WO2018101030A1 - Exhaust gas treatment apparatus, incineration facility, and exhaust gas treatment method - Google Patents

Exhaust gas treatment apparatus, incineration facility, and exhaust gas treatment method Download PDF

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Publication number
WO2018101030A1
WO2018101030A1 PCT/JP2017/040951 JP2017040951W WO2018101030A1 WO 2018101030 A1 WO2018101030 A1 WO 2018101030A1 JP 2017040951 W JP2017040951 W JP 2017040951W WO 2018101030 A1 WO2018101030 A1 WO 2018101030A1
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Prior art keywords
exhaust gas
chemical
gas treatment
supply
supply unit
Prior art date
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PCT/JP2017/040951
Other languages
French (fr)
Japanese (ja)
Inventor
通孝 古林
武 片山
Original Assignee
日立造船株式会社
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Application filed by 日立造船株式会社 filed Critical 日立造船株式会社
Priority to CN201780074663.XA priority Critical patent/CN110022965A/en
Priority to JP2018553755A priority patent/JP6955512B2/en
Publication of WO2018101030A1 publication Critical patent/WO2018101030A1/en
Priority to PH12019501181A priority patent/PH12019501181A1/en

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/46—Removing components of defined structure
    • B01D53/48—Sulfur compounds
    • B01D53/50—Sulfur oxides
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/46—Removing components of defined structure
    • B01D53/64—Heavy metals or compounds thereof, e.g. mercury
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/46—Removing components of defined structure
    • B01D53/68—Halogens or halogen compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/46—Removing components of defined structure
    • B01D53/68—Halogens or halogen compounds
    • B01D53/70—Organic halogen compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
    • B01D53/81—Solid phase processes
    • B01D53/83—Solid phase processes with moving reactants
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F23—COMBUSTION APPARATUS; COMBUSTION PROCESSES
    • F23J—REMOVAL OR TREATMENT OF COMBUSTION PRODUCTS OR COMBUSTION RESIDUES; FLUES 
    • F23J15/00—Arrangements of devices for treating smoke or fumes
    • F23J15/06—Arrangements of devices for treating smoke or fumes of coolers

Definitions

  • the present invention relates to technology for treating exhaust gas and incineration equipment.
  • the present invention is directed to an exhaust gas treatment apparatus, and aims to efficiently perform a desalination treatment and appropriately cope with an abnormal time when the HCl concentration becomes a predetermined value or more.
  • An exhaust gas treatment apparatus includes a dust collector provided in a flue through which exhaust gas flows, and a temperature reducing tower that is provided between the generation source of the exhaust gas and the dust collector in the flue and sprays water into the exhaust gas. And a position between the generation source in the flue and the temperature reducing tower, or a position in the temperature reducing tower as a chemical supply position, and an exhaust gas treatment chemical containing a calcium-based chemical at the chemical supply position.
  • the supply amount of the exhaust gas treatment chemical is increased, or when the HCl concentration is equal to or higher than a predetermined value, the HCl concentration is supplied to the auxiliary supply position by the second chemical supply unit while supplying the exhaust gas treatment chemical.
  • a control unit that increases the supply amount of the exhaust gas treatment chemical to the chemical supply position by the first chemical supply unit more than when the value is less than the predetermined value.
  • the present invention it is possible to efficiently perform desalting and to appropriately cope with an abnormality in which the HCl concentration exceeds a predetermined value using the first drug supply unit or the second drug supply unit.
  • the first drug supply unit and the second drug supply unit share a storage unit that stores a calcium-based drug.
  • the second chemical supply unit supplies the dust collection ash collected by the dust collector as the exhaust gas treatment chemical.
  • An incineration facility includes a combustion chamber for burning waste, a flue for discharging exhaust gas generated in the combustion chamber from the combustion chamber, and the exhaust gas treatment device provided in the flue. .
  • the present invention is also directed to an exhaust gas treatment method in an exhaust gas treatment apparatus.
  • the exhaust gas treatment device is provided between a dust collector provided in a flue through which the exhaust gas flows, and the exhaust gas generation source and the dust collector in the flue, and water is contained in the exhaust gas.
  • a temperature-decreasing tower that sprays the water, a position between the generation source in the flue and the temperature-decreasing tower, or a position in the temperature-decreasing tower as a medicine supply position
  • a second chemical agent capable of supplying an exhaust gas treatment chemical containing a calcium-based chemical to a first chemical supply unit for supplying an exhaust gas treatment chemical containing a gas to an auxiliary supply position between the generation source and the dust collector in the flue
  • the exhaust gas treatment method includes: a) a position between the generation source and the temperature-decreasing tower in the flue, or in the temperature-decreasing tower, the exhaust gas by the first chemical supply unit.
  • the second chemical supply unit supplies the exhaust gas treatment chemical to the auxiliary supply position.
  • FIG. 1 is a diagram showing a configuration of an incineration facility 1 according to the first embodiment of the present invention.
  • the incineration facility 1 is a facility for incinerating waste such as municipal waste.
  • the incineration facility 1 includes a combustion chamber 2, a flue 3, an exhaust gas treatment device 4, an induction fan 51, and a chimney 52.
  • combustion chamber 2 combustion of garbage and combustion of combustible gas generated from the garbage are performed.
  • the flue 3 connects the combustion chamber 2 and the chimney 52.
  • the exhaust gas treatment device 4 and the induction fan 51 are provided in the flue 3.
  • the induction fan 51 discharges exhaust gas (combustion gas) generated in the combustion chamber 2 to the flue 3 and guides it to the chimney 52 through the exhaust gas treatment device 4.
  • the exhaust gas generated from the combustion chamber 2 flows through the flue 3 from the combustion chamber 2 toward the chimney 52, and the exhaust gas treatment device 4 performs a predetermined process on the exhaust gas.
  • the chimney 52 releases exhaust gas to the atmosphere.
  • the flue 3 is indicated by a thick solid line.
  • FIG. 2 is a diagram showing a configuration of the exhaust gas treatment device 4.
  • the exhaust gas treatment device 4 includes a temperature reducing tower 41, a chemical supply unit 42, a dust collector 43, an HCl concentration measurement unit 401, and a control unit 40.
  • a temperature reducing tower 41 and a dust collector 43 are sequentially provided from the combustion chamber 2 toward the chimney 52, that is, from the upstream side to the downstream side in the flow direction of the exhaust gas.
  • a denitration device or the like may be provided between the dust collector 43 and the chimney 52.
  • the temperature reducing tower 41 sprays water into the exhaust gas flowing from the combustion chamber 2 to lower the temperature of the exhaust gas.
  • the temperature of the exhaust gas discharged from the temperature reducing tower 41 is about 170 ° C., for example.
  • the drug supply unit 42 includes a slaked lime storage unit 421, a special auxiliary agent storage unit 422, a first drug pumping unit 423a, a second drug pumping unit 423b, a first drug supply line 424a, and a second drug supply line 424b. And fixed quantity supply parts 425 and 426.
  • the first drug supply line 424a is connected to the first drug pumping part 423a, and the other end is a position P1 between the combustion chamber 2 and the temperature reducing tower 41 in the flue 3 (hereinafter referred to as “drug supply position P1”). ").
  • medical agent pumping part 423a is an air blower, and sends air toward the flue 3 in the 1st chemical
  • One end of the second chemical supply line 424b is connected to the second chemical pumping unit 423b, and the other end is a position P2 between the temperature reducing tower 41 and the dust collector 43 in the flue 3 (hereinafter referred to as “auxiliary supply position P2”). Connected).
  • the second medicine pumping unit 423b is a blower and sends air toward the flue 3 in the second medicine supply line 424b.
  • the slaked lime storage unit 421 stores powdered slaked lime (calcium hydroxide (Ca (OH) 2 )) as a calcium (Ca) -based drug.
  • Slaked lime is a desalting and desulfurizing agent.
  • a fixed amount supply unit 425 is attached to the lower part of the slaked lime storage unit 421.
  • the fixed amount supply unit 425 is, for example, a table feeder having two discharge ports, and the two discharge ports are connected to the first drug supply line 424a and the second drug supply line 424b, respectively.
  • a set amount of slaked lime is taken out (cut out) from the slaked lime storage unit 421 per unit time. Thereby, slaked lime is supplied into the 1st chemical
  • the special auxiliary agent storage unit 422 stores a powdery drug (for example, Bag Ace (registered trademark) or activated carbon manufactured by Hitachi Zosen Corporation, hereinafter referred to as “special auxiliary agent”).
  • a fixed amount supply unit 426 is attached to the lower part of the special auxiliary agent storage unit 422.
  • the fixed amount supply unit 426 has two discharge ports like the fixed amount supply unit 425, and the two discharge ports are connected to the first drug supply line 424a and the second drug supply line 424b, respectively.
  • a set amount of special auxiliary agent is taken out from the special auxiliary agent storage unit 422 per unit time and supplied into the first drug supply line 424a and the second drug supply line 424b.
  • the chemical supply unit 42 configured as described above, it is possible to supply (blow) exhaust gas treatment chemicals including slaked lime and special auxiliary agents into the flue 3 at the chemical supply position P1 and the auxiliary supply position P2.
  • the exhaust gas treatment chemical may include other calcium-based chemicals (calcium-containing chemicals) such as dolomite hydroxide [Ca (OH) 2 .Mg (OH) 2 ] instead of or together with slaked lime (others) The same applies to the embodiment).
  • the first chemical supply unit 42a When the configuration for supplying the exhaust gas treatment chemical to the chemical supply position P1 is called a “first chemical supply unit 42a”, the first chemical supply unit 42a includes the slaked lime storage unit 421, the special auxiliary agent storage unit 422, and the first chemical agent. It includes a pumping unit 423a, a first medicine supply line 424a, and a fixed amount supply unit 425,426.
  • the second chemical supply unit 42b includes a slaked lime storage unit 421, a special auxiliary agent storage unit 422, It includes a second drug pumping unit 423b, a second drug supply line 424b, and a quantitative supply unit 425,426.
  • the slaked lime storage part 421 which stores slaked lime is shared, and the special adjuvant storage part 422 which stores a special adjuvant is also shared.
  • the dust collector 43 is, for example, a filtration type, and removes fly ash contained in the exhaust gas with a filter cloth.
  • the dust collector 43 is also called a bag filter.
  • the exhaust gas treatment chemical supplied by the chemical supply unit 42 is deposited on the filter cloth. When the exhaust gas passes through the filter cloth inside the dust collector 43, a reaction between the harmful substance contained in the exhaust gas and the exhaust gas treatment chemical occurs, and the harmful substance is removed from the exhaust gas. The reaction between the exhaust gas and the exhaust gas treatment chemical also occurs in the flue 3 upstream of the dust collector 43.
  • other types of exhaust gas treatment chemicals such as activated carbon may be supplied in addition to slaked lime. Examples of harmful substances removed by the exhaust gas treatment chemical include hydrogen chloride, sulfur oxides, dioxins, and mercury compounds.
  • fly ash and exhaust gas treatment chemicals including reactants with harmful substances deposited on the filter cloth are wiped out by backwashing using compressed air every predetermined time. Fly ash and exhaust gas treatment chemicals that have been wiped off from the filter cloth are conveyed to a dust collection ash treatment unit (not shown) and treated with, for example, a chelating agent (heavy metal stabilizer). Actually, part of the fly ash and the exhaust gas treatment chemical is also collected in the temperature reducing tower 41 provided between the combustion chamber 2 and the dust collector 43 in the flue 3 and transported to the fly ash treatment unit.
  • the HCl concentration measuring unit 401 is provided in the flue 3 between the combustion chamber 2 and the temperature reducing tower 41 (for example, in the vicinity of the inlet of the temperature reducing tower 41), and uses a laser beam or the like to measure hydrogen chloride in the exhaust gas.
  • the concentration (hereinafter referred to as “HCl concentration”) is measured.
  • the HCl concentration acquired by the HCl concentration measuring unit 401 is output to the control unit 40.
  • the controller 40 controls the drug supply unit 42 based on the HCl concentration.
  • the control unit 40 is also responsible for overall control of the exhaust gas treatment device 4.
  • FIG. 3 is a diagram showing the flow of exhaust gas treatment in the exhaust gas treatment device 4.
  • the HCl concentration measurement unit 401 measures the HCl concentration in the exhaust gas (step S11).
  • the exhaust gas treatment chemical containing slaked lime and special auxiliary agent is supplied to the chemical supply position P1 by the first chemical supply unit 42a (step S12).
  • the supply amount (supply amount per unit time) of the exhaust gas treatment chemical to the chemical supply position P1 can be controlled by adjusting the outputs of the first chemical pumping unit 423a and the quantitative supply units 425 and 426. It is.
  • control unit 40 when the HCl concentration acquired by the HCl concentration measuring unit 401 is higher than a predetermined set value, the supply amount of the exhaust gas treatment chemical to the chemical supply position P1 is increased, and the HCl concentration is set to the predetermined set value. If lower than that, the supply amount of the exhaust gas treatment chemical to the chemical supply position P1 is preferably reduced.
  • a reaction product (CaCl 2 ) of slaked lime and hydrogen chloride is formed on the surface. Since slaked lime flows into the temperature reducing tower 41 together with the exhaust gas, the moisture concentration on the surface of the slaked lime increases. Furthermore, the reactant on the surface having a high solubility in water is dissolved in the water sprayed into the temperature reducing tower 41, that is, is removed from the surface of the slaked lime, and unreacted slaked lime appears on the surface. Thereby, the fall of the reaction rate by the reaction material in the slaked lime surface is suppressed.
  • the efficiency of the desalting reaction is improved (the HCl concentration is reduced with less slaked lime). ) Is possible.
  • the exhaust gas treatment chemical contains another calcium chemical such as dolomite hydroxide, the reaction product with hydrogen chloride formed on the surface of the other calcium chemical is sprayed into the temperature reducing tower 41. And the decrease in reaction rate in the other calcium-based drug is suppressed.
  • the second chemical supply unit 42b supplies the exhaust gas treatment chemical including slaked lime and special auxiliary agent to the auxiliary supply position P2 (step S13).
  • the supply amount of the exhaust gas treatment chemical to the auxiliary supply position P2 can be controlled by adjusting the outputs of the second chemical pumping unit 423b and the quantitative supply units 425 and 426.
  • the control unit 40 the supply amount of the exhaust gas treatment chemical to the auxiliary supply position P2 is increased or decreased based on the HCl concentration.
  • the supply amount of the exhaust gas treatment chemical to the auxiliary supply position P2 by the second chemical supply unit 42b is increased more than when the HCl concentration is less than the predetermined value.
  • the control unit 40 causes the second chemical supply unit 42b to The supply amount of the exhaust gas treatment chemical to the auxiliary supply position P2 is increased.
  • step S13 when the HCl concentration is less than a predetermined value, the supply amount of the exhaust gas treatment chemical to the auxiliary supply position P2 by the second chemical supply unit 42b is 0 and the HCl concentration is equal to or higher than the predetermined value.
  • the supply of the exhaust gas treatment chemical to the auxiliary supply position P2 may be started when an abnormality occurs.
  • step S11 measurement of HCl concentration (step S11), supply of exhaust gas treatment chemical by the first chemical supply unit 42a (step S12), and supply of exhaust gas treatment chemical by the second chemical supply unit 42b (step S12).
  • Step S13) is in principle performed continuously in parallel with each other.
  • the supply of the exhaust gas treatment chemical to the chemical supply position P1 or the auxiliary supply position P2 may be temporarily stopped.
  • FIG. 4 is a diagram showing the relationship between the desalination rate and the equivalence ratio in the exhaust gas treatment apparatuses of the first and second comparative examples.
  • the exhaust gas treatment chemicals are adjusted so that the HCl concentration in the chimney 52 becomes a predetermined value. The supply amount was controlled.
  • the broken line L21 shows the relationship between the desalination rate and the equivalence ratio in the exhaust gas treatment device of the first comparative example
  • the solid line L22 shows the relationship between the desalination rate and the equivalence ratio in the exhaust gas treatment device of the second comparative example.
  • the equivalence ratio is a value of a ratio between the amount of slaked lime actually supplied and the amount of slaked lime theoretically necessary to completely remove hydrogen chloride and sulfur oxide in the exhaust gas. It is an index indicating the degree of excess.
  • the desalination rate is the ratio of the amount of hydrogen chloride removed by the exhaust gas treatment device to the amount of hydrogen chloride before treatment. For example, the desalting rate is obtained by (1- (amount of hydrogen chloride after desalting) / (amount of hydrogen chloride before desalting)).
  • an exhaust gas treatment chemical containing slaked lime is supplied to the chemical supply position P1 between the combustion chamber 2 and the temperature reducing tower 41 by the first chemical supply unit 42a.
  • desalination performance can be improved by using slaked lime efficiently.
  • the running cost can be reduced by the efficient use of slaked lime (reduction in the amount of slaked lime used). The same applies when the exhaust gas treatment chemical contains other calcium-based chemicals.
  • the supply amount of the exhaust gas treatment chemicals by the second chemical supply unit 42 b as well as the first chemical supply unit 42 a is increased at the time when the HCl concentration becomes a predetermined value or more. Accordingly, it is possible to appropriately cope with an abnormality, that is, it is possible to suppress a rapid increase in HCl concentration in a short time, and to stabilize the HCl concentration in the exhaust gas discharged from the chimney 52.
  • the exhaust gas treatment chemical can be efficiently used by controlling the first chemical supply unit 42a and the second chemical supply unit 42b based on the HCl concentration, and the running cost of the exhaust gas treatment device 4 can be reduced.
  • the first chemical supply unit 42a and the second chemical supply unit 42b share the slaked lime storage unit 421 that stores slaked lime, thereby simplifying the structure of the exhaust gas treatment device 4 (special The same applies to the auxiliary agent storage unit 422.)
  • FIG. 5 is a view showing an exhaust gas treatment device 4 according to the second embodiment of the present invention.
  • slaked lime storage units 421a and 421b for storing slaked lime are individually provided, and special auxiliary agent storage for storing special auxiliary agents.
  • the parts 422a and 422b are also provided individually.
  • the chemical supply position P1 is set in the temperature reduction tower 41, and the exhaust gas treatment chemical is supplied into the temperature reduction tower 41 by the first chemical supply unit 42a.
  • Other configurations are the same as those in FIG. 2, and the same reference numerals are given to the same configurations.
  • the first chemical supply unit 42a includes a slaked lime storage unit 421a, a special auxiliary agent storage unit 422a, a first chemical pumping unit 423a, a first chemical supply line 424a, and quantitative supply units 425a and 426a. Including. One end of the first medicine supply line 424a is connected to the first medicine pumping unit 423a, and the other end is connected to the medicine supply position P1.
  • the slaked lime in the slaked lime storage unit 421a is supplied into the first drug supply line 424a through the fixed amount supply unit 425a
  • the special auxiliary agent in the special auxiliary agent storage unit 422a is the first drug through the fixed amount supply unit 426a. It is supplied into the supply line 424a.
  • the exhaust gas treatment chemical containing slaked lime and special auxiliary agent is supplied to the chemical supply position P ⁇ b> 1 in the temperature reducing tower 41.
  • the second drug supply unit 42b includes a slaked lime storage unit 421b, a special auxiliary agent storage unit 422b, a second drug pumping unit 423b, a second drug supply line 424b, and quantitative supply units 425b and 426b.
  • One end of the second drug supply line 424b is connected to the second drug pumping unit 423b, and the other end is connected to the auxiliary supply position P2.
  • the slaked lime in the slaked lime storage unit 421b is supplied into the second drug supply line 424b via the fixed amount supply unit 425b, and the special auxiliary agent in the special auxiliary agent storage unit 422b is supplied to the second drug through the fixed amount supply unit 426b. It is supplied into the supply line 424b.
  • the exhaust gas treatment chemical containing slaked lime and special auxiliary agent is supplied to the auxiliary supply position P ⁇ b> 2 in the flue 3.
  • the supply amount of slaked lime to the drug supply position P1 and the slaked lime to the auxiliary supply position P2 The supply amount can be changed with a higher degree of freedom than the exhaust gas treatment device 4 of FIG. 2 (the same applies to the supply amount of the special auxiliary agent).
  • the supply amount of slaked lime by the first chemical supply unit 42a is larger than the supply amount of slaked lime by the second chemical supply unit 42b in normal times.
  • the chemical supply position P1 may be set upstream of the temperature reducing tower 41 in the flue 3 in the exhaust gas treatment device 4 of FIG.
  • the chemical supply position P ⁇ b> 1 may be set in the temperature reducing tower 41.
  • the HCl concentration is reduced by controlling both the first chemical supply unit 42 a and the second chemical supply unit 42 b based on the HCl concentration acquired by the HCl concentration measurement unit 401. It is possible to appropriately cope with an abnormality that exceeds a predetermined value.
  • a certain amount of exhaust gas treatment chemical is supplied to the chemical supply position P1 by the first chemical supply unit 42a, and only the supply amount of the exhaust gas treatment chemical to the auxiliary supply position P2 by the second chemical supply unit 42b is HCl. It may be controlled based on the concentration.
  • the supply amount of the exhaust gas treatment chemical to the auxiliary supply position P2 by the second chemical supply unit 42b is increased more than when the HCl concentration is less than the predetermined value at an abnormal time when the HCl concentration is equal to or higher than the predetermined value, It becomes possible to deal appropriately.
  • a certain amount of exhaust gas treatment chemical is supplied to the auxiliary supply position P2 by the second chemical supply unit 42b, and only the supply amount of the exhaust gas treatment chemical to the chemical supply position P1 by the first chemical supply unit 42a is based on the HCl concentration. It may be controlled. Also in this case, the first chemical supply is performed when the HCl concentration is less than the predetermined value while supplying the exhaust gas treatment chemical to the auxiliary supply position P2 by the second chemical supply unit 42b at the time of an abnormality in which the HCl concentration becomes a predetermined value or more. The supply amount of the exhaust gas treatment chemical to the chemical supply position P1 by the unit 42a can be increased to appropriately cope with it.
  • the first drug supply unit 42a and the second drug supply unit 42b include a drug storage unit
  • the first drug supply unit 42a and the second drug supply unit 42b are in an abnormal state when the HCl concentration becomes a predetermined value or more. While the exhaust gas treatment chemicals are supplied by both of them, the sum of the supply amounts of the exhaust gas treatment chemicals by both is increased as compared with the normal time when the HCl concentration is less than the predetermined value. This makes it possible to stabilize the HCl concentration in the exhaust gas (the same applies to the exhaust gas treatment device 4 in FIG. 2).
  • FIG. 6 is a view showing an exhaust gas treatment device 4 according to the third embodiment of the present invention.
  • a dust collection ash transport unit 44 is provided instead of the second chemical supply unit 42 b in the exhaust gas treatment device 4 of FIG. 5, and the chemical supply position P ⁇ b> 1 is a temperature reduction in the flue 3. It is set upstream of the tower 41.
  • the dust collection ash transport unit 44 includes an auxiliary path 441, a dust collection ash distribution unit 45, a dust collection ash storage unit 442, a quantitative supply unit 443, a supply conveyor 46, and a chute unit 444.
  • the auxiliary path 441 connects the position between the temperature reducing tower 41 and the dust collector 43 in the flue 3 (that is, the auxiliary supply position P ⁇ b> 2) and the lower portion of the dust collector 43. In FIG. 6, the auxiliary path 441 is indicated by a thin solid line. The auxiliary path 441 is a path different from the flue 3.
  • a dust collection ash distribution unit 45 In the auxiliary path 441, a dust collection ash distribution unit 45, a dust collection ash storage unit 442, a fixed amount supply unit 443, a supply conveyor 46, and a chute unit 444 are provided in order from the dust collector 43 toward the auxiliary supply position P2.
  • the dust collection ash distribution unit 45 collects the fly ash and exhaust gas treatment chemicals (hereinafter collectively referred to as “dust collection ash”) that have been removed from the filter cloth in the dust collector 43 and the dust collection ash storage unit 442 and the dust collection unit. Distribute and supply to the ash treatment unit 49.
  • the dust collection ash distribution unit 45 includes a conveyor 451 and a gate 452.
  • the conveyor 451 is, for example, a flight conveyor (also called a scraper conveyor).
  • the gate 452 is provided in the dust collection ash conveyance path by the conveyor 451.
  • the gate 452 When the amount of dust collection ash stored by the level meter (not shown) in the dust collection ash storage unit 442 is less than a predetermined amount, the gate 452 is opened and the dust collection ash is supplied to the dust collection ash storage unit 442. Is done. When the amount of dust collection ash stored in the dust collection ash storage unit 442 is greater than or equal to a predetermined amount, the gate 452 is closed and the dust collection ash is supplied to the dust collection ash processing unit 49. Thus, in the dust collection ash distribution unit 45, the dust collection ash from the dust collector 43 is collected by opening and closing the gate 452 so that the amount of dust collection ash stored in the dust collection ash storage unit 442 is approximately constant. It is distributed to the storage unit 442 and the dust collection ash processing unit 49.
  • a fixed amount supply unit 443 is attached to the lower part of the dust collection ash storage unit 442.
  • the fixed amount supply unit 443 is, for example, a table feeder, and takes out a set amount of dust collection ash from the dust collection ash storage unit 442 per unit time.
  • the fixed amount supply unit 443 is connected to the supply conveyor 46, and the dust collection ash taken out from the dust collection ash storage unit 442 is supplied into the supply conveyor 46.
  • the supply conveyor 46 is a flight conveyor, for example, and conveys the dust collection ash along a conveyor conveyance path from below the dust collection ash storage unit 442 to above the auxiliary supply position P ⁇ b> 2 in the flue 3.
  • the conveyor conveyance path is a part of the auxiliary path 441 described above.
  • the chute part 444 is provided above the auxiliary supply position P2, and the dust collection ash conveyed by the supply conveyor 46 is supplied to the auxiliary supply position P2 via the chute part 444.
  • the dust collection ash contains the exhaust gas treatment chemical. Therefore, it can be said that the dust collection ash transport unit 44 is a second chemical supply unit capable of supplying an exhaust gas treatment chemical containing slaked lime to the auxiliary supply position P2.
  • the control of the first chemical supply unit 42a and the dust collection ash transport unit 44 by the control unit 40 is the same as the control for the first chemical supply unit 42a and the second chemical supply unit 42b in the exhaust gas treatment device 4 of FIGS. is there. Therefore, when the HCl concentration is equal to or higher than the predetermined value, the supply amount of the dust collection ash to the auxiliary supply position P2 by the dust collection ash transport unit 44 is increased more than when the HCl concentration is less than the predetermined value.
  • the first chemical supply unit 42a is supplied more than when the HCl concentration is less than the predetermined value while supplying the dust collection ash to the auxiliary supply position P2 by the dust collection ash transport unit 44.
  • the amount of the exhaust gas treatment chemical supplied to the chemical supply position P1 is increased.
  • the unused exhaust gas treatment chemical is supplied to the chemical supply position P1 between the combustion chamber 2 and the temperature reducing tower 41 by the first chemical supply unit 42a. .
  • the dust collection ash transport unit 44 supplies dust collection ash containing slaked lime to the auxiliary supply position P2.
  • the first chemical supply unit 42a supplies the exhaust gas treatment chemical by the first chemical supply unit 42a and supplies the dust collection ash by the dust collection ash transport unit 44.
  • Both or one of the supply amount of the exhaust gas treatment chemical by and the supply amount of dust collection ash by the dust collection ash transport unit 44 is increased from the normal time when the HCl concentration is less than a predetermined value. Thereby, it is possible to appropriately cope with an abnormality.
  • the dust collection ash transport unit 44 the dust collection ash may be transported to the auxiliary supply position P2 using a carrier gas such as air.
  • a carrier gas such as air.
  • the chemical supply position P1 may be set in the temperature reduction tower 41, and the exhaust gas treatment chemical may be supplied into the temperature reduction tower 41 by the first chemical supply unit 42a (described later). The same applies to the exhaust gas treatment device 4 of FIGS. 7 and 8).
  • FIG. 7 is a view showing an exhaust gas treatment device 4 according to the fourth embodiment of the present invention.
  • the auxiliary supply position P ⁇ b> 2 in the exhaust gas treatment device 4 of FIG. 6 is upstream of the temperature reduction tower 41 in the flue 3, that is, between the combustion chamber 2 and the temperature reduction tower 41. Is set.
  • Other configurations are the same as those of the exhaust gas treatment apparatus 4 of FIG. 6, and the same components are denoted by the same reference numerals.
  • dust collection ash conveyance part 44 reduces the usage-amount of the waste gas processing chemical
  • both or one of the supply amount of the exhaust gas treatment chemical by the first chemical supply unit 42a and the supply amount of the dust collection ash by the dust collection ash transport unit 44 are changed to the HCl concentration. Is increased from the normal time when it is less than the predetermined value, it is possible to appropriately cope with an abnormal time.
  • the auxiliary supply position P2 On the road 3 it is only necessary to be provided between the combustion chamber 2, which is a source of exhaust gas, and the dust collector 43.
  • FIG. 8 is a view showing an exhaust gas treatment device 4 according to the fifth embodiment of the present invention.
  • two auxiliary supply positions P ⁇ b> 2 are set in the dust collection ash transport unit 44.
  • One auxiliary supply position P ⁇ b> 2 is between the combustion chamber 2 and the temperature reduction tower 41 in the flue 3
  • the other auxiliary supply position P ⁇ b> 2 is between the temperature reduction tower 41 and the dust collector 43.
  • a supply conveyor 47 and a chute 445 are added to the dust collection ash transport unit 44 in FIG. 6.
  • the supply conveyor 47 is connected to a predetermined position of the supply conveyor 46, and continues from the position above the one auxiliary supply position P2.
  • dust ash can be supplied to the one auxiliary supply position P ⁇ b> 2 using a part of the supply conveyor 46, the supply conveyor 47 and the chute 445.
  • Dust ash can be supplied to the other auxiliary supply position P ⁇ b> 2 using the supply conveyor 46 and the chute 444.
  • the dust collection ash transport unit 44 supplies the dust collection ash containing slaked lime to the flue 3 as the second chemical supply unit, whereby the exhaust gas treatment in the first chemical supply unit 42a.
  • the amount of medicine used can be reduced. Further, at the time of an abnormality in which the HCl concentration exceeds a predetermined value, both or one of the supply amount of the exhaust gas treatment chemical by the first chemical supply unit 42a and the supply amount of the dust collection ash by the dust collection ash transport unit 44 are increased. Therefore, it is possible to cope with it appropriately.
  • the HCl concentration measurement unit 401 may be provided in the flue 3 between the temperature reducing tower 41 and the dust collector 43 (for example, at the inlet of the dust collector 43), or may be provided between the dust collector 43 and the chimney 52. .
  • the chimney 52 is usually provided with another HCl concentration measurement unit. However, by providing the HCl concentration measurement unit 401 on the upstream side of the chimney 52, it is possible to quickly cope with fluctuations in the HCl concentration of the exhaust gas. Become. Or supply_amount
  • medical agent may be controlled using the HCl concentration measurement part provided in the chimney 52 (it may be taken as a part of flue).
  • the exhaust gas treatment device 4 may be used in facilities other than the incineration facility 1.

Abstract

The exhaust gas treatment apparatus according to the present invention is provided with: a dust collector provided to a flue; a temperature reduction tower for spraying water into exhaust gas, the temperature reduction tower being provided between the dust collector and a combustion chamber in the flue; a first chemical supply unit for suppling an exhaust gas treatment chemical including a calcium-based chemical to a position between the temperature reduction tower and the combustion chamber in the flue; a second chemical supply unit capable of supplying the exhaust gas treatment chemical including a calcium-based chemical to an auxiliary supply position between the dust collector and the combustion chamber in the flue; an HCl concentration measurement unit for measuring the HCl concentration in the exhaust gas; and a control unit for increasing the amount of the exhaust gas treatment chemical supplied by the first chemical supply unit or the second chemical supply unit to an amount greater than the amount thereof at the time the HCl concentration is less than a predetermined value when the HCl concentration is equal to or greater than the predetermined value. Desalination treatment is thereby performed with good efficiency, and it is possible to appropriately respond in the event of an abnormality in which the HCl concentration is equal to or greater than the predetermined value.

Description

排ガス処理装置、焼却設備および排ガス処理方法Exhaust gas treatment apparatus, incineration equipment, and exhaust gas treatment method
　本発明は、排ガスを処理する技術および焼却設備に関する。 The present invention relates to technology for treating exhaust gas and incineration equipment.
　従来、都市ごみ等の一般廃棄物は、ごみ焼却設備により焼却処理される。焼却処理により発生する排ガスには、煤塵、塩化水素（ＨＣｌ）、硫黄酸化物（ＳＯｘ）、窒素酸化物（ＮＯｘ）、重金属（Ｐｂ、Ｈｇ等）等の有害物質が含まれている。そこで、これらの有害物質を排ガスから除去する処理が排ガス処理装置により行われ、処理済みの排ガスが大気に排出される。例えば、特開平１０－２４２１３号公報（文献１）では、減温塔内に粉末状の消石灰を投入し、消石灰に水分を吸収させて排ガス中の酸性ガスと反応させることにより、脱塩率を向上する手法が開示されている。 Conventionally, municipal waste and other general waste are incinerated by waste incineration equipment. The exhaust gas generated by the incineration process contains harmful substances such as dust, hydrogen chloride (HCl), sulfur oxide (SOx), nitrogen oxide (NOx), heavy metals (Pb, Hg, etc.). Therefore, a treatment for removing these harmful substances from the exhaust gas is performed by the exhaust gas treatment device, and the treated exhaust gas is discharged to the atmosphere. For example, in Japanese Patent Application Laid-Open No. 10-24213 (Reference 1), powdered slaked lime is introduced into a temperature reducing tower, moisture is absorbed into the slaked lime and reacted with the acid gas in the exhaust gas, thereby reducing the desalination rate. Techniques for improving are disclosed.
　ところで、高塩素含有廃棄物が焼却される際に、排ガスのＨＣｌ濃度が一時的に過度に高くなる場合がある。文献１の装置では、このような場合に、ＨＣｌ濃度の上昇を短時間に抑制することができない場合がある。したがって、脱塩処理を効率よく行うとともに、ＨＣｌ濃度が所定値以上となる異常時に適切に対処することが可能な手法が求められている。 By the way, when the high chlorine content waste is incinerated, the HCl concentration of the exhaust gas may temporarily become excessively high. In such a case, the apparatus of Literature 1 may not be able to suppress the increase in HCl concentration in a short time. Therefore, there is a demand for a technique that can efficiently perform desalting and appropriately cope with an abnormality when the HCl concentration exceeds a predetermined value.
　本発明は、排ガス処理装置に向けられており、脱塩処理を効率よく行うとともに、ＨＣｌ濃度が所定値以上となる異常時に適切に対処することを目的としている。 The present invention is directed to an exhaust gas treatment apparatus, and aims to efficiently perform a desalination treatment and appropriately cope with an abnormal time when the HCl concentration becomes a predetermined value or more.
　本発明に係る排ガス処理装置は、排ガスが流れる煙道に設けられる集塵機と、前記煙道において前記排ガスの発生源と前記集塵機との間に設けられ、前記排ガス中に水を噴霧する減温塔と、前記煙道における前記発生源と前記減温塔との間の位置、または、前記減温塔内の位置を薬剤供給位置として、前記薬剤供給位置に、カルシウム系薬剤を含む排ガス処理薬剤を供給する第１薬剤供給部と、前記煙道において前記発生源と前記集塵機との間の補助供給位置に、カルシウム系薬剤を含む排ガス処理薬剤を供給可能である第２薬剤供給部と、前記排ガス中のＨＣｌ濃度を測定するＨＣｌ濃度測定部と、前記ＨＣｌ濃度が所定値以上となる場合に、前記ＨＣｌ濃度が前記所定値未満である時よりも前記第２薬剤供給部による前記補助供給位置への前記排ガス処理薬剤の供給量を増大させる、または、前記ＨＣｌ濃度が所定値以上となる場合に、前記第２薬剤供給部により前記補助供給位置に前記排ガス処理薬剤を供給しつつ、前記ＨＣｌ濃度が前記所定値未満である時よりも前記第１薬剤供給部による前記薬剤供給位置への前記排ガス処理薬剤の供給量を増大させる制御部とを備える。 An exhaust gas treatment apparatus according to the present invention includes a dust collector provided in a flue through which exhaust gas flows, and a temperature reducing tower that is provided between the generation source of the exhaust gas and the dust collector in the flue and sprays water into the exhaust gas. And a position between the generation source in the flue and the temperature reducing tower, or a position in the temperature reducing tower as a chemical supply position, and an exhaust gas treatment chemical containing a calcium-based chemical at the chemical supply position. A first chemical supply unit to supply; a second chemical supply unit capable of supplying an exhaust gas treatment chemical containing a calcium-based chemical to an auxiliary supply position between the generation source and the dust collector in the flue; and the exhaust gas And an auxiliary supply position by the second medicine supply unit when the HCl concentration is lower than the predetermined value when the HCl concentration is equal to or higher than a predetermined value. When the supply amount of the exhaust gas treatment chemical is increased, or when the HCl concentration is equal to or higher than a predetermined value, the HCl concentration is supplied to the auxiliary supply position by the second chemical supply unit while supplying the exhaust gas treatment chemical. And a control unit that increases the supply amount of the exhaust gas treatment chemical to the chemical supply position by the first chemical supply unit more than when the value is less than the predetermined value.
　本発明によれば、脱塩処理を効率よく行うとともに、ＨＣｌ濃度が所定値以上となる異常時に第１薬剤供給部または第２薬剤供給部を用いて適切に対処することができる。 According to the present invention, it is possible to efficiently perform desalting and to appropriately cope with an abnormality in which the HCl concentration exceeds a predetermined value using the first drug supply unit or the second drug supply unit.
　本発明の一の好ましい形態では、前記第１薬剤供給部および前記第２薬剤供給部が、カルシウム系薬剤を貯留する貯留部を共有する。 In one preferred embodiment of the present invention, the first drug supply unit and the second drug supply unit share a storage unit that stores a calcium-based drug.
　本発明の他の好ましい形態では、前記第２薬剤供給部が、前記集塵機にて捕集された集塵灰を前記排ガス処理薬剤として供給する。 In another preferred embodiment of the present invention, the second chemical supply unit supplies the dust collection ash collected by the dust collector as the exhaust gas treatment chemical.
　本発明は、焼却設備にも向けられている。本発明に係る焼却設備は、廃棄物を燃焼させる燃焼室と、前記燃焼室にて発生する排ガスを前記燃焼室から排出する煙道と、前記煙道に設けられる上記の排ガス処理装置とを備える。 The present invention is also directed to an incineration facility. An incineration facility according to the present invention includes a combustion chamber for burning waste, a flue for discharging exhaust gas generated in the combustion chamber from the combustion chamber, and the exhaust gas treatment device provided in the flue. .
　本発明は、排ガス処理装置における排ガス処理方法にも向けられている。本発明に係る排ガス処理方法では、前記排ガス処理装置が、排ガスが流れる煙道に設けられる集塵機と、前記煙道において前記排ガスの発生源と前記集塵機との間に設けられ、前記排ガス中に水を噴霧する減温塔と、前記煙道における前記発生源と前記減温塔との間の位置、または、前記減温塔内の位置を薬剤供給位置として、前記薬剤供給位置に、カルシウム系薬剤を含む排ガス処理薬剤を供給する第１薬剤供給部と、前記煙道において前記発生源と前記集塵機との間の補助供給位置に、カルシウム系薬剤を含む排ガス処理薬剤を供給可能である第２薬剤供給部とを備え、前記排ガス処理方法が、ａ）前記煙道において前記発生源と前記減温塔との間の位置、または、前記減温塔内に、前記第１薬剤供給部により前記排ガス処理薬剤を供給する工程と、ｂ）前記排ガス中のＨＣｌ濃度を測定する工程と、ｃ）前記ＨＣｌ濃度が所定値以上となる場合に、前記ＨＣｌ濃度が前記所定値未満である時よりも前記第２薬剤供給部による前記補助供給位置への前記排ガス処理薬剤の供給量を増大させる、または、前記ＨＣｌ濃度が所定値以上となる場合に、前記第２薬剤供給部により前記補助供給位置に前記排ガス処理薬剤を供給しつつ、前記ＨＣｌ濃度が前記所定値未満である時よりも前記第１薬剤供給部による前記薬剤供給位置への前記排ガス処理薬剤の供給量を増大させる工程とを備える。 The present invention is also directed to an exhaust gas treatment method in an exhaust gas treatment apparatus. In the exhaust gas treatment method according to the present invention, the exhaust gas treatment device is provided between a dust collector provided in a flue through which the exhaust gas flows, and the exhaust gas generation source and the dust collector in the flue, and water is contained in the exhaust gas. A temperature-decreasing tower that sprays the water, a position between the generation source in the flue and the temperature-decreasing tower, or a position in the temperature-decreasing tower as a medicine supply position, A second chemical agent capable of supplying an exhaust gas treatment chemical containing a calcium-based chemical to a first chemical supply unit for supplying an exhaust gas treatment chemical containing a gas to an auxiliary supply position between the generation source and the dust collector in the flue The exhaust gas treatment method includes: a) a position between the generation source and the temperature-decreasing tower in the flue, or in the temperature-decreasing tower, the exhaust gas by the first chemical supply unit. Supply processing chemicals B) measuring the HCl concentration in the exhaust gas; and c) supplying the second chemical more than when the HCl concentration is less than the predetermined value when the HCl concentration is greater than or equal to the predetermined value. When the supply amount of the exhaust gas treatment chemical to the auxiliary supply position by the unit is increased, or when the HCl concentration is equal to or higher than a predetermined value, the second chemical supply unit supplies the exhaust gas treatment chemical to the auxiliary supply position. And a step of increasing the supply amount of the exhaust gas treatment chemical to the chemical supply position by the first chemical supply unit as compared to when the HCl concentration is less than the predetermined value.
　上述の目的および他の目的、特徴、態様および利点は、添付した図面を参照して以下に行うこの発明の詳細な説明により明らかにされる。 The above object and other objects, features, aspects, and advantages will become apparent from the following detailed description of the present invention with reference to the accompanying drawings.
第１実施形態に係る焼却設備の構成を示す図である。It is a figure showing composition of incineration equipment concerning a 1st embodiment. 排ガス処理装置の構成を示す図である。It is a figure which shows the structure of an exhaust gas processing apparatus. 排ガス処理の流れを示す図である。It is a figure which shows the flow of waste gas treatment. 比較例の排ガス処理装置における脱塩率と当量比との関係を示す図である。It is a figure which shows the relationship between the desalination rate and equivalent ratio in the exhaust gas processing apparatus of a comparative example. 第２実施形態に係る排ガス処理装置を示す図である。It is a figure which shows the waste gas processing apparatus which concerns on 2nd Embodiment. 第３実施形態に係る排ガス処理装置を示す図である。It is a figure which shows the waste gas processing apparatus which concerns on 3rd Embodiment. 第４実施形態に係る排ガス処理装置を示す図である。It is a figure which shows the waste gas processing apparatus which concerns on 4th Embodiment. 第５実施形態に係る排ガス処理装置を示す図である。It is a figure which shows the waste gas processing apparatus which concerns on 5th Embodiment.
（第１実施形態）
　図１は、本発明の第１実施形態に係る焼却設備１の構成を示す図である。焼却設備１は、都市ごみ等の廃棄物を焼却処理する設備である。焼却設備１は、燃焼室２と、煙道３と、排ガス処理装置４と、誘引通風機５１と、煙突５２とを備える。燃焼室２では、ごみの燃焼と、ごみから発生した可燃性ガスの燃焼とが行われる。煙道３は、燃焼室２と煙突５２とを接続する。排ガス処理装置４および誘引通風機５１は、煙道３に設けられる。誘引通風機５１は、燃焼室２にて発生する排ガス（燃焼ガス）を煙道３へと排出し、排ガス処理装置４を介して煙突５２へと導く。すなわち、燃焼室２を発生源とする排ガスは、燃焼室２から煙突５２に向かって煙道３内を流れつつ、排ガス処理装置４により排ガスに対して所定の処理が行われる。煙突５２は、排ガスを大気に放出する。図１では、煙道３を太い実線にて示している。 (First embodiment)
FIG. 1 is a diagram showing a configuration of an incineration facility 1 according to the first embodiment of the present invention. The incineration facility 1 is a facility for incinerating waste such as municipal waste. The incineration facility 1 includes a combustion chamber 2, a flue 3, an exhaust gas treatment device 4, an induction fan 51, and a chimney 52. In the combustion chamber 2, combustion of garbage and combustion of combustible gas generated from the garbage are performed. The flue 3 connects the combustion chamber 2 and the chimney 52. The exhaust gas treatment device 4 and the induction fan 51 are provided in the flue 3. The induction fan 51 discharges exhaust gas (combustion gas) generated in the combustion chamber 2 to the flue 3 and guides it to the chimney 52 through the exhaust gas treatment device 4. That is, the exhaust gas generated from the combustion chamber 2 flows through the flue 3 from the combustion chamber 2 toward the chimney 52, and the exhaust gas treatment device 4 performs a predetermined process on the exhaust gas. The chimney 52 releases exhaust gas to the atmosphere. In FIG. 1, the flue 3 is indicated by a thick solid line.
　図２は、排ガス処理装置４の構成を示す図である。排ガス処理装置４は、減温塔４１と、薬剤供給ユニット４２と、集塵機４３と、ＨＣｌ濃度測定部４０１と、制御部４０とを備える。煙道３において、燃焼室２から煙突５２に向かって、すなわち、排ガスの流れ方向における上流側から下流側に向かって、減温塔４１、集塵機４３が順に設けられる。集塵機４３と煙突５２との間には、脱硝装置等が設けられてもよい。 FIG. 2 is a diagram showing a configuration of the exhaust gas treatment device 4. The exhaust gas treatment device 4 includes a temperature reducing tower 41, a chemical supply unit 42, a dust collector 43, an HCl concentration measurement unit 401, and a control unit 40. In the flue 3, a temperature reducing tower 41 and a dust collector 43 are sequentially provided from the combustion chamber 2 toward the chimney 52, that is, from the upstream side to the downstream side in the flow direction of the exhaust gas. A denitration device or the like may be provided between the dust collector 43 and the chimney 52.
　減温塔４１は、燃焼室２から流入する排ガス中に水を噴霧して排ガスの温度を低下させる。減温塔４１から排出される排ガスの温度は、例えば約１７０℃である。薬剤供給ユニット４２は、消石灰貯留部４２１と、特殊助剤貯留部４２２と、第１薬剤圧送部４２３ａと、第２薬剤圧送部４２３ｂと、第１薬剤供給ライン４２４ａと、第２薬剤供給ライン４２４ｂと、定量供給部４２５，４２６とを備える。 The temperature reducing tower 41 sprays water into the exhaust gas flowing from the combustion chamber 2 to lower the temperature of the exhaust gas. The temperature of the exhaust gas discharged from the temperature reducing tower 41 is about 170 ° C., for example. The drug supply unit 42 includes a slaked lime storage unit 421, a special auxiliary agent storage unit 422, a first drug pumping unit 423a, a second drug pumping unit 423b, a first drug supply line 424a, and a second drug supply line 424b. And fixed quantity supply parts 425 and 426.
　第１薬剤供給ライン４２４ａの一端は、第１薬剤圧送部４２３ａに接続され、他端は、煙道３における燃焼室２と減温塔４１との間の位置Ｐ１（以下、「薬剤供給位置Ｐ１」という。）に接続される。第１薬剤圧送部４２３ａは、送風機であり、第１薬剤供給ライン４２４ａ内において空気を煙道３に向かって送る。第２薬剤供給ライン４２４ｂの一端は、第２薬剤圧送部４２３ｂに接続され、他端は、煙道３における減温塔４１と集塵機４３との間の位置Ｐ２（以下、「補助供給位置Ｐ２」という。）に接続される。第２薬剤圧送部４２３ｂは、送風機であり、第２薬剤供給ライン４２４ｂ内において空気を煙道３に向かって送る。 One end of the first drug supply line 424a is connected to the first drug pumping part 423a, and the other end is a position P1 between the combustion chamber 2 and the temperature reducing tower 41 in the flue 3 (hereinafter referred to as “drug supply position P1”). "). The 1st chemical | medical agent pumping part 423a is an air blower, and sends air toward the flue 3 in the 1st chemical | medical agent supply line 424a. One end of the second chemical supply line 424b is connected to the second chemical pumping unit 423b, and the other end is a position P2 between the temperature reducing tower 41 and the dust collector 43 in the flue 3 (hereinafter referred to as “auxiliary supply position P2”). Connected). The second medicine pumping unit 423b is a blower and sends air toward the flue 3 in the second medicine supply line 424b.
　消石灰貯留部４２１は、粉状の消石灰（水酸化カルシウム（Ｃａ（ＯＨ）２））をカルシウム（Ｃａ）系薬剤として貯留する。消石灰は、脱塩および脱硫用の薬剤である。消石灰貯留部４２１の下部には、定量供給部４２５が取り付けられる。定量供給部４２５は、例えば、２つの排出口を有するテーブルフィーダであり、当該２つの排出口は、第１薬剤供給ライン４２４ａおよび第２薬剤供給ライン４２４ｂにそれぞれ接続される。定量供給部４２５の各排出口では、単位時間当たりに設定量の消石灰が消石灰貯留部４２１から取り出される（切り出される）。これにより、第１薬剤供給ライン４２４ａおよび第２薬剤供給ライン４２４ｂ内に消石灰が供給される。 The slaked lime storage unit 421 stores powdered slaked lime (calcium hydroxide (Ca (OH) 2 )) as a calcium (Ca) -based drug. Slaked lime is a desalting and desulfurizing agent. A fixed amount supply unit 425 is attached to the lower part of the slaked lime storage unit 421. The fixed amount supply unit 425 is, for example, a table feeder having two discharge ports, and the two discharge ports are connected to the first drug supply line 424a and the second drug supply line 424b, respectively. At each discharge port of the fixed amount supply unit 425, a set amount of slaked lime is taken out (cut out) from the slaked lime storage unit 421 per unit time. Thereby, slaked lime is supplied into the 1st chemical | medical agent supply line 424a and the 2nd chemical | medical agent supply line 424b.
　特殊助剤貯留部４２２は、粉状の薬剤（例えば、日立造船株式会社製のバグエース（登録商標）や活性炭であり、以下、「特殊助剤」という。）を貯留する。特殊助剤貯留部４２２の下部には、定量供給部４２６が取り付けられる。定量供給部４２６は、定量供給部４２５と同様に２つの排出口を有し、当該２つの排出口は、第１薬剤供給ライン４２４ａおよび第２薬剤供給ライン４２４ｂにそれぞれ接続される。定量供給部４２６の各排出口では、単位時間当たりに設定量の特殊助剤が特殊助剤貯留部４２２から取り出され、第１薬剤供給ライン４２４ａおよび第２薬剤供給ライン４２４ｂ内に供給される。以上の構成の薬剤供給ユニット４２により、消石灰および特殊助剤を含む排ガス処理薬剤を、薬剤供給位置Ｐ１および補助供給位置Ｐ２にて煙道３内に供給する（吹き込む）ことが可能である。排ガス処理薬剤は、消石灰に代えて、または、消石灰と共に、水酸化ドロマイト［Ｃａ（ＯＨ）２・Ｍｇ（ＯＨ）２］等の他のカルシウム系薬剤（カルシウム含有薬剤）を含んでもよい（他の実施形態において同様）。 The special auxiliary agent storage unit 422 stores a powdery drug (for example, Bag Ace (registered trademark) or activated carbon manufactured by Hitachi Zosen Corporation, hereinafter referred to as “special auxiliary agent”). A fixed amount supply unit 426 is attached to the lower part of the special auxiliary agent storage unit 422. The fixed amount supply unit 426 has two discharge ports like the fixed amount supply unit 425, and the two discharge ports are connected to the first drug supply line 424a and the second drug supply line 424b, respectively. At each discharge port of the quantitative supply unit 426, a set amount of special auxiliary agent is taken out from the special auxiliary agent storage unit 422 per unit time and supplied into the first drug supply line 424a and the second drug supply line 424b. With the chemical supply unit 42 configured as described above, it is possible to supply (blow) exhaust gas treatment chemicals including slaked lime and special auxiliary agents into the flue 3 at the chemical supply position P1 and the auxiliary supply position P2. The exhaust gas treatment chemical may include other calcium-based chemicals (calcium-containing chemicals) such as dolomite hydroxide [Ca (OH) 2 .Mg (OH) 2 ] instead of or together with slaked lime (others) The same applies to the embodiment).
　薬剤供給位置Ｐ１に排ガス処理薬剤を供給する構成を「第１薬剤供給部４２ａ」と呼ぶと、第１薬剤供給部４２ａは、消石灰貯留部４２１と、特殊助剤貯留部４２２と、第１薬剤圧送部４２３ａと、第１薬剤供給ライン４２４ａと、定量供給部４２５，４２６とを含む。同様に、補助供給位置Ｐ２に排ガス処理薬剤を供給する構成を「第２薬剤供給部４２ｂ」と呼ぶと、第２薬剤供給部４２ｂは、消石灰貯留部４２１と、特殊助剤貯留部４２２と、第２薬剤圧送部４２３ｂと、第２薬剤供給ライン４２４ｂと、定量供給部４２５，４２６とを含む。第１薬剤供給部４２ａおよび第２薬剤供給部４２ｂでは、消石灰を貯留する消石灰貯留部４２１が共有され、特殊助剤を貯留する特殊助剤貯留部４２２も共有される。 When the configuration for supplying the exhaust gas treatment chemical to the chemical supply position P1 is called a “first chemical supply unit 42a”, the first chemical supply unit 42a includes the slaked lime storage unit 421, the special auxiliary agent storage unit 422, and the first chemical agent. It includes a pumping unit 423a, a first medicine supply line 424a, and a fixed amount supply unit 425,426. Similarly, when the configuration for supplying the exhaust gas treatment chemical to the auxiliary supply position P2 is referred to as a “second chemical supply unit 42b”, the second chemical supply unit 42b includes a slaked lime storage unit 421, a special auxiliary agent storage unit 422, It includes a second drug pumping unit 423b, a second drug supply line 424b, and a quantitative supply unit 425,426. In the 1st chemical | medical agent supply part 42a and the 2nd chemical | medical agent supply part 42b, the slaked lime storage part 421 which stores slaked lime is shared, and the special adjuvant storage part 422 which stores a special adjuvant is also shared.
　集塵機４３は、例えば、ろ過式であり、排ガスに含まれる飛灰をろ布により除去する。集塵機４３は、バグフィルタとも呼ばれる。薬剤供給ユニット４２により供給される排ガス処理薬剤は、当該ろ布に堆積する。集塵機４３の内部において、排ガスが当該ろ布を通過する際に、排ガスに含まれる有害物質と、排ガス処理薬剤との反応が生じ、当該有害物質が排ガスから除去される。排ガスと排ガス処理薬剤との反応は、集塵機４３よりも上流側における煙道３内においても生じる。薬剤供給ユニット４２では、消石灰に加えて活性炭等の他の種類の排ガス処理薬剤が供給されてもよい。排ガス処理薬剤により除去される有害物質は、例えば、塩化水素、硫黄酸化物、ダイオキシン類、水銀化合物等である。 The dust collector 43 is, for example, a filtration type, and removes fly ash contained in the exhaust gas with a filter cloth. The dust collector 43 is also called a bag filter. The exhaust gas treatment chemical supplied by the chemical supply unit 42 is deposited on the filter cloth. When the exhaust gas passes through the filter cloth inside the dust collector 43, a reaction between the harmful substance contained in the exhaust gas and the exhaust gas treatment chemical occurs, and the harmful substance is removed from the exhaust gas. The reaction between the exhaust gas and the exhaust gas treatment chemical also occurs in the flue 3 upstream of the dust collector 43. In the chemical supply unit 42, other types of exhaust gas treatment chemicals such as activated carbon may be supplied in addition to slaked lime. Examples of harmful substances removed by the exhaust gas treatment chemical include hydrogen chloride, sulfur oxides, dioxins, and mercury compounds.
　集塵機４３では、所定時間毎に、ろ布に堆積した飛灰および排ガス処理薬剤（有害物質との反応物を含む。）が圧縮空気を利用した逆洗により、払い落とされる。ろ布から払い落とされた飛灰および排ガス処理薬剤は、集塵灰処理部（図示省略）に搬送され、例えばキレート剤（重金属安定剤）により処理される。実際には、煙道３における燃焼室２と集塵機４３との間に設けられる減温塔４１においても、一部の飛灰および排ガス処理薬剤が回収され、飛灰処理部に搬送される。 In the dust collector 43, fly ash and exhaust gas treatment chemicals (including reactants with harmful substances) deposited on the filter cloth are wiped out by backwashing using compressed air every predetermined time. Fly ash and exhaust gas treatment chemicals that have been wiped off from the filter cloth are conveyed to a dust collection ash treatment unit (not shown) and treated with, for example, a chelating agent (heavy metal stabilizer). Actually, part of the fly ash and the exhaust gas treatment chemical is also collected in the temperature reducing tower 41 provided between the combustion chamber 2 and the dust collector 43 in the flue 3 and transported to the fly ash treatment unit.
　ＨＣｌ濃度測定部４０１は、煙道３において燃焼室２と減温塔４１との間（例えば、減温塔４１の入口近傍）に設けられ、レーザ光等を利用して排ガス中の塩化水素の濃度（以下、「ＨＣｌ濃度」という。）を測定する。ＨＣｌ濃度測定部４０１により取得されるＨＣｌ濃度は、制御部４０に出力される。制御部４０は、ＨＣｌ濃度に基づいて薬剤供給ユニット４２を制御する。制御部４０は、排ガス処理装置４の全体制御も担う。 The HCl concentration measuring unit 401 is provided in the flue 3 between the combustion chamber 2 and the temperature reducing tower 41 (for example, in the vicinity of the inlet of the temperature reducing tower 41), and uses a laser beam or the like to measure hydrogen chloride in the exhaust gas. The concentration (hereinafter referred to as “HCl concentration”) is measured. The HCl concentration acquired by the HCl concentration measuring unit 401 is output to the control unit 40. The controller 40 controls the drug supply unit 42 based on the HCl concentration. The control unit 40 is also responsible for overall control of the exhaust gas treatment device 4.
　図３は、排ガス処理装置４における排ガス処理の流れを示す図である。排ガス処理装置４における排ガス処理では、ＨＣｌ濃度測定部４０１により、排ガス中のＨＣｌ濃度が測定される（ステップＳ１１）。また、第１薬剤供給部４２ａにより薬剤供給位置Ｐ１に消石灰および特殊助剤を含む排ガス処理薬剤が供給される（ステップＳ１２）。このとき、薬剤供給位置Ｐ１への排ガス処理薬剤の供給量（単位時間当たりの供給量）は、第１薬剤圧送部４２３ａおよび定量供給部４２５，４２６の出力を調整することにより制御することが可能である。制御部４０では、ＨＣｌ濃度測定部４０１により取得されるＨＣｌ濃度が所定の設定値よりも高い場合に、薬剤供給位置Ｐ１への排ガス処理薬剤の供給量が増加され、ＨＣｌ濃度が所定の設定値よりも低い場合に、薬剤供給位置Ｐ１への排ガス処理薬剤の供給量が減少されることが好ましい。 FIG. 3 is a diagram showing the flow of exhaust gas treatment in the exhaust gas treatment device 4. In the exhaust gas treatment in the exhaust gas treatment device 4, the HCl concentration measurement unit 401 measures the HCl concentration in the exhaust gas (step S11). Further, the exhaust gas treatment chemical containing slaked lime and special auxiliary agent is supplied to the chemical supply position P1 by the first chemical supply unit 42a (step S12). At this time, the supply amount (supply amount per unit time) of the exhaust gas treatment chemical to the chemical supply position P1 can be controlled by adjusting the outputs of the first chemical pumping unit 423a and the quantitative supply units 425 and 426. It is. In the control unit 40, when the HCl concentration acquired by the HCl concentration measuring unit 401 is higher than a predetermined set value, the supply amount of the exhaust gas treatment chemical to the chemical supply position P1 is increased, and the HCl concentration is set to the predetermined set value. If lower than that, the supply amount of the exhaust gas treatment chemical to the chemical supply position P1 is preferably reduced.
　薬剤供給位置Ｐ１に供給される消石灰では、その表面において、消石灰と塩化水素との反応物（ＣａＣｌ２）が形成される。消石灰は、排ガスと共に減温塔４１内に流入するため、消石灰表面の水分濃度が高くなる。さらには、水への溶解度が大きい表面の反応物が、減温塔４１内に噴霧される水に溶解して流される、すなわち、消石灰の表面から除去され、未反応の消石灰が表面に表れる。これにより、消石灰表面における反応物による反応速度の低下が抑制される。したがって、煙道３において燃焼室２と減温塔４１との間の薬剤供給位置Ｐ１に消石灰を供給する排ガス処理装置４では、脱塩反応の効率を向上する（少ない消石灰でＨＣｌ濃度を低下させる）ことが可能となる。排ガス処理薬剤が、水酸化ドロマイト等の他のカルシウム系薬剤を含む場合も同様に、当該他のカルシウム系薬剤の表面に形成される塩化水素との反応物は、減温塔４１内に噴霧される水により除去され、当該他のカルシウム系薬剤における反応速度の低下が抑制される。 In the slaked lime supplied to the chemical supply position P1, a reaction product (CaCl 2 ) of slaked lime and hydrogen chloride is formed on the surface. Since slaked lime flows into the temperature reducing tower 41 together with the exhaust gas, the moisture concentration on the surface of the slaked lime increases. Furthermore, the reactant on the surface having a high solubility in water is dissolved in the water sprayed into the temperature reducing tower 41, that is, is removed from the surface of the slaked lime, and unreacted slaked lime appears on the surface. Thereby, the fall of the reaction rate by the reaction material in the slaked lime surface is suppressed. Therefore, in the exhaust gas treatment device 4 that supplies slaked lime to the chemical supply position P1 between the combustion chamber 2 and the temperature reducing tower 41 in the flue 3, the efficiency of the desalting reaction is improved (the HCl concentration is reduced with less slaked lime). ) Is possible. Similarly, when the exhaust gas treatment chemical contains another calcium chemical such as dolomite hydroxide, the reaction product with hydrogen chloride formed on the surface of the other calcium chemical is sprayed into the temperature reducing tower 41. And the decrease in reaction rate in the other calcium-based drug is suppressed.
　ステップＳ１２に並行して、補助供給位置Ｐ２にも第２薬剤供給部４２ｂにより消石灰および特殊助剤を含む排ガス処理薬剤が供給される（ステップＳ１３）。このとき、補助供給位置Ｐ２への排ガス処理薬剤の供給量は、第２薬剤圧送部４２３ｂおよび定量供給部４２５，４２６の出力を調整することにより制御することが可能である。制御部４０では、補助供給位置Ｐ２への排ガス処理薬剤の供給量が上記ＨＣｌ濃度に基づいて増減される。すなわち、ＨＣｌ濃度が所定値以上となる場合に、ＨＣｌ濃度が所定値未満である時よりも第２薬剤供給部４２ｂによる補助供給位置Ｐ２への排ガス処理薬剤の供給量が増大される。特に、高塩素含有廃棄物が焼却された時に排ガス中の塩素濃度が急上昇し、第１薬剤供給部４２ａの制御のみでは対処ができなくなる場合に、制御部４０により、第２薬剤供給部４２ｂによる補助供給位置Ｐ２への排ガス処理薬剤の供給量が増大される。ステップＳ１３では、ＨＣｌ濃度が所定値未満である時を通常時として、通常時に第２薬剤供給部４２ｂによる補助供給位置Ｐ２への排ガス処理薬剤の供給量が０であり、ＨＣｌ濃度が所定値以上となる異常時に補助供給位置Ｐ２への排ガス処理薬剤の供給が開始されてもよい。 In parallel with step S12, the second chemical supply unit 42b supplies the exhaust gas treatment chemical including slaked lime and special auxiliary agent to the auxiliary supply position P2 (step S13). At this time, the supply amount of the exhaust gas treatment chemical to the auxiliary supply position P2 can be controlled by adjusting the outputs of the second chemical pumping unit 423b and the quantitative supply units 425 and 426. In the control unit 40, the supply amount of the exhaust gas treatment chemical to the auxiliary supply position P2 is increased or decreased based on the HCl concentration. That is, when the HCl concentration is equal to or higher than the predetermined value, the supply amount of the exhaust gas treatment chemical to the auxiliary supply position P2 by the second chemical supply unit 42b is increased more than when the HCl concentration is less than the predetermined value. In particular, when high chlorine content waste is incinerated, the chlorine concentration in the exhaust gas rapidly rises, and when the control by the first chemical supply unit 42a cannot be dealt with, the control unit 40 causes the second chemical supply unit 42b to The supply amount of the exhaust gas treatment chemical to the auxiliary supply position P2 is increased. In step S13, when the HCl concentration is less than a predetermined value, the supply amount of the exhaust gas treatment chemical to the auxiliary supply position P2 by the second chemical supply unit 42b is 0 and the HCl concentration is equal to or higher than the predetermined value. The supply of the exhaust gas treatment chemical to the auxiliary supply position P2 may be started when an abnormality occurs.
　図２の排ガス処理装置４では、ＨＣｌ濃度の測定（ステップＳ１１）、第１薬剤供給部４２ａによる排ガス処理薬剤の供給（ステップＳ１２）、および、第２薬剤供給部４２ｂによる排ガス処理薬剤の供給（ステップＳ１３）は、原則として、互いに並行して継続的に行われる。なお、薬剤供給位置Ｐ１または補助供給位置Ｐ２への排ガス処理薬剤の供給は、一時的に停止されてもよい。 In the exhaust gas treatment device 4 of FIG. 2, measurement of HCl concentration (step S11), supply of exhaust gas treatment chemical by the first chemical supply unit 42a (step S12), and supply of exhaust gas treatment chemical by the second chemical supply unit 42b (step S12). Step S13) is in principle performed continuously in parallel with each other. The supply of the exhaust gas treatment chemical to the chemical supply position P1 or the auxiliary supply position P2 may be temporarily stopped.
　ここで、煙道３における燃焼室２と減温塔４１との間の薬剤供給位置Ｐ１のみに排ガス処理薬剤を供給する第１比較例の排ガス処理装置、および、減温塔４１と集塵機４３との間の補助供給位置Ｐ２のみに排ガス処理薬剤を供給する第２比較例の排ガス処理装置を想定する。図４は、第１および第２比較例の排ガス処理装置における脱塩率と当量比との関係を示す図であり、ここでは、煙突５２におけるＨＣｌ濃度が所定値になるように排ガス処理薬剤の供給量を制御した。図４では、破線Ｌ２１が第１比較例の排ガス処理装置における脱塩率と当量比との関係を示し、実線Ｌ２２が第２比較例の排ガス処理装置における脱塩率と当量比との関係を示す。なお、当量比は、実際に供給した消石灰の量と、排ガス中の塩化水素および硫黄酸化物を完全に除去するために理論上必要な消石灰の量との比の値であり、消石灰の供給量の過剰度合いを示す指標である。また、脱塩率は、排ガス処理装置により除去された塩化水素の量の、処理前の塩化水素の量に対する割合である。例えば、脱塩率は、（１－（脱塩後における塩化水素の量）／（脱塩前における塩化水素の量））により求められる。 Here, the exhaust gas treatment device of the first comparative example that supplies the exhaust gas treatment chemical only to the chemical supply position P 1 between the combustion chamber 2 and the temperature reduction tower 41 in the flue 3, the temperature reduction tower 41 and the dust collector 43, Assume an exhaust gas treatment apparatus of a second comparative example that supplies an exhaust gas treatment chemical only to the auxiliary supply position P2 between the two. FIG. 4 is a diagram showing the relationship between the desalination rate and the equivalence ratio in the exhaust gas treatment apparatuses of the first and second comparative examples. Here, the exhaust gas treatment chemicals are adjusted so that the HCl concentration in the chimney 52 becomes a predetermined value. The supply amount was controlled. In FIG. 4, the broken line L21 shows the relationship between the desalination rate and the equivalence ratio in the exhaust gas treatment device of the first comparative example, and the solid line L22 shows the relationship between the desalination rate and the equivalence ratio in the exhaust gas treatment device of the second comparative example. Show. The equivalence ratio is a value of a ratio between the amount of slaked lime actually supplied and the amount of slaked lime theoretically necessary to completely remove hydrogen chloride and sulfur oxide in the exhaust gas. It is an index indicating the degree of excess. The desalination rate is the ratio of the amount of hydrogen chloride removed by the exhaust gas treatment device to the amount of hydrogen chloride before treatment. For example, the desalting rate is obtained by (1- (amount of hydrogen chloride after desalting) / (amount of hydrogen chloride before desalting)).
　第２比較例の排ガス処理装置では、粉末状の消石灰の表面において、消石灰と塩化水素との反応物が形成されるため、塩化水素との新たな反応が生じにくくなる。したがって、所定の脱塩率を得るには、煙道３中に供給する消石灰の量を増加する必要がある。これに対し、第１比較例の排ガス処理装置では、消石灰表面の水分濃度が高くなるため、さらには、消石灰の表面の反応物が、減温塔４１内に噴霧される水により除去されるため、同じ当量比で比較した場合に、第２比較例の排ガス処理装置に比べて、高い脱塩率が得られる。このように、燃焼室２と減温塔４１との間の薬剤供給位置Ｐ１に排ガス処理薬剤を供給することにより、脱塩処理を効率よく行うことが可能である。 In the exhaust gas treatment apparatus of the second comparative example, since a reaction product of slaked lime and hydrogen chloride is formed on the surface of the powdered slaked lime, a new reaction with hydrogen chloride hardly occurs. Therefore, in order to obtain a predetermined desalination rate, it is necessary to increase the amount of slaked lime supplied into the flue 3. On the other hand, in the exhaust gas treatment apparatus of the first comparative example, the moisture concentration on the surface of the slaked lime becomes high, and further, the reactant on the surface of the slaked lime is removed by the water sprayed in the temperature reducing tower 41. When compared with the same equivalent ratio, a higher desalting rate is obtained as compared with the exhaust gas treatment apparatus of the second comparative example. In this way, by supplying the exhaust gas treatment chemical to the chemical supply position P1 between the combustion chamber 2 and the temperature reducing tower 41, it is possible to efficiently perform the desalting treatment.
　図２の排ガス処理装置４では、第１薬剤供給部４２ａにより、燃焼室２と減温塔４１との間の薬剤供給位置Ｐ１に、消石灰を含む排ガス処理薬剤が供給される。これにより、通常時において、消石灰を効率よく用いて脱塩性能を向上させることができる。その結果、排ガス処理装置４を有する焼却設備１では、消石灰の効率的な使用（消石灰の使用量の削減）によりランニングコストを削減することができる。排ガス処理薬剤が、他のカルシウム系薬剤を含む場合も同様である。 In the exhaust gas treatment device 4 of FIG. 2, an exhaust gas treatment chemical containing slaked lime is supplied to the chemical supply position P1 between the combustion chamber 2 and the temperature reducing tower 41 by the first chemical supply unit 42a. Thereby, in normal time, desalination performance can be improved by using slaked lime efficiently. As a result, in the incineration facility 1 having the exhaust gas treatment device 4, the running cost can be reduced by the efficient use of slaked lime (reduction in the amount of slaked lime used). The same applies when the exhaust gas treatment chemical contains other calcium-based chemicals.
　ところで、都市ごみは不均一であり、例えば、高塩素含有のごみ（高塩素含有廃棄物）が燃焼室２内に投入されると、排ガスにおけるＨＣｌ濃度が急激に上昇する。このような場合でも、第１薬剤供給部４２ａに加えて、第２薬剤供給部４２ｂを有する排ガス処理装置４では、ＨＣｌ濃度測定部４０１により取得されるＨＣｌ濃度に基づいて、第１薬剤供給部４２ａおよび第２薬剤供給部４２ｂの双方が制御され、薬剤供給位置Ｐ１および補助供給位置Ｐ２の双方に対する排ガス処理薬剤の供給量が増大される。換言すると、排ガス処理装置４では、ＨＣｌ濃度が所定値以上となる異常時に、第１薬剤供給部４２ａのみならず第２薬剤供給部４２ｂによる排ガス処理薬剤の供給量が増大される。これにより、異常時に適切に対処する、すなわち、ＨＣｌ濃度の急激な上昇を短時間で抑制することが可能となり、煙突５２から排出される排ガス中のＨＣｌ濃度を安定させることができる。 By the way, municipal waste is uneven. For example, when high chlorine content waste (high chlorine content waste) is introduced into the combustion chamber 2, the HCl concentration in the exhaust gas rapidly increases. Even in such a case, in the exhaust gas treatment device 4 having the second drug supply unit 42b in addition to the first drug supply unit 42a, the first drug supply unit is based on the HCl concentration acquired by the HCl concentration measurement unit 401. Both the 42a and the second chemical supply unit 42b are controlled, and the supply amount of the exhaust gas treatment chemical to both the chemical supply position P1 and the auxiliary supply position P2 is increased. In other words, in the exhaust gas treatment device 4, the supply amount of the exhaust gas treatment chemicals by the second chemical supply unit 42 b as well as the first chemical supply unit 42 a is increased at the time when the HCl concentration becomes a predetermined value or more. Accordingly, it is possible to appropriately cope with an abnormality, that is, it is possible to suppress a rapid increase in HCl concentration in a short time, and to stabilize the HCl concentration in the exhaust gas discharged from the chimney 52.
　また、ＨＣｌ濃度に基づく第１薬剤供給部４２ａおよび第２薬剤供給部４２ｂの制御により、排ガス処理薬剤を効率よく使用して、排ガス処理装置４のランニングコストを削減することができる。排ガス処理装置４では、第１薬剤供給部４２ａおよび第２薬剤供給部４２ｂが、消石灰を貯留する消石灰貯留部４２１を共有することにより、排ガス処理装置４の構造を簡素化することができる（特殊助剤貯留部４２２についても同様である。）。 Further, the exhaust gas treatment chemical can be efficiently used by controlling the first chemical supply unit 42a and the second chemical supply unit 42b based on the HCl concentration, and the running cost of the exhaust gas treatment device 4 can be reduced. In the exhaust gas treatment device 4, the first chemical supply unit 42a and the second chemical supply unit 42b share the slaked lime storage unit 421 that stores slaked lime, thereby simplifying the structure of the exhaust gas treatment device 4 (special The same applies to the auxiliary agent storage unit 422.)
（第２実施形態）
　図５は、本発明の第２実施形態に係る排ガス処理装置４を示す図である。図５の排ガス処理装置４では、第１薬剤供給部４２ａおよび第２薬剤供給部４２ｂにおいて、消石灰を貯留する消石灰貯留部４２１ａ，４２１ｂが個別に設けられ、特殊助剤を貯留する特殊助剤貯留部４２２ａ，４２２ｂも個別に設けられる。また、薬剤供給位置Ｐ１が、減温塔４１内に設定され、第１薬剤供給部４２ａにより減温塔４１内に排ガス処理薬剤が供給される。他の構成は、図２と同様であり、同じ構成に同じ符号を付す。 (Second Embodiment)
FIG. 5 is a view showing an exhaust gas treatment device 4 according to the second embodiment of the present invention. In the exhaust gas treatment device 4 of FIG. 5, in the first chemical supply unit 42a and the second chemical supply unit 42b, slaked lime storage units 421a and 421b for storing slaked lime are individually provided, and special auxiliary agent storage for storing special auxiliary agents. The parts 422a and 422b are also provided individually. Further, the chemical supply position P1 is set in the temperature reduction tower 41, and the exhaust gas treatment chemical is supplied into the temperature reduction tower 41 by the first chemical supply unit 42a. Other configurations are the same as those in FIG. 2, and the same reference numerals are given to the same configurations.
　排ガス処理装置４では、第１薬剤供給部４２ａが、消石灰貯留部４２１ａと、特殊助剤貯留部４２２ａと、第１薬剤圧送部４２３ａと、第１薬剤供給ライン４２４ａと、定量供給部４２５ａ，４２６ａとを含む。第１薬剤供給ライン４２４ａの一端は、第１薬剤圧送部４２３ａに接続され、他端は、薬剤供給位置Ｐ１に接続される。消石灰貯留部４２１ａ内の消石灰は、定量供給部４２５ａを介して第１薬剤供給ライン４２４ａ内に供給され、特殊助剤貯留部４２２ａ内の特殊助剤は、定量供給部４２６ａを介して第１薬剤供給ライン４２４ａ内に供給される。これにより、消石灰および特殊助剤を含む排ガス処理薬剤が、減温塔４１内の薬剤供給位置Ｐ１に供給される。 In the exhaust gas treatment device 4, the first chemical supply unit 42a includes a slaked lime storage unit 421a, a special auxiliary agent storage unit 422a, a first chemical pumping unit 423a, a first chemical supply line 424a, and quantitative supply units 425a and 426a. Including. One end of the first medicine supply line 424a is connected to the first medicine pumping unit 423a, and the other end is connected to the medicine supply position P1. The slaked lime in the slaked lime storage unit 421a is supplied into the first drug supply line 424a through the fixed amount supply unit 425a, and the special auxiliary agent in the special auxiliary agent storage unit 422a is the first drug through the fixed amount supply unit 426a. It is supplied into the supply line 424a. As a result, the exhaust gas treatment chemical containing slaked lime and special auxiliary agent is supplied to the chemical supply position P <b> 1 in the temperature reducing tower 41.
　第２薬剤供給部４２ｂは、消石灰貯留部４２１ｂと、特殊助剤貯留部４２２ｂと、第２薬剤圧送部４２３ｂと、第２薬剤供給ライン４２４ｂと、定量供給部４２５ｂ，４２６ｂとを含む。第２薬剤供給ライン４２４ｂの一端は、第２薬剤圧送部４２３ｂに接続され、他端は、補助供給位置Ｐ２に接続される。消石灰貯留部４２１ｂ内の消石灰は、定量供給部４２５ｂを介して第２薬剤供給ライン４２４ｂ内に供給され、特殊助剤貯留部４２２ｂ内の特殊助剤は、定量供給部４２６ｂを介して第２薬剤供給ライン４２４ｂ内に供給される。これにより、消石灰および特殊助剤を含む排ガス処理薬剤が、煙道３内の補助供給位置Ｐ２に供給される。 The second drug supply unit 42b includes a slaked lime storage unit 421b, a special auxiliary agent storage unit 422b, a second drug pumping unit 423b, a second drug supply line 424b, and quantitative supply units 425b and 426b. One end of the second drug supply line 424b is connected to the second drug pumping unit 423b, and the other end is connected to the auxiliary supply position P2. The slaked lime in the slaked lime storage unit 421b is supplied into the second drug supply line 424b via the fixed amount supply unit 425b, and the special auxiliary agent in the special auxiliary agent storage unit 422b is supplied to the second drug through the fixed amount supply unit 426b. It is supplied into the supply line 424b. As a result, the exhaust gas treatment chemical containing slaked lime and special auxiliary agent is supplied to the auxiliary supply position P <b> 2 in the flue 3.
　第１および第２薬剤供給部４２ａ，４２ｂにおいて、消石灰貯留部４２１ａ，４２１ｂが個別に設けられる排ガス処理装置４では、薬剤供給位置Ｐ１への消石灰の供給量と、補助供給位置Ｐ２への消石灰の供給量とを、図２の排ガス処理装置４に比べて、高い自由度で変更することができる（特殊助剤の供給量についても同様である。）。好ましい排ガス処理装置４では、通常時において第１薬剤供給部４２ａによる消石灰の供給量が、第２薬剤供給部４２ｂによる消石灰の供給量よりも多い。なお、図２の排ガス処理装置４と同様に、図５の排ガス処理装置４において薬剤供給位置Ｐ１が、煙道３における減温塔４１よりも上流側に設定されてもよい。また、図２の排ガス処理装置４において、薬剤供給位置Ｐ１が減温塔４１内に設定されてもよい。 In the exhaust gas treatment device 4 in which the slaked lime reservoirs 421a and 421b are individually provided in the first and second drug supply units 42a and 42b, the supply amount of slaked lime to the drug supply position P1 and the slaked lime to the auxiliary supply position P2 The supply amount can be changed with a higher degree of freedom than the exhaust gas treatment device 4 of FIG. 2 (the same applies to the supply amount of the special auxiliary agent). In the preferred exhaust gas treatment device 4, the supply amount of slaked lime by the first chemical supply unit 42a is larger than the supply amount of slaked lime by the second chemical supply unit 42b in normal times. 2, the chemical supply position P1 may be set upstream of the temperature reducing tower 41 in the flue 3 in the exhaust gas treatment device 4 of FIG. In the exhaust gas treatment device 4 of FIG. 2, the chemical supply position P <b> 1 may be set in the temperature reducing tower 41.
　図５の排ガス処理装置４においても、ＨＣｌ濃度測定部４０１により取得されるＨＣｌ濃度に基づいて、第１薬剤供給部４２ａおよび第２薬剤供給部４２ｂの双方が制御されることにより、ＨＣｌ濃度が所定値以上となる異常時に適切に対処することができる。排ガス処理装置４では、第１薬剤供給部４２ａにより薬剤供給位置Ｐ１に一定量の排ガス処理薬剤が供給され、第２薬剤供給部４２ｂによる補助供給位置Ｐ２への排ガス処理薬剤の供給量のみがＨＣｌ濃度に基づいて制御されてもよい。この場合も、ＨＣｌ濃度が所定値以上となる異常時に、ＨＣｌ濃度が所定値未満である時よりも第２薬剤供給部４２ｂによる補助供給位置Ｐ２への排ガス処理薬剤の供給量を増大して、適切に対処することが可能となる。 Also in the exhaust gas treatment apparatus 4 of FIG. 5, the HCl concentration is reduced by controlling both the first chemical supply unit 42 a and the second chemical supply unit 42 b based on the HCl concentration acquired by the HCl concentration measurement unit 401. It is possible to appropriately cope with an abnormality that exceeds a predetermined value. In the exhaust gas treatment device 4, a certain amount of exhaust gas treatment chemical is supplied to the chemical supply position P1 by the first chemical supply unit 42a, and only the supply amount of the exhaust gas treatment chemical to the auxiliary supply position P2 by the second chemical supply unit 42b is HCl. It may be controlled based on the concentration. Also in this case, the supply amount of the exhaust gas treatment chemical to the auxiliary supply position P2 by the second chemical supply unit 42b is increased more than when the HCl concentration is less than the predetermined value at an abnormal time when the HCl concentration is equal to or higher than the predetermined value, It becomes possible to deal appropriately.
　また、第２薬剤供給部４２ｂにより補助供給位置Ｐ２に一定量の排ガス処理薬剤が供給され、第１薬剤供給部４２ａによる薬剤供給位置Ｐ１への排ガス処理薬剤の供給量のみがＨＣｌ濃度に基づいて制御されてもよい。この場合も、ＨＣｌ濃度が所定値以上となる異常時に、第２薬剤供給部４２ｂにより補助供給位置Ｐ２に排ガス処理薬剤を供給しつつ、ＨＣｌ濃度が所定値未満である時よりも第１薬剤供給部４２ａによる薬剤供給位置Ｐ１への排ガス処理薬剤の供給量を増大して、適切に対処することが可能となる。第１薬剤供給部４２ａおよび第２薬剤供給部４２ｂが薬剤の貯留部を含む排ガス処理装置４では、ＨＣｌ濃度が所定値以上となる異常時に、第１薬剤供給部４２ａおよび第２薬剤供給部４２ｂの双方による排ガス処理薬剤の供給を行いつつ、ＨＣｌ濃度が所定値未満である通常時よりも、両者による排ガス処理薬剤の供給量の和が増大される。これにより、排ガス中のＨＣｌ濃度を安定させることが可能となる（図２の排ガス処理装置４において同様）。 Further, a certain amount of exhaust gas treatment chemical is supplied to the auxiliary supply position P2 by the second chemical supply unit 42b, and only the supply amount of the exhaust gas treatment chemical to the chemical supply position P1 by the first chemical supply unit 42a is based on the HCl concentration. It may be controlled. Also in this case, the first chemical supply is performed when the HCl concentration is less than the predetermined value while supplying the exhaust gas treatment chemical to the auxiliary supply position P2 by the second chemical supply unit 42b at the time of an abnormality in which the HCl concentration becomes a predetermined value or more. The supply amount of the exhaust gas treatment chemical to the chemical supply position P1 by the unit 42a can be increased to appropriately cope with it. In the exhaust gas treatment device 4 in which the first drug supply unit 42a and the second drug supply unit 42b include a drug storage unit, the first drug supply unit 42a and the second drug supply unit 42b are in an abnormal state when the HCl concentration becomes a predetermined value or more. While the exhaust gas treatment chemicals are supplied by both of them, the sum of the supply amounts of the exhaust gas treatment chemicals by both is increased as compared with the normal time when the HCl concentration is less than the predetermined value. This makes it possible to stabilize the HCl concentration in the exhaust gas (the same applies to the exhaust gas treatment device 4 in FIG. 2).
（第３実施形態）
　図６は、本発明の第３実施形態に係る排ガス処理装置４を示す図である。図６の排ガス処理装置４では、図５の排ガス処理装置４における第２薬剤供給部４２ｂに代えて、集塵灰搬送部４４が設けられるとともに、薬剤供給位置Ｐ１が、煙道３における減温塔４１よりも上流側に設定される。 (Third embodiment)
FIG. 6 is a view showing an exhaust gas treatment device 4 according to the third embodiment of the present invention. In the exhaust gas treatment device 4 of FIG. 6, a dust collection ash transport unit 44 is provided instead of the second chemical supply unit 42 b in the exhaust gas treatment device 4 of FIG. 5, and the chemical supply position P <b> 1 is a temperature reduction in the flue 3. It is set upstream of the tower 41.
　集塵灰搬送部４４は、補助経路４４１と、集塵灰分配部４５と、集塵灰貯留部４４２と、定量供給部４４３と、供給コンベア４６と、シュート部４４４とを備える。補助経路４４１は、煙道３における減温塔４１と集塵機４３との間の位置（すなわち、補助供給位置Ｐ２）と、集塵機４３の下部とを接続する。図６では、補助経路４４１を細い実線にて示している。補助経路４４１は、煙道３とは異なる経路である。補助経路４４１において、集塵機４３から補助供給位置Ｐ２に向かって順に、集塵灰分配部４５、集塵灰貯留部４４２、定量供給部４４３、供給コンベア４６、シュート部４４４が設けられる。 The dust collection ash transport unit 44 includes an auxiliary path 441, a dust collection ash distribution unit 45, a dust collection ash storage unit 442, a quantitative supply unit 443, a supply conveyor 46, and a chute unit 444. The auxiliary path 441 connects the position between the temperature reducing tower 41 and the dust collector 43 in the flue 3 (that is, the auxiliary supply position P <b> 2) and the lower portion of the dust collector 43. In FIG. 6, the auxiliary path 441 is indicated by a thin solid line. The auxiliary path 441 is a path different from the flue 3. In the auxiliary path 441, a dust collection ash distribution unit 45, a dust collection ash storage unit 442, a fixed amount supply unit 443, a supply conveyor 46, and a chute unit 444 are provided in order from the dust collector 43 toward the auxiliary supply position P2.
　集塵灰分配部４５は、集塵機４３において、ろ布から払い落とされた飛灰および排ガス処理薬剤（以下、「集塵灰」と総称する。）を、集塵灰貯留部４４２と、集塵灰処理部４９とに分配供給する。詳細には、集塵灰分配部４５は、コンベア４５１と、ゲート４５２とを有する。コンベア４５１は、例えばフライトコンベア（スクレーパコンベアとも呼ばれる。）である。ゲート４５２は、コンベア４５１による集塵灰の搬送経路に設けられる。集塵灰貯留部４４２におけるレベル計（図示省略）により取得される集塵灰の貯留量が所定量未満である場合に、ゲート４５２が開かれ、集塵灰貯留部４４２に集塵灰が供給される。集塵灰貯留部４４２における集塵灰の貯留量が所定量以上である場合に、ゲート４５２が閉じられ、集塵灰処理部４９に集塵灰が供給される。このように、集塵灰分配部４５では、集塵灰貯留部４４２における集塵灰の貯留量がおよそ一定となるように、集塵機４３からの集塵灰が、ゲート４５２の開閉により集塵灰貯留部４４２と集塵灰処理部４９とに分配される。 The dust collection ash distribution unit 45 collects the fly ash and exhaust gas treatment chemicals (hereinafter collectively referred to as “dust collection ash”) that have been removed from the filter cloth in the dust collector 43 and the dust collection ash storage unit 442 and the dust collection unit. Distribute and supply to the ash treatment unit 49. Specifically, the dust collection ash distribution unit 45 includes a conveyor 451 and a gate 452. The conveyor 451 is, for example, a flight conveyor (also called a scraper conveyor). The gate 452 is provided in the dust collection ash conveyance path by the conveyor 451. When the amount of dust collection ash stored by the level meter (not shown) in the dust collection ash storage unit 442 is less than a predetermined amount, the gate 452 is opened and the dust collection ash is supplied to the dust collection ash storage unit 442. Is done. When the amount of dust collection ash stored in the dust collection ash storage unit 442 is greater than or equal to a predetermined amount, the gate 452 is closed and the dust collection ash is supplied to the dust collection ash processing unit 49. Thus, in the dust collection ash distribution unit 45, the dust collection ash from the dust collector 43 is collected by opening and closing the gate 452 so that the amount of dust collection ash stored in the dust collection ash storage unit 442 is approximately constant. It is distributed to the storage unit 442 and the dust collection ash processing unit 49.
　集塵灰貯留部４４２の下部には、定量供給部４４３が取り付けられる。定量供給部４４３は、例えばテーブルフィーダであり、単位時間当たりに設定量の集塵灰を集塵灰貯留部４４２から取り出す。定量供給部４４３は、供給コンベア４６に接続され、集塵灰貯留部４４２から取り出された集塵灰は、供給コンベア４６内に供給される。供給コンベア４６は、例えばフライトコンベアであり、集塵灰貯留部４４２の下方から煙道３における補助供給位置Ｐ２の上方までのコンベア搬送経路に沿って集塵灰を搬送する。コンベア搬送経路は、既述の補助経路４４１の一部である。シュート部４４４は、補助供給位置Ｐ２の上方に設けられ、供給コンベア４６により搬送された集塵灰が、シュート部４４４を介して補助供給位置Ｐ２に供給される。既述のように、集塵灰は排ガス処理薬剤を含む。したがって、集塵灰搬送部４４は、補助供給位置Ｐ２に、消石灰を含む排ガス処理薬剤を供給可能な第２薬剤供給部であるといえる。 A fixed amount supply unit 443 is attached to the lower part of the dust collection ash storage unit 442. The fixed amount supply unit 443 is, for example, a table feeder, and takes out a set amount of dust collection ash from the dust collection ash storage unit 442 per unit time. The fixed amount supply unit 443 is connected to the supply conveyor 46, and the dust collection ash taken out from the dust collection ash storage unit 442 is supplied into the supply conveyor 46. The supply conveyor 46 is a flight conveyor, for example, and conveys the dust collection ash along a conveyor conveyance path from below the dust collection ash storage unit 442 to above the auxiliary supply position P <b> 2 in the flue 3. The conveyor conveyance path is a part of the auxiliary path 441 described above. The chute part 444 is provided above the auxiliary supply position P2, and the dust collection ash conveyed by the supply conveyor 46 is supplied to the auxiliary supply position P2 via the chute part 444. As described above, the dust collection ash contains the exhaust gas treatment chemical. Therefore, it can be said that the dust collection ash transport unit 44 is a second chemical supply unit capable of supplying an exhaust gas treatment chemical containing slaked lime to the auxiliary supply position P2.
　制御部４０による第１薬剤供給部４２ａおよび集塵灰搬送部４４の制御は、図２および図５の排ガス処理装置４における第１薬剤供給部４２ａおよび第２薬剤供給部４２ｂに対する制御と同様である。したがって、ＨＣｌ濃度が所定値以上となる場合に、ＨＣｌ濃度が所定値未満である時よりも集塵灰搬送部４４による補助供給位置Ｐ２への集塵灰の供給量が増大される。または、ＨＣｌ濃度が所定値以上となる場合に、集塵灰搬送部４４により補助供給位置Ｐ２に集塵灰を供給しつつ、ＨＣｌ濃度が所定値未満である時よりも第１薬剤供給部４２ａによる薬剤供給位置Ｐ１への排ガス処理薬剤の供給量が増大される。 The control of the first chemical supply unit 42a and the dust collection ash transport unit 44 by the control unit 40 is the same as the control for the first chemical supply unit 42a and the second chemical supply unit 42b in the exhaust gas treatment device 4 of FIGS. is there. Therefore, when the HCl concentration is equal to or higher than the predetermined value, the supply amount of the dust collection ash to the auxiliary supply position P2 by the dust collection ash transport unit 44 is increased more than when the HCl concentration is less than the predetermined value. Alternatively, when the HCl concentration is equal to or higher than the predetermined value, the first chemical supply unit 42a is supplied more than when the HCl concentration is less than the predetermined value while supplying the dust collection ash to the auxiliary supply position P2 by the dust collection ash transport unit 44. The amount of the exhaust gas treatment chemical supplied to the chemical supply position P1 is increased.
　以上のように、図６の排ガス処理装置４では、第１薬剤供給部４２ａにより、燃焼室２と減温塔４１との間の薬剤供給位置Ｐ１に、未使用の排ガス処理薬剤が供給される。これにより、通常時において、消石灰を効率よく用いて脱塩性能を向上させることができる。また、集塵灰搬送部４４により、補助供給位置Ｐ２に、消石灰を含む集塵灰が供給される。このように、集塵機４３にて捕集された集塵灰を排ガス処理薬剤として用いることにより、第１薬剤供給部４２ａにおける排ガス処理薬剤の使用量（すなわち、飛灰が混在していない排ガス処理薬剤の使用量）を低減することができる。さらに、ＨＣｌ濃度が所定値以上となる異常時に、第１薬剤供給部４２ａによる排ガス処理薬剤の供給、および、集塵灰搬送部４４による集塵灰の供給を行いつつ、第１薬剤供給部４２ａによる排ガス処理薬剤の供給量、および、集塵灰搬送部４４による集塵灰の供給量の双方または一方が、ＨＣｌ濃度が所定値未満である通常時よりも増大される。これにより、異常時に適切に対処することができる。 As described above, in the exhaust gas treatment device 4 of FIG. 6, the unused exhaust gas treatment chemical is supplied to the chemical supply position P1 between the combustion chamber 2 and the temperature reducing tower 41 by the first chemical supply unit 42a. . Thereby, in normal time, desalination performance can be improved by using slaked lime efficiently. Further, the dust collection ash transport unit 44 supplies dust collection ash containing slaked lime to the auxiliary supply position P2. Thus, by using the dust ash collected by the dust collector 43 as the exhaust gas treatment chemical, the amount of exhaust gas treatment chemical used in the first chemical supply unit 42a (that is, the exhaust gas treatment chemical in which fly ash is not mixed) Use amount) can be reduced. In addition, when the HCl concentration becomes a predetermined value or more, the first chemical supply unit 42a supplies the exhaust gas treatment chemical by the first chemical supply unit 42a and supplies the dust collection ash by the dust collection ash transport unit 44. Both or one of the supply amount of the exhaust gas treatment chemical by and the supply amount of dust collection ash by the dust collection ash transport unit 44 is increased from the normal time when the HCl concentration is less than a predetermined value. Thereby, it is possible to appropriately cope with an abnormality.
　集塵灰搬送部４４では、空気等のキャリアガスを利用して、集塵灰が補助供給位置Ｐ２に搬送されてもよい。また、図６の排ガス処理装置４において、薬剤供給位置Ｐ１が、減温塔４１内に設定され、第１薬剤供給部４２ａにより減温塔４１内に排ガス処理薬剤が供給されてもよい（後述の図７および図８の排ガス処理装置４において同様）。 In the dust collection ash transport unit 44, the dust collection ash may be transported to the auxiliary supply position P2 using a carrier gas such as air. Further, in the exhaust gas treatment device 4 of FIG. 6, the chemical supply position P1 may be set in the temperature reduction tower 41, and the exhaust gas treatment chemical may be supplied into the temperature reduction tower 41 by the first chemical supply unit 42a (described later). The same applies to the exhaust gas treatment device 4 of FIGS. 7 and 8).
（第４実施形態）
　図７は、本発明の第４実施形態に係る排ガス処理装置４を示す図である。図７の排ガス処理装置４では、図６の排ガス処理装置４における補助供給位置Ｐ２が、煙道３における減温塔４１よりも上流側、すなわち、燃焼室２と減温塔４１との間に設定される。他の構成は、図６の排ガス処理装置４と同様であり、同じ構成に同じ符号を付している。 (Fourth embodiment)
FIG. 7 is a view showing an exhaust gas treatment device 4 according to the fourth embodiment of the present invention. In the exhaust gas treatment device 4 of FIG. 7, the auxiliary supply position P <b> 2 in the exhaust gas treatment device 4 of FIG. 6 is upstream of the temperature reduction tower 41 in the flue 3, that is, between the combustion chamber 2 and the temperature reduction tower 41. Is set. Other configurations are the same as those of the exhaust gas treatment apparatus 4 of FIG. 6, and the same components are denoted by the same reference numerals.
　図７の排ガス処理装置４においても、第１薬剤供給部４２ａにより、燃焼室２と減温塔４１との間の薬剤供給位置Ｐ１に未使用の排ガス処理薬剤が供給されることにより、通常時において脱塩処理を効率よく行うことができる。また、集塵灰搬送部４４が、第２薬剤供給部として、消石灰を含む集塵灰を煙道３に供給することにより、第１薬剤供給部４２ａにおける排ガス処理薬剤の使用量を低減することができる。さらに、ＨＣｌ濃度が所定値以上となる異常時に、第１薬剤供給部４２ａによる排ガス処理薬剤の供給量、および、集塵灰搬送部４４による集塵灰の供給量の双方または一方を、ＨＣｌ濃度が所定値未満である通常時よりも増大することにより、異常時に適切に対処することができる。図２、並びに、図５ないし図７を参照して説明したように、ＨＣｌ濃度が所定値以上となる異常時に、ＨＣｌ濃度の急激な上昇を抑制するという観点では、補助供給位置Ｐ２は、煙道３において、排ガスの発生源である燃焼室２と集塵機４３との間に設けられていればよい。 Also in the exhaust gas treatment device 4 of FIG. 7, when the unused exhaust gas treatment chemical is supplied to the chemical supply position P1 between the combustion chamber 2 and the temperature reducing tower 41 by the first chemical supply unit 42a, In this case, desalting can be performed efficiently. Moreover, dust collection ash conveyance part 44 reduces the usage-amount of the waste gas processing chemical | medical agent in the 1st chemical | medical agent supply part 42a by supplying the dust collection ash containing slaked lime to the flue 3 as a 2nd chemical | medical agent supply part. Can do. Further, at the time of abnormality when the HCl concentration becomes a predetermined value or more, both or one of the supply amount of the exhaust gas treatment chemical by the first chemical supply unit 42a and the supply amount of the dust collection ash by the dust collection ash transport unit 44 are changed to the HCl concentration. Is increased from the normal time when it is less than the predetermined value, it is possible to appropriately cope with an abnormal time. As described with reference to FIG. 2 and FIG. 5 to FIG. 7, from the viewpoint of suppressing a rapid increase in the HCl concentration at an abnormal time when the HCl concentration exceeds a predetermined value, the auxiliary supply position P2 On the road 3, it is only necessary to be provided between the combustion chamber 2, which is a source of exhaust gas, and the dust collector 43.
（第５実施形態）
　図８は、本発明の第５実施形態に係る排ガス処理装置４を示す図である。図８の排ガス処理装置では、集塵灰搬送部４４において２つの補助供給位置Ｐ２が設定される。一方の補助供給位置Ｐ２は、煙道３における燃焼室２と減温塔４１との間であり、他方の補助供給位置Ｐ２は、減温塔４１と集塵機４３との間である。 (Fifth embodiment)
FIG. 8 is a view showing an exhaust gas treatment device 4 according to the fifth embodiment of the present invention. In the exhaust gas treatment apparatus of FIG. 8, two auxiliary supply positions P <b> 2 are set in the dust collection ash transport unit 44. One auxiliary supply position P <b> 2 is between the combustion chamber 2 and the temperature reduction tower 41 in the flue 3, and the other auxiliary supply position P <b> 2 is between the temperature reduction tower 41 and the dust collector 43.
　図８の集塵灰搬送部４４では、図６の集塵灰搬送部４４に対して、供給コンベア４７およびシュート部４４５が追加される。供給コンベア４７は、供給コンベア４６の所定位置に接続され、当該位置から、上記一方の補助供給位置Ｐ２の上方へと連続する。これにより、上記一方の補助供給位置Ｐ２に、供給コンベア４６の一部、供給コンベア４７およびシュート部４４５を用いて集塵灰が供給可能である。上記他方の補助供給位置Ｐ２には、供給コンベア４６およびシュート部４４４を用いて集塵灰が供給可能である。図８の排ガス処理装置４においても、集塵灰搬送部４４が、第２薬剤供給部として、消石灰を含む集塵灰を煙道３に供給することにより、第１薬剤供給部４２ａにおける排ガス処理薬剤の使用量を低減することができる。また、ＨＣｌ濃度が所定値以上となる異常時に、第１薬剤供給部４２ａによる排ガス処理薬剤の供給量、および、集塵灰搬送部４４による集塵灰の供給量の双方または一方を増大することにより、適切に対処することができる。 8, a supply conveyor 47 and a chute 445 are added to the dust collection ash transport unit 44 in FIG. 6. The supply conveyor 47 is connected to a predetermined position of the supply conveyor 46, and continues from the position above the one auxiliary supply position P2. Thus, dust ash can be supplied to the one auxiliary supply position P <b> 2 using a part of the supply conveyor 46, the supply conveyor 47 and the chute 445. Dust ash can be supplied to the other auxiliary supply position P <b> 2 using the supply conveyor 46 and the chute 444. Also in the exhaust gas treatment device 4 of FIG. 8, the dust collection ash transport unit 44 supplies the dust collection ash containing slaked lime to the flue 3 as the second chemical supply unit, whereby the exhaust gas treatment in the first chemical supply unit 42a. The amount of medicine used can be reduced. Further, at the time of an abnormality in which the HCl concentration exceeds a predetermined value, both or one of the supply amount of the exhaust gas treatment chemical by the first chemical supply unit 42a and the supply amount of the dust collection ash by the dust collection ash transport unit 44 are increased. Therefore, it is possible to cope with it appropriately.
（変形例）
　上記排ガス処理装置の実施形態では様々な変形が可能である。 (Modification)
Various modifications are possible in the embodiment of the exhaust gas treatment apparatus.
　ＨＣｌ濃度測定部４０１は、煙道３において減温塔４１と集塵機４３との間（例えば、集塵機４３の入口）に設けられてもよく、集塵機４３と煙突５２との間に設けられてもよい。煙突５２には、通常、他のＨＣｌ濃度測定部が設けられるが、ＨＣｌ濃度測定部４０１を煙突５２よりも上流側に設けることにより、排ガスのＨＣｌ濃度の変動に迅速に対応することが可能となる。または、煙突５２（煙道の一部と捉えられてもよい。）に設けられるＨＣｌ濃度測定部を用いて排ガス処理薬剤の供給量が制御されてもよい。 The HCl concentration measurement unit 401 may be provided in the flue 3 between the temperature reducing tower 41 and the dust collector 43 (for example, at the inlet of the dust collector 43), or may be provided between the dust collector 43 and the chimney 52. . The chimney 52 is usually provided with another HCl concentration measurement unit. However, by providing the HCl concentration measurement unit 401 on the upstream side of the chimney 52, it is possible to quickly cope with fluctuations in the HCl concentration of the exhaust gas. Become. Or supply_amount | feed_rate of waste gas processing chemical | medical agent may be controlled using the HCl concentration measurement part provided in the chimney 52 (it may be taken as a part of flue).
　排ガス処理装置４は、焼却設備１以外の設備において用いられてもよい。 The exhaust gas treatment device 4 may be used in facilities other than the incineration facility 1.
　上記実施の形態および各変形例における構成は、相互に矛盾しない限り適宜組み合わされてよい。 The configurations in the above embodiment and each modification may be combined as appropriate as long as they do not contradict each other.
　発明を詳細に描写して説明したが、既述の説明は例示的であって限定的なものではない。したがって、本発明の範囲を逸脱しない限り、多数の変形や態様が可能であるといえる。 Although the invention has been described in detail, the above description is illustrative and not restrictive. Therefore, it can be said that many modifications and embodiments are possible without departing from the scope of the present invention.
　１　　焼却設備
　２　　燃焼室
　３　　煙道
　４　　排ガス処理装置
　４０　　制御部
　４１　　減温塔
　４２ａ　　第１薬剤供給部
　４２ｂ　　第２薬剤供給部
　４３　　集塵機
　４４　　集塵灰搬送部
　４０１　　ＨＣｌ濃度測定部
　４２１　　消石灰貯留部
　Ｐ１　　薬剤供給位置
　Ｐ２　　補助供給位置
　Ｓ１１～Ｓ１３　　ステップ DESCRIPTION OF SYMBOLS 1 Incinerator 2 Combustion chamber 3 Flue 4 Exhaust gas treatment apparatus 40 Control part 41 Temperature-reduction tower 42a 1st chemical | medical agent supply part 42b 2nd chemical | medical agent supply part 43 Dust collector 44 Dust collection ash conveyance part 401 HCl concentration measurement part 421 Slaked lime storage part P1 Drug supply position P2 Auxiliary supply position S11 to S13 Steps

Claims (5)

  1. 　排ガス処理装置であって、
    　排ガスが流れる煙道に設けられる集塵機と、
    　前記煙道において前記排ガスの発生源と前記集塵機との間に設けられ、前記排ガス中に水を噴霧する減温塔と、
    　前記煙道における前記発生源と前記減温塔との間の位置、または、前記減温塔内の位置を薬剤供給位置として、前記薬剤供給位置に、カルシウム系薬剤を含む排ガス処理薬剤を供給する第１薬剤供給部と、
    　前記煙道において前記発生源と前記集塵機との間の補助供給位置に、カルシウム系薬剤を含む排ガス処理薬剤を供給可能である第２薬剤供給部と、
    　前記排ガス中のＨＣｌ濃度を測定するＨＣｌ濃度測定部と、
    　前記ＨＣｌ濃度が所定値以上となる場合に、前記ＨＣｌ濃度が前記所定値未満である時よりも前記第２薬剤供給部による前記補助供給位置への前記排ガス処理薬剤の供給量を増大させる、または、前記ＨＣｌ濃度が所定値以上となる場合に、前記第２薬剤供給部により前記補助供給位置に前記排ガス処理薬剤を供給しつつ、前記ＨＣｌ濃度が前記所定値未満である時よりも前記第１薬剤供給部による前記薬剤供給位置への前記排ガス処理薬剤の供給量を増大させる制御部と、
    を備える。     An exhaust gas treatment device,
    A dust collector installed in a flue through which exhaust gas flows;
    A temperature reducing tower that is provided between the generation source of the exhaust gas and the dust collector in the flue, and sprays water into the exhaust gas;
    An exhaust gas treatment chemical containing a calcium-based chemical is supplied to the chemical supply position with the position between the generation source and the temperature reduction tower in the flue or the position in the temperature reduction tower as a chemical supply position. A first drug supply unit;
    A second chemical supply unit capable of supplying an exhaust gas treatment chemical containing a calcium-based chemical to an auxiliary supply position between the generation source and the dust collector in the flue;
    An HCl concentration measuring unit for measuring the HCl concentration in the exhaust gas;
    When the HCl concentration is equal to or higher than a predetermined value, the supply amount of the exhaust gas treatment chemical to the auxiliary supply position by the second chemical supply unit is increased than when the HCl concentration is less than the predetermined value, or When the HCl concentration is equal to or higher than a predetermined value, the first chemical supply unit supplies the exhaust gas treatment chemical to the auxiliary supply position while the HCl concentration is lower than the predetermined value. A control unit for increasing the supply amount of the exhaust gas treatment chemical to the chemical supply position by the chemical supply unit;
    Is provided.
  2. 　請求項１に記載の排ガス処理装置であって、
    　前記第１薬剤供給部および前記第２薬剤供給部が、カルシウム系薬剤を貯留する貯留部を共有する。     The exhaust gas treatment apparatus according to claim 1,
    The first drug supply unit and the second drug supply unit share a storage unit that stores a calcium-based drug.
  3. 　請求項１または２に記載の排ガス処理装置であって、
    　前記第２薬剤供給部が、前記集塵機にて捕集された集塵灰を前記排ガス処理薬剤として供給する。     The exhaust gas treatment apparatus according to claim 1 or 2,
    The second chemical supply unit supplies dust ash collected by the dust collector as the exhaust gas treatment chemical.
  4. 　焼却設備であって、
    　廃棄物を燃焼させる燃焼室と、
    　前記燃焼室にて発生する排ガスを前記燃焼室から排出する煙道と、
    　前記煙道に設けられる請求項１ないし３のいずれかに記載の排ガス処理装置と、
    を備える。     Incineration equipment,
    A combustion chamber for burning waste,
    A flue for discharging exhaust gas generated in the combustion chamber from the combustion chamber;
    The exhaust gas treatment device according to any one of claims 1 to 3, provided in the flue,
    Is provided.
  5. 　排ガス処理装置における排ガス処理方法であって、
    　前記排ガス処理装置が、
    　排ガスが流れる煙道に設けられる集塵機と、
    　前記煙道において前記排ガスの発生源と前記集塵機との間に設けられ、前記排ガス中に水を噴霧する減温塔と、
    　前記煙道における前記発生源と前記減温塔との間の位置、または、前記減温塔内の位置を薬剤供給位置として、前記薬剤供給位置に、カルシウム系薬剤を含む排ガス処理薬剤を供給する第１薬剤供給部と、
    　前記煙道において前記発生源と前記集塵機との間の補助供給位置に、カルシウム系薬剤を含む排ガス処理薬剤を供給可能である第２薬剤供給部と、
    を備え、
    　前記排ガス処理方法が、
    　ａ）前記煙道において前記発生源と前記減温塔との間の位置、または、前記減温塔内に、前記第１薬剤供給部により前記排ガス処理薬剤を供給する工程と、
    　ｂ）前記排ガス中のＨＣｌ濃度を測定する工程と、
    　ｃ）前記ＨＣｌ濃度が所定値以上となる場合に、前記ＨＣｌ濃度が前記所定値未満である時よりも前記第２薬剤供給部による前記補助供給位置への前記排ガス処理薬剤の供給量を増大させる、または、前記ＨＣｌ濃度が所定値以上となる場合に、前記第２薬剤供給部により前記補助供給位置に前記排ガス処理薬剤を供給しつつ、前記ＨＣｌ濃度が前記所定値未満である時よりも前記第１薬剤供給部による前記薬剤供給位置への前記排ガス処理薬剤の供給量を増大させる工程と、
    を備える。     An exhaust gas treatment method in an exhaust gas treatment device,
    The exhaust gas treatment device is
    A dust collector installed in a flue through which exhaust gas flows;
    A temperature reducing tower that is provided between the generation source of the exhaust gas and the dust collector in the flue, and sprays water into the exhaust gas;
    An exhaust gas treatment chemical containing a calcium-based chemical is supplied to the chemical supply position with the position between the generation source and the temperature reduction tower in the flue or the position in the temperature reduction tower as a chemical supply position. A first drug supply unit;
    A second chemical supply unit capable of supplying an exhaust gas treatment chemical containing a calcium-based chemical to an auxiliary supply position between the generation source and the dust collector in the flue;
    With
    The exhaust gas treatment method comprises:
    a) supplying the exhaust gas treatment chemical by the first chemical supply unit into the temperature reduction tower at a position between the generation source and the temperature reduction tower in the flue;
    b) measuring the HCl concentration in the exhaust gas;
    c) When the HCl concentration is equal to or higher than a predetermined value, the supply amount of the exhaust gas treatment chemical to the auxiliary supply position by the second chemical supply unit is increased more than when the HCl concentration is less than the predetermined value. Or, when the HCl concentration is equal to or higher than a predetermined value, the second chemical supply unit supplies the exhaust gas treatment chemical to the auxiliary supply position while the HCl concentration is lower than the predetermined value. Increasing the supply amount of the exhaust gas treatment chemical to the chemical supply position by the first chemical supply unit;
    Is provided.
PCT/JP2017/040951 2016-12-02 2017-11-14 Exhaust gas treatment apparatus, incineration facility, and exhaust gas treatment method WO2018101030A1 (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2022015858A (en) * 2020-07-10 2022-01-21 株式会社タクマ Acid gas removing system, and acid gas removing method

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11248141A (en) * 1998-02-27 1999-09-14 Babcock Hitachi Kk Method for treating burnt exhaust gas
JP2007021442A (en) * 2005-07-20 2007-02-01 Mitsubishi Heavy Ind Ltd Method and facilities for treating exhaust gas
JP2010227749A (en) * 2009-03-26 2010-10-14 Jfe Engineering Corp Method of treating exhaust gas
JP2014100670A (en) * 2012-11-20 2014-06-05 Kurita Water Ind Ltd Method for stable acidic gas treatment and combustion exhaust gas treatment facility
JP2014195790A (en) * 2013-03-29 2014-10-16 Ｊｆｅエンジニアリング株式会社 Exhaust gas treatment method
JP2016140837A (en) * 2015-02-03 2016-08-08 Ｊｆｅエンジニアリング株式会社 Exhaust gas treatment equipment and exhaust gas treatment method

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58132534U (en) * 1982-02-26 1983-09-07 古河鉱業株式会社 Equipment for removing HCl from incinerator exhaust gas
JP3626238B2 (en) * 1995-03-31 2005-03-02 アルストム Method for dry or substantially dry purification of flue gas from waste incineration
JPH1024213A (en) * 1996-07-12 1998-01-27 Hitachi Zosen Corp Incinerator and waste gas treating method therefor
JP2001137644A (en) * 1999-11-15 2001-05-22 Mitsubishi Heavy Ind Ltd System and method for treating main waste gas of sintering machine
JP4015496B2 (en) * 2002-07-29 2007-11-28 三菱重工業株式会社 Exhaust gas treatment equipment
JP3759154B1 (en) * 2005-02-24 2006-03-22 三菱重工業株式会社 Exhaust gas denitration device, integrated filtration dust collector equipped with the device, and exhaust gas treatment facility
US9302218B2 (en) * 2010-03-11 2016-04-05 The Board Of Trustees Of The University Of Illinois Chemically-enhanced sorbent activation process and methods for using same
JP5720455B2 (en) * 2011-07-14 2015-05-20 栗田工業株式会社 Acid gas treatment method
MX2014011720A (en) * 2012-03-30 2016-08-08 Fuel Tech Inc Dry processes, apparatus, compositions and systems for reducing sulfur oxides and hci.
JP5961514B2 (en) * 2012-06-18 2016-08-02 日立造船株式会社 Fly ash circulation type exhaust gas treatment method
US8734747B2 (en) * 2012-09-20 2014-05-27 Mitsubishi Heavy Industries, Ltd. Method and apparatus for treating exhaust gas
JP5991677B2 (en) * 2012-09-24 2016-09-14 三菱重工環境・化学エンジニアリング株式会社 Exhaust gas treatment equipment
JP6351278B2 (en) * 2014-01-31 2018-07-04 三菱日立パワーシステムズ株式会社 Exhaust gas treatment system
JP6254012B2 (en) * 2014-02-24 2017-12-27 三菱日立パワーシステムズ株式会社 Exhaust gas treatment system and exhaust gas treatment method

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11248141A (en) * 1998-02-27 1999-09-14 Babcock Hitachi Kk Method for treating burnt exhaust gas
JP2007021442A (en) * 2005-07-20 2007-02-01 Mitsubishi Heavy Ind Ltd Method and facilities for treating exhaust gas
JP2010227749A (en) * 2009-03-26 2010-10-14 Jfe Engineering Corp Method of treating exhaust gas
JP2014100670A (en) * 2012-11-20 2014-06-05 Kurita Water Ind Ltd Method for stable acidic gas treatment and combustion exhaust gas treatment facility
JP2014195790A (en) * 2013-03-29 2014-10-16 Ｊｆｅエンジニアリング株式会社 Exhaust gas treatment method
JP2016140837A (en) * 2015-02-03 2016-08-08 Ｊｆｅエンジニアリング株式会社 Exhaust gas treatment equipment and exhaust gas treatment method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2022015858A (en) * 2020-07-10 2022-01-21 株式会社タクマ Acid gas removing system, and acid gas removing method

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