑的电润湿显示器及其制备方法 Download PDF

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Publication number
WO2018133514A1
WO2018133514A1 PCT/CN2017/110985 CN2017110985W WO2018133514A1 WO 2018133514 A1 WO2018133514 A1 WO 2018133514A1 CN 2017110985 W CN2017110985 W CN 2017110985W WO 2018133514 A1 WO2018133514 A1 WO 2018133514A1
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WIPO (PCT)
Prior art keywords
electrowetting display
display device
support
pixel wall
support structure
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PCT/CN2017/110985
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English (en)
French (fr)
Inventor
周国富
唐彪
蒋洪伟
窦盈莹
周莹
Original Assignee
华南师范大学
深圳市国华光电科技有限公司
深圳市国华光电研究院
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Application filed by 华南师范大学, 深圳市国华光电科技有限公司, 深圳市国华光电研究院 filed Critical 华南师范大学
Priority to US16/475,937 priority Critical patent/US20190346673A1/en
Priority to JP2019556402A priority patent/JP2020503571A/ja
Publication of WO2018133514A1 publication Critical patent/WO2018133514A1/zh

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/004—Optical devices or arrangements for the control of light using movable or deformable optical elements based on a displacement or a deformation of a fluid
    • G02B26/005—Optical devices or arrangements for the control of light using movable or deformable optical elements based on a displacement or a deformation of a fluid based on electrowetting
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
    • G03F7/2043—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means with the production of a chemical active agent from a fluid, e.g. an etching agent; with meterial deposition from the fluid phase, e.g. contamination resists

Definitions

  • the invention relates to the technical field of electrowetting, in particular to a self-supporting electrowetting display and a preparation method thereof.
  • wetting is meant the process by which one fluid on a solid surface is replaced by another fluid.
  • the liquid can spread on the solid surface, and the solid-liquid contact surface has a tendency to expand, that is, the adhesion of the liquid to the solid surface is greater than the cohesive force, that is, wetting.
  • the liquid does not spread on the solid surface, and the contact surface has a tendency to shrink into a spherical shape, that is, it does not wet, and the non-wetting is the adhesion of the liquid to the solid surface is less than its cohesive force.
  • a general electrowetting display device structure mainly includes two upper and lower substrates, wherein the upper substrate is composed of an upper glass substrate 1 ′, a first electrode 2 ′ and a sealant 3 ′, and the lower substrate is composed of a lower glass substrate 9 ′.
  • the second electrode 8', the hydrophobic insulating layer 7' (generally a fluorinated polymer), and the pixel wall 6' are composed.
  • the pattern of the pixel wall 6' defines the pixels of the display device, and the area between the pixel walls 6' is the display area, and the pixels are filled with a non-polar solution 5' (ink) and a polar solution 4' (electrolyte solution).
  • the immiscible fluid drives the non-polar solution 5' by applying a voltage to the polar solution 4' and the second electrode 8' of the lower substrate to change the hydrophilicity of the electrolyte solution 4' on the hydrophobic insulating layer 7'. Spreading and shrinking to achieve the display effect.
  • the pixel wall 6' and the non-polar solution 5' are covered by a polar electrolyte solution 4', wherein the polar solution 4' is a continuous phase in the electrowetting device and is not separated like a non-polar solution 5', At the same time, the polar solution 4' is electrically connected to the first electrode 2'.
  • the wettability of the polar solution 4' on the surface of the hydrophobic insulating layer 7' changes from a hydrophobic state to a hydrophilic state polarity.
  • the polar solution 4' wets the surface of the hydrophobic insulating layer 7', and the non-polar solution 5' is pushed to a corner of the pixel to achieve an open state.
  • the polar electrolyte solution 4 recovers the hydrophobicity on the surface of the hydrophobic insulating layer, and the non-polar solution 5' is re-spreaded to achieve the shutdown process.
  • pixels of 150 For example, ⁇ m ⁇ 150 ⁇ m, the height of the pixel wall in the electrowetting display device is 6 ⁇ m, the thickness of the non-polar solution 5' is 5.5-6.6 ⁇ m, and the thickness of the sealant 3' is 40.
  • the thickness of the polar electrolyte solution 4' is also about 40 ⁇ m.
  • the non-polar solution 5' shrinks and the height becomes 25. Mm.
  • the distance between the first electrode 2' of the upper substrate and the non-polar liquid 5' is 15-40. ⁇ m, due to the external atmospheric pressure, the center of the upper and lower substrates is easily deformed, causing the first electrode 2' to contact the non-polar solution 5', causing the non-polar solution 5' to accumulate on the surface of the first electrode 2' 10', Or causing the non-polar solution 5' to climb over 11', causing the non-polar solution 5' to accumulate on the lower substrate, causing failure of the entire display device.
  • the display device of the package basically has an intermediate collapse due to deformation of the upper and lower substrates.
  • the display device of the package in order to achieve high-quality display effect in the preparation process of the liquid crystal display panel, it is necessary to accurately control the thickness of the liquid crystal layer to realize the overall liquid crystal layer. Good light conditioning, so it is necessary to add spacers to support the spacing of the upper and lower substrates.
  • spacers for example, in a liquid crystal display panel, microspheres or microrods used as spacers are added between the upper and lower substrates of the liquid crystal display panel, and the support of the upper and lower substrates is realized by the size of the microspheres or microrods. .
  • the method of supporting the upper and lower substrates by adding microspheres or microrods is not suitable for the electrowetting display device because the microspheres or microrods are easily dropped into the pixel cells and the non-polar solution. Contact causes the accumulation of non-polar solutions or over the pixel walls.
  • a method in which a plurality of ultraviolet-polymerized high-molecular polymers and an initiator are mixed together in a liquid crystal and then formed by ultraviolet light irradiation is also used to support the upper and lower substrates in the liquid crystal display panel.
  • the method for preparing a spacer by ultraviolet curing is theoretically applicable to an electrowetting display device, but there are risks in actual operation such as: ultraviolet photopolymer or photoinitiator can be combined with non-polar
  • the solution is miscible or extracts the color solute in the non-polar solution; the ultraviolet photopolymer or the photoinitiator does not react well during the polymerization process.
  • the residual substance affects the conductivity in the polar electrolyte solution and the polar electrolyte solution is in the power-on state.
  • the electrowetting display device can partially solve the problem of center collapse of the device by increasing the thickness of the sealant.
  • the thickness of the sealant frame needs to be much larger than the shape of the upper and lower substrates, but this method is for a large-size display panel and uses ultra-thin glass. There are still collapse problems as the upper and lower substrate electrowetting devices or flexible devices.
  • the technical problem to be solved by the present invention is to provide a self-supporting electrowetting display and a preparation method thereof.
  • An electrowetting display device comprising an upper substrate and a lower substrate, the lower substrate comprising a first transparent substrate, a conductive layer, a hydrophobic insulating layer and a pixel wall structure, wherein the upper surface of the pixel wall structure is provided with a support structure.
  • the support structure is a plurality of support columns.
  • the support columns are disposed at intersections of mutually perpendicular wall surfaces of the pixel wall structure.
  • the support column is cylindrical or polygonal columnar.
  • the material of the support structure is a photoresist.
  • the material of the support structure is a material of the pixel wall structure or a material that is more hydrophilic than the pixel wall structure.
  • the height of the support structure ⁇ the distance from the upper surface of the pixel wall structure to the upper substrate.
  • the present invention also provides a method of fabricating an electrowetting display device as described above, comprising the steps of preparing a pixel wall structure on a lower substrate, and further comprising the step of preparing a support structure on the pixel wall structure.
  • the step of preparing the support structure on the pixel wall structure is prepared by a photolithography process.
  • the present invention provides a self-supporting electrowetting display and a preparation method thereof for the problem that the electrowetting display is easily deformed due to deformation of the upper and lower substrates, and the support structure is directly prepared on the pixel wall without the support structure falling.
  • the problem in the pixel grid and basically does not change the basic structure of the electrowetting display, does not affect the performance of the display device; does not need to add any components to the polar electrolyte solution, so there will be no residue, no Contamination of the two functional solutions; the thickness of the sealant can be reduced, thereby reducing the thickness of the overall display device, enabling the preparation of ultra-thin displays.
  • FIG. 1 is a cross-sectional structural view of a general electrowetting display device.
  • FIG. 2 is a schematic view showing deformation of a substrate of a general electrowetting display device.
  • Embodiment 3 is a schematic view showing a preparation process of the self-supporting electrowetting display of Embodiment 1.
  • FIG. 4 is a schematic perspective view showing a partial support structure of Embodiment 2.
  • Fig. 5 is a plan view showing a partial support structure of the second embodiment.
  • the preparation of the self-supporting electrowetting display is carried out with reference to the schematic diagram of the preparation process shown in FIG.
  • a conductive layer 8 is prepared on the first transparent substrate 9, and a hydrophobic insulating layer 7 is prepared on the conductive layer 8.
  • the hydrophobic insulating layer 7 may be a single layer structure or an insulating layer +
  • the composite layer structure of the hydrophobic layer, in a preferred embodiment, the hydrophobic insulating layer 7 is a single layer structure, obtained by the following steps: the solution of the hydrophobic insulating layer 7 is applied by spin coating, blade coating, slit coating, Silk screen printing, flexographic printing and the like are applied on the surface of the first light-transmissive substrate 9 with the conductive layer 8 and thermally cured to obtain a hydrophobic insulating layer 7, and the surface of the hydrophobic insulating layer 7 is modified by a reactive ion etching machine.
  • the modification can enable the photoresist material to form a film on the surface of the hydrophobic insulating layer 7 and improve the adhesion on the surface thereof, thereby improving the wettability of the photoresist material on the surface thereof;
  • the photoresist material 6' is uniformly coated on the surface of the hydrophobic insulating layer 7, and the coating method may be any coating method such as spin coating, blade coating, slit coating, etc.; referring to FIG.
  • the first mask 13 placed above the lower substrate and aligned with it, through parallel
  • the outer line 15 illuminates the first mask 13 with a pre-designed pattern of the pixel wall structure, and a portion of the parallel ultraviolet light can be irradiated onto the photoresist material 6' through the first mask 13
  • the exposure is cured; after the exposure is finished, a second layer of photoresist material 12' is applied, the second layer of photoresist material 12' is the same as the first layer of photoresist material 6', and the coating method can be selected by spin coating.
  • any coating method such as blade coating, slit coating, etc., then placing the second mask 14 over the lower substrate and performing alignment, and the second mask 14 has a pattern of support structures corresponding to the position of the pixel wall;
  • the second mask 14 is irradiated, and part of the parallel ultraviolet light can be irradiated onto the photoresist material 12' through the second mask 14 to be exposed and cured; after the exposure is completed, referring to FIG. 3e, development is performed with a high concentration KOH solution.
  • the pixel wall structure 6 and the support structure 12 are obtained. Since the preset patterns on the second mask 14 are all at the position corresponding to the pixel wall 6, the exposure process of the support structure does not affect the non-exposure area of the pixel wall 6.
  • the support structure 12 can be a support column, the support column can be any shape, such as a cylindrical shape or a polygonal column shape; then the lower substrate is placed in a high temperature environment to make the hydrophobic insulation layer 7 The glass transition temperature restores the hydrophobicity of the surface of the hydrophobic insulating layer 7; finally, the non-polar solution 5 is filled in the pixel grid in the environment of the polar electrolyte solution 4 and is composed of the second transparent substrate 1, the conductive layer 2 and the sealant 3.
  • the upper substrate and the lower substrate are aligned and pressed to complete the preparation process of the electrowetting device, and a self-supporting electrowetting display having a structure as shown in FIG. 3f is obtained.
  • the height of the support structure 12 is equal to the upper surface of the pixel wall structure 6.
  • the distance to the upper substrate, that is, the support structure 12 is in contact with the conductive layer 2, serves as a support for the upper and lower substrates, and the electrolyte solution 4 is still a continuous phase in the self-supporting electrowetting display, and the support structure 12 does not act on the electrolyte solution 4.
  • Connectivity has an impact.
  • FIG. 4 is a schematic perspective view of a partial support structure
  • FIG. 5 is a top view of a partial support structure, and the embodiment is substantially the same as Embodiment 1, except that the support structure 12 is disposed at At the intersection of the mutually perpendicular wall surfaces of the pixel wall structure 6, the support structure 12 is a columnar support column, and the material of the support structure 12 is a photoresist material which is more hydrophilic than the pixel wall structure 6.
  • the material of the support structure 12 should be similar in material to the material of the pixel wall structure 6.
  • the material of the support structure 12 can be adjusted according to the requirements of the filling effect of the actual non-polar solution 5.
  • the position and number of support structures 12 can be controlled by the predetermined pattern of the second mask 14 so that the density and layout of the different support structures 12 can be designed for different sizes and different types of devices.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Electrochromic Elements, Electrophoresis, Or Variable Reflection Or Absorption Elements (AREA)

Abstract

一种自支撑的电润湿显示器及其制备方法，在像素墙结构（6）的上表面设有支撑结构（12）。直接将支撑结构制备在像素墙上，不存在支撑结构掉落到像素格内的问题；而且基本没有改变电润湿显示器的基本结构，不会影响显示器件的性能；不需要添加任何成分到极性电解质溶液中，因此就不会有任何成分残留，不会造成两种功能性溶液的污染；可以降低密封胶的厚度，进而降低整体显示器件的厚度，能够实现超薄显示器的制备。

Description

一种自支撑的电润湿显示器及其制备方法
技术领域
本发明涉及电润湿技术领域，具体涉及一种自支撑的电润湿显示器及其制备方法。
背景技术
所谓润湿是指固体表面的一种流体被另一种流体所取代的过程。液体在固体表面能铺展，固液接触面有扩大的趋势，即液体对固体表面的附着力大于其内聚力，就是润湿。液体在固体表面不能铺展，接触面有收缩成球形的趋势，就是不润湿，不润湿就是液体对固体表面的附着力小于其内聚力。
如图1所示，一般电润湿显示器件结构主要包括上下两个基板，其中上基板由上玻璃基板1’、第一电极2’和密封胶3’组成，下基板由下玻璃基板9’、第二电极8’、疏水绝缘层7’（一般为氟化聚合物）、像素墙6’组成。像素墙6’的图案限定了显示器件的像素，像素墙6’之间的区域为显示区域，像素中填充有非极性溶液5’（油墨）和极性溶液4’（电解质溶液）两种不互溶的流体，通过施加电压在极性溶液4’和下基板的第二电极8’来改变电解质溶液4’在疏水绝缘层7’上的亲疏水性，以此来驱动非极性溶液5’的铺展和收缩来达到显示效果。
像素墙6’和非极性溶液5’上方被极性电解质溶液4’覆盖，其中极性溶液4’在电润湿器件中是连续相并没有像非极性溶液5’被分隔开，同时极性溶液4’与第一电极2’相导通。当施加一个电压在第一电极2’和第二电极8’之间时，极性溶液4’在疏水绝缘层7’表面上的润湿性发生变化，由疏水状态变为亲水状态极性极性溶液4’润湿疏水绝缘层7’表面，非极性溶液5’被推挤到像素格内一角，实现打开状态。当撤掉电压时候，极性电解质溶液4恢复在疏水绝缘层表面的疏水性，非极性溶液5’重新铺展，实现关闭过程。以像素大小为150 μm ×150 μm为例，电润湿显示器件中像素墙高度为6 μm，非极性溶液5’的厚度为5.5-6.6 μm，密封胶3’的厚度为40 μm，因此极性电解质溶液4’的厚度也为40μm左右。当施加电压时，非极性溶液5’收缩，高度变为25 μm。参照图2，上基板的第一电极2’距离非极性液体5’的距离在15-40 μm，由于受到外界大气压力的作用，上下基板中心容易发生变形造成第一电极2’与非极性溶液5’接触，造成非极性溶液5’在第一电极2’表面的堆积10’，或造成非极性溶液5’的翻越11’，造成非极性溶液5’在下基板上的堆积，从而造成整个显示器件的失效。因此对于电润湿显示器件亟需一种可以实现对上下基板进行支撑从而解决由于上下基板弯曲变形造成的油墨翻墙或堆积的问题，进而可以实现电润湿显示器件的柔性化。
目前对于这种成盒的显示器件基本都存在上下基板变形造成中间塌陷的风险，如液晶显示面板在制备过程中为了实现高品质的显示效果，需要准确的控制液晶层的厚度才能实现整体液晶层的良好光调节作用，因此就需要添加隔垫物来进行上下基板间距的支撑。例如液晶显示面板中用来作为隔垫物的微球或微棒，微球或微棒被添加在液晶显示面板的上下基板之间，通过微球或微棒的尺寸来实现对上下基板的支撑。但是对于这种通过添加微球或微棒的方法来实现对上下基板支撑的方法并不适用于电润湿显示器件，因为微球或微棒极易掉落到像素格内与非极性溶液接触造成非极性溶液的堆积或翻越像素墙。除此之外，通过把几种紫外光聚合的高分子聚合物和引发剂一起混合在液晶里，再通过紫外光照射的方式形成隔垫物也是液晶显示面板中用来支撑上下基板的方式。这种通过紫外固化方式来制备隔垫物的方法在理论上也可适用于电润湿显示器件，但在实际操作过程中存在以下风险如：紫外光聚合材料或光引发剂能够与非极性溶液互溶或萃取非极性溶液中的彩色溶质；紫外光聚合材料或光引发剂在聚合过程中反应不充分有残留物质在极性电解质溶液中影响其导电性能和极性电解质溶液在加电状态下在疏水绝缘层上的润湿性；聚合过程中需要掩模板来限定聚合物的位置，掩模板的对位精度以及掩模板的厚度和上支撑板1的厚度对紫外光的折射都会对聚合物实际形成的位置产生偏差，从而与非极性溶液形成接触。
目前电润湿显示器件为了解决器件中心塌陷问题可通过增高密封胶的厚度来部分解决，密封胶框的厚度需要远大于上下基板的形变量，但是此方法对于大尺寸显示面板、采用超薄玻璃作为上下基板电润湿器件或者柔性器件仍存在塌陷问题。
发明内容
本发明所要解决的技术问题是提供一种自支撑的电润湿显示器及其制备方法。
本发明所采取的技术方案是：
一种电润湿显示器件，包括上基板和下基板，所述下基板包括第一透光基板、导电层、疏水绝缘层和像素墙结构，包括像素墙结构的上表面设有支撑结构。
在一些具体的实施方式中，所述支撑结构为多个支撑柱。
在上述方案的优选的实施方式中，所述支撑柱设于像素墙结构各个相互垂直的壁面交汇处。
在上述方案的优选的实施方式中，所述支撑柱为圆柱状或多边形柱状。
在一些具体的实施方式中，所述支撑结构的材料为光刻胶。
在一些具体的实施方式中，所述支撑结构的材料为所述像素墙结构的材料或比所述像素墙结构亲水性更强的材料。
在一些具体的实施方式中，所述支撑结构的高度≤所述像素墙结构上表面至上基板的距离。
本发明还提供了一种如上所述的电润湿显示器件的制备方法，包括在下基板上制备像素墙结构的步骤，还包括在像素墙结构上制备支撑结构的步骤。
在一些具体的实施方式中，所述在像素墙结构上制备支撑结构的步骤是采用光刻工艺制备。
本发明的有益效果是：
针对电润湿显示器容易因上下基板变形导致器件失效的问题，本发明提供了一种自支撑的电润湿显示器及其制备方法，直接将支撑结构制备在像素墙上，不存在支撑结构掉落到像素格内的问题；而且基本没有改变电润湿显示器的基本结构，不会影响显示器件的性能；不需要添加任何成分到极性电解质溶液中，因此就不会有任何成分残留，不会造成两种功能性溶液的污染；可以降低密封胶的厚度，进而降低整体显示器件的厚度，能够实现超薄显示器的制备。
附图说明
图1为一般电润湿显示器件的截面结构图。
图2为一般电润湿显示器件的基板变形示意图。
图3为实施例1的自支撑电润湿显示器的制备过程示意图。
图4为实施例2的部分支撑结构的立体结构示意图。
图5为实施例2的部分支撑结构的俯视图。
具体实施方式
实施例1：
参照图3所示的制备过程示意图，进行自支撑电润湿显示器的制备：
首先，如图3a所示，在第一透光基板9上制备导电层8，在导电层8上制备疏水绝缘层7，所述疏水绝缘层7可为单层结构，也可以为绝缘层+疏水层的复合层结构，在优选的实施方式中，所述疏水绝缘层7为单层结构，通过下列步骤植被得到：将疏水绝缘层7的溶液通过旋涂、刮涂、狭缝涂布、丝印、柔印等方法涂布在带有导电层8的第一透光基板9表面，并进行热固化处理，得到疏水绝缘层7，利用反应离子刻蚀机对疏水绝缘层7表面进行改性，降低表面的疏水性，改性可以让光刻胶材料能够在疏水绝缘层7表面成膜并提高在其表面的粘附力，提高光刻胶材料在其表面的润湿性；参照图3b，将光刻胶材料6’均匀的涂布在疏水绝缘层7的表面，涂布方法可选用旋涂、刮涂、狭缝涂布等任意涂覆方法；参照图3c，将第一掩模板13放置在下基板上方并与其对位，通过平行紫外线15对第一掩模板13进行照射，第一掩模板13上有预先设计好的像素墙结构的图形，部分平行紫外光可穿过第一掩模板13照射到光刻胶材料6’上对其曝光固化；曝光结束后，涂布第二层光刻胶材料12’，所述第二层光刻胶材料12’与第一层光刻胶材料6’相同，涂布方法可选用旋涂、刮涂、狭缝涂布等任意涂覆方法，然后放置第二掩模板14在下基板上方并进行对位，第二掩模板14上有对应像素墙位置的支撑结构的图形；通过平行紫外线15对第二掩模板14进行照射，部分平行紫外光可穿过第二掩模板14照射到光刻胶材料12’上对其曝光固化；曝光结束后，参照图3e，用高浓度KOH溶液进行显影，得到像素墙结构6和支撑结构12，因为第二掩模板14上的预设定图案均在对应像素墙6的位置，因此支撑结构的曝光过程不会对像素墙6非曝光区域产生影响，而且支撑结构12制备于所述像素墙结构6上，支撑结构12可以为支撑柱，所述支撑柱可为任意形状，如圆柱状或多边形柱状；然后将下基板放入高温环境下使疏水绝缘层7达到玻璃化温度恢复疏水绝缘层7表面的疏水性；最后在极性电解质溶液4环境下将非极性溶液5填充在像素格内并将由第二透光基板1、导电层2和密封胶3组成的上基板与下基板进行对位压合，完成电润湿器件的制备过程，得到结构如图3f所示的自支撑电润湿显示器，支撑结构12的高度等于所述像素墙结构6上表面至上基板的距离，也即支撑结构12与导电层2接触，起到上下基板的支撑作用，电解质溶液4在自支撑电润湿显示器中仍然是连续相，支撑结构12不会对电解质溶液4的连通性产生影响。
实施例2：
参照图4和图5，图4为部分支撑结构的立体结构示意图；图5为部分支撑结构的俯视图，本实施例与实施例1基本相同，不同之处在于：所述支撑结构12设于所述像素墙结构6各个相互垂直的壁面交汇处，所述支撑结构12为圆柱状的支撑柱，所述支撑结构12的材料为比所述像素墙结构6亲水性更强的光刻胶材料，所述支撑结构12的材料的性质应当与所述像素墙结构6的材料相近，支撑结构12的材料可根据实际非极性溶液5的填充效果的需求进行调整。支撑结构12的位置和数量可以通过第二掩膜版14的预设图形来控制，因此可以针对不同尺寸和不同类型的器件来设计不同的支撑结构12的密度和布局。

Claims (9)

  1. 一种电润湿显示器件，包括上基板和下基板，所述下基板包括第一透光基板、导电层、疏水绝缘层和像素墙结构，其特征在于，包括像素墙结构的上表面设有支撑结构。
  2. 根据权利要求1所述的电润湿显示器件，其特征在于，所述支撑结构为多个支撑柱。
  3. 根据权利要求2所述的电润湿显示器件，其特征在于，所述支撑柱设于像素墙结构各个相互垂直的壁面交汇处。
  4. 根据权利要求2所述的电润湿显示器件，其特征在于，所述支撑柱为圆柱状或多边形柱状。
  5. 根据权利要求1所述的电润湿显示器件，其特征在于，所述支撑结构的材料为光刻胶。
  6. 根据权利要求1所述的电润湿显示器件，其特征在于，所述支撑结构的材料为所述像素墙结构的材料或比所述像素墙结构亲水性更强的材料。
  7. 根据权利要求1所述的电润湿显示器件，其特征在于，所述支撑结构的高度≤所述像素墙结构上表面至上基板的距离。
  8. 一种权利要求1-7任一项所述的电润湿显示器件的制备方法，包括在下基板上制备像素墙结构的步骤，其特征在于，还包括在像素墙结构上制备支撑结构的步骤。
  9. 根据权利要求8所述的电润湿显示器件的制备方法，其特征在于，所述在像素墙结构上制备支撑结构的步骤是采用光刻工艺制备。
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