JP6955512B2 - Exhaust gas treatment equipment, incinerator and exhaust gas treatment method - Google Patents

Exhaust gas treatment equipment, incinerator and exhaust gas treatment method Download PDF

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JP6955512B2
JP6955512B2 JP2018553755A JP2018553755A JP6955512B2 JP 6955512 B2 JP6955512 B2 JP 6955512B2 JP 2018553755 A JP2018553755 A JP 2018553755A JP 2018553755 A JP2018553755 A JP 2018553755A JP 6955512 B2 JP6955512 B2 JP 6955512B2
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exhaust gas
gas treatment
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flue
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JPWO2018101030A1 (en
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通孝 古林
通孝 古林
武 片山
武 片山
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Hitachi Zosen Corp
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/46—Removing components of defined structure
    • B01D53/48—Sulfur compounds
    • B01D53/50—Sulfur oxides
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/46—Removing components of defined structure
    • B01D53/64—Heavy metals or compounds thereof, e.g. mercury
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/46—Removing components of defined structure
    • B01D53/68—Halogens or halogen compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/46—Removing components of defined structure
    • B01D53/68—Halogens or halogen compounds
    • B01D53/70—Organic halogen compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
    • B01D53/81—Solid phase processes
    • B01D53/83—Solid phase processes with moving reactants
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F23—COMBUSTION APPARATUS; COMBUSTION PROCESSES
    • F23J—REMOVAL OR TREATMENT OF COMBUSTION PRODUCTS OR COMBUSTION RESIDUES; FLUES 
    • F23J15/00—Arrangements of devices for treating smoke or fumes
    • F23J15/06—Arrangements of devices for treating smoke or fumes of coolers

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Health & Medical Sciences (AREA)
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  • Oil, Petroleum & Natural Gas (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Treating Waste Gases (AREA)
  • Waste-Gas Treatment And Other Accessory Devices For Furnaces (AREA)

Description

本発明は、排ガスを処理する技術および焼却設備に関する。 The present invention relates to a technique for treating exhaust gas and an incinerator.

従来、都市ごみ等の一般廃棄物は、ごみ焼却設備により焼却処理される。焼却処理により発生する排ガスには、煤塵、塩化水素（ＨＣｌ）、硫黄酸化物（ＳＯｘ）、窒素酸化物（ＮＯｘ）、重金属（Ｐｂ、Ｈｇ等）等の有害物質が含まれている。そこで、これらの有害物質を排ガスから除去する処理が排ガス処理装置により行われ、処理済みの排ガスが大気に排出される。例えば、特開平１０−２４２１３号公報（文献１）では、減温塔内に粉末状の消石灰を投入し、消石灰に水分を吸収させて排ガス中の酸性ガスと反応させることにより、脱塩率を向上する手法が開示されている。 Conventionally, general waste such as municipal waste is incinerated by a waste incinerator. The exhaust gas generated by the incineration treatment contains harmful substances such as soot, hydrogen chloride (HCl), sulfur oxides (SOx), nitrogen oxides (NOx), and heavy metals (Pb, Hg, etc.). Therefore, a treatment for removing these harmful substances from the exhaust gas is performed by an exhaust gas treatment device, and the treated exhaust gas is discharged to the atmosphere. For example, in Japanese Patent Application Laid-Open No. 10-24213 (Reference 1), powdered slaked lime is put into a temperature reducing tower, and the slaked lime absorbs water and reacts with an acid gas in an exhaust gas to increase the desalination rate. Techniques for improvement are disclosed.

ところで、高塩素含有廃棄物が焼却される際に、排ガスのＨＣｌ濃度が一時的に過度に高くなる場合がある。文献１の装置では、このような場合に、ＨＣｌ濃度の上昇を短時間に抑制することができない場合がある。したがって、脱塩処理を効率よく行うとともに、ＨＣｌ濃度が所定値以上となる異常時に適切に対処することが可能な手法が求められている。 By the way, when the high chlorine-containing waste is incinerated, the HCl concentration of the exhaust gas may temporarily become excessively high. In such a case, the apparatus of Document 1 may not be able to suppress an increase in the HCl concentration in a short time. Therefore, there is a need for a method capable of efficiently performing desalination treatment and appropriately coping with an abnormality in which the HCl concentration exceeds a predetermined value.

本発明は、排ガス処理装置に向けられており、脱塩処理を効率よく行うとともに、ＨＣｌ濃度が所定値以上となる異常時に適切に対処することを目的としている。 The present invention is directed to an exhaust gas treatment apparatus, and an object of the present invention is to efficiently perform desalination treatment and to appropriately deal with an abnormality in which the HCl concentration becomes a predetermined value or more.

本発明に係る排ガス処理装置は、排ガスが流れる煙道に設けられる集塵機と、前記煙道において前記排ガスの発生源と前記集塵機との間に設けられ、前記排ガス中に水を噴霧する減温塔と、前記煙道における前記発生源と前記減温塔との間の位置、または、前記減温塔内の位置を薬剤供給位置として、前記薬剤供給位置に、カルシウム系薬剤を含む排ガス処理薬剤を供給する第１薬剤供給部と、前記集塵機にて捕集された集塵灰を貯留する集塵灰貯留部を有し、前記煙道において前記発生源と前記減温塔との間の補助供給位置に、前記集塵灰貯留部から前記集塵灰を供給可能である第２薬剤供給部と、前記排ガス中のＨＣｌ濃度を測定するＨＣｌ濃度測定部と、前記ＨＣｌ濃度が所定値以上となる場合に、前記ＨＣｌ濃度が前記所定値未満である時よりも前記第２薬剤供給部による前記補助供給位置への前記集塵灰の供給量を増大させる制御部とを備える。 The exhaust gas treatment device according to the present invention is provided between a dust collector provided in a flue through which exhaust gas flows and a temperature reducing tower provided between the source of the exhaust gas and the dust collector in the flue and sprays water into the exhaust gas. An exhaust gas treatment agent containing a calcium-based agent is placed at the agent supply position, with the position between the source and the temperature reducing tower in the flue or the position inside the temperature reducing tower as the agent supply position. It has a first chemical supply unit to be supplied and a dust collection ash storage unit for storing dust collected ash collected by the dust collector , and is an auxiliary supply between the source and the temperature reducing tower in the flue. At the position, the second chemical supply unit capable of supplying the dust collection ash from the dust collection ash storage unit, the HCl concentration measurement unit for measuring the HCl concentration in the exhaust gas, and the HCl concentration become a predetermined value or more. case, and a said HCl concentration is the current increased so Ru control part to supply the amount of Chirihai to the auxiliary supply position by the second agent supply section than when less than the predetermined value.

本発明によれば、脱塩処理を効率よく行うとともに、ＨＣｌ濃度が所定値以上となる異常時に第２薬剤供給部を用いて適切に対処することができる。 According to the present invention, the desalting treatment can be efficiently performed, and when an abnormality in which the HCl concentration becomes a predetermined value or more can be appropriately dealt with by using the second drug supply unit.

本発明の一の好ましい形態では、前記第１薬剤供給部が、カルシウム系薬剤を貯留する貯留部を有する。 In one preferred form of the present invention, the first agent supply section, to have a reservoir for storing the calcium-based agents.

本発明の他の好ましい形態では、前記第２薬剤供給部が、供給コンベアおよびシュート部を用いて、前記減温塔と前記集塵機との間の位置にも前記集塵灰を供給可能であり、前記補助供給位置への前記集塵灰の供給が、前記供給コンベアの一部、他の供給コンベアおよび他のシュート部を用いて行われる。 In another preferred embodiment of the present invention, the second agent supply section, with a feed conveyor and chute state, and are capable of supplying the current Chirihai in position between the dust collector and the reduced cooling tower , the supply of the current Chirihai to the auxiliary supply position, a portion of the supply conveyor, Ru performed using other feed conveyors and other chute.

本発明は、焼却設備にも向けられている。本発明に係る焼却設備は、廃棄物を燃焼させる燃焼室と、前記燃焼室にて発生する排ガスを前記燃焼室から排出する煙道と、前記煙道に設けられる上記の排ガス処理装置とを備える。 The present invention is also directed to incinerator equipment. The incineration facility according to the present invention includes a combustion chamber for burning waste, a flue for discharging exhaust gas generated in the combustion chamber from the combustion chamber, and the exhaust gas treatment device provided in the flue. ..

本発明は、排ガス処理装置における排ガス処理方法にも向けられている。本発明に係る排ガス処理方法では、前記排ガス処理装置が、排ガスが流れる煙道に設けられる集塵機と、前記煙道において前記排ガスの発生源と前記集塵機との間に設けられ、前記排ガス中に水を噴霧する減温塔と、前記煙道における前記発生源と前記減温塔との間の位置、または、前記減温塔内の位置を薬剤供給位置として、前記薬剤供給位置に、カルシウム系薬剤を含む排ガス処理薬剤を供給する第１薬剤供給部と、前記集塵機にて捕集された集塵灰を貯留する集塵灰貯留部を有し、前記煙道において前記発生源と前記減温塔との間の補助供給位置に、前記集塵灰貯留部から前記集塵灰を供給可能である第２薬剤供給部とを備え、前記排ガス処理方法が、ａ）前記煙道において前記発生源と前記減温塔との間の位置、または、前記減温塔内に、前記第１薬剤供給部により前記排ガス処理薬剤を供給する工程と、ｂ）前記排ガス中のＨＣｌ濃度を測定する工程と、ｃ）前記ＨＣｌ濃度が所定値以上となる場合に、前記ＨＣｌ濃度が前記所定値未満である時よりも前記第２薬剤供給部による前記補助供給位置への前記集塵灰の供給量を増大させる工程とを備える。 The present invention is also directed to an exhaust gas treatment method in an exhaust gas treatment device. In the exhaust gas treatment method according to the present invention, the exhaust gas treatment device is provided between a dust collector provided in a flue through which the exhaust gas flows and between the source of the exhaust gas and the dust collector in the flue, and water is contained in the exhaust gas. A calcium-based drug is placed at the drug supply position, with the position between the heat-reducing tower and the source and the heat-reducing tower in the flue, or the position inside the heat-reducing tower as the drug supply position. It has a first chemical supply unit that supplies an exhaust gas treatment chemical containing the above, and a dust collection ash storage unit that stores dust collection ash collected by the dust collector, and has the source and the temperature reducing tower in the flue. A second chemical supply unit capable of supplying the dust collection ash from the dust collection ash storage unit is provided at an auxiliary supply position between the two, and the exhaust gas treatment method is a) the source and the source in the flue. A step of supplying the exhaust gas treating agent by the first chemical supply unit to a position between the temperature reducing tower or the temperature reducing tower, and b) a step of measuring the HCl concentration in the exhaust gas. c) When the HCl concentration is equal to or higher than the predetermined value, the amount of the dust-collected ash supplied to the auxiliary supply position by the second drug supply unit is increased as compared with the case where the HCl concentration is less than the predetermined value. and a that engineering degree.

上述の目的および他の目的、特徴、態様および利点は、添付した図面を参照して以下に行うこの発明の詳細な説明により明らかにされる。 The above objectives and other objectives, features, embodiments and advantages will be manifested in the detailed description of the invention described below with reference to the accompanying drawings.

第１の関連技術に係る焼却設備の構成を示す図である。It is a figure which shows the structure of the incinerator equipment which concerns on the 1st related technology. 排ガス処理装置の構成を示す図である。It is a figure which shows the structure of the exhaust gas treatment apparatus. 排ガス処理の流れを示す図である。It is a figure which shows the flow of the exhaust gas treatment. 比較例の排ガス処理装置における脱塩率と当量比との関係を示す図である。It is a figure which shows the relationship between the desalting rate and the equivalent ratio in the exhaust gas treatment apparatus of a comparative example. 第２の関連技術に係る排ガス処理装置を示す図である。It is a figure which shows the exhaust gas treatment apparatus which concerns on the 2nd related technology. 第３の関連技術に係る排ガス処理装置を示す図である。It is a figure which shows the exhaust gas treatment apparatus which concerns on the 3rd related technology. 第１実施形態に係る排ガス処理装置を示す図である。It is a figure which shows the exhaust gas treatment apparatus which concerns on 1st Embodiment. 第２実施形態に係る排ガス処理装置を示す図である。It is a figure which shows the exhaust gas treatment apparatus which concerns on 2nd Embodiment.

（第１の関連技術）
図１は、本発明の第１の関連技術に係る焼却設備１の構成を示す図である。焼却設備１は、都市ごみ等の廃棄物を焼却処理する設備である。焼却設備１は、燃焼室２と、煙道３と、排ガス処理装置４と、誘引通風機５１と、煙突５２とを備える。燃焼室２では、ごみの燃焼と、ごみから発生した可燃性ガスの燃焼とが行われる。煙道３は、燃焼室２と煙突５２とを接続する。排ガス処理装置４および誘引通風機５１は、煙道３に設けられる。誘引通風機５１は、燃焼室２にて発生する排ガス（燃焼ガス）を煙道３へと排出し、排ガス処理装置４を介して煙突５２へと導く。すなわち、燃焼室２を発生源とする排ガスは、燃焼室２から煙突５２に向かって煙道３内を流れつつ、排ガス処理装置４により排ガスに対して所定の処理が行われる。煙突５２は、排ガスを大気に放出する。図１では、煙道３を太い実線にて示している。 (First related technology )
FIG. 1 is a diagram showing a configuration of an incinerator 1 according to the first related technique of the present invention. The incinerator 1 is an incinerator for incinerating waste such as municipal waste. The incinerator 1 includes a combustion chamber 2, a flue 3, an exhaust gas treatment device 4, an induction ventilator 51, and a chimney 52. In the combustion chamber 2, the combustion of waste and the combustion of combustible gas generated from the waste are performed. The flue 3 connects the combustion chamber 2 and the chimney 52. The exhaust gas treatment device 4 and the induction ventilator 51 are provided in the flue 3. The attraction ventilator 51 discharges the exhaust gas (combustion gas) generated in the combustion chamber 2 to the flue 3 and guides the exhaust gas (combustion gas) to the chimney 52 via the exhaust gas treatment device 4. That is, the exhaust gas originating from the combustion chamber 2 flows through the flue 3 from the combustion chamber 2 toward the chimney 52, and the exhaust gas treatment device 4 performs a predetermined treatment on the exhaust gas. The chimney 52 releases exhaust gas to the atmosphere. In FIG. 1, the flue 3 is shown by a thick solid line.

図２は、排ガス処理装置４の構成を示す図である。排ガス処理装置４は、減温塔４１と、薬剤供給ユニット４２と、集塵機４３と、ＨＣｌ濃度測定部４０１と、制御部４０とを備える。煙道３において、燃焼室２から煙突５２に向かって、すなわち、排ガスの流れ方向における上流側から下流側に向かって、減温塔４１、集塵機４３が順に設けられる。集塵機４３と煙突５２との間には、脱硝装置等が設けられてもよい。 FIG. 2 is a diagram showing the configuration of the exhaust gas treatment device 4. The exhaust gas treatment device 4 includes a temperature reducing tower 41, a chemical supply unit 42, a dust collector 43, an HCl concentration measuring unit 401, and a control unit 40. In the flue 3, the temperature reducing tower 41 and the dust collector 43 are provided in this order from the combustion chamber 2 toward the chimney 52, that is, from the upstream side to the downstream side in the flow direction of the exhaust gas. A denitration device or the like may be provided between the dust collector 43 and the chimney 52.

減温塔４１は、燃焼室２から流入する排ガス中に水を噴霧して排ガスの温度を低下させる。減温塔４１から排出される排ガスの温度は、例えば約１７０℃である。薬剤供給ユニット４２は、消石灰貯留部４２１と、特殊助剤貯留部４２２と、第１薬剤圧送部４２３ａと、第２薬剤圧送部４２３ｂと、第１薬剤供給ライン４２４ａと、第２薬剤供給ライン４２４ｂと、定量供給部４２５，４２６とを備える。 The temperature reducing tower 41 sprays water into the exhaust gas flowing from the combustion chamber 2 to lower the temperature of the exhaust gas. The temperature of the exhaust gas discharged from the temperature reducing tower 41 is, for example, about 170 ° C. The drug supply unit 42 includes a slaked lime storage section 421, a special auxiliary agent storage section 422, a first drug pumping section 423a, a second drug pumping section 423b, a first drug supply line 424a, and a second drug supply line 424b. And the fixed quantity supply units 425 and 426.

第１薬剤供給ライン４２４ａの一端は、第１薬剤圧送部４２３ａに接続され、他端は、煙道３における燃焼室２と減温塔４１との間の位置Ｐ１（以下、「薬剤供給位置Ｐ１」という。）に接続される。第１薬剤圧送部４２３ａは、送風機であり、第１薬剤供給ライン４２４ａ内において空気を煙道３に向かって送る。第２薬剤供給ライン４２４ｂの一端は、第２薬剤圧送部４２３ｂに接続され、他端は、煙道３における減温塔４１と集塵機４３との間の位置Ｐ２（以下、「補助供給位置Ｐ２」という。）に接続される。第２薬剤圧送部４２３ｂは、送風機であり、第２薬剤供給ライン４２４ｂ内において空気を煙道３に向かって送る。 One end of the first drug supply line 424a is connected to the first drug pumping section 423a, and the other end is the position P1 between the combustion chamber 2 and the temperature reducing tower 41 in the flue 3 (hereinafter, “drug supply position P1”). ".) Is connected. The first drug pumping unit 423a is a blower and sends air toward the flue 3 in the first drug supply line 424a. One end of the second drug supply line 424b is connected to the second drug pumping section 423b, and the other end is the position P2 between the temperature reducing tower 41 and the dust collector 43 in the flue 3 (hereinafter, “auxiliary supply position P2””. It is connected to.). The second drug pumping unit 423b is a blower and sends air toward the flue 3 in the second drug supply line 424b.

消石灰貯留部４２１は、粉状の消石灰（水酸化カルシウム（Ｃａ（ＯＨ）２））をカルシウム（Ｃａ）系薬剤として貯留する。消石灰は、脱塩および脱硫用の薬剤である。消石灰貯留部４２１の下部には、定量供給部４２５が取り付けられる。定量供給部４２５は、例えば、２つの排出口を有するテーブルフィーダであり、当該２つの排出口は、第１薬剤供給ライン４２４ａおよび第２薬剤供給ライン４２４ｂにそれぞれ接続される。定量供給部４２５の各排出口では、単位時間当たりに設定量の消石灰が消石灰貯留部４２１から取り出される（切り出される）。これにより、第１薬剤供給ライン４２４ａおよび第２薬剤供給ライン４２４ｂ内に消石灰が供給される。The slaked lime storage unit 421 stores powdered slaked lime (calcium hydroxide (Ca (OH) 2 )) as a calcium (Ca) -based drug. Slaked lime is a chemical for desalination and desulfurization. A fixed quantity supply unit 425 is attached to the lower part of the slaked lime storage unit 421. The fixed quantity supply unit 425 is, for example, a table feeder having two discharge ports, and the two discharge ports are connected to the first drug supply line 424a and the second drug supply line 424b, respectively. At each discharge port of the fixed quantity supply unit 425, a set amount of slaked lime is taken out (cut out) from the slaked lime storage unit 421 per unit time. As a result, slaked lime is supplied into the first drug supply line 424a and the second drug supply line 424b.

特殊助剤貯留部４２２は、粉状の薬剤（例えば、日立造船株式会社製のバグエース（登録商標）や活性炭であり、以下、「特殊助剤」という。）を貯留する。特殊助剤貯留部４２２の下部には、定量供給部４２６が取り付けられる。定量供給部４２６は、定量供給部４２５と同様に２つの排出口を有し、当該２つの排出口は、第１薬剤供給ライン４２４ａおよび第２薬剤供給ライン４２４ｂにそれぞれ接続される。定量供給部４２６の各排出口では、単位時間当たりに設定量の特殊助剤が特殊助剤貯留部４２２から取り出され、第１薬剤供給ライン４２４ａおよび第２薬剤供給ライン４２４ｂ内に供給される。以上の構成の薬剤供給ユニット４２により、消石灰および特殊助剤を含む排ガス処理薬剤を、薬剤供給位置Ｐ１および補助供給位置Ｐ２にて煙道３内に供給する（吹き込む）ことが可能である。排ガス処理薬剤は、消石灰に代えて、または、消石灰と共に、水酸化ドロマイト［Ｃａ（ＯＨ）２・Ｍｇ（ＯＨ）２］等の他のカルシウム系薬剤（カルシウム含有薬剤）を含んでもよい（他の形態において同様）。 The special auxiliary agent storage unit 422 stores powdered chemicals (for example, Bug Ace (registered trademark) or activated carbon manufactured by Hitachi Zosen Corporation, hereinafter referred to as “special auxiliary agent”). A fixed quantity supply unit 426 is attached to the lower part of the special auxiliary agent storage unit 422. The fixed-quantity supply unit 426 has two discharge ports like the fixed-quantity supply unit 425, and the two discharge ports are connected to the first drug supply line 424a and the second drug supply line 424b, respectively. At each discharge port of the fixed quantity supply unit 426, a set amount of the special auxiliary agent is taken out from the special auxiliary agent storage unit 422 per unit time and supplied into the first drug supply line 424a and the second drug supply line 424b. With the drug supply unit 42 having the above configuration, the exhaust gas treatment drug containing slaked lime and a special auxiliary agent can be supplied (blown) into the flue 3 at the drug supply position P1 and the auxiliary supply position P2. The exhaust gas treatment agent may contain other calcium-based agents (calcium-containing agents) such as dolomite hydroxide [Ca (OH) 2 , Mg (OH) 2 ] instead of slaked lime or together with slaked lime (others). similar in shape state).

薬剤供給位置Ｐ１に排ガス処理薬剤を供給する構成を「第１薬剤供給部４２ａ」と呼ぶと、第１薬剤供給部４２ａは、消石灰貯留部４２１と、特殊助剤貯留部４２２と、第１薬剤圧送部４２３ａと、第１薬剤供給ライン４２４ａと、定量供給部４２５，４２６とを含む。同様に、補助供給位置Ｐ２に排ガス処理薬剤を供給する構成を「第２薬剤供給部４２ｂ」と呼ぶと、第２薬剤供給部４２ｂは、消石灰貯留部４２１と、特殊助剤貯留部４２２と、第２薬剤圧送部４２３ｂと、第２薬剤供給ライン４２４ｂと、定量供給部４２５，４２６とを含む。第１薬剤供給部４２ａおよび第２薬剤供給部４２ｂでは、消石灰を貯留する消石灰貯留部４２１が共有され、特殊助剤を貯留する特殊助剤貯留部４２２も共有される。 When the configuration for supplying the exhaust gas treatment drug to the drug supply position P1 is called the "first drug supply section 42a", the first drug supply section 42a includes the slaked lime storage section 421, the special auxiliary agent storage section 422, and the first drug. It includes a pumping unit 423a, a first drug supply line 424a, and a fixed quantity supply unit 425,426. Similarly, when the configuration for supplying the exhaust gas treatment chemical to the auxiliary supply position P2 is called the "second chemical supply unit 42b", the second chemical supply unit 42b includes the slaked lime storage unit 421, the special auxiliary agent storage unit 422, and the special auxiliary agent storage unit 422. It includes a second drug pumping section 423b, a second drug supply line 424b, and a fixed quantity supply section 425,426. In the first drug supply section 42a and the second drug supply section 42b, the slaked lime storage section 421 for storing slaked lime is shared, and the special auxiliary agent storage section 422 for storing the special auxiliary agent is also shared.

集塵機４３は、例えば、ろ過式であり、排ガスに含まれる飛灰をろ布により除去する。集塵機４３は、バグフィルタとも呼ばれる。薬剤供給ユニット４２により供給される排ガス処理薬剤は、当該ろ布に堆積する。集塵機４３の内部において、排ガスが当該ろ布を通過する際に、排ガスに含まれる有害物質と、排ガス処理薬剤との反応が生じ、当該有害物質が排ガスから除去される。排ガスと排ガス処理薬剤との反応は、集塵機４３よりも上流側における煙道３内においても生じる。薬剤供給ユニット４２では、消石灰に加えて活性炭等の他の種類の排ガス処理薬剤が供給されてもよい。排ガス処理薬剤により除去される有害物質は、例えば、塩化水素、硫黄酸化物、ダイオキシン類、水銀化合物等である。 The dust collector 43 is, for example, a filtration type, and removes fly ash contained in the exhaust gas with a filter cloth. The dust collector 43 is also called a bug filter. The exhaust gas treatment chemical supplied by the chemical supply unit 42 is deposited on the filter cloth. Inside the dust collector 43, when the exhaust gas passes through the filter cloth, a reaction occurs between the harmful substances contained in the exhaust gas and the exhaust gas treatment agent, and the harmful substances are removed from the exhaust gas. The reaction between the exhaust gas and the exhaust gas treatment agent also occurs in the flue 3 on the upstream side of the dust collector 43. In addition to slaked lime, the chemical supply unit 42 may supply other types of exhaust gas treatment chemicals such as activated carbon. Hazardous substances removed by the exhaust gas treatment chemicals are, for example, hydrogen chloride, sulfur oxides, dioxins, mercury compounds and the like.

集塵機４３では、所定時間毎に、ろ布に堆積した飛灰および排ガス処理薬剤（有害物質との反応物を含む。）が圧縮空気を利用した逆洗により、払い落とされる。ろ布から払い落とされた飛灰および排ガス処理薬剤は、集塵灰処理部（図示省略）に搬送され、例えばキレート剤（重金属安定剤）により処理される。実際には、煙道３における燃焼室２と集塵機４３との間に設けられる減温塔４１においても、一部の飛灰および排ガス処理薬剤が回収され、飛灰処理部に搬送される。 In the dust collector 43, fly ash and exhaust gas treatment chemicals (including reactants with harmful substances) accumulated on the filter cloth are removed by backwashing using compressed air at predetermined time intervals. The fly ash and exhaust gas treatment chemicals that have been removed from the filter cloth are transported to a dust collecting ash treatment unit (not shown) and treated with, for example, a chelating agent (heavy metal stabilizer). Actually, even in the temperature reducing tower 41 provided between the combustion chamber 2 and the dust collector 43 in the flue 3, a part of the fly ash and the exhaust gas treatment agent are recovered and transported to the fly ash treatment unit.

ＨＣｌ濃度測定部４０１は、煙道３において燃焼室２と減温塔４１との間（例えば、減温塔４１の入口近傍）に設けられ、レーザ光等を利用して排ガス中の塩化水素の濃度（以下、「ＨＣｌ濃度」という。）を測定する。ＨＣｌ濃度測定部４０１により取得されるＨＣｌ濃度は、制御部４０に出力される。制御部４０は、ＨＣｌ濃度に基づいて薬剤供給ユニット４２を制御する。制御部４０は、排ガス処理装置４の全体制御も担う。 The HCl concentration measuring unit 401 is provided between the combustion chamber 2 and the temperature reducing tower 41 in the flue 3 (for example, near the inlet of the temperature decreasing tower 41), and uses laser light or the like to generate hydrogen chloride in the exhaust gas. The concentration (hereinafter referred to as "HCl concentration") is measured. The HCl concentration acquired by the HCl concentration measuring unit 401 is output to the control unit 40. The control unit 40 controls the drug supply unit 42 based on the HCl concentration. The control unit 40 is also responsible for overall control of the exhaust gas treatment device 4.

図３は、排ガス処理装置４における排ガス処理の流れを示す図である。排ガス処理装置４における排ガス処理では、ＨＣｌ濃度測定部４０１により、排ガス中のＨＣｌ濃度が測定される（ステップＳ１１）。また、第１薬剤供給部４２ａにより薬剤供給位置Ｐ１に消石灰および特殊助剤を含む排ガス処理薬剤が供給される（ステップＳ１２）。このとき、薬剤供給位置Ｐ１への排ガス処理薬剤の供給量（単位時間当たりの供給量）は、第１薬剤圧送部４２３ａおよび定量供給部４２５，４２６の出力を調整することにより制御することが可能である。制御部４０では、ＨＣｌ濃度測定部４０１により取得されるＨＣｌ濃度が所定の設定値よりも高い場合に、薬剤供給位置Ｐ１への排ガス処理薬剤の供給量が増加され、ＨＣｌ濃度が所定の設定値よりも低い場合に、薬剤供給位置Ｐ１への排ガス処理薬剤の供給量が減少されることが好ましい。 FIG. 3 is a diagram showing a flow of exhaust gas treatment in the exhaust gas treatment device 4. In the exhaust gas treatment in the exhaust gas treatment device 4, the HCl concentration measuring unit 401 measures the HCl concentration in the exhaust gas (step S11). Further, the exhaust gas treatment chemical containing slaked lime and a special auxiliary agent is supplied to the chemical supply position P1 by the first chemical supply unit 42a (step S12). At this time, the supply amount (supply amount per unit time) of the exhaust gas treatment drug to the drug supply position P1 can be controlled by adjusting the outputs of the first drug pumping unit 423a and the fixed quantity supply unit 425,426. Is. In the control unit 40, when the HCl concentration acquired by the HCl concentration measuring unit 401 is higher than the predetermined set value, the supply amount of the exhaust gas treatment drug to the drug supply position P1 is increased, and the HCl concentration is set to the predetermined set value. When it is lower than, it is preferable that the supply amount of the exhaust gas treatment chemical to the chemical supply position P1 is reduced.

薬剤供給位置Ｐ１に供給される消石灰では、その表面において、消石灰と塩化水素との反応物（ＣａＣｌ２）が形成される。消石灰は、排ガスと共に減温塔４１内に流入するため、消石灰表面の水分濃度が高くなる。さらには、水への溶解度が大きい表面の反応物が、減温塔４１内に噴霧される水に溶解して流される、すなわち、消石灰の表面から除去され、未反応の消石灰が表面に表れる。これにより、消石灰表面における反応物による反応速度の低下が抑制される。したがって、煙道３において燃焼室２と減温塔４１との間の薬剤供給位置Ｐ１に消石灰を供給する排ガス処理装置４では、脱塩反応の効率を向上する（少ない消石灰でＨＣｌ濃度を低下させる）ことが可能となる。排ガス処理薬剤が、水酸化ドロマイト等の他のカルシウム系薬剤を含む場合も同様に、当該他のカルシウム系薬剤の表面に形成される塩化水素との反応物は、減温塔４１内に噴霧される水により除去され、当該他のカルシウム系薬剤における反応速度の低下が抑制される。In the slaked lime supplied to the drug supply position P1, a reaction product (CaCl 2 ) of slaked lime and hydrogen chloride is formed on the surface thereof. Since the slaked lime flows into the temperature reducing tower 41 together with the exhaust gas, the water concentration on the surface of the slaked lime becomes high. Furthermore, the surface reactants having high solubility in water are dissolved and washed away in the water sprayed into the temperature reducing column 41, that is, removed from the surface of slaked lime, and unreacted slaked lime appears on the surface. As a result, the decrease in reaction rate due to the reactant on the surface of slaked lime is suppressed. Therefore, in the exhaust gas treatment device 4 that supplies slaked lime to the chemical supply position P1 between the combustion chamber 2 and the temperature reducing tower 41 in the flue 3, the efficiency of the desalting reaction is improved (the HCl concentration is lowered with less slaked lime). ) Is possible. Similarly, when the exhaust gas treatment agent contains another calcium-based agent such as dromite hydroxide, the reaction product with hydrogen chloride formed on the surface of the other calcium-based agent is sprayed into the temperature reducing tower 41. It is removed by the water, and the decrease in the reaction rate of the other calcium-based drug is suppressed.

ステップＳ１２に並行して、補助供給位置Ｐ２にも第２薬剤供給部４２ｂにより消石灰および特殊助剤を含む排ガス処理薬剤が供給される（ステップＳ１３）。このとき、補助供給位置Ｐ２への排ガス処理薬剤の供給量は、第２薬剤圧送部４２３ｂおよび定量供給部４２５，４２６の出力を調整することにより制御することが可能である。制御部４０では、補助供給位置Ｐ２への排ガス処理薬剤の供給量が上記ＨＣｌ濃度に基づいて増減される。すなわち、ＨＣｌ濃度が所定値以上となる場合に、ＨＣｌ濃度が所定値未満である時よりも第２薬剤供給部４２ｂによる補助供給位置Ｐ２への排ガス処理薬剤の供給量が増大される。特に、高塩素含有廃棄物が焼却された時に排ガス中の塩素濃度が急上昇し、第１薬剤供給部４２ａの制御のみでは対処ができなくなる場合に、制御部４０により、第２薬剤供給部４２ｂによる補助供給位置Ｐ２への排ガス処理薬剤の供給量が増大される。ステップＳ１３では、ＨＣｌ濃度が所定値未満である時を通常時として、通常時に第２薬剤供給部４２ｂによる補助供給位置Ｐ２への排ガス処理薬剤の供給量が０であり、ＨＣｌ濃度が所定値以上となる異常時に補助供給位置Ｐ２への排ガス処理薬剤の供給が開始されてもよい。 In parallel with step S12, the exhaust gas treatment chemical containing slaked lime and a special auxiliary agent is also supplied to the auxiliary supply position P2 by the second chemical supply unit 42b (step S13). At this time, the amount of the exhaust gas treatment chemical supplied to the auxiliary supply position P2 can be controlled by adjusting the outputs of the second chemical pumping unit 423b and the fixed quantity supply units 425 and 426. In the control unit 40, the amount of the exhaust gas treatment agent supplied to the auxiliary supply position P2 is increased or decreased based on the above-mentioned HCl concentration. That is, when the HCl concentration is equal to or higher than the predetermined value, the amount of the exhaust gas treatment chemical supplied to the auxiliary supply position P2 by the second chemical supply unit 42b is increased as compared with the case where the HCl concentration is less than the predetermined value. In particular, when the chlorine concentration in the exhaust gas rises sharply when the high chlorine-containing waste is incinerated and it is not possible to deal with it only by controlling the first chemical supply unit 42a, the control unit 40 controls the second chemical supply unit 42b. The amount of the exhaust gas treatment agent supplied to the auxiliary supply position P2 is increased. In step S13, when the HCl concentration is less than a predetermined value, the amount of the exhaust gas treatment chemical supplied to the auxiliary supply position P2 by the second chemical supply unit 42b is 0 in the normal time, and the HCl concentration is equal to or higher than the predetermined value. At the time of an abnormality, the supply of the exhaust gas treatment agent to the auxiliary supply position P2 may be started.

図２の排ガス処理装置４では、ＨＣｌ濃度の測定（ステップＳ１１）、第１薬剤供給部４２ａによる排ガス処理薬剤の供給（ステップＳ１２）、および、第２薬剤供給部４２ｂによる排ガス処理薬剤の供給（ステップＳ１３）は、原則として、互いに並行して継続的に行われる。なお、薬剤供給位置Ｐ１または補助供給位置Ｐ２への排ガス処理薬剤の供給は、一時的に停止されてもよい。 In the exhaust gas treatment device 4 of FIG. 2, the HCl concentration is measured (step S11), the exhaust gas treatment chemical is supplied by the first chemical supply unit 42a (step S12), and the exhaust gas treatment chemical is supplied by the second chemical supply unit 42b (step S12). As a general rule, step S13) is continuously performed in parallel with each other. The supply of the exhaust gas treatment chemical to the chemical supply position P1 or the auxiliary supply position P2 may be temporarily stopped.

ここで、煙道３における燃焼室２と減温塔４１との間の薬剤供給位置Ｐ１のみに排ガス処理薬剤を供給する第１比較例の排ガス処理装置、および、減温塔４１と集塵機４３との間の補助供給位置Ｐ２のみに排ガス処理薬剤を供給する第２比較例の排ガス処理装置を想定する。図４は、第１および第２比較例の排ガス処理装置における脱塩率と当量比との関係を示す図であり、ここでは、煙突５２におけるＨＣｌ濃度が所定値になるように排ガス処理薬剤の供給量を制御した。図４では、破線Ｌ２１が第１比較例の排ガス処理装置における脱塩率と当量比との関係を示し、実線Ｌ２２が第２比較例の排ガス処理装置における脱塩率と当量比との関係を示す。なお、当量比は、実際に供給した消石灰の量と、排ガス中の塩化水素および硫黄酸化物を完全に除去するために理論上必要な消石灰の量との比の値であり、消石灰の供給量の過剰度合いを示す指標である。また、脱塩率は、排ガス処理装置により除去された塩化水素の量の、処理前の塩化水素の量に対する割合である。例えば、脱塩率は、（１−（脱塩後における塩化水素の量）／（脱塩前における塩化水素の量））により求められる。 Here, the exhaust gas treatment device of the first comparative example in which the exhaust gas treatment chemical is supplied only to the chemical supply position P1 between the combustion chamber 2 and the heat reduction tower 41 in the flue 3, and the heat reduction tower 41 and the dust collector 43. It is assumed that the exhaust gas treatment apparatus of the second comparative example supplies the exhaust gas treatment agent only to the auxiliary supply position P2 between the two. FIG. 4 is a diagram showing the relationship between the desalting rate and the equivalent ratio in the exhaust gas treatment apparatus of the first and second comparative examples. Here, the exhaust gas treatment agent is prepared so that the HCl concentration in the chimney 52 becomes a predetermined value. The supply was controlled. In FIG. 4, the broken line L21 shows the relationship between the desalination rate and the equivalent ratio in the exhaust gas treatment device of the first comparative example, and the solid line L22 shows the relationship between the desalination rate and the equivalent ratio in the exhaust gas treatment device of the second comparative example. show. The equivalent ratio is the ratio of the amount of slaked lime actually supplied to the amount of slaked lime theoretically required to completely remove hydrogen chloride and sulfur oxides in the exhaust gas, and is the amount of slaked lime supplied. It is an index showing the degree of excess of. The desalination rate is the ratio of the amount of hydrogen chloride removed by the exhaust gas treatment device to the amount of hydrogen chloride before the treatment. For example, the desalination rate is determined by (1- (amount of hydrogen chloride after desalting) / (amount of hydrogen chloride before desalting)).

第２比較例の排ガス処理装置では、粉末状の消石灰の表面において、消石灰と塩化水素との反応物が形成されるため、塩化水素との新たな反応が生じにくくなる。したがって、所定の脱塩率を得るには、煙道３中に供給する消石灰の量を増加する必要がある。これに対し、第１比較例の排ガス処理装置では、消石灰表面の水分濃度が高くなるため、さらには、消石灰の表面の反応物が、減温塔４１内に噴霧される水により除去されるため、同じ当量比で比較した場合に、第２比較例の排ガス処理装置に比べて、高い脱塩率が得られる。このように、燃焼室２と減温塔４１との間の薬剤供給位置Ｐ１に排ガス処理薬剤を供給することにより、脱塩処理を効率よく行うことが可能である。 In the exhaust gas treatment apparatus of the second comparative example, a reaction product of slaked lime and hydrogen chloride is formed on the surface of the powdered slaked lime, so that a new reaction with hydrogen chloride is less likely to occur. Therefore, in order to obtain a predetermined desalination rate, it is necessary to increase the amount of slaked lime supplied into the flue 3. On the other hand, in the exhaust gas treatment apparatus of the first comparative example, the water concentration on the surface of the slaked lime is high, and further, the reactant on the surface of the slaked lime is removed by the water sprayed into the temperature reducing tower 41. When compared with the same equivalent ratio, a higher desalting rate can be obtained as compared with the exhaust gas treatment apparatus of the second comparative example. In this way, by supplying the exhaust gas treatment chemical to the chemical supply position P1 between the combustion chamber 2 and the temperature reducing tower 41, the desalting treatment can be efficiently performed.

図２の排ガス処理装置４では、第１薬剤供給部４２ａにより、燃焼室２と減温塔４１との間の薬剤供給位置Ｐ１に、消石灰を含む排ガス処理薬剤が供給される。これにより、通常時において、消石灰を効率よく用いて脱塩性能を向上させることができる。その結果、排ガス処理装置４を有する焼却設備１では、消石灰の効率的な使用（消石灰の使用量の削減）によりランニングコストを削減することができる。排ガス処理薬剤が、他のカルシウム系薬剤を含む場合も同様である。 In the exhaust gas treatment device 4 of FIG. 2, the exhaust gas treatment chemical containing slaked lime is supplied to the chemical supply position P1 between the combustion chamber 2 and the temperature reducing tower 41 by the first chemical supply unit 42a. As a result, in normal times, slaked lime can be efficiently used to improve desalination performance. As a result, in the incinerator 1 having the exhaust gas treatment device 4, the running cost can be reduced by efficiently using slaked lime (reducing the amount of slaked lime used). The same applies when the exhaust gas treatment agent contains other calcium-based agents.

ところで、都市ごみは不均一であり、例えば、高塩素含有のごみ（高塩素含有廃棄物）が燃焼室２内に投入されると、排ガスにおけるＨＣｌ濃度が急激に上昇する。このような場合でも、第１薬剤供給部４２ａに加えて、第２薬剤供給部４２ｂを有する排ガス処理装置４では、ＨＣｌ濃度測定部４０１により取得されるＨＣｌ濃度に基づいて、第１薬剤供給部４２ａおよび第２薬剤供給部４２ｂの双方が制御され、薬剤供給位置Ｐ１および補助供給位置Ｐ２の双方に対する排ガス処理薬剤の供給量が増大される。換言すると、排ガス処理装置４では、ＨＣｌ濃度が所定値以上となる異常時に、第１薬剤供給部４２ａのみならず第２薬剤供給部４２ｂによる排ガス処理薬剤の供給量が増大される。これにより、異常時に適切に対処する、すなわち、ＨＣｌ濃度の急激な上昇を短時間で抑制することが可能となり、煙突５２から排出される排ガス中のＨＣｌ濃度を安定させることができる。 By the way, municipal waste is non-uniform. For example, when high chlorine-containing waste (high-chlorine-containing waste) is put into the combustion chamber 2, the HCl concentration in the exhaust gas rises sharply. Even in such a case, in the exhaust gas treatment device 4 having the second drug supply section 42b in addition to the first drug supply section 42a, the first drug supply section is based on the HCl concentration acquired by the HCl concentration measurement section 401. Both the 42a and the second drug supply unit 42b are controlled, and the supply amount of the exhaust gas treatment drug to both the drug supply position P1 and the auxiliary supply position P2 is increased. In other words, in the exhaust gas treatment device 4, when the HCl concentration becomes an abnormality of a predetermined value or more, the supply amount of the exhaust gas treatment chemical is increased not only by the first chemical supply unit 42a but also by the second chemical supply unit 42b. As a result, it is possible to take appropriate measures in the event of an abnormality, that is, to suppress a rapid increase in the HCl concentration in a short time, and to stabilize the HCl concentration in the exhaust gas discharged from the chimney 52.

また、ＨＣｌ濃度に基づく第１薬剤供給部４２ａおよび第２薬剤供給部４２ｂの制御により、排ガス処理薬剤を効率よく使用して、排ガス処理装置４のランニングコストを削減することができる。排ガス処理装置４では、第１薬剤供給部４２ａおよび第２薬剤供給部４２ｂが、消石灰を貯留する消石灰貯留部４２１を共有することにより、排ガス処理装置４の構造を簡素化することができる（特殊助剤貯留部４２２についても同様である。）。 Further, by controlling the first drug supply unit 42a and the second drug supply unit 42b based on the HCl concentration, the exhaust gas treatment agent can be efficiently used and the running cost of the exhaust gas treatment device 4 can be reduced. In the exhaust gas treatment device 4, the structure of the exhaust gas treatment device 4 can be simplified by sharing the slaked lime storage unit 421 for storing slaked lime by the first chemical supply unit 42a and the second chemical supply unit 42b (special). The same applies to the auxiliary agent storage unit 422).

（第２の関連技術）
図５は、本発明の第２の関連技術に係る排ガス処理装置４を示す図である。図５の排ガス処理装置４では、第１薬剤供給部４２ａおよび第２薬剤供給部４２ｂにおいて、消石灰を貯留する消石灰貯留部４２１ａ，４２１ｂが個別に設けられ、特殊助剤を貯留する特殊助剤貯留部４２２ａ，４２２ｂも個別に設けられる。また、薬剤供給位置Ｐ１が、減温塔４１内に設定され、第１薬剤供給部４２ａにより減温塔４１内に排ガス処理薬剤が供給される。他の構成は、図２と同様であり、同じ構成に同じ符号を付す。 (Second related technology )
FIG. 5 is a diagram showing an exhaust gas treatment device 4 according to the second related technique of the present invention. In the exhaust gas treatment device 4 of FIG. 5, the first drug supply section 42a and the second drug supply section 42b are individually provided with slaked lime storage sections 421a and 421b for storing slaked lime, and special auxiliary agent storage for storing the special auxiliary agent. Parts 422a and 422b are also provided individually. Further, the chemical supply position P1 is set in the temperature reducing tower 41, and the exhaust gas treatment chemical is supplied into the temperature reducing tower 41 by the first chemical supply unit 42a. Other configurations are the same as in FIG. 2, and the same configurations are designated by the same reference numerals.

排ガス処理装置４では、第１薬剤供給部４２ａが、消石灰貯留部４２１ａと、特殊助剤貯留部４２２ａと、第１薬剤圧送部４２３ａと、第１薬剤供給ライン４２４ａと、定量供給部４２５ａ，４２６ａとを含む。第１薬剤供給ライン４２４ａの一端は、第１薬剤圧送部４２３ａに接続され、他端は、薬剤供給位置Ｐ１に接続される。消石灰貯留部４２１ａ内の消石灰は、定量供給部４２５ａを介して第１薬剤供給ライン４２４ａ内に供給され、特殊助剤貯留部４２２ａ内の特殊助剤は、定量供給部４２６ａを介して第１薬剤供給ライン４２４ａ内に供給される。これにより、消石灰および特殊助剤を含む排ガス処理薬剤が、減温塔４１内の薬剤供給位置Ｐ１に供給される。 In the exhaust gas treatment device 4, the first drug supply section 42a includes a slaked lime storage section 421a, a special auxiliary agent storage section 422a, a first drug pumping section 423a, a first drug supply line 424a, and a fixed quantity supply section 425a, 426a. And include. One end of the first drug supply line 424a is connected to the first drug pumping section 423a, and the other end is connected to the drug supply position P1. The slaked lime in the slaked lime storage unit 421a is supplied into the first drug supply line 424a via the fixed quantity supply unit 425a, and the special auxiliary agent in the special auxiliary agent storage unit 422a is supplied to the first drug via the fixed quantity supply unit 426a. It is supplied into the supply line 424a. As a result, the exhaust gas treatment agent containing slaked lime and a special auxiliary agent is supplied to the agent supply position P1 in the temperature reducing tower 41.

第２薬剤供給部４２ｂは、消石灰貯留部４２１ｂと、特殊助剤貯留部４２２ｂと、第２薬剤圧送部４２３ｂと、第２薬剤供給ライン４２４ｂと、定量供給部４２５ｂ，４２６ｂとを含む。第２薬剤供給ライン４２４ｂの一端は、第２薬剤圧送部４２３ｂに接続され、他端は、補助供給位置Ｐ２に接続される。消石灰貯留部４２１ｂ内の消石灰は、定量供給部４２５ｂを介して第２薬剤供給ライン４２４ｂ内に供給され、特殊助剤貯留部４２２ｂ内の特殊助剤は、定量供給部４２６ｂを介して第２薬剤供給ライン４２４ｂ内に供給される。これにより、消石灰および特殊助剤を含む排ガス処理薬剤が、煙道３内の補助供給位置Ｐ２に供給される。 The second drug supply section 42b includes a slaked lime storage section 421b, a special auxiliary agent storage section 422b, a second drug pumping section 423b, a second drug supply line 424b, and a fixed quantity supply section 425b, 426b. One end of the second drug supply line 424b is connected to the second drug pumping section 423b, and the other end is connected to the auxiliary supply position P2. The slaked lime in the slaked lime storage unit 421b is supplied into the second drug supply line 424b via the fixed quantity supply unit 425b, and the special auxiliary agent in the special auxiliary agent storage unit 422b is supplied to the second drug via the fixed quantity supply unit 426b. It is supplied into the supply line 424b. As a result, the exhaust gas treatment agent containing slaked lime and a special auxiliary agent is supplied to the auxiliary supply position P2 in the flue 3.

第１および第２薬剤供給部４２ａ，４２ｂにおいて、消石灰貯留部４２１ａ，４２１ｂが個別に設けられる排ガス処理装置４では、薬剤供給位置Ｐ１への消石灰の供給量と、補助供給位置Ｐ２への消石灰の供給量とを、図２の排ガス処理装置４に比べて、高い自由度で変更することができる（特殊助剤の供給量についても同様である。）。好ましい排ガス処理装置４では、通常時において第１薬剤供給部４２ａによる消石灰の供給量が、第２薬剤供給部４２ｂによる消石灰の供給量よりも多い。なお、図２の排ガス処理装置４と同様に、図５の排ガス処理装置４において薬剤供給位置Ｐ１が、煙道３における減温塔４１よりも上流側に設定されてもよい。また、図２の排ガス処理装置４において、薬剤供給位置Ｐ１が減温塔４１内に設定されてもよい。 In the exhaust gas treatment device 4 in which the slaked lime storage units 421a and 421b are individually provided in the first and second chemical supply units 42a and 42b, the amount of slaked lime supplied to the chemical supply position P1 and the amount of slaked lime supplied to the auxiliary supply position P2. The supply amount can be changed with a higher degree of freedom as compared with the exhaust gas treatment device 4 of FIG. 2 (the same applies to the supply amount of the special auxiliary agent). In the preferred exhaust gas treatment device 4, the amount of slaked lime supplied by the first chemical supply unit 42a is larger than the amount of slaked lime supplied by the second chemical supply unit 42b in the normal state. Similar to the exhaust gas treatment device 4 of FIG. 2, the chemical supply position P1 in the exhaust gas treatment device 4 of FIG. 5 may be set on the upstream side of the temperature reducing tower 41 in the flue 3. Further, in the exhaust gas treatment device 4 of FIG. 2, the chemical supply position P1 may be set in the temperature reducing tower 41.

図５の排ガス処理装置４においても、ＨＣｌ濃度測定部４０１により取得されるＨＣｌ濃度に基づいて、第１薬剤供給部４２ａおよび第２薬剤供給部４２ｂの双方が制御されることにより、ＨＣｌ濃度が所定値以上となる異常時に適切に対処することができる。排ガス処理装置４では、第１薬剤供給部４２ａにより薬剤供給位置Ｐ１に一定量の排ガス処理薬剤が供給され、第２薬剤供給部４２ｂによる補助供給位置Ｐ２への排ガス処理薬剤の供給量のみがＨＣｌ濃度に基づいて制御されてもよい。この場合も、ＨＣｌ濃度が所定値以上となる異常時に、ＨＣｌ濃度が所定値未満である時よりも第２薬剤供給部４２ｂによる補助供給位置Ｐ２への排ガス処理薬剤の供給量を増大して、適切に対処することが可能となる。 Also in the exhaust gas treatment device 4 of FIG. 5, the HCl concentration is increased by controlling both the first drug supply section 42a and the second drug supply section 42b based on the HCl concentration acquired by the HCl concentration measurement section 401. Appropriate measures can be taken when an abnormality exceeds a predetermined value. In the exhaust gas treatment device 4, a fixed amount of the exhaust gas treatment chemical is supplied to the chemical supply position P1 by the first chemical supply unit 42a, and only the supply amount of the exhaust gas treatment chemical to the auxiliary supply position P2 by the second chemical supply unit 42b is HCl. It may be controlled based on the concentration. Also in this case, when the HCl concentration becomes an abnormality of the predetermined value or more, the supply amount of the exhaust gas treatment chemical to the auxiliary supply position P2 by the second chemical supply unit 42b is increased as compared with the case where the HCl concentration is less than the predetermined value. It will be possible to deal with it appropriately.

また、第２薬剤供給部４２ｂにより補助供給位置Ｐ２に一定量の排ガス処理薬剤が供給され、第１薬剤供給部４２ａによる薬剤供給位置Ｐ１への排ガス処理薬剤の供給量のみがＨＣｌ濃度に基づいて制御されてもよい。この場合も、ＨＣｌ濃度が所定値以上となる異常時に、第２薬剤供給部４２ｂにより補助供給位置Ｐ２に排ガス処理薬剤を供給しつつ、ＨＣｌ濃度が所定値未満である時よりも第１薬剤供給部４２ａによる薬剤供給位置Ｐ１への排ガス処理薬剤の供給量を増大して、適切に対処することが可能となる。第１薬剤供給部４２ａおよび第２薬剤供給部４２ｂが薬剤の貯留部を含む排ガス処理装置４では、ＨＣｌ濃度が所定値以上となる異常時に、第１薬剤供給部４２ａおよび第２薬剤供給部４２ｂの双方による排ガス処理薬剤の供給を行いつつ、ＨＣｌ濃度が所定値未満である通常時よりも、両者による排ガス処理薬剤の供給量の和が増大される。これにより、排ガス中のＨＣｌ濃度を安定させることが可能となる（図２の排ガス処理装置４において同様）。 Further, a fixed amount of the exhaust gas treatment agent is supplied to the auxiliary supply position P2 by the second drug supply unit 42b, and only the supply amount of the exhaust gas treatment agent to the drug supply position P1 by the first drug supply unit 42a is based on the HCl concentration. It may be controlled. Also in this case, when the HCl concentration is abnormally equal to or higher than the predetermined value, the exhaust gas treatment chemical is supplied to the auxiliary supply position P2 by the second chemical supply unit 42b, and the first chemical is supplied as compared with the case where the HCl concentration is less than the predetermined value. It is possible to increase the supply amount of the exhaust gas treatment chemical to the chemical supply position P1 by the unit 42a and take appropriate measures. In the exhaust gas treatment device 4 in which the first drug supply section 42a and the second drug supply section 42b include the drug storage section, when the HCl concentration becomes an abnormality of a predetermined value or more, the first drug supply section 42a and the second drug supply section 42b While supplying the exhaust gas treatment chemicals by both of them, the sum of the supply amounts of the exhaust gas treatment chemicals by both is increased as compared with the normal time when the HCl concentration is less than a predetermined value. This makes it possible to stabilize the HCl concentration in the exhaust gas (similar to the exhaust gas treatment device 4 in FIG. 2).

（第３の関連技術）
図６は、本発明の第３の関連技術に係る排ガス処理装置４を示す図である。図６の排ガス処理装置４では、図５の排ガス処理装置４における第２薬剤供給部４２ｂに代えて、集塵灰搬送部４４が設けられるとともに、薬剤供給位置Ｐ１が、煙道３における減温塔４１よりも上流側に設定される。 (Third related technology )
FIG. 6 is a diagram showing an exhaust gas treatment device 4 according to a third related technique of the present invention. In the exhaust gas treatment device 4 of FIG. 6, a dust collecting ash transport section 44 is provided in place of the second chemical supply section 42b in the exhaust gas treatment device 4 of FIG. It is set on the upstream side of the tower 41.

集塵灰搬送部４４は、補助経路４４１と、集塵灰分配部４５と、集塵灰貯留部４４２と、定量供給部４４３と、供給コンベア４６と、シュート部４４４とを備える。補助経路４４１は、煙道３における減温塔４１と集塵機４３との間の位置（すなわち、補助供給位置Ｐ２）と、集塵機４３の下部とを接続する。図６では、補助経路４４１を細い実線にて示している。補助経路４４１は、煙道３とは異なる経路である。補助経路４４１において、集塵機４３から補助供給位置Ｐ２に向かって順に、集塵灰分配部４５、集塵灰貯留部４４２、定量供給部４４３、供給コンベア４６、シュート部４４４が設けられる。 The dust collecting ash transporting unit 44 includes an auxiliary path 441, a dust collecting ash distributing unit 45, a dust collecting ash storage unit 442, a fixed quantity supply unit 443, a supply conveyor 46, and a chute unit 444. The auxiliary path 441 connects the position between the temperature reducing tower 41 and the dust collector 43 (that is, the auxiliary supply position P2) in the flue 3 and the lower part of the dust collector 43. In FIG. 6, the auxiliary path 441 is shown by a thin solid line. The auxiliary route 441 is a route different from that of the flue 3. In the auxiliary path 441, a dust collecting ash distribution unit 45, a dust collecting ash storage unit 442, a fixed quantity supply unit 443, a supply conveyor 46, and a chute unit 444 are provided in order from the dust collector 43 toward the auxiliary supply position P2.

集塵灰分配部４５は、集塵機４３において、ろ布から払い落とされた飛灰および排ガス処理薬剤（以下、「集塵灰」と総称する。）を、集塵灰貯留部４４２と、集塵灰処理部４９とに分配供給する。詳細には、集塵灰分配部４５は、コンベア４５１と、ゲート４５２とを有する。コンベア４５１は、例えばフライトコンベア（スクレーパコンベアとも呼ばれる。）である。ゲート４５２は、コンベア４５１による集塵灰の搬送経路に設けられる。集塵灰貯留部４４２におけるレベル計（図示省略）により取得される集塵灰の貯留量が所定量未満である場合に、ゲート４５２が開かれ、集塵灰貯留部４４２に集塵灰が供給される。集塵灰貯留部４４２における集塵灰の貯留量が所定量以上である場合に、ゲート４５２が閉じられ、集塵灰処理部４９に集塵灰が供給される。このように、集塵灰分配部４５では、集塵灰貯留部４４２における集塵灰の貯留量がおよそ一定となるように、集塵機４３からの集塵灰が、ゲート４５２の開閉により集塵灰貯留部４４２と集塵灰処理部４９とに分配される。 The dust collecting ash distribution unit 45 collects fly ash and exhaust gas treatment chemicals (hereinafter collectively referred to as “dust collecting ash”) that have been wiped off from the filter cloth in the dust collector 43 together with the dust collecting ash storage unit 442. It is distributed and supplied to the ash processing unit 49. Specifically, the dust collecting ash distribution unit 45 has a conveyor 451 and a gate 452. The conveyor 451 is, for example, a flight conveyor (also referred to as a scraper conveyor). The gate 452 is provided in the dust collecting ash transport path by the conveyor 451. When the amount of dust-collected ash stored by the level meter (not shown) in the dust-collecting ash storage unit 442 is less than a predetermined amount, the gate 452 is opened and the dust-collected ash is supplied to the dust-collecting ash storage unit 442. Will be done. When the amount of dust collected ash stored in the dust collecting ash storage unit 442 is equal to or greater than a predetermined amount, the gate 452 is closed and the dust collecting ash is supplied to the dust collecting ash processing unit 49. In this way, in the dust collecting ash distribution unit 45, the dust collecting ash from the dust collector 43 is collected by opening and closing the gate 452 so that the stored amount of the dust collecting ash in the dust collecting ash storage unit 442 becomes substantially constant. It is distributed to the storage unit 442 and the dust collecting ash processing unit 49.

集塵灰貯留部４４２の下部には、定量供給部４４３が取り付けられる。定量供給部４４３は、例えばテーブルフィーダであり、単位時間当たりに設定量の集塵灰を集塵灰貯留部４４２から取り出す。定量供給部４４３は、供給コンベア４６に接続され、集塵灰貯留部４４２から取り出された集塵灰は、供給コンベア４６内に供給される。供給コンベア４６は、例えばフライトコンベアであり、集塵灰貯留部４４２の下方から煙道３における補助供給位置Ｐ２の上方までのコンベア搬送経路に沿って集塵灰を搬送する。コンベア搬送経路は、既述の補助経路４４１の一部である。シュート部４４４は、補助供給位置Ｐ２の上方に設けられ、供給コンベア４６により搬送された集塵灰が、シュート部４４４を介して補助供給位置Ｐ２に供給される。既述のように、集塵灰は排ガス処理薬剤を含む。したがって、集塵灰搬送部４４は、補助供給位置Ｐ２に、消石灰を含む排ガス処理薬剤を供給可能な第２薬剤供給部であるといえる。 A fixed quantity supply unit 443 is attached to the lower part of the dust collection ash storage unit 442. The fixed quantity supply unit 443 is, for example, a table feeder, and takes out a set amount of dust collection ash per unit time from the dust collection ash storage unit 442. The fixed quantity supply unit 443 is connected to the supply conveyor 46, and the dust collection ash taken out from the dust collection ash storage unit 442 is supplied into the supply conveyor 46. The supply conveyor 46 is, for example, a flight conveyor, and transports dust-collected ash along a conveyor transport path from below the dust-collecting ash storage unit 442 to above the auxiliary supply position P2 in the flue 3. The conveyor transport path is a part of the auxiliary path 441 described above. The chute portion 444 is provided above the auxiliary supply position P2, and the dust collecting ash conveyed by the supply conveyor 46 is supplied to the auxiliary supply position P2 via the chute portion 444. As mentioned above, the dust collecting ash contains an exhaust gas treatment agent. Therefore, it can be said that the dust collecting ash transport unit 44 is a second chemical supply unit capable of supplying the exhaust gas treatment chemical containing slaked lime to the auxiliary supply position P2.

制御部４０による第１薬剤供給部４２ａおよび集塵灰搬送部４４の制御は、図２および図５の排ガス処理装置４における第１薬剤供給部４２ａおよび第２薬剤供給部４２ｂに対する制御と同様である。したがって、ＨＣｌ濃度が所定値以上となる場合に、ＨＣｌ濃度が所定値未満である時よりも集塵灰搬送部４４による補助供給位置Ｐ２への集塵灰の供給量が増大される。または、ＨＣｌ濃度が所定値以上となる場合に、集塵灰搬送部４４により補助供給位置Ｐ２に集塵灰を供給しつつ、ＨＣｌ濃度が所定値未満である時よりも第１薬剤供給部４２ａによる薬剤供給位置Ｐ１への排ガス処理薬剤の供給量が増大される。 The control of the first chemical supply unit 42a and the dust collecting ash transport unit 44 by the control unit 40 is the same as the control of the first chemical supply unit 42a and the second chemical supply unit 42b in the exhaust gas treatment device 4 of FIGS. 2 and 5. be. Therefore, when the HCl concentration is equal to or higher than the predetermined value, the amount of dust collected ash supplied to the auxiliary supply position P2 by the dust collecting ash transport unit 44 is increased as compared with the case where the HCl concentration is less than the predetermined value. Alternatively, when the HCl concentration is equal to or higher than the predetermined value, the dust collecting ash transport section 44 supplies the dust collecting ash to the auxiliary supply position P2, and the first chemical supply section 42a is higher than when the HCl concentration is lower than the predetermined value. The supply amount of the exhaust gas treatment chemical to the chemical supply position P1 is increased.

以上のように、図６の排ガス処理装置４では、第１薬剤供給部４２ａにより、燃焼室２と減温塔４１との間の薬剤供給位置Ｐ１に、未使用の排ガス処理薬剤が供給される。これにより、通常時において、消石灰を効率よく用いて脱塩性能を向上させることができる。また、集塵灰搬送部４４により、補助供給位置Ｐ２に、消石灰を含む集塵灰が供給される。このように、集塵機４３にて捕集された集塵灰を排ガス処理薬剤として用いることにより、第１薬剤供給部４２ａにおける排ガス処理薬剤の使用量（すなわち、飛灰が混在していない排ガス処理薬剤の使用量）を低減することができる。さらに、ＨＣｌ濃度が所定値以上となる異常時に、第１薬剤供給部４２ａによる排ガス処理薬剤の供給、および、集塵灰搬送部４４による集塵灰の供給を行いつつ、第１薬剤供給部４２ａによる排ガス処理薬剤の供給量、および、集塵灰搬送部４４による集塵灰の供給量の双方または一方が、ＨＣｌ濃度が所定値未満である通常時よりも増大される。これにより、異常時に適切に対処することができる。 As described above, in the exhaust gas treatment device 4 of FIG. 6, an unused exhaust gas treatment chemical is supplied to the chemical supply position P1 between the combustion chamber 2 and the temperature reducing tower 41 by the first chemical supply unit 42a. .. As a result, in normal times, slaked lime can be efficiently used to improve desalination performance. Further, the dust collecting ash transport unit 44 supplies the dust collecting ash containing slaked lime to the auxiliary supply position P2. By using the dust collected ash collected by the dust collector 43 as the exhaust gas treatment agent in this way, the amount of the exhaust gas treatment agent used in the first chemical supply unit 42a (that is, the exhaust gas treatment agent in which fly ash is not mixed) is used. The amount used) can be reduced. Further, when the HCl concentration becomes abnormal to be equal to or higher than a predetermined value, the first chemical supply unit 42a supplies the exhaust gas treatment chemical by the first chemical supply unit 42a and the dust collection ash is supplied by the dust collection ash transport unit 44. Both or one of the supply amount of the exhaust gas treatment chemicals and the supply amount of the dust collection ash by the dust collection ash transport unit 44 is increased as compared with the normal time when the HCl concentration is less than a predetermined value. As a result, it is possible to take appropriate measures in the event of an abnormality.

集塵灰搬送部４４では、空気等のキャリアガスを利用して、集塵灰が補助供給位置Ｐ２に搬送されてもよい。また、図６の排ガス処理装置４において、薬剤供給位置Ｐ１が、減温塔４１内に設定され、第１薬剤供給部４２ａにより減温塔４１内に排ガス処理薬剤が供給されてもよい（後述の図７および図８の排ガス処理装置４において同様）。 In the dust collecting ash transport unit 44, the dust collecting ash may be transported to the auxiliary supply position P2 by using a carrier gas such as air. Further, in the exhaust gas treatment device 4 of FIG. 6, the chemical supply position P1 may be set in the temperature reducing tower 41, and the exhaust gas treatment chemical may be supplied into the heat reducing tower 41 by the first chemical supply unit 42a (described later). The same applies to the exhaust gas treatment device 4 of FIGS. 7 and 8).

（第１実施形態）
図７は、本発明の第１実施形態に係る排ガス処理装置４を示す図である。図７の排ガス処理装置４では、図６の排ガス処理装置４における補助供給位置Ｐ２が、煙道３における減温塔４１よりも上流側、すなわち、燃焼室２と減温塔４１との間に設定される。他の構成は、図６の排ガス処理装置４と同様であり、同じ構成に同じ符号を付している。 (First Embodiment)
FIG. 7 is a diagram showing an exhaust gas treatment device 4 according to the first embodiment of the present invention. In the exhaust gas treatment device 4 of FIG. 7, the auxiliary supply position P2 in the exhaust gas treatment device 4 of FIG. 6 is located upstream of the temperature reduction tower 41 in the flue 3, that is, between the combustion chamber 2 and the heat reduction tower 41. Set. Other configurations are the same as those of the exhaust gas treatment apparatus 4 of FIG. 6, and the same configurations are designated by the same reference numerals.

図７の排ガス処理装置４においても、第１薬剤供給部４２ａにより、燃焼室２と減温塔４１との間の薬剤供給位置Ｐ１に未使用の排ガス処理薬剤が供給されることにより、通常時において脱塩処理を効率よく行うことができる。また、集塵灰搬送部４４が、第２薬剤供給部として、消石灰を含む集塵灰を煙道３に供給することにより、第１薬剤供給部４２ａにおける排ガス処理薬剤の使用量を低減することができる。さらに、ＨＣｌ濃度が所定値以上となる異常時に、第１薬剤供給部４２ａによる排ガス処理薬剤の供給量、および、集塵灰搬送部４４による集塵灰の供給量の双方または一方を、ＨＣｌ濃度が所定値未満である通常時よりも増大することにより、異常時に適切に対処することができる。図２、並びに、図５ないし図７を参照して説明したように、ＨＣｌ濃度が所定値以上となる異常時に、ＨＣｌ濃度の急激な上昇を抑制するという観点では、補助供給位置Ｐ２は、煙道３において、排ガスの発生源である燃焼室２と集塵機４３との間に設けられていればよい。 Also in the exhaust gas treatment device 4 of FIG. 7, an unused exhaust gas treatment chemical is supplied to the chemical supply position P1 between the combustion chamber 2 and the temperature reducing tower 41 by the first chemical supply unit 42a. The desalination treatment can be efficiently performed in. Further, the dust collecting ash transport unit 44 supplies the dust collecting ash containing slaked lime to the flue 3 as the second chemical supply unit, thereby reducing the amount of the exhaust gas treatment chemical used in the first chemical supply unit 42a. Can be done. Further, when the HCl concentration becomes an abnormality of a predetermined value or more, both or one of the supply amount of the exhaust gas treatment chemical by the first chemical supply unit 42a and the dust collection ash supply amount by the dust collection ash transport unit 44 is changed to the HCl concentration. Is less than a predetermined value and increases from the normal time, so that an abnormal case can be appropriately dealt with. As described with reference to FIG. 2 and FIGS. 5 to 7, the auxiliary supply position P2 is the smoke from the viewpoint of suppressing a rapid increase in the HCl concentration when the HCl concentration becomes an abnormality of a predetermined value or more. On the road 3, it may be provided between the combustion chamber 2 which is the source of the exhaust gas and the dust collector 43.

（第２実施形態）
図８は、本発明の第２実施形態に係る排ガス処理装置４を示す図である。図８の排ガス処理装置では、集塵灰搬送部４４において２つの補助供給位置Ｐ２が設定される。一方の補助供給位置Ｐ２は、煙道３における燃焼室２と減温塔４１との間であり、他方の補助供給位置Ｐ２は、減温塔４１と集塵機４３との間である。 ( Second Embodiment)
FIG. 8 is a diagram showing an exhaust gas treatment device 4 according to a second embodiment of the present invention. In the exhaust gas treatment device of FIG. 8, two auxiliary supply positions P2 are set in the dust collecting ash transport unit 44. One auxiliary supply position P2 is between the combustion chamber 2 and the temperature reducing tower 41 in the flue 3, and the other auxiliary supply position P2 is between the temperature reducing tower 41 and the dust collector 43.

図８の集塵灰搬送部４４では、図６の集塵灰搬送部４４に対して、供給コンベア４７およびシュート部４４５が追加される。供給コンベア４７は、供給コンベア４６の所定位置に接続され、当該位置から、上記一方の補助供給位置Ｐ２の上方へと連続する。これにより、上記一方の補助供給位置Ｐ２に、供給コンベア４６の一部、供給コンベア４７およびシュート部４４５を用いて集塵灰が供給可能である。上記他方の補助供給位置Ｐ２には、供給コンベア４６およびシュート部４４４を用いて集塵灰が供給可能である。図８の排ガス処理装置４においても、集塵灰搬送部４４が、第２薬剤供給部として、消石灰を含む集塵灰を煙道３に供給することにより、第１薬剤供給部４２ａにおける排ガス処理薬剤の使用量を低減することができる。また、ＨＣｌ濃度が所定値以上となる異常時に、第１薬剤供給部４２ａによる排ガス処理薬剤の供給量、および、集塵灰搬送部４４による集塵灰の供給量の双方または一方を増大することにより、適切に対処することができる。 In the dust collecting ash transporting section 44 of FIG. 8, a supply conveyor 47 and a chute section 445 are added to the dust collecting ash transporting section 44 of FIG. The supply conveyor 47 is connected to a predetermined position of the supply conveyor 46, and is continuous from that position above one of the auxiliary supply positions P2. As a result, the dust collecting ash can be supplied to the one auxiliary supply position P2 by using a part of the supply conveyor 46, the supply conveyor 47, and the chute portion 445. Dust collecting ash can be supplied to the other auxiliary supply position P2 by using the supply conveyor 46 and the chute portion 444. Also in the exhaust gas treatment device 4 of FIG. 8, the dust collecting ash transport unit 44 supplies the dust collecting ash containing slaked lime to the flue 3 as the second chemical supply unit, thereby treating the exhaust gas in the first chemical supply unit 42a. The amount of drug used can be reduced. Further, when the HCl concentration becomes abnormally equal to or higher than a predetermined value, both or one of the supply amount of the exhaust gas treatment chemical by the first chemical supply unit 42a and the supply amount of the dust collection ash by the dust collection ash transport unit 44 is to be increased. Therefore, it can be dealt with appropriately.

（変形例）
上記排ガス処理装置の実施形態では様々な変形が可能である。(Modification example)
Various modifications are possible in the embodiment of the exhaust gas treatment device.

ＨＣｌ濃度測定部４０１は、煙道３において減温塔４１と集塵機４３との間（例えば、集塵機４３の入口）に設けられてもよく、集塵機４３と煙突５２との間に設けられてもよい。煙突５２には、通常、他のＨＣｌ濃度測定部が設けられるが、ＨＣｌ濃度測定部４０１を煙突５２よりも上流側に設けることにより、排ガスのＨＣｌ濃度の変動に迅速に対応することが可能となる。または、煙突５２（煙道の一部と捉えられてもよい。）に設けられるＨＣｌ濃度測定部を用いて排ガス処理薬剤の供給量が制御されてもよい。 The HCl concentration measuring unit 401 may be provided between the temperature reducing tower 41 and the dust collector 43 (for example, the inlet of the dust collector 43) in the flue 3, or may be provided between the dust collector 43 and the chimney 52. .. The chimney 52 is usually provided with another HCl concentration measuring unit, but by providing the HCl concentration measuring unit 401 on the upstream side of the chimney 52, it is possible to quickly respond to fluctuations in the HCl concentration of the exhaust gas. Become. Alternatively, the supply amount of the exhaust gas treatment agent may be controlled by using the HCl concentration measuring unit provided in the chimney 52 (which may be regarded as a part of the flue).

排ガス処理装置４は、焼却設備１以外の設備において用いられてもよい。 The exhaust gas treatment device 4 may be used in equipment other than the incinerator equipment 1.

上記実施の形態および各変形例における構成は、相互に矛盾しない限り適宜組み合わされてよい。 The above-described embodiment and the configurations in each modification may be appropriately combined as long as they do not conflict with each other.

発明を詳細に描写して説明したが、既述の説明は例示的であって限定的なものではない。したがって、本発明の範囲を逸脱しない限り、多数の変形や態様が可能であるといえる。 Although the invention has been described in detail, the above description is exemplary and not limiting. Therefore, it can be said that many modifications and modes are possible as long as they do not deviate from the scope of the present invention.

１ 焼却設備
２ 燃焼室
３ 煙道
４ 排ガス処理装置
４０ 制御部
４１ 減温塔
４２ａ 第１薬剤供給部
４２ｂ 第２薬剤供給部
４３ 集塵機
４４ 集塵灰搬送部
４０１ ＨＣｌ濃度測定部
４２１ 消石灰貯留部
Ｐ１ 薬剤供給位置
Ｐ２ 補助供給位置
Ｓ１１〜Ｓ１３ ステップ1 Incinerator 2 Combustion chamber 3 Flue 4 Exhaust gas treatment device 40 Control unit 41 Thermostat 42a 1st chemical supply unit 42b 2nd chemical supply unit 43 Dust collector 44 Dust collection ash transport unit 401 HCl Concentration measurement unit 421 Demineralizing lime storage unit P1 Drug supply position P2 Auxiliary supply position S11-S13 Step

Claims (5)

排ガス処理装置であって、
排ガスが流れる煙道に設けられる集塵機と、
前記煙道において前記排ガスの発生源と前記集塵機との間に設けられ、前記排ガス中に水を噴霧する減温塔と、
前記煙道における前記発生源と前記減温塔との間の位置、または、前記減温塔内の位置を薬剤供給位置として、前記薬剤供給位置に、カルシウム系薬剤を含む排ガス処理薬剤を供給する第１薬剤供給部と、
前記集塵機にて捕集された集塵灰を貯留する集塵灰貯留部を有し、前記煙道において前記発生源と前記減温塔との間の補助供給位置に、前記集塵灰貯留部から前記集塵灰を供給可能である第２薬剤供給部と、
前記排ガス中のＨＣｌ濃度を測定するＨＣｌ濃度測定部と、
前記ＨＣｌ濃度が所定値以上となる場合に、前記ＨＣｌ濃度が前記所定値未満である時よりも前記第２薬剤供給部による前記補助供給位置への前記集塵灰の供給量を増大させる制御部と、
を備える排ガス処理装置。 It is an exhaust gas treatment device
A dust collector installed in the flue where exhaust gas flows,
A heat reducing tower provided between the exhaust gas source and the dust collector in the flue and spraying water into the exhaust gas.
An exhaust gas treatment chemical containing a calcium-based chemical is supplied to the chemical supply position, with the position between the source and the heat reduction tower in the flue or the position in the heat reduction tower as the chemical supply position. 1st drug supply department and
The dust collecting ash storage unit has a dust collecting ash storage unit for storing the dust collected ash collected by the dust collector, and is located at an auxiliary supply position between the source and the temperature reducing tower in the flue. The second chemical supply unit capable of supplying the dust collecting ash from
An HCl concentration measuring unit that measures the HCl concentration in the exhaust gas,
If the HCl concentration is equal to or greater than a predetermined value, the HCl concentration Ru increases the supply amount of the current Chirihai to the auxiliary supply position by the second agent supply section than when less than the predetermined value control With your department
Exhaust gas treatment device equipped with. 請求項１に記載の排ガス処理装置であって、
前記第１薬剤供給部が、カルシウム系薬剤を貯留する貯留部を有する排ガス処理装置。 The exhaust gas treatment device according to claim 1.
An exhaust gas treatment device in which the first drug supply unit has a storage unit for storing a calcium-based drug. 請求項１または２に記載の排ガス処理装置であって、
前記第２薬剤供給部が、供給コンベアおよびシュート部を用いて、前記減温塔と前記集塵機との間の位置にも前記集塵灰を供給可能であり、
前記補助供給位置への前記集塵灰の供給が、前記供給コンベアの一部、他の供給コンベアおよび他のシュート部を用いて行われる排ガス処理装置。 The exhaust gas treatment device according to claim 1 or 2.
The second agent supply section, with a feed conveyor and chute state, and are capable of supplying the current Chirihai in position between the said down cooling tower dust collector,
It said auxiliary supply of the current Chirihai to supply position, the portion of the supply conveyor, an exhaust gas treating apparatus of Ru carried out using other feed conveyors and other chute. 焼却設備であって、
廃棄物を燃焼させる燃焼室と、
前記燃焼室にて発生する排ガスを前記燃焼室から排出する煙道と、
前記煙道に設けられる請求項１ないし３のいずれかに記載の排ガス処理装置と、
を備える焼却設備。 It is an incinerator
A combustion chamber that burns waste and
A flue that discharges exhaust gas generated in the combustion chamber from the combustion chamber,
The exhaust gas treatment device according to any one of claims 1 to 3 provided on the flue.
Incinerator equipped with. 排ガス処理装置における排ガス処理方法であって、
前記排ガス処理装置が、
排ガスが流れる煙道に設けられる集塵機と、
前記煙道において前記排ガスの発生源と前記集塵機との間に設けられ、前記排ガス中に水を噴霧する減温塔と、
前記煙道における前記発生源と前記減温塔との間の位置、または、前記減温塔内の位置を薬剤供給位置として、前記薬剤供給位置に、カルシウム系薬剤を含む排ガス処理薬剤を供給する第１薬剤供給部と、
前記集塵機にて捕集された集塵灰を貯留する集塵灰貯留部を有し、前記煙道において前記発生源と前記減温塔との間の補助供給位置に、前記集塵灰貯留部から前記集塵灰を供給可能である第２薬剤供給部と、
を備え、
前記排ガス処理方法が、
ａ）前記煙道において前記発生源と前記減温塔との間の位置、または、前記減温塔内に、前記第１薬剤供給部により前記排ガス処理薬剤を供給する工程と、
ｂ）前記排ガス中のＨＣｌ濃度を測定する工程と、
ｃ）前記ＨＣｌ濃度が所定値以上となる場合に、前記ＨＣｌ濃度が前記所定値未満である時よりも前記第２薬剤供給部による前記補助供給位置への前記集塵灰の供給量を増大させる工程と、
を備える排ガス処理方法。 This is an exhaust gas treatment method for exhaust gas treatment equipment.
The exhaust gas treatment device
A dust collector installed in the flue where exhaust gas flows,
A heat reducing tower provided between the exhaust gas source and the dust collector in the flue and spraying water into the exhaust gas.
An exhaust gas treatment chemical containing a calcium-based chemical is supplied to the chemical supply position, with the position between the source and the heat reduction tower in the flue or the position in the heat reduction tower as the chemical supply position. 1st drug supply department and
The dust collecting ash storage unit has a dust collecting ash storage unit for storing the dust collected ash collected by the dust collector, and is located at an auxiliary supply position between the source and the temperature reducing tower in the flue. The second chemical supply unit capable of supplying the dust collecting ash from
With
The exhaust gas treatment method
a) A step of supplying the exhaust gas treatment agent to the position between the source and the temperature reducing tower in the flue, or into the temperature decreasing tower by the first chemical supply unit.
b) The step of measuring the HCl concentration in the exhaust gas and
c) When the HCl concentration is equal to or higher than the predetermined value, the amount of the dust-collected ash supplied to the auxiliary supply position by the second drug supply unit is increased as compared with the case where the HCl concentration is less than the predetermined value. and as that engineering,
Exhaust gas treatment method including.
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