WO2018093034A1 - Liquide de dispersion de points quantiques, composition de résine photosensible auto-luminescente, filtre coloré préparé en utilisant ceux-ci et dispositif d'affichage d'image - Google Patents

Liquide de dispersion de points quantiques, composition de résine photosensible auto-luminescente, filtre coloré préparé en utilisant ceux-ci et dispositif d'affichage d'image Download PDF

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Publication number
WO2018093034A1
WO2018093034A1 PCT/KR2017/010278 KR2017010278W WO2018093034A1 WO 2018093034 A1 WO2018093034 A1 WO 2018093034A1 KR 2017010278 W KR2017010278 W KR 2017010278W WO 2018093034 A1 WO2018093034 A1 WO 2018093034A1
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Prior art keywords
acetate
methyl
quantum dot
acid
ester
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PCT/KR2017/010278
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English (en)
Korean (ko)
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왕현정
김주호
김형주
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동우화인켐 주식회사
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Priority to JP2019525834A priority Critical patent/JP6778818B2/ja
Priority to CN201780070674.0A priority patent/CN109952360B/zh
Publication of WO2018093034A1 publication Critical patent/WO2018093034A1/fr

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    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K11/00—Luminescent, e.g. electroluminescent, chemiluminescent materials
    • C09K11/08—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K11/00—Luminescent, e.g. electroluminescent, chemiluminescent materials
    • C09K11/08—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials
    • C09K11/0805—Chalcogenides
    • C09K11/0811—Chalcogenides with zinc or cadmium
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K11/00—Luminescent, e.g. electroluminescent, chemiluminescent materials
    • C09K11/08—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials
    • C09K11/54—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials containing zinc or cadmium
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Definitions

  • the present invention relates to a quantum dot dispersion, a self-luminous photosensitive resin composition, and a color filter manufactured using the same, which are excellent in dispersing properties and harmless to a human body.
  • the color filter is a thin film type optical component that extracts three colors of red, green, and blue from white light and makes them possible in fine pixel units.
  • the size of one pixel is about tens to hundreds of micrometers.
  • Such a color filter includes a black matrix layer formed in a predetermined pattern on a transparent substrate to shield the boundary between each pixel, and a plurality of colors (typically red (R), green (G) and The pixel units in which the three primary colors of blue (B) are arranged in a predetermined order are stacked in this order.
  • color filters are used in various fields, including various image display devices, not only excellent pattern characteristics but also high color reproducibility and excellent performance such as high brightness and high contrast ratio are required.
  • a color filter manufacturing method using the self-luminous photosensitive resin composition containing is proposed.
  • Korean Patent Laid-Open Publication No. 2006-0084668 relates to a quantum dot phosphor, and discloses a light emitting diode which maintains excellent light emission efficiency by including a quantum dot and a solid carrier supporting the quantum dot.
  • the Republic of Korea Patent Publication No. 2006-0084668 uses a solvent harmful to the human body such as chloroform, toluene, hexane and the like excellent dispersibility as a dispersing solvent for dispersing the quantum dot phosphor.
  • Solvents described above are highly volatile compounds (Volatile Organic Compound) or carcinogenic, neurotoxic, and have a high risk of abnormal reproductive function.
  • Patent Document 1 Republic of Korea Patent Publication No. 2006-0084668 (2006.07.25)
  • An object of the present invention is to provide a quantum dot dispersion liquid, harmless to the human body and excellent in dispersibility, and a self-luminous photosensitive resin composition comprising the same.
  • an object of the present invention is to provide a color filter and an image display device having excellent luminescence properties manufactured using the quantum dot dispersion liquid and the self-luminous photosensitive resin composition described above.
  • the quantum dot dispersion according to the present invention for achieving the above object comprises a quantum dot and a solvent, the solvent satisfies the conditions of the Hansen solubility parameter of the following formula (1), halogenated hydrocarbon solvent; Aromatic hydrocarbon solvents; And aliphatic hydrocarbon solvents.
  • ⁇ d is the dispersion component
  • ⁇ p is the polar component
  • ⁇ h is the hydrogen bonding component
  • the present invention is a quantum dot dispersion described above; And an alkali-soluble resin, a photopolymerizable compound, a photopolymerization initiator, an additional solvent, and an additive.
  • the self-luminous photosensitive resin composition further comprises one or more selected from the group consisting of:
  • the present invention provides a color filter including a cured product of the above-described self-luminous photosensitive resin composition and an image display apparatus including the same.
  • the quantum dot dispersion of the present invention is excellent in dispersing characteristics, there is an advantage that does not contain a human toxic substance, the self-luminous photosensitive resin composition comprising the same also has the above advantages.
  • the color filter manufactured by using the self-luminous photosensitive resin composition of the present invention and an image display device including the same have excellent light emission characteristics.
  • a member when a member is located "on" another member, this includes not only when one member is in contact with another member but also when another member exists between the two members.
  • One aspect of the invention relates to a quantum dot dispersion.
  • one embodiment of the present invention comprises a quantum dot and a solvent, the solvent satisfies the conditions of the Hansen solubility parameter of the following equation (1), halogenated hydrocarbon-based solvents; Aromatic hydrocarbon solvents; And an aliphatic hydrocarbon solvent; and a quantum dot dispersion liquid not included.
  • ⁇ d is the dispersion component
  • ⁇ p is the polar component
  • ⁇ h is the hydrogen bonding component
  • Quantum dot dispersions in accordance with an aspect of the present invention include quantum dots.
  • the quantum dots may refer to nanoscale semiconductor materials. Atoms form molecules, and molecules form clusters of small molecules called clusters that form nanoparticles, which are called quantum dots when they are semiconducting. When the quantum dots reach the excited state from the outside, the quantum dots emit energy according to their corresponding energy bandgap.
  • the color filter made of the self-luminous photosensitive resin composition containing the quantum dot dispersion liquid according to one embodiment of the present invention can emit light (luminescence) by light irradiation by including the quantum dots.
  • a typical image display apparatus including a color filter
  • white light is transmitted through the color filter to implement color.
  • a part of the light is absorbed by the color filter, thereby degrading light efficiency.
  • the color filter made of the self-luminous photosensitive resin composition according to the present invention since the color filter is self-luminous by the light of the light source, it is possible to implement more excellent light efficiency, and also emit light with color Since the color reproducibility is excellent, and the light is emitted in all directions by the photoluminescence, the viewing angle is also improved.
  • the quantum dot is not particularly limited as long as it is a quantum dot particle capable of emitting light by stimulation caused by light.
  • the II-VI semiconductor compound may be selected from the group consisting of CdS, CdSe, CdTe, ZnS, ZnSe, ZnTe, ZnO, HgS, HgSe, HgTe, and mixtures thereof; CdSeS, CdSeTe, CdSTe, ZnSeS, ZnSeTe, ZnSTe, HgSeS, HgSeTe, HgSTe, CdZnS, CdZnSe, CdZnTe, CdHgS, CdHgSe, CdHgTe, HgZnS, HgZnSe, HgZnTe And an elemental compound selected from the group consisting of CdZnSeS, CdZnSeTe, CdZnSTe, CdHgSeS, CdHgSeTe, CdHgSTe, HgZnSeS, HgZnS, H
  • the group III-V semiconductor compound may be selected from the group consisting of GaN, GaP, GaAs, GaSb, AlN, AlP, AlAs, AlSb, InN, InP, InAs, InSb, and mixtures thereof; Three-element compounds selected from the group consisting of GaNP, GaNAs, GaNSb, GaPAs, GaPSb, AlNP, AlNAs, AlNSb, AlPAs, AlPSb, InNP, InNAs, InNSb, InPAs, InPSb, GaAlNP and mixtures thereof; And an elemental compound selected from the group consisting of GaAlNAs, GaAlNSb, GaAlPAs, GaAlPSb, GaInNP, GaInNAs, GaInNSb, GaInPAs, GaInPSb, InAlNP, InAlNAs, InAlNSb, InAlPAs, InAlPSb and mixtures thereof.
  • the Group IV-VI semiconductor compound may be selected from the group consisting of SnS, SnSe, SnTe, PbS, PbSe, PbTe, and mixtures thereof; A three-element compound selected from the group consisting of SnSeS, SnSeTe, SnSTe, PbSeS, PbSeTe, PbSTe, SnPbS, SnPbSe, SnPbTe, and mixtures thereof; And SnPbSSe, SnPbSeTe, SnPbSTe, and one or more selected from the group consisting of an elemental compound selected from the group consisting of mixtures thereof, but are not limited thereto.
  • the group IV element or a compound including the same may include an element compound selected from the group consisting of Si, Ge, and mixtures thereof; And a binary element compound selected from the group consisting of SiC, SiGe, and mixtures thereof.
  • the quantum dots are homogeneous single structures; Dual structures such as core-shell, gradient structures, and the like; Or a mixed structure thereof.
  • the material constituting each core and shell may be made of the above-mentioned different semiconductor compounds.
  • the core may include one or more materials selected from the group consisting of CdSe, CdS, ZnS, ZnSe, CdTe, CdSeTe, CdZnS, PbSe, AgInZnS, and ZnO, but is not limited thereto.
  • the shell may include one or more materials selected from the group consisting of CdSe, ZnSe, ZnS, ZnTe, CdTe, PbS, TiO, SrSe, and HgSe, but is not limited thereto.
  • the quantum dots may be synthesized by a wet chemical process, a metal organic chemical vapor deposition (MOCVD), or a molecular beam epitaxy (MBE), but are not limited thereto. .
  • MOCVD metal organic chemical vapor deposition
  • MBE molecular beam epitaxy
  • the wet chemical process is a method of growing a particle by adding a precursor material to an organic solvent.
  • the organic solvent naturally coordinates the surface of the quantum dot crystal and acts as a dispersant to control the growth of the crystal. Therefore, the nano solvent is easier and cheaper than the vapor deposition method such as the organometallic chemical vapor deposition process or molecular beam epitaxy. Since the growth of the particles can be controlled, it is preferred to produce the quantum dots according to the invention using the wet chemical process.
  • the quantum dots may further include an organic ligand.
  • the organic ligand may be bound to the surface of the quantum dots to serve to stabilize the quantum dots.
  • the organic ligand is not limited in the present invention, such as C5 to C20 alkyl carboxylic acid, alkenyl carboxylic acid or alkynyl carboxylic acid; Alkyl carboxylic acids, al, C5 to C20, which may include thiol, phosphoric acid, pyridine, mercapto alcohol, phosphine, phosphine oxide, etc., and in terms of improving stability by effectively protecting the surface of the quantum dot.
  • Kenyl carboxylic acid or alkynyl carboxylic acid It is preferable to include one or more selected from the group consisting of thiol and phosphoric acid.
  • the organic ligand may cover 5% or more of the surface of the total area of the quantum dots.
  • the organic ligand may be included in the quantum dot dispersion in the form of a commercially available form, or may be added directly to the quantum dot dispersion when not included in the quantum dot dispersion, and the organic ligand may be added directly to the quantum dot dispersion.
  • the content may be added in an amount of 0.1 to 10 moles with respect to 1 mole of the quantum dot.
  • the quantum dots may be included in 5 to 70% by weight, preferably 10 to 65% by weight, more preferably 15 to 60% by weight relative to the total 100% by weight of the quantum dot dispersion. .
  • the quantum dot is included in the above range, it is possible to provide a self-luminous photosensitive resin composition having excellent photosensitivity.
  • the quantum dot is included in the range below the photosensitive properties may be slightly reduced, and when included in excess of the above range, the content of the other components, such as alkali-soluble resin, photopolymerizable compound to be described later in contrast to the quantum dot Since it is relatively small, there is a problem that the manufacture of the color filter may be somewhat difficult, so it is preferably included within the above range.
  • the quantum dot dispersion according to the present invention has an advantage of uniformly dispersing the quantum dots by including a solvent that satisfies the conditions of the Hansen solubility parameter of Equation 1 below, halogenated hydrocarbon solvent such as chloroform or dichloromethane harmful to human body; Aromatic hydrocarbon solvents such as benzene or toluene; And aliphatic hydrocarbon-based solvents such as N-hexane, there is an advantage that can prevent workers to deal with this dangerous environment such as carcinogenicity, neurotoxicity, causing reproductive dysfunction.
  • halogenated hydrocarbon solvent such as chloroform or dichloromethane harmful to human body
  • Aromatic hydrocarbon solvents such as benzene or toluene
  • aliphatic hydrocarbon-based solvents such as N-hexane
  • ⁇ d is the dispersion component
  • ⁇ p is the polar component
  • ⁇ h is the hydrogen bonding component
  • the solvent may specifically include one or more selected from the group consisting of ether and ester having 6 to 10 carbon atoms, in which case the dispersibility is improved and includes the same.
  • the solvent is specifically methyl isoamyl ketone, diisobutyl ketone, diethyl carbonate, ethyl butyrate, ethyl isobutyrate, tert-butyl acetate, isopropyl propionate, methyl-3-methylbutanoate, propyl Propionate, methyl 2-methyl butanoate, sec-butyl acetate, methyl pentanoate, isobutyl acetate, butyl acetate, methyl pibarate, sec-butyl propionate, n-butyl propionate, 2-methyl Butyl acetate, ethyl 2-methylbutyrate, methyl 2-methylpentanoate, 2-pentyl acetate, neopentyl acetate, 3-methylbutan-2-yl acetate, isopropyl isobutyrate, propyl isobutyrate, ethyl isovalerate, Methyl 3-methyl
  • the said solvent can be used individually or in mixture of 2 or more types, respectively.
  • the content of the solvent may be included in 5 to 95% by weight, preferably 20 to 90% by weight, more preferably 30 to 80% by weight relative to 100% by weight of the total quantum dot dispersion. If the solvent is included in less than the above range may cause a problem that the dispersibility deteriorates, if it exceeds the above range may cause a problem that it is difficult to control the solid content of the resin composition.
  • the quantum dot dispersion of the present invention the solvent as a whole satisfies the above-described conditions of the solvent, that is, the Hansen solubility parameter of the above formula (1), halogenated hydrocarbon solvent; Aromatic hydrocarbon solvents; And an aliphatic hydrocarbon solvent; satisfies a condition not included. Therefore, according to one embodiment of the present invention, even if the individual solvent component in the quantum dot dispersion of the present invention does not satisfy the Hansen solubility parameter of Equation 1 above, the entire solvent composed of these satisfies the Hansen solubility parameter of Equation 1 .
  • the quantum dot dispersion may further include a phosphate ester compound.
  • the phosphate ester compound is further included, the dispersibility between the quantum dot and the solvent is improved, and thus, the quantum efficiency is excellent, and the light efficiency is lowered and the photosensitive characteristic can be suppressed.
  • the phosphate ester compound may include a form in which a hydroxy group or a hydrogen atom of a hydroxy group present in phosphate ester ((HO) 2 PO (OR)) or phosphoric acid (H 3 PO 4 ) is substituted or unsubstituted with another functional group.
  • the phosphate ester compound may be represented in the form of (H 2 PO 3 ⁇ ), but is not limited thereto.
  • the "phosphate ester type" may include at least one selected from the group consisting of phosphorous acid derivatives, phosphoric acid derivatives, phosphonic acid derivatives, and phosphinic acid derivatives.
  • the phosphate ester compound may further include at least one of a polyether moiety, a polyester moiety, and a phosphate group in one molecule.
  • poly- may refer to a compound composed of a large number of repeating units
  • the "polyether portion” and “polyester portion” may have 1 to 20 repeating units each containing an ether group or an ester group. It can be referred to as a part consisting of.
  • the repeating unit may be composed of 5 to 20, more preferably 10 to 20, in this case there is an excellent compatibility.
  • the phosphate ester compound further includes a polyether moiety in one molecule
  • compatibility with alkali-soluble resins to be described later is improved
  • the phosphate ester compound further includes a polyester moiety in one molecule.
  • the compatibility with the alkali-soluble resin and the dissolution characteristics for the alkaline developer are improved.
  • the phosphate ester compound may serve as a protective layer through adsorption on the surface of the quantum dot, and has the advantage of deagglomerating the quantum dot.
  • the phosphate ester compound according to the present invention may include a polyether moiety, a polyester moiety, and a phosphate group in one molecule, in which case deagglomeration of quantum dots reduces the particle size of the dispersion, and compatibility with alkali-soluble resins. And dissolution properties in alkaline developing solution, which is advantageous because it has an advantageous advantage in pattern formation.
  • the "acid value” is a value measured as the amount (mg) of potassium hydroxide required to neutralize 1 g of the acrylic polymer and may be involved in solubility in the self-luminous photosensitive resin composition described later.
  • the acid value of the phosphate ester compound is 10 (KOHmg / g) or more, specifically 10 to 200 (KOHmg / g) is preferable in terms of the development rate of the self-luminous photosensitive resin composition containing the surface treatment agent.
  • the acid value When the acid value is less than the above range, it may be somewhat difficult to secure a sufficient developing speed, and when the acid value exceeds the above range, adhesion to the substrate may be reduced, thereby causing short circuiting of the pattern, and lowering the storage stability of the overall composition to increase the viscosity. Since the problem may occur, it is preferable to satisfy the above range.
  • the phosphoric acid ester compound may be included in an amount of 1 to 300 parts by weight, preferably 3 to 250 parts by weight, and more preferably 5 to 200 parts by weight, based on 100 parts by weight of the total quantum dot solids.
  • the surface treating agent is included in the above range, the deagglomeration effect of the quantum dots is excellent, and the precipitation phenomenon due to the polarity difference in the quantum dot dispersion liquid and the self-luminous photosensitive resin composition including the same according to the present invention is possible, and color filter manufacture It is preferable because it can act as a protective layer of the quantum dots in the process.
  • the phosphate ester compound When the phosphate ester compound is included in the range below, the deagglomeration effect of the quantum dots may be slightly lowered. When the phosphate ester compound is included in the range above, the development characteristics of the self-luminous photosensitive resin composition including the quantum dot dispersion may be slightly lowered. Since it is possible, it is preferable to be included in the above range.
  • Another aspect of the invention is a quantum dot dispersion described above; And an alkali-soluble resin, a photopolymerizable compound, a photopolymerization initiator, an additional solvent, and at least one selected from the group consisting of additives.
  • the quantum dot dispersion described above is 3 to 80% by weight, preferably 5 to 70% by weight, more preferably 10 to 60% by weight based on 100% by weight of the total of the self-luminous photosensitive resin composition May contain%.
  • the self-luminous photosensitive resin composition according to the present invention includes the above-described quantum dot dispersion in the above range, there is an advantage in that a color filter having excellent light emission characteristics can be manufactured.
  • the quantum dot dispersion When the quantum dot dispersion is included in the range below the light emission characteristics may be slightly reduced, when the quantum dot dispersion is included in the above range, the formation of the pattern may be somewhat difficult as the content of the other composition is reduced, the reliability Since it may be lowered, it is preferable to be included in the above range.
  • the self-luminous photosensitive resin composition according to the present invention may further include an alkali-soluble resin.
  • the alkali-soluble resin may serve to make the non-exposed part of the color filter made of the self-luminous photosensitive resin composition alkali-soluble and to remove it, and to leave the exposure area.
  • the quantum dots may be evenly dispersed in the composition, and may serve to maintain the brightness by protecting the quantum dots during the process.
  • the alkali-soluble resin according to the present invention can be selected to have an acid value of 50 to 200 (KOHmg / g).
  • the "acid value” is a value measured as the amount (mg) of potassium hydroxide required to neutralize 1 g of the acrylic polymer and is involved in solubility.
  • the acid value of the alkali-soluble resin is less than the above range, it may be difficult to secure a sufficient developing speed, when the acid value of the alkali-soluble resin is exceeded, the adhesion to the substrate is reduced, the short circuit of the pattern is likely to occur, the storage stability of the entire composition is lowered viscosity The problem may arise.
  • the alkali-soluble resin may consider the limitation of the molecular weight and the molecular weight distribution (Mw / Mn) in order to improve the surface hardness for use as a color filter.
  • Mw / Mn molecular weight distribution
  • the weight average molecular weight is 3,000 to 30,000, preferably 5,000 to 20,000
  • the molecular weight distribution is 1.5 to 6.0, preferably 1.8 to 4.0 to directly polymerize or purchase and use.
  • Alkali-soluble resins having a molecular weight and molecular weight distribution in the above range can be improved in the hardness already mentioned, as well as high residual film ratio, solubility of the non-exposed portion in the developing solution can be excellent and the resolution can be improved.
  • the alkali-soluble resin includes at least one member selected from the group consisting of polymers of carboxyl group-containing unsaturated monomers, copolymers with monomers having unsaturated bonds copolymerizable therewith, and combinations thereof.
  • the carboxyl group-containing unsaturated monomer may be unsaturated monocarboxylic acid, unsaturated dicarboxylic acid, unsaturated tricarboxylic acid, or the like.
  • unsaturated monocarboxylic acid acrylic acid, methacrylic acid, crotonic acid, (alpha)-chloroacrylic acid, cinnamic acid etc. are mentioned, for example.
  • unsaturated dicarboxylic acid maleic acid, a fumaric acid, itaconic acid, a citraconic acid, a mesaconic acid, etc. are mentioned, for example.
  • the unsaturated polyhydric carboxylic acid may be an acid anhydride, and specific examples thereof include maleic anhydride, itaconic anhydride and citraconic anhydride.
  • unsaturated polyhydric carboxylic acid may be mono (2-methacryloyloxyalkyl) ester, for example, succinic acid mono (2-acryloyloxyethyl), succinic acid mono (2-methacryloyloxyethyl) And phthalic acid mono (2-acryloyloxyethyl), phthalic acid mono (2-methacryloyloxyethyl) and the like.
  • the unsaturated polyhydric carboxylic acid may be mono (meth) acrylate of the sock end dicarboxy polymer, and examples thereof include? -Carboxypolycaprolactone monoacrylate and? -Carboxypolycaprolactone monomethacrylate.
  • These carboxyl group-containing monomers can be used individually or in mixture of 2 or more types, respectively.
  • monomers copolymerizable with carboxyl group-containing unsaturated monomers include aromatic vinyl compounds, unsaturated carboxylic acid ester compounds, unsaturated carboxylic acid aminoalkyl ester compounds, unsaturated carboxylic acid glycidyl ester compounds, carboxylic acid vinyl ester compounds, unsaturated ether compounds, vinyl cyanide compounds, One type selected from the group consisting of an unsaturated imide compound, an aliphatic conjugated diene compound, a macromonomer having a monoacryloyl group or a monomethacryloyl group at the terminal of the molecular chain, a bulky monomer, and a combination thereof is possible.
  • the copolymerizable monomer may be styrene, ⁇ -methylstyrene, o-vinyltoluene, m-vinyltoluene, p-vinyltoluene, p-chlorostyrene, o-methoxystyrene, m-methoxystyrene, p- Methoxy styrene, o-vinyl benzyl methyl ether, m-vinyl benzyl methyl ether, p-vinyl benzyl methyl ether, o-vinyl benzyl glycidyl ether, m-vinyl benzyl glycidyl ether, p-vinyl benzyl glycidyl Aromatic vinyl compounds such as ether and indene; Methyl acrylate, methyl methacrylate, ethyl acrylate, ethyl g
  • Macromonomers having; Bulky monomers, such as a monomer having a norbornyl skeleton, a monomer having an adamantane skeleton, and a monomer having a rosin skeleton, can lower the dielectric constant.
  • the alkali-soluble resin may be included in 5 to 80% by weight, specifically 10 to 70% by weight, more specifically 15 to 60% by weight based on 100% by weight of the total solid content of the self-luminous photosensitive resin composition.
  • the solubility in the developing solution is sufficient, so that pattern formation is easy, and the film reduction of the pixel portion of the exposed portion is prevented at the time of development, so that the dropping of the non-pixel portion is good, which is preferable.
  • the alkali-soluble resin is included in less than the above range, the non-pixel portion may be somewhat missing, and when the alkali-soluble resin is included in more than the above range, the solubility in the developing solution is slightly lowered may be somewhat difficult to form a pattern.
  • the photopolymerizable compound which may be further included in the self-luminous photosensitive resin composition of the present invention is a compound which can be polymerized by the action of light and a photopolymerization initiator to be described later, and may include monofunctional monomers, bifunctional monomers, other polyfunctional monomers, and the like. have.
  • the kind of the monofunctional monomer is not particularly limited, and for example, nonylphenylcarbitol acrylate, 2-hydroxy-3-phenoxypropyl acrylate, 2-ethylhexyl carbitol acrylate, 2-hydroxyethyl acryl
  • the rate, N-vinylpyrrolidone, etc. are mentioned.
  • the kind of the said bifunctional monomer is not specifically limited, For example, 1, 6- hexanediol di (meth) acrylate, ethylene glycol di (meth) acrylate, neopentyl glycol di (meth) acrylate, and triethylene Glycol di (meth) acrylate, bis (acryloyloxyethyl) ether of bisphenol A, 3-methylpentanediol di (meth) acrylate, and the like.
  • the kind of the polyfunctional monomer is not particularly limited, and examples thereof include trimethylolpropane tri (meth) acrylate, ethoxylated trimethylol propane tri (meth) acrylate, and propoxylated trimethylolpropane tree (meth).
  • the photopolymerizable compound may be included in an amount of 5 to 70% by weight, specifically 10 to 60% by weight, and more specifically 15 to 50% by weight, based on 100% by weight of the total solid of the self-luminous photosensitive resin composition.
  • the photopolymerizable compound is included in the above range, there is a preferable advantage in terms of intensity or smoothness of the pixel portion.
  • the intensity of the pixel portion may be lowered slightly, and when the photopolymerizable compound is included in the above range, smoothness may be slightly lowered, so it is preferably included within the range. .
  • the self-luminous photosensitive resin composition according to the present invention may further include a photopolymerization initiator, and the photopolymerization initiator may be used without particular limitation as long as it can polymerize the photopolymerizable compound.
  • the photopolymerization initiator is an acetophenone compound, a benzophenone compound, a triazine compound, a biimidazole compound, an oxime compound, and a thioxanthone compound in terms of polymerization properties, start efficiency, absorption wavelength, availability, and price. It is preferable to use at least one compound selected from the group consisting of compounds.
  • acetophenone-based compound examples include diethoxyacetophenone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, benzyl dimethyl ketal, 2-hydroxy-1- [4- (2-hydroxy Hydroxyethoxy) phenyl] -2-methylpropan-1-one, 1-hydroxycyclohexylphenyl ketone, 2-methyl-1- (4-methylthiophenyl) -2-morpholinopropan-1-one, 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) butan-1-one, 2-hydroxy-2-methyl-1- [4- (1-methylvinyl) phenyl] propane-1 -One, 2- (4-methylbenzyl) -2- (dimethylamino) -1- (4-morpholinophenyl) butan-1-one, and the like.
  • benzophenone type compound for example, benzophenone, methyl o-benzoyl benzoate, 4-phenylbenzophenone, 4-benzoyl-4'-methyldiphenyl sulfide, 3,3 ', 4,4'- tetra ( tert-butylperoxycarbonyl) benzophenone, 2,4,6-trimethylbenzophenone, and the like.
  • triazine-based compound examples include 2,4-bis (trichloromethyl) -6- (4-methoxyphenyl) -1,3,5-triazine and 2,4-bis (trichloromethyl) -6 -(4-methoxynaphthyl) -1,3,5-triazine, 2,4-bis (trichloromethyl) -6-piperonyl-1,3,5-triazine, 2,4-bis (Trichloromethyl) -6- (4-methoxystyryl) -1,3,5-triazine, 2,4-bis (trichloromethyl) -6- [2- (5-methylfuran-2- Yl) ethenyl] -1,3,5-triazine, 2,4-bis (trichloromethyl) -6- [2- (furan-2-yl) ethenyl] -1,3,5-triazine , 2,4-bis (trichloromethyl) -6- [2- (furan
  • biimidazole compound examples include 2,2'-bis (2-chlorophenyl) -4,4 ', 5,5'-tetraphenylbiimidazole, 2,2'-bis (2,3-dichloro Phenyl) -4,4 ', 5,5'-tetraphenylbiimidazole, 2,2'-bis (2-chlorophenyl) -4,4', 5,5'-tetra (alkoxyphenyl) biimidazole , 2,2'-bis (2-chlorophenyl) -4,4 ', 5,5'-tetra (trialkoxyphenyl) biimidazole, 2,2-bis (2,6-dichlorophenyl) -4, The imidazole compound etc.
  • oxime compound examples include o-ethoxycarbonyl- ⁇ -oxyimino-1-phenylpropan-1-one and the like, and commercially available BASF Irgacure OXE 01 and OXE 02 are typical examples.
  • thioxanthone type compound 2-isopropyl thioxanthone, 2, 4- diethyl thioxanthone, 2, 4- dichloro thioxanthone, 1-chloro-4- propoxy thioxanthone, etc. are mentioned, for example. There is this.
  • the photopolymerization initiator may be included in an amount of 0.1 to 20% by weight, preferably 0.5 to 15% by weight, and more preferably 1 to 10% by weight, based on 100% by weight of the total solid of the self-luminous photosensitive resin composition.
  • the self-luminous photosensitive resin composition may be highly sensitive, and thus the exposure time may be shortened, so that productivity may be improved and high resolution may be maintained.
  • strength of the pixel part formed using the self-luminous photosensitive resin composition concerning this invention, and smoothness in the surface of the said pixel part become favorable.
  • the photopolymerization initiator may further include a photopolymerization initiation aid in order to improve the sensitivity of the self-luminous photosensitive resin composition in the present invention.
  • a photopolymerization start adjuvant When the photopolymerization start adjuvant is included, there is an advantage in that the sensitivity is higher and the productivity is improved.
  • the photopolymerization initiation assistant may be preferably used, for example, at least one compound selected from the group consisting of an amine compound, a carboxylic acid compound, and an organic sulfur compound having a thiol group, but is not limited thereto.
  • an aromatic amine compound as the amine compound, and specifically, aliphatic amine compounds such as triethanolamine, methyl diethanolamine, triisopropanolamine, methyl 4-dimethylaminobenzoate, ethyl 4-dimethylaminobenzoate, 4- Dimethylaminobenzoic acid isoamyl, 4-dimethylaminobenzoic acid 2-ethylhexyl, benzoic acid 2-dimethylaminoethyl, N, N-dimethylparatoluidine, 4,4'-bis (dimethylamino) benzophenone (common name: Michler's ketone ), 4,4'-bis (diethylamino) benzophenone and the like can be used.
  • aliphatic amine compounds such as triethanolamine, methyl diethanolamine, triisopropanolamine, methyl 4-dimethylaminobenzoate, ethyl 4-dimethylaminobenzoate, 4- Dimethyl
  • the carboxylic acid compound is preferably an aromatic heteroacetic acid, specifically, phenylthioacetic acid, methylphenylthioacetic acid, ethylphenylthioacetic acid, methylethylphenylthioacetic acid, dimethylphenylthioacetic acid, methoxyphenylthioacetic acid, dimethoxyphenylthioacetic acid, Chlorophenylthioacetic acid, dichlorophenylthioacetic acid, N-phenylglycine, phenoxyacetic acid, naphthylthioacetic acid, N-naphthylglycine, naphthoxyacetic acid, etc. are mentioned.
  • organic sulfur compound having the thiol group examples include 2-mercaptobenzothiazole, 1,4-bis (3-mercaptobutyryloxy) butane, 1,3,5-tris (3-mercaptobutyloxyethyl)- 1,3,5-triazine-2,4,6 (1H, 3H, 5H) -trione, trimethylolpropanetris (3-mergaptopropionate), pentaerythritol tetrakis (3-mercaptobutyl Late), pentaerythritol tetrakis (3-mercaptopropionate), dipentaerythritol hexakis (3-mercaptopropionate), tetraethylene glycol bis (3-mercaptopropionate), etc. are mentioned. Can be.
  • the photopolymerization start adjuvant can be appropriately added and used within a range that does not impair the scope of the present invention.
  • the additional solvent that may be further included in the self-luminous photosensitive resin composition of the present invention is not particularly limited, and may include an organic solvent commonly used in the art, which may be the same as the solvent contained in the quantum dot dispersion of the present invention. May be different.
  • the additional solvent include alkylene glycol alkyl ethers such as ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, ethylene glycol monobutyl ether, propylene glycol monomethyl ether, propylene glycol methylethyl ether, Diethylene glycol dialkyl ethers such as diethylene glycol dimethyl ether, diethylene glycol diethyl ether, diethylene glycol dipropyl ether and diethylene glycol dibutyl ether; Alkylene glycol alkyl ether acetates such as methyl cellosolve acetate, ethyl cellosolve acetate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, propylene glycol monopropyl ether acetate, and the like; Alkoxyalkyl acetates such as methoxybutyl acetate and methoxypent
  • the above additional solvent is preferably an organic solvent having a boiling point of 100 ° C to 200 ° C in the above additional solvent, more preferably alkylene glycol alkyl ether acetates, ketones, 3- Ester, such as ethyl ethoxy propionate and methyl 3-methoxy propionate, is mentioned, More preferably, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, 3-ethoxy propionate ethyl, 3-methoxy Methyl propionate etc. are mentioned.
  • These additional solvents can be used individually or in mixture of 2 or more types, respectively.
  • the total solvent (solvent in quantum dot dispersion and additional solvent) contained in the self-luminous photosensitive resin composition of the present invention is 20 to 90% by weight, preferably 25 to 85% by weight, based on 100% by weight of the total self-luminous photosensitive resin composition, More preferably, it may be included in 30 to 80% by weight. If the total solvent content is within the above range, the applicability may be improved when applied with a coating device such as a roll coater, spin coater, slit and spin coater, slit coater (sometimes referred to as die coater), inkjet, or the like. It is preferable. When the content of the total solvent is included in less than the above range, the process may be somewhat difficult as the applicability is slightly lowered. If the total solvent is exceeded, the performance of the color filter formed of the self-luminous photosensitive resin composition may be slightly lowered. Problems can arise.
  • the self-luminous photosensitive resin composition according to the present invention may further include an additive such as an adhesion promoter and a surfactant to enhance the coating property or adhesion.
  • the adhesion promoter may include a silane coupling agent having a reactive substituent selected from the group consisting of carboxyl groups, methacryloyl groups, isocyanate groups, epoxy groups, and combinations thereof, which may be added to increase adhesion to the substrate. It is not limited.
  • the silane coupling agent is trimethoxysilyl benzoic acid, ⁇ -methacryl oxypropyl trimethoxy silane, vinyltriacetoxysilane, vinyl trimethoxysilane, ⁇ -isocyanate propyl triethoxysilane, ⁇ -glycidoxy If propyl trimethoxysilane, (beta)-(3, 4- epoxycyclohexyl) ethyltrimethoxysilane, etc. are mentioned, these can be used individually and in combination of 2 or more types.
  • the self-luminous photosensitive resin composition according to the present invention includes the surfactant
  • the surfactant is BM-1000, BM-1100 (BM Chemie Co., Ltd.), Proride FC-135 / FC-170C / FC-430 (Sumitomo 3M Co., Ltd.), SH-28PA / -190 / SZ-6032 (Dore Siri).
  • Fluorine-based surfactants such as Corn Co., Ltd. may be used, but is not limited thereto.
  • the self-luminous photosensitive resin composition according to the present invention may further include additives such as antioxidants, ultraviolet absorbers and anti-agglomerating agents in a range that does not impair the effects of the present invention, the additives also inhibit the effects of the present invention It can be used by those skilled in the art as long as it does not.
  • the additive may be used in an amount of 0.05 to 10 parts by weight, specifically 0.1 to 10 parts by weight, more specifically 0.1 to 5 parts by weight based on the total weight of the self-luminous photosensitive resin composition, but is not limited thereto.
  • Yet another aspect of the present invention relates to a color filter manufactured using the above-described self-luminous photosensitive resin composition.
  • the color filter according to the present invention includes the cured product of the self-luminous photosensitive resin composition including the quantum dot dispersion liquid of the present invention, the quantum dot particles are uniformly dispersed, thereby providing excellent light emission characteristics.
  • the color filter includes a substrate and a pattern layer formed on the substrate.
  • the substrate may be the substrate of the color filter itself, or may be a portion where the color filter is positioned in a display device or the like, and is not particularly limited.
  • the substrate may be glass, silicon (Si), silicon oxide (SiOx), or a polymer substrate, and the polymer substrate may be polyethersulfone (PES) or polycarbonate (PC).
  • the pattern layer is a layer including the self-luminous photosensitive resin composition of the present invention, and may be a layer formed by applying the self-luminous photosensitive resin composition and exposing, developing and thermosetting in a predetermined pattern.
  • the pattern layer may be formed by performing a method commonly known in the art.
  • the color filter including the substrate and the pattern layer may further include a partition formed between each pattern, and may further include a black matrix, but is not limited thereto.
  • a protective film formed on the pattern layer of the color filter may be further included.
  • the color filter may include one or more selected from the group consisting of a red pattern layer, a green pattern layer, and a blue pattern layer.
  • the color filter may include one or more selected from the group consisting of a red pattern layer including a red quantum dot, a green pattern layer including a green quantum dot, and a blue pattern layer including a blue quantum dot according to the present invention.
  • the red pattern layer, the green pattern layer, and the blue pattern layer may respectively emit red light, green light, and blue light when irradiated with light.
  • the emission light of the light source is not particularly limited, but blue light may be generated in terms of better color reproducibility.
  • a light source that emits can be used.
  • the color filter may include only a pattern layer of two colors among the red pattern layer, the green pattern layer, and the blue pattern layer, but is not limited thereto. However, when the color filter includes only the pattern layer of two colors, the pattern layer may further include a transparent pattern layer containing no quantum dot particles.
  • a light source emitting light having a wavelength representing a color other than the two colors may be used.
  • a light source emitting blue light may be used.
  • red quantum dots emit red light and green quantum dots emit green light
  • the transparent pattern layer may As the blue light transmitted by the light source is transmitted as it is, blue can be obtained.
  • Another aspect of this invention is related with the image display apparatus containing the color filter mentioned above.
  • the color filter of the present invention can be applied to various image display devices such as electroluminescent display devices, plasma display devices, field emission display devices, as well as ordinary liquid crystal display devices.
  • the image display device includes the color filter made of the cured product of the self-luminous photosensitive resin composition containing the quantum dot dispersion liquid of the present invention, thereby exhibiting excellent light emission characteristics.
  • the image display apparatus may further include a light source emitting blue light and a transparent pattern layer, and the above-described information may be applied to the light source emitting blue light and the transparent pattern layer.
  • Quantum dot dispersions were prepared by mixing the components (quantum dots and solvents) and contents shown in Table 1 below, and Hansen solubility parameters of each preparation example (Preparation Examples 1-1 to 1-11) were also described in Table 1 below.
  • a flask equipped with a stirrer, a thermometer reflux condenser, a dropping lot, and a nitrogen introduction tube was prepared, 45 parts by weight of N-benzylmaleimide, 45 parts by weight of methacrylic acid, 10 parts by weight of tricyclodecyl methacrylate, and t-butyl 4 parts by weight of peroxy-2-ethylhexanoate and 40 parts by weight of propylene glycol monomethyl ether acetate (hereinafter referred to as "PGMEA”) were added, followed by stirring and mixing to prepare a monomer dropping lot, and n-dodecanethiol 6 weight Part and 24 parts by weight of PGMEA were added and stirred to prepare a chain transfer dropper lot.
  • PGMEA propylene glycol monomethyl ether acetate
  • the color filter was manufactured using the self-luminous photosensitive resin composition prepared in Examples 1 to 7 and Comparative Examples 1 to 4 below. Specifically, each of the self-luminous photosensitive resin composition was applied on a glass substrate by spin coating, then placed on a heating plate and maintained at a temperature of 100 ° C. for 3 minutes to form a thin film. Subsequently, a test photomask having a 20 mm ⁇ 20 mm square transmission pattern and a line / space pattern of 1 ⁇ m to 100 ⁇ m was placed on the thin film, and the ultraviolet rays were irradiated with a distance of 100 ⁇ m from the test photomask.
  • the ultraviolet light source was irradiated with an exposure amount (365 nm) of 200 mJ / cm 2 in an air atmosphere using an ultra high pressure mercury lamp (trade name USH-250D) manufactured by Ushio Denki Co., Ltd., and no special optical filter was used.
  • the thin film irradiated with ultraviolet rays was developed by soaking for 80 seconds in a KOH aqueous solution developing solution of pH 10.5.
  • the thin film coated glass plate was washed with distilled water, dried by blowing nitrogen gas, and heated in a heating oven at 150 ° C. for 10 minutes to prepare a color filter pattern.
  • the film thickness of the prepared self-luminous color filter pattern was 3 ⁇ m.
  • Dispersion particle size was measured using ELSZ-2000ZS (manufactured by Otsuka Co., Ltd.) and listed in Table 3 below. As the quantum dot particles aggregate, the dispersion particle size increases.
  • the emission intensity in the 550 nm region of the color filter manufactured in Preparation Example 3 was measured using a spectrometer (manufactured by Ocean Optics, Inc.), and is shown in Table 3 below. It is determined that the greater the measured emission intensity is, the better the self-luminous property is.

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Abstract

Un liquide de dispersion de points quantiques selon la présente invention comprend des points quantiques et un solvant. Le solvant ne comprend ni un solvant hydrocarboné halogéné, ni un solvant hydrocarboné aromatique ni un solvant hydrocarboné aliphatique et satisfait à une condition particulière du paramètre de solubilité de Hansen.
PCT/KR2017/010278 2016-11-15 2017-09-20 Liquide de dispersion de points quantiques, composition de résine photosensible auto-luminescente, filtre coloré préparé en utilisant ceux-ci et dispositif d'affichage d'image WO2018093034A1 (fr)

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JP2019525834A JP6778818B2 (ja) 2016-11-15 2017-09-20 量子ドット分散液、自発光感光性樹脂組成物、これを利用して製造されたカラーフィルターおよび画像表示装置
CN201780070674.0A CN109952360B (zh) 2016-11-15 2017-09-20 量子点分散液、自发光感光性树脂组合物、利用其制造的滤色器及图像显示装置

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JP2021043445A (ja) * 2019-09-10 2021-03-18 東友ファインケム株式会社Ｄｏｎｇｗｏｏ Ｆｉｎｅ−Ｃｈｅｍ Ｃｏ．， Ｌｔｄ． 光変換インク組成物、カラーフィルタ、及び画像表示装置
JP2021043446A (ja) * 2019-09-10 2021-03-18 東友ファインケム株式会社Ｄｏｎｇｗｏｏ Ｆｉｎｅ−Ｃｈｅｍ Ｃｏ．， Ｌｔｄ． 光変換インク組成物、カラーフィルタ、及び画像表示装置

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WO2019083112A1 (fr) 2017-10-27 2019-05-02 삼성에스디아이 주식회사 Composition comprenant des points quantiques, procédé de préparation de points quantiques, et filtre couleur
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KR102519941B1 (ko) * 2018-10-18 2023-04-07 동우 화인켐 주식회사 광변환 수지 조성물, 광변환 시트 및 화상표시장치
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KR102296792B1 (ko) 2019-02-01 2021-08-31 삼성에스디아이 주식회사 무용매형 경화성 조성물, 이를 이용하여 제조된 경화막, 상기 경화막을 포함하는 컬러필터, 디스플레이 장치 및 상기 경화막의 제조방법
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