WO2018097488A1 - Method for plating to express champagne gold color - Google Patents
Method for plating to express champagne gold color Download PDFInfo
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- WO2018097488A1 WO2018097488A1 PCT/KR2017/011806 KR2017011806W WO2018097488A1 WO 2018097488 A1 WO2018097488 A1 WO 2018097488A1 KR 2017011806 W KR2017011806 W KR 2017011806W WO 2018097488 A1 WO2018097488 A1 WO 2018097488A1
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- plating
- gold color
- champagne gold
- champagne
- fingerprint
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0015—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterized by the colour of the layer
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C9/00—Alloys based on copper
- C22C9/01—Alloys based on copper with aluminium as the next major constituent
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/228—Gas flow assisted PVD deposition
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
Definitions
- the present invention relates to a plating method for plating an emblem, a decoration, or the like to have a specific color. More specifically, the brightness L * is 78 based on the CIE color coordinate L * a * b * expression method defined by the International Lighting Commission (CIE).
- CIE International Lighting Commission
- the present invention relates to a plating method for plating a champagne gold color represented by a color corresponding to 1 to 5, a * corresponding to 1 to 5, and b * corresponding to 13 to 19.
- Decorative products such as emblems and ornaments are often attached to various products such as smartphones, automobiles, and home appliances in order to give an aesthetic luxury. These decorative products are usually formed by injection molding or the like, and are plated to give a metallic luxurious feel.
- the plating method can be largely divided into wet plating and dry plating.
- wet plating there are various problems compared to dry plating in terms of environmental problems, manufacturing cost and time. Therefore, technical research and development on dry plating using vacuum deposition equipment, such as sputtering equipment, are mainly performed.
- Korean Patent Registration No. 10-0646009 (ABS resin and dry plating method on plastics) and the like disclose a dry plating technology for plastic, which is an injection molded product.
- two or more metallic sputter targets may be used together with the inert gas and various reaction gases.
- the inert gas and various reaction gases In the case of dry plating using two or more sputter targets and various gas types, there was a problem in that reproducibility of plating color was inferior.
- An object of the present invention is to solve the above-mentioned problems, to provide a champagne gold color plating method that can improve the reproducibility of the plating of a specific color, such as champagne gold using a sputtering equipment.
- Champagne gold plating method for achieving the above object is a sputter target (sputter) made of an alloying material containing copper and aluminum, the plating object to be plated is placed in the plating position in the sputter (sputter) a plating preparation step of positioning the target in the sputter; And a plating step of plating the plating object by sputtering by colliding ions on the sputter target prepared in the plating preparation step and depositing on the plating object.
- the CIE color coordinate L * defined by the International Commission on Illumination (CIE). Based on a * b * expression, a * may be characterized by plating the plating object such that a * corresponds to 1 to 5 and b * represents a champagne gold color represented by a color corresponding to 13 to 19. have.
- the brightness L * of the champagne gold color may be another feature that corresponds to between 78 and 95.
- the inert gas is argon, the atmosphere gas It may also be another feature to supply more.
- argon supplied as the atmosphere gas and SCCM (Standard Cubic Centimeter per Minute) ratio may be another feature that corresponds to 1: 0.04 to 1: 0.15.
- the sputter target is an alloy material consisting of copper and aluminum
- the weight ratio (wt%) of copper and aluminum may be another feature that corresponds to between 80:20 to 90:10.
- the protective layer forming step of forming a protective layer on the upper side of the plating layer formed by plating the plating object in the plating step may also be another feature to include a further.
- the protective layer It may also be another feature to be.
- the anti-fingerprint layer formed in the anti-fingerprint layer forming step may be another feature that is formed by spray coating the anti-fingerprint liquid on the protective layer and then drying.
- the anti-fingerprint may be dried by irradiating ultraviolet light.
- the brightness L * is between 78 and 95
- a * is 1 to 5
- B * is to improve the reproducibility of the champagne gold color represented by the color corresponding to 13 to 19 and to suppress the occurrence of dichroic phenomenon, so that the plating quality of the plating object such as an emblem or a decoration It has the effect of improving.
- FIG. 1 is a flow chart schematically showing a champagne gold color plating method according to an embodiment of the present invention.
- FIG. 2 is a champagne gold color plating method according to an embodiment of the present invention, when the deposition by using a sputter target made of copper and aluminum alloy material in an argon atmosphere gas and the copper, aluminum sputter target was deposited by using together In this case, the color coordinates of the plated color and the reflectance for each wavelength can be compared.
- 3 is a champagne gold color plating method according to an embodiment of the present invention, when using a sputter target made of an alloy material of copper and aluminum in an argon and nitrogen atmosphere gas and using a copper, aluminum sputter target together In the case of vapor deposition, the color coordinates of the plated color and the reflectivity for each wavelength can be compared.
- FIG. 4 is an image view schematically showing an SEM image showing a surface of a plating layer deposited on champagne gold color according to an embodiment of the present invention.
- FIG 5 is a schematic view showing an AFM image, etc. showing the surface of the plating layer deposited in the champagne gold color plating method according to an embodiment of the present invention.
- FIG. 6 is an XPS diagram graphically showing the intrinsic components of the deposited plating layer in the champagne gold color plating method according to an embodiment of the present invention.
- FIG. 1 is a flow chart schematically showing a champagne gold color plating method according to an embodiment of the present invention
- Figure 2 is a champagne gold color plating method according to an embodiment of the present invention, an alloying material of copper and aluminum in argon atmosphere gas
- Figure 3 is a view of the present invention
- the deposition by using a sputter target made of copper and aluminum alloy material in the argon and nitrogen atmosphere gas and the deposition using both copper and aluminum sputter target together The color coordinates and reflectance of each wavelength can be compared for comparison.
- FIG. 4 is an image diagram schematically showing an SEM image showing the surface of the plating layer deposited in the champagne gold color plating method according to an embodiment of the present invention
- Figure 5 is a champagne gold according to an embodiment of the present invention
- an AFM image and the like showing the surface of the deposited plating layer are schematically illustrated.
- the brightness L * is between 78 to 95 based on the CIE color coordinate L * a * b * expression method defined by the International Illumination Commission (CIE)
- CIE International Illumination Commission
- a * corresponds to 1 to 5
- b * is a method of plating a champagne gold color represented by a color corresponding to 13 to 19.
- a plating preparation step (S110) and a plating step (S120) are performed. It includes, and preferably further comprises a protective layer forming step (S130), more preferably further comprises an anti-fingerprint layer forming step (S140).
- the champagne gold color plating method may be made in a deposition apparatus such as a sputter apparatus, and in this embodiment, the plating by deposition using the sputter apparatus will be described as an example.
- the plating preparation step (S110) is a step of placing the plating object 100 to be plated at a plating position in a sputter (not shown), and placing a sputter target (not shown) in the sputter.
- Sputter targets made of copper and sputter targets made of aluminum are separately prepared and placed in the sputter, and it may be desirable to co-deposition together in the plating step (S120). It is preferable to use a single sputter target, which is an alloy material containing copper and aluminum.
- the weight ratio (wt%) of copper and aluminum in the sputter target made of an alloy material made of copper and aluminum preferably corresponds to between 80:20 and 90:10.
- Plating step (S120) is a step of plating the plating target 100 by sputtering to collide with ions to the sputter target prepared in the plating preparation step (S110) to deposit on the plating target 100.
- sputtering is performed using an inert gas, which is a Group 8 element, as an atmospheric gas at a predetermined vacuum degree.
- the atmosphere gas refers to a gas present around the sputter target for sputtering in a chamber environment in which sputtering is performed. Therefore, in the present specification, the atmosphere gas generically refers to the discharge gas and the reaction gas in the sputtering equipment. If the discharge gas and the reactive gas are distinguished, the discharge gas is an inert gas, and the reaction gas will be described later. It can be said to mean a gas such as.
- the inert gas is preferably argon, more preferably argon and a small amount of It is preferable to supply together as an atmosphere gas.
- argon supplied as the atmosphere gas SCCM Standard Cubic Centimeter per Minute
- SCCM Standard Cubic Centimeter per Minute ratio of preferably corresponds to 1: 0.04 to 1: 0.15.
- SCCM Standard Cubic Centimeter per Minute
- the plating layer 110 is formed on the plating object 100.
- the plating layer 110 may be finished by forming the plating layer 110 through the plating step (S120), it is preferable to form a protective layer through the protective layer forming step (S130) to protect the plating layer (110).
- the protective layer forming step (S130) is a step of forming the protective layer 120 on the upper side of the plating layer 110 formed by plating the plating object 100 in the plating step (S120).
- the protective layer 120 is Is preferably.
- the protective layer 120 may also be formed by sputtering or the like.
- the protective layer 120 is preferably formed because the protective layer 120 can be protected from discoloration or dichroic phenomenon.
- furnace protection layer 120 is formed because the oxidation prevention and the corrosion resistance are improved.
- Anti-fingerprint layer forming step (S140) is a step of forming an anti-fingerprint (Anti-Finger print) layer 130 so as not to leave fingerprint marks on the upper side of the protective layer 120 formed in the protective layer forming step (S130).
- the anti-fingerprint layer 130 in the anti-fingerprint layer forming step (S140) is applied to the anti-fingerprint solution on the protective layer 130.
- a method of applying the anti-fingerprint solution on the protective layer 130 it is also possible to use a method such as spray coating or spin coating.
- the anti-fingerprint liquid is evenly applied on the protective layer 130 and then dried to form the anti-fingerprint layer 130. It is also preferable to dry by applying heat, and in addition, it is also preferable to form the anti-fingerprint layer 130 by irradiating with ultraviolet rays to dry.
- the antifingerprint layer 130 can be formed.
- the anti-fingerprint layer 130 When the anti-fingerprint layer 130 is formed in this way, the occurrence of changes over time or oxidation at room temperature is suppressed, and scratches may also be suppressed.
- the XPS graph showing the intrinsic components of the deposited plating layer is shown in FIG.
- the inherent peaks of copper peaks (WL43: Cu111, WL52: 200) were added to the nitrogen process gas under two conditions to minimize WL43 and shift the peak of WL45 of aluminum to short wavelength.
- the brightness L * corresponds to 78 to 95 based on the CIE color coordinate L * a * b * expression method defined by the International Lighting Commission (CIE), a * is between 1 and 5, and b * is used to increase the reproducibility of the champagne gold color represented by the color corresponding to 13 to 19, and to suppress the occurrence of dichroism, and so on.
- CIE International Lighting Commission
- a * is between 1 and 5
- b * is used to increase the reproducibility of the champagne gold color represented by the color corresponding to 13 to 19, and to suppress the occurrence of dichroism, and so on.
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- Engineering & Computer Science (AREA)
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- Physical Vapour Deposition (AREA)
Abstract
The present invention relates to a plating method for plating using a sputter, the method comprising: a plating preparation step of positioning an object to be plated at a plating position in a sputter and a sputtering target made of an alloy material including copper and aluminum in the sputter; and a plating step of plating the object by sputtering in which ions collide with the sputtering target prepared in the plating preparation step to deposit the target on the object. Accordingly, the present invention can plate an object to exhibit a champagne gold color as expressed by the CIE color coordinate L*a*b* expression method regulated by Commission Internationale de I'Eclairage (CIE) wherein a* corresponds to 1 to 5 and b* corresponds to 13 to 19, and thus can enhance the reproducibility of the champagne gold color and restrain the appearance of different colors, etc.
Description
본 발명은 앰블럼이나 장식물 등이 특정 색상을 갖도록 도금시키는 도금방법에 관한 것으로, 보다 상세하게는 국제조명위원회(CIE)에서 규정한 CIE 색좌표 L*a*b* 표현법에 의거하여 명도 L*는 78 내지 95 사이에 해당되고, a*는 1 내지 5 사이에 해당되고 b*는 13 내지 19 에 해당되는 색상으로 표현되는 샴페인골드 색상을 도금시키는 도금방법에 관한 것이다.The present invention relates to a plating method for plating an emblem, a decoration, or the like to have a specific color. More specifically, the brightness L * is 78 based on the CIE color coordinate L * a * b * expression method defined by the International Lighting Commission (CIE). The present invention relates to a plating method for plating a champagne gold color represented by a color corresponding to 1 to 5, a * corresponding to 1 to 5, and b * corresponding to 13 to 19.
스마트폰, 자동차, 가전제품 등 다양한 제품들에는 미적으로 고급스러운 느낌을 주기 위하여 앰블럼이나 장식품 등과 같은 장식성 제품들이 부착되는 경우가 많다. 이러한 장식성 제품들은 대체로 사출성형 등의 방법으로 사출물을 형성시키고 금속성의 고급스러운 느낌을 주기 위하여 도금을 한다.Decorative products such as emblems and ornaments are often attached to various products such as smartphones, automobiles, and home appliances in order to give an aesthetic luxury. These decorative products are usually formed by injection molding or the like, and are plated to give a metallic luxurious feel.
여기서 다양한 색상을 구현하기 위하여 다양한 도금재료와 도금방법을 적용하여 생산하고 있다. 도금방법으로는 크게 습식도금과 건식도금으로 나뉠 수 있는데 습식도금의 경우 환경상의 문제, 제조비용과 시간 등에서 건식도금에 비하여 다양한 문제점이 있다. 따라서, 주로 스퍼터장비와 같은 진공증착설비를 이용한 건식도금에 대한 기술연구개발이 많이 이루어지고 있다. In order to realize various colors, various plating materials and plating methods are applied. The plating method can be largely divided into wet plating and dry plating. In the case of wet plating, there are various problems compared to dry plating in terms of environmental problems, manufacturing cost and time. Therefore, technical research and development on dry plating using vacuum deposition equipment, such as sputtering equipment, are mainly performed.
이러한 건식도금에 관련하여 대한민국 등록특허 제 10-0646009호 (에이비에스수지 및 플라스틱 상의 건식도금 방법.) 등에서는 사출성형물인 플라스틱 등에 대한 건식도금기술이 개시되어 있다. In connection with such dry plating, Korean Patent Registration No. 10-0646009 (ABS resin and dry plating method on plastics) and the like disclose a dry plating technology for plastic, which is an injection molded product.
그러나 이러한 선행기술 1 등에는 다음과 같은 문제점이 있었다. However, the prior art 1 and the like had the following problems.
샴페인골드 등과 같이 특정 색상을 구현하기 위하여 둘 이상의 금속성 스퍼터타겟을 함께 증착에 이용하면서 불활성가스와 여러 반응가스를 함께 사용하여야 하는 경우도 있다. 둘 이상의 스퍼터타겟과 여러 가스종류를 사용하여 건식도금을 하는 경우 동일한 조건이지만 도금 색상의 재연성이 떨어지는 문제점이 있었다. In order to achieve a specific color, such as champagne gold, two or more metallic sputter targets may be used together with the inert gas and various reaction gases. In the case of dry plating using two or more sputter targets and various gas types, there was a problem in that reproducibility of plating color was inferior.
본 발명의 목적은 상기한 종래의 문제점을 해결하기 위한 것으로, 스퍼터장비를 이용하여 샴페인골드와 같은 특정 색상의 도금 재연성을 향상시킬 수 있는 샴페인골드 색상 도금방법을 제공함에 있다.An object of the present invention is to solve the above-mentioned problems, to provide a champagne gold color plating method that can improve the reproducibility of the plating of a specific color, such as champagne gold using a sputtering equipment.
상기와 같은 목적을 달성하기 위한 본 발명의 실시 예에 따른 샴페인골드 도금방법은 도금시킬 도금대상체를 스퍼터(sputter) 내 도금위치에 위치시키고, 구리 및 알루미늄을 포함하는 합금물질로 이루어진 스퍼터타겟(sputter target)을 스퍼터 내에 위치시키는 도금준비단계; 및 상기 도금준비단계에서 준비된 상기 스퍼터타겟에 이온을 충돌시켜서 상기 도금대상체에 증착시키는 스퍼터링에 의해 상기 도금대상체를 도금시키는 도금단계;를 포함함으로써, 국제조명위원회(CIE)에서 규정한 CIE 색좌표 L*a*b* 표현법에 의거하여 a*는 1 내지 5 사이에 해당되고 b*는 13 내지 19 에 해당되는 색상으로 표현되는 샴페인골드 색상을 나타내도록 상기 도금대상체를 도금시키는 것을 하나의 특징으로 할 수도 있다. Champagne gold plating method according to an embodiment of the present invention for achieving the above object is a sputter target (sputter) made of an alloying material containing copper and aluminum, the plating object to be plated is placed in the plating position in the sputter (sputter) a plating preparation step of positioning the target in the sputter; And a plating step of plating the plating object by sputtering by colliding ions on the sputter target prepared in the plating preparation step and depositing on the plating object. The CIE color coordinate L * defined by the International Commission on Illumination (CIE). Based on a * b * expression, a * may be characterized by plating the plating object such that a * corresponds to 1 to 5 and b * represents a champagne gold color represented by a color corresponding to 13 to 19. have.
여기서, 샴페인골드 색상의 명도 L*는 78 내지 95 사이에 해당되는 것을 또 하나의 특징으로 할 수도 있다. Here, the brightness L * of the champagne gold color may be another feature that corresponds to between 78 and 95.
여기서, 상기 도금단계에서, 소정의 진공도에서 이루어지는 상기 스퍼터링의 분위기가스로 불활성가스를 공급시켜주는 것을 또 하나의 특징으로 할 수도 있다. Here, in the plating step, it may be another feature to supply an inert gas to the atmosphere gas of the sputtering made at a predetermined degree of vacuum.
나아가, 상기 불활성가스는 아르곤이며, 상기 분위기가스로 를 더 공급시켜주는 것을 또 하나의 특징으로 할 수도 있다. Further, the inert gas is argon, the atmosphere gas It may also be another feature to supply more.
더 나아가, 상기 분위기가스로서 공급되는 아르곤과 의 SCCM(Standard Cubic Centimeter per Minute) 비는 1 : 0.04 내지 1 : 0.15 사이에 해당되는 것을 또 하나의 특징으로 할 수도 있다. Furthermore, argon supplied as the atmosphere gas and SCCM (Standard Cubic Centimeter per Minute) ratio may be another feature that corresponds to 1: 0.04 to 1: 0.15.
여기서, 상기 스퍼터타겟은 구리 및 알루미늄으로 이루어진 합금물질로서, 구리 및 알루미늄의 중량비(wt%)는 80 : 20 내지 90 : 10 사이에 해당되는 것을 또 하나의 특징으로 할 수도 있다. Here, the sputter target is an alloy material consisting of copper and aluminum, the weight ratio (wt%) of copper and aluminum may be another feature that corresponds to between 80:20 to 90:10.
여기서, 상기 도금단계에서 상기 도금대상체에 대하여 도금을 시켜서 형성된 도금층의 상측에 보호층을 형성시키는 보호층형성단계; 를 더 포함하는 것을 또 하나의 특징으로 할 수도 있다. Here, the protective layer forming step of forming a protective layer on the upper side of the plating layer formed by plating the plating object in the plating step; It may also be another feature to include a further.
나아가, 상기 보호층은 인 것을 또 하나의 특징으로 할 수도 있다. Further, the protective layer It may also be another feature to be.
나아가, 상기 보호층형성단계에서 형성된 상기 보호층의 상측에 지문자국이 남지 않도록 안티지문(Anti-Finger print)층을 형성시키는 안티지문층형성단계; 를 더 포함하는 것을 또 하나의 특징으로 할 수도 있다. Furthermore, an anti-fingerprint layer forming step of forming an anti-fingerprint layer so that fingerprint marks do not remain on the protective layer formed in the protective layer forming step; It may also be another feature to include a further.
더 나아가, 상기 안티지문층형성단계에서 형성되는 상기 안티지문층은, 안티지문액을 상기 보호층 위에 스프레이 도포한 후 건조시켜서 형성되는 것을 또 하나의 특징으로 할 수도 있다. Furthermore, the anti-fingerprint layer formed in the anti-fingerprint layer forming step may be another feature that is formed by spray coating the anti-fingerprint liquid on the protective layer and then drying.
더 나아가, 상기 안티지문액에 대한 건조는 자외선을 조사하여 이루어지는 것을 또 하나의 특징으로 할 수도 있다. Furthermore, the anti-fingerprint may be dried by irradiating ultraviolet light.
본 발명에 따른 샴페인골드 도금방법에 따르면, 국제조명위원회(CIE)에서 규정한 CIE 색좌표 L*a*b* 표현법에 의거하여 명도 L*는 78 내지 95 사이에 해당되고, a*는 1 내지 5 사이에 해당되며, b*는 13 내지 19 에 해당되는 색상으로 표현되는 샴페인골드 색상의 재연성을 증진시켜주고 이색현상 등의 발생을 억제할 수 있므로 앰블럼이나 장식물 등과 같은 도금대상체에 대한 도금품질을 향상시켜 주는 효과가 있다. According to the champagne gold plating method according to the present invention, based on the CIE color coordinate L * a * b * expression method defined by the International Illumination Commission (CIE), the brightness L * is between 78 and 95, a * is 1 to 5 B * is to improve the reproducibility of the champagne gold color represented by the color corresponding to 13 to 19 and to suppress the occurrence of dichroic phenomenon, so that the plating quality of the plating object such as an emblem or a decoration It has the effect of improving.
도 1은 본 발명의 실시 예에 따른 샴페인골드 색상 도금방법을 개략적으로 나타낸 순서도이다.1 is a flow chart schematically showing a champagne gold color plating method according to an embodiment of the present invention.
도 2는 본 발명의 실시 예에 따른 샴페인골드 색상 도금방법에서, 아르곤 분위기가스 속에서 구리 및 알루미늄 합금물질로된 스퍼터타겟을 이용하여 증착시켰을 경우와 구리, 알루미늄 스퍼터타겟 각각을 함께 이용하여 증착시켰을 경우 도금된 색상의 색좌표 및 파장별 반사율을 개략적으로 비교해 볼 수 있도록 나타낸 도면이다.2 is a champagne gold color plating method according to an embodiment of the present invention, when the deposition by using a sputter target made of copper and aluminum alloy material in an argon atmosphere gas and the copper, aluminum sputter target was deposited by using together In this case, the color coordinates of the plated color and the reflectance for each wavelength can be compared.
도 3은 본 발명의 실시 예에 따른 샴페인골드 색상 도금방법에서, 아르곤과 질소 분위기가스 속에서 구리 및 알루미늄의 합금물질로 된 스퍼터타겟을 이용하여 증착시켰을 경우와 구리, 알루미늄 스퍼터타겟 각각을 함께 이용하여 증착시켰을 경우 도금된 색상의 색좌표 및 파장별 반사율을 개략적으로 비교해 볼 수 있도록 나타낸 도면이다.3 is a champagne gold color plating method according to an embodiment of the present invention, when using a sputter target made of an alloy material of copper and aluminum in an argon and nitrogen atmosphere gas and using a copper, aluminum sputter target together In the case of vapor deposition, the color coordinates of the plated color and the reflectivity for each wavelength can be compared.
도 4는 본 발명의 실시 예에 따른 샴페인골드 색상 도금방법에서, 증착도금된 도금층 표면을 나타낸 SEM 이미지를 개략적으로 나타낸 이미지도면이다.FIG. 4 is an image view schematically showing an SEM image showing a surface of a plating layer deposited on champagne gold color according to an embodiment of the present invention.
도 5는 본 발명의 실시 예에 따른 샴페인골드 색상 도금방법에서, 증착도금된 도금층의 표면을 나타낸 AFM 이미지 등을 개략적으로 나타낸 도면이다.5 is a schematic view showing an AFM image, etc. showing the surface of the plating layer deposited in the champagne gold color plating method according to an embodiment of the present invention.
도 6은 본 발명의 실시 예에 따른 샴페인골드 색상 도금방법에서, 증착도금된 도금층의 고유성분을 그래프로 나타낸 XPS도면이다.6 is an XPS diagram graphically showing the intrinsic components of the deposited plating layer in the champagne gold color plating method according to an embodiment of the present invention.
이하에서는 본 발명에 대하여 보다 구체적으로 이해할 수 있도록 첨부된 도면을 참조한 바람직한 실시 예를 들어 설명하기로 한다. Hereinafter, a preferred embodiment with reference to the accompanying drawings to be described in more detail with respect to the present invention will be described.
도 1은 본 발명의 실시 예에 따른 샴페인골드 색상 도금방법을 개략적으로 나타낸 순서도이고, 도 2는 본 발명의 실시 예에 따른 샴페인골드 색상 도금방법에서, 아르곤 분위기가스 속에서 구리 및 알루미늄의 합금물질로 된 스퍼터타겟을 이용하여 증착시켰을 경우와 구리, 알루미늄 스퍼터타겟 각각을 함께 이용하여 증착시켰을 경우 도금된 색상의 색좌표 및 파장별 반사율을 개략적으로 비교해 볼 수 있도록 나타낸 도면이며, 도 3은 본 발명의 실시 예에 따른 샴페인골드 색상 도금방법에서, 아르곤과 질소 분위기가스 속에서 구리 및 알루미늄 합금물질로된 스퍼터타겟을 이용하여 증착시켰을 경우와 구리, 알루미늄 스퍼터타겟 각각을 함께 이용하여 증착시켰을 경우 도금된 색상의 색좌표 및 파장별 반사율을 개략적으로 비교해 볼 수 있도록 나타낸 도면이고, 도 4는 본 발명의 실시 예에 따른 샴페인골드 색상 도금방법에서, 증착도금된 도금층 표면을 나타낸 SEM 이미지를 개략적으로 나타낸 이미지도면이며, 도 5는 본 발명의 실시 예에 따른 샴페인골드 색상 도금방법에서, 증착도금된 도금층의 표면을 나타낸 AFM 이미지 등을 개략적으로 나타낸 도면이다.1 is a flow chart schematically showing a champagne gold color plating method according to an embodiment of the present invention, Figure 2 is a champagne gold color plating method according to an embodiment of the present invention, an alloying material of copper and aluminum in argon atmosphere gas In the case of using a sputter target to be deposited and when using a copper and aluminum sputter target together to deposit the color coordinates of the plated color and reflectance for each wavelength can be compared to show the schematic, Figure 3 is a view of the present invention In the champagne gold color plating method according to the embodiment, when the deposition by using a sputter target made of copper and aluminum alloy material in the argon and nitrogen atmosphere gas and the deposition using both copper and aluminum sputter target together The color coordinates and reflectance of each wavelength can be compared for comparison. 4 is an image diagram schematically showing an SEM image showing the surface of the plating layer deposited in the champagne gold color plating method according to an embodiment of the present invention, Figure 5 is a champagne gold according to an embodiment of the present invention In the color plating method, an AFM image and the like showing the surface of the deposited plating layer are schematically illustrated.
먼저 도 1을 참조하면, 본 발명의 실시 예에 따른 샴페인골드 색상 도금 방법은, 국제조명위원회(CIE)에서 규정한 CIE 색좌표 L*a*b* 표현법에 의거하여 명도 L*는 78 내지 95 사이에 해당되고, a*는 1 내지 5 사이에 해당되며, b*는 13 내지 19 에 해당되는 색상으로 표현되는 샴페인골드 색상으로 도금시키는 방법으로서, 도금준비단계(S110) 및 도금단계(S120)를 포함하며, 바람직하게는 보호층형성단계(S130)를 더 포함하고, 더욱 바람직하게는 안티지문층형성단계(S140)를 더 포함하여 이루어진다. Referring first to Figure 1, the champagne gold color plating method according to an embodiment of the present invention, the brightness L * is between 78 to 95 based on the CIE color coordinate L * a * b * expression method defined by the International Illumination Commission (CIE) In this case, a * corresponds to 1 to 5, and b * is a method of plating a champagne gold color represented by a color corresponding to 13 to 19. A plating preparation step (S110) and a plating step (S120) are performed. It includes, and preferably further comprises a protective layer forming step (S130), more preferably further comprises an anti-fingerprint layer forming step (S140).
이러한 샴페인골드 색상 도금방법은 스퍼터(sputter)장비와 같은 증착장비 내에서 이루어질 수 있으며, 본 실시 예에서는 스퍼터장비를 이용하여 증착에 의한 도금이 이루어지는 것을 예로서 설명하기로 한다. The champagne gold color plating method may be made in a deposition apparatus such as a sputter apparatus, and in this embodiment, the plating by deposition using the sputter apparatus will be described as an example.
<<S110>><< S110 >>
먼저, 도금준비단계(S110)는 도금시킬 도금대상체(100)를 스퍼터(sputter)(미도시) 내 도금위치에 위치시키고, 스퍼터타겟(sputter)(미도시)을 스퍼터 내에 위치시키는 단계이다. First, the plating preparation step (S110) is a step of placing the plating object 100 to be plated at a plating position in a sputter (not shown), and placing a sputter target (not shown) in the sputter.
구리로 된 스퍼터타겟과 알루미늄으로된 스퍼터타겟 각각을 별도로 준비하여 스퍼터 내에 위치시키고, 도금단계(S120)에서 함께 증착(co-deposition)하는 것도 바람직하겠으나. 구리 및 알루미늄을 포함하는 합금물질인 단일 스퍼터타겟을 이용하는 것이 바람직하다. Sputter targets made of copper and sputter targets made of aluminum are separately prepared and placed in the sputter, and it may be desirable to co-deposition together in the plating step (S120). It is preferable to use a single sputter target, which is an alloy material containing copper and aluminum.
여기서, 구리 및 알루미늄으로 이루어진 합금물질로 이루어진 스퍼터타겟에서 구리 및 알루미늄의 중량비(wt%)는 80 : 20 내지 90 : 10 사이에 해당되는 것이 바람직하다.Here, the weight ratio (wt%) of copper and aluminum in the sputter target made of an alloy material made of copper and aluminum preferably corresponds to between 80:20 and 90:10.
<<S120>><< S120 >>
도금단계(S120)는 도금준비단계(S110)에서 준비된 스퍼터타겟에 이온을 충돌시켜서 도금대상체(100)에 증착시키는 스퍼터링에 의해 도금대상체(100)를 도금시키는 단계이다. Plating step (S120) is a step of plating the plating target 100 by sputtering to collide with ions to the sputter target prepared in the plating preparation step (S110) to deposit on the plating target 100.
이러한 도금단계(S120)에서는 소정의 진공도에서 8족 원소인 불활성가스를 분위기가스로 하여 스퍼터링이 이루어지는 것이 바람직하다. In the plating step (S120), it is preferable that sputtering is performed using an inert gas, which is a Group 8 element, as an atmospheric gas at a predetermined vacuum degree.
여기서 분위기가스라 함은 스퍼터링이 이루어지는 챔버 환경 속에서 스퍼터링을 위해 스퍼터타겟 주변에 존재하는 가스를 말한다. 따라서, 본 명세서 상에서 분위기가스는 스퍼터장비에서 방전가스와 반응가스를 총칭한다. 굳이 방전가스와 반응가스를 구분한다면, 방전가스는 불활성가스이며, 반응가스는 후술할 등과 같은 가스를 의미한다고 할 수 있다.Here, the atmosphere gas refers to a gas present around the sputter target for sputtering in a chamber environment in which sputtering is performed. Therefore, in the present specification, the atmosphere gas generically refers to the discharge gas and the reaction gas in the sputtering equipment. If the discharge gas and the reactive gas are distinguished, the discharge gas is an inert gas, and the reaction gas will be described later. It can be said to mean a gas such as.
그리고 불활성가스는 아르곤인 것이 바람직하며, 더욱 바람직하게는 아르곤과 소량의 를 함께 분위기가스로서 공급시켜주는 것이 바람직하다. And the inert gas is preferably argon, more preferably argon and a small amount of It is preferable to supply together as an atmosphere gas.
여기서 분위기가스로서 공급되는 아르곤과 의 SCCM(Standard Cubic Centimeter per Minute) 비는 1 : 0.04 내지 1 : 0.15 사이에 해당되는 것이 바람직하다. 예를 들어, 아르곤을 100SCCM 으로 한다면, 는 4 SCCM 내지 15 SCCM 사이에 해당되도록 설정하여 주는 것이 바람직하다는 것이다.Where argon supplied as the atmosphere gas SCCM (Standard Cubic Centimeter per Minute) ratio of preferably corresponds to 1: 0.04 to 1: 0.15. For example, if you set argon to 100SCCM, Is preferably set to correspond to between 4 SCCM and 15 SCCM.
이와 같은 방법으로 도금대상체(100)에 대하여 도금층(110)을 형성시켜준다.In this manner, the plating layer 110 is formed on the plating object 100.
여기서, 도 4 또는 도 5에서 참조되는 바와 같이 스퍼터타겟으로 구리와 알루미늄 각각을 따로 마련하여 함께 아르곤 분위기가스 속에서 증착시켜서 형성시킨 도금층(110)의 표면보다 구리와 알루미늄 합금물질로 된 단일한 스퍼터타겟으로 아르곤 분위기가스 속에서 증착시켜서 형성된 도금층(110)의 표면이 좀 더 고르게 형성된 것을 알 수 있다. Here, a single sputter made of copper and aluminum alloy material than the surface of the plating layer 110 formed by depositing each of copper and aluminum separately as a sputter target and being deposited together in an argon atmosphere gas, as shown in FIG. 4 or 5. It can be seen that the surface of the plating layer 110 formed by depositing in an argon atmosphere gas is more evenly formed as a target.
그리고, 도 4에서 참조되는 바와 같이 구리와 알루미늄 합금물질로 된 단일한 스퍼터타겟으로 아르곤 분위기가스 속에서 증착시켜서 형성된 도금층(110)의 표면보다 질소와 아르곤 분위기가스 속에서 증착시켜서 형성된 도금층(110)의 표면이 더욱 고르게 형성된 것을 알 수 있다. 4, the plating layer 110 formed by depositing in an atmosphere of nitrogen and argon gas rather than the surface of the plating layer 110 formed by depositing in an atmosphere of argon with a single sputter target made of copper and an aluminum alloy material, as shown in FIG. 4. It can be seen that the surface of is formed more evenly.
이와 같이 도금층(110)의 표면의 고른 정도가 달리 형성되지만, 성분비는 3가지의 경우 모두 동일한 성분비를 나타나게 된다.As described above, evenness of the surface of the plating layer 110 is different, but the component ratios are the same in all three cases.
도금단계(S120)를 통해 도금층(110)을 형성시키는 것으로 마무리 지을 수도 있겠으나, 도금층(110)을 보호하기 위하여 보호층형성단계(S130)을 통하여 보호층을 형성시키는 것이 바람직하다.Although it may be finished by forming the plating layer 110 through the plating step (S120), it is preferable to form a protective layer through the protective layer forming step (S130) to protect the plating layer (110).
<<S130>><< S130 >>
다음으로 보호층형성단계(S130)는 도금단계(S120)에서 도금대상체(100)에 대하여 도금을 시켜서 형성된 도금층(110)의 상측에 보호층(120)을 형성시키는 단계이다.Next, the protective layer forming step (S130) is a step of forming the protective layer 120 on the upper side of the plating layer 110 formed by plating the plating object 100 in the plating step (S120).
여기서 보호층(120)은 인 것이 바람직하다. 그리고 이러한 보호층(120)은 스퍼터링 등에 의한 방법으로 형성시킬 수도 있다.Where the protective layer 120 is Is preferably. The protective layer 120 may also be formed by sputtering or the like.
도금층(110) 상측에 로 보호층(120)을 형성시키면, 변색 또는 이색현상이 발생되지 않도록 보호할 수 있으므로 바람직하다.On top of the plating layer 110 The protective layer 120 is preferably formed because the protective layer 120 can be protected from discoloration or dichroic phenomenon.
또한 이와 같이 로 보호층(120)을 형성시키면 산화방지 및 내부식성이 향상되므로 바람직하다.Also like this It is preferable to form the furnace protection layer 120 because the oxidation prevention and the corrosion resistance are improved.
이상의 보호층(120)을 형성시키는 것까지만 해도 충분할 수 있으나, 보호층(120)에 사용자의 손 등과 접촉되는 경우 지문이 묻어나는 현상을 예방 내지 억제하기 위하여 다음과 같은 안티지문형성단계(S140)을 더 포함하여 이루어지는 것 또한 바람직하다. It may be sufficient even to form the above protective layer 120, but in order to prevent or suppress the phenomenon that the fingerprint is buried in contact with the user's hand and the like in the protective layer 120 as follows (S140) It is also preferable that it further comprises.
<<S140>><< S140 >>
안티지문층형성단계(S140)는 보호층형성단계(S130)에서 형성된 보호층(120)의 상측에 지문자국이 남지 않도록 안티지문(Anti-Finger print)층(130)을 형성시키는 단계이다. Anti-fingerprint layer forming step (S140) is a step of forming an anti-fingerprint (Anti-Finger print) layer 130 so as not to leave fingerprint marks on the upper side of the protective layer 120 formed in the protective layer forming step (S130).
이러한 안티지문층형성단계(S140)에서 안티지문층(130)을 형성시키기 위하여 안티지문액을 보호층(130) 위에 도포시켜준다. 여기서 안티지문액을 보호층(130) 위에 도포시키는 방법으로 다양한 방법이 있을 수 있겠으나, 스프레이 도포 또는 스핀코팅 등의 방법을 이용하는 것 또한 충분히 가능하다.In order to form the anti-fingerprint layer 130 in the anti-fingerprint layer forming step (S140) is applied to the anti-fingerprint solution on the protective layer 130. There may be a variety of methods as a method of applying the anti-fingerprint solution on the protective layer 130, it is also possible to use a method such as spray coating or spin coating.
안티지문액을 보호층(130)위에 고르게 도포시킨 후 건조시켜서 안티지문층(130)을 형성시키게 된다. 여기서 열을 가하여 건조시키는 것도 바람직하며, 이에 더하여 자외선을 조사하여 건조시킴으로써 안티지문층(130)을 형성시키는 것 또한 바람직하다. The anti-fingerprint liquid is evenly applied on the protective layer 130 and then dried to form the anti-fingerprint layer 130. It is also preferable to dry by applying heat, and in addition, it is also preferable to form the anti-fingerprint layer 130 by irradiating with ultraviolet rays to dry.
이와 같이 하여 안티지문층(130)을 형성시킬 수가 있다. In this way, the antifingerprint layer 130 can be formed.
이와 같이 안티지문층(130)을 형성시키게 되면 상온에서 경시변화현상 또는 산화현상의 발생이 억제되며, 스크레치 발생 또한 억제될 수 있으므로 바람직하다.When the anti-fingerprint layer 130 is formed in this way, the occurrence of changes over time or oxidation at room temperature is suppressed, and scratches may also be suppressed.
이상에서 설명한 바와 같은 단계들을 통하여 샴페인골드 색상으로 도금시킬 수가 있게 된다.Through the steps as described above it is possible to plate the champagne gold color.
참고로 아르곤 분위기가스 속에서 구리와 알루미늄이 80 : 20 내지 90 : 10 사이의 비율로 합금물질로 된 스퍼터타겟으로 도금한 경우와 구리와 알루미늄 각각 따로 된 스퍼터타겟으로 도금한 경우의 색좌표 및 파장별 반사율을 도 2에 개략적으로 나타내었다. For reference, in the argon atmosphere, copper and aluminum were plated with a sputter target made of an alloying material at a ratio between 80: 20 and 90: 10 and color coordinates and wavelengths when plated with a sputter target made of copper and aluminum separately. Reflectance is schematically shown in FIG. 2.
그리고, 아르곤과 소량의 분위기 가스 속에서 구리와 알루미늄이 80 : 20 내지 90 : 10 사이의 비율로 합금물질로 된 스퍼터타겟을 이용하여 의 양에 따른 색좌표와 파장별 반사율을 도 3에 개략적으로 나타내었다. And argon and a small amount of Using sputter targets made of alloying material in the ratio of 80: 20 to 90: 10 The color coordinates and the reflectance for each wavelength according to the amount of are schematically shown in FIG. 3.
아울러, 본 발명의 실시 예에 따른 샴페인골드 색상 도금방법에서, 증착도금된 도금층의 고유성분을 나타낸 XPS그래프를 도 6에 도시하였다. 구리피크(WL43:Cu111,WL52:200)의 고유피크를 질소 공정가스를 두 조건으로 투입하여 WL43을 최소화 시키고 알루미늄의 WL45 피크를 단파장대로 Shift 됨을 나타내었다.In addition, in the champagne gold color plating method according to an embodiment of the present invention, the XPS graph showing the intrinsic components of the deposited plating layer is shown in FIG. The inherent peaks of copper peaks (WL43: Cu111, WL52: 200) were added to the nitrogen process gas under two conditions to minimize WL43 and shift the peak of WL45 of aluminum to short wavelength.
이상에서 설명한 바와 같이 본 발명에 따른 샴페인골드 색상 도금방법에 따르면, 국제조명위원회(CIE)에서 규정한 CIE 색좌표 L*a*b* 표현법에 의거하여 명도 L*는 78 내지 95 사이에 해당되고, a*는 1 내지 5 사이에 해당되며, b*는 13 내지 19 에 해당되는 색상으로 표현되는 샴페인골드 색상의 재연성을 증진시켜주고 이색현상 등의 발생을 억제할 수 있므로 앰블럼이나 장식물 등과 같은 도금대상체에 대한 도금품질을 향상시켜 주는 장점이 있다. As described above, according to the champagne gold color plating method according to the present invention, the brightness L * corresponds to 78 to 95 based on the CIE color coordinate L * a * b * expression method defined by the International Lighting Commission (CIE), a * is between 1 and 5, and b * is used to increase the reproducibility of the champagne gold color represented by the color corresponding to 13 to 19, and to suppress the occurrence of dichroism, and so on. There is an advantage of improving the plating quality for the object.
이상에서 설명된 바와 같이, 본 발명에 대한 구체적인 설명은 첨부된 도면을 참조한 실시 예들에 의해서 이루어졌지만, 상술한 실시 예들은 본 발명의 바람직한 실시 예를 들어 설명하였을 뿐이기 때문에, 본 발명이 상기의 실시 예에만 국한되는 것으로 이해되어져서는 아니되며, 본 발명의 권리범위는 후술하는 청구범위 및 그 등가개념으로 이해되어져야 할 것이다. As described above, the detailed description of the present invention has been made by the embodiments with reference to the accompanying drawings, but since the above-described embodiments have only been described with reference to a preferred embodiment of the present invention, the present invention has been described above. It should not be understood to be limited only to the embodiments, and the scope of the present invention should be understood by the claims and equivalent concepts described below.
Claims (11)
- 도금시킬 도금대상체를 스퍼터(sputter) 내 도금위치에 위치시키고, 구리 및 알루미늄을 포함하는 합금(Alloy)물질로 이루어진 스퍼터타겟(sputter target)을 스퍼터 내에 위치시키는 도금준비단계; 및A plating preparation step of placing a plating target to be plated at a plating position in a sputter and placing a sputter target made of an alloy (Alloy) material including copper and aluminum in the sputter; And상기 도금준비단계에서 준비된 상기 스퍼터타겟에 이온을 충돌시켜서 상기 도금대상체에 증착시키는 스퍼터링에 의해 상기 도금대상체를 도금시키는 도금단계;를 포함함으로써, And a plating step of plating the plating object by sputtering to impinge ions on the sputter target prepared in the plating preparation step and deposit the deposited on the plating object.국제조명위원회(CIE)에서 규정한 CIE 색좌표 L*a*b* 표현법에 의거하여 a*는 1 내지 5 사이에 해당되고 b*는 13 내지 19 에 해당되는 색상으로 표현되는 샴페인골드 색상을 나타내도록 상기 도금대상체를 도금시키는 것을 특징으로 하는 샴페인골드 색상 도금방법.According to the CIE color coordinates L * a * b * expressions prescribed by the International Lighting Commission (CIE), a * corresponds to 1 to 5 and b * represents a champagne gold color represented by a color corresponding to 13 to 19. Champagne gold color plating method characterized in that for plating the plating object.
- 제 1항에 있어서, The method of claim 1,상기 샴페인골드 색상의 명도 L*는 78 내지 95 사이에 해당되는 것을 특징으로 하는 샴페인골드 색상 도금방법.Brightness L * of the champagne gold color is a champagne gold color plating method, characterized in that corresponding to between 78 and 95.
- 제 1항에 있어서, The method of claim 1,상기 도금단계에서, In the plating step,소정의 진공도에서 이루어지는 상기 스퍼터링의 분위기가스로 불활성가스를 공급시켜주는 것을 특징으로 하는 샴페인골드 색상 도금방법.Champagne gold color plating method characterized in that to supply an inert gas to the atmosphere gas of the sputtering made at a predetermined degree of vacuum.
- 제 4항에 있어서, The method of claim 4, wherein상기 분위기가스로서 공급되는 아르곤과 의 SCCM(Standard Cubic Centimeter per Minute) 비는 1 : 0.04 내지 1 : 0.15 사이에 해당되는 것을 특징으로 하는 샴페인골드 색상 도금방법.Argon supplied as the atmosphere gas and SCCM (Standard Cubic Centimeter per Minute) ratio of champagne gold color plating method, characterized in that corresponding to 1: 0.04 to 1: 0.15.
- 제 1항에 있어서, The method of claim 1,상기 스퍼터타겟은 구리 및 알루미늄으로 이루어진 합금물질로서, The sputter target is an alloy material made of copper and aluminum,구리 및 알루미늄의 중량비(wt%)는 80 : 20 내지 90 : 10 사이에 해당되는 것을 특징으로 하는 샴페인골드 색상 도금방법.The weight ratio (wt%) of copper and aluminum is champagne gold color plating method characterized in that corresponding to between 80:20 to 90:10.
- 제 1항에 있어서, The method of claim 1,상기 도금단계에서 상기 도금대상체에 대하여 도금을 시켜서 형성된 도금층의 상측에 보호층을 형성시키는 보호층형성단계; 를 더 포함하는 것을 특징으로 하는 샴페인골드 색상 도금방법.A protective layer forming step of forming a protective layer on an upper side of the plating layer formed by plating the plating object in the plating step; Champagne gold color plating method characterized in that it further comprises.
- 제 7항에 있어서,The method of claim 7, wherein상기 보호층형성단계에서 형성된 상기 보호층의 상측에 지문자국이 남지 않도록 안티지문(Anti-Finger print)층을 형성시키는 안티지문층형성단계; 를 더 포함하는 것을 특징으로 하는 샴페인골드 색상 도금방법.An anti-fingerprint layer forming step of forming an anti-fingerprint layer so that fingerprint marks do not remain on the protective layer formed in the protective layer forming step; Champagne gold color plating method characterized in that it further comprises.
- 제 9항에 있어서, The method of claim 9,상기 안티지문층형성단계에서 형성되는 상기 안티지문층은,The anti-fingerprint layer formed in the anti-fingerprint layer forming step,안티지문액을 상기 보호층 위에 스프레이 도포한 후 건조시켜서 형성되는 것을 특징으로 하는 샴페인골드 색상 도금방법.Champagne gold color plating method characterized in that the anti-fingerprint liquid is spray-coated on the protective layer and then dried.
- 제 10항에 있어서, The method of claim 10,상기 안티지문액에 대한 건조는 자외선을 조사하여 이루어지는 것을 특징으로 하는 샴페인골드 색상 도금방법.The anti-fingerprint drying is champagne gold color plating method, characterized in that made by irradiation with ultraviolet rays.
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KR20060026114A (en) * | 2006-03-03 | 2006-03-22 | 김호욱 | Sputtering target material for intercept the electromagnetic wave |
JP2010095707A (en) * | 2008-09-16 | 2010-04-30 | Nippon Paint Co Ltd | Fingerprint-proof photocurable composition and coating with fingerprint-proof coating layer |
KR20130003126A (en) * | 2011-06-30 | 2013-01-09 | 한국기계연구원 | A surface treatment goods having a color and method of surface treatment thereof |
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